| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 430269000 |
IMAGING AFFECTING PHYSICAL PROPERTY OF RADIATION SENSITIVE MATERIAL, OR PRODUCING NONPLANAR OR PRINTING SURFACE - PROCESS, COMPOSITION, OR PRODUCT
| 4336 |
| 430031000 |
ELECTRIC OR MAGNETIC IMAGERY, E.G., XEROGRAPHY, ELECTROGRAPHY, MAGNETOGRAPHY, ETC., PROCESS, COMPOSITION, OR PRODUCT
| 3289 |
| 430004000 |
RADIATION MODIFYING PRODUCT OR PROCESS OF MAKING
| 1484 |
| 430030000 |
INCLUDING CONTROL FEATURE RESPONSIVE TO A TEST OR MEASUREMENT
| 216 |
| 430001000 |
HOLOGRAPHIC PROCESS, COMPOSITION, OR PRODUCT
| 177 |
| 430009000 |
IMAGED PRODUCT
| 141 |
| 430401000 |
POST IMAGING PROCESSING
| 51 |
| 430199000 |
TRANSFER PROCEDURE BETWEEN IMAGE AND IMAGE LAYER, IMAGE RECEIVING LAYERS, OR ELEMENT CONTAINING AN IMAGE RECEIVING LAYER OR AN INGREDIENT FOR FORMING AN IMAGE RECEIVING LAYER
| 21 |
| 430495100 |
RADIATION SENSITIVE PRODUCT
| 19 |
| 430020000 |
LIQUID CRYSTAL PROCESS, COMPOSITION, OR PRODUCT
| 18 |
| 430348000 |
THERMOGRAPHIC PROCESS
| 15 |
| 430022000 |
REGISTRATION OR LAYOUT PROCESS OTHER THAN COLOR PROOFING
| 14 |
| 430019000 |
ERASABLE IMAGING
| 12 |
| 430449000 |
NONRADIATION SENSITIVE IMAGE PROCESSING COMPOSITIONS OR PROCESS OF MAKING
| 9 |
| 430357000 |
COLOR IMAGING PROCESS
| 7 |
| 430332000 |
DYE IMAGE FROM RADIATION SENSITIVE DYE OR DYE FORMER BY DRY PROCESSING, COMPOSITION, OR PRODUCT | 5 |
| 20080254395 | Image recording media and image layers - Imaging layers, image recording media, and methods of preparation of each, are disclosed. | 10-16-2008 |
| 20110151384 | Colour Forming Composition - A composition comprising i) a colour forming component which is susceptible to changing colour when irradiated; ii) an amine neutralised alkylaromatic sulphonic acid; and iii) a binder. Methods of marking a substrate comprising incorporating within or applying to a substrate the composition of this invention, and substrates coated with the composition, are also provided. | 06-23-2011 |
| 20110250545 | COMPOSITION, PROCESS OF PREPARATION AND METHOD OF APPLICATION AND EXPOSURE FOR LIGHT IMAGING PAPER - The present invention provides dual energy imaging compositions, processes for forming dual energy imaging compositions, methods for forming images using dual energy imaging compositions and substrate (e.g., paper web) treated (e.g., coated) on one or both sides with a dual energy imaging composition. Also provided is a particulate comprising a matrix of polymer material and containing one or more image-forming agents and a photo-oxidizing agent useful in making dual energy imaging compositions. | 10-13-2011 |
| 20080268384 | Color forming composites capable of multi-colored imaging and associated systems and methods - Composites, methods, and systems for production of multi-color images which are developable at various wavelengths are disclosed and described. The color forming composite can include a first color forming layer having a first polymer matrix, a first color former, and a first developer where the first color former and the first developer can be in separate phases within the first color forming layer; a second color forming layer having a second polymer matrix, a second color former, and a second developer where the second color former and the second developer can be in separate phases within the second color forming layer; and at least one radiation absorber. The radiation absorber can be present in at least one of the first or second color forming layers. Additionally, the first color forming layer can have a first extinction coefficient that is higher than the second extinction coefficient of the second color forming layer. | 10-30-2008 |
| 20120003592 | IMAGING PARTICULATES, PAPER AND PROCESS, AND IMAGING OF PAPER USING DUAL WAVELENGTH LIGHT - The present invention provides dual wavelength imaging compositions, processes for forming dual wavelength imaging compositions, methods for forming images using dual wavelength imaging compositions and substrate (e.g., paper web) treated (e.g., coated) on one or both sides with dual wavelength imaging compositions. Also provided is a dual wavelength imaging particulate comprising a matrix of polymer material and containing: one or more image-forming agents; a photo-oxidizing agent which is activated at a first wavelength of light to cause the one or more image-forming agents to form one or more images; and a reducing agent which is activated at a second wavelength of light to cause termination of the formation of the one or more images. | 01-05-2012 |
| 430008000 |
MICROGRAPHY, PROCESS, COMPOSITION, OR PRODUCT OTHER THAN MICROELECTRONIC DEVICE MANUFACTURE | 5 |
