Entries |
Document | Title | Date |
20080197489 | Packaging conductive structure and method for manufacturing the same - A packaging conductive structure for a semiconductor substrate and a method for manufacturing the structure are provided. The structure comprises an under bump metal (UBM) that overlays a pad of the semiconductor substrate. At least one auxiliary component is disposed on the UBM. Then, a bump conductive layer is disposed thereon and a bump is subsequently formed on the bump conductive layer. Thus, the bump can electrically connect to the pad of the semiconductor substrate through the UBM and the bump conductive layer and can provide better junction buffer capabilities and conductivity. | 08-21-2008 |
20080197490 | Conductive structure for a semiconductor integrated circuit and method for forming the same - A conductive structure for a semiconductor integrated circuit and method for forming the conductive structure are provided. The semiconductor integrated circuit has a pad and a passivation layer partially overlapping the pad to define the first lateral size of the first opening. The conductive structure electrically connects to the pad via the first opening. The conductive structure overlaps the first opening portion and parts of the passivation layer to provide a lower conductive resistance for the pad when connecting to a bump. Meanwhile, the conductive structure provides no discontinuity over the passivation layer in other places, thereby providing a stable conduction. | 08-21-2008 |
20080197491 | SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING THE SAME - The semiconductor device includes a silicon interposer made of a semiconductor and a first semiconductor chip mounted on one surface of the silicon interposer. The semiconductor device is provided with a through electrode penetrating the silicon interposer and having a side surface insulated from the silicon interposer; and a wiring connecting one end of the through electrode and the silicon interposer. The through electrode is connected to a power supply wiring or a GND wiring provided on the first semiconductor chip. | 08-21-2008 |
20080197492 | Semiconductor device, connecting member, method for manufacturing a semiconductor device and method for manufacturing a connecting member - A semiconductor device has a semiconductor element having a plurality of connection terminals, a circuit substrate electrically connected with the semiconductor element; and a connecting member arranged between the semiconductor element and the circuit substrate having a plurality of conductive projections each having a columnar portion, each of columnar portions are connected with each of connection terminals, a cross section of the columnar portion along a plane parallel to a surface of the semiconductor element being smaller than a surface area of each of connection terminals of the semiconductor element. | 08-21-2008 |
20080203563 | SEMICONDUCTOR PACKAGE AND MANUFACTURING METHOD THEREOF - A COF package in exemplary form includes a flexible base film, inner leads each made of metal and having a thickness d | 08-28-2008 |
20080203564 | Semiconductor device having stress alleviating portion positioned at outer circumference of chip, wiring substrate, and method for producing the same - A semiconductor device has a wiring substrate, a semiconductor chip, a conductive bump, and an under-fill resin. The wiring substrate has a solder resist layer, and a stress alleviating portion. The stress alleviating portion is mounted on the solder resist layer opposed to the outer circumference of the semiconductor chip. The material of the stress alleviating portion is different from that of the solder resist layer. The stress alleviating portion alleviates the stress acting on the solder resist layer and the under-fill resin. The semiconductor chip is mounted above the wiring substrate via the conductive bump. The gap between the wiring substrate and the semiconductor chip is filled with the under-fill resin. | 08-28-2008 |
20080203565 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - The semiconductor device | 08-28-2008 |
20080211092 | ELECTRONIC ASSEMBLY HAVING A MULTILAYER ADHESIVE STRUCTURE - An electronic assembly comprising a first substrate, a number of bonds on the first substrate, a second substrate spaced apart from the first substrate, a number of bumps on the second substrate, each of the bumps including an insulating body and a conductive portion, the conductive portion extending from a top surface of the insulating body via at least one sidewall of the insulating body toward the second substrate, and an adhesive between the first substrate and the second substrate, the adhesive including an insulating layer and a conductive layer, the insulating layer and the conductive layer being laminated with respect to each other, wherein the insulating layer is positioned closer to the first substrate than the conductive layer. | 09-04-2008 |
20080217767 | Stacked-Chip Semiconductor Device - A chip stacking semiconductor device which can be used without mounting a converter circuit and without altering the circuitry of the semiconductor chips even when semiconductor chips stacked in a plurality of stages are connected electrically. Through wiring ( | 09-11-2008 |
20080217768 | System and method for increased stand-off height in stud bumping process - System and method for creating single stud bumps having an increased stand-off height. A preferred embodiment comprises a capillary for use in creating stud bumps in a flip chip assembly, comprising a hole section adapted to pass a wire, a chamfer section providing a transition from the hole section to a stud bump section, and a sidewall within the stud bump section, the sidewall having a sidewall height, wherein the side wall height is equal to, or greater than, the a diameter of the stud bump section. | 09-11-2008 |
20080217769 | SEMICONDUCTOR MODULE, METHOD OF MANUFACTURING SEMICONDUCTOR MODULE, AND MOBILE DEVICE - An electrode for a semiconductor device is formed on the mounting surface (particularly, the outer periphery thereof) of a semiconductor substrate in a semiconductor module. In order to secure a large gap between the electrodes, an insulating layer is formed on the electrode. Also formed are a plurality of bumps penetrating the insulating layer and connected to the electrode, and a rewiring pattern integrally formed with the bumps. The rewiring pattern includes a bump area and a wiring area extending contiguously with the bump area. | 09-11-2008 |
20080217770 | MOUNTING CONFIGURATION OF ELECTRONIC COMPONENT - An electronic component mounting configuration in which an electronic component chip having a plurality of protrusion-shaped electrodes distributed on its entire mounting surface is mounted through protrusion-shaped electrodes on a printed circuit board is provided which is capable of improving reliability of an electronic component by relieving thermal stress. The solder bumps are arranged so that intervals between solder bumps adjacent to one another become smaller from a central portion of a mounting surface of the electronic component chip toward the peripheral portion thereof. For example, an interval between the solder bump “ | 09-11-2008 |
20080217771 | Metallic electrode forming method and semiconductor device having metallic electrode - A metallic electrode forming method includes: forming a bed electrode on a substrate; forming a protective film with an opening on the bed electrode to expose the bed electrode from the opening; forming a metallic film covering the protective film and the opening; mounting the substrate on an adsorption stage, and measuring a surface shape of the metallic film by a surface shape measuring means; deforming the substrate by a deforming means so that a difference between the principal surface and a cutting surface is within a predetermined range; measuring a surface shape of the principal surface, and determining whether the difference is within a predetermined range; and cutting the substrate along with the cutting surface so that the metallic film is patterned to be a metallic electrode. | 09-11-2008 |
20080217772 | Semiconductor device manufacturing method and semiconductor device - The present invention provides a method for forming a semiconductor device, which comprises the steps of preparing a semiconductor wafer including an electrode pad, an insulating film formed with a through hole and a bedding metal layer which are formed in a semiconductor substrate, forming a first resist mask which exposes each area for forming a redistribution wiring, over the bedding metal layer, forming a redistribution wiring connected to the electrode pad and extending in an electrode forming area for a post electrode with the first resist mask as a mask, removing the first resist mask by a dissolving solution to expose each area excluding the electrode forming area for the redistribution wiring and forming a second resist mask disposed with being separated from each side surface of the redistribution wiring, forming a redistribution wiring protective metal film over upper and side surfaces of the exposed redistribution wiring with the second resist mask as a mask, removing the second resist mask by a dissolving solution, attaching a dry film over the semiconductor wafer and exposing the electrode forming area lying over the redistribution wiring, forming a post electrode in the electrode forming area with the dry film as a mask, removing the dry film by a removal solvent, and removing the redistribution wiring protective metal film after the removal of the dry film. | 09-11-2008 |
20080224307 | Semiconductor die with mask programmable interface selection - According to one exemplary embodiment, a semiconductor die with on-die preferred interface selection includes at least two groups of pads situated on an active surface of the semiconductor die, where each of the at least two groups of pads is coupled to its associated interface in the die. A set of bumps is mask-programmably routed to one of the at least two groups of pads, thereby selecting the preferred interface for the semiconductor die. A non-preferred interface is not routed to any bumps on the active surface of the semiconductor die, thereby reducing bump count on the die. Each of the at least two groups of pads can be situated in a corresponding pad ring on the active surface of said semiconductor die. The at least two groups of pads can be laid out substantially inline. | 09-18-2008 |
20080224308 | SEMICONDUCTOR PACKAGE AND FABRICATING METHOD THEREOF - Provided is a semiconductor device including a substrate, an electrode pad disposed on the substrate, an external terminal disposed on the electrode pad, a container extended from the electrode pad into the external terminal, and a conductive liquid disposed inside the container. The conductive liquid solidifies when exposed to air. When a crack forms in the external terminal, the container suppresses propagation of the crack. Further, if the crack breaches the container, the conductive liquid fills the crack, thereby minimizing further crack propagation and recovering the resistance characteristics of the external terminal prior to the crack formation. A method of forming a semiconductor device including a container having a conductive liquid is also provided. | 09-18-2008 |
20080224309 | SEMICONDUCTOR DEVICE MOUNTED ON SUBSTRATE, AND MANUFACTURING METHOD THEREOF - The connection technology is provided in which, at the time of mounting the semiconductor device on the substrate, the thermal load or the stress, which is imposed upon the semiconductor device, is little, a reliability of the semiconductor device is obtained, a stand-off of the semiconductor device mounted on the substrate can be secured appropriately, and moreover the short circuit hardly occurs between the pads of the semiconductor device mounted on the substrate. | 09-18-2008 |
20080224310 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE - A method for manufacturing a semiconductor device includes: preparing a wiring board having a base substrate and wiring that is plated on surface with a plating metal; pressing a bump that is formed on the active side of the semiconductor chip against an end part of the wiring of the wiring board, thereby exfoliating the area surrounding the pressed portion of the wiring from the base substrate while keeping the end of the wiring bonded with the base substrate; melting the plating metal that is located on the end part of the wiring, thereby causing the plating metal and the bump to form an alloy that bonds the bump and the wiring and infiltrate the plating metal into a space between the wiring and the base substrate; and judging that the bump and the wiring are well bonded if the plating metal has infiltrated a space between the wiring and the base substrate so as to have an area, width or length of infiltration that exceeds a reference value. | 09-18-2008 |
20080224311 | SEMICONDUCTOR DEVICE - A semiconductor device is disclosed including a data family pad layout wherein an effort is made to contrive layouts of a power lead wire and a ground lead wire to minimize effective inductance in priority to a length of a lead wire between a pad and a solder ball land of a semiconductor chip. Pad layouts are arrayed in two rows and one unit of the pad layout is configured such that a data power source and ground are adjacent to each other or one data is inserted between the data power source and the ground. Such configurations decrease mutual inductance between the data power sources and increase mutual inductance between the data power source and the ground causing reduction in effective inductance between the data power source and the ground with the resultant minimization of power and ground noises. | 09-18-2008 |
20080230896 | Copper die bumps with electromigration cap and plated solder - Embodiments of the invention include apparatuses and methods relating to copper die bumps with electromigration cap and plated solder. In one embodiment, an apparatus comprises an integrated circuit die, a plurality of copper bumps on a surface of the die, electromigration (EM) caps substantially covering a mating surface of the copper bumps capable of controlling intermetallic formation between the copper bumps and a solder, and solder plating on the EM caps capable of protecting the EM caps from oxidation prior to packaging. | 09-25-2008 |
20080230897 | METHOD OF MANUFACTURING ELECTRONIC DEVICE, SUBSTRATE AND SEMICONDUCTOR DEVICE - A method includes a step of forming a bump | 09-25-2008 |
20080230898 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THEREOF - A semiconductor device which includes a first semiconductor chip, a second semiconductor chip flip-chip bonded to the first semiconductor chip, a resin portion for sealing the first semiconductor chip and the second semiconductor chip such that a lower surface of the first semiconductor chip and an upper surface of the second semiconductor chip are exposed and a side surface of the first semiconductor chip is covered, and a post electrode which pierces the resin portion and is connected to the first semiconductor chip, and a manufacturing method thereof are provided. | 09-25-2008 |
20080230899 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - In a semiconductor device according to the present invention, a plurality of opening regions | 09-25-2008 |
20080230900 | DETERMINING THE PLACEMENT OF SEMICONDUCTOR COMPONENTS ON AN INTEGRATED CIRCUIT - Systems and methods are disclosed herein for determining the placement of a standard cell, representing a semiconductor component in a design stage, on an integrated circuit die. One embodiment of a method, among others, comprises analyzing regions of a semiconductor die with respect to the susceptibility of the region to be exposed to radiation. This method further comprises placing the standard cell in one of the analyzed regions of the semiconductor die, the standard cell being placed based on the sensitivity of the standard cell to radiation. The method may also comprise running an algorithm, e.g. using a component placement engine, for determining the placement of semiconductor components on an integrated circuit die. | 09-25-2008 |
20080237849 | Method and apparatus providing integrated circuit having redistribution layer with recessed connectors - A method of making a semiconductor die includes forming a trench around a conductive stud extending from the first side to a second side of a substrate to expose a portion of the stud and then forming a conductive layer inside the trench and in electrical contact with the stud. | 10-02-2008 |
20080237850 | COMPLIANT BUMP STRUCTURE AND BONDING STRUCTURE - A compliant bump structure includes a substrate, at least a first polymer bump, at least a second polymer bump and at least a conductive layer. The substrate has at least a pad on a surface thereof. The first polymer bump is disposed on the pad. The second polymer bump is disposed on the surface of the substrate outside the pad. The conductive layer is disposed on the first and second polymer bumps. | 10-02-2008 |
20080237851 | SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THEREOF, COMPOSITE METAL BODY AND MANUFACTURING METHOD THEREOF - A semiconductor device having a structure in which a semiconductor element and a Cu or Ni electrode are connected by way of a bonding layer comprising Cu, and the Cu bonding layer and the Cu or Ni electrode are diffusion-bonded to each other. The bonding layer is formed by conducting bonding in a reducing atmosphere by using a bonding material containing particles of Cu oxide with an average particle size of 1 nm to 50 μm and a reducing agent comprising an organic material, thereby providing excellent bonding strength to Ni or Cu electrode. | 10-02-2008 |
20080237852 | SEMICONDUCTOR DEVICE - Provided is a semiconductor device in which a high concentration n type impurity region to be a conductive path and a drain electrode are disposed in an outer circumferential end of the chip to be an inactive region as a device region. Thereby, an up-drain structure is obtained without reducing the device region or without increasing the size of a semiconductor chip. The provided n type impurity region and drain electrode causes a depletion layer of a substrate to be terminated without needing an additional conventional annular region or shield metal. This is because the n type impurity region and the drain electrode also function as the annular region and the shield metal, respectively. With this configuration, a MOSFET with the up-drain structure having necessary components is obtained, while avoiding a reduction of the device region or an increase of the chip area. | 10-02-2008 |
20080237853 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME - A conventional semiconductor device has a problem that reduction of a resistance value above a pad electrode is difficult because of an oxide film formed on a surface of the pad electrode. In a semiconductor device of this invention, an oxidation preventing metal layer is formed on a pad electrode, and the oxidation preventing metal layer is exposed at an opening region formed in a spin coat resin film at a portion above the pad electrode. In addition, a plating metal layer and a copper plated layer are formed on the oxidation preventing metal layer. With this structure, the resistance value above the pad electrode is reduced because the top surface of the pad electrode is difficult to oxidize, and the oxidation preventing metal layer having considerably smaller sheet resistivity than an oxidation film serves as part of a current path. | 10-02-2008 |
20080246144 | METHOD FOR FABRICATING CONTACT PADS - A method for fabricating a contact pad is disclosed. A first metal layer is disposed on a substrate for serving as a probing region. A second metal layer is disposed on the substrate thereafter to serve as an electrical connection region. Preferably, the first metal layer and the second metal layer are composed of different material and are electrically connected. The present invention uses two different metals to form a probing region and an electrical connection region of a contact pad. The probing region is used for providing a contacting surface for a test probe, whereas the electrical connection region is used for establishing an electrical connection in the later bumping or wire bonding process. By providing a contact pad having two different regions, the present invention is able to achieve probing process while prevent the surface of the contact pad from being damaged by the contact of test probes. | 10-09-2008 |
20080246145 | MOBILE BINDING IN AN ELECTRONIC CONNECTION - A method of creating an electrical contact involves locating a barrier material at a location for an electrical connection, providing an electrically conductive bonding metal on the barrier material, the electrically conductive bonding metal having a diffusive mobile component, the volume of barrier material and volume of diffusive mobile component being selected such that the barrier material volume is at least 20% of the volume of the combination of the barrier material volume and diffusive mobile component volume. An electrical connection has an electrically conductive bonding metal between two contacts, a barrier material to at least one side of the electrically conductive bonding metal, and an alloy, located at an interface between the barrier material and the electrically conductive bonding metal. The alloy includes at least some of the barrier material, at least some of the bonding metal, and a mobile material. | 10-09-2008 |
20080246146 | WIRING SUBSTRATE AND WIRING SUBSTRATE MANUFACTURING METHOD - A method of manufacturing a wiring substrate comprises: a first step of forming, on a support plate, an electrode pad made of metal; a second step of etching the support plate in such a manner that the support plate has a shape which includes a projection portion to be contacted with the electrode pad; a third step of forming, on the surface of the support plate, an insulating layer for covering the electrode pad; a fourth step of forming, on the surface of the insulating layer, a conductive pattern to be connected to the electrode pad; and, a fifth step of removing the support plate. | 10-09-2008 |
20080251913 | SEMICONDUCTOR DEVICE INCLUDING WIRING SUBSTRATE HAVING ELEMENT MOUNTING SURFACE COATED BY RESIN LAYER - In one embodiment of the present invention, there is provided a semiconductor device including a first semiconductor element mounted, through flip-chip bonding, on the element mounting surface of a first wiring substrate, and a resin layer that coats substantially the entire element mounting surface of the first wiring substrate. The first semiconductor element has two opposite surfaces. One surface faces the element mounting surface of the first wiring substrate, and the other surface is not coated by the resin layer. | 10-16-2008 |
20080251914 | SEMICONDUCTOR DEVICE - In a structure for connecting a semiconductor element having a fine pitch electrode at 50 pm pitch or less and a pad or wirings on a substrate, for preventing inter-bump short-circuit or fracture of a connected portion due to high strain generated upon heating or application of load during connection, the substrate and the semiconductor element are connected by way of a bump having a longitudinal elastic modulus (Young's modulus) of 65 GPa or more and 600 GPa or less and a buffer layer including one of tin, aluminum, indium, or lead as a main ingredient and, further, protrusions are formed to at least one of opposing surfaces of the bump and the pad or the wirings on the substrate to each other, and the surfaces are connected by ultrasonic waves. | 10-16-2008 |
20080251915 | Structure of semiconductor chip and package structure having semiconductor chip embedded therein - A semiconductor chip is disclosed, which comprises a chip having an active surface; plural electrode pads disposed on the active surface of the chip; a first passivation layer disposed on the chip, which has openings corresponding to the electrode pads to expose the electrode pads, wherein the first passivation layer is made of a material having high alkali resistance and low coefficient of elasticity; and plural metal bumps disposed in the openings of the first passivation layer. Therefore, as forming the metal bumps by a chemical deposition technique, the damage to the passivation layer can be prevented. Besides, as the semiconductor chip is embedded in a package structure, the problem of delamination occurred due to the mismatch in the coefficients of thermal expansion of the semiconductor chip and the dielectric layers can be avoided. Accordingly, the yield of the package structure having the semiconductor chip embedded therein can be improved. | 10-16-2008 |
20080258297 | METHOD OF MAKING SOLDER PAD - A method of making a solder pad includes providing a substrate having a metal layer formed on it, and applying a photo resist to the metal layer. The photo resist is patterned. A first etching operation is performed on the metal layer to form voids in the metal layer. A second etching operation is performed on the metal layer to form the solder pad. A solder mask is formed on the substrate and a portion of the solder pad. | 10-23-2008 |
20080258298 | SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME - Embodiments include a semiconductor device comprising: a pad formed on an insulating layer and having an electric connection region with external components; and a protective insulating layer which has an aperture for exposing the electric connection region. The protective insulating layer may include a first insulating layer and a second insulating layer, and side surfaces of these insulating layers are exposed to the aperture. At least part of the side surfaces surrounding the electric connection region have a tapered configuration at an acute angle to a top surface of the pad. This semiconductor device not only enables reduction of the fabrication steps, but also provides a reliable passivation structure for a pad with sufficient thickness and stress relaxation characteristics. | 10-23-2008 |
20080258299 | Method of manufacturing a semiconductor device having an even coating thickness using electro-less plating, and related device - A method of manufacturing a semiconductor device includes forming a diffusion barrier layer on a substrate, and forming at least two features on the substrate such that the diffusion barrier layer is respectively disposed between each feature and the substrate and contacts the at least two features. A first impurity region of the substrate contains impurities of a first type, a second impurity region of the substrate contains impurities of a second type, different from the first type, a first feature of the at least two features is in the first impurity region, and a second feature of the at least two features is in the second impurity region, such that the second feature is electrically isolated from first feature by the different impurity regions. | 10-23-2008 |
20080258300 | WIRING BOARD MANUFACTURING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND WIRING BOARD - A semiconductor device | 10-23-2008 |
20080265410 | Wafer level package - A wafer level package includes a substrate, a passivation layer, an elastic layer, a first insulation layer, a metal trace, a second insulation layer, and a bump. The passivation layer is formed on the substrate, and has one pad. The elastic layer is formed on the passivation layer. The first insulation layer is formed on the passivation layer and the elastic layer, and has a junction in contact with the pad. The metal trace is formed on the first insulation layer. The second insulation layer is formed on the metal trace, and a groove is formed correspondingly above the elastic layer. The bump is formed in the groove. An annular trench can be further formed around the bump. A groove can be furthermore formed in the first insulation layer correspondingly below the bump. | 10-30-2008 |
20080265411 | Structure of packaging substrate and method for making the same - A structure of a packaging substrate and a method for making the same are disclosed, wherein the structure comprises: a substrate body having a circuit layer on the surface thereof, wherein the circuit layer has a plurality of conductive pads which are each formed in a flat long shape to enhance the elasticity of circuit layout; a solder mask disposed on the substrate body and having a plurality of openings corresponding to and exposing the conductive pads, wherein the openings are each formed in a flat long shape; and a metal bump disposed in each of the openings of the solder mask and on each of the corresponding conductive pads. | 10-30-2008 |
20080265412 | Semiconductor device and method of manufacturing thereof - A package substrate has wires that electrically connect a semiconductor chip, and surface side terminals that are solid cylindrical and whose one ends are electrically connected to the wires. The semiconductor chip is sealed by a sealing resin. A surface of the sealing resin is made to be a same height (a same surface) as end surfaces of other ends of the surface side terminals, by grinding, from a surface, a resin layer that is formed by molding so as to cover the semiconductor chip. The surface of the sealing resin is a ground surface formed by grinding. The end surfaces of the surface side terminals are exposed at the ground surface of the sealing resin. | 10-30-2008 |
20080265413 | SEMICONDUCTOR CHIP WITH POST-PASSIVATION SCHEME FORMED OVER PASSIVATION LAYER - The invention provides a semiconductor chip comprising an interconnecting structure over said passivation layer. The interconnecting structure comprises a first contact pad connected to a second contact pad exposed by an opening in a passivation layer. A metal bump is on the first contact pad and over multiple semiconductor devices, wherein the metal bump has more than 50 percent by weight of gold and has a height of between 8 and 50 microns | 10-30-2008 |
20080272486 | CHIP PACKAGE STRUCTURE - A chip package structure includes a carrier, an interposer, a plurality of electrically conductive elements, a first sealant, a chip, and a second sealant. The interposer is disposed on the carrier. The electrically conductive elements electrically connect the interposer and the carrier. The first sealant seals the electrically conductive elements. A plurality of bumps of the chip is connected to the interposer. The second sealant seals the bumps. A first glass transition temperature of the first sealant is higher than a second glass transition temperature of the second sealant. Since glass transition temperatures of the first sealant and the second sealant are different, and the first glass transition temperature of the first sealant is higher than the second glass transition temperature of the second sealant, the inner stress will be lowered and the yield is promoted. | 11-06-2008 |
20080272487 | SYSTEM FOR IMPLEMENTING HARD-METAL WIRE BONDS - A wire bond system including providing an integrated circuit die with a bond pad thereon, forming a soft bump on the bond pad, and wire bonding a hard-metal wire on the soft bump. | 11-06-2008 |
20080277783 | PRINTED CIRCUIT BOARD AND FLIP CHIP PACKAGE USING THE SAME WITH IMPROVED BUMP JOINT RELIABILITY - A printed circuit board and a flip chip package using the same are designed to minimize thermal stress due to different thermal coefficients present in areas having metal lines and solder resist versus other areas on the printed circuit board. The printed circuit board includes an insulation layer; a first metal line formed on one surface of the insulation layer and having at one end thereof a bump land and a projection which integrally extends from the bump land; a second metal line formed on the other surface of the insulation layer and having at one end thereof a ball land; a via metal line formed through the insulation layer to connect the first and second metal lines to each other; and solder resists formed on the upper and lower surfaces of the insulation layer to expose the bump land and the ball land. | 11-13-2008 |
20080277784 | Semiconductor chip and manufacturing method thereof - A semiconductor chip formed with a bump such that the bump corresponds to a pad electrode. The pad electrode is covered with a nickel layer. The bump has an indium layer and an intermediate metal compound layer disposed between the indium layer and the nickel layer, and the intermediate metal compound layer is formed by alloying the indium layer and a copper layer containing copper atoms of not less than 0.5 atomic percent and not more than 5 atomic percent with respect to the indium atoms in the indium layer. | 11-13-2008 |
20080277785 | PACKAGE STRUCTURE FOR INTEGRATED CIRCUIT DEVICE AND METHOD OF THE SAME - A package structure for packaging at least one of a plurality of integrated circuit devices of a wafer is provided. The package structure includes an extension metal pad, a first conductive bump and an insulator layer. The extension metal pad electrically contacts the at least one of the plurality of integrated circuit devices. The first conductive bump is located on the extension metal pad. The insulator layer is located over the at least one of the plurality of integrated circuit devices and on a sidewall of it. | 11-13-2008 |
20080284009 | Dimple free gold bump for drive IC - A conductive bump structure for an integrated circuit (IC) structure comprises a passivation layer, such as a silicon oxide/silicon nitride stack, that is formed on an upper surface of each of the conductive contact pads (e.g. Al pads) of the IC. A plurality of openings extend through the passivation layer to expose areas of the upper surface of the contact pad. The openings are larger in the longitudinal dimension than in the lateral dimension. A conductive bump, preferably comprising gold (Au), is formed on the passivation layer to extend through the openings in the passivation and into electrical contact with the exposed upper surface areas of the contact pad. | 11-20-2008 |
20080284010 | Apparatus for connecting integrated circuit chip to power and ground circuits - In a method and system for transferring at least one of power and ground signal between a die and a package base of a semiconductor device, a connector is formed there between. The connector, which is disposed above the die attached to the package base, includes a center pad electrically coupled to the die by a plurality of conductive bumps and a finger extending outward from the center pad towards the package base. The finger is electrically coupled to the package base by a conductive pad. A plurality of bond wires are formed to electrically couple the package base and the die. A resistance of a conductive path via the connector is much less than a resistance of a conductive path via any one of the plurality of bond wires to facilitate an efficient transfer of the at least one of power and ground signal. | 11-20-2008 |
20080284011 | BUMP STRUCTURE - A bump structure including at least one contact pad, at least one first polymer bump, at least one second polymer bump, and a conductive layer is provided. The contact pad is disposed on a substrate, and the first polymer bump is also disposed on the substrate. The second polymer bump is disposed on the substrate and is connected to the first polymer bump. The conductive layer covers the first polymer bump and electrically connects the contact pad. | 11-20-2008 |
20080284012 | SEMICONDUCTOR MODULE MANUFACTURING METHOD, SEMICONDUCTOR MODULE, AND MOBILE DEVICE - A semiconductor substrate having on its surface an electrode of a semiconductor device and a pattern unit is prepared. A copper plate is formed provided with a first principle surface having a bump and a second principle surface, opposite to the first principle surface, having a trench. By adjusting the position of the copper plate so that a pattern unit and the corresponding trench have a predetermined positional relation, the bump and the electrode are aligned, the first principle surface of the copper plate and a semiconductor substrate are pressure-bonded via an insulating layer, and the bump and the electrode become connected electrically while the bump penetrating the insulating layer. A predetermined rewiring pattern is formed on the side of the second principle surface. | 11-20-2008 |
20080284013 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE - A method for manufacturing a semiconductor device includes: when bonding a bump of an IC chip to a bonding position of a wiring pattern that is formed on an insulating film base member and has a surface covered by a plating layer, forming a plating layer around the bonding position among the wiring pattern at least in an outer peripheral section of a peeled surface of a portion of the wiring pattern peeled from the film base member. | 11-20-2008 |
20080284014 | CHIP ASSEMBLY - A chip assembly includes a semiconductor chip, a bump and an external circuit. The semiconductor chip includes a semiconductor substrate, a transistor in and on the semiconductor substrate, multiple dielectric layers over the semiconductor substrate, a metallization structure over the semiconductor substrate, wherein the metallization structure is connected to the transistor, and a passivation layer over the metallization structure, over the dielectric layers and over the transistor. The bump is connected to the metallization structure through an opening in the passivation layer, wherein the bump includes an adhesion/barrier layer and a gold layer over the adhesion/barrier layer. The external circuit can be connected to the bump using a tape carrier package (TCP), a chip-on-film (COF) package or a chip-on-glass (COG) assembly. | 11-20-2008 |
20080284015 | BUMP ON VIA-PACKAGING AND METHODOLOGIES - A semiconductor package with a semiconductor chip having under bump metallizations (UBMs) on a first surface and a substrate having open vias. The substrate is attached to the semiconductor chip with the UBMs in alignment with the open vias. An encapsulant surrounds the semiconductor chip and the substrate and a conductor fills the open vias to form external package connections. A method of forming a semiconductor package having external package connections includes providing a semiconductor chip having under bump metallizations (UBMs) on a first surface; attaching the first surface of the semiconductor chip to a substrate, the UBMs of the semiconductor chip being in alignment with open vias formed in the substrate; encapsulating the semiconductor chip and the substrate; and filling with open vias with a conductor to form the external package connections. | 11-20-2008 |
20080284016 | Reliable metal bumps on top of I/O pads after removal of test probe marks - In accordance with the objectives of the invention a new method is provided for the creation of metal bumps over surfaces of I/O pads. Contact pads are provided over the surface of a layer of dielectric. The aluminum of the I/O pads, which have been used as I/O pads during wafer level semiconductor device testing, is completely or partially removed over a surface area that is smaller than the surface area of the contact pad using methods of metal dry etching or wet etching. The contact pad can be accessed either by interconnect metal created in a plane of the contact pad or by via that are provided through the layer of dielectric over which the contact pad has been deposited. The process can be further extended by the deposition, patterning and etching of a layer of polyimide over the layer of passivation that serves to protect the contact pad. | 11-20-2008 |
20080290509 | Chip Scale Package and Method of Assembling the Same - A method of producing a chip scale package is disclosed. The method includes dicing a wafer into a plurality of chip arrays, each array including two or more integrated circuit chips. The method further includes mounting each array on a substrate and dicing each array, attached to the substrate, into individual chip scale packages, each individual chip scale package including only one integrated circuit chip. | 11-27-2008 |
20080290510 | APPARATUS FOR CRACK PREVENTION IN INTEGRATED CIRCUIT PACKAGES - A microelectronic package having integrated circuits is provided. The microelectronic package includes multiple dielectric laminate layers, copper circuitry between the dielectric laminate layers where the copper circuitry includes circuit traces, and ball grid arrays/land grid arrays operatively connected to the copper circuitry such that conduction occurs. Further, proximate to the connection of the copper circuitry and the ball grid arrays/land grid arrays, a protective copper tongue is below an extension of the circuit traces, such that the protective copper tongue prevents the circuit traces from being affected by cracking propagated in the dielectric laminate layers or the ball grid arrays/land grid arrays. | 11-27-2008 |
20080290511 | Chip Assembly and Method of Manufacturing Thereof - An assembly of a first chip ( | 11-27-2008 |
20080290512 | SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF - For a suppressed breakage after a flip chip connection of a semiconductor device using a low-permittivity insulation film and a lead-free solder together, with an enhanced production yield, bump electrodes ( | 11-27-2008 |
20080296758 | Protection and Connection of Devices Underneath Bondpads - A circuit structure and a method for reducing stresses on semiconductor devices fabricated underneath bondpads include metal layers with a lattice planar configuration which spreads forces applied such as during wafer test probing or during wire bonding. Easing electrical connectivity among circuit elements and maintaining circuit performance is also carried out using the lattice. The lattice has metal strips which may connect circuit elements together or which may connect to a reference voltage source. The metal layer and bondpad corners and edges are formed preferentially without acute angles. | 12-04-2008 |
20080296759 | SEMICONDUCTOR PACKAGES - A semiconductor package comprises a semiconductor component (e.g., a die) and a via at least partially covered by an encapsulant. The encapsulant forms substantially parallel top and bottom surfaces, with at least part of the via being exposed on the top surface. At least one conductive pad is exposed on the bottom surface, and the via can electrically couple the top and bottom surfaces, as well as couple the semiconductor component at the top and bottom surfaces. An additional semiconductor component can be coupled to the top surface with a circuit pattern formed on the top surface and coupled to the via. | 12-04-2008 |
20080296760 | SEMICONDUCTOR APPARATUS AND METHOD FOR MANUFACTURING SAME - A semiconductor apparatus includes a semiconductor device having electrodes on its opposed frontside and backside, respectively, a first external electrode connected to the electrode at the frontside, the first external electrode having a first major surface generally parallel to the frontside of the semiconductor device, and a first side surface generally perpendicular to the first major surface, and a second external electrode having a second major surface generally parallel to the backside of the semiconductor device, a second side surface generally perpendicular to the second major surface, and a projection protruding perpendicular to the second major surface and connected to the electrode at the backside, The first side surface of the first external electrode and the second side surface of the second external electrode serve as mount surfaces. The semiconductor device is located between the first external electrode and the second external electrode. | 12-04-2008 |
20080296761 | Cylindrical Bonding Structure and method of manufacture - A cylindrical bonding structure and its method of manufacture. The cylindrical bonding structure is formed over the bonding pad of a silicon chip and the chip is flipped over to connect with a substrate board in the process of forming a flip-chip package. The cylindrical bonding structure mainly includes a conductive cylinder and a solder block. The conductive cylinder is formed over the bonding pad of the silicon chip and the solder block is attached to the upper end of the conductive cylinder. The solder block has a melting point lower than the conductive cylinder. The solder block can be configured into a cylindrical, spherical or hemispherical shape. To fabricate the cylindrical bonding structure, a patterned mask layer having a plurality of openings that correspond in position to the bonding pads on the wafer is formed over a silicon wafer. Conductive material is deposited into the openings to form conductive cylinders and finally a solder block is attached to the end of each conductive cylinder. | 12-04-2008 |
20080296762 | SEMICONDUCTOR DEVICE - A semiconductor device of the invention includes a semiconductor substrate having a first insulating section formed on one surface thereof. A first conductive section is disposed on the one surface of the semiconductor substrate. A second insulating section is superimposed over the first insulating section and covers the first conductive section. A second conductive section is superimposed over the second insulating section. A third insulating section is disposed over the second insulating section and covers the second conductive section. These first conductive section, second insulating section, second conductive section, third insulating section, and terminal altogether constitute a structure. A third opening is formed between adjacent structures. The third opening is formed passing through the third and second insulating sections to expose the first insulating section. | 12-04-2008 |
20080303142 | ELECTRONIC SYSTEM WITH VERTICAL INTERMETALLIC COMPOUND - An electronic system is provided including forming a substrate having a contact, forming a conductive structure over the contact, mounting an electrical device having an external interconnect over the conductive structure, and forming a conductive protrusion from the conductive structure in the external interconnect. | 12-11-2008 |
20080303143 | Microelectronic Die Including Locking Bump and Method of Making Same - A microelectronic die and a method of providing same. The die includes a die substrate having an active surfaces and a locking bump on the active surface of the die substrate. The locking bump defines a recess adapted to receive therein a solder bump of a package substrate such that an apex of the solder bump contacts a bottom of the recess. | 12-11-2008 |
20080303144 | STRUCTURE, METHOD AND SYSTEM FOR ASSESSING BONDING OF ELECTRODES IN FCB PACKAGING - Structures, methods, and systems for assessing bonding of electrodes in FCB packaging are disclosed. In one embodiment, a method comprises mounting a semiconductor chip with a plurality of first electrodes of a first shape to a mounted portion with a second electrode of a second shape, wherein the second shape is different from the first shape, bonding a respective on of the plurality of first electrodes and the second electrode using a first solder bump, generating an X-ray image of the first solder bump, and determining an acceptability of the bonding of the respective one of the plurality of first electrodes and the second electrode based on the X-ray image of the first solder bump. | 12-11-2008 |
20080303145 | Printed Circuit Board, Printed Circuit Board Manufacturing Method and Electronic Device - According to one embodiment, there is provided a printed circuit board which comprises a printed wiring board, a semiconductor package having a number of solder bonding members arranged on its back side and mounted on the printed wiring board by the solder bonding members being soldered to the wiring board, and reinforcing members which are formed of a reinforcing material having a solder flux function and locally reinforce the solder bonding members in a number of places on the semiconductor package mounting portion of the printed wiring board. | 12-11-2008 |
20080303146 | PROCESS FOR MANUFACTURING SUBSTRATE WITH BUMPS AND SUBSTRATE STRUCTURE - A process for manufacturing a substrate with bumps is provided. First, a metallic substrate having a body and a plurality of conductive elements is provided. Next, a first dielectric layer is formed on the body, and the conductive elements are covered by the first dielectric layer. Then, a plurality of circuits and a plurality of contacts are formed on a surface of the first dielectric layer, and the contacts are electrically connected to the conductive elements. Next, a second dielectric layer is formed on the surface of the first dielectric layer, and the circuits are covered by the second dielectric layer. Finally, the body is patterned to form a plurality of bumps, and the bumps are electrically connected to the contacts by the conductive elements. The bumps are formed by etching the body, so the connection reliability between bumps and conductive elements is desirable, and the manufacturing cost is reduced. | 12-11-2008 |
20080303147 | HIGH-FREQUENCY CIRCUIT DEVICE AND RADAR - A semiconductor chip is provided with a high-frequency circuit. A multi-layer wiring section is comprised of organic material and formed on the semiconductor chip, an outermost layer of the multi-layer wiring section formed with a bump forming portion. A bump is formed on the bump forming portion. The multi-layer wiring section is provided with a reinforcing means for suppressing a deformation of a bonding portion between the bump and the bump forming portion when the high-frequency circuit device is bonded to a substrate with an ultrasonic vibration applied thereto. | 12-11-2008 |
20080303148 | PAD ARRANGEMENT OF DRIVER IC CHIP FOR LCD AND RELATED CIRCUIT PATTERN STRUCTURE OF TAB PACKAGE - Output pads on an integrated circuit (IC) chip are arranged along a first longer side and are arranged along a second longer side with input pads. The output pads are connected to respective output patterns formed on top and bottom surfaces of a base film. All the output patterns may pass over the first longer side. Alternatively, the output patterns connected to the output pads at the second longer side may pass over a shorter side. These pattern structures establish an effective pad arrangement without increasing the size of a TAB package, yet allowing reduced the chip size. | 12-11-2008 |
20080308929 | SEMICONDUCTOR DEVICE, CHIP PACKAGE AND METHOD OF FABRICATING THE SAME - A semiconductor device has a chip, a first bump electrode, a conductive wire and a second bump electrode. The chip has at least one contact pad, and the first bump electrode is formed on the contact pad. The conductive wire is disposed on an active surface of the chip and electrically connected to the first bump electrode. The second bump electrode is formed on the conductive wire, and the second bump electrode is not disposed over any contact pad of the chip. In addition, a method for packaging a chip and an IC package are also disclosed. | 12-18-2008 |
20080308930 | SEMICONDUCTOR DEVICE MOUNTING STRUCTURE, MANUFACTURING METHOD, AND REMOVAL METHOD OF SEMICONDUCTOR DEVICE - A semiconductor device mounting structure includes a semiconductor device whose electrodes are aligned on its one main face; a circuit board having board electrodes electrically connected to the electrodes of the semiconductor device by solder bumps; and curable resin applied between at least the side face of the semiconductor device and the circuit board. Multiple types of thermally expandable particles with different expansion temperatures are mixed in this curable resin. This structure offers the semiconductor device mounting structure that is highly resistant to impact and suited for mass production, its manufacturing method, and a removal method of the semiconductor device. In addition, this structure facilitates repair and reworking, leaving almost no adhesive residue on the circuit board after repair. Stress applied to the circuit board during repair can also be minimized. | 12-18-2008 |
20080308931 | Electronic Structures Including Barrier Layers Defining Lips - Forming an electronic structure may include forming a seed layer on a substrate, and forming a mask on the seed layer. The mask may include an aperture therein exposing a portion of the seed layer, and a barrier layer may be formed on the exposed portion of the seed layer. A bump may be formed on the barrier layer, and the mask may be removed. In addition, portions of the seed layer may be selectively removed using the barrier layer as an etch mask. | 12-18-2008 |
20080315409 | DIRECT EDGE CONNECTION FOR MULTI-CHIP INTEGRATED CIRCUITS - The present invention allows for direct chip-to-chip connections using the shortest possible signal path. | 12-25-2008 |
20080315410 | Substrate Including Barrier Solder Bumps to Control Underfill Transgression and Microelectronic Package including Same - A microelectronic substrate and a microelectronic package including the substrate and a die bonded thereto. The substrate includes a substrate panel having a die-side surface including a die-attach region; a system of interconnects extending through the substrate panel and adapted to allow a connection of the substrate to external circuitry; and a plurality of solder bumps including: die-attach solder bumps electrically coupled to the system of interconnects and disposed in the die-attach region; and barrier solder bumps isolated from the system of interconnects, the barrier solder bumps being disposed outside of the die-attach region and being adapted to substantially limit a flow of underfill away from the die-attach region. | 12-25-2008 |
20080315411 | INTEGRATED CIRCUIT PACKAGE SYSTEM EMPLOYING DEVICE STACKING - An integrated circuit package system that includes: providing an electrical interconnect system including an inner lead-finger system and an outer lead-finger system; stacking a first device, a second device, and a third device between and over the electrical interconnect system; connecting the first device and the second device to the inner lead-finger system; and connecting the third device to the outer lead-finger system. | 12-25-2008 |
20080315412 | Package Structure with Flat Bumps for Integrate Circuit or Discrete Device and Method of Manufacture the Same - The invention discloses a novel package structure of integrate circuit or discrete device and packaging method, and includes the lead pins adjacent to the island; another metal layer formed at the bottom of the island; another metal layer formed at the bottom of lead pins; chip mounted on the island; wires bonded between the chip and the lead pins; the molded body encapsulating the top surface and side surface of the island and the lead pins, small protrusions of the island and the lead pins below the molded body; in the individual package, the number of the island can be one or more, lead pins can be arrayed at one side of the island, also can be arrayed at two sides or three sides of the island, one or two rows of lead pins can be located around the island. The invention provides strong welding, good quality, low cost, smooth production, wide applicability, flexible arrangement of the chips. | 12-25-2008 |
20080315413 | ELECTRONIC DEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE - There are provided the steps of forming a bump | 12-25-2008 |
20080315414 | ELECTRONIC DEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE - There are provided the steps of forming a bump | 12-25-2008 |
20080315415 | Semiconductor device and manufacturing method thereof - The present invention provides a double-sided electrode package of a structure excellent in the reliability of connection and moisture resistance to another package, which is capable of being manufactured simply and at low cost. The present invention also provides a double-sided electrode package of a structure capable of forming inner wirings (electrode pads) in arbitrary layouts according to the number of pins of a semiconductor chip and the size thereof, which package is capable of being manufactured simply and at low cost. A copper foil is attached onto a core material formed with electrode pads, wirings, through electrodes, lands and a solder resist. The copper foil is wet-etched in several stages to form surface side terminals which stand on the wirings approximately vertically and each of which includes a plurality of protrusions (convex portions continuous in the circumferential direction) formed at their side faces over the full circumference along the circumferential direction. The peripheries of the surface side terminals are sealed with a sealing resin, and the end faces of the surface side terminals are exposed from a sealing resin layer, whereby redistribution wiring is performed at the surface of the sealing resin layer. | 12-25-2008 |
20090001567 | IC chip with finger-like bumps - A bumped chip has a plurality of finger-like bumps bonded on multiple openings of a chip. The chip primarily comprises a plurality of bonding pads and a passivation layer having a plurality of opening thereon. In one embodiment, the openings on each bonding pad are plural and disposed in linear, in parallel, or in an array. The finger-like bumps are protrusively disposed on the chip and each has a bump core and an extension finger. The bump cores are disposed within the corresponding bonding pads and cover the openings, and the extension fingers are disposed outside the corresponding bonding pads to maintain the bonding strengths of the bumps even at fine pitches. In an embodiment, the extension fingers overlap at least a trace of the chip. | 01-01-2009 |
20090001568 | Wafer-level solder bumps - In one embodiment, the present invention includes a semiconductor package having a support substrate coupled to a first semiconductor die, where the first semiconductor die includes first conductive bumps, and a second semiconductor die includes second conductive bumps, and where the first and second die are coupled by joints formed of the first and second conductive bumps and a solder material therebetween. Other embodiments are described and claimed. | 01-01-2009 |
20090001569 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor chip is characterized by a structure including a semiconductor chip on which electrode pads are formed, bumps which are formed on the respective electrode pads and which have projection sections, an insulating layer formed on the semiconductor chip, and a conductive pattern to be connected to the bumps, wherein extremities of the projection sections are inserted into the conductive pattern and the inserted extremities are flattened. | 01-01-2009 |
20090001570 | ELECTRONIC DEVICE AND METHOD OF MANUFACTURING THE SAME - The present disclosure relates to a method of manufacturing an electronic device in which a plurality of first bumps serving as external connection terminals are formed on a conductive pattern. The method includes: (a) forming a second bump having a projection portion on an electrode pad formed on a substrate; (b) forming an insulating layer on the substrate; (c) exposing a portion of the projection portion from an upper surface of the insulating layer; (d) forming a flat stress absorbing layer in a bump providing area, in which the first bumps are provided, on the insulating layer; (e) forming a first conductive layer on the insulating layer and the stress absorbing layer and the exposed portion of the projection portion; (f) forming a second conductive layer by an electroplating using the first conductive layer as a power feeding layer; (g) forming the conductive pattern by patterning the second conductive layer; and (h) forming the first bumps on the conductive pattern formed on the stress absorbing layer. | 01-01-2009 |
20090001571 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A method of manufacturing a semiconductor device in which a semiconductor element | 01-01-2009 |
20090001572 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device of the present invention includes a chip which has a pad; a bump electrode formed on the pad; and a wire whose stitch bonding is made on the bump electrode. The wire satisfies a condition: (modulus-of-elasticity/breaking strength per unit area)≧400. | 01-01-2009 |
20090008775 | SEMICONDUCTOR DEVICE WITH WELDED LEADS AND METHOD OF MANUFACTURING THE SAME - A semiconductor device and a manufacturing method for preventing mechanical and thermal damage to the semiconductor chip. A laser beam welds a first connection pad formed on a first external lead to a first electrode formed on the surface of the semiconductor chip. A first connection hole is formed in the first connection pad, and the first connection hole overlaps the first connection electrode. A laser beam irradiates an area including the first connection hole, and the first connection pad in a portion around the first connection hole is melted to form a melting section, that is welded to the first connection electrode to easily form a semiconductor device with more excellent electrical characteristics. | 01-08-2009 |
20090008776 | Electronic Component Mounted Body, Electronic Component with Solder Bump, Solder Resin Mixed Material, Electronic Component Mounting Method and Electronic Component Manufacturing Method - In an electronic component mounted body, an electrode of a first electronic component and an electrode of a second electronic component are electrically connected by a solder connecter, and the solder connecter contains solder and insulation filler. Alternatively, a solder bump is formed on the electrode of the electronic component, and the solder bump includes the insulation filler. | 01-08-2009 |
20090014869 | SEMICONDUCTOR DEVICE PACKAGE WITH BUMP OVERLYING A POLYMER LAYER - A semiconductor device package, for example a flip-chip package, having a solder bump mounted above a polymer layer for use in flip-chip mounting of a semiconductor device to a circuit board. A polymer layer such as polybenzoxazole is formed overlying a wafer passivation layer. Solder bumps are attached to an under-bump metallization layer and electrically coupled to conductive bond pads exposed by openings in the wafer passivation layer. | 01-15-2009 |
20090014870 | SEMICONDUCTOR CHIP AND PACKAGE PROCESS FOR THE SAME - A semiconductor chip is provided. The semiconductor chip includes a chip and chip bump pads thereon. The chip bump pads include at least two chip bump pads that are physically connected. | 01-15-2009 |
20090014871 | SEMICONDUCTOR DEVICE - A semiconductor device is disclosed. One embodiment includes a semiconductor substrate and at least two insulating elements located above the semiconductor substrate or above a mold compound embedding the semiconductor substrate. The at least two insulating elements have a first face facing the semiconductor substrate or the mold compound and a second face facing away from the semiconductor substrate or the mold compound. A conductive element for each of the at least two insulating elements extends from the first face of the insulating element to the second face of the insulating element. | 01-15-2009 |
20090014872 | METHOD FOR MANUFACTURING A CIRCUIT BOARD STRUCTURE, AND A CIRCUIT BOARD STRUCTURE - This publication discloses a method for manufacturing a circuit-board structure. | 01-15-2009 |
20090014873 | ELECTRONIC DEVICE AND MANUFACTURING METHOD - An electronic device including a semiconductor device with a plurality of bump electrodes, a mounting board connected to the semiconductor device, thermally expandable particles, and adhesive. The thermally expandable particles are provided on the sides of the semiconductor device and the surface of the mounting board around a projected area of the semiconductor device. The adhesive is provided on the sides of the semiconductor device and the surface of the mounting board such that it covers the area of thermally expandable particles. This improves the impact resistance of the semiconductor device soldered onto the mounting board, and also facilitates removal of the semiconductor device from the mounting board when the semiconductor device needs repair. | 01-15-2009 |
20090014874 | SEMICONDUCTOR APPARATUS AND MANUFACTURING METHOD OF SEMICONDUCTOR APPARATUS - A semiconductor apparatus includes a semiconductor chip, a wired board, a plurality of bump electrodes, a plurality of external terminals, and insulating material. The semiconductor chip includes a plurality of electrode pads arranged in a central area on one surface. The wired board is arranged as facing one surface of the semiconductor chip, and includes a wiring. The bump electrode is provided between surfaces at which the semiconductor chip and the wired board face each other, and electrically connects the electrode pad and the wiring. The external terminal corresponds to a plurality of bump electrodes, and is mounted on the wired board. The insulating material is provided between the semiconductor chip and the wired board, and covers at least a connection part between the bump electrode and the wiring. The wiring of the wired board is configured to run in a straight line from a bump electrode-mounted position in a semiconductor chip-mounted surface of the wired board, to an external terminal-mounted surface of the wired board, and also, electrically connect the bump electrode and the corresponding external terminal. | 01-15-2009 |
20090020869 | INTERCONNECT JOINT - An interconnect joint comprises a substrate ( | 01-22-2009 |
20090020870 | ELECTRONIC DEVICE PROVIDED WITH WIRING BOARD, METHOD FOR MANUFACTURING SUCH ELECTRONIC DEVICE AND WIRING BOARD FOR SUCH ELECTRONIC DEVICE - An electronic device ( | 01-22-2009 |
20090020871 | SEMICONDUCTOR CHIP WITH SOLDER BUMP SUPPRESSING GROWTH OF INTER-METALLIC COMPOUND AND METHOD OF FABRICATING THE SAME - A semiconductor chip having a solder bump and a method of fabricating the same are provided. Conventionally, an inter-metallic compound (IMC) unexpectedly grows at an interface of the solder bump by means of heat generated during operation of the semiconductor chip, thereby weakening mechanical property of the semiconductor chip. To solve this drawback, the semiconductor chip includes at least one metal adhesion layer formed on an electrode pad of the semiconductor chip, an interlayer isolation layer formed on the metal adhesion layer, at least one penetration layer formed on the interlayer isolation layer and penetrating into the solder bump, and the solder bump formed on the penetration layer. Thereby, materials of the penetration layer penetrate into the solder bump to change the solder bump into a multi-component solder bump, so that the growth of the IMC is suppressed, and the reliability of the semiconductor chip can be improved. | 01-22-2009 |
20090020872 | WIRE BONDING METHOD AND SEMICONDUCTOR DEVICE - In order to prevent bonded wires from being damaged during another wire bonding in a semiconductor device, there is provided a wire bonding method for wire-connecting pads on a semiconductor chip and multiple leads corresponding to the pads in a semiconductor device to be manufactured by sealing the semiconductor chip and the leads together in one block, in which bumps and are formed with an ultrasonic vibration on all of the pads on the semiconductor chip and the leads included in the one block, and then wires are provided, with no ultrasonic vibration, for connection between the bumps and on the pads and the leads. | 01-22-2009 |
20090020873 | SEMICONDUCTOR APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR APPARATUS - A semiconductor apparatus includes a semiconductor chip in which a plurality of electrode pads are provided on a main surface, and a plurality of bump electrodes are provided on the electrode pads of the semiconductor chip. The semiconductor apparatus also includes a wired board which is allocated in a side of the main surface of the semiconductor chip, and is positioned in a central area of the main surface of the semiconductor chip so as to be separated from an edge part of the semiconductor chip by at least 50 μm or more. The semiconductor apparatus also includes a plurality of external terminals which are provided on the wired board, and which are electrically connected to a plurality of bump electrodes through wirings of the wired board, and sealing part which is provided between the semiconductor chip and the wired board, is made of underfill material that covers a connection part between the bump electrode and the wiring. | 01-22-2009 |
20090020874 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A semiconductor device according to the present invention is provided with a semiconductor chip in which a plurality of electrode pads is provided on a principal surface, a plurality of bump electrodes provided on the electrode pads of the semiconductor chip, a square-shaped wiring board which is disposed on a side of the principal surface of the semiconductor chip, and in which at least two sides of an outer circumference that face each other are positioned in an area on the principal surface of the semiconductor chip, a plurality of external terminals which is provided on the wiring board, and which are electrically connected to a plurality of the bump electrodes through a wiring of the wiring board, and sealing material which is provided between the semiconductor chip and the wiring board, and which covers a connection part between the bump electrode and the wiring. | 01-22-2009 |
20090026607 | Electronic Device and Method of Manufacturing Same - It is proposed a method of manufacturing an electronic system wherein a first substrate comprising first connection elements on a first surface of the first substrate is provided; a second substrate comprising second connection elements on a first surface of the second substrate is provided; a polymer layer is applied to at least one of the two first surfaces; the first connection elements are attached to the second connection elements; and the polymer layer is caused to swell during or after the attachment. | 01-29-2009 |
20090026608 | Crosstalk-Free WLCSP Structure for High Frequency Application - A structure, a system, and a method for manufacture of crosstalk-free wafer level chip scale packaging (WLCSP) structure for high frequency applications is provided. An illustrative embodiment comprises a substrate on which various layers and structures form circuitry, a signal pin formed on the substrate and coupled with the circuitry, a ground ring encircling the signal pin, and a grounded solder bump coupled to the ground ring. | 01-29-2009 |
20090026609 | Semiconductor device and method for manufacturing the same - A semiconductor device includes a semiconductor chip, a connection electrode including a first land electrode electrically coupled with the semiconductor chip, and a through electrode formed on an upper surface of the first land electrode to be electrically coupled with the first land electrode using a stud bump, and a sealing resin, through which the connection electrode passes, for sealing the semiconductor chip. | 01-29-2009 |
20090026610 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - The invention provides a semiconductor device having high reliability and a method of manufacturing the same. The semiconductor device of the invention has pad electrodes formed on a semiconductor die near the side surface portion thereof and connected to a semiconductor integrated circuit or the like in the semiconductor die, a supporting body formed on the pad electrodes, an insulation film formed on the side and back surface portions of the semiconductor die, wiring layers connected to the back surfaces of the pad electrodes and extending from the side surface portion onto the back surface portion of the semiconductor die so as to contact the insulation film, and a second protection film formed on the side surface portion of the supporting body. | 01-29-2009 |
20090026611 | ELECTRONIC ASSEMBLY HAVING A MULTILAYER ADHESIVE STRUCTURE - An electronic device comprises a substrate and a number of bump units over the substrate, wherein each of the bump units includes an electrically insulating bump-forming body extending in a first direction, and at least two conductive layers separated from each other on the electrically insulating bump-forming body, the at least two conductive layers extending in a second direction orthogonal to the first direction. | 01-29-2009 |
20090032939 | METHOD OF FORMING A STUD BUMP OVER PASSIVATION, AND RELATED DEVICE - A method of forming a stud bump over passivation, and related device. At least some of the illustrative embodiments are methods comprising depositing a first passivation layer over a semiconductor die, depositing a capping metal layer over the first passivation layer (the capping metal layer comprises a capping metal pad), and depositing a stud bump onto the capping metal pad. | 02-05-2009 |
20090032940 | Conductor Bump Method and Apparatus - Various semiconductor die conductor structures and methods of fabricating the same are provided. In one aspect, a method of manufacturing is provided that includes forming a conductor structure on a conductor pad of a semiconductor die. The conductor layer has a surface. A polymeric layer is formed on the surface of the conductor layer while a portion of the surface is left exposed. A solder structure is formed on the exposed portion of the surface and a portion of the polymeric layer. | 02-05-2009 |
20090032941 | Under Bump Routing Layer Method and Apparatus - Various semiconductor chip conductor structures and methods of fabricating the same are provided. In one aspect, a method of manufacturing is provided that includes forming a conductor structure on a semiconductor chip. The conductor structure has a first site electrically connected to a first redistribution layer structure and a second site electrically connected to a second redistribution layer structure. A solder structure is formed on the conductor structure. | 02-05-2009 |
20090032942 | SEMICONDUCTOR CHIP WITH SOLDER BUMP AND METHOD OF FABRICATING THE SAME - A semiconductor chip having a solder bump and a method of fabricating the same are provided. The semiconductor chip includes at least one under bump metal (UBM) layer formed on an electrode pad of the semiconductor chip, an adhesion enhance layer (AEL) formed on the UBM layer and having at least one concavo-convex portion on a top surface thereof, and the solder bump formed on the AEL. Thereby, adhesive solder bump is increased, and thereby the reliability of the semiconductor chip can be improved. Further, it is possible to prevent tin (Sn) in the solder bump from being diffused due to the AEL. | 02-05-2009 |
20090032943 | SUBSTRATE, SUBSTRATE FABRICATION, SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FABRICATION - A substrate for fixing an integrated circuit (IC) element comprises: a substrate for fixing an integrated circuit element includes: a plurality of metal posts that are aligned in a longitudinal direction and a lateral direction in plan view, each of the plurality of metal posts having a first surface and a second surface facing an opposite direction to the first surface, the plurality of metal posts being configured identically; and a joining section that joins each of the plurality of metal posts together at a portion of each of the plurality of metal posts between the first surface and the second surface. | 02-05-2009 |
20090032944 | ELECTRONIC DEVICE, METHOD OF PRODUCING THE SAME, AND SEMICONDUCTOR DEVICE - A semiconductor device includes n | 02-05-2009 |
20090032945 | SOLDER BUMP ON A SEMICONDUCTOR SUBSTRATE - A solder bump on a semiconductor substrate is provided. The solder bump has a semiconductor substrate with a top copper pad thereon, a protective layer on the semiconductor substrate and at least one inorganic passivation layer overlying the protective layer with a first opening exposing the top copper pad, wherein the inorganic passivation layer has a thinner portion adjacent a top portion of the first opening. The solder bump further has a soft passivation layer on the inorganic passivation layer with a second opening larger than the first opening, an under bump metal layer conformally formed along the first opening and the second opening and a solder bump formed on the under bump metal layer. | 02-05-2009 |
20090039505 | Thermally insulating bonding pad structure for solder reflow connection - A thermally insulating bonding pad for solder reflow is described. The bonding pad includes a structure. The structure forms the bonding pad. The bonding pad further includes an insulator formed on the structure. The insulator is configured to be interposed between the structure and a substrate of a component onto which said bonding pad is to be disposed. The bonding pad provides thermal insulation for said substrate when said bonding pad is subject to a solder reflow process being performed thereon. | 02-12-2009 |
20090039506 | SEMICONDUCTOR DEVICE INCLUDING A SEMICONDUCTOR CHIP WHICH IS MOUNTED SPANING A PLURALITY OF WIRING BOARDS AND MANUFACTURING METHOD THEREOF - The semiconductor device is made up of two wiring boards, a semiconductor chip, and a sealing part. The two wiring boards are spaced apart, and a semiconductor chip is mounted so as to span the two wiring boards. The semiconductor chip includes a predetermined circuit and a plurality of electrode pads on one side thereof. The wiring board includes a plurality of connection pads on a semiconductor chip-mounting face, and a plurality of lands on the opposite side thereof. The land is electrically connected to a corresponding connection pad. An external terminal is formed on each of the lands. Further, the electrode pad formed in the semiconductor chip is electrically connected to the corresponding connection pad of the wiring board. Moreover, the semiconductor chip, the semiconductor chip mounting face of the wiring board, and the side faces of the wiring board are covered with the sealing part. | 02-12-2009 |
20090039507 | Electronic Element, Electronic Element Device Using the Same, and Manufacturing Method Thereof - An electronic element including an electronic element base and electrodes each of which has a first electrode having a surface composed of at least Al or an Al alloy and a second electrode composed of a metal nanoparticle sintered body and bonded to the first electrode. A bonding interface between the first electrode and the second electrode has a multilayer structure including, from the side of the first electrode to the side of the second electrode, (a) a first layer primarily composed of Al, (b) a second layer primarily composed of an Al oxide, (c) a third layer primarily composed of an alloy of Al and a constituent element of metal nanoparticles, and (d) a fourth layer primarily composed of the constituent element of the metal nanoparticles. | 02-12-2009 |
20090045508 | OBLONG PERIPHERAL SOLDER BALL PADS ON A PRINTED CIRCUIT BOARD FOR MOUNTING A BALL GRID ARRAY PACKAGE - Methods, systems, and apparatuses for ball grid array land patterns are provided. A ball grid array land pattern includes a plurality of land pads and electrically conductive traces. The plurality of land pads is arranged in an array of rows and columns. A perimeter edge of the array includes a pair of adjacent oblong shaped land pads. An electrically conductive trace is routed between the pair of adjacent oblong shaped land pads from a land pad positioned in an interior of the array to a location external to the array. The oblong shaped land pads are narrower than standard round land pads, and thus provide more clearance for the routing of traces. The oblong shaped land pads enable more land pads of the land pattern array to be routed external to the array on each routing layer, and thus can save printed circuit board component and assembly costs. | 02-19-2009 |
20090045509 | ELECTRONIC DEVICE - An electronic device including: a semiconductor chip on which an integrated circuit is formed; an electrode formed on the semiconductor chip and electrically connected to the integrated circuit; a resin protrusion disposed on the semiconductor chip; an interconnect formed on the electrode and extending over the resin protrusion; a wiring board on which a wiring pattern is formed, the semiconductor chip being mounted on the wiring board so that part of the interconnect positioned over the resin protrusion faces and is electrically connected to the wiring pattern; and an adhesive that bonds the semiconductor chip and the wiring board. The resin protrusion is compressed in a direction in which the distance between the semiconductor chip and the wiring board decreases and is formed of a material having a negative coefficient of thermal expansion. | 02-19-2009 |
20090045510 | SEMICONDUCTOR DEVICE AND METHOD FOR MOUNTING SEMICONDUCTOR CHIP - A semiconductor device includes a rigid substrate, a flexible solid-state image sensor and bumps. The bumps are aligned along a pair of opposing edges of the rigid substrate, and the diameter of the bumps gradually increases from the center to the ends of the edges. Owing to the difference in diameter of the bumps, the solid-state image sensor is curved convexly to the rigid substrate. | 02-19-2009 |
20090051028 | ELECTRONIC DEVICE AND ELECTRONIC APPARATUS - An electronic device includes a semiconductor device and a wiring substrate having a wiring pattern. The semiconductor device includes: a semiconductor chip having an electrode; a convex-shaped resin protrusion provided on a surface of the semiconductor chip, the surface having the electrode; and wiring having a plurality of electrical coupling sections which are aligned on the resin protrusion and electrically coupled to the electrode. The semiconductor device is mounted to the wiring substrate so that the electrical coupling sections and the wiring pattern are brought into contact and electrically coupled with each other. The plurality of electrical coupling sections brought into contact with the wiring pattern include curved or bent shapes projecting in a longitudinal direction of the resin protrusion. | 02-26-2009 |
20090051029 | FLIP-CHIP TYPE SEMICONDUCTOR DEVICE - A flip-chip type semiconductor device includes a semiconductor substrate. A plurality of electrode terminals are provided and arranged on a top surface of the semiconductor substrate, a sealing resin layer is formed on the top surface of the semiconductor substrate such that the electrode terminals are completely covered with the sealing resin layer. | 02-26-2009 |
20090057887 | WAFER LEVEL PACKAGING OF SEMICONDUCTOR CHIPS - A method of manufacturing semiconductor packages at the wafer level is disclosed. A wafer has multiple integrated circuits (ICs) formed on its active surface, with each IC in communication with a plurality under-bump metallization (UBM) pads formed on one surface the package. The UBM pads include a larger pads near the center of package and smaller UBM pads near the periphery. The method includes attaching a stiffener to an inactive surface of the wafer; forming under bump metallization pads; and forming solder bumps extending from the UBM pads. | 03-05-2009 |
20090057888 | IC Package Having IC-to-PCB Interconnects on the Top and Bottom of the Package Substrate - An integrated circuit package, according to one embodiment, includes a package substrate, an interface stratum and an integrated circuit die. Both the IC die and interface stratum are disposed on the package substrate. The integrated circuit die includes a microelectronic circuit having a plurality of inputs and outputs. A first set of the inputs and outputs are electrically coupled to a plurality of package-to-circuit connection regions on the package substrate. A second set of input and outputs are electrically coupled through the package substrate to package-to-circuit connection regions on the interface stratum. | 03-05-2009 |
20090057889 | Semiconductor Device Having Wafer Level Chip Scale Packaging Substrate Decoupling - One aspect of the invention provides a semiconductor device that includes a microchip having an outermost surface. First and second bond pads are located on the microchip and near the outermost surface. A first UBM contact is located on the outermost surface and between the first and second bond pads. The first UBM contact is offset from the first bond pad. A second UBM contact is located on the outermost surface and between the first and second bond pads. The second UBM contact is offset from the second bond pad, and a capacitor supported by the microchip is located between the first and second UBM contacts. | 03-05-2009 |
20090057890 | SEMICONDUCTOR DEVICE - In this semiconductor device, connection parts between wafers are electrically insulated from each other, and a junction face shape of second electrical signal connection parts is larger than the shape of a positioning margin face that is formed by an outer shape when the periphery of a minimum junction face, which has half the area of a junction area of the first electrical signal connection part, is enclosed by a same width dimension as a positioning margin dimension between the first wafer and the second wafer. | 03-05-2009 |
20090057891 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device includes a supporting base whereupon an electrode terminal is placed; an intermediate member mounted on said supporting base; a semiconductor element, a portion thereof being supported with said intermediate member, and placed on said supporting base; and a convex-shaped member which corresponds to the electrode terminal of said semiconductor element and placed on said supporting base or said intermediate member; wherein the electrode terminal of said semiconductor element and the electrode terminal of said supporting base are connected with a bonding wire. | 03-05-2009 |
20090057892 | ELECTRODE STRUCTURE IN SEMICONDUCTOR DEVICE AND RELATED TECHNOLOGY - A first insulation film having a first opening is provided on an electrode pad of a semiconductor chip. A second insulation film having a second opening is provided on the first insulation film. A ground metallic layer which is to be in contact with the electrode pad via the first opening is provided on the first insulation film. A bump which is to be mechanically and electrically connected to the ground metallic layer is provided. Further, the above placement is made in a way that the ground metallic layer is provided in the second opening, and the ground metallic layer is provided on an inner side than an outer periphery of the electrode pad, covering the first opening. | 03-05-2009 |
20090057893 | Semiconductor apparatus - In order to solve a problem of occurrence of delamination of interlayer film due to occurrence of a crack in an LSI wiring layer in a UBM lower layer immediately under a solder bump in an outer periphery of an LSI chip, a semiconductor apparatus of the present invention includes a stress boundary between compressive stress and tensile stress in an LSI wiring layer of a bump lower layer and in order to alleviate the stress present in the bump lower layer tensile stress material is arranged on a compressive stress side or compressive stress material is arranged on a tensile stress side with a stress boundary of the LSI wiring layer as a boundary. | 03-05-2009 |
20090057894 | Structure of Gold Bumps and Gold Conductors on one IC Die and Methods of Manufacturing the Structures - A method for fabricating multiple metal layers includes the following steps. An electronic component is provided with multiple contact points. A first metal layer is deposited over said electronic component. A first mask layer is deposited over said first metal layer. A second metal layer is deposited over said first metal layer exposed by an opening in said first mask layer. Said first mask layer is removed. A second mask layer is deposited over said second metal layer. A third metal layer is deposited over said second metal layer exposed by an opening in said second mask layer. Said second mask layer is removed. Said first metal layer not covered by said second metal layer is removed. | 03-05-2009 |
20090057895 | POST PASSIVATION STRUCTURE FOR A SEMICONDUCTOR DEVICE AND PACKAGING PROCESS FOR SAME - A post passivation rerouting support structure comprises a relatively thin support layer above the passivation layer to support the RDL, and a relatively thick support layer for fine pitch interconnects extending from the RDL and terminating as contact structures at the surface of the thick support layer, for a next level packaging structure. The thick support layer is planarized before defining the contact structures. The thick support layer may be formed after the conducting posts have been formed, or the thick support layer is formed before forming the conducting posts in vias formed in the thick support layer. An encapsulating layer may be provided above the thick support layer, which top surface is planarized before defining the contact structures. The encapsulating layer and the further support layer may be the same layer. | 03-05-2009 |
20090065930 | Package Substrate Including Surface Mount Component Mounted on a Peripheral Surface thereof and Microelectronic Package Including Same - A microelectronic combination and a method of making the combination. The combination includes a package substrate including a substrate body having a peripheral surface and contacts disposed at the peripheral surface; and a surface mount component electrically and mechanically bonded to the contacts. | 03-12-2009 |
20090065931 | PACKAGED INTEGRATED CIRCUIT AND METHOD OF FORMING THEREOF - Disclosed is a packaged integrated circuit and a method of forming thereof. The packaged integrated circuit includes a substrate, a plurality of solder bumps, a semiconductor die and a plurality of copper bumps. The plurality of solder bumps are configured on the substrate. Each of the plurality of solder bumps has a height of about 40 micrometers (μm) to about 65 μm. Further, the plurality of copper bumps are configured on the semiconductor die. Each of the plurality of copper bumps has a height of about 10 μm to about 25 μm. The semiconductor die is disposed above the substrate such that the plurality of copper bumps are coupled to the plurality of solder bumps, which in turn, couples the semiconductor die to the substrate. | 03-12-2009 |
20090065932 | Methods of forming nano-coatings for improved adhesion between first level interconnects and epoxy under-fills in microelectronic packages and structures formed thereby - Methods and associated structures of forming microelectronic devices are described. Those methods may include coating an interconnect structure disposed on a die with a layer of functionalized nanoparticles, wherein the functionalized nanoparticles are dispersed in a solvent, heating the layer of functionalized nanoparticles to drive off a portion of the solvent, and applying an underfill on the coated interconnect structure. | 03-12-2009 |
20090065933 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - The present invention provides a semiconductor device that can suppresses poor connection caused by the variation of the heights of bumps during reflow heating, can be applied to a narrow array pitch, and can freely adjust the heights of the bumps. | 03-12-2009 |
20090065934 | Wiring substrate, tape package having the same, display device having the tape package, method of manufacturing the wiring substrate, method of manufacturing a tape package having the same and method of manufacturing a display device having the tape package - A wiring substrate may include a base film, a plurality of wires, a first insulation member and a second insulation member. The base film may have a chip-mounting region where a semiconductor chip may be mounted thereon. The wires may extend from the chip-mounting region and the wires may include adhesive end portions that may be electrically connected to the semiconductor chip. The first insulation member may cover portions of the wires outside the chip-mounting region thereof. The second insulation member may cover portions of the wire inside the chip-mounting region, the adhesive end portion of the wire being exposed by the second insulation member. | 03-12-2009 |
20090072391 | Structurally-enhanced integrated circuit package and method of manufacture - A chip scale integrated circuit package includes an integrated circuit chip which has a first face and a second face. A plurality of pillar bumps are formed on the first face of the integrated circuit chip. An encapsulant material encapsulates the sides and the first face of the integrated circuit chip, and the pillar bumps. Upper ends of the pillar bumps remain free form encapsulant material and a substantially planar surface is formed by an upper surface of the encapsulant material and the upper ends of the pillar bumps. A plurality of solder balls are mounted on the substantially planar surface in locations corresponding to the upper ends of the pillar bumps. | 03-19-2009 |
20090072392 | Techniques For Forming Solder Bump Interconnects - Interconnects are formed on attachment points of a wafer by performing several steps. A plurality of cavities having a predetermined shape is formed in a semiconductor substrate. These cavities are then filled with an interconnect material to form the interconnects. The interconnects are subsequently attached to the attachment points of the wafer. | 03-19-2009 |
20090072393 | Structure and Method for Fabricating Flip Chip Devices - A solder bump structure and an under bump metallurgical structure. An upper surface of a semiconductor substrate comprises a first conductive pad ( | 03-19-2009 |
20090072394 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device includes a semiconductor chip, a bump electrode, a molding portion, a redistribution layer and an outer connection electrode. The bump electrode is provided on an upper face of the semiconductor chip. The molding portion encapsulates an entire side face of the semiconductor chip and seals the bump electrode so that a part of the bump electrode is exposed. The redistribution layer is provided on an upper face of the molding portion and is electrically coupled to the semiconductor chip via the bump electrode. The outer connection electrode is provided on an upper face of the redistribution layer and is electrically coupled to the bump electrode via the redistribution layer. | 03-19-2009 |
20090072395 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device includes a semiconductor element, a lead, and a gold wire electrically connecting an electrode of the semiconductor element and the lead. In the semiconductor device, the gold wire is covered with a metal and is a continuous film formed by plating. | 03-19-2009 |
20090072396 | Method of Forming Low Stress Multi-Layer Metallurgical Structures and High Reliable Lead Free Solder Termination Electrodes - Techniques for manufacturing a bond pad structure are provide. A method includes providing a substrate. A metal pad and passivation layer are formed over the substrate. The passivation layer includes an opening to expose a portion of the metal pad. A first film is deposited at least over the exposed portion of the metal pad. A second film is deposited over the first film. A photoresist layer is deposited over the substrate, and a trench is formed in the photoresist layer directly over the portion of the metal pad. A first layer is electroplated in the trench over the second film, and a barrier layer is electroplated in trench over the first layer. A termination electrode, comprising tin, is electroplated in the trench over the barrier layer. The photoresist layer is removed. In addition, the method can include etching to remove the second film and first film beyond a predetermined area. The termination electrode is then reflowed. The barrier layer prevents formation of an intermetallic compound in proximity to the first layer by precluding diffusion of tin from the termination electrode to the first layer. In a specific embodiment, the first layer includes stress release copper underneath a barrier layer which includes nickel. | 03-19-2009 |
20090079067 | Method for Stacking Semiconductor Chips - In a semiconductor system ( | 03-26-2009 |
20090079068 | METHODS FOR ATTACHING A FLIP CHIP INTEGRATED CIRCUIT ASSEMBLY TO A SUBSTRATE - A method for fabricating an integrated circuit assembly, comprises forming a conductive material pattern on a substrate using a process in which the conductive material in wet when formed, the conductive material pattern comprising contact points, before curing the conductive material, placing a integrated circuit comprising contact bumps on the substrate such that the bumps come in contact with the contact points of the conductive material pattern, and allowing the conductive material cure such that the conductive material forms a bond with the bumps. | 03-26-2009 |
20090079069 | Semiconductor Device and Method of Forming Interconnect Structure in Non-Active Area of Wafer - A semiconductor wafer includes a plurality of semiconductor die. Contact pads are formed on an active area of the semiconductor die and non-active area of the semiconductor wafer between the semiconductor die. Solder bumps are formed on the contact pads in both the active area of the semiconductor die and non-active area of the semiconductor wafer between the semiconductor die. The I/O terminal count of the semiconductor die is increased by forming solder bumps in the non-active area of the wafer. An encapsulant is formed over the solder bumps. The encapsulant provides structural support for the solder bumps formed in the non-active area of the semiconductor wafer. The semiconductor wafer undergoes grinding after forming the encapsulant to expose the solder bumps. The semiconductor wafer is singulated to separate the semiconductor die. The semiconductor die is mounted to a package substrate with solder paste or socket. | 03-26-2009 |
20090085202 | Methods and Apparatus for Assembling Integrated Circuit Device Utilizing a Thin Si Interposer - Methods of assembling an integrated circuit are provided. An interposer supported by an integrated handler is solder bumped onto one or more bond pads on a substrate. The integrated handler is removed from the interposer. A side of the interposer opposite that of the substrate is solder bumped to one or more bond pads on a chip. | 04-02-2009 |
20090085203 | Method for Exchanging Semiconductor Chip of Flip-Chip Module and Flip-Chip Module Suitable Therefor - A process for replacing a semiconductor chip of such a flip-chip module and a suitable flip-chip module and an apparatus for implementing the method are disclosed. The flip-chip module comprises at least one semiconductor chip and a substrate. The semiconductor chip comprises contact posts on a surface that are disposed at right angles to the surface. With these contact posts it is connected with contact points of the substrate via a soldered connection. The contact posts completely cover the contact points with their end faces. Due to this it is possible to completely press the solder between the contact posts and contact points out of the intermediate area between the contact points and the contact posts after a renewed heating. This permits a renewed attachment of a further semiconductor chip. | 04-02-2009 |
20090085204 | Wafer-level package and method of manufacturing the same - Provided is a wafer-level package including a wafer-level semiconductor chip having a plurality of integrated circuits (ICs) and pads formed on the top surface thereof; a molding material of which the outer portion is supported by the top surface of the semiconductor chip such that a cavity is provided on the semiconductor chip; and a conducive member filled in a plurality of vias which are formed in arbitrary positions of the molding material so as to pass through the molding material, the conductive member being connected to the pads. | 04-02-2009 |
20090085205 | METHOD FOR MANUFACTURING AN ELECTRONIC COMPONENT PACKAGE AND ELECTRONIC COMPONENT PACKAGE - A manufacturing method of an electronic component package, includes: forming electrode pads on a main surface of a first electronic component; forming first bonding wires shaped in loop so as to be electrically connected with the electrode pads and elongated upward from the electrode pads and such that both ends of the first bonding wires are on the electrode pad, respectively; forming a resin layer over the main surface of the first electronic component so as to embed the first bonding wires; removing the resin layer so as to expose ends of the first bonding wires from the resin layer and removing the end of each of the first bonding wires so that two wires are elongated from on each of the electrode pads; and forming a metallic layer on the surface of the resin layer after removing so that the first bonding wires are electrically connected with the metallic layer. | 04-02-2009 |
20090091024 | Stable Gold Bump Solder Connections - A metallic interconnect structure ( | 04-09-2009 |
20090091025 | METHOD FOR FORMING AND RELEASING INTERCONNECTS - A method for forming and releasing interconnects by using a dummy substrate. The method comprises applying metallization to the dummy substrate for creating a relatively strong bond between the metallization and the dummy substrate and a weak bond between a first end of each of the interconnects and the metallization; weakly bonding the first ends to the metallization; shaping the interconnects; releasing the weak bond between the metallization and the first ends by using a reduced release force to release the first end of the interconnects from the dummy substrate. | 04-09-2009 |
20090091026 | Stackable semiconductor package having plural pillars per pad - A stackable semiconductor package is revealed, primarily comprising a chip carrier, a chip, and a plurality of bottom bump sets. The chip carrier has a plurality of stacking pads disposed on the top surface and a plurality of bump pads on the bottom surface. The chip is disposed on and electrically connected to the chip carrier. The bottom bump sets are disposed on the corresponding bump pads and each consists of a plurality of conductive pillars. Solder-filling gaps are formed between the adjacent conductive pillars for filling and holding solder paste so that the soldering area can be increase and the anchoring effect can be enhanced due to complicated the soldering interfaces to achieve higher soldering reliability and less cracks at the soldering interfaces. | 04-09-2009 |
20090091027 | Semiconductor package having restraining ring surfaces against soldering crack - A semiconductor package with crack-restraining ring surfaces is revealed, primarily comprising a chip carrier, a chip disposed on the chip carrier, and a plurality of belfry-like bumps. The belfry-like bumps are disposed on a plurality of corresponding conductive pads on the bottom surface of the chip carrier as external terminals. Each belfry-like bump has at least a crack-restraining ring surface parallel to the conductive pads and between the top of the belfry-like bump and the conductive pad to prevent the spreading of the soldering cracks and to enhance the soldering strengths at the micro contacts to achieve higher package reliability. | 04-09-2009 |
20090091028 | SEMICONDUCTOR DEVICE AND METHOD OF BUMP FORMATION - A semiconductor device including a semiconductor substrate, a contact pad, a passivation layer, a bump, and a seeding layer is provided. The semiconductor substrate has an active surface. The contact pad is disposed on the active surface. The passivation layer is disposed on the active surface and exposes a central part of the contact pad. The seeding layer is disposed on the exposed central part of the contact pad. The bump has a top surface, a bottom surface opposite to the top surface, and a side surface connecting the top surface and the bottom surface. The bump is disposed on the seeding layer. The bump is placed in contact with the seeding layer by the bottom surface and by part of the side surface. | 04-09-2009 |
20090091029 | SEMICONDUCTOR PACKAGE HAVING MARKING LAYER - The symbolization of a semiconductor device ( | 04-09-2009 |
20090091030 | SEMICONDUCTOR DEVICE, METHOD FOR MOUNTING SEMICONDUCTOR DEVICE, AND MOUNTING STRUCTURE OF SEMICONDUCTOR DEVICE - In order to realize a semiconductor device which is easily mounted on a circuit board and which has high mounting reliability, a semiconductor device | 04-09-2009 |
20090091031 | Semiconductor device - A semiconductor device comprises: a package substrate having a plurality of bonding electrodes arranged in a peripheral region of a main surface thereof and wirings connected to the respective bonding electrodes and electrolessly plated; a semiconductor chip mounted on the package substrate; a plurality of wires connecting pads of the semiconductor chip and the bonding electrodes; a sealing body for sealing the semiconductor chip and the wires with resin; and a plurality of solder balls arranged on the package substrate. The wirings are formed only at the inner side of the plurality of bonding electrodes on the main surface of the package substrate, and no solder resist film is formed at the outer side of the plurality of bonding electrodes. With this arrangement, the region outside the bonding electrodes can be minimized and the semiconductor device can be downsized without changing the size of the chip mounted thereon. | 04-09-2009 |
20090096092 | Bump I/O Contact for Semiconductor Device - A bump contact electrically connects a conductor on a substrate and a contact pad on a semiconductor device mounted to the substrate. The first end of an electrically conductive pillar effects electrical contact and mechanical attachment of the pillar to the contact pad with the pillar projecting outwardly from the semiconductor device. A solder crown reflowable at a predetermined temperature into effecting electrical contact and mechanical attachment with the conductor is positioned in axial alignment with the second end of the pillar. A diffusion barrier electrically and mechanically joins the solder bump to the second end of the pillar and resists electro-migration into the first end of the solder crown of copper from the pillar. One diffusion barrier takes the form of a 2-20 micron thick control layer of nickel, palladium, titanium-tungsten, nickel-vanadium, or tantalum nitride positioned between the pillar and the solder crown. | 04-16-2009 |
20090096093 | INTER-CONNECTING STRUCTURE FOR SEMICONDUCTOR PACKAGE AND METHOD OF THE SAME - The interconnecting structure for a semiconductor die assembly comprises a build-up layers having RDL formed therein formed over a die having die pads formed thereon, wherein the RDL is coupled to the die pads; an isolation base having ball openings attached over the build-up layer to expose ball pads within the build-up layers; and conductive balls placed into the ball openings of the isolation base and attached on the ball pads within the build-up layers. | 04-16-2009 |
20090096094 | SEMICONDUCTOR DEVICE - In a wafer level CSP package, with respect to signal wiring | 04-16-2009 |
20090096095 | Semiconductor device and method of manufacturing the same - Provided is a semiconductor device having a substrate, a semiconductor chip flip-chip mounted on the substrate, and a stacked film provided in a gap between the substrate and the semiconductor chip. The stacked film is composed of a protective film covering the surface of the substrate, and an underfill film formed between the solder resist film and the semiconductor chip. The protective film is roughened on the contact surface brought into contacting said underfill film. | 04-16-2009 |
20090096096 | SEMICONDUCTOR DEVICE AND CIRCUIT DEVICE HAVING THE SAME MOUNTED THEREON - A semiconductor device has a semiconductor chip, terminals formed at a prescribed terminal pitch on the bottom side of the semiconductor chip, and columnar post electrodes formed on the terminals. The post electrodes are formed of two different metals, the side bonded with the terminals is constituted by first metallic portions while the side on which solder bumps is formed are constituted by second metallic portions. A dimension in the width direction of the first metallic portions is formed smaller than a dimension in the width direction of the second metallic portions. | 04-16-2009 |
20090096097 | Semiconductor device and manufacturing method of the same - Semiconductor device | 04-16-2009 |
20090102047 | Flip chip package structure and carrier thereof - A flip chip package structure including a chip, a carrier, and a plurality of bumps is provided. The chip has a bonding surface and a plurality of bump pads thereon. The carrier is disposed corresponding to the chip and includes a substrate and a plurality of pre-solders. The substrate has a carrying surface and a patterned trace layer thereon. The patterned trace layer has a plurality of traces, and each of the traces has an outward protruding bonding portion corresponding to the bump. The line width of the bonding portion is greater than that of the trace. The pre-solders are disposed on the bonding portions, respectively. The bumps are disposed between the bump pads and the corresponding pre-solders such that the chip is electrically connected to the carrier through the bumps. | 04-23-2009 |
20090102048 | ELECTRONIC DEVICE AND MANUFACTURING METHOD THEREOF - Electronic device has substrate having at least one pad, electronic component having bump connected with pad of substrate electrically and mounting on substrate by flip chip bonding, conductive resin electrically connecting pad with bump, and insulation sheet disposed between substrate and electronic component. Substrate has recess on surface opposite to electronic component. Pad is formed on recess bottom. Conductive resin is provided on pad and in recess. Sheet has through hole corresponding to each bump. Opening area of through hole is smaller than that of recess. Bump is inserted into through hole, in contact with inner wall of through hole, electrically connected with pad via conductive resin, without direct contact with pad. | 04-23-2009 |
20090102049 | SEMICONDUCTOR DEVICE, LAYERED TYPE SEMICONDUCTOR DEVICE USING THE SAME, BASE SUBSTRATE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD - A semiconductor device has a plurality of external connection lands arranged on a base substrate for an external connection terminal used for electrical connection with an external member. The external connection lands at different arrangement positions have different heights in accordance with a warp of the base substrate which warp the base substrate would have when mounted. Thus, even when the semiconductor device, which attains a thin thickness and a high density, is warped, it is possible to provide a semiconductor device having a high connection yield and high connection reliability between the semiconductor device and a mounting substrate and between the semiconductor devices, and it is possible to provide a layered type semiconductor device using the same, a base substrate and a semiconductor device manufacturing method. | 04-23-2009 |
20090108442 | SELF-ASSEMBLED STRESS RELIEF INTERFACE - A method of forming an interconnect assembly is provided in which contacts exposed at a face of a first element such as, for example, a microelectronic element are aligned and joined with corresponding contacts of an interconnect element confronting the face of the first element. At least one of the i) the contacts of the first element, ii) the corresponding contacts of the interconnect element, iii) a joining metal between the contacts and the corresponding contacts includes a catalyst metal. Subsequently, a material including an organic component contacting the catalyst metal reacts to form volume expansion accommodation elements in the presence of the catalyst metal, the reaction being limited by proximity with the catalyst metal, such that the interconnect assembly includes volume expansion accommodation elements adjacent to the joined contacts. | 04-30-2009 |
20090108443 | Flip-Chip Interconnect Structure - Various aspects can be implemented for providing flip-chip interconnect structures for connecting or mounting semiconductor chips to supporting substrates, such as cards, circuit boards, carriers, lead frames, and the like. In general, one aspect can be a method of providing a flip-chip interconnect structure that includes providing a semiconductor work piece that includes one or more bond pads. The method also includes depositing a first non-reflowable layer that has a first melting temperature higher than a predetermined first reflow temperature. The method further includes depositing a reflowable stress relief layer that reflows at the predetermined first reflow temperature. The method additionally includes depositing a second non-reflowable layer that has a second melting temperature higher than the predetermined first reflow temperature such that the deposited reflowable stress relief layer is between the first and the second non-reflowable layers. | 04-30-2009 |
20090108444 | CHIP PACKAGE STRUCTURE AND ITS FABRICATION METHOD - A chip package structure and its fabrication method are disclosed. Method of electrically connecting a chip with plural different metal layers is utilized to replace the conventional method of connecting identical metal layer merely. Besides, the method of a protective layer directly set on the metal layer to cover the chip and the conductive connecting structure is different from the general method of coating the solder mask on the metal layer. Moreover, a carrier utilized for support makes lighter and thinner substrate be fabricated. The fabrication method is utilized to manufacture by using the fabrication process of present package manufacturing. No additional equipments and fabrication processes are needed so that the PCB production flow may be simplified to reduce the package cost. | 04-30-2009 |
20090108445 | SUBSTRATE STRUCTURE AND SEMICONDUCTOR PACKAGE USING THE SAME - A substrate structure is provided. The substrate structure includes a substrate and a patterned wiring layer formed on the substrate. The patterned wiring layer includes a plurality of conductive traces. An isolation layer covers the patterned wiring layer and has an opening to expose a portion of at least one of the conductive traces therefrom. A plurality of conductive coatings covers the exposed portions of the conductive traces. The present invention further provides a semiconductor package with the above substrate structure. | 04-30-2009 |
20090108446 | ELECTRODE STRUCTURE FOR SEMICONDUCTOR CHIP - The bump electrode | 04-30-2009 |
20090115054 | ELECTRONIC COMPONENT - An electronic component includes: an active surface; a plurality of external connection terminals included in the active surface; a bump electrode disposed to the active surface, the bump electrode including: an internal resin formed on the active surface as a core; and a conductive film on a surface of the internal resin, the internal resin being formed in a nearly half-cylindrical shape having a transverse section of one of a nearly semicircular shape, a nearly semielliptical shape, and a nearly trapezoidal shape and extending orthogonal to the transverse section, the transverse section being orthogonal to the active surface; and a global wiring line disposed on the active surface and connecting between the plurality of external connection terminals, and at least one of the external connection terminals being electrically connected to the conductive film. | 05-07-2009 |
20090115055 | MOUNTING STRUCTURE OF ELECTRONIC COMPONENT - A mounting structure of an electronic component includes: a substrate having a terminal and the electronic component which is mounted on the substrate; and a bump electrode included in the electronic component. This bump electrode has an underlying resin provided on an active surface of the electronic component, and a conductive film covering part of a surface of the underlying resin and exposing the rest so as to be electrically continued to an electrode terminal. In this mounting structure, the conductive film of the bump electrode makes direct conductive contact with the terminal, and the underlying resin of the bump electrode elastically deforms so that at least part of an exposed area which is exposed without being covered by the conductive film directly adheres to the substrate. Further, the substrate and the electronic component retain a state of the bump electrode making conductive contact with the terminal by adhesivity of the exposed area of the underlying resin to the substrate. | 05-07-2009 |
20090115056 | DEVICE MOUNTING BOARD, SEMICONDUCTOR MODULE, AND MOBILE DEVICE - A device mounting board includes an insulating layer formed of an insulating resin, a glass cloth covering the surface of the insulating layer, and an electrode provided in a through hole extending through the glass cloth. The angle of contact with solder of the glass cloth is larger than that of the resin. Thus, solder bumps are formed on the electrode of the device mounting board | 05-07-2009 |
20090115057 | C4 JOINT RELIABILITY - In one embodiment, the invention provides a method comprising fabricating a die bump on a die, the die bump being shaped and dimensioned to at least reduce the flow of solder material used, to attach the die bump to a package substrate, towards an under bump metallurgy (UBM) layer located below the die bump. Advantageously, the method may comprise performing a substrate reflow operation to attach the package substrate to the die bump, without performing a separate wafer reflow operation to reflow the die bump. | 05-07-2009 |
20090121348 | CHIP STRUCTURE AND PROCESS THEREOF AND STACKED STRUCTURE OF CHIPS AND PROCESS THEREOF - A chip structure and a stacked structure composed of the chip structures are provided. The chip structure has a substrate and at least one compliant contact. Furthermore, the chip structure may further have a redistribution layer for redistributing pads originally disposed around the substrate in a specific arrangement. The substrate has a first surface and a second surface. The compliant contact is embedded into the substrate and protrudes outside the first surface and the second surface of the substrate. The compliant contact has a compliant bump and a conductive layer encapsulating the compliant bump. The conductive layer can be connected with the redistribution layer. Two chip structures can be connected with each other through their compliant contacts or through their compliant contacts or redistribution layers. | 05-14-2009 |
