Patent application number | Description | Published |
20100055830 | I-SHAPED PHASE CHANGE MEMORY CELL - A memory device includes two electrodes, vertically separated and having mutually opposed contact surfaces, between which lies a phase change cell. The phase change cell includes an upper phase change member, having a contact surface in electrical contact with the first electrode; a lower phase change member, having a contact surface in electrical contact with the second electrode; and a kernel member disposed between and in electrical contact with the upper and lower phase change members. The phase change cell is formed of material having at least two solid phases, and the lateral extent of the upper and lower phase change members is substantially greater than that of the kernel member. An intermediate insulating layer is disposed between the upper and lower phase change members adjacent to the kernel member. | 03-04-2010 |
20100144128 | Phase Change Memory Cell and Manufacturing Method - A phase change memory cell includes first and second electrodes electrically coupled by a phase change element. At least a section of the phase change element comprises a higher reset transition temperature portion and a lower reset transition temperature portion. The lower reset transition temperature portion comprises a phase change region which can be transitioned, by the passage of electrical current therethrough, from generally crystalline to generally amorphous states at a lower temperature than the higher reset transition temperature portion. The phase change element may comprise an outer, generally tubular, higher reset transition temperature portion surrounding an inner, lower reset transition temperature portion. | 06-10-2010 |
20100291747 | Phase Change Memory Device and Manufacturing Method - A phase change memory device comprises a photolithographically formed phase change memory cell having first and second electrodes and a phase change element positioned between and electrically coupling the opposed contact elements of the electrodes to one another. The phase change element has a width, a length and a thickness. The length, the thickness and the width are less than a minimum photolithographic feature size of the process used to form the phase change memory cell. The size of the photoresist masks used in forming the memory cell may be reduced so that the length and the width of the phase change element are each less than the minimum photolithographic feature size. | 11-18-2010 |
20100301304 | BURIED SILICIDE STRUCTURE AND METHOD FOR MAKING - Methods for manufacturing buried silicide lines are described herein, along with high density stacked memory structures. A method for manufacturing an integrated circuit as described herein includes forming a semiconductor body comprising silicon. A plurality of trenches are formed in the semiconductor body to define semiconductor lines comprising silicon between adjacent trenches, the semiconductor lines having sidewalls. A silicide precursor is deposited within the trenches to contact the sidewalls of the semiconductor lines, and a portion of the silicide precursor is removed to expose upper portions of the sidewalls and leave remaining strips of silicide precursor along the sidewalls. Silicide conductors are then formed by inducing reaction of the strips of silicide with the silicon of the semiconductor lines. | 12-02-2010 |
20110006279 | PHASE CHANGE MEMORY - A phase change memory (PCM) is provided which includes a substrate, a plurality of bottom electrodes, a plurality of top electrodes, a plurality of phase change materials, and a plurality of thermal disturbance-preventing parts. The bottom electrodes are disposed in the substrate, and the top electrodes are disposed on the substrate. The phase change (PC) materials are disposed between the top and bottom electrodes, and each of the PC materials is conducted with one of the top electrodes and one of the bottom electrodes. The thermal disturbance-preventing parts are utilized to reduce the effect of thermal disturbance upon the PCM. | 01-13-2011 |
20110012079 | THERMAL PROTECT PCRAM STRUCTURE AND METHODS FOR MAKING - A memory cell as described herein includes a conductive contact and a memory element comprising programmable resistance memory material overlying the conductive contact. An insulator element extends from the conductive contact into the memory element, the insulator element having proximal and distal ends and an inside surface defining an interior. The proximal end is adjacent the conductive contact. A bottom electrode contacts the conductive contact and extends upwardly within the interior from the proximal end. The memory element is within the interior extending downwardly from the distal end to contact a top surface of the bottom electrode at a first contact surface. A top electrode can be separated from the distal end of the insulator element by the memory element and contact the memory element at a second contact surface having a surface area greater than that of the first contact surface. | 01-20-2011 |
20110044097 | PHASE CHANGE MEMORY AND OPERATION METHOD OF THE SAME - An operation method of phase change memory (PCM) is provided. The operation method includes applying a RESET pulse to a phase change material of the PCM, wherein the RESET pulse has a profile with a first tail such that a plurality of seeds are formed in the phase change material. Due to the design of the RESET pulse in the operation method, it can speed up the crystal process. | 02-24-2011 |
