| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 430018000 |
Including resin or synthetic polymer
| 88 |
| 430017000 |
Nonsilver image
| 13 |
| 430014000 |
Multilayer
| 13 |
| 430016000 |
Deposited metal coating on image | 5 |
| 20160018737 | FORMING CONDUCTIVE METAL PATTERNS USING WATER-SOLUBLE POLYMERS - A conductive pattern can be formed using a polymeric layer that contains a reactive composition that comprises a reactive polymer that is metal ion-complexing, water-soluble, and crosslinkable. This reactive polymer comprises photosensitive non-aromatic heterocyclic groups each of these groups comprising a carbon-carbon double bond in conjugation with an electron withdrawing group, as well as metal ion-complexing and water solubilizing groups. The reactive composition can be patternwise exposed to suitable radiation to induce crosslinking within the reactive polymer. The reactive composition and reactive polymer in the non-exposed regions can be removed due to their aqueous solubility, but the exposed regions of the polymeric layer are contacted with electroless seed metal ions, which are then reduced. The resulting electroless seed metal nuclei are electrolessly plated with a suitable metal to form the desired conductive pattern. Various articles can be prepared during this process, and the product article can be incorporated into various electronic devices. | 01-21-2016 |
| 20160048078 | FORMING ELECTRICALLY-CONDUCTIVE PATTERNS USING CROSSLINKABLE REACTIVE POLYMERS - An electrically-conductive pattern is prepared using a reactive composition having: (1) a reactive polymer; (2) a compound that provides a cleaving acid upon exposure to radiation; and (3) a crosslinking agent that reacts in the presence of the cleaving acid, to provide crosslinking in the reactive polymer. A polymeric layer of the reactive composition is patternwise exposed to provide a polymeric layer comprising non-exposed regions and exposed regions comprising a polymer comprising sulfonic acid or sulfonate groups. The exposed regions are contacted with electroless seed metal ions to form a pattern of electroless seed metal ions, which pattern is reduced to provide a pattern of corresponding electroless seed metal particles. Electrolessly plating is then carried out in the exposed regions. The unique reactive comprises (a) recurring units represented Structure (A) as described in the disclosure, and can also include other recurring units that are crosslinkable or provide other properties. | 02-18-2016 |
| 20160077438 | FORMING CONDUCTIVE METAL PATTERNS USING WATER-SOLUBLE POLYMERS - A conductive pattern can be formed using a polymeric layer that contains a reactive composition having a reactive polymer. This reactive polymer comprises (i) a backbone, and (ii) pendant photosensitive non-aromatic unsaturated heterocyclic groups comprising an amide group that is conjugated with a carbon-carbon double bond. The non-aromatic unsaturated heterocyclic groups are linked to the backbone at an amide nitrogen atom. The reactive composition can be patternwise exposed to suitable radiation to induce crosslinking within the reactive polymer. The reactive composition and reactive polymer in the non-exposed regions can be removed due to their aqueous solubility, but the exposed regions of the polymeric layer are contacted with electroless seed metal ions, which are then reduced, followed by electrolessly plating with a suitable metal to form the desired conductive pattern. Various articles can be prepared during this process, and the product article can be incorporated into various electronic devices. | 03-17-2016 |
| 20160091793 | FORMING CONDUCTIVE METAL PATTERNS USING WATER-SOLUBLE POLYMERS - A conductive pattern can be formed using a polymeric layer that contains a reactive composition having a reactive polymer. This reactive polymer comprises pendant photosensitive 1,2-diarylethylene groups. The reactive composition can be patternwise exposed to suitable radiation to induce crosslinking within the reactive polymer. The reactive composition and reactive polymer in the non-exposed regions can be removed due to their aqueous solubility, but the exposed regions of the polymeric layer are contacted with electroless seed metal ions, which are then reduced, followed by electrolessly plating with a suitable metal to form the desired conductive pattern. Various articles can be prepared during this process, and the product article can be incorporated into various electronic devices. | 03-31-2016 |
