| Entries |
| Document | Title | Date |
|---|
| 20080246406 | Helicon plasma source with permanent magnets - A helicon plasma source has a discharge tube, a radio frequency antenna disposed proximate the discharge tube, and a permanent magnet positioned with respect to the discharge tube so that the discharge tube is in a far-field region of a magnetic field produced by the permanent magnet. | 10-09-2008 |
| 20100084980 | PLASMA UNIFORMITY CONTROL USING BIASED ARRAY - Apparatus and method for improving the plasma uniformity in a plasma based system are described. The apparatus may include a plurality of electrical conductors, to which one or more types of electrical potentials may be applied. The conductors may be arranged in an array and may preferably be positioned near the plasma. By applying the bias voltages to the various electrically conductors, the plasma can be manipulated. For example, the conductors may extract or confine the electrons in the plasma, thereby locally adjusting the plasma density near the conductors. In the process, uniformity of the plasma density or ion concentration in the plasma may be improved. In a further embodiment, a magnetic field is included in the same direction as the electric field created by the bias voltage so as to better confine the charged particles. | 04-08-2010 |
| 20100213851 | PLASMA SOURCE - An RF based, gridless improved plasma source and method of operating a plasma source comprising a RF coupler, a first stage with a helicon-like system, a ICH second stage, a ionization chamber, magnetic means which are strengthened on the downstream end of the first stage, to control the plasma flux, ionization fraction, spatial distribution. | 08-26-2010 |
| 20100231130 | RADIATION SOURCE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD - A plasma radiation source includes a vessel configured to catch a source material transmitted along a trajectory, and a decelerator configured to reduce a speed of the source material in a section of the trajectory downstream of a plasma initiation site. | 09-16-2010 |
| 20100253224 | MODULATED MULTI-FREQUENCY PROCESSING METHOD - A method is provided for operating a processing system having a space therein arranged to receive a gas and an electromagnetic field generating portion operable to generate an electromagnetic field within the space. The method includes providing a gas into the space, and operating the electromagnetic field generating portion with a driving potential to generate an electromagnetic field within the space to transform at least a portion of the gas into plasma. The driving potential as a function of time is based on a first potential function portion and a second potential function portion. The first potential function portion comprises a first continuous periodic portion having a first amplitude and a first frequency. The second potential function portion comprises a second periodic portion having an maximum amplitude portion, and minimum amplitude portion and a duty cycle. The maximum amplitude portion is a higher amplitude than the minimum amplitude portion. The duty cycle is the ratio of a duration of the maximum amplitude portion to the sum of the duration of the maximum amplitude portion and the duration of the minimum amplitude portion. The second periodic portion additionally has a second frequency during the maximum amplitude portion. An amplitude modulation of the second periodic portion is phase locked to the first continuous periodic portion. | 10-07-2010 |
| 20110089834 | Z-PINCH PLASMA GENERATOR AND PLASMA TARGET - A configuration of two opposed electrodes with conical depressions and symmetry around an axis along which there is an applied steady magnetic field, is supplied with a pulsed voltage and current to create an azimuthally very uniform pre-ionization cylinder of a working gas as a precursor to stable and accurate compression of the working gas into a Z-pinch plasma photon source or plasma target for laser-pumped photon sources. A further compound hollow electrode configuration permits the generation of a cool, dense, core plasma surrounded and compressed by a hot liner plasma. Modulation of the radial density profile within this core can provide optical guiding for a laser-pumped recombination laser. | 04-21-2011 |
| 20110101863 | EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET LIGHT - An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation. | 05-05-2011 |
| 20110115380 | PLASMA GENERATION DEVICE AND PLASMA PROCESSING DEVICE - A flange, which forms a portion of a vacuum container, has a rectangular opening surrounded by an insulating frame. A plate-shaped radio-frequency antenna conductor | 05-19-2011 |
| 20110121736 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - Provided is a plasma processing apparatus having a coaxial waveguide structure in which characteristic impedance of an input side and characteristic impedance of an output side are different. A microwave plasma processing apparatus, which plasma-processes a substrate by exciting a gas by using a microwave, includes: a processing container; a microwave source, which outputs a microwave, a first coaxial waveguide, which transmits the microwave output from the microwave source; and a dielectric plate, which is adjacent to the first coaxial waveguide while facing an inner side of the processing container, and emits the microwave transmitted from the first coaxial waveguide into the processing container. A thickness ratio between an inner conductor and an outer conductor of the first coaxial waveguide is not uniform along a longitudinal direction. | 05-26-2011 |
