Class / Patent application number | Description | Number of patent applications / Date published |
430287100 | Ethylenic unsaturation within the side chain component | 44 |
20080227033 | Photosensitive Paste Composition, Plasma Display Panel Manufactured Using the Same and Method of Manufacturing the Plasma Display Panel - Photosensitive paste compositions, plasma display panels (PDP) manufactured using the same, and methods of manufacturing the PDPs are provided. In one embodiment, a photosensitive paste composition includes an inorganic component and an organic component, where the organic component includes a cross-linking agent including a monoacrylate, where the monoacrylate is present in an amount ranging from about 50 to about 100 weight % with respect to a total weight of the cross-linking agent. In another embodiment, a PDP is manufactured using the photosensitive paste composition. In yet another embodiment, a method of manufacturing the PDP is provided. The inventive photosensitive paste compositions can fundamentally prevent film twisting, disconnection or detachment by minimizing stress on the patterned film during sintering, thereby minimizing modifications due to shrinkage. | 09-18-2008 |
20080233517 | Negative Resists Based on Acid-Catalyzed Elimination of Polar Molecules - The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents. | 09-25-2008 |
20080241753 | Negative Resist Composition - The negative resist composition of the present invention comprises a silsesguioxane resin (A) comprising a constituent unit (a1) represented by the following general formula (I) and a constituent unit (a2) represented by the following general formula (II), an acid generator component (B) which generates an acid upon exposure, and a crosslinking agent component (C): | 10-02-2008 |
20080241754 | POLYONIUM BORATES AND RADIATION-SENSITIVE COMPOSITION AND IMAGEABLE ELEMENTS CONTAINING SAME - A radiation-sensitive composition includes a free-radically polymerizable component, an initiator composition capable of generating free radicals sufficient to initiate polymerization upon exposure to imaging radiation, an infrared radiation absorbing compound, and a polymeric binder. The initiator composition includes a unique polyonium borate comprising a polyvalent onium cation with multiple onium moieties and sufficient organic borate counterions to provide a net neutral charge. The radiation-sensitive composition can be used to prepare a negative-working imageable element that is sensitive to suitable imaging infrared radiation, can be imaged at relatively low energy, and can be developed either on-press or off-press. | 10-02-2008 |
20080248427 | Composition for Coating over a Photoresist Pattern Comprising a Lactam - The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1) | 10-09-2008 |
20080254387 | NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE - A radiation-sensitive composition includes an initiator composition, a radiation absorbing compound, and a particulate primary polymeric binder that has a backbone comprising multiple urethane moieties and further comprises side chains comprising free radically polymerizable groups attached to the backbone. This primary polymeric binder can be used in place of or in addition to a conventional free radically polymerizable component. This composition can be used to provide negative-working imageable elements that can be imaged and developed to provide lithographic printing plates. | 10-16-2008 |
20080254388 | FLUORINATED POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND PARTITION WALLS - To provide a fluorinated polymer which enables to reduce the amount of residual ink on partition walls and to form an ink layer having high uniformity in film thickness, and a negative photosensitive composition. | 10-16-2008 |
20080274426 | CHEMICALLY AMPLIFIED RESIST COMPOSITION - The present invention provides a chemically amplified resist composition comprising:
| 11-06-2008 |
20080280229 | NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE - A radiation-sensitive composition includes a radically polymerizable component, initiator composition, a radiation absorbing compound, and a polymeric binder having recurring units that are derived from various ethylenically unsaturated polymerizable monomers provided that at least 40 mol % of the recurring units have a tertiary carbon atom in the backbone and the rest of the recurring units have a secondary or quaternary carbon atom in the backbone. This composition can be used to provide negative-working imageable elements that can be imaged and developed to provide lithographic printing plates that have desired imaging speed and excellent run length without the need for a post-exposure backing step. | 11-13-2008 |
20080286692 | Photosensitve Laminate - A photoresist laminate structure comprising at least one photosensitive resist layer and a polymeric layer bound to the photosensitive resist layer is disclosed, wherein the polymeric layer is substantially impermeable to water. | 11-20-2008 |
20080292989 | POSITIVE WORKING PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME - A positive working photosensitive composition comprises: (A) a resin having a heterocyclic group containing plural sulfur atoms in a cyclic structure of the heterocyclic group, the resin decomposing by action of an acid to increase its solubility in an alkaline developer; and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation. | 11-27-2008 |
