Class / Patent application number | Description | Number of patent applications / Date published |
257209000 | Programmable signal paths (e.g., with fuse elements, laser programmable, etc) | 38 |
20080217658 | ELECTRICAL ANTIFUSE WITH INTEGRATED SENSOR - The present invention provides structures for antifuses that utilize electromigration for programming. By providing a portion of antifuse link with high resistance without conducting material and then by inducing electromigration of the conducting material into the antifuse link, the resistance of the antifuse structure is changed. By providing a terminal on the antifuse link, the change in the electrical properties of the antifuse link is detected and sensed. Also disclosed are an integrated antifuse with a built-in sensing device and a two dimensional array of integrated antifuses that can share programming transistors and sensing circuitry. | 09-11-2008 |
20080283872 | Variable path wiring cell, semiconductor integrated circuit designing method thereof, and forming method of variable path wiring cell - Provided are a first wiring layer where each of the first, second internally present wirings can be selectively connected to the first and the second externally extended wirings, and a second wiring layer that has substantially the same structure as that of the first wiring layer. There is further provided an interlayer contact layer which arbitrarily connects one of the first and the second internally present wirings on the first wiring layer to one of the first, second internally present wirings on the second wiring layer, and connects the remainder of the first and the second internally present wirings on the first wiring layer to the remainder of the first and the second internally present wirings on the second wiring layer. | 11-20-2008 |
20090057723 | SEMICONDUCTOR DEVICE - A semiconductor device including a plurality of semiconductor elements, a substrate on which the plurality of semiconductor elements are mounted, the substrate also having a plurality of terminals for connecting to external equipment, a fuse mounted on the outside of a mounting area of the plurality of semiconductor elements and mounted on a surface of the substrate near a power supply terminal among the plurality of terminals, and the power supply terminal and the plurality of semiconductor elements are connected via the fuse. | 03-05-2009 |
20090127587 | TUNABLE ANTIFUSE ELEMENTS - A tunable antifuse element ( | 05-21-2009 |
20090140299 | MEMORY WITH HIGH DIELECTRIC CONSTANT ANTIFUSES ADAPTED FOR USE AT LOW VOLTAGE - A memory array having memory cells comprising a diode and an antifuse can be made smaller and programmed at lower voltage by using an antifuse material having a higher dielectric constant and a higher acceleration factor than those of silicon dioxide, and by using a diode having a lower band gap than that of silicon. Such memory arrays can be made to have long operating lifetimes by using the high acceleration factor and lower band gap materials. Antifuse materials having dielectric constants between 5 and 27, for example, hafnium silicon oxynitride or hafnium silicon oxide, are particularly effective. Diode materials with band gaps lower than that of silicon, such as germanium or a silicon-germanium alloy, are particularly effective. | 06-04-2009 |
20090189196 | PROGRAMMABLE NANOTUBE INTERCONNECT - Programmable nanotube interconnect is disclosed. In one embodiment, a method includes forming a interconnect layer using a plurality of nanotube structures, and automatically altering a route of an integrated circuit based on an electrical current applied to at least one of the plurality of nanotube structures in the interconnect layer. Neighboring interconnect layers separated by planar vias may include communication lines that are perpendicularly oriented with respect to each of the neighboring interconnect layers. The nanotube structure may be chosen from a group comprising a polymer, carbon, and a composite material. A carbon nanotube film may be patterned in a metal layer to form the plurality of nanotube structures. A sputtered planar process may be performed across a trench of electrodes to create the carbon nanotube structures. | 07-30-2009 |
20090200578 | SELF-REPAIRING FIELD EFFECT TRANSISITOR - A self repairing field effect transistor (FET) device, in accordance with one embodiment, includes a plurality of FET cells each having a fuse link. The fuse links are adapted to blow during a high current event in a corresponding cell. | 08-13-2009 |
20090236639 | STACKED BIT LINE DUAL WORD LINE NONVOLATILE MEMORY - An arrangement of nonvolatile memory devices, having at least one memory device level stacked level by level above a semiconductor substrate, each memory level comprising an oxide layer substantially disposed above a semiconductor substrate, a plurality of word lines substantially disposed above the oxide layer; a plurality of bit lines substantially disposed above the oxide layer; a plurality of via plugs substantially in electrical contact with the word lines and, an anti-fuse dielectric material substantially disposed on side walls beside the bit lines and substantially in contact with the plurality of bit lines side wall anti-fuse dielectrics. | 09-24-2009 |