20120077309 | THERMALLY STABILIZED ELECTRODE STRUCTURE - Memory devices and methods for manufacturing are described herein. A memory device as described herein includes a first electrode layer, a second electrode layer, and a thermal isolation structure including a layer of thermal isolation material between the first and second electrode layers. The first and second electrode layers and the thermal isolation structure define a multi-layer stack having a sidewall. A sidewall conductor layer including a sidewall conductor material is on the sidewall of the multi-layer stack. The sidewall conductor material has an electrical conductivity greater than that of the thermal isolation material. A memory element including memory material is on and in contact with the second electrode layer. | 03-29-2012 |
20120182802 | Memory Architecture of 3D Array With Improved Uniformity of Bit Line Capacitances - A 3D integrated circuit memory array has a plurality of plane positions. Multiple bit line structures have a multiple sequences of multiple plane positions. Each sequence characterizes an order in which a bit line structure couples the plane positions to bit lines. Each bit line is coupled to at least two different plane positions to access memory cells at two or more different plane positions. | 07-19-2012 |
20120182806 | Memory Architecture of 3D Array With Alternating Memory String Orientation and String Select Structures - A 3D memory device includes a plurality of ridge-shaped stacks, in the form of multiple strips of conductive material separated by insulating material, arranged as bit lines which can be coupled through decoding circuits to sense amplifiers. Diodes are connected to the bit lines at either the string select of common source select ends of the strings. The strips of conductive material have side surfaces on the sides of the ridge-shaped stacks. A plurality of word lines, which can be coupled to row decoders, extends orthogonally over the plurality of ridge-shaped stacks. Memory elements lie in a multi-layer array of interface regions at cross-points between side surfaces of the semiconductor strips on the stacks and the word lines. | 07-19-2012 |
20130075802 | CONTACT ARCHITECTURE FOR 3D MEMORY ARRAY - A vertical interconnect architecture for a three-dimensional (3D) memory device suitable for low cost, high yield manufacturing is described. Conductive lines (e.g. word lines) for the 3D memory array, and contact pads for vertical connectors used for couple the array to decoding circuitry and the like, are formed as parts of the same patterned level of material. The same material layer can be used to form the contact pads and the conductive access lines by an etch process using a single mask. By forming the contact pads concurrently with the conductive lines, the patterned material of the contact pads can protect underlying circuit elements which could otherwise be damaged during patterning of the conductive lines. | 03-28-2013 |
20130119455 | NAND FLASH WITH NON-TRAPPING SWITCH TRANSISTORS - A manufacturing method for a memory array includes first forming a multilayer stack of dielectric material on a plurality of semiconductor strips, and then exposing the multilayer stack in switch transistor regions. The multilayer stacks exposed in the switch transistor regions are processed to form gate dielectric structures that are different than the dielectric charge trapping structures. Word lines and select lines are then formed. A 3D array of dielectric charge trapping memory cells includes stacks of NAND strings of memory cells. A plurality of switch transistors are coupled to the NAND strings, the switch transistors including gate dielectric structures wherein the gate dielectric structures are different than the dielectric charge trapping structures. | 05-16-2013 |
20130153846 | THREE DIMENSIONAL MEMORY ARRAY ADJACENT TO TRENCH SIDEWALLS - A self-aligning stacked memory cell array structure and method for fabricating such structure. The memory cell array includes a stack of memory cells disposed adjacent to opposing sides of a conductive line that is formed within a trench. The memory cells are stacked such that the memory element surface of each memory cell forms a portion of the sidewall of the conductive line. The conductive line is formed within the trench such that electrical contact is made across the entire memory element surface of each memory cell. Such structure and method for making such structure is a self-aligning process that does not require the use of any additional masks. | 06-20-2013 |
20140054784 | Integrated Circuit Connector Access Region and Method for Making - A connector access region of an integrated circuit device includes a set of parallel conductors, extending in a first direction, and interlayer connectors. The conductors comprise a set of electrically conductive contact areas on different conductors which define a contact plane with the conductors extending below the contact plane. A set of the contact areas define a line at an oblique angle, such as less than 45° or 5° to 27°, to the first direction. The interlayer connectors are in electrical contact with the contact areas and extend above the contact plane. At least some of the interlayer connectors overlie but are electrically isolated from the electrical conductors adjacent to the contact areas with which the interlayer connectors are in electrical contact. The set of parallel conductors may include a set of electrically conductive layers with the contact plane being generally perpendicular to the electrically conductive layers. | 02-27-2014 |
