| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 430270100 |
Radiation sensitive composition or product or process of making
| 2246 |
| 430322000 |
Forming nonplanar surface
| 928 |
| 430311000 |
Making electrical device
| 573 |
| 430300000 |
Making printing plates
| 189 |
| 430296000 |
Electron beam imaging
| 182 |
| 430320000 |
Making named article
| 166 |
| 430331000 |
Finishing or perfecting composition or product
| 18 |
| 430327000 |
Processing feature prior to imaging
| 14 |
| 430329000 |
Removal of imaged layers
| 7 |
| 430290000 |
Light scattering or refractive index image formation | 4 |
| 20090111055 | METHOD OF FORMING AN IMAGE HAVING MULTIPLE PHASES - A method of forming an image having multiple phases is disclosed herein. The method includes forming exposed and unexposed areas, the exposed areas comprising a first polymer network exhibiting first and second phases that are chemically connected and have different refractive indices, the first phase being continuous, and the second phase comprising a plurality of structures dispersed within the first phase, and the unexposed areas comprising a second polymer network comprising third and fourth phases that are chemically connected and have different refractive indices, the third phase being continuous, and the fourth phase comprising a plurality of structures dispersed within the third phase. The first and second polymer networks are chemically connected, and morphology formed by the first and second phases is different than that formed by the third and fourth phases. | 04-30-2009 |
| 20090269702 | METHOD FOR INTRODUCING INCLUSION IMAGE INTO GEMSTONE - A gemstone having an image formed by a manufactured color inclusion and method for making same. The gemstone is of a type that is heat sensitive and undergoes a color phase transformation upon heat treatment. The image is formed by tracing a focused laser beam along a linear trail within the interior of the gemstone so as to heat the linear trail for precipitating the color phase transformation and creating the color inclusion. The image is formed by the newly formed color inclusion. | 10-29-2009 |
| 20100003619 | SYSTEMS AND METHODS FOR FABRICATING THREE-DIMENSIONAL OBJECTS - Systems and methods for fabricating three-dimensional objects. The system includes an optical imaging system providing a light source; a photosensitive medium adapted to change states upon exposure to a portion of the light source from the optical imaging system; a control system for controlling movement of the optical imaging system, wherein the optical imaging system moves continuously above the photosensitive medium. The method includes moving a maskless optical imaging system providing the light beam in a continuous sequence; presenting the light beam on a portion of the photosensitive medium; lowering a plate upon which the photosensitive medium resides; and applying a new layer of the photosensitive medium. | 01-07-2010 |
| 20110091813 | DYNAMIC PROJECTION METHOD FOR MICRO-TRUSS FOAM FABRICATION - A system for fabricating a radiation-cured component is provided. The system includes a radiation-sensitive material configured to at least one of initiate, polymerize, crosslink and dissociate with exposure to radiation, and at least one radiation source configured to project a radiation beam with a vector that does not intersect the radiation-sensitive material. The system further includes a radiation directing device that is selectively positionable to reflect the radiation beam in a desired direction and exposure the radiation-sensitive material to the radiation beam. A method for fabricating the radiation-cured components is also provided. | 04-21-2011 |
| 430328000 |
Post imaging radiant energy exposure | 3 |
| 20140154632 | PERFLUOROALKYL SULFONAMIDES SURFACTANTS FOR PHOTORESIST RINSE SOLUTIONS - A method of modifying a surface of a photoresist material including exposing the photoresist material to an aqueous ionic surfactant solution and varying the pH of the aqueous ionic surfactant solution until a fluorochemical layer is formed in or on the photoresist material. The aqueous ionic surfactant solution includes a perfluoroalkyl sulfonamide the formula: R | 06-05-2014 |
| 20150017590 | COATING AGENT FOR FORMING FINE PATTERN - A coating agent for forming a fine pattern and a method for forming a fine pattern using the coating agent, in which the coating agent allows a resist pattern to be favorably fined, and can form a fined pattern having a suppressed deviation of CD. A coating agent for forming a fine pattern including (A) a water-soluble polymer is combined with a compound in which the compound has an alkyl group having 8 or more carbon atoms bound to a nitrogen atom, and is combined with 4 moles or more of ethylene oxide and/or propylene oxide with respect to 1 mole of a nitrogen atom bound with the alkyl group as (B) a nitrogen-containing compound. | 01-15-2015 |
| 20150309417 | EXPOSURE APPARATUS - Provided are a photomask, an exposure apparatus and a method. A fine pattern having a submicrometer size can be easily formed on a cylindrical mold, and the cylindrical mold having the pattern formed therein can be easily applied to an automation process, such as a roll-to-roll process. Also, the fine pattern can be formed in a large scale having various sizes by using a mask formed of a flexible material, and patterns having different shapes can be divided or independently formed on a curved surface of the cylindrical mold so that a degree of freedom of a process can be improved. | 10-29-2015 |
| 430330000 |
Including heating | 1 |
| 20110143289 | SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM AND SUBSTRATE PROCESSING SYSTEM - A PEB unit has a first heat plate and a second heat plate. After an exposure process for a resist film for EUV on a wafer and before a development process, the PEB unit heats the wafer through the first heat plate at a first heating temperature. A heating time through the first heat plate is not less than 10 seconds and not more than 30 seconds. Thereafter, the PEB unit heats the wafer through the second heat plate at a second heating temperature lower than the first heating temperature. A temperature difference between the first heating temperature and the second heating temperature is not less than 20° C. and not more than 60° C. | 06-16-2011 |
| 430299000 |
Simultaneous developing a resist image and etching a subtrate | 1 |
| 20190146337 | PHOTORESIST DEVELOPER AND METHOD OF DEVELOPING PHOTORESIST | 05-16-2019 |
| 430297000 |
Simultaneous radiation imaging and etching of substrate | 1 |
| 20140308616 | COMPOSITION OF AN AQUEOUS ETCHANT CONTAINING A PRECURSOR OF OXIDANT AND PATTERNING METHOD FOR CONDUCTIVE CIRCUIT - The present invention is primarily related to the composition of an aqueous etchant containing a precursor of oxidant and patterning methods for conductive circuits, in which the chemical structure of the precursor contains chlorine and can produce oxidants through various reactions. And, the patterned conductive circuits can be used for electronic devices, including printed electronics, sensors, displays, organic light emitting diodes (OLED), touch panels, electronic circuit boards, electrodes, electroluminescent (EL) films, antennas, and solar cells. | 10-16-2014 |
| 430291000 |
Post imaging treatment with particles | 1 |
| 20140287364 | PATTERNING METHOD USING THIOSULFATE POLYMER AND METAL NANOPARTICLES - A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer composition can be used in methods to form predetermined patterns of metal nanoparticles. | 09-25-2014 |