20090121349 | SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME - A technique which improves the reliability in coupling between a bump electrode of a semiconductor chip and wiring of a mounting substrate, more particularly a technique which guarantees the flatness of a bump electrode even when wiring lies in a top wiring layer under the bump electrode, thereby improving the reliability in coupling between the bump electrode and the wiring formed on a glass substrate. Wiring, comprised of a power line or signal line, and a dummy pattern are formed in a top wiring layer beneath a non-overlap region of a bump electrode. The dummy pattern is located to fill the space between wirings to reduce irregularities caused by the wirings and space in the top wiring layer. A surface protection film formed to cover the top wiring layer is flattened by CMP. | 05-14-2009 |
20090121350 | BOARD ADAPTED TO MOUNT AN ELECTRONIC DEVICE, SEMICONDUCTOR MODULE AND MANUFACTURING METHOD THEREFORE, AND PORTABLE DEVICE - A board adapted to mount an electronic device includes an insulating resin layer, a wiring layer of a predetermined pattern provided on one surface of the insulating resin layer, a bump electrode provided on an insulating-resin-layer-side surface of the wiring layer, and a covering, formed of a metal layer, which covers a top surface of the bump electrode and a region, at a side surface of the bump electrode, continuous with the top surface excluding a region in contact with the wiring layer. | 05-14-2009 |
20090121351 | Process for forming a bump structure and bump structure - A method for forming a bump structure and a bump structure for conductive interconnection with another element having at least one of microelectronic devices or wiring thereon, used as an electric connection in an electronic circuit, includes the steps of forming a mandrel by steps including forming at least one opening extending through a bump-forming die body in the thickness direction thereof and positioning a bump-forming die lid on a surface of the bump-forming die body so as to cover one end of the opening and to thereby define a bump-forming recess. The bump-forming die body may be comprised of a metal sheet. A metal layer is formed at least on an inner surface of the bump-forming die lid exposed within the bump-forming recess. The mandrel is removed so as to expose the metal layer and form a bump structure. | 05-14-2009 |
20090121352 | MUTLI-PACKAGE MODULE AND ELECTRONIC DEVICE USING THE SAME - A package substrate for a multi-package module. The package substrate comprises a substrate having a die region and at least one thermal channel region outwardly extending to an edge of the substrate from the die region. An array of bumps is arranged on the substrate except in the die and thermal channel regions, in which the interval between the bumps is narrower than the width of the thermal channel region. An electronic device with a package substrate is also disclosed. | 05-14-2009 |
20090127703 | Method and System for Providing a Low-Profile Semiconductor Assembly - A semiconductor assembly is provided that includes a substrate that has a first surface. A chip is coupled to the substrate. The chip has a second surface that faces the first surface of the substrate. The chip is spaced apart from the substrate forming a gap. At least a portion of the substrate is coupled to the chip by solder bumps. The solder bumps include a deformable material, such that as a height of the gap between the chip and the substrate increases, the solder bumps deform into a stretched state. An underfill material is applied between the substrate and the chip. The underfill material substantially fills the gap between the chip and the substrate and surrounds the solder bumps in the stretched state. Barricades comprising non-conductive protrusions are disposed between the first surface of the substrate and the second surface of the chip. The barricades confine the solder bumps in a compressed state. | 05-21-2009 |
20090127704 | Method and System for Providing a Reliable Semiconductor Assembly - A semiconductor assembly is provided that includes a substrate. A first set of non-conductive hedges is disposed on and protrudes from a first surface of the substrate. A chip is coupled to and spaced apart from the substrate. The chip has a second surface facing the first surface of the substrate. A second set of non-conductive hedges is disposed on and protrudes from the second surface of the chip. The first set of hedges is configured and positioned to engage the second set of hedges to restrict movement of the substrate with respect to the chip. The second set of hedges is configured and positioned to engage the first set of hedges to restrict movement of the chip with respect to the substrate. | 05-21-2009 |
20090127705 | Semiconductor chip, method of manufacturing semiconductor chip, and semiconductor device - There are provided a semiconductor device capable of accurately determining whether a semiconductor chip is bonded to a solid-state device such as the other semiconductor chip parallelly with each other, a semiconductor chip used for the semiconductor device, and a method of manufacturing the semiconductor chip. The semiconductor chip includes a functional bump projected with a first projection amount from the surface of the semiconductor chip and electrically connecting the semiconductor chip to the solid-state device, and a connection confirmation bump projected with a second projection amount, which is smaller than the first projection amount, from the surface of the semiconductor chip and used for confirming the state of the electrical connection by the functional bump. | 05-21-2009 |
20090127706 | CHIP STRUCTURE, SUBSTRATE STRUCTURE, CHIP PACKAGE STRUCTURE AND PROCESS THEREOF - A chip package structure and process are provided; the structure includes a substrate, a chip, a solder layer and at least a stud bump. The substrate has at least a contact pad, and the chip has an active surface where at least a bonding pad is disposed. The stud bump is disposed on the bonding pad of the chip or on the contact pad of the substrate, and the stud bump joints with the solder layer to fix the chip on the substrate. The stud bump is made of gold-silver alloy containing silver below 15% by weight. | 05-21-2009 |
20090127707 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device having good radiation performance is provided. The semiconductor device is provided with a substrate having one surface in which external connection terminals are formed. The semiconductor device includes the substrate having a wiring layer; a semiconductor chip which is mounted on the one surface of the substrate; the external connection terminals formed on the one surface of the substrate so as to be located along the perimeter of the semiconductor chip; and a conductive part formed on the one surface and having a melting point higher than that of the external connection terminals and electrically insulated from the wiring layer. | 05-21-2009 |
20090127708 | COPPER PILLAR TIN BUMP ON SEMICONDUCTOR CHIP AND METHOD OF FORMING THE SAME - Copper pillar tin bump on semiconductor chip comprises a copper layer composed on chip and a tin layer entirely wrapping whole outer surface of said copper layer. A method for forming of the copper pillar tin bump on semiconductor chip comprises: composing the first copper layer on said chip; applying photoresist to said first copper layer, exposing and developing a part of said photoresist, composing the copper pillar layer at the developed part of photoresist, composing the upper tin layer, removing said photoresist, removing said the first copper layer except disposing place of copper pillar layer, composing side tin layer. The minute pattern makes it possible to form a high density packaging by reducing a pitch of copper pillar tin bump. Signal delay can be reduced by low electric resistance, and underfill can be easily soaked. | 05-21-2009 |
20090127709 | SEMICONDUCTOR DEVICE - A semiconductor device according to the present invention includes: a semiconductor chip; a wiring formed on the semiconductor chip; a passivation film, coating the wiring and having an opening for partially exposing the wiring from the passivation film; an interposing film, formed on a portion of the wiring facing the opening; and a post bump, raisedly formed on the interposing film and with a peripheral edge portion thereof protruding more toward a side than a peripheral edge of the interposing film. | 05-21-2009 |
20090127710 | UNDERCUT-FREE BLM PROCESS FOR PB-FREE AND PB-REDUCED C4 - A system and method for eliminating undercut when forming a C4 solder bump for BLM (Ball Limiting Metallurgy) and improving the C4 pitch. In the process, a barrier layer metal stack is deposited above a metal pad layer. A top layer of the barrier layer metals (e.g., Cu) is patterned by CMP with a bottom conductive layer of the barrier metal stack removed by etching. The diffusion barrier and C4 solder bump may be formed by electroless plating, in one embodiment, using a maskless technique, or by an electroplating techniques using a patterned mask. This allows the pitch of the C4 solder bumps to be reduced. | 05-21-2009 |
20090134514 | METHOD FOR FABRICATING ELECTRICAL BONDING PADS ON A WAFER - A method for fabricating electrical bonding pads on one face of a wafer includes the production of electrically conductive areas and electrical connection branches connecting these conductive areas. A layer of mask material is deposited and openings are produced in this mask layer which extend above said conductive areas and at least some of which extend at least partly beyond the peripheral edges of the underlying conductive areas. Blocks made of a solder material are produces in the openings by electrodeposition in a bath. The mask material is then removed along with the connection branches. The wafer is passed through or placed in an oven so as to shape, on the conductive areas, the blocks into substantially domed electrical bonding pads. | 05-28-2009 |
20090134515 | SEMICONDUCTOR PACKAGE SUBSTRATE - A semiconductor package substrate includes a main body with a surface having a first circuit layer thereon and a dielectric layer covering the first circuit layer, with a plurality of vias on a portion of the first circuit layer; a plurality of first conductive vias disposed in the vias; a plurality of first electrically connecting pads on the first conductive vias and completely exposed on the dielectric layer having no extending circuits for a semiconductor chip to be mounted thereon, the first electrically connecting pad being electrically connected to the first circuit layer of the first conductive via; and an insulating protective layer disposed on the main body with an opening for completely exposing the first electrically connecting pads, whereby the circuit layout density is increased without disposing circuits between the electrically connecting pads. | 05-28-2009 |
20090134516 | Method of manufacturing semiconductor device and semiconductor device - According to an embodiment of the present invention, a method of manufacturing a semiconductor device, comprising forming a conducting layer on a substrate; forming a resist mask having an opening in a prescribed position on the conducting layer; forming a first plated film in the opening by supplying an electric current to the conducting layer; increasing the interval between an inner side surface of the resist mask forming the opening and the first plated film by setting back the inner side surface; and forming a second plated film in the opening resulting from the setback of the inner side surface to cover the first plated film by supplying an electric current to the conducting layer. | 05-28-2009 |
20090140419 | EXTENDED PLATING TRACE IN FLIP CHIP SOLDER MASK WINDOW - A flip chip in accordance with an exemplary embodiment of the present invention has a ball grid array and a die disposed on the ball grid array, wherein the ball grid array includes conducting pads disposed under the die. Traces connecting conducting pads under the die are accessible to leads on the die by way of a solder mask window. These traces continue through the solder mask window and extend out to the border of the ball grid array and are used for both signaling purposes and electroplating purposes. | 06-04-2009 |
20090140420 | SOFT ERROR RATE MITIGATION BY INTERCONNECT STRUCTURE - A method creates a structure that comprises a carrier connected to an integrated circuit chip by pillars and openings. Thus, in this structure, at least one conductive pillar extends a distance or height from the surface of the integrated circuit chip and a barrier surrounds the lower portion of the conductive pillar such that the barrier covers at least some portion of the height of the pillar that is closest to the chip surface. There is at least one opening in the carrier that is large enough to accommodate the conductive pillar and the barrier, and the conductive pillar and the barrier are positioned in opening. A solder is used in the bottom of the opening to connect the conductive pillar to the bottom of the opening. The barrier prevents the solder from contacting the portion of the conductive pillar protected by the barrier. | 06-04-2009 |
20090140421 | Semiconductor Device and Method of Making Integrated Passive Devices - A semiconductor device has integrated passive circuit elements. A first substrate is formed on a backside of the semiconductor device. The passive circuit element is formed over the insulating layer. The passive circuit element can be an inductor, capacitor, or resistor. A passivation layer is formed over the passive circuit element. A carrier is attached to the passivation layer. The first substrate is removed. A non-silicon substrate is formed over the insulating layer on the backside of the semiconductor device. The non-silicon substrate is made with glass, molding compound, epoxy, polymer, or polymer composite. An adhesive layer is formed between the non-silicon substrate and insulating layer. A via is formed between the insulating layer and first passivation layer. The carrier is removed. An under bump metallization is formed over the passivation layer in electrical contact with the passive circuit element. A solder bump is formed on the under bump metallization. | 06-04-2009 |
20090140422 | SUBSTRATE FOR SEMICONDUCTOR PACKAGE WITH IMPROVED BUMPING OF CHIP BUMPS AND CONTACT PADS AND SEMICONDUCTOR PACKAGE HAVING THE SAME - The present invention relates to a substrate for a semiconductor package and a semiconductor package having the same. A substrate for a semiconductor package includes a substrate body; a contact pad group including a plurality of contact pads parallely arranged at a determined interval on a surface of the substrate body; dummy contact pads arranged at both sides of the contact pad group, respectively; and solder resist patterns covering the substrate body and having openings exposing the dummy contact pads and the contact pad group. When bumping the semiconductor chip having the bumps to the solders arranged on the contact pads formed on the substrate, the bumping defect caused due to different volumes of each solder can be prevented. | 06-04-2009 |
20090146297 | Semiconductor Device and Method of Forming Wafer Level Ground Plane and Power Ring - A semiconductor die has active circuits formed on its active surface. Contact pads are formed on the active surface of the semiconductor die and coupled to the active circuits. A die extension region is formed around a periphery of the semiconductor die. Through hole vias (THV) are formed in the die extension region. A conductive plane or ring is formed in a center area on the active surface of the semiconductor die. The conductive plane or ring is coupled to a first contact pad for providing a first power supply potential to the active circuits. The conductive plane or ring is electrically connected to a first THV. A conductive ring is formed partially around a perimeter of the conduction plane or ring. The conductive ring is coupled to a second contact pad for providing a second power supply potential to the active circuits. The conductive ring is electrically connected to a second THV. | 06-11-2009 |
20090146298 | SEMICONDUCTOR DEVICE HAVING SOLDER-FREE GOLD BUMP CONTACTS FOR STABILITY IN REPEATED TEMPERATURE CYCLES - A semiconductor device has a chip ( | 06-11-2009 |
20090152715 | Semiconductor Device and Method of Forming Interconnect Structure for Encapsulated Die Having Pre-applied Protective Layer - A semiconductor device is made by first forming a protective layer over an active surface of a semiconductor wafer. The semiconductor die with pre-applied protective layer are moved from the semiconductor wafer and mounted on a carrier. The semiconductor die and contact pads on the carrier are encapsulated. The carrier is removed. A first insulating layer is formed over the pre-applied protective layer and contact pads. Vias are formed in the first insulating layer and pre-applied protective layer to expose interconnect sites on the semiconductor die. An interconnect structure is formed over the first insulating layer in electrical contact with the interconnect sites on the semiconductor die and contact pads. The interconnect structure has a redistribution layer formed on the first insulating layer, a second insulating layer formed on the redistribution layer, and an under bump metallization layer formed over the second dielectric in electrical contact with the redistribution layer. | 06-18-2009 |
20090152716 | WIRING SUBSTRATE AND ELECTRONIC COMPONENT MOUNTING STRUCTURE - A wiring substrate on which an electronic component is flip-chip bonded, including a substrate main body, a solder resist which is formed on the substrate main body and having an opening, and a plurality of conductive pattern formed on the substrate main body, including exposure surfaces exposed from the opening of the solder resist. The conductive patterns include, a narrow interval group, a wide interval group, an interval between the adjacent conductive patterns belonging to the narrow interval group is narrower than an interval between the adjacent conductive patterns belonging to the wide interval group, an exposure length of the conductive patterns of the narrow interval group is shorter than an exposure length of the conductive patterns of the wide interval group. | 06-18-2009 |
20090160049 | Semiconductor device - A semiconductor device of the present invention includes a semiconductor chip; an internal pad for electrical connection formed on a surface of the semiconductor chip; a stress relaxation layer formed on the semiconductor chip and having an opening for exposing the internal pad; a connection pad made of a metal having solder wettability, formed on a part facing the opening of the internal pad and provided with a protruding portion protruding on the stress relaxation layer; a metal flange made of a metal having solder wettability, encompassing the periphery of the protruding portion and formed with a smaller thickness than a protruding amount of the protruding portion onto the stress relaxation layer; and a solder terminal for electrical connection with outside formed on the protruding portion and the metal flange. | 06-25-2009 |
20090160050 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE AND WAFER - A deep isolation trench extending from the main surface of a substrate to a desired depth is formed on the substrate with an insulating film in buried in it to form a through isolation portion. Subsequently, after a MOSFET is formed on the main surface of the substrate, an interlayer insulating film is deposited on the main surface of the substrate. Then, a deep conduction trench extending from the upper surface of the interlayer insulating film to a depth within the thickness of the substrate is formed in a region surrounded by the through isolation portion. Subsequently, a conductive film is buried in the deep conduction trench to form through interconnect portion. Then, after the undersurface of the substrate is ground and polished to an extent not to expose the through isolation portion and the through interconnect portion, wet etching is performed to an extent to expose parts of the lower portion of each of the through isolation portion and the through interconnect portion. | 06-25-2009 |
20090160051 | Semiconductor Chip, Method of Fabricating the Same and Semiconductor Chip Stack Package - Provided are a semiconductor chip, a method of fabricating a semiconductor chip, and a semiconductor chip stack package. The semiconductor chip includes a semiconductor substrate and a semiconductor device on the semiconductor substrate. A dielectric covers the semiconductor device. A top metal is on the dielectric and electrically connected to the semiconductor device. A deep via penetrates the semiconductor substrate and the dielectric. An interconnection connects the deep via and the top metal electrically. A bump is in contact with the top metal and the interconnection. | 06-25-2009 |
20090166856 | Semiconductor Device - A semiconductor device is provided whereby the signal interference among a plurality of function blocks is reduced. | 07-02-2009 |
20090166857 | Method and System for Providing an Aligned Semiconductor Assembly - A semiconductor assembly is provided that includes a first substrate that has a first surface. A second substrate is coupled to and spaced apart from the first substrate. The second substrate has a second surface facing the first surface of the first substrate. The second substrate includes a set of cavities. A set of non-conductive pillars is disposed on and protrudes from the first surface of the first substrate. The set of non-conductive pillars is configured and positioned to engage the set of cavities of the second substrate to align the second substrate with the first substrate. | 07-02-2009 |
20090166858 | LGA SUBSTRATE AND METHOD OF MAKING SAME - An LGA substrate includes a core ( | 07-02-2009 |
20090166859 | Semiconductor device and method of manufacturing the same - Provided is a semiconductor device including a wafer having an electrode pad; an insulating layer that is formed on the wafer and has an exposure hole formed in one side thereof, the exposure layer exposing the electrode pad, and a support post formed in the other side, the support post having a buffer groove; a redistribution layer that is formed on the top surface of the insulating layer and has one end connected to the electrode pad and the other end extending to the support post; an encapsulation layer that is formed on the redistribution layer and the insulating layer and exposes the redistribution layer formed on the support post; and a solder bump that is provided on the exposed portion of the redistribution layer. | 07-02-2009 |
20090166860 | FLEXIBLE FILM AND DISPLAY DEVICE COMPRISING THE SAME - A flexible film is provided. The flexible film includes a dielectric film; and a metal layer disposed on the dielectric film, wherein the ratio of the thickness of the metal layer to the thickness of the dielectric film is about 1:3 to 1:10. Therefore, it is possible to improve the peel strength, dimension stability, and tensile strength of a flexible film by limiting the ratio of the thicknesses of a dielectric film and a metal layer of the flexible film. | 07-02-2009 |
20090166861 | WIRE BONDING OF ALUMINUM-FREE METALLIZATION LAYERS BY SURFACE CONDITIONING - In sophisticated semiconductor devices including copper-based metallization systems, a substantially aluminum-free bump structure in device regions and a substantially aluminum-free wire bond structure in test regions may be formed on the basis of a manufacturing process resulting in identical final dielectric layer stacks in these device areas. Moreover, reliable wire bond connections may be obtained by providing a protection layer, such as an oxide layer, after exposing the respective contact metal, such as copper, nickel and the like, thereby providing highly uniform process conditions during the subsequent wire bonding process. The number of process steps may be reduced by making a decision as to whether a substrate is to become a product substrate or test substrate for estimating the reliability of actual semiconductor devices. For example, nickel contact elements may be formed above copper-based contact areas wherein the nickel may provide a base for wire bonding or forming a bump material thereon. | 07-02-2009 |
20090174069 | I/O PAD STRUCTURE FOR ENHANCING SOLDER JOINT RELIABILITY IN INTEGRATED CIRCUIT DEVICES - A semiconductor device is described. The device includes an integrated circuit die having an active surface that includes a plurality of input/output (I/O) pads. The device further includes a plurality of crack resistant structures. Each crack resistant structure is formed over an associated I/O pad and includes an associated raised portion. Each I/O pad may be bumped with solder such that a solder bump is formed over the associated crack resistant structure on the I/O pad. | 07-09-2009 |
20090174070 | Three-dimensional stacked substrate arrangements - Three-dimensional stacked substrate arrangements with reliable bonding and inter-substrate protection. | 07-09-2009 |
20090174071 | Semiconductor device including electrically conductive bump and method of manufacturing the same - A semiconductor device and method of manufacturing are provided that include forming an electrically conductive bump on a substrate and forming at least one passivation layer on the bump to reduce solder joint failures. | 07-09-2009 |
20090184418 | WIRING SUBSTRATE, TAPE PACKAGE HAVING THE SAME, AND DISPLAY DEVICE HAVING THE SAME - A wiring substrate includes a base film, a plurality of first wirings and a plurality of second wirings. The base film has a chip-mounting region configured for mounting a semiconductor chip thereon. The first wirings extend in a first direction from inside the chip-mounting region to outside the chip-mounting region, and include first connection end portions extending in a second direction different from the first direction. The first connection end portions may be formed inside the chip-mounting region and configured to electrically connect to the semiconductor chip. The second wirings extend in the first direction from inside the chip-mounting region to outside the chip-mounting region, and include second connection end portions extending in the opposite direction to the second direction in which the first connection end portions extend, and the second connection end portions may be formed inside the chip-mounting region and configured to electrically connect to the semiconductor chip. | 07-23-2009 |
20090184419 | Flip Chip Interconnect Solder Mask - A solder mask for flip chip interconnection has a common opening that spans a plurality of circuit elements. The solder mask allows confinement of the solder during the remelt stage of interconnection, yet it is within common design rules for solder mask patterning. Also, a substrate for flip chip interconnection includes a substrate having the common opening that spans a plurality of circuit elements. Also, a flip chip package includes a substrate having a common opening that spans a plurality of circuit elements. | 07-23-2009 |
20090189279 | METHODS AND SYSTEMS FOR PACKAGING INTEGRATED CIRCUITS - Methods of packaging integrated circuits are described. One method relates to attaching a singulated device wafer to a substrate. The singulated device wafer includes a multiplicity of integrated circuit dice arranged in a first configuration. The method also involves a substrate, which includes a sacrificial semiconductor wafer having device areas with metalized contacts. The device areas on the substrate may be arranged in a configuration matching that of the dice on the device wafer. The method also entails aligning the singulated device wafer as a whole with the substrate so that the dice of the device wafer are positioned substantially simultaneously over associated device areas on the substrate. The method also involves attaching the dice from the singulated wafer as a whole substantially simultaneously to the substrate such that each die of the device wafer is attached to an associated device area of the substrate. | 07-30-2009 |
20090200663 | POLYMER AND SOLDER PILLARS FOR CONNECTING CHIP AND CARRIER - A method of connecting chips to chip carriers, ceramic packages, etc. (package substrates) forms smaller than usual first solder balls and polymer pillars on the surface of a semiconductor chip and applies adhesive to the distal ends of the polymer pillars. The method also forms second solder balls, which are similar in size to the first solder balls, on the corresponding surface of the package substrate to which the chip will be attached. Then, the method positions the surface of the semiconductor chip next to the corresponding surface of the package substrate. The adhesive bonds the distal ends of the polymer pillars to the corresponding surface of the package substrate. The method heats the first solder balls and the second solder balls to join the first solder balls and the second solder balls into solder pillars. | 08-13-2009 |
20090200664 | MANUFACTURING METHOD OF SEMICONDUCTOR APPARATUS AND SEMICONDUCTOR APPARATUS - A first conducting layer is formed on a side of a main surface on which an electrode terminal of a semiconductor device is provided in a semiconductor substrate. The first conducting layer is electrically connected to the electrode terminal of the semiconductor device. A mask layer that has an opening at a predetermined position is formed on the first conducting layer. A second conducting layer is formed inside the opening of the mask layer. The mask layer is removed. A relocation wiring that includes the first conducting layer and electrically draws out the electrode terminal is formed by performing anisotropic etching for the first conducting layer using the second conducting layer as a mask. Finally, a bump is formed on the relocation wiring by causing the second conducting layer to reflow. | 08-13-2009 |
20090200665 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device includes a semiconductor construction assembly having a semiconductor substrate which has first and second surfaces, and has an integrated circuit element formed on the first surface, a plurality of connection pads which are connected to the integrated circuit element, a protective layer which covers the semiconductor substrate and has openings for exposing the connection pads, and conductors which are connected to the connection pads, arranged on the protective layer, and have pads. An upper insulating layer covers the entire upper surface of the semiconductor construction assembly including the conductors except the pads. A sealing member covers at least one side surface of the semiconductor construction assembly. An upper conductors is formed on the upper insulating layer, and has one ends electrically connected to the pads and an external connection pads, respectively, an external connection pad of at least one of the upper conductors being disposed in a region corresponding to the sealing member. | 08-13-2009 |
20090206476 | CONDUCTIVE STRUCTURE FOR A SEMICONDUCTOR INTEGRATED CIRCUIT - A conductive structure for a semiconductor integrated circuit is provided. The semiconductor integrated circuit comprises a pad, and a passivation layer partially overlapping the pad, which jointly define an opening portion. The conductive structure is adapted to be electrically connected to the pad through the opening portion. The conductive structure comprises an under bump metal (UBM). A first conductor layer formed on the under bump metal is electrically connected to the under bump metal. A second conductor layer formed on the first conductor layer and electrically connected to the first conductor layer and a cover conductor layer. Furthermore, the under bump metal, the first conductor layer, and the second conductor jointly define a basic bump structure. The cover conductor layer is adapted to cover the basic bump structure. | 08-20-2009 |
20090206477 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A semiconductor device has a plurality of wafers which are laminated to each other, wherein: each wafer comprises an lamination surface to which another wafer is laminated; the lamination surface is provided with an electric signal connecting portion that electrically connects to said another surface so as to form a semiconductor circuit; at least one of the electrical signal connecting portions facing each other is a protruding connection portion that protrudes from the lamination surface; and a reinforcing protruding portion that is insulated from the semiconductor circuit and is provided in an area where the protruding connection portion is not disposed on the lamination surface formed with the protruding connection portion so as to protrude from the lamination surface with a height equal to or larger than that of the protruding connection portion. | 08-20-2009 |
20090206478 | FLIP CHIP DEVICE AND MANUFACTURING METHOD THEREOF - A flip chip device made using LCD-COG (liquid crystal display-chip on glass) technique. The flip chip device comprises a substrate, at least one chip having active area with a plurality of compliant bumps thereon. The compliant bumps are centrally disposed in the center of the chip for electrically connecting the chip and the substrate. An adhesive is daubed on a joint area of the substrate and the chips for jointing the substrate and the chips. By limiting the position of the compliant bumps so that they are centrally disposed on the chips, the thermal warpage of the substrate is reduced. | 08-20-2009 |
20090212420 | INTEGRATED CIRCUIT DEVICE AND METHOD FOR FABRICATING SAME - Fabricating an integrated circuit device includes providing a semiconductor substrate comprising a first surface and a sec-ond surface, forming a wiring layer on the first surface of the semiconductor substrate, providing a circuit chip, and arranging the circuit chip on the wiring layer of the semi-conductor substrate. The fabricating further includes forming an embedding layer on the wiring layer and on the circuit chip, the embedding layer encapsulating the circuit chip, thinning the semiconductor substrate at the second surface after forming the embedding layer, and forming a conductive via in the semiconductor substrate being electrically coupled to the wiring layer and exposed at the second surface of the semiconductor substrate. Moreover, an integrated circuit de-vice is described. | 08-27-2009 |
20090212421 | POLYMER INTERLAYER DIELECTRIC AND PASSIVATION MATERIALS FOR A MICROELECTRONIC DEVICE - Polymer interlayer dielectric and passivation materials for a microelectronic device are generally described. In one example, an apparatus includes one or more interconnect structures of a microelectronic device and one or more polymeric dielectric layers coupled with the one or more interconnect structures, the polymeric dielectric layers including copolymer backbones having a first monomeric unit and a second monomeric unit wherein the first monomeric unit has a different chemical structure than the second monomeric unit and wherein the copolymer backbones are cross-linked by a first cross-linker or a second cross-linker, or combinations thereof. | 08-27-2009 |
20090212422 | JOINT RELIABILITY OF SOLDER JOINT BETWEEN Sn-yAg SOLDER AND Ni-P UNDER BUMP METALLIC LAYER BY COBALT ADDITION - An improvement of joint reliability between Sn-yAg (0≦y≦4.0) solder and Ni—P under-bump metallic layers is achieved by cobalt (Co) addition. A solder joint with improved joint reliability is formed between a solder part of an electronic packaging and an under-bump metallic (UBM) layer, which has a specific structure comprising Sn-yAg-xCo (0.02≦x≦0.1, 0≦y≦4.0) alloy solder containing cobalt (Co) ingredient bonded to a Ni—P UBM. Also, a solder joint with a joint structure comprising Sn-yAg-xCo (0.02≦x≦0.1, 0≦y≦4.0) alloy solder with addition of Co ingredient and Ni—P UBM is formed, which is inserted between a PCB substrate and a silicon chip to join the same. | 08-27-2009 |
20090212423 | STACKED SOLDER BALLS FOR INTEGRATED CIRCUIT DEVICE PACKAGING AND ASSEMBLY - A semiconductor device is provided that includes a semiconductor chip, a plurality of solder bumps that electrically couple the semiconductor chip to the outside, and a metal bump being provided on the surface of each first solder bump which is at least a part of the plurality of solder bumps and being made of a metal having a melting point higher than that of the first solder bump. The wettability of the first solder bump is improved as each metal bump serves as a core when the corresponding first solder bump melts. Thus, the connection reliability of the first solder bump can be improved. | 08-27-2009 |
20090212424 | ROUTING STRUCTURE OF RE-DISTRIBUTION LAYER AND METHOD FOR RE-DISTRIBUTING ROUTING STRUCTURE IN INTEGRATED CIRCUIT - A routing structure of an RDL of a chip is provided. The routing structure comprises a power route, a plurality of first stripes, a ground route, and a plurality of second stripes. The power route is arranged in a first direction and comprises a plurality of first bumps and a plurality of first line segments. Each of the first line segments connects adjacent first bumps. The first stripes are arranged in a second direction and connected to the power route. The ground route is disposed at one side of the power route in a third direction, and comprises a plurality of second bumps and a plurality of second line segments. Each of the second line segments connects adjacent second bumps. The second stripes, are arranged in a forth direction and connected to the ground route. The first stripes and the second stripes are interleaved without intersecting one another. | 08-27-2009 |
20090212425 | SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME - A technique is provided which allows a chip mounted by wire bonding and a chip mounted by bump electrodes to share a manufacturing process. Both in a case where a chip is electrically coupled to an external circuit by bump electrodes and a case where the chip is electrically coupled to the external circuit by bonding wires, a bump coupling part and a bonding pad are both provided in a single uppermost wiring layer. When the bump electrodes are used, an opening is provided in an insulating film on the bump coupling part and a surface of the bonding pad is covered with the insulating film. On the other hand, when the bonding wires are used, an opening is provided in an insulating film on the bonding pad and a surface of the bump coupling part is covered with the insulating film. | 08-27-2009 |
20090212426 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - In a semiconductor device, a region under a pad electrode with a bump can be utilized efficiently and a large amount of force is prevented from applying locally to a semiconductor substrate under the bump when the semiconductor device is mounted. A first layer metal wiring is formed on the semiconductor substrate. A pad electrode is formed on the first layer metal wiring through an interlayer insulation film. The pad electrode is connected with the first layer metal wiring through a via hole that is formed in the interlayer insulation film. A protection film is formed on the pad electrode. The protection film has an opening to expose the pad electrode and an island-shaped protection film formed in the opening. An Au bump connected with the pad electrode through the opening in the protection film is formed on the pad electrode. The via hole is formed under the island-shaped protection film, and incompletely filled with a portion of the pad electrode. | 08-27-2009 |
20090212427 | Solder Structures Including Barrier Layers with Nickel and/or Copper - An electronic device may include an electronic substrate, and an under bump seed metallurgy layer on the electronic substrate. A barrier layer may be provided on the under bump seed metallurgy layer so that the under bump seed metallurgy layer is between the barrier layer and the electronic substrate, and the barrier layer may include nickel and/or copper. Moreover, portions of the under bump seed metallurgy layer may be undercut relative to portions of the barrier layer. In addition, a solder layer may be provided on the barrier layer so that the barrier layer is between the solder layer and the under bump seed metallurgy layer. | 08-27-2009 |
20090218684 | AUTOCLAVE CAPABLE CHIP-SCALE PACKAGE - A power semiconductor package that includes a power semiconductor device having a threshold voltage that does not vary when subjected to an autoclave test. | 09-03-2009 |
20090218685 | SEMICONDUCTOR MODULE AND METHOD OF PRODUCING THE SAME - A semiconductor module including: a semiconductor chip in which an integrated circuit is formed; an electrode formed on the semiconductor chip and electrically connected to the integrated circuit; an insulating film formed on the semiconductor chip and having an opening positioned corresponding to the electrode; an elastic protrusion disposed on the insulating film, a surface of the elastic protrusion opposite to the insulating film being convexly curved; an interconnect extending from over the electrode to over the elastic protrusion; an elastic substrate on which a lead is formed, the lead being in contact with part of the interconnect positioned on the elastic protrusion; and an adhesive maintaining a space between a surface of the semiconductor chip on which the elastic protrusion is formed and a surface of the elastic substrate on which the lead is formed. The elastic substrate has a first depression formed by elastic deformation. The lead is in contact with the interconnect on a surface of the first depression. | 09-03-2009 |
20090218686 | SEMICONDUCTOR, SEMICONDUCTOR MODULE, METHOD FOR MANUFACTURING THE SEMICONDUCTOR MODULE, AND MOBILE APPARATUS - A semiconductor module includes a device mounting board and a semiconductor device mounted on the device mounting board. The device mounting board includes an insulating resin layer, a wiring layer provided on one main surface of the insulating resin layer, and bump electrodes, electrically connected to the wiring layer, which are protruded from the wiring layer toward the insulating resin layer. The semiconductor device has device electrodes which are disposed counter to a semiconductor substrate and the bump electrodes, respectively. The surface of a metallic layer provided on the device electrode lies on the same plane as the surface of a protective layer. | 09-03-2009 |
20090218687 | Semiconductor Chip with Passivation Layer Comprising Metal Interconnect and Contact Pads - The invention provides a semiconductor chip comprising a semiconductor substrate comprising a MOS device, an interconnecting structure over said semiconductor substrate, and a metal bump over said MOS device, wherein said metal bump has more than 50 percent by weight of gold and has a height of between 8 and 50 microns. | 09-03-2009 |
20090224401 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device comprises a package substrate, a semiconductor chip, a plurality of bump electrodes and one or more dummy chips. The semiconductor chip is mounted on one surface of the package substrate. The bump electrodes are the other surface of the package substrate and electrically connected to the semiconductor chip through a wiring structure. Each of the dummy chips is mounted on a predetermined region close to a corner portion of the semiconductor chip on the one surface of the package substrate. | 09-10-2009 |
20090230546 | MOUNTED BODY AND METHOD FOR MANUFACTURING THE SAME - A mounted body of the present invention includes: a multilayer semiconductor chip | 09-17-2009 |
20090230547 | DESIGN STRUCTURE, SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURING A SEMICONDUCTOR STRUCTURE AND PACKAGING THEREOF - A design structure is embodied in a machine readable medium for designing, manufacturing, or testing a design. The design structure includes a dielectric material formed between a design sensitive structure and a passivation layer. The design sensitive structure comprising a lower wiring layer electrically and mechanically connected to a higher wiring level by a via farm. A method and structure is also provided. | 09-17-2009 |
20090230548 | SEMICONDUCTOR PACKAGE AND MULTI-CHIP PACKAGE USING THE SAME - A semiconductor package may have a semiconductor chip that includes a chip pad formed on a substrate including an integrated circuit, and a passivation layer exposing the chip pad, a first redistribution wiring layer that is connected to the chip pad and extends on the semiconductor chip and includes a wire bonding pad to provide wire bonding and a first solder pad to connect the first redistribution wiring layer to a second semiconductor chip, and a second redistribution wiring layer that is connected to the first redistribution wiring layer on the first redistribution wiring layer and includes a second solder pad to connect the second redistribution wiring layer to a third semiconductor chip. | 09-17-2009 |
20090230549 | FLIP CHIP PACKAGE - A flip chip package may include a substrate, a semiconductor chip, main bump structures and auxiliary bump structures. The substrate has a circuit pattern. The semiconductor chip is arranged over the substrate. The semiconductor chip includes a body having semiconductor structures, main pads electrically connected to the semiconductor structures to mainly control the semiconductor structures, and auxiliary pads electrically connected to the semiconductor structures to provide auxiliary control of the semiconductor structures. The main bump structures are interposed between the semiconductor chip and the substrate to electrically connect the circuit pattern with the main pads. The auxiliary bump structures can be interposed between the semiconductor chip and the substrate to electrically connect the circuit pattern with the auxiliary pads. | 09-17-2009 |
20090230550 | Method and system for the modular design and layout of integrated circuits - An integrated circuit (IC) and fabrication method thereof is provided that include the steps of specifying a plurality of required tile modules suitable for a particular end application, each of the modular tiles being configured to perform a predetermined function and constructed to have approximately the same length and width dimensions. The modular tiles are used to form the IC in a standard IC fabrication process. In many implementations, physical layout of the IC does not include the step of routing. Capabilities also include configuring the modular tiles to have programmable performance parameters and configuring the modular tiles to cooperate usefully with one another based on a programmable parameter. | 09-17-2009 |
20090230551 | SEMICONDUCTOR DEVICE - The reliability of a semiconductor device which has the semiconductor components which were mounted on the same surface of the same substrate via the bump electrodes with which height differs, and with which package structure differs is improved. | 09-17-2009 |
20090230552 | Bump-on-Lead Flip Chip Interconnection - A flip chip interconnect is made by mating the interconnect bump directly onto a lead, rather than onto a capture pad. Also, a flip chip package includes a die having solder bumps attached to interconnect pads in an active surface, and a substrate having electrically conductive traces in a die attach surface, in which the bumps are mated directly onto the traces. In some embodiments the interconnection is formed without employing a solder mask. In some methods a curable adhesive is dispensed either onto the bumps on the die or onto the traces on the substrate; the adhesive is partly cured during the mating process, and the partly cured adhesive serves to confine the molten solder during a reflow process. | 09-17-2009 |
20090236738 | Semiconductor Device and Method of Forming Oxide Layer on Signal Traces for Electrical Isolation in Fine Pitch Bonding - A semiconductor device has a semiconductor die with a solder bump formed on its surface. A contact pad is formed on a substrate. A signal trace is formed on the substrate. The pitch between the contact pad and signal trace is less than 150 micrometers. An electroless surface treatment is formed over the contact pad. The electroless surface treatment can include tin, ENIG, or OSP. A film layer is formed over the contact pad with an opening over the signal trace. An oxide layer is formed over the signal trace. The film layer and surface treatment prevent formation of the oxide layer over the contact pad. The film layer is removed. The solder bump is reflowed to metallurgically and electrically bond to the contact pad. In the event that the solder bump physically contacts the oxide layer, the oxide layer maintains electrical isolation between the solder bump and signal trace. | 09-24-2009 |
20090236739 | SEMICONDUCTOR PACKAGE HAVING SUBSTRATE ID CODE AND ITS FABRICATING METHOD - A semiconductor package with a substrate ID code and its manufacturing method are revealed. A circuit and a solder mask are formed on the bottom surface of a substrate where the solder mask covers most of the circuit and a circuit-free zone of the substrate. A chip is disposed on the top surface of the substrate. A substrate ID code consisting of a plurality of laser marks is inscribed in the solder mask or in a portion of an encapsulant on the bottom surface away from the circuit to show the substrate lot number on the bottom surface. Therefore, quality control and failure tracking and management can easily be implemented by tracking the substrate ID code from the semiconductor package without changing the appearance of the semiconductor package. Furthermore, the substrate ID code can be implemented by the existing laser imprinting machines for semiconductor packaging processes and be formed at the same time of formation of a product code. The complexity of the semiconductor packaging processes is not increased and the circuits of the substrates are not easily damaged. | 09-24-2009 |
20090236740 | Window ball grid array package - A WBGA (window ball grid array) semiconductor package includes a substrate having a slot as a window for a chip. The slot has four straight sections and four rounded corners respectively interconnecting adjacent two straight sides. Each rounded corner has a radius satisfying the minimum distance between the pads and the slot according to the design rule so as to increase the pad pitch in the chip. The plain area increased due to the pad pitch is suitable for ESD circuit or capacitors layout. | 09-24-2009 |
20090236741 | CONDUCTIVE STRUCTURE OF A CHIP AND METHOD FOR MANUFACTURING THE SAME - A conductive structure of a chip and a method for manufacturing the conductive structure are provided. An under bump metal (UBM) is formed on the redistribution layer (RDL) by performing an electroless plating process. Subsequently, the solder bump is formed on the under bump metal for electrical connection. Thus, the photomask can be economized and the cost of manufacturing can be reduced. | 09-24-2009 |
20090236742 | WIRE BONDING OVER ACTIVE CIRCUITS - A semiconductor device includes a semiconductor die mounted over a package substrate. The die has a bond pad located thereover. A stud bump consisting substantially of a first metal is located on the bond pad. A wire consisting substantially of a different second metal is bonded to the stud bump. | 09-24-2009 |
20090243090 | MOCK BUMP SYSTEM FOR FLIP CHIP INTEGRATED CIRCUITS - A mock bump system includes providing a flip chip integrated circuit having an edge and forming a mock bump near the edge. | 10-01-2009 |
20090243091 | MOCK BUMP SYSTEM FOR FLIP CHIP INTEGRATED CIRCUITS - A mock bump system includes: providing a first structure having an edge; and forming a mock bump near the edge. | 10-01-2009 |
20090243092 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE - A semiconductor device includes a semiconductor element; a plate member disposed opposite to an electronic-circuit forming portion of the semiconductor element; and an elastic body arranged in a compressed state between the semiconductor element and the plate member, wherein the elastic body includes at least one first protruding portion at one end in an extension direction of the elastic body, the first protruding portion being formed opposite to the electronic-circuit forming portion of the semiconductor element, and the semiconductor element and the plate member are fastened by an adhesive agent. | 10-01-2009 |
20090243093 | CONTACT STRUCTURE AND CONNECTING STRUCTURE - A contact structure disposed on a substrate is provided. The contact structure includes at least one pad, at least one polymer bump and at least one conductive layer. The pad is disposed on the substrate and the polymer bump is disposed on the substrate. The polymer bump has a curved surface having a plurality of concave-convex structures. The polymer bump is covered by the conductive layer and the conductive layer is electrically connected with the pad. | 10-01-2009 |
20090243094 | Semiconductor device and manufacturing method thereof - The semiconductor device comprises a first area and a second area positioned adjacent to the outside of the first area, the semiconductor substrate having a main surface and side surfaces and disposed in such a manner that the main surface is positioned in the first area and each of the side surfaces is positioned at a boundary between the first area and the second area, a plurality of pads formed over the main surface of the semiconductor substrate and a plurality of external connecting terminals formed thereon, which are respectively electrically connected to the pads, a first resin portion which is formed over the main surface of the semiconductor substrate so as to cover the pads and has a main surface and side surfaces, and which is formed in such a manner that the external connecting terminals are exposed from the main surface and each of the side surfaces is positioned at the boundary, and a second resin portion which is positioned in the second area and formed so as to cover the side surfaces of the semiconductor substrate and the side surfaces of the first resin portion and which is different in composition from the first resin portion. | 10-01-2009 |
20090243095 | SUBSTRATE, MANUFACTURING METHOD THEREOF, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A substrate on which an IC element is fixed includes: a plurality of metal posts arranged in a plurality of columns in a lengthwise direction and in a plurality of rows in a crosswise direction when viewed in a plan view, the plurality of metal posts having first faces and second faces that face an opposite side to a side that the first faces face; first marks each of the first marks being disposed on extending lines of the plurality of columns; and second marks, each of the second marks being disposed on extending lines of the plurality of rows. | 10-01-2009 |
20090243096 | SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF - A semiconductor device and a method of manufacturing the same are disclosed. The method is carried out by forming solder pads on a substrate by wet etching, flipping a semiconductor chip having a plurality of connection bumps formed on an active surface of the semiconductor chip for the connection bumps to be mounted by compression on the solder pads of the substrate correspondingly, at a temperature of the compression between the connection bumps and the solder pads lower than the melting points of the solder pads and the connection bumps, so as to allow the semiconductor chip to be engaged with and electrically connected to the substrate through the connection bumps and the solder pads, thereby enhancing the bonding strength of the solder pads and the connection bumps and increasing the fabrication reliability. | 10-01-2009 |
20090243097 | SEMICONDUCTOR DEVICE HAVING LOW DIELECTRIC CONSTANT FILM AND MANUFACTURING METHOD THEREOF - A low dielectric constant film/wiring line stack structure made up of a stack of low dielectric constant films and wiring lines is provided in a region on the upper surface of the semiconductor substrate except for the peripheral part of this surface. The peripheral side surface of the low dielectric constant film/wiring line stack structure is covered with a sealing film. This provides a structure in which the low dielectric constant films do not easily come off. In this case, a lower protective film is provided on the lower surface of a silicon substrate to protect this lower surface against cracks. | 10-01-2009 |
20090250811 | Semiconductor Device and Method of Self-Confinement of Conductive Bump Material During Reflow Without Solder Mask - A semiconductor device has a semiconductor die with an die bump pad and substrate with a trace line and integrated bump pad. Conductive bump material is deposited on the substrate bump pad or die bump pad. The semiconductor die over the substrate so that the bump material is disposed between the die bump pad and substrate bump pad. The bump material is reflowed without a solder mask around the die bump pad or substrate bump pad to form an interconnect. The bump material is self-confined within a footprint of the die bump pad or substrate bump pad. The bump material can be immersed in a flux solution prior to reflow to increase wettability. Alternatively, the interconnect includes a non-fusible base and fusible cap. The volume of bump material is selected so that a surface tension maintains self-confinement of the bump material within the bump pads during reflow. | 10-08-2009 |
20090250812 | FLIP-CHIP MOUNTING SUBSTRATE AND FLIP-CHIP MOUNTING METHOD - A solder resist and a central pad to which a central Au bump provided on a semiconductor chip is flip-chip bonded are formed on a substrate main body. In a flip-chip mounting substrate where an underfill resin is provided after the semiconductor chip is mounted, a central opening portion for exposing the central pad is formed in the solder resist, and also, an edge portion forming the central opening portion of the solder resist is partially overlapped with the outer peripheral portion of the central pad. | 10-08-2009 |
20090250813 | INTEGRATED CIRCUIT SOLDER BUMPING SYSTEM - An integrated circuit solder bumping system provides a substrate and forms a redistribution layer on the substrate. An insulation layer is formed on the redistribution layer. The insulation layer has a plurality of openings therethrough. A first UBM layer of titanium is deposited on the insulation layer and in the openings therethrough. A second UBM layer of chromium/copper alloy is deposited on the first UBM layer. A third UBM layer of copper is deposited on the second UBM layer. UBM pads of at least two different sizes are formed from the UBM layers. Solder paste is printed over at least some of the UBM pads. The solder paste is reflowed to form at least smaller solder bumps on at least some of the UBM pads. Bigger solder bumps are formed on at least some of the UBM pads. | 10-08-2009 |
20090267227 | PLASTIC BALL GRID ARRAY RUGGEDIZATION - A method and product which provides a thin metal or ceramic plate to the top of a plastic grid array (PGA) as a stiffener to maintain its flatness over temperature during a column attach process, and the columns are used for attachment to circuit boards or other circuit devices. These may be constructed in this manner initially or may be retrofitted plastic ball grid arrays from which the solder balls are removed and, the stiffener is attached to the top, and the solder columns have been added to replace the solder balls. The stiffener is a bonded thin metal or ceramic plate attached to the top of the PGA to maintain its flatness over temperature during the column attach process. An aluminum plate bonded to the top of a PGA results in a significant reduction in warping during a temperature cycle. This allows attachment of solder columns to the PBGA. The high melt solder columns are attached to an area array pattern on the PBGA substrate. This array is typically either a solid or perimeter grid. It is critical that the ends of the solder columns opposite the ends attached to the substrate align precisely with the matching grid of solder pads on the printed wiring board. The purpose of the stiffening plate is to maintain the flatness of the PBGA during the process of attaching the columns to the substrate as well as attaching the component to the printed wiring board such that the columns maintain their alignment over this temperature range. | 10-29-2009 |
20090267228 | INTERMETALLIC DIFFUSION BLOCK DEVICE AND METHOD OF MANUFACTURE - One embodiment of the present invention is directed to an under bump metallurgy material. The under bump metallurgy material of this embodiment includes an adhesion layer and a conduction layer formed on top of the adhesion layer. The under bump metallurgy material of this embodiment also includes a barrier layer plated on top of the conduction layer and a sacrificial layer plated on top of the barrier layer. The conduction layer of this embodiment includes a trench formed therein, the trench contacting a portion of the barrier layer and blocking a path of intermetallic formation between the conduction layer and the sacrificial layer. | 10-29-2009 |
20090267229 | CHIP PACKAGE STRUCTURE - A chip package structure is provided. The chip package structure comprises different layers of leads electrically connected to different circuits of a chip. The chip package structure comprises a chip and a flexible substrate layer. The chip has an active surface, a plurality of first pads, and a plurality of second pads. The first pads and the second pads are disposed on the active surface. The flexible substrate layer has a first conductive layer, a second conductive layer, a first surface, and a second surface opposite the first surface. The flexible substrate layer has an opening defined therein. The first conductive layer is formed on the first surface of the flexible substrate layer. The first conductive layer includes a plurality of first leads. The first leads electrically connect to the first pads. The second conductive layer is formed on the second surface of the flexible substrate layer. The second conductive layer includes a plurality of second leads. The second leads extend inwards into the opening and electrically connect to the second pads through the opening. | 10-29-2009 |
20090267230 | PACKAGE STRUCTURE FOR INTEGRATED CIRCUIT DEVICE AND METHOD OF THE SAME - The present invention discloses a package structure for an integrated circuit device and method for manufacturing the same. The method includes providing a wafer with multiple integrated circuit devices; providing an extendable substrate having a first surface supporting the wafer; forming multiple anti-elongation layers on a second surface of the extendable substrate, the second surface being opposite to the first surface; forming multiple recesses in the wafer for separating the integrated circuit devices from each other; elongating the extendable substrate to enlarge the multiple recesses; and forming an insulating layer to fill the recesses and cover multiple integrated circuit devices. | 10-29-2009 |
20090273078 | Electronic packages - Assemblies involving integrated circuit dies (e.g. packaged integrated circuits) and packaged dies electrically connected to circuit boards at times mechanically fail at conducting pads used for electrical interconnection. Such failure is mitigated by underlying appropriate pads with a compliant region having specific characteristics. | 11-05-2009 |
20090273079 | SEMICONDUCTOR PACKAGE HAVING PASSIVE COMPONENT BUMPS - A semiconductor package includes contact bumps configured as passive circuit components. One or more contact bumps of the semiconductor package may be formed or configured as pull-up resistors, pull-down resistors, capacitors or inductors. | 11-05-2009 |
20090273080 | DISPLAY DEVICE AND MANUFACTURING METHOD OF THE SAME - A display device includes a drive circuit chip, and a substrate on which the drive circuit chip is mounted. The drive circuit chip includes a semiconductor substrate, an insulation layer, a first conductive layer and a second conductive layer formed of metal between the semiconductor substrate and the insulation layer, and a first bump and a second bump formed over the insulation layer. The first bump is superposed with the first conductive layer, and a profile of the first bump in plan view is within a profile of the first conductive layer in plan view. The second bump is superposed with the second conductive layer, and a profile of the second pump in plan view is beyond a profile of the second conductive layer in plan view. | 11-05-2009 |
20090278255 | SEMICONDUCTOR DEVICE - A semiconductor device includes a substrate having external connection terminals, and a semiconductor chip mounted over a semiconductor-chip mounting portion of the substrate. The external connection terminals are formed by sequentially forming an electroless nickel plating layer, an electroless gold plating layer, and an electrolytic gold plating layer on a terminal portion formed on a surface of the substrate. | 11-12-2009 |
20090283903 | BUMP WITH MULTIPLE VIAS FOR SEMICONDUCTOR PACKAGE AND FABRICATION METHOD THEREOF, AND SEMICONDUCTOR PACKAGE UTILIZING THE SAME - A bump for a semiconductor package forms a polymer layer having multiple vias on an electrode pad above a semiconductor chip to increase an electrical contact area between the electrode pad and a metal bump. Further, the bump forms a polymer layer having multiple vias on a redistribution electrode pad to increase a surface area of an electrode interconnection. The multiple vias increase electrical and mechanical contact areas, thereby preventing current crowding and improving joint reliability. The bump for a semiconductor package may further comprise a stress relaxation layer at the lower portion of the bump. | 11-19-2009 |
20090283904 | FLIPCHIP BUMP PATTERNS FOR EFFICIENT I-MESH POWER DISTRIBUTION SCHEMES - Disclosed is a flipchip scheme where power and ground bumps are arranged in a striped configuration. Specifically, there are a plurality of lines of power bumps, and a plurality of lines of ground bumps. Each line of power bumps is interconnected by a mesh core power bus, and each line of ground bumps is interconnected by a mesh core ground bus. The busses are shorted across the bumps without having to use metal tab extensions. This arrangement provides that: signal routing can be provided between the lines of bumps; and/or the mesh core power busses can be provided as being wider in order to provide improved power mesh performance and/or in order to reduce or eliminate the metal required on the second top-most metal layer. | 11-19-2009 |
20090283905 | CONDUCTIVE STRUCTURE OF A CHIP - A conductive structure of a chip is provided. The conductive structure comprises a ground layer, a dielectric layer, a redistribution layer, an under bump metal and a solder bump. The ground layer electrically connects to the ground pad of the chip, while the dielectric layer overlays the ground layer. Thus, the conductive layer can result in impedance matching, and the packaged chip is adapted to transmit a high frequency signal. | 11-19-2009 |
20090283906 | SEMICONDUCTOR DEVICE, METHOD FOR MOUNTING SEMICONDUCTOR DEVICE, AND MOUNTING STRUCTURE OF SEMICONDUCTOR DEVICE - A semiconductor device of the present invention includes a semiconductor substrate on which an electrode and a Cu bump are stacked, and on the electrode and the Cu bump, a metal bump layer is provided, in which (i) a solder layer via which the semiconductor device is bonded and electrically connected to the mounting substrate by metal bonding and (ii) a Cu layer, an intermetallic compound being formed by interdiffusion of the Cu layer and the solder layer are included. Hence, the present semiconductor device can be mounted with a high bonding strength while avoiding a decrease in mounting reliability, by flip chip mounting by means of metal bonding. | 11-19-2009 |
20090289356 | Wirebondless Wafer Level Package with Plated Bumps and Interconnects - A semiconductor package includes a carrier strip having a die cavity and a plurality of bump cavities. A semiconductor die is mounted in the die cavity of the carrier strip using a die attach adhesive. In one embodiment, a top surface of the semiconductor die is approximately coplanar with a top surface of the carrier strip proximate to the die cavity. Underfill material is deposited into the die cavity between the semiconductor die and a surface of the die cavity. In one embodiment, a passivation layer is deposited over the semiconductor die, and a portion of the passivation layer is etched to expose a contact pad of the semiconductor die. A metal layer is deposited over the package. The metal layer forms a package bump and a plated interconnect between the package bump and the contact pad of the semiconductor die. Encapsulant is deposited over the semiconductor package. | 11-26-2009 |
20090289357 | SEMICONDUCTOR ELEMENT AND SEMICONDUCTOR DEVICE USING THE SAME - A semiconductor element includes: a substrate having an integrated circuit; and a wire connection electrode and a bump connection electrode which are provided on a same main surface of the substrate as electrodes having a same connection function to the integrated circuit. The wire connection electrode is provided in a periphery of the main surface. The bump connection electrode is provided inside the wire connection electrode on the main surface. When a straight line dividing the main surface into two regions is determined, the wire connection electrode and the bump connection electrode are located opposite to each other with respect to the straight line. | 11-26-2009 |
20090289358 | SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING THE SAME, AND SUBSTRATE - A semiconductor device includes a substrate and a plurality of bumps. The substrate is compartmentalized into a bump-free area provided along four sides of the substrate and a bump area which is surrounded by the bump-free area. The plurality of bumps is aligned in the bump area. The plurality of bumps includes a first group of bumps aligned along the four sides and a second group of bumps surrounded by the first group. A first subgroup of bumps included in the first group and aligned along one side of the four sides is shifted with respect to a second subgroup of bumps included in the first group and aligned along an opposing side of the four sides in a direction parallel to the one side. | 11-26-2009 |
20090289359 | SEMICONDUCTOR PACKAGE AND METHODS OF MANUFACTURING THE SEMICONDUCTOR PACKAGE - A semiconductor package and a method of manufacturing the semiconductor package are provided. A semiconductor package according to the present general inventive concept may include a base substrate having one surface on which a connection terminal is formed and a first package substrate having a molding layer covering the base substrate. The molding layer faces a circumference of the connection terminal and includes a side surface having first and second surfaces having a circumference of a different size, respectively. | 11-26-2009 |
20090289360 | WORKPIECE CONTACT PADS WITH ELEVATED RING FOR RESTRICTING HORIZONTAL MOVEMENT OF TERMINALS OF IC DURING PRESSING - A method of forming an electronic assembly including a plurality of IC die having bonding terminals that have a solderable material thereon and a workpiece. The workpiece includes workpiece contact pads including an elevated ring having a ring height at least 5 μm above a minimum contact pad height in an indented bonding region that is within the elevated ring. The bonding terminals and/or the plurality of workpiece contact pads include solder thereon. A plurality of IC die are mounted on the workpiece. Heat is applied so that the solder becomes tacky while remaining below its melting temperature to obtain a tacked position. The plurality of IC die are pressed using a pressing tool to heat the solder to a peak temperature that is above the melting temperature. The elevated ring resists horizontal movement of the plurality of IC die from their tacked positions during pressing. | 11-26-2009 |
20090289361 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - A semiconductor device includes at least a wiring board, a semiconductor chip that is mounted on one face side of the wiring board, connection pads that are formed on the one face side of the wiring board, and connect through bonding wires to electrode pads on the semiconductor chip, and bumps disposed on another face side of the wiring board; the semiconductor chip is disposed such that four chip sides face corners of the wiring board, and each chip corner is near one of the outer peripheral sides of the wiring board; and, on one face of the wiring board are provided corner regions which are enclosed by the chip sides of the semiconductor chip and the corners of the wiring board, and the connection pads are disposed in these corner regions. | 11-26-2009 |
20090294958 | WAFER LEVEL REDISTRIBUTION USING CIRCUIT PRINTING TECHNOLOGY - Methods, systems, and apparatuses for wafer-level integrated circuit (IC) packages are described. A wafer has a surface defined by a plurality of integrated circuit regions Each integrated circuit region has a passivation layer and a plurality of terminals on the surface of the wafer accessible through openings in the passivation layer. An ink jet printer is configured to print a plurality of routing interconnects on the surface of a wafer in the form of an ink. The ink jet printer is configured to print the plurality of routing interconnects such that each routing interconnect has a first portion in contact with a respective terminal of the plurality of terminals and has a second portion that extends over the passivation layer. Bump interconnects are attached to the routing interconnects. The wafer may be singulated to create a plurality of wafer-level integrated circuits. | 12-03-2009 |
20090294959 | Semiconductor package device, semiconductor package structure, and fabrication methods thereof - A semiconductor package device, a semiconductor package structure, and fabrication methods thereof are provided, which mainly includes disposing a plurality of semiconductor chips on a wafer formed with TSVs (Through Silicon Vias) and electrically connecting the semiconductor chips to the TSVs; encapsulating the semiconductor chips with an encapsulant; and disposing a hard component on the encapsulant. The hard component ensures flatness of the wafer during a solder bump process and provides support to the wafer during a singulation process such that the wafer can firmly lie on a singulation carrier, thereby overcoming the drawbacks of the prior art, namely difficulty in mounting of solder bumps, and difficulty in cutting of the wafer. | 12-03-2009 |
20090294960 | SEMICONDUCTOR DEVICE - A semiconductor device, including: a substrate having an upper face on which a first ground pad, a first power supply pad, a first signal pad, and a second signal pad are formed; a first substrate formed on the substrate and having an upper face on which a third signal pad connected to the first signal pad and a first circuit are formed; and a semiconductor element including a second substrate having a reverse face on which a bump electrode connected to the first circuit and a second circuit are formed and an upper face on which a fourth signal pad connected to the second signal pad is formed, with a signal through via connected to the second circuit and the fourth signal pad being buried in the second substrate. | 12-03-2009 |
20090302463 | SEMICONDUCTOR DEVICE HAVING SUBSTRATE WITH DIFFERENTIALLY PLATED COPPER AND SELECTIVE SOLDER - A semiconductor device having an insulating substrate with differentially plated metal and selective solder. Chip | 12-10-2009 |
20090302464 | SEMICONDUCTOR DEVICE - A semiconductor device allowing for chip size reduction and thereby cost reduction without being restricted by a layout of bumps comprises a film substrate, an interposer substrate ( | 12-10-2009 |
20090302465 | DIE REARRANGEMENT PACKAGE STRUCTURE AND METHOD THEREOF - A die rearrangement package structure is provided and includes a die; an encapsulated structure is covered around the four sides of the die to expose the active surface and the reverse side of the die; a patterned protective layer is formed on the encapsulated structure and the active surface of the die, and the pads is to be exposed; one end of fan-out patterned metal layer is electrically connected the pads and other end is extended to cover the patterned protective layer; patterned second protective layer is provided to cover the patterned metal layer to expose the portions surface of the patterned metal layer; patterned UBM layer is formed on the exposed surface of the patterned metal layer; and a conductive component is formed on the patterned UBM layer, and electrically connected the patterned metal layer. | 12-10-2009 |
20090302466 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device includes a first metal post that has a first face, a second metal post that has a second face, a first plated layer that is provided on the first face, the first plated layer being discontiguous with an outer edge of the first face, a second plated layer that is provided on the second face, the second plated layer being discontiguous with an outer edge of the second face, an integrated circuit element that is fixed on the first face; a conductor that electrically connects the integrated circuit element with the second metal post, and a resin that seals the integrated circuit element and the conductor. | 12-10-2009 |
20090302467 | ELECTRONIC COMPONENT AND SEMICONDUCTOR DEVICE, METHOD OF FABRICATING THE SAME, CIRCUIT BOARD MOUNTED WITH THE SAME, AND ELECTRONIC APPLIANCE COMPRISING THE CIRCUIT BOARD - An integrated type semiconductor device that is capable of reducing cost or improving the reliability of connecting semiconductor chips together or chips to a circuit board. One embodiment of such an integrated type semiconductor device comprises a first semiconductor device having a semiconductor chip with electrodes, a stress-relieving layer prepared on the semiconductor chip, a wire formed across the electrodes and the stress-relieving layer, and solder balls formed on the wire over the stress-relieving layer; and a bare chip as a second semiconductor device to be electrically connected to the first semiconductor device. | 12-10-2009 |
20090309216 | WAFER LEVEL PACKAGE AND MANUFACTURING METHOD THEREOF - A wafer level package and a manufacturing method thereof capable of reducing stress between an under bump metal and a bump. The wafer level package includes a substrate provided with a plurality of chip pads on a top surface; a first passivation layer to expose the chip pads; vias connected to the chip pads by passing through the first passivation layer; a metal wiring layer formed on the first passivation layer and connected to the vias; an under bump metal formed on the first passivation layer to be connected to the metal wiring layer and having a buffer pattern separated through a trench on a center; a second passivation layer formed on the first passivation layer to expose the under bump metal; a first bump formed on the buffer pattern; and a second bump filling the trench and formed on the first bump and the under bump metal. | 12-17-2009 |
20090309217 | FLIP-CHIP INTERCONNECTION WITH A SMALL PASSIVATION LAYER OPENING - A flip-chip electrical coupling ( | 12-17-2009 |
20090309218 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - When a through-hole electrode and a rear-surface wire are formed on a rear surface of a chip, a convex portion is formed on the rear surface of the chip due to a rear-surface wiring pad which is a part of the through-hole electrode and the rear-surface wire. This causes the air leakage when the chip is sucked, and therefore, the reduction of the sucking force of the chip occurs. A concave portion is formed in advance in a region where a rear-surface wiring pad and a rear-surface wire are formed. The rear-surface wiring pad and the rear-surface wire are provided inside the concave portion. Thus, a flatness of the rear surface of the chip is ensured by a convex portion caused by thicknesses of the rear-surface wiring pad and the rear-surface wire, so that the reduction of the sucking force does not occur when the chip is handled. | 12-17-2009 |
20090315175 | ELECTRODE STRUCTURE AND SEMICONDUCTOR DEVICE - In a power MOS transistor, for example, a source electrode is formed so as to be commonly connected to a plurality of source regions formed on the front surface. Thus, a current density varies based on in-plane resistance of the source electrode, thereby providing the necessity of increasing the number of wires connecting the sources and a lead. In the invention, an electrode structure includes a copper plating layer | 12-24-2009 |
20090315176 | SEMICONDUCTOR PACKAGE AND METHOD FOR MANUFACTURING SEMICONDUCTOR PACKAGE - A semiconductor package of this invention includes external electrode pad | 12-24-2009 |
20090315177 | Semiconductor package with joint reliability - A semiconductor package with improved joint reliability and a method of fabricating the semiconductor package are disclosed. A conductive connector may be formed on a surface of a semiconductor wafer on which semiconductor devices may be arranged. A first insulating layer including a first opening through which a portion of the connection pad is exposed may be formed on the connection pad and the semiconductor wafer. A rewiring line electrically connected to an exposed portion of the connection pad may be formed on the first insulating layer. A second insulating layer including a second opening through which a portion of the rewiring line is exposed may be formed on the rewiring line and the first insulating layer. A connection terminal including one or more entangled wires may be formed on an exposed portion of the rewiring line so as to be electrically connected to the rewiring line. | 12-24-2009 |
20090315178 | CONDUCTIVE BUMP, METHOD FOR PRODUCING THE SAME, AND ELECTRONIC COMPONENT MOUNTED STRUCTURE - A conductive bump formed on an electrode surface of an electronic component. This conductive bump is composed of a plurality of photosensitive resin layers having different conductive filler contents. Consequently, this conductive bump is able to realize conflicting functions, namely, improvement in adhesion strength with the electrode and reduction of contact resistance. | 12-24-2009 |
20090315179 | SEMICONDUCTOR DEVICE HAVING SOLDER BUMPS PROTRUDING BEYOND INSULATING FILMS - A semiconductor device having projection electrodes with a narrow pad pitch, and a method of forming such semiconductor device, are provided. On a semiconductor wafer, a polyimide film, which does not cover each of a plurality of lands, is prepared between the respective lands which adjoin each other among the plurality of lands on the main surface of the semiconductor wafer. A soldering paste material is applied by a printing method, via a mask for printing, on each of a plurality of lands after polyimide film formation, and a solder bump is formed by performing heat curing of the soldering paste material after removing the mask for printing. The solder bump can be provided without generating an electric short circuit between bumps even in the case of a narrow pad pitch. | 12-24-2009 |
20090321926 | MOUNTING STRUCTURE AND MOUNTING METHOD - A mounting structure of the present invention includes a semiconductor element | 12-31-2009 |
20090321927 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD FOR THE SAME - To provide a small, high-performance semiconductor device in which contact between adjacent wires is prevented for increased flexibility in designing a wiring layout, and an efficient method for manufacturing the semiconductor device. The semiconductor device includes a substrate | 12-31-2009 |
20100001399 | Semiconductor Chip Passivation Structures and Methods of Making the Same - Various semiconductor chip passivation structures and methods of making the same are disclosed. In one aspect, a method of manufacturing is provided that includes applying a polymeric passivation layer to a side of a semiconductor chip. The side of the semiconductor chip includes plural conductor pads. Plural openings are formed in the polymeric passivation layer to expose the plural conductor pads. Plural conductor structures are formed on the plural conductor pads. | 01-07-2010 |
20100007015 | INTEGRATED CIRCUIT DEVICE WITH IMPROVED UNDERFILL COVERAGE - An integrated circuit device ( | 01-14-2010 |
20100007016 | DEVICE WITH CONTACT ELEMENTS - A device with contact elements. One embodiment provides an electrical device including a structure defining a main face. The structure includes an array of cavities and an array of overhang regions, each overhang region defining an opening to one of the cavities. The electrical device further includes an array of contact elements, each contact element only partially filling one of the cavities and protruding from the structure over the main face. | 01-14-2010 |
20100007017 | INTER-CONNECTING STRUCTURE FOR SEMICONDUCTOR PACKAGE AND METHOD FOR THE SAME - The present invention discloses an inter-connecting structure for a semiconductor package and a method for the same. The inter-connecting structure for the semiconductor package comprises a substrate formed to support a die thereon; core paste formed on the substrate and adjacent to the die; and a stiffener formed in an upper portion of the core paste, wherein the hardness of the stiffener is larger than the hardness of the core paste. | 01-14-2010 |
20100007018 | PROCESS FOR COATING A BUMPED SEMICONDUCTOR WAFER - A process is described that enables the active side of a bumped wafer to be coated with a front side protection (FSP) material or wafer level underfill (WLUF) without contaminating the solder bumps with the coating material and/or filler. In this process a repellent material is applied to a top portion of the solder bumps on the active side of the wafer, the front side of the wafer is then coated with the coating material, the coating material is hardened, and optionally the repellent material is removed from the solder bumps. | 01-14-2010 |
20100007019 | Semiconductor Device and Method of Forming Composite Bump-on-Lead Interconnection - A semiconductor device has a semiconductor die mounted to a substrate with a plurality of composite interconnects formed between interconnect sites on the substrate and bump pads on the die. The interconnect sites are part of traces formed on the substrate. The interconnect site has a width between 1.0 and 1.2 times a width of the trace. The composite interconnect is tapered. The composite interconnects have a fusible portion connected to the interconnect site and non-fusible portion connected to the bump pad. The non-fusible portion can be gold, copper, nickel, lead solder, or lead-tin alloy. The fusible portion can be tin, lead-free alloy, tin-silver alloy, tin-silver-copper alloy, tin-silver-indium alloy, eutectic solder, or other tin alloys with silver, copper, or lead. An underfill material is deposited between the semiconductor die and substrate. A finish such as Cu-OSP can be formed over the substrate. | 01-14-2010 |
20100013091 | SEMICONDUCTOR DEVICE INCLUDING A COPOLYMER LAYER - A semiconductor device including a chip including an integrated circuit, a conductive layer, a copolymer layer and metal elements. The conductive layer is disposed over the chip and electrically coupled to the integrated circuit. The copolymer is disposed on the conductive layer. The metal elements are electrically coupled to the conductive layer via through-connects in the copolymer layer. | 01-21-2010 |
20100013092 | Semiconductor device and manufacturing method therefor - Provided is a semiconductor device having a bump structure which is capable of resolving inconvenience in mounting. The semiconductor device comprises: an electrode pad; and a columnar bump formed on the electrode pad, the columnar bump comprising: a first high melting point metal layer ( | 01-21-2010 |
20100013093 | Chip Mounting - A device comprising a chip including a substrate defining one or more electronic devices and a printed circuit board electrically connected to the chip via one or more solder elements sandwiched between the chip and the printed circuit board, and the solder elements, said buffer layers having a Young's Modulus of 2.5 GPa or less. | 01-21-2010 |
20100019381 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - A semiconductor device and method of manufacturing a semiconductor device. One embodiment provides an electrically conductive carrier. A semiconductor chip is placed over the carrier. An electrically insulating layer is applied over the carrier and the semiconductor chip. The electrically insulating layer has a first face facing the carrier and a second face opposite to the first face. A first through-hole is in the electrically insulating layer. Solder material is deposited in the first through-hole and on the second face of the electrically insulating layer. | 01-28-2010 |
20100019382 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A technique permitting the reduction in size of a semiconductor device is provided. In a BGA type semiconductor device with a semiconductor chip flip-chip-bonded onto a wiring substrate, bump electrodes of the semiconductor chip are coupled to lands formed at an upper surface of the wiring substrate. The lands at the upper surface of the wiring substrate are coupled electrically to solder balls formed on a lower surface of the wiring substrate. Therefore, the lands include first type lands with lead-out lines coupled thereto and second type lands with lead-out lines not coupled thereto but with vias formed just thereunder. The lands are arrayed in six or more rows at equal pitches in an advancing direction of the rows. However, a row-to-row pitch is not made an equal pitch. In land rows which are likely to cause a short-circuit, the pitch between adjacent rows is made large, while in land rows which are difficult to cause a short-circuit, the pitch between adjacent rows is made small. By so doing, both prevention of a short-circuit and improvement of the layout density of lands are attained at a time. | 01-28-2010 |
20100019383 | METHOD OF FORMING WIRING ON A PLURALITY OF SEMICONDUCTOR DEVICES FROM A SINGLE METAL PLATE, AND A SEMICONDUCTOR CONSTRUCTION ASSEMBLY FORMED BY THE METHOD - In this manufacturing method of a semiconductor device, a metal plate having a plurality of projection electrodes in each of a plurality of semiconductor device formation areas is prepared. Next, the projection electrodes of each of the semiconductor formation areas are aligned corresponding to external connection electrodes of each semiconductor construction, and each semiconductor construction is separately arranged on the projection electrodes in the semiconductor device formation areas. Next, an insulating layer formation sheet is arranged on the metal plate, and the metal plate and the insulating layer formation sheet are joined by heat pressing. Then, the metal plate is patterned and a plurality of upper layer wirings that connect to the projection electrodes is formed. | 01-28-2010 |
20100025847 | SEMICONDUCTOR DEVICE MOUNTED STRUCTURE AND SEMICONDUCTOR DEVICE MOUNTED METHOD - A recess portion is formed on a board surface at a position facing a peripheral end portion of a semiconductor device so as to place a sealing-bonding use resin partially inside the recess portion. Thereby, increases of a placement area for a fillet portion (foot spreading portion) of the sealing-bonding use resin are suppressed while its inclination angle is increased. Thus, stress loads that occur to peripheral portions of the semiconductor device due to thermal expansion differences and thermal contraction differences among individual members caused by heating process and cooling process in mounting operation are relaxed, by which internal breakdown of the semiconductor device mounted structure is avoided. | 02-04-2010 |
20100032829 | STRUCTURES AND METHODS FOR IMPROVING SOLDER BUMP CONNECTIONS IN SEMICONDUCTOR DEVICES - Structures with improved solder bump connections and methods of fabricating such structures are provided herein. The structure includes a trench formed in a dielectric layer which has at least a portion thereof devoid of a fluorine boundary layer. The structure further includes a copper wire in the trench having at least a bottom portion thereof in contact with the non-fluoride boundary layer of the trench. A lead free solder bump is in electrical contact with the copper wire. | 02-11-2010 |
20100032830 | THREE-DIMENSIONAL CONDUCTING STRUCTURE AND METHOD OF FABRICATING THE SAME - The three-dimensional conducting structure comprises a substrate, a first redistributed conductor, a second redistributed conductor and an insulator. The substrate has an active surface, a passive surface opposite to the active one, a pad on the active surface and a through hole. The first redistributed conductor comprises a projecting portion and a receiving portion. The projecting portion is projected from the active surface and electrically connected to the pad. The receiving portion is outside the active surface and in contact with the projecting portion, both of which constitute a recess communicating with the through hole. The second redistributed conductor is positioned within the through hole and the recess, in contact with the receiving portion, and extended toward the passive surface along the through hole. The insulator is filled between the second redistributed conductor and the substrate and between the second redistributed conductor and the projecting portion. | 02-11-2010 |
20100032831 | BUMP STRUCTURE FOE SEMICONDUCTOR DEVICE - There is provided a bump structure for a semiconductor device, comprising a first metal layer, and a second metal layer electrically connected to the first metal layer so as to be integrally formed with the first metal layer, and electrically connected to electrode pads of the semi-conductor device, in which the second metal layer is composed of one or more metals or alloys having the melting point higher than the melting point of the first metal layer or the eutectic temperature of the first metal layer and another substance when the first metal layer makes a fusion reaction to the surface of the another substance. Preferably, the second metal layer may have a thickness greater than that of the first metal layer. The bump structure may further comprise a diffusion prevention layer between the first metal layer and the second metal layer. | 02-11-2010 |
20100032832 | SEMICONDUCTOR CHIP AND SEMICONDUCTOR DEVICE - In this semiconductor chip | 02-11-2010 |
20100032833 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device includes a semiconductor chip of a multilayer wiring structure having an insulating film formed on a surface thereof, multiple electrode pads formed at a central part and an outer peripheral part of the insulating film, and multiple protective metal layers formed respectively on the electrode pads. The semiconductor device also includes a substrate having the semiconductor chip mounted thereon and including multiple substrate terminals formed on a surface thereof respectively in positions corresponding to the electrode pads. The semiconductor chip is mounted on the substrate by connecting a stud bump to a solder bump. The stud bump is formed on any one of each of the protective metal layers and each of the substrate terminals and the solder bump is formed on the other one of each of the protective metal layers and each of the substrate terminals. | 02-11-2010 |
20100032834 | METHOD FOR FORMING BUMPS IN SUBSTRATES WITH THROUGH VIAS - A method for manufacturing solder bumps for through vias in a substrate having a first surface and a second surface opposed to each other. The method includes the steps of forming a blind hole extending in the substrate from the first surface for each via and filling each blind hole with a conductive filler; a deepest part of each filler includes a bump portion made of a solder material. The method further includes the step of removing a part of the substrate extending from the second surface to have at least the bump portions protrude from the substrate. The non-protruding part of each filler defines the corresponding via and the bump portion defines the corresponding bump. | 02-11-2010 |
20100038777 | METHOD OF MAKING A SIDEWALL-PROTECTED METALLIC PILLAR ON A SEMICONDUCTOR SUBSTRATE - A method of forming conductive pillars on a semiconductor wafer in which the conductive pillars are plated with a protecting coating of Ni, Co, Cr, Rh, NiP, NiB , CoWP, or CoP. Only the side of the conductive pillars are plated. The ends of the conductive pillars are free of the protective plating so that the conductive pillars can be readily joined to the pads of a packaging substrate. Also disclosed is a sidewall-protected conductive pillar having a protective coating of Ni, Co, Cr, Rh, NiP, NiB , CoWP, or CoP thereon. | 02-18-2010 |
20100038778 | INTEGRATED CIRCUIT STRUCTURES AND FABRICATING METHODS THAT USE VOIDS IN THROUGH HOLES AS JOINING INTERFACES - A void that is created in a conductive electrode in a through hole that extends through an integrated circuit substrate can be used as a joining interface. For example, an integrated circuit structure includes an integrated circuit substrate having a conductive pad on a first face thereof, and a through hole that extends through the integrated circuit substrate from a second face of the integrated circuit substrate that is opposite to the first face and through the pad. A conductive electrode is provided in the through hole that extends from the second face to the first face through and onto the pad. The conductive electrode includes a void therein adjacent the second face. The void includes a void opening adjacent the second face that defines inner walls of the conductive electrode. A conductive material is provided in the void that directly contacts the inner walls of the conductive electrode. Related fabrication methods are also disclosed. | 02-18-2010 |
20100038779 | SEMICONDUCTOR DEVICE - A semiconductor device includes a semiconductor chip having a first main surface having an electrode pad in an exposed state, and an interlayer insulation layer formed on the first main surface so that the electrode pad is partially exposed; a re-wiring layer including a wiring pattern having a linear portion having one end portion electrically connected to the electrode pad and extending from the electrode pad, and a post electrode mounting portion with a recessed polygonal shape and connected to the other end portion of the linear portion; a post electrode formed on the post electrode mounting portion and having a bottom surface with a contour crossing an upper contour of the post electrode mounting portion at more than two points; a sealing portion disposed so that a top of the post electrode is exposed; and an outer terminal formed on the top of the post electrode. | 02-18-2010 |
20100044859 | Semiconductor device and method of fabricating semiconductor device - There is provided a semiconductor device including a semiconductor substrate on which at least one electrode pad is formed, a rewiring layer connected to the electrode pad, and an encapsulation part which encapsulates the semiconductor substrate, the electrode pad being formed of a first region including a connection part connected to the rewiring layer and a second region other than the first region, the device including: an insulating film provided on the semiconductor substrate, having an opening at which the first region in the electrode pad is exposed, and covering the second region of the electrode pad, wherein the rewiring layer is connected to the first region of the electrode pad exposed at the opening, and extends across the insulating film so as to cover the second region of the electrode pad from above. | 02-25-2010 |
20100044860 | Microelectronic substrate or element having conductive pads and metal posts joined thereto using bond layer - An interconnection element can include a substrate, e.g., a connection substrate, element of a package, circuit panel or microelectronic substrate, e.g., semiconductor chip, the substrate having a plurality of metal conductive elements such as conductive pads, contacts, bond pads, traces, or the like exposed at the surface. A plurality of solid metal posts may overlie and project away from respective ones of the conductive elements. An intermetallic layer can be disposed between the posts and the conductive elements, such layer providing electrically conductive interconnection between the posts and the conductive elements. Bases of the posts adjacent to the intermetallic layer can be aligned with the intermetallic layer. | 02-25-2010 |
20100052159 | Methods of forming C4 metal stud bump for fine pitch packaging applications and structures formed thereby - Methods of forming microelectronic device structures are described. Those methods may include forming a passivation layer on a substrate, wherein the substrate comprises an array of conductive structures, forming a first via in the passivation layer, forming a second via in the passivation layer that exposes at least one of the conductive structures in the array, and wherein the second via is formed within the first via space to form a step via, and forming a conductive material in the step via, wherein a round dimple is formed in the conductive material. | 03-04-2010 |
20100052160 | BUMP STRUCTURE AND METHOD FOR FABRICATING THE SAME - The present invention discloses a bump structure and a method for fabricating the same. The bump structure of the present invention comprises a semiconductor substrate having a plurality of connection pads; a passivation layer covering the substrate and having openings each corresponding to one connection pad, wherein the openings reveal a portion of each connection pad to form a plurality of electrical-connection areas; an elastic layer formed on the passivation layer; and a plurality of bumps each formed corresponding to one electric-connection area and extending to the elastic layer, whereby the elasticity and deformability of the bumps is enhanced. The present invention uses a larger-texture (≧20 μm) patterning process to fabricate an appropriate patterned elastic layer (having parallel lines, strips, or saw teeth) to enhance the elasticity and deformability of the bumps, whereby the bump structure of the present invention can apply to a fine-pitch IC. | 03-04-2010 |
20100052161 | Semiconductor wafer with adhesive protection layer - A semiconductor wafer with an adhesive protection layer includes: a wafer body having a first surface and an opposing second surface; a plurality of electrical connection pads formed on the second surface of the wafer body; and the adhesive protection layer formed on the second surface of the wafer body and the plurality of electrical connection pads, wherein the protection layer is made of a material including a photosensitive adhesive, a thermal-setting adhesive and a dielectric material. The protection layer not only isolates circuits on the wafer surface from external moisture and contaminant, but also can be patterned and is adhesive, such that the wafer can be mounted to a circuit substrate in a subsequent process by the protection layer, without having to apply an additional adhesive on the wafer, thereby greatly simplifying the wafer-substrate attachment procedure during package fabrication processes. | 03-04-2010 |
20100052162 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE - A semiconductor device, includes a semiconductor substrate; and a solder bump part, which is formed on the semiconductor substrate and in which no grain boundary extends equal to or over ⅓ of a diameter dimension of said solder bump part from an outer circumferential surface between an end of a connection part with the semiconductor substrate and a lateral portion. | 03-04-2010 |
20100052163 | SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING SAME AND METHOD OF REPAIRING SAME - A semiconductor device in which opposing electrodes of a semiconductor component and of a wiring board are arranged to conduct via bumps, comprises: a first conductive resin bump provided on the electrode of the semiconductor component; and a second conductive resin bump provided on the electrode of the wiring board. The difference between a glass transition temperature of the first conductive resin bump and a glass transition temperature of the second conductive resin bump is equal to or greater than 40° C. | 03-04-2010 |
20100059881 | SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME - A semiconductor package and a method of manufacturing the semiconductor package are disclosed. The semiconductor package in accordance with an embodiment of the present invention includes: a substrate, in which a conductive pattern formed on one surface of the substrate; an insulation layer, which is formed on one surface of the substrate, in which a through-hole is formed in the insulation layer such that the conductive pattern is exposed; a metal post, which is formed in the through-hole such that one end of the metal post is in contact with the conductive pattern and the other end of the metal post is protruded from the insulation layer; and a solder bump, which is formed on the other end of the metal post. | 03-11-2010 |
20100059882 | SEMICONDUCTOR DEVICE - Signal lines which provide electric connections from an internal circuit formed on a main surface of a semiconductor chip and including, for example, MIS transistor to protective elements constituted by, for example, diodes are drawn out from outlet ports formed on wiring lines disposed between the protective elements, and a signal line region occupied by the signal lines is provided over the protective elements and under electrode pads. A wiring region on the main surface of the semiconductor chip can be enlarged without increasing the chip area. | 03-11-2010 |
20100065964 | COPPER-TOPPED INTERCONNECT STRUCTURE THAT HAS THIN AND THICK COPPER TRACES AND METHOD OF FORMING THE COPPER-TOPPED INTERCONNECT STRUCTURE - A copper-topped interconnect structure allows the combination of high density design areas, which have low current requirements that can be met with tightly packed thin and narrow copper traces, and low density design areas, which have high current requirements that can be met with more widely spaced thick and wide copper traces, on the same chip. | 03-18-2010 |
20100065965 | METHODS OF FORMING SOLDER CONNECTIONS AND STRUCTURE THEREOF - A method comprises depositing a first metal containing layer into a trench structure, which contacts a metalized area of a semiconductor structure. The method further includes patterning at least one opening in a resist to the first metal containing layer. The opening should be in alignment with the trench structure. At least a pad metal containing layer is formed within the at least one opening (preferably by electroplating processes). The resist and the first metal layer underlying the resist are then etched (with the second metal layer acting as a mask, in embodiments). The method includes flowing solder material within the trench and on pad metal containing layer after the etching process. The structure is a controlled collapse chip connection (C4) structure comprising at least one electroplated metal layer formed in a resist pattern to form at least one ball limiting metallurgical layer. The structure further includes an underlying metal layer devoid of undercuts. | 03-18-2010 |
20100065966 | Solder Joint Flip Chip Interconnection - A flip chip interconnect has a tapering interconnect structure, and the area of contact of the interconnect structure with the site on the substrate metallization is less than the area of contact of the interconnect structure with the die pad. Also, a bond-on-lead or bond-on-narrow pad or bond on a small area of a contact pad interconnection includes such tapering flip chip interconnects. Also, methods for making the interconnect structure include providing a die having interconnect pads, providing a substrate having interconnect sites on a patterned conductive layer, providing a bump on a die pad, providing a fusible electrically conductive material either at the interconnect site or on the bump, mating the bump to the interconnect site, and heating to melt the fusible material. | 03-18-2010 |
20100072615 | High-Electrical-Current Wafer Level Packaging, High-Electrical-Current WLP Electronic Devices, and Methods of Manufacture Thereof - The present invention has various aspects relating to the maximization of current carrying capacity of wafer level packaged chip scale solder pad mounted integrated circuits. In one aspect, the solder pad areas are maximized by using rectangular solder pads spaced as close together as reliable mounting to a circuit board will allow. In another aspect, multiple contact pads may be used for increasing the current capacity without using contact pads of different areas. In still another aspect, vias are used to directly connect one lead of high current component or components to a contact pad directly above that component, and to route a second lead of the high current component to an adjacent contact pad by way of a thick metal interconnect layer. | 03-25-2010 |
20100072616 | METHOD OF MANUFACTURING AN ELECTRONIC SYSTEM - A method of manufacturing an electronic system. One embodiment provides a semiconductor chip having a first main face and a second main face opposite to the first main face. A mask is applied to the first main face of the semiconductor chip. A compound is applied to the first main face of the semiconductor chip. The compound includes electronically conductive particles. The semiconductor chip is coupled to a carrier with the compound facing the carrier. | 03-25-2010 |
20100072617 | Multiple die structure and method of forming a connection between first and second dies in same - A multiple die structure includes a first die ( | 03-25-2010 |
20100078810 | SEMICONDUCTOR APPARATUS, SUBSTRATE DESIGN METHOD, AND SUBSTRATE DESIGN APPARATUS - A semiconductor apparatus including: a substrate; and a semiconductor chip mounted on the substrate, wherein the substrate has plural holes, and the plural holes are provided such that the density on a substrate surface of the holes in a first area, which is an area of the substrate facing a semiconductor chip peripheral portion, is higher than the density on the substrate surface of the holes in an area excluding the first area on the substrate. | 04-01-2010 |
20100084763 | Metallic Bump Structure Without Under Bump Metallurgy And Manufacturing Method Thereof - The metallic bump is directly formed on a semiconductor wafer's I/O pad without UBM. First, a zinc layer is formed on the I/O pad or an anti-oxidation layer of the I/O pad is selectively etched off. Then, an isolative layer and a copper foil are arranged sequentially in this order above the I/O pad. The isolative layer is originally in a liquid state or in a temporarily solid state and later permanently solidified. Then, a via above the I/O pad is formed by removing part of the isolative layer and the cooper foil. Subsequently, A thin metallic layer connecting the copper foil and the I/O pad is formed in the via and a plating resist on the copper foil is formed. Then, a metallic bump is formed from the via whose height is controlled by the plating resist. Finally, the plating resist and the copper foil are removed. | 04-08-2010 |
20100084764 | Carbon nanotube-reinforced solder caps, methods of assembling same, and chip packages and systems containing same - A carbon nanotube solder is formed on a substrate of an integrated circuit package. The carbon nanotube solder exhibits high heat and electrical conductivities. The carbon nanotube solder is used as a solder microcap on a metal bump for communication between an integrated circuit device and external structures. | 04-08-2010 |
20100090338 | MICROELECTRONIC DEVICES INCLUDING MULTIPLE THROUGH-SILICON VIA STRUCTURES ON A CONDUCTIVE PAD AND METHODS OF FABRICATING THE SAME - A microelectronic structure includes a conductive pad on a substrate. The conductive pad includes first and second openings extending therethrough. A first conductive via on the conductive pad extends through the first opening in the conductive pad into the substrate. A second conductive via on the conductive pad adjacent the first conductive via extends through the second opening in the conductive pad into the substrate. At least one of the conductive vias may be electrically isolated from the conductive pad. Related devices and fabrication methods are also discussed. | 04-15-2010 |
20100096749 | SEMICONDUCTOR PACKAGE AND MANUFACTURING METHOD THEREOF - Disclosed are a semiconductor package and a manufacturing method thereof. The semiconductor package can include a semiconductor substrate, having one surface on which a conductive pad is formed; an insulating layer, being formed on one surface of the semiconductor substrate; a metal post, penetrating through the conductive pad, the semiconductor substrate, and the insulating layer; and an outer-layer circuit, being electrically connected to the metal post. With the present invention, it can become unnecessary to form an additional via for electrically connecting both surfaces of the semiconductor substrate, thereby simplifying the manufacturing process, reducing the manufacturing cost, and improving the coupling reliability. | 04-22-2010 |
20100102444 | WAFER LEVEL PACKAGE USING STUD BUMP COATED WITH SOLDER - A method of fabricated a wafer level package is described. In one embodiment, the method includes fabricating at least one active device on a semiconductor wafer that has not been singulated, with the active device having a plurality of bonding pads exposed at an upper surface of the wafer. Prior to singulating the semiconductor wafer, a plurality of corresponding stud bumps on the plurality of bonding pads with a wire bonding tool are formed. Thereafter, a molding encapsulation layer is applied over the semiconductor wafer leaving an upper portion of each of the plurality of stud bumps exposed. | 04-29-2010 |
20100102445 | WIRING SUBSTRATE, SOLID-STATE IMAGING APPARATUS USING THE SAME, AND MANUFACTURING METHOD THEREOF - In one embodiment, a miniaturized solid-state imaging apparatus includes a body having a cavity for mounting a semiconductor chip therein. The body has an overhanging portion extending toward the cavity. Further, a lead is disposed within the body. The lead has one end exposed through a top surface of the body and the other end exposed through a bottom surface of the body for electrical connection thereof. | 04-29-2010 |
20100109156 | BACK SIDE PROTECTIVE STRUCTURE FOR A SEMICONDUCTOR PACKAGE - The present invention provides a semiconductor device package, comprising a die having a back surface and an active surface formed thereon; a conductive layer formed upon the back surface of the die; and a protection substrate formed on the conductive layer. An adhesive layer is formed between the conductive layer and the protective layer, if necessary. The present invention further provides a method for forming a semiconductor device package, comprising providing a plurality of die having a back surface and an active surface on a wafer; forming a conductive layer upon the back surface of the die; forming protection substrates on the conductive layer; forming a plurality of bumps on the active surface of each die; and dicing the plurality of die into individual die for singulation by exerting external force on the substrate. An adhesive layer is formed between the conductive layer and the protective layer, if necessary. | 05-06-2010 |
20100109157 | CHIP STRUCTURE AND CHIP PACKAGE STRUCTURE - A chip structure and a chip package structure are disclosed herein. The chip structure includes a chip and a bump. The chip includes at least one pad. The bump is disposed on a bounding region of the pad. The shape of the bump is triangular pillar or trapezoidal pillar. A surface area of connection between the bump and the pad is less than or equal to the bounding region. Therefore, the material usage and the cost of the bump can be reduced. In addition, such shape of the bump has directional characteristic so that it is easy to perform the chip testing via the identifiable pads, and perform the package process of bonding the chip to a circuit board or any carriers. | 05-06-2010 |
20100109158 | SEMICONDUCTOR DEVICE INCLUDING A REDUCED STRESS CONFIGURATION FOR METAL PILLARS - In a metallization system of a sophisticated semiconductor device, metal pillars may be provided so as to exhibit an increased efficiency in distributing any mechanical stress exerted thereon. This may be accomplished by significantly increasing the surface area of the final passivation layer that is in tight mechanical contact with the metal pillar. | 05-06-2010 |
20100109159 | BUMPED CHIP WITH DISPLACEMENT OF GOLD BUMPS - A bumped chip is revealed, including a chip, a UBM layer, an Ag bump, and a creeping-resist layer. The chip has a bonding pad and a passivation layer covering one surface of the chip and exposing the bonding pad. The UBM layer is disposed on the bonding pad and covers the passivation layer at the peripheries of the opening. The Ag bump is disposed on the UBM layer to form as a pillar bump having a top surface and a pillar sidewall. The creeping-resist layer is formed at least on the pillar sidewall to fully encapsulate the Ag bump. Therefore, the disclosed bumped chip will have no Ag-creeping due to exerting stresses nor changing of joint heights under high temperature environment to meet the bumping requirements of lead-free, high reliability, and lower cost. | 05-06-2010 |
20100109160 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A method of manufacturing a semiconductor device, includes the steps of preparing a semiconductor wafer having a connection pad, forming an insulating dam layer in which an opening portion is provided in an area including the connection pad, on the semiconductor wafer, and forming a bump electrode by mounting a conductive ball on the connection pad in the opening portion of the insulating dam layer. | 05-06-2010 |
20100117226 | STRUCTURE AND METHOD FOR STACKED WAFER FABRICATION - A method for fabricating stacked wafers is provided. In one embodiment, the method comprises providing a wafer having a chip side and a non-chip side, the chip side comprising a plurality of semiconductor chips. A plurality of dies is provided, each of the die bonded to one of the plurality of semiconductor chips. The chip side of the wafer and the plurality of dies are encapsulated with a protecting material. The non-chip side of the wafer is thinned to an intended thickness. The wafer is then diced to separate the wafer into individual semiconductor packages. | 05-13-2010 |