20080311523 | Material for Formation of Resist Protection Film and Method of Forming Resist Pattern Therewith - In the liquid immersion lithography process, by simultaneously preventing deterioration of a resist film and deterioration of an immersion liquid employed during liquid immersion lithography which uses various immersion liquids, including water, resistance to post exposure delay of the resist film can be improved without increasing the number of processes, thereby making it possible to form a high resolution resist pattern using liquid immersion lithography. Furthermore, it is possible to apply a high refractive index liquid immersion medium, used in combination with the high refractive index liquid immersion medium, thus making it possible to further improve pattern accuracy. Using a composition comprising an acrylic resin component having characteristics which have substantially no compatibility with a liquid in which a resist film is immersed, particularly water, and are also soluble in alkaline, a protective film is formed on the surface of a resist film used. | 12-18-2008 |
20090011367 | INTERFACE BINDER, RESIST COMPOSITION CONTAINING THE SAME, LAMINATE FOR FORMING MAGNETIC RECORDING MEDIUM HAVING LAYER CONTAINING THE SAME, MANUFACTURING METHOD OF MAGNETIC RECORDING MEDIUM USING THE SAME, AND MAGNETIC RECORDING MEDIUM PRODUCED BY THE MANUFACTURING METHOD - To provide an interface binder for binding a resist layer and a laminate for forming magnetic recording medium having a substrate and a magnetic layer, the interface binder containing a first functional group crosslinkable with a surface of the laminate, and a second functional group crosslinkable with the resist layer. | 01-08-2009 |
20090042135 | MULTI-LAYER IMAGEABLE ELEMENT WITH IMPROVED PROPERTIES - Positive-working imageable elements comprise a radiation absorbing compound and inner and outer layers on a substrate having a hydrophilic surface. The inner layer comprises a specific polymeric binder represented by Structure (I): | 02-12-2009 |
20090061359 | RESIST COMPOSITION FOR IMMERSION EXPOSURE AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME - According to an aspect of an embodiment, a resist composition for immersion exposure includes a matrix resin so that the matrix resin is turned alkali-soluble by an acid. The resist composition further includes a resin having a side chain containing silicon, the resin being capable of being turned alkali-soluble by an acid, the content of the silicon with respect to the total amount of the matrix resin and the resin being 1% by mass or less. | 03-05-2009 |
20090081590 | NEGATIVE RESIST COMPOSITION AND PROCESS FOR FORMING RESIST PATTERNS - A negative resist composition is provided wherein the composition has the sensitivity to g-rays, i-rays, KrF excimer lasers and electron rays, and can be used for mix and match wherein exposure is conducted using at least two exposure light sources selected form g-rays, i-rays, KrF excimer lasers and electron rays. Furthermore, a negative resist composition and a resist pattern forming method are also proposed wherein a resist pattern having excellent high resolution and excellent plating resistance can be formed, and they can be used for manufacturing MEMS. That is, the present invention proposes: a negative resist composition which is used for a process in which at least two exposure light sources selected from g-rays, i-rays, KrF excimer lasers and electron rays are used and comprises an alkali-soluble resin component (A), acid generator component (B), which generates acid due to exposure to g-rays, i-rays, KrF excimer lasers and electron rays, and a crosslinking agent (C); and a negative resist composition which is used for manufacturing MEMS and comprises an alkali-soluble novolak resin (A), an acid generator component (B) which generates an acid due to the exposure of radiation and a crosslinking agent component (C). | 03-26-2009 |
20090155721 | FLEXOGRAPHIC PRINTING PLATE - According to the present invention, a flexographic printing plate and a photosensitive resin composition used therein are provided. The flexographic printing plate comprises a photocured product which is obtained by photocuring a photosensitive resin composition comprising a thermoplastic elastomer (a), a photopolymerizable unsaturated monomer (b) and a photopolymerization initiator (c) and has a loss tangent (tan δ) of 0.3 or more at 500 Hz in dynamic viscoelastometry using a nonresonance forced vibration apparatus. | 06-18-2009 |
20090202947 | Positive resist composition and patterning process using the same - The present invention provides a polymer suitable as a base resin for a positive resist composition, especially for a chemically amplified positive resist composition, having a high sensitivity, a high degree of resolution, a good pattern configuration after exposure, and in addition an excellent etching resistance; a positive resist composition using the polymer; and a patterning process. | 08-13-2009 |