20090250726 | LOW VT ANTIFUSE DEVICE - A one time programmable memory cell having an anti-fuse device with a low threshold voltage independent of core circuit process manufacturing technology is presented. A two transistor memory cell having a pass transistor and an anti-fuse device, or a single transistor memory cell having a dual thickness gate oxide, are formed in a high voltage well that is formed for high voltage transistors. The threshold voltage of the anti-fuse device differs from the threshold voltages of any transistor in the core circuits of the memory device, but has a gate oxide thickness that is the same as a transistor in the core circuits. The pass transistor has a threshold voltage that differs from the threshold voltages of any transistor in the core circuits, and has a gate oxide thickness that differs from any transistor in the core circuits. The threshold voltage of the anti-fuse device is lowered by omitting some or all of the threshold adjustment implants that is used for high voltage transistors fabricated in the I/O circuits. | 10-08-2009 |
20090315081 | PROGRAMMABLE CIRCUIT WITH CARBON NANOTUBE - A semiconductor device has a programming circuit that includes an active device and a programmable electronic component. The programmable electronic component includes a carbon nanotube having a segment with an adjusted diameter. The programmable electronic component has a value that depends upon the adjusted diameter. The programming circuit also includes interconnects that couple the active device to the programmable electronic component. The active device is configured to control a current transmitted to the programmable electronic component. | 12-24-2009 |
20100006904 | Apparatus and Method for Input/Output Module That Optimizes Frequency Performance in a Circuit - A circuit can include a module having signal pads that are configurable to route signals between the circuit and at least one external device. The module can also have unused pads that are interleaved between the signal pads. A circuit can include a module having signal pads that are configurable to route varying signals between the circuit and at least one external device. The module can also have voltage pads that are configurable to route substantially constant voltages between at least one external device and the circuit. The signal pads can be interleaved between the voltage pads. A module with one or more of these features can achieve ideal performance in both wire bond and flip chip packages with the flexibility of setting a different input/output utilization percentage within the module. | 01-14-2010 |
20100044756 | METHOD OF FABRICATING A SELF-ALIGNING DAMASCENE MEMORY STRUCTURE - A method of forming a memory cell is provided, the method including forming a first pillar-shaped element comprising a first semiconductor material, forming a first mold comprising an opening self-aligned with the first pillar-shaped element, and depositing a second semiconductor material in the opening to form a second pillar-shaped element above the first pillar-shaped element. Other aspects are also provided. | 02-25-2010 |
20100090253 | PROGRAMMABLE POWER MANAGEMENT USING A NANOTUBE STRUCTURE - Programmable power management using a nanotube structure is disclosed. In one embodiment, a method includes coupling a nanotube structure of an integrated circuit to a conductive surface when a command is processed, and enabling a group of transistors of the integrated circuit based on the coupling the nanotube structure to the conductive surface. A current may be applied to the nanotube structure to couple the nanotube structure to the conductive surface. The nanotube structure may be formed from a material chosen from one or more of a polymer, carbon, and a composite material. The group of transistors may be enabled during an activation sequence of the integrated circuit. In addition, one or more transistors of the group of transistors may be disengaged from the one or more power sources (e.g., to minimize leakage) when the nanotube structure is decoupled from the conductive surface. | 04-15-2010 |
20100155784 | Three-Dimensional Memory Structures Having Shared Pillar Memory Cells - A three-dimensional non-volatile memory system is disclosed including a memory array utilizing shared pillar structures for memory cell formation. A shared pillar structure includes two non-volatile storage elements. A first end surface of each pillar contacts one array line from a first set of array lines and a second end surface of each pillar contacts two array lines from a second set of array lines that is vertically separated from the first set of array lines. Each pillar includes a first subset of layers that are divided into portions for the individual storage elements in the pillar. Each pillar includes a second subset of layers that is shared between both non-volatile storage elements formed in the pillar. The individual storage elements each include a steering element and a state change element. | 06-24-2010 |