20100117227 | METHOD OF PREPARING DETECTORS FOR OXIDE BONDING TO READOUT INTEGRATED CHIPS - In one embodiment, a method of preparing detectors for oxide bonding to an integrated chip, e.g., a readout integrated chip, includes providing a wafer having a plurality of detector elements with bumps thereon. A floating oxide layer is formed surrounding each of the bumps at a top portion thereof. An oxide-to-oxide bond is formed between the floating oxide layer and an oxide layer of the integrated chip which is provided in between corresponding bumps of the integrated chip. The oxide-to-oxide bond enables the bumps on the detector elements and the bumps on the integrated chip to be intimately contacted with each other, and removes essentially all mechanical stresses on and between the bumps. In another embodiment, a device has an interconnect interface that includes the oxide-to-oxide bond and an electrical connection between the bumps on the detector elements and the bumps on the integrated chip. | 05-13-2010 |
20100123243 | FLIP-CHIP CHIP-SCALE PACKAGE STRUCTURE - The present invention relates to a flip-chip chip-scale package structure, and more particularly to a flip-chip chip-scale package structure with high thermal and electrical performance. The flip-chip chip-scale package structure comprising: a die, a substrate, and a metal ribbon. The die comprises a back-side metal and a plurality of bond pads. The die is bonded to the substrate by a plurality of bumps. The metal ribbon is bonded to the back-side metal by way of metal diffusion bonding. By using the package structure of the present invention, it provides high thermal and electrical performance for semiconductor devices. | 05-20-2010 |
20100123244 | Semiconductor device and method of manufacturing the same - Provided are a semiconductor device capable of reducing stress due to a density difference in the arrangement of bumps, and a method of manufacturing the semiconductor device. The semiconductor device includes: a wiring board including an electrode terminal group; a semiconductor chip including a bump formation surface where a bump group is formed and being mounted on the wiring board by using the bump group. The bump formation surface includes a first region where an area density of a region having bumps arranged therein is a first density, a second region where an area density of a region having bumps arranged therein is a second density lower than the first density, and a third region provided in a border portion between the first and second regions. In the third region, an area density of a region having bumps arranged therein is above the second density and below the first density. | 05-20-2010 |
20100123245 | Semiconductor integrated circuit devices and display apparatus including the same - A semiconductor integrated circuit device includes: an electrostatic discharge (ESD) impurity region formed in a substrate; a bump formed on the substrate; and a first wiring layer and a second wiring layer formed at the same level under the bump. The first and second wiring layers are separated from each other, and at least part of each of the first and second wiring layers are overlapped by the bump. The first wiring layer is electrically connected to the ESD impurity region and the bump, and the second wiring layer is insulated from the bump. | 05-20-2010 |
20100127392 | Semiconductor die - A semiconductor die includes a semiconductor substrate, electrodes provided on the semiconductor substrate, an isolating layer provided on the electrodes, an upper protective layer provided on the electrodes and the isolating layer, pads provided on the upper protective layer and connectors inserted through the upper protective layer and used to connect the electrodes to the pads. The area of the pads is larger than that of the electrodes. | 05-27-2010 |
20100127393 | Electronic device and semiconductor device - An electronic device includes: a wiring board having first and second regions; a plurality of first lands in the first region; a plurality of second lands in the second region; and an insulator covering the wiring board. More heat is applied to the first region than the second region. The second land is smaller in volume than the first land. The insulator has a plurality of openings being adjacent to the plurality of first lands and the plurality of second lands. Each of the plurality of openings has substantially the same area. | 05-27-2010 |
20100133686 | CHIP PACKAGE STRUCTURE - A chip package includes a die, a pad-mounting surface on the die, a plurality of bonding pad arranged at the pad-mounting surface, at least one dielectric layer cover over the pad-mounting surface, and at least one conductive wire set in the dielectric layer. The formation of the conductive wire consists of a plurality of steps. Coat a first dielectric layer on the pad-mounting surface and a slot is formed on each bonding pad correspondingly. Then coat a second dielectric layer and produce a wiring slot corresponding to each bonding pad and the slot thereof. Next each wiring slot is filled with electrically conductive metal so as to form a conductive wire. Later Coat a third dielectric layer and a corresponding slot is formed on one end of each conductive wire while this slot is filled with electrically conductive metal to form a solder point. The above steps can further be repeated so as to form an upper-layer and a lower-layer conductive wire. Thereby precision of the chip package, use efficiency of the wafer and yield rate of manufacturing processes are all improved. | 06-03-2010 |
20100133687 | Semiconductor Device with Solder Bump Formed on High Topography Plated Cu Pads - A semiconductor device has a first conductive layer formed over a substrate. A first insulating layer is formed over the substrate and first conductive layer. A second conductive layer is formed over the first conductive layer and first insulating layer. A second insulating layer is formed over the first insulating layer and second conductive layer. The second insulating layer has a sidewall between a surface of the second insulating material and surface of the second conductive layer. A protective layer is formed over the second insulating layer and surface of the second conductive layer. The protective layer follows a contour of the surface and sidewall of the second insulating layer and second conductive layer. A bump is formed over the surface of the second conductive layer and a portion of the protective layer adjacent to the second insulating layer. The protective layer protects the second insulating layer. | 06-03-2010 |
20100140795 | Semiconductor Device and Method of Forming Conductive Pillars in Recessed Region of Peripheral Area Around the Device for Electrical Interconnection to Other Devices - A semiconductor wafer contains a plurality of semiconductor die each having a peripheral area around the die. A first insulating layer is formed over the die. A recessed region with angled sidewall is formed in the peripheral area. A first conductive layer is formed over the first insulating layer outside the recessed region and further into the recessed region. A conductive pillar is formed over the first conductive layer within the recessed region. A second insulating layer is formed over the first insulating layer, conductive pillar, and first conductive layer such that the conductive pillar is exposed from the second insulating layer. A dicing channel partially through the peripheral area. The semiconductor wafer undergoes backgrinding to the dicing channel to singulate the semiconductor wafer and separate the semiconductor die. The semiconductor die can be disposed in a semiconductor package with other components and electrically interconnected through the conductive pillar. | 06-10-2010 |
20100140796 | Manufacturing method of semiconductor device, and semiconductor device - A manufacturing method of a semiconductor device includes a first to fourth steps. The first step includes a step of determining an UBM (Under Bump Metal) radius of an UBM of a chip. The second step includes a step of determining a first curvature radius of a solder bump formed on the UBM. The third step includes a step of determining a SRO (Solider Resist Opening) radius of a SRO of a substrate such that a ratio of the SRO radius to the UMB radius is in a range from 0.8 to 1.2. The fourth step includes a step of determining a second curvature radius of a spare solder formed on an electrode in the SRO such that the second curvature radius is equal to or more than the first curvature radius. | 06-10-2010 |
20100140797 | DEVICE MOUNTING BOARD AND METHOD OF MANUFACTURING THE BOARD, SEMICONDUCTOR MODULE AND METHOD OF MANUFACTURING THE MODULE - A device mounting board is provided with: an insulating resin layer; a wiring layer provided on one major surface of the insulating resin layer; and a bump electrode electrically connected to the wiring layer and configured to be projected from the wiring layer toward the insulating resin layer. The bump electrode has an approximately convex-shaped top surface and at least the peripheral area on the top surface thereof is curve-shaped. | 06-10-2010 |
20100140798 | SEMICONDUCTOR CHIP BUMP CONNECTION APPARATUS AND METHOD - Various semiconductor chip packages and methods of making the same are disclosed. In one aspect, a method of manufacturing is provided that includes coupling a solder bump to a side of a semiconductor chip and bringing the solder bump into contact with a conductor pad coupled to a substrate and positioned in an opening of a solder mask on the substrate. The conductor pad has a first lateral dimension and the opening has a second lateral dimension that is larger than the first lateral dimension. A metallurgical bond is established between the solder bump and the conductor pad. | 06-10-2010 |
20100140799 | Extended Redistribution Layers Bumped Wafer - A semiconductor device is manufactured by, first, providing a wafer, designated with a saw street guide, and having a bond pad formed on an active surface of the wafer. The wafer is taped with a dicing tape. The wafer is singulated along the saw street guide into a plurality of dies having a plurality of gaps between each of the plurality of dies. The dicing tape is stretched to expand the plurality of gaps to a predetermined distance. An organic material is deposited into each of the plurality of gaps. A top surface of the organic material is substantially coplanar with a top surface of a first die of the plurality of dies. A redistribution layer is patterned over a portion of the organic material. An under bump metallization (UBM) is deposited over the organic material in electrical communication, through the redistribution layer, with the bond pad. | 06-10-2010 |
20100140800 | SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING MULTILAYER WIRING BOARD AND SEMICONDUCTOR DEVICE - A semiconductor device includes a multilayer wiring board and a semiconductor chip mounted on the multilayer wiring board. Electrode pads of the semiconductor chip include: first electrode pads including electrode pads respectively disposed in the vicinity of corners of the back surface of the semiconductor chip; and second electrode pads other than the first electrode pads. Connection pads of the multilayer wiring board include: first connection pads connected to the first electrode pads via bumps; and second connection pads connected to the second electrode pads via bumps. The first connection pads are supported by a first insulating region made of a thermoplastic resin, and the second connection pads are supported by a second insulating region made of a thermosetting resin. | 06-10-2010 |
20100148360 | Semiconductor Device and Method of Forming a Vertical Interconnect Structure for 3-D FO-WLCSP - A semiconductor device is made by forming a first conductive layer over a carrier. The first conductive layer has a first area electrically isolated from a second area of the first conductive layer. A conductive pillar is formed over the first area of the first conductive layer. A semiconductor die or component is mounted to the second area of the first conductive layer. A first encapsulant is deposited over the semiconductor die and around the conductive pillar. A first interconnect structure is formed over the first encapsulant. The first interconnect structure is electrically connected to the conductive pillar. The carrier is removed. A portion of the first conductive layer is removed. The remaining portion of the first conductive layer includes an interconnect line and UBM pad. A second interconnect structure is formed over a remaining portion of the first conductive layer is removed. | 06-17-2010 |
20100148361 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME - A semiconductor device and a method for fabricating the same, including: a substrate having a mounting surface formed with a plurality of bonding fingers and covered with an insulating layer, the insulating layer having an opening formed therein for exposing the bonding fingers; and a chip coupled to the substrate and including a body, a self-adhesive protective layer, and a plurality of bumps protruding from the self-adhesive protective layer. The self-adhesive protective layer is formed on the chip but leaves the bumps exposed. The self-adhesive protective layer is made of a photosensitive adhesive, thermosetting adhesive, or dielectric material. The chip is coupled to the substrate via the self-adhesive protective layer, thus allowing the bumps to be electrically connected to the bonding fingers and at least an end of the opening to be exposed. The method enables a more streamlined manufacturing process and lower fabrication costs by dispensing with adhesive dispensing. | 06-17-2010 |
20100148362 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME - A semiconductor device includes an electronic part including an electrode, a substrate including a substrate electrode electrically connected to the first electrode on an upper surface thereof, the first substrate electrode and the first electrode being arranged, facing each other, a connecting member configured to connect the electrode with the substrate electrode, and a sealing material including a first resin portion which contains flux and contacts at least a connection portion between the connecting member and the substrate electrode, and a second resin portion which contains a lower concentration of flux than that of the first resin portion. A gap between the electronic part and the substrate is filled with the sealing film. | 06-17-2010 |
20100155937 | Wafer structure with conductive bumps and fabrication method thereof - A wafer structure with conductive bumps and fabrication method thereof are disclosed herein. Conductive bumps are later converted into conductive balls. A central area and a marginal area are defined on the wafer. To achieve heights among conductive balls formed on the wafer structure, the sizes (can be but not limited to one) of under bump metallurgy (UBM) layer blocks in the central area are smaller than that in the marginal area. The fabrication procedure for forming under bump metallurgy layer blocks of different size includes depositing a photoresist layer on the metallurgy layer and pattern the photoresist with a photomask of smaller opening area for the central area than for the marginal area, and removing the photoresist layer and the portion of metallurgy layer under the photoresist layer. | 06-24-2010 |
20100155938 | FACE-TO-FACE (F2F) HYBRID STRUCTURE FOR AN INTEGRATED CIRCUIT - An integrated circuit (IC) product includes a redistribution layer (RDL) having at least one conductive layer configured to distribute electrical information from one location to another location in the IC. The RDL also includes a plurality of wire bond pads and a plurality of solder pads. The plurality of solder pads each includes a solder wettable material that is in direct electrical communication with the RDL. | 06-24-2010 |
20100155939 | CIRCUIT BOARD AND FABRICATION METHOD THEREOF AND CHIP PACKAGE STRUCTURE - A fabrication method of a circuit board is provided. A substrate, a top pad, a base pad electrically connecting the top pad, and a top and a base solder resist layers are provided. The top and the base pads are disposed on two opposite surfaces of the substrate, respectively. The top solder resist layer having a first opening partially exposing the top pad and the base solder resist layer having a second opening partially exposing the base pad are disposed on the two surfaces, respectively. A conductive layer covering the base solder resist layer and the base pad is formed. A plating resist layer having a third opening is formed on the conductive layer. A current is applied to the conductive layer through the third opening for electroplating a pre-bump on the top pad. The plating resist layer and the conductive layer are then removed. | 06-24-2010 |
20100155940 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - In a semiconductor device in which a plurality of semiconductor chips are stacked, performance is enhanced without deteriorating productivity. The semiconductor device has a plurality of elements, an interlayer insulating film, a pad, and a bump electrode electrically connected with the pad sequentially formed on a main surface of a silicon substrate and has a back-surface electrode formed on a back surface of the silicon substrate and electrically connected with the bump electrode. The bump electrode has a protruding portion penetrating through the pad and protruding toward the silicon substrate side. The back-surface electrode is formed so as to reach the protruding portion of the bump electrode from the back surface side of the silicon substrate toward the main surface side and to cover the inside of a back-surface-electrode hole portion which does not reach the pad, so that the back-surface electrode is electrically connected with the bump electrode. | 06-24-2010 |
20100155941 | SEMICONDUCTOR DEVICE - A semiconductor device includes multiple electrode pads provided in an interconnection layer over a semiconductor substrate; an insulating layer provided on the interconnection layer so as to expose portions of the electrode pads; multiple conductive layers having their respective first ends connected to the exposed portions of the corresponding electrode pads so as to extend therefrom on the insulating layer; and multiple protruding electrodes provided at respective second ends of the conductive layers, wherein the conductive layers extend in a given direction relative to the electrode pads. | 06-24-2010 |
20100155942 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME - A semiconductor device includes: a connection electrode formed on a side of a semiconductor element substrate opposed to a bump, where the semiconductor element substrate includes a semiconductor element; a passivation layer covering the semiconductor element substrate and an end portion of the connection electrode; and a barrier metal layer covering the connection electrode and a portion of the passivation layer so as to be electrically connected to the bump. A recess is formed in a portion of the passivation layer connected with the barrier metal layer. | 06-24-2010 |
20100155943 | SEMICONDUCTOR CHIP USED IN FLIP CHIP PROCESS - A semiconductor chip for forming the same. The semiconductor chip includes M regular solder bump structures and N monitor solder bump structures, M and N being positive integers. If a flip chip process is performed for the semiconductor chip, then the N monitor solder bump structures are more sensitive to a cool-down stress than the M regular solder bump structures. The cool-down stress results from a cool-down step of the flip chip process. Each of the M regular solder bump structures is electrically connected to either a power supply or a device of the semiconductor chip. Each of the N monitor solder bump structures is not electrically connected to a power supply or a device of the semiconductor chip. | 06-24-2010 |
20100155944 | SEMICONDUCTOR DEVICE - A semiconductor device including: a semiconductor substrate including an electrode; a resin protrusion formed on the semiconductor substrate and including a plurality of first portions and a second portion disposed between two of the first portions adjacent to each other; and an interconnect electrically connected to the electrode and extending over one of the first portions of the resin protrusion. A lower portion of a side surface of the second portion includes a portion which extends in a direction intersecting a direction in which the resin protrusion extends. | 06-24-2010 |
20100155945 | SEMICONDUCTOR DEVICE - A semiconductor device including: a semiconductor chip; a plurality of electrodes formed on the semiconductor chip and arranged along one side of the semiconductor chip; a resin protrusion formed on the semiconductor chip and extending in a direction which intersects the side; and a plurality of electrical connection sections formed on the resin protrusion and electrically connected to the respective electrodes. | 06-24-2010 |
20100164096 | Structures and Methods for Improving Solder Bump Connections in Semiconductor Devices - Structures with improved solder bump connections and methods of fabricating such structures are provided herein. The structure includes a via formed in a dielectric layer to expose a contact pad and a capture pad formed in the via and over the dielectric layer. The capture pad has openings over the dielectric layer to form segmented features. The solder bump is deposited on the capture pad and the openings over the dielectric layer. | 07-01-2010 |
20100164097 | Semiconductor Device and Method of Confining Conductive Bump Material During Reflow with Solder Mask Patch - A semiconductor device has a semiconductor die with die bump pads and substrate with trace lines having integrated bump pads. A solder mask patch is formed interstitially between the die bump pads or integrated bump pads. The solder mask patch contains non-wettable material. Conductive bump material is deposited over the integrated bump pads or die bump pads. The semiconductor die is mounted over the substrate so that the conductive bump material is disposed between the die bump pads and integrated bump pads. The bump material is reflowed without a solder mask around the integrated bump pads to form an interconnect between the semiconductor die and substrate. The solder mask patch confines the conductive bump material within a footprint of the die bump pads or integrated bump pads during reflow. The interconnect can have a non-fusible base and fusible cap. | 07-01-2010 |
20100164098 | SEMICONDUCTOR DEVICE INCLUDING A COST-EFFICIENT CHIP-PACKAGE CONNECTION BASED ON METAL PILLARS - In sophisticated semiconductor devices, a chip-package interconnect structure may be established on the basis of a metal pillar without using a solder bump material in the package. In this case, the complexity of the manufacturing process for forming the wiring system of the package may be significantly reduced, while also providing the possibility of increasing packing density of the pillar structure. | 07-01-2010 |
20100164099 | Semiconductor integrated circuit device - A semiconductor integrated circuit device includes plural circuit units each having plural logic circuits; and plural power terminals supplying power source from outside to the semiconductor integrated circuit device, in which the plural circuit units each having plural logic circuits have common packaging design with each other, and lengths in a vertical direction and a lateral direction of the circuit units each having plural logic circuits are equal to an even multiple of a distance between the power terminals adjacent to each other. | 07-01-2010 |
20100164100 | Bump-on-Lead Flip Chip Interconnection - A semiconductor device has a semiconductor die with a plurality of bumps formed over the die. A substrate has a plurality of conductive traces formed on the substrate. Each trace has an interconnect site for mating to the bumps. The interconnect sites have parallel edges along a length of the conductive traces under the bumps from a plan view for increasing escape routing density. The bumps have a noncollapsible portion for attaching to a contact pad on the die and fusible portion for attaching to the interconnect site. The fusible portion melts at a temperature which avoids damage to the substrate during reflow. The noncollapsible portion includes lead solder, and fusible portion includes eutectic solder. The interconnect sites have a width which is less than 1.2 times a width of the conductive trace. Alternatively, the interconnect sites have a width which is less than one-half a diameter of the bump. | 07-01-2010 |
20100171216 | ELECTRONIC DEVICE AND ELECTRONIC APPARATUS - An electronic device includes a semiconductor device and a wiring substrate having a wiring pattern. The semiconductor device includes: a semiconductor chip having an electrode; a convex-shaped resin protrusion provided on a surface of the semiconductor chip, the surface having the electrode; and wiring having a plurality of electrical coupling sections which are aligned on the resin protrusion and electrically coupled to the electrode. The semiconductor device is mounted to the wiring substrate so that the electrical coupling sections and the wiring pattern are brought into contact and electrically coupled with each other. The plurality of electrical coupling sections brought into contact with the wiring pattern include curved or bent shapes projecting in a longitudinal direction of the resin protrusion. | 07-08-2010 |
20100176509 | SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME - A semiconductor device includes: a mount body; a semiconductor chip mounted on the mount body via projecting connecting terminals; and a filling resin filled between the mount body and the semiconductor chip to seal the connecting terminals, the filling resin being retained inside the semiconductor chip in such a way as not to run out of at least one side portion in four side portions defining an outer peripheral portion of the semiconductor chip. | 07-15-2010 |
20100176510 | Fusible I/O Interconnection Systems and Methods for Flip-Chip Packaging Involving Substrate-Mounted Stud Bumps - A semiconductor device has a semiconductor die with bond pads formed on a surface of the semiconductor die. A UBM is formed over the bond pads of the semiconductor die. A fusible layer is formed over the UBM. The fusible layer can be tin or tin alloy. A substrate has bond pads formed on a surface of the substrate. A plurality of stud bumps containing non-fusible material is formed over the bond pads on the substrate. Each stud bump includes a wire having a first end attached to the bond pad of the substrate and second end of uniform height electrically connected to the bond pad of the semiconductor die by reflowing the fusible layer or applying thermal compression bonding. An underfill material is deposited between the semiconductor die and substrate. An encapsulant is deposited over the semiconductor die and substrate. | 07-15-2010 |
20100181666 | Semiconductor device having lead free solders between semiconductor chip and frame and gabrication method thereof - A semiconductor device includes a semiconductor chip having a current path between a first principal surface and a second principal surface opposite from the first principal surface, a first conductive frame having an opposite region to the first principal surface, and a second conductive frame electrically connected via electrical connection member to a pad formed on the second principal surface. In a gap between the first principal surface and the first conductive frame, there are arranged multiple column-shaped lead-free solders which are arranged within a circle drawn around a center of the opposite region and having a diameter corresponding to a narrow side of the opposite region, and which electrically connects the first conductive frame with the semiconductor chip, and a filler which is filled between the multiple column-shaped lead-free solders. | 07-22-2010 |
20100181667 | SEMICONDUCTOR DEVICE MOUNTED STRUCTURE AND ITS MANUFACTURING METHOD, SEMICONDUCTOR DEVICE MOUNTING METHOD, AND PRESSING TOOL - While bumps formed on pads of a semiconductor chip and a board having a sheet-like seal-bonding use resin stuck on its surface are set face to face, the bumps and the board are pressed to each other with a tool, thereby forming a semiconductor chip mounted structure in which the seal-bonding use resin is filled between the semiconductor chip and the board and in which the pads of the semiconductor chip and the electrodes of the board are connected to each other via the bumps, respectively. In the semiconductor chip mounted structure formed in this way, entire side faces at the corner portions of the semiconductor chip are covered with the seal-bonding use resin. As a result, loads generated at corner portions of the semiconductor chip due to board flexures for thermal expansion differences and thermal contraction differences among the individual members caused by heating process and cooling process in mounting operation as well as for mechanical loads after the mounting operation so that internal breakdown of the semiconductor chip can be avoided. | 07-22-2010 |
20100187684 | System and Method for 3D Integrated Circuit Stacking - A method and system of stacking and aligning a plurality of integrated circuits. The method includes the steps of providing a first integrated circuit having at least one funnel-shaped socket, providing a second integrated circuit, aligning at least one protrusion on the second integrated circuit with the at least one funnel-shaped socket, and bonding the first integrated circuit to the second integrated circuit. The system includes a first integrated circuit having at least one funnel-shaped socket, a metallization-diffusion barrier disposed on the interior of the funnel-shaped socket, and a second integrated circuit. The at least one funnel-shaped socket is adapted to receive a portion of the second integrated circuit. | 07-29-2010 |
20100187685 | SEMICONDUCTOR DEVICE - Disclosed is a semiconductor device suppressed in decrease of reliability. The semiconductor device comprises an electrode pad portion ( | 07-29-2010 |
20100187686 | SEMICONDUCTOR PACKAGE COMPRISING ALIGNMENT MEMERS - A semiconductor package comprising alignment members is provided. The semiconductor package includes a semiconductor die, first connection terminals disposed on a first surface of the semiconductor die, and a tape substrate including a substrate portion, and second connection terminals disposed on the substrate portion and disposed corresponding to the first connection terminals. The semiconductor package further includes a first alignment member disposed on the first surface of the semiconductor die, and a second alignment member disposed on the substrate portion of the tape substrate and disposed corresponding to the first alignment member. | 07-29-2010 |
20100193943 | Semiconductor Device Having a Diamond Substrate Heat Spreader - In accordance with one or more embodiments, a semiconductor device comprises a semiconductor die having a heat region disposed on at least one portion of the semiconductor die, and a diamond substrate disposed proximate to the semiconductor die, wherein the diamond substrate is capable of dissipating heat from the diamond substrate via at least one or more bumps coupling the diamond substrate to the heat region of the semiconductor die. | 08-05-2010 |
20100193944 | Semiconductor Flip-Chip System Having Oblong Connectors and Reduced Trace Pitches - A semiconductor chip ( | 08-05-2010 |
20100193945 | REINFORCED STRUCTURE FOR A STACK OF LAYERS IN A SEMICONDUCTOR COMPONENT - The present application relates to a reinforcing structure ( | 08-05-2010 |
20100193946 | SEMICONDUCTOR MODULE AND MANUFACTURING METHOD THEREOF - A semiconductor module includes: an insulating resin layer; a wiring layer which is provided on one main surface of the insulating resin layer and which includes an external connection region; bump electrodes which are electrically connected to the wiring layer and each of which is formed such that it protrudes from the wiring layer toward the insulating resin layer; a semiconductor device which is provided on the other main surface of the insulating resin layer and which includes device electrodes connected to the bump electrode; and a wiring protection layer provided on the wiring layer and the insulating resin layer so as to expose the external connection region. In the semiconductor module, the outer edge portion of the wiring protection layer is in contact with the external edge portion of the semiconductor device such that it shields at least a part of the semiconductor resin layer at the side edge. | 08-05-2010 |
20100193947 | Flip Chip Interconnection Having Narrow Interconnection Sites on the Substrate - A flip chip interconnect of a die on a substrate is made by mating the interconnect bump onto a narrow interconnect pad on a lead or trace, rather than onto a capture pad. The width of the narrow interconnect pad is less than a base diameter of bumps on the die to be attached. Also, a flip chip package includes a die having solder bumps attached to interconnect pads in an active surface, and a substrate having narrow interconnect pads on electrically conductive traces in a die attach surface, in which the bumps are mated onto the narrow pads on the traces. | 08-05-2010 |
20100200985 | Semiconductor Device and Method of Protecting Passivation Layer in a Solder Bump Process - A flip chip semiconductor device has a substrate with a plurality of active devices formed thereon. A contact pad is formed on the substrate in electrical contact with the plurality of active devices. A passivation layer is formed over the substrate and intermediate conduction layer. An adhesive layer is formed over the passivation layer. A barrier layer is formed over the adhesive layer. A wetting layer is formed over the barrier layer. The barrier layer and wetting layer in a first region are removed, while the barrier layer, wetting layer, and adhesive layer in a second region are maintained. The adhesive layer over the passivation layer in the first region are maintained until the solder bumps are formed. By keeping the adhesive layer over the passivation layer until after formation of the solder bumps, less cracking occurs in the passivation layer. | 08-12-2010 |
20100200986 | Grooving Bumped Wafer Pre-Underfill System - A method of forming a semiconductor device includes providing a bumped wafer. A plurality of grooves is formed in an active surface of the bumped wafer. A pre-underfill layer is disposed over the active surface, filling the plurality of grooves. A first adhesive layer is mounted to the pre-underfill layer, and a back surface of the bumped wafer is ground. A second adhesive layer is mounted to the back surface of the bumped wafer. The first adhesive layer is peeled from the active surface of the bumped wafer, or the second adhesive layer is mounted to the first adhesive layer. The bumped wafer is singulated into a plurality of segments by cutting the bumped wafer along the plurality of grooves. | 08-12-2010 |
20100200987 | Semiconductor Device and a Method of Manufacturing the Same - A semiconductor device manufacturing technique which allows reduction of semiconductor chip size. First, a pad and other wires are formed over an insulating film. A surface protective film is formed over the insulating film including the pad and wires, and an opening is made in the surface protective film. The opening lies over the pad and exposes a surface of the pad. A bump electrode is formed over the surface protective film including the opening. Here, the pad is smaller than the bump electrode. Consequently, the wires are arranged just beneath the bump electrode in the same layer as the pad | 08-12-2010 |
20100207270 | SEMICONDUCTOR MODULE, METHOD FOR MANUFACTURING SEMICONDUCTOR MODULE, AND PORTABLE DEVICE - A semiconductor module is of a structure such that a wiring layer, an insulating resin layer and a semiconductor device are stacked in this order by bonding them together with compression. In the wiring layer, bump electrodes each having a base and a tip portion are provided in positions corresponding respectively to device electrodes of the semiconductor device. The bump electrodes penetrate the insulating resin layer and are electrically coupled to the corresponding device electrodes. | 08-19-2010 |
20100207271 | SEMICONDUCTOR DEVICE - In order to provide a wafer level semiconductor device, a protection film and a stress buffer layer are formed on a metal wiring formed on a semiconductor element, a via-hole that passes through the protection film and the stress buffer layer is formed so as to expose the metal wiring, and a bump electrode is formed on a conductive layer that fills the via-hole. | 08-19-2010 |
20100213608 | Solder bump UBM structure - Disclosed is an under bump metallization structure including a plurality of metal or metal alloy layers formed on chip bond pads. The disclosed UBM structure has a stress improvement on the semiconductor device because the thickness of the copper-base layer is reduced to between about 0.3 and 10 microns, preferably between about 0.3 and 2 micron. The presence of the pure tin layer prevents oxidation and contamination of the nickel-base layer. It also forms a good solderable surface for the subsequent processes. Also disclosed are semiconductor devices having the disclosed UBM structure and the methods of making the semiconductor devices. | 08-26-2010 |
20100213609 | SOLDER BUMP, SEMICONDUCTOR CHIP, METHOD OF MANUFACTURING THE SEMICONDUCTOR CHIP, CONDUCTIVE CONNECTION STRUCTURE, AND METHOD OF MANUFACTURING THE CONDUCTIVE CONNECTION STRUCTURE - A solder bump and a conductive connection structure are provided which can conductively connect a semiconductor chip and a substrate with high connection reliability. Filler | 08-26-2010 |
20100213610 | Semiconductor Device and Method of Forming an Interconnect Structure for 3-D Devices Using Encapsulant for Structural Support - A semiconductor device has a first interconnect structure formed over a first side of a substrate. A semiconductor die is mounted to the first interconnect structure. An encapsulant is deposited over the semiconductor die and first interconnect structure for structural support. A portion of a second side of the substrate, opposite the first side of the substrate, is removed to reduce its thickness. The encapsulant maintains substrate robustness during thinning process. A TSV is formed through the second side of the substrate to the first interconnect structure. A second interconnect structure is formed in the TSV. The TSV has a first insulating layer formed over the second side of the substrate and first conductive layer formed over the first insulating layer and into the TSV. The second interconnect structure has a second conductive layer formed over the first conductive layer in an area away from the TSV. | 08-26-2010 |
20100219527 | METALLIZATION SYSTEM OF A SEMICONDUCTOR DEVICE INCLUDING METAL PILLARS HAVING A REDUCED DIAMETER AT THE BOTTOM - In a metallization system of a complex semiconductor device, metal pillars, such as copper pillars, may be formed in a nail-like configuration in order to reduce the maximum mechanical stress acting on the metallization system while providing a required contact surface for connecting to the package substrate. The nail-like configuration may be obtained on the basis of appropriately configured resist masks. | 09-02-2010 |
20100219528 | Electromigration-Resistant Flip-Chip Solder Joints - A semiconductor device contact structure practically eliminating the copper diffusion into the solder as well as the current crowding at the contact with the subsequent electromigration in the solder. A column-like electroplated copper stud ( | 09-02-2010 |
20100224993 | Forming sacrificial composite materials for package-on-package architectures and structures formed thereby - Methods of forming a microelectronic packaging structure are described. Those methods may include forming a solder paste comprising a sacrificial polymer on a substrate, curing the solder paste below a reflow temperature of the solder to form a solid composite hybrid bump on the conductive pads, forming a molding compound around the solid composite hybrid bump, and reflowing the hybrid bump, wherein the sacrificial polymer is substantially decomposed. | 09-09-2010 |
20100230809 | WIRE LOOP AND METHOD OF FORMING THE WIRE LOOP - A method of forming a wire loop is provided. The method includes: (1) forming a first fold of wire; (2) bonding the first fold of wire to a first bonding location to form a first bond; (3) extending a length of wire, continuous with the first bond, between (a) the first bond and (b) a second bonding location; and (4) bonding a portion of the wire to the second bonding location to form a second bond. | 09-16-2010 |
20100230810 | FLIP CHIP SEMICONDUCTOR PACKAGE AND FABRICATION METHOD THEREOF - There is provide a flip chip semiconductor package comprising: an electrode pad formed a semiconductor substrate; a lower metal bonding layer formed on the electrode pad; an upper metal bonding layer formed on the lower metal bonding layer and having a post shape of a predetermined height; and a conductive bump formed on the upper metal bonding layer, and a solder bump covers at least partially the surface of the upper metal bonding layer. An insulating layer for electrode reconfiguration is formed around the electrode pad on the substrate, and the insulating layer has a predetermined thickness to prevent the penetration of a particles from the solder bump. The semiconductor package may further comprise an oxidation preventing layer between the solder bump and the upper metal bonding layer. In accordance with the present invention, there is realized the flip chip semiconductor package which improves the adhesive strength of the solder bump and which more improves the reliability in the flip chip bump structure of fine pitches. | 09-16-2010 |
20100230811 | SEMICONDUCTOR DEVICE HAVING A CONDUCTIVE BUMP - In one embodiment, a semiconductor device includes a semiconductor substrate and a bonding pad disposed thereon. The semiconductor device also includes a passivation layer, a buffer layer, and an insulating layer sequentially stacked on the semiconductor substrate. According to one aspect, a first recess is defined within the passivation layer, the buffer layer, and the insulating layer to expose at least a region of the bonding pad and a second recess is defined within the insulating layer to expose at least a region of the buffer layer and spaced apart from the first recess such that a portion of the insulating layer is interposed therebetween. Further, the semiconductor device includes a conductive solder bump disposed within the first and second recesses. The conductive solder bump may be connected to the bonding pad in the first recess and supported by the buffer layer through a protrusion of the conductive solder bump extending into the second recess. | 09-16-2010 |
20100230812 | Microelectronic Assemblies Having Compliancy and Methods Therefor - A microelectronic assembly is disclosed that includes a semiconductor wafer with contacts, compliant bumps of dielectric material overlying the first surface of the semiconductor wafer, and a dielectric layer overlying the first surface of the semiconductor wafer and edges of the compliant bumps. The compliant bumps have planar top surfaces which are accessible through the dielectric layer. Conductive traces may be electrically connected with contacts and extend therefrom to overlie the planar top surfaces of the compliant bumps. Conductive elements may overlie the planar top surfaces in contact with the conductive traces. | 09-16-2010 |
20100237497 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - There are included a semiconductor substrate provided with a desirable element region, an electrode pad formed to come in contact with a surface of the semiconductor substrate or a wiring layer provided on the surface of the semiconductor substrate, a bonding pad formed on a surface of the electrode pad through an intermediate layer, and a resin insulating film for covering a peripheral edge of the bonding pad such that an interface of the bonding pad and the intermediate layer is not exposed to a side wall. | 09-23-2010 |
20100244239 | Semiconductor Device and Method of Forming Enhanced UBM Structure for Improving Solder Joint Reliability - A semiconductor device has a first conductive layer formed over a substrate. A first insulating layer is formed over the first conductive layer. A second conductive layer is formed over first insulating layer and first conductive layer. A third insulating layer is formed over the second insulating layer and second conductive layer. An under bump metallization layer (UBM) is formed over the third insulating layer and second conductive layer. A UBM build-up structure is formed over the UBM. The UBM build-up structure has a sloped sidewall and is confined within a footprint of the UBM. The UBM build-up structure extends above the UBM to a height of 2-20 micrometers. The UBM build-up structure is formed in sections occupying less than an area of the UBM. A solder bump is formed over the UBM and UBM build-up structure. The sections of the UBM build-up structure provide exits for flux vapor escape. | 09-30-2010 |
20100244240 | STACKABLE ELECTRONIC PACKAGE AND METHOD OF MAKING SAME - An apparatus comprises a first chip layer comprising a first component coupled to a first side of a first flex layer, the first component comprising a plurality of electrical pads. The first chip layer also comprises a first plurality of feed-thru pads coupled to the first side of the first flex layer and a first encapsulant encapsulating the first component, the first encapsulant having a portion thereof removed to form a first plurality of cavities in the first encapsulant and to expose the first plurality of feed-thru pads by way of the first plurality of cavities. | 09-30-2010 |
20100244241 | Semiconductor Device and Method of Forming a Thin Wafer Without a Carrier - A semiconductor device has a conductive via in a first surface of a substrate. A first interconnect structure is formed over the first surface of the substrate. A first bump is formed over the first interconnect structure. The first bump is formed over or offset from the conductive via. An encapsulant is deposited over the first bump and first interconnect structure. A portion of the encapsulant is removed to expose the first bump. A portion of a second surface of the substrate is removed to expose the conductive via. The encapsulant provides structural support and eliminates the need for a separate carrier wafer when thinning the substrate. A second interconnect structure is formed over the second surface of the substrate. A second bump is formed over the first bump. A plurality of semiconductor devices can be stacked and electrically connected through the conductive via. | 09-30-2010 |
20100244242 | SEMICONDUCTOR DEVICE - A semiconductor device including a first substrate having first and second surfaces, multiple first mounting pads formed on the first surface of the first substrate and for mounting a first semiconductor element on the first surface of the first substrate, multiple first connection pads formed on the first surface of the first substrate and positioned on the periphery of the multiple first mounting pads, a second substrate formed on the first substrate and having first and second surfaces, the second substrate having a second penetrating electrode which penetrates through the first and second surfaces of the second substrate, multiple second mounting pads formed on the first surface of the second substrate and for mounting a second semiconductor element, and a conductive member formed on one of the first connection pads and electrically connecting an end portion of the second penetrating electrode and the one of the first connection pads. | 09-30-2010 |
20100244243 | SEMICONDUCTOR DEVICE - A semiconductor device has a flexible substrate which can be folded U-shape, and an outer surface of the flexible substrate being provided concave-convex portions for heat radiation. The semiconductor device also has a semiconductor chip which is mounted on an inner surface of the flexible substrate, and the chip being electronically connected with the flexible substrate. | 09-30-2010 |
20100244244 | Chip Having a Bump and Package Having the Same - The present invention relates to a chip having a bump and a package having the same. The chip includes a chip body, at least one via, a passivation layer, an under ball metal layer and at least one bump. The via penetrates the chip body, and is exposed to a surface of the chip body. The passivation layer is disposed on the surface of the chip body, and the passivation layer has at least one opening. The opening exposes the via. The under ball metal layer is disposed in the opening of the passivation layer, and is connected to the via. The bump is disposed on the under ball metal layer, and includes a first metal layer, a second metal layer and a third metal layer. The first metal layer is disposed on the under ball metal layer. The second metal layer is disposed on the first metal layer. The third metal layer is disposed on the second metal layer. As the bumps can connect two chips, the chip is stackable, and so the density of the product is increased while the size of the product is reduced. | 09-30-2010 |
20100244245 | Filp Chip Interconnection Structure with Bump on Partial Pad and Method Thereof - A semiconductor package includes a semiconductor die with a plurality of solder bumps formed on bump pads. A substrate has a plurality of contact pads each with an exposed sidewall. A solder resist is disposed opening over at least a portion of each contact pad. The solder bumps are reflowed to metallurgically and electrically connect to the contact pads. Each contact pad is sized according to a design rule defined by SRO+2*SRR−2X, where SRO is the solder resist opening, SRR is a solder registration for the manufacturing process, and X is a function of a thickness of the exposed sidewall of the contact pad. The value of X ranges from 5 to 20 microns. The solder bump wets the exposed sidewall of the contact pad and substantially fills an area adjacent to the exposed sidewall. The contact pad can be made circular, rectangular, or donut-shaped. | 09-30-2010 |
20100252923 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME - A semiconductor device of the present invention includes a semiconductor chip formed with an electrode pad on a front side thereof, a wiring board having a wiring pattern, the wiring board having a front side opposing the back side of the semiconductor chip, a wire for electrically connecting the electrode pad of the semiconductor chip with the wiring pattern of the wiring board, an external terminal arranged on the back side of the wiring board for electrical connection with the electrode pad through the wire and the wiring pattern, and a sealant for fixing the semiconductor chip on the front side of the wiring board so as to form a hollow which is continuous to a portion straddling the entirety of the back side of the semiconductor chip and the front side of the wiring board, and continuous to a portion adjacent to at least one outer peripheral surface of the semiconductor chip except for the back side of the same. The wiring board includes a throughhole in communication with the hollow. | 10-07-2010 |
20100252924 | SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME - A semiconductor device includes plural electrode pads arranged in an active region of a semiconductor chip, and wiring layers provided below the plural electrode pads wherein occupation rates of wirings arranged within the regions of the electrode pads are, respectively, made uniform for every wiring layer. To this end, in a region where an occupation rate of wiring is smaller than those in other regions, a dummy wiring is provided. On the contrary, when the occupation rate of wiring is larger than in other regions, slits are formed in the wiring to control the wiring occupation rate. In the respective wirings layers, the shapes, sizes and intervals of wirings below the respective electrode pads are made similar or equal to one another. | 10-07-2010 |
20100252925 | SEMICONDUCTOR DEVICE - A semiconductor device including: a semiconductor chip having a rectangular surface on which a plurality of electrodes are formed; a plurality of resin protrusions formed on the surface of the semiconductor chip; and a plurality of interconnects each of which is electrically connected to one of the electrodes and includes an electrical connection section disposed on one of the resin protrusions. At least part of the resin protrusions are disposed in a region near a short side of the surface and extend in a direction which intersects the short side. | 10-07-2010 |
20100258938 | SUBSTRATE AND SEMICONDUCTOR DEVICE - A substrate ( | 10-14-2010 |
20100258939 | STACKED MICROFEATURE DEVICES AND ASSOCIATED METHODS - Stacked microfeature devices and associated methods of manufacture are disclosed. A package in accordance with one embodiment includes first and second microfeature devices having corresponding first and second bond pad surfaces that face toward each other. First bond pads can be positioned at least proximate to the first bond pad surface and second bond pads can be positioned at least proximate to the second bond pad surface. A package connection site can provide electrical communication between the first microfeature device and components external to the package. A wirebond can be coupled between at least one of the first bond pads and the package connection site, and an electrically conductive link can be coupled between the first microfeature device and at least one of the second bond pads of the second microfeature device. Accordingly, the first microfeature device can form a portion of an electrical link to the second microfeature device. | 10-14-2010 |
20100264538 | METHOD FOR PRODUCING ELECTRICAL INTERCONNECTS AND DEVICES MADE THEREOF - A method for the fabrication of electrical interconnects in a substrate is disclosed. In one aspect, the method includes providing a substrate having a first main surface. The method may further include producing a ring structure in the substrate from the first main surface, which surrounds an inner pillar structure and has a bottom surface. The method may further include filling the ring structure with a dielectric material. The method may further include providing a conductive inner pillar structure, thereby forming an interconnect structure, which forms an electrical path from the bottom surface up until the first main surface. This conductive inner pillar structure can for example be provided by removing the inner pillar structure leaving a pillar vacancy and partially filling the vacancy with a conductive material. The dielectric material may be applied in liquid phase. | 10-21-2010 |
20100270672 | Semiconductor device - A semiconductor device includes a conductive section formed on a semiconductor chip; and a bump electrode formed directly or indirectly on the conductive section. The conductive section includes a slit section having a thickness thinner than another portion of the conductive section. The bump electrode has a recessed section corresponds to the slit section above the slit section. | 10-28-2010 |
20100276800 | SEMICONDUCTOR MODULE - A first circuit element and a second element are mounted with their electrode forming surfaces facing a wiring layer. A first bump electrode formed integrally with the wiring layer on one face substantially penetrates a first insulating resin layer. A gold plating layer covering an element electrode of the first circuit element and a gold plating layer disposed on top of the first bump electrode are bonded together by Au—Au bonding. A second bump electrode formed integrally with the wiring layer on one face substantially penetrates the first and the second insulating resin layer. A gold plating layer covering an element electrode of the second circuit element and a gold plating layer disposed on top of the second bump electrode are bonded together by Au—Au bonding. | 11-04-2010 |
20100276801 | SEMICONDUCTOR DEVICE AND METHOD TO MANUFACTURE THEREOF - A semiconductor device | 11-04-2010 |
20100283144 | IN-SITU CAVITY CIRCUIT PACKAGE - A flip chip semiconductor packaging device and method that incorporates in situ formation of cavities underneath selected portions of a die during a flip chip die bonding process. A method of flip chip semiconductor component packaging includes providing a die having a first surface, forming a barrier on first surface of the die, the barrier at least partially surrounding a designated location on the first surface of the die, bonding the die to a substrate in a flip chip configuration, and flowing molding compound over the die and over at least a portion of the substrate. Bonding the die to the substrate includes causing contact between the barrier and the substrate such that flow of the molding compound is blocked by the barrier to provide a cavity between the die and the substrate, the cavity being proximate the designated location on the first surface of the die. | 11-11-2010 |
20100283145 | Stack structure with copper bumps - A stack structure with copper bumps on an integrated circuit board is disclosed. The stack structure includes a plurality of insulating layers and a plurality of conductive layers which are stacked alternately. The uppermost conductive layer has copper bumps as copper pillar pins for soldering the chip pins of an integrated circuit chip. Because the copper bumps have a certain height, the distance between the copper bumps and the chip pins is shortened, and therefore the solders needed for soldering may be reduced. Also, the shape of the solders is a long strap instead of spheroid due to the cohesion force between the copper bump surfaces and the solders so that the distance between the solders is scaled down and the gaps between the pins are reduced. Thus, the entire size of the integrated circuit board may also be miniatured. | 11-11-2010 |
20100283146 | SEMICONDUCTOR STRUCTURE AND METHOD OF FABRICATING THE SAME - A semiconductor structure including a substrate, an insulating layer, a composite pad structure, a passivation layer, and a bump is provided. A circuit structure is disposed on the substrate. The insulating layer covers the substrate and has a first opening exposing the circuit structure. The composite pad structure includes a first conductive layer, a barrier layer, and a second conductive layer which are sequentially disposed. The composite pad structure is disposed on the insulating layer and fills the first opening to electrically connect to the circuit structure. The passivation layer covers the composite pad structure and has a second opening exposing the composite pad structure. The bump fills the second opening and electrically connects to the composite pad structure. | 11-11-2010 |
20100283147 | METHOD FOR PRODUCING A PLURALITY OF CHIPS AND A CHIP PRODUCED ACCORDINGLY - A production method for chips, in which as many method steps as possible are carried out in the wafer composite, that is, in parallel for a plurality of chips disposed on a wafer. This is a method for producing a plurality of chips whose functionality is implemented on the basis of the surface layer of a substrate. In this method, the surface layer is patterned and at least one cavity is produced below the surface layer, so that the individual chip regions are connected to each other and/or to the rest of the substrate by suspension webs only, and/or so that the individual chip regions are connected to the substrate layer below the cavity via supporting elements in the region of the cavity. The suspension webs and/or supporting elements are cut when the chips are separated. The patterned and undercut surface layer of the substrate is embedded in a plastic mass before the chips are separated. | 11-11-2010 |
20100283148 | Bump Pad Structure - An embodiment is a bump bond pad structure that comprises a substrate comprising a top layer, a reinforcement pad disposed on the top layer, an intermediate layer above the top layer, an intermediate connection pad disposed on the intermediate layer, an outer layer above the intermediate layer, and an under bump metal (UBM) connected to the intermediate connection pad through an opening in the outer layer. Further embodiments may comprise a via mechanically coupling the intermediate connection pad to the reinforcement pad. The via may comprise a feature selected from the group consisting of a solid via, a substantially ring-shaped via, or a five by five array of vias. Yet, a further embodiment may comprise a secondary reinforcement pad, and a second via mechanically coupling the reinforcement pad to the secondary reinforcement pad. | 11-11-2010 |
20100283149 | STRUCTURE AND METHOD OF FORMING A PAD STRUCTURE HAVING ENHANCED RELIABILITY - A semiconductor substrate is provided having a first metal layer formed over a first insulating layer. A second insulating layer is formed having a first damascene opening, the first opening having a second insulating layer portion formed therein. A resist layer is deposited to fill the first opening and the resist layer is thereafter patterned to form an etching mask for etching a second damascene opening. The second opening is etched into a portion of the second insulating layer, the second opening exposing a portion of the first metal layer. A second metal layer is formed to include filling the first and second damascene openings embedding the second insulating layer portion in the second metal layer. The second metal layer is planarized and a passivation layer is formed above the second insulating layer and the second metal layer, wherein the passivation layer partially covers the second metal layer. | 11-11-2010 |
20100283150 | Semiconductor device - The present invention provides a method for forming a semiconductor device, which comprises the steps of preparing a semiconductor wafer including an electrode pad, an insulating film formed with a through hole and a bedding metal layer which are formed in a semiconductor substrate, forming a first resist mask which exposes each area for forming a redistribution wiring, over the bedding metal layer, forming a redistribution wiring connected to the electrode pad and extending in an electrode forming area for a post electrode with the first resist mask as a mask, removing the first resist mask by a dissolving solution to expose each area excluding the electrode forming area for the redistribution wiring and forming a second resist mask disposed with being separated from each side surface of the redistribution wiring, forming a redistribution wiring protective metal film over upper and side surfaces of the exposed redistribution wiring with the second resist mask as a mask, removing the second resist mask by a dissolving solution, attaching a dry film over the semiconductor wafer and exposing the electrode forming area lying over the redistribution wiring, forming a post electrode in the electrode forming area with the dry film as a mask, removing the dry film by a removal solvent, and removing the redistribution wiring protective metal film after the removal of the dry film. | 11-11-2010 |
20100289138 | SUBSTRATE STRUCTURE FOR FLIP-CHIP INTERCONNECT DEVICE - An integrated circuit (IC) and a method of forming the device are provided. The device includes a substrate and a metal trace formed on the substrate, the metal trace including a bond area and a routing area. The routing area includes a rough surface for promoting adhesion to underfill of a flip-chip die. The flip-chip die can include a bump bond connected to the bond area of the metal trace. The underfill is between the substrate and an active surface of the flip-chip die, the rough surface of the routing area adhering to the underfill in the absence of a photo resist on the routing area of the metal trace. | 11-18-2010 |
20100289139 | HARDWIRED SWITCH OF DIE STACK AND OPERATING METHOD OF HARDWIRED SWITCH - A hardwired switch of a die stack including eight landing pads is provided. A first, a second, a third, and a fourth landing pads are disposed on a first surface of a die. The second and the fourth landing pads are electrically connected to the first and the third landing pads respectively. A fifth, a sixth, a seventh, and an eighth landing pads are disposed on a second surface of the die. The seventh and the eighth landing pads are electrically connected to the sixth and the fifth landing pads respectively. In a vertical direction of the die, the first, the second, the third, and the fourth landing pads overlap partially or fully with the fifth, the sixth, the seventh, and the eighth landing pads respectively. In addition, an operating method of a hardwired switch is also provided. | 11-18-2010 |
20100289140 | SEMICONDUCTOR PACKAGE AND MANUFACTURING METHOD OF THE SEMICONDUCTOR PACKAGE - A semiconductor package includes a semiconductor device, and a wiring board where the semiconductor device is mounted. The semiconductor device includes a semiconductor substrate, a piercing electrode configured to pierce the semiconductor substrate and electrically connect the wiring board and the semiconductor device, and a ring-shaped concave part provided so as to surround the piercing electrode, the ring-shaped concave part being configured to open to a wiring board side of the semiconductor substrate. | 11-18-2010 |
20100295173 | Composite Underfill and Semiconductor Package - Embodiments of the invention exploit physical properties of nanostructures by using nanostructures in a composite underfill. An embodiment is a composite underfill comprising an epoxy matrix applied between a substrate and a semiconductor chip and a suspension of nanostructures distributed within the epoxy matrix. Another embodiment is a semiconductor package comprising a semiconductor chip, a carrier, wherein the semiconductor chip is bonded to the carrier, and a composite underfill comprising a plurality of nanostructures dispersed in an epoxy medium between the carrier and the semiconductor chip. Further embodiments include a method for creating a semiconductor package comprising a composite underfill. | 11-25-2010 |
20100295174 | WIRING SUBSTRATE AND SEMICONDUCTOR DEVICE - A wiring substrate includes: a semiconductor chip on which a plurality of bumps are mounted, and a plurality of connection pads which are joined to the bumps mounted on the semiconductor chip in a flip chip method, wherein the connection pads of a peripheral portion of the wiring substrate are formed in a non-solder mask defined structure, and the connection pads of a center portion of the wiring substrate are formed in a solder mask defined structure. | 11-25-2010 |
20100295175 | WAFER LEVEL CHIP SCALE PACKAGE - A semiconductor device of the invention includes a semiconductor substrate having a first insulating section formed on one surface thereof. A first conductive section is disposed on the one surface of the semiconductor substrate. A second insulating section is superimposed over the first insulating section and covers the first conductive section. A second conductive section is superimposed over the second insulating section. A third insulating section is disposed over the second insulating section and covers the second conductive section. These first conductive section, second insulating section, second conductive section, third insulating section, and terminal altogether constitute a structure. A third opening is formed between adjacent structures. The third opening is formed passing through the third and second insulating sections to expose the first insulating section. | 11-25-2010 |
20100295176 | SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING THE SAME, CIRCUIT SUBSTRATE, ELECTRO-OPTICAL APPARATUS, AND ELECTRONIC EQUIPMENT - A semiconductor device is provided with a plurality of protrusions which are made of a resin and which protrude higher than electrodes, and conductive layers which are electrically connected to the electrodes and which cover the top surfaces of the protrusions. A method for manufacturing the semiconductor device includes a step of applying a layer of the resin to the semiconductor device except for the electrodes, a step of patterning the conductive layers on the electrodes and the layer of the resin in accordance with the protrusions, and a step of removing the layer of the resin located between the conductive layers by the use of the patterned conductive layers as masks so as to form the protrusions. | 11-25-2010 |
20100295177 | ELECTRONIC COMPONENT MOUNTING STRUCTURE, ELECTRONIC COMPONENT MOUNTING METHOD, AND ELECTRONIC COMPONENT MOUNTING BOARD - In an electronic component mounting structure, a semiconductor element (an electronic component) provided with an electrode pad and a board provide with an electrode pad corresponding to the electrode pad are connected via a conductive material portion. On a surface of the board, there is formed solder resist having an opening regulating an area of the electrode pad. The conductive material portion is formed to protrude from a surface of the solder resist. An elastic coefficient of the conductive material portion is lower than that of the solder resist. A solder bump and the conductive material portion are connected via a metal layer. The conductive material portion is formed to have an area larger than that of the opening of the solder resist. An edge of the conductive material portion is adhered to a portion of the surface of the solder resist. Thus, in a case of mounting an electronic component on a board by flip-chip connection, a reliability of connection can be secured. | 11-25-2010 |
20100295178 | SEMICONDUCTOR CHIP PACKAGE AND MANUFACTURING METHOD THEREOF - A first wiring pattern is formed on a surface of a first support plate; a semiconductor chip is disposed on the first wiring pattern; and electrode terminals of the semiconductor chip are electrically connected to the first wiring pattern at required positions. Post electrodes connected to a second wiring pattern of a wiring-added post electrode component integrally connected by a second support plate are collectively fixed and electrically connected to the first wiring pattern formed on the first support plate at predetermined positions. After sealing with resin, the first and second support plates are separated; a glass substrate is affixed on a front face side; and external electrodes connected to the second wiring pattern are formed on a back face side. | 11-25-2010 |
20100301472 | ELECTRONIC COMPONENT AND MANUFACTURING METHOD THEREOF - An electronic component in which an element is formed on a chip includes: a pad that is made of a conductive material and that is formed in a first bump formation region that is two-dimensionally arranged in center of one principle face and in a second bump formation region that is linearly arranged at peripheral border of the principle face; a passivation film that is formed on the principle face to cover portion except a formation position of the pad; a metal layer that is formed on the pad; and a bump that is made of a conductive material and that is formed on the metal layer by plating, wherein radius of the metal layer in the second bump formation region is smaller than radius of at least some of the metal layer in the first bump formation region. | 12-02-2010 |
20100301473 | COMPONENT BUILT-IN WIRING BOARD AND MANUFACTURING METHOD OF COMPONENT BUILT-IN WIRING BOARD - Disclosed is a component built-in wiring board, including a first insulating layer; a second insulating layer positioned in a laminated state on the first insulating layer; a semiconductor element buried in the second insulating layer, having a semiconductor chip with terminal pads and having surface mounting terminals arrayed in a grid shape connected electrically with the terminal pads; an electric/electronic component further buried in the second insulating layer; a wiring pattern sandwiched between the first insulating layer and the second insulating layer, including a first mounting land for the semiconductor element and a second mounting land for the electric/electronic component; a first connecting member connecting electrically the surface mounting terminal of the semiconductor element with the first mounting land; and a second connecting member connecting electrically the terminals of the electric/electronic component with the second mounting land, made of a same material as a material of the first connecting member. | 12-02-2010 |
20100301474 | Semiconductor Device Package Structure and Method for the Same - The present invention discloses a semiconductor device package and the method for the same. The method includes preparing a first substrate and a second substrate; opening a die opening window through the second substrate by using laser or punching; preparing an adhesion material; attaching the first substrate to the second substrate by the adhesion material; aligning a die by using the aligning mark of the die metal pad and attaching the die onto the die metal pad with force by the adhesion material; forming a first dielectric layer on top surfaces of the second substrate and the die and pushing the first dielectric layer into gap between the side wall of the die and the side wall of the die opening window under vacuum condition; opening a plurality of via openings in the first dielectric layer; and forming a redistribution layer in the plurality of via openings and on the first dielectric layer. | 12-02-2010 |
20100308457 | Semiconductor apparatus and manufacturing method of the same - Provided is a semiconductor apparatus that reduces on-resistance in wiring between a first electrode terminal and a second electrode terminal. The semiconductor apparatus includes the first electrode terminal, the second electrode terminal, and at least two wires that connect the first and second electrode terminals. At least two wires are electrically connected with each other by using a conductive adhesive in an extending direction of the wires. The first electrode terminal is a terminal of an external lead electrode, for example. The second electrode terminal is a terminal of a source electrode of a MOSFET, for example. | 12-09-2010 |
20100308458 | Semiconductor integrated circuit device - Circuit elements and wirings constituting a circuit, and first electrodes electrically connected to such a circuit are provided on one main surface of a semiconductor substrate. An organic insulating film is formed on the circuit except for openings on the surfaces of the first electrodes. First and second external connecting electrodes are provided on the organic insulating film. At least one conductive layer for electrically connecting the first and second external connecting electrodes and the first electrodes is placed on the organic insulating film. | 12-09-2010 |
20100308459 | Semiconductor Device and Method of Forming Through Hole Vias in Die Extension Region Around Periphery of Die - A semiconductor wafer contains a plurality of semiconductor die. The semiconductor wafer is diced to separate the semiconductor die. The semiconductor die are transferred onto a carrier. A die extension region is formed around a periphery of the semiconductor die on the carrier. The carrier is removed. A plurality of through hole vias (THV) is formed in first and second offset rows in the die extension region. A conductive material is deposited in the THVs. A first RDL is formed between contact pads on the semiconductor die and the THVs. A second RDL is formed on a backside of the semiconductor die in electrical contact with the THVs. An under bump metallization is formed in electrical contact with the second RDL. Solder bumps are formed on the under bump metallization. The die extension region is singulated to separate the semiconductor die. | 12-09-2010 |
20100314754 | METHOD OF FORMING WIRE BONDS IN SEMICONDUCTOR DEVICES - A method of forming a wire bond in a semiconductor device includes forming a first bump of a first composition proximate to a probe mark on a bond pad. A second bump of the first composition is formed adjacent to the first bump such that the first and second bumps are formed away from the probe mark. A wire of a second composition that is harder than the first composition is attached on top of the first and second bumps to form an interconnection. | 12-16-2010 |
20100314755 | PRINTED CIRCUIT BOARD, SEMICONDUCTOR DEVICE COMPRISING THE SAME, AND METHOD OF MANUFACTURING THE SAME - Disclosed is a printed circuit board, which includes a first circuit layer embedded in one surface an insulating layer and including a bump pad and a wire bonding pad, thus realizing a high-density wire bonding pad. A semiconductor device including the printed circuit board and a method of manufacturing the printed circuit board are also provided. | 12-16-2010 |
20100314756 | Interconnect Structures Having Lead-Free Solder Bumps - An integrated circuit structure includes a semiconductor substrate, and a polyimide layer over the semiconductor substrate. An under-bump-metallurgy (UBM) has a first portion over the polyimide layer, and a second portion level with the polyimide layer. A first solder bump and a second solder bump are formed over the polyimide layer, with a pitch between the first solder bump and the second solder bump being no more than 150 μm. A width of the UBM equals one-half of the pitch plus a value greater than 5 μm. | 12-16-2010 |
20100314757 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - In a POP semiconductor device, a technology is provided which can increase the degree of freedom of semiconductor packages to be combined. A first metal conductive member is placed on a first wiring substrate which is a lower mounting substrate and a second metal conductive member is placed on a second wiring substrate which is an upper mounting substrate. By joining the corresponding portions of the first and second conductive members, the first and second wiring substrates are electrically coupled to each other. An electrode pad which is electrically coupled to the second conductive member and will have an upper semiconductor member | 12-16-2010 |
20100314758 | THROUGH-SILICON VIA STRUCTURE AND A PROCESS FOR FORMING THE SAME - A through-silicon via (TSV) structure and process for forming the same are disclosed. A semiconductor substrate has a front surface and a back surface, and a TSV structure is formed to extend through the semiconductor substrate. The TSV structure includes a metal layer, a metal seed layer surrounding the metal layer, a barrier layer surrounding the metal seed layer, and a metal silicide layer formed in a portion sandwiched between the metal layer and the metal seed layer. | 12-16-2010 |
20100314759 | SEMICONDUCTOR CHIP PASSIVATION STRUCTURES AND METHODS OF MAKING THE SAME - Various semiconductor chip passivation structures and methods of making the same are disclosed. In one aspect, a method of manufacturing is provided that includes applying a polymeric passivation layer to a side of a semiconductor chip. The side of the semiconductor chip includes plural conductor pads. Plural openings are formed in the polymeric passivation layer to expose the plural conductor pads. Plural conductor structures are formed on the plural conductor pads. | 12-16-2010 |
20100320596 | METHOD FOR FABRICATING SEMICONDUCTOR PACKAGE AND SEMICONDUCTOR PACKAGE USING THE SAME - Provided is a method for fabricating semiconductor package and a semiconductor package fabricated using the same. The method for fabricating semiconductor package dopes a mixture including the polymer material and the solder particle on the substrate in which the terminal is formed and applies heat, and thus the solder particle flows (or diffuses) toward the terminal in the heated polymer resin to adhere to the exposed surface of the terminal, i.e., the side surface and upper surface of the terminal, thereby forming the solder layer. The solder layer improves the adhesive strength between the terminal of the semiconductor chip and the terminal of the substrate in the subsequent flip chip bonding process. | 12-23-2010 |
20100320597 | Wafer level stack structure for system-in-package and method thereof - A system-in-package, comprising a wafer level stack structure, including at least one first device chip including a first device region having a plurality of input/output(I/O) pads, and at least one second device chip including a second device region having a plurality of input/output(I/O) pads and a second peripheral region surrounding the second device region, wherein the size of the second device region is different from the size of the first device region, wherein the at least one first device chip and the at least one second device chip have approximately equal size; and a common circuit board to which the wafer level stack structure is connected. | 12-23-2010 |
20100320598 | SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF - A semiconductor device includes a stacked chip structure provided on a board and made up of semiconductor chips that are stacked via insulators. Each semiconductor chip has an integrated circuit surface, pads provided on the integrated circuit surface, and conductive connecting members having a wave shape with first ends electrically connected to the pads, and second ends extending outwardly from the at least one edge part and electrically connected to the connection terminals on the board. | 12-23-2010 |
20100320599 | DIE STACKING APPARATUS AND METHOD - Various stacked semiconductor devices and methods of making the same are provided. In one aspect, a method of manufacturing is provided that includes providing a first semiconductor die that has a first bulk semiconductor side and a first opposite side. A second semiconductor die is provided that has a second bulk semiconductor side and a second opposite side. The second opposite side of the second semiconductor die is coupled to the first opposite side of the first semiconductor die. Electrical connections are formed between the first semiconductor die and the second semiconductor die. | 12-23-2010 |
20100320600 | SURFACE DEPRESSIONS FOR DIE-TO-DIE INTERCONNECTS AND ASSOCIATED SYSTEMS AND METHODS - Stacked microelectronic dies employing die-to-die interconnects and associated systems and methods are disclosed herein. In one embodiment, a stacked system of microelectronic dies includes a first microelectronic die, a second microelectronic die attached to the first die, and a die-to-die interconnect electrically coupling the first die with the second die. The first die includes a back-side surface, a surface depression in the back-side surface, and a first metal contact located within the surface depression. The second die includes a front-side surface and a second metal contact located at the front-side surface and aligned with the first metal contact of the first die. The die-to-die interconnect electrically couples the first metal contact of the first die with the second metal contact of the second die and includes a flowable metal layer that at least partially fills the surface depression of the first die. | 12-23-2010 |
20100327434 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device includes: a first semiconductor chip having a first active surface and a bonding surface forming an opposite side of the first active surface, the bonding surface being bonded to a mounting surface of a substrate; a second semiconductor chip having a second active surface facing the first active surface, and stacked on the first semiconductor chip; a slope section having a sloping surface with a shape of smoothing a step between the first active surface and the mounting surface, and adapted to bury the step in at least a part of a periphery of the first semiconductor chip; and a first wiring wire laid down between the mounting surface and the first active surface via the sloping surface of the slope section, and connected to a first bump provided to the second active surface on the first active surface. | 12-30-2010 |
20100327435 | ELECTRONIC COMPONENT AND MANUFACTURE METHOD THEREOF - An electronic component includes a package substrate, a plurality of conductive pads, an insulating material and a semiconductor device. The plurality of conductive pads is disposed on the package substrate. The insulating material is disposed between the plurality of conductive pads. The insulating material includes a top surface located on an identical plane to an upper surface of the plurality of conductive pads. The semiconductor device includes a conductive bump aligned on a corresponding conductive pad of the plurality of conductive pads. | 12-30-2010 |
20100327436 | APPARATUS AND METHOD FOR STACKING INTEGRATED CIRCUITS - A multi-chip stack module provides increased circuit density for a given surface chip footprint. Support structures are alternated with standard surface mount type chips to form a stack wherein the support structures electrically interconnect the chips. One aspect is a structure and method for interconnecting a plurality of generally planar chips in a vertical stack such that signals, which are common to the chips, are connected in the stack and signals, which are accessed individually, are separated within the stack. | 12-30-2010 |
20100327437 | WIRING BOARD AND SEMICONDUCTOR DEVICE USING THE WIRING BOARD - Provided is a wiring board wherein a circuit is not short-circuited when a IC chip is mounted on the wiring board. A wiring board ( | 12-30-2010 |
20100327438 | NEAR CHIP SCALE SEMICONDUCTOR PACKAGES - Flip chip ball grid array semiconductor devices and methods for fabricating the same. In one example, a near chip scale method of semiconductor die packaging may comprise adhering the die to a substrate in a flip chip configuration, coating the die with a first polymer layer, selectively removing the first polymer layer to provide at least one opening to expose a portion of the die, and depositing a first metal layer over the first polymer layer, the first metal layer at least partially filling the at least one opening to provide an electrical contact to the die, and including a portion that substantially surrounds the die in a plane of an upper surface of the first metal layer to provide an electromagnetic shield around the die. | 12-30-2010 |
20100327439 | SEMICONDUCTOR PACKAGE AND METHOD OF FORMING THE SAME - A semiconductor package includes a first package substrate, a first semiconductor chip disposed on the first package substrate, the semiconductor chip including first through hole vias, and a chip package disposed on the first semiconductor chip, the chip package including a second package substrate and a second semiconductor chip disposed on the second package substrate, wherein a first conductive terminal is disposed on a first surface of the semiconductor chip and a second conductive terminal is disposed on a first surface of the second package substrate, the first conductive terminal disposed on the second conductive terminal. | 12-30-2010 |
20100327440 | 3-D SEMICONDUCTOR DIE STRUCTURE WITH CONTAINING FEATURE AND METHOD - A die-on-die assembly has a first die ( | 12-30-2010 |
20110001232 | Flip-Chip Module and Method for the Production Thereof - The invention relates to a flip-chip module with a semiconductor chip with contact posts, wherein the contact posts are connected electrically and mechanically to a substrate. Provided between the substrate and the semiconductor chip is a spacer, which is coupled mechanically to the substrate and/or the semiconductor chip. By this means, thermal stresses in the flip-chip module are absorbed by the spacer and kept away from the semiconductor chip. | 01-06-2011 |
20110001233 | SEMICONDUCTOR DEVICE MOUNTED STRUCTURE AND SEMICONDUCTOR DEVICE MOUNTING METHOD - In a semiconductor device mounted structure in which device electrodes of a semiconductor device and board electrodes of a board are connected to each other via bump electrodes, respectively, and in which a sealing-bonding use resin is placed between the semiconductor device and the board, a void portion is placed at a position corresponding to an edge portion of the semiconductor device in the sealing-bonding use resin. Thus, stress loads generated at corner portions of the semiconductor device due to board flexures for differences in thermal expansion and thermal contraction among the individual members caused by heating and cooling steps in mounting process of the semiconductor device, as well as for mechanical loads after the mounting process, can be absorbed by the void portion and thereby reduced, so that breakdown of the semiconductor device mounted structure is prevented. | 01-06-2011 |
20110001234 | Semiconductor device and fabrication method thereof - Disclosed is a semiconductor device that comprises a first insulating film provided on a main face of a semiconductor substrate; a first pedestal provided at a first wiring layer on the first insulating layer; a second insulating film provided on the first wiring layer; and a second pedestal provided at a second wiring layer on the second insulating film, wherein, when the first and second pedestals are projected in a direction perpendicular to the main face onto a plane parallel to the main face, the second pedestal is larger than the first pedestal, and the whole of the first pedestal is disposed at an inside of the second pedestal. | 01-06-2011 |
20110001235 | STACKED SEMICONDUCTOR DEVICE AND FABRICATION METHOD FOR SAME - A stacked semiconductor device is constructed by stacking in two levels: a lower semiconductor device having a wiring board, at least one semiconductor chip mounted on a first surface of the wiring board and having electrodes electrically connected to wiring by way of a connection means, an encapsulant composed of insulating plastic that covers the semiconductor chip and the connection means, a plurality of electrodes formed overlying the wiring of a second surface of the wiring board, and a plurality of linking interconnects each having a portion connected to the wiring of the first surface of the wiring board and another portion exposed on the surface of the encapsulant; and an upper semiconductor device in which each electrode overlies and is electrically connected to the exposed portions of each of the linking interconnects of the lower semiconductor device. The linking interconnects extend from the first surface of the wiring board to the side surfaces and upper surface of the encapsulant, and moreover, electrically connect with wiring of the wiring board that projects from the encapsulant. | 01-06-2011 |
20110001236 | SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME - A semiconductor device having redistribution interconnects in the WPP technology and improved reliability, wherein the redistribution interconnects have first patterns and second patterns which are electrically separated from each other within the plane of the semiconductor substrate, the first patterns electrically coupled to the multi-layer interconnects and the floating second patterns are coexistent within the plane of the semiconductor substrate, and the occupation ratio of the total of the first patterns and the second patterns within the plane of the semiconductor substrate, that is, the occupation ratio of the redistribution interconnects is 35 to 60%. | 01-06-2011 |
20110001237 | ASSEMBLY OF A WIRE ELEMENT WITH A MICROELECTRONIC CHIP WITH A GROOVE COMPRISING AT LEAST ONE BUMP SECURING THE WIRE ELEMENT - The assembly comprises at least one microelectronic chip having two parallel main surfaces and lateral surfaces, at least one of the lateral faces comprising a longitudinal groove housing a wire element having an axis parallel to the longitudinal axis of the groove. The groove is delineated by at least two side walls. The wire element is secured to the chip at the level of a clamping area between at least one bump arranged on one of the side walls, and the side wall of the groove opposite said bump. The clamping area has a smaller height than the diameter of the wire element and a free area is arranged laterally to the bump along the longitudinal axis of the groove. The free area has a height, corresponding to the distance separating the two side walls, that is greater than the diameter of the wire element. | 01-06-2011 |
20110006415 | SOLDER INTERCONNECT BY ADDITION OF COPPER - A method of forming an electronic device provides an electronic device substrate having a solder bump pad located thereover. A nickel-containing layer is located over the solder bump pad. A copper-containing layer is formed on the nickel-containing layer prior to subjecting the electronic device to a reflow process. | 01-13-2011 |
20110006416 | STRUCTURE AND METHOD FOR FORMING PILLAR BUMP STRUCTURE HAVING SIDEWALL PROTECTION - A method for forming a metal pillar bump structure is provided. In one embodiment, a passivation layer is formed over a semiconductor substrate and a conductive layer is formed over the passivation layer. A patterned and etched photoresist layer is provided above the conductive layer, the photoresist layer defining at least one opening therein. A metal layer is deposited in the at least one opening. Portions of the photoresist layer are etched along one or more interfaces between the photoresist layer and the metal layer to form cavities. A solder material is deposited in the at least one opening, the solder material filling the cavities and a portion of the opening above the metal layer. The remaining photoresist layer and the conductive layer not formed under the copper layer are removed. The solder material is then reflown to encapsulate the metal layer. | 01-13-2011 |
20110006417 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A semiconductor device includes: a first semiconductor element having a first terminal surface on which a first terminal is disposed and a first rear surface on which no terminal is disposed; a second semiconductor element having a second terminal surface on which a second terminal is disposed and a second rear surface on which no terminal is disposed, the second rear surface being bonded to the first rear surface; a terminal member having a surface set substantially flush with the second terminal surface; and a conductive wire connecting the terminal member and the first terminal. | 01-13-2011 |
20110006418 | SEMICONDUCTOR DEVICE PROVIDED WITH WIRE THAT ELECTRICALLY CONNECTS PRINTED WIRING BOARD AND SEMICONDUCTOR CHIP EACH OTHER - In one embodiment, a semiconductor device includes a printed wiring board provided with a connection pad, a semiconductor chip provided with an electrode pad and a conductive wire. One end of the conductive wire is connected to the connection pad of the printed wiring board and the other end of the conductive wire is connected to the electrode pad of the semiconductor chip. The semiconductor chip is mounted on the printed wiring board so that the first surface of the semiconductor chip provided with the electrode pad is oriented opposite to the printed wiring board. A first insulating layer is formed on the first surface of the semiconductor chip oriented opposite to the printed wiring board. A thermoplastic second insulating layer is formed on the first insulating layer. Part of the conductive wire between one end and the other end is buried in the second insulating layer. | 01-13-2011 |
20110006419 | FILM FOR USE IN MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE - A film for use in manufacturing a semiconductor device having at least one semiconductor element of the present invention is characterized by comprising: a base sheet having one surface; and a bonding layer provided on the one surface of the base sheet, the bonding layer being adapted to be bonded to the semiconductor element in the semiconductor device, the bonding layer being formed of a resin composition comprising a crosslinkable resin and a compound having flux activity. Further, it is preferred that in the film of the present invention, the semiconductor element is of a flip-chip type and has a functional surface, and the bonding layer is adapted to be bonded to the functional surface of the semiconductor element. | 01-13-2011 |
20110006420 | SEMICONDUCTOR DEVICE - A method for manufacturing a semiconductor device includes: preparing a wiring board having a base substrate and wiring that is plated on surface with a plating metal; pressing a bump that is formed on the active side of the semiconductor chip against an end part of the wiring of the wiring board, thereby exfoliating the area surrounding the pressed portion of the wiring from the base substrate while keeping the end of the wiring bonded with the base substrate; melting the plating metal that is located on the end part of the wiring, thereby causing the plating metal and the bump to form an alloy that bonds the bump and the wiring and infiltrate the plating metal into a space between the wiring and the base substrate; and judging that the bump and the wiring are well bonded if the plating metal has infiltrated a space between the wiring and the base substrate so as to have an area, width or length of infiltration that exceeds a reference value. | 01-13-2011 |
20110006421 | SOLDER INTERCONNECT PADS WITH CURRENT SPREADING LAYERS - Structure and methods of making the structures. The structures include a structure, comprising: an organic dielectric passivation layer extending over a substrate; an electrically conductive current spreading pad on a top surface of the organic dielectric passivation layer; an electrically conductive solder bump pad comprising one or more layers on a top surface of the current spreading pad; and an electrically conductive solder bump containing tin, the solder bump on a top surface of the solder bump pad, the current spreading pad comprising one or more layers, at least one of the one or more layers consisting of a material that will not form an intermetallic with tin or at least one of the one or more layers is a material that is a diffusion barrier to tin and adjacent to the solder bump pad. | 01-13-2011 |
20110012258 | Semiconductor Device and Method of Laser-Marking Laminate Layer Formed Over EWLB With Tape Applied to Opposite Surface - A semiconductor device has a semiconductor die with a plurality of bumps formed on contact pads disposed over its active surface. An encapsulant is formed over the semiconductor die. An interconnect structure is formed over the semiconductor die and encapsulant. The semiconductor die is mounted to a translucent tape with the bumps embedded in the translucent tape. The translucent tape has layers of polyolefin, acrylic, and polyethylene terephthalate. A back surface of the semiconductor die undergoes backgrinding to reduce die thickness. The tape undergoes UV curing. A laminate layer is formed over the back surface of the semiconductor die. The laminate layer undergoes oven curing. The laminate layer is laser-marked while the tape remains applied to the bumps. The tape is removed after laser-marking the laminate layer. Alternately, the tape can be removed prior to laser-marking. The tape reduces die warpage during laser-marking. | 01-20-2011 |
20110018128 | PACKAGE STRUCTURE AND METHOD FOR REDUCING DIELECTRIC LAYER DELAMINATION - A semiconductor package structure is provided. The structure includes a semiconductor chip having a plurality of interconnect layers formed thereover. A first passivation layer is formed over the plurality of interconnect layers. A stress buffer layer is formed over the first passivation layer. A bonding pad is formed over the stress buffer layer. A second passivation layer is formed over a portion of the bonding pad, the second passivation having at least one opening therein exposing a portion of the bonding pad. | 01-27-2011 |
20110018129 | Semiconductor Device - To provide a technique capable of reducing the chip size of a semiconductor chip and particularly, a technique capable of reducing the chip size of a semiconductor chip in the form of a rectangle that constitutes an LCD driver by devising a layout arrangement in a short-side direction. In a semiconductor chip that constitutes an LCD driver, input protection circuits are arranged in a lower layer of part of a plurality of input bump electrodes and on the other hand, in a lower layer of the other part of the input bump electrodes, the input protection circuits are not arranged but SRAMs (internal circuits) are arranged. | 01-27-2011 |
20110018130 | SEMICONDUCTOR PACKAGE AND SEMICONDUCTOR PACKAGE MODULE - A semiconductor package is provided with a functionally necessary minimum number of components with which stress concentrated on specific solder bumps is reduced and ruptures of the bumps are prevented even when stress caused by physical bending or a difference in thermal expansion coefficient is applied to the package. The semiconductor package includes a tabular die and bonding pads arranged on a mounting surface of the die. A passivation layer and a protective film are provided on the mounting surface such that central areas of the bonding pads are open. Under-bump metals (UBMs) connected to the bonding pads are provided in the openings, and solder bumps are provided on the surfaces of the UBMs. The diameter of the UBMs provided at corners of the die is less than that of the UBM provided at the approximate center of the die so that the elastic modulus of the UBMs provided at the corners is small. | 01-27-2011 |
20110024899 | SUBSTRATE STRUCTURE FOR CAVITY PACKAGE - Various embodiments provide semiconductor devices having cavity substrate structures for package-on-package assembly and methods for their fabrication. In one embodiment, the cavity substrate structure can include at least one top interconnect via formed within a top substrate. The top substrate can be disposed over a base substrate having at least one base interconnect via that is not aligned with the top interconnect via. Semiconductor dies can be assembled in an open cavity of the top substrate and attached to a base center portion of the base substrate of the cavity substrate structure. A top semiconductor package can be mounted over the top substrate of the cavity substrate structure. | 02-03-2011 |
20110024900 | SEMICONDUCTOR DEVICE INCLUDING A STRESS BUFFER MATERIAL FORMED ABOVE A LOW-K METALLIZATION SYSTEM - A bump structure or pillar structure formed above a metallization system of a complex semiconductor device may include a stress buffer layer, which may efficiently distribute the resulting mechanical stress which may typically occur during the chip package interaction due to a thermal mismatch of these components. The stress buffer layer comprises copper-based buffer regions that cover a significant portion of the overall surface, wherein a thickness of approximately 3-10 μm may also be used. Moreover, the buffer regions may efficiently replace aluminum as a terminal metal active region. | 02-03-2011 |
20110024901 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE - According to one embodiment, a manufacturing method of a semiconductor device attained as follows. A dielectric layer having a first opening and a second opening reaching an electrode terminal is formed by modifying a photosensitive resin film on a substrate on which the electrode terminal of a first conductive layer is provided. Next, a second conductive layer that is electrically connected to the electrode terminal is formed on the dielectric layer that includes inside of the first opening, and a third conductive layer that has an oxidation-reduction potential of which difference from the oxidation-reduction potential of the first conductive layer is smaller than a difference of the oxidation-reduction potential between the first conductive layer and the second conductive layer is formed on the second conductive layer. Next, a dielectric layer having a third opening reaching the third conductive layer and a fourth opening reaching the electrode terminal via the second opening is formed by modifying a photosensitive resin film, and a bump that is electrically connected to the third conductive layer is formed. | 02-03-2011 |
20110024902 | STRUCTURE AND MANUFACTURING METHOD OF A CHIP SCALE PACKAGE WITH LOW FABRICATION COST, FINE PITCH AND HIGH RELIABILITY SOLDER BUMP - A new method and package is provided for the mounting of semiconductor devices that have been provided with small-pitch Input/Output interconnect bumps. Fine pitch solder bumps, consisting of pillar metal and a solder bump, are applied directly to the I/O pads of the semiconductor device, the device is then flip-chip bonded to a substrate. Dummy bumps may be provided for cases where the I/O pads of the device are arranged such that additional mechanical support for the device is required. | 02-03-2011 |
20110024903 | Semiconductor Device and Method of Forming Wafer Level Ground Plane and Power Ring - A semiconductor die has active circuits formed on its active surface. Contact pads are formed on the active surface of the semiconductor die and coupled to the active circuits. A die extension region is formed around a periphery of the semiconductor die. Conductive through hole vias (THV) are formed in the die extension region. A wafer level conductive plane or ring is formed on a center area of the active surface. The conductive plane or ring is connected to a first contact pad to provide a first power supply potential to the active circuits, and is electrically connected to a first conductive THV. A conductive ring is formed partially around a perimeter of the conductive plane or ring and connected to a second contact pad for providing a second power supply potential to the active circuits. The conductive ring is electrically connected to a second THV. | 02-03-2011 |
20110031615 | Semiconductor device - A semiconductor device having a structure that can reduce stress due to difference in coefficients of thermal expansion and prevent or suppress generation of cracks, and a semiconductor device manufacturing method, are provided. The semiconductor device includes a single crystal silicon substrate having a main face on which semiconductor elements are formed and a side face intersecting with the main face, and a sealing resin provided covering at least a portion of the side face. The side face covered by the sealing resin is equipped with a first face with a plane direction forming an angle of −5° to +5° to the plane direction of the main face. | 02-10-2011 |
20110031616 | STRUCTURES AND METHODS FOR IMPROVING SOLDER BUMP CONNECTIONS IN SEMICONDUCTOR DEVICES - Structures with improved solder bump connections and methods of fabricating such structures are provided herein. The method includes forming a plurality of trenches in a dielectric layer extending to an underlying metal layer. The method further includes depositing metal in the plurality of trenches to form discrete metal line islands in contact with the underlying metal layer. The method also includes forming a solder bump in electrical connection to the plurality of metal line islands. | 02-10-2011 |
20110031617 | SEMICONDUCTOR PACKAGE SUBSTRATE STRUCTURE AND MANUFACTURING METHOD THEREOF - A semiconductor package substrate structure and a manufacturing method thereof are disclosed. The structure includes a substrate having a plurality of electrical connecting pads formed on at least one surface thereof; a plurality of electroplated conductive posts each covering a corresponding one of the electrical connecting pads and an insulating protective layer formed on the surface of the substrate and having a revealing portion for exposing the electroplated conductive posts therefrom. The invention allows the interval between the electroplated conductive posts to be minimized, the generation of concentrated stresses and the overflow of underfill to be avoided, as well as the reduction of the overall height of the fabricated package. | 02-10-2011 |
20110037169 | Semiconductor Device and Method of Dual-Molding Die Formed on Opposite Sides of Build-Up Interconnect Structures - A semiconductor device has dual-molded semiconductor die mounted to opposite sides of a build-up interconnect structure. A first semiconductor die is mounted to a temporary carrier. A first encapsulant is deposited over the first semiconductor die and temporary carrier. The temporary carrier is removed. A first interconnect structure is formed over a first surface of the first encapsulant and first semiconductor die. The first interconnect structure is electrically connected to first contact pads of the first semiconductor die. A plurality of conductive pillars is formed over the first interconnect structure. A second semiconductor die is mounted between the conductive pillars to the first interconnect structure. A second encapsulant is deposited over the second semiconductor die. A second interconnect structure is formed over the second encapsulant. The second interconnect structure is electrically connected to the conductive pillars and first and second semiconductor die. | 02-17-2011 |
20110037170 | ELECTRONIC DEVICE AND MANUFACTURING METHOD THEREFOR - Reduction of the size of and enhancement of the reliability, mounting strength, and mounting reliability of a semiconductor module are achieved. The semiconductor module includes: a wiring substrate; an electronic component placed over the upper surface of the wiring substrate; an electronic component placed over the under surface of the wiring substrate; a lead placed over the under surface of the wiring substrate; and encapsulation resin covering the under surface of the wiring substrate including the electronic component and the lead. The lead includes: a first portion coupled to an electrode pad via a joining material; a second portion bent from the first portion; and a third portion bent from the second portion. The third portion is positioned closer to the peripheral edge portion side of the under surface of the wiring substrate than the first portion. At the same time, the third portion is arranged at a position farther from the under surface of the wiring substrate than the first portion. The third portion of the lead is exposed from the main surface and side surface of the encapsulation resin and functions as a terminal for external coupling. | 02-17-2011 |
20110037171 | Electronic Structures Including Barrier Layers and/or Oxidation Barriers Defining Lips and Related Methods - An electronic device may include a substrate, a seed layer on the substrate, a barrier layer on the seed layer opposite the substrate, and an oxidation barrier on the barrier layer opposite the seed layer. The barrier layer and the seed layer comprise different materials, and the oxidation barrier and the barrier layer may comprise different materials. The seed layer may be undercut relative to the barrier layer and/or relative to the oxidation barrier so that the barrier layer and/or the oxidation barrier define a lip extending beyond the seed layer in a direction parallel with respect to a surface of the substrate. Related methods are also discussed. | 02-17-2011 |
20110037172 | Ultra Thin Bumped Wafer With Under-Film - A semiconductor device includes a wafer and a dicing saw tape that is laminated to a back surface of the wafer. An active surface of the wafer is opposite the back surface of the wafer. The semiconductor device further includes a lamination tape disposed in contact with the wafer. The lamination tape includes an under-film layer contacting the active surface of the wafer. The lamination tape further includes an adhesive layer contacting the under-film layer. | 02-17-2011 |
20110037173 | SEMICONDUCTOR DEVICE - Input/output cells are formed so as to be peripherally arranged adjacent to a corner cell on a surface of a semiconductor chip, and electrode pads are formed on the respective input/output cells. The electrode pads are configured in a zigzag pad arrangement so as to form inner and outer pad arrays. However, of the electrode pads forming the inner pad array, those electrode pads in predetermined areas adjacent to the two sides of the corner cell are not disposed, such that an interconnect pattern of a carrier which is bump-bonded to the semiconductor chip and vias are prevented from becoming complex. | 02-17-2011 |
20110037174 | METHOD OF MANUFACTURING SEMICONDUCTOR COMPONENT, AND SEMICONDUCTOR COMPONENT - A method of manufacturing a semiconductor component of the present invention has: obtaining a semiconductor wafer having stud electrodes formed on a functional surface thereof, and a circuit board having solder bumps on one surface and having electrode pads on the other surface thereof; bonding the semiconductor wafer and the circuit board, while providing a resin layer having a flux activity between the semiconductor wafer and the circuit board, and so as to bring the stud electrodes into contact with the solder bumps, while penetrating the resin layer having a flux activity, to thereby obtain a bonded structure; applying a solder material onto the electrode pads of the bonded structure; and dicing the bonded structure to obtain a plurality of semiconductor components. | 02-17-2011 |
20110042803 | Method For Fabricating A Through Interconnect On A Semiconductor Substrate - A method for fabricating a through interconnect on a semiconductor substrate includes the steps of forming a via on a first side of the substrate part way through the substrate, forming an electrically insulating layer on the first side and in the via, forming an electrically conductive layer at least partially lining the via, forming a first contact on the conductive layer in the via, and thinning the substrate from a second side at least to the insulating layer in the via. The method can also include the step of forming a second contact on a second side of the substrate in electrical contact with the first contact. The method can be performed on a semiconductor wafer to form a wafer scale interconnect component. In addition, the interconnect component can be used to construct semiconductor systems such as a light emitting diode (LED) systems. | 02-24-2011 |
20110042804 | CHIP PACKAGE AND FABRICATION METHOD THEREOF - The invention provides a chip package and fabrication method thereof. In one embodiment, the chip package includes: a semiconductor substrate having opposite first and second surfaces, at least one bond pad region and at least one device region; a plurality of conductive pad structures disposed on the bond pad region at the first surface of the semiconductor substrate; a plurality of heavily doped regions isolated from one another, underlying and electrically connected to the conductive pad structures; and a plurality of conductive bumps underlying the heavily doped regions and electrically connected to the conductive pad structures through the heavily-doped regions. | 02-24-2011 |
20110042805 | PACKAGE STRUCTURES FOR INTEGRATING THERMOELECTRIC COMPONENTS WITH STACKING CHIPS - Package structures for integrating thermoelectric components with stacking chips are presented. The package structures include a chip with a pair of conductive through vias. Conductive elements are disposed one side of the chip contacting the pair of conductive through vias. Thermoelectric components are disposed on the other side of the chip, wherein the thermoelectric component includes a first type conductive thermoelectric element and a second type conductive thermoelectric element respectively corresponding to and electrically connecting to the pair of conductive through vias. A substrate is disposed on the thermoelectric component, wherein the thermoelectric component, the pair of conductive through vias and the conductive element form a thermoelectric current path. Therefore, heat generated from the chip is transferred outward through a thermoelectric path formed from the thermoelectric components, the conductive through vias and the conductive elements. | 02-24-2011 |
20110042806 | MULTI-CHIP MODULE AND METHOD OF MANUFACTURING THE SAME - A method of manufacturing a multi-chip module includes: securing a plurality of chips on a surface of a flat-shaped member through a solder bump; connecting the plurality of chips with each other by a bonding wire, at surfaces, opposite to the flat-shaped member side, of the plurality of chips; and electrically connecting the plurality of chips with a board, at the surfaces, opposite to the flat-shaped member side, of the plurality of chips. | 02-24-2011 |
20110042807 | CHIP PACKAGE AND FABRICATION METHOD THEREOF - The invention provides a chip package and fabrication method thereof. In one embodiment, the chip package includes: a semiconductor substrate having opposite first and second surfaces, at least one bond pad region and at least one device region; a plurality of conductive pad structures disposed on the bond pad region at the first surface of the semiconductor substrate; a plurality of heavily doped regions isolated from one another, underlying and electrically connected to the conductive pad structures; and a plurality of conductive bumps underlying the heavily doped regions and electrically connected to the conductive pad structures through the heavily-doped regions. | 02-24-2011 |
20110042808 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME - A semiconductor device includes a semiconductor element having a plurality of element electrodes formed thereon, a circuit board having board electrodes respectively corresponding to the element electrodes formed thereon and having the semiconductor element mounted thereon, and bumps each of which is provided on at least one of the element electrode and the board electrode, and connects together the element electrode and the board electrode corresponding to each other when the semiconductor element is mounted on the circuit board. Furthermore, at least one of a dielectric layer and a resistive layer is provided between at least one of the bumps and the element or board electrode on which the at least one of the bumps is provided, so that the element or board electrode, the dielectric layer or the resistive layer, and the bump form a parallel-plate capacitor or electrical resistance. | 02-24-2011 |
20110049703 | Flip-Chip Package Structure - A flip-chip (FC) package structure is provided. The FC package structure includes a substrate, a chip, a plurality of copper platforms, a plurality of copper bumps, a plating layer, a circuit layer and a solder mask layer. The copper bumps are disposed on the substrate. The copper platforms are stacked on the copper bumps. The plating layer covers the copper bumps and the copper platforms, for contacting with chip foot pads configured at a bottom of the chip. The FC package structure does not need to reserve a space for wire bonding, thus saving the area of the substrate. The copper platforms are stacked on the copper bumps, and are higher than the circuit pattern layer. Therefore, the chip is blocked up, and the gap between the chip and the substrate is enlarged, thus preventing the risk of configuring voids when filling the cladding material and improving the packaging yield. | 03-03-2011 |