| 20110133651 | Methods And Apparatus For Generating Strongly-Ionized Plasmas With Ionizational Instabilities - A plasma generator includes a chamber for confining a feed gas. An anode is positioned inside the chamber. A cathode assembly is positioned adjacent to the anode inside the chamber. A pulsed power supply comprising at least two solid state switches and having an output that is electrically connected between the anode and the cathode assembly generates voltage micropulses. A pulse width and a duty cycle of the voltage micropulses are generated using a voltage waveform comprising voltage oscillation having amplitudes and frequencies that generate a strongly ionized plasma. | 06-09-2011 |
| 20110248634 | METHOD FOR CONTROLLING ION ENERGY IN RADIO FREQUENCY PLASMAS - A method of establishing a DC bias in front of at least one electrode in a plasma operating apparatus by applying an RF voltage with at least two harmonic frequency components with a controlled relative phase between the components, where at least one of the higher frequency components is established as an even multiple of the lower frequency component. | 10-13-2011 |
| 20110260621 | LOW-POWER GASEOUS PLASMA SOURCE - A plasma source includes a first rod forming a quarterwave antenna, surrounded by at least one parallel rod forming a coupler and which is substantially the same length as the first rod, set to a reference potential, the coupler rods being evenly distributed radially about the first rod, at a distance of around one-fifth to one-twentieth of the quarter of the wavelength. | 10-27-2011 |
| 20110291567 | DISCHARGE LAMP FOR GDS WITH AN AXIAL MAGNETIC FIELD - A glow discharge spectrometer discharge lamp includes: a lamp body having a vacuum enclosure connected to pump elements and to injector elements for injecting an inert gas into the enclosure; a hollow cylindrical first electrode of longitudinal axis X-X′; a second electrode for receiving a sample for analysis and for holding the sample facing one end of the cylindrical electrode; electric field generator including an applicator for applying to the terminals of the electrodes an electric field that is continuous, pulsed, radiofrequency, or hybrid, and suitable for generating a glow discharge plasma in the presence of the gas; coupler elements for coupling the discharge lamp to a spectrometer suitable for measuring at least one component of the plasma; and magnetic field generator elements for generating a magnetic field having field lines oriented along the axis X-X′, the magnetic field being uniform in orientation and in intensity over an area of the sample that is not less than the inside area of the hollow cylindrical electrode as projected along the direction X-X′. | 12-01-2011 |
| 20120001550 | MAGNETIC MODUE OF ELECTRON CYCLOTRON RESONANCE AND ELECTRON CYCLOTRON RESONANCE APPARATUS USING THE SAME - The present invention provides a magnetic module for electron cyclotron resonance (ECR) and ECR apparatus using the magnetic module, wherein the magnetic module comprises a plurality of layers of supporting ring and a plurality of magnetic pillars. Each of the supporting rings has an outer surface and an inner surface and has a plurality of through holes radially disposed inside the supporting ring. The plurality of pillars are respectively embedded into the plurality of through holes of each supporting ring and magnetic fields of the magnetic pillars in each two adjacent supporting ring are respectively opposite to each other. The ECR apparatus of the present invention is capable of being operated under lower pressure environment for forming a single atom layer on a substrate. | 01-05-2012 |
| 20120013254 | IGNITION APPARATUS, INTERNAL-COMBUSTION ENGINE, IGNITION PLUG, PLASMA EQUIPMENT, EXHAUST GAS DEGRADATION APPARATUS, OZONE GENERATING/STERILIZING/DISINFECTING APPARATUS, AND ODOR ELIMINATING APPARATUS - Stable and highly efficient combustion/reaction is provided, even when fuel ratio of mixture is decreased and combustion/reaction of the lean mixture is performed in a heat engine such as a reciprocating engine, for controlling dielectric constant of mixture in a combustion/reaction chamber 8 by introducing water and/or exhaust gas into the combustion/reaction chamber, by introducing water and/or exhaust gas into the combustion/reaction chamber. A microwave radiation antenna for irradiation of the combustion/reaction chamber, and a discharge unit for igniting the mixture in the combustion/reaction chamber are provided. The dielectric constant of the mixture before the combustion/reaction of the mixture is controlled so that the resonance frequency of the mixture corresponds to the frequency of the microwave. | 01-19-2012 |
| 20120068603 | PLASMA GENERATING APPARATUS, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - An apparatus for generating plasma, comprises: a microwave generator configured to generate a microwave; a wave guide which is connected to the microwave generator, wherein the wave guide is elongated in a traveling direction of the microwave and has a hollow shape having a rectangular section in a direction perpendicular to the traveling direction; a gas feeder which is connected to the wave guide and feeds process gas into the wave guide; and an antenna unit which is a part of the wave guide and discharges plasma generated by the microwave to the outside, wherein the antenna unit has one or more slots formed on a wall constituting a short side in a section of the antenna unit, plasmarizes the process gas fed into the wave guide under an atmospheric pressure in the slots by the microwave, and discharges the plasma out of the slots. | 03-22-2012 |