20090246696 | PLANOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE MAKING METHOD USING THE SAME - The invention provides a planographic printing plate precursor having at least: a support; and an image recording layer that is provided on or above the support, the image recording layer containing at least: an infrared ray absorbing agent (A); a polymerization initiator (B); a polymerizable monomer (C); and a polymer compound (D) having, in a side chain thereof, at least one specific polymerizable functional group having a hydroxyl group; and following exposure of the planographic printing plate precursor, an unexposed portion of the image recording layer is removed with a gum solution. The invention further provides a plate making method including imagewise exposing the planographic printing plate precursor and developing the planographic printing plate precursor by processing the exposed planographic printing plate precursor with a gum solution so as to remove an unexposed portion of the image recording layer | 10-01-2009 |
20090317746 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT COMPRISING THE SAME, METHOD OF FORMING RESIST PATTERN, AND PROCESS FOR PRODUCING PRINTED WIRING BOARD - ABSTRACT A photosensitive resin composition according to the invention comprises (A) a binder polymer, (B) a photopolymerizing compound with an ethylenic unsaturated group and (C) a photopolymerization initiator, wherein component (B) contains a compound represented by the following general formula (I). | 12-24-2009 |
20100003618 | POLYMER HAVING POLYMERIZABLE GROUP, POLYMERIZABLE COMPOSITION, PLANOGRAPHIC PRINTING PLATE PRECURSOR, AND PLANOGRAPHIC PRINTING METHOD USING THE SAME - A polymer having a polymerizable group and an alkyleneoxy groups on side chains thereof, and a polymerizable composition containing the polymer. The polymerizable composition preferably contains a polymerizable compound and a polymerization initiator. Also provided is a planographic printing plate precursor having a polymerizable layer on a hydrophilic support, the polymerizable layer containing a polymer having a polymerizable on a side chain thereof. The planographic printing plate precursor can form an image without being subjected to an alkali development. An undercoat layer containing a specific copolymer may be provided between the support and the photopolymerizable layer. | 01-07-2010 |
20100055613 | NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF LITHOGRAPHIC PRINTING USING SAME - A negative-working lithographic printing plate precursor is disclosed that can be developed on the press without going through a development processing step, and a method of lithographic printing is also disclosed that uses this negative-working lithographic printing plate precursor. Also disclosed are a negative-working lithographic printing plate precursor that can be developed by a water-soluble resin-containing aqueous solution and a method of lithographic printing that uses this negative-working lithographic printing plate precursor. A negative-working lithographic printing plate precursor is provided that exhibits an excellent fine line reproducibility in nonimage areas even when printing is performed using ultraviolet-curing ink (UV ink). Also provided is a negative-working lithographic printing plate precursor that exhibits an excellent combination of fine line reproducibility and printing durability and that resists the production of scum during on-press development. The negative-working lithographic printing plate precursor has a support and has thereon a photopolymerizable layer that contains a polymer compound that has the urea bond in the main chain and a hydrophilic group and a carboxylic acid content less than 0.05 meq/g. The method of lithographic printing uses this negative-working lithographic printing plate precursor. | 03-04-2010 |
20100075258 | ON-PRESS DEVELOPABLE IMAGEABLE ELEMENTS - On press developable negative-working, on-press developable imageable elements have improved printout qualities with an incorporated infrared radiation absorbing compound that has a cyanine dye chromophore that is represented by the following Structure (CHROMOPHORE): | 03-25-2010 |
20100086874 | Photosensitive polymides - The invention pertains to an isocyanate-modified photosensitive polyimide. The photosensitive polyimide of the invention possesses excellent heat resistance, chemical resistance and flexibility, and can be used in a liquid photo resist composition or dry film photo resist composition, or used in a solder resist, coverlay film, or printed wiring board. | 04-08-2010 |
20100104982 | Printing resist, method for preparing the same and patterning method using the same - Disclosed herein is a printing resist sequentially transferred to a printing plate and a substrate after being applied to a printing roll. The printing resist comprises at least one polymer main chain bound to a tackiness-inducing vinyl group. The surface of the printing resist has tackiness without complete dryness, thus enabling a correct transfer of the printing resist to the printing plate and substrate. | 04-29-2010 |