20100213515 | Metal or Via Programmable Element - An integrated circuit may include one or more cells, with each cell comprising a first and a second input terminal, a first and a second output terminal, and a number of connection stages configured to couple each input terminal to a corresponding respective output terminal. The stages may include one stage per metal layer of the integrated circuit and one stage per VIA layer of the integrated circuit. Each stage may be configured with a pair of input ports and a pair of output ports. Each output port of a stage may serially connect to a corresponding respective input port of a first adjacent stage, and each input port of the stage may also serially connect to a corresponding respective output port of a second adjacent stage. The pair of input ports may also be configured to programmably connect to the pair of output ports within the same stage, according to one of two different connection patterns, to establish a respective connection within the stage. A combination of the respective connections within the stages may determine which input terminal of the cell connects to which output terminal of the cell. | 08-26-2010 |
20100283085 | Massively Parallel Interconnect Fabric for Complex Semiconductor Devices - An embodiment of this invention uses a massive parallel interconnect fabric (MPIF) at the flipped interface of a core die substrate (having the core logic blocks) and a context die (used for in circuit programming/context/customization of the core die substrate), to produce ASIC-like density and FPGA-like flexibility/programmability, while reducing the time and cost for development and going from prototyping to production, reducing cost per die, reducing or eliminating NRE, and increasing performance. Other embodiments of this invention enable debugging complex SoC through large contact points provided through the MPIF, provide for multi-platform functionality, and enable incorporating FGPA core in ASIC platform through the MPIF. | 11-11-2010 |
20100289064 | METHOD FOR FABRICATION OF A SEMICONDUCTOR DEVICE AND STRUCTURE - A semiconductor device comprising: a first single crystal silicon layer comprising first transistors, first alignment marks, and at least one metal layer overlying the first single crystal silicon layer, wherein the at least one metal layer comprises copper or aluminum more than other materials; and a second single crystal silicon layer overlying the at least one metal layers; wherein the second single crystal silicon layer comprises a plurality of second transistors arranged in substantially parallel bands wherein each of a plurality of the bands comprises a portion of the second transistors along an axis in a repeating pattern. | 11-18-2010 |
20110024800 | Shared Resources in a Chip Multiprocessor - In one embodiment, a node comprises a plurality of processor cores and a node controller configured to receive a first read operation addressing a first register. The node controller is configured to return a first value in response to the first read operation, dependent on which processor core transmitted the first read operation. In another embodiment, the node comprises the processor cores and the node controller. The node controller comprises a queue shared by the processor cores. The processor cores are configured to transmit communications at a maximum rate of one every N clock cycles, where N is an integer equal to a number of the processor cores. In still another embodiment, a node comprises the processor cores and a plurality of fuses shared by the processor cores. In some embodiments, the node components are integrated onto a single integrated circuit chip (e.g. a chip multiprocessor). | 02-03-2011 |
20110049577 | SYSTEM COMPRISING A SEMICONDUCTOR DEVICE AND STRUCTURE - A system includes a semiconductor device. The semiconductor device includes a first single crystal silicon layer comprising first transistors, first alignment marks, and at least one metal layer overlying the first single crystal silicon layer, wherein the at least one metal layer comprises copper or aluminum more than other materials; and a second single crystal silicon layer overlying the at least one metal layer. The second single crystal silicon layer comprises a plurality of second transistors arranged in substantially parallel bands. Each of a plurality of the bands comprises a portion of the second transistors along an axis in a repeating pattern. | 03-03-2011 |
20110084314 | SYSTEM COMPRISING A SEMICONDUCTOR DEVICE AND STRUCTURE - A system includes a semiconductor device. The semiconductor device includes a first single crystal silicon layer comprising first transistors, first alignment marks, and at least one metal layer overlying the first single crystal silicon layer, wherein the at least one metal layer comprises copper or aluminum more than other materials; and a second single crystal silicon layer overlying the at least one metal layer. The second single crystal silicon layer comprises a plurality of second transistors arranged in substantially parallel bands. Each of a plurality of the bands comprises a portion of the second transistors along an axis in a repeating pattern. | 04-14-2011 |