20140177311 | MEMORY DEVICE STRUCTURE WITH DECODERS IN A DEVICE LEVEL SEPARATE FROM THE ARRAY LEVEL - A memory device structure and method of fabricating the memory device structure is described. The memory device structure has a memory array disposed in a array level and peripheral circuitry, including decoders and other peripheral circuitry, disposed in a device level. The array of memory cells has a perimeter that defines a cylinder that extends above and beneath the array of memory cells. The decoders and the other peripheral circuitry or at least part of the decoders and the other peripheral circuitry are disposed within the cylinder in the device level. The memory device structure also includes a plurality of pads in a pad level. A first plurality of inter-level conductive lines electrically couples the decoders to the bit lines and word lines in the array of memory cells. | 06-26-2014 |
20140193973 | METHOD FOR FORMING INTERLAYER CONNECTORS TO A STACK OF CONDUCTIVE LAYERS - A method forms interlayer connectors extending to conductive layers of a stack of W conductive layers interleaved with dielectric layers. The stack is etched to expose landing areas at W−1 conductive layers using a set of M etch masks. For each etch mask m, m going from 0 to M−1, there is a first etching step, at least one mask trimming step, and a subsequent etching step following each trimming step. The etch mask may cover N | 07-10-2014 |
20150055414 | MEMORY DEVICE STRUCTURE WITH PAGE BUFFERS IN A PAGE-BUFFER LEVEL SEPARATE FROM THE ARRAY LEVEL - A structure of a memory device and a method for making the memory device structure are described. The memory device includes an array of memory cells in an array level die. The array comprises a plurality of sub-arrays. Each of the sub-arrays comprises respective data lines. The memory device also includes page buffers for corresponding sub-arrays in a page-buffer level die. The memory device also includes inter-die connections that are configured to electrically couple the page buffers in the page-buffer level die to data lines of corresponding sub-arrays in the array level die. | 02-26-2015 |
20150085579 | CONTACT STRUCTURE AND FORMING METHOD - Vias are formed within a stack of alternating active and insulating layers by forming a first sub stack, a second sub stack over the first sub stack, a first buffer layer therebetween and a second buffer layer under the first sub stack. An upper layer of the first sub stack is exposed through a set of vias by first and second etching processes. The first etching process forms a first set of etch vias through the second sub stack and stops at or in the first buffer layer. The second etching process etches through the first buffer layer to the upper layer of the first sub stack. A third etching process etches through the first set of etch vias, through the first sub stack and stops at or in the second buffer layer. A fourth etching process and etches through the second buffer layer. | 03-26-2015 |
20150115455 | STACKED 3D MEMORY - A memory can include a plurality of memory blocks, including a first block and a second block disposed over the first block. An isolation layer is disposed in this structure, between the first and second blocks to isolate the vertical conductors in the memory kernels of the first and second blocks. Access conductors are provided outside the kernels, such as adjacent the memory blocks or through regions of the blocks that only include decoding element. The access conductors are coupled to the decoding elements in the first and second blocks, and provide for connection of the memory cells to peripheral circuits. | 04-30-2015 |
20150206898 | PARALLELOGRAM CELL DESIGN FOR HIGH SPEED VERTICAL CHANNEL 3D NAND MEMORY - Roughly described, a memory device has a multilevel stack of conductive layers. Pillars oriented orthogonally to the substrate each include series-connected memory cells at cross-points between the pillars and the conductive layers. String select lines (SSLs) are disposed above the conductive layers, and bit lines are disposed above the SSLs. The pillars are arranged on a regular grid having a unit cell which is a non-rectangular parallelogram. The pillars may be arranged so as to define a number of parallel pillar lines, each having an acute angle θ>° relative to the bit line conductors, each line of pillars having n>1 pillars intersecting a common one of the SSL. The arrangement permits higher bit line density, a higher data rate due to increased parallelism, and a smaller number of SSLs, thereby reducing disturbance, reducing power consumption and reducing unit cell capacitance. | 07-23-2015 |
20150206899 | TWISTED ARRAY DESIGN FOR HIGH SPEED VERTICAL CHANNEL 3D NAND MEMORY - Roughly described, a memory device has a multilevel stack of conductive layers. Vertically oriented pillars each include series-connected memory cells at cross-points between the pillars and the conductive layers. SSLs run above the conductive layers, each intersection of a pillar and an SSL defining a respective select gate of the pillar. Bit lines run above the SSLs. The pillars are arranged on a regular grid which is rotated relative to the bit lines. The grid may have a square, rectangle or diamond-shaped unit cell, and may be rotated relative to the bit lines by an angle θ where tan(θ)=±X/Y, where X and Y are co-prime integers. The SSLs may be made wide enough so as to intersect two pillars on one side of the unit cell, or all pillars of the cell, or sufficiently wide as to intersect pillars in two or more non-adjacent cells. | 07-23-2015 |
20150255468 | CONTACT STRUCTURE AND FORMING METHOD - Vias are formed within a stack of alternating active and insulating layers by forming a first sub stack, a second sub stack over the first sub stack, a first buffer layer therebetween and a second buffer layer under the first sub stack. An upper layer of the first sub stack is exposed through a set of vias by first and second etching processes. The first etching process forms a first set of etch vias through the second sub stack and stops at or in the first buffer layer. The second etching process etches through the first buffer layer to the upper layer of the first sub stack. A third etching process etches through the first set of etch vias, through the first sub stack and stops at or in the second buffer layer. A fourth etching process and etches through the second buffer layer. | 09-10-2015 |