20100119977 | PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE - A photosensitive resin composition which has satisfactory compatibility in dry-film formation, has sensitivity equally to two lights of i-line and h-line, is excellent in resolution and adhesion, and can be developed with an alkaline aqueous solution. Also provided are: a layered photosensitive-resin product including the photosensitive resin composition; a method of forming a resist pattern on a substrate with the layered photosensitive-resin product; and a use of the resist pattern. The photosensitive resin composition comprises: (a) 20-90 mass % thermoplastic copolymer which includes comonomer units derived from an α,β-unsaturated monomer having a carboxy group and which has an acid equivalent of 100-600 and a weight-average molecular weight of 5,000-500,000; (b) 5-75 mass % addition-polymerizable monomer having at least one ethylenically unsaturated terminal group; (c) 0.01-30 mass % photopolymerization initiator comprising a triarylimidazolyl dimer; and (d) 0.001-10 mass % pyrazoline compound represented by a specific general formula. | 05-13-2010 |
20100167208 | WATER SOLUBLE PHOTOSENSITIVE POLYMIDE POLYMER, ITS PREPARATION AND PHOTORESIST CONTAINING THE SAME - The present invention relates to a water soluble photosensitive polyimide polymer, preparation thereof and a photoresist composition containing the same. The water soluble photosensitive polyimide polymer is characterized by having repeat units represented by the following formula (I): | 07-01-2010 |
20100227275 | THIOPYRAN DERIVATIVE, POLYMER, RESIST COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SUCH RESIST COMPOSITION - To provide a thiopyran derivative, having a structure expressed by the following general formula 1: | 09-09-2010 |
20100297560 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND - A positive resist composition including a base component (A′) which exhibits increased solubility in an alkali developing solution under action of acid and generates acid upon exposure, the base component (A′) including a polymeric compound (A1′) having a structural unit (a5-1) represented by general formula (a5-1), a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a0-2) that generates acid upon exposure, the structural unit (a0-2) containing a group represented by general formula (a0-2′) (wherein represents an anion moiety represented by one of general formulas (1) to (5)). | 11-25-2010 |
20110014571 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME - A positive resist composition and a pattern forming method using the resist composition are provided, the resist composition including: (A) a resin containing a repeating structural unit represented by formula (I) as defined in the specification and being capable of decomposing by an action of an acid to increase the solubility in an alkali developer; (B) an acid generator; and (C) a mixed solvent containing at least one solvent selected from the group consisting of the following Group (a) and at least one solvent selected from the group consisting of the following Groups (b) to (d):
| 01-20-2011 |
20110053086 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN - A compound of the present invention is represented by the formula (A); | 03-03-2011 |
20110059400 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition comprising | 03-10-2011 |
20110076621 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE MAKING METHOD THEREOF - A lithographic printing plate precursor includes a support, and an image-recording layer, the image-recording layer contains a urethane resin having a polyalkylene oxide chain represented by the formula (1) as defined herein in a side chain, an infrared absorbing agent, a radical polymerizable compound and a radical polymerization initiator, and an unexposed area of the image-recording layer is capable of being removed with at least one of dampening water and ink. | 03-31-2011 |
20110143282 | PHOTOSENSITIVE COMPOSITION, PARTITION WALLS, COLOR FILTER AND ORGANIC EL DEVICE - It is an object of the present invention to provide a photosensitive composition capable of forming partition walls having an upper surface with good ink repellency and open areas which have good ink affinity within which an ink will easily spread. Further, it is an object of the present invention to provide partition walls formed by curing the photosensitive composition, and a color filter and an organic EL device having the partition walls. | 06-16-2011 |
20110256482 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF MANUFACTURE THEREOF AND ARTICLES INCLUDING THE SAME - Provided herein is a photosensitive resin composition which is patternable and exhibits adhesion even after being crosslinked. The photosensitive resin composition includes a (meth)acryl-based polymer having a carboxyl group and a reactive double bond on a side chain and having a specific acid value and a specific content of reactive double bond, and a photopolymerization initiator. | 10-20-2011 |
20120003586 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME AND PATTERN FORMING METHOD - Provided are an actinic ray-sensitive or radiation-sensitive resin composition; a resist film using the composition; and a pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing a repeating unit represented by formula (I), a repeating unit represented by formula (II) and a repeating unit represented by formula (III), and (B) a compound capable of generating a fluorine atom-containing acid upon irradiation with an actinic ray or radiation: | 01-05-2012 |
