| Entries |
| Document | Title | Date |
|---|
| 20090042125 | PHOTOTHERMOGRAPHIC MATERIAL - A photothermographic material comprising on one side of a support a light-sensitive layer containing an organic silver salt, silver halide grains, a binder and a reducing agent and on the other side of the support a back coating layer, wherein a dry thickness of the light-sensitive layer is 9 to 16 μm; a centerline average roughness (Ra(B)) of an outermost surface of a back coating layer side is 100 to 150 nm; and the back coating layer contains a lubricant having a molecular weight of 550 to 10000. | 02-12-2009 |
| 20090053646 | MATERIAL FOR PROTECTIVE FILM FORMATION AND METHOD OF FORMING RESIST PATTERN THEREWITH - A material for protective film formation that is used to form an upper-layer protective film for a resist film and that contains at least a polymer component soluble in water or alkali and an alcohol containing a fluorine atom; and a method of forming a resist pattern with the use of the same. Consequently, not only can the degeneration of resist film during liquid immersion exposure by various liquids for liquid immersion exposure, for example, water and the degeneration of liquid immersion exposure liquids per se be simultaneously prevented in the liquid immersion exposure process, but also without inviting an increase of the number of processing steps, the resistance to post exposure delay of the resist film can be enhanced. | 02-26-2009 |
| 20090053647 | Coating-type underlayer coating forming composition for lithography containing naphthalene resin derivative - [Object] To provide a coating-type underlayer coating forming composition containing a naphthalene resin derivative.
| 02-26-2009 |
| 20090111049 | LITHOGRAPHIC PRINTING PLATE PRECURSOR - A lithographic printing plate precursor capable of being subjected to on-press development by supplying at least one of printing ink and dampening water and including a support, an image-recording layer and optionally an undercoat layer between the support and the image-recording layer, wherein at least one of the undercoat layer and the image-recording layer contains at least one of a compound represented by the formula (1A) as defined herein and a compound including a structure represented by the formula (1B) as defined herein. | 04-30-2009 |
| 20090130594 | Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating - There is provided an underlayer coating that is used as an underlayer of photoresists in lithography process of the manufacture of semiconductor devices and that has a high dry etching rate in comparison to the photoresists, does not intermix with the photoresists, and is capable of flattening the surface of a semiconductor substrate having holes of a high aspect ratio; and an underlayer coating forming composition for forming the underlayer coating. | 05-21-2009 |
| 20090148792 | METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE AND LITHOGRAPHIC PRINTING PLATE PRECURSOR - A method for preparing a lithographic printing plate includes: exposing imagewise a lithographic printing plate precursor comprising, in the following order, a hydrophilic support, a photosensitive layer containing (A) a sensitizing dye, (B) a polymerization initiator, (C) a polymerizable compound and (D) a binder polymer and a protective layer containing at least one acid-modified polyvinyl alcohol in an amount of 50% by weight or more based on a total solid content of the protective layer; and removing the protective layer and an unexposed area of the photosensitive layer with a developer having pH of from 2 to 8. | 06-11-2009 |
| 20090202941 | SILSESQUIOXANE RESIN SYSTEMS WITH BASE ADDITIVES BEARING ELECTRON-ATTRACTING FUNCTIONALITIES - Silsesquioxane-based compositions that contain (a) silsesquioxane resins that contain HSiO3/2 units and RSiO | 08-13-2009 |
| 20090208867 | Resist Composition, Resist Protective Coating Composition, and Patterning Process - A polymer obtained through copolymerization of a monomer having a hexafluoroalcohol pendant and a monomer having a hexafluoroalcohol pendant whose hydroxyl moiety has been protected is useful as an additive to a photoresist composition and as a protective coating material for immersion lithography. When processed by immersion lithography, the resist composition and protective coating composition exhibit good water repellency and water slip and produce few development defects. | 08-20-2009 |
| 20090246688 | NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF LITHOGRAPHIC PRINTING USING SAME - A negative-working lithographic printing plate precursor is disclosed that can be developed on the press without going through a development processing step, and a method of lithographic printing is also disclosed that uses this negative-working lithographic printing plate precursor. A negative-working lithographic printing plate precursor is provided that exhibits excellent on-press developability, nonimage area fine line reproducibility and printing durability and that resists the production of scum during on-press development. The negative-working lithographic printing plate precursor has a hydrophilic support and has thereon a photopolymerizable layer that contains at least one selected from the group consisting of a polymer compound that has an ethylenically unsaturated bond in the side chain position, a hydrophilic group and a sulfonamide group and a polymer compound that has an ethylenically unsaturated bond in the side chain position, a hydrophilic group and a cyclic structure derived from a maleimide. The method of lithographic printing uses this negative-working lithographic printing plate precursor. | 10-01-2009 |