20110049704 | SEMICONDUCTOR DEVICE PACKAGES WITH INTEGRATED HEATSINKS - In one embodiment, a semiconductor device package includes a circuit substrate, a chip, a plurality of first solder balls, an encapsulant, and a heatsink. The circuit substrate includes a carrying surface and a plurality of first bonding pads thereon. The chip is disposed on the carrying surface and electrically connected to the circuit substrate. The first bonding pads are located outside of the chip. The first solder balls are disposed on the first bonding pads. The encapsulant is disposed on the carrying surface and covers the chip. The encapsulant includes a plurality of openings exposing the first solder balls. The heatsink is disposed over the encapsulant and bonded to the first solder balls, wherein the heatsink includes a plurality of protrusions on a bonding surface facing the encapsulant, and the protrusions are correspondingly embedded into the first solder balls. | 03-03-2011 |
20110049705 | SELF-ALIGNED PROTECTION LAYER FOR COPPER POST STRUCTURE - A copper post is formed in a passivation layer to electrically connect an underlying bond pad region, and extends to protrude from the passivation layer. A protection layer is formed on a sidewall surface or a top surface of the copper post in a self-aligned manner. The protection layer is a manganese-containing oxide layer, a manganese-containing nitride layer or a manganese-containing oxynitride layer. | 03-03-2011 |
20110049706 | Front Side Copper Post Joint Structure for Temporary Bond in TSV Application - An integrated circuit structure includes a semiconductor substrate; a conductive via (TSV) passing through the semiconductor substrate; and a copper-containing post overlying the semiconductor substrate and electrically connected to the conductive via. | 03-03-2011 |
20110049707 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE - According to one embodiment, a semiconductor device includes an electrode pad, a protective layer, a bump, and a resin layer. The electrode pad is formed on a semiconductor substrate. The protective layer includes a pad opening formed in the position of the electrode pad. The bump is formed in the pad opening and electrically connected to the electrode pad. The resin layer has a space provided between the resin layer and the bump and is formed on the protective layer via a metal layer. The resin layer is formed by using an adhesive resin material. | 03-03-2011 |
20110049708 | Semiconductor Chip Interconnection Structure and Semiconductor Package Formed Using the Same - A semiconductor chip interconnection structure and a semiconductor package formed using the same are provided. The semiconductor chip interconnection structure comprises a chip, a bump assembly and an electrical element. The chip comprises a pad and has a pad aperture from which the pad is exposed. The bump assembly comprises a first bump and a second bump. The first bump is disposed on the pad. The second bump is disposed on the first bump. The outer diameter of the second bump is not less than the outer diameter of the first bump. The electrical element is connected to the bump assembly. | 03-03-2011 |
20110049709 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - Chipping of semiconductor chips is to be prevented. A semiconductor device comprises a semiconductor chip having a main surface, a plurality of pads formed over the main surface, a rearrangement wiring formed over the main surface to alter an arrangement of the plurality of pads, and a protective film and an insulating film formed over the main surface, and a plurality of solder bumps each connected to the rearrangement wiring and arranged differently from the plurality of pads. The presence of a bevel cut surface obliquely continuous to the main surface and formed on a periphery of the main surface of the semiconductor chip prevents chipping. | 03-03-2011 |
20110057307 | Semiconductor Chip with Stair Arrangement Bump Structures - Various semiconductor chip input/output structures and methods of making the same are disclosed. In one aspect, a method of manufacturing is provided that includes forming a first conductor structure on a first side of a semiconductor chip and forming a second conductor structure in electrical contact with the first conductor structure. The second conductor structure is adapted to be coupled to a solder structure and includes a stair arrangement that has at least two treads. | 03-10-2011 |
20110057308 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH CONDUCTIVE PILLARS AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit packaging system includes: providing a substrate; forming a conductive pillar, having substantially parallel vertical sides, in direct contact with the substrate; mounting an integrated circuit to the substrate beside the conductive pillar; and encapsulating the integrated circuit with an encapsulation having a top surface formed for the conductive pillar to extend beyond. | 03-10-2011 |
20110057309 | STRUCTURE, METHOD AND SYSTEM FOR ASSESSING BONDING OF ELECTRODES IN FCB PACKAGING - Structures, methods, and systems for assessing bonding of electrodes in FCB packaging are disclosed. In one embodiment, a method comprises mounting a semiconductor chip with a plurality of first electrodes of a first shape to a mounted portion with a second electrode of a second shape, wherein the second shape is different from the first shape, bonding a respective on of the plurality of first electrodes and the second electrode using a first solder bump, generating an X-ray image of the first solder bump, and determining an acceptability of the bonding of the respective one of the plurality of first electrodes and the second electrode based on the X-ray image of the first solder bump. | 03-10-2011 |
20110057310 | SEMICONDUCTOR PACKAGE HAVING MEMORY DEVICES STACKED ON LOGIC DEVICE - A semiconductor package includes a base substrate, a logic device with a serializer/deserializer (SerDes), a plurality of odd memory devices disposed on a lower surface of the logic device and operatively stack-connected with the SerDes, and a plurality of even memory devices disposed on an upper surface of the logic device and operatively stack-connected with the SerDes, such that the plurality of odd memory devices and the plurality of even memory devices are connected in parallel by the SerDes. | 03-10-2011 |
20110057311 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR - A semiconductor device is obtained, in which excellent characteristics are achieved, the reliability is improved, and an SiC wafer can also be used for the fabrication. A plurality of Schottky-barrier-diode units | 03-10-2011 |
20110057312 | CONTACT STRUCTURE AND METHOD FOR PRODUCING A CONTACT STRUCTURE - The invention relates to a contact structure ( | 03-10-2011 |
20110062580 | PROTECTION LAYER FOR PREVENTING UBM LAYER FROM CHEMICAL ATTACK AND OXIDATION - A protection layer formed of a CuGe | 03-17-2011 |
20110062581 | SEMICONDUCTOR PACKAGE - A semiconductor package includes a substrate, a first semiconductor chip module attached to the substrate, a conductive connection member attached to the first semiconductor chip module, and a second semiconductor chip module attached to the conductive connection member. The first and second semiconductor chip modules are formed to have step like shapes to and extend laterally in opposite directions so as to define a zigzag arrangement together. | 03-17-2011 |
20110062582 | Display device - A display device includes a display panel, and a semiconductor chip having plural bump electrodes and mounted on a substrate constituting the display panel. The plural bump electrodes include a first bump electrode arranged in the vicinity of a center for a longitudinal direction of the semiconductor chip, and a second bump electrode arranged in the vicinity of an end portion in the longitudinal direction of the semiconductor chip. The semiconductor chip has one or more than one conductive layer inside. Assuming that a surface of the semiconductor chip having the bump electrodes formed thereon is a lower side, the number of the conductive layers formed on the second bump electrode is greater than the number of the conductive layers formed on the first bump electrode. The conductive layer formed on the first and the second bump electrode includes a dummy conductive layer. Further, the plural bump electrodes are electrically connected to a wiring layer formed on a substrate constituting the display panel through an anisotropic conductive film. | 03-17-2011 |
20110062583 | STACKED DIE PACKAGE FOR PERIPHERAL AND CENTER DEVICE PAD LAYOUT DEVICE - An assembly method is disclosed that includes providing a substrate, securing a first semiconductor device on a first surface thereof, and superimposing at least a second semiconductor device at least partially over the first semiconductor device. An outer peripheral portion of the second semiconductor device overhangs both the first semiconductor device and the substrate. Discrete conductive elements are placed between the outer peripheral portion of the second semiconductor device and a second surface of the substrate. Intermediate portions of the discrete conductive elements pass outside of a side surface of the substrate. Assemblies and packaged semiconductor devices that are formed in accordance with the method are also disclosed. | 03-17-2011 |
20110062584 | THREE-DIMENSIONALLY INTEGRATED SEMICONDUTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A wiring substrate has, on each of opposite faces thereof, connection pad portions to which various circuit elements are connected, and wiring traces for connecting the connection pad portions. The wiring substrate also has a through wiring portion for establishing mutual connection between the connection pad portions and the wiring traces on the front face and those on the back face. A post electrode component is formed such that it includes a plurality of post electrodes supported by a support portion. A semiconductor chip is attached to the back face of the wiring substrate, and is connected to the connection pad portions on the back face. After the post electrode component is fixed to and electrically connected to the wiring traces at predetermined positions, and resin sealing is performed, the support portion is separated so as to expose end surfaces of the post electrodes or back face wiring traces connected thereto. Another circuit element is disposed on the front face of the wiring substrate, and is connected to the connection pad portions on the front face. | 03-17-2011 |
20110068465 | STRONG INTERCONNECTION POST GEOMETRY - A flip-chip packaging assembly and integrated circuit device are disclosed. An exemplary flip-chip packaging assembly includes a first substrate; a second substrate; and joint structures disposed between the first substrate and the second substrate. Each joint structure comprises an interconnect post between the first substrate and the second substrate and a joint solder between the interconnect post and the second substrate, wherein the interconnect post exhibits a width and a first height. A pitch defines a distance between each joint structure. The first height is less than half the pitch. | 03-24-2011 |
20110068466 | Wafer Backside Interconnect Structure Connected to TSVs - An integrated circuit structure includes a semiconductor substrate having a front surface and a back surface; a conductive via passing through the semiconductor substrate; and a metal feature on the back surface of the semiconductor substrate. The metal feature includes a metal pad overlying and contacting the conductive via, and a metal line over the conductive via. The metal line includes a dual damascene structure. The integrated circuit structure further includes a bump overlying the metal line. | 03-24-2011 |
20110068467 | Semiconductor device and method of manufacturing same - A semiconductor device includes the semiconductor chip connected in a flip-chip style to the substrate, and the underfill resin formed between the substrate and the semiconductor chip and including a filet, wherein the underfill resin includes a first resin layer and a second resin layer superposed on each other in at least a part of a region overlapping with the semiconductor chip in a plan view, and at least one of the first and the second resin layer is formed over an area including the region overlapping with said semiconductor chip in a plan view and the filet. | 03-24-2011 |
20110068468 | Semiconductor Package with Semiconductor Core Structure and Method of Forming the Same - A semiconductor device includes an IPD structure, a first semiconductor die mounted to the IPD structure with a flipchip interconnect, and a plurality of first conductive posts that are disposed adjacent to the first semiconductor die. The semiconductor device further includes a first molding compound that is disposed over the first conductive posts and first semiconductor die, a core structure bonded to the first conductive posts over the first semiconductor die, and a plurality of conductive TSVs disposed in the core structure. The semiconductor device further includes a plurality of second conductive posts that are disposed over the core structure, a second semiconductor die mounted over the core structure, and a second molding compound disposed over the second conductive posts and the second semiconductor die. The second semiconductor die is electrically connected to the core structure. | 03-24-2011 |
20110074014 | Semiconductor Device and Method of Forming Adhesive Material to Secure Semiconductor Die to Carrier in WLCSP - A semiconductor device is made by providing a temporary carrier and providing a semiconductor die having a plurality of bumps formed on its active surface. An adhesive material is deposited as a plurality of islands or bumps on the carrier or active surface of the semiconductor die. The adhesive layer can also be deposited as a continuous layer over the carrier or active surface of the die. The semiconductor die is mounted to the carrier. An encapsulant is deposited over the die and carrier. The adhesive material holds the semiconductor die in place to the carrier while depositing the encapsulant. An interconnect structure is formed over the active surface of the die. The interconnect structure is electrically connected to the bumps of the semiconductor die. The adhesive material can be removed prior to forming the interconnect structure, or the interconnect structure can be formed over the adhesive material. | 03-31-2011 |
20110074015 | STACKED SEMICONDUCTOR DEVICE AND A METHOD FOR MANUFACTURING THE SAME - An upper-side semiconductor chip is stacked on a lower-side semiconductor chip by connection through microbumps. In the lower-side semiconductor chip that forms a gap with the upper-side semiconductor chip to be filled with an underfill resin, and is sealed with a molding resin, a polyimide film is formed on the chip surface in a peripheral area excluding openings of bonding pads. A stacked semiconductor device and a method for manufacturing the stacked semiconductor device are provided that the device is capable of suppressing generation of a void in the underfill resin layer, prevents a decrease in measurement accuracy of the gap between the stacked semiconductor chips, and prevents peeling of the molding resin. | 03-31-2011 |
20110074016 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR - The size and thickness of a semiconductor device are reduced. A semiconductor package with a flip chip bonding structure includes: a semiconductor chip having a main surface with multiple electrode pads formed therein and a back surface located on the opposite side thereto; four lead terminals each having an upper surface with the semiconductor chip placed thereover and a lower surface located on the opposite side thereto; and a sealing body having a main surface and a back surface located on the opposite side thereto. In this semiconductor package, the distance between adjacent first lower surfaces of the four lead terminals exposed in the back surface of the sealing body is made longer than the distance between adjacent upper surfaces thereof. This makes it possible to suppress the production of a solder bridge when the semiconductor package is solder mounted to a mounting board and to reduce the size and thickness of the semiconductor package and further enhance the reliability of the semiconductor package. | 03-31-2011 |
20110074017 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE AND MULTILAYER WAFER STRUCTURE - Grooves are formed on the front surfaces of first and second semiconductor wafers each including an aggregate of a plurality of semiconductor chips. The grooves each extend on a dicing line set between the semiconductor chips and to have a larger width than the dicing line. Thereafter the first and second semiconductor wafers are arranged so that the front surfaces thereof are opposed to each other, and the space between the first semiconductor wafer and the second semiconductor wafer is sealed with underfill. Thereafter the rear surfaces of the first and second semiconductor wafers are polished until at least the grooves are exposed, and a structure including the first and second semiconductor wafers and the underfill is cut on the dicing line. | 03-31-2011 |
20110074018 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - In one embodiment, a method of manufacturing a semiconductor device is disclosed. The method includes forming a cured film of an insulation resin on a surface of a first semiconductor chip and flip-chip bonding a second semiconductor via a bump on the first semiconductor chip on which the cured film of the insulation resin is formed. The insulation resin can be cured at temperature range from (A−50)° C. to (A+50)° C., wherein “A” is a solidification point of the bump. | 03-31-2011 |
20110074019 | SEMICONDUCTOR DEVICE - To improve reliability of a semiconductor device in which wire bonding using a wire made of copper is performed. A semiconductor device is configured so that one of end parts (wide width part) of a copper wire is joined via a bump on a pad (electrode pad) formed over a main surface (first main surface) of a semiconductor chip of the semiconductor device. The bump is made of gold, which is a metal material having a hardness lower than that of copper, and the width of the bump is narrower than the width of the wide width part of the wire. | 03-31-2011 |
20110074020 | SEMICONDUCTOR DEVICE AND METHOD FOR MOUNTING SEMICONDUCTOR DEVICE - A method for mounting a semiconductor device by mounting a semiconductor chip on a board by flip chip bonding, comprising: contacting an Au bump of the semiconductor chip with a Sn—Bi solder; and heating the Sn—Bi solder at a temperature which is not lower than the melting point thereof and which is not higher than 180° C. for 30 minutes or more. | 03-31-2011 |
20110074021 | DEVICE MOUNTING BOARD, AND SEMICONDUCTOR MODULE - A device mounting board includes an insulating resin layer, a wiring layer provided on one of main surfaces of the insulating resin layer, and bump electrodes connected electrically to the wiring layer and protruding on a side of the insulating resin layer from the wiring layer. A semiconductor module is formed by having the bump electrodes connected to a semiconductor device. A recess is provided in the top face of each bump electrode. The recess communicates with an opening provided on a side surface of the bump electrode. | 03-31-2011 |
20110074022 | Semiconductor Device and Method of Forming Flipchip Interconnect Structure - A semiconductor device has a semiconductor die with a plurality of bumps or interconnect structures formed over an active surface of the die. The bumps can have a fusible portion and non-fusible portion, such as a conductive pillar and bump formed over the conductive pillar. A plurality of conductive traces with interconnect sites is formed over a substrate. The bumps are wider than the interconnect sites. A masking layer is formed over an area of the substrate away from the interconnect sites. The bumps are bonded to the interconnect sites under pressure or reflow temperature so that the bumps cover a top surface and side surfaces of the interconnect sites. An encapsulant is deposited around the bumps between the die and substrate. The masking layer can form a dam to block the encapsulant from extending beyond the semiconductor die. Asperities can be formed over the interconnect sites or bumps. | 03-31-2011 |
20110074023 | Apparatus And Methods Of Forming An Interconnect Between A Workpiece And Substrate - Embodiments of an apparatus and methods of forming interconnect between a workpiece and substrate and its application to packaging of microelectronic devices are described herein. Other embodiments may be described and claimed. | 03-31-2011 |
20110074024 | Semiconductor Device and Method of Forming Bump-on-Lead Interconnection - A semiconductor device has a semiconductor die with a plurality of composite bumps formed over a surface of the semiconductor die. The composite bumps have a fusible portion and non-fusible portion, such as a conductive pillar and bump formed over the conductive pillar. The composite bumps can also be tapered. Conductive traces are formed over a substrate with interconnect sites having edges parallel to the conductive trace from a plan view for increasing escape routing density. The interconnect site can have a width less than 1.2 times a width of the conductive trace. The composite bumps are wider than the interconnect sites. The fusible portion of the composite bumps is bonded to the interconnect sites so that the fusible portion covers a top surface and side surface of the interconnect sites. An encapsulant is deposited around the composite bumps between the semiconductor die and substrate. | 03-31-2011 |
20110074025 | SEMICONDUCTOR MODULE, METHOD OF MANUFACTURING SEMICONDUCTOR MODULE, AND MOBILE DEVICE - An electrode for a semiconductor device is formed on the mounting surface (particularly, the outer periphery thereof) of a semiconductor substrate in a semiconductor module. In order to secure a large gap between the electrodes, an insulating layer is formed on the electrode. Also formed are a plurality of bumps penetrating the insulating layer and connected to the electrode, and a rewiring pattern integrally formed with the bumps. The rewiring pattern includes a bump area and a wiring area extending contiguously with the bump area. The insulating layer is formed to have a concave upper surface in an interval between the bumps, and the wiring area of the rewiring pattern is formed to fit that upper surface. The wiring area of the rewiring pattern is formed to be depressed toward the semiconductor substrate in relation to the bump area of the rewiring pattern. | 03-31-2011 |
20110074026 | Semiconductor Device and Method of Forming Insulating Layer on Conductive Traces for Electrical Isolation in Fine Pitch Bonding - A semiconductor device has a semiconductor die with a plurality of bumps formed over an active surface of the semiconductor die. A plurality of first conductive traces with interconnect sites is formed over a substrate. The bumps are wider than the interconnect sites. A surface treatment is formed over the first conductive traces. A plurality of second conductive traces is formed adjacent to the first conductive traces. An oxide layer is formed over the second conductive traces. A masking layer is formed over an area of the substrate away from the interconnect sites. The bumps are bonded to the interconnect sites so that the bumps cover a top surface and side surface of the interconnect sites. The oxide layer maintains electrical isolation between the bump and second conductive trace. An encapsulant is deposited around the bumps between the semiconductor die and substrate. | 03-31-2011 |
20110074027 | FLIP CHIP INTERCONNECTION WITH DOUBLE POST - A microelectronic assembly includes a substrate having a first surface, a plurality of first conductive pads exposed thereon, and a plurality of first metal posts. Each metal post defines a base having an outer periphery and is connected to one of the conductive pads. Each metal post extends along a side wall from the base to ends remote from the conductive pad. The assembly further includes a dielectric material layer having a plurality of openings and extending along the first surface of the substrate. The first metal posts project through the openings such that the dielectric material layer contacts at least the outside peripheries thereof. Fusible metal masses contact the ends of some of first metal posts and extend along side walls towards the outer surface of the dielectric material layer. A microelectronic element is carried on the substrate and is electronically can be connected the conductive pads. | 03-31-2011 |
20110074028 | Semiconductor Device and Method of Dissipating Heat From Thin Package-on-Package Mounted to Substrate - A semiconductor device has a first substrate with a central region. A plurality of bumps is formed around a periphery of the central region of the first substrate. A first semiconductor die is mounted to the central region of the first substrate. A second semiconductor die is mounted to the first semiconductor die over the central region of the first substrate. A height of the first and second die is less than or equal to a height of the bumps. A second substrate has a thermal conduction channel. A surface of the second semiconductor die opposite the first die is mounted to the thermal conductive channel of the second substrate. A thermal interface layer is formed over the surface of the second die. The bumps are electrically connected to contact pads on the second substrate. A conductive plane is formed over a surface of the second substrate. | 03-31-2011 |
20110079894 | Template Process for Small Pitch Flip-Flop Interconnect Hybridization - A process is disclosed for high density indium bumping of microchips by using an innovative template wafer upon which the bumps are initially fabricated. Once fabricated, these bumps are transferred to the microchip, after which can be hybridized to another microchip. Such a template wafer is reusable, and thus provides an economical way to fabricate indium bumps. Reusability also eliminates nonuniformities in bump shape and size in serial processing of separate microchips, which is not the case for other indium bump fabrication processes. Such a fabrication process provides a way to form relatively tall indium bumps and accomplishes this without the standard thick photoresist liftoff process. The described process can be suitable for bump pitches under 10 microns, and is only limited by the resolution of the photolithography equipment used. | 04-07-2011 |
20110079895 | BUMP STRUCTURE, CHIP PACKAGE STRUCTURE INCLUDING THE SAME AND METHOD OF MANUFACTURING THE SAME - A bump structure includes a first substrate, a plurality of first bond pads, a plurality of dielectric bumps, a plurality of under bump metal layers, and a plurality of metal layers. The plurality of first bond pads are spaced apart on the first substrate. The plurality of dielectric bumps disposed corresponding to the first bond pads electrically isolate the first bond pads from each other. Each under bump metal layer is formed between the respective first bond pad and the dielectric bump, extending through a side surface of the respective dielectric bump, and correspondingly forming an extension portion between two adjacent dielectric bumps, wherein each extension portion has a length along the extending direction thereof shorter than the pitch between two adjacent dielectric bumps. Each metal layer is formed on the side surface of the respective dielectric bump and the respective extension portion. | 04-07-2011 |
20110079896 | SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE FABRICATION METHOD - A semiconductor device fabrication method, comprising the steps of: forming a solder portion on an electrode of a substrate on which a semiconductor chip is to be mounted; applying a resin layer onto the substrate to a thickness such that a top region of the solder portion is exposed; curing the resin layer; providing a thermosetting underfill material over a region where the semiconductor chip is to be mounted; placing an electrode of the semiconductor chip face down on the solder portion in such a manner that the electrode faces the solder portion; and heating the underfill material and the solder portion. | 04-07-2011 |
20110079897 | INTEGRATED CIRCUIT CHIP AND FLIP CHIP PACKAGE HAVING THE INTEGRATED CIRCUIT CHIP - In an integrated circuit (IC) chip and a flip chip package having the same, no wiring line is provided and the first electrode pad does not make contact with the wiring line in a pad area of the IC chip. Thus, the first bump structure makes contact with the first electrode regardless of the wiring line in the pad area. The second electrode pad makes contact with the wiring line in a pseudo pad area of the IC chip. Thus, the second bump structure in the pseudo pad area makes contact with an upper surface of the second electrode at a contact point(s) spaced apart from the wiring line under the second electrode. | 04-07-2011 |
20110079898 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME, CIRCUIT BOARD, AND ELECTRONIC INSTRUMENT - A substrate includes an insulating film in which a penetrating hole is formed, the penetrating hole extending between a first surface of the insulating film and a second surface of the insulating film opposite to the first surface of the insulating film. A wiring pattern is adhered to the first surface of the insulating film by an adhesive material. A first portion of the wiring pattern is formed over the penetrating hole, and a part of the adhesive material is formed on an internal wall surface forming the penetrating hole so as not to stop up the penetrating hole. An external electrode contacts the first portion of the wiring pattern and projects through the penetrating hole and extends beyond the second surface of the insulating film. | 04-07-2011 |
20110079899 | EMBEDDED INTEGRATED CIRCUIT PACKAGE SYSTEM AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an embedded integrated circuit package system includes: forming a first conductive pattern on a first structure; connecting a first integrated circuit die, having bumps on a first active side, directly on the first conductive pattern by the bumps; forming a substrate forming encapsulation to cover the first integrated circuit die and the first conductive pattern; forming a channel in the substrate forming encapsulation; and applying a conductive material in the channel. | 04-07-2011 |
20110079900 | MICROFEATURE WORKPIECES AND METHODS FOR FORMING INTERCONNECTS IN MICROFEATURE WORKPIECES - Methods for forming interconnects in microfeature workpieces, and microfeature workpieces having such interconnects are disclosed herein. The microfeature workpieces may have a terminal and a substrate with a first side carrying the terminal and a second side opposite the first side. In one embodiment, a method includes (a) constructing an electrically conductive interconnect extending from the terminal to at least an intermediate depth in the substrate with the interconnect electrically connected to the terminal, and (b) removing material from the second side of the substrate so that a portion of the interconnect projects from the substrate. | 04-07-2011 |
20110079901 | Methods of Forming Back Side Layers For Thinned Wafers and Related Structures - A method of processing a wafer including a plurality of integrated circuit devices on a front side of the wafer, may include thinning the wafer from a back side opposite the front side. After thinning the wafer, a back side layer may be provided on the back side of the thinned wafer opposite the front side, and the back side layer may be configured to counter stress on the front side of the wafer including the plurality of integrated circuit devices thereon. After providing the back side layer, the plurality of integrated circuit devices may be separated. Related structures are also discussed. | 04-07-2011 |
20110084381 | Chip Having A Metal Pillar Structure - The present invention relates to a chip having a metal pillar structure. The chip includes a chip body, at least one chip pad, a first passivation layer, an under ball metal layer and at least one metal pillar structure. The chip body has an active surface. The chip pad is disposed on the active surface. The first passivation layer is disposed on the active surface, and has at least one first opening so as to expose part of the chip pad. The under ball metal layer is disposed on the chip pad. The metal pillar structure is disposed on the under ball metal layer, and includes a metal pillar and a solder. The metal pillar is disposed on the under ball metal layer. The solder is disposed on the metal pillar, and the maximum diameter formed by the solder is shorter than or equal to the diameter of the metal pillar. Therefore, when the pitch between two adjacent metal pillar structures of the chip is a fine pitch, the defect of solder bridge can be avoided, so that the yield rate is improved. | 04-14-2011 |
20110084382 | CHIP PACKAGE AND FABRICATION METHOD THEREOF - A chip package is disclosed. The package includes a carrier substrate and at least two semiconductor chips thereon. Each semiconductor chip includes a plurality of conductive pads. A position structure is disposed on the carrier substrate to fix locations of the semiconductor chips at the carrier substrate. A fill material layer is formed on the carrier substrate, covers the semiconductor chips and the position structure, and has a plurality of openings correspondingly exposing the conductive pads. A redistribution layer (RDL) is disposed on the fill material layer and is connected to the conductive pads through the plurality of openings. A protective layer covers the fill material layer and the RDL. A plurality of conductive bumps is disposed on the protective layer and is electrically connected to the RDL. A fabrication method of the chip package is also disclosed. | 04-14-2011 |
20110084383 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device includes a first circuit base member including a surface having multiple first electrodes formed thereon, a second circuit base member being provided above the first circuit base member and having first through holes and second through holes formed respectively above the first electrodes, a semiconductor package provided above the second circuit base member, and multiple first bumps provided inside the first through holes and the second through holes to connect the first electrodes to the semiconductor package. | 04-14-2011 |
20110084384 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device includes a substrate, a semiconductor chip that is bonded to one of the faces of the substrate via bumps, and has a device formation face facing the one of the faces, and a resin that fills the space between the device formation face of the semiconductor chip and the one of the faces of the substrate. The resin includes: a first resin that is formed in a formation region of bumps placed on the outermost circumference of the bumps, and is formed inside the formation region, and a second resin that is formed outside the first resin. The thermal expansion coefficient of the substrate is higher than the thermal expansion coefficient of the first resin. The thermal expansion coefficient of the second resin is higher than the thermal expansion coefficient of the first resin. | 04-14-2011 |
20110084385 | Semiconductor device and information processing system including the same - A semiconductor device includes a plurality of core chips and an interface chip that controls the core chips. Each of the core chips and the interface chip includes plural through silicon vias that penetrate a semiconductor substrate and plural pads respectively connected to the through silicon vias. The through silicon vias include a through silicon via of a power source system to which a power source potential or a ground potential is supplied, and a through silicon via of a signal system to which various signals are supplied. Among the pads, at least an size of a pad connected to the through silicon via of the power source system is larger than a size of a pad connected to the through silicon via of the signal system. Therefore, a larger parasitic capacitance can be secured. | 04-14-2011 |
20110084386 | Semiconductor Device and Method of Self-Confinement of Conductive Bump Material During Reflow Without Solder Mask - A semiconductor device has a semiconductor die with a die bump pad. A substrate has a conductive trace with an interconnect site. A conductive bump material is deposited on the interconnect site or die bump pad. The semiconductor die is mounted over the substrate so that the bump material is disposed between the die bump pad and interconnect site. The bump material is reflowed without a solder mask around the die bump pad or interconnect site to form an interconnect structure between the die and substrate. The bump material is self-confined within the die bump pad or interconnect site. The volume of bump material is selected so that a surface tension maintains self-confinement of the bump material substantially within a footprint of the die bump pad and interconnect site. The interconnect structure can have a fusible portion and non-fusible portion. An encapsulant is deposited between the die and substrate. | 04-14-2011 |
20110084387 | DESIGNS AND METHODS FOR CONDUCTIVE BUMPS - Methods, techniques, and structures relating to die packaging. In one exemplary implementation, a die package interconnect structure includes a semiconductor substrate and a first conducting layer in contact with the semiconductor substrate. The first conducting layer may include a base layer metal. The base layer metal may include Cu. The exemplary implementation may also include a diffusion barrier in contact with the first conducting layer and a wetting layer on top of the diffusion barrier. A bump layer may reside on top of the wetting layer, in which the bump layer may include Sn, and Sn may be electroplated. The diffusion barrier may be electroless and may be adapted to prevent Cu and Sn from diffusing through the diffusion barrier. Furthermore, the diffusion barrier may be further adapted to suppress a whisker-type formation in the bump layer. | 04-14-2011 |
20110084388 | REDUCING UNDERFILL KEEP OUT ZONE ON SUBSTRATE USED IN ELECTRONIC DEVICE PROCESSING - Electronic devices and methods for fabricating electronic devices are described. One method includes providing a substrate with a die attach area, and forming a layer on the substrate outside of the die attach area. The layer may be formed from a fluoropolymer material. The method also includes coupling a die to the substrate in the die attach area, wherein a gap remains between the die and the die attach area. The method also includes placing an underfill material in the gap and adjacent to the layer on the substrate. Examples of fluoropolymer materials which may be used include polytetrafluoroethylene (PTFE) and perfluoroalkoxy polymer resin (PFA). Other embodiments are described and claimed. | 04-14-2011 |
20110089560 | Non-Uniform Alignment of Wafer Bumps with Substrate Solders - An integrated circuit structure includes a work piece selected from the group consisting of a semiconductor chip and a package substrate. The work piece includes a plurality of under bump metallurgies (UBMs) distributed on a major surface of the work piece; and a plurality of metal bumps, with each of the plurality of metal bumps directly over, and electrically connected to, one of the plurality of UBMs. The plurality of UBMs and the plurality of metal bumps are allocated with an overlay offset, with at least some of the plurality of UBMs being misaligned with the respective overlying ones of the plurality of metal bumps. | 04-21-2011 |
20110089561 | SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME - A semiconductor package has: a first chip; and a second chip. The first chip has: an insulating resin layer formed on a principal surface of the first chip; a bump-shaped first internal electrode group that is so formed in a region of the insulating resin layer as to penetrate through the insulating resin layer and is electrically connected to the second chip; an external electrode group used for electrical connection to an external device; and an electrostatic discharge protection element group electrically connected to the external electrode group. The first internal electrode group is not electrically connected to the electrostatic discharge protection element group. | 04-21-2011 |
20110089562 | SEMICONDUCTOR DEVICE HAVING WAFER-LEVEL CHIP SIZE PACKAGE - A semiconductor device including a semiconductor substrate with circuit elements and electrode pads formed on one surface. The surface is covered by a dielectric layer with openings above the electrode pads. A metal layer is included on the dielectric layer and patterned to form a conductive pattern with traces leading to the electrode pads. A protective layer is included as having openings exposing part of the conductive pattern. Each opening is covered by an electrode such as a solder bump, which is electrically connected through the conductive pattern to one of the electrode pads. The thickness of the protective layer, which may function as a package of the semiconductor device, is thus reduced. The protective layer may be formed from a photosensitive material, simplifying the formation of the openings for the electrodes. | 04-21-2011 |
20110095417 | LEADLESS SEMICONDUCTOR DEVICE TERMINAL - This document discusses, among other things, a semiconductor die having a first conductive bump coupled to a first electrical terminal at a first die surface of a semiconductor die and a dielectric substantially covering the first die surface and substantially surrounding the first conductive bump. A surface of the dielectric can include a recessed terminal area, and a second electrical terminal can be coupled to the first conductive bump in the recessed terminal area. | 04-28-2011 |
20110095418 | SEMICONDUCTOR PACKAGE AND METHOD FOR FABRICATING THE SAME - A semiconductor package includes a semiconductor chip having a first bump group and a second bump group, and a package substrate having a first pattern for data communication with the semiconductor chip and a second pattern for supplying power to the semiconductor chip or grounding the semiconductor chip, wherein the first bump group is disposed on the first pattern and the second bump group is disposed on the second pattern. | 04-28-2011 |
20110095419 | CONDUCTIVE FILM, METHOD OF MANUFACTURING THE SAME, SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - There is provided a conductive film. The conductive film includes: an anodized layer having a plurality of through holes extending therethrough in its thickness direction; a plurality of linear conductors each formed in a corresponding one of the through holes and each having first and second protrusions protruding from the anodized layer, wherein at least one of the first and second protrusions is covered by a coating material; and an uncured thermosetting resin layer formed on the anodized layer to cover at least one of the first and second protrusions. | 04-28-2011 |
20110095420 | Semiconductor device and method of manufacturing semiconductor device - A semiconductor device includes a protective insulating film, an opening formed in the protective insulating film, an electrode pad located within the opening, a bump formed on the protective insulating film, and an interconnect. The bump includes a bump core and a conductive film. The bump core includes an insulating resin layer and a conductive resin layer located on the insulating resin layer. The conductive film is formed on at least the upper surface of the bump core. The interconnect connects the conductive film of the bump and the electrode pad. | 04-28-2011 |
20110095421 | Flip chip package and method of manufacturing the same - There is provided a flip chip package including an electronic device, a board including a conductive pad disposed inside a mounting region of the board on which the electronic device is mounted, and a connection pad disposed outside the mounting region, a resin layer formed on the board and including a trench formed by removing a part of the resin layer, and a dam member provided on the trench and preventing the leakage of an underfill between the mounting region and the connection pad. Since the dam member, formed on the processed resin layer, can prevent the leakage of the underfill, a package defect rate can be lowered, and connection reliability can be improved. | 04-28-2011 |
20110095422 | ELECTRONIC COMPONENT, SEMICONDUCTOR DEVICE, METHODS OF MANUFACTURING THE SAME, CIRCUIT BOARD, AND ELECTRONIC INSTRUMENT - An electronic component including an electronic element, an electrode that is formed on a first surface of the electronic element, a first resin layer that is formed over the first surface of the electronic element, a wiring that is electrically connected to the electrode, a first portion of the wiring extending over the first resin layer, a second resin layer that is formed over the first resin layer and the wiring, the second resin layer having an opening, the opening overlapping the first portion of the wiring, an external terminal that is provided above the second resin layer, the external terminal being connected to the first portion of the wiring via the opening, and a third resin layer that is formed over the second resin layer, the third resin layer being provided around the external terminal. | 04-28-2011 |
20110095423 | SEMICONDUCTOR DEVICE MOUNTED STRUCTURE AND ITS MANUFACTURING METHOD - A semiconductor device mounted structure includes a semiconductor device having a plurality first electrodes, a circuit board having a plurality of second electrodes, a plurality of bumps respectively formed on the plurality of first electrodes, a plurality of bonding members respectively positioned between the bumps and the second electrodes to electrically connect the first electrodes to the second electrodes via the bumps, and a plurality of reinforcing resin members respectively positioned around the bonding members so as to cover at least the bonding members and bonding regions between the bonding members and the bumps. Adjacent reinforcing resin members are spaced away from each other so as not to have contact with each other without being in contact with the semiconductor device. This semiconductor device mounted structure enhances the reliability of joints in impact resistance and makes it easy to repair it. | 04-28-2011 |
20110101517 | MOLDED SEMICONDUCTOR PACKAGE HAVING A FILLER MATERIAL - An integrated circuit is attached to a package substrate. The integrated circuit is electrically connected to the package substrate using a plurality of bond wires connected between a plurality of bond posts and a plurality of bond pads. A first plurality of the bond pads are along a first side of the integrated circuit and coupled to a first plurality of the bond posts with a first plurality of the bond wires. A second plurality of the bond pads are along a second side of the integrated circuit and coupled to a second plurality of the bond posts with a second plurality of the bond wires. Mold compound is injected through a plurality of openings in the package substrate. A first opening is between the first plurality of bond posts and the first side. A second opening is between the second plurality of bond posts and the second side. | 05-05-2011 |
20110101518 | Semiconductor Device and Method of Forming Column Interconnect Structure to Reduce Wafer Stress - An interconnect pad is formed over a first substrate. A photoresist layer is formed over the first substrate and interconnect pad. A portion of the photoresist layer is removed to form a channel and expose a perimeter of the interconnect pad while leaving the photoresist layer covering a central area of the interconnect pad. A first conductive material is deposited in the channel of the photoresist layer to form a column of conductive material. The remainder of the photoresist layer is removed. A masking layer is formed around the column of conductive material while exposing the interconnect pad within the column of conductive material. A second conductive material is deposited over the first conductive layer. The second conductive material extends above the column of conductive material. The masking layer is removed. The second conductive material is reflowed to form a column interconnect structure over the semiconductor device. | 05-05-2011 |
20110101519 | Robust Joint Structure for Flip-Chip Bonding - An integrated circuit structure includes a first work piece and a second work piece. The first work piece includes a copper bump at a main surface of the first work piece and having a first dimension; and a nickel-containing barrier layer over and adjoining the copper bump. The second work piece is bonded to the first work piece and includes a bond pad at a main surface of the second work piece; and a solder mask at the main surface of the second work piece and having a solder resist opening with a second dimension exposing a portion of the bond pad. A ratio of the first dimension to the second dimension is greater than about 1. Further, a solder region electrically connects the copper bump to the bond pad, with a vertical distance between the bond pad and the copper bump being greater than about 30 μm. | 05-05-2011 |
20110101520 | Semiconductor Die Contact Structure and Method - A system and method for forming a semiconductor die contact structure is disclosed. An embodiment comprises a top level metal contact, such as copper, with a thickness large enough to act as a buffer for underlying low-k, extremely low-k, or ultra low-k dielectric layers. A contact pad or post-passivation interconnect may be formed over the top level metal contact, and a copper pillar or solder bump may be formed to be in electrical connection with the top level metal contact. | 05-05-2011 |
20110101521 | POST PASSIVATION INTERCONNECT WITH OXIDATION PREVENTION LAYER - A copper interconnect line formed on a passivation layer is protected by a copper-containing material layer including a group III element, a group IV element, a group V element or combinations thereof. | 05-05-2011 |
20110101522 | Multichip semiconductor device, chip therefor and method of formation thereof - A multichip semiconductor device is disclosed in which chips are stacked each of which comprises a semiconductor substrate formed on top with circuit components and an interlayer insulating film formed on the top of the semiconductor substrate. At least one of the chips has a connect plug of a metal formed in a through hole that passes through the semiconductor substrate and the interlayer insulating film. The chip with the connect plug is electrically connected with another chip by that connect plug. | 05-05-2011 |
20110101523 | PILLAR BUMP WITH BARRIER LAYER - A copper pillar bump has a surface covered with by a barrier layer formed of a copper-containing material layer including a group III element, a group IV element, a group V element or combinations thereof. The barrier layer depresses the copper diffusion and reaction with solder to reduce the thickness of intermetallic compound between the pillar pump and solder. | 05-05-2011 |
20110101524 | Semiconductor Device with Bump Interconnection - A semiconductor device includes a semiconductor die having contact pads disposed over a surface of the semiconductor die, a die attach adhesive layer disposed under the semiconductor die, and an encapsulant material disposed around and over the semiconductor die. The semiconductor device further includes bumps disposed in the encapsulant material around a perimeter of the semiconductor die. The bumps are partially enclosed by the encapsulant material. The semiconductor device further comprises first vias disposed in the encapsulant. The first vias expose surfaces of the contact pads. The semiconductor device further includes a first redistribution layer (RDL) disposed over the encapsulant and in the first vias, and a second RDL disposed under the encapsulant material and the die attach adhesive layer. The first RDL electrically connects each contact pad of the semiconductor die to one of the bumps, and the second RDL is electrically connected to one of the bumps. | 05-05-2011 |
20110108980 | STABLE GOLD BUMP SOLDER CONNECTIONS - A metallic interconnect structure ( | 05-12-2011 |
20110108981 | REDISTRIBUTION LAYER ENHANCEMENT TO IMPROVE RELIABILITY OF WAFER LEVEL PACKAGING - An enhanced redistribution layer is provided that geometrically expands redistribution layer (RDL) pads associated with a ball grid array of a wafer level package (WLP) to provide tensile stress relief during temperature cycle and/or drop testing of the WLP. | 05-12-2011 |
20110108982 | PRINTED CIRCUIT BOARD - A printed circuit board includes a body part formed with connection pads on a first surface thereof; and a warpage compensating part formed over the first surface of the body part and having a height that increases from edges toward a center of the warpage compensating part so that an upper surface of the warpage compensating part facing away from the first surface of the body part is convex upward. The warpage compensating part comprises conductive layer patterns formed over the first surface of the body part to be electrically connected to the connection pads; and a solder resist formed over the first surface of the body part so as to expose the conductive layer patterns. The height of the solder resist gradually increases from both edges toward a center of the solder resist. | 05-12-2011 |
20110115073 | PAD STRUCTURE FOR SEMICONDUCTOR DEVICES - A semiconductor device is provided which includes a semiconductor substrate having a plurality of microelectronic elements formed therein; an interconnect structure formed over the substrate, the interconnect structure including metal layers isolated from one another by an inter-metal dielectric, the metal layers including a topmost metal layer; dummy metal vias formed between at least two metal layers and disposed within a region of the interconnect structure; and a bonding pad formed over the topmost metal layer such that the bonding pad is aligned with the region of the interconnect structure. | 05-19-2011 |
20110115074 | WAFER BUMPING USING PRINTED UNDER BUMP METALIZATION - Methods, systems, and apparatuses for printing under bump metallization (UBM) features on chips/wafers are provided. A wafer is received that has a surface defined by a plurality of integrated circuit regions. Each integrated circuit region has a passivation layer and a plurality of terminals on the surface of the wafer accessible through openings in the passivation layer. A plurality of UBM features are formed on the surface of the wafer in the form of an ink such that each UBM feature is formed electrically coupled with a corresponding terminal of the plurality of terminals. An ink jet printer may be used to print the ink in the form of the UBM feature. A UBM feature may be formed directly on a corresponding terminal, or on routing that is coupled to the corresponding terminal. A bump interconnect may be formed on the UBM feature. | 05-19-2011 |
20110115075 | BUMPING FREE FLIP CHIP PROCESS - Methods, systems, and apparatuses for an integrated circuit package assembly process are provided. A wafer is received having a surface defined by a plurality of integrated circuit regions. Electrical conductors are accessible through corresponding first openings in a first passivation layer on the surface of the wafer. Solderable metal layer features are formed on the electrical conductors through the first openings. The wafer is singulated to form a plurality of flip chip dies. A plurality of package substrates is received. Each package substrate has a plurality of solder on pad (SOP) features on a respective surface. Each flip chip die is mounted to a corresponding package substrate such that each SOP feature is coupled to a corresponding solderable metal layer feature, to form a plurality of integrated circuit packages. | 05-19-2011 |
20110115076 | SEMICONDUCTOR DEVICE, ELECTRONIC COMPONENT, AND FABRICATION PROCESS THEREOF - A semiconductor device includes: a semiconductor substrate that has a first surface and a second surface opposite to the first surface; an electrode that is provided on the first surface of the semiconductor substrate; an insulating film that is provided on the first surface of the semiconductor substrate, the insulating film having an aperture at least partly overlapping the electrode; a resin bump that is provided on the insulating film; and a wiring layer that is electrically connected to the electrode, a part of the wiring layer being partly provided on the resin bump, the wiring layer including a first conductive layer formed on the electrode and on the resin bump, and a second conductive layer formed on the first conductive layer, the first conductive layer including a first surface on the side of the semiconductor substrate, and a second surface on the side of the second conductive layer, and a first oxide film or a first nitride film that is provided on the second surface of the first conductive layer. | 05-19-2011 |
20110115077 | Method for Reducing Voids in a Copper-Tin Interface and Structure Formed Thereby - An embodiment is a method for forming a semiconductor assembly comprising cleaning a connector comprising copper formed on a substrate, applying cold tin to the connector, applying hot tin to the connector, and spin rinsing and drying the connector. | 05-19-2011 |
20110115078 | FLIP CHIP PACKAGE - A flip chip package may include a semiconductor chip, a package substrate, a conductive magnetic bump and an anisotropic conductive member. The semiconductor chip may have a first pad. The package substrate may have a second pad confronting the first pad. The conductive magnetic bump may be interposed between the semiconductor chip and the package substrate to generate a magnetic force. The anisotropic conductive member may be arranged between the semiconductor chip and the package substrate. The anisotropic conductive member may have conductive magnetic particles induced toward the conductive magnetic bump by the magnetic force to electrically connect the first pad with the second pad. A predetermined number of the conductive magnetic particles may be positioned between the conductive magnetic bump and the pad, so that an electrical connection reliability between the pads may be increased. | 05-19-2011 |
20110115079 | Wafter and substructure for use in manufacturing electronic component packages - A wafer for electronic component packages is used for manufacturing a plurality of electronic component packages, each of the plurality of electronic component packages including: a base incorporating a plurality of external connecting terminals; and at least one electronic component chip bonded to the base and electrically connected to the plurality of external connecting terminals. The wafer has a plurality of sets of external connecting terminals corresponding to the plurality of electronic component packages, a retainer for retaining the plurality of sets of external connecting terminals, and a coupling portion for coupling the plurality of sets of external connecting terminals to one another. The wafer includes a plurality of pre-base portions that will each be subjected to bonding of the at least one electronic component chip thereto and will be subjected to separation from one another later so that each of them will thereby become the base. | 05-19-2011 |
20110115080 | SEMICONDUCTOR DEVICE INCLUDING SEMICONDUCTOR CONSTRUCT INSTALLED ON BASE PLATE, AND MANUFACTURING METHOD OF THE SAME - A semiconductor device comprises a semiconductor construct including a semiconductor substrate, and an external connection electrode provided to protrude on the surface of the semiconductor substrate, a base plate on which the semiconductor construct is installed, and a sealing layer stacked on the semiconductor substrate except for the external connection electrode and on the base plate including the side surface of the semiconductor substrate. | 05-19-2011 |
20110115081 | MULTILAYER SEMICONDUCTOR DEVICE AND ELECTRONIC EQUIPMENT - A multilayer semiconductor device includes an interconnect substrate provided with first electrode lands and connection terminals on a top surface; a semiconductor chip mounted on the top surface of the interconnect substrate; first connecting members connecting the first electrode lands to a circuit formation surface of the semiconductor chip; first metal posts provided on the connection terminals; encapsulating resin filling a space between the interconnect substrate and the semiconductor chip; a package provided with second electrode lands on a main surface; and second connecting members electrically connecting the first metal posts to the second electrode lands. | 05-19-2011 |
20110121449 | Semiconductor Device and Method of Forming Compliant Stress Relief Buffer Around Large Array WLCSP - A semiconductor device has a stress relief buffer mounted to a temporary substrate in locations designated for bump formation. The stress relief buffer can be a multi-layer composite material such as a first compliant layer, a silicon layer formed over the first compliant layer, and a second compliant layer formed over the silicon layer. A semiconductor die is also mounted to the temporary substrate. The stress relief buffer can be thinner than the semiconductor die. An encapsulant is deposited between the semiconductor die and stress relief buffer. The temporary substrate is removed. An interconnect structure is formed over the semiconductor die, encapsulant, and stress relief buffer. The interconnect structure is electrically connected to the semiconductor die. A stiffener layer can be formed over the stress relief buffer and encapsulant. A circuit layer containing active devices, passive devices, conductive layers, and dielectric layers can be formed within the stress relief buffer. | 05-26-2011 |
20110121450 | SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREFOR - A semiconductor device includes a support plate having a hole formed therein and a conductor formed on a wall surface of the hole, a semiconductor element; and a conductive post formed by a conductor having a first end portion at one end, and a second end portion at an other end. The second end portion of the conductive post is connected to the semiconductor element, and a side surface of the conductive post is fixed to the conductor on the wall surface of the hole deformed by pressing force of the conductive post on a side closer to the first end portion than the second end portion. | 05-26-2011 |
20110121451 | ELECTRONIC DEVICE AND ELECTRONIC APPARATUS - An electronic device includes a semiconductor device and a wiring substrate having a wiring pattern. The semiconductor device includes: a semiconductor chip having an electrode; a convex-shaped resin protrusion provided on a surface of the semiconductor chip, the surface having the electrode; and wiring having a plurality of electrical coupling sections which are aligned on the resin protrusion and electrically coupled to the electrode. The semiconductor device is mounted to the wiring substrate so that the electrical coupling sections and the wiring pattern are brought into contact and electrically coupled with each other. The plurality of electrical coupling sections brought into contact with the wiring pattern include curved or bent shapes projecting in a longitudinal direction of the resin protrusion. | 05-26-2011 |
20110121452 | Semiconductor Device Having Vertically Offset Bond on Trace Interconnects on Recessed and Raised Bond Fingers - A semiconductor device includes a substrate, a first recessed conductive layer embedded and recessed into a first surface of the substrate, and a first raised conductive layer disposed above the first surface. A first vertical offset exists between an upper surface of the first recessed conductive layer and an upper surface of the first raised conductive layer. The device includes a second recessed conductive layer embedded and recessed into a second surface of the substrate. The second surface of the substrate is opposite the first surface. The device includes a second raised conductive layer disposed beneath the second surface and an interconnect structure disposed on the first recessed and raised conductive layers and the second recessed and raised conductive layers. A second vertical offset exists between a lower surface of the second recessed conductive layer and a lower surface of the second recessed conductive layer. | 05-26-2011 |
20110121453 | SEMICONDUCTOR SYSTEM-IN-PACKAGE AND METHOD FOR MAKING THE SAME - Semiconductor devices that contain a system in package and methods for making such packages are described. The semiconductor device with a system in package (SIP) contains a first IC die, passive components, and discrete devices that are contained in a lower level of the package. The SIP also contains a second IC die that is vertically separated from the first IC die by an array of metal interposers, thereby isolating the components of the first IC die from the components of the second IC die. Such a configuration provides more functionality within a single semiconductor package while also reducing or eliminating local heating in the package. Other embodiments are also described. | 05-26-2011 |
20110127668 | Semiconductor Device and Method of Forming Bump Structure with Multi-Layer UBM Around Bump Formation Area - A semiconductor wafer has a first conductive layer formed over its active surface. A first insulating layer is formed over the substrate and first conductive layer. A second conductive layer is formed over the first conductive layer and first insulating layer. A UBM layer is formed around a bump formation area over the second conductive layer. The UBM layer can be two stacked metal layers or three stacked metal layers. The second conductive layer is exposed in the bump formation area. A second insulating layer is formed over the UBM layer and second conductive layer. A portion of the second insulating layer is removed over the bump formation area and a portion of the UBM layer. A bump is formed over the second conductive layer in the bump formation area. The bump contacts the UBM layer to seal a contact interface between the bump and second conductive layer. | 06-02-2011 |
20110127669 | SOLDER STRUCTURE, METHOD FOR FORMING THE SOLDER STRUCTURE, AND SEMICONDUCTOR MODULE INCLUDING THE SOLDER STRUCTURE - The invention provides a solder structure which is least likely to develop Sn whiskers and a method for forming such a solder structure. The solder structure includes an Sn alloy capable of a solid-liquid coexistent state and an Au (or Au alloy) coating covering at least part of the surface of the Sn alloy. The Au covering is a film that covers and coats at least part of the surface of the Sn alloy. As a preferable mode, the Au coating forms a netlike structure on the surface of the Sn alloy. The thickness of the Au coating is, for instance, 1 to 5 μm. | 06-02-2011 |
20110133331 | INTERFACE STRUCTURE FOR COPPER-COPPER PEELING INTEGRITY - An integrated circuit device is disclosed. An exemplary integrated circuit device includes a first copper layer, a second copper layer, and an interface between the first and second copper layers. The interface includes a flat zone interface region and an intergrowth interface region, wherein the flat zone interface region is less than or equal to 50% of the interface. | 06-09-2011 |
20110133332 | Package substrate and method of fabricating the same - There is provided a package substrate allowing for enhanced reliability by improving the structure of a solder bump and a method of fabricating the same. The package substrate includes: a substrate having at least one conductive pad; an insulating layer provided on the substrate and having an opening to expose the conductive pad; a post terminal provided on the conductive pad inside the opening; and a solder bump provided on the post terminal and having an angle between a bottom surface and a side surface thereof ranging from 80° to 120°. | 06-09-2011 |
20110133333 | MICROELECTRONIC DEVICES INCLUDING CONDUCTIVE VIAS, CONDUCTIVE CAPS AND VARIABLE THICKNESS INSULATING LAYERS, AND METHODS OF FABRICATING SAME - Microelectronic devices include a conductive via that extends into a substrate face and that also protrudes beyond the substrate face to define a conductive via end surface and a conductive via sidewall that extends from the end surface towards the substrate face. A conductive cap is provided on the end surface, the conductive cap including a conductive cap body that extends across the end surface and a flange that extends from the conductive cap body along the conductive via sidewall towards the substrate face. Related fabrication methods are also described. | 06-09-2011 |
20110133334 | Semiconductor Device and Method of Confining Conductive Bump Material with Solder Mask Patch - A semiconductor device has a semiconductor die having a plurality of die bump pad and substrate having a plurality of conductive trace with an interconnect site. A solder mask patch is formed interstitially between the die bump pads or interconnect sites. A conductive bump material is deposited on the interconnect sites or die bump pads. The semiconductor die is mounted to the substrate so that the conductive bump material is disposed between the die bump pads and interconnect sites. The conductive bump material is reflowed without a solder mask around the die bump pad or interconnect site to form an interconnect structure between the semiconductor die and substrate. The solder mask patch confines the conductive bump material within the die bump pad or interconnect site. The interconnect structure can include a fusible portion and non-fusible portion. An encapsulant is deposited between the semiconductor die and substrate. | 06-09-2011 |
20110133335 | Through-Silicon Via With Air Gap - A semiconductor substrate having a through-silicon via with an air gap interposed between the through-silicon via and the semiconductor substrate is provided. An opening is formed partially through the semiconductor substrate. The opening is first lined with a liner and then the opening is filled with a conductive material. A backside of the semiconductor substrate is thinned to expose the liner, which is subsequently removed to form an air gap around the conductive material of the through-silicon via. A dielectric layer is formed of the backside of the semiconductor substrate to seal the air gap. | 06-09-2011 |
20110133336 | Semiconductor Wafer and Method of Manufacturing the Same and Method of Manufacturing Semiconductor Device - A semiconductor wafer comprising: a tubular trench formed at a position to form a through-hole electrode of a wafer; an insulating member buried inside the trench and on an upper surface of the trench; a gate electrode film and a metal film formed on an upper surface of the insulating member; a multilevel columnar wiring via formed on an upper surface of the metal film; and an external connection electrode formed electrically connected to the metal film via the multilevel columnar wiring via. In this manner, it is unnecessary to have a new process of dry etching to form a through-hole electrode after thinning the wafer and equipment development. Moreover, introduction of a specific design enables formation of through-hole electrodes with significantly reduced difficulties of respective processes. | 06-09-2011 |
20110140267 | ELECTRONIC DEVICE PACKAGE AND METHOD FOR FABRICATING THE SAME - The invention provides an electronic device package and a method for fabricating the same. The electronic device package includes a carrier wafer. An electronic device chip with a plurality of conductive pads thereon is disposed over the carrier wafer. An isolation laminating layer includes a lower first isolation layer, which covers the carrier wafer and the electronic device chip, and an upper second isolation layer. The isolation laminating layer has a plurality of openings to expose the conductive pads. A plurality of redistribution patterns is conformably formed on the isolation laminating layer and in the openings. The redistribution patterns are electrically connected to the conductive pads, respectively. A plurality of conductive bumps is respectively formed on the redistribution patterns, electrically connected to the conductive pads. | 06-16-2011 |
20110140268 | HIGH-DENSITY INTER-PACKAGE CONNECTIONS FOR ULTRA-THIN PACKAGE-ON-PACKAGE STRUCTURES, AND PROCESSES OF FORMING SAME - An apparatus includes a coreless mounting substrate and an interposer disposed on the coreless mounting substrate with a chip disposed in a recess in the interposer and upon the coreless substrate. The apparatus may include an inter-package solder bump in contact with an interconnect channel in the interposer, and a top chip package including a top package substrate and a top die disposed on the top package substrate. The top package substrate is in contact with the inter-package solder bump. | 06-16-2011 |
20110140269 | Semiconductor device and method for manufacturing the same - A semiconductor device includes an electrode pad and a protective insulating film having an opening to expose the electrode pad. The semiconductor device further includes a bump (resin core bump) that includes a bump core (resin core) formed on the protective insulating film and a conductive layer formed on the bump core. The semiconductor device further includes an interconnect that connects the conductive layer and the electrode pad. The bump core is in the form of a laminate of plural resin layers (for example, first and second resin layers) that have different elastic modulus. | 06-16-2011 |
20110140270 | SEMICONDUCTOR MOUNTING SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor mounting substrate according to the present invention comprises: a substrate; a semiconductor device, mounted on this substrate; solder bumps, which connect the semiconductor device and the substrate; a first resin, filled in a space between the semiconductor device and the substrate; and electronic components, mounted on a face side of the semiconductor device where the semiconductor device is mounted, wherein bond strength reinforcing resin section is provided at least between a side face in the vicinity of a corner part of the semiconductor device and a substrate surface of the substrate in a position corresponding to the corner part. | 06-16-2011 |
20110147922 | STRUCTURES AND METHODS TO REDUCE MAXIMUM CURRENT DENSITY IN A SOLDER BALL - Structures and methods to reduce maximum current density in a solder ball are disclosed. A method includes forming a contact pad in a last wiring level and forming a plurality of wires of the contact pad extending from side edges of the contact pad to respective ones of a plurality of vias. Each one of the plurality of wires has substantially the same electrical resistance. | 06-23-2011 |
20110147923 | Surface Mounting Integrated Circuit Components - An electronic apparatus may include a first component solder bonded to a second component. The first component may be, for example, an integrated circuit. The first component may have an array of metallic protrusions. Those protrusions may be coupled to circuit elements within said first component. The second component may include a plurality of solder portions coupled to the second component and engaged by the protrusions on the first component in a soldered connection. | 06-23-2011 |
20110147924 | WIRING SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A wiring substrate includes an insulating layer, a wiring layer buried in the insulating layer, and a connection pad connected to the wiring layer via a via conductor provided in the insulating layer and in which at least a part is buried in an outer surface side of the insulating layer, wherein the connection pad includes a first metal layer (a first copper layer) arranged on the outer surface side, an intermediate metal layer (a nickel layer) arranged on a surface of an inner layer side of the first metal layer, and a second metal layer (a second copper layer) arranged on a surface of an inner layer side of the intermediate metal layer, and a hardness of the intermediate metal layer is higher than a hardness of the first metal layer and the second metal layer. | 06-23-2011 |
20110147925 | PRE-SOLDERED LEADLESS PACKAGE - The invention relates to a method of manufacturing a semiconductor device, the method comprising: i) providing a substrate carrier comprising a substrate layer and a patterned conductive layer, wherein the patterned conductive layer defines contact pads; ii) partially etching the substrate carrier using the patterned conductive layer as a mask defining contact regions in the substrate layer; iii) providing the semiconductor chip; iv) mounting said semiconductor chip with the adhesive layer on the patterned conductive layer such that the semiconductor chip covers at least one of the trenches and part of the contact pads neighboring the respective trench are left uncovered for future wire bonding; v) providing wire bonds between respective terminals of the semiconductor chip and respective contact pads of the substrate carrier; vi) providing a molding compound covering the substrate carrier and the semiconductor chip, and vii) etching the backside (S | 06-23-2011 |
20110147926 | Semiconductor Device and Method of Forming the Device Using Sacrificial Carrier - A semiconductor device includes a first semiconductor die or component having a plurality of bumps, and a plurality of first and second contact pads. In one embodiment, the first and second contact pads include wettable contact pads. The bumps are mounted directly to a first surface of the first contact pads to align the first semiconductor die or component. An encapsulant is deposited over the first semiconductor die or component. An interconnect structure is formed over the encapsulant and is connected to a second surface of the first and second contact pads opposite the first surface of the first contact pads. A plurality of vias is formed through the encapsulant and extends to a first surface of the second contact pads. A conductive material is deposited in the vias to form a plurality of conductive vias that are aligned by the second contact pads to reduce interconnect pitch. | 06-23-2011 |
20110147927 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME - A semiconductor device includes a semiconductor chip having an element formation surface on which at least one element is formed and including a plurality of electrode pads formed on the element formation surface, an interconnect substrate having a principal surface facing the element formation surface of the semiconductor chip and including a plurality of connection pads formed at positions of the principal surface facing the respective corresponding electrode pads, and a plurality of solder bumps provided between the respective corresponding electrode pads and connection pads, and configured to electrically connect the respective corresponding electrode pads and connection pads together. An UBM layer is formed on a portion of each solder bump closer to the corresponding electrode pad and a barrier metal layer is formed on a portion of each solder bump closer to the corresponding connection pad, and the two layers have substantially the same composition of major materials. | 06-23-2011 |
20110156248 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device includes: an integrated circuit having an electrode pad; a first insulating layer disposed on the integrated circuit; a redistribution layer including a plurality of wirings and disposed on the first insulating layer, at least one of the plurality of wirings being electrically coupled to the electrode pad; a second insulating layer having a opening on at least a portion of the plurality of wirings; a metal film disposed on the opening and on the second insulating layer, and electrically coupled to at least one of the plurality of wirings; and a solder bump the solder bump overhanging at least one of the plurality of wirings not electrically coupled to the metal film. | 06-30-2011 |
20110156249 | WAFER-TO-WAFER STACK WITH SUPPORTING PEDESTAL - An electronic device having a stacked structure is provided. The electronic device includes a first electronic layer, a second electronic layer disposed on the first electronic layer, and at least a post. The first electronic layer has a first interface, and including a first substrate and a first device layer disposed on the first substrate. The first interface is located between the first substrate and the first device layer, and the first device layer has a surface opposite to the first interface. The post is arranged in the first device layer, and extending from the first interface to the surface of the first device layer. | 06-30-2011 |
20110163440 | SEMICONDUCTOR DEVICE - A method of manufacturing a semiconductor device includes providing a carrier and attaching a plurality of semiconductor chips to the carrier. The semiconductor chips have a first electrode pad on a first main face and at least a second electrode pad on a second main face opposite to the first main face, whereby the first electrode pad is electrically connected to the carrier. A plurality of first bumps are formed on the carrier, the first bumps being made of a conductive material. The carrier is then singulated into a plurality of semiconductor devices, wherein each semiconductor device includes at least one semiconductor chip and one first bump. | 07-07-2011 |
20110163441 | PB-FREE SOLDER BUMPS WITH IMPROVED MECHANICAL PROPERTIES - A method of forming a semiconductor device is disclosed. A semiconductor substrate is provided that has a first contact and an undoped electroplated lead-free solder bump ( | 07-07-2011 |
20110163442 | METHOD OF MANUFACTURING A PLURALITY OF ICS AND TRANSPONDERS - A method of manufacturing a plurality of ICs for different transponder types adapted for different operating range is provided, wherein the method comprises manufacturing a first IC having a first capacitance corresponding to a first operating range of the first transponder and manufacturing a second IC having a second capacitance corresponding to a second operating range of the second transponder, wherein a common layout is used for manufacturing the first IC and the second IC. | 07-07-2011 |
20110169160 | REAL TIME MONITORING OF INDIUM BUMP REFLOW AND OXIDE REMOVAL ENABLING OPTIMIZATION OF INDIUM BUMP MORPHOLOGY - A method, apparatus, system, and device provide the ability to form one or more solder bumps on one or more materials. The solder bumps are reflowed. During the reflowing, the solder bumps are monitored in real time. The reflow is controlled in real time, thereby controlling a morphology of each of the solder bumps. Further, the wetting of the solder bumps to a surface of the materials is controlled in real time. | 07-14-2011 |
20110169161 | SEMICONDUCTOR DEVICE - A semiconductor device, including: a semiconductor layer having an active region; a first conductive layer formed above the semiconductor layer and having a first width; a second conductive layer connected to the first conductive layer and having a second width smaller than the first width; an interlayer dielectric formed above the semiconductor layer; an electrode pad formed above the interlayer dielectric and covering the active region when viewed from a top side; and a forbidden region provided in the semiconductor layer in a specific range positioned outward from a line extending vertically downward from an edge of at least part of the electrode pad. A connection section at which the first conductive layer and the second conductive layer are connected is not provided in the forbidden region. | 07-14-2011 |
20110175220 | SEMICONDUCTOR DEVICE HAVING CONDUCTIVE PADS AND A METHOD OF MANUFACTURING THE SAME - A semiconductor device includes at least two conductive pads, one of the conductive pads being formed above another of the at least two conductive pads, and a redistribution layer extending from at least one of the conductive pads. The semiconductor device also includes a bump structure formed over the conductive pads and electrically coupled to the conductive pads. | 07-21-2011 |
20110175221 | CHIP PACKAGE AND FABRICATION METHOD THEREOF - A chip package and a fabrication method thereof are provided according to an embodiment of the invention. The chip package contains a semiconductor substrate having a chip. A packaging layer is disposed over the semiconductor substrate. A spacer is disposed between the semiconductor substrate and the packaging layer, wherein a side surface consisting of the semiconductor substrate, the spacer and the packaging layer has a recess section. The method includes forming a plurality of spacers between a plurality of chips of a semiconductor wafer and a packaging layer, wherein each spacer corresponding to each chip is separated from each other and the spacer is shrunk inward from an edge of the chip to form a recess section and dicing the semiconductor wafer along a scribe line between any two adjacent chips to form a plurality of chip packages. | 07-21-2011 |
20110180927 | ELECTRONIC COMPONENT AND SEMICONDUCTOR DEVICE, METHOD OF FABRICATING THE SAME, CIRCUIT BOARD MOUNTED WITH THE SAME, AND ELECTRONIC APPLIANCE COMPRISING THE CIRCUIT BOARD - An integrated type semiconductor device that is capable of reducing cost or improving the reliability of connecting semiconductor chips together or chips to a circuit board. One embodiment of such an integrated type semiconductor device comprises a first semiconductor device having a semiconductor chip with electrodes, a stress-relieving layer prepared on the semiconductor chip, a wire formed across the electrodes and the stress-relieving layer, and solder balls formed on the wire over the stress-relieving layer; and a bare chip as a second semiconductor device to be electrically connected to the first semiconductor device. | 07-28-2011 |
20110186985 | Semiconductor substrate, laminated chip package, semiconductor plate and method of manufacturing the same - A semiconductor substrate has a plurality of groove portions formed along scribe lines. The semiconductor substrate includes: a unit region in contact with at least any one of the plurality of groove portions; and a wiring electrode with a portion thereof arranged within the unit region. Further, the plurality of groove portions have a wide-port structure in which a wide width portion wider in width than a groove lower portion including a bottom portion is formed at an inlet port thereof. | 08-04-2011 |
20110186986 | T-Shaped Post for Semiconductor Devices - A T-shaped post for semiconductor devices is provided. The T-shaped post has an under-bump metallization (UBM) section and a pillar section extending from the UBM section. The UBM section and the pillar section may be formed of a same material or different materials. In an embodiment, a substrate, such as a die, wafer, printed circuit board, packaging substrate, or the like, having T-shaped posts is attached to a contact of another substrate, such as a die, wafer, printed circuit board, packaging substrate, or the like. The T-shaped posts may have a solder material pre-formed on the pillar section such that the pillar section is exposed or such that the pillar section is covered by the solder material. In another embodiment, the T-shaped posts may be formed on one substrate and the solder material formed on the other substrate. | 08-04-2011 |
20110186987 | STRESS BUFFER STRUCTURES IN A MOUNTING STRUCTURE OF A SEMICONDUCTOR DEVICE AND METHODS OF MANUFACTURING THE SAME - A mounting structure for a semiconductor device includes a stepwise stress buffer layer under a likewise stepwise UBM structure. | 08-04-2011 |
20110186988 | Multi-Direction Design for Bump Pad Structures - An integrated circuit structure includes a semiconductor chip having a first region and a second region; a dielectric layer formed on the first region and the second region of the semiconductor chip; a first elongated under-bump metallization (UBM) connector formed in the dielectric layer and on the first region of the semiconductor chip and having a first longer axis extending in a first direction; and a second elongated UBM connector formed in the dielectric layer on the second region of the semiconductor chip and having a second longer axis extending in a second direction. The first direction is different from the second direction. | 08-04-2011 |
20110186989 | Semiconductor Device and Bump Formation Process - A semiconductor device includes a solder bump overlying and electrically connected to a pad region, and a metal cap layer formed on at least a portion of the solder bump. The metal cap layer has a melting temperature greater than the melting temperature of the solder bump. | 08-04-2011 |
20110186990 | PROTRUDING TSV TIPS FOR ENHANCED HEAT DISSIPATION FOR IC DEVICES - An integrated circuit (IC) device includes a substrate having a top surface including substrate pads, and a through substrate via (TSV) die including a semiconductor substrate including a topside semiconductor surface having active circuitry and a bottomside surface. The topside semiconductor surface includes bonding connectors that are coupled to the substrate pads on the top surface of the substrate. A plurality of TSVs include an inner metal core that extends from the topside semiconductor surface to protruding TSV tips which extend out from the bottomside surface. At least one of the plurality of TSVs are dummy TSVs that have their protruding TSV tips exclusive of any electrically connection thereto that provide additional surface area that enhances heat dissipation from the bottomside of the TSV die. | 08-04-2011 |
20110186991 | Package substrate and method of fabricating the same - There is provided a package substrate capable of controlling the degree of warpage thereof by improving the composition and formation of a post terminal and a method of fabricating the same. The package substrate includes a substrate having at least one conductive pad; an insulating layer provided on the substrate and having an opening to expose the conductive pad; a separation barrier layer provided on the conductive pad inside the opening and formed to be higher than the upper surface of the insulating layer along the side walls thereof; a post terminal provided on the separation barrier layer; and a solder bump provided on the post terminal. | 08-04-2011 |
20110186992 | RECESSED SEMICONDUCTOR SUBSTRATES AND ASSOCIATED TECHNIQUES - Embodiments of the present disclosure provide a method, comprising providing a semiconductor substrate having (i) a first surface and (ii) a second surface that is disposed opposite to the first surface, forming one or more vias in the first surface of the semiconductor substrate, the one or more vias initially passing through only a portion of the semiconductor substrate without reaching the second surface, forming a dielectric film on the first surface of the semiconductor substrate, forming a redistribution layer on the dielectric film, the redistribution layer being electrically coupled to the one or more vias, coupling one or more dies to the redistribution layer, forming a molding compound to encapsulate at least a portion of the one or more dies, and recessing the second surface of the semiconductor substrate to expose the one or more vias. Other embodiments may be described and/or claimed. | 08-04-2011 |
20110186993 | SEMICONDUCTOR MODULE AND PORTABLE APPARATUS PROVIDED WITH SEMICONDUCTOR MODULE - A semiconductor element mounted on an insulating resin layer formed on a wiring layer is sealed by a sealing resin. On the wiring layer, a protruding electrode protruding to the side of the semiconductor element and a protruding section are integrally formed with the wiring layer, respectively. The protruding electrode is electrically connected to an element electrode of the semiconductor element by penetrating the insulating resin layer. The protruding section is arranged to surround the semiconductor element along the four sides of the semiconductor element, and is embedded in the sealing resin up to a position above a section where the protruding electrode and the element electrode are bonded. | 08-04-2011 |
20110186994 | INTEGRATED CIRCUIT PACKAGING SYSTEM HAVING DUAL SIDED CONNECTION AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit packaging system includes: mounting an integrated circuit, having a device through via and a device interconnect, over a substrate with the device through via traversing the integrated circuit and the device interconnect attached to the device through via; attaching a conductive support over the substrate with the conductive support adjacent to the integrated circuit; providing a pre-formed interposer, having an interposer through via and a pre-attached interconnect, with the pre-attached interconnect attached to the interposer through via; mounting the pre-formed interposer over the integrated circuit and the conductive support with the pre-attached interconnect over the device through via; and forming an encapsulation over the substrate covering the integrated circuit, the conductive support, and partially covering the pre-formed interposer. | 08-04-2011 |
20110186995 | SOLDER BUMP INTERCONNECT - A semiconductor package includes a device pad on a substrate. A polybenzoxazole (PBO) layer overlies the substrate, and the PBO layer has an opening to expose the device pad. A redistribution layer (RDL) comprises a landing pad, and the RDL is positioned on the PBO layer and conductively coupled to the device pad. A polymer layer is on the RDL, and an under bump metal pad (UBM) is on the landing pad and extends onto a top surface of the polymer layer. The UBM electrically connects to the landing pad through an opening in the polymer layer. A solder bump is secured to the UBM. A shortest distance from a center of the landing pad to an outer edge of the landing pad, and a shortest distance from a center of the UBM to an outer edge of the UBM are in a ratio that ranges from 0.5:1 up to 0.95:1. | 08-04-2011 |
20110186996 | MULTI-CHIP SEMICONDUCTOR DEVICE - An interposer has an opening in the central portion. A plurality of first electrode terminals are formed on the front surface near the opening of the interposer, a plurality of second electrode terminals are formed on the front surface of the peripheral portion thereof and corresponding ones of the plurality of first and second electrode terminals are electrically connected to one another via a plurality of wirings. A plurality of bump electrodes is formed on the front surface of a child chip. A plurality of bump electrodes containing a plurality of bump electrodes for connection with the exterior are formed on the front surface of a parent chip. The front surfaces of the parent chip and child chip are set to face each other with the interposer disposed therebetween and the bump electrodes are electrically connected to one another in the opening of the interposer. | 08-04-2011 |
20110193218 | Solder Interconnect with Non-Wettable Sidewall Pillars and Methods of Manufacture - A solder interconnect structure is provided with non-wettable sidewalls and methods of manufacturing the same. The method includes forming a nickel or nickel alloy pillar on an underlying surface. The method further includes modifying the sidewall of the nickel or nickel alloy pillar to prevent solder wetting on the sidewall. | 08-11-2011 |
20110193219 | SEMICONDUCTOR DEVICE AND SEMICONDUCTOR ASSEMBLY WITH LEAD-FREE SOLDER - A semiconductor device includes a bump structure over a pad region. The bump structure includes a copper layer and a lead-free solder layer over the copper layer. The lead-free solder layer is a SnAg layer, and the Ag content in the SnAg layer is less than 1.6 weight percent. | 08-11-2011 |
20110193220 | Pillar Structure having a Non-Planar Surface for Semiconductor Devices - A conductive pillar for a semiconductor device is provided. The conductive pillar is formed such that a top surface is non-planar. In embodiments, the top surface may be concave, convex, or wave shaped. An optional capping layer may be formed over the conductive pillar to allow for a stronger inter-metallic compound (IMC) layer. The IMC layer is a layer formed between solder material and an underlying layer, such as the conductive pillar or the optional capping layer. | 08-11-2011 |
20110193221 | 3DIC Architecture with Interposer for Bonding Dies - A device includes an interposer, which includes a substrate having a top surface. An interconnect structure is formed over the top surface of the substrate, wherein the interconnect structure includes at least one dielectric layer, and metal features in the at least one dielectric layer. A plurality of through-substrate vias (TSVs) is in the substrate and electrically coupled to the interconnect structure. A first die is over and bonded onto the interposer. A second die is bonded onto the interposer, wherein the second die is under the interconnect structure. | 08-11-2011 |
20110193222 | SEMICONDUCTOR MODULE, METHOD FOR FABRICATING THE SEMICONDUCTOR MODULE, AND MOBILE APPARATUS - A semiconductor module manufacturing method includes a step of bonding a semiconductor wafer, which has a plurality of semiconductor elements each of which has an element electrode formed thereon, on an expansible first insulating resin layer; a step of dicing the semiconductor wafer; a step of expanding the first insulating resin layer to widen a gap between semiconductor elements; a pressure-bonding step of pressure-bonding a metal plate whereupon an electrode is arranged and the semiconductor elements with the widened gaps in between, by having a second insulating resin layer in between, and electrically connecting the electrode and the element electrodes; a step of forming a wiring layer which corresponds to each semiconductor element by selectively removing the metal plate and forming a plurality of semiconductor modules connected by the first insulating resin layer and the second insulating resin layer; and a step of separating the semiconductor modules by cutting the first insulating resin layer and the second insulating resin layer. | 08-11-2011 |
20110193223 | SEMICONDUCTOR DEVICE, CHIP-ON-CHIP MOUNTING STRUCTURE, METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE, AND METHOD OF FORMING THE CHIP-ON-CHIP MOUNTING STRUCTURE - A semiconductor device includes: a semiconductor chip having a semiconductor substrate; a pad electrode formed on the semiconductor substrate; a base metal layer formed on said pad electrode; and a bump electrode formed on the base metal layer, in which an exposed surface including a side surface of the base metal layer is covered with the solder bump electrode. | 08-11-2011 |
20110193224 | SEMICONDUCTOR DEVICE - In a semiconductor device, a pad electrode is disposed on a surface of a semiconductor substrate, and a surface-protective film is disposed on the surface of the semiconductor substrate and the pad electrode. The surface-protective film has an opening to expose a part of the pad electrode. A bump electrode is disposed on the part of the pad electrode exposed from the opening, and a bump is disposed on the bump electrode. The surface-protective film further has a slit at a location above the pad electrode. The slit has a frame shape surrounding a periphery of the bump electrode. The slit extends from a surface of the surface-protective film, which is opposite to the semiconductor substrate, and reaches the pad electrode. | 08-11-2011 |
20110193225 | ELECTRONIC DEVICE PACKAGE AND FABRICATION METHOD THEREOF - A chip package is disclosed. The package includes a carrier substrate, at least two semiconductor chips, a fill material layer, a protective layer, and a plurality of conductive bumps. The carrier substrate includes a grounding region. The semiconductor chips are disposed overlying the grounding region of the carrier substrate. Each semiconductor chip includes at least one signal pad and includes at least one grounding pad electrically connected to the grounding region. The fill material layer is formed overlying the carrier substrate and covers the semiconductor chips. The protective layer covers the fill material layer. The plurality of conductive bumps is disposed overlying the protective layer and is electrically connected to the semiconductor chips. A fabrication method of the chip package is also disclosed. | 08-11-2011 |
20110198747 | CONDUCTIVE PILLAR STRUCTURE FOR SEMICONDUCTOR SUBSTRATE AND METHOD OF MANUFACTURE - A semiconductor component formed on a semiconductor substrate is provided. The semiconductor substrate has a first surface and a second surface. The semiconductor substrate includes a plurality of devices on the first surface. A plurality of through silicon vias (TSVs) in the semiconductor substrate extends from the first surface to the second surface. A protection layer overlies the devices on the first surface of the semiconductor substrate. A plurality of active conductive pillars on the protection layer have a first height. Each of the active conductive pillars is electrically connected to at least one of the plurality of devices. A plurality of dummy conductive pillars on the protection layer have a second height. Each of the dummy conductive pillars is electrically isolated from the plurality of devices. The first height and the second height are substantially equal. | 08-18-2011 |
20110198748 | Semiconductor device and method of fabricating same - A method of fabricating a semiconductor device includes: forming a semiconductor chip portion having an electrode on a main surface of a wafer; forming a first resist pattern having a first opening on the electrode; filling the first opening with a first electrically conductive material, thereby forming an electrically conductive post; removing the first resist pattern after said forming of the electrically conductive post; forming an interlayer dielectric film having a second opening positioned on the electrically conductive post; and forming an electrically conductive redistribution layer extending from an upper surface of the electrically conductive post over an upper surface of the interlayer dielectric film. | 08-18-2011 |
20110198749 | Semiconductor chip package and method of manufacturing the same - Provided are a semiconductor chip package and a method of manufacturing the same. The semiconductor chip package includes a semiconductor chip comprising a chip pad, and a rerouting layer disposed on the semiconductor chip and including a metal interconnection electrically connected to the chip pad and a partial oxidation region formed by the oxidation of metal and insulating the metal interconnection. | 08-18-2011 |
20110198750 | SEMICONDUCTOR CHIP AND METHOD FOR MANUFACTURING SAME, ELECTRODE STRUCTURE OF SEMICONDUCTOR CHIP AND METHOD FOR FORMING SAME, AND SEMICONDUCTOR DEVICE - A semiconductor chip according to the present invention includes a semiconductor substrate, a bump of a metal projecting from a surface of the semiconductor substrate, and an alloy film covering the entire surface of the bump, the alloy film being composed of an alloy of the metal of the bump and a second metal. | 08-18-2011 |
20110204510 | CHIP STRUCTURE AND METHOD FOR FABRICATING THE SAME - A method for fabricating a metallization structure comprises depositing a first metal layer; depositing a first pattern-defining layer over said first metal layer, a first opening in said first pattern-defining layer exposes said first metal layer; depositing a second metal layer over said first metal layer exposed by said first opening; depositing a second pattern-defining layer over said second metal layer, a second opening in said second pattern-defining layer exposes said second metal layer; depositing a third metal layer over said second metal layer exposed by said second opening; removing said second pattern-defining layer; removing said first pattern-defining layer; and removing said first metal layer not under said second metal layer. | 08-25-2011 |
20110204511 | System and Method for Improving Reliability of Integrated Circuit Packages - An integrated circuit package includes a die, a bump, an underbump metallization layer formed between the bump and the die, a portion of the underbump metallization layer under the bump having a first radius, and a redistribution layer formed between the underbump metallization layer and the die. The redistribution layer has a pad positioned under the underbump metallization layer. The pad has a second radius, and makes contact with the underbump metallization layer. The second radius is less than or equal to the first radius. The integrated circuit package also includes a first dielectric layer disposed between the die and the redistributing layer. | 08-25-2011 |
20110204512 | Wirebondless Wafer Level Package with Plated Bumps and Interconnects - A semiconductor package includes a carrier strip having a die cavity and bump cavities. A semiconductor die is mounted in the die cavity of the carrier strip. In one embodiment, the semiconductor die is mounted using a die attach adhesive. In one embodiment, a top surface of the first semiconductor die is approximately coplanar with a top surface of the carrier strip proximate to the die cavity. A metal layer is disposed over the carrier strip to form a package bump and a plated interconnect between the package bump and a contact pad of the first semiconductor die. An underfill material is disposed in the die cavity between the first semiconductor die and a surface of the die cavity. A passivation layer is disposed over the first semiconductor die and exposes a contact pad of the first semiconductor die. An encapsulant is disposed over the carrier strip. | 08-25-2011 |
20110210441 | CHIP PACKAGE - A chip package includes a semiconductor chip, a flexible circuit film and a substrate. The substrate has a circuit structure in the substrate. The flexible circuit film is connected to the circuit structure of the substrate through metal joints, an anisotropic conductive film or wireboning wires. The semiconductor chip has fine-pitched metal bumps having a thickness of between 5 and 50 micrometers, and preferably of between 10 and 25 micrometers, and the semiconductor chip is joined with the flexible circuit film by the fine-pitched metal bumps using a chip-on-film (COF) technology or tape-automated-bonding (TAB) technology. A pitch of the neighboring metal bumps is less than 35 micrometers, such as between 10 and 30 micrometers. | 09-01-2011 |
20110210442 | Semiconductor Package and Trace Substrate with Enhanced Routing Design Flexibility and Method of Manufacturing Thereof - A semiconductor package, a method for manufacturing the semiconductor package, a trace substrate and a method for manufacturing the trace substrate are provided. The semiconductor package includes a trace substrate, a chip and a plurality of wires. The trace substrate includes a plurality of trace, a plurality of conductive studs, a plurality of traces pads and a trace modling compound. The conductive studs are formed on the lower surfaces of the traces. The trace modling compound encapsulates the conductive studs and the trace, and exposes the lower surfaces of the conductive studs and the upper surfaces of the traces. The chip is disposed on the trace substrate, and the wires electrically connect the chip and the trace pads. The trace pads are not overlapping to the conductive studs. | 09-01-2011 |
20110215464 | Semiconductor package with embedded die and its methods of fabrication - Embodiments of the present invention describe a semiconductor package having an embedded die. The semiconductor package comprises a coreless substrate that contains the embedded die. The semiconductor package provides die stacking or package stacking capabilities. Furthermore, embodiments of the present invention describe a method of fabricating the semiconductor package that minimizes assembly costs. | 09-08-2011 |
20110215465 | MULTI-CHIP INTEGRATED CIRCUIT - An integrated circuit (IC) combines a first IC chip (die) having a first on-chip interconnect structure and a second IC chip having a second on-chip interconnect structure on a reconstructed wafer base. The second IC chip is edge-bonded to the first IC chip with oxide-to-oxide edge bonding. A chip-to-chip interconnect structure electrically couples the first IC chip and the second IC chip. | 09-08-2011 |
20110215466 | FLIP CHIP PACKAGE MAINTAINING ALIGNMENT DURING SOLDERING - Disclosed is a flip chip package maintaining alignment during soldering, primarily comprising a chip and a substrate. A plurality of bumps and at least an extruded alignment key are disposed on the active surface of the chip. The substrate has a plurality of bonding pads and at least an alignment base where the alignment base has a concaved alignment pattern corresponding to the extruded alignment key. When the chip is disposed on the substrate, the extruded alignment key is embedded into the concaved alignment pattern to achieve accurately align the bumps to the corresponding bonding pads. Therefore, even with the mechanical misalignment due to the accuracy of flip-chip die bonders and the transportation during reflow processes, the bumps of a chip still can accurately align to the bonding pads of the substrate to achieve accurate soldering which is especially beneficial to the mass production of MPS-C2 products. | 09-08-2011 |
20110215467 | METAL POST CHIP CONNECTING DEVICE AND METHOD FREE TO USE SOLDERING MATERIAL - A metal post chip connecting device without soldering materials is revealed, primarily comprising a chip and a substrate. A plurality of metal pillars are disposed on and extruded from a surface of the chip where each metal pillar has an end surface and two corresponding parallel sidewalls. The substrate has an upper surface and a plurality of bonding pads disposed on the upper surface where each bonding pad has a concaved bottom surface and two corresponding concaved sidewalls. The chip is bonded onto the upper surface of the substrate through heat, pressure, and ultrasonic power so that the end surfaces of the metal pillars self-solder to the concaved bottom surfaces and two parallel sidewalls of the metal pillars partially self-solder to two concaved sidewalls to form U-shape cross-sections of metal bonding between the metal pillars and the bonding pads. Therefore, there is no need for the conventional solder paste as chip connection to increase conductivity of the soldering points, especially, to save the soldering cost for MPS-C2 products and to greatly enhance the bonding strength of the soldering points. The manufacturing method of the above described metal post chip connecting device is also revealed. | 09-08-2011 |
20110215468 | Bump-on-Lead Flip Chip Interconnection - A semiconductor device has a semiconductor die with a plurality of bumps formed over the die. A substrate has a plurality of conductive traces formed on the substrate. Each trace has an interconnect site for mating to the bumps. The interconnect sites have parallel edges along a length of the conductive traces under the bumps from a plan view for increasing escape routing density. The bumps have a noncollapsible portion for attaching to a contact pad on the die and fusible portion for attaching to the interconnect site. The fusible portion melts at a temperature which avoids damage to the substrate during reflow. The noncollapsible portion includes lead solder, and fusible portion includes eutectic solder. The interconnect sites have a width which is less than 1.2 times a width of the conductive trace. Alternatively, the interconnect sites have a width which is less than one-half a diameter of the bump. | 09-08-2011 |
20110215469 | METHOD FOR FORMING A DOUBLE EMBOSSING STRUCTURE - A method for fabricating a circuitry component comprises depositing a first metal layer over a substrate; forming a first pattern-defining layer over said first metal layer, a first opening in said first pattern-defining layer exposing said first metal layer; depositing a second metal layer over said first metal layer exposed by said first opening; removing said first pattern-defining layer; forming a second pattern-defining layer over said second metal layer, a second opening in said second pattern-defining layer exposing said second metal layer; depositing a third metal layer over said second metal layer exposed by said second opening; removing said second pattern-defining layer; removing said first metal layer not under said second metal layer; and forming a polymer layer over said second metal layer, wherein said third metal layer is used as a metal bump bonded to an external circuitry. | 09-08-2011 |
20110221058 | SEMICONDUCTOR DEVICE AND METHOD OF FORMING VERTICALLY OFFSET BOND ON TRACE INTERCONNECTS ON DIFFERENT HEIGHT TRACES - A semiconductor device has a vertically offset BOT interconnect structure. The vertical offset is achieved by forming different height first and second conductive layer above a substrate. A first patterned photoresist layer is formed over the substrate. A first conductive layer is formed in the first patterned photoresist layer. The first patterned photoresist layer is removed. A second patterned photoresist layer is formed over the substrate. A second conductive layer is formed in the second patterned photoresist layer. The height of the second conductive layer, for example 25 micrometers, is greater than the height of the first conductive layer which is 5 micrometers. The first and second conductive layers are interposed between each other close together to minimize pitch and increase I/O count while maintaining sufficient spacing to avoid electrical shorting after bump formation. An interconnect structure is formed over the first and second conductive layers. | 09-15-2011 |
20110227216 | Under-Bump Metallization Structure for Semiconductor Devices - An under-bump metallization (UBM) structure for a semiconductor device is provided. A passivation layer is formed over a contact pad such that at least a portion of the contact pad is exposed. A protective layer, such as a polyimide layer, may be formed over the passivation layer. The UBM structure, such as a conductive pillar, is formed over the underlying contact pad such that the underlying contact pad extends laterally past the UBM structure by a distance large enough to prevent or reduce cracking of the passivation layer and or protective layer. | 09-22-2011 |
20110227217 | SEMICONDUCTOR PACKAGE WITH STACKED CHIPS AND METHOD FOR MANUFACTURING THE SAME - A semiconductor package includes at least two semiconductor chips stacked to have step surfaces and possessing bonding pads disposed over the step surfaces. Conductive patterns are disposed over the step surfaces and electrically connect the bonding pads of the semiconductor chips with one another. An insulation member is formed over side and upper surfaces of the stacked semiconductor chips excluding the step surfaces and the conductive patterns. | 09-22-2011 |
20110227218 | SILICON SUBSTRATE FOR PACKAGE - In a silicon substrate for a package, a through electrode is provided with which a through hole passing through from a bottom surface of a cavity for accommodating a chip of an electronic device to a back surface of the substrate is filled. An end part of the through electrode in the bottom surface side of the cavity has a connection part to a wiring that forms an electric circuit including the chip of the electronic device. The silicon substrate for a package is characterized in that (1) a thin film wiring is included as the wiring and the connection part is reinforced by a conductor connected to the thin film wiring and/or (2) a wire bonding part is included as the wiring and the connection part is formed by wire bonding the end part of the through electrode in the bottom surface side of the cavity. | 09-22-2011 |
20110233761 | CU PILLAR BUMP WITH NON-METAL SIDEWALL PROTECTION STRUCTURE - Sidewall protection processes are provided for Cu pillar bump technology, in which a protection structure on the sidewalls of the Cu pillar bump is formed of at least one of non-metal material layers, for example a dielectric material layer, a polymer material layer, or combinations thereof. | 09-29-2011 |
20110233762 | WAFER LEVEL INTEGRATED INTERCONNECT DECAL AND MANUFACTURING METHOD THEREOF - A wafer level integrated interconnect decal manufacturing method and wafer level integrated interconnect decal arrangement. In accordance with the technology concerning the soldering of integrated circuits and substrates, and particularly providing for solder decal methods forming and utilization, in the present instance there are employed underfills which consist of a solid film material and which are applied between a semiconductor chip and the substrate in order to enhance the reliability of a flip chip package. In particular, the underfill material increases the resistance to fatigue of controlled collapse chip connect (C4) bumps. | 09-29-2011 |
20110233763 | INTEGRATED CIRCUIT SYSTEM WITH STRESS REDISTRIBUTION LAYER AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit system includes: providing a substrate having a transistor and a metallization layer; forming a metal pad in direct contact with the metallization layer of the substrate; forming a passivation layer in direct contact with the metal pad and covering the substrate; forming a routing trace above the passivation layer in direct contact with the metal pad, and the routing trace is substantially larger than the metal pad, and the routing trace is not electrically insulated by a subsequent layer; and forming a bump connected to the metal pad with the routing trace. | 09-29-2011 |
20110233764 | SEMICONDUCTOR DEVICE PACKAGE AND METHOD OF FABRICATING THE SAME - A semiconductor device package and a method of fabricating the same are disclosed. The semiconductor device package includes a substrate, a buffer structure, two active chips and a bridge chip. The substrate has a cavity, a first surface and a second surface opposite to the first surface. The cavity is extended from the first surface toward the second surface, and the buffer structure is disposed in the cavity. The active chips are mechanically disposed on and electrically connected to the first surface and around the cavity, wherein the active chips both have a first active surface. The bridge chip is disposed in the cavity and above the buffer structure, wherein the bridge chip has a second active surface, the second active surface faces the first active surfaces and is partially overlapped with the first active surfaces, the bridge chip is used for providing a proximity communication between the active chips. | 09-29-2011 |