| 20120091893 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions. | 04-19-2012 |
| 20120146510 | PULSED DISCHARGE EXTREME ULTRAVIOLET SOURCE WITH MAGNETIC SHIELD - A magnetically shielded, efficient plasma generation configuration for a pulsed discharge extreme ultraviolet (EUV) light source comprises two opposed convex electrodes mounted with axes parallel to a static magnetic field. A limiter aperture disposed between the electrodes, in conjunction with the field lines, defines a hollow plasma cylinder connecting the electrodes. A high pulsed voltage and current compresses the plasma cylinder and its interior magnetic field onto the electrode surfaces to create a magnetic insulating layer at the same time as propelling the working gas from each side toward the space between the electrode tips. The plasma then collapses radially in a three-dimensional compression to form a dense plasma on the axis of the device with radiation of extreme ultraviolet light. | 06-14-2012 |
| 20120176036 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device. | 07-12-2012 |
| 20120187842 | MICROWAVE PLASMA ELECTRON FLOOD - A method and apparatus is provided for generating a plasma electron flood using microwave radiation. In one embodiment, a microwave PEF apparatus is configured to generate a magnetic field that rapidly decays over a PEF cavity, resulting in a static magnetic field having a high magnetic field strength near one side (e.g., “bottom”) of the PEF cavity and a low magnetic field strength (e.g., substantially zero) near the opposite side (e.g., “top”) of the PEF comprising an elongated extraction slit. In one particular embodiment, the one or more permanent magnets are located at a position that is spatially opposed to the location of the elongated extraction slit to achieve the rapidly decaying magnetic field. | 07-26-2012 |
| 20120187843 | CLOSED DRIFT ION SOURCE WITH SYMMETRIC MAGNETIC FIELD - A closed drift ion source is provided comprising a single magnetic source, a first pole and a second pole. The ends of the first and second poles are separated by a gap. The magnetic source is disposed proximate to one of the first pole and second pole. A first magnetic path is provided between one magnetic pole of the single magnetic source and the end of the first pole. A second magnetic path is provided between the other magnetic pole of the single magnetic source and the end of the second pole. The first and second magnetic paths are selectively constructed to produce a symmetrical magnetic field in the gap. | 07-26-2012 |
| 20120206045 | HALL-EFFECT PLASMA THRUSTER - A Hall effect plasma thruster including an annular discharge channel around a main axis presenting an open downstream end and defined between an inner wall and an outer wall, at least one cathode, a magnetic circuit for creating a magnetic field in the channel, a pipe for feeding ionizable gas to the channel, an anode, and a manifold placed in the upstream end of the channel. The manifold is connected to the pipe and enables the ionizable gas to flow into the ionization zone of the channel in concentric manner around the main axis. The anode acts as a manifold, and the manifold includes a directional mechanism that gives rise at an outlet from the manifold to swirling motion of the gas around the main axis. | 08-16-2012 |
| 20120212136 | PENETRATING PLASMA GENERATING APPARATUS FOR HIGH VACUUM CHAMBERS - A plasma generating apparatus is provided with a high vacuum processing chamber and a transformer type plasmatron that is coupled with the high vacuum processing chamber. At least one gas source is coupled with the transformer type plasmatron, for introducing at least one gas into the transformer type plasmatron. The high vacuum processing chamber includes at least one entry port. The transformer type plasmatron includes: a radio frequency power source, for generating alternating current power; a plurality of conductors, coupled with the radio frequency power source; a closed loop discharge chamber, for confining the at least one gas; a plurality of high permeability magnetic cores, coupled around an outer portion of the closed loop discharge chamber and with the plurality of conductors; a plurality of apertures, located along an inner portion of the closed loop discharge chamber; and at least two dielectric gaskets. | 08-23-2012 |
| 20120217876 | Systems and Methods for Cylindrical Hall Thrusters with Independently Controllable Ionization and Acceleration Stages - Systems and methods may be provided for cylindrical Hall thrusters with independently controllable ionization and acceleration stages. The systems and methods may include a cylindrical channel having a center axial direction, a gas inlet for directing ionizable gas to an ionization section of the cylindrical channel, an ionization device that ionizes at least a portion of the ionizable gas within the ionization section to generate ionized gas, and an acceleration device distinct from the ionization device. The acceleration device may provide an axial electric field for an acceleration section of the cylindrical channel to accelerate the ionized gas through the acceleration section, where the axial electric field has an axial direction in relation to the center axial direction. The ionization section and the acceleration section of the cylindrical channel may be substantially non-overlapping. | 08-30-2012 |