| 20080226995 | Thermally controlled particulate core migration within polymer matrix - A composition is provided that includes a polymer matrix. A core having a core surface is embedded within the polymer matrix. A polymeric ligand passivates the core surface and has a moiety Y, where Y is a Diels-Alder group of a diene or dienophile. A polymeric linker has a complementary Diels-Alder group diene or dienophile to moiety Y and forms a Diels-Alder bond with the moiety Y. A composition is also provided that includes polymer matrix having a matrix surface. A core having a core surface is present on the matrix surface. A polymeric ligand passivates the core surface and has a moiety Y, where Y is Diels-Alder group of a diene or dienophile. The polymer matrix and polymeric ligand together define a matrix-ligand Flory-Huggins binary interaction function greater than 0. | 09-18-2008 |
| 20120107734 | METHODS OF FORMING SHEETING WITH COMPOSITE IMAGES THAT FLOAT AND SHEETING WITH COMPOSITE IMAGES THAT FLOAT - Microlens sheetings with different types of composite images are disclosed, in which the composite image floats above, in, or below the sheeting, or some combination. One type of composite image may be viewable to the unaided eye or an observer and another type of composite image is viewable only to the aided eye of an observer. Methods for providing such an imaged sheeting are also disclosed. | 05-03-2012 |
| 20120156598 | PHOTOSENSITIVE RESIN COMPOSITION FOR MICROLENS - There is provided a photosensitive resin composition for a microlens. A photosensitive resin composition for a microlens, comprising a component (A), a component (B) and a component (C), wherein the component (A) is a polymer having a maleimide structural unit of Formula (1), the component (B) is a cross-linking agent, and the component (C) is a photosensitizing agent. | 06-21-2012 |
| 20120208115 | IMAGING OPTICS - An imaging optics includes a plurality of mirrors which reflect imaging light to image an object field in an object plane into an image field in an image plane. A mirror body of at least one of the mirrors has a through-opening for the imaging light to pass through. The through-opening has an internal region of a smallest opening width in the mirror body. The through-opening expands from the internal region towards both edge regions of the mirror body. A disturbing influence of unused light portions is reduced or eliminated completely. | 08-16-2012 |
| 20130059239 | PHOTORESIST PATTERN FORMING METHOD, AND MICROLENS ARRAY FORMING METHOD - A photoresist pattern forming method, comprising a first step of forming on an underlayer a photoresist film which includes a convex portion and a concave portion having a thickness thinner than a thickness of the convex portion, and a second step of processing the photoresist film to form, in a portion which has been the convex portion, an opening having a width narrower than a width of the convex portion, wherein in the second step, the convex portion of the photoresist film is at least partially exposed, and the photoresist film is then developed, and exposure light is condensed by the convex portion in exposing the photoresist film. | 03-07-2013 |
| 430256000 |
STRIPPING PROCESS OR ELEMENT | 5 |
| 20090098478 | Method of manufacturing multi-layer circuit board - A method of manufacturing a multi-layer circuit layer is provided. One example method includes the steps of: preparing an upper substrate and a lower substrate, wherein each of the upper and lower substrates includes a carrier layer and a seed layer, which are detachably connected to each other; forming circuits including first circuit patterns on the upper substrate and second circuit patterns on the lower substrate by plating on the seed layer; preparing a core substrate, wherein circuit patterns comprising a conductive material are formed on the core substrate; coupling the upper substrate, the core substrate, and the lower substrate by interposing adhesive members; detaching the carrier layer from the seed layer; etching the seed layer, wherein the seed layer is removed; and electrically connecting the first circuit patterns and the second circuit patterns to the third circuit patterns, respectively. | 04-16-2009 |
| 20160077440 | PATTERN PEELING METHOD, ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING THE SAME - The present invention has an object to provide a pattern peeling method which is excellent in peelability and causes less damage to a substrate, a method for manufacturing an electronic device, including the pattern peeling method, and an electronic device manufactured by the method for manufacturing an electronic device. The present invention includes a resist film forming step of applying an actinic ray-sensitive or radiation-sensitive resin composition onto a substrate to form a resist film; an exposing step of exposing the resist film; a developing step of developing the exposed resist film using a developing liquid containing an organic solvent to form a negative-type pattern; and a peeling step of peeling the negative-type pattern using the following liquid A or B:
| 03-17-2016 |
| 20160154315 | ORGANIC P-N JUNCTION BASED INFRARED DETECTION DEVICE AND MANUFACTURING METHOD THEREOF AND INFRARED IMAGE DETECTOR USING SAME | 06-02-2016 |
| 20160252819 | MODIFIED-RESIST STRIPPER, METHOD FOR STRIPPING MODIFIED RESIST USING SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR-SUBSTRATE PRODUCT | 09-01-2016 |
| 20120264051 | PEDESTAL COVERS - Examples of novel semiconductor processing pedestals, and apparatuses including such pedestals, are described. These pedestals are specifically configured to provide uniform heat transfer to semiconductor substrates and to reduce maintenance complexity and/or frequency. Specifically, a pedestal may include a removable cover positioned over a metal platen of the pedestal. The removable cover is configured to maintain a consistent and uniform temperature profile of its substrate-facing surface even though the platen's upper-surface, which supports the cover and is in thermal communication with the cover, may have a much less uniform temperature profile. The cover may be made from certain ceramic materials and shaped as a thin plate. These materials are resistant to the processing environments and maintain their thermal characteristics over many processing cycles. The cover can be easily removed from the platen and replaced with a new one without a need for major disassembly of the entire apparatus. | 10-18-2012 |
| 430141000 |
DIAZO REPRODUCTION, PROCESS, COMPOSITION, OR PRODUCT | 3 |
| 20090214979 | PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT - A photosensitive resin composition comprising (a) a compound obtained by reacting a polybasic acid anhydride with the phenolic hydroxyl groups of a novolac-type phenol resin, and (b) a 1,2-quinonediazide compound. The photosensitive resin composition, which comprises component (b) composed of a 1,2-quinonediazide compound in combination with a component (a) obtained by reacting a polybasic acid anhydride with the phenolic hydroxyl groups of a novolac-type phenol resin, exhibits sufficiently high photosensitivity, image contrast, resolution and adhesiveness. | 08-27-2009 |
| 20130323640 | Preparation of Norbornane-based PAC Ballasts - Embodiments in accordance with the present invention provide for norbornane-type ballast materials, norbornane-type photoactive compounds derived from such ballast materials and alkali-soluble positive-tone polymer compositions that encompass such norbornane-type photoactive compounds and one of a PBO or PNB resin. | 12-05-2013 |
| 20140242515 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING DISPLAY DEVICE USING SAME - A photoresist composition including a binder resin including a novolac resin represented by Chemical Formula 1, a diazide photosensitive initiator, and a solvent including a base solvent and an auxiliary solvent, wherein the base solvent includes propylene glycol monomethyl ether acetate, and the auxiliary solvent includes dimethyl-2-methylglutarate and ethyl beta-ethoxypropionate, | 08-28-2014 |
| 430346000 |
VISIBLE IMAGING USING RADIATION ONLY OTHER THAN HEATING BY SURFACE CONTACT OR CONVECTION | 3 |
| 20080220382 | Lithographic apparatus and method - A lithographic apparatus includes a shutter system constructed and arranged to mask out parts of a patterning device or a substrate from a beam of radiation. The shutter system includes at least one moveable shutter. The apparatus also includes a control unit arranged to receive information regarding the extent to which a patterned beam of radiation would extend across a periphery of the substrate when being projected onto the target region of the substrate. The control unit is configured to move the shutter by a predetermined amount to affect the parts of the patterning device or the substrate masked out from the beam of radiation if projecting the patterned beam of radiation onto the target portion would involve the patterned beam of radiation extending across the periphery of the substrate. | 09-11-2008 |
| 20080241767 | Deactivating device and method for lithographic printing plate - A device as well as method for deactivating without developing an exposed lithographic printing plate is disclosed. The device comprises a structure for providing a deactivating agent that is capable of deactivating without developing the plate. The plate comprises on a substrate a photosensitive layer capable of hardening upon exposure to a radiation, and becoming incapable of or having reduced rate of hardening after contacting with a deactivating agent. The deactivated plate is safe or has better stability at room lighting, and can be handled under room lighting before and during development. The development can be on press with ink and/or fountain solution or off press with a liquid developer. | 10-02-2008 |