20150325587 | 3D STACKED IC DEVICE WITH STEPPED SUBSTACK INTERLAYER CONNECTORS - A stepped substack interlayer connector structure on a multilayer integrated circuit includes N steps on the substrate from a surface of the substrate at a first level to a surface of the substrate at a second level. A stack of active layers alternating with insulating layers on the substrate, including a plurality of substacks disposed in relation to the N step(s) to form respective contact regions in which the substacks are disposed at a common level. Interlayer connectors are formed by conductors in the respective regions connected to landing areas on active layers in each of the plurality of substacks. The maximum depth of the interlayer connectors is equal to, or less than, the thickness of one of the substacks. | 11-12-2015 |
Patent application number | Description | Published |
20100149703 | ESD CLAMP CIRCUIT APPLIED TO POWER AMPLIFIER - An ESD clamp circuit applied to a power amplifier is provided. The ESD clamp circuit includes a first line, a second line, a first circuit, a second circuit, an ESD detecting unit, a buffer unit, and an ESD clamp unit. The first line is coupled to the output terminal of the power amplifier. The first circuit is coupled to the first line. The second circuit is coupled to the first circuit. The ESD detecting unit is coupled to the first circuit and the second line. The buffer unit is coupled to the second circuit, the second line and the ESD detecting unit. The ESD clamp unit is coupled to the buffer unit, the first line and the second line. Therefore, at normal operation mode, the problem of signal loss caused by the leakage current of ESD clamp circuit can be avoided. | 06-17-2010 |
20100296212 | ELECTROSTATIC DISCHARGE CLAMP CIRCUIT - An electrostatic discharge (ESD) clamp circuit is provided. The ESD clamp circuit includes a first resistor, a second resistor, a first transistor, a second transistor, and a third transistor. A clamp device of the ESD clamp circuit is implemented by the third transistor. A parasitic capacitor of the third transistor forms a detection scheme along with the second resistor to detect the ESD. The first resistor, the second resistor, the first transistor, and the second transistor form a feedback scheme to control the third transistor for discharging the ESD current. | 11-25-2010 |
20110013326 | INITIAL-ON SCR DEVICE FOR ON-CHIP ESD PROTECTION - A semiconductor device for electrostatic discharge (ESD) protection comprises a silicon controlled rectifier (SCR) including a semiconductor substrate, a first well formed in the substrate, a second well formed in the substrate, a first p-type region formed in the first well to serve as an anode, and a first n-type region partially formed in the second well to serve as a cathode, a p-type metal-oxide-semiconductor (PMOS) transistor formed in the first well including a gate, a first diffused region and a second diffused region separated apart from the first diffused region, a second n-type region formed in the first well electrically connected to the first diffused region of the PMOS transistor, and a second p-type region formed in the substrate electrically connected to the second diffused region of the PMOS transistor. | 01-20-2011 |
20110304010 | ELECTROSTATIC DISCHARGE PROTECTION SCHEME FOR SEMICONDUCTOR DEVICE STACKING PROCESS - An electrostatic discharge (ESD) protection scheme for a semiconductor device stacking process is provided, in which an equivalent electrical resistance of a specific path is designed to be less than an equivalent electrical resistance of other paths. Accordingly, when a first active layer and a second active layer in the semiconductor device are stacked, by designing suitable ESD protection cells on such a specific path, electrical charges accumulated on the top layer wafer (or die) select such a specific path over the other paths to be released to the grounded bottom layer wafer (or die), so as to achieve an ESD protection effect. In addition, since such a specific path also serves as a heat dissipation path in a three dimensional integrated circuit (3D IC), an overall heat resistance of the 3D IC may be reduced to improve a heat dissipation effect. | 12-15-2011 |
20120080716 | INITIAL-ON SCR DEVICE FOR ON-CHIP ESD PROTECTION - A semiconductor device for electrostatic discharge (ESD) protection comprises a silicon controlled rectifier (SCR) including a semiconductor substrate, a first well formed in the substrate, a second well formed in the substrate, a first p-type region formed in the first well to serve as an anode, and a first n-type region partially formed in the second well to serve as a cathode, a p-type metal-oxide-semiconductor (PMOS) transistor formed in the first well including a gate, a first diffused region and a second diffused region separated apart from the first diffused region, a second n-type region formed in the first well electrically connected to the first diffused region of the PMOS transistor, and a second p-type region formed in the substrate electrically connected to the second diffused region of the PMOS transistor. | 04-05-2012 |
Patent application number | Description | Published |