| 20120235569 | NOZZLE FOR GENERATING MICROWAVE PLASMA FROM COMBUSTION FLAME - Systems for generating microwave plasma from a combustion flame. The present invention provides a microwave plasma nozzle that includes a hollow cylindrical housing through which combustible material flows, and a rod-shaped conductor disposed in the housing. A portion of the rod-shaped conductor extends into a microwave cavity to receive microwaves passing in the cavity. The rod-shaped conductor transmits microwaves along the surface thereof, and has a distal end disposed in proximity to and surrounded by a proximal end portion of the housing. During operation, a combustion flame is formed in proximity to the proximal end portion of the housing, and the microwaves transmitted along the surface heat up the flame to generate plasma in proximity to the distal end of the rod-shaped conductor. | 09-20-2012 |
| 20120280618 | PLASMA IGNITION SYSTEM, PLASMA IGNITION METHOD, AND PLASMA GENERATING APPARATUS - Provided is a plasma ignition technique allowing easy and reliable ignition and reignition of plasma without monitoring or manual handling. A plasma ignition system according to this technique is provided with a radio-frequency power supply configured to supply a predetermined high frequency signal to an applied electrode for generating plasma; a matching device configured to match impedance on a side of the radio-frequency power supply and impedance on a side of the applied electrode; a forward wave/reflected wave detector configured to detect a forward wave and a reflected wave of the high frequency signal; a high-voltage generator configured to generate a predetermined high voltage; and a controller configured to superimpose the high voltage on the high frequency signal when a ratio of the reflected wave to the forward wave is greater than a first threshold value. | 11-08-2012 |
| 20120293071 | IGNITION APPARATUS, INTERNAL-COMBUSTION ENGINE, IGNITION PLUG, PLASMA EQUIPMENT, EXHAUST GAS DEGRADATION APPARATUS, OZONE GENERATING/STERILIZING/DISINFECTING APPARATUS AND ODOR ELIMINATING APPARATUS - A plasma equipment comprising a microwave oscillator for generating a predetermined microwave band, a microwave resonant cavity for allowing the predetermined microwave band to resonate, and microwave radiation means for radiating the microwave into the microwave resonant cavity, wherein the microwave radiation means is a microwave radiation antenna having the shape and the size so as to form a strong electric field of the microwave in a plasma generation field formed by the microwave. | 11-22-2012 |
| 20130015766 | APPARATUS FOR GENERATING MINI AND MICRO PLASMAS AND METHODS OF USE - Systems and methods for formation of an ultra high frequency atmospheric pressure plasma jet are presented. A magnetic loop has first and second ends and a gap for generating the plasmas. An inner arc provides RF power to the magnetic loop. Use of the described structure allows for generation of plasmas in air and in inert gases such as argon and helium. Various properties, including the non-thermal nature and shape of the plasma jet are discussed. Applications for utilizing the non-thermal plasma jet are provided. | 01-17-2013 |
| 20130020939 | C ATMOSPHERIC PLASMA EQUIPMENT AND WAVEGUIDE FOR THE SAME - Provided is an atmospheric plasma equipment and a waveguide for the same. The atmospheric plasma equipment according to this disclosure includes: an oscillator supplying an electromagnetic wave; and a waveguide into which the electromagnetic wave generated from the oscillator is input to be propagated therethrough, wherein the waveguide includes at least one or more steps, and plasma is generated at a waveguide region including a final short portion. The atmospheric plasma equipment may simultaneously attain an effect of causing concentration of an electromagnetic wave applied through the waveguide with one or more steps and an effect of stably maintaining generated plasma. | 01-24-2013 |
| 20130026919 | Pulsed Plasma Generator - A pulsed electrostatic/electric field generator apparatus providing a source of large quantity, free slow-speed high energy free electrons, or high energy positive ions, contained in an electrostatic/electric field capacity exceeding 1 Joule. The pulsed electrostatic/electric field generator apparatus encapsulates an enclosed non-equilibrium, non-thermal pulsed power plasma. A key subcomponent of this apparatus incorporates an innovative unipolar piezoelectric capacitor creating high voltage nanosecond rise time pulses in a multistage high energy step-up pulsed plasma generation sequence of steps. The resulting multi-Joule electrostatic/electric field is then tapped to provide a source of current and/or potential for use by external loads. | 01-31-2013 |
| 20130026920 | Iodine Fueled Plasma Generator System - An iodine fueled plasma generator system includes a plasma generator. At least one storage vessel is configured to store condensed phase iodine therein. A heating device proximate to the storage vessel is configured to create iodine vapor from the condensed phase iodine. A propellant management subsystem is configured to deliver the iodine vapor to the plasma generator. A feedback control subsystem is responsive to one or more of plasma generator discharge current, the pressure of the iodine vapor, and/or the temperature of the iodine vapor configured to regulate the flow rate of the iodine vapor to the plasma generator. | 01-31-2013 |
