| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 430272100 | Silicon containing backing or protective layer | 25 |
| 20080280228 | Photosensitive Planographic Printing Plate - A photosensitive planographic printing plate comprising a substrate and a photosensitive layer including a photopolymerizable compound, wherein the photosensitive layer and the substrate are provided between them with an undercoat layer including a (co)polymer having structural units having ethylenically unsaturated groups bonded with silicon atoms and phosphonic acid groups. | 11-13-2008 |
| 20080286686 | FLUORINATED HALF ESTER OF MALEIC ANHYDRIDE POLYMERS FOR DRY 193 NM TOP ANTIREFLECTIVE COATING APPLICATION - The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for 193 nm lithography. The inventive composition is soluble in aqueous base solutions and has low refractive index at 193 nm. The inventive composition comprises an aqueous base-soluble polymer having a backbone and a fluorinated half ester moiety. The fluorinated half ester moiety is pendant from the backbone. The present invention also discloses a method of forming a patterned layer on a substrate by using the inventive composition in lithography. | 11-20-2008 |
| 20080318158 | Underlayer Coating Forming Composition for Lithography Containing Polysilane Compound - There is provided an underlayer coating for lithography that is used in lithography process of the manufacture of semiconductor devices, that can be used as a hardmask, and that causes no intermixing with photoresists; and a composition for forming the underlayer coating. | 12-25-2008 |
| 20090061355 | PROCESS OF MAKING A LITHOGRAPHIC STRUCTURE USING ANTIREFLECTIVE MATERIALS - A lithographic structure comprising: an organic antireflective material disposed on a substrate; and a silicon antireflective material disposed on the organic antireflective material. The silicon antireflective material comprises a crosslinked polymer with a SiO | 03-05-2009 |
| 20090098481 | PHOTOSENSITIVE MATERIAL FOR FORMING CONDUCTIVE FILM, CONDUCTIVE FILM, LIGHT TRANSMITTING ELECTROMAGNETIC WAVE SHIELDING FILM AND METHOD FOR MANUFACTURING THE SAME - To provide a conductive film forming photosensitive material from which a conductive film having high electromagnetic wave shielding properties and high transparency simultaneously can be manufactured and which is reduced with respect to pressure properties. | 04-16-2009 |
| 20090130595 | Thermoacid Generator for Antireflection Film Formation, Composition for Antireflection Film Formation, and Antireflection Film Made Therefrom - A thermoacid generator for antireflective film formation, characterized by being represented by the following formula (1): | 05-21-2009 |
| 20090162782 | Silicon-Containing Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating - There is provided an underlayer coating that is used as an underlayer of photoresists in lithography process of the manufacture of semiconductor devices and that has a high dry etching rate in comparison to the photoresists depending on the type of etching gas, does not intermix with the photoresists, and is capable of flattening the surface of a semiconductor substrate having holes of a high aspect ratio; and an underlayer coating forming composition for forming the underlayer coating. | 06-25-2009 |
| 20090305162 | IMAGEABLE ELEMENTS AND METHODS USEFUL FOR PROVIDING WATERLESS PRINTING PLATES - An imageable element can be imaged using non-ablative processes. This element has a non-silicone, non-crosslinked layer contiguous to and under an ink-repelling crosslinked silicone rubber layer. These elements can be used for providing lithographic printing plates useful for waterless printing (no fountain solution). Processing after imaging is relatively simple with either water or an aqueous solution consisting essentially of a surfactant or mechanical means to remove the crosslinked silicone rubber layer and a minor portion of the non-silicone, non-crosslinked layer in the imaged regions. | 12-10-2009 |
| 20100047712 | TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND ACIDIC GROUPS - The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for immersion lithography. The inventive composition is soluble in aqueous base solutions and insoluble in water. The inventive composition comprises a polymer having at least one hydrophobic moiety, at least one acidic moiety with a pKa of 1 or less, and at least one aqueous base soluble moiety. The present invention also discloses a method of forming a patterned layer on a substrate by using the inventive composition in lithography. | 02-25-2010 |