20090020746 | SELF-ALIGNED STRUCTURE AND METHOD FOR CONFINING A MELTING POINT IN A RESISTOR RANDOM ACCESS MEMORY - A process in the manufacturing of a resistor random access memory with a confined melting area for switching a phase change in the programmable resistive memory. The process initially formed a pillar comprising a substrate body, a first conductive material overlying the substrate body, a programmable resistive memory material overlying the first conductive material, a high selective material overlying the programmable resistive memory material, and a silicon nitride material overlying the high selective material. The high selective material in the pillar is isotropically etched on both sides of the high selective material to create a void on each side of the high selective material with a reduced length. A programmable resistive memory material is deposited in a confined area previously occupied by the reduced length of the poly, and the programmable resistive memory material is deposited into an area previously occupied by the silicon nitride material. | 01-22-2009 |
20100117048 | MEMORY CELL ACCESS DEVICE HAVING A PN-JUNCTION WITH POLYCRYSTALLINE AND SINGLE-CRYSTAL SEMICONDUCTOR REGIONS - A memory device includes a driver comprising a pn-junction in the form of a multilayer stack including a first doped semiconductor region having a first conductivity type, and a second doped semiconductor region having a second conductivity type opposite the first conductivity type, the first and second doped semiconductors defining a pn-junction therebetween, in which the first doped semiconductor region is formed in a single-crystalline semiconductor, and the second doped semiconductor region includes a polycrystalline semiconductor. Also, a method for making a memory device includes forming a first doped semiconductor region of a first conductivity type in a single-crystal semiconductor, such as on a semiconductor wafer; and forming a second doped polycrystalline semiconductor region of a second conductivity type opposite the first conductivity type, defining a pn-junction between the first and second regions. | 05-13-2010 |
20100117049 | MEMORY CELL ACCESS DEVICE HAVING A PN-JUNCTION WITH POLYCRYSTALLINE PLUG AND SINGLE-CRYSTAL SEMICONDUCTOR REGIONS - A memory device includes a driver comprising a pn-junction in the form of a multilayer stack including a first doped semiconductor region having a first conductivity type, and a second doped semiconductor plug having a second conductivity type opposite the first conductivity type, the first and second doped semiconductors defining a pn junction therebetween, in which the first doped semiconductor region is formed in a single-crystalline semiconductor, and the second doped semiconductor region includes a polycrystalline semiconductor. Also, a method for making a memory device includes forming a first doped semiconductor region of a first conductivity type in a single-crystal semiconductor, such as on a semiconductor wafer; and forming a second doped polycrystalline semiconductor region of a second conductivity type opposite the first conductivity type, defining a pn junction between the first and second regions. | 05-13-2010 |
20100264396 | RING-SHAPED ELECTRODE AND MANUFACTURING METHOD FOR SAME - An electrode structure and a method for manufacturing an integrated circuit electrode includes forming a bottom electrode comprising a pipe-shaped member, filled with a conductive material such as n-doped silicon, and having a ring-shaped top surface. A disc-shaped insulating member is formed on the top of the pipe-shaped member by oxidizing the conductive fill. A layer of programmable resistance material, such as a phase change material, is deposited in contact with the top surface of the pipe-shaped member. A top electrode in contact with the layer of programmable resistance material. | 10-21-2010 |
20100276654 | Low Operational Current Phase Change Memory Structures - Memory cells described herein have an increased current density at lateral edges of the active region compared to that of conventional mushroom-type memory cells, resulting in improved operational current efficiency. | 11-04-2010 |
20120080657 | LOW OPERATIONAL CURRENT PHASE CHANGE MEMORY STRUCTURES - Memory cells described herein have an increased current density at lateral edges of the active region compared to that of conventional mushroom-type memory cells, resulting in improved operational current efficiency. As a result, the amount of heat generated within the lateral edges per unit value of current is increased relative to that of conventional mushroom-type memory cells. Therefore, the amount of current needed to induce phase change is reduced. | 04-05-2012 |
20120202333 | METHOD FOR FORMING A SELF-ALIGNED BIT LINE FOR PCRAM AND SELF-ALIGNED ETCH BACK PROCESS - A method of forming bit line aligned to a phase change material that includes forming a pedestal of a sacrificial material on a portion of a lower electrode and fowling at least one dielectric material adjacent to the sacrificial material, wherein the at least one dielectric material has an upper surface substantially coplanar with an upper surface of the pedestal of the sacrificial material. The pedestal of the sacrificial material is removed selective to the at least one dielectric material and the lower electrode to provide an opening to an exposed surface of the lower electrode. A phase change material is formed on the exposed surface of the lower electrode, and the opening is filled with a conductive fill material. A self-aligned etch back process is also provided. | 08-09-2012 |