| 20130082599 | TRANSFORMER-COUPLED RF SOURCE FOR PLASMA PROCESSING TOOL - A RF source and method are disclosed which inductively create a plasma within an enclosure without an electric field or with a significantly decreased creation of an electric field. A ferrite material with an insulated wire wrapped around its body is used to efficiently channel the magnetic field through the legs of the ferrite. This magnetic field, which flows between the legs of the ferrite can then be used to create and maintain a plasma. In one embodiment, these legs rest on a dielectric window, such that the magnetic field passes into the chamber. In another embodiment, the legs of the ferrite extend into the processing chamber, thereby further extending the magnetic field into the chamber. This ferrite can be used in conjunction with a PLAD chamber, or an ion source for a traditional beam line ion implantation system. | 04-04-2013 |
| 20130119865 | PLASMA GENERATION DEVICE - The plasma generation device | 05-16-2013 |
| 20130175928 | HYBRID PLASMA REACTOR - A hybrid plasma reactor includes a first plasma chamber for providing a first ring-shaped plasma discharge space, second plasma chambers providing a second plasma discharge space connected to the first plasma discharge space and coupled to magnetic flux channels, a hybrid plasma source including magnetic cores, which partially surround the first plasma chamber and have magnetic entrances forming the magnetic flux channels, and primary winding coils wound in the magnetic cores and complexly generating ring-shaped transformer-coupled plasma in the first plasma discharge space and magnetic flux channel coupled plasma in the second plasma discharge space, and an AC switching power supply for supplying plasma generation power to the primary winding coils. The hybrid plasma reactor can complexly generate magnetic flux channel coupled plasma and transformer coupled plasma so that it has a high control capability for plasma ion energy and a wide operation region from a low-pressure region to a high-pressure region. | 07-11-2013 |
| 20130187546 | Novel Coherent Multiple Side Electromagnets - In some embodiments, the present disclosure relates to a plasma processing system that generates a magnetic field having a maximum strength that is independent of workpiece size. The plasma processing system has a plurality of side electromagnets that have a size which is independent of the workpiece size. The side electromagnets are located around a perimeter of a processing chamber configured to house a semiconductor workpiece. When a current is provided to the side electromagnets, separate magnetic fields emanate from separate positions around the workpiece. The separate magnetic fields contribute to the formation of an overall magnetic field that controls the distribution of plasma within the processing chamber. Because the size of the plurality of separate side magnets is independent of the workpiece size, the plurality of side magnets can generate a magnetic field having a maximum field strength that is independent of workpiece size. | 07-25-2013 |
| 20130193848 | RIBBON ANTENNA FOR VERSATILE OPERATION AND EFFICIENT RF POWER COUPLING - A plasma processing apparatus and method are disclosed which allows switching between the E and H operation modes and also increase the coupling efficiency of the RF power to the plasma. This apparatus may increase plasma density by a factor of about 1.25-1.65 for a given power output. Simultaneously, due to the high efficiency, the need to cool the antenna may be eliminated. A new antenna geometry which increases the amount of surface area for a given volume is used to take advantage of skin effects associated with RF electric current. In some embodiments, the antenna has a single turn to reduce proximity effects. The antenna may also be embedded in a ferrite material to further optimize its performance. | 08-01-2013 |
| 20130214684 | METHOD AND DEVICE FOR TRANSPORTING VACUUM ARC PLASMA - The proposed method allows forming cathode arc plasma flows for high quality coatings. The plasma flows are transported in a plasma-optical system by means of a transport magnetic field generated by electromagnetic coils, super-positioning a constant magnetic field and additional variable magnetic fields deflecting the plasma flows from internal surfaces of the system's elements. In a device for implementing the proposed method, an arc power supply is connected to an anode via a coil, surrounding the anode. In a linear embodiment of the system, an electrically conductive tube section inside the anode is connected to one end of the deflection coil. The other end is connected to the positive terminal of power supply. In the system's non-linear embodiment, additional magnetic fields are established using two additional electromagnetic coils, surrounding the anode and a nonlinear part respectively. The method and device allow for a significantly reduction of losses of macroparticle-free plasma. | 08-22-2013 |