20110233765 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device includes a first bump that is located over a surface of a semiconductor element, and is formed on a first bump formation face distanced from a back surface of the semiconductor element at a first distance, and a second bump that is located over the surface of the semiconductor element, and is formed on a second bump formation face distanced from the back surface of the semiconductor element at a second distance being longer than the first distance, the second bump having a diameter larger than a diameter of the first bump. | 09-29-2011 |
20110233766 | Semiconductor Device and Method of Forming a Dual UBM Structure for Lead Free Bump Connections - A semiconductor device has a substrate with a contact pad. A first insulation layer is formed over the substrate and contact pad. A first under bump metallization (UBM) is formed over the first insulating layer and is electrically connected to the contact pad. A second insulation layer is formed over the first UBM. A second UBM is formed over the second insulation layer after the second insulation layer is cured. The second UBM is electrically connected to the first UBM. The second insulation layer is between and separates portions of the first and second UBMs. A photoresist layer with an opening over the contact pad is formed over the second UBM. A conductive bump material is deposited within the opening in the photoresist layer. The photoresist layer is removed and the conductive bump material is reflowed to form a spherical bump. | 09-29-2011 |
20110233767 | SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD - The semiconductor device manufacturing method includes the steps of attaching two or more solder particles on at least one electrode among a plurality of electrodes of an electronic component, arranging the electrode of the electronic component and an electrode of a circuit board so as to oppose each other, abutting the solder particles attached on a surface of the electrode of the electronic component to the electrode of the circuit board and heating the solder particles, and connecting electrically the electrode of the electronic component and the electrode of the circuit board via two or more solder joint bodies made by melting the solder particles. | 09-29-2011 |
20110233768 | SEMICONDUCTOR DEVICE - A semiconductor device includes: an interconnection substrate on which a semiconductor chip is mounted; electrodes formed on a surface of the interconnection substrate; and solder bumps formed on the electrodes. The solder bump includes a base section and a surface layer section that covers the base section. The surface layer section includes conductive metal selected from the group consisting of Cu, Ni, Au, and Ag, and Sn at least and a ratio of the number of atoms of the conductive metal to the number of Sn atoms per a unit volume is more than 0.01. | 09-29-2011 |
20110233769 | SEMICONDUCTOR DEVICE PROVIDED WITH TIN DIFFUSION INHIBITING LAYER, AND MANUFACTURING METHOD OF THE SAME - A semiconductor device is disclosed wherein a tin diffusion inhibiting layer is provided above the land of a wiring line, and a solder ball is provided above the tin diffusion inhibiting layer. Thus, even when this semiconductor device is, for example, a power supply IC which deals with a high current, the presence of the tin diffusion inhibiting layer makes it possible to more inhibit the diffusion of tin in the solder ball into the wiring line. | 09-29-2011 |
20110233770 | CHIP PACKAGE - A chip package includes: a substrate having a first and a second surfaces; an optical device on the first surface; a conducting layer on the second surface; a passivation layer on the second surface and the conducting layer, wherein the passivation layer has an opening exposing the conducting layer; a conducting bump on the second surface and having a bottom and an upper portions, wherein the bottom portion is disposed in the opening and electrically contacts the conducting layer, and the upper portion is located outside of the opening and extends along a direction away from the opening; a recess extending from a surface of the conducting bump toward an inner portion of the conducting bump; and a light shielding layer on the second surface, extending under the upper portion, and partially located in the recess and overlapping a portion of the conducting bump. | 09-29-2011 |
20110233771 | SEMICONDUCTOR PACKAGES HAVING WARPAGE COMPENSATION - A semiconductor package can include a substrate body having a first surface and a second surface. A semiconductor chip can be mounted on the first surface and a plurality of electrode pads can be on the second surface and selectively formed to have progressively smaller or larger sizes extending from a central region of the substrate body toward an outer edge of the substrate body based on a reflow soldering process warpage profile for the semiconductor package. | 09-29-2011 |
20110233772 | SEMICONDUCTOR ELEMENT AND SEMICONDUCTOR DEVICE USING THE SAME - A semiconductor element includes: a substrate having an integrated circuit; and a wire connection electrode and a bump connection electrode which are provided on a same main surface of the substrate as electrodes having a same connection function to the integrated circuit. The wire connection electrode is provided in a periphery of the main surface. The bump connection electrode is provided inside the wire connection electrode on the main surface. When a straight line dividing the main surface into two regions is determined, the wire connection electrode and the bump connection electrode are located opposite to each other with respect to the straight line. | 09-29-2011 |
20110233773 | MANUFACTURING PROCESS AND STRUCTURE OF THROUGH SILICON VIA - A through silicon via reaching a pad from a second surface of a semiconductor substrate is formed. A penetration space in the through silicon via is formed of a first hole and a second hole with a diameter smaller than that of the first hole. The first hole is formed from the second surface of the semiconductor substrate to the middle of the interlayer insulating film. Further, the second hole reaching the pad from the bottom of the first hole is formed. Then, the interlayer insulating film formed on the first surface of the semiconductor substrate has a step shape reflecting a step difference between the bottom surface of the first hole and the first surface of the semiconductor substrate. More specifically, the thickness of the interlayer insulating film between the bottom surface of the first hole and the pad is smaller than that in other portions. | 09-29-2011 |
20110233774 | ELECTRONIC DEVICES FORMED OF TWO OR MORE SUBSTRATES CONNECTED TOGETHER, ELECTRONIC SYSTEMS COMPRISING ELECTRONIC DEVICES, AND METHODS OF FORMING ELECTRONIC DEVICES - Electronic devices comprise a first substrate and a second substrate. The first substrate comprises circuitry including a plurality of conductive traces at least substantially parallel to each other through at least a portion of the first substrate. A plurality of bond pads is positioned on a surface of the first substrate and comprises a width extending over at least two of the plurality of conductive traces. A plurality of vias extends from adjacent at least some of the conductive traces to the plurality of bond pads. The second substrate is bonded to the first substrate and comprises support circuitry coupled to the plurality of bond pads on the first substrate with a plurality of conductive bumps. Memory devices and related methods of forming electronic devices and memory devices are also disclosed, as are electronic systems. | 09-29-2011 |
20110233775 | Three-Dimensional Multichip Module - A three-dimensional multichip module includes a first integrated circuit chip having at least one first high-temperature functional area and one first low-temperature functional area, and at least one second integrated circuit chip having a second high-temperature functional area and a second low-temperature functional area. The second high-temperature functional area is arranged opposite the first low-temperature functional area. As an alternative, at least one low-temperature chip having only one low-temperature functional area can also be arranged between the first and second chips. | 09-29-2011 |
20110233776 | SEMICONDUCTOR CHIP WITH COIL ELEMENT OVER PASSIVATION LAYER - A method for fabricating a circuitry component includes providing a semiconductor substrate, a first coil over said semiconductor substrate, a passivation layer over said first coil; and depositing a second coil over said passivation layer and over said first coil. Said second coil may be deposited by forming a first metal layer over said passivation layer, forming a pattern defining layer over said first metal layer, a first opening in said pattern defining layer exposing said first metal layer, forming a second metal layer over said first metal layer exposed by said first opening, removing said pattern defining layer, and removing said first metal layer not under said second metal layer. | 09-29-2011 |
20110241201 | Radiate Under-Bump Metallization Structure for Semiconductor Devices - An under-bump metallization (UBM) structure for a semiconductor device is provided. The UBM structure has a center portion and extensions extending out from the center portion. The extensions may have any suitable shape, including a quadrangle, a triangle, a circle, a fan, a fan with extensions, or a modified quadrangle having a curved surface. Adjacent UBM structures may have the respective extensions aligned or rotated relative to each other. Flux may be applied to a portion of the extensions to allow an overlying conductive bump to adhere to a part of the extensions. | 10-06-2011 |
20110241202 | Dummy Metal Design for Packaging Structures - An integrated circuit structure includes a semiconductor chip, a metal pad at a major surface of the semiconductor chip, and an under-bump metallurgy (UBM) over and contacting the metal pad. A metal bump is formed over and electrically connected to the UBM. A dummy pattern is formed at a same level, and formed of a same metallic material, as the metal pad. | 10-06-2011 |
20110241203 | SEMICONDUCTOR MODULE, METHOD FOR MANUFACTURING SEMICONDUCTOR MODULE, AND PORTABLE APPARATUS - A semiconductor module includes a device mounting board and a semiconductor device. The semiconductor device and the device mounting board are flip-chip connected to each other, and a device electrode provided in the semiconductor device and a substrate electrode provided in the device mounting board are connected by soldering. In a cross section along a line connecting the adjacent substrate electrodes, the width L | 10-06-2011 |
20110248398 | WAFER-LEVEL CHIP-SCALE PACKAGE DEVICE HAVING BUMP ASSEMBLIES CONFIGURED TO MITIGATE FAILURES DUE TO STRESS - Wafer-level chip-scale package semiconductor devices are described that have bump assemblies configured to mitigate solder bump failures due to stresses, particularly stresses caused by CTE mismatch during thermal cycling tests, dynamic deformation during drop tests or cyclic bending tests, and so on. In an implementation, the wafer-level chip-scale package devices include an integrated circuit chip having two or more arrays of bump assemblies for mounting the device to a printed circuit board. At least one of the arrays includes bump assemblies that are configured to withstand higher levels of stress than the bump assemblies of the remaining arrays. | 10-13-2011 |
20110248399 | Semiconductor Device and Method of Forming High Routing Density Interconnect Sites on Substrate - A semiconductor device has a semiconductor die with a plurality of bumps formed over contact pads on a surface of the semiconductor die. The bumps can have a fusible portion and non-fusible portion. A plurality of conductive traces is formed over a substrate with interconnect sites having a width greater than 20% and less than 80% of a width of a contact interface between the bumps and contact pads. The bumps are bonded to the interconnect sites so that the bumps cover a top surface and side surface of the interconnect sites. An encapsulant is deposited around the bumps between the semiconductor die and substrate. The conductive traces have a pitch as determined by minimum spacing between adjacent conductive traces that can be placed on the substrate and the width of the interconnect site provides a routing density equal to the pitch of the conductive traces. | 10-13-2011 |
20110248400 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A manufacturing method of a semiconductor device includes: forming a columnar electrode on a semiconductor wafer; flip-chip bonding a second semiconductor chip onto the semiconductor wafer; forming a molding portion on the semiconductor wafer, the molding portion covering and molding the columnar electrode and the second semiconductor chip; grinding or polishing the molding portion and the second semiconductor chip so that an upper face of the columnar electrode and an upper face of the semiconductor chip are exposed; and cutting the molding portion and the semiconductor wafer so that a first semiconductor chip, where the second semiconductor chip is flip-chip bonded and the columnar electrode is formed, is formed. | 10-13-2011 |
20110254151 | METHOD FOR FABRICATING BUMP STRUCTURE WITHOUT UBM UNDERCUT - A method for fabricating bump structure without UBM undercut uses an electroless Cu plating process to selectively form a Cu UBM layer on a Ti UBM layer within an opening of a photoresist layer. After stripping the photoresist layer, there is no need to perform a wet etching process on the Cu UBM layer, and thereby the UBM structure has a non-undercut profile. | 10-20-2011 |
20110254152 | CHIP STRUCTURE, CHIP BONDING STRUCTURE USING THE SAME, AND MANUFACTURING METHOD THEREOF - An IC chip and an IC chip manufacturing method thereof are provided. The IC chip has a chip body and at least one bump. The chip body has at least one conducting area on its surface. The bump is formed on the conducting area of the chip body. The bump includes a plurality of protrusions and at least one conducting material. The protrusions protrude out of the conducting area and are spaced apart from each other. The conducting material covers the protrusions and electrically connects the conducting area. The method includes: (A) providing a chip body having a conducting area on its surface; (B) forming a plurality of protrusions on the chip body, wherein the protrusions protrude out of the conducting area and are spaced apart from each other; and (C) forming at least one conducting material, wherein the conducting material covers the protrusions and electrically connects the conducting area. | 10-20-2011 |
20110254153 | DIE STRUCTURE AND DIE CONNECTING METHOD - A die structure and a die connecting method using the same are provided. The die structure includes a die and a bump structure. The bump structure includes a body and a solder layer. The body is disposed on the die. The solder layer is disposed on the body. The method includes providing a die structure mentioned above, providing a circuit board mentioned above, and soldering the solder layer of the die structure with the tine layer on the copper block of the circuit board. In different embodiments, a tin layer is omitted from the circuit board, wherein the solder layer of the die structure is directly soldered onto the surface of the copper block. | 10-20-2011 |
20110254154 | ROUTING LAYER FOR MITIGATING STRESS IN A SEMICONDUCTOR DIE - A routing layer for a semiconductor die is disclosed. The routing layer includes traces interconnecting integrated circuit bond-pads to UBMs. The routing layer is formed on a layer of dielectric material. The routing layer includes conductive traces arranged underneath the UBMs as to absorb stress from solder bumps attached to the UMBs. Traces beneath the UBMs protect parts of the underlying dielectric material proximate the solder bumps, from the stress. | 10-20-2011 |
20110254155 | Wafer Level Die Integration and Method Therefor - A method of manufacturing a semiconductor device includes providing a wafer for supporting the semiconductor device. An insulation layer is disposed over a top surface of the wafer. The method includes forming a first interconnect structure over the top surface of the wafer with temperatures in excess of 200° C., forming a metal pillar over the wafer in electrical contact with the first interconnect structure, connecting a semiconductor component to the first interconnect structure, and forming encapsulant over the semiconductor component. The encapsulant is etched to expose a portion of the metal pillar. A buffer layer is optionally formed over the encapsulant. The method includes forming a second interconnect structure over the encapsulant in electrical contact with the metal pillar with temperatures below 200° C., and removing a portion of a backside of the wafer opposite the top surface of the wafer. | 10-20-2011 |
20110254156 | Semiconductor Device and Method of Wafer Level Package Integration - A method of making a wafer level chip scale package includes providing a temporary substrate, and forming a wafer level interconnect structure over the temporary substrate using wafer level processes. The wafer level processes include forming a first insulating layer in contact with an upper surface of the temporary substrate, and forming a first conductive layer in contact with an upper surface of the first passivation layer. A first semiconductor die is mounted over the wafer level interconnect structure such that an active surface of the first semiconductor die is in electrical contact with the first conductive layer, and a first encapsulant is deposited over the first semiconductor die. A second encapsulant is deposited over the first encapsulant, and the first and second encapsulants are cured simultaneously. The temporary substrate is removed to expose the first passivation layer. | 10-20-2011 |
20110254157 | Semiconductor Package and Method of Forming Z-Direction Conductive Posts Embedded in Structurally Protective Encapsulant - A semiconductor package is made using a prefabricated post carrier including a base plate and plurality of conductive posts. A film encapsulant is disposed over the base plate of the post carrier and around the conductive posts. A semiconductor die is mounted to a temporary carrier. The post carrier and temporary carrier are pressed together to embed the semiconductor die in the film encapsulant. The semiconductor die is disposed between the conductive posts in the film encapsulant. The temporary carrier and base plate of the post carrier are removed. A first circuit build-up layer is formed over a first side of the film encapsulant. The first circuit build-up layer is electrically connected to the conductive posts. A second circuit build-up layer is formed over a second side of the film encapsulant opposite the first side. The second circuit build-up layer is electrically connected to the conductive posts. | 10-20-2011 |
20110254158 | Mask Programmable Interface Selection - According to one exemplary embodiment, a semiconductor die with on-die preferred interface selection includes at least two groups of pads situated on an active surface of the semiconductor die, where each of the at least two groups of pads is coupled to its associated interface in the die. A set of bumps is mask-programmably routed to one of the at least two groups of pads, thereby selecting the preferred interface for the semiconductor die. A non-preferred interface is not routed to any bumps on the active surface of the semiconductor die, thereby reducing bump count on the die. Each of the at least two groups of pads can be situated in a corresponding pad ring on the active surface of said semiconductor die. The at least two groups of pads can be laid out substantially inline. | 10-20-2011 |
20110260316 | Semiconductor Device and Method of Forming Bump on Substrate to Prevent ELK ILD Delamination During Reflow Process - A semiconductor device has a flipchip semiconductor die and substrate. A first insulating layer is formed over the substrate. A via is formed through the first insulating layer. Conductive material is deposited in the via to form a conductive pillar or stacked stud bumps. The conductive pillar is electrically connected to a conductive layer within the substrate. A second insulating layer is formed over the first insulating layer. Bump material is formed over the conductive pillar. The bump material is reflowed to form a bump. The first and second insulating layers are removed. The semiconductor die is mounted to the substrate by reflowing the bump to a conductive layer of the die. The semiconductor die also has a third insulating layer formed over the conductive layer and an active surface of the die and UBM formed over the first conductive layer and third insulating layer. | 10-27-2011 |
20110260317 | CU PILLAR BUMP WITH ELECTROLYTIC METAL SIDEWALL PROTECTION - A copper pillar bump has a sidewall protection layer formed of an electrolytic metal layer. The electrolytic metal layer is an electrolytic nickel layer, an electrolytic gold layer, and electrolytic copper layer, or an electrolytic silver layer. | 10-27-2011 |
20110260318 | Integrated circuits with multiple I/O regions - Methods and/or associated devices and/or systems for creating integrated circuits (IC's) that have multiple connected I/O regions that can be designed and implemented using commonly available standard I/O libraries in conjunction with standard IC design flows and tools and in combination with one or more novel standardized I/O region interconnect cells for interconnecting between or through otherwise separated I/O regions. Specific embodiments support a wide variety of IC's that can be developed using standard libraries and design flows including: application specific integrated circuits (ASIC's), programmable logic devices (PLDs), custom IC's, analog IC's, CPU's, GPU's, and other IC's that require large numbers of input/ouput (IO) circuits while having relatively small core circuitry areas. Specific embodiments may involve innovative I/O cell functions, innovative IC topologies, and innovative IC packaging solutions for single die packages and multiple die packages. | 10-27-2011 |
20110260319 | THREE-DIMENSIONAL STACKED SUBSTRATE ARRANGEMENTS - Three-dimensional stacked substrate arrangements with reliable bonding and inter-substrate protection. | 10-27-2011 |
20110260320 | METHOD OF MAKING A CONNECTION COMPONENT WITH POSTS AND PADS - A packaged microelectronic element includes connection component incorporating a dielectric layer ( | 10-27-2011 |
20110260321 | Flip Chip Interconnection Structure - A flip chip interconnection structure is formed by mechanically interlocking joining surfaces of a first and second element. The first element, which may be a bump on an integrated circuit chip, includes a soft, deformable material with a low yield strength and high elongation to failure. The surface of the second element, which may for example be a substrate pad, is provided with asperities into which the first element deforms plastically under pressure to form the mechanical interlock | 10-27-2011 |
20110266667 | CU PILLAR BUMP WITH NON-METAL SIDEWALL PROTECTION STRUCTURE - A sidewall protection structure is provided for covering at least a portion of a sidewall surface of a bump structure, in which a protection structure on the sidewalls of a Cu pillar and a surface region of an under-bump-metallurgy (UBM) layer is formed of at least one non-metal material layers, for example a dielectric material layer, a polymer material layer, or combinations thereof. | 11-03-2011 |
20110266668 | MICROELECTRONIC ASSEMBLIES HAVING COMPLIANCY - A microelectronic assembly includes a microelectronic element, such as a semiconductor wafer or semiconductor chip, having a first surface and contacts accessible at the first surface, and a compliant layer overlying the first surface of the microelectronic element, the compliant layer having openings in substantial alignment with the contacts of the microelectronic element. The assembly desirably includes conductive posts overlying the compliant layer and projecting away from the first surface of the microelectronic element, the conductive posts being electrically interconnected with the contacts of the microelectronic element by elongated, electrically conductive elements extending between the contacts and the conductive posts. | 11-03-2011 |
20110266669 | SEMICONDUCTOR CHIP WITH POST-PASSIVATION SCHEME FORMED OVER PASSIVATION LAYER - The invention provides a semiconductor chip comprising an interconnecting structure over said passivation layer. The interconnecting structure comprises a first contact pad connected to a second contact pad exposed by an opening in a passivation layer. A metal bump is on the first contact pad and over multiple semiconductor devices, wherein the metal bump has more than 50 percent by weight of gold and has a height of between 8 and 50 microns | 11-03-2011 |
20110272799 | IC CHIP AND IC CHIP MANUFACTURING METHOD THEREOF - An IC chip and an IC chip manufacturing method thereof are provided. The IC chip has a chip body and at least one bump. The chip body has at least one conducting area on its surface. The bump is formed on the conducting area of the chip body. The bump includes a plurality of protrusions and at least one conducting material. The protrusions protrude out of the conducting area and are spaced apart from each other. The conducting material covers the protrusions and electrically connects the conducting area. The method includes: (A) providing a chip body having a conducting area on its surface; (B) forming a plurality of protrusions on the chip body, wherein the protrusions protrude out of the conducting area and are spaced apart from each other; and (C) forming at least one conducting material, wherein the conducting material covers the protrusions and electrically connects the conducting area. | 11-10-2011 |
20110272800 | SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING SAME - A method of manufacturing a semiconductor package includes placing a semiconductor chip in a recess provided on a surface of a supporting body so that a part of the semiconductor chip projects from the recess; forming a resin part on the surface of the supporting body, the resin part encapsulating the projecting part of the semiconductor chip; removing the supporting body; and forming an interconnection structure electrically connected to the semiconductor chip by using the resin part as a part of the base body of the semiconductor package. | 11-10-2011 |
20110272801 | SEMICONDUCTOR DEVICE WITH CONNECTION PADS PROVIDED WITH INSERTS - A semiconductor device includes an integrated circuit and external electrical connection pads. Each pad includes cavities that are at least partially filled with a material different from the material forming the pads, so as to form inserts. | 11-10-2011 |
20110272802 | BUMP, METHOD FOR FORMING THE BUMP, AND METHOD FOR MOUNTING SUBSTRATE HAVING THE BUMP THEREON - A two-layer structure bump including a first bump layer of a bulk body of a first conductive metal, which is any of gold, copper, and nickel, formed on a substrate and a second bump layer of a sintered body of a powder of a second conductive metal, which is any of gold and silver, formed on the first bump layer. The bulk body composing the first bump layer is formed through any of plating, sputtering, or CVD. The sintered body composing the second bump layer is formed by sintering the powder of the second conductive metal having a purity of not lower than 99.9 wt % and an average particle diameter of 0.005 μm to 1.0 μm. The second bump layer has a Young's modulus 0.1 to 0.4 times that of the first bump layer. | 11-10-2011 |
20110278716 | METHOD OF FABRICATING BUMP STRUCTURE - A method for fabricating bump structure forms an under-bump metallurgy (UBM) layer in an opening of an encapsulating layer, and then forms a bump layer on the UBM layer within the opening of the encapsulating layer. After removing excess material of the bump layer from the upper surface of the encapsulating layer, the encapsulating layer is removed till a top portion of the bump layer protrudes from the upper surface of the encapsulating layer. | 11-17-2011 |
20110278717 | Semiconductor Device and Method of Embedding Bumps Formed on Semiconductor Die Into Penetrable Adhesive Layer to Reduce Die Shifting During Encapsulation - A semiconductor device has a semiconductor die with a plurality of bumps formed over a surface of the first semiconductor die. A penetrable adhesive layer is formed over a temporary carrier. The adhesive layer can include a plurality of slots. The semiconductor die is mounted to the carrier by embedding the bumps into the penetrable adhesive layer. The semiconductor die and interconnect structure can be separated by a gap. An encapsulant is deposited over the first semiconductor die. The bumps embedded into the penetrable adhesive layer reduce shifting of the first semiconductor die while depositing the encapsulant. The carrier is removed. An interconnect structure is formed over the semiconductor die. The interconnect structure is electrically connected to the bumps. A thermally conductive bump is formed over the semiconductor die, and a heat sink is mounted to the interconnect structure and thermally connected to the thermally conductive bump. | 11-17-2011 |
20110278718 | ASSEMBLY OF MULTI-CHIP MODULES USING REFLOWABLE FEATURES - A multi-chip module (MCM) that includes at least two substrates, having facing surfaces, which are mechanically coupled by a set of coupling elements having a reflow characteristic, is described. One of the two substrates includes another set of coupling elements having another reflow characteristic, which is different than the reflow characteristic. These different reflow characteristics of the sets of coupling elements allow different temperature profiles to be used when bonding the two substrates to each other than when bonding the one of the two substrates to a carrier. For example, the temperature profiles may have different peak temperatures and/or different durations from one another. These reflow characteristics may facilitate low-cost, high-yield assembly and alignment of the substrates in the MCM, and may allow temperature-sensitive components to be included in the MCM. | 11-17-2011 |
20110278719 | DIRECTING THE FLOW OF UNDERFILL MATERIALS USING MAGNETIC PARTICLES - Electronic devices and methods for fabricating electronic devices are described. One method includes providing a substrate and a die, and coupling the die to the substrate, wherein a gap remains between the die and the substrate. The method also includes placing an underfill material on the substrate and delivering at least part of the underfill material into the gap. The method also includes controlling the flow of the underfill material in the gap using magnetic force. Other embodiments are described and claimed. | 11-17-2011 |
20110278720 | SEMICONDUCTOR SUBSTRATE STRUCTURE AND SEMICONDUCTOR DEVICE - A semiconductor substrate structure includes an electrode pad formed on a semiconductor substrate, a protective film formed on the semiconductor substrate with a distance from the electrode pad, and a bump formed on the electrode pad. The protective film has a barrier portion surrounding the electrode pad. The barrier portion has a height different from a height of a part of the protective film other than the barrier portion. | 11-17-2011 |
20110278721 | Semiconductor Package and Method of Mounting Semiconductor Die to Opposite Sides of TSV Substrate - A semiconductor device includes a wafer level substrate having a plurality of first conductive vias formed through the wafer level substrate. A first semiconductor die is mounted to the wafer level substrate. A first surface of the first semiconductor die includes contact pads oriented toward a first surface of the wafer level substrate. A first encapsulant is deposited over the first semiconductor die. A second semiconductor die is mounted to the wafer level substrate. A first surface of the second semiconductor die includes contact pads oriented toward a second surface of the wafer level substrate opposite the first surface of the wafer level substrate. A second encapsulant is deposited over the second semiconductor die. A plurality of bumps is formed over the plurality of first conductive vias. A second conductive via can be formed through the first encapsulant and connected to the first conductive via. The semiconductor packages are stackable. | 11-17-2011 |
20110278722 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device includes: an electrode pad formed in a chip region on a substrate; and a protruding portion continuously formed in a region outside the electrode pad within the chip region so as to surround a region inside the chip region. The protruding portion is higher than the electrode pad. | 11-17-2011 |
20110278723 | SEMICONDUCTOR DEVICE - A semiconductor device includes a semiconductor element having a main surface where an outside connection terminal pad is provided. The semiconductor element is connected to a conductive layer on a supporting board via a plurality of convex-shaped outside connection terminals provided on the outside connection terminal pad and a connection member; and the connection member commonly covers the convex-shaped outside connection terminals. | 11-17-2011 |
20110285011 | CU PILLAR BUMP WITH L-SHAPED NON-METAL SIDEWALL PROTECTION STRUCTURE - An L-shaped sidewall protection process is used for Cu pillar bump technology. The L-shaped sidewall protection structure is formed of at least one of non-metal material layers, for example a dielectric material layer, a polymer material layer or combinations thereof. | 11-24-2011 |
20110285012 | Substrate Contact Opening - An under-bump metallization (UBM) structure for a substrate, such as an organic substrate, a ceramic substrate, a silicon or glass interposer, a high density interconnect, a printed circuit board, or the like, is provided. A buffer layer is formed over a contact pad on the substrate such that at least a portion of the contact pad is exposed. A conductor pad is formed within the opening and extends over at least a portion of the buffer layer. The conductor pad may have a uniform thickness and/or a non-planar surface. The substrate may be attached to another substrate and/or a die. | 11-24-2011 |
20110285013 | Controlling Solder Bump Profiles by Increasing Heights of Solder Resists - A device includes a first work piece bonded to a second work piece. The first work piece includes a solder resist at a surface of the first work piece, wherein the solder resist includes a solder resist opening, and a bond pad in the solder resist opening. The second work piece includes a non-reflowable metal bump at a surface of the second work piece. A solder bump bonds the non-reflowable metal bump to the bond pad, with at least a portion of the solder bump located in the solder resist opening and adjoining the non-reflowable metal bump and the bond pad. A thickness of the solder resist is greater than about 50 percent a height of the solder bump, wherein the height equals a distance between the non-reflowable metal bump and the bond pad. | 11-24-2011 |
20110285014 | PACKAGING STRUCTURE AND PACKAGE PROCESS - A package structure and a package process are proposed in using pillar bumps to connect an upper second chip and through silicon vias of a lower first chip, wherein a gap between the first chip and the second chip can be controlled by adjusting a height of the pillar bumps. In other words, the pillar bumps compensate the height difference between the first chip and a molding compound surrounding the first chip so as to ensure the bondibility between the pillar bumps and the corresponding through silicon vias and improve the process yield. Furthermore, the pillar bumps maintain the gap between the second chip and the molding compound for allowing an underfill being properly filled into the space between the first chip and the second chip. | 11-24-2011 |
20110285015 | BUMP STRUCTURE AND FABRICATION METHOD THEREOF - There is provided a bump structure for a semiconductor device, comprising a metal post formed on and electrically connected to an electrode pad on a substrate, a solder post formed on the top surface of the metal post, said solder post having the same horizontal width as the metal post and the top surface of the solder post being substantially rounded, and an intermetallic compound layer disposed at the interface between the metal post and the solder post. An oxide layer formed on the solder post prevents solder post under reflow from being changed into a spherical shape. An intermetallic compound layer may be formed by an aging process at the interface between the metal post and the solder post. The bump structure can realize fine pitch semiconductor package without a short between neighboring bumps. | 11-24-2011 |
20110285016 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device includes a substrate and a stress generating film. A first surface of the substrate includes a protruding part at each of two end portions. The substrate includes a semiconductor element. The stress generating film is formed so as to come into contact with a second surface of the substrate that is opposite to the first surface of the substrate. The stress generating film is in a shape which causes a second stress that offsets at least a part of a first stress occurring as a result of bonding between an external substrate and the protruding part. | 11-24-2011 |
20110285017 | METHOD FOR PRODUCING AN OPTOELECTRONIC DEVICE AND OPTOELECTRONIC DEVICE - A method for producing an optoelectronic device includes providing a carrier, applying at least one first metal layer on the carrier, providing at least one optical component, applying at least one second metal layer on the at least one optical component, and mechanically connecting the carrier to the at least one optical component by the at least one first and the at least one second metal layer, wherein the connecting includes friction welding or is friction welding. | 11-24-2011 |
20110285018 | MULTIPLE SELECTABLE FUNCTION INTEGRATED CIRCUIT MODULE - An integrated circuit module has a common function known good integrated circuit die with selectable functions. The selectable functions arc selected during packaging of the known good integrated circuit die. The known good integrated circuit die is mounted to a second level substrate. The second level substrate has wiring connections to the input/output pads of the known good integrated circuit die that select desired input functions and output functions. Further, the wiring connections on the second level substrate provide signal paths to transfer signals to the desired input function and signals from the desired output function, and signals to and from the common functions. Also, the wiring connections form connections between the input/output pads and external circuitry. To select the desired input functions and the desired output functions, appropriate logic states are applied to input/output pads connected to a function selector to configure a functional operation of the integrated circuit module. The second level module substrate has connector pins to provide physical and electrical connections between the external circuitry and the wiring connections on the second level substrate. | 11-24-2011 |
20110291259 | Reliable metal bumps on top of I/O pads after removal of test probe marks - In accordance with the objectives of the invention a new method is provided for the creation of metal bumps over surfaces of I/O pads. Contact pads are provided over the surface of a layer of dielectric. The aluminum of the I/O pads, which have been used as I/O pads during wafer level semiconductor device testing, is completely or partially removed over a surface area that is smaller than the surface area of the contact pad using methods of metal dry etching or wet etching. The contact pad can be accessed either by interconnect metal created in a plane of the contact pad or by via that are provided through the layer of dielectric over which the contact pad has been deposited. The process can be further extended by the deposition, patterning and etching of a layer of polyimide over the layer of passivation that serves to protect the contact pad. | 12-01-2011 |
20110291260 | SEMICONDUCTOR ENCAPSULATION ADHESIVE COMPOSITION, SEMICONDUCTOR ENCAPSULATION FILM-LIKE ADHESIVE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE - A semiconductor encapsulation adhesive composition comprising (a) an epoxy resin, (b) a curing agent and (c) an antioxidant. | 12-01-2011 |
20110291261 | THREE DIMENSIONAL STACKED PACKAGE STRUCTURE - An apparatus, system, and method are disclosed for connecting integrated circuit devices. A plurality of primary electrically conductive contacts and a plurality of primary electrically conductive pillars are electrically coupled to a primary integrated circuit device. The plurality of primary electrically conductive contacts form a pattern corresponding to secondary electrically conductive contacts disposed on one or more secondary integrated circuit devices. The plurality of primary electrically conductive pillars extends away from the primary integrated circuit device. The plurality of primary electrically conductive pillars forms a pattern that corresponds to substrate electrically conductive contacts that are disposed on a substrate. The plurality of primary electrically conductive pillars and associated connecting material provide a standoff height between the primary integrated circuit device and the substrate that is greater than or equal to a height of the one or more secondary integrated circuit devices. | 12-01-2011 |
20110291262 | Strength of Micro-Bump Joints - A device includes a work piece including a metal bump; and a dielectric layer having a portion directly over the metal bump. The metal bump and a surface of the portion of the dielectric layer form an interface. A metal finish is formed over and contacting the metal bump. The metal finish extends from over the dielectric layer to below the interface. | 12-01-2011 |
20110291263 | IC HAVING DIELECTRIC POLYMERIC COATED PROTRUDING FEATURES HAVING WET ETCHED EXPOSED TIPS - A method of fabricating IC die includes providing a substrate having a topside semiconductor surface including active circuitry and a bottomside surface. The IC die includes at least one protruding feature coupled to the active circuitry that protrudes from the bottomside surface or the topside semiconductor surface. The topside semiconductor surface and/or bottomside surface and the protruding feature are coated with a dielectric polymer. A portion of the dielectric polymer is removed from the protruding feature using a solvent to expose a tip portion of the protruding feature for electrical connection thereto. With a solvent that does not corrode or oxidize the exposed protruding feature tips, the need for a conventional subsequent chemical exposure to remove corrosion or oxidation is avoided. | 12-01-2011 |
20110291264 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH POSTS AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit packaging system includes: providing a semiconductor wafer having a chip pad; attaching a wafer frame to the semiconductor wafer, the wafer frame having a horizontal cover integral to a protruding connector with the protruding connector on the chip pad; forming an underfill around the protruding connector and between the horizontal cover and the semiconductor wafer; removing the horizontal cover exposing the underfill and the protruding connector; and singulating an integrated circuit package from the semiconductor wafer. | 12-01-2011 |
20110291265 | SEMICONDUCTOR INTEGRATED CIRCUIT HAVING A MULTI-CHIP STRUCTURE - A semiconductor integrated circuit having a multi-chip structure includes a number of stacked semiconductor chips. Each of the semiconductor chips includes a first through electrode formed through the semiconductor chip, a first bump pad formed over the semiconductor chip at a region where the first bump pad is separated from the first through electrode, a first internal circuit formed inside the semiconductor chip, coupled to the first through electrode through a first metal path, and coupled to the first bump pad through a second metal path; and a redistribution layer (RDL) formed over a backside of the semiconductor chip. | 12-01-2011 |
20110291266 | SEMICONDUCTOR INTEGRATED CIRCUIT HAVING A MULTI-CHIP STRUCTURE - A semiconductor integrated circuit having a multi-chip structure includes a plurality of stacked semiconductor chips. At least one of the semiconductor chips includes first and second metal layers separately formed inside the semiconductor chip, a first internal circuit coupled in series between the first and second metal layers inside the semiconductor chip, a first metal path vertically formed over the second metal layer to a first side of the semiconductor chip, and a first through silicon via formed through the semiconductor chip from a second side of the semiconductor chip to the first metal layer. | 12-01-2011 |
20110291267 | Semiconductor wafer structure and multi-chip stack structure - A semiconductor wafer structure comprises a first surface and a second surface opposite to the first surface, a plurality of chip areas formed on the first surface, a plurality of through-silicon holes formed in each of the plurality of chip areas connecting the first surface and the second surface, and a through-silicon-via (TSV) electrode structure formed in each through-silicon hole. Each through-silicon-via electrode structure comprises a dielectric layer formed on the inner wall of the through-silicon hole, a barrier layer formed on the inner wall of the dielectric layer and defining a vacancy therein, a filling metal layer filled into the vacancy, a first end of the filling metal layer being lower than the first surface forming a recess, and a soft metal cap connecting to and overlaying the first end of the filling metal layer, wherein a portion of the soft metal cap is formed in the recess and the soft metal cap protrudes out of the first surface. Hence, the reliability of multi-chip stack package structure can be enhanced with the application of these soft metal caps. | 12-01-2011 |
20110291268 | Semiconductor wafer structure and multi-chip stack structure - A semiconductor wafer structure comprises a first surface and a second surface opposite to the first surface, a plurality of chip areas formed on the first surface, a plurality of through-silicon holes formed in each of the plurality of chip areas connecting the first surface and the second surface, and a through-silicon-via (TSV) electrode structure formed in each through-silicon hole. Each through-silicon-via electrode structure comprises a dielectric layer formed on the inner wall of the through-silicon hole, a barrier layer formed on the inner wall of the dielectric layer and defining a vacancy therein, a filling metal layer filled into the vacancy, a first end of the filling metal layer being lower than the first surface forming a recess, and a soft metal cap connecting to and overlaying the first end of the filling metal layer, wherein a portion of the soft metal cap is formed in the recess and the soft metal cap protrudes out of the first surface. Hence, the reliability of multi-chip stack package structure can be enhanced with the application of these soft metal caps. | 12-01-2011 |
20110291269 | Semiconductor Device Comprising a Stacked Die Configuration Including an Integrated Peltier Element - In a stacked semiconductor device, a Peltier element may be incorporated as a distributed element so as to provide active heat transfer from a high power device into a low power device, thereby achieving superior temperature control in stacked device configurations. For example, a CPU and a dynamic RAM device may be provided as a stacked configuration, wherein waste heat of the CPU may be efficiently distributed into the low power memory device. | 12-01-2011 |
20110291270 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND MOUNTING STRUCTURE THEREOF - A semiconductor device with improved quality and reliability is provided. In a UBM formed over an electrode pad located over a semiconductor substrate, the edge (end) of an Au film as an upper layer is located inside or in the same position as the edge (end) of a TiW film as a lower layer, which can suppress the formation of a suspended part in the Au film. This arrangement can prevent the occurrence of electrical short circuit between the adjacent pads due to the suspended part and the adhesion of the suspended part as foreign matter to the semiconductor substrate, thus improving the quality and reliability of the semiconductor device (semiconductor chip). | 12-01-2011 |
20110291271 | SEMICONDUCTOR CHIP AND SEMICONDUCTOR DEVICE - A semiconductor chip such as an MMIC is provided. The semiconductor chip has: a Si semiconductor as a substrate; and a low-loss transmission line, and can be easily connected to a circuit board on which the semiconductor chip is to be mounted and can ensure a stable GND potential. The semiconductor chip is a flip-chip semiconductor chip, and includes: a Si substrate; an integrated circuit manufactured on a main surface of the substrate; a dielectric film formed above the integrated circuit; and a conductor film for grounding formed on an upper surface of the dielectric film. The integrated circuit includes a wiring layer including a signal line which transmits signals for the integrated circuit. The signal line, the dielectric film, and the conductor film constitute a microstrip line. | 12-01-2011 |
20110291272 | CHIP STRUCTURE - A chip structure includes a semiconductor substrate, an interconnecting metallization structure, a passivation layer, a circuit layer and a bump. The interconnecting metallization structure is over the semiconductor substrate. The passivation layer is over the interconnecting metallization structure. The circuit layer is over the passivation layer. The bump is on the circuit layer, and the bump is unsuited for being processed using a reflow process. | 12-01-2011 |
20110298123 | CU PILLAR BUMP WITH NON-METAL SIDEWALL SPACER AND METAL TOP CAP - A bump has a non-metal sidewall spacer on a lower sidewall portion of Cu pillar, and a metal top cap on a top surface and an upper sidewall portion of the Cu pillar. The metal top cap is formed by an electroless or immersion plating technique after the non-metal sidewall spacer formation. | 12-08-2011 |
20110298124 | Semiconductor Structure - A semiconductor structure is provided. By using a composite bump with replace of a gold bump, the consumption of gold can be reduced and the manufacturing cost can be decreased accordingly. Moreover, by using an encapsulation material formed on a metal layer, the heat transferring efficiency of the semiconductor structure can be improved and the stability thereof can be increased. | 12-08-2011 |
20110304041 | ELECTRICALLY CONNECTING ROUTES OF SEMICONDUCTOR CHIP PACKAGE CONSOLIDATED IN DIE-ATTACHMENT - A chip package comprises a chip, a plurality of bumps, and a die-attaching tape where the bumps are jointed to the corresponding bonding pads on the active surface of the chip. The die-attaching tape consists of a wiring core, a first dielectric adhesive, and a second dielectric adhesive where the wiring core is sandwiched between the first dielectric adhesive and the second dielectric adhesive. The wiring core is of a thickness of a dielectric material and includes a plurality of conductive traces separated by the dielectric material. The conductive traces are also of the thickness of the dielectric material. The die-attaching tape is attached to the active surface of the chip by the first dielectric adhesive to make the bumps penetrate the first dielectric adhesive and joint to the corresponding conductive traces. Therefore, the die-attaching tape can have both functions of holding the chip and transversely transmitting signals to substrate or another chip to eliminate or reduce the conventional wire-bonding processes. | 12-15-2011 |
20110304042 | Copper Bump Structures Having Sidewall Protection Layers - A work piece includes a copper bump having a top surface and sidewalls. A protection layer is formed on the sidewalls, and not on the top surface, of the copper bump. The protection layer includes a compound of copper and a polymer, and is a dielectric layer. | 12-15-2011 |
20110304043 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME - A semiconductor device comprises a semiconductor chip which comprises mode-set terminals, and mode-set wiring lines respectively connected to the mode-set terminals, a sealing layer which covers the semiconductor chip and also covers a land of a first mode-set wiring line that is one of the mode-set wiring lines, the sealing layer including a mode-set via hole formed above a land of a second mode-set wiring line, the second mode-set wiring line being one of the mode-set wiring lines and being different from the first mode-set wiring line, a mode-set embedded conductor provided within the mode-set via hole to be connected to the second mode-set wiring line, and a mode-set conductive pattern which is connected to the mode-set embedded conductor and which is provided on the sealing layer above the land of the first mode-set wiring line. | 12-15-2011 |
20110309490 | Plasma Treatment for Semiconductor Devices - A semiconductor device having a polymer layer and a method of fabricating the same is provided. A two-step plasma treatment for a surface of the polymer layer includes a first plasma process to roughen the surface of the polymer layer and loosen contaminants, and a second plasma process to make the polymer layer smoother or make the polymer layer less rough. An etch process may be used between the first plasma process and the second plasma process to remove the contaminants loosened by the first plasma process. In an embodiment, the polymer layer exhibits a surface roughness between about 1% and about 8% as measured by Atomic Force Microscopy (AFM) with the index of surface area difference percentage (SADP) and/or has surface contaminants of less than about 1% of Ti, less than about 1% of F, less than about 1.5% Sn, and less than about 0.4% of Pb. | 12-22-2011 |
20110309491 | TUNGSTEN STIFFENER FOR FLEXIBLE SUBSTRATE ASSEMBLY - A flexible semiconductor package is formed by interposing a flexible substrate between a tungsten stiffener and a die. A tungsten stiffener is bonded to a first surface of the flexible substrate prior to flip chip bonding or die attach of a die to a second surface of the flexible substrate. The tungsten stiffener is dimensioned so as to substantially overlap the die and provide a rigid and flat surface on which the die/flexible substrate bonding occurs. The flat and rigid characteristic of a tungsten stiffener optimizes the electrical and mechanical bond between the die and the flexible substrate as well as minimizing CTE mismatch. | 12-22-2011 |
20110309492 | INTEGRATED CIRCUIT SYSTEM WITH RECESSED THROUGH SILICON VIA PADS AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit system includes: providing a substrate with a face surface having a via therein and a back surface having a trench therein; filling the via with a conductive pillar; forming a recessed contact pad in the trench; filling the recessed contact pad partially with solder; and forming an under-bump metal having a base surface in electrical contact with the conductive pillar, and having sides that extend away from the face surface of the substrate and further extend beyond the base surface. | 12-22-2011 |
20110309493 | Electronic Device Package Locking System and Method - Device and method for an electronic device package is disclosed. The electronic device package includes a first pad, a second pad and an encapsulation surrounding the first and second pad, wherein the encapsulation includes a first opening underneath the first pad and a second opening underneath the second pad. A first bump is arranged in the first opening and a second bump is arranged in the second opening, wherein the encapsulation mechanically locks the first bump to the first pad and the second bump to the second pad. | 12-22-2011 |
20110309494 | SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREFOR - Various embodiments of the present invention include a semiconductor device and a fabrication method therefor, the semiconductor device including a first semiconductor chip disposed on a substrate, a first sealing resin sealing the first semiconductor chip, a built-in semiconductor device disposed on the first sealing resin, and a second sealing resin sealing the first sealing resin and the built-in semiconductor device and covering a side surface of the substrate. According to an aspect of the present invention, it is possible to provide a high-quality semiconductor device and a fabrication method therefor, in which downsizing and cost reduction can be realized. | 12-22-2011 |
20110309495 | Multi-chip stack package structure - A multi-chip stack package structure comprises a substrate, which has a chip placement area defined on its upper surface and a plurality of contacts disposed outside the chip placement area; a first chip is disposed in the chip placement area with the rear surface, a plurality of first pads being disposed on the active surface and a plurality of first bumps each being formed on one of the first pads; a plurality of metal wires connect the first bumps to the contacts; a second chip with a plurality of second pads being disposed on the active surface and a plurality of second bumps each being formed on one of the second pads, the second chip being mounted to the first chip with its active surface facing the active surface of the first chip, wherein the second bumps correspondingly connect the metal wires and the first bumps respectively. | 12-22-2011 |
20110309496 | Multi-chip stack package structure - A multi-chip stack package structure comprises a substrate, which has a chip placement area defined on its upper surface and a plurality of contacts disposed outside the chip placement area; a first chip is disposed in the chip placement area with the rear surface, a plurality of first pads being disposed on the active surface and a plurality of first bumps each being formed on one of the first pads; a plurality of metal wires connect the first bumps to the contacts; a second chip with a plurality of second pads being disposed on the active surface and a plurality of second bumps each being formed on one of the second pads, the second chip being mounted to the first chip with its active surface facing the active surface of the first chip, wherein the second bumps correspondingly connect the metal wires and the first bumps respectively. | 12-22-2011 |
20110309497 | Multi-chip stack package structure - A multi-chip stack package structure comprises a substrate, which has a chip placement area defined on its upper surface and a plurality of contacts disposed outside the chip placement area; a first chip is disposed in the chip placement area with the rear surface, a plurality of first pads being disposed on the active surface and a plurality of first bumps each being formed on one of the first pads; a plurality of metal wires connect the first bumps to the contacts; a second chip with a plurality of second pads being disposed on the active surface and a plurality of second bumps each being formed on one of the second pads, the second chip being mounted to the first chip with its active surface facing the active surface of the first chip, wherein the second bumps correspondingly connect the metal wires and the first bumps respectively. | 12-22-2011 |
20110309498 | SEMICONDUCTOR DEVICE - A semiconductor device includes a semiconductor substrate including a bump electrode, a first insulating layer formed on the semiconductor substrate and arranged to a lateral direction of the bump electrode, a first wiring layer formed on the first insulating layer and connected to the bump electrode, a second insulating layer formed on the first wiring layer, a via hole formed in the second insulating layer, and reaching the first wiring layer, a second wiring layer formed on the second insulating layer and connected to the first wiring layer via a via conductor formed in the via hole, and an external connection terminal connected to the second wiring layer, wherein an elastic modulus of the second insulating layer is set lower than an elastic modulus of the first insulating layer. | 12-22-2011 |
20110309499 | METHOD OF MANUFACTURING DEVICES - A method of manufacturing a device includes forming a covering layer having affinity for a filler to be injected into a space between a first base and a second base, on at least one of the opposing surfaces of the first base and the second base, and then injecting the filler into the space between the first base and the second base. | 12-22-2011 |
20110309500 | Semiconductor Device and Method of Self-Confinement of Conductive Bump Material During Reflow Without Solder Mask - A semiconductor device has a semiconductor die with a die bump pad and substrate with a trace line and integrated bump pad. Conductive bump material is deposited on the substrate bump pad or die bump pad. The semiconductor die is mounted over the substrate so that the bump material is disposed between the die bump pad and substrate bump pad. The bump material is reflowed without a solder mask around the die bump pad or substrate bump pad to form an interconnect. The bump material is self-confined within a footprint of the die bump pad or substrate bump pad. The bump material can be immersed in a flux solution prior to reflow to increase wettability. Alternatively, the interconnect includes a non-fusible base and fusible cap. The volume of bump material is selected so that a surface tension maintains self-confinement of the bump material within the bump pads during reflow. | 12-22-2011 |
20110316146 | Semiconductor Device and Method of Forming Anisotropic Conductive Film Between Semiconductor Die and Build-Up Interconnect Structure - A semiconductor wafer contains a plurality of semiconductor die with bumps formed over contact pads on an active surface of the semiconductor die. An ACF is deposited over the bumps and active surface of the wafer. An insulating layer can be formed between the ACF and semiconductor die. The semiconductor wafer is singulated to separate the die. The semiconductor die is mounted to a temporary carrier with the ACF oriented to the carrier. The semiconductor die is forced against the carrier to compress the ACF under the bumps and form a low resistance electrical interconnect to the bumps. An encapsulant is deposited over the semiconductor die and carrier. The carrier is removed. An interconnect structure is formed over the semiconductor die and encapsulant. The interconnect structure is electrically connected through the compressed ACF to the bumps. The ACF reduces shifting of the semiconductor die during encapsulation. | 12-29-2011 |
20110316147 | Embedded 3D Interposer Structure - A device includes an interposer, which includes a substrate; and at least one dielectric layer over the substrate. A plurality of through-substrate vias (TSVs) penetrate through the substrate. A first metal bump is in the at least one dielectric layer and electrically coupled to the plurality of TSVs. A second metal bump is over the at least one dielectric layer. A die is embedded in the at least one dielectric layer and bonded to the first metal bump. | 12-29-2011 |
20110316148 | WIRING SUBSTRATE - A wiring substrate includes plural wiring layers and plural insulation layers being alternately stacked one on top of the other. The plural insulation layers are formed with insulation resin having the same composition. The plural insulation layers are formed with a filler having the same composition. The filler content of each of the plural insulation layers ranges from 30 vol % or more to 65 vol % or less. The thermal expansion coefficient of each of the plural insulation layers ranges from 12 ppm/° C. or more to 35 ppm/° C. or less. | 12-29-2011 |
20110316149 | METHOD OF MOUNTING ELECTRONIC COMPONENT AND MOUNTING SUBSTRATE - In flip chip attach of electronic components, underfill is filled between the component and the substrate to alleviate, for example, thermal stress. In electronic component mounting using copper pillars conducted so far, filler contained in the underfill may cause separation in the process of heating and curing the resin. Disclosed is plating the surfaces of the copper pillars with solder. Mobilization of the filler charged in the underfill due to electric fields produced by local cells that are developed upon contact between dissimilar metals, is suppressed, and occurrence of crack at connection portions is obviated. Thus, connection reliability is increased. | 12-29-2011 |
20110316150 | SEMICONDUCTOR PACKAGE AND METHOD FOR MANUFACTURING SEMICONDUCTOR PACKAGE - A semiconductor package includes a first board, a semiconductor chip having a first face and a second face at an opposite side to the first face, the semiconductor chip being mounted on the first board with the first face facing the first board, an insulating film provided on the second face of the semiconductor chip, and a second board stacked on the first board. A bump provided on a face of the second board facing the first board is connected to a pad provided on a face of the first board facing the second board and a gap is formed between the first board and the second board. The semiconductor chip and the insulating film are provided in the gap. | 12-29-2011 |
20110316151 | SEMICONDUCTOR PACKAGE AND METHOD FOR MANUFACTURING SEMICONDUCTOR PACKAGE - A semiconductor package includes a board, an under fill resin layer provided on the board, and a semiconductor chip having a first face and a second face at an opposite side to the first face, the semiconductor chip being flip-chip mounted on the board via the under fill resin layer with the first face facing the board. The semiconductor chip is covered with the under fill resin layer over the first face and from the first face to an edge part of the second face. | 12-29-2011 |
20110316152 | MANUFACTURING METHOD OF SEMICONDUCTOR PACKAGES AND A SEMICONDUCTOR PACKAGE - Semiconductor chips are placed in recesses of a support carrier with electrode surfaces facing upward in a state where the semiconductor chips are arranged separately from each other. A seal resin part is formed by encapsulating the semiconductor chips by an insulating resin on said support carrier. Rewiring patterns are formed on a top surface of the seal resin part. External connection terminals are formed on the rewiring patterns. Bottom parts of the recesses of the support carrier are removed from the seal resin part while maintaining reinforcing members of the support carrier to be remained. The semiconductor packages are individualized by cutting the seal resin part along an outside of each reinforcing member. | 12-29-2011 |
20110316153 | SEMICONDUCTOR DEVICE AND PACKAGE INCLUDING THE SEMICONDUCTOR DEVICE - A semiconductor device includes a semiconductor substrate | 12-29-2011 |
20110316154 | SEMICONDUCTOR DEVICE HAVING SEMICONDUCTOR SUBSTRATE, AND METHOD OF MANUFACTURING THE SAME - A semiconductor device includes a semiconductor substrate having a plurality of electrode pads, a protective film covering the upper surface of the semiconductor substrate and having an opening so that the electrode pad is exposed therethrough, a metal film formed on the electrode pad exposed through the opening, and a bump formed on the metal film. The metal film includes a plurality of grooves radially formed from the center thereof toward the periphery thereof. | 12-29-2011 |
20120001322 | DOUBLE MOLDED CHIP SCALE PACKAGE - Chip scale semiconductor packages and methods for making and using the same are described. The chip scale semiconductor packages (CSPs) contain a die with an integrated circuit device, a patterned plating layer, and a second interconnect structure formed from a Cu etched substrate that has a portion of an upper surface connected to the patterned plating layer, a side surface, and a bottom surface. The die can be attached to the patterned plating layer by a first interconnect structure that uses wirebonding or that uses a flip chip attachment process. The CSP contains a double molded structure where a first molding layer encapsulates the die, the patterned plating layer, the first interconnect structure, and the upper surface of the second interconnect structure. The second molding layer encapsulates the side surface of the second interconnect structure without encapsulating the bottom surface of the second interconnect structure. With such a configuration, the second molding layer helps control warpage during the manufacturing process and no printed circuit board (PCB) substrate is needed when the package is used in an electronic device since the signal routing is performed by the second interconnect structure. Other embodiments are described. | 01-05-2012 |
20120001323 | Semiconductor Device Including Ultra Low-K (ULK) Metallization Stacks with Reduced Chip-Package Interaction - In complex semiconductor devices, sophisticated ULK materials may be used in metal line layers in combination with a via layer of enhanced mechanical stability by increasing the amount of dielectric material of superior mechanical strength. Due to the superior mechanical stability of the via layers, reflow processes for directly connecting the semiconductor die and a package substrate may be performed on the basis of a lead-free material system without unduly increasing yield losses. | 01-05-2012 |
20120001324 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - In one embodiment, a semiconductor device includes a circuit substrate, and first and second semiconductor chips mounted on it. The first semiconductor chip and the second semiconductor chip are flip-chip connected, and an underfill resin is filled between them. The underfill resin has a fillet portion. A thickness T | 01-05-2012 |
20120001325 | Semiconductor Device and Method of Forming Compliant Stress Relief Buffer Around Large Array WLCSP - A semiconductor device has a stress relief buffer mounted to a temporary substrate in locations designated for bump formation. The stress relief buffer can be a multi-layer composite material such as a first compliant layer, a silicon layer formed over the first compliant layer, and a second compliant layer formed over the silicon layer. A semiconductor die is also mounted to the temporary substrate. The stress relief buffer can be thinner than the semiconductor die. An encapsulant is deposited between the semiconductor die and stress relief buffer. The temporary substrate is removed. An interconnect structure is formed over the semiconductor die, encapsulant, and stress relief buffer. The interconnect structure is electrically connected to the semiconductor die. A stiffener layer can be formed over the stress relief buffer and encapsulant. A circuit layer containing active devices, passive devices, conductive layers, and dielectric layers can be formed within the stress relief buffer. | 01-05-2012 |
20120001326 | Semiconductor Package and Method of Forming Similar Structure for Top and Bottom Bonding Pads - A semiconductor device includes a first semiconductor die. A plurality of conductive vias is formed around the first semiconductor die. A first conductive layer is formed over a first surface of the first semiconductor die and electrically connects to the plurality of conductive vias. A second conductive layer is formed over a second surface of the first semiconductor die opposite the first surface and electrically connects to the plurality of conductive vias. A first passivation layer is formed over the first surface and includes openings that expose the first conductive layer. A second passivation layer is formed over the second surface and includes openings that expose the second conductive layer. Bonding pads are formed within the openings in the first and second passivation layers and are electrically connected to the first and second conductive layers. An interconnect structure is disposed within the openings in the first and second passivation layers. | 01-05-2012 |
20120007230 | CONDUCTIVE BUMP FOR SEMICONDUCTOR SUBSTRATE AND METHOD OF MANUFACTURE - An embodiment of the disclosure includes a conductive bump on a semiconductor die. A substrate is provided. A bond pad is over the substrate. An under bump metallurgy (UBM) layer is over the bond pad. A copper pillar is over the UBM layer. The copper pillar has a top surface with a first width and sidewalls with a concave shape. A nickel layer having a top surface and a bottom surface is over the top surface of the copper pillar. The bottom surface of the nickel layer has a second width. A ratio of the second width to the first width is between about 0.93 to about 1.07. A solder material is over the top surface of the cap layer. | 01-12-2012 |
20120007231 | METHOD OF FORMING CU PILLAR CAPPED BY BARRIER LAYER - A nickel barrier layer is formed on an upper sidewall surface of a Cu pillar. A mask layer with an opening for defining the Cu pillar window has an upper portion and a lower portion. The upper portion of the mask layer is removed after the formation of the Cu pillar so as to expose the upper sidewall surface of the Cu pillar. The nickel barrier layer is then deposited on the exposed sidewall surface of the Cu pillar followed by removing and the lower portion of the mask layer. | 01-12-2012 |
20120007232 | MICROELECTRONIC PACKAGES WITH DUAL OR MULTIPLE-ETCHED FLIP-CHIP CONNECTORS - A packaged microelectronic element includes a microelectronic element having a front surface and a plurality of first solid metal posts extending away from the front surface. A substrate has a major surface and a plurality of conductive elements exposed at the major surface and joined to the first solid metal posts. In particular examples, the conductive elements can be bond pads or can be second posts having top surfaces and edge surfaces extending at substantial angles away therefrom. Each first solid metal post includes a base region adjacent the microelectronic element and a tip region remote from the microelectronic element, the base region and tip region having respective concave circumferential surfaces. Each first solid metal post has a horizontal dimension which is a first function of vertical location in the base region and which is a second function of vertical location in the tip region. | 01-12-2012 |
20120007233 | SEMICONDUCTOR ELEMENT AND FABRICATION METHOD THEREOF - A semiconductor element and a fabrication method thereof. The method includes forming an encapsulating layer on a semiconductor silicon substrate having electrode pads and a passivation layer formed thereon, the encapsulating layer covering the electrode pads and a part of the passivation layer that surrounds the electrode pads; forming a covering layer on the passivation layer and the encapsulating layer with a plurality of openings that expose a part of the encapsulating layer; forming a bonding metallic layer on the part of the encapsulating layer that are exposed from the openings and electrically connecting the bonding metallic layer to the encapsulating layer, wherein the bonding metallic layer is not greater in diameter than the encapsulating layer; and forming a conductive element on the bonding metallic layer. The encapsulating layer provides a good buffering effect to prevent electrode pads from delamination or being broken caused by the direct stress from the conductive element. | 01-12-2012 |
20120007234 | SEMICONDUCTOR PACKAGE WITHOUT CHIP CARRIER AND FABRICATION METHOD THEREOF - A semiconductor package without a chip carrier formed thereon and a fabrication method thereof. A metallic carrier is half-etched to form a plurality of grooves and metal studs corresponding to the grooves. The grooves are filled with a first encapsulant and a plurality of bonding pads are formed on the metal studs. The first encapsulant is bonded with the metal studs directly. Each of the bonding pads and one of the metal studs corresponding to the bonding pad form a T-shaped structure. Therefore, bonding force between the metal studs and the first encapsulant is enhanced such that delamination is avoided. Die mounting, wire-bonding and molding processes are performed subsequently. Since the half-etched grooves are filled with the first encapsulant, the drawback of having pliable metallic carrier that makes transportation difficult to carry out as encountered in prior techniques is overcome, and the manufacturing cost is educed by not requiring the use of costly metals as an etching resist layer. | 01-12-2012 |
20120007235 | Chip Fanning Out Method and Chip-on-Film Device - A chip fanning out method is disclosed. The chip fanning out method includes mounting a chip on a film, forming a plurality of outer lead bonds spatially arranged in a bump correspondence order on the film, forming a plurality of bumps spatially arranged in a bump arrangement order on the chip, and forming a plurality of wires to connect the plurality of outer lead bonds to the plurality of bumps according to the bump correspondence order, wherein the bump correspondence order is different from the bump arrangement order. | 01-12-2012 |
20120007236 | SEMICONDUCTOR DEVICE AND PACKAGE - A semiconductor device includes a semiconductor substrate having an upper surface, a lower surface, a first side and a second side, wherein the lower surface has a slope so that the first side is thicker than the second side, and a circuit pattern including a bonding pad on the upper surface of the semiconductor substrate. | 01-12-2012 |
20120007237 | CHIP PACKAGE - A chip package includes a bump connecting said semiconductor chip and said circuitry component, wherein the semiconductor chip has a photosensitive area used to sense light. The chip package may include a ring-shaped protrusion connecting a transparent substrate and the semiconductor chip. | 01-12-2012 |
20120007238 | Method of Manufacturing a Semiconductor Device - Chipping of semiconductor chips is to be prevented. A semiconductor device comprises a semiconductor chip having a main surface, a plurality of pads formed over the main surface, a rearrangement wiring formed over the main surface to alter an arrangement of the plurality of pads, and a protective film and an insulating film formed over the main surface, and a plurality of solder bumps each connected to the rearrangement wiring and arranged differently from the plurality of pads. The presence of a bevel cut surface obliquely continuous to the main surface and formed on a periphery of the main surface of the semiconductor chip prevents chipping. | 01-12-2012 |
20120012997 | Recessed Pillar Structure - A bump structure that may be used to interconnect one substrate to another substrate is provided. A recessed conductive pillar is formed on a first substrate such that the recessed conductive pillar has a recess formed therein. The recess may be filled with a solder material. A conductive pillar on a second substrate may be formed having a contact surface with a width less than or equal to a width of the recess. The first substrate may be attached to the second substrate such that the conductive pillar on the second substrate is positioned over or in the recess of the first substrate. The substrates may each be an integrated circuit die, an interposer, a printed circuit board, a high-density interconnect, or the like. | 01-19-2012 |
20120012998 | Conductive Sidewall for Microbumps - Electromigration in microbump connections causes voids in the microbumps, which reduces the lifetime of an integrated circuit containing the microbump. Electromigration lifetime may be increased in microbumps by forming a copper shell around the solder. The copper shell of one microbump contacts the copper shell of a second microbump to enclose the solder of the microbump connection. The copper shell allows higher current densities through the microbump. Thus, smaller microbumps may be manufactured on a smaller pitch without suffering failure from electromigration. Additionally, the copper shell reduces shorting or bridging between microbump connections on a substrate. | 01-19-2012 |
20120012999 | SEMICONDUCTOR-ENCAPSULATING ADHESIVE, SEMICONDUCTOR-ENCAPSULATING FILM-FORM ADHESIVE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE - The present invention relates to a semiconductor-encapsulating adhesive, a semiconductor-encapsulating film-form adhesive, a method for producing a semiconductor device, and a semiconductor device. The present invention provides a semiconductor-encapsulating adhesive comprising (a) an epoxy resin, and (b) a compound formed of an organic acid reactive with an epoxy resin and a curing accelerator. | 01-19-2012 |
20120013000 | STACKABLE MOLDED MICROELECTRONIC PACKAGES - A microelectronic package has a microelectronic element overlying or mounted to a first surface of a substrate and substantially rigid conductive posts projecting above the first surface or projecting above a second surface of the substrate remote therefrom. Conductive elements exposed at a surface of the substrate opposite the surface above which the conductive posts project are electrically interconnected with the microelectronic element. An encapsulant overlies at least a portion of the microelectronic element and the surface of the substrate above which the conductive posts project, the encapsulant having a recess or a plurality of openings each permitting at least one electrical connection to be made to at least one conductive post. At least some conductive posts are electrically insulated from one another and adapted to simultaneously carry different electric potentials. In particular embodiments, the openings in the encapsulant at least partially expose conductive masses joined to posts, fully expose top surfaces of posts and partially expose edge surfaces of posts, or may only partially expose top surfaces of posts. | 01-19-2012 |
20120013001 | STACKABLE MOLDED MICROELECTRONIC PACKAGES WITH AREA ARRAY UNIT CONNECTORS - A microelectronic package having a substrate, a microelectronic element, e.g., a chip, and terminals can have conductive elements electrically connected with element contacts of the chip and contacts of the substrate. Conductive elements can be electrically insulated from one another for simultaneously carrying different electric potentials. An encapsulant can overlie the first surface of the substrate and at least a portion of a face of the microelectronic element remote from the substrate, and may have a major surface above the microelectronic element. A plurality of package contacts can overlie a face of the microelectronic element remote from the substrate. The package contacts, e.g., conductive masses, substantially rigid posts, can be electrically interconnected with terminals of the substrate, such as through the conductive elements. The package contacts can have top surfaces at least partially exposed at the major surface of the encapsulant. | 01-19-2012 |
20120013002 | PACKAGE STRUCTURE - Disclosed is a package structure including a semiconductor chip disposed in a core board having a first surface and an opposite second surface. The package structure further includes a plurality of first and second electrode pads disposed on an active surface and an opposite inactive surface of the semiconductor chip respectively, the semiconductor chip having a plurality of through-silicon vias for electrically connecting the first and second electrode pads. As a result, the semiconductor chip is electrically connected to the two sides of the package structure via the through-silicon vias instead of conductive through holes, so as to enhance electrical quality and prevent the inactive surface of the semiconductor chip from occupying wiring layout space of the second surface of the core board to thereby increase wiring layout density and enhance electrical performance. | 01-19-2012 |
20120013003 | BGA PACKAGE WITH TRACES FOR PLATING PADS UNDER THE CHIP - A semiconductor flip-chip ball grid array package with one-metal-layered substrate. The sites of a two-dimensional array become usable for attaching solder balls of the signal (non-common net assignment) I/O type to the substrate under the chip area, when the sites can be routed for metal plating. The space to place a maximum number of signal routing traces is opened up by interrupting the periodicity of the site array from the edge of the substrate towards the center under the chip. The periodicity is preferably interrupted by depopulating entire aligned lines and rows of the two-dimensional array. | 01-19-2012 |
20120013004 | Semiconductor Device Having an Interconnect Structure with TSV Using Encapsulant for Structural Support - A semiconductor device includes a substrate and a via extending through the substrate. A first insulating layer is disposed on sidewalls of the via. An electrically conductive material is disposed in the via over the first insulating layer to form a TSV. A first interconnect structure is disposed over a first side of the substrate. A semiconductor die or a component is mounted to the first interconnect structure. An encapsulant is disposed over the first interconnect structure and semiconductor die or component. A second interconnect structure is disposed over the second side of the substrate. The second interconnect structure is electrically connected to the TSV. The second interconnect structure includes a second insulating layer disposed over the second surface of the substrate and TSV, and a first conductive layer disposed over the TSV and in contact with the TSV through the second insulating layer. | 01-19-2012 |
20120013005 | Packaging Structure and Method - A method of making a semiconductor device includes providing a substrate and forming a conductive layer on the substrate. The conductive layer includes a first metal. A semiconductor die is provided. A bump is formed on the semiconductor die. The bump includes a second metal. The semiconductor die is positioned proximate to the substrate to contact the bump to the conductive layer and form a bonding interface. The bump and the conductive layer are metallurgically reacted at a melting point of the first metal to dissolve a portion of the second metal from an end of the bump. The bonding interface is heated to the melting point of the first metal for a time sufficient to melt a portion of the first metal from the conductive layer. A width of the conductive layer is no greater than a width of the bump. | 01-19-2012 |
20120018875 | Reducing Delamination Between an Underfill and a Buffer layer in a Bond Structure - A die includes a metal pad, a passivation layer, and a patterned buffer layer over the passivation layer. The patterned buffer layer includes a plurality of discrete portions separated from each other. An under-bump-metallurgy (UBM) is formed in an opening in the patterned buffer layer and an opening in the passivation layer. A metal bump is formed over and electrically coupled to the UBM. | 01-26-2012 |
20120018876 | Multi-Die Stacking Using Bumps with Different Sizes - A device includes a first die having a first side and a second side opposite to first side, the first side includes a first region and a second region, and a first metal bump of a first horizontal size formed on the first region of the first side of the first die. A second die is bonded to the first side of the first die through the first metal bump. A dielectric layer is formed over the first side of the first die and includes a first portion directly over the second die, a second portion encircling the second die, and an opening exposing the second region of the first side of the first die. A second metal bump of a second horizontal size is formed on the second region of the first side of the first die and extending into the opening of the dielectric layer. The second horizontal size is greater than the first horizontal size. An electrical component is bonded to the first side of the first die through the second metal bump. | 01-26-2012 |
20120018877 | Package-on-Package Structures with Reduced Bump Bridging - A device includes a package substrate including a first non-reflowable metal bump extending over a top surface of the package substrate; a die over and bonded to the package substrate; and a package component over the die and bonded to the package substrate. The package component includes a second non-reflowable metal bump extending below a bottom surface of the package component. The package component is selected from the group consisting essentially of a device die, an additional package substrate, and combinations thereof. A solder bump bonds the first non-reflowable metal bump to the second non-reflowable metal bump. | 01-26-2012 |
20120018878 | Doping Minor Elements into Metal Bumps - A method of forming a device includes providing a substrate, and forming a solder bump over the substrate. A minor element is introduced to a region adjacent a top surface of the solder bump. A re-flow process is then performed to the solder bump to drive the minor element into the solder bump. | 01-26-2012 |
20120018879 | STACK PACKAGE AND METHOD FOR MANUFACTURING THE SAME - A stack package includes a cover film, a first package having a first semiconductor chip which is attached to the cover film, a first adhesive member which is formed to seal the first semiconductor chip and a surface of the cover film, and a first circuit pattern which is disposed over the first adhesive member and electrically connected with the first semiconductor chip; a second package disposed over the first package, having a second semiconductor chip which is electrically connected with the first circuit pattern, a second adhesive member which is formed to seal the second semiconductor chip, and a second circuit pattern which is formed over the second adhesive member, and a via formed to pass through the second circuit pattern and the second adhesive member and to be electrically connected with the first circuit pattern and the second circuit pattern. | 01-26-2012 |
20120018880 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF - A semiconductor structure and a manufacture method thereof are disclosed. The semiconductor structure includes a semiconductor wafer having a plurality of semiconductor device dies, wherein each of the semiconductor device dies includes a die body, a metal wiring layer, a bump, and a metal layer. The metal wiring layer is formed on the die body while the bump is formed on the metal wiring layer during the semiconductor front-end-of-line (FEOL) process and protrudes from the die body. The metal layer is disposed on one side of the bump opposite to the metal wiring layer, wherein the activity of the metal layer is smaller than the activity of the bump. In this way, the semiconductor structure of the present invention is easy to be manufactured and the manufacture cost is also reduced. | 01-26-2012 |
20120018881 | Semiconductor Device and Method of Dual-Molding Die Formed on Opposite Sides of Build-Up Interconnect Structure - A semiconductor device has a first interconnect structure. A first semiconductor die has an active surface oriented towards and mounted to a first surface of the first interconnect structure. A first encapsulant is deposited over the first interconnect structure and first semiconductor die. A second semiconductor die has an active surface oriented towards and mounted to a second surface of the first interconnect structure opposite the first surface. A plurality of first conductive pillars is formed over the second surface of the first interconnect structure and around the second semiconductor die. A second encapsulant is deposited over the second semiconductor die and around the plurality of first conductive pillars. A second interconnect structure including a conductive layer and bumps is formed over the second encapsulant and electrically connects to the plurality of first conductive pillars and the first and second semiconductor die. | 01-26-2012 |
20120018882 | Semiconductor Device and Method of Forming Stress Relief Layer Between Die and Interconnect Structure - A semiconductor device is made by forming a first conductive layer over a sacrificial carrier. A conductive pillar is formed over the first conductive layer. An active surface of a semiconductor die is mounted to the carrier. An encapsulant is deposited over the semiconductor die and around the conductive pillar. The carrier and adhesive layer are removed. A stress relief insulating layer is formed over the active surface of the semiconductor die and a first surface of the encapsulant. The stress relief insulating layer has a first thickness over the semiconductor die and a second thickness less than the first thickness over the encapsulant. A first interconnect structure is formed over the stress relief insulating layer. A second interconnect structure is formed over a second surface of encapsulant opposite the first interconnect structure. The first and second interconnect structures are electrically connected through the conductive pillar. | 01-26-2012 |
20120018883 | CONDUCTIVE STRUCTURE FOR A SEMICONDUCTOR INTEGRATED CIRCUIT - A conductive structure for a semiconductor integrated circuit is provided. The semiconductor integrated circuit has a substrate, a plurality of pads and a passivation layer. The pads are disposed on the substrate. The passivation layer extends over and covers a part of the substrate and a part of around each of the pads to define a plurality of openings, in which the conductive structure electrically connects to a corresponding pad of the pads through a corresponding opening of the openings. The conductive structure includes a buffering layer, an under bump metallurgy (UBM) layer and a bump. The buffering layer is formed on the passivation layer without fully blocking the corresponding opening. The UBM layer is substantially formed in the corresponding opening and electrically connects to the corresponding pad. Additionally, the UBM layer, formed under the bump, continuously extends over and covers a peripheral portion of the buffering layer. | 01-26-2012 |
20120025368 | Semiconductor Device Cover Mark - A system and method for determining underfill expansion is provided. An embodiment comprises forming cover marks along a top surface of a substrate, attaching a semiconductor substrate to the top surface of the substrate, placing an underfill material between the semiconductor substrate and the substrate, and then using the cover marks to determine the expansion of the underfill over the top surface of the substrate. Additionally, cover marks may also be formed along a top surface of the semiconductor substrate, and the cover marks on both the substrate and the semiconductor substrate may be used together as alignment marks during the alignment of the substrate and the semiconductor substrate. | 02-02-2012 |
20120025369 | SEMICONDUCTOR PACKAGE - A semiconductor package is provided. The semiconductor package includes a substrate, a semiconductor element, a plurality of element contacts and a molding compound. The substrate includes a passivation layer and a plurality of substrate pads. Each substrate pad includes a protrusion and an embedded portion. The embedded portion is embedded in the passivation layer, and the protrusion projects from the passivation layer. The semiconductor element includes a plurality of under bump metallurgies (UBM) with recesses. The ratio of the width of each recess to the first width of the protrusion is larger than 1. The element contacts connect the UBM and the substrate pads. The molding compound covers the semiconductor element. | 02-02-2012 |
20120025370 | SEMICONDUCTOR STRUCTURE COMPRISING PILLAR AND MOISTURE BARRIER - A semiconductor structure includes multiple semiconductor devices on a substrate and a metal layer disposed over the semiconductor devices, the metal layer comprising at least a first trace and a second trace. A conductive pillar is disposed directly on and in electrical contact with the first trace of the metal layer, and a dielectric layer is selectively disposed between the metal layer and the conductive pillar, where the dielectric layer electrically isolates the second trace from the pillar. A moisture barrier surrounds the semiconductor devices around a periphery of the semiconductor structure, and extends from the substrate through the dielectric layer to the conductive pillar. | 02-02-2012 |
20120025371 | SEMICONDUCTOR DEVICE - A semiconductor device includes a semiconductor chip, wiring formed thereon, a first insulating film formed on the wiring, provided with a first opening, a pad electrode formed so as to be in contact with the wiring, a second insulating film formed on the pad electrode film, provided with a second opening, and a flip chip bump formed so as to be in contact with the pad electrode film. In this case, the second insulating film exists between the flip chip bump and the pad electrode film, in a region directly underneath the outer edge of the flip chip bump, as seen in a plan view, and the outer edge of the flip chip bump is formed in a region inside the outer edge of the pad electrode film. | 02-02-2012 |
20120025372 | CHIP HAVING A DRIVING INTEGRATED CIRCUIT - A chip having a bump layout suitable for the chip on glass technology and a driving IC includes a plurality of first bumps and a plurality of second bumps for electrically connecting to a glass substrate of a displayer. The first and second bumps are disposed on a surface of the chip and near two opposite long sides of the chip respectively. The ratio of the total contacting area of the first bumps to that of the second bumps is between 0.8 and 1.2. Thus, a pressure applied on the chip and the glass substrate of the displayer for connection can be uniformly exerted all over the chip, and the stability of the connection is therefore improved. | 02-02-2012 |
20120025373 | Semiconductor Device and Method of Forming Vertically Offset Bond on Trace Interconnects on Different Height Traces - A method of making a semiconductor device includes providing a substrate, and forming a first conductive layer over the substrate. A patterned layer is formed over the first conductive layer. A second conductive layer is formed in the patterned layer. A height of the second conductive layer is greater than a height of the first conductive layer. The patterned layer is removed. A first bump and a second bump are formed over the first and second conductive layers, respectively, wherein the second bump overlaps the first bump, and wherein an uppermost surface of the second bump is vertically offset from an uppermost surface of the first bump. Bond wires are formed on the first and second bumps. The bond wires are arranged in a straight configuration. Lowermost surfaces of the first conductive layer and second conductive layer are substantially coplanar. | 02-02-2012 |
20120025374 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH ROUNDED INTERCONNECT - An integrated circuit packaging system includes: a package carrier; an integrated circuit attached to the package carrier; a rounded interconnect on the package carrier; and an encapsulation over the package carrier covering the integrated circuit and exposing the rounded interconnect having a characteristic free of denting. | 02-02-2012 |
20120032321 | Electrical Contact Alignment Posts - An electronic apparatus and method of fabrication of the apparatus, the apparatus including a first electronic device having an interconnection surface with a first plurality of interconnection pads extending from the surface by a first distance and a second plurality of alignment posts extending from the surface by a second distance greater than the first distance, and a second electrical device having an interconnection surface with a first plurality of electrical interconnection pads, each pad arranged to contact a corresponding first electronic device interconnection surface pad upon assembly of the first electronic device interconnection surface upon the second electronic device interconnection surface, the second electronic device interconnection surface including a third plurality of alignment posts, each located to be adjacent to at least one of the first electronic device alignment posts upon assembly. | 02-09-2012 |
20120032322 | FLIP CHIP PACKAGE UTILIZING TRACE BUMP TRACE INTERCONNECTION - A flip chip package includes a substrate having a die attach surface; and a die mounted on the die attach surface with an active surface of the die facing the substrate, wherein the die is interconnected to the substrate via a plurality of copper pillar bumps on the active surface, wherein at least one of the plurality of copper pillar bumps has a bump width that is substantially equal to or smaller than a line width of a trace on the die attach surface of the substrate. | 02-09-2012 |
20120032323 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A preferred aim of the invention is to provide technique for improving reliability of semiconductor devices when using a low-dielectric-constant film having a lower dielectric constant than a silicon oxide film to a part of an interlayer insulating film. More specifically, to achieve the preferred aim, an interlayer insulating film IL | 02-09-2012 |
20120032324 | SEMICONDUCTOR DEVICE - A semiconductor device, including: a semiconductor layer; a first conductive layer formed above the semiconductor layer and having a first width; a second conductive layer connected to the first conductive layer and having a second width which is smaller than the first width; an interlayer dielectric formed above the first conductive layer and the second conductive layer; and an electrode pad formed above the interlayer dielectric. A connection section at which the first conductive layer and the second conductive layer are connected is disposed in a specific region positioned inward from a line extending vertically downward from an edge of the electrode pad; and a reinforcing section is provided at the connection section. | 02-09-2012 |
20120032325 | SEMICONDUCTOR DEVICE - There is provided a semiconductor device with which stress can be prevented from locally concentrating on an external connecting terminal on a post and thus damages of the external connecting terminal can be prevented. The semiconductor device includes a semiconductor chip, a sealing resin layer stacked on a surface of the semiconductor chip, and the post which penetrates the sealing resin layer in a stacking direction of the semiconductor chip and the sealing resin layer, protrudes from the sealing resin layer, and has a periphery of the protruding portion opposedly in contact with a surface of the sealing resin layer in the stacking direction. | 02-09-2012 |
20120038040 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH STACKED LEAD AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit packaging system includes: providing a substrate; attaching an integrated circuit device to the substrate; forming a stud interconnect having stacked studs, the stud interconnect on the substrate and having a contact surface and a crown surface on an end of the stud interconnect opposite the substrate; applying an encapsulation over the integrated circuit die, over the stud interconnect, and over the substrate; and forming a cavity in the encapsulation over the stud interconnect, the contact surface and the crown surface exposed in the cavity. | 02-16-2012 |
20120038041 | HEAT DISSIPATION STRUCTURE FOR ELECTRONIC DEVICE AND FABRICATION METHOD THEREOF - A heat dissipation structure for an electronic device includes a body having a first surface and a second surface opposite to the first surface. A silicon-containing insulating layer is disposed on the first surface of the body. An ultrananocrystalline diamond film is disposed on the silicon-containing insulating layer. A first conductive pattern layer is disposed on the silicon-containing insulating layer and enclosed by the ultrananocrystalline diamond film, wherein the ultrananocrystalline diamond film and the first conductive pattern layer do not overlap with each other as viewed from a top-view perspective. A method for fabricating a heat dissipation structure for an electronic device and an electronic package having the heat dissipation structure are also disclosed. | 02-16-2012 |
20120038042 | LEAD-FREE SOLDER ALLOY, SOLDER BALL, AND ELECTRONIC MEMBER COMPRISING SOLDER BUMP - A lead-free solder alloy, a solder ball and an electronic member comprising a solder bump which enable the prevention of the occurrence of yellow discoloration on the surface of a solder after soldering, the surface of a solder bump after the formation of the bump in a BGA, and the surface of a solder bump after a burn-in test of a BGA. Specifically disclosed are: a lead-free solder alloy; a solder ball; and an electronic member comprising a solder bump, containing at least one additive element selected from Li, Na, K, Ca, Be, Mg, Sc, Y, lanthanoid series elements, Ti, Zr, Hf, Nb, Ta, Mo, Zn, Al, Ga, In, Si and Mn in the total amount of 1 ppm by mass to 0.1% by mass inclusive, with the remainder being 40% by mass or more of Sn. | 02-16-2012 |
20120038043 | MANUFACTURING FAN-OUT WAFER LEVEL PACKAGING - Fan-out wafer level packaging includes an integrated circuit having a top surface, a bottom surface and a bond pad defined on the top surface, and a substrate having a cavity. An adhesive layer is positioned between a top surface of the cavity and the bottom surface of the integrated circuit, and a bump is positioned proximate a top surface of the fan-out wafer level packaging, the bump spaced apart from the integrated circuit. A redistribution layer is configured to electrically couple the bond pad of the integrated circuit to the bump. | 02-16-2012 |
20120043654 | MECHANISMS FOR FORMING COPPER PILLAR BUMPS USING PATTERNED ANODES - The mechanisms of preparing bump structures described by using patterned anodes may simplify bump-making process, reduce manufacturing cost, and improve thickness uniformity within die and across the wafer. In addition, the mechanisms described above allow forming bumps with different heights to allow bumps to be integrated with elements on a substrate with different heights. Bumps with different heights expand the application of copper post bumps to enable further chip integration. | 02-23-2012 |
20120056315 | Alignment Marks in Substrate Having Through-Substrate Via (TSV) - A device includes a substrate, and an alignment mark including a conductive through-substrate via (TSV) penetrating through the substrate. | 03-08-2012 |
20120056316 | Semiconductor Device and Method of Forming Different Height Conductive Pillars to Electrically Interconnect Stacked Laterally Offset Semiconductor Die - A semiconductor device has a first semiconductor die mounted over a carrier. Wettable contact pads can be formed over the carrier. A second semiconductor die is mounted over the first semiconductor die. The second die is laterally offset with respect to the first die. An electrical interconnect is formed between an overlapping portion of the first die and second die. A plurality of first conductive pillars is disposed over the first die. A plurality of second conductive pillars is disposed over the second die. An encapsulant is deposited over the first and second die and first and second conductive pillars. A first interconnect structure is formed over the encapsulant, first conductive pillars, and second die. The carrier is removed. A second interconnect structure is formed over the encapsulant, second conductive pillars, and first die. A third conductive pillar is formed between the first and second build-up interconnect structures. | 03-08-2012 |
20120056317 | CHIP - A chip includes a body, a number of pins, and conductive pieces. The body includes a top surface and a bottom surface. The pins are arranged on the bottom surface. The conductive pieces are arranged on the top surface. The number of the conductive pieces equals to the number of the pins. Each pin is electrically connected to one conductive piece. | 03-08-2012 |
20120056318 | SEMICONDUCTOR DEVICE - According to one embodiment, there is provided a semiconductor device including a semiconductor element, an electrode pad of the semiconductor element, a buffer coat film, and a micro-bump. The buffer coat film has an opening corresponding to the electrode pad. The micro-bump is electrically connected to the electrode pad through the opening. A contact area between the micro-bump and side surfaces of the opening is larger than a contact area between the micro-bump and a bottom surface of the opening. | 03-08-2012 |
20120056319 | EMBEDDED PACKAGE AND METHOD FOR MANUFACTURING THE SAME - An embedded package includes a first semiconductor chip having a first conductive line which has a first sunken area, a second semiconductor chip having a second conductive line which has a second sunken area, wherein the first semiconductor chip and the second semiconductor chip are arranged facing each other, and wherein the first sunken area and the second sunken area are arranged facing each other, a core layer surrounding the first semiconductor chip and the second semiconductor chip, wherein the core layer has a first circuit pattern coupled to an external terminal; and a bump formed in the first and second sunken areas, wherein the bump is coupled to the first circuit pattern. | 03-08-2012 |
20120056320 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE - According to one embodiment, a semiconductor substrate, a metal film, a surface modifying layer, and a redistribution trace are provided. On the semiconductor substrate, a wire and a pad electrode are formed. The metal film is formed over the semiconductor substrate. The surface modifying layer is formed on a surface layer of the metal film and improves the adhesion with a resist pattern. The redistribution trace is formed on the metal film via the surface modifying layer. | 03-08-2012 |
20120056321 | Semiconductor Device and Method of Forming WLP With Semiconductor Die Embedded Within Penetrable Encapsulant Between TSV Interposers - A semiconductor device has a first substrate with a plurality of first conductive vias formed partially through the first substrate. A first semiconductor die is mounted over the first substrate and electrically connected to the first conductive vias. A plurality of bumps is formed over the first substrate. A second substrate has a plurality of second conductive vias formed partially through the second substrate. A penetrable encapsulant is deposited over the second substrate. The second substrate is mounted over the first substrate to embed the first semiconductor die and interconnect structure in the penetrable encapsulant. The encapsulant can be injected between the first and second substrates. A portion of the first substrate is removed to expose the first conductive vias. A portion of the second substrate is removed to expose the second conductive vias. A second semiconductor die is mounted over the second substrate. | 03-08-2012 |
20120056322 | SEMICONDUCTOR DEVICE WITH PADS OF ENHANCED MOISTURE BLOCKING ABILITY - A semiconductor device is provided having a pad with an improved moisture blocking ability. The semiconductor device has: a circuit portion including a plurality of semiconductor elements formed on a semiconductor substrate; lamination of insulator covering the circuit portion, including a passivation film as an uppermost layer having openings; ferro-electric capacitors formed in the lamination of insulator; wiring structure formed in the lamination of insulator and connected to the semiconductor elements and the ferro-electric capacitors; pad electrodes connected to the wiring structure, formed in the lamination of insulator and exposed in the openings of the passivation film; a conductive pad protection film, including a Pd film, covering each pad electrode via the opening of the passivation film, and extending on the passivation film; and stud bump or bonding wire connected to the pad electrode via the conductive pad protection film. | 03-08-2012 |
20120061821 | SEMICONDUCTOR CHIP WITH REDUNDANT THRU-SILICON-VIAS - A semiconductor chip with conductive vias and a method of manufacturing the same are disclosed. The method includes forming a first plurality of conductive vias in a layer of a first semiconductor chip. The first plurality of conductive vias includes first ends and second ends. A first conductor pad is formed in ohmic contact with the first ends of the first plurality of conductive vias. | 03-15-2012 |
20120061822 | Semiconductor Device and Method of Forming Base Substrate With Cavities Formed Through Etch-Resistant Conductive Layer for Bump Locking - A semiconductor device has a base substrate with first and second etch-resistant conductive layers formed over opposing surfaces of the base substrate. First cavities are etched in the base substrate through an opening in the first conductive layer. The first cavities have a width greater than a width of the opening in the first conductive layer. Second cavities are etched in the base substrate between portions of the first or second conductive layer. A semiconductor die is mounted over the base substrate with bumps disposed over the first conductive layer. The bumps are reflowed to electrically connect to the first conductive layer and cause bump material to flow into the first cavities. An encapsulant is deposited over the die and base substrate. A portion of the base substrate is removed down to the second cavities to form electrically isolated base leads between the first and second conductive layers. | 03-15-2012 |
20120061823 | SEMICONDUCTOR DEVICE HAVING PAD STRUCTURE WITH STRESS BUFFER LAYER - A semiconductor device has a pad structure with a ring-shaped stress buffer layer between a metal pad and an under-bump metallization (UBM) layer. The stress buffer layer is formed of a dielectric layer with a dielectric constant less than 3.5, a polymer layer, or an aluminum layer. The stress buffer layer is a circular ring, a square ring, an octagonal ring, or any other geometric ring. | 03-15-2012 |
20120061824 | SEMICONDUCTOR DEVICE AND METHOD OF FORMING BOND-ON-LEAD INTERCONNECTION FOR MOUNTING SEMICONDUCTOR DIE IN FO-WLCSP - A semiconductor die has a conductive layer including a plurality of trace lines formed over a carrier. The conductive layer includes a plurality of contact pads electrically continuous with the trace lines. A semiconductor die has a plurality of contact pads and bumps formed over the contact pads. A plurality of conductive pillars can be formed over the contact pads of the semiconductor die. The bumps are formed over the conductive pillars. The semiconductor die is mounted to the conductive layer with the bumps directly bonded to an end portion of the trace lines to provide a fine pitch interconnect. An encapsulant is deposited over the semiconductor die and conductive layer. The conductive layer contains wettable material to reduce die shifting during encapsulation. The carrier is removed. An interconnect structure is formed over the encapsulant and semiconductor die. An insulating layer can be formed over the conductive layer. | 03-15-2012 |
20120061825 | CHIP SCALE PACKAGE AND METHOD OF FABRICATING THE SAME - A chip scale package and a method of fabricating the chip scale package. The chip scale package includes a encapsulant having a first surface and a second surface opposing the first surface; a conductive pillar formed in the encapsulant and exposed from the first surface and the second surface; a chip embedded in the encapsulant while exposed from the first surface; a dielectric layer formed on the first surface, the conductive pillar and the chip; a circuit layer formed on the dielectric layer; a plurality of conductive blind vias formed in the dielectric layer electrically connecting the circuit layer, electrode pads and the conductive pillar; and a solder mask layer formed on the dielectric layer and the circuit layer, thereby using conductive pillars to externally connect with other electronic devices as required to form a stacked structure. | 03-15-2012 |
20120061826 | SEMICONDUCTOR DEVICE - A device includes a substrate, a semiconductor chip, first and second pads, and a first wiring layer. The substrate includes first and second surfaces. The semiconductor chip includes third and fourth surfaces. The third surface faces toward the first surface. The first and second pads are provided on the third surface. The first and second pads are connected to each other. The first wiring layer is provided on the second surface of the substrate. The first wiring layer is connected to the first pad. | 03-15-2012 |
20120061827 | SEMICONDUCTOR DEVICE - A semiconductor device includes a semiconductor substrate having a first surface, a through silicon via (TSV) that is formed so that at least a part thereof penetrates through the semiconductor substrate, and an insulation ring. The insulation ring is formed so as to penetrate through the semiconductor substrate and so as to surround the TSV. The insulation ring includes a tapered portion and a vertical portion. The tapered portion has a sectional area which is gradually decreased from the first surface toward a thickness direction of the semiconductor substrate. The vertical portion has a constant sectional area smaller than the tapered portion. | 03-15-2012 |
20120061828 | SEMICONDUCTOR DEVICE AND LAYOUT METHOD OF SEMICONDUCTOR DEVICE - A semiconductor device that is resin-sealed in a wafer level after a rewiring layer forming process and a metal post forming process forming a metal post are performed on a semiconductor substrate of the semiconductor device includes devices formed on the semiconductor substrate. Further all of the devices are disposed in respective positions other than positions overlapping a peripheral border of the metal post when viewed from a top of the semiconductor substrate. | 03-15-2012 |