20120267689 | Memory with Off-Chip Controller - An integrated circuit memory device, including a memory circuit and a peripheral circuit, is described which is suitable for low cost manufacturing. The memory circuit and peripheral circuit for the device are implemented in different layers of a stacked structure. The memory circuit layer and the peripheral circuit layer include complementary interconnect surfaces, which upon mating together establish the electrical interconnection between the memory circuit and the peripheral circuit. The memory circuit layer and the peripheral circuit layer can be formed separately using different processes on different substrates in different fabrication lines. This enables the use of independent fabrication process technologies, one arranged for the memory array, and another arranged for the supporting peripheral circuit. The separate circuitry can then be stacked and bonded together. | 10-25-2012 |
20120276688 | METHOD FOR FORMING A SELF-ALIGNED BIT LINE FOR PCRAM AND SELF-ALIGNED ETCH BACK PROCESS - A method of forming bit line aligned to a phase change material that includes forming a pedestal of a sacrificial material on a portion of a lower electrode and forming at least one dielectric material adjacent to the sacrificial material, wherein the at least one dielectric material has an upper surface substantially coplanar with an upper surface of the pedestal of the sacrificial material. The pedestal of the sacrificial material is removed selective to the at least one dielectric material and the lower electrode to provide an opening to an exposed surface of the lower electrode. A phase change material is formed on the exposed surface of the lower electrode, and the opening is filled with a conductive fill material. A self-aligned etch back process is also provided. | 11-01-2012 |
20130175598 | Damascene Word Line - The technology relates to a damascene word line for a three dimensional array of nonvolatile memory cells. Conductive lines such as silicon are formed over stacked nonvolatile memory structures. Word line trenches separate neighboring ones of the silicon lines. The silicon lines separated by the word line trenches are oxidized, making insulating surfaces in the word line trenches. Word lines are made in the word line trenches. | 07-11-2013 |
20130334575 | Damascene Word Line - The technology relates to a damascene word line for a three dimensional array of nonvolatile memory cells. Partly oxidized lines of material such as silicon are made over a plurality of stacked nonvolatile memory structures. Word line trenches are made in the partly oxidized lines, by removing the unoxidized lines from the intermediate parts of the partly oxidized lines, leaving the plurality of oxidized lines at the outer parts of the plurality of partly oxidized lines. Word lines are made in the word line trenches over the plurality of stacked nonvolatile memory structures. | 12-19-2013 |
20140021628 | METHOD FOR FORMING INTERLAYER CONNECTORS IN A THREE-DIMENSIONAL STACKED IC DEVICE - A method is used with an IC device including a stack of dielectric/conductive layers to form interlayer connectors extending from a surface of the device to the conductive layers. Contact openings are created through a dielectric layer to a first conductive layer. N etch masks, with 2 | 01-23-2014 |
20140175532 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A method for manufacturing semiconductor device is disclosed. A substrate with a conductive layer is provided, and a dummy layer is formed on the conductive layer. The dummy layer and at least a portion of the conductive layer are patterned to form several trenches. A first dielectric layer is formed to fill into the trenches so as to form several first dielectric elements in the trenches. The dummy layer is removed to expose parts of the first dielectric elements. A second dielectric layer is formed on the exposed parts of the first dielectric elements, and the second dielectric layer is patterned so that a spacer is formed at a lateral side of each exposed first dielectric element. The conductive layer is patterned by the spacers, so that a patterned conductive portion is formed at each lateral side of each first dielectric element. | 06-26-2014 |
20140183619 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THIN HARD MASK AND STRUCTURE MANUFACTURED BY THE SAME - A method for manufacturing semiconductor device is disclosed. A substrate with a plurality of protruding strips formed vertically thereon is provided. A charging trapping layer is formed conformally on the protruding strips. A conductive layer is formed conformally on the charging trapping layer. A thin hard mask is conformally deposited on the conductive layer, wherein a plurality of trenches are formed between the thin hard mask on the protruding strips. A patterned photo resist is formed on the thin hard mask, wherein the patterned photo resist fills into the trenches. The thin hard mask is patterned according to the patterned photo resist to form a patterned hard mask layer and expose a portion of the conductive layer. The conductive layer is patterned for removing the exposed portion of the conductive layer to form a patterned conductive layer and expose a portion of the charging trapping layer. | 07-03-2014 |
20140191388 | 3D STACKING SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A 3D stacking semiconductor device and a manufacturing method thereof are provided. The manufacturing method includes the following steps. N layers of stacking structures are provided. Each stacking structure includes a conductive layer and an insulating layer. A first photoresister layer is provided. The stacking structures are etched P−1 times by using the first photoresister layer as a mask. A second photoresister layer is provided. The stacking structures are etched Q−1 times by using the second photoresister layer as a mask. The first photoresister layer is trimmed along a first direction. The second photoresister layer is trimmed along a second direction. The first direction is different from the second direction. A plurality of contact points are arranged along the first and the second directions in a matrix. The included angle between the first direction and the second direction is an acute angle. | 07-10-2014 |