| 20160147148 | FORMING CONDUCTIVE METAL PATTERNS USING THIOSULFATE COPOLYMERS - A precursor article has a substrate and a polymeric layer having a reactive composition that contains a non-crosslinked thiosulfate copolymer comprising: (a) recurring units comprising pendant thiosulfate groups, and (b) recurring units comprising pendant carboxy, carboxylate, phospho, phosphonate, phosphate, sulfo, sulfonate, or sulfite groups. The (a) recurring units are present in an amount of 1 to 30 mol %, and the (b) recurring units are present in an amount of 70 to 99 mol %. This precursor article can be used to provide a product article comprising a substrate in which the polymeric layer has both exposed regions and non-exposed regions. The exposed regions contain a pattern of electrolessly plated metal within or deposited on the surface of an at least partially crosslinked polymer that has been derived from the non-crosslinked thiosulfate copolymer. The non-exposed regions have none of the electrolessly plated metal or the non-crosslinked thiosulfate polymer. | 05-26-2016 |
| 430011000 |
Structurally defined | 3 |
| 20140178807 | PHOTOPATTERNABLE IMAGING LAYERS FOR CONTROLLING BLOCK COPOLYMER MICRODOMAIN ORIENTATION - The present invention provides structures including a substrate, a crosslinked polymer film disposed over the substrate, and a patterned diblock copolymer film disposed over the crosslinked polymer film. The crosslinked polymer comprises a random copolymer polymerized from a first monomer, a second monomer, and a photo-crosslinkable and/or thermally crosslinkable third monomer, including epoxy-functional or acrylyol-functional monomers. Also disclosed are methods for forming the structures. | 06-26-2014 |
| 20150140481 | FORMING PATTERNS USING CROSSLINKABLE REACTIVE POLYMERS - Various patterning methods utilize certain crosslinkable reactive polymers comprise -A- and -B- recurring units, arranged randomly along a backbone. The -A- recurring units comprise pendant aromatic sulfonic acid oxime ester groups that are capable of providing pendant aromatic sulfonic acid groups upon irradiation with radiation having a λ | 05-21-2015 |
| 20160116839 | ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS AND CORRESPONDING METHODS - Organometallic radiation resist compositions are described based on tin ions with alkyl ligands. Some of the compositions have branched alkyl ligands to provide for improved patterning contrast while maintaining a high degree of solution stability. Blends of compounds with distinct alkyl ligands can provide further improvement in the patterning. High resolution patterning with a half-pitch of no more than 25 nm can be achieved with a line width roughness of no more than about 4.5 nm. Synthesis techniques have been developed that allow for the formation of alkyl tin oxide hydroxide compositions with very low metal contamination. | 04-28-2016 |
| 430013000 |
Image contained within transparent base | 2 |
| 20140087293 | MALEIMIDE CONTAINING CYCLOOLEFINIC POLYMERS AND APPLICATIONS THEREOF - Various cycloolefinic/maleic anhydride polymers containing maleimide pendant groups and compositions thereof useful for forming self-imageable films encompassing such copolymers are disclosed. Such polymers encompass norbornene-type repeating units containing maleimide groups and maleic anhydride-type repeating units where at least some of such maleic anhydride-type repeating units have been ring-opened. The films formed from such copolymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices. | 03-27-2014 |
| 20140272688 | GRAYSCALE LITHOGRAPHY OF PHOTO DEFINABLE GLASS - A method for forming a three-dimensional microstructure includes providing a photosensitive glass substrate; exposing the photosensitive glass substrate to energy through a continuous tone, variable transmission photomask so as to form opaque portions in the photosensitive glass substrate, each of the opaque portions having one of a variety of depths extending through the entire thickness of the photosensitive glass substrate; and removing the opaque portions so as to form three-dimensional features in the photosensitive glass substrate. | 09-18-2014 |
| 430010000 |
Antifraud or antitampering | 1 |
| 20080248411 | Display Medium and Displaying Method - Provided are an indicating material having excellent facility and high security and an indicating method for recording and indicating information on this indicating material. The indicating material has a structure that an ultraviolet light-screening layer having visible light-transmitting ability is laminated on a recording layer having visible light-transmitting ability and composed of a recording layer-forming material containing a color-developing component that becomes a color-developed state by the action of ultraviolet light. The indicating method is an indicating method for recording and indicating information on the above-described indicating material, comprising condensing a laser beam having a wavelength of a visible range or longer on the recording layer in the indicating material to irradiate the recording layer with the laser beam and recording and indicating the information by two-photon absorption. | 10-09-2008 |
| Entries |