| 20100086872 | Metal oxide-containing film-forming composition, metal oxide-containing film-formed substrate, and patterning process - There is disclosed a thermosetting metal oxide-containing film-forming composition for forming a metal oxide-containing film to be formed in a multilayer resist process used in lithography, the thermosetting metal oxide-containing film-forming composition comprising, at least: (A) a metal oxide-containing compound obtained by hydrolytic condensation of a hydrolyzable silicon compound and a hydrolyzable metal compound; (B) a thermal crosslinking accelerator; (C) a monovalent, divalent, or higher organic acid having 1 to 30 carbon atoms; (D) a trivalent or higher alcohol; and (E) an organic solvent. There can be provided a metal oxide-containing film-forming composition in a multi-layer resist process, in a manner that a film made of the composition allows for formation of an excellent pattern of a photoresist film, the composition is capable of forming a metal oxide-containing film as an etching mask having an excellent dry etching resistance, the composition is excellent in storage stability, and the film made of the composition is removable by a solution used in a removal process; a metal oxide-containing film-formed substrate; and a pattern forming process. | 04-08-2010 |
| 20100151384 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME - A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen asking during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A), | 06-17-2010 |
| 20100167203 | Resist underlayer composition and method of manufacturing semiconductor integrated circuit device using the same - A resist underlayer composition and a method of manufacturing a semiconductor integrated circuit device, the composition including a solvent and an organosilane polymer, the organosilane polymer being a condensation polymerization product of at least one first compound represented by Chemical Formulae 1 and 2 and at least one second compound represented by Chemical Formulae 3 to 5. | 07-01-2010 |
| 20100248138 | LITHOGRAPHIC PRINTING PLATE PRECURSOR - A lithographic printing plate precursor includes in the following order: a support; an image-recording layer containing (A) an infrared absorbing agent, (B) a polymerization initiator and (C) a polymerizable compound; and a protective layer, an unexposed area of the image-recording layer is capable of being removed with at least one of printing ink and dampening water on a printing machine, and the lithographic printing plate precursor contains a compound represented by the following formula (I): | 09-30-2010 |
| 20100285407 | Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same - There is disclosed a thermosetting silicon-containing antireflection film-forming composition, to form a silicon-containing antireflection film in a multilayer resist process used in a lithography, wherein the composition is at least capable of forming—on an organic film that is an underlayer film having a naphthalene skeleton—a silicon-containing antireflection film whose refractive index “n” and extinction coefficient “k” at 193 nm satisfy the following relationship: 2n−3.08≦k≦20n−29.4 and 0.01≦k≦0.5. There can be provided, in a multilayer resist process used in a lithography, a thermosetting silicon-containing antireflection film-forming composition to form a silicon-containing antireflection film which can form an excellent pattern having depressed reflection of an exposing light at the time when a photoresist film is formed on the silicon-containing antireflection film formed on an organic film having a naphthalene skeleton as a resist underlayer film and subsequently a resist pattern is formed; has excellent dry etching properties between the photoresist film—which is the upperlayer of the silicon-containing antireflection film—and the organic film—which is the underlayer—; and has an excellent storage stability, and a substrate having the silicon-containing antireflection film from the composition for forming the silicon-containing antireflection film, and a patterning process using the same. | 11-11-2010 |
| 20110008733 | PHOTOTOOLS HAVING A PROTECTIVE LAYER - A phototool comprises an optically transparent substrate having designed pattern and a protective layer on the substrate. The protective layer comprises a cured hardcoat composition. The hardcoat composition comprises (i) one or more epoxy silane compounds (ii) one or more fluorochemical additives selected from the group consisting of perfluoropolyether-urethane silanes and silane-functionalized perfluoropolyether acrylate oligomers, and (iii) photo-acid generator. | 01-13-2011 |
