| Entries |
| Document | Title | Date |
|---|
| 20080220340 | APPARATUS AND METHOD FOR HEATING A LAYER CARRIED ON A ROTATING SUBSTRATE - Embodiments of an apparatus and methods for heating a substrate and a sacrificial layer are generally described herein. Other embodiments may be described and claimed. | 09-11-2008 |
| 20080311484 | Radiation image conversion panel, scintillator panel, and radiation image sensor - The radiation image conversion panel in accordance with the present invention has an aluminum substrate, an alumite layer formed on a surface of the aluminum substrate, an intermediate film covering the alumite layer and having a radiation transparency and a light transparency, and a converting part provided on the intermediate film and adapted to convert a radiation image. | 12-18-2008 |
| 20110217629 | ILLUMINATION DEVICE, DISPLAY DEVICE, AND METHOD OF MANUFACTURING LIGHT MODULATOR - An illumination device is provided and has a light guide plate, a light source and a light modulator, wherein the light modulator has a pair of transparent substrates a pair of electrodes and a light modulator layer. The light modulator layer includes a first region being changed between a transparent state and a scatterable state depending on intensity of an electric field, and a second region being more transparent than the first region in a scatterable state at an electric field having a certain intensity, the electric field being applied when the first region is changed between the transparent state and the scatterable state, and an occupancy rate of the first region in the light modulator layer is increased with increase in distance from the light source. | 09-08-2011 |
| 20120196208 | MULTILAYER MIRROR FOR EUV LITHOGRAPHY AND PROCESS FOR ITS PRODUCTION - Provided are a multilayer mirror for EUVL in which deterioration in reflectivity due to oxidation of a Ru protective layer is prevented, and a process for its production. A multilayer mirror for EUV lithography comprising a substrate, and a reflective layer for reflecting EUV light and a protective layer for protecting the reflective layer, formed in this order on the substrate, wherein the reflective layer is a Mo/Si multilayer reflective film, the protective layer is a Ru layer or a Ru compound layer, and an intermediate layer containing from 0.5 to 25 at % of nitrogen and from 75 to 99.5 at % of Si is formed between the reflective layer and the protective layer. | 08-02-2012 |