20150048506 | MEMORY DEVICE AND MANUFACTURING METHOD OF THE SAME - A memory device and a manufacturing method of the same are provided. The memory device includes a substrate, a 3D memory array, a periphery circuit, and a conductive connection structure. The 3D memory array and the periphery circuit are stacked on the substrate. The periphery circuit includes a patterned metal layer and a contact structure electrically connected to the patterned metal layer. The conductive connection structure is electrically connected to the patterned metal layer. The 3D memory array is electrically connected to the periphery circuit via the conductive connection structure. | 02-19-2015 |
20150060958 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME - A semiconductor device and a manufacturing method of the same are provided. The semiconductor device includes a substrate and a stacked structure vertically formed on the substrate. The stacked structure includes a plurality of conductive layers and a plurality of insulating layers, and the conductive layers and the insulating layers are interlaced. At least one of the conductive layers has a first doping segment having a first doping property and a second doping segment having a second doping property, the second doping property being different from the first doping property. The interface between the first doping segment and the second doping segment has a grain boundary. | 03-05-2015 |
20150091064 | 3D SEMICONDUCTOR DEVICE AND 3D LOGIC ARRAY STRUCTURE THEREOF - A 3D semiconductor device and a 3D logic array structure thereof are provided. The 3D semiconductor device includes an array structure, a periphery line structure and a 3D logic array structure. The array structure has Y contacts located at a side of the array structure. Y is within M | 04-02-2015 |
20150130066 | INTEGRATED CIRCUIT DEVICE WITH A CONNECTOR ACCESS REGION AND METHOD FOR MAKING THEREOF - An integrated circuit device and a method for making it are provided. The integrated circuit device comprises plural conductive layers, plural dielectric layers and plural first stopping layers. The conductive layers are extending in a first direction. The dielectric layers are paralleled to the conductive layers, and the conductive layers and the dielectric layers are disposed in an alternative arrangement. The first stopping layers are disposed over the conductive layers and the dielectric layers. The first stopping layers make no contact with the conductive layers. | 05-14-2015 |
20150145012 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD OF THE SAME - A semiconductor structure is provided. The semiconductor structure includes a first stacked structure. The first stacked structure includes a first stacked portion disposed along a first direction, at least one second stacked portion connected with the first stacked portion and disposed along a second direction perpendicular to the first direction, and at least one third stacked portion connected with the first direction and arranged alternately with the second stacked portion along the first direction. The width of the third stacked portion is smaller than the width of the second stacked portion along the second direction. | 05-28-2015 |
20150155388 | SEMICONDUCTOR STRUCTURE - A semiconductor device comprises a plurality of stacking blocks and a plurality of conductive lines. Each stacking blocks comprises two opposite finger VG structures. Each finger VG structure includes a staircase structure and a plurality of bit line stacks. The staircase structure is perpendicular to the bit line stacks, and the bit line stacks of the two opposite finger VG structures are arranged alternately. The conductive lines is disposed over the stacking blocks at interval The direction of the conductive lines is parallel to a direction of the bit line stacks. The conductive lines include a plurality of bit lines and a plurality of ground lines, and each stacking block includes at least one ground line. | 06-04-2015 |
20150162169 | ETCHING APPARATUS AND METHOD - An apparatus is disclosed for etching a wafer or substrate. The apparatus includes a process reaction chamber, a gas distribution plate, and an electrostatic chuck. The gas distribution plate is disposed in the process reaction chamber, and is used for entrance of a main processing gas. The electrostatic chuck is disposed in the process reaction chamber and has an adsorption surface. The wafer or substrate is disposed on the adsorption surface. The electrostatic chuck further has a plurality of first gas inlets for entrance of a plurality of auxiliary processing gases. Each of the first gas inlets is communicated with the adsorption surface and aligned with at least a part of a circumference of the wafer or substrate. The gas distribution plate and the electrostatic chuck are located at two opposite sides of the process reaction chamber, respectively. | 06-11-2015 |
20150206896 | THREE-DIMENSIONAL SEMICONDUCTOR DEVICE - A 3D semiconductor device is provided, comprising plural memory layers vertically stacked on a substrate and parallel to each other; plural selection lines disposed on the memory layers and parallel to each other; plural bit lines disposed on the selection lines, and the bit lines arranged in parallel to each other and in perpendicular to the selection lines; plural strings formed vertically to the memory layers and the selection lines, and the strings electrically connected to the corresponding selection lines; a plurality of cells respectively defined by the strings, the selection lines and the bit lines correspondingly, and the cells arranged in a plurality of rows and columns, wherein a column direction is parallel to the bit lines while a row direction is parallel to the selection lines. The adjacent cells in the same column are electrically connected to the different bit lines. | 07-23-2015 |