| Document | Title | Date |
|---|
| 20090208854 | Photosensitive Resin Composition for Forming Column Spacer of Liquid Crystal Display, Method for Forming Column Spacer Using the Composition, Column Spacer Formed by the Method, and Display Device Comprising the Column Spacer - Disclosed is a photosensitive resin composition used to form spacers of a liquid crystal display device. The photosensitive resin composition comprises [A] an alkali-soluble resin, [B] a reactive unsaturated compound, [C] a photopolymerization initiator and [D] a solvent wherein the alkali-soluble resin [A] is a copolymer including structural units represented by Formulae 1 to 3, which are described in the specification. Column spacers formed using the photosensitive resin composition exhibit high compressive displacement, elastic recovery and residual film ratio. | 08-20-2009 |
| 20090311614 | Charge Director for Liquid Toner - A charge director material for charging a liquid toner, the charge director material comprising (a) nanoparticles of a simple salt and (b) a sulfosuccinate salt of the general formula MA | 12-17-2009 |
| 20140038092 | COLORED COMPOSITION, COLORED CURED FILM, COLOR FILTER, METHOD FOR PRODUCING COLOR FILTER, LIQUID CRYSTAL DISPLAY DEVICE, SOLID-STATE IMAGING DEVICE, AND NOVEL DIPYRROMETHENE METAL COMPLEX COMPOUND OR TAUTOMER THEREOF - A colored composition including at least one selected from the group consisting of a compound represented by the following formula (I) and a tautomer thereof. In formula (I), R | 02-06-2014 |
| 20140212796 | PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET-SENSITIVE COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE - There is provided a pattern forming method comprising (1) a step of forming a film by using an electron beam-sensitive or extreme ultraviolet-sensitive resin composition, (2) a step of exposing the film by using an electron beam or an extreme ultraviolet ray, and (3) a step of developing the exposed film by using an organic solvent-containing developer, wherein the electron beam-sensitive or extreme ultraviolet-sensitive resin composition contains (A) a resin containing (R) a repeating unit having a structural moiety capable of decomposing upon irradiation with an electron beam or an extreme ultraviolet ray to generate an acid, and (B) a solvent. | 07-31-2014 |
| 20140212797 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD EACH USING THE COMPOSITION, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE AND PRODUCTION METHOD OF RESIN - An actinic ray-sensitive or radiation-sensitive resin composition includes: (P) a resin that contains (A) a repeating unit capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid in a side chain of the resin (P) and (C) a repeating unit represented by the following formula (I) as defined in the specification, wherein a polydispersity of the resin (P) is 1.20 or less. | 07-31-2014 |
| 20140234759 | ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN - According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition containing
| 08-21-2014 |
| 20140234760 | TRANSLUCENT ELECTROMAGNETIC SHIELD FILM, PRODUCING METHOD THEREFOR AND EMULSIFIER - A producing method for a translucent electromagnetic shield film comprising exposing a photosensitive material having an emulsion layer containing a silver salt and a dye on a substrate, then executing a development process to form a metallic silver portion and a light transmitting portion respectively in an exposed area and an unexposed area, and applying a physical development and/or a plating process to the metallic silver portion thereby causing the metallic silver portion to carry a conductive metal. The producing method allows to inexpensively mass produce a translucent electromagnetic shield film without a moiré pattern, having a high EMI shield property and a high transparency at the same time. | 08-21-2014 |
| 20140295331 | NANOPOROUS FILM PATTERNED BY DIRECT PHOTOLITHOGRAPHY AND METHOD FOR PREPARING THE SAME - A nanoporous film patterned by direct photolithography and a method for preparing the same are provided. Since a precursor of the material is the mixture of a nano template material and a photoresist and the mixture still has the basic physical properties of the photoresist, a film is formed on a substrate by a standard photolithography process and a micro-sized patterned structure is realized. The mixture with the patterned structure is chemically etched to remove the template material to form a porous polymer film, or the mixture with the patterned structure is carbonized at a high temperature and then the template material is removed to form a porous carbon film. The nanoporous film patterned by direct photolithography and the method for preparing the same have the advantages of simple operation, low cost and good integration with other micro electric mechanical systems. | 10-02-2014 |