| 20110262863 | NEAR-INFRARED ABSORPTIVE LAYER-FORMING COMPOSITION AND MULTILAYER FILM - A near-infrared absorptive layer is formed from a composition comprising (A) an acenaphthylene polymer, (B) a near-infrared absorbing dye, and (C) a solvent. When a multilayer film comprising the near-infrared absorptive layer and a photoresist layer is used in optical lithography, the detection accuracy of optical auto-focusing is improved, allowing the optical lithography to produce a definite projection image with an improved contrast and succeeding in forming a better photoresist pattern. | 10-27-2011 |
| 20110300483 | Self-Segregating Multilayer Imaging Stack With Built-In Antireflective Properties - A coating process comprises forming a patterned material layer on a substrate using a self-segregating polymeric composition comprising a polymeric photoresistive material and an antireflective coating material contained in a single solution. When depositing this solution on a substrate and removing the solvent, the two materials self-segregate into two layers. This produces a coated substrate having a uniaxial bilayer coating oriented in a direction orthogonal to the substrate with a top photoresistive coating layer and a bottom antireflective coating layer. Pattern-wise exposing the coated substrate to imaging radiation and contacting the coated substrate with a developer, produces the patterned material layer. Any optional top coat material and a portion of the photoresist layer can be simultaneously removed from the coated substrate to form a patterned photoresist layer on the substrate. | 12-08-2011 |
| 20120183901 | METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE PRECURSOR - To provide a method for producing a lithographic printing plate precursor excellent in development property and printing durability, which method restrains mixture of both layers at coating and drying an overcoat layer on an image-recording layer. A method for producing a polymerizable lithographic printing plate precursor including (a) a step of coating a coating solution of an image-recording layer containing (A) a sensitizing dye, (B) a radical polymerization initiator and (C) a radical polymerizable compound on a support, (b) a first drying step of supplying hot air to the image-recording layer, (c) a second drying step of supplying hot air and superheated vapor to the image-recording layer after the first drying step, (d) a step of coating an overcoat layer on the image-recording layer, and (e) a step of drying the overcoat layer. | 07-19-2012 |
| 20130017486 | PROCESS OF MAKING A LITHOGRAPHIC STRUCTURE USING ANTIREFLECTIVE MATERIALS - A lithographic structure comprising: an organic antireflective material disposed on a substrate, and a silicon antireflective material disposed on the organic antireflective material. The silicon antireflective material comprises a crosslinked polymer with a SiO | 01-17-2013 |
| 20130164677 | Spin-On Anti-Reflective Coatings for Photolithography - Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions. | 06-27-2013 |
| 20140045120 | WATERLESS PLANOGRAPHIC PRINTING PLATE PRECURSOR - A waterless planographic printing plate precursor has, on a substrate, at least a photosensitive layer or heat sensitive layer and a silicone rubber layer, which is a waterless planographic printing plate precursor, wherein 1) a color pigment and a pigment dispersant are contained in the silicone rubber layer, 2) the a content of color pigment is 0.1 to 20 vol % in the silicone rubber layer, and 3) the pigment dispersant contains an organic complex compound including a metal and an organic compound. | 02-13-2014 |
| 20140242516 | Silane Composition and Cured Film Thereof, and Method for Forming Negative Resist Pattern Using Same - A composition provided to contain:
| 08-28-2014 |
| 20140272709 | MIDDLE LAYER COMPOSITION FOR TRILAYER PATTERNING STACK - Methods and materials for making a semiconductor device are described. The method includes forming a middle layer (ML) of a patterning stack (e.g., a tri-layer patterning stack such as a tri-layer resist) and forming a photoresist layer directly on the middle layer. The middle layer includes an additive component having a photo base generator (PBG). The substrate including the photoresist layer and the middle layer is then exposed to a radiation. A covalent bond between the ML and the photoresist layer may be formed. | 09-18-2014 |
| 20160033861 | ALL WATER-BASED NANOPATTERNING - The present application provides novel methods for the fabrication of nanostructures. More specifically, the invention relates to direct electron beam lithography with the use of silk fibroin as “green” resists. | 02-04-2016 |
| 20160179008 | DNA DOUBLE-WRITE/DOUBLE BINDING IDENTITY | 06-23-2016 |