| 20100015558 | Laser Marking - An ink formulation comprises a marking component, e.g. ammonium octamolybdate, and a metal salt that absorbs laser irradiation at 780-2500 nm, e.g. reduced indium tin oxide, and thereby causes the marking component to change colour. | 01-21-2010 |
| 430138000 |
MICROCAPSULE, PROCESS, COMPOSITION, OR PRODUCT | 2 |
| 20130183620 | CHEMICAL COATING COMPOSITION FOR FORMING A LASER-MARKABLE MATERIAL AND A LASER-MARKABLE MATERIAL - Disclosed is a chemical coating composition for recording an image on a recording material that forms a color image by irradiation with a laser beam. Further, the chemical coating composition comprises at least one microcapsule encapsulating a basic dye precursor, and at least one plastic dispersion. Also disclosed is a recording material using the inventive chemical coating composition, as well as a recording method using the chemical coating composition dried onto a recording material which is then subsequently irradiated with a laser. | 07-18-2013 |
| 20130216947 | CHEMICAL COATING COMPOSITION FOR FORMING A LASER-MARKABLE MATERIAL AND A LASER-MARKABLE MATERIAL - Disclosed is a chemical coating composition for recording an image on a recording material that forms a color image by irradiation with a laser beam. Further, the chemical coating composition includes at least one water soluble polymer whose viscosity of a 4% aqueous solution is more than 29 mPa·s at 20° C., and at least one water soluble compound which has at least one acidic group and at least one basic group, and has absorption maximum at more than 330 nm. Also disclosed is a recording material using the inventive chemical coating composition, as well as a recording method using the chemical coating composition dried onto a recording material which is then subsequently irradiated with a laser. | 08-22-2013 |
| 430021000 |
RETRIEVING IMAGE MADE USING RADIATION IMAGERY | 2 |
| 20080199789 | Antireflective Coating Composition Based on Silicon Polymer - The present invention relates to an antireflecting coating composition which is capable of forming a crosslinked coating underneath a layer of photoresist comprising a silicon polymer, where the silicon polymer comprises at least one unit with the structure 1, | 08-21-2008 |
| 20080233494 | Method for forming a high resolution resist pattern on a semiconductor wafer - In one disclosed embodiment, a method for forming a high resolution resist pattern on a semiconductor wafer involves forming a layer of resist comprising, for example a polymer matrix and a catalytic species, over a material layer formed over a semiconductor wafer; exposing the layer of resist to patterned radiation; and applying a magnetic field to the semiconductor wafer during a post exposure bake process. In one embodiment, the patterned radiation is provided by an extreme ultraviolet (EUV) light source. In other embodiments, the source of patterned radiation can be an electron beam, or ion beam, for example. In one embodiment, the polymer matrix is an organic polymer matrix such as, for example, styrene, acrylate, or methacrylate. In one embodiment, the catalytic species can be, for example, an acid, a base, or an oxidizing agent. | 09-25-2008 |
| 430396000 |
EFFECTING FRONTAL RADIATION MODIFICATION DURING EXPOSURE, E.G., SCREENING, MASKING, STENCILING, ETC. | 2 |
| 20120088196 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND BLIND FOR EXPOSURE APPARATUS - An exposure apparatus includes a mask, a substrate which passes through a region disposed below the mask while moving in a first direction, a light source unit disposed above the mask, where the light source irradiates light on the substrate through the mask, and at least one blind disposed below the light source unit, where the blind blocks the light irradiated from the light source unit, where a second direction is perpendicular to the first direction in a same plane as the first direction, the blind is a polyhedron having a width, a length and a thickness and is disposed such that a direction of the length is substantially parallel to the second direction, and the blind is rotatable around a rotation axis substantially parallel to the second direction, and where the width is greater than the thickness. | 04-12-2012 |
