| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 430022000 | REGISTRATION OR LAYOUT PROCESS OTHER THAN COLOR PROOFING | 14 |
| 20080220344 | Drawing Method and Apparatus - In a drawing method for drawing an image on a substrate by relatively moving a drawing head that forms, based on input drawing-point data, drawing points on the substrate with respect to the substrate and by sequentially forming the drawing points on the substrate by the drawing head based on the movement of the drawing head, a relative positional deviation between the substrate and the drawing head during drawing of the image is obtained. Further, formation positions of the drawing points by the drawing head are corrected based on the obtained relative positional deviation. | 09-11-2008 |
| 20080286667 | OVERLAY MANAGEMENT METHOD AND APPARATUS, PROCESSING APPARATUS, MEASUREMENT APPARATUS AND EXPOSURE APPARATUS, DEVICE MANUFACTURING SYSTEM AND DEVICE MANUFACTURING METHOD, AND PROGRAM AND INFORMATION RECORDING MEDIUM - In repeated processes (steps | 11-20-2008 |
| 20090004580 | DETECTION DEVICE, MOVABLE BODY APPARATUS, PATTERN FORMATION APPARATUS AND PATTERN FORMATION METHOD, EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - By irradiating a detection beam from an irradiation system of a detection device to a scale used for measuring the position of a wafer stage, and detecting the detection beam via the scale by a photodetection system, a surface state (an existence state of foreign substance) of the scale is detected. With this operation, detection of the surface state can be performed contactlessly with respect to the scale. Moreover, movement control of the wafer stage can be performed with high precision by taking the surface state into consideration. | 01-01-2009 |
| 20090035669 | WORK POSITION INFORMATION OBTAINING METHOD AND APPARATUS - A work position information obtaining apparatus capable of obtaining a position of a work with respect to a table with high accuracy. Moving a table with a work placed thereon relative to an imaging section. Obtaining work position information representing a position of the work with respect to the table based on imaged information obtained by imaging table and work reference marks by the imaging section and moving direction positions of the table at the time of imaging the table and work reference marks. Obtaining the positional deviations of the table at the time of imaging the table and work reference marks, with reference to a positional deviation of the table obtained in advance in association with each of the moving direction positions of the table. Then, eliminating an error included in the work position information arising from the difference between each imaged positional deviation. | 02-05-2009 |
| 20090042115 | Exposure apparatus, exposure method, and electronic device manufacturing method - An exposure apparatus for exposing a bright-dark pattern on a substrate via a projection optical system includes a position detection system which detects a plurality of predetermined positions in a unit exposure field of the substrate. A plurality of reference detection positions fall within a range substantially equal to the unit exposure field. A deformation calculation unit calculates a state of deformation in the unit exposure field based on the detection result of the position detection system. A shape modification unit modifies a shape of the bright-dark pattern to be exposed on the substrate based on the deformation state calculated by the deformation calculation unit. | 02-12-2009 |
| 20090176167 | Alignment System and Alignment Marks for Use Therewith - A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal. | 07-09-2009 |
| 20090263734 | Lithographic Apparatus and Device Manufacturing Method - In optical maskless lithography, scanning of a single substrate is typically much slower than in conventional lithography. Solutions are described for the adoption of immersion lithography techniques into optical maskless lithography and in particular provides one or more solutions to reduce the amount of time which the immersion liquid is in contact with any given part of the top surface of the substrate during imaging. | 10-22-2009 |
| 20090317732 | PATTERN VERIFICATION-TEST METHOD, OPTICAL IMAGE INTENSITY DISTRIBUTION ACQUISITION METHOD, AND COMPUTER PROGRAM - A pattern verification-test method according to an embodiment of the present invention includes: deriving an illumination condition at a verification-test subject position in a photomask surface of a mask pattern as a verification or a test subject based on the verification-test subject position and illumination condition information about a distribution of an illumination condition in a photomask surface of exposure light incident on the mask pattern, performing lithography simulation on the mask pattern based on the derived illumination condition and the mask pattern, and verifying or testing the mask pattern based on a result of the lithography simulation. | 12-24-2009 |
| 20100055584 | EXPOSURE DEVICE AND EXPOSURE METHOD - An exposure device according to an embodiment includes an exposure light source for irradiating a reflective mask with an exposure light, an alignment light source for irradiating the reflective mask with an alignment light and an optical element having a structure that a light path of the exposure light extending from the alignment light source to the reflective mask shares at least part in common with a light path of the alignment light extending from the alignment light source to the reflective mask. | 03-04-2010 |
| 20100248098 | IMAGE FORMING APPARATUS, IMAGE FORMING METHOD, AND STORAGE MEDIUM IN WHICH ABNORMALITY JUDGING PROGRAM IS STORED - An image forming apparatus is provided. An exposure component is equipped with a plurality of light emitting elements arrayed along a first direction. An output component is equipped with output ends corresponding to each of the light emitting elements and the output component, when correcting an amount of misalignment in the first direction, outputs drive signals of one line corresponding to a line on a most upstream side of drive signals of plural lines from the output ends that have been shifted by a number corresponding to the amount of misalignment in the first direction. A plurality of connecting wires interconnect each of the output ends and each of the light emitting elements. A judging component is connected to each of the connecting wires, and judges whether or not the drive signals are being normally transmitted through the connecting wire that the judging component has selected. | 09-30-2010 |
| 20120015289 | ALIGNMENT METHOD AND METHOD FOR MANUFACTURING FLAT PANEL DISPLAY - An alignment method is disclosed, in which a distance between a substrate and a photomask is set at a predetermined exposure gap. The photomask is rectangular, and includes a first side, and a second side opposite to the first side. A distance between a midpoint of the first side and the substrate is matched with the exposure gap. The photomask is rotated about, as an axis, a line that connects the midpoint of the first side and a midpoint of the second side to each other, whereby distances between both ends of the first side and the substrate are individually matched with the exposure gap. The photomask is rotated about the first side taken as an axis, whereby a distance between the midpoint of the second side and the substrate is matched with the exposure gap | 01-19-2012 |
| 20160041477 | METHOD FOR PRODUCING A STRUCTURE - The invention relates to a method for producing a structure in a lithographic material, wherein the structure in the lithographic material is defined by means of a writing beam of an exposure device, in that a plurality of partial structures are written sequentially, wherein for writing the partial structures a write field of the exposure device is displaced and positioned sequentially and that a partial structure is written in the write field in each case, and wherein for positioning of the write field a reference structure is detected by means of an imaging measuring device. For calibration of the write field in the respectively positioned write field, before, during or after writing a partial structure, at least one reference structure element assigned to this partial structure is produced in the lithographic material with the writing beam, wherein the reference structure element after the displacement of the write field is detected by means of the imaging measuring device for writing a further partial structure. | 02-11-2016 |
| 20160170317 | METHOD OF ALIGNING QUADRATE WAFER IN FIRST PHOTOLITHOGRAPHY PROCESS | 06-16-2016 |
| 20190146357 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SYSTEM FOR PERFORMING THE SAME | 05-16-2019 |