| 20130221847 | METHOD AND APPARATUS FOR DETECTING ARC IN PLASMA CHAMBER - An apparatus for detecting an arc in a plasma chamber is designed to detect the respective voltage and current values of RF power supplied to the plasma chamber and calculate the ratio of the voltage and current values to accomplish a required control of the supplying of the power. When it is determined that the arc is generated, the apparatus rapidly controls the supplying of the power to prevent damages on the plasma chamber and contaminations on the materials to be processed due to the generation of the arc. | 08-29-2013 |
| 20130278141 | THREE-COIL INDUCTIVELY COUPLED PLASMA SOURCE WITH INDIVIDUALLY CONTROLLED COIL CURRENTS FROM A SINGLE RF POWER GENERATOR - An inductively coupled plasma reactor has three concentric RF coil antennas and a current divider circuit individually controlling currents in each of the three coil antennas by varying only two reactive elements in the current divider circuit. | 10-24-2013 |
| 20130278142 | THREE-COIL INDUCTIVELY COUPLED PLASMA SOURCE WITH INDIVIDUALLY CONTROLLED COIL CURRENTS FROM A SINGLE RF POWER GENERATOR - An inductively coupled plasma reactor has three concentric coil antennas and a current divider circuit individually controlling currents in each of the three coil antennas by varying two variable impedance elements in the current divider circuit in response to a desired current apportionment among the coil antennas received from a user interface. | 10-24-2013 |
| 20130285551 | Method for Improving Uniformity of High-Frequency Plasma Discharge by Means of Frequency Modulation - A method for improving the uniformity of high-frequency discharge plasma by means of frequency modulation is disclosed. In a plasma discharge chamber, there is a pair of parallel electrodes. A high-frequency power supply is adopted to feed the electrodes. The frequency range of the electromagnetic field is 13.56 MHz˜160 MHz. Discharge gas is input to form plasma. The frequency of the fed-in high-frequency electromagnetic field is under automatic tuning control, and keeps changing cyclically without stop in the course of plasma discharge. The range of the frequency change may fall into either a portion of or the entire range of 13.56 MHz˜160 MHz and makes the locations with higher plasma density on the plane in parallel with the electrodes and in the plasma discharge space changed cyclically. In a time slot longer than one frequency change cycle, the average plasma density between the parallel electrodes is uniform. | 10-31-2013 |
| 20130300289 | ELECTRODE ASSEMBLIES, PLASMA GENERATING APPARATUSES, AND METHODS FOR GENERATING PLASMA - Electrode assemblies for plasma reactors include a structure or device for constraining an arc endpoint to a selected area or region on an electrode. In some embodiments, the structure or device may comprise one or more insulating members covering a portion of an electrode. In additional embodiments, the structure or device may provide a magnetic field configured to control a location of an arc endpoint on the electrode. Plasma generating modules, apparatus, and systems include such electrode assemblies. Methods for generating a plasma include covering at least a portion of a surface of an electrode with an electrically insulating member to constrain a location of an arc endpoint on the electrode. Additional methods for generating a plasma include generating a magnetic field to constrain a location of an arc endpoint on an electrode. | 11-14-2013 |
| 20140055035 | Device And Method For Quick Closing Of An Electric Circuit And A Use Of The Device - A device for quick closing of an electric circuit having a main spark gap with main electrodes and a triggering device. The triggering device has an auxiliary spark gap with auxiliary electrodes for igniting an arc in the main spark gap. The auxiliary electrodes are shielded from the main spark gap by a shielding unit having channel means extending therethrough from an auxiliary spark gap facing side to a main spark gap facing side of the shielding unit. The device further includes a nozzle with a first end being most close to the auxiliary spark gap and a second end most close to the main spark gap. The first end has an inlet opening that is in connection with the channel means and the second end has an outlet opening. The invention also relates to a corresponding method and to a use of the device. | 02-27-2014 |
| 20140184073 | PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) SOURCE - One embodiment is directed to a plasma source comprising a body in which a cavity is formed and at least two self-contained magnetron assemblies disposed within the cavity. The magnetron assemblies are mutually electrically isolated from each other and from the body. In one implementation of such an embodiment, the self-contained magnetron assemblies comprise closed-drift magnetron assemblies. Other embodiments are disclosed. | 07-03-2014 |
| 20140197733 | APPARATUS AND METHOD FOR MULTIPLEXED MULTIPLE DISCHARGE PLASMA PRODUCED SOURCES - An apparatus for producing EUV light, including: a plate with pluralities of through-bores; at least one power system; and a plurality of discharge plasma devices disposed in the through-bores. Each device includes: a respective plasma electrode forming at least part of a respective plasma-producing region; a respective magnetic core embedded in the plate and aligned with the respective plasma electrode in a radial direction and configured to create a respective magnetic field within the respective plasma-producing region; and a respective feed system arranged to supply an ionizable material to the respective plasma-producing region. The power system is configured to supply electrical power to the plasma electrodes to create respective electric fields in the respective plasma-producing regions. The combination of the respective electric field and the respective magnetic fields is arranged to create respective plasma from the ionizable material, the respective plasma creating respective EUV light. | 07-17-2014 |