| 20130029273 | Fabrication Of Fluidic Features Within A Plastic Substrate - In one aspect of the invention, methods, and devices are provided for creating microfluidic and nanofluidic features. In some embodiments, such methods and devices are used to create at least one channel of a desired volume within a channel in a plastic substrate. | 01-31-2013 |
| 430139000 |
LUMINESCENT IMAGING | 2 |
| 20100330496 | SIMULTANEOUS TWO-PHOTON ABSORPTION RECORDING-REPRODUCTION METHOD, AND SIMULTANEOUS TWO-PHOTON ABSORPTION RECORDING MATERIAL FOR USE THEREIN - A simultaneous two-photon absorption recording-reproduction method of recording and reproducing a data by inducing changes in the fluorescence intensities in a recorded part and an unrecorded part by simultaneous two-photon absorption, comprising: generating a fluorescence quencher in a two-photon recording part; and inducing quenching by excitation energy transfer between the fluorescence quencher and a fluorescent dye to physically quench the fluorescence by reproduction light from the fluorescent dye and decrease the fluorescence intensity in the recorded part; and a simultaneous two-photon absorption recording material for use in the method capable of generating a fluorescence quencher capable of inducing quenching by excitation energy transfer between the fluorescence quencher and a fluorescent dye by simultaneous two-photon absorption and physically quenching the fluorescence from the fluorescent dye. | 12-30-2010 |
| 20120189958 | IMAGE TRANSFER PROCESS - The present invention relates to an image transfer process. The process includes the steps of: a) providing an image carrying device including at least one photoluminescent surface; b) displaying a luminous image on a display surface of a light-emitting medium; and c) positioning the display surface of the light-emitting medium that is displaying the luminous image at a distance from the at least one photoluminescent surface of the image carrying device shorter than a predetermined effective distance, for a predetermined period of time. | 07-26-2012 |
| 430394000 |
PLURAL EXPOSURE STEPS | 1 |
| 20080311531 | Method and apparatus for generating periodic patterns by step-and-align interference lithography - The present invention provides a method and an apparatus for generating periodic patterns by step-and-align interference lithography, wherein at least two coherent light beams with a pattern are controlled to project onto a substrate to be exposed to form an interference-patterned region on the substrate. Thereafter, by means of moving the substrate or the light beams stepwisely, a patterned region with a large area can be formed on the substrate. According to the present invention, the optical path and exposure time may be shortened to reduce defect formation during lithographic processing and to improve the yield. | 12-18-2008 |
| 430494000 |
INCLUDING EXPOSURE STEP OR SPECIFIED PRE-EXPOSURE STEP PERFECTING EXPOSURE | 1 |
| 20110070548 | SILVER HALIDE PHOTOSENSITIVE MATERIAL AND PROCESS OF PRODUCING BLACK AND WHITE IMAGE USING THE SAME - Disclosed is a silver halide photographic photosensitive material which includes a support and at least one silver halide photosensitive layer on the support, wherein the average equivalent sphere diameter of the silver halide of the silver halide photosensitive layer is 0.30 μm or less, the silver halide photosensitive layer includes four or more kinds of silver halide grains having mutually different average equivalent sphere diameters, and the thickness between a surface of the support at a side at which the silver halide photosensitive layer is provided and a surface of the silver halide photosensitive layer at a side opposite to the support is 10 μm or less. | 03-24-2011 |
| 430003000 |
USE OF SOUND OR NONDIGITAL COMPRESSIVE FORCE | 1 |
| 20130183609 | THIN FILM PATTERNING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE THIN FILM PATTERNING METHOD - A thin film patterning method may include forming a thin film by coating a precursor solution containing a precursor of metal oxide onto a substrate, soft baking the thin film, exposing the thin film to light by using a photomask, developing the thin film, and hard baking the developed thin film. The precursor may include metal acetate, for example, a zinc acetate-based material, and the metal oxide thin film may include zinc oxide (ZnO). | 07-18-2013 |
| 430198000 |
VISIBLE IMAGING INCLUDING STEP OF FIRING OR SINTERING | 1 |
| 20100209843 | PROCESS FOR THICK FILM CIRCUIT PATTERNING - The invention relates to forming an electrically functional pattern on a substrate. More specifically, the invention relates to a process for using a photosensitive element in combination with a sheet having a thick film composition applied to a support. | 08-19-2010 |