20120061829 | METHOD FOR MANUFACTURING SUBSTRATE FOR SEMICONDUCTOR ELEMENT, AND SEMICONDUCTOR DEVICE - A manufacturing method of a substrate for a semiconductor element, wherein a first step includes: forming a first and second photosensitive resin layer on a first and second surface of a metal plate, respectively; forming a first and second resist pattern on the first and second surface, for forming a connection post and a wiring pattern, respectively. A second step includes: forming the connection post and wiring pattern; filling in a premold liquid resin to the first surface which was etched; forming a premold resin layer by hardening the premold liquid resin; performing a grinding operation on the first surface, and exposing an upper bottom surface of the connection post from the premold resin layer. A groove structure is formed by the first and second steps, wherein a depth of the groove is up to an intermediate part in a thickness direction of the metal plate. | 03-15-2012 |
20120061830 | BACK SIDE PROTECTIVE STRUCTURE FOR A SEMICONDUCTOR PACKAGE - A back side protective structure for a semiconductor package provided with a conductive layer, which is elastic and contains conductive material, formed between a protection substrate and an adhesive layer for having the protection substrate more stably fixed on the semiconductor package and protecting the back side of the semiconductor package. | 03-15-2012 |
20120061831 | SEMICONDUCTOR PACKAGE AND METHOD FOR MAKING THE SAME - A semiconductor package includes: a semiconductor substrate; an inner insulator layer formed on the substrate; at least one internal wiring extending from a front side of the substrate along one of lateral sides of the substrate to a rear side of the substrate; a first outer insulator layer disposed at the front side of the substrate, formed on the internal wiring, and formed with at least one wire-connecting hole; and a second outer insulator layer disposed at the rear side of the substrate, formed on the internal wiring, and formed with at least one wire-connecting hole which exposes a portion of the internal wiring. | 03-15-2012 |
20120068332 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH POST AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit packaging system includes: providing a stack substrate with a component side; connecting an integrated circuit component to the component side; attaching a conductive post to the component side and adjacent the integrated circuit component, the conductive post having a protruded end above the integrated circuit component; forming a protection layer on a top and sides of the protruded end, the protection layer having a width equal to a width of the conductive post; applying a stack encapsulation over the integrated circuit component, over the stack substrate, and around a portion of the conductive post, the protection layer exposed from the stack encapsulation; and mounting a base package under the stack substrate, base package connected to the stack substrate. | 03-22-2012 |
20120068333 | Wire Bond Through-Via Structure and Method - A stackable integrated circuit chip layer and module device that avoids the use of electrically conductive elements on the external surfaces of a layer containing an integrated circuit die by taking advantage of conventional wire bonding equipment to provide an electrically conductive path defined by a wire bond segment that is encapsulated in a potting material so as to define an electrically conductive wire bond “through-via” accessible from at least the lower or second surface of the layer. | 03-22-2012 |
20120068334 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - Semiconductor devices of embodiments include a plurality of solder bumps electrically connected on a plurality of electrode pads disposed on a semiconductor substrate in parallel at a pitch of 40 μm or less via under bump metals. The ratio of the diameter (the top diameter) of the portion of each solder bump most away from the semiconductor substrate and the diameter (the bottom diameter) of the bottom side of each solder bump is 1:1 to 1:4. | 03-22-2012 |
20120068335 | PRINTED CIRCUIT BOARD HAVING HEXAGONALLY ALIGNED BUMP PADS FOR SUBSTRATE OF SEMICONDUCTOR PACKAGE, AND SEMICONDUCTOR PACKAGE INCLUDING THE SAME - Provided are a printed circuit board (PCB) having hexagonally aligned bump pads as a substrate of a semiconductor package, and a semiconductor package including the same. The PCB includes: a PCB body; a bottom metal layer at a bottom of the PCB body; and a top metal layer at a top of the PCB body, and the top metal layer includes: vias vertically connected to the PCB body; bump pads hexagonally aligned in a horizontal direction around the vias; and connection patterns connecting the vias to two or more of the bump pads. Accordingly, the number of bump pads in a unit area of the PCB may be increased. | 03-22-2012 |
20120068336 | Method for Fabricating a Neo-Layer Using Stud Bumped Bare Die - A method for fabricating a stackable integrated circuit layer and a device made from the method are disclosed. A stud bump is defined on the contact pad of an integrated circuit die and the stud-bumped die encapsulated in a potting material to define a potted assembly. A predetermined portion of the potting material is removed whereby a portion of the stud bump is exposed. One or more electrically conductive traces are defined on the layer surface and in electrical connection with the stud bump to reroute the integrated circuit contacts to predetermined locations on the layer to provide a stackable neolayer. | 03-22-2012 |
20120068337 | Semiconductor Device and Method of Forming Composite Bump-on-Lead Interconnection - A semiconductor device has a semiconductor die mounted to a substrate with a plurality of composite interconnects formed between interconnect sites on the substrate and bump pads on the die. The interconnect sites are part of traces formed on the substrate. The interconnect site has a width between 1.0 and 1.2 times a width of the trace. The composite interconnect is tapered. The composite interconnects have a fusible portion connected to the interconnect site and non-fusible portion connected to the bump pad. The non-fusible portion can be gold, copper, nickel, lead solder, or lead-tin alloy. The fusible portion can be tin, lead-free alloy, tin-silver alloy, tin-silver-copper alloy, tin-silver-indium alloy, eutectic solder, or other tin alloys with silver, copper, or lead. An underfill material is deposited between the semiconductor die and substrate. A finish such as Cu—OSP can be formed over the substrate. | 03-22-2012 |
20120074562 | Three-Dimensional Integrated Circuit Structure with Low-K Materials - A device includes an interposer free from active devices therein. The interposer includes a substrate; a through-substrate via (TSV) penetrating through the substrate; and a low-k dielectric layer over the substrate. | 03-29-2012 |
20120074563 | Semiconductor apparatus and the method of manufacturing the same - A semiconductor apparatus includes a semiconductor chip, a post electrode positioned on the front surface electrode, and a metal particle layer having metal particles bonded actively to each other. The front surface electrode and the post electrode are bonded with each other through the metal particle layer. A method of manufacturing a semiconductor apparatus includes the steps of coating metal particles protected with organic coating films to at least one of the front surface electrode of a semiconductor chip or the post electrode; pressing and heating the metal particles between the front surface electrode of the semiconductor chip and post electrode for breaking the organic coating films and for exposing the metal particles; and actively bonding the exposed metal particles to each other for bonding the front surface electrode and post electrode. | 03-29-2012 |
20120074564 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME - A semiconductor device comprises a semiconductor substrate having a connection pad, an external connection electrode provided on the semiconductor substrate to be connected to the connection pad, and a sealing film provided to cover the external connection electrode, wherein an opening is provided in the sealing film to expose a center of the upper surface of the external connection electrode, and the sealing film is provided to cover an outer peripheral part of the upper surface of the external connection electrode. | 03-29-2012 |
20120074565 | SEMICONDUCTOR DEVICE PROVIDED WITH REAR PROTECTIVE FILM ON OTHER SIDE OF SEMICONDUCTOR SUBSTRATE AND MANUFACTURING METHOD OF THE SAME - An opening is formed in a part of a rear protective film corresponding to the center of a dicing street by laser processing which applies a laser beam. The rear protective film is formed on the lower surface of a semiconductor wafer, and made of a resin. By using a resin cutting blade, parts of a sealing film and the upper side of the semiconductor wafer corresponding to the dicing street and both its sides are then cut to form a trench. By using a silicon cutting blade, parts of the semiconductor wafer and the rear protective film corresponding to the dicing street are then cut. In this case, cutting of the rear protective film with the silicon cutting blade is reduced by the opening. | 03-29-2012 |
20120080786 | ELECTRONIC COMPONENT AND METHOD FOR MANUFACTURING THE SAME - An electronic component including a wiring board having interlayer insulation layers and conductive patterns, the wiring board having a first surface and a second surface on the opposite side of the first surface, multiple first bumps formed on a first conductive pattern positioned on the first surface of the wiring board among the conductive patterns of the wiring board, a semiconductor element mounted on the first surface of the wiring board through the first bumps, an encapsulating resin encapsulating the semiconductor element and at least a portion of a side surface of the wiring board, the side surface of the wiring board extending between the first surface and second surface of the wiring board, and multiple of second bumps formed on the second surface of the wiring board and connected to a second conductive pattern of the conductive patterns in the wiring board. | 04-05-2012 |
20120080787 | Electronic Package and Method of Making an Electronic Package - An electrical package and a method of forming the electrical package, where the electrical package has a substrate with a frontside, an intergrated circuit coupled to the frontside of the substrate, and at least one non-collapsible metal connector created on the frontside of the first substrate. | 04-05-2012 |
20120080788 | SEMICONDUCTOR DEVICE HAVING MULTILAYER WIRING STRUCTURE AND MANUFACTURING METHOD OF THE SAME - Disclosed is a semiconductor device | 04-05-2012 |
20120080789 | SEMICONDUCTOR CHIP AND MOUNTING STRUCTURE OF THE SAME (as amended) - Provided is a semiconductor chip having a narrowed pitch between terminals, the chip being capable of suppressing occurrence of poor connection between the chip and a substrate on which the chip is mounted. In an LSI chip including an input bump group, which is composed of a plurality of input bumps aligned in a line along one long side of its bottom surface, and an output bump group, which is composed of a plurality of output bumps arranged in a staggered manner along the other long side of the bottom surface, a dummy bump group is provided in an area between an area where the input bump group is provided and an area where the output bump group is provided, the dummy bump group including a plurality of rectangular dummy bumps which have long side extending along a direction perpendicular to the long sides of the bottom surface. | 04-05-2012 |
20120086118 | SEMICONDUCTOR PACKAGE AND METHOD OF FABRICATING THE SAME - Provided is a semiconductor package and a method of fabricating the same. The semiconductor package includes: a package body including a plurality of sheets; semiconductor chips mounted in the package body; and an external connection terminal provided on a first side of the package body, wherein the sheets are stacked in a parallel direction to the first side. | 04-12-2012 |
20120086119 | CHIP STACKED STRUCTURE - A chip stacked structure is provided. The chip stacked structure includes a first die and a second die stacked on the first die. The first die has a plurality of connection structures each which has a through hole, a connection pad and a solder bump. The connection pad has a terminal connected to the through hole. The solder bump is disposed on the connection pad and located around the through hole. The second die has a plurality of through holes which are aligned and bonded to the solder bump respectively. The chip stacked structure may simplify the process and improve the process yield rate. | 04-12-2012 |
20120086120 | STACKED SEMICONDUCTOR PACKAGE HAVING CONDUCTIVE VIAS AND METHOD FOR MAKING THE SAME - The present invention relates to a stacked semiconductor package and a method for making the same. The method includes the steps of: forming and curing a first protective layer to cover a plurality of first bumps of a first wafer; cutting the first wafer to form a plurality of first dice; forming a third protective layer to cover a plurality of second bumps of a second wafer; picking up the first dice through the first protective layer, and bonding the first dice to the second wafer; removing part of the first protective layer; cutting the second wafer to form a plurality of second dice; and bonding the first dice and the second dice to a substrate. Whereby, the first protective layer can protect the first bumps, and the first protective layer can increase the total thickness and the flatness. | 04-12-2012 |
20120086121 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE - A semiconductor device includes an insulating film base member and a wiring pattern that is formed on the insulating film base member. The wiring pattern has a surface, with at least a peripheral section of the surface being a peeled surface of the wiring pattern peeled from the insulating film base member. The semiconductor device further includes a plating layer that covers the surface of the wiring pattern, and an IC chip that has an active surface with a bump bonded to the wiring pattern. The peeled surface of the wiring pattern is peeled from the insulating film base member around a bonding position of the wiring pattern bonded with the bump. | 04-12-2012 |
20120091574 | CONDUCTIVE PILLAR STRUCTURE - The invention relates to a bump structure of a semiconductor device. An exemplary structure for a semiconductor device comprises a substrate; a contact pad over the substrate; a passivation layer extending over the substrate having an opening over the contact pad; and a conductive pillar over the opening of the passivation layer, wherein the conductive pillar comprises an upper portion substantially perpendicular to a surface of the substrate and a lower portion having tapered sidewalls. | 04-19-2012 |
20120091575 | Semiconductor Package And Method For Making The Same - The present invention relates to a semiconductor package and a method for making the same. The semiconductor package includes a substrate, at least one first chip, a dielectric layer and at least one second chip. The first chip is attached and electrically connected to the substrate. The first chip includes a first active surface and a plurality of first signal coupling pads. The first signal coupling pads are disposed adjacent to the first active surface. The dielectric layer is disposed on the first active surface. The second chip is attached and electrically connected to the substrate by metal bumps. The second chip includes a second active surface and a plurality of second signal coupling pads. The second active surface contacts the dielectric layer. The second signal coupling pads are disposed adjacent to the second active surface, and capacitively coupled to the first signal coupling pads of the first chip, so as to provide proximity communication between the first chip and the second chip. Whereby, the gap between the first signal coupling pads of the first chip and the second signal coupling pads of the second chip is controlled by the thickness of the dielectric layer. Therefore, the mass-production yield of the semiconductor package is increased. | 04-19-2012 |
20120091576 | UNDER-BUMP METALLIZATION (UBM) STRUCTURE AND METHOD OF FORMING THE SAME - An under-bump metallization (UBM) structure in a semiconductor device includes a copper layer, a nickel layer, and a Cu—Ni—Sn intermetallic compound (IMC) layer between the copper layer and the nickel layer. | 04-19-2012 |
20120091577 | COPPER PILLAR BUMP WITH COBALT-CONTAINING SIDEWALL PROTECTION - An integrated circuit device includes a Cu pillar and a solder layer overlying the Cu pillar. A Co-containing metallization layer is formed to cover the Cu pillar and the solder layer, and then a thermally reflow process is performed to form a solder bump and drive the Co element into the solder bump. Next, an oxidation process is performed to form a cobalt oxide layer on the sidewall surface of the Cu pillar. | 04-19-2012 |
20120091578 | SEMICONDUCTOR CHIP HAVING DIFFERENT PAD WIDTH TO UBM WIDTH RATIOS AND METHOD OF MANUFACTURING THE SAME - The present application describes an semiconductor chip having a substrate, a first conductive pad formed over the substrate, a second conductive pad formed over the substrate and positioned farther from a geometric center of the semiconductor chip than the first conductive pad, a first under bump metallurgy (UBM) structure formed over the first conductive pad, and a second UBM structure formed over the second conductive pad. The first conductive pad and the first UBM structure has a first pad width to UBM width ratio, and the second conductive pad and the second UBM structure has a second pad width to UBM width ratio that is greater than the first ratio. | 04-19-2012 |
20120091579 | Semiconductor Packages And Methods Of Fabricating The Same - A semiconductor package includes a wiring board including an upper connection pad provided on a first surface and a lower connection pad provided on a second surface opposite to the first surface, a semiconductor chip having a bonding pad area in which a bonding pad is provided and an adhesive area except the bonding pad area, and being mounted on the first surface of the wiring board in a flip-chip manner such that the bonding pad is electrically connected to the upper connection pad, a first molding layer provided between the adhesive area of the semiconductor chip and the first surface of the wiring board, and a second molding layer provided between the bonding pad area of the semiconductor chip and the first area of the wiring board while covering the first surface of the wiring board and the semiconductor chip. The first molding layer has a lower modulus than the second molding layer. | 04-19-2012 |
20120091580 | Semiconductor Devices And Methods Of Fabricating The Same - Provided is a semiconductor device. The semiconductor device may include a first semiconductor chip that includes a first through silicon via having a first protrusion height and a second through silicon via having a second protrusion height greater than the first protrusion height which are penetrating at least a portion of the first semiconductor chip, a second semiconductor chip may be electrically connected to the first through silicon via, and a third semiconductor chip may be electrically connected to the second through silicon via. | 04-19-2012 |
20120091581 | PACKAGE UNIT AND STACKING STRUCTURE THEREOF - A package unit and a stacking structure thereof are provided. The package unit includes a substrate, a first patterned circuit layer, a first conductive pillar, a semiconductor element, an insulation layer, a second conductive pillar, a third conductive pillar, a second patterned circuit layer and a conductive bump. The first patterned circuit layer is disposed on a surface of the substrate. The first conductive pillar is deposited through the substrate. The semiconductor element is disposed on the substrate. The insulation layer covers the semiconductor element and the substrate. The second conductive pillar is deposited through the insulation layer. The third conductive pillar is deposited through the insulation layer. The second patterned circuit layer is disposed on the insulation layer. The conductive bump is disposed on the second patterned metal layer. | 04-19-2012 |
20120091582 | MICROELECTRONIC ASSEMBLIES HAVING COMPLIANCY AND METHODS THEREFOR - A microelectronic assembly is disclosed that includes a semiconductor wafer with contacts, compliant bumps of dielectric material overlying the first surface of the semiconductor wafer, and a dielectric layer overlying the first surface of the semiconductor wafer and edges of the compliant bumps. The compliant bumps have planar top surfaces which are accessible through the dielectric layer. Conductive traces may be electrically connected with contacts and extend therefrom to overlie the planar top surfaces of the compliant bumps. Conductive elements may overlie the planar top surfaces in contact with the conductive traces. | 04-19-2012 |
20120091583 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - In a semiconductor device in which a plurality of semiconductor chips are stacked, performance is enhanced without deteriorating productivity. The semiconductor device has a plurality of elements, an interlayer insulating film, a pad, and a bump electrode electrically connected with the pad sequentially formed on a main surface of a silicon substrate and has a back-surface electrode formed on a back surface of the silicon substrate and electrically connected with the bump electrode. The bump electrode has a protruding portion penetrating through the pad and protruding toward the silicon substrate side. The back-surface electrode is formed so as to reach the protruding portion of the bump electrode from the back surface side of the silicon substrate toward the main surface side and to cover the inside of a back-surface electrode hole portion which does not reach the pad, so that the back-surface electrode is electrically connected with the bump electrode. | 04-19-2012 |
20120098120 | CENTRIPETAL LAYOUT FOR LOW STRESS CHIP PACKAGE - A low-stress chip package is disclosed. The package includes two substrates. The first substrate includes an array of first conductive structures in the corner area of the chip, and an array of second conductive structures in the peripheral edge area of the chip. The first and second conductive structures each has a conductive pillar having elongated cross section in the plane parallel to the first substrate and a solder bump over the pillar. The package also includes a second substrate having an array of metal traces. The elongated pillars each form a coaxial bump-on-trace interconnect with a metal trace respectively. The long axis of the elongated cross section of a pillar in the corner area of the chip points to chip's center area, and the long axis of the elongated cross section of a pillar in chip's peripheral edge area aligns perpendicular to the edge. | 04-26-2012 |
20120098121 | CONDUCTIVE FEATURE FOR SEMICONDUCTOR SUBSTRATE AND METHOD OF MANUFACTURE - A conductive feature on a semiconductor component is disclosed. A first passivation layer is formed over a substrate. A bond pad is formed over the first passivation layer. A second passivation layer overlies the first passivation layer and the bond pad. The second passivation layer has a first opening overlying the bond pad and a plurality of second openings exposing a top surface of the first passivation layer. A buffer layer overlies the second passivation layer and fills the plurality of second openings. The buffer layer has a third opening overlapping the first opening and together exposes a portion the bond pad. The combined first opening and third opening has sidewalls. An under bump metallurgy (UBM) layer overlies the sidewalls of the combined first opening and third opening, and contacts the exposed portion of the bond pad. A conductive feature overlies the UBM layer. | 04-26-2012 |
20120098122 | WAFER LEVEL PACKAGING OF MICRO-ELECTRO-MECHANICAL SYSTEMS (MEMS) AND COMPLEMENTARY METAL-OXIDE-SEMICONDUCTOR (CMOS) SUBSTRATES - The embodiments of methods and structures for forming through silicon vias a CMOS substrate bonded to a MEMS substrate and a capping substrate provide mechanisms for integrating CMOS and MEMS devices that use less real-estate and are more reliable. The through silicon vias electrically connect to metal-1 level of the CMOS devices. Copper metal may be plated on a barrier/Cu-seed layer to partially fill the through silicon vias, which saves time and cost. The formation method may involve using dual dielectric layers on the substrate surface as etching mask to eliminate a photolithographical process during the removal of oxide layer at the bottoms of through silicon vias. In some embodiments, the through silicon vias land on polysilicon gate structures to prevent notch formation during etching of the vias. | 04-26-2012 |
20120098123 | Molded Chip Interposer Structure and Methods - Apparatus and methods for providing a molded chip interposer structure and assembly. A molded chip structure having at least two integrated circuit dies disposed within a mold compound is provided having the die bond pads on the bottom surface; and solder bumps are formed in the openings of a dielectric layer on the bottom surface, the solder bumps forming connections to the bond pads. An interposer having a die side surface and a board side surface is provided having bump lands receiving the solder bumps of the molded chip structure on the die side of the interposer. An underfill layer is formed between the die side of the interposer and the bottom surface of the molded chip structure surrounding the solder bumps. Methods for forming the molded chip interposer structure are disclosed. | 04-26-2012 |
20120098124 | SEMICONDUCTOR DEVICE HAVING UNDER-BUMP METALLIZATION (UBM) STRUCTURE AND METHOD OF FORMING THE SAME - A semiconductor device has a UBM (under-bump metallization) structure underlying and electrically connected to a solder bump. The UBM structure has a first metallization layer with a first cross-sectional dimension d | 04-26-2012 |
20120098125 | INTEGRATED CIRCUIT PACKAGE AND PHYSICAL LAYER INTERFACE ARRANGEMENT - An integrated circuit (IC) package includes an IC chip and a package carrier. The IC chip includes a substrate and an IC layered structure configured on an active surface of the substrate. The IC layered structure includes a first physical layer interface and a second physical layer interface. The first physical layer interface includes a plurality of first bump pads and a plurality of first inner pads electrically connected to the first bump pads, respectively. The second physical layer interface includes a plurality of second bump pads and a plurality of second inner pads electrically connected to the second bump pads, respectively. The second bump pads are mirror images of the first bump pads with respect to a first geometric plane perpendicular to the active surface. The second inner pads are mirror images of the first inner pads with respect to the first geometric plane. | 04-26-2012 |
20120098126 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR - The joint reliability in flip chip bonding of a semiconductor device is enhanced. Prior to flip chip bonding, flux | 04-26-2012 |
20120098127 | POWER/GROUND LAYOUT FOR CHIPS - Embodiments of the present disclosure provide a chip that comprises a base metal layer formed over a first semiconductor die and a first metal layer formed over the base metal layer. The first metal layer includes a plurality of islands configured to route at least one of (i) a ground signal or (ii) a power signal in the chip. The chip further comprises a second metal layer formed over the first metal layer. The second metal layer includes a plurality of islands configured to route at least one of (i) the ground signal or (ii) the power signal in the chip. | 04-26-2012 |
20120098128 | CHIP STRUCTURE AND PROCESS FOR FORMING THE SAME - A chip with a metallization structure and an insulating layer with first and second openings over first and second contact points of the metallization structure, a first circuit layer connecting the first and second contact points and comprising a first trace portion, first and second via portions between the first trace portion and the first and second contact points, the first circuit layer comprising a copper layer and a first conductive layer under the copper layer and at a sidewall of the first trace portion, and a second circuit layer comprising a second trace portion with a third via portion at a bottom thereof, wherein the second circuit layer comprises another copper layer and a second conductive layer under the other copper layer and at a sidewall of the second trace portion, and a second dielectric layer comprising a portion between the first and second circuit layers. | 04-26-2012 |
20120104594 | GROUNDED SEAL RING STRUCTURE IN SEMICONDUCTOR DEVICES - A semiconductor device includes a substrate having a seal ring region and a circuit region, at least one corner bump disposed in the circuit region, a seal ring structure disposed in the seal ring region, and a connector electrically coupling a metal layer of the seal ring structure to the at least one corner bump. The at least one corner bump is configured to be coupled to a signal ground. A method of fabricating a semiconductor device includes providing a substrate having a seal ring region and a circuit region, providing at least one corner bump in a triangular corner bump zone in the circuit region, providing a seal ring structure in the seal ring region, electrically coupling a metal layer of the seal ring structure to the at least one corner bump, and electrically coupling the at least one corner bump to a signal ground. | 05-03-2012 |
20120104595 | NO FLOW UNDERFILL - A method for making a microelectronic assembly includes providing a microelectronic element with first conductive elements and a dielectric element with second conductive elements. At least some of either the first conductive elements or the second conductive elements may be conductive posts and other of the first or second conductive elements may include a bond metal disposed between some of the conductive posts. An underfill layer may overly some of the first or second conductive elements. At least one of the first conductive elements may be moved towards the other of the second conductive elements so that the posts pierce the underfill layer and at least deform the bond metal. The microelectronic element and the dielectric element can be heated to join them together. The height of the posts above the surface may be at least forty percent of a distance between surfaces of the microelectronic element and dielectric element. | 05-03-2012 |
20120104596 | FLIP CHIP BUMP ARRAY WITH SUPERIOR SIGNAL PERFORMANCE - An integrated circuit ( | 05-03-2012 |
20120104597 | CHIP-ON-CHIP STRUCTURE AND MANUFACTURING METHOD THEROF - According to an embodiment, a chip-on-chip structure includes a first chip, a second chip, the first chip and the second chip being opposite to each other, a first electrode terminal, a second electrode terminal, a bump and a protecting material. The first electrode terminal is provided on the surface of the first chip at the side of the second chip. The second electrode terminal is provided on the surface of the second chip at the side of the first chip. The bump electrically connects the first electrode terminal and the second electrode terminal. The protecting material is formed around the bump between the first chip and the second chip. The protecting material includes a layer made of a material having heat-sensitive adhesive property. | 05-03-2012 |
20120104598 | PACKAGE STRUCTURE HAVING EMBEDDED SEMICONDUCTOR COMPONENT AND FABRICATION METHOD THEREOF - A package structure having an embedded semiconductor component, includes: a chip having an active surface with electrode pads and an inactive surface opposite to the active surface; a first insulating protection layer having a chip mounting area for the chip to be mounted thereon via the active surface thereof; a plurality of connection columns disposed in the first insulating protection layer at positions corresponding to the electrode pads and electrically connected to the electrode pads via solder bumps; an encapsulant formed on one surface of the first insulating protection layer having the chip mounted thereon for encapsulating the chip; and a built-up structure formed on the other surface of the first insulating protection layer and the connection columns. Due to the bending resistance of the encapuslant, the warpage of the built-up structure is prevented. | 05-03-2012 |
20120104599 | Semiconductor Package Having Semiconductor Die with Internal Vertical Interconnect Structure and Method Therefor - A semiconductor wafer is made by forming a first conductive layer over a sacrificial substrate, mounting a semiconductor die to the sacrificial substrate, depositing an insulating layer over the semiconductor die and first conductive layer, exposing the first conductive layer and contact pad on the semiconductor die, forming a second conductive layer over the insulating layer between the first conductive layer and contact pad, forming solder bumps on the second conductive layer, depositing an encapsulant over the semiconductor die, first conductive layer, and interconnect structure, and removing the sacrificial substrate after forming the encapsulant to expose the conductive layer and semiconductor die. A portion of the encapsulant is removed to expose a portion of the solder bumps. The solder bumps are sized so that each extends the same outside the encapsulant. The semiconductor die are stacked by electrically connecting the solder bumps. | 05-03-2012 |
20120104600 | STRUCTURE, SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURING A SEMICONDUCTOR STRUCTURE AND PACKAGING THEREOF - A design structure is embodied in a machine readable medium for designing, manufacturing, or testing a design. The design structure includes a dielectric material formed between a design sensitive structure and a passivation layer. The design sensitive structure comprising a lower wiring layer electrically and mechanically connected to a higher wiring level by a via farm. A method and structure is also provided. | 05-03-2012 |
20120104601 | Semiconductor Device and Method of Forming Wafer Level Ground Plane and Power Ring - A semiconductor die has active circuits formed on its active surface. Contact pads are formed on the active surface of the semiconductor die and coupled to the active circuits. A die extension region is formed around a periphery of the semiconductor die. Conductive THVs are formed in the die extension region. A wafer level conductive plane or ring is formed on a center area of the active surface. The conductive plane or ring is connected to a first contact pad to provide a first power supply potential to the active circuits, and is electrically connected to a first conductive THV. A conductive ring is formed partially around a perimeter of the conductive plane or ring and connected to a second contact pad for providing a second power supply potential to the active circuits. The conductive ring is electrically connected to a second THV. | 05-03-2012 |
20120104602 | SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND CIRCUIT DEVICE USING SEMICONDUCTOR DEVICE - [Problem] A semiconductor device which achieves a fine pitch, a high throughput and a high connection reliability, especially in flip-chip mounting is provided. A method for manufacturing the semiconductor device and a circuit device using the semiconductor device are also provided. | 05-03-2012 |
20120104603 | INTERCONNECT ASSEMBLIES AND METHODS OF MAKING AND USING SAME - The various embodiments of the present invention provide fine pitch, chip-to-substrate interconnect assemblies, as well as methods of making and using the assemblies. The assemblies generally include a semiconductor having a die pad and a bump disposed thereon and a substrate having a substrate pad disposed thereon. The bump is configured to electrically interconnect at least a portion of the semiconductor with at least a portion of the substrate when the bump is contacted with the substrate pad. In addition, when the bump is contacted to the substrate pad, at least a portion of the bump and at least a portion of the substrate pad are deformed so as to create a non-metallurgical bond therebetween. | 05-03-2012 |
20120112342 | SEMICONDUCTOR DEVICE AND STACKED SEMICONDUCTOR PACKAGE - A semiconductor device includes a first structural body having a first surface and a second surface which faces away from the first surface, and formed with first electrode pads on the first surface, a stress buffer layer formed on the first electrode pads and the first surface of the first structural body, and having a plurality of holes which expose the first electrode pads, and a plurality of bumps formed to be electrically connected with the first electrode pads through the plurality of holes, wherein the plurality of bumps include first bumps which are filled in corresponding holes of the plurality of holes and second bumps which are formed on the first bumps and the stress buffer layer and are disposed over the first electrode pads and portions of the first surface outside the first electrode pads. | 05-10-2012 |
20120112343 | ELECTROPLATED POSTS WITH REDUCED TOPOGRAPHY AND STRESS - Bond pads on an integrated circuit are provided with planarizing dielectric structures to permit the electroplating of metal posts having planar top surfaces. The metal posts contact at least three sides of the planarizing dielectric structures. The planarizing dielectric structures can be used on integrated circuits having bond pads of different sizes to electroplate metal posts having the same height. | 05-10-2012 |
20120112344 | SUBSTRATE FOR SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THEREOF - Disclosed is a substrate for a semiconductor package in which leakage of radiation noise from a gap between a semiconductor element and a mounting substrate can be prevented. The substrate for the semiconductor package includes a coplanar waveguide including a signal and ground electrodes on the mounting substrate, the signal electrode flip-chip connected to the semiconductor element, the ground electrodes arranged on both sides of the signal electrode with intervals therebetween. A step part is formed in the ground electrodes in an outer circumferential part of a mounting region of the semiconductor element, the step part having a larger distance between upper surfaces of the mounting substrate and the ground electrode in the outer circumferential part of the mounting region than such distance in the mounting region, and an insulator for covering the signal electrode in the outer circumferential part of the mounting region is formed. | 05-10-2012 |
20120119354 | Protecting Flip-Chip Package using Pre-Applied Fillet - A die has a first surface, a second surface opposite the first surface, and sidewalls includes a first portion and a second portion, wherein the first portion is closer to the first surface than the second portion. A fillet contacts the first portion of sidewalls of the die and encircles the die. A work piece is bonded to the die through solder bumps, with the second surface facing the work piece. A first underfill is filled a gap between the die and the work piece, wherein the first underfill contacts the fillet, and wherein the first underfill and the fillet are formed of different materials. | 05-17-2012 |
20120119355 | INTEGRATED CIRCUIT STRUCTURE AND METHOD OF FORMING THE SAME - A method of forming an integrated circuit structure comprises the steps of: providing a semiconductor substrate having a first side and a second side opposite the first side; forming a hole extending from the first side of the semiconductor substrate into the semiconductor substrate; filling the hole with conductive material; thinning the second side of the semiconductor substrate to a first predetermined thickness, so that the bottom of the hole does not protrude from the second side of the semiconductor substrate; and etching the second side of the semiconductor to substrate to a second predetermined thickness, thereby exposing the bottom of the hole. | 05-17-2012 |
20120119356 | SEMICONDUCTOR APPARATUS AND SEMICONDUCTOR DEVICE - A semiconductor apparatus includes a semiconductor chip in which a plurality of electrode pads are provided on a main surface, and a plurality of bump electrodes are provided on the electrode pads of the semiconductor chip. The semiconductor apparatus also includes a wired board which is allocated in a side of the main surface of the semiconductor chip, and is positioned in a central area of the main surface of the semiconductor chip so as to be separated from an edge part of the semiconductor chip by at least 50 μm or more. The semiconductor apparatus also includes a plurality of external terminals which are provided on the wired board, and which are electrically connected to a plurality of bump electrodes through wirings of the wired board, and sealing part which is provided between the semiconductor chip and the wired board, is made of underfill material that covers a connection part between the bump electrode and the wiring. | 05-17-2012 |
20120119357 | SEMICONDUCTOR APPARATUS - A semiconductor apparatus having stacked first and second chips includes a first through line of the first chip configured to receive a first coding signal and be electrically connected to a first through line of the second chip; a second through line of the first chip configured to receive a second coding signal; and a second through line of the second chip configured to be electrically connected to the first through line of the first chip and receive the first coding signal. | 05-17-2012 |
20120119358 | SEMICONDIUCTOR PACKAGE SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME - Disclosed herein is a semiconductor package substrate including: a substrate for package having connection pads; and a solder resist layer formed on one surface or both surfaces of the substrate for package and having openings exposing the connection pads, wherein the solder resist layer includes a roughness layer formed thereon. | 05-17-2012 |
20120119359 | BUMP STRUCTURE AND SEMICONDUCTOR PACKAGE HAVING THE BUMP STRUCTURE - Provided are a bump structure includes a first bump and a second bump, a semiconductor package including the same, and a method of manufacturing the same. The bump structure includes: first bump provided on a connection pad of a substrate, the first bump including a plurality of nano-wires extending from the connection pad and a body connecting end portions of the plurality of nano-wires; and a second bump provided on the body of the first bump. | 05-17-2012 |
20120119360 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH CONNECTION STRUCTURE AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit packaging system includes: providing a substrate; attaching a connection post to the substrate, the connection post having a post top and a post side; mounting an integrated circuit die on the substrate, the integrated circuit die having a top die surface; and forming a package body on the substrate, the connection post, and the integrated circuit die. | 05-17-2012 |
20120119361 | Semiconductor Device and Method of Forming Overlapping Semiconductor Die with Coplanar Vertical Interconnect Structure - A semiconductor device is made by forming first and interconnect structures over a first semiconductor die. A third interconnect structure is formed in proximity to the first die. A second semiconductor die is mounted over the second and third interconnect structures. An encapsulant is deposited over the first and second die and first, second, and third interconnect structures. A backside of the second die is substantially coplanar with the first interconnect structure and a backside of the first semiconductor die is substantially coplanar with the third interconnect structure. The first interconnect structure has a height which is substantially the same as a combination of a height of the second interconnect structure and a thickness of the second die. The third interconnect structure has a height which is substantially the same as a combination of a height of the second interconnect structure and a thickness of the first die. | 05-17-2012 |
20120126394 | INTEGRATED CIRCUIT DEVICE AND METHOD FOR PREPARING THE SAME - An integrated circuit device includes a bottom wafer, at least one stacking wafer positioned on the bottom wafer, and at least one conductive via penetrating through the stacking wafer and into the bottom wafer in a substantially linear manner, wherein the bottom wafer and the stacking wafer are bonded by an intervening adhesive layer, and no bump pad is positioned between the bottom wafer and the stacking wafer. A method for preparing an integrated circuit device includes the steps of forming a bottom wafer, forming at least one stacking wafer, bonding the at least one stacking wafer to the bottom wafer by an intervening adhesive layer, and forming at least one conductive via penetrating through the stacking wafer and into the bottom wafer in a substantially linear manner, wherein no bump pad is positioned between the bottom wafer and the stacking wafer. | 05-24-2012 |
20120126395 | Semiconductor Device and Method of Forming Uniform Height Insulating Layer Over Interposer Frame as Standoff for Semiconductor Die - A semiconductor device has an interposer frame having a die attach area. A uniform height insulating layer is formed over the interposer frame at corners of the die attach area. The insulating layer can be formed as rectangular or circular pillars at the corners of the die attach area. The insulating layer can also be formed in a central region of the die attach area. A semiconductor die has a plurality of bumps formed over an active surface of the semiconductor die. The bumps can have a non-fusible portion and fusible portion. The semiconductor die is mounted over the insulating layer which provides a uniform standoff distance between the semiconductor die and interposer frame. The bumps of the semiconductor die are bonded to the interposer frame. An encapsulant is deposited over the semiconductor die and interposer frame and between the semiconductor die and interposer frame. | 05-24-2012 |
20120126396 | DIE DOWN DEVICE WITH THERMAL CONNECTOR - Methods and apparatuses for a die down device with a thermal connector are provided. In an embodiment, an integrated circuit (IC) device includes an IC die having opposing first and second surfaces, a thermal connector coupled to the first surface of the IC die, and a substrate. The second surface of the IC die is coupled to the substrate. The thermal connector is configured to be coupled to a circuit board. | 05-24-2012 |
20120126397 | SEMICONDUCTOR SUBSTRATE AND METHOD THEREOF - A semiconductor substrate includes a substrate having plurality of electrical contact pads formed thereon, a first insulating protective layer formed on the substrate that exposes the electrical contact pads, a plurality of metal layers formed on the exposed electrical contact pads, a second insulating protective layer formed on the first insulating protective layer that exposes a portion of the metal layers, and a plurality of solder bumps formed on the exposed metal layers having copper. Through the second insulating protective layer covering a portion of the metal layers, the solder bumps are prevented from falling off or crack when the semiconductor substrate is under a temperature test. | 05-24-2012 |
20120126398 | INTEGRATED CIRCUIT PACKAGE AND PHYSICAL LAYER INTERFACE ARRANGEMENT - An integrated circuit (IC) package includes an IC chip, a package carrier, and a plurality of conductive bumps connecting the IC chip to the package carrier. The IC chip includes a substrate and an IC layered structure configured on an active surface of the substrate. The active surface has a core area and a signal area surrounding the core area. The IC layered structure includes a first physical layer interface. The first physical layer interface includes a plurality of first bump pads and a plurality of first inner pads electrically connected to the first bump pads, respectively. The first inner pads are arranged in multiple rows in the signal area. | 05-24-2012 |
20120126399 | THERMALLY ENHANCED SEMICONDUCTOR ASSEMBLY WITH BUMP/BASE/FLANGE HEAT SPREADER AND BUILD-UP CIRCUITRY - A semiconductor assembly includes a semiconductor device, a heat spreader, an adhesive and a build-up circuitry. The heat spreader includes a bump, a base and a flange. The bump defines a cavity. The semiconductor device is mounted on the bump at the cavity, electrically connected to the build-up circuitry and thermally connected to the bump. The bump extends from the base into an opening in the adhesive, the base extends vertically from the bump opposite the cavity and the flange extends laterally from the bump at the cavity entrance. The build-up circuitry includes a dielectric layer and conductive traces on the semiconductor device and the flange. The conductive traces provide signal routing for the semiconductor device. | 05-24-2012 |
20120126400 | SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME - A semiconductor package may include a package substrate, a first semiconductor chip and a second semiconductor chip. The first semiconductor chip may be arranged on the package substrate. The first semiconductor chip may have a plug electrically connected to the package substrate and at least one insulating hole arranged around the plug. The second semiconductor chip may be arranged on the first semiconductor chip. The second semiconductor chip may be electrically connected to the plug. Thus, the insulating hole and the insulating member may ensure an electrical isolation between the plug and the first semiconductor chip, and between the plugs. | 05-24-2012 |
20120126401 | STACKABLE SEMICONDUCTOR ASSEMBLY WITH BUMP/BASE/FLANGE HEAT SPREADER AND ELECTROMAGNETIC SHIELDING - A stackable semiconductor assembly includes a semiconductor device, a heat spreader, an adhesive, a terminal, a plated through-hole and build-up circuitry. The heat spreader includes a bump, a base and a flange. The bump defines a cavity. The semiconductor device is mounted on the bump at the cavity, electrically connected to the build-up circuitry and thermally connected to the bump. The bump extends from the base into an opening in the adhesive, the base extends vertically from the bump opposite the cavity and the flange extends laterally from the bump at the cavity entrance. The build-up circuitry provides signal routing for the semiconductor device. The plated through-hole provides signal routing between the build-up circuitry and the terminal. The heat spreader provides heat dissipation for the semiconductor device. | 05-24-2012 |
20120126402 | SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME - A semiconductor device includes a wiring board; a stack of semiconductor chips disposed over the wiring board, each of the semiconductor chip comprising via electrodes, the semiconductor chips being electrically coupled through the via electrodes to each other, the semiconductor chips being electrically coupled through the via electrodes to the wiring board; a first seal that seals the stack of semiconductor chips; and a second seal that covers the first seal. The first seal is smaller in elastic modulus than the second seal. | 05-24-2012 |
20120126403 | SEMICONDUCTOR DEVICE - Signals outputted from an I/O buffer with a parallel drive configuration are stabilized for reliability enhancement. Each I/O cell has a complementary I/O cell that outputs one output signal as a complementary signal made up of a non-inverted signal and an inverted signal. Two I/O cells are coupled in parallel. Output portions of first inverters are coupled together through a first wiring; and output portions of second inverters are coupled together through a second wiring. The first wiring is formed on the lower side of the I/O cells so that it is astride the two I/O cells, and the second wiring is formed above the first wiring so that it is astride the two I/O cells. The wirings are laid out so that the wiring length of the first wiring and the wiring length of the second wiring are substantially equal to each other. | 05-24-2012 |
20120126404 | SEMICONDUCTOR DEVICE - In a semiconductor device comprising a semiconductor chip, electrodes formed on the major surface of the semiconductor chip, and a wiring board for mounting the semiconductor chip, for example, wirings for electrically connecting the wirings of the wiring board to the electrodes are provided. As the wirings, those relaxing stress generated between the semiconductor chip and the wiring board are used. | 05-24-2012 |
20120126405 | SOLDER INTERCONNECT PADS WITH CURRENT SPREADING LAYERS - Structure and methods of making the structures. The structures include a structure, comprising: an organic dielectric passivation layer extending over a substrate; an electrically conductive current spreading pad on a top surface of the organic dielectric passivation layer; an electrically conductive solder bump pad comprising one or more layers on a top surface of the current spreading pad; and an electrically conductive solder bump containing tin, the solder bump on a top surface of the solder bump pad, the current spreading pad comprising one or more layers, at least one of the one or more layers consisting of a material that will not form an intermetallic with tin or at least one of the one or more layers is a material that is a diffusion barrier to tin and adjacent to the solder bump pad. | 05-24-2012 |
20120133041 | Semiconductor Devices Having Electrodes and Methods of Fabricating the Same - Some embodiments provide a semiconductor device including a substrate having a first surface and an opposite second surface. An electrode extends within the substrate towards the first surface and has a protruding portion extending from the first surface. A supporting portion extends from the first surface of the substrate to a sidewall of the protruding portion that supports the protruding portion. Methods of fabricating the same are also provided. | 05-31-2012 |
20120133042 | MOUNTING STRUCTURE OF CHIP AND MODULE USING THE SAME - A mounting structure of chip comprises a substrate having a base, a chip on the upper surface of the base, and adhesive agents which bonds the base and the first chip. The adhesive agent is applied to the upper surface of the base. The chip has a rectangular shape to have a width and a length, and is bonded at its lower surface to the base. The adhesive agents comprises the first adhesive agent, the second adhesive agent, and the third adhesive agent which are disposed on the three spots of the upper surface of the base, respectively. The three spots on the base are located on vertexes of a triangle. The first chip is bonded to the base by only the first adhesive agent, the second adhesive agent, and the third adhesive agent. | 05-31-2012 |
20120133043 | Solder Joint Flip Chip Interconnection - A flip chip interconnect has a tapering interconnect structure, and the area of contact of the interconnect structure with the site on the substrate metallization is less than the area of contact of the interconnect structure with the die pad. Also, a bond-on-lead or bond-on-narrow pad or bond on a small area of a contact pad interconnection includes such tapering flip chip interconnects. Also, methods for making the interconnect structure include providing a die having interconnect pads, providing a substrate having interconnect sites on a patterned conductive layer, providing a bump on a die pad, providing a fusible electrically conductive material either at the interconnect site or on the bump, mating the bump to the interconnect site, and heating to melt the fusible material. | 05-31-2012 |
20120139102 | DISPOSING UNDERFILL IN AN INTEGRATED CIRCUIT STRUCTURE - In one embodiment, a method of forming a multi-die semiconductor device is provided. A plurality of dice is mounted on a semiconductor substrate, and neighboring ones of the dice are separated by a distance at which a first one of the neighboring dice will contact a meniscus of a flange of the neighboring die during underfill to form a capillary bridge between the neighboring dice. Solder bumps are reflowed to electrically connect contact terminals of the plurality of dice to contact terminals on a top surface of the substrate. Underfill is deposited along one or more edges of one or more of the plurality of dice. As a result of the capillary bridge formed between neighboring dice, flow of underfill is induced between the bottom surfaces of the neighboring dice and the top surface of the substrate. The dispensed underfill is cured. | 06-07-2012 |
20120139103 | SEMICONDUCTOR DEVICE WITH STACKED POWER CONVERTER - A semiconductor device with a stacked power converter is described. In some examples, a semiconductor device includes: a first integrated circuit (IC) die having bond pads and solder bumps, the bond pads configured for wire-bonding; and a second IC die mounted on the first IC die, the second IC die having an active side and a backside opposite the active side, the second IC die including bond pads on the active side configured for wire-bonding, and solder bumps disposed on a backside opposite the active side; where the solder bumps of the first IC die are electrically and mechanically coupled to the solder bumps of the second IC die to form bump bonds. | 06-07-2012 |
20120139104 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH PAD CONNECTION AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit packaging system includes: forming a lead having a lead bottom side and a lead top side; applying a passivation over the lead with the lead top side exposed from the passivation; forming an interconnect structure directly on the passivation and the lead top side, the interconnect structure having an inner pad and an outer pad with a recess above the lead top side; mounting an integrated circuit over the inner pad and the passivation; and molding an encapsulation over the integrated circuit. | 06-07-2012 |
20120139105 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF - A manufacturing method of a semiconductor structure includes providing a substrate having an upper surface and a bottom surface. First openings are formed in the substrate. An oxidization process is performed to oxidize the substrate having the first openings therein to form an oxide-containing material layer, and the oxide-containing material layer has second openings therein. A conductive material is filled into the second openings to form conductive plugs. A first device layer is formed a first surface of the oxide-containing material layer, and is partially or fully electrically connected to the conductive plugs. A second device layer is formed on a second surface of the oxide-containing material layer, and is partially or fully electrically connected to the conductive plugs. | 06-07-2012 |
20120139106 | Semiconductor Device and a Method of Manufacturing the Same - A semiconductor device manufacturing technique which allows reduction of semiconductor chip size. First, a pad and other wires are formed over an insulating film. A surface protective film is formed over the insulating film including the pad and wires, and an opening is made in the surface protective film. The opening lies over the pad and exposes a surface of the pad. A bump electrode is formed over the surface protective film including the opening. Here, the pad is smaller than the bump electrode. Consequently, the wires are arranged just beneath the bump electrode in the same layer as the pad | 06-07-2012 |
20120139107 | SEMICONDUCTOR CHIP AND SEMICONDUCTOR DEVICE USING THE CHIP - A semiconductor chip includes at least one electrode pad formed on a substrate; a protective film formed on the substrate and the electrode pad, and having an opening exposing the electrode pad; an under barrier metal layer formed on the electrode pad to cover an edge of the opening of the protective film; and a bump formed on the under barrier metal layer. A contact angle between the under barrier metal layer and the protective film is less than 90° at an edge of the under barrier metal layer. A contact angle between the bump and the under barrier metal layer is less than 90° at an edge of the bump. | 06-07-2012 |
20120146212 | SOLDER BUMP CONNECTIONS - Solder bump connections and methods for fabricating solder bump connections. The method includes forming a layer stack containing first and second conductive layers, forming a dielectric passivation layer on a top surface of the second conductive layer, and forming a via opening extending through the dielectric passivation layer to the top surface of the second conductive layer. The method further includes forming a conductive plug in the via opening. The solder bump connection includes first and second conductive layers comprised of different conductors, a dielectric passivation layer on a top surface of the second conductive layer, a via opening extending through the dielectric passivation layer to the top surface of the second conductive layer, and a conductive plug in the via opening. | 06-14-2012 |
20120146213 | HIGH PERFORMANCE LOW PROFILE QFN/LGA - A method for manufacturing a semiconductor device is disclosed. In one embodiment a semiconductor die is formed overlying a substrate. The semiconductor die is flip chip mounted to the substrate, wherein the substrate comprises a plurality of conductive traces. The semiconductor die and substrate are encapsulated with an encapsulating material. A top side of the encapsulating material is subjected to one of polishing, etching, and grinding to expose a top side of the semiconductor die. Finally, the bottom side of the substrate is subjected to one of polishing, etching, and grinding to remove the substrate and to reduce a thickness of the plurality of conductive traces. | 06-14-2012 |
20120146214 | SEMICONDUCTOR DEVICE WITH VIAS AND FLIP-CHIP - Semiconductor devices comprising a flip-chip having passive circuits such as spiral inductors on the back side are disclosed. | 06-14-2012 |
20120146215 | BONDING PAD STRUCTURE AND INTEGRATED CIRCUIT COMPRISING A PLURALITY OF BONDING PAD STRUCTURES - A bonding pad structure positioned on an integrated circuit includes a connecting pad, an insulation layer and a gold bump. The connecting pad is formed on the integrated circuit. The insulation layer is formed on the connecting pad, where the insulation layer has only one opening and a shape of the opening includes at least a bend. The gold bump is formed on the insulation layer, where the gold bump is electrically connected to the connecting pad through the opening of the insulation layer. | 06-14-2012 |
20120146216 | SEMICONDUCTOR PACKAGE AND FABRICATION METHOD THEREOF - A semiconductor package is provided. The package includes a package substrate with a first surface and a second surface on the opposite side, and a plurality of via sets connecting vertically the first surface with the second surface, said via sets having a plurality of micro vias and filled with conductive material. The micro vias are grouped together, and the distance between micro vias in the via set is smaller than the distance between neighboring via sets. | 06-14-2012 |
20120146217 | CONDUCTIVE PAD STRUCTURE, CHIP PACKAGE STRUCTURE AND DEVICE SUBSTRATE - A conductive pad structure, configured in a peripheral circuit area of a device substrate, is provided. The conductive pad structure includes a conductive pad and a plurality of conductive spacers. The conductive spacers are configured on the conductive pad and arranged as a non-closed pattern on the conductive pad. Besides, a chip package structure and a device substrate that both have the above-mentioned conductive pad structure are also provided. | 06-14-2012 |
20120153458 | IC DEVICE HAVING ELECTROMIGRATION RESISTANT FEED LINE STRUCTURES - An integrated circuit (IC) device includes an electromigration resistant feed line. The IC device includes a substrate including active circuitry. A back end of the line (BEOL) metallization stack includes an interconnect metal layer that is coupled to a bond pad by the EM resistant feed line. A bonding feature is on the bond pad. The feed line includes a uniform portion and patterned trace portion that extends to the bond pad which includes at least three sub-traces that are electrically in parallel. The sub-traces are sized so that a number of squares associated with each of the sub-traces are within a range of a mean number of squares for the sub-traces plus or minus twenty percent or a current density provided to the bonding feature through each sub-trace is within a range of a mean current density provided to the bonding feature plus or minus twenty percent. | 06-21-2012 |
20120153459 | METHOD FOR CHIP SCALE PACKAGE AND PACKAGE STRUCTURE THEREOF - This invention provides a method for chip scale package and a chip scale package structure. The chip scale package structure includes: a semiconductor substrate, on which sets a plurality of contact bonding pads being connected with semiconductor devices; and a plurality of bumps respectively attached to all of the contact bonding pads. The semiconductor substrate is divided into several regions according to different distances from a central point. The contact bonding pads and the bumps in the region which is closest to the central point are the smallest, while the contact bonding pads and the bumps in the region which is farthest to the central point are the largest. The invention effectively improves the situation that the bumps at the edge tend to flake off easily; in addition, it avoids short-circuit caused by bridging between the bumps. | 06-21-2012 |
20120153460 | BUMP STRUCTURE AND MANUFACTURING METHOD THEREOF - A manufacturing method of a bump structure is provided. A substrate having at least one pad and a passivation layer is provided. The passivation layer has at least one first opening exposing the pad. An insulating layer is formed on the passivation layer. The insulating layer has at least one second opening located above the first opening. A metal layer is formed on the insulating layer. The metal layer electrically connects the pad through the first and second openings. A first bump is formed in the first and second openings. A second bump is formed on the first bump and a portion of the metal layer. The metal layer not covered by the second bump is partially removed by using the second bump as a mask, so as to form at least one UBM layer. The first bump is completely covered by the UBM layer and the second bump. | 06-21-2012 |
20120153461 | SEMICONDUCTOR COMPONENT, SEMICONDUCTOR WAFER COMPONENT, MANUFACTURING METHOD OF SEMICONDUCTOR COMPONENT, AND MANUFACTURING METHOD OF JOINING STRUCTURE - A semiconductor component of the present invention includes a semiconductor element and a joining layer formed on one surface of the semiconductor element and consisting of a joining material containing Bi as an essential ingredient, and projecting sections are formed on a surface of the joining layer on a side opposite to a surface in contact with the semiconductor element. By joining the semiconductor component to an electrode arranged so as to face the joining layer, the generation of a void can be suppressed. | 06-21-2012 |
20120153462 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A semiconductor device includes a semiconductor element; a pad electrode that is formed on the semiconductor element; an alignment mark that is formed on the semiconductor element; a connection electrode that is formed on the pad electrode; and an underfill resin that is formed to cover the connection electrode. The height of the alignment mark from the semiconductor element is greater than that of the connection electrode. | 06-21-2012 |
20120153463 | MULTILAYER WIRING SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - To provide a multilayer wiring substrate in which the connection reliability of via conductors is enhanced, via holes are formed in a resin interlayer insulation layer which isolates a lower conductor layer from an upper conductor layer, and via conductors are formed in the via holes for connecting the lower conductor layer and the upper conductor layer. The surface of the resin interlayer insulation layer is a rough surface, and the via holes open at the rough surface of the resin interlayer insulation layer. Stepped portions are formed in opening verge regions around the via holes such that the stepped portions are recessed from peripheral regions around the opening verge regions. The stepped portions are higher in surface roughness than the peripheral regions. | 06-21-2012 |
20120153464 | LOCALIZED ALLOYING FOR IMPROVED BOND RELIABILITY - Methods of forming gold-aluminum electrical interconnects are described. The method may include interposing a diffusion retardant layer between the gold and the aluminum, the diffusion retardant layer including regions containing and regions substantially devoid of a diffusion retardant material; bringing into contact the diffusion retardant layer, the gold, and the aluminum; forming alloys of gold and the diffusion retardant material in regions containing the material and forming gold-aluminum intermetallic compounds in regions substantially devoid of the material; and forming a continuous electrically conducting path between the aluminum and the gold. A structure for gold-aluminum interconnect is provided. The structure may include an aluminum alloy bond pad and a diffusion retardant layer in contact with the bond pad, the diffusion retardant layer including regions containing and regions substantially devoid of a diffusion retardant material. The structure may include a gold free air ball in contact with the diffusion retardant layer. | 06-21-2012 |
20120153465 | PACKAGE STRUCTURE - The invention discloses a package structure including a semiconductor device, a first protection layer, a second protection layer and at least one conductive bump. The semiconductor device has at least one pad. The first protection layer is disposed on the semiconductor device and exposes the pad. The second protection layer, disposed on the first protection layer, has at least one first opening and at least one second opening. The first opening exposes a partial surface of the pad. The second opening exposes a partial surface of the first protection layer. The conductive bump, opposite to the pad, is disposed on the second protection layer and coupled to the pad through the first openings. | 06-21-2012 |
20120153466 | PACKAGE STRUCTURE - A package structure including a first semiconductor element, a second semiconductor element, a semiconductor interposer and a substrate is provided. The first semiconductor element includes multiple first conductive bumps. The second semiconductor element includes multiple second conductive bumps. The semiconductor interposer includes a connection motherboard, at least one signal wire and at least one signal conductive column. The signal wire is disposed on the connection motherboard. The two ends of the signal wire are electrically connected to one of the first conductive bumps and one of the second conductive bumps respectively. The signal conductive column is electrically connected to the signal wire. The substrate is electrically connected to the signal conductive column. The first and the second semiconductor elements have the same circuit structure. The substrate of the package structure can simultaneously form a signal communication path with the first and the second semiconductor element respectively. | 06-21-2012 |
20120153467 | Semiconductor Device and Method of Forming Thin Profile WLCSP with Vertical Interconnect over Package Footprint - A semiconductor wafer has a plurality of first semiconductor die. A second semiconductor die is mounted to the first semiconductor die. The active surface of the first semiconductor die is oriented toward an active surface of the second semiconductor die. An encapsulant is deposited over the first and second semiconductor die. A portion of a back surface of the second semiconductor die opposite the active surface is removed. Conductive pillars are formed around the second semiconductor die. TSVs can be formed through the first semiconductor die. An interconnect structure is formed over the back surface of the second semiconductor die, encapsulant, and conductive pillars. The interconnect structure is electrically connected to the conductive pillars. A portion of a back surface of the first semiconductor die opposite the active surface is removed. A heat sink or shielding layer can be formed over the back surface of the first semiconductor die. | 06-21-2012 |
20120153468 | Elimination of RDL Using Tape Base Flip Chip on Flex for Die Stacking - A flexible film interposer for stacking a flip chip semiconductor die onto a second (bottom) semiconductor die, semiconductor devices and stacked die assemblies that incorporate the flexible film interposer, and methods of fabricating the devices and assemblies are provided. The incorporation of the flexible film interposer achieves densely packaged semiconductor devices, without the need for a redistribution layer (RDL). | 06-21-2012 |
20120153469 | MICRO ELECTRONIC MECHANICAL SYSTEM STRUCTURE - A micro electronic mechanical system structure and a manufacturing method thereof are provided. A substrate has a plurality of conductive regions is provided. A dielectric layer is formed on the substrate. A plurality of openings and recesses are formed in the dielectric layer, wherein the openings expose the conductive regions. The recesses are located between the openings. A conductive layer is formed on the dielectric layer and the openings and the recesses are filled with the conductive layer. The conductive layer is patterned to form a plurality of strips of the first conductive patterns on the dielectric layer and a second conductive pattern on the sidewall and the bottom of each recess, wherein the first conductive patterns are connected with each other through the second conductive patterns. The dielectric layer is removed. The second conductive patterns between the first conductive patterns are removed. | 06-21-2012 |
20120161312 | NON-SOLDER METAL BUMPS TO REDUCE PACKAGE HEIGHT - Electronic assemblies and their manufacture are described. One assembly includes a substrate and a die on a first side of the substrate. A plurality of non-solder metal bumps are positioned on a second side of the substrate. The assembly also includes a board to which the non-solder metal bumps are coupled. The assembly also includes solder positioned between the board and the substrate, wherein the board is electrically coupled to the substrate through the solder and the bumps. Other embodiments are described and claimed. | 06-28-2012 |
20120161313 | SEMICONDUCTOR DEVICE, AND INSPECTION METHOD THEREOF - In a substrate for a stacking-type semiconductor device including a connection terminal provided for a connection with a semiconductor chip to be stacked and an external terminal connected to the connection terminal through a conductor provided in a substrate, connection terminals of a power supply, a ground and the like, which terminals have an identical node, are electrically continuous with each other. Thus, it is possible to facilitate an inspection of electrical continuity between each connection terminal and an external terminal corresponding to each connection terminal by minimum addition of inspecting terminals. Further, it is possible to improve reliability of a stacking-type semiconductor module. | 06-28-2012 |
20120161314 | TEMPLATE WAFER AND PROCESS FOR SMALL PITCH FLIP-CHIP INTERCONNECT HYBRIDIZATION - A process is disclosed for high density indium bumping of microchips by using an innovative template wafer upon which the bumps are initially fabricated. Once fabricated, these bumps are transferred to the microchip, after which can be hybridized to another microchip. Such a template wafer is reusable, and thus provides an economical way to fabricate indium bumps. Reusability also eliminates nonuniformities in bump shape and size in serial processing of separate microchips, which is not the case for other indium bump fabrication processes. Such a fabrication process provides a way to form relatively tall indium bumps and accomplishes this without the standard thick photoresist liftoff process. The described process can be suitable for bump pitches under 10 microns, and is only limited by the resolution of the photolithography equipment used. | 06-28-2012 |
20120168933 | WAFER LEVEL MOLDING STRUCTURE - A wafer level molding structure and a manufacturing method thereof are provided. A molding structure includes a first chip and a second chip and an adhesive layer there between. The first chip includes a first back side, a first front side and a plurality of lateral sides, in which a plurality of first front side bumps are disposed on the first front side. The second chip includes a second back side and a second front side, and a plurality of second back side bumps and second front side bumps are respectively disposed on the second back side and the second front side. A plurality of through-hole vias is disposed in the second chip, and electrically connected the second back side bumps to the second front side bumps. Adhesive materials covering the lateral sides of the first chip, and electrically connect the second back side bumps with the first front side bumps. The adhesive materials include a plurality of conductive particles and/or a plurality of non-conductive particles. | 07-05-2012 |
20120168934 | FLIP CHIP DEVICE HAVING SIMPLIFIED ROUTING - The present disclosure is directed to a semiconductor die having a chip outline boundary, a die seal, a row of input/output contact pads separated from the chip outline boundary by the die seal, a first row of solder bump connections positioned between the row of input/output contact pads and the die seal, and a second row of solder bump connections separated from the first row of solder bump connections by the row of input/output contact pads. | 07-05-2012 |
20120168935 | INTEGRATED CIRCUIT DEVICE AND METHOD FOR PREPARING THE SAME - An integrated circuit device includes a bottom wafer having a first annular dielectric block, at least one stacking wafer having a second annular dielectric block positioned on the bottom wafer, and a conductive via penetrating through the stacking wafer and into the bottom wafer in a substantially linear manner. In one embodiment of the present invention, the bottom wafer and the stacking wafer are bonded by an intervening adhesive layer, no bump pad is positioned between the bottom wafer and the stacking wafer, and the conductive via is positioned within the first annular dielectric block and the second annular dielectric block. | 07-05-2012 |
20120168936 | MULTI-CHIP STACK PACKAGE STRUCTURE AND FABRICATION METHOD THEREOF - A multi-chip stack package structure includes: an inner-layer heat sink having a first surface and a second surface opposing one another and having a plurality of conductive vias penetrating the first surface and the second surface; a first chip disposed on the first surface of the inner-layer heat sink; and a second chip disposed on the second surface of the inner-layer heat sink. Thereby, a heat-dissipating path is provided within inner-layers of the multi-chip stack package structure, and the rigidity of the overall structure is enhanced. | 07-05-2012 |
20120168937 | FLIP CHIP PACKAGE AND METHOD OF MANUFACTURING THE SAME - A flip chip package and a method of manufacturing the same are provided. The flip chip package include: a package substrate, a semiconductor chip and conductive hollow bumps. The semiconductor chip may be arranged over an upper surface of the package substrate. The conductive hollow bumps may be interposed between the semiconductor chip and the package substrate to electrically connect the semiconductor chip with the package substrate. Thus, a wide gap may be formed between the semiconductor chip and the package substrate by the thick conductive hollow bumps. As a result, a sufficient amount of the molding member may be supplied to each of the conductive hollow bumps to surround each of the conductive hollow bumps. | 07-05-2012 |
20120168938 | PLASMA TREATMENT ON SEMICONDUCTOR WAFERS - A semiconductor wafer has integrated circuits formed thereon and a top passivation layer applied. The passivation layer is patterned and selectively etched to expose contact pads on each semiconductor die. The wafer is exposed to ionized gas causing the upper surface of passivation layer to roughen and to slightly roughen the upper surface of the contact pads. The wafer is cut to form a plurality of semiconductor dies each with a roughened passivation layer. The plurality of semiconductor dies are placed on an adhesive layer and a reconstituted wafer formed. Redistribution layers are formed to complete the semiconductor package having electrical contacts for establishing electrical connections external to the semiconductor package, after which the wafer is singulated to separate the dice. | 07-05-2012 |
20120168939 | CHIP PACKAGE AND METHOD FOR FORMING THE SAME - An embodiment of the invention provides a chip package which includes: a first chip; a second chip disposed on the first chip; a hole extending from a surface of the first chip towards the second chip; a conducting layer disposed on the surface of the first chip and extending into the hole and electrically connected to a conducting region or a doped region in the first chip; and a support bulk disposed between the first chip and the second chip, wherein the support bulk substantially and/or completely covers a bottom of the hole. | 07-05-2012 |
20120168940 | APPARATUS AND METHOD OF APPLYING A FILM TO A SEMICONDUCTOR WAFER AND METHOD OF PROCESSING A SEMICONDUCTOR WAFER - Implementations and techniques for applying a film to a semiconductor wafer and for processing a semiconductor wafer are generally disclosed. | 07-05-2012 |
20120168941 | STACKABLE ELECTRONIC PACKAGE AND METHOD OF MAKING SAME - An apparatus comprises a first chip layer comprising a first component coupled to a first side of a first flex layer, the first component comprising a plurality of electrical pads. The first chip layer also comprises a first plurality of feed-thru pads coupled to the first side of the first flex layer and a first encapsulant encapsulating the first component, the first encapsulant having a portion thereof removed to form a first plurality of cavities in the first encapsulant and to expose the first plurality of feed-thru pads by way of the first plurality of cavities. | 07-05-2012 |
20120175767 | SEMICONDUCTOR PACKAGE WITH THROUGH SILICON VIAS AND METHOD FOR MAKING THE SAME - The present invention relates to a stacked semiconductor package and a method for making the same. The method includes the steps of mounting a plurality of first dice to a wafer by conducting a reflow process; and thinning the wafer from the backside surface of the wafer, thereby reducing manufacturing time and preventing warpage. | 07-12-2012 |
20120175768 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device includes: a semiconductor chip including a main surface electrode; a first mounting lead; a second mounting lead; a connection lead which overlaps with the main surface electrode, the first mounting lead and the second mounting lead when viewed in a thickness direction of the semiconductor chip and makes electrical conduction between the main surface electrode, the first mounting lead and the second mounting lead; and a resin portion which covers the semiconductor chip, the first mounting lead and the second mounting lead, wherein the resin portion has a resin bottom lying on the same plane as a bottom of the first mounting lead and a bottom of the second mounting lead. | 07-12-2012 |
20120175769 | Semiconductor Device and Method of Dissipating Heat From Thin Package-on-Package Mounted to Substrate - A semiconductor device has a first substrate with a central region. A plurality of bumps is formed around a periphery of the central region of the first substrate. A first semiconductor die is mounted to the central region of the first substrate. A second semiconductor die is mounted to the first semiconductor die over the central region of the first substrate. A height of the first and second die is less than or equal to a height of the bumps. A second substrate has a thermal conduction channel. A surface of the second semiconductor die opposite the first die is mounted to the thermal conductive channel of the second substrate. A thermal interface layer is formed over the surface of the second die. The bumps are electrically connected to contact pads on the second substrate. A conductive plane is formed over a surface of the second substrate. | 07-12-2012 |
20120175770 | Semiconductor Device and Method of Forming Conductive Pillars in Recessed Region of Peripheral Area around the Device for Electrical Interconnection to Other Devices - A semiconductor wafer contains a plurality of semiconductor die each having a peripheral area around the die. A first insulating layer is formed over the die. A recessed region with angled sidewall is formed in the peripheral area. A first conductive layer is formed over the first insulating layer outside the recessed region and further into the recessed region. A conductive pillar is formed over the first conductive layer within the recessed region. A second insulating layer is formed over the first insulating layer, conductive pillar, and first conductive layer such that the conductive pillar is exposed from the second insulating layer. A dicing channel partially through the peripheral area. The semiconductor wafer undergoes backgrinding to the dicing channel to singulate the semiconductor wafer and separate the semiconductor die. The semiconductor die can be disposed in a semiconductor package with other components and electrically interconnected through the conductive pillar. | 07-12-2012 |
20120175771 | Semiconductor Device and Method of Forming No-Flow Underfill Material Around Vertical Interconnect Structure - A semiconductor device is made by forming a conductive layer over a first sacrificial carrier. A solder bump is formed over the conductive layer. A no-flow underfill material is deposited over the first carrier, conductive layer, and solder bump. A semiconductor die or component is compressed into the no-flow underfill material to electrically contact the conductive layer. A surface of the no-flow underfill material and first solder bump is planarized. A first interconnect structure is formed over a first surface of the no-flow underfill material. The first interconnect structure is electrically connected to the solder bump. A second sacrificial carrier is mounted over the first interconnect structure. A second interconnect structure is formed over a second side of the no-flow underfill material. The second interconnect structure is electrically connected to the first solder bump. The semiconductor devices can be stacked and electrically connected through the solder bump. | 07-12-2012 |
20120181686 | METHOD OF PREPARING SEMICONDUCTOR PACKAGE AND SEMICONDUCTOR DIE FOR SEMICONDUCTOR PACKAGE - A method of preparing a semiconductor package including disposing photosensitive adhesive film on a reinterconnected rear surface of a wafer on which the through electrodes are disposed, and forming a pattern corresponding to the through electrodes to prepare the semiconductor package. | 07-19-2012 |
20120181687 | MATERIALS, STRUCTURES AND METHODS FOR MICROELECTRONIC PACKAGING - Highly reliable interconnections for microelectronic packaging. In one embodiment, dielectric layers in a build-up interconnect have a gradation in glass transition temperature; and the later applied dielectric layers are laminated at temperatures lower than the glass transition temperatures of the earlier applied dielectric layers. In one embodiment, the glass transition temperatures of earlier applied dielectric films in a build-up interconnect are increased through a thermosetting process to exceed the temperature for laminating the later applied dielectric films. In one embodiment, a polyimide material is formed with embedded catalysts to promote cross-linking after a film of the polyimide material is laminated (e.g., through photo-chemical or thermal degradation of the encapsulant of the catalysts). In one embodiment, the solder resist opening walls have a wettable layer generated through laser assisted seeding so that there is no gap between the solder resist opening walls and no underfill in the solder resist opening. | 07-19-2012 |
20120181688 | PACKAGING SUBSTRATE WITH CONDUCTIVE STRUCTURE - A packaging substrate with conductive structure is provided, including a substrate body having at least one conductive pad on a surface thereof, a stress buffer metal layer disposed on the conductive pad and a thickness of the stress buffer metal layer being 1-20 μm, a solder resist layer disposed on the substrate body and having at least one opening therein for correspondingly exposing a portion of top surface of the stress buffer metal layer, a metal post disposed on a central portion of the surface of the stress buffer metal layer, and a solder bump covering the surfaces of the metal post. Therefore, a highly reliable conductive structure is provided, by using the stress buffer metal layer to release thermal stresses, and using the metal post and the solder bump to increase the height of the conductive structure. | 07-19-2012 |
20120181689 | Semiconductor Device and Method of Forming Bond Wires and Stud Bumps in Recessed Region of Peripheral Area around the Device for Electrical Interconnection to Other Devices - A semiconductor wafer contains a plurality of semiconductor die each having a peripheral area around the die. A recessed region with angled or vertical sidewall is formed in the peripheral area. A conductive layer is formed in the recessed region. A first stud bump is formed over a contact pad of the semiconductor die. A second stud bump is formed over the first conductive layer within the recessed region. A bond wire is formed between the first and second stud bumps. A third stud bump is formed over the bond wire and first stud bump. A dicing channel partially formed through the peripheral area. The semiconductor wafer undergoes backgrinding to the dicing channel to singulate the semiconductor wafer and separate the semiconductor die. The semiconductor die can be disposed in a semiconductor package with other components and electrically interconnected through the bond wire and stud bumps. | 07-19-2012 |
20120181690 | Semiconductor Device Having Vertically Offset Bond on Trace Interconnects on Recessed and Raised Bond Fingers - A semiconductor device includes a substrate, a first recessed conductive layer embedded and recessed into a first surface of the substrate, and a first raised conductive layer disposed above the first surface. A first vertical offset exists between an upper surface of the first recessed conductive layer and an upper surface of the first raised conductive layer. The device includes a second recessed conductive layer embedded and recessed into a second surface of the substrate. The second surface of the substrate is opposite the first surface. The device includes a second raised conductive layer disposed beneath the second surface and an interconnect structure disposed on the first recessed and raised conductive layers and the second recessed and raised conductive layers. A second vertical offset exists between a lower surface of the second recessed conductive layer and a lower surface of the second recessed conductive layer. | 07-19-2012 |
20120187558 | STRUCTURES FOR IMPROVING CURRENT CARRYING CAPABILITY OF INTERCONNECTS AND METHODS OF FABRICATING THE SAME - Interconnect structures and methods of fabricating the same are provided. The interconnect structures provide highly reliable copper interconnect structures for improving current carrying capabilities (e.g., current spreading). The structure includes an under bump metallurgy formed in a trench. The under bump metallurgy includes at least: an adhesion layer; a plated barrier layer; and a plated conductive metal layer provided between the adhesion layer and the plated barrier layer. The structure further includes a solder bump formed on the under bump metallurgy. | 07-26-2012 |
20120187559 | Semiconductor Device and Method of Forming Column Interconnect Structure to Reduce Wafer Stress - An interconnect pad is formed over a first substrate. A photoresist layer is formed over the first substrate and interconnect pad. A portion of the photoresist layer is removed to form a channel and expose a perimeter of the interconnect pad while leaving the photoresist layer covering a central area of the interconnect pad. A first conductive material is deposited in the channel of the photoresist layer to form a column of conductive material. The remainder of the photoresist layer is removed. A masking layer is formed around the column of conductive material while exposing the interconnect pad within the column of conductive material. A second conductive material is deposited over the first conductive layer. The second conductive material extends above the column of conductive material. The masking layer is removed. The second conductive material is reflowed to form a column interconnect structure over the semiconductor device. | 07-26-2012 |
20120193778 | INTEGRATED CIRCUIT HAVING PROTRUDING BONDING FEATURES WITH REINFORCING DIELECTRIC SUPPORTS - An integrated circuit (IC) die includes a substrate including a topside surface having active circuitry and a bottomside surface. A plurality of protruding bonding features are on the topside surface or bottomside surface and include at least one metal. The protruding bonding features including sidewalls having a neck region that includes an interface at or proximate to the topside surface or the bottomside surface. The protruding bonding features extend outward to a distal top edge. A dielectric support is positioned on the topside surface or bottomside surface between protruding bonding features. The dielectric support contacts and surrounds the sidewalls of the neck regions, does not extend beyond a height of the distal top edge, and is at least twenty percent taller where contacting the sidewalls as compared to a minimum non-zero height in a location between adjacent bonding features. | 08-02-2012 |
20120193779 | SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME - A stack of semiconductor chips, a semiconductor device, and a method of manufacturing are disclosed. The stack of semiconductor chips may comprise a first chip of the stack, a second chip of the stack over the first chip, conductive bumps, a homogeneous integral underfill material, and a molding material. The conductive bumps may extend between an upper surface of the first chip and a lower surface of the second chip. The homogeneous integral underfill material may be interposed between the first chip and the second chip, encapsulate the conductive bumps, and extend along sidewalls of the second chip. The homogeneous integral underfill material may have an upper surface extending in a direction parallel to an upper surface of the second chip and located adjacent the upper surface of the second chip. The molding material may be on outer side surfaces of the homogeneous integral underfill material above the upper surface of the first chip, wherein, in view of a first cross sectional profile, the molding material is separated from sidewalls of the second chip by the homogeneous integral underfill material such that the molding material does not contact sidewalls of the second chip. | 08-02-2012 |
20120193780 | SEMICONDUCTOR MOUNTING DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR MOUNTING DEVICE - A semiconductor mounting device including a first substrate having first insulation layers, first conductor layers formed on the first insulation layers and via conductors connecting the first conductor layers, a second substrate having a core substrate, second conductor layers, through-hole conductors and buildup layers having second insulation layers and third conductor layers, first bumps connecting the first and second substrates and formed on the outermost first conductor layer on the outermost first insulation layer, and second bumps positioned to connect a semiconductor element and formed on the outermost third conductor layer on the outermost second insulation layer. The second substrate has greater thickness than the first substrate, the second conductor layers are formed on surfaces of the core substrate, respectively, the through-hole conductors are formed through the core substrate and connecting the second conductor layers, and the buildup layers are formed on the core substrate and second conductor layers, respectively. | 08-02-2012 |
20120193781 | CUSTOMIZED RF MEMS CAPACITOR ARRAY USING REDISTRIBUTION LAYER - Disclosed is a method for fabricating a customized micro-electromechanical systems (MEMS) integrated circuit using at least one redistribution layer. The method includes steps of providing a substrate on which MEMS components are fabricated and coupling predetermined ones of the MEMS components via the redistribution traces. | 08-02-2012 |
20120193782 | SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND ELECTRONIC DEVICE - A semiconductor device includes a semiconductor element and an electronic element. The semiconductor element has a first protruding electrode, and the electronic element has a second protruding electrode. A substrate is disposed between the semiconductor element and the electronic element. The substrate has a through-hole in which the first and second protruding electrodes are fitted. The first and second protruding electrodes are connected together inside the through-hole of the substrate. | 08-02-2012 |
20120193783 | PACKAGE ON PACKAGE - A package on package is provided herein, the package on package including a first semiconductor package including a first substrate, a first semiconductor chip stacked on the first substrate, a plurality of first connection members on an upper surface of the first substrate and in a first molding material, and a plurality of via holes which respectively expose the plurality of first connection members through the first molding material; a second semiconductor package including a second substrate, a second semiconductor chip stacked on the second substrate, and a plurality of second connection members on a lower surface of the second substrate; and a plurality of connection portions including a plurality of cores and a plurality of conductive fusion layers surrounding the plurality of cores, wherein the plurality of conductive fusion layers contact the upper surface of the first substrate and the lower surface of the second substrate. | 08-02-2012 |
20120193784 | METHOD FOR JOINING BONDING WIRE, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - Provided is a method for joining a bonding wire, the method including wedge-joining a bonding wire which has a core whose main component is a non-noble metal and a noble metal layer covering the core to a bump formed on an electrode of a semiconductor element via the noble metal layer. | 08-02-2012 |
20120193785 | Multichip Packages - Multichip packages or multichip modules may include stacked chips and through silicon/substrate vias (TSVs) formed using enclosure-first technology. Enclosure-first technology may include forming an isolation enclosure associated with a TSV early in the fabrication process, without actually forming the associated TSV. The TSV associated with the isolation enclosure is formed later in the fabrication process. The enclosure-first technology allows the isolation enclosures to be used as alignment marks for stacking additional chips. The stacked chips can be connected to each other or to an external circuit such that data input is provided through the bottom-most (or topmost) chip, data is output from the bottom-most (or topmost) chip. The multichip package may provide a serial data connection, and a parallel connection, to each of the stacked chips. | 08-02-2012 |
20120193786 | CHIP PACKAGE AND METHOD FOR FORMING THE SAME - An embodiment of the invention provides a chip package which includes: a substrate; a device region disposed in or on the substrate; a signal pad disposed in or on the substrate and electrically connected to the device region; a ground pad disposed in or on the substrate; a signal bump disposed on a surface of the substrate, wherein the signal bump is electrically connected to the signal pad through a signal conducting layer; a ground conducting layer disposed on the surface of the substrate and electrically connected to the ground pad; and a protection layer disposed on the surface of the substrate, wherein the protection layer completely covers the entire side terminals of the signal conducting layer and partially covers the ground conducting layer such that a side terminal of the ground conducting layer is exposed on a side of the substrate. | 08-02-2012 |
20120193787 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE - A rewiring is formed by forming a Cu seed layer of copper over an opening and insulating films, forming a photoresist film over the Cu seed layer, a step of forming copper film by plating-growth over the Cu seed layer, and forming a Ni film. After forming an Au film in an opening (pad region) over the rewiring, the photoresist film is removed and passivation processing is performed on the Ni film. Then, the Cu seed layer other than the formation region of the rewiring is etched. According to these steps, a passivation film is formed on the surface of the Ni film and the reduction in film thickness of the Ni film by the etching can be reduced. Furthermore, it is possible to reduce trouble due to distortion of a substrate resulting from an increase in thickness of the Ni film in view of reduction in film thickness. | 08-02-2012 |
20120199966 | Elongated Bump Structure for Semiconductor Devices - An elongated bump structure for semiconductor devices is provided. An uppermost protective layer has an opening formed therethrough. A pillar is formed within the opening and extending over at least a portion of the uppermost protective layer. The portion extending over the uppermost protective layer exhibits a generally elongated shape. In an embodiment, the position of the opening relative to the portion of the bump structure extending over the uppermost protective layer is such that a ratio of a distance from an edge of the opening to an edge of the bump is greater than or equal to about 0.2. In another embodiment, the position of the opening is offset relative to center of the bump. | 08-09-2012 |
20120199967 | Interconnection Structure - An electrical interconnect for connecting an IC chip to a PCB, the electrical interconnect comprising a plurality of connection elements for connection to the PCB attached to a first surface of the electrical interconnect, wherein the amount of thermal and/or mechanical stress that each solder element connection can take before failing is improved. | 08-09-2012 |
20120199968 | SEMICONDUCTOR PACKAGE - A semiconductor package and method of manufacturing thereof are provided. The package includes: a substrate; a first metal wire on a top surface of the substrate; a first semiconductor chip disposed on the substrate; a first insulation layer which covers the first semiconductor chip and at least a part of the substrate; a second metal wire formed on a top surface of the first insulation layer; a first via formed in the first insulation layer, wherein the first via electrically connects the second metal wire and the first metal wire; and a second semiconductor chip disposed on the second metal wire, wherein the second semiconductor chip is electrically connected to the second metal wire. | 08-09-2012 |
20120199969 | SEMICONDUCTOR DEVICE - A semiconductor device has a semiconductor chip mounted on a circuit board. The semiconductor chip includes: a semiconductor substrate; a first pad formed on the semiconductor substrate; a second pad formed on the first pad via an interlayer insulating film; a via formed through the interlayer insulating film for connecting the first pad with the second pad; a protection film that is formed on the second pad and has an opening exposing a center portion of the second pad; and a barrier metal layer formed on the portion of the second pad exposed from the opening of the protection film and on a portion of the protection film surrounding the opening. The diameter of the via is smaller than the diameter of the opening of the protection film, and the center of the via corresponds with the center of the barrier metal layer. | 08-09-2012 |
20120199970 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - A semiconductor device includes a substrate having a via region and a circuit region, an insulation interlayer formed on a top surface of the substrate, a through electrode having a first surface and a second surface, wherein the through electrode penetrates the via region of the substrate and the second surface is substantially coplanar with a bottom surface of the substrate, a first upper wiring formed on a portion of the first surface of the through electrode, a plurality of via contacts formed on a portion of a top surface of the first upper wiring, and a second upper wiring formed on the plurality of via contacts. | 08-09-2012 |
20120199971 | Embedded Semiconductor Die Package and Method of Making the Same Using Metal Frame Carrier - An embedded semiconductor die package is made by mounting a frame carrier to a temporary carrier with an adhesive. The frame carrier includes die mounting sites each including a leadframe interconnect structure around a cavity. A semiconductor die is disposed in each cavity. An encapsulant is deposited in the cavity over the die. A package interconnect structure is formed over the leadframe interconnect structure and encapsulant. The package interconnect structure and leadframe interconnect structure are electrically connected to the die. The frame carrier is singulated into individual embedded die packages. The semiconductor die can be vertically stacked or placed side-by-side within the cavity. The embedded die packages can be stacked and electrically interconnected through the leadframe interconnect structure. A semiconductor device can be mounted to the embedded die package and electrically connected to the die through the leadframe interconnect structure. | 08-09-2012 |
20120199972 | Semiconductor Device and Method of Forming Vertical Interconnect Structure Using Stud Bumps - A semiconductor device is made by forming a conductive layer over a temporary carrier. The conductive layer includes a wettable pad. A stud bump is formed over the wettable pad. The stud bump can be a stud bump or stacked bumps. A semiconductor die is mounted to the carrier. An encapsulant is deposited over the semiconductor die and around the stud bump. A first interconnect structure is formed over a first surface of the encapsulant. The first interconnect structure includes a first IPD and is electrically connected to the stud bump. The carrier is removed. A second interconnect structure is formed over a second surface of encapsulant opposite the first interconnect structure. The second interconnect structure includes a second IPD. The first or second IPD includes a capacitor, resistor, or inductor. The semiconductor devices are stackable and electrically connected through the stud bump. | 08-09-2012 |
20120205794 | SEMICONDUCTOR CHIP PACKAGE STRUCTURE AND SEMICONDUCTOR CHIP - A semiconductor chip package structure including a first semiconductor chip, a second semiconductor chip and a supporting substrate is provided. The first semiconductor chip includes at least a first conductor unit. The first conductor unit has a first bonding surface and a second bonding surface exposed from the first semiconductor chip. The second semiconductor chip includes at least a second conductor unit. The second conductor unit has a third bonding surface and a fourth bonding surface exposed from the second semiconductor chip. The third bonding surface is contacted with and electrically connected to the first bonding surface. The supporting substrate includes a wire unit for electrically connecting to at least one of the second bonding surface and the fourth bonding surface. A semiconductor chip and a semiconductor chip group are also provided. | 08-16-2012 |
20120205795 | STACKED PACKAGE AND METHOD OF MANUFACTURING THE SAME - A stacked package and method of manufacture are provided. The stacked package may include a first semiconductor package, a second semiconductor package, plugs and spacers. The second semiconductor package may be stacked on the first semiconductor package. The plugs may electrically connect the first semiconductor to the second semiconductor package. The spacer may be interposed between the first semiconductor package and the second semiconductor package to form a gap between the first semiconductor package and the second semiconductor package, thereby preventing an electrical short between the plugs. | 08-16-2012 |
20120205796 | SEMICONDUCTOR PACKAGE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor package includes a substrate having a connection terminal with a groove on its surface. Nanopowder may be disposed on a bottom of the groove. A semiconductor chip may be flip-chip bonded to the substrate by the nanopowder. A filler member may be interposed between the substrate and the semiconductor chip. | 08-16-2012 |
20120205797 | BUMP AND SEMICONDUCTOR DEVICE HAVING THE SAME - A bump includes a metal pillar formed over a structural body; and a diffusion barrier member formed to cover at least a portion of a side surface of the metal pillar. | 08-16-2012 |
20120205798 | SEMICONDUCTOR PACKAGE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor package includes a first semiconductor chip having first bumps which are projectedly formed thereon; a first copper foil attachment resin covered on the first semiconductor chip to embed the first semiconductor chip, and formed such that a first copper foil layer attached on an upper surface of the first copper foil attachment resin is electrically connected with the first bumps; a second copper foil attachment resin including a second copper foil layer which is electrically connected with the first copper foil layer, and disposed on the first copper foil attachment resin; and a second semiconductor chip embedded in the second copper foil attachment resin in such a way as to face the first semiconductor chip, and having second bumps formed thereon which are electrically connected with the second copper foil layer. | 08-16-2012 |
20120205799 | CHIP PACKAGE AND FABRICATION METHOD THEREOF - A chip package is disclosed. The package includes a semiconductor chip having a first surface and a second surface opposite thereto, at least one conductive pad adjacent to the first surface, and an opening extending toward the first surface from the second surface to expose the conductive pad. The caliber adjacent to the first surface is greater than that of the opening adjacent to the second surface. An insulating layer and a redistribution layer (RDL) are successively disposed on the second surface and extend to a sidewall and a bottom of the opening, in which the RDL is electrically connected to the conductive pad through the opening. A passivation layer covers the RDL and partially fills the opening to form a void between the passivation layer and the conductive pad in the opening. A fabrication method of the chip package is also disclosed. | 08-16-2012 |
20120205800 | PACKAGING STRUCTURE - A package structure and a package process are proposed in using pillar bumps to connect an upper second chip and through silicon vias of a lower first chip, wherein a gap between the first chip and the second chip can be controlled by adjusting a height of the pillar bumps. In other words, the pillar bumps compensate the height difference between the first chip and a molding compound surrounding the first chip so as to ensure the bondibility between the pillar bumps and the corresponding through silicon vias and improve the process yield. Furthermore, the pillar bumps maintain the gap between the second chip and the molding compound for allowing an underfill being properly filled into the space between the first chip and the second chip. | 08-16-2012 |
20120211880 | Flip Chip Interconnection Having Narrow Interconnection Sites on the Substrate - A flip chip interconnect of a die on a substrate is made by mating the interconnect bump onto a narrow interconnect pad on a lead or trace, rather than onto a capture pad. The width of the narrow interconnect pad is less than a base diameter of bumps on the die to be attached. Also, a flip chip package includes a die having solder bumps attached to interconnect pads in an active surface, and a substrate having narrow interconnect pads on electrically conductive traces in a die attach surface, in which the bumps are mated onto the narrow pads on the traces. | 08-23-2012 |
20120211881 | Semiconductor Device and Method of Protecting Passivation Layer in a Solder Bump Process - A flip chip semiconductor device has a substrate with a plurality of active devices formed thereon. A contact pad is formed on the substrate in electrical contact with the plurality of active devices. A passivation layer is formed over the substrate and intermediate conduction layer. An adhesive layer is formed over the passivation layer. A barrier layer is formed over the adhesive layer. A wetting layer is formed over the barrier layer. The barrier layer and wetting layer in a first region are removed, while the barrier layer, wetting layer, and adhesive layer in a second region are maintained. The adhesive layer over the passivation layer in the first region are maintained until the solder bumps are formed. By keeping the adhesive layer over the passivation layer until after formation of the solder bumps, less cracking occurs in the passivation layer. | 08-23-2012 |
20120211882 | Semiconductor Device and Method of Confining Conductive Bump Material with Solder Mask Patch - A semiconductor device has a semiconductor die having a plurality of die bump pad and substrate having a plurality of conductive trace with an interconnect site. A solder mask patch is formed interstitially between the die bump pads or interconnect sites. A conductive bump material is deposited on the interconnect sites or die bump pads. The semiconductor die is mounted to the substrate so that the conductive bump material is disposed between the die bump pads and interconnect sites. The conductive bump material is reflowed without a solder mask around the die bump pad or interconnect site to form an interconnect structure between the semiconductor die and substrate. The solder mask patch confines the conductive bump material within the die bump pad or interconnect site. The interconnect structure can include a fusible portion and non-fusible portion. An encapsulant is deposited between the semiconductor die and substrate. | 08-23-2012 |
20120211883 | ANCHORED CONDUCTIVE VIA AND METHOD FOR FORMING - A conductive via and a method of forming. The conductive via includes a portion located between a conductive contact structure and an overhang portion of a dielectric layer located above the conductive contact structure. In one embodiment, the overhang portion is formed by forming an undercutting layer over the conductive contact structure and then forming a dielectric layer over the conductive contact structure and the undercutting layer. An opening is formed in the dielectric layer and material of the undercutting layer is removed through the opening to create an overhang portion of the dielectric layer. Conductive material of the conductive via is then formed under the overhang portion and in the opening. | 08-23-2012 |
20120211884 | WAFER CHIP SCALE PACKAGE CONNECTION SCHEME - A method and structure for forming a semiconductor device, for example a device including a wafer chip scale package (WCSP), can include the formation of at least one conductive layer which contacts a bond pad. The at least one conductive layer can be patterned using a first mask, then a passivation layer can be formed over the patterned at least one conductive layer. The passivation layer can be patterned using a second mask to expose the at least one conductive layer, then a conductive layer such as a solder ball, conductive bump, metal-filled paste, or another conductor is formed on the at least one conductive layer. The method can result in a structure which is formed using a reduced number of mask steps. | 08-23-2012 |
20120211885 | SEMICONDUCTOR PACKAGE HAVING THROUGH SILICON VIA (TSV) INTERPOSER AND METHOD OF MANUFACTURING THE SEMICONDUCTOR PACKAGE - A semiconductor package having a reduced size by including an interposer having through substrate vias (TSVs), the semiconductor package may comprise a lower semiconductor package which includes a lower base substrate, an interposer with TSVs on the lower base substrate, and a lower semiconductor chip on the interposer and electrically connected to the interposer. The semiconductor package may include an upper semiconductor package on the lower semiconductor package including an upper semiconductor chip and package connecting members on the interposer and electrically connect the upper semiconductor package to the interposer. An exterior molding member may be provided. | 08-23-2012 |
20120211886 | Method for Fabricating a Small Footprint Chip-Scale Package and a Device Made from the Method - A method for fabricating an integrated circuit chip-scale package and a device made from the method. One or more IC chips are mounted on a carrier and a stud bump defined on an IC pad. The stud-bumped IC is encapsulated to define a potted assembly layer which is thinned to expose the stud bump. Conductive first traces are defined and coupled to the stud bump to reroute the IC pads. A dielectric layer is provided and vias defined there through to expose the first traces. Electrically conductive second traces are disposed on the dielectric layer surface that are coupled to the first traces to reroute the IC pads to define a chip scale package. | 08-23-2012 |