| 20140217894 | LINEAR PLASMA SOURCE - Embodiments of the present application disclose a linear plasma source applied to the field of solar cell production. A linear plasma source comprising a housing which forms a reaction chamber having an outlet; a gas intake system comprising an internal pipeline which is mounted on the housing and located inside the reaction chamber for releasing reaction gas into the reaction chamber; an electrode system comprising at least two electrode plates which are mounted on the housing and located around the internal pipeline within the reaction chamber; and an electromagnetism system comprising an electromagnetic coil, and the electromagnetic coil is mounted at the outlet of the reaction chamber of the housing and has a plasma outlet. The embodiments of the present application have a simple structure, a low production cost, a good uniformity and a high film compactness. | 08-07-2014 |
| 20140265856 | Magnetic Field Sources For An Ion Source - An ion source is provided that includes an ionization chamber and two magnetic field sources. The ionization chamber has a longitudinal axis extending therethrough and includes two opposing chamber walls, each chamber wall being parallel to the longitudinal axis. The two magnetic field sources each comprises (i) a core and (ii) a coil wound substantially around the core. Each magnetic field source is aligned with and adjacent to an external surface of respective one of the opposing chamber walls and oriented substantially parallel to the longitudinal axis. The cores of the magnetic field sources are physically separated and electrically isolated from each other. | 09-18-2014 |
| 20140312770 | SYSTEMS AND METHODS FOR GENERATING ELECTRON SPIRAL TOROIDS - A spheromak is a plasma of ions and electrons formed into a toroidal shape. A spheromak plasma can include electrons and ions of nearly equal amounts such that it is essentially charge neutral. It contains large internal electrical currents and their associated internal magnetic fields arranged so that the forces within the spheromak are nearly balanced. The spheromak described herein is observed to form around an electric arc in partial atmosphere, and is observed to be self-stable with no external magnetic containment. | 10-23-2014 |
| 20140320016 | PLASMA GENERATING APPARATUS AND SUBSTRATE TREATING APPARATUS - A plasma generating apparatus and a substrate processing apparatus are disclosed. The plasma generating apparatus includes a disk-shaped first electrode receiving first RF power of a first frequency to generate plasma, a washer-type second electrode disposed around the circumference of the first electrode and receiving second RF power of a second frequency, an insulating spacer disposed between the first electrode and the second electrode, a first RF power source supplying power to the first electrode, and a second RF power source supplying power to the second electrode. | 10-30-2014 |
| 20150048741 | System and Method for Imaging a Sample with a Laser Sustained Plasma Illumination Output - The inspection of a sample with VUV light from a laser sustained plasma includes generating pumping illumination including a first selected wavelength, or range of wavelength, containing a volume of gas suitable for plasma generation, generating broadband radiation including a second selected wavelength, or range of wavelengths, by forming a plasma within the volume of gas by focusing the pumping illumination into the volume of gas, illuminating a surface of a sample with the broadband radiation emitted from the plasma via an illumination pathway, collecting illumination from a surface of the sample, focusing the collected illumination onto a detector via a collection pathway to form an image of at least a portion of the surface of the sample and purging the illumination pathway and/or the collection pathway with a selected purge gas. | 02-19-2015 |
| 20150091442 | Microwave plasma generating device and method for operating same - A microwave plasma generating device has a plasma chamber. A microwave generating device is provided outside of the plasma chamber, and the microwaves are coupled into the plasma chamber via a microwave in-coupling device. The microwave in-coupling device has an inner conductor which leads into the plasma chamber through a chamber wall of the plasma chamber, an insulating tube which encloses the inner conductor and separates the inner conductor from an interior of the plasma chamber, and an outer conductor which leads into the plasma chamber through the chamber wall and which is coaxial to the inner conductor. The outer conductor has an outer conductor end in the plasma chamber. The inner and outer conductors form a microwave line, an outlet of microwaves out of the microwave line is provided in the plasma chamber to generate microwave plasma in the interior of the plasma chamber. | 04-02-2015 |