20110233618 | NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME - A non-volatile semiconductor memory device and a method of manufacturing the same of the embodiments are provided. The non-volatile semiconductor memory device includes: drain contact plugs formed in memory cell regions and having bottom ends joined to drain diffusion layers of the respective memory cells; a local interconnect provided to extend in a WL direction across the memory cell regions and a shunt region, and having a bottom end joined commonly to plural source diffusion layers; drain via plugs formed in the memory cell regions and having bottom ends joined to the top ends of the respective drain contact plugs; and a power supply via for source formed in the shunt region to extend in a BL direction, and having a bottom end joined to the top end of the local interconnect. | 09-29-2011 |
20110241078 | Stacked Bit Line Dual Word Line Nonvolatile Memory - An arrangement of nonvolatile memory devices, having at least one memory device level stacked level by level above a semiconductor substrate, each memory level comprising an oxide layer substantially disposed above a semiconductor substrate, a plurality of word lines substantially disposed above the oxide layer; a plurality of bit lines substantially disposed above the oxide layer; a plurality of via plugs substantially in electrical contact with the word lines and, an anti-fuse dielectric material substantially disposed on side walls beside the bit lines and substantially in contact with the plurality of bit lines side wall anti-fuse dielectrics. | 10-06-2011 |
20120068229 | Massively Parallel Interconnect Fabric for Complex Semiconductor Devices - An embodiment of this invention uses a massive parallel interconnect fabric (MPIF) at the flipped interface of a core die substrate (having the core logic blocks) and a context die (used for in circuit programming/context/customization of the core die substrate), to produce ASIC-like density and FPGA-like flexibility/programmability, while reducing the time and cost for development and going from prototyping to production, reducing cost per die, reducing or eliminating NRE, and increasing performance. Other embodiments of this invention enable debugging complex SoC through large contact points provided through the MPIF, provide for multi-platform functionality, and enable incorporating FGPA core in ASIC platform through the MPIF. Various examples are also given for different implementations. | 03-22-2012 |
20120086050 | Massively Parallel Interconnect Fabric for Complex Semiconductor Devices - An embodiment of this invention uses a massive parallel interconnect fabric (MPIF) at the flipped interface of a core die substrate (having the core logic blocks) and a context die (used for in circuit programming/context/customization of the core die substrate), to produce ASIC-like density and FPGA-like flexibility/programmability, while reducing the time and cost for development and going from prototyping to production, reducing cost per die, reducing or eliminating NRE, and increasing performance. Other embodiments of this invention enable debugging complex SoC through large contact points provided through the MPIF, provide for multi-platform functionality, and enable incorporating FGPA core in ASIC platform through the MPIF. | 04-12-2012 |
20120146099 | RECONFIGURABLE RF/DIGITAL HYBRID 3D INTERCONNECT - Reconfigurable | 06-14-2012 |
20120193682 | SYSTEM OF DYNAMIC AND END-USER CONFIGURABLE ELECTRICAL INTERCONNECTS - A dynamic and end-user configurable controlled impedance interconnect line includes a plurality of conductive pixels, a plurality of thin-film transition material interconnects to electrically connect adjacent conductive pixels in the plurality of conductive pixels, and a plurality of addressable pixel interconnect actuators to selectively heat a respective plurality of the thin-film transition material interconnects. The plurality of addressable pixel interconnect actuators is operable to selectively heat a respective plurality of the thin-film transition material interconnects to form an interconnect line. | 08-02-2012 |
20120261724 | STACKABLE PROGRAMMABLE PASSIVE DEVICE AND A TESTING METHOD - A programmable passive device comprising a first node and a second node. A plurality of passive device elements electrically coupled to the first node. A plurality of switches are electrically coupled to at least the second node and selectively coupled to a number of the plurality of passive device elements to provide the programmable passive device with a pre-determined value. | 10-18-2012 |
20120273843 | SEMICONDUCTOR MEMORY DEVICE AND REPAIR METHOD THEREOF - A semiconductor memory device includes at least one first semiconductor chip including a plurality of memory cells and a second semiconductor chip including a fuse circuit configured to repair defective cells among the memory cells of the at least one first semiconductor chip. | 11-01-2012 |