20120211887 | Bump-on-Lead Flip Chip Interconnection - A semiconductor device has a semiconductor die with a plurality of bumps formed over the die. A substrate has a plurality of conductive traces formed on the substrate. Each trace has an interconnect site for mating to the bumps. The interconnect sites have parallel edges along a length of the conductive traces under the bumps from a plan view for increasing escape routing density. The bumps have a noncollapsible portion for attaching to a contact pad on the die and fusible portion for attaching to the interconnect site. The fusible portion melts at a temperature which avoids damage to the substrate during reflow. The noncollapsible portion includes lead solder, and fusible portion includes eutectic solder. The interconnect sites have a width which is less than 1.2 times a width of the conductive trace. Alternatively, the interconnect sites have a width which is less than one-half a diameter of the bump. | 08-23-2012 |
20120217632 | Extending Metal Traces in Bump-on-Trace Structures - A device includes a work piece, and a metal trace on a surface of the work piece. A Bump-on-Trace (BOT) is formed at the surface of the work piece. The BOT structure includes a metal bump, and a solder bump bonding the metal bump to a portion of the metal trace. The metal trace includes a metal trace extension not covered by the solder bump. | 08-30-2012 |
20120217633 | PASSIVATION LAYER FOR SEMICONDUCTOR DEVICES - An embodiment of the disclosure provides a semiconductor device. The semiconductor device includes a plurality of metallization layers comprising a topmost metallization layer. The topmost metallization layer has two metal features having a thickness T | 08-30-2012 |
20120217634 | Semiconductor Device and Method of Forming the Device Using Sacrificial Carrier - A semiconductor device includes a first semiconductor die or component having a plurality of bumps, and a plurality of first and second contact pads. In one embodiment, the first and second contact pads include wettable contact pads. The bumps are mounted directly to a first surface of the first contact pads to align the first semiconductor die or component. An encapsulant is deposited over the first semiconductor die or component. An interconnect structure is formed over the encapsulant and is connected to a second surface of the first and second contact pads opposite the first surface of the first contact pads. A plurality of vias is formed through the encapsulant and extends to a first surface of the second contact pads. A conductive material is deposited in the vias to form a plurality of conductive vias that are aligned by the second contact pads to reduce interconnect pitch. | 08-30-2012 |
20120217635 | Packaging Structure and Method - A method of making a semiconductor device includes providing a substrate and forming a conductive layer on the substrate. The conductive layer includes a first metal. A semiconductor die is provided. A bump is formed on the semiconductor die. The bump includes a second metal. The semiconductor die is positioned proximate to the substrate to contact the bump to the conductive layer and form a bonding interface. The bump and the conductive layer are metallurgically reacted at a melting point of the first metal to dissolve a portion of the second metal from an end of the bump. The bonding interface is heated to the melting point of the first metal for a time sufficient to melt a portion of the first metal from the conductive layer. A width of the conductive layer is no greater than a width of the bump. | 08-30-2012 |
20120223425 | SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF - A semiconductor structure includes a chip, a plurality of metal posts disposed in the chip and a buffer layer disposed on the chip. The chip includes a silicon-based layer having opposite first and second surfaces, and a build-up structure formed on the first surface of the silicon-based layer consisting of at least a metal layer and a low-k dielectric layer alternatively stacked on one another. Each of the metal posts is disposed in the silicon-based layer with one end thereof electrically connected with the metal layer while the other end is exposed from the second surface of the silicon-based layer. The buffer layer is disposed on the build-up structure. By positioning the low-k dielectric layer far from the second surface that is used for connecting to an external electronic component, the present invention reduces the overall thermal stress. | 09-06-2012 |
20120223426 | Semiconductor Device and Method of Forming Stress Relief Layer Between Die and Interconnect Structure - A semiconductor device is made by forming a first conductive layer over a sacrificial carrier. A conductive pillar is formed over the first conductive layer. An active surface of a semiconductor die is mounted to the carrier. An encapsulant is deposited over the semiconductor die and around the conductive pillar. The carrier and adhesive layer are removed. A stress relief insulating layer is formed over the active surface of the semiconductor die and a first surface of the encapsulant. The stress relief insulating layer has a first thickness over the semiconductor die and a second thickness less than the first thickness over the encapsulant. A first interconnect structure is formed over the stress relief insulating layer. A second interconnect structure is formed over a second surface of encapsulant opposite the first interconnect structure. The first and second interconnect structures are electrically connected through the conductive pillar. | 09-06-2012 |
20120223427 | FLIP CHIP PACKAGE - A flip chip package may include a substrate, a semiconductor chip, main bump structures and auxiliary bump structures. The substrate has a circuit pattern. The semiconductor chip is arranged over the substrate. The semiconductor chip includes a body having semiconductor structures, main pads electrically connected to the semiconductor structures to mainly control the semiconductor structures, and auxiliary pads electrically connected to the semiconductor structures to provide auxiliary control of the semiconductor structures. The main bump structures are interposed between the semiconductor chip and the substrate to electrically connect the circuit pattern with the main pads. The auxiliary bump structures can be interposed between the semiconductor chip and the substrate to electrically connect the circuit pattern with the auxiliary pads. | 09-06-2012 |
20120223428 | Semiconductor Device and Method of Forming Vertical Interconnect Structure Between Semiconductor Die and Substrate - A semiconductor device has a semiconductor die and substrate with a plurality of stud bumps formed over the semiconductor die or substrate. The stud bumps include a base portion and stem portion extending from the base portion. The stud bumps include a non-fusible material or fusible material. The semiconductor die is mounted to the substrate with the stud bumps electrically connecting the semiconductor die to the substrate. A width of the base portion is greater than a mating conductive trace formed on the substrate. Alternatively, a vertical interconnect structure, such as a conductive column, is formed over the semiconductor die or substrate. The conductive column can have a tapered sidewall or oval cross sectional area. An underfill material is deposited between the semiconductor die and substrate. The semiconductor die includes a flexible property. The vertical interconnect structure includes a flexible property. The substrate includes a flexible property. | 09-06-2012 |
20120228759 | SEMICONDUCTOR PACKAGE HAVING INTERCONNECTION OF DUAL PARALLEL WIRES - A semiconductor package having dual parallel wires is disclosed. A chip is attached on a substrate where the chip and the substrate are electrically connected by a bonding wire. The bonding wire consists of a first metal wire, a second metal wire, and an insulating body where the insulating body encapsulates the first and the second metal wires to make both metal wires parallel to each other. The insulating body forms a constant gap between the first and the second metal wires so that both metal wires do not contact to each other. Therefore, the electrical performance of the package can greatly be enhanced with the same productivity. | 09-13-2012 |
20120228760 | SYSTEMS INCLUDING AN I/O STACK AND METHODS FOR FABRICATING SUCH SYSTEMS - Systems including an input/output (I/O) stack and methods for fabricating such systems are described. In one implementation, the methods include stacking an I/O die including I/O elements and excluding a logic element. Also in one implementation, the methods further include stacking an integrated circuit die with respect to the I/O die. The integrated circuit includes logic elements and excludes an I/O element. The separation of the I/O die from the integrated circuit die provides various benefits, such as independent development of each of the dies and more space for the I/O elements on an I/O substrate of the I/O die compared to that in a conventional die. The increase in space allows new process generation of the integrated circuit die in which an increasing number of logic elements are fitted within the same surface area of a substrate of the integrated circuit die. | 09-13-2012 |
20120228761 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device includes a first substrate and a second substrate being bonded to each other, a posterior interconnect layer interposed between the first and second substrates, a weld pad disposed in the posterior interconnect layer, and a first annular opening disposed in the first substrate. The device further includes a dielectric layer formed in the first opening, a via surrounded by the first annular opening, and an interconnect layer disposed in the via. The device also includes a conductive bump disposed on the interconnect layer and electrically connected to the weld pad through the interconnect layer. | 09-13-2012 |
20120228762 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME - A semiconductor device, includes: a wiring substrate, a stacked body mounted on the wiring substrate, an underfill layer filled into gaps between respective semiconductor chips of the stacked body; and a molding body made up of a molding resin covered and formed at outside of the stacked body and so on. The underfill layer is made up of a cured product of a resin material containing an amine-based curing agent, and the cured product has a Tg of 65° C. or more and 100° C. or less. | 09-13-2012 |
20120228763 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device including a pillar formed in a highly reliable manner and a method of manufacturing the semiconductor device are disclosed. The semiconductor device includes a semiconductor chip including an internal circuit area and an I/O area disposed outside the internal circuit area, a package substrate coupled in a flip-chip manner to the semiconductor chip, and an electrically conductive pillar disposed between the semiconductor chip and the package substrate such that the electrically conductive pillar is located over two or more wirings in an uppermost wiring layer of the semiconductor chip and such that the two or more wirings are coupled together via the electrically conductive pillar. | 09-13-2012 |
20120228764 | PACKAGE STRUCTURE, FABRICATING METHOD THEREOF, AND PACKAGE-ON-PACKAGE DEVICE THEREBY - A package structure, a method of fabricating the package structure, and a package-on-package device are provided, where the package structure includes a metal sheet having perforations and a semiconductor chip including an active surface having electrode pads thereon, where the semiconductor chip is combined with the metal sheet via an inactive surface thereof. Also, a protective buffer layer is formed on the active surface to cover the conductive bumps, and the perforations are arranged around a periphery of the inactive surface of the semiconductor chip. Further, an encapsulant is formed on the metal sheet and in the perforations, for encapsulating the semiconductor chip and exposing the protective buffer layer; and a circuit fan-out layer is formed on the encapsulant and the protective buffer layer and having conductive vias penetrating the protective buffer layer and electrically connecting to the conductive bumps. | 09-13-2012 |
20120228765 | SOLDER BUMP INTERCONNECT - A semiconductor package includes a device pad on a substrate. A first polymer layer overlies the substrate, and the first polymer layer has an opening to expose the device pad. In one embodiment, a redistribution layer (RDL) comprises a landing pad, and the RDL is positioned on the first polymer layer and conductively coupled to the device pad. A second polymer layer is on the RDL, and an under bump metal pad (UBM) is on the landing pad and extends onto a top surface of the second polymer layer. In one embodiment, a shortest distance from a center of the landing pad to an outer edge of the landing pad, and a shortest distance from a center of the UBM to an outer edge of the UBM are in a ratio that ranges from 0.5:1 up to 0.95:1. | 09-13-2012 |
20120228766 | Semiconductor Device and Method of Confining Conductive Bump Material During Reflow with Solder Mask Patch - A semiconductor device has a semiconductor die with die bump pads and substrate with trace lines having integrated bump pads. A solder mask patch is formed interstitially between the die bump pads or integrated bump pads. The solder mask patch contains non-wettable material. Conductive bump material is deposited over the integrated bump pads or die bump pads. The semiconductor die is mounted over the substrate so that the conductive bump material is disposed between the die bump pads and integrated bump pads. The bump material is reflowed without a solder mask around the integrated bump pads to form an interconnect between the semiconductor die and substrate. The solder mask patch confines the conductive bump material within a footprint of the die bump pads or integrated bump pads during reflow. The interconnect can have a non-fusible base and fusible cap. | 09-13-2012 |
20120228767 | INTEGRATED CIRCUIT PACKAGE SYSTEM WITH STACKABLE DEVICES AND A METHOD OF MANUFACTURE THEREOF - An integrated circuit package system includes: providing a package substrate; mounting an interposer chip containing active circuitry over the package substrate; attaching a conductive bump stack having a base bump end and a stud bump end, the base bump end on the interposer chip; connecting a stack connector to the interposer chip and the package substrate; and applying a package encapsulant over the interposer chip, the stack connector, and the conductive bump stack with the stud bump end of the conductive bump stack substantially exposed. | 09-13-2012 |
20120235296 | IC DEVICES HAVING TSVS INCLUDING PROTRUDING TIPS HAVING IMC BLOCKING TIP ENDS - A through substrate via (TSV) die includes a plurality of TSVs including an outer dielectric sleeve, an inner metal core and protruding TSV tips including sidewalls that emerge from the TSV die. A passivation layer lateral to protruding TSV tips is on a portion of the sidewalls of protruding TSV tips. The passivation layers is absent from a distal portion of protruding TSV tips to provide an exposed portion of the inner metal core. The TSV tips include bulbous distal tip ends which cover a portion of the TSV sidewalls, are over a topmost surface of the outer dielectric sleeve, and have a maximum cross sectional area that is ≧25% more as compared to a cross sectional area of the protruding TSV tips below the bulbous distal tip ends. | 09-20-2012 |
20120241945 | Semiconductor Device and Method of Forming Flipchip Interconnect Structure - A semiconductor device has a semiconductor die with a plurality of bumps or interconnect structures formed over an active surface of the die. The bumps can have a fusible portion and non-fusible portion, such as a conductive pillar and bump formed over the conductive pillar. A plurality of conductive traces with interconnect sites is formed over a substrate. The bumps are wider than the interconnect sites. A masking layer is formed over an area of the substrate away from the interconnect sites. The bumps are bonded to the interconnect sites under pressure or reflow temperature so that the bumps cover a top surface and side surfaces of the interconnect sites. An encapsulant is deposited around the bumps between the die and substrate. The masking layer can form a dam to block the encapsulant from extending beyond the semiconductor die. Asperities can be formed over the interconnect sites or bumps. | 09-27-2012 |
20120241946 | Semiconductor Device and Method of Forming High Routing Density Interconnect Sites on Substrate - A semiconductor device has a semiconductor die with a plurality of bumps formed over contact pads on a surface of the semiconductor die. The bumps can have a fusible portion and non-fusible portion. A plurality of conductive traces is formed over a substrate with interconnect sites having a width greater than 20% and less than 80% of a width of a contact interface between the bumps and contact pads. The bumps are bonded to the interconnect sites so that the bumps cover a top surface and side surface of the interconnect sites. An encapsulant is deposited around the bumps between the semiconductor die and substrate. The conductive traces have a pitch as determined by minimum spacing between adjacent conductive traces that can be placed on the substrate and the width of the interconnect site provides a routing density equal to the pitch of the conductive traces. | 09-27-2012 |
20120241947 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH LOCKING INTERCONNECTS AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit packaging system includes: providing a lead frame having a hole, a lead extension, and an exterior pad under the lead extension with the hole abutting the lead extension; connecting an electrical interconnect between an integrated circuit and the lead extension; forming an encapsulation over the integrated circuit and surrounding the electrical interconnect and through the hole; and removing a bottom portion of the lead frame resulting in a stand-off lead from the lead extension with the exterior pad on the stand-off lead. | 09-27-2012 |
20120241948 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH PADS AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit packaging system includes: providing a lead frame having a frame platform and a frame base; forming an elevated paddle on the frame platform and a base pad on the frame base; mounting an integrated circuit over the elevated paddle; forming an encapsulation on the lead frame and over the elevated paddle, the base pad, the integrated circuit, and the internal interconnect; and removing the lead frame to expose an encapsulation recess and an encapsulation base with the base pad exposed along the encapsulation base and the elevated paddle exposed in the encapsulation recess. | 09-27-2012 |
20120241949 | SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING THE SAME, AND METHOD OF MANUFACTURING WIRING BOARD - A semiconductor device includes: a solder bump including a barrier metal layer formed on an electrode pad portion of a substrate, and a solder layer formed at a central portion of an upper surface of the barrier metal layer so as to have a smaller outer diameter than that of the barrier metal layer. | 09-27-2012 |
20120241950 | SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND ELECTRONIC APPARATUS - A semiconductor device includes a first wiring board, a first semiconductor element mounted on the first wiring board, a second wiring board disposed over the first semiconductor element, and a second semiconductor element mounted on the second wiring board. The wiring boards are electrically interconnected by a connecting portion interposed therebetween. A resin layer is formed between the wiring boards such that the first semiconductor element mounted on the first wiring board is sealed and such that the wiring boards having the respective semiconductor elements mounted thereon are bonded together. | 09-27-2012 |
20120241951 | WAFER BUMPING USING PRINTED UNDER BUMP METALIZATION - Methods, systems, and apparatuses for printing under bump metallization (UBM) features on chips/wafers are provided. A wafer is received that has a surface defined by a plurality of integrated circuit regions. Each integrated circuit region has a passivation layer and a plurality of terminals on the surface of the wafer accessible through openings in the passivation layer. A plurality of UBM features are formed on the surface of the wafer in the form of an ink such that each UBM feature is formed electrically coupled with a corresponding terminal of the plurality of terminals. An ink jet printer may be used to print the ink in the form of the UBM feature. A UBM feature may be formed directly on a corresponding terminal, or on routing that is coupled to the corresponding terminal. A bump interconnect may be formed on the UBM feature. | 09-27-2012 |
20120241952 | APPARATUSES AND METHODS TO ENHANCE PASSIVATION AND ILD RELIABILITY - Some embodiments of the present invention include apparatuses and methods relating to processing and packaging microelectronic devices that reduce stresses on and limit or eliminate crack propagation in the devices. | 09-27-2012 |
20120241953 | UNIT FOR SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE - A semiconductor device has a single unit capable of improving adhesion to a cooling body and a heat dissipation performance, and an aggregate of the single units is capable of configuring any circuit at a low cost. A single unit ( | 09-27-2012 |
20120248598 | SEMICONDUCTOR BONDING APPARATUS - An apparatus includes a tool head configured for bonding to establish 100 or more electrical and mechanical connections between a silicon chip having a thickness of about 50 microns (μm) or smaller and a substrate, wherein 100 or more solder bumps set on a plurality of contacts on the silicon chip or a plurality of contacts on the substrate are melted by heating between the plurality of contacts of the silicon chip and the substrate, and wherein the melted solder bumps are solidified by cooling using forced convection of air flowing from around the silicon chip. The tool head includes a pyrolytic graphite sheet configured to be used in direct contact with the silicon chip, and having a thickness between about 75 μm and 125 μm. | 10-04-2012 |
20120248599 | RELIABLE SOLDER BUMP COUPLING WITHIN A CHIP SCALE PACKAGE - In one general aspect, an apparatus can include a semiconductor substrate including at least one semiconductor device, and a metal layer disposed on the semiconductor substrate. The apparatus can include a nonconductive layer defining an opening and having a cross-sectional portion of the nonconductive layer defining a protrusion disposed over a recess in the metal layer, and can include a solder bump having a portion disposed between the metal layer and the protrusion defined by the nonconductive layer. | 10-04-2012 |
20120248600 | SEMICONDUCTOR DEVICE HAVING PLURAL STACKED CHIPS - Disclosed herein is a device including a substrate and first and second chips stacked on the substrate. The first and second chips have penetration electrodes that are penetrating therethrough. Power terminals of the first and second chips are connected to each other and arranged in a first arrangement pitch. Signal terminals of the first and second chips are connected to each other and arranged in a second arrangement pitch that is smaller than the first arrangement pitch. | 10-04-2012 |
20120248601 | Semiconductor Device and Method of Forming a Land Grid Array Flip Chip Bump System - A semiconductor device has a semiconductor wafer with a plurality of semiconductor die including a plurality of contact pads. An insulating layer is formed over the semiconductor wafer and contact pads. An under bump metallization (UBM) is formed over and electrically connected to the plurality of contact pads. A mask is disposed over the semiconductor wafer with a plurality of openings aligned over the plurality of contact pads. A conductive bump material is deposited within the plurality of openings in the mask and onto the UBM. The mask is removed. The conductive bump material is reflowed to form a plurality of bumps with a height less than a width. The plurality of semiconductor die is singulated. A singulated semiconductor die is mounted to a substrate with bumps oriented toward the substrate. Encapsulant is deposited over the substrate and around the singulated semiconductor die. | 10-04-2012 |
20120248602 | SEMICONDUCTOR DEVICE - In this semiconductor device, the through-hole is formed in the substrate, and is located under the conductive pattern. The insulating layer is located at the bottom surface of the through-hole. The conductive pattern is located on one surface side of the substrate. The opening pattern is formed in the insulating layer which is located between the through-hole and the conductive pattern, where the distance r | 10-04-2012 |
20120248603 | SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME - To provide a technique capable of positioning of a semiconductor chip and a mounting substrate with high precision by improving visibility of an alignment mark. In a semiconductor chip constituting an LCD driver, a mark is formed in an alignment mark formation region over a semiconductor substrate. The mark is formed in the same layer as that of an uppermost layer wiring (third layer wiring) in an integrated circuit formation region. Then, in the lower layer of the mark and a background region surrounding the mark, patterns are formed. At this time, the pattern P | 10-04-2012 |
20120256310 | SEMICONDUCTOR DEVICE - A semiconductor device includes a multi-level wiring structure that includes a first wring layer, a plurality of first patterns, and a first mark. The first wring layer is disposed at a first wiring level of the multi-level wiring structure. The plurality of first patterns is disposed over the first wring layer. The plurality of first patterns is disposed at a second wiring level of the multi-level wiring structure. The second wiring level is above the first wiring level. The plurality of first patterns is disposed over the first wring layer. The plurality of first patterns is disposed at a second wiring level of the multi-level wiring structure. The second wiring level is above the first wiring level. | 10-11-2012 |
20120256311 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A bump electrode, a dummy bump, and a heat-resistant polymer film, whose upper-surface heights are uniformed, are formed on each of a first silicon substrate and a second silicon substrate, and then, the first silicon substrate and the second silicon substrate are bonded to each other so that the bump electrodes formed on the respective substrates are electrically connected to each other. At this time, the dummy bump is arranged so as to be bonded to the heat-resistant polymer film on the silicon substrate opposed thereto, so that a semiconductor device having both of good electrical connection between the bump electrodes and bump protection performance obtained by a polymer film with high heat resistance and without voids can be achieved. | 10-11-2012 |
20120256312 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME - A semiconductor device includes a semiconductor chip, an electrode pad formed on the semiconductor chip, an underlying barrier metal formed on the electrode pad, a solder bump formed on the underlying barrier metal, and an underfill material surrounding the underlying barrier metal and the solder bump. A junction interface of the solder bump with the underlying barrier metal corresponds to an upper surface of the underlying barrier metal, and a portion of the underfill material bonded to a side surface of the solder bump and an end surface of the underlying barrier metal forms a right angle or an obtuse angle. | 10-11-2012 |
20120261812 | SEMICONDUCTOR CHIP WITH PATTERNED UNDERBUMP METALLIZATION - Various semiconductor chip solder bump and underbump metallization (UBM) structures and methods of making the same are disclosed. In one aspect, a method is provided that includes providing a semiconductor chip that has a conductor pad and a passivation structure over the conductor pad. A first metallic layer is applied on the passivation structure and in electrical contact with the conductor pad. The first metallic layer covers a first portion but not a second portion of the passivation structure. A second metallic layer is applied to the first metallic layer. A polymer layer is applied to the second metallic layer. The polymer layer includes a first opening in alignment with the first metallic layer that exposes a portion of the second layer. A conducting solder barrier layer is applied to the exposed portion of the second metallic layer. | 10-18-2012 |
20120261813 | REINFORCED VIA FARM INTERCONNECT STRUCTURE, A METHOD OF FORMING A REINFORCED VIA FARM INTERCONNECT STRUCTURE AND A METHOD OF REDESIGNING AN INTEGRATED CIRCUIT CHIP TO INCLUDE SUCH A REINFORCED VIA FARM INTERCONNECT STRUCTURE - Disclosed is reinforced via farm interconnect structure for an integrated circuit chip that minimizes delamination caused by tensile stresses applied to the chip through lead-free C4 connections during thermal cycling. The reinforced via farm interconnect structure includes a plurality of vias electrically connecting metal wires within different wiring levels and, for reinforcement, further incorporates dielectric columns into the lower metal wire so that the areas around the metal-to-metal interface between the vias and the lower metal wire contain a relatively strong dielectric-to-dielectric interface. The reinforced via farm interconnect structure can be located in an area of the chip at risk for delamination and, for added strength, can have a reduced via density relative to conventional via farm interconnect structures located elsewhere on the chip. Also disclosed are a method of forming the reinforced via farm interconnect structure and a method of redesigning an integrated circuit chip to include reinforced via farm interconnect structure(s). | 10-18-2012 |
20120261814 | Packaging an Electronic Device - An electronic device comprises a plurality of integrated circuit dies mounted on different areas of a carrier. The carrier is folded into a plurality of layers, each layer comprising one of the different areas of the carrier and one of the integrated circuit dies, such that the plurality of integrated circuit dies form a stack. Adjacent surfaces of neighbouring layers are fixed together, for example by an adhesive layer, and the folded carrier and the integrated circuit dies are embedded in a moulded material. | 10-18-2012 |
20120261815 | SEALED SURFACE ACOUSTIC WAVE ELEMENT PACKAGE - An electronic component includes: a semiconductor substrate having a first surface and a second surface opposing to the first surface; a trans-substrate conductive plug that penetrates the semiconductor substrate from the first surface to the second surface; an electronic element provided in the vicinity of the first surface of the semiconductor; and a sealing member that seals the electronic element between the sealing member and the first surface, wherein the electronic element is electrically connected to the trans-substrate conductive plug. | 10-18-2012 |
20120261816 | DEVICE PACKAGE SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A device package substrate includes: a substrate having a cavity formed on a top surface thereof, the cavity having a chip mounting region; a first interconnection layer formed to extend to the inside of the cavity; a second interconnection layer formed to be spaced apart from the first interconnection layer; a chip positioned in the chip mounting region so as to be connected to the first and second interconnection layers; an insulating layer formed to cover the first and second interconnection layers and the chip and having a contact hole exposing a part of the second interconnection layer; and a bump pad formed in the contact hole so as to be connected to external elements. | 10-18-2012 |
20120261817 | Semiconductor Device and Method of Providing Common Voltage Bus and Wire Bondable Redistribution - A semiconductor wafer contains a plurality of semiconductor die. The wafer has contact pads formed over its surface. A passivation layer is formed over the wafer. A stress buffer layer is formed over the passivation layer. The stress buffer layer is patterned to expose the contact pads. A metal layer is deposited over the stress buffer layer. The metal layer is a common voltage bus for the semiconductor device in electrical contact with the contact pads. An adhesion layer, barrier layer, and seed layer is formed over the wafer in electrical contact with the contact pads. The metal layer is mounted to the seed layer. Solder bumps or other interconnect structures are formed over the metal layer. A second passivation layer is formed over the metal layer. In an alternate embodiment, a wirebondable layer can be deposited over the metal layer and wirebonds connected to the metal layer. | 10-18-2012 |
20120261818 | Semiconductor Device and Method of Embedding Bumps Formed on Semiconductor Die into Penetrable Adhesive Layer to Reduce Die Shifting During Encapsulation - A semiconductor device has a semiconductor die with a plurality of bumps formed over a surface of the first semiconductor die. A penetrable adhesive layer is formed over a temporary carrier. The adhesive layer can include a plurality of slots. The semiconductor die is mounted to the carrier by embedding the bumps into the penetrable adhesive layer. The semiconductor die and interconnect structure can be separated by a gap. An encapsulant is deposited over the first semiconductor die. The bumps embedded into the penetrable adhesive layer reduce shifting of the first semiconductor die while depositing the encapsulant. The carrier is removed. An interconnect structure is formed over the semiconductor die. The interconnect structure is electrically connected to the bumps. A thermally conductive bump is formed over the semiconductor die, and a heat sink is mounted to the interconnect structure and thermally connected to the thermally conductive bump. | 10-18-2012 |
20120267776 | CHIP STACK PACKAGE - A chip stack package is provided. The chip stack package includes an n number of chips stacked on each other and an n number of interconnection strands connecting the chips. The interconnection strands are spirally rotated and insulated from each other. In one embodiment, the chips are substantially structurally identical. In another embodiment, each of the interconnection strands is electrically coupled to a chip selection signal. | 10-25-2012 |
20120267777 | MULTI-CHIP MODULE WITH STACKED FACE-DOWN CONNECTED DIES - A microelectronic assembly can include a substrate having first and second surfaces, at least two logic chips overlying the first surface, and a memory chip having a front surface with contacts thereon, the front surface of the memory chip confronting a rear surface of each logic chip. The substrate can have conductive structure thereon and terminals exposed at the second surface for connection with a component. Signal contacts of each logic chip can be directly electrically connected to signal contacts of the other logic chips through the conductive structure of the substrate for transfer of signals between the logic chips. The logic chips can be adapted to simultaneously execute a set of instructions of a given thread of a process. The contacts of the memory chip can be directly electrically connected to the signal contacts of at least one of the logic chips through the conductive structure of the substrate. | 10-25-2012 |
20120267778 | CIRCUIT BOARD, SEMICONDUCTOR ELEMENT, SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING CIRCUIT BOARD, METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A circuit board includes: an electrode portion which has a copper layer, a copper oxide layer formed thereon, and a removal portion formed by partially removing the copper oxide layer so as to partially expose the copper layer from the copper oxide layer; and a solder bump for flip chip mounting formed on the copper layer exposed by the removal portion. | 10-25-2012 |
20120267779 | SEMICONDUCTOR PACKAGE - The invention provides a semiconductor package. The semiconductor package includes a semiconductor die having a central area and a peripheral area surrounding the central area. A first conductive bump is disposed on the semiconductor die in the central area. A second conductive bump is disposed on the semiconductor die in the peripheral area. An area ratio of the first conductive bump to the second conductive bump from a top view is larger than 1, and less than or equal to 3. | 10-25-2012 |
20120267780 | CHIP PACKAGE AND METHOD FOR FORMING THE SAME - An embodiment of the invention provides a chip package which includes: a first chip; a second chip disposed on the first chip, wherein a side surface of the second chip is a chemically-etched surface; and a bonding bulk disposed between the first chip and the second chip such that the first chip and the second chip are bonded with each other. | 10-25-2012 |
20120267781 | MECHANISMS FOR FORMING COPPER PILLAR BUMPS USING PATTERNED ANODES - This disclosure relates to a bump structure on a substrate including a copper layer, wherein the copper layer fills an opening created in a dielectric layer and a polymer layer. The bump structure further includes an under-bump-metallurgy (UBM) layer lines the opening and the copper layer is deposited over the UBM layer. The bump structure further includes a surface of the copper layer facing away from the substrate is curved. This disclosure also relates to two bump structures with different heights on a substrate where a thickness of the first bump structure is different than a thickness of the second bump structure. This disclosure also relates to a semiconductor device including a bump structure. | 10-25-2012 |
20120273934 | REDUCED-STRESS BUMP-ON-TRACE (BOT) STRUCTURES - The embodiments of bump-on-trace (BOT) structures and their layout on a die described reduce stresses on the dielectric layer on the metal pad and on the metal traces of the BOT structures. By orienting the axes of the metal bumps away from being parallel to the metal traces, the stresses can be reduced, which can reduce the risk of delamination of the metal traces from the substrate and the dielectric layer from the metal pad. Further, the stresses of the dielectric layer on the metal pad and on the metal traces may also be reduced by orienting the axes of the metal traces toward the center of the die. As a result, the yield can be increased. | 11-01-2012 |
20120273935 | Semiconductor Device and Method of Making a Semiconductor Device - A semiconductor device and a method of manufacturing a semiconductor device are disclosed. An embodiment comprises forming a bump on a die, the bump having a solder top, melting the solder top by pressing the solder top directly on a contact pad of a support substrate, and forming a contact between the die and the support substrate. | 11-01-2012 |
20120273936 | Micro Bump And Method For Forming The Same - A method for forming a micro bump includes forming a first nano-particle layer on a substrate and forming a second nano-particle layer on the first nano-particle layer. The first and second nano-particle layers include a plurality of first nano particles and a plurality of second nano particles, respectively. The method further includes irradiating a laser beam onto the second nano-particle layer, where the laser beam penetrates through the second nano-particle layer and is at least partially absorbed by at least some of the first nano particles to generate heat. The first nano particles and the second nano particles have different absorption rates with respect to the laser beam. | 11-01-2012 |
20120273937 | Semiconductor Device and Method of Forming Bump Interconnect Structure with Conductive Layer Over Buffer Layer - A semiconductor device has a substrate with a plurality of contact pads. A first insulation layer is formed over the substrate and contact pads. A portion of the first insulating layer is removed to form a toroid-shaped SRO over the contact pads while retaining a central portion of the first insulating layer over the contact pads. The central portion of the first insulating layer can extend above a surface of the first insulating layer outside the first conductive layer. A first conductive layer is formed over the central portion of the first insulating layer and through the SRO in the first insulating layer over the contact pads. The first conductive layer may extend above a surface of the first insulating layer outside the second conductive layer. A semiconductor die is mounted to the substrate with the bumps electrically connected to the first conductive layer. | 11-01-2012 |
20120273938 | Semiconductor Device and Method of Forming an Interconnect Structure with Conductive Material Recessed Within Conductive Ring Over Surface of Conductive Pillar - A semiconductor device has a semiconductor die with a first conductive layer formed over an active surface of the semiconductor die. An insulation layer is formed over the active surface of the semiconductor die. A second conductive layer is conformally applied over the insulating layer and first conductive layer. Conductive pillars are formed over the first conductive layer. Conductive rings are formed around a perimeter of the conductive pillars. A conductive material is deposited over the surface of the conductive pillars within the conductive rings. A substrate has a third conductive layer formed over a surface of the substrate. The semiconductor die is mounted to a substrate with the third conductive layer electrically connected to the conductive material within the conductive rings. The conductive rings inhibit outward flow of the conductive material from under the conductive pillars to prevent electrical bridging between adjacent conductive pillars. | 11-01-2012 |
20120273939 | FILLED THROUGH-SILICON VIA AND THE FABRICATION METHOD THEREOF - By adding particles of high thermal conductivity and low thermal expansion coefficient into the copper as a composite material and filling with the composite material into the through-via hole, the mismatch of the coefficient of thermal expansion and the stress of the through-silicon via are lowered and the thermal conductivity of the through-silicon via is increased. | 11-01-2012 |
20120273940 | SEMICONDUCTOR APPARATUS AND METHOD FOR FABRICATING THE SAME - A semiconductor apparatus includes a first chip comprising a first bonding pad and a dielectric layer exposes a portion of the first bonding pad; a first bonding layer covering entirely or partially the first front side of the first chip, a second chip comprising a second bonding pad and a through-silicon via, and a conductive projection formed over the second bonding pad. The dielectric layer is formed on of the first chip, a second back side of the second chip is bonded to the first front side of the first chip by the medium of the first bonding layer, and the second bonding pad formed on a second front side of the second chip is coupled to the first bonding pad by the through-silicon via. | 11-01-2012 |
20120273941 | PACKAGE STRUCTURE HAVING EMBEDDED ELECTRONIC COMPONENT AND FABRICATION METHOD THEREOF - A package structure having an embedded electronic component includes: a carrier having a cavity penetrating therethrough; a semiconductor chip received in the cavity and having solder bumps disposed thereon; a dielectric layer formed on the carrier and the semiconductor chip so as to encapsulate the solder bumps; a wiring layer formed on the dielectric layer; an insulating protection layer formed on the dielectric layer and the wiring layer; and a solder material formed in the dielectric layer and the insulating protection layer for electrically connecting the wiring layer and the solder bumps, thereby shortening the signal transmission path between the semiconductor chip and the carrier to avoid signal losses. | 11-01-2012 |
20120273942 | Flip-chip Mounting Structure and Flip-chip Mounting Method - When a flip-chip mounting component with an Al/Au bonding structure is exposed to high temperature, voids may be caused in the Al electrode. The generation of voids causes failed connection or failed bonding between the Al electrode and the Au bump, thereby significantly degrading the connection reliability and bonding reliability in the flip-chip mounting structure. An object of the preset invention is to provide a flip-chip mounting structure that has high connection reliability and bonding reliability without being degraded even in high temperature. In a flip-chip mounting structure for wirelessly connecting an IC chip | 11-01-2012 |
20120273943 | Solder Joint Flip Chip Interconnection Having Relief Structure - A flip chip interconnect has a tapering interconnect structure, and the area of contact of the interconnect structure with the site on the substrate metallization is less than the area of contact of the interconnect structure with the die pad. A solder mask has an opening over the interconnect site, and the solder mask makes contact with the interconnect structure at the margin of the opening. The flip chip interconnect is provided with an underfill. During the underfill process, the contact or near proximity of the solder mask with the interconnect structure interferes with flow of the underfill material toward the substrate adjacent the site, resulting in formation of a void left unfilled by the underfill, adjacent the contact of the interconnect structure with the site on the substrate metallization. The void can help provide relief from strain induced by changes in temperature of the system. | 11-01-2012 |
20120273944 | Power Semiconductor Package With Bottom Surface Protrusions - A package includes a body that encapsulates a semiconductor die, the body having a first pair of opposing lateral sides, a second pair of opposing lateral sides, a top, and a bottom. The bottom has a primary surface and a plurality of protrusions that extend outward from the primary surface. When the package is mounted to a printed circuit board (PCB) the protrusions contact the PCB and the primary surface is disposed a first distance away from the PCB. The package further includes a plurality of leads that extend outward from the first pair of opposing lateral sides. | 11-01-2012 |
20120273945 | INTEGRATED CIRCUIT DEVICE INCLUDING A COPPER PILLAR CAPPED BY BARRIER LAYER - This description relates to an integrated circuit device including a semiconductor substrate, an under-bump-metallurgy (UBM) layer overlying the semiconductor substrate and a copper-containing pillar on the UBM layer. The copper-containing pillar includes a top surface, an upper sidewall surface adjacent to the top surface, and a lower sidewall surface adjacent to the UBM layer. The integrated circuit device further includes a barrier layer on the upper sidewall surface of the copper-containing pillar, wherein the barrier layer exposes the lower sidewall surface. The copper-containing pillar has a first height and the upper sidewall surface has a second height. The second height is greater than about 30 percent of the first height. | 11-01-2012 |
20120280384 | SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD THEREOF - A fabrication method of a semiconductor structure includes providing a chip having at least an electrode pad, forming a titanium layer on the electrode pad, forming a dielectric layer on the chip and a portion of the titanium layer, forming a copper layer on the dielectric layer and the titanium layer, forming a conductive pillar on the copper layer corresponding in position to the titanium layer, and removing a portion of the copper layer that is not covered by the conductive pillar. When the portion of the copper layer is removed by etching, undercutting of the titanium layer is avoided since the titanium layer is covered by the dielectric layer, thereby providing an improved support for the conductive pillar to increase product reliability. | 11-08-2012 |
20120280385 | ELECTRONIC DEVICE PACKAGING STRUCTURE - An electronic device packaging structure is provided. The semiconductor device includes a semiconductor base, an emitter, a collector, and a gate. The emitter and the gate are disposed on a first surface of the semiconductor base. The collector is disposed on a second surface of the semiconductor base. A first passivation layer is located on the first surface of the semiconductor base surrounding the gate. A first conductive pad is disposed on the first passivation layer. A second conductive pad is disposed on the collector on the second surface. At least one conductive through via structure penetrates the first passivation layer, the first and second surfaces of the semiconductor base, and the collector to electrically connect the first and second conductive pads. | 11-08-2012 |
20120280386 | PACKAGE-ON-PACKAGE ASSEMBLY WITH WIRE BONDS TO ENCAPSULATION SURFACE - A microelectronic assembly includes a substrate having a first surface and a second surface remote from the first surface. A microelectronic element overlies the first surface and first electrically conductive elements are exposed at one of the first surface and the second surface. Some of the first conductive elements are electrically connected to the microelectronic element. Wire bonds have bases joined to the conductive elements and end surfaces remote from the substrate and the bases, each wire bond defining an edge surface extending between the base and the end surface. An encapsulation layer extends from the first surface and fills spaces between the wire bonds such that the wire bonds are separated by the encapsulation layer. Unencapsulated portions of the wire bonds are defined by at least portions of the end surfaces of the wire bonds that are uncovered by the encapsulation layer. | 11-08-2012 |
20120280387 | THREE-DIMENSIONAL STACKED SUBSTRATE ARRANGEMENTS - Three-dimensional stacked substrate arrangements with reliable bonding and inter-substrate protection. | 11-08-2012 |
20120280388 | COPPER PILLAR BUMP WITH NON-METAL SIDEWALL PROTECTION STRUCTURE AND METHOD OF MAKING THE SAME - This description relates to an integrated circuit device including a conductive pillar formed over a substrate. The conductive pillar has a sidewall surface and a top surface. The integrated circuit device further includes an under-bump-metallurgy (UBM) layer between the substrate and the conductive pillar. The UBM layer has a surface region. The integrated circuit device further includes a protection structure on the sidewall surface of the conductive pillar and the surface region of the UBM layer. The protection structure is formed of a non-metal material. | 11-08-2012 |
20120280389 | CHIP PACKAGE AND FABRICATION METHOD THEREOF - The invention provides A chip package, comprising: a semiconductor substrate having opposite first and second surfaces, at least one bond pad region, and at least one device region; a plurality of conductive pad structures disposed on the bond pad region at the first surface of the semiconductor substrate; and a plurality of heavily doped regions isolated from one another, underlying and electrically connected to the conductive pad structures, wherein the heavily doped regions are disposed in a carrier substrate which is bonded to the first surface of the semiconductor substrate. | 11-08-2012 |
20120286416 | SEMICONDUCTOR CHIP PACKAGE ASSEMBLY AND METHOD FOR MAKING SAME - A microelectronic assembly may include a microelectronic element having a plurality of element contacts at a face thereof, and a compliant dielectric element having a Young's modulus of less than about two gigapascal (GPa) and substrate contacts at a first surface joined to the element contacts. The substrate contacts may be electrically connected with terminals at a second surface of the compliant dielectric element that opposes the first surface, through conductive vias in the compliant dielectric element. A rigid underfill may be between the face of the microelectronic element and the first surface of the compliant dielectric element. The terminals may be usable for bonding the microelectronic assembly to corresponding contacts of a component external to the microelectronic assembly. | 11-15-2012 |
20120286417 | METHOD AND STRUCTURE FOR CONTROLLING PACKAGE WARPAGE - A method comprises determining a warpage of an integrated circuit (IC) package design. The IC package design includes a substrate having a top solder mask on a first major surface and a bottom solder mask on a second major surface opposite the first major surface. The first major surface has an IC die mounted over the top solder mask. The design is modified, including modifying an average thickness of one of the group consisting of the top solder mask and the bottom solder mask, so as to reduce the warpage. An IC package is fabricated according to the modified design. | 11-15-2012 |
20120286418 | Semiconductor Device and Method of Forming Dummy Pillars Between Semiconductor Die and Substrate for Maintaining Standoff Distance - A semiconductor device has a semiconductor die with an insulation layer formed over an active surface of the semiconductor die. A conductive layer is formed over the first insulating layer electrically connected to the active surface. A plurality of conductive pillars is formed over the conductive layer. A plurality of dummy pillars is formed over the first insulating layer electrically isolated from the conductive layer and conductive pillars. The semiconductor die is mounted to a substrate. A height of the dummy pillars is greater than a height of the conductive pillars to maintain the standoff distance between the semiconductor die and substrate. The dummy pillars can be formed over the substrate. The dummy pillars are disposed at corners of the semiconductor die and a central region of the semiconductor die. A mold underfill material is deposited between the semiconductor die and substrate. | 11-15-2012 |
20120286419 | SEMICONDUCTOR PACKAGE WITH INTERPOSER BLOCK THEREIN - A semiconductor package substrate is provided. The package substrate includes a mold base and an interposer block embedded in the mold base, said interposer block having a plurality of vertical conductive lines therein. A metallization layer is formed on the surface of the interposer block or the mold base, said metallization layer being electrically connected to at least one of the vertical conductive lines. A semiconductor chip may be mounted on or embedded in the mold base. | 11-15-2012 |
20120286420 | CHIP PACKAGE AND METHOD FOR FORMING THE SAME - An embodiment of the invention provides a chip package which includes: a first substrate; a second substrate disposed on the first substrate, wherein the second substrate has at least one opening penetrating through the second substrate, and the at least one opening defines a plurality of conducting regions electrically insulated from each other in the second substrate; a carrier substrate disposed on the second substrate; an insulating layer disposed on a surface and a sidewall of the carrier substrate, wherein the insulating layer fills the at least one opening of the second substrate; and a conducting layer disposed on the insulating layer on the carrier substrate and electrically contacting with one of the conducting regions. | 11-15-2012 |
20120286421 | CHIP PACKAGE AND METHOD FOR FORMING THE SAME - An embodiment of the invention provides a chip package which includes: a first substrate; a second substrate disposed on the first substrate, wherein the second substrate has at least one opening penetrating through the second substrate, and the at least one opening defines a plurality of conducting regions electrically insulated from each other in the second substrate; a first insulating layer disposed on a side of the first substrate and filling in the at least one opening of the second substrate; a carrier substrate disposed on the second substrate; a second insulating layer disposed on a surface and a sidewall of the carrier substrate; and a conducting layer disposed on the second insulating layer on the carrier substrate and electrically contacting with one of the conducting regions. | 11-15-2012 |
20120286422 | Semiconductor Device and Method of Forming Interconnect Structure for Encapsulated Die having Pre-Applied Protective Layer - A semiconductor device has a protective layer formed over an active surface of a semiconductor wafer. The semiconductor die with pre-applied protective layer are moved from the semiconductor wafer and mounted on a carrier. The semiconductor die and contact pads on the carrier are encapsulated. The carrier is removed. A first insulating layer is formed over the pre-applied protective layer and contact pads. Vias are formed in the first insulating layer and pre-applied protective layer to expose interconnect sites on the semiconductor die. An interconnect structure is formed over the first insulating layer in electrical contact with the interconnect sites on the semiconductor die and contact pads. The interconnect structure has a redistribution layer formed on the first insulating layer, a second insulating layer formed on the redistribution layer, and an under bump metallization layer formed over the second dielectric in electrical contact with the redistribution layer. | 11-15-2012 |
20120286423 | Doping Minor Elements into Metal Bumps - A method of forming a device includes providing a substrate, and forming a solder bump over the substrate. A minor element is introduced to a region adjacent a top surface of the solder bump. A re-flow process is then performed to the solder bump to drive the minor element into the solder bump. | 11-15-2012 |
20120286424 | DIE STACKING WITH AN ANNULAR VIA HAVING A RECESSED SOCKET - A die stack including a die having an annular via with a recessed conductive socket and methods of forming the die stack provide a structure for use in a variety of electronic systems. In an embodiment, a die stack includes a conductive pillar on the top of a die inserted into the recessed conductive socket of another die. | 11-15-2012 |
20120292759 | SEMICONDUCTOR DEVICE HAVING CHIP CRACK DETECTION STRUCTURE - A device includes a semiconductor substrate, a first penetration electrode and a plurality of second penetration electrodes each penetrating the semiconductor substrate, a first terminal and a plurality of second terminals formed on a one side of the substrate, and a third terminal and a plurality of fourth terminals formed on an opposite side of the substrate. Each of the first and third terminals is vertically aligned with and electrically connected to first penetration electrode. Each of the second terminals is vertically aligned with an associated one of the second penetration electrodes and electrically connected to another one of the second penetration terminals that is not vertically aligned with the associated second terminal. Each of fourth terminals is vertically aligned with and electrically connected to an associated one of the second penetration electrodes. | 11-22-2012 |
20120292760 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - To increase the manufacturing yield of semiconductor devices by improving a joint failure of a bump electrode. | 11-22-2012 |
20120292761 | BONDING PAD STRUCTURE AND INTEGRATED CIRCUIT COMPRISING A PLURALITY OF BONDING PAD STRUCTURES - A bonding pad structure positioned on an integrated circuit includes a connecting pad, an insulation layer and a gold bump. The connecting pad is formed on the integrated circuit. The insulation layer is formed on the connecting pad, where the insulation layer has only one opening and a shape of the opening includes at least a bend. The gold bump is formed on the insulation layer, where the gold bump is electrically connected to the connecting pad through the opening of the insulation layer. | 11-22-2012 |
20120299176 | Semiconductor Device and Method of Forming Bump Structure with Multi-Layer UBM Around Bump Formation Area - A semiconductor wafer has a first conductive layer formed over its active surface. A first insulating layer is formed over the substrate and first conductive layer. A second conductive layer is formed over the first conductive layer and first insulating layer. A UBM layer is formed around a bump formation area over the second conductive layer. The UBM layer can be two stacked metal layers or three stacked metal layers. The second conductive layer is exposed in the bump formation area. A second insulating layer is formed over the UBM layer and second conductive layer. A portion of the second insulating layer is removed over the bump formation area and a portion of the UBM layer. A bump is formed over the second conductive layer in the bump formation area. The bump contacts the UBM layer to seal a contact interface between the bump and second conductive layer. | 11-29-2012 |
20120299177 | SEMICONDUCTOR COMPONENT AND METHOD OF FABRICATING THE SAME - A semiconductor component structure is provided, which includes a body formed with openings, an insulating layer formed on surfaces of the body and the openings, conductive bumps formed in the openings, and a re-distributed circuit formed by conductive traces electrically connecting the conductive bumps, wherein the conductive traces are formed on a portion of the insulating layer on the body. As the conductive traces and the conductive bumps are formed on and in the body prior to the formation of the re-distributed circuit. The process for fabricating the semiconductor component structure is simplified and the reliability of the semiconductor component structure is enhanced. A method for fabricating the semiconductor component is also provided. | 11-29-2012 |
20120299178 | SEMICONDUCTOR DEVICE - A semiconductor device includes: a main body chip; a circuit pattern on a front surface of the main body chip and including a first pad; a cap chip including a first recess in a front surface of the cap chip and a second recess in a back surface of the cap chip, the cap chip being joined to the main body chip with the first recess facing the circuit pattern; a second pad on a bottom surface of the first recess of the cap chip; a first metallic member inlaid in the second recess of the cap chip; a first through electrode electrically connecting the second pad to the first metallic member through the cap chip; and a bump electrically connecting the first pad to the second pad. | 11-29-2012 |
20120299179 | THROUGH MOLD VIA POLYMER BLOCK PACKAGE - Methods for forming an integrated circuit chip package having through mold vias in a polymer block, and such packages are described. For example, a first interconnect layer may be formed on a molded polymer block, wherein the first interconnect layer comprises first interconnects through a first polymer layer and to the block. Then, at least one second interconnect layer may be formed on the first interconnect layer, wherein the second interconnect layer comprises second interconnects through a second polymer layer and to the first interconnects of the first interconnect layer. Through mold vias may then be farmed through the block, into the first interconnect layer, and to the first interconnects. The through mold vias may be filled with solder to form bumps contacting the first interconnects and extending above the block. Other embodiments are also described and claimed. | 11-29-2012 |
20120299180 | BONDING PAD STRUCTURE AND INTEGRATED CIRCUIT COMPRISING A PLURALITY OF BONDING PAD STRUCTURES - A bonding pad structure positioned on an integrated circuit includes a connecting pad, an insulation layer and a gold bump. The connecting pad is formed on the integrated circuit. The insulation layer is formed on the connecting pad, where the insulation layer has only one opening and a shape of the opening includes at least a bend. The gold bump is formed on the insulation layer, where the gold bump is electrically connected to the connecting pad through the opening of the insulation layer. | 11-29-2012 |
20120306070 | Electrical Connection for Chip Scale Packaging - A system and method for providing a post-passivation and underbump metallization is provided. An embodiment comprises a post-passivation layer that is larger than an overlying underbump metallization. The post-passivation layer extending beyond the underbump metallization shields the underlying layers from stresses generated from mismatches of the materials' coefficient of thermal expansion. | 12-06-2012 |
20120306071 | WAFER-LEVEL PACKAGE DEVICE - Wafer-level package semiconductor devices are described that have a smallest distance between two adjacent attachment bumps smaller than about twenty-five percent (25%) of a pitch between the two adjacent attachment bumps. The smallest distance between the two adjacent attachment bumps allows for an increase in the number of attachment bumps per area without reducing the size of the bumps, which increases solder reliability. The increased solder reliability may reduce stress to the attachment bumps, particularly stress caused by CTE mismatch during thermal cycling tests, dynamic deformation during drop tests or cyclic bending tests, and so on. | 12-06-2012 |
20120306072 | Semiconductor Wafer with Reduced Thickness Variation and Method for Fabricating Same - According to one embodiment, a semiconductor wafer comprises a plurality of solder bumps for providing device contacts formed over a functional region of the semiconductor wafer, and one or more support rings surrounding the functional region. The one or more support rings and the plurality of solder bumps are formed so as to have substantially matching heights. The presence of the one or more support rings causes the semiconductor wafer to have a substantially uniform thickness in the functional region after a thinning process is performed on the semiconductor wafer. A method for fabricating the semiconductor wafer comprises forming the plurality of solder bumps over the functional region, and forming the one or more support rings surrounding the functional region before performing the thinning process on the semiconductor wafer. | 12-06-2012 |
20120306073 | Connector Design for Packaging Integrated Circuits - A device includes a top dielectric layer having a top surface. A metal pillar has a portion over the top surface of the top dielectric layer. A non-wetting layer is formed on a sidewall of the metal pillar, wherein the non-wetting layer is not wettable to the molten solder. A solder region is disposed over and electrically coupled to the metal pillar. | 12-06-2012 |
20120306074 | SEMICONDUCTOR CHIP HAVING BUMP ELECTRODE, SEMICONDUCTOR DEVICE HAVING THE SEMICONDUCTOR CHIP, AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR DEVICE - A semiconductor chip includes: a substrate; a first bump electrode formed on one face of the substrate; a second bump electrode formed on other face of the substrate; and a conductive bonding material layer formed on a top face of at least one of the first bump electrode and the second bump electrode. The first bump electrode has a convex top face and the second bump electrode has a concave top face. | 12-06-2012 |
20120313238 | SEMICONDUCTOR CHIP PACKAGE ASSEMBLY AND METHOD FOR MAKING SAME - A microelectronic assembly may include a substrate containing a dielectric element having first and second opposed surfaces. The dielectric element may include a first dielectric layer adjacent the first surface, and a second dielectric layer disposed between the first dielectric layer and the second surface. A Young's modulus of the first dielectric layer may be at least 50% greater than the Young's modulus of the second dielectric layer, which is less than two gigapascal (GPa). A conductive structure may extend through the first and second dielectric layers and electrically connect substrate contacts at the first surface with terminals at the second surface. The substrate contacts may be joined with contacts of a microelectronic element through conductive masses, and a rigid underfill may be between the microelectronic element and the first surface. The terminals may be usable to bond the microelectronic assembly to contacts of a component external to the microelectronic assembly. | 12-13-2012 |
20120313239 | FLIP CHIP ASSEMBLY AND PROCESS WITH SINTERING MATERIAL ON METAL BUMPS - A microelectronic package includes a substrate overlying the front face of a microelectronic element. A plurality of metal bumps can project from conductive elements of the substrate towards the microelectronic element, the metal bumps having first ends extending from the conductive elements, second ends remote from the conductive elements, and lateral surfaces extending between the first and second ends. A conductive matrix material can contact the second ends and at least portions of the lateral surfaces of respective ones of the metal bumps and join the metal bumps with contacts of the microelectronic element. | 12-13-2012 |
20120313240 | SEMICONDUCTOR PACKAGE AND FABRICATION METHOD THEREOF - A semiconductor package includes a substrate having a flip chip bonding area. A plurality of recessed bump pads are disposed in the flip chip bonding area. The substrate further includes a solder mask that covers a circuit area. A chip having a plurality of metal bumps is mounted in the flip chip bonding area. The metal bumps are respectively connected to the recessed bump pads. An underfill is filled into the gap between the substrate and the chip. | 12-13-2012 |
20120313241 | METHODS FOR SURFACE ATTACHMENT OF FLIPPED ACTIVE COMPONENTS - A method for selectively transferring active components from a source substrate to a destination substrate includes pressing a first stamp having first pillars protruding therefrom against active components on the source substrate to adhere respective primary surfaces of the active components including electrical connections thereon to respective transfer surfaces of the first pillars. A second stamp having second pillars protruding therefrom is pressed against the active components on the first stamp to adhere respective secondary surfaces of the active components to respective transfer surfaces of the second pillars. The transfer surfaces of the second pillars have greater adhesive strength than the first pillars. The second stamp is pressed against a destination substrate to adhere the respective primary surfaces of the active components including the electrical connections thereon to a receiving surface of the destination substrate. | 12-13-2012 |
20120319269 | Enhanced Bump Pitch Scaling - An integrated circuit (IC) device is provided. In an embodiment the IC device includes an IC die configured to be bonded onto an IC routing member and a first plurality of pads that is located on a surface of the IC die, each pad being configured to be coupled to a respective pad of a second plurality of pads that is located on a surface of the IC routing member. A pad of the first plurality of pads is offset relative to a respective pad of the second plurality of pads such that the pad of the first plurality of pads is substantially aligned with the respective pad of the second plurality of pads after the IC die is bonded to the IC routing member. | 12-20-2012 |
20120319270 | Wafer Level Chip Scale Package with Reduced Stress on Solder Balls - A structure includes a metal pad over a semiconductor substrate, a passivation layer having a portion over the metal pad, and a first polyimide layer over the passivation layer, wherein the first polyimide layer has a first thickness and a first Young's modulus. A post-passivation interconnect (PPI) includes a first portion over the first polyimide layer, and a second portion extending into the passivation layer and the first polyimide layer. The PPI is electrically coupled to the metal pad. A second polyimide layer is over the PPI. The second polyimide layer has a second thickness and a second Young's modulus. At least one of a thickness ratio and a Young's modulus ratio is greater than 1.0, wherein the thickness ratio is the ratio of the first thickness to the second thickness, and the Young's modulus ratio is the ratio of the second Young's modulus to the first Young's modulus. | 12-20-2012 |
20120319271 | BUMP STRUCTURE AND PROCESS OF MANUFACTURING THE SAME - A bump structure comprises a first polymer block, a second polymer block, a first groove, an under bump metallurgy layer and a connection metal layer, wherein the first polymer block and the second polymer block are individual blocks. The first polymer block and the second polymer block are located at two sides of the first groove, the first polymer block comprises a first connection slot, and the second polymer block comprises a second connection slot communicated with the first connection slot and the first groove. The under bump metallurgy layer covers the first polymer block and the second polymer block to form a second groove, a third connection slot and a fourth connection slot communicated with each other. The connection metal layer covers the under bump metallurgy layer to form a third groove, a fifth connection slot and a sixth connection slot communicated with each other. | 12-20-2012 |
20120319272 | Flip Chip Interconnect Solder Mask - A solder mask for flip chip interconnection has a common opening that spans a plurality of circuit elements. The solder mask allows confinement of the solder during the re-melt stage of interconnection, yet it is within common design rules for solder mask patterning. Also, a substrate for flip chip interconnection includes a substrate having the common opening that spans a plurality of circuit elements. Also, a flip chip package includes a substrate having a common opening that spans a plurality of circuit elements. | 12-20-2012 |
20120319273 | Flip Chip Interconnect Solder Mask - A solder mask for flip chip interconnection has a common opening that spans a plurality of circuit elements. The solder mask allows confinement of the solder during the re-melt stage of interconnection, yet it is within common design rules for solder mask patterning. Also, a substrate for flip chip interconnection includes a substrate having the common opening that spans a plurality of circuit elements. Also, a flip chip package includes a substrate having a common opening that spans a plurality of circuit elements. | 12-20-2012 |
20120326296 | Semiconductor Device and Method of Forming Interconnect Structure Over Seed Layer on Contact Pad of Semiconductor Die Without Undercutting Seed Layer Beneath Interconnect Structure - A semiconductor device has a semiconductor die with a first conductive layer formed over the die. A first insulating layer is formed over the die with a first opening in the first insulating layer disposed over the first conductive layer. A second conductive layer is formed over the first insulating layer and into the first opening over the first conductive layer. An interconnect structure is constructed by forming a second insulating layer over the first insulating layer with a second opening having a width less than the first opening and depositing a conductive material into the second opening. The interconnect structure can be a conductive pillar or conductive pad. The interconnect structure has a width less than a width of the first opening. The second conductive layer over the first insulating layer outside the first opening is removed while leaving the second conductive layer under the interconnect structure. | 12-27-2012 |
20120326297 | Semiconductor Device and Method of Forming Protective Coating Over Interconnect Structure to Inhibit Surface Oxidation - A semiconductor device has a semiconductor die with a first conductive layer formed over the semiconductor die. A first insulating layer is formed over the semiconductor die with a first opening in the first insulating layer disposed over the first conductive layer. A second conductive layer is formed over the first insulating layer and into the first opening over the first conductive layer. An interconnect structure is formed over the first and second conductive layers within openings of a second insulating layer. The second insulating layer is removed. The interconnect structure can be a conductive pillar or conductive pad. A bump material can be formed over the conductive pillar. A protective coating is formed over the conductive pillar or pad to a thickness less than one micrometer to reduce oxidation. The protective coating is formed by immersing the conductive pillar or pad into the bath containing tin or indium. | 12-27-2012 |
20120326298 | BUMP STRUCTURE WITH BARRIER LAYER ON POST-PASSIVATION INTERCONNECT - A semiconductor device includes a barrier layer between a solder bump and a post-passivation interconnect (PPI) layer. The barrier layer is formed of at least one of an electroless nickel (Ni) layer, an electroless palladium (Pd) layer or an immersion gold (Au) layer. | 12-27-2012 |
20120326299 | SEMICONDUCTOR CHIP WITH DUAL POLYMER FILM INTERCONNECT STRUCTURES - Various semiconductor chip input/output structures and methods of making the same are disclosed. In one aspect, a method of manufacturing is provided that includes applying a first polymer film to a side of a semiconductor chip and forming a first underbump metallization structure with at least a portion on the first polymer film. A second polymer film is applied on the first polymer film with an opening exposing a portion of the first underbump metallization structure. | 12-27-2012 |
20120326300 | LOW PROFILE PACKAGE AND METHOD - In a method aspect, a multiplicity of ICs are attached to routing on a structurally supportive carrier (such as a wafer). The dice are encapsulated and then both the dice and the encapsulant layer are thinned with the carrier in place. A second routing layer is formed over the first encapsulant layer and conductive vias are provided to electrically couple the first and second routing layers as desired. External I/O contacts (e.g. solder bumps) are provided to facilitate electrical connection of the second routing layer (or a subsequent routing layer in stacked packages) to external devices. A contact encapsulant layer is then formed over the first encapsulant layer and the second routing layer in a manner that embeds the external I/O contacts at least partially therein. After the contact encapsulant layer has been formed, the carrier itself may be thinned significantly and singulated to provide a number of very low profile packages. The described approach can also be used to form stacked multi-chip packages. | 12-27-2012 |
20120326301 | THERMOSETTING RESIN COMPOSITION, FLIP-CHIP MOUNTING ADHESIVE, SEMICONDUCTOR DEVICE FABRICATION METHOD, AND SEMICONDUCTOR DEVICE - The present invention is aimed to provide a thermosetting resin composition which is easily produced, has excellent storage stability and thermal stability while maintaining high transparency and preventing formation of voids on the occasion of semiconductor chip bonding, and gives a cured product having excellent heat resistance, a flip-chip mounting adhesive containing the thermosetting resin composition, a method for producing a semiconductor device using the flip-chip mounting adhesive, and a semiconductor device produced by the method for producing a semiconductor device. The present invention is a thermosetting resin composition including an epoxy resin, an acid anhydride having a bicycle skeleton, and an imidazole curing accelerator that is in a liquid form at an ordinary temperature. | 12-27-2012 |
20120326302 | Semiconductor Device and Method of Forming PIP with Inner Known Good Die Interconnected with Conductive Bumps - A PiP semiconductor device has an inner known good semiconductor package. In the semiconductor package, a first via is formed in a temporary carrier. A first conductive layer is formed over the carrier and into the first via. The first conductive layer in the first via forms a conductive bump. A first semiconductor die is mounted to the first conductive layer. A first encapsulant is deposited over the first die and carrier. The semiconductor package is mounted to a substrate. A second semiconductor die is mounted to the first conductive layer opposite the first die. A second encapsulant is deposited over the second die and semiconductor package. A second via is formed in the second encapsulant to expose the conductive bump. A second conductive layer is formed over the second encapsulant and into the second via. The second conductive layer is electrically connected to the second die. | 12-27-2012 |
20120326303 | Semiconductor Device and Method of Forming Partially-Etched Conductive Layer Recessed Within Substrate for Bonding to Semiconductor Die - A semiconductor device has a substrate with a die attach area. A conductive layer is formed over a surface of the substrate and extending below the surface. An insulating layer is formed over the surface of the substrate outside the die attach area. A portion of the conductive layer is removed within the die attach area to expose sidewalls of the substrate. The remaining portion of the conductive layer is recessed below the surface of the substrate within the die attach area. A semiconductor die has bumps formed over its active surface. The semiconductor die is mounted to the substrate by bonding the bumps to the remaining portion of the first conductive layer recessed below the first surface of the substrate. The sidewalls of the substrate retain the bumps during bonding to the remaining portion of the conductive layer. An encapsulant is deposited between the semiconductor die and substrate. | 12-27-2012 |
20130001769 | Bump-on-Trace Structures with Increased Current Entrance Areas - A device includes a package component, and a metal trace on a surface of the package component. A first and a second dielectric mask cover a top surface and sidewalls of the metal trace, wherein a landing portion of the metal trace is located between the first and the second dielectric masks. The landing portion includes a first portion having a first width, and a second portion connected to an end of the first portion. The second portion has a second width greater than the first width, wherein the first and the second widths are measured in a direction perpendicular to a lengthwise direction of the metal trace. | 01-03-2013 |
20130001770 | WAFER LEVEL EMBEDDED AND STACKED DIE POWER SYSTEM-IN-PACKAGE PACKAGES - Wafer level embedded and stacked die power system-in-package semiconductor devices, and methods for making and using the same, are described. The methods include placing a first side of a substrate frame, which includes through cavity and an adjacent via, on a carrier. A first side of a component selected from an active device and a passive device can be placed on the carrier, within the cavity. A perimeter of the cavity can be attached to a perimeter of the component. Material at a second side of the substrate frame can be removed so the via extends from the frame's first side to the frame's second side. The substrate frame and component can then be removed from the carrier so that routing can be distributed between the first side of the frame and the first side of the component to electrically connect the component with the via. Other embodiments are described. | 01-03-2013 |
20130001771 | Semiconductor Device and Method of Forming FO-WLCSP with Discrete Semiconductor Components Mounted Under and Over Semiconductor Die - A semiconductor die has first and second discrete semiconductor components mounted over a plurality of wettable contact pads formed on a carrier. Conductive pillars are formed over the wettable contact pads. A semiconductor die is mounted to the conductive pillars over the first discrete components. The conductive pillars provide vertical stand-off of the semiconductor die as headroom for the first discrete components. The second discrete components are disposed outside a footprint of the semiconductor die. Conductive TSV can be formed through the semiconductor die. An encapsulant is deposited over the semiconductor die and first and second discrete components. The wettable contact pads reduce die and discrete component shifting during encapsulation. A portion of a back surface of the semiconductor die is removed to reduce package thickness. An interconnect structure is formed over the encapsulant and semiconductor die. Third discrete semiconductor components can be mounted over the semiconductor die. | 01-03-2013 |
20130001772 | SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME - A semiconductor device having redistribution interconnects in the WPP technology and improved reliability, wherein the redistribution interconnects have first patterns and second patterns which are electrically separated from each other within the plane of the semiconductor substrate, the first patterns electrically coupled to the multi-layer interconnects and the floating second patterns are coexistent within the plane of the semiconductor substrate, and the occupation ratio of the total of the first patterns and the second patterns within the plane of the semiconductor substrate, that is, the occupation ratio of the redistribution interconnects is 35 to 60%. | 01-03-2013 |
20130001773 | Semiconductor Device and Method of Forming a Wafer Level Package Structure Using Conductive Via and Exposed Bump - A semiconductor device has a carrier. A semiconductor wafer including a semiconductor die is mounted to the carrier with an active surface of the semiconductor die facing away from the carrier. A plurality of bumps is formed over the active surface of the semiconductor die. An opening is formed in a periphery of the semiconductor die. An encapsulant is deposited over the carrier and semiconductor die, in the opening, and around the plurality of bumps such that an exposed portion of the plurality of bumps is devoid of encapsulant. A conductive via is formed through the encapsulant, within the opening, and extends to the carrier. A conductive layer is formed over the encapsulant and electrically connects to the conductive via and the exposed portion of the plurality of bumps. The carrier is removed to expose an end of the conductive via. | 01-03-2013 |
20130001774 | ELECTRICALLY CONDUCTIVE PASTE, AND ELECTRICALLY CONDUCTIVE CONNECTION MEMBER PRODUCED USING THE PASTE - Providing the conductive paste for the material forming the conductive connecting member without disproportionately located holes (gaps), coarse voids, and cracks, which improves thermal cycle and is excellent in crack resistance and bonding strength. An conductive paste including metal fine particles (P) comprising metal fine particles (P1) of one or more than two kinds selected from metal and alloy thereof, having mean primary particle diameter from 1 to 150 nm, and metal fine particles (P2) of same metal as the metal fine particles (P1), having mean primary particle diameter from 1 to 10 μm, mixing ratio of (P1/P2) being from 80 to 95 mass % for P1 and from 20 to 5 mass % for P2 (a total of mass % being 100 mass %); and organic dispersion medium (D) comprising organic solvent (S), or organic solvent (S) and organic binder (B), mixing ratio (P/D) of the metal fine particles (P) and the organic dispersion medium (D) being from 50 to 85 mass % for P and from 50 to 15 mass % for D (a total of mass % being 100 mass %). | 01-03-2013 |
20130001775 | CONDUCTIVE CONNECTING MEMBER AND MANUFACTURING METHOD OF SAME - A conductive connecting member formed on a bonded face of an electrode terminal of a semiconductor or an electrode terminal of a circuit board, the conductive connecting member comprising a porous body formed in such manner that a conductive paste containing metal fine particles (P) having mean primary particle diameter from 10 to 500 nm and an organic solvent (S), or a conductive paste containing the metal fine particles (P) and an organic dispersion medium (D) comprising the organic solvent (S) and an organic binder (R) is heating-treated so as for the metal fine particles (P) to be bonded, the porous body being formed by bonded metal fine particles (P) having mean primary particle diameter from 10 to 500 nm, a porosity thereof being from 5 to 35 volume %, and mean pore diameter being from 1 to 200 nm. | 01-03-2013 |
20130009303 | Connecting Function Chips To A Package To Form Package-On-Package - A package-on-package (PoP) comprises a substrate with a plurality of substrate traces, a first function chip on top of the substrate connected to the substrate by a plurality of bond-on-trace connections, and a second function chip on top of the first function chip, directly connected to the substrate. Another package-on-package (PoP) comprises: a substrate with a plurality of substrate traces, a first function chip on top of the substrate connected to the substrate by a plurality of solder mask defined (SMD) connections formed on SMD bonding pads connected to solder bumps, and a second function chip on top of the first function chip, directly connected to the substrate by a plurality of bond-on-trace connections. | 01-10-2013 |
20130009304 | CHIP-STACKED SEMICONDUCTOR PACKAGE - A chip-stacked semiconductor package including a stacked chip structure including a plurality of separate chips stacked on each other; a flexible circuit substrate having the stacked chip structure mounted on a first side of the flexible circuit substrate in a first region of the flexible circuit substrate, and being electrically connected to at least one of the plurality of separate chips of the stacked chip structure by folding a second region of the flexible circuit substrate; a sealing portion sealing the stacked chip structure and the flexible circuit substrate; and an external connecting terminal on a second side of the flexible circuit substrate. | 01-10-2013 |
20130009305 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device having a first via and a first interconnect supplying a high current is provided in which a first surface having the first via and the first interconnect is planar. The semiconductor device has a first via penetrating a first substrate from a first surface of the first substrate and a first interconnect buried in the first surface of the first substrate and connected with one end of at least one first via. The first via has an inclined portion where an angle formed between a lateral side of the first via and the bottom of the first via is larger than an angle formed between a lateral side of the first interconnect and the bottom of the first interconnect. | 01-10-2013 |
20130009306 | PACKAGING SUBSTRATE AND FABRICATION METHOD THEREOF - A packaging substrate includes a first dielectric layer, a first circuit layer, a first metal bump, and a built-up structure. The first metal bump and the first circuit layer are embedded in and exposed from two surfaces of the first dielectric layer. The end of the first metal bump is embedded in the first circuit layer and between the first circuit layer and the first dielectric layer. In addition, a conductive seedlayer is disposed between the first circuit layer and the first metal bump. The built-up structure is disposed on the first circuit layer and the first dielectric layer. The outmost layer of the built-up structure has a plurality of conductive pads. Compared to the prior art, the present invention can effectively improve the warpage problem of the conventional packaging substrate. | 01-10-2013 |
20130015569 | Semiconductor Device and Method of Forming Substrate With Seated Plane for Mating With Bumped Semiconductor DieAANM Anderson; Samuel J.AACI TempeAAST AZAACO USAAGP Anderson; Samuel J. Tempe AZ USAANM Smiley; Thomas B.AACI CarlsbadAAST CAAACO USAAGP Smiley; Thomas B. Carlsbad CA US - A semiconductor device has a first insulating layer formed over a substrate. The substrate has a plurality of conductive layers and plurality of second insulating layers formed between the conductive layers. The substrate can be a PCB or interposer. A plurality of openings is formed in the first insulating layer by etching or laser direct ablation. A semiconductor die has a plurality of bumps formed over a surface of the semiconductor die. The pattern of openings coincides with a pattern of the bumps. The die is mounted to the substrate with the bumps disposed within the openings in the first insulating layer. Alternatively, a conductive paste can be disposed within the openings in the first insulating layer. The bumps are reflowed to electrically connect the die to the first substrate. The bumps are substantially contained within the openings of the first insulating layer to reduce bridging between adjacent bumps. | 01-17-2013 |
20130015570 | STACKED SEMICONDUCTOR PACKAGE AND MANUFACTURING METHOD THEREOFAANM Sato; TakaoAACI Edogawa-kuAACO JPAAGP Sato; Takao Edogawa-ku JP - In an embodiment, a stacked semiconductor package includes a wiring board having external connection terminals and internal connection terminals, and first and second modules stacked on the wiring board. Each of the first and second modules includes a plurality of semiconductor chips mounted on an interposer and a sealing resin layer. The interposers and the internal connection terminals of the wiring board are electrically connected by connecting members such as metal wires, printed wiring layers or metal bumps. The first and second modules are collectively sealed by a sealing resin layer formed on the wiring board. | 01-17-2013 |
20130015571 | Semiconductor Package And Method Of Manufacturing The SameAANM CHUN; Jung HwanAACI Chungcheongnam-DoAACO KRAAGP CHUN; Jung Hwan Chungcheongnam-Do KR - A semiconductor package and a method of manufacturing the same. The semiconductor package includes; a printed circuit board (PCB); a first semiconductor chip attached onto the PCB; an interposer that is attached onto the first semiconductor chip to cover a portion of the first semiconductor chip and comprises first connection pad units and second connection pad units that are electrically connected to each other, respectively, on an upper surface opposite to a surface of the interposer facing the first semiconductor chip; a second semiconductor chip attached onto the first semiconductor chip and the interposer as a flip chip type; a plurality of bonding wires that electrically connect the second connection pad units of the interposer to the PCB or the first semiconductor chip to the PCB; and a sealing member formed on the PCB to surround the first semiconductor chip, the second semiconductor chip, the interposer, and the bonding wires. | 01-17-2013 |
20130015572 | ELECTRONIC ASSEMBLY INCLUDING AN EMBEDDED ELECTRONIC COMPONENTAANM Ostmann; AndreasAACI BerlinAACO DEAAGP Ostmann; Andreas Berlin DEAANM Manessis; DionysiosAACI BerlinAACO DEAAGP Manessis; Dionysios Berlin DEAANM Bottcher; LarsAACI BerlinAACO DEAAGP Bottcher; Lars Berlin DEAANM Karaszkiewicz; StefanAACI BerlinAACO DEAAGP Karaszkiewicz; Stefan Berlin DE - An electronic unit is produced including at least one electronic component at least partially embedded in an insulating material. A film assembly is provided with at least one conductive layer and a carrier layer. The conductive layer includes openings in the form of holes for receiving bumps, which are connected to contact surfaces of the at least one electronic component. The at least one component is placed on the film assembly such that the bumps engage with the openings of the conductive layer. The at least one component is partially embedded from the side opposite of the bumps into a dielectric layer. The carrier layer of the film assembly is removed such that the surface of the bumps is exposed. A metallization layer is then deposited on the side of the remaining conductive layer having the exposed bumps and so as to produce conductor tracks that overlap with the bumps. | 01-17-2013 |
20130015573 | BALL GRID ARRAY WITH IMPROVED SINGLE-ENDED AND DIFFERENTIAL SIGNAL PERFORMANCE - An improved system and method for assigning power and ground pins and single ended or differential signal pairs for a ball grid array semiconductor package. In certain embodiments, the system uses a hexagonal pattern where the grid may be represented by a multiplicity of nested hexagonal patterns. | 01-17-2013 |
20130015574 | BUMP I/O CONTACT FOR SEMICONDUCTOR DEVICE - A bump contact electrically connects a conductor on a substrate and a contact pad on a semiconductor device mounted to the substrate. The first end of an electrically conductive pillar effects electrical contact and mechanical attachment of the pillar to the contact pad with the pillar projecting outwardly from the semiconductor device. A solder crown reflowable at a predetermined temperature into effecting electrical contact and mechanical attachment with the conductor is positioned in axial alignment with the second end of the pillar. A diffusion barrier electrically and mechanically joins the solder bump to the second end of the pillar and resists electro-migration into the first end of the solder crown of copper from the pillar. One diffusion barrier takes the form of a 2-20 micron thick control layer of nickel, palladium, titanium-tungsten, nickel-vanadium, or tantalum nitride positioned between the pillar and the solder crown. | 01-17-2013 |
20130015575 | Semiconductor Device with Solder Bump Formed on High Topography Plated Cu Pads - A semiconductor device has a first conductive layer formed over a substrate. A first insulating layer is formed over the substrate and first conductive layer. A second conductive layer is formed over the first conductive layer and first insulating layer. A second insulating layer is formed over the first insulating layer and second conductive layer. The second insulating layer has a sidewall between a surface of the second insulating material and surface of the second conductive layer. A protective layer is formed over the second insulating layer and surface of the second conductive layer. The protective layer follows a contour of the surface and sidewall of the second insulating layer and second conductive layer. A bump is formed over the surface of the second conductive layer and a portion of the protective layer adjacent to the second insulating layer. The protective layer protects the second insulating layer. | 01-17-2013 |
20130015576 | Solder Bump with Inner Core Pillar in Semiconductor Package - A flip chip semiconductor package has a substrate with a plurality of active devices. A contact pad is formed on the substrate in electrical contact with the plurality of active devices. A passivation layer, second barrier layer, and adhesion layer are formed between the substrate and an intermediate conductive layer. The intermediate conductive layer is in electrical contact with the contact pad. A copper inner core pillar is formed by plating over the intermediate conductive layer. The inner core pillar has a rectangular, cylindrical, toroidal, or hollow cylinder form factor. A solder bump is formed around the inner core pillar by plating solder material and reflowing the solder material to form the solder bump. A first barrier layer and wetting layer are formed between the inner core pillar and solder bump. The solder bump is in electrical contact with the intermediate conductive layer. | 01-17-2013 |
20130015577 | Semiconductor Device and Method of Forming Base Substrate with Cavities Formed through Etch-Resistant Conductive Layer for Bump Locking - A semiconductor device has a base substrate with first and second etch-resistant conductive layers formed over opposing surfaces of the base substrate. First cavities are etched in the base substrate through an opening in the first conductive layer. The first cavities have a width greater than a width of the opening in the first conductive layer. Second cavities are etched in the base substrate between portions of the first or second conductive layer. A semiconductor die is mounted over the base substrate with bumps disposed over the first conductive layer. The bumps are reflowed to electrically connect to the first conductive layer and cause bump material to flow into the first cavities. An encapsulant is deposited over the die and base substrate. A portion of the base substrate is removed down to the second cavities to form electrically isolated base leads between the first and second conductive layers. | 01-17-2013 |
20130020697 | TECHNIQUES AND STRUCTURES FOR TESTING INTEGRATED CIRCUITS IN FLIP-CHIP ASSEMBLIES - A method for rejoining an IC die, removed from an existing substrate, to a new substrate, is disclosed herein. In one embodiment, such a method includes grinding an existing substrate from an IC die to create a substantially planar surface exposing interconnects and surrounding underfill material. A new substrate is provided having electrically conductive pedestals protruding therefrom. The electrically conductive pedestals are positioned to align with the exposed interconnects and have a melting point substantially higher than the melting point of the interconnects. The method places the exposed interconnects in contact with the electrically conductive pedestals. The method then applies a reflow process to melt and electrically join the exposed interconnects with the electrically conductive pedestals. A structure produced by the method is also disclosed. | 01-24-2013 |
20130020698 | Pillar Design for Conductive Bump - A system and method for conductive pillars is provided. An embodiment comprises a conductive pillar having trenches located around its outer edge. The trenches are used to channel conductive material such as solder when a conductive bump is formed onto the conductive pillar. The conductive pillar may then be electrically connected to another contact through the conductive material. | 01-24-2013 |
20130020699 | PACKAGE STRUCTURE AND METHOD FOR FABRICATING THE SAME - The invention provides a package structure, including: a substrate, wherein the substrate has a first surface and a second surface, and a first pattern metal layer is formed on the first surface, and a second patterned metal layer is formed on the second surface, and the substrate has a plurality of vias formed therein, wherein the first patterned metal layer is electrically connected to the second patterned metal layer through the plurality of vias, and the widths of the plurality of vias are gradually increased from the first surface to the second surface; a chip formed on the first surface of the substrate; and a molding material is formed on the substrate and the chip, wherein the chip is covered by the molding material. | 01-24-2013 |
20130020700 | CHIP PACKAGE AND FABRICATION METHOD THEREOF - An embodiment of the present invention relates to a chip package and fabrication method thereof, which includes a semiconductor substrate containing a chip area and a peripheral pad area surrounding the chip area, wherein a conductive pad and a through hole exposing the conductive pad are formed in the peripheral pad area; a protection layer covering a bottom surface of the semiconductor substrate and the through hole; a packaging layer formed on an upper surface of the semiconductor substrate; and a spacing layer formed between the packaging layer and the semiconductor substrate, wherein the chip packaging has a main side surface constituted of side surfaces of the semiconductor substrate, the protecting layer, the packaging layer and the spacing layer, and wherein the main side surface has at least one recess portion. | 01-24-2013 |
20130020701 | SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME - A technique which improves the reliability in coupling between a bump electrode of a semiconductor chip and wiring of a mounting substrate, more particularly a technique which guarantees the flatness of a bump electrode even when wiring lies in a top wiring layer under the bump electrode, thereby improving the reliability in coupling between the bump electrode and the wiring formed on a glass substrate. Wiring, comprised of a power line or signal line, and a dummy pattern are formed in a top wiring layer beneath a non-overlap region of a bump electrode. The dummy pattern is located to fill the space between wirings to reduce irregularities caused by the wirings and space in the top wiring layer. A surface protection film formed to cover the top wiring layer is flattened by CMP. | 01-24-2013 |
20130026618 | METHOD AND DEVICE FOR CIRCUIT ROUTING BY WAY OF UNDER-BUMP METALLIZATION - The present disclosure involves a semiconductor device. The semiconductor device includes a substrate that contains a plurality of electronic components. The semiconductor device includes an interconnect structure disposed over the substrate, the interconnect structure containing a plurality of interconnect layers. The semiconductor device includes a passivation layer disposed over the interconnect structure. The semiconductor device includes an Under-Bump Metallization (UBM) layer disposed over the passivation layer, the UBM layer containing a UBM pad and a plurality of UBM devices, the UBM devices including at least one of: a UBM trace that is electrically coupled to one of the electronic components through the interconnect structure, and a dummy UBM device. The semiconductor device includes a solder bump disposed on, and electrically coupled to, the UBM pad. | 01-31-2013 |
20130026619 | BUMP STRUCTURES - The embodiments of bump and bump-on-trace (BOT) structures provide bumps with recess regions for reflowed solder to fill. The recess regions are placed in areas of the bumps where reflow solder is most likely to protrude. The recess regions reduce the risk of bump to trace shorting. As a result, yield can be improved. | 01-31-2013 |
20130026620 | SELF-ALIGNING CONDUCTIVE BUMP STRUCTURE AND METHOD OF MAKING THE SAME - The disclosure relates to a conductive bump structure of a semiconductor device. An exemplary structure for a semiconductor device comprises a substrate comprising a major surface and conductive bumps distributed over the major surface of the substrate. Each of a first subset of the conductive bumps comprise a regular body, and each of a second subset of the conductive bumps comprise a ring-shaped body. | 01-31-2013 |
20130026621 | METAL BUMP STRUCTURE - A semiconductor device comprises a substrate comprising a major surface and a plurality of metal bumps on the major surface. Each of the plurality of metal bumps comprises a metal via on the major surface and a metal pillar on the metal via having an overlay offset between the metal pillar and metal via. A first metal bump of the metal bumps has a first overlay offset and a second metal bump of the metal bumps farther than the first metal bump to a centroid of the substrate has a second overlay offset greater than the first overlay offset. | 01-31-2013 |
20130026622 | BUMP STRUCTURES IN SEMICONDUCTOR DEVICE AND PACKAGING ASSEMBLY - A bump structure in a semiconductor device or a packing assembly includes an under-bump metallization (UBM) layer formed on a conductive pad of a semiconductor substrate. The UBM layer has a width greater than a width of the conductive pad. | 01-31-2013 |
20130026623 | Semiconductor Devices, Packaging Methods and Structures - Semiconductor devices, packaging methods and structures are disclosed. In one embodiment, a semiconductor device includes an integrated circuit die with a surface having a peripheral region and a central region. A plurality of bumps is disposed on the surface of the integrated circuit die in the peripheral region. A spacer is disposed on the surface of the integrated circuit die in the central region. | 01-31-2013 |
20130026624 | COAXIAL SOLDER BUMP SUPPORT STRUCTURE - A solder bump support structure and method of manufacturing thereof is provided. The solder bump support structure includes an inter-level dielectric (ILD) layer formed over a silicon substrate. The ILD layer has a plurality of conductive vias. The structure further includes a first insulation layer formed on the ILD layer. The solder bump support structure further includes a pedestal member formed on the ILD layer which includes a conductive material formed above the plurality of conductive vias in the ILD layer coaxially surrounded by a second insulation layer. The second insulation layer is thicker than the first insulation layer. The structure further includes a capping under bump metal (UBM) layer formed over, and in electrical contact with, the conductive material and formed over at least a portion of the second insulation layer of the pedestal member. | 01-31-2013 |
20130026625 | FLIP-CHIP SEMICONDUCTOR DEVICE HAVING ANISOTROPIC ELECTRICAL INTERCONNECTION AND SUBSTRATE UTILIZED FOR THE PACKAGE - Disclosed is a flip-chip semiconductor device having isotropic electrical interconnection, primarily comprising a chip and a substrate. The chip has at least a first bump and a plurality of second bumps. The substrate has a plurality of bump pads disposed on the top surface and an isotropic connecting mechanism disposed inside the substrate consisting of a plurality of terminals electrically isolated from each other and a flexible vertical pad protruded from the top surface, wherein the disposition locations of the terminals circle around the flexible vertical pad as a disposition center. When the second bumps of the chip are bonded onto the corresponding bump pads, the first bump presses and bends the flexible vertical pad in a specific horizontal direction so that the flexible vertical pad selectively and electrically connect to a selected one of the terminals. | 01-31-2013 |
20130026626 | METHOD FOR FORMING BUMPS AND SUBSTRATE INCLUDING THE BUMPS - Disclosed herein are a method for forming bumps and a substrate including the bumps. The method includes: coating a solder resist on a substrate and electrodes formed on the substrate: performing laser etching treatment on the solder resist to form openings for forming bumps; printing a composition for forming bumps in the openings for forming bumps; and performing a reflowing process. | 01-31-2013 |
20130026627 | ELECTRONIC CHIP COMPRISING CONNECTION PILLARS AND MANUFACTURING METHOD - An electronic chip including a semiconductor substrate ( | 01-31-2013 |
20130026628 | Flip Chip Interconnection having Narrow Interconnection Sites on the Substrate - A flip chip interconnect of a die on a substrate is made by mating the interconnect bump onto a narrow interconnect pad on a lead or trace, rather than onto a capture pad. The width of the narrow interconnect pad is less than a base diameter of bumps on the die to be attached. Also, a flip chip package includes a die having solder bumps attached to interconnect pads in an active surface, and a substrate having narrow interconnect pads on electrically conductive traces in a die attach surface, in which the bumps are mated onto the narrow pads on the traces. | 01-31-2013 |
20130026629 | SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE UNIT, AND SEMICONDUCTOR DEVICE PRODUCTION METHOD - An example of a semiconductor device according to the present invention includes: a protective film ( | 01-31-2013 |
20130032938 | THREE DIMENSIONAL SEMICONDUCTOR ASSEMBLY BOARD WITH BUMP/FLANGE SUPPORTING BOARD, CORELESS BUILD-UP CIRCUITRY AND BUILT-IN ELECTRONIC DEVICE - A semiconductor assembly board includes a supporting board, a coreless build-up circuitry and a built-in electronic device. The supporting board includes a bump, a flange and a via hole in the bump. The built-in electronic device extends into the via hole and is electrically connected to the build-up circuitry. The build-up circuitry extends from the flange and the built-in electronic device and provides signal routing for the built-in electronic device. The supporting board provides mechanical support, ground/power plane and heat sink for the coreless build-up circuitry. | 02-07-2013 |
20130032939 | CHIP PACKAGE STRUCTURE - A chip package structure includes a flexible substrate having a chip mounting region, a plurality of leads disposed on the flexible substrate, an insulating layer and a chip. Each lead includes a body portion and an inner lead portion connected to each other. The body portion is located outside the chip mounting region and has a thickness greater than that of the inner lead portion. The insulating layer is disposed on the inner lead portions. The chip has an active surface on which a plurality of bumps and a seal ring adjacent to the chip edges are disposed. The chip is mounted within the chip mounting region and electrically connects the flexible substrate by connecting the inner lead portions of the leads with the bumps. The insulating layer is corresponding to the seal ring in position when the chip is electrically connected to the flexible substrate. | 02-07-2013 |
20130032940 | CHIP PACKAGE STRUCTURE - A chip package structure includes a chip, a flexible substrate, first leads and second leads. First bumps, second bumps and a seal ring are disposed on an active surface of the chip. The first and second bumps are respectively adjacent to first and second edges of the chip. The seal ring is located between the bumps and the edges. The chip is disposed in a chip mounting region of the flexible substrate. The first and second edges correspond to first and second sides of the chip mounting region respectively. The first leads disposed on the flexible substrate enter the chip mounting region through the first side and extend toward the second side to electrically connect the second bumps respectively. The second leads disposed on the flexible substrate enter the chip mounting region through the second side and extend toward the first side to electrically connect the first bumps respectively. | 02-07-2013 |
20130032941 | ROUTING LAYER FOR MITIGATING STRESS IN A SEMICONDUCTOR DIE - A routing layer for a semiconductor die is disclosed. The routing layer includes traces interconnecting integrated circuit bond-pads to UBMs. The routing layer is formed on a layer of dielectric material. The routing layer includes conductive traces arranged underneath the UBMs as to absorb stress from solder bumps attached to the UMBs. Traces beneath the UBMs protect parts of the underlying dielectric material proximate the solder bumps, from the stress. | 02-07-2013 |
20130037933 | SEMICONDUCTOR PACKAGE WITH UNDER BUMP METALLIZATION ROUTING - A semiconductor package includes a semiconductor substrate a semiconductor substrate having source and drain regions formed therein, an intermediate routing structure to provide electrical interconnects to the source and drain regions, a dielectric layer formed over the intermediate routing structure, and an under-bump-metallization (UBM) stack. The intermediate routing structure includes an outermost conductive layer, and the dielectric layer has an opening positioned over a portion of the intermediate layer routing structure. The UBM stack includes a conductive base layer formed over the dielectric layer and electrically connected to the outermost conductive layer through the opening, and a thick conductive layer formed on the base layer. A conductive bump is positioned on the UBM stack and laterally spaced from the opening. | 02-14-2013 |
20130037934 | INTEGRATED CIRCUIT CHIP WITH REDUCED IR DROP - An integrated circuit chip includes a power/ground interconnection network in a topmost metal layer over a semiconductor substrate and at least a bump pad on/over the power/ground interconnection network. The power/ground mesh interconnection network includes a first power/ground line connected to the bump pad and extending along a first direction, and a connection portion connected to the bump pad and extending along a second direction. | 02-14-2013 |
20130037935 | WAFER LEVEL PACKAGE STRUCTURE AND THE FABRICATION METHOD THEREOF - The present invention relates to a package for semiconductor device and the fabrication method for integrally encapsulating a whole semiconductor chip within a molding compound. In the semicondcutor device package, bonding pads distributed on the top of the chip are redistributed into an array of redistributed bonding pads located in an dielectric layer by utilizing the redistribution technique. The electrodes or signal terminals on the top of the semiconductor chip are connected to an electrode metal segment on the bottom of the chip by conductive materials filled in through holes formed in a silicon substrate of a semiconductor wafer. Furthermore, the top molding portion and the bottom molding portion seal the semiconductor chip completely, thus providing optimum mechanical and electrical protections. | 02-14-2013 |
20130037936 | Semiconductor Device and Method of Forming a Stackable Semiconductor Package with Vertically-Oriented Discrete Electrical Devices as Interconnect Structures - A semiconductor device has a substrate and first semiconductor die to the substrate. A plurality of vertically-oriented discrete electrical devices, such as a capacitor, inductor, resistor, diode, or transistor, is mounted over the substrate in proximity to the first semiconductor die. A first terminal of the discrete electrical devices is connected to the substrate. A plurality of bumps is formed over the substrate adjacent to the discrete electrical devices. An encapsulant is deposited over and between the first semiconductor die and substrate. A portion of the bumps and a second terminal of the discrete electrical devices is exposed from the encapsulant. An interconnect structure is formed over a surface of the substrate opposite the first semiconductor die. The semiconductor devices are stackable and electrically connected through the substrate, discrete electrical devices, and bumps. A heat spreader or second semiconductor die can be disposed between the stacked semiconductor devices. | 02-14-2013 |
20130037937 | BUMP PAD STRUCTURE - A bump pad structure for a semiconductor package is disclosed. A bump pad structure includes a conductive pad disposed on an insulating layer. A ring-shaped conductive layer is embedded in the insulating layer and is substantially under and along an edge of the conductive pad. At least one conductive via plug is embedded in the insulating layer and between the conductive pad and the ring-shaped conductive layer, such that the conductive pad is electrically connected to the ring-shaped conductive layer. | 02-14-2013 |
20130037938 | EMBEDDED PACKAGE AND METHOD FOR MANUFACTURING THE SAME - An embedded package includes a semiconductor chip divided into a cell region and a peripheral region, having a first surface and a second surface which faces away from the first surface, and including an integrated circuit which is formed in the cell region on the first surface, a bonding pad which is formed in the peripheral region on the first surface and a bump which is formed over the bonding pad; a core layer attached to the second surface of the semiconductor chip; an insulation component formed over the core layer including the semiconductor chip and having an opening which exposes the bump; and a circuit wiring line formed over the insulation component and the bump and electrically connected to is the bump, wherein the insulation component formed in the cell region has a thickness larger than a height of the bump. | 02-14-2013 |