| 20150137682 | GLOW DISCHARGE LAMP - The disclosure includes a glow-discharge lamp including: an elongate casing transparent to illuminating radiation and containing a plasma gas; a device for applying an electric field for maintaining a plasma in the so-called positive column region of the casing, the device including two electrodes forming an anode and a cathode located in the casing at each end thereof; and a radio-frequency or microwave cathode plasma source arranged in the casing in relation to the cathode-forming electrode, such as to generate a high-frequency discharge located on the surface of the electrode in order to generate the plasma. The disclosure also includes a lighting method of such a glow-discharge lamp. | 05-21-2015 |
| 20150294842 | ELECTRICAL TRANSFORMER - Systems and methods for managing electric power are disclosed. In an aspect, a system can comprise plasma disposed in a housing and a pair of helical electrodes disposed in the housing, wherein an electric current passing through the pair of electrodes induces a rotation in the plasma. | 10-15-2015 |
| 20150319834 | METHOD AND CONTROL UNIT FOR OPERATING A PLASMA GENERATION APPARATUS - The invention relates to a method and to a control unit for operating the plasma generation apparatus. | 11-05-2015 |
| 20150340206 | PLASMA GENERATION DEVICE - A plasma generating device that improves plasma generating efficiency can further accommodate changes in plasma generating state because of changes in conditions of surroundings and the like. The plasma generating device is provided with an electromagnetic wave radiating device, which has an electromagnetic wave generating device that oscillates electromagnetic waves and a radiating antenna that radiates electromagnetic waves oscillated by the electromagnetic wave generating device, and a control device that controls the electromagnetic wave radiating device. The electromagnetic wave radiating device is provided with a power detector that detects traveling wave power output by the electromagnetic wave generating device and reflected wave power reflected from the radiating antenna, and the control device automatically controls the oscillation pattern for the electromagnetic waves on the basis of the proportion of the value for the reflected wave power to the value for the traveling wave power detected by the power detector. | 11-26-2015 |
| 20150342017 | PLASMA GATE - A plasma gate includes at least one conductive input line having a corresponding at least one terminal end, a plurality of conductive output lines having a corresponding plurality of input ends, and a plasma gap having opposite first and second ends, where the plasma gap extends between the terminal ends of the input lines and the input ends of the output lines. A plasma-generating gas is resident in the plasma gap. At least one field generator having a field-generating distal end is mounted so as to position the distal end of the field generator adjacent the plasma gap. The output lines are arrayed along the plasma gap in a spaced apart array. The distal end of the field generator is positioned at least at the first end of the plasma gap. | 11-26-2015 |
| 20160005575 | PLASMA SOURCE - The invention relates to a plasma source ( | 01-07-2016 |
| 20160007436 | METHOD AND APPARATUS FOR PROVIDING HIGH CONTROL AUTHORITY ATMOSPHERIC PLASMA - Embodiments of the invention relate to a method and apparatus for providing high thrust density plasma, and/or high control authority plasma. In specific embodiments, such high thrust density, and/or high control authority, plasma can be at or near atmospheric pressure. Embodiments pertain to a method and apparatus that use electron confinement via one or more magnetic fields, and/or one or more electric fields, in a manner to improve the ionization due to surface plasma actuators. Specific embodiments can improve ionization by several orders of magnitude. This improved ionization can result in a high electric field inside the sheath for the same applied voltage and can result in very high thrust. | 01-07-2016 |
| 20160056023 | Plasma Ignition and Sustaining Apparatus - Apparatus for use with a vessel used to generate plasma are provided. One apparatus includes a first comb structure configured to partially wrap around a circumference of the vessel. The first comb structure has a first end and a second end, and a first separation is defined between the first end and the second end. The first comb structure defines a first plurality of fingers oriented perpendicular to the circumference of the vessel. The first comb structure is configured to be connected to a first end of a radio frequency (RF) coil. Also provided is a second comb structure configured to partially wrap around the circumference of the vessel. The second comb structure has a first end and a second end. A second separation is defined between the first end and the second end the second comb structure. The second comb structure defines a second plurality of fingers oriented perpendicular to the circumference of the vessel. The second comb structure is configured to be connected to a second end of the RF coil. Further, ends of the first plurality of fingers and ends of the second plurality of fingers are configured to face each other and maintain a third separation. | 02-25-2016 |
| 20160174354 | POWER SUPPLY DEVICE AND METHOD FOR PLASMA GENERATION | 06-16-2016 |
| 20160181069 | System and Method for Plasma Treatment Using Directional Dielectric Barrier Discharge Energy System | 06-23-2016 |
| 20160181765 | IGNITION PLUG AND PLASMA GENERATION DEVICE | 06-23-2016 |