| 20090291392 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF - The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography. | 11-26-2009 |
| 20090311624 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LIQUID ADDITIVE - To provide a resist underlayer film forming composition for lithography that is used in a lithography process for production of a semiconductor device. There is provided a resist underlayer film forming composition used in a lithography process for production of a semiconductor device, comprising a resin (A), a liquid additive (B) and a solvent (C). The liquid additive (B) may be an aliphatic polyether compound. The liquid additive (B) may be a polyether polyol, polyglycidyl ether or a combination thereof. Further, there is provided a method of manufacturing a semiconductor device, including the steps of forming a resist underlayer film by applying the resist underlayer film forming composition on a semiconductor substrate and by calcining the composition; forming a photoresist layer on the underlayer film; exposing the semiconductor substrate coated with the resist underlayer film and the photoresist layer to light; and developing the photoresist layer after the exposure to light. | 12-17-2009 |
| 20100035181 | RESIST UNDERLAYER FILM FORMING COMPOSITION - It is a problem to provide a resist underlayer film forming composition containing a fullerene derivative, which is easily applied on a substrate and from which a resist underlayer film excellent in dry etching properties can be obtained. The problem is solved by for example a resist underlayer film forming composition comprising: a fullerene derivative represented by Formula (3): | 02-11-2010 |
| 20100055610 | HEAT SENSITIVE POSITIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR - A heat-sensitive positive-working lithographic printing plate precursor comprising | 03-04-2010 |
| 20100104977 | PHOTORESIST UNDERCOAT-FORMING MATERIAL AND PATTERNING PROCESS - A material comprising a novolac resin having a C | 04-29-2010 |
| 20100124720 | MATERIAL FOR PROTECTIVE FILM FORMATION, AND METHOD FOR PHOTORESIST PATTERN FORMATION USING THE SAME - This invention provides a material for protective film formation, comprising at least an alkali soluble polymer comprising at least one of constitutional units represented by general formulae (I) and (II) and an alcoholic solvent. The material for protective film formation can simultaneously prevent a deterioration in a resist film during liquid immersion exposure and a deterioration in a liquid for liquid immersion exposure used and, at the same time, can form a resist pattern with a good shape without the need to increase the number of treatment steps. | 05-20-2010 |
| 20100129752 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT EMPLOYING THE SAME, METHOD OF FORMING RESIST PATTERN, AND PROCESS FOR PRODUCING PRINTED WIRING BOARD - The photosensitive resin composition of the present invention is a photosensitive resin composition comprising:
| 05-27-2010 |
| 20100167202 | PHOTOSENSITIVE FLEXOGRAPHIC PRINTING ORIGINAL PLATE - The present invention provides a photosensitive flexographic printing original plate provided with a heat sensitive mask layer having high light blocking effect and durability yet prepared as a thin film. A photosensitive flexographic printing original plate including at least (A) a supporting member, (B) a photosensitive resin layer, (C) a protective layer and (D) a heat sensitive mask layer that are successively laminated, wherein the heat sensitive mask layer (D) contains carbon black and, as a dispersion binder therefor, a butyral resin as well as polyamide containing polar group selected from the group consisting of polyamide containing a tertiary amine group, polyamide containing a quaternary ammonium salt group, polyamide containing an ether group and polyamide containing a sulfonic group. | 07-01-2010 |
| 20100209846 | NEGATIVE-WORKING IMAGEABLE ELEMENTS - Negative-working imageable element can be used to prepared lithographic printing plates. These elements include a water-soluble contrast dye having a λ | 08-19-2010 |
| 20100297556 | Coating compositions suitable for use with an overcoated photoresist - Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer. | 11-25-2010 |
| 20100297557 | Coating compositions suitable for use with an overcoated photoresist - Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups. | 11-25-2010 |
| 20110003250 | COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST - In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer. | 01-06-2011 |
| 20110033800 | COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST - Cyanurate compositions are provided that are particularly useful as a reagent to form a resin component of a coating composition underlying an overcoated photoresist. Preferred isocyanurates compound comprise substitution of multiple cyanurate nitrogen ring atoms by at least two distinct carboxy and/or carboxy ester groups. | 02-10-2011 |
| 20110033801 | COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST - Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image. | 02-10-2011 |