| 20140349221 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND RESIST FILM USING THE COMPOSITION, AND ELECTRONIC DEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE USING THESE - There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound capable of generating an acid upon irradiation with an actinic ray or radiation, represented by the formula (Z1), and the formula (Z1) is defined as herein, | 11-27-2014 |
| 20150017576 | PATTERN FORMING METHOD, METHOD FOR SELECTING HEATING TEMPERATURE IN PATTERN FORMING METHOD, EXTREME ULTRAVIOLET-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE - There is provided a pattern forming method comprising, in order: (i) a step of forming a film by using an extreme ultraviolet-sensitive resin composition containing (A) a resin having an acid-decomposable group; (ii) a step of exposing the film by using an extreme ultraviolet ray; (iii) a step of heating the film; and (iv) a step of developing the film to form a pattern, wherein in the step (ii), an optical image formed by exposure on the surface of the film is an optical image having a line part with a line width of 20 nm or less as an exposed area or an unexposed area, and, the heating temperature T | 01-15-2015 |
| 20150056542 | ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS - Organometallic solutions have been found to provide high resolution radiation based patterning using thin coatings. The patterning can involve irradiation of the coated surface with a selected pattern and developing the pattern with a developing agent to form the developed image. The patternable coatings may be susceptible to positive-tone patterning or negative-tone patterning based on the use of an organic developing agent or an aqueous acid or base developing agent. The radiation sensitive coatings can comprise a metal oxo/hydroxo network with organic ligands. A precursor solution can comprise an organic liquid and metal polynuclear oxo-hydroxo cations with organic ligands having metal carbon bonds and/or metal carboxylate bonds. | 02-26-2015 |
| 20150056543 | Sublimation Transfer Dyeing Method And Dyed Product Thereby - [Problem] To provide a sublimation transfer dyeing method capable of highly efficient dyeing of a product to be dyed by an electrophotographic process using a toner, and a dyed product dyed highly efficiently by the dyeing method. | 02-26-2015 |
| 20150056544 | METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE - Provided is a method for manufacturing a liquid crystal display device that includes a photoalignment film. The photoalignment film is formed from a liquid crystal alignment agent, and aligns liquid crystal molecules horizontally to the main face of the at least one of the substrates. The liquid crystal alignment agent contains a solvent and at least two kinds of polyamic acids or their derivatives obtained by reacting diamine and tetracarboxylic dianhydride. At least two of the diamines and at least one of the tetracarboxylic dianhydrides are compounds represented by predetermined formulas. The method includes the steps of: (1) forming the film of the liquid crystal alignment agent; (2) pre-baking the film; (3) irradiating the pre-baked film with light; and (4) post-baking the irradiated film, the step (4) including an operation of post-baking the film multiple times at temperatures ranging from low to high temperatures. | 02-26-2015 |
| 20150338740 | METHOD FOR PROVIDING CONDUCTIVE SILVER FILM ELEMENTS - A black-and-white developing solution and a silver halide solution physical developing solution are used in sequence to provide electrically-conductive film elements from conductive film element precursors that contain photosensitive silver halide emulsions on one or both supporting sides of a transparent substrate. The two developing solutions have unique combinations of developing agents and other essential components to provide complete development of imagewise exposed silver halide and highly conductive silver metal in desired patterns on a transparent substrate. | 11-26-2015 |
| 20150376248 | PHOTOACTIVE SILK PROTEIN AND FABRICATION OF SILK PROTEIN STRUCTURES USING PHOTOLITHOGRAPHY - A natural protein, specifically silk fibroin or sericin, is chemically modified such that it can be rendered photoactive, but which otherwise has similar structure and attributes as silk fibroin or sericin. This chemically modified silk conjugate can be patterned using radiant energy to produce patterned silk materials which may be used for a wide variety of applications such as making micro and nanoparticles of different shapes and functionalities for drug delivery, creating new forms of intricate 3D scaffolds for tissue engineering, and forming substrates for flexible bio-electronics. | 12-31-2015 |
| 20160170319 | METALLIC TONER PARTICLES FOR PROVIDING METALLIC EFFECT | 06-16-2016 |