20160005713 | THREE DIMENSIONAL STACKED MULTI-CHIP STRUCTURE AND MANUFACTURING METHOD OF THE SAME - A three dimensional stacked multi-chip structure including M chips, a first conductive pillar, and N second conductive pillars is provided. Each chip has a common connection area and a chip-enable area, and includes a substrate and a patterned circuit layer disposed on the substrate. The patterned circuit layer includes an active element, at least one common conductive structure in the common connection area, and N chip-enable conductive structures in the chip-enable area. The first conductive pillar connects the common conductive structure of the M chips. Each second conductive pillar connects one of the N chip-enable conductive structures of the M chips. The chip-conductive areas of the M chips have different conducting states. N is large than 1, M is large than 2, and M is smaller than or equal to 2 | 01-07-2016 |
Patent application number | Description | Published |
20130072013 | Etching Method and Apparatus - An etching method comprises etching an oxide layer with a first dc bias of a plasma chamber, removing a photoresist layer with a second dc bias of the plasma chamber and etching through a liner film with a third dc bias of the plasma chamber. In order to reduce the copper deposition on the wall of the plasma chamber, the third dc bias is set to be less than the first and second dc bias. | 03-21-2013 |
20130245978 | SYSTEMS AND METHODS OF CONTROLLING SEMICONDUCTOR WAFER FABRICATION PROCESSES - A system and method of controlling a semiconductor wafer fabrication process. The method includes positioning a semiconductor wafer on a wafer support assembly in a wafer processing module. A signal is transmitted from a signal emitter positioned at a predetermined transmission angle relative to an axis normal to the wafer support assembly to check leveling of the wafer in the module, so that the signal is reflected from the wafer. The embodiment includes monitoring for the reflected signal at a predetermined reflectance angle relative to the axis normal to the wafer support assembly at a signal receiver. A warning indication is generated if the reflected signal is not received at the signal receiver. | 09-19-2013 |
20130322990 | LOADPORT BRIDGE FOR SEMICONDUCTOR FABRICATION TOOLS - A wafer handling system with apparatus for transporting wafers between semiconductor fabrication tools. In one embodiment, the apparatus is a loadport bridge mechanism including an enclosure having first and second mounting ends, a docking port at each end configured and dimensioned to interface with a loadport of a semiconductor tool, and at least one wafer transport robot operable to transport a wafer between the docking ports. The wafer transport robot hands off or receives a wafer to/from a tool robot at the loadports of a first and second tool. The bridge mechanism allows one or more wafers to be transferred between loadports of different tools on an individual basis without reliance on the FAB's automated material handling system (AMHS) for bulk wafer transport inside a wafer carrier such as a FOUP or others. | 12-05-2013 |
20140271053 | PRESSURE-CONTROLLED WAFER CARRIER AND WAFER TRANSPORT SYSTEM - Disclosed are a wafer carrier that keeps wafers under a constant pressure, at any preset value below or above the atmospheric pressure, to prevent wafer contaminations arising from atmospheric exposure in conventional wafer carriers, and also, a wafer transport system and method utilizing the same wafer carrier. The wafer carrier charged with a preset carrier pressure is transported and docked with an airlock of a wafer processing tool comprising the airlock, a vacuum transfer module, and a process chamber. The airlock adjusts, by a gas pump, inner pressure to equate successively with, first, the carrier pressure before opening the carrier door, and next, the vacuum transfer module pressure before opening the latter's door. The wafers are then transferred into the process chamber. After processing, the wafers are transferred back into the wafer carrier and charged with the preset carrier pressure before undocked and transported to the next wafer processing tool. | 09-18-2014 |
20150129044 | MECHANISMS FOR PROCESSING WAFER - Embodiments of mechanisms for processing a wafer are provided. A method for processing a wafer includes creating an exhaust flow in a fluid conduit assembly that is connected to a process module used for processing the wafer. The method also includes detecting the exhaust pressure in the fluid conduit assembly. The method further includes determining whether the exhaust pressure meets a set point. In addition, the method includes regulating the exhaust flow if the exhaust pressure fails to meet the set point. | 05-14-2015 |
20150134112 | MECHANISMS FOR POSITIONING ROBOT BLADE - Embodiments of mechanisms for measuring the distance between a robot blade and at least one measurement target are provided. A method for measuring the distance includes emitting a signal to the measurement target by a signal source assembly. The method also includes receiving the signal reflected from the measurement target by a signal reception assembly. The method further includes determining the distance between the robot blade and the measurement target. The distance is determined based on the time difference between the emission of the signal from the signal source assembly and the receipt of the signal by the signal reception assembly. | 05-14-2015 |