Class / Patent application number | Description | Number of patent applications / Date published |
438088000 | Direct application of electric current | 10 |
20090246907 | Higher Selectivity, Method for passivating short circuit current paths in semiconductor devices - A method for passivating short circuit defects in a thin film large area photovoltaic device in accordance with an exemplary embodiment is provided. The method employs a passivation agent and a counter electrode disposed in said passivation agent. The method includes controlling an application of current between the substrate of said photovoltaic device and said counter electrode so as to ensure high selectivity of modification of a transparent conductive oxide material of said photovoltaic module adjacent said short circuit defect, while leaving the transparent conductive oxide material of said photovoltaic module of non-defect areas in its unmodified form. | 10-01-2009 |
20100159633 | METHOD OF MANUFACTURING PHOTOVOLTAIC DEVICE - Provided is a method of manufacturing a photovoltaic device using a Joule heating-induced crystallization method. The method includes: forming a first conductive pattern on a substrate; forming a photoelectric conversion layer on the substrate having the first conductive pattern; and crystallizing at least part of the photoelectric conversion layer by applying an electric field to the photoelectric conversion layer, wherein the photoelectric conversion layer includes a first amorphous semiconductor layer containing first impurities, a second intrinsic, amorphous semiconductor layer, and a third amorphous semiconductor layer containing second impurities. | 06-24-2010 |
20110237021 | PHOTOVOLTAIC MODULE MANUFACTURE - A method for manufacturing a photovoltaic module including a laminating step. | 09-29-2011 |
20110287577 | METHOD OF CLEANING AND FORMING A NEGATIVELY CHARGED PASSIVATION LAYER OVER A DOPED REGION - The present invention generally provides a method of forming a high efficiency solar cell device by preparing a surface and/or forming at least a part of a high quality passivation layer on a silicon containing substrate. Embodiments of the present invention may be especially useful for preparing a surface of a p-type doped region formed on a silicon substrate so that a high quality passivation layer can be formed thereon. In one embodiment, the methods include exposing a surface of the solar cell substrate to a plasma to clean and modify the physical, chemical and/or electrical characteristics of the surface. | 11-24-2011 |
20120058594 | METHOD FOR MANUFACTURING AN ARRAY-TYPE NANOTUBE LAYER OF A THIN-FILM SOLAR CELL - A method for manufacturing an array-type nanotube layer for a thin-film solar cell comprises the steps of: preparing an isotropic Si-substrate; sputtering a metal Ti layer onto the isotropic Si-substrate; heat-treating the Ti-coated Si-substrate in a vacuum heat-treatment environment; annealing the Ti-coated Si-substrate in an annealing heat-treatment environment to produce an intermediate-phase metal Ti layer ; anodizing the intermediate-phase metal Ti layer so as to transform the intermediate-phase metal Ti layer into an array-type nanotube layer for the solar cell; and finally applying a reverse voltage to separate the array-type nanotube layer from the isotropic Si-substrate. | 03-08-2012 |
20130071965 | In-Situ Fabrication Method for Silicon Solar Cell - An in-situ fabrication method for a silicon solar cell includes the following steps: pretreating a silicon chip; placing the pretreated silicon chip in an implantation chamber of a plasma immersion ion implantation machine; completing the preparation of black silicon via a plasma immersion ion implantation process; making a PN junction and forming a passivation layer on the black silicon; after making the PN junction and forming the passivation layer, removing the black silicon from the plasma immersion ion implantation machine; preparing a metal back electrode on the back of the black silicon; preparing a metal grid on the passivation layer; obtaining a solar cell after encapsulation. Said method enables black silicon preparation, PN junction preparation, and passivation layer formation in-situ, greatly reducing the amount of equipment needed for the preparation of solar cells and the preparation cost. In addition, the method is simple and easy to control. | 03-21-2013 |
20140024168 | METHOD FOR PRODUCING PHOTOELECTRIC CONVERSION DEVICE - This method for producing a photoelectric conversion device has: a step for forming each of an IN layer and an IP layer on one surface of an n-type monocrystalline silicon substrate; and a step of forming an n-side electrode and a p-side electrode, each including a plurality of conductor layers. Also, the step for forming the electrodes includes: a first step for forming a first conductive layer on the IN layer and the IP layer; a second step for forming a second conductive layer on the portion of the first conductive layer that covers the IN layer, and a second conductive layer on the portion of the first conductive layer that covers the IP layer; and a third step for forming a first conductive layer and a first conductive layer by partially etching the first conductive layer after completing the second step. | 01-23-2014 |
20140057386 | Systems and Methods for Depositing and Charging Solar Cell Layers - Systems and methods of the present invention may be used to charge a layer (such as a passivation layer and/or antireflective layer) of a solar cell (e.g., wafer) with a positive or negative charge. The layer may retain the charge to improve operation of the solar cell. The charged layer may include any suitable dielectric material capable of retaining either a negative or a positive charge. Systems and methods of the present invention permit in-situ charging of a layer. Charging of a layer may be accomplished during or after deposition of the layer including after completing the whole solar cell process, in other words, on a finished cell. | 02-27-2014 |
20140057387 | Systems and Methods for Depositing and Charging Solar Cell Layers - Systems and methods of the present invention may be used to charge a layer (such as a passivation layer and/or antireflective layer) of a solar cell (e.g., wafer) with a positive or negative charge. The layer may retain the charge to improve operation of the solar cell. The charged layer may include any suitable dielectric material capable of retaining either a negative or a positive charge. Systems and methods of the present invention permit in-situ charging of a layer. Charging of a layer may be accomplished during or after deposition of the layer including after completing the whole solar cell process, in other words, on a finished cell. | 02-27-2014 |
20140057388 | Systems and Methods for Depositing and Charging Solar Cell Layers - Systems and methods of the present invention may be used to charge a layer (such as a passivation layer and/or antireflective layer) of a solar cell (e.g., wafer) with a positive or negative charge. The layer may retain the charge to improve operation of the solar cell. The charged layer may include any suitable dielectric material capable of retaining either a negative or a positive charge. Systems and methods of the present invention permit in-situ charging of a layer. Charging of a layer may be accomplished during or after deposition of the layer including after completing the whole solar cell process, in other words, on a finished cell. | 02-27-2014 |