20120280282 | Three Dimensional Multilayer Circuit - A three dimensional multilayer circuit ( | 11-08-2012 |
20130181257 | APPARATUS FOR FLEXIBLE ELECTRONIC INTERFACES AND ASSOCIATED METHODS - A semiconductor die includes at least one flexible interface block. The flexible interface block includes at least one interconnect, and at least one buffer coupled to the at least one interconnect. The flexible interface block further includes a routing interface coupled to circuitry integrated in the semiconductor die, and a controller coupled to provide communication between the routing interface and the at least one buffer. | 07-18-2013 |
20140151752 | ACCESSING OR INTERCONNECTING INTEGRATED CIRCUITS - Multiple integrated circuits (ICs) die, from different wafers, can be picked-and-placed, front-side planarized using a vacuum applied to a planarizing disk, and attached to each other or a substrate. The streets between the IC die can be filled, and certain techniques or fixtures allow application of monolithic semiconductor wafer processing for interconnecting different die. High density I/O connections between different IC die can be obtained using structures and techniques for aligning vias to I/O structures, and programmably routing IC I/O lines to appropriate vias. Existing IC die can be retrofitted for such interconnection to other IC die, such as by using similar techniques or tools. | 06-05-2014 |
20140217473 | DEVICE COMPRISING NANOSTRUCTURES AND METHOD OF MANUFACTURING THEREOF - A method for manufacturing of a device including a first substrate including a plurality of sets of nanostructures arranged on the first substrate, wherein each of the sets of nanostructures is individually electrically addressable, the method including the steps of: providing a substrate having a first face, the substrate having an insulating layer including an insulating material arranged on the first face of the substrate forming an interface between the insulating layer and the substrate; providing a plurality of stacks on the first substrate, wherein each stack includes a first conductive layer and a second conductive layer; heating the first substrate having the plurality of stacks arranged thereon in a reducing atmosphere to enable formation of nanostructures on the second conductive material; heating the first substrate having the plurality of stacks arranged thereon in an atmosphere such that nanostructures are formed on the second layer. | 08-07-2014 |
20140246704 | INTEGRATED CIRCUIT DEVICE - An integrated circuit device includes a fuse in which a pair of terminal portions connected to different conductive components is provided on both sides of a cuttable portion that is cut as needed by being irradiated with laser light, the cuttable portion and the pair of terminal portions being integrally formed. The cuttable portion may be thinner than the terminal portions. | 09-04-2014 |
20140246705 | Programmable Leakage Test For Interconnects In Stacked Designs - Aspects of the invention relate to techniques of testing interconnects in stacked designs for leakage defects. Logic “1” or “0” is first applied to one end of an interconnect during a first pulse. Then, logic value at the one end is captured, which triggered by an edge of a second pulse. The first pulse precedes the second pulse by a time period being selected from a plurality of delay periods. The plurality of delay periods is generated by a device shared by a plurality of interconnects. | 09-04-2014 |
20140252419 | MEMS DEVICE AND METHOD OF MANUFACTURE - A MEMS logic device comprising agate which pivots on a torsion hinge, two conductive channels on the gate, one on each side of the torsion hinge, source and drain landing pads under the channels, and two body bias elements under the gate, one on each side of the torsion hinge, so that applying a threshold bias between one body bias element and the gate will pivot the gate so that one channel connects the respective source and drain landing pad, and vice versa. An integrated circuit with MEMS logic devices on the dielectric layer, with the source and drain landing pads connected to metal interconnects of the integrated circuit. A process of forming the MEM switch. | 09-11-2014 |
20140332856 | VERTICAL ELECTRONIC FUSE - An electronic fuse structure including a first M | 11-13-2014 |
20160134288 | THREE DIMENSIONAL INTEGRATED CIRCUITS - A three-dimensional semiconductor device, comprising: a first module layer having a plurality of circuit blocks; and a second module layer positioned substantially above the first module layer, including a plurality of configuration circuits; and a third module layer positioned substantially above the second module layer, including a plurality of circuit blocks; wherein, the configuration circuits in the second module control a portion of the circuit blocks in the first and third module layers. | 05-12-2016 |
20180026043 | VERTICALLY STACKED FINFET FUSE | 01-25-2018 |