| 20110091811 | DOUBLE-LAYERED PATTERNABLE ADHESIVE FILM, METHOD OF FORMING THE SAME, AND METHOD OF FORMING PATTERNABLE ADHESIVE LAYER USING THE SAME - A patternable adhesive film is formed in a double-layered structure of an adhesive layer having patternability and an adhesive layer having both adhesion and developability. Thus, the double-layered patternable adhesive film can effectively have both patternability and adhesion. | 04-21-2011 |
| 20110262862 | NEAR-INFRARED ABSORPTIVE LAYER-FORMING COMPOSITION AND MULTILAYER FILM - A composition comprising (A) a near-infrared absorbing dye of formula (1), (B) a polymer, and (C) a solvent is used to form a near-infrared absorptive layer. In formula (1), R | 10-27-2011 |
| 20110311915 | PHOTOSENSITIVE RESIST UNDERLAYER FILM FORMING COMPOSITION - A resist underlayer film forming composition used in a lithography process includes: a polymer (A) containing a unit structure having a hydroxy group, a unit structure having a carboxy group, or combination thereof; a crosslinkable compound (B) having at least two vinyl ether groups; a photoacid generator (C); a C | 12-22-2011 |
| 20120034562 | COATING COMPOSITION FOR USE WITH AN OVERCOATED PHOTORESIST - In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits. | 02-09-2012 |
| 20120070779 | LITHOGRAPHIC PRINTING PLATE PRECURSOR - The present invention provides a lithographic printing plate precursor which exhibits satisfactory ink cleanup and restart toning characteristics during printing. | 03-22-2012 |
| 20120237872 | BLACK AND WHITE SILVER HALIDE PHOTOSENSITIVE MATERIAL - A black and white silver halide photosensitive material, having: a support; at least one silver halide emulsion layer; and at least one non-photosensitive layer, wherein both of the silver halide emulsion layer and the non-photosensitive layer are positioned at one side of the support, the non-photosensitive layer includes carbon particles of 35 mg/m | 09-20-2012 |
| 20120288795 | COMPOSITION FOR FORMATION OF PHOTOSENSITIVE RESIST UNDERLAYER FILM AND METHOD FOR FORMATION OF RESIST PATTERN - A composition for forming a photosensitive resist underlayer film and a method for forming a resist pattern. The composition for forming a photosensitive resist underlayer film includes a polymer having a structural unit of Formula (1), a compound having at least two vinyl ether groups, a photo-acid generator; and a solvent: | 11-15-2012 |
| 20130040238 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS - A negative developable bottom antireflective coating (NDBARC) material includes a polymer containing an aliphatic alcohol moiety, an aromatic moiety, and a carboxylic acid moiety. The NDBARC composition is insoluble in a typical resist solvent such as propylene glycol methyl ether acetate (PGMEA) after coating and baking. The NDBARC material also includes a photoacid generator, and optionally a crosslinking compound. In the NDBARC material, the carboxylic acid provides the developer solubility, while the alcohol alone, the carboxylic acid alone, or their combination provides the PGMEA resistance. The NDBARC material has resistance to the resist solvent, and thus, intermixing does not occur between NDBARC and resist during resist coating over NDBARC. After exposure and bake, the lithographically exposed portions of both the negative photoresist and the NDBARC layer become insoluble in developer due to the chemically amplified crosslinking of the polymers in negative resist and NDBARC layer in the lithographically exposed portions. | 02-14-2013 |
| 20130337379 | ANTIREFLECTIVE COMPOSITIONS AND METHODS OF USING SAME - The present invention relates to a novel antireflective coating composition comprising a polymer obtained from a reaction product of at least one amino compound chosen from the group consisting of a polymer with repeat unit of structure (1), structure (2) and mixtures thereof reacted with a hydroxy compound chosen from the group consisting of structure (3), structure (4) and mixtures thereof, and, a thermal acid generator. The invention also relates to a process for using the novel composition in lithography. | 12-19-2013 |
| 20140147789 | LITHOGRAPHIC PRINTING PLATE PRECURSORS AND PROCESSES FOR PREPARING LITHOGRAPHIC PRINTING PLATES - Provide is a lithographic printing plate precursors having excellent printing durability, staining resistance and developability as well as processes for preparing lithographic printing plates therefrom. | 05-29-2014 |
| 20140295349 | BOTTOM ANTIREFLECTIVE MATERIALS AND COMPOSITIONS - The present invention relates to novel antireflective coating compositions and their use in image processing. The compositions self-segregate to form hydrophobic surfaces of the novel antireflective coating compositions, the composition being situated between a reflective substrate and a photoresist coating. Such compositions are particularly useful in the fabrication of semiconductor devices by photolithographic techniques. The present invention also related to self-segregating polymers useful in image processing and processes of their use. | 10-02-2014 |
| 20160009924 | COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST | 01-14-2016 |
| 20160170303 | LAMINATE BODY | 06-16-2016 |
| 20160179005 | PECVD FILMS FOR EUV LITHOGRAPHY | 06-23-2016 |
| 20160187778 | COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST - Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that comprise a surface agent of the Formula (I). | 06-30-2016 |
| 20160252813 | Lithographic Printing Plate Precursors and Coating | 09-01-2016 |