20130052589 | LITHOGRAPHIC PRINTING PLATE PRECURSORS FOR ON-PRESS DEVELOPMENT - On-press developable, negative-working lithographic printing plate precursors have a sulfuric acid anodized aluminum-containing substrate in which the oxide layer pores have been widened using an acidic or alkaline treatment. Over the widened pores, a hydrophilic coating is applied, which coating comprises a non-crosslinked hydrophilic polymer having carboxylic acid side chains. This particular substrate provides improved adhesion and printing durability for on-press development and printing. | 02-28-2013 |
20130078575 | NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS - A lithographic printing plate precursor comprises an imageable layer comprising a free radically polymerizable component, an initiator composition capable of generating free radicals upon exposure to imaging infrared radiation, an infrared radiation absorbing dye comprising an infrared radiation absorbing cation and a counter anion, and a polymeric binder. The salt formed between the infrared radiation absorbing cation and a tetraphenyl borate has solubility in 2-methoxy propanol at 20° C. that is greater than or equal to 3.5 g/l. The use of these infrared radiation absorbing dyes in the imageable layers provides a reduced tendency of these dyes to crystallize in the presence of tetraaryl borate counter anions. | 03-28-2013 |
20130171569 | RESIST UNDERLAYER FILM COMPOSITION, METHOD FOR PRODUCING POLYMER FOR RESIST UNDERLAYER FILM, AND PATTERNING PROCESS USING THE RESIST UNDERLAYER FILM COMPOSITION - A resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of a condensed body, the body being obtained by condensation of one or more kinds of a compound shown by the following general formula (1-1) with one or more kinds of a compound shown by the following general formula (2-3) and an equivalent body thereof, with one or more kinds of a compound shown by the following general formula (2-1), a compound shown by the following general formula (2-2), and an equivalent body thereof; a method for producing a polymer for a resist underlayer film; and a patterning process using the same. | 07-04-2013 |
20140030655 | Enhanced Multi-Photon Imaging Resolution Method - A method and a multi-photon photocurable composition are provided that allow for the formation of a three-dimensional microstructure having enhanced imaging resolution. The method involves providing a multi-photon photocurable composition system having an acrylic prepolymer and a multiphotohn photoinitiator system that comprises at least one distyrylbenzene dye or a benzothiazolyl fluorine derivative. The method includes imagewise exposing at least one voxel of the photocurable composition to a dose of electromagnetic energy under conditions effective to photodefinably form at least one solid voxel of a three-dimensional microstructure having a volume, wherein the solid voxel volume varies inversely with the dose. | 01-30-2014 |
20140141376 | SELF-ASSEMBLED STRUCTURES, METHOD OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME - Disclosed herein is a composition comprising a graft block copolymer comprising a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing moiety; and a second block polymer; the second block polymer being covalently bonded to the first block; wherein the second block comprises the backbone polymer and a second graft polymer; where the second graft polymer comprises a functional group that is operative to crosslink the graft block copolymer; a photoacid generator; and a crosslinking agent. | 05-22-2014 |
20150030983 | RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS - A resist top coat composition includes a polymer including a base resin having a repeating unit p of styrene having a 1,1,1,3,3,3-hexafluoro-2-propanol group and a repeating unit q of acenaphthylene having chemical formula 1. R is hydrogen, hydroxyl. R | 01-29-2015 |
20150050596 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF - The invention relates to a photosensitive polysiloxane composition and a thin film formed by the aforementioned photosensitive polysiloxane composition. The thin film is a planarization film of a TFT substrate, an interlayer insulating film or an overcoat of a core material or a protective material in a waveguide. The photosensitive polysiloxane composition has excellent chemical resistance. The photosensitive polysiloxane composition comprises a polysiloxane (A), an o-naphthoquinone diazide sulfonic acid ester (B), a thermal base generator (C) and a solvent (D). | 02-19-2015 |
20150147700 | Black Photosensitive Resin Composition and Light Blocking Layer Using the Same - Disclosed are a black photosensitive resin composition including (A) a binder resin; (B) a colorant including a pigment and a silica nanoparticle; (C) a photopolymerizable compound; (D) a photopolymerization initiator; and (E) a solvent, wherein the silica nanoparticle is included in an amount of about 1 part by weight to about 11 parts by weight based on about 100 parts by weight of the pigment, and a light blocking layer and a color filter using the same. | 05-28-2015 |