20130037939 | SEMICONDUCTOR PACKAGE AND STACK-TYPE SEMICONDUCTOR PACKAGE HAVING THE SAME - A semiconductor package includes a semiconductor chip having a first surface, a second surface which faces away from the first surface, and through holes which pass through the first surface and the second surface; a dielectric layer formed on one or more of the first surface and the second surface and formed with grooves around the through holes on a fourth surface of the dielectric layer facing away from a third surface of the dielectric layer which is attached to the semiconductor chip; through-silicon vias filling the through holes; and bumps formed on the through-silicon vias and on portions of the dielectric layer around the through-silicon vias and filling the grooves. | 02-14-2013 |
20130037940 | METHOD FOR INHIBITING GROWTH OF INTERMETALLIC COMPOUNDS - The present invention relates to a method for inhibiting growth of intermetallic compounds, comprising the steps of: (i) preparing a substrate element including a substrate on which at least one layer of metal pad is deposited, wherein at least one thin layer of solder is deposited onto the layer of metal pad, and then carry out reflowing process; and (ii) further depositing a bump of solder with an appropriate thickness on the substrate element, characterized in that a thin intermetallic compound is formed by the reaction of the thin solder layer and the metal in the metal pad after appropriate heat treatment of the thin solder layer. In the present invention, the formation of a thin intermetallic compound is able to slow the growth of the intermetallic compound and to prevent the transformation of the intermetallic compounds. | 02-14-2013 |
20130037941 | SEMICONDUCTOR DEVICE REDUCING RISKS OF A WIRE SHORT-CIRCUIT AND A WIRE FLOW - A semiconductor device includes a wiring substrate having first and second connection pads on a main surface thereof, a first semiconductor chip having first electrode pads, a second semiconductor chip having second electrode pads each of which has a size smaller than that of each of the first electrode pads, first wires connecting the first electrode pads with the first connection pads, and second wires connecting the second electrode pads with the second connection pads. The second wires have wide width parts at first ends. The first electrode pads are larger than the wide width parts while the second electrode pads are smaller than the wide width parts. The wide width parts are connected the second connection pads and the second wires have second ends connected to the second electrode pads via bump electrodes which are smaller than the second electrode pads. | 02-14-2013 |
20130037942 | SEMICONDUCTOR CHIPS HAVING A DUAL-LAYERED STRUCTURE, PACKAGES HAVING THE SAME, AND METHODS OF FABRICATING THE SEMICONDUCTOR CHIPS AND THE PACKAGES - Dual-layered structural semiconductor chips are provided. The semiconductor chip includes a first semiconductor chip and a second semiconductor chip bonded to the first semiconductor chip. The first semiconductor chip includes a first substrate having a first bottom surface. The second semiconductor chip includes a second substrate having a second bottom surface. The first bottom surface directly contacts the second bottom surface. The related packages and the related methods are also provided. | 02-14-2013 |
20130037943 | SEMICONDUCTOR DEVICE, SEMICONDUCTOR PACKAGE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR PACKAGE - A semiconductor device includes a semiconductor substrate, which includes a through hole that extends through the semiconductor substrate. An insulative layer includes a first surface, an opposite second surface covering the semiconductor substrate, and an opening aligned with the through hole. An insulative film covers an inner wall surface of the semiconductor substrate and the opening. A through electrode is formed in the through hole and the opening inward from the insulative film. The through electrode includes a first end surface that forms a pad exposed from the first surface of the insulative layer. The first end surface of the through electrode is flush with the first surface of the insulative layer. | 02-14-2013 |
20130037944 | Chip Stack Packages Having Aligned Through Silicon Vias of Different Areas - A chip stack package includes a first semiconductor chip, a second semiconductor chip and a third semiconductor chip. The first semiconductor chip includes a first through silicon via that extends through the first semiconductor chip. The second semiconductor chip is stacked on the first semiconductor chip, and includes a second through silicon via that extends through the second semiconductor chip. The second through silicon via is disposed on the first through silicon via, and has a cross-sectional area smaller than that of the first through silicon via. The third semiconductor chip is stacked on the first semiconductor chip, and includes a third through silicon via that extends through the third semiconductor chip. The third through silicon via is disposed on the second through silicon via, and has a cross-sectional area smaller than that of the second through silicon via. | 02-14-2013 |
20130037945 | SEMICONDUCTOR DEVICE - Provided is a semiconductor device in which misalignment between a semiconductor die and a substrate (e.g., a circuit board) can be prevented or substantially reduced when the semiconductor die is attached to the circuit board. In a non-limiting example, the semiconductor device includes: a semiconductor die comprising at least one bump; and a circuit board comprising at least one circuit pattern to which the bump is electrically connected. In a non-limiting example, the circuit board comprises: an insulation layer comprising a center region and peripheral regions around the center region; a plurality of center circuit patterns formed in the center region of the insulation layer; and a plurality of peripheral circuit patterns formed in the peripheral regions of the insulation layer. The center circuit patterns may be formed wider than the peripheral circuit patterns, formed in a zigzag pattern, and/or may be formed in a crossed shape. | 02-14-2013 |
20130037946 | SEMICONDUCTOR CHIP INCLUDING BUMP HAVING BARRIER LAYER, AND MANUFACTURING METHOD THEREOF - A semiconductor chip includes a first substrate including a first surface and a second surface, a through-via plug passing through the first substrate, and a first conduction layer connected to an end of the through-via plug on the first surface, and a first bump including a first barrier layer on the first conduction layer, and a first solder layer for connecting the first substrate and a second substrate on the first barrier layer, and the first barrier layer includes a barrier material for preventing diffusion of a conductive material of the first conduction layer into the first solder layer. | 02-14-2013 |
20130037947 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - Even when a stiffener is omitted, the semiconductor device which can prevent the generation of twist and distortion of a wiring substrate is obtained. | 02-14-2013 |
20130043583 | Dummy Flip Chip Bumps for Reducing Stress - A device includes a metal pad over a substrate. A passivation layer includes a portion over the metal pad. A post-passivation interconnect (PPI) is electrically coupled to the metal pad, wherein the PPI comprises a portion over the metal pad and the passivation layer. A polymer layer is over the PPI. A dummy bump is over the polymer layer, wherein the dummy bump is electrically insulated from conductive features underlying the polymer layer. | 02-21-2013 |
20130043584 | SEMICONDUCTOR DEVICES, PACKAGE SUBSTRATES, SEMICONDUCTOR PACKAGES, PACKAGE STACK STRUCTURES, AND ELECTRONIC SYSTEMS HAVING FUNCTIONALLY ASYMMETRIC CONDUCTIVE ELEMENTS - A package stack structure may an upper package include an upper package substrate having a first edge and a second edge opposite to the first edge. The upper package substrate has a first region arranged near the first edge and a second region arranged near the second edge. A first upper semiconductor device is mounted on the upper package substrate. The package stack structure may also include a lower package having a lower package substrate and a lower semiconductor device. The lower package is connected to the upper package through a plurality of inter-package connectors. The plurality of the inter-package connectors may include first inter-package connectors configured to transmit data signals; second inter-package connectors configured to transmit address/control signals; third inter-package connectors configured to provide a supply voltage for an address/control circuit; and fourth inter-package connectors configured to provide a supply voltage for a data circuit. | 02-21-2013 |
20130043585 | SEMICONDUCTOR APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR APPARATUS, AND ELECTRONIC APPARATUS - A semiconductor apparatus, including: a semiconductor component; a Cu stud bump that is formed on the semiconductor component; and a solder bump configured to electrically connect to the Cu stud bump. | 02-21-2013 |
20130043586 | METHOD FOR ENCAPSULATING ELECTRONIC COMPONENTS ON A WAFER - A method for encapsulating electronic components, including the steps of: forming, in a first surface of a semiconductor wafer, electronic components; forming, on the first surface, an interconnection stack including conductive tracks and vias separated by an insulating material; forming first and second bonding pads on the interconnection stack; thinning down the wafer, except at least on its contour; filling the thinned-down region with a first resin layer; arranging at least one first chip on the first bonding pads and forming solder bumps on the second bonding pads; depositing a second resin layer covering the first chips and partially covering the solder bumps; bonding an adhesive strip on the first resin layer; and scribing the structure into individual chips. | 02-21-2013 |
20130049189 | SEMICONDUCTOR FLIP-CHIP SYSTEM HAVING THREE-DIMENSIONAL SOLDER JOINTS - A solder joint between a trace ( | 02-28-2013 |
20130049190 | METHODS OF FABRICATING SEMICONDUCTOR CHIP SOLDER STRUCTURES - Various semiconductor chip solder bump and underbump metallization (UBM) structures and methods of making the same are disclosed. In one aspect, a method is provided that includes depositing a layer of a first metallic material on a semiconductor chip. The first layer has a first physical quantity. A layer of a second metallic material is deposited on the layer of the first metallic material. The second layer has a second physical quantity. The first and second layers are reflowed to form a solder structure with a desired ratio of the first metallic material to the second metallic material. | 02-28-2013 |
20130049193 | FORMATION OF THROUGH-SILICON VIA (TSV) IN SILICON SUBSTRATE - To form a through-silicon via (TSV) in a silicon substrate without using plating equipment or using sputtering equipment or small metal particles, and form an interlayer connection by stacking a plurality of such silicon substrates, a through hole of a silicon substrate is filled using molten solder itself. In detail, solid solder placed above the through hole of the silicon substrate is molten and the molten solder is guided to and filled in the internal space. A metal layer can be deposited on an internal surface of the through hole beforehand, and also an intermetallic compound (IMC) can be formed in a portion other than the metal layer. | 02-28-2013 |
20130049194 | SELF-ALIGNED PROTECTION LAYER FOR COPPER POST STRUCTURE - A semiconductor device including a semiconductor substrate and a conductive post overlying and electrically connected to the substrate. The semiconductor device further includes a manganese-containing protection layer on a surface of the conductive post. A method of forming a semiconductor device. The method includes forming a bond pad region on a semiconductor substrate. The method further includes forming a conductive post overlying and electrically connected to the bond pad region. The method further includes forming a protection layer on a surface of the conductive post, wherein the protection layer comprises manganese (Mn). | 02-28-2013 |
20130056865 | Method of Three Dimensional Integrated Circuit Assembly - A method of fabricating a three-dimensional integrated circuit comprises attaching a wafer to a carrier, mounting a plurality of semiconductor dies on top of the wafer to form a wafer stack. The method further comprises forming a molding compound layer on top of the wafer, attaching the wafer stack to a tape frame and dicing the wafer stack to separate the wafer stack into a plurality of individual packages. | 03-07-2013 |
20130056866 | STACKED WAFER-LEVEL PACKAGE DEVICE - Wafer-level package devices are described that include multiple die packaged into a single wafer-level package device. In an implementation, a wafer-level package device includes a semiconductor device having at least one electrical interconnection formed therein. At least one semiconductor package device is positioned over the first surface of the semiconductor device. The semiconductor package device includes one or more micro-solder bumps. The wafer-level package device further includes an encapsulation structure disposed over and supported by the semiconductor device for encapsulating the semiconductor package device(s). When the semiconductor package device is positioned over the semiconductor device, each micro-solder bump is connected to a respective electrical interconnection that is formed in the semiconductor device. | 03-07-2013 |
20130056867 | Semiconductor device and method of forming FO-WLCSP with recessed interconnect area in peripheralregion of semiconductor die - A semiconductor device has a temporary layer, such as a dam material or adhesive layer, formed over a carrier. A plurality of recesses is formed in the temporary layer. A first semiconductor die is mounted within the recesses of the temporary layer. An encapsulant is deposited over the first semiconductor die and temporary layer. The encapsulant extends into the recesses in the temporary layer. The carrier and temporary layer are removed to form recessed interconnect areas around the first semiconductor die. Alternatively, the recessed interconnect areas can be formed the carrier or encapsulant. Multiple steps can be formed in the recesses of the temporary layer. A conductive layer is formed over the first semiconductor die and encapsulant and into the recessed interconnect areas. A second semiconductor die can be mounted on the first semiconductor die. The semiconductor device can be integrated into PiP and Fi-PoP arrangements. | 03-07-2013 |
20130056868 | ROUTING UNDER BOND PAD FOR THE REPLACEMENT OF AN INTERCONNECT LAYER - The present invention provides a solder bump structure. In one aspect, the solder bump structure is utilized in a semiconductor device, such as an integrated circuit. The semiconductor device comprises active devices located over a semiconductor substrate, interconnect layers comprising copper formed over the active devices, and an outermost metallization layer positioned over the interconnect layers. The outermost metallization layer comprises aluminum and includes at least one bond pad and at least one interconnect runner each electrically connected to an interconnect layer. An under bump metallization layer (UBM) is located over the bond pad, and a solder bump is located over the UBM. | 03-07-2013 |
20130056869 | PILLAR STRUCTURE HAVING A NON-PLANAR SURFACE FOR SEMICONDUCTOR DEVICES - A conductive pillar for a semiconductor device is provided. The conductive pillar is formed such that a top surface is non-planar. In embodiments, the top surface may be concave, convex, or wave shaped. An optional capping layer may be formed over the conductive pillar to allow for a stronger inter-metallic compound (IMC) layer. The IMC layer is a layer formed between solder material and an underlying layer, such as the conductive pillar or the optional capping layer. | 03-07-2013 |
20130056870 | FLIP-CHIP, FACE-UP AND FACE-DOWN WIREBOND COMBINATION PACKAGE - A microelectronic assembly can include a substrate having oppositely-facing first and second surfaces and a first aperture extending between the first and second surfaces, a first microelectronic element having a surface facing the first surface, a second microelectronic element having a front surface facing the first microelectronic element, signal leads connected to contacts of the second microelectronic element and extending through the first aperture to at least some of a plurality of electrically conductive elements on the substrate, and at least one power regulation component having active circuit elements therein disposed between the first surface of the substrate and the front surface of the second microelectronic element. The first microelectronic element can have another surface remote from the surface of the first microelectronic element, and an edge extending between the surfaces thereof. The contacts of the second microelectronic element can project beyond the edge of the first microelectronic element. | 03-07-2013 |
20130062755 | ELONGATED BUMP STRUCTURE IN SEMICONDUCTOR DEVICE - A device includes a chip attached to a substrate. The chip includes a conductive pillar having a length (L) measured along a long axis of the conductive pillar and a width (W) measured along a short axis of the conductive pillar. The substrate includes a conductive trace and a mask layer overlying the conductive trace, wherein the mask layer has an opening exposing a portion of the conductive trace. An interconnection is formed between the conductive pillar and the exposed portion of the conductive trace. The opening has a first dimension (d | 03-14-2013 |
20130062756 | SUBSTRATE STRUCTURE WITH COMPLIANT BUMP AND MANUFACTURING METHOD THEREOF - A substrate structure with compliant bump comprises a substrate, a plurality of bumps, and a metallic layer, wherein the substrate comprises a surface, a trace layer, and a protective layer. The trace layer comprises a plurality of conductive pads, and each of the conductive pads comprises an upper surface. The protective layer comprises a plurality of openings. The bumps are formed on the surface, and each of the bumps comprises a top surface, an inner surface and an outer surface and defines a first body and a second body. The first body is located on the surface. The second body is located on top of the first body. The metallic layer is formed on the top surface, the inner surface, and the upper surface. | 03-14-2013 |
20130062757 | No Flow Underfill or Wafer Level Underfill and Solder Columns - A preassembly semiconductor device comprises substrate soldering structures extending toward chip soldering structures for forming solder connections with the chip soldering structures, i.e., the chip and the substrate are in preassembly positions relative to one another. The height of the substrate soldering structures is greater than the height of the chip soldering structures. A pre-applied underfill is contiguous with the substrate and is sufficiently thick so as to extend substantially no further than the full height of the substrate soldering structures. In another embodiment the height of the chip soldering structures is greater than the height of the substrate soldering structures and the pre-applied underfill is contiguous with the semiconductor chip and sufficiently thick so as to extend substantially no further than the full height of the chip soldering structures. A process comprises manufacturing semiconductor assemblies from these devices by soldering the semiconductor chip and the substrate to one another. | 03-14-2013 |
20130062758 | SEMICONDUCTOR DEVICE - In one embodiment, a semiconductor device has a substrate, a first semiconductor chip, an electrode, a first and second connection member, and a first and second sealing member. The electrode is disposed on the first semiconductor chip and contains Al. The first connection member electrically connects the electrode and the substrate and contains Au or Cu. The first sealing member seals the first semiconductor chip and the first connection member. One or more second semiconductor chips are stacked on the first sealing member. The second sealing member seals the first connection member, the one or more second semiconductor chips, and the one or more second connection members. A ratio of a total weight W | 03-14-2013 |
20130062759 | ELECTRONIC DEVICE PACKAGE - A chip package is disclosed. The package includes a carrier substrate, at least two semiconductor chips, a fill material layer, a protective layer, and a plurality of conductive bumps. The carrier substrate includes a grounding region. The semiconductor chips are disposed overlying the grounding region of the carrier substrate. Each semiconductor chip includes at least one signal pad and includes at least one grounding pad electrically connected to the grounding region. The fill material layer is formed overlying the carrier substrate and covers the semiconductor chips. The protective layer covers the fill material layer. The plurality of conductive bumps is disposed overlying the protective layer and is electrically connected to the semiconductor chips. A fabrication method of the chip package is also disclosed. | 03-14-2013 |
20130069221 | Semiconductor Device and Method of Forming Conductive Protrusions Over Conductive Pillars or Bond Pads as Fixed Offset Vertical Interconnect Structures - A semiconductor device has a semiconductor die mounted to a substrate. A plurality of conductive pillars is formed over a semiconductor die. A plurality of conductive protrusions is formed over the conductive pillars. Bumps are formed over the conductive protrusions and conductive pillars. Alternatively, the conductive protrusions are formed over the substrate. A conductive layer is formed over the substrate. The semiconductor die is mounted to the substrate by reflowing the bumps at a temperature that is less than a melting point of the conductive pillars and conductive protrusions to metallurgically and electrically connect the bumps to the conductive layer while maintaining a fixed offset between the semiconductor die and substrate. The fixed offset between the semiconductor die and substrate is determined by a height of the conductive pillars and a height of the conductive protrusions. A mold underfill material is deposited between the semiconductor die and substrate. | 03-21-2013 |
20130069222 | Semiconductor Device and Method of Forming a Reconfigured Stackable Wafer Level Package with Vertical Interconnect - A semiconductor device has a carrier with a semiconductor die mounting area. A plurality of conductive posts is formed in a periphery of the semiconductor die mounting area and in the carrier. A first portion of the carrier is removed to expose a first portion of the plurality of conductive posts such that a second portion of the plurality of conductive posts is embedded in a second portion of the carrier. A first semiconductor die is mounted to the semiconductor die mounting area and between the first portion of the plurality of conductive posts. A first encapsulant is deposited around the first semiconductor die and around the first portion of the plurality of conductive posts. A second portion of the carrier is removed to expose the second portion of the plurality of conductive posts. An interconnect structure is formed over the plurality of conductive posts and the first semiconductor die. | 03-21-2013 |
20130069223 | FLASH MEMORY CARD WITHOUT A SUBSTRATE AND ITS FABRICATION METHOD - Disclosed is a flash memory card without a substrate, primarily comprising a memory chip component, a controller chip disposed on the memory chip, and an encapsulant encapsulating both chips. Formed on an active surface and a back surface of the memory chip component are a first RDL (redistribution layer) and a second RDL respectively. A plurality of TSVs (through silicon vias) penetrate from the active surface to the back surface to electrically connect both RDLs. A plurality of contacting fingers are disposed on the back surface of the memory chip component and electrically connected with the second RDL. Additionally, the encapsulant has a card appearance with one surface of each contacting finger to be exposed. Accordingly, the flash memory card can save conventional substrate structure with better reliability and efficiency for packaging processes. | 03-21-2013 |
20130069224 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH ROUTABLE UNDERLAYER AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit packaging system includes: providing a routable layer having a column; mounting an integrated circuit structure in direct contact with the column; and forming a gamma connector to electrically connect the column to the integrated circuit structure. | 03-21-2013 |
20130069225 | Semiconductor Device and Method of Forming Protection and Support Structure for Conductive Interconnect Structure - A semiconductor device has a semiconductor wafer with a plurality of contact pads. A first insulating layer is formed over the semiconductor wafer and contact pads. A portion of the first insulating layer is removed, exposing a first portion of the contact pads, while leaving a second portion of the contact pads covered. An under bump metallization layer and a plurality of bumps is formed over the contact pads and the first insulating layer. A second insulating layer is formed over the first insulating layer, a sidewall of the under bump metallization layer, sidewall of the bumps, and upper surface of the bumps. A portion of the second insulating layer covering the upper surface of the bumps is removed, but the second insulating layer is maintained over the sidewall of the bumps and the sidewall of the under bump metallization layer. | 03-21-2013 |
20130069226 | SEMICONDUCTOR PACKAGE HAVING INTERPOSER - A semiconductor package includes a first structural body having a first surface and a second surface which faces away from the first surface, and formed with first connection members on the first surface; a second structural body placed over the first structural body, and formed with second connection members on a surface thereof which faces the first surface of the first structural body; and an interposer interposed between the first structural body and the second structural body, and having a body which is formed with openings into which the first connection members and the second connection members are inserted and a conductive layer which is formed to fill the openings. | 03-21-2013 |
20130069227 | Semiconductor Device and Method of Forming Protection and Support Structure for Conductive Interconnect Structure - A semiconductor device has a semiconductor wafer with a plurality of contact pads. A first insulating layer is formed over the semiconductor wafer and contact pads. A portion of the first insulating layer is removed, exposing a first portion of the contact pads, while leaving a second portion of the contact pads covered. An under bump metallization layer and a plurality of bumps is formed over the contact pads and the first insulating layer. A second insulating layer is formed over the first insulating layer, a sidewall of the under bump metallization layer, sidewall of the bumps, and upper surface of the bumps. A portion of the second insulating layer covering the upper surface of the bumps is removed, but the second insulating layer is maintained over the sidewall of the bumps and the sidewall of the under bump metallization layer. | 03-21-2013 |
20130069228 | FLIP-CHIP PACKAGE STRUCTURE AND FORMING METHOD THEREOF - A flip-chip package structure comprising a substrate, a chip, a bump structure and a solder resist is provided. The substrate has a circuit layer disposed on the surface thereof. The chip comprises a central region and two edge regions disposed on the two sides of the central region. The bump structure is disposed on the central region of the chip and faces the substrate. The solder resist is disposed on the substrate to partially cover the circuit layer. The chip is electrically connected to the substrate by the bump structure, and the solder resist is adapted to come into contact with the two edge regions of the chip to support the chip with the bump structure when the chip is disposed on the substrate. | 03-21-2013 |
20130069229 | PACKAGE SUBSTRATE AND SEMICONDUCTOR PACKAGE INCLUDING THE SAME - A package substrate may include an insulating substrate, a dummy pad, a signal pad and a plug. The dummy pad may be formed on an upper surface of the insulating substrate. The signal pad may be formed on the upper surface of the insulating substrate. The signal pad may have an upper surface protruded from an upper surface of the dummy pad. The plug may be vertically formed in the insulating substrate. The plug may have an upper end exposed through the upper surface of the insulating substrate and connected with the signal pad and the dummy pad, and a lower end exposed through a lower surface of the insulating substrate. Thus, a signal bump may accurately make contact with the protruded upper surface of the signal pad. | 03-21-2013 |
20130069230 | ELECTRONIC ASSEMBLY APPARATUS AND ASSOCIATED METHODS - An apparatus includes a substrate, and first and second die. The first die is assembled above the substrate. The first die includes electronic circuitry. The second die is assembled above the substrate. The second die includes electronic circuitry. The apparatus further includes first and second interconnects. The first interconnect includes a first set of copper pillars, and couples the first die to the substrate. The second interconnect includes a second set of copper pillars, and couples the second die to the first die. | 03-21-2013 |
20130075891 | FLIP CHIP TYPE FULL WAVE RECTIFICATION SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD - This invention reveals a flip-chip type full-wave rectification semiconductor device which includes at least a PNNP type and/or NPPN type flip-chip, and a sheet stuff or substrate including a plurality pins, and which is characterized in that: all the soldering points (bumps) of the PNNP type and/or the NPPN type flip-chip are on an identical surface, this can make easy connecting of the pins with the bumps of the flip-chips by soldering in pursuance of circuit arrangement of the full-wave rectification device, and complete manufacturing product after the steps of shaping/packing and cutting; such product has a function of making full-wave rectifying, and can simplify the manufacturing process, reduce the manufacturing cost, and get an effect of reducing the size of the product with better heat dissipation, being different from traditional full wave rectification semiconductor devices composed of two/four grains. | 03-28-2013 |
20130075892 | Method for Three Dimensional Integrated Circuit Fabrication - A method for fabricating three dimensional integrated circuits comprises providing a wafer stack wherein a plurality of semiconductor dies are mounted on a first semiconductor die, forming a molding compound layer on the first side of the first semiconductor die, wherein the plurality of semiconductor dies are embedded in the molding compound layer. The method further comprises grinding a second side of the first semiconductor die until a plurality of through vias become exposed, attaching the wafer stack to a tape frame and dicing the wafer stack to separate the wafer stack into a plurality of individual packages. | 03-28-2013 |
20130075893 | Synchronous Buck Converter Having Coplanar Array of Contact Bumps of Equal Volume - A packaged power supply module ( | 03-28-2013 |
20130075894 | INTEGRATED CIRCUIT AND METHOD OF MAKING - Integrated circuits and methods of fabricating integrated circuits are disclosed herein. One embodiment of an integrated circuit includes a die having a side, wherein a conductive stud extends from the side. A dielectric layer having a first side and a second side is located proximate the side of the die so that the first side of the dielectric layer is adjacent the side of the die. The conductive stud extends into the first side of the dielectric layer. A conductive layer having a first side and a second side is located adjacent the second side of the dielectric layer, wherein the first side of the conductive layer is located adjacent the second side of the dielectric layer. A conductive adhesive connects the conductive stud to the first side of the conductive layer. | 03-28-2013 |
20130075895 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - In one embodiment, a semiconductor device includes a chip stacked body disposed on an interposer substrate and an interface chip mounted on the chip stacked body. The chip stacked body has plural semiconductor chips, and is electrically connected via through electrodes provided in the semiconductor chips excluding a lowermost semiconductor chip in a stacking order of the plural semiconductor chips and bump electrodes. The interface chip is electrically connected to the interposer substrate via a rewiring layer formed on a surface of an uppermost semiconductor chip in the stacking order or through electrodes provided in the interface chip. | 03-28-2013 |
20130075896 | SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THEREOF, AND ELECTRONIC APPARATUS - A semiconductor device includes a semiconductor substrate and a through electrode provided in a through hole formed in the semiconductor substrate. The through electrode partially protrudes from a back surface of the semiconductor substrate, which is opposite to an active surface thereof. The through electrode includes a resin core and a conductive film covering at least a part of the resin core. | 03-28-2013 |
20130075897 | SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE FOR DRIVING DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor integrated circuit device for driving an LCD, COG chip packaging is performed. To achieve this, an elongate and relatively thick gold bump electrode is formed over an aluminum-based pad having a relatively small area. In a wafer probe test performed after formation of the gold bump electrode, a cantilever type probe needle having gold as a main component and having an almost perpendicularly bent tip portion is used. The diameter of this probe needle in the vicinity of its tip is usually almost the same as the width of the gold bump electrode. This makes it difficult to perform the wafer probe test stably. To counteract this, a plurality of bump electrode rows for outputting a display device drive signal are formed such that the width of inner bump electrodes is made greater than the width of outer bump electrodes. | 03-28-2013 |
20130075898 | SURFACE DEPRESSIONS FOR DIE-TO-DIE INTERCONNECTS AND ASSOCIATED SYSTEMS AND METHODS - Stacked microelectronic dies employing die-to-die interconnects and associated systems and methods are disclosed herein. In one embodiment, a stacked system of microelectronic dies includes a first microelectronic die, a second microelectronic die attached to the first die, and a die-to-die interconnect electrically coupling the first die with the second die. The first die includes a back-side surface, a surface depression in the back-side surface, and a first metal contact located within the surface depression. The second die includes a front-side surface and a second metal contact located at the front-side surface and aligned with the first metal contact of the first die. The die-to-die interconnect electrically couples the first metal contact of the first die with the second metal contact of the second die and includes a flowable metal layer that at least partially fills the surface depression of the first die. | 03-28-2013 |
20130075899 | Semiconductor Package and Method of Forming Z-Direction Conductive Posts Embedded in Structurally Protective Encapsulant - A semiconductor package is made using a prefabricated post carrier including a base plate and plurality of conductive posts. A film encapsulant is disposed over the base plate of the post carrier and around the conductive posts. A semiconductor die is mounted to a temporary carrier. The post carrier and temporary carrier are pressed together to embed the semiconductor die in the film encapsulant. The semiconductor die is disposed between the conductive posts in the film encapsulant. The temporary carrier and base plate of the post carrier are removed. A first circuit build-up layer is formed over a first side of the film encapsulant. The first circuit build-up layer is electrically connected to the conductive posts. A second circuit build-up layer is formed over a second side of the film encapsulant opposite the first side. The second circuit build-up layer is electrically connected to the conductive posts. | 03-28-2013 |
20130075900 | Semiconductor Device and Method of Forming Insulating Layer on Conductive Traces for Electrical Isolation in Fine Pitch Bonding - A semiconductor device has a semiconductor die with a plurality of bumps formed over an active surface of the semiconductor die. A plurality of first conductive traces with interconnect sites is formed over a substrate. The bumps are wider than the interconnect sites. A surface treatment is formed over the first conductive traces. A plurality of second conductive traces is formed adjacent to the first conductive traces. An oxide layer is formed over the second conductive traces. A masking layer is formed over an area of the substrate away from the interconnect sites. The bumps are bonded to the interconnect sites so that the bumps cover a top surface and side surface of the interconnect sites. The oxide layer maintains electrical isolation between the bump and second conductive trace. An encapsulant is deposited around bumps between the semiconductor die and substrate. | 03-28-2013 |
20130075901 | SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME - A semiconductor device manufacturing technique which allows reduction of semiconductor chip size. First, a pad and other wires are formed over an insulating film. A surface protective film is formed over the insulating film including the pad and wires, and an opening is made in the surface protective film. The opening lies over the pad and exposes a surface of the pad. A bump electrode is formed over the surface protective film including the opening. Here, the pad is smaller than the bump electrode. Consequently, the wires are arranged just beneath the bump electrode in the same layer as the pad | 03-28-2013 |
20130075902 | Semiconductor Device and Method of Forming Conductive Posts Embedded in Photosensitive Encapsulant - A semiconductor package includes a post carrier having a base plate and plurality of conductive posts. A photosensitive encapsulant is deposited over the base plate of the post carrier and around the conductive posts. The photosensitive encapsulant is etched to expose a portion of the base plate of the post carrier. A semiconductor die is mounted to the base plate of the post carrier within the etched portions of the photosensitive encapsulant. A second encapsulant is deposited over the semiconductor die. A first circuit build-up layer is formed over the second encapsulant. The first circuit build-up layer is electrically connected to the conductive posts. The base plate of the post carrier is removed and a second circuit build-up layer is formed over the semiconductor die and the photosensitive encapsulant opposite the first circuit build-up layer. The second circuit build-up layer is electrically connected to the conductive posts. | 03-28-2013 |
20130075903 | Semiconductor Device and Method of Forming Different Height Conductive Pillars to Electrically Interconnect Stacked Laterally Offset Semiconductor Die - A semiconductor device has a first semiconductor die mounted over a carrier. Wettable contact pads can be formed over the carrier. A second semiconductor die is mounted over the first semiconductor die. The second die is laterally offset with respect to the first die. An electrical interconnect is formed between an overlapping portion of the first die and second die. A plurality of first conductive pillars is disposed over the first die. A plurality of second conductive pillars is disposed over the second die. An encapsulant is deposited over the first and second die and first and second conductive pillars. A first interconnect structure is formed over the encapsulant, first conductive pillars, and second die. The carrier is removed. A second interconnect structure is formed over the encapsulant, second conductive pillars, and first die. A third conductive pillar is formed between the first and second build-up interconnect structures. | 03-28-2013 |
20130082379 | SEMICONDUCTOR PACKAGE INCLUDING AN INTEGRATED WAVEGUIDE - Methods and apparatus are disclosed for wirelessly communicating among integrated circuits and/or functional modules within the integrated circuits. A semiconductor device fabrication operation uses a predetermined sequence of photographic and/or chemical processing steps to form one or more functional modules onto a semiconductor substrate. The functional modules are coupled to an integrated waveguide that is formed onto the semiconductor substrate and/or attached thereto to form an integrated circuit. The functional modules communicate with each other as well as to other integrated circuits using a multiple access transmission scheme via the integrated waveguide. One or more integrated circuits may be coupled to an integrated circuit carrier to form Multichip Module. The Multichip Module may be coupled to a semiconductor package to form a packaged integrated circuit. | 04-04-2013 |
20130082380 | STUB MINIMIZATION USING DUPLICATE SETS OF SIGNAL TERMINALS IN ASSEMBLIES WITHOUT WIREBONDS TO PACKAGE SUBSTRATE - A microelectronic package can include a microelectronic element having a face and a plurality of element contacts thereon, a substrate having first and second surfaces, and terminals on the second surface configured for connecting the package with an external component. The microelectronic element can include a plurality of stacked electrically interconnected semiconductor chips. The substrate can have contacts facing the element contacts of the microelectronic element and joined thereto. The terminals can include first terminals arranged at positions within first and second parallel grids. The first terminals of each grid can be configured to carry address information usable by circuitry within the microelectronic package to determine an addressable memory location from among all the available addressable memory locations within the microelectronic element. The signal assignments of the first terminals in the first grid can be a mirror image of the signal assignments of the first terminals in the second grid. | 04-04-2013 |
20130082381 | STUB MINIMIZATION USING DUPLICATE SETS OF TERMINALS FOR WIREBOND ASSEMBLIES WITHOUT WINDOWS - A microelectronic element having a memory storage array has a front face facing away from a substrate of a microelectronic package, and is electrically connected with the substrate through conductive structure extending above the front face. First terminals are disposed at locations within first and second parallel grids of the package. The first terminals of each grid are configured to carry address information usable to determine an addressable memory location from among all the available addressable memory locations of the memory storage array. The first terminals in the first grid have signal assignments which are a mirror image of the signal assignments of the first terminals in the second grid. | 04-04-2013 |
20130082382 | SEMICONDUCTOR DEVICE - First and second sub-bumps are provided on both surfaces of each substrate along with a usual bump structure (first and second main bumps), and at least one of the first and second sub-bumps is made greater in height than the first and second main bumps, so that the sub-bumps come into contact with one another earlier than the main bumps at the time of joining semiconductor chips, thereby securing margins of joint among the main bumps and suppressing the thin-filming of a layer, such as a solder layer, to be fluidized by heating. | 04-04-2013 |
20130087906 | CIRCUIT BOARD, FABRICATING METHOD THEREOF AND PACKAGE STRUCTURE - The present invention provides a circuit board including a substrate, at least one lead, at least one bump, and a solder layer. The lead is disposed on the substrate, and the bump is disposed on the lead. The solder layer covers the lead and the bump. | 04-11-2013 |
20130087907 | Metal Features to Reduce Crack-Inducing Stresses in Metallization Stacks - Generally, the subject matter disclosed herein relates to sophisticated semiconductor chips that may be less susceptible to the occurrence of white bumps during semiconductor chip packaging operations, such as flip-chip or 3D-chip assembly, and the like. One illustrative semiconductor chip disclosed herein includes, among other things, a bump structure above a first metallization layer of a metallization system of the semiconductor chip, and a metal feature in the first metallization layer, wherein at least a first portion of the metal feature is located closer to a center of the semiconductor chip than any portion of the bump structure, and at least a second portion of the metal feature is positioned below the bump structure. | 04-11-2013 |
20130087908 | BUMP WITH PROTECTION STRUCTURE - A semiconductor device includes a bump structure formed on a post-passivation interconnect (PPI) line and surrounded by a protection structure. The protection structure includes a polymer layer and at least one dielectric layer. The dielectric layer may be formed on the top surface of the polymer layer, underlying the polymer layer, inserted between the bump structure and the polymer layer, inserted between the PPI line and the polymer layer, covering the exterior sidewalls of the polymer layer, or combinations thereof. | 04-11-2013 |
20130087909 | SEMICONDUCTOR DEVICE HAVING IMPROVED CONTACT STRUCTURE - A semiconductor die includes a first contact stack including a first die pad having a first pad perimeter, a first via through a dielectric layer to the first die pad having a first via perimeter, and a first UBM pad contacting the first die pad through the first via having a first UBM pad perimeter. A second contact stack includes a second die pad having a second pad perimeter shorter than the first pad perimeter, a second via through the dielectric layer to the second die pad having a second via perimeter shorter than the first via perimeter, and a second UBM pad contacting the second die pad through the second via having a second UBM pad perimeter that is shorter than the first UBM pad perimeter. | 04-11-2013 |
20130087910 | SEMICONDUCTOR DEVICE HAVING MULTIPLE BUMP HEIGHTS AND MULTIPLE BUMP DIAMETERS - A semiconductor die includes a first contact stack including a first UBM pad on a first die pad, a second contact stack including a second UBM pad on a second die pad, and a third contact stack including a third UBM pad on a third die pad. The second UBM pad perimeter is shorter than the first UBM pad perimeter, and the third UBM pad perimeter is longer than the second UBM pad perimeter. A first solder bump is on the first UBM pad, a second solder bump is on the second UBM pad, and a third solder bump is on the third UBM pad. The first solder bump, second solder bump and third solder bump all have different sizes. | 04-11-2013 |
20130087911 | INTEGRATED CIRCUIT PACKAGE STRUCTURE - An integrated circuit (IC) package structure is provided, including: a first integrated circuit (IC) package, including: a first package substrate, having opposite first and second surfaces, wherein a first semiconductor chip is disposed over a first portion of the first surface of the first package substrate. In addition, a second integrated circuit (IC) package is disposed on a second portion different from the first portion of the first surface of the first package substrate, including: a second package substrate, having opposite third and fourth surfaces, wherein a second semiconductor chip is disposed over a portion of the third surface of the second package substrate, and the second semiconductor chip has a function different from that of the first semiconductor chip. | 04-11-2013 |
20130087912 | SEMICONDUCTOR DEVICE, ELECTRONIC DEVICE, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD - A semiconductor device, includes: a connection member including a first pad formed on a principal surface thereof; a semiconductor chip including a circuit-formed surface on witch a second pad is formed, the chip mounted on the connection member so that the circuit-formed surface faces the principal surface; and a solder bump that connects the first and second pads and is made of metal containing Bi and Sn, wherein the bump includes a first interface-layer formed adjacent to the second pad, a second interface-layer formed adjacent to the first pad, a first intermediate region formed adjacent to either one of the interface-layers, and a second intermediate region formed adjacent to the other one of the interface-layers and formed adjacent to the first intermediate region; Bi-concentration in the first intermediate region is higher than a Sn-concentration; and a Sn-concentration in the second intermediate region is higher than a Bi-concentration. | 04-11-2013 |
20130087913 | Semiconductor Device and Method of Forming Bump on Substrate to Prevent ELK ILD Delamination During Reflow Process - A semiconductor device that has a flipchip semiconductor die and substrate. A first insulating layer is formed over the substrate. A via is formed through the first insulating layer. Conductive material is deposited in the via to form a conductive pillar or stacked stud bumps. The conductive pillar is electrically connected to a conductive layer within the substrate. A second insulating layer is formed over the first insulating layer. Bump material is formed over the conductive pillar. The bump material is reflowed to form a bump. The first and second insulating layers are removed. The semiconductor die is mounted to the substrate by reflowing the bump to a conductive layer of the die. The semiconductor die also has a third insulating layer formed over the conductive layer and an active surface of the die and UBM formed over the first conductive layer and third insulating layer. | 04-11-2013 |
20130093076 | SEMICONDUCTOR PACKAGE AND METHOD OF FORMING THE SAME - A method of a semiconductor package includes providing a substrate having a conductive trace coated with an organic solderability preservative (OSP) layer, removing the OSP layer from the conductive trace, and then coupling a chip to the substrate to form a semiconductor package. | 04-18-2013 |
20130093077 | POST-PASSIVATION INTERCONNECT STRUCTURE - A semiconductor device includes a passivation layer, a first protective layer, an interconnect layer, and a second protective layer successively formed on a semiconductor substrate. The interconnect layer has an exposed portion, on which a barrier layer and a solder bump are formed. At least one of the passivation layer, the first protective layer, the interconnect layer and the second protective layer includes at least one slot formed in a region outside a conductive pad region. | 04-18-2013 |
20130093078 | Process for Forming Package-on-Package Structures - A device includes an inter-layer dielectric, a device die under the inter-layer dielectric; and a die-attach film under the inter-layer dielectric and over the device die, wherein the die-attach film is attached to the device die. A plurality of redistribution lines includes portions level with the die-attach film. A plurality of Z-interconnects is electronically coupled to the device die and the plurality of redistribution lines. A polymer-comprising material is under the inter-layer dielectric. The device die, the die-attach film, and the plurality of Z-interconnects are disposed in the polymer-comprising material. | 04-18-2013 |
20130093079 | Connector Structures of Integrated Circuits - A die includes a substrate, a metal pad over the substrate, and a passivation layer covering edge portions of the metal pad. A metal pillar is formed over the metal pad. A portion of the metal pillar overlaps a portion of the metal pad. A center of the metal pillar is misaligned with a center of the metal pad. | 04-18-2013 |
20130093080 | MULTI-CHIP PACKAGE AND METHOD OF MANUFACTURING THE SAME - A multi-chip package may include a first semiconductor chip, a second semiconductor chip, a first stud bump, a first nail head bonding bump, a second stud bump, and a first conductive wire. The first semiconductor chip may have a first bonding pad. The second semiconductor chip may be stacked on the first semiconductor chip so the first bonding pad remains exposed. The second semiconductor chip may have a second bonding pad. The first stud bump may be formed on the first bonding pad. The first nail head bonding bump may be formed on the first stud bump, with one end of a first conductive wire formed between the two. The second stud bump may be formed on the second bonding pad, with another end of the first conductive wire formed between the two. An electrical connection test may be performed on each of the wire bonding processes. | 04-18-2013 |
20130093081 | IC CHIP PACKAGE AND CHIP-ON-GLASS STRUCTURE USING THE SAME - An IC chip package and a chip-on-glass structure using the same are provided. The IC chip package includes an IC chip having a circuit surface, and plural copper (Cu) bumps formed on the circuit surface. Moreover, a non-conductive film (NCF) could be formed on the circuit surface to cover the Cu bumps. The chip-on-glass structure includes a glass substrate, plural electrodes such as aluminum (Al) electrodes formed on the glass substrate, and a conductive film formed on the electrodes. The conductive film contains a number of conductive particles. When the IC chip package is coupled to the glass substrate, the Cu bumps can be coupled to the corresponding electrodes via conductive particles. | 04-18-2013 |
20130093082 | SEMICONDUCTOR DEVICE, ELECTRODE MEMBER, AND ELECTRODE MEMBER FABRICATION METHOD - A semiconductor device that improves the heat cycle resistance and power cycle resistance of a power module. An electrode member in which copper posts are formed in a plurality of perforations cut in a support made of a ceramic material is soldered onto a side of an IGBT where an emitter electrode is formed. By soldering the copper posts onto the electrode, heat generated in the IGBT is transferred to the electrode member and is radiated. In addition, even if a material of which the IGBT is made and copper differ in thermal expansivity, stress on a soldered interface is reduced and distortion is reduced. This suppresses the appearance of a crack. As a result, the heat cycle resistance and power cycle resistance of a power module can be improved. | 04-18-2013 |
20130093083 | SEMICONDUCTOR DEVICE AND STACKED SEMICONDUCTOR DEVICE - A semiconductor device according to one embodiment has a wiring circuit board, a semiconductor chip, a die attach material and bumps. The semiconductor chip is mounted on the wiring circuit board. The die attach material is provided between the wiring circuit board and the semiconductor chip. A wiring layer is provided on one surface of the wiring circuit board. Leads are extended from the wiring layer and connected to the semiconductor chip. The bumps are provided at outer positions relative to the region where the semiconductor chip of the wiring circuit board is mounted. The wiring layer in the wiring circuit board is formed on the surface opposite from the surface on which the semiconductor chip is mounted. | 04-18-2013 |
20130099370 | SEMICONDUCTOR PACKAGE - A semiconductor package includes a workpiece with a conductive trace and a chip with a conductive pillar. The chip is attached to the workpiece and a solder joint region is formed between the conductive pillar and the conductive trace. The distance between the conductive pillar and the conductive trace is less than or equal to about 16 μm. | 04-25-2013 |
20130099371 | SEMICONDUCTOR PACKAGE HAVING SOLDER JOINTED REGION WITH CONTROLLED AG CONTENT - A semiconductor package includes a workpiece with a conductive trace and a chip with a conductive pillar. The chip is attached to the workpiece and a solder joint region is formed between the conductive pillar and the conductive trace. The silver (Ag) content in the solder layer is between 0.5 and 1.8 weight percent. | 04-25-2013 |
20130099372 | Methods of Forming Bump Structures That Include a Protection Layer - One illustrative method disclosed herein includes forming a conductive pad in a layer of insulating material, forming a passivation layer above the conductive pad, performing at least one etching process on the passivation layer to define an opening in the passivation layer that exposes at least a portion of the conductive pad, forming a protective layer on the passivation layer, in the opening and on the exposed portion of the conductive pad, forming a heat-curable material layer above the protective layer, performing an etching process to define a patterned heat-curable material layer having an opening that exposes a portion of the protective layer, performing an etching process on the protective layer to thereby expose at least a portion of the conductive pad and forming a conductive bump that is conductively coupled to the conductive pad. | 04-25-2013 |
20130099373 | SEMICONDUCTOR PACKAGES INCLUDING A PLURALITY OF UPPER SEMICONDUCTOR DEVICES ON A LOWER SEMICONDUCTOR DEVICE - Semiconductor packages are provided. The semiconductor packages may include an upper package including a plurality of upper semiconductor devices connected to an upper package substrate. The semiconductor packages may also include a lower package including a lower semiconductor device connected to a lower package substrate. The upper and lower packages may be connected to each other. | 04-25-2013 |
20130099374 | PACKAGE OF ELECTRONIC DEVICE INCLUDING CONNECTING BUMP, SYSTEM INCLUDING THE SAME AND METHOD FOR FABRICATING THE SAME - A package of an electronic device, a system including the same and a method for fabricating the same are provided. The package of the electronic device includes a substrate, a step difference layer and a connecting bump. The substrate allows a connecting contact part to be exposed on a surface thereof. The step difference layer covers the substrate so as to leave the connecting contact part exposed. The connecting bump is connected to the connecting contact part so that one end part of the connecting bump is extended on the step difference layer, and has a sloped upper surface formed by a step difference formed by the step difference layer. | 04-25-2013 |
20130099375 | SEMICONDUCTOR PACKAGE SUBSTRATE AND SEMICONDUCTOR PACKAGE INCLUDING THE SAME - A semiconductor package substrate including a substrate body having a front surface configured for mounting a semiconductor chip on the front surface and a rear surface facing the front surface and comprising a window passing through the front and rear surfaces, the window having one or more surfaces inclined from the front surface toward the rear surface; and a conductive pattern arranged along an inclined surface of the window so as to extend from the front surface to the rear surface of the substrate body. | 04-25-2013 |
20130099376 | MICROELECTRONIC PACKAGES WITH DUAL OR MULTIPLE-ETCHED FLIP-CHIP CONNECTORS - A packaged microelectronic element includes a microelectronic element having a front surface and a plurality of first solid metal posts extending away from the front surface. A substrate has a major surface and a plurality of conductive elements exposed at the major surface and joined to the first solid metal posts. In particular examples, the conductive elements can be bond pads or can be second posts having top surfaces and edge surfaces extending at substantial angles away therefrom. Each first solid metal post includes a base region adjacent the microelectronic element and a tip region remote from the microelectronic element, the base region and tip region having respective concave circumferential surfaces. Each first solid metal post has a horizontal dimension which is a first function of vertical location in the base region and which is a second function of vertical location in the tip region. | 04-25-2013 |
20130099377 | Molded Chip Interposer Structure and Methods - Apparatus and methods for providing a molded chip interposer structure and assembly. A molded chip structure having at least two integrated circuit dies disposed within a mold compound is provided having the die bond pads on the bottom surface; and solder bumps are formed in the openings of a dielectric layer on the bottom surface, the solder bumps forming connections to the bond pads. An interposer having a die side surface and a board side surface is provided having bump lands receiving the solder bumps of the molded chip structure on the die side of the interposer. An underfill layer is formed between the die side of the interposer and the bottom surface of the molded chip structure surrounding the solder bumps. Methods for forming the molded chip interposer structure are disclosed. | 04-25-2013 |
20130099378 | Semiconductor Device and Method of Forming Interposer Frame Electrically Connected to Embedded Semiconductor Die - A semiconductor device has an interposer frame mounted over a carrier. A semiconductor die has an active surface and bumps formed over the active surface. The semiconductor die can be mounted within a die opening of the interposer frame or over the interposer frame. Stacked semiconductor die can also be mounted within the die opening of the interposer frame or over the interposer frame. Bond wires or bumps are formed between the semiconductor die and interposer frame. An encapsulant is deposited over the interposer frame and semiconductor die. An interconnect structure is formed over the encapsulant and bumps of the first semiconductor die. An electronic component, such as a discrete passive device, semiconductor die, or stacked semiconductor die, is mounted over the semiconductor die and interposer frame. The electronic component has an I/O count less than an I/O count of the semiconductor die. | 04-25-2013 |
20130099379 | SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING THE SAME, CIRCUIT SUBSTRATE, ELECTRO-OPTICAL APPARATUS, AND ELECTRONIC EQUIPMENT - A semiconductor device is provided with a plurality of protrusions which are made of a resin and which protrude higher than electrodes, and conductive layers which are electrically connected to the electrodes and which cover the top surfaces of the protrusions. A method for manufacturing the semiconductor device includes a step of applying a layer of the resin to the semiconductor device except for the electrodes, a step of patterning the conductive layers on the electrodes and the layer of the resin in accordance with the protrusions, and a step of removing the layer of the resin located between the conductive layers by the use of the patterned conductive layers as masks so as to form the protrusions. | 04-25-2013 |
20130105966 | THREE-DIMENSIONAL CHIP-TO-WAFER INTEGRATION | 05-02-2013 |
20130105967 | Semiconductor Die and Method of Forming Sloped Surface in Photoresist Layer to Enhance Flow of Underfill Material Between Semiconductor Die and Substrate | 05-02-2013 |
20130105968 | TSV Backside Processing Using Copper Damascene Interconnect Technology | 05-02-2013 |
20130105969 | SOLDER BONDING PROCESS FORMING A SEMICONDUCTOR CHIP IN MULTIPLE STAGES ON A 3-DIMENSIONAL STACKED ASSEMBLY | 05-02-2013 |
20130105970 | Semiconductor Device and Method of Forming Conductive Posts and Heat Sink Over Semiconductor Die Using Leadframe | 05-02-2013 |
20130105971 | Solder Interconnect Pads with Current Spreading Layers | 05-02-2013 |
20130113093 | Semiconductor Device and Method of Forming a Metallurgical Interconnection Between a Chip and a Substrate in a Flip Chip Package - A method for forming metallurgical interconnections and polymer adhesion of a flip chip to a substrate includes providing a chip having a set of bumps formed on a bump side thereof and a substrate having a set of interconnect points on a metallization thereon, providing a measured quantity of a polymer adhesive in a middle region of the chip on the bump side, aligning the chip with the substrate so that the set of bumps aligns with the set of interconnect points, pressing the chip and the substrate toward one another so that a portion of the polymer adhesive contacts the substrate and the bumps contact the interconnect points, and heating the bumps to a temperature sufficiently high to form a metallurgical connection between the bumps and the interconnect points. | 05-09-2013 |
20130113094 | POST-PASSIVATION INTERCONNECT STRUCTURE AND METHOD OF FORMING THE SAME - A semiconductor device includes a conductive layer formed on the surface of a post-passivation interconnect (PPI) structure by an immersion tin process. A polymer layer is formed on the conductive layer and patterned with an opening to expose a portion of the conductive layer. A solder bump is then formed in the opening of the polymer layer to electrically connect to the PPI structure. | 05-09-2013 |
20130113095 | PACKAGING SUBSTRATE AND FABRICATION METHOD THEREOF - A packaging substrate includes a base body having at least a conductive pad on a surface thereof, a dielectric layer formed on the surface of the base body and having at least a first opening for exposing the conductive pad and at least a second opening formed at a periphery of the first opening, and a metal layer formed on the conductive pad and the dielectric layer and extending to a sidewall of the second opening, thereby effectively eliminating side-etching of the metal layer under a solder bump. | 05-09-2013 |
20130113096 | SEMICONDUCTOR DEVICE - A semiconductor device suitable for preventing malfunction is provided. | 05-09-2013 |
20130119532 | Bumps for Chip Scale Packaging - A chip scale semiconductor device comprises a semiconductor die, a first bump and a second bump. The first bump having a first diameter and a first height is formed on an outer region of the semiconductor die. A second bump having a second diameter and a second height is formed on an inner region of the semiconductor die. The second diameter is greater than the first diameter while the second height is the same as the first height. By changing the shape of the bump, the stress and strain can be redistributed through the bump. As a result, the thermal cycling reliability of the chip scale semiconductor device is improved. | 05-16-2013 |
20130119533 | Package for Three Dimensional Integrated Circuit - A wafer level package includes a semiconductor die bonded on a supporting wafer. The semiconductor die has at least a step recess at its substrate. An underfill layer is formed between the semiconductor die and the supporting wafer. Moreover, the height of the underfill layer is limited by the step recess. During a fabrication process of the wafer level package, the step recess helps to reduce the stress on the wafer level package. | 05-16-2013 |
20130119534 | METAL PAD STRUCTURE FOR THICKNESS ENHANCEMENT OF POLYMER USED IN ELECTRICAL INTERCONNECTION OF SEMICONDUCTOR DIE TO SEMICONDUCTOR CHIP PACKAGE SUBSTRATE WITH SOLDER BUMP - A topographical feature is formed proximate to a conductive bond pad that is used to couple a solder bump to a semiconductor die. The topographical feature is separated from the conductive bond pad by a gap. In one embodiment, the topographical feature is formed at a location that is slightly beyond the perimeter of the solder bump, wherein an edge of the bump is aligned vertically to coincide with the gap separating the conductive bond pad from the topographical feature. The topographical feature provides thickness enhancement of a non-conductive layer disposed over the semiconductor die and the conductive bond pad and stress buffering. | 05-16-2013 |
20130119535 | FLIP CHIP PACKAGES WITH IMPROVED THERMAL PERFORMANCE - Systems and methods for improving thermal performance, such as thermal dissipation, of flip chip packages that include one or more flip chip dies are disclosed. In some embodiments, a thermal collection layer can be formed on a surface of a flip chip die. The thermal collection layer can be configured to dissipate heat generated by the flip chip die. In some variations, the thermal collection layer can be constructed using materials having high thermal conductivity. | 05-16-2013 |
20130119536 | METHOD FOR FORMING STUDS USED FOR SELF-ALIGNMENT OF SOLDER BUMPS - A method and a combination of studs, silicon chips, and solder bumps configured to restrict motion of a plurality of silicon chips. The combination includes: a plurality of studs, a plurality of silicon chips, a plurality of target solder bumps, where the plurality of solder bumps are melted between the plurality of silicon chips, where lateral positions of the plurality of studs are in accord with a pitch of the plurality of target solder bumps by using the pitch as a reference, where (i) lateral positions and lateral widths of studs of the plurality of studs located at a first silicon chip of the plurality of silicon chips and (ii) lateral positions and lateral widths of studs of the plurality of studs located at a second silicon chip of the plurality of silicon chips are restricted such that relative lateral motion on the respective silicon chips is restricted. | 05-16-2013 |
20130119537 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device includes a wiring board, a semiconductor chip mounted on the wiring board, the semiconductor chip including a bump formation surface, a plurality of first bumps provided within a first region of the bump formation surface, the first bumps being arranged in a first area density, a plurality of second bumps provided within a second region of the bump formation surface, the second bumps being arranged in a second area density, and a plurality of third bumps arranged between the first region and the second region of the bump formation surface in a two-dimensional array. The plurality of third bumps are arranged in a third area density being higher than the second area density and being lower than the first area density. | 05-16-2013 |
20130127039 | Semiconductor Device and Method of Laser-Marking Laminate Layer Formed Over EWLB With Tape Applied to Opposite Surface - A semiconductor device has a semiconductor die with a plurality of bumps formed on contact pads disposed over its active surface. An encapsulant is formed over the semiconductor die. An interconnect structure is formed over the semiconductor die and encapsulant. The semiconductor die is mounted to a translucent tape with the bumps embedded in the translucent tape. The translucent tape has layers of polyolefin, acrylic, and polyethylene terephthalate. A back surface of the semiconductor die undergoes backgrinding to reduce die thickness. The tape undergoes UV curing. A laminate layer is formed over the back surface of the semiconductor die. The laminate layer undergoes oven curing. The laminate layer is laser-marked while the tape remains applied to the bumps. The tape is removed after laser-marking the laminate layer. Alternately, the tape can be removed prior to laser-marking. The tape reduces die warpage during laser-marking. | 05-23-2013 |
20130127040 | DIE CARRIER FOR PACKAGE ON PACKAGE ASSEMBLY - A package-on-package arrangement for maintaining die alignment during a reflow operation is provided. A first top die has a first arrangement of solder bumps. A bottom package has a first electrical arrangement to electrically connect to the first arrangement of solder bumps. A die carrier has a plurality of mounting regions defined on its bottom surface, wherein the first top die is adhered to the die carrier at a first of the plurality of mounting regions. One of a second top die and a dummy die having a second arrangement of solder bumps is also fixed to the die carrier at a second of the plurality of mounting regions of the die carrier. The first and second arrangements of solder bumps are symmetric to one another, therein balancing a surface tension during a reflow operation, and generally fixing an orientation of the die carrier with respect to the bottom package. | 05-23-2013 |
20130127041 | BALL GRID ARRAY TO PIN GRID ARRAY CONVERSION - Ball grid array to pin grid array conversion methods are provided. An example method can include coupling a plurality of solder balls to a respective plurality of pin grid array contact pads. Each of the plurality of solder balls is encapsulated in a fixed material. A portion of the plurality of solder balls and a portion of the fixed material is removed to provide a plurality of exposed solder balls. The exposed solder balls are softened and each of a plurality of pin members is inserted in a softened, exposed, solder ball. The plurality of pin members forms a pin grid array package. | 05-23-2013 |
20130127042 | Semiconductor Device and Method of Forming Conductive Layer Over Substrate with Vents to Channel Bump Material and Reduce Interconnect Voids - A semiconductor device has a semiconductor die with a plurality of bumps formed over a surface of the semiconductor die. A first conductive layer having first and second segments is formed over a surface of the substrate with a first vent separating an end of the first segment and the second segment and a second vent separating an end of the second segment and the first segment. A second conductive layer is formed over the surface of the substrate to electrically connect the first segment and second segment. The thickness of the second conductive layer can be less than a thickness of the first conductive layer to form the first vent and second vent. The semiconductor die is mounted to the substrate with the bumps aligned to the first segment and second segment. Bump material from reflow of the bumps is channeled into the first vent and second vent. | 05-23-2013 |
20130127043 | MICRO SURFACE MOUNT DEVICE PACKAGING - A variety of improved approaches for packaging integrated circuits are described. In one described approach, a multiplicity of dice are mounted on a carrier (e.g., a plastic carrier). Each die has a plurality of wire bonded contact studs secured to its associated I/O pads. An encapsulant is applied over the carrier to cover the dice and at least portions of the contact studs to form an encapsulant carrier structure. After the encapsulant has been applied, a first surface of the encapsulant and the contact studs are ground such that exposed portions of the contact studs are smooth and substantially co-planar with the encapsulant. In some embodiments, a redistribution layer is formed over the encapsulant carrier structure and solder bumps are attached to the redistribution layer. A contact encapsulant layer is applied over the encapsulant carrier structure to provide extra mechanical support for the resulting packages. | 05-23-2013 |
20130127044 | MICRO SURFACE MOUNT DEVICE PACKAGING - A variety of improved approaches for packaging integrated circuits are described. In one described approach, a multiplicity of die cavities are formed in a plastic carrier. In some preferred embodiments, the die cavities are formed by laser ablation. A multiplicity of dice are placed on the carrier, with each die being placed in an associated die cavity. Each of the dice preferably has a multiplicity of I/O bumps formed thereon. An encapsulant is applied over the carrier to form an encapsulant layer that covers the dice and fills portions of the cavities that are not occupied by the dice. In some preferred embodiments, the encapsulant is an epoxy material applied by screen printing and the dice are not physically attached to the carrier prior to the application of the encapsulant. In these embodiments, the epoxy encapsulant serves to secure the dice to the carrier. | 05-23-2013 |
20130127045 | MECHANISMS FOR FORMING FINE-PITCH COPPER BUMP STRUCTURES - The mechanisms of forming a copper post structures described enable formation of copper post structures on a flat conductive surface. In addition, the copper post structures are supported by a molding layer with a Young's modulus (or a harder material) higher than polyimide. The copper post structures formed greatly reduce the risk of cracking of passivation layer and delamination of at the dielectric interface surrounding the copper post structures. | 05-23-2013 |
20130127046 | REDUCED SUSCEPTIBILITY TO ELECTROSTATIC DISCHARGE DURING 3D SEMICONDUCTOR DEVICE BONDING AND ASSEMBLY - Electrostatic discharge susceptibility is reduced when assembling a stacked IC device by coupling a ground plane of a first semiconductor device and a ground plane of a second semiconductor device to place the ground plane at substantially a same electrical potential. Active circuitry on the first semiconductor device and active circuitry on the second semiconductor device are electrically coupled after the ground planes are coupled. Electrically coupling the ground planes of the first and the second semiconductor device creates a preferred electrostatic discharge path to ground, thus reducing potential damage to sensitive circuit elements. | 05-23-2013 |
20130127047 | CONDUCTIVE STRUCTURE AND METHOD FOR FORMING THE SAME - A conductive structure for a semiconductor chip and a method for forming the conductive structure are provided. The semiconductor chip comprises a semiconductor substrate, a pad, a passivation layer and a patterned insulating layer. The patterned insulating layer is disposed on the passivation layer and partially and directly covers the first opening of the pad to expose a second opening. The conductive structure comprises an under bump metal (UBM) layer and a conductive bump. The UBM layer is disposed in the second opening defined by the patterned insulating layer and is electrically connected to the pad. The conductive bump is disposed on the UBM layer and is electrically connected to the UBM layer. The upper surface of the conductive bump is greater than the upper surface of the patterned insulating layer, while the portion of the conductive bump disposed in the second opening is covered by the UBM layer. | 05-23-2013 |
20130127048 | DEVICE - A device has a first substrate having a first surface; a first electrode pad arranged on the first surface of the first substrate; a first insulator film provided on the first surface of the first substrate so that the first electrode pad is exposed; a first bump electrode provided on the first electrode pad and having a first diameter; and a second bump electrode provided on the first insulator film and having a second diameter smaller than the first diameter. | 05-23-2013 |
20130127049 | Method for Stacking Devices and Structure Thereof - A semiconductor device that has a first device that includes a first through-silicon via (TSV) structure, a first coating material disposed over the first device, the first coating material continuously extending over the first device and covering the first TSV structure, a second device disposed over the first device and within the first coating material, the second device includes a second TSV structure and a plurality of conductive bumps, the plurality of conductive bumps are positioned within the first coating material, a second coating material disposed over the second device, the second coating material continuously extends over the second device and covers the second TSV structure, and a third device disposed over the second coating material, the third device includes a third TSV structure. | 05-23-2013 |
20130127050 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR - A semiconductor device includes a substrate having a main surface and a back surface opposite to the main surface, a first semiconductor chip having an upper surface and a lower surface opposite to the first surface with a side surface provided therebetween, the first semiconductor chip being mounted on the main surface of the substrate, a plurality of bumps provided between the main surface of the substrate and the lower surface of the first semiconductor chip, a second semiconductor chip having an upper surface and a lower surface opposite to the first surface with a side surface provided therebetween, the second semiconductor chip being mounted on the upper surface of the first semiconductor chip such that the side surface of the second semiconductor chip is positioned outward from the side surface of the first semiconductor chip. | 05-23-2013 |
20130127051 | WINDOW BALL GRID ARRAY (BGA) SEMICONDUCTOR PACKAGES - A semiconductor package includes a substrate having a first surface, a second surface that is opposite to the first surface, and an opening formed between the first surface of the substrate and the second surface of the substrate. One or more bonding wires electrically couple a first surface of a semiconductor die included in the semiconductor package to the first surface of the substrate through an opening of the substrate. A first electrically insulative structure is disposed to substantially fill an area between the first surface of the semiconductor die, the second surface of the substrate, and one or more interconnect bumps that electrically couple the semiconductor die to the substrate. The first electrically insulative structure substantially encapsulates the one or more bonding wires and substantially fills the opening of the substrate. | 05-23-2013 |
20130134578 | DEVICE HAVING MULTIPLE WIRE BONDS FOR A BOND AREA AND METHODS THEREOF - Wire bonds are formed at an integrated circuit device so that multiple wires are bonded to a single bond pad. In a particular embodiment, the multiple wires are bonded by first applying a stud bump to the pad and successively bonding each of the wires to the stud bump. Another stud bump can be placed over the bonded wires to provide additional connection security. | 05-30-2013 |
20130134579 | Structure for High-Speed Signal Integrity in Semiconductor Package with Single-Metal-Layer Substrate - A semiconductor chip ( | 05-30-2013 |
20130134580 | Semiconductor Device and Method of Forming RDL Under Bump for Electrical Connection to Enclosed Bump - A semiconductor device has a semiconductor wafer with a plurality of semiconductor die. A first conductive layer is formed over a surface of the wafer. A first insulating layer is formed over the surface of the wafer and first conductive layer. A second conductive layer has first and second segments formed over the first insulating layer. A second insulating layer is formed over the first insulating layer and second conductive layer. A UBM layer is formed over the second insulating layer and the first segment of the second conductive layer. A first bump is formed over the UBM layer. The first bump is electrically connected to the second segment and electrically isolated from the first segment of the second conductive layer. A second bump is formed over the surface of the wafer and electrically connected to the first segment of the second conductive layer. | 05-30-2013 |
20130134581 | PLANARIZED BUMPS FOR UNDERFILL CONTROL - The mechanisms for forming bump structures reduce variation of standoffs between chips and package substrates. By planarizing the solder layer on bump structures on chips and/or substrates after plating, the heights of bump structures are controlled to minimize variation due to within die and within wafer locations, pattern density, die size, and process variation. As a result, the standoffs between chips and substrates are controlled to be more uniform. Consequently, underfill quality is improved. | 05-30-2013 |
20130134582 | NOVEL BUMP STRUCTURES FOR MULTI-CHIP PACKAGING - The mechanisms for forming a multi-chip package described enable chips with different bump sizes being packaged to a common substrate. A chip with larger bumps can be bonded with two or more smaller bumps on a substrate. Conversely, two or more small bumps on a chip may be bonded with a large bump on a substrate. By allowing bumps with different sizes to be bonded together, chips with different bump sizes can be packaged together to form a multi-chip package. | 05-30-2013 |
20130134583 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - In one embodiment, a semiconductor device includes a first semiconductor chip and a second semiconductor chip stacked on the first semiconductor chip. The first and second semiconductor chips are electrically connected via first bump connection parts. Stopper projections and bonding projections are provided at least one of the first and second semiconductor chips. The stopper projections are in contact with the other of the first and second semiconductor chips in an unbonded state. The bonding projections are bonded to the first and second semiconductor chips. | 05-30-2013 |
20130134584 | SEMICONDUCTOR DEVICE HAVING WIRING PAD AND WIRING FORMED ON THE SAME WIRING LAYER - Disclosed herein is a device that includes a first wiring provided as a first-level wiring layer and elongated in a first direction; and a first wiring pad provided as the first-level wiring layer, the first wiring pad being rectangular and including a first side edge that is elongated in the first direction and a second side edge that is elongated in a second direction crossing to the first direction, the first side edge being greater in length than the second side edge, the first wiring pad being greater in length in the second direction than the first wiring. | 05-30-2013 |
20130134585 | INTEGRATED CIRCUIT ASSEMBLY AND METHOD OF MAKING - An integrated circuit assembly includes an insulating layer having a having a first surface and a second surface. A first active layer contacts the first surface of the insulating layer. A metal bond pad is electrically connected to the first active layer and formed on the second surface of the insulating layer. A substrate having a first surface and a second surface, with a second active layer formed in the first surface, is provided such that the first active layer is coupled to the second surface of the substrate. | 05-30-2013 |
20130134586 | Semiconductor Device Having Vertically Offset Bond on Trace Interconnects on Recessed and Raised Bond Fingers - A semiconductor device includes a substrate, a first recessed conductive layer embedded and recessed into a first surface of the substrate, and a first raised conductive layer disposed above the first surface. A first vertical offset exists between an upper surface of the first recessed conductive layer and an upper surface of the first raised conductive layer. The device includes a second recessed conductive layer embedded and recessed into a second surface of the substrate. The second surface of the substrate is opposite the first surface. The device includes a second raised conductive layer disposed beneath the second surface and an interconnect structure disposed on the first recessed and raised conductive layers and the second recessed and raised conductive layers. A second vertical offset exists between a lower surface of the second recessed conductive layer and a lower surface of the second recessed conductive layer. | 05-30-2013 |
20130134587 | MICROELECTRONIC PACKAGE WITH SELF-HEATING INTERCONNECT - A microelectronic package is provided. The microelectronic package includes a substrate having a plurality of solder bumps disposed on a top side of the substrate anda die disposed adjacent to the top side of the substrate. The die includes a plurality of glassy metal bumps disposed on a bottom side of the die wherein the plurality of glassy metal bumps are to melt the plurality of solder bumps to form a liquid solder layer. The liquid solder layer is to attach the die with the substrate. | 05-30-2013 |
20130140688 | Through Silicon Via and Method of Manufacturing the Same - The present invention discloses a through silicon via and method of manufacturing the same comprising the steps of providing a substrate, forming a plurality of through silicon via (TSV) holes in said substrate, forming a seed layer on the surface of said substrate and said a plurality of TSV holes, forming a patterned mask on said substrate, wherein said patterned mask comprises a plurality of first openings corresponding to said TSV holes and a plurality of second openings adjacent to or surrounding said a plurality of first openings, forming a material layer on said substrate, wherein said material layer is filled into said TSV holes and said first openings to form a plurality of through silicon vias, and said material layer is filled into said second openings to form a plurality of dummy bumps. | 06-06-2013 |
20130140689 | Bump-on-Trace Structures in Packaging - A package component includes a metal trace on a top surface of the package component, and an anchor via underlying and in contact with the metal trace. The anchor via is configured not to conduct currents flowing through the metal trace. | 06-06-2013 |
20130140690 | TSV Structures and Methods for Forming the Same - A device includes a substrate having a front side and a backside, a through-via extending from the backside to the front side of the substrate, and a conductive pad on the backside of the substrate and over the through-via. The conductive pad has a substantially planar top surface. A conductive bump has a non-planar top surface over the substantially planar top surface and aligned to the through-via. The conductive bump and the conductive pad are formed of a same material. No interface is formed between the conductive bump and the conductive pad. | 06-06-2013 |
20130140691 | Semiconductor Device and Method of Forming Patterned Repassivation Openings Between RDL and UBM to Reduce Adverse Effects of Electro-Migration - A semiconductor device has a semiconductor wafer with a first conductive layer formed over a surface of the semiconductor wafer. A first insulating layer is formed over the surface of the semiconductor wafer and first conductive layer. A second conductive layer is formed over the first insulating layer and first conductive layer. A second insulating layer is formed over the first insulating layer and second conductive layer. A plurality of openings is formed in the second insulating layer in a bump formation area of the semiconductor wafer to expose the second conductive layer and reduce adverse effects of electro-migration. The openings are separated by portions of the second insulating layer. A UBM layer is formed over the openings in the second insulating layer in the bump formation area electrically connected to the second conductive layer. A bump is formed over the UBM layer. | 06-06-2013 |
20130140692 | WIRING SUBSTRATE, MANUFACTURING METHOD OF WIRING SUBSTRATE, AND SEMICONDUCTOR PACKAGE INCLUDING WIRING SUBSTRATE - A wiring substrate includes an insulating layer having a first surface on which a projecting part is formed, and an electrode pad being formed on the projecting part and including a first electrode pad surface and a second electrode pad surface on a side opposite to the first electrode pad surface. The first electrode pad surface is exposed from the projecting part of the insulating layer. The second electrode pad surface is covered by the insulating layer. A cross-section of the projecting part is a tapered shape. One side of the cross-section toward the first electrode pad surface is narrower than another side of the cross-section toward the first surface of the insulating layer. | 06-06-2013 |
20130140693 | METHOD FOR FORMING AN INTEGRATED CIRCUIT - A method for forming an integrated circuit including the steps of: a) forming openings in a front surface of a first semiconductor wafer, the depth of the openings being smaller than 10 μm, and filling them with a conductive material; b) forming doped areas of components in active areas of the front surface, forming interconnection levels on the front surface and leveling the surface supporting the interconnection levels; c) covering with an insulating layer a front surface of a second semiconductor wafer, and leveling the surface coated with an insulator; d) applying the front surface of the second wafer coated with insulator on the front surface of the first wafer supporting interconnection levels, to obtain a bonding between the two wafers; e) forming vias from the rear surface of the second wafer, to reach the interconnection levels of the first wafer; and f) thinning the first wafer to reach the openings filled with conductive material. | 06-06-2013 |
20130140694 | FLIP CHIP PACKAGE UTILIZING TRACE BUMP TRACE INTERCONNECTION - A flip chip package includes a substrate having a die attach surface; and a die mounted on the die attach surface with an active surface of the die facing the substrate, wherein the die is interconnected to the substrate via a plurality of copper pillar bumps on the active surface, wherein at least one of the plurality of copper pillar bumps has a bump width that is substantially equal to or smaller than a line width of a trace on the die attach surface of the substrate. | 06-06-2013 |
20130140695 | SOLDER BUMP CONNECTIONS - Solder bump connections and methods for fabricating solder bump connections. The method includes forming a layer stack containing first and second conductive layers, forming a dielectric passivation layer on a top surface of the second conductive layer, and forming a via opening extending through the dielectric passivation layer to the top surface of the second conductive layer. The method further includes forming a conductive plug in the via opening. The solder bump connection includes first and second conductive layers comprised of different conductors, a dielectric passivation layer on a top surface of the second conductive layer, a via opening extending through the dielectric passivation layer to the top surface of the second conductive layer, and a conductive plug in the via opening. | 06-06-2013 |
20130140696 | SEMICONDUCTOR DEVICE - A semiconductor device includes a first substrate; a plurality of first electrodes formed on the first substrate; and a first insulating film formed on sidewalls of the plurality of first electrodes. The first insulating film is formed not to fill spaces between the plurality of first electrodes. | 06-06-2013 |
20130147030 | Landing Areas of Bonding Structures - A device includes a first and a second package component. A metal trace is disposed on a surface of the first package component. The metal trace has a lengthwise direction. The metal trace includes a portion having an edge, wherein the edge is not parallel to the lengthwise direction of the metal trace. The second package component includes a metal pillar, wherein the second package component is disposed over the first package component. A solder region bonds the metal pillar to the metal trace, wherein the solder region contacts a top surface and the edge of the portion of the metal trace. | 06-13-2013 |
20130147031 | SEMICONDUCTOR DEVICE WITH BUMP STRUCTURE ON POST-PASSIVATION INTERCONNCET - A semiconductor device includes a post-passivation interconnect (PPI) structure having a landing pad region. A polymer layer is formed on the PPI structure and patterned with a first opening and a second opening to expose portions of the landing pad region. The second opening is a ring-shaped opening surrounding the first opening. A bump structure is formed on the polymer layer to electrically connect the landing pad region through the first opening and the second opening. | 06-13-2013 |
20130147032 | PASSIVATION LAYER FOR PACKAGED CHIP - The embodiments described above provide mechanisms for forming metal bumps on metal pads with testing pads on a packaged integrated circuit (IC) chip. A passivation layer is formed to cover the testing pads and possibly portions of metal pads. The passivation layer does not cover surfaces away from the testing pad region and the metal pad region. The limited covering of the testing pads and the portions of the metal pads by the passivation layer reduces interface resistance for a UBM layer formed between the metal pads and the metal bumps. Such reduction of interface resistance leads to the reduction of resistance of the metal bumps. | 06-13-2013 |
20130147033 | POST-PASSIVATION INTERCONNECT STRUCTURE - A semiconductor device includes a passivation layer overlying a semiconductor substrate, and an interconnect structure overlying the passivation layer. The interconnect structure includes a landing pad region and a dummy region electrically separated from each other. A protective layer overlies the interconnect structure and includes a first opening exposing a portion of the landing pad region and a second opening exposing a portion of the dummy region. A metal layer is formed on the exposed portion of landing pad region and the exposed portion of the dummy region. A bump is formed on the metal layer overlying the landing pad region. | 06-13-2013 |
20130147034 | BUMP STRUCTURE DESIGN FOR STRESS REDUCTION - Low stress bumps can be used to reduce stress and strain on bumps bonded to a substrate with different coefficients of thermal expansion (CTEs) from the die. The low stress bumps include multiple polymer layers. More than one type of bump is coupled to a die, with low stress bumps placed on areas subjected to high stress. | 06-13-2013 |
20130147035 | Semiconductor Device and Method of Forming Recesses in Conductive Layer to Detect Continuity for Interconnect Between Semiconductor Die and Substrate - A semiconductor device has a semiconductor die with composite bump structures over a surface of the semiconductor die. A conductive layer is formed over the substrate. The conductive layer has a channel in an interconnect site of the conductive layer. The channel extends beyond a footprint of the composite bump structures. The semiconductor die is disposed over the substrate. The bump material of the composite bump structures is melted. The composite bump structures are pressed over the interconnect site of the conductive layer so that the melted bump material flows into the channel. Electrical continuity between the composite bump structures and conductive layer is detected by a presence of the bump material in the channel. No electrical continuity between the composite bump structures and conductive layer is detected by an absence of the bump material in the channel. The electrical continuity can be detected by visual inspection or X-ray. | 06-13-2013 |
20130147036 | Semiconductor Device and Method of Forming UBM Structure on Back Surface of TSV Semiconductor Wafer - A semiconductor device has a plurality of conductive vias formed through the semiconductor die with a first insulating layer around the conductive vias. A recess is formed in the first insulating layer around the conductive vias by LDA. A portion of the semiconductor wafer is removed by LDA after forming the recess in the first insulating layer so that the conductive vias extend above a surface of the semiconductor wafer. The first insulating layer extends to the surface of the semiconductor wafer or above the surface of the semiconductor wafer. A second insulating layer is formed over the surface of the semiconductor wafer and conductive vias. A first portion of the second insulating layer is removed by LDA, while leaving a second portion of the second insulating layer over the surface of the semiconductor wafer around the conductive vias. An electroless plated bump is formed over the conductive vias. | 06-13-2013 |
20130147037 | SEMICONDUCTOR STRUCTURE - A semiconductor structure is provided. The semiconductor structure includes a substrate, at least two pads, a passivation layer, at least two under bump metallization (UBM) layers and at least two bumps. The pads are disposed adjacent to each other on the substrate along the first direction. The passivation layer covers the substrate and the peripheral upper surface of each pad to define an opening. Each of the openings defines an opening projection along the second direction. The opening projections are disposed adjacent to each other but not overlapping with each other. Furthermore, the first direction is perpendicular to the second direction. The UBM layers are disposed on the corresponding openings, and the bumps are respectively disposed on the corresponding UBM layers. With the above arrangements, the width of each bump of the semiconductor structure of the present invention could be widened without being limited by the bump pitch. | 06-13-2013 |
20130147038 | SEMICONDUCTOR DEVICE INCLUDING STACKED SEMICONDUCTOR CHIPS WITHOUT OCCURRING OF CRACK - A device includes first and second semiconductor chips. The first semiconductor chip includes an edge defining a periphery of the first semiconductor chip. The second semiconductor chip is greater in size than the first semiconductor chip. The second semiconductor chip is stacked over the first semiconductor chip so that the second semiconductor chip hangs over from the edge of the first semiconductor chip. The second semiconductor chip includes a plurality of wiring patterns including a first wiring pattern that positions over the edge of the first semiconductor chip, an insulating film which covers the wiring patterns and which includes on or more holes that expose one or more the wiring patterns, and one or more bump electrodes formed on the one or more the wiring patterns. Remaining one or ones of the wiring patterns is kept covered by the insulating layer and includes the first wiring pattern. | 06-13-2013 |
20130147039 | SEMICONDUCTOR DEVICE - A semiconductor device includes a wiring board that has a conductive pattern formed on at least one principal surface, and an IC chip that is mounted on the wiring board. The IC chip includes a plurality of electrodes to make conductor connection with the wiring board. The conductive pattern includes a lead line pattern and a heat dissipation pattern. The lead line pattern is connected with at least one of the plurality of electrodes through a conductor. The heat dissipation pattern is physically spaced from the IC chip and the lead line pattern and has a larger surface area than the lead line pattern. Further, the lead line pattern and the heat dissipation pattern are placed opposite to each other with a gap therebetween, and their opposite parts respectively have interdigitated shapes and are arranged with the respective interdigitated shapes engaging with each other with the gap therebetween. | 06-13-2013 |
20130154088 | Integrated Circuits with Components on Both Sides of a Selected Substrate and Methods of Fabrication - Novel integrated circuits (SOI ICs), and methods for making and mounting the ICs are disclosed. In one embodiment, an IC comprises a first circuit layer of the IC formed from an active layer of an SOI wafer. The first circuit layer is coupled to a first surface of buffer layer, and a second surface of the buffer layer is coupled to a selected substrate comprising an insulating material. The selected substrate may be selected, without limitation, from the following types: sapphire, quartz, silicon dioxide glass, piezoelectric materials, and ceramics. A second circuit layer of the IC are formed, coupled to a second surface of the selected substrate. In one embodiment of a mounted IC, the first circuit layer is coupled to contact pads on a package substrate via solder bumps or copper pillars. The second circuit layer is coupled to contact pads on the package substrate via wire bonds. | 06-20-2013 |
20130154089 | BUMP INCLUDING DIFFUSION BARRIER BI-LAYER AND MANUFACTURING METHOD THEREOF - Provided herein is a bump including a diffusion barrier bi-layer, the bump having: a conductive layer; a first diffusion barrier layer formed on or above the conductive layer, and comprising an alloy of nickel and phosphorus; a second diffusion barrier formed on or above the first diffusion barrier layer, and comprising copper; and a solder layer formed on or above the second diffusion barrier layer. A manufacturing method for producing a bump is also provided. | 06-20-2013 |
20130154090 | Semiconductor Device and Method of Forming Interconnect Structure with Conductive Pads Having Expanded Interconnect Surface Area for Enhanced Interconnection Properties - A semiconductor device has a substrate and first conductive pads formed over the substrate. An interconnect surface area of the first conductive pads is expanded by forming a plurality of recesses into the first conductive pads. The recesses can be an arrangement of concentric rings, arrangement of circular recesses, or arrangement of parallel linear trenches. Alternatively, the interconnect surface area of the first conductive pads is expanded by forming a second conductive pad over the first conductive pad. A semiconductor die has a plurality of interconnect structures formed over a surface of the semiconductor die. The semiconductor die is mounted to the substrate with the interconnect structures contacting the expanded interconnect surface area of the first conductive pads to increase bonding strength of the interconnect structure to the first conductive pads. A mold underfill material is deposited between the semiconductor die and substrate. | 06-20-2013 |
20130161810 | SEMICONDUCTOR PACKAGE - The invention provides a semiconductor package. The semiconductor package includes a substrate. A first conductive trace is disposed on the substrate. A solder resistance layer is disposed on the substrate, having an extending portion covering a portion of the first conductive trace, wherein a width of the extending portion of the solder resistance layer is larger than that of the portion of the first conductive trace. A semiconductor die is disposed over the first conductive trace. | 06-27-2013 |
20130161811 | 3D IC CONFIGURATION WITH CONTACTLESS COMMUNICATION - A package comprises a die stack having at least two stacked dies coupled for contactless communications with each other. At least one of the stacked dies has a substrate joined to its major face. The substrate has a plurality of conductive traces in or on the substrate for conducting power to the dies and for conducting heat from the dies. At least one conductive pillar is joined to at least one of the conductive traces on at least a first edge of the substrate, for conducting power to the at least one die and for conducting heat from the at least one die. | 06-27-2013 |
20130161812 | DIE PACKAGES AND SYSTEMS HAVING THE DIE PACKAGES - A die package may include a package substrate; an interposer; and/or at least one first die connected between the package substrate and the interposer. The die package may further include at least one second die mounted on the interposer and/or a processor. A system may include a system board and/or a die package mounted on the system board. The die package may include a package substrate; an interposer; and/or at least one first die connected between the package substrate and the interposer. The system may further include at least one second die mounted on the interposer and/or a processor. The processor may control data processing operations of the at least one first die and/or the at least one second die. | 06-27-2013 |
20130161813 | SEMICONDUCTOR DEVICE, SEMICONDUCTOR PACKAGE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A semiconductor device includes a semiconductor substrate. The semiconductor substrate includes a first surface, a second surface, and a through hole that extends through the semiconductor substrate from the first surface to the second surface. An insulating layer covers the first surface and includes an opening at a location facing the through hole. An insulating film covers an inner wall of the through hole and an inner wall of the opening. A through electrode is formed in the through hole and the opening that are covered by the insulating film. A first connecting terminal is formed integrally with the through electrode to cover one end of the through electrode exposed from the insulating layer. The first connecting terminal has a larger size than the through electrode as viewed from above. | 06-27-2013 |
20130161814 | SEMICONDUCTOR CHIP WITH OFFSET PADS - A semiconductor chip device includes a first semiconductor chip adapted to be stacked with a second semiconductor chip wherein the second semiconductor chip includes a side and first and second conductor structures projecting from the side. The first semiconductor chip includes a first edge, a first conductor pad, a first conductor pillar positioned on but laterally offset from the first conductor pad toward the first edge and that has a first lateral dimension and is adapted to couple to one of the first and second conductor structures, a second conductor pad positioned nearer the first edge than the first conductor pad, and a second conductor pillar positioned on but laterally offset from the second conductor pad and that has a second lateral dimension larger than the first lateral dimension and is adapted to couple to the other of the first and second conductor structures. | 06-27-2013 |
20130161815 | SEMICONDUCTOR DEVICE - The semiconductor device has the CSP structure, and may include a plurality of electrode pads formed on a semiconductor integrated circuit in order to input/output signals from/to exterior; solder bumps for making external lead electrodes; and rewiring. The solder bumps may be arranged in two rows along the periphery of the semiconductor device. The electrode pads may be arranged inside the outermost solder bumps so as to be interposed between the two rows of solder bumps. Each trace of the rewiring may be extended from an electrode pad, and may be connected to any one of the outermost solder bumps or any one of the inner solder bumps. | 06-27-2013 |
20130168848 | PACKAGED SEMICONDUCTOR DEVICE AND METHOD OF PACKAGING THE SEMICONDUCTOR DEVICE - The mechanisms of forming a molding compound on a semiconductor device substrate to enable fan-out structures in wafer-level packaging (WLP) are provided. The mechanisms involve covering portions of surfaces of an insulating layer surrounding a contact pad. The mechanisms improve reliability of the package and process control of the packaging process. The mechanisms also reduce the risk of interfacial delamination, and excessive outgassing of the insulating layer during subsequent processing. The mechanisms further improve planarization end-point. By utilizing a protective layer between the contact pad and the insulating layer, copper out-diffusion can be reduced and the adhesion between the contact pad and the insulating layer may also be improved. | 07-04-2013 |
20130168849 | Fully Molded Fan-Out - A method for manufacturing a device package may include constructing a spacer element coupled with a surface of a semiconductor die unit, where the spacer element is configured to create a gap between the semiconductor die unit and a surface of a carrier, and encapsulating the semiconductor die unit within a mold compound, where the encapsulating includes introducing the mold compound into the gap. | 07-04-2013 |
20130168850 | SEMICONDUCTOR DEVICE HAVING A THROUGH-SUBSTRATE VIA - Semiconductor devices are described that include a via that extends only partially through the substrate. Through-substrate vias (TSV) furnish electrical interconnectivity to electronic components formed in the substrates. In implementations, the semiconductor devices are fabricated by first bonding a semiconductor wafer to a carrier wafer with an adhesive material. The semiconductor wafer includes an etch stop disposed within the wafer (e.g., between a first surface a second surface of the wafer). One or more vias are formed through the wafer. The vias extend from the second surface to the etch stop. | 07-04-2013 |
20130168851 | BUMP STRUCTURE AND ELECTRONIC PACKAGING SOLDER JOINT STRUCTURE AND FABRICATING METHOD THEREOF - A bump structure includes a substrate, a pad, an electrode and a protruding electrode. The pad is disposed on the substrate. The electrode is formed by a first metal material and disposed on the pad. The protruding electrode is formed by a second metal material and disposed on the electrode, wherein a cross-sectional area of the protruding electrode is less than a cross-sectional area of the electrode. | 07-04-2013 |
20130168852 | MEMS Devices and Methods of Forming Same - A microelectromechanical system (MEMS) device may include a MEMS structure over a first substrate. The MEMS structure comprises a movable element. Depositing a first conductive material over the first substrate and etching trenches in a second substrate. Filling the trenches with a second conductive material and depositing a third conductive material over the second conductive material and the second substrate. Bonding the first substrate and the second substrate and thinning a backside of the second substrate which exposes the second conductive material in the trenches. | 07-04-2013 |
20130168853 | PACKAGE SUBSTRATE AND METHOD OF FABRICATING THE SAME - Disclosed herein are a package substrate and a method of fabricating the same. The method of fabricating the package substrate includes preparing a base substrate, forming a metal material layer surrounding an entire surface of the base substrate, forming sacrificial patterns on partial regions of the base substrate on which the metal material layer is formed, forming pads contacting lateral surfaces of the sacrificial patterns, forming a gold plating layer on upper surfaces of the pads, and removing the sacrificial patterns and removing portions of the metal material layer to form a conductive layer that remains on partial regions so as to contact lower surfaces of the pads. | 07-04-2013 |
20130175681 | CHIP PACKAGE STRUCTURE - A chip package structure includes a carrier and a chip group. The chip group includes a pair of first chips that are identical IC chips. The pair of first chips are disposed on the carrier in opposite directions and parallel to each other, and electrically connected with the carrier. | 07-11-2013 |
20130175682 | SEMICONDUCTOR DEVICE AND INFORMATION PROCESSING SYSTEM INCLUDING THE SAME - A semiconductor device includes a semiconductor substrate, first and second penetration electrodes each penetrating the semiconductor substrate, a multi-level wiring structure formed on the semiconductor substrate, the multi-level wiring structure including a lower-level wiring, an upper-level wiring and an interlayer insulating film between the lower-level wiring and the upper-level wiring, a first wiring pad formed as the lower-level wiring and electrically connected to the first penetration electrode, a second wiring pad formed as the upper-level wiring, a plurality of first through electrodes each formed in the interlayer insulating film to form an electrical connection between the first and second wiring pads, a third wiring pad formed as the lower-level wiring and electrically connected to the second penetration electrode, a fourth wiring pad formed as the upper-level wiring, and a plurality of second through electrodes each formed in the interlayer insulating film. | 07-11-2013 |
20130175683 | Semiconductor Device And Bump Formation Process - A semiconductor device includes a solder bump overlying and electrically connected to a pad region, and a metal cap layer formed on at least a portion of the solder bump. The metal cap layer has a melting temperature greater than the melting temperature of the solder bump. | 07-11-2013 |
20130181338 | Package on Package Interconnect Structure - A structure comprises a post passivation interconnect layer formed over a semiconductor substrate, a metal bump formed over the post passivation interconnect layer and a molding compound layer formed over the semiconductor substrate. A lower portion of the metal bump is embedded in the molding compound layer and a middle portion of the metal bump is surrounded by a concave meniscus molding compound protection layer. | 07-18-2013 |
20130181339 | MULTI-CHIP SELF-ALIGNMENT ASSEMBLY WHICH CAN BE USED WITH FLIP-CHIP BONDING - A method and structure for mechanical self-alignment of semiconductor device features, for example multi-chip module features. Alignment of the features can be performed using mechanical alignment grooves within a layer of a first device and mechanical alignment pedestals of a second device. The alignment accuracy is limited by the patterning resolution of the semiconductor processing, which is in sub-micron scale. Flip-chip bonding can be used as the bonding process between chips to increase the alignment precision. | 07-18-2013 |
20130181340 | SEMICONDUCTOR DEVICES WITH COMPLIANT INTERCONNECTS - A method forms a connecting pillar to a bonding pad of an integrated circuit. A seed layer is formed over the bond pad. Photoresist is deposited over the integrated circuit. An opening is formed in the photoresist over the bond pad. The connecting pillar is formed in the opening by plating. | 07-18-2013 |
20130181341 | SEMICONDUCTOR PACKAGE STRUCTURE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor package structure and a method for manufacturing the same are provided, in which a semiconductor die is disposed in a spacer structure for packaging, and a connection pad, a first metallic layer, an insulating layer, a wiring layer, a pin base, a conductive via and a metallic bump are formed on the semiconductor die, wherein the wiring layer can be formed as a single layer or multiple layers, and the connection pad is electrically connected with an outer pin. Moreover, the positioning structures are also formed to overcome the conventional misalignment problems caused by the thermal expansion and the cooling contraction. The alignment of the conductive via with the connection pad can be more accurately achieved, which ensures that the connection pad is reliably connected with the outer pin. | 07-18-2013 |
20130181342 | SEMICONDUCTOR PACKAGE - A semiconductor package includes a substrate having first and second surfaces which face each other, a semiconductor chip mounted on the first surface, a first encapsulant formed on the first surface and at least partially encapsulating the semiconductor chip. A second encapsulant is formed on the second surface and first external connection terminals formed on the second surface to penetrate the second encapsulant. The external connection terminals have first ends in contact with the second surface. Second external connection terminals are attached to second ends of the first external connection terminals. | 07-18-2013 |
20130181343 | MULTI-CHIP PACKAGE AND METHOD OF MANUFACTURING THE SAME - A multi-chip package includes a first semiconductor chip and a second semiconductor chip. The first semiconductor chip has a first active surface. The second semiconductor chip has a second active surface facing the first active surface. The second active surface is electrically connected with the first active surfaceand the first active surface of the first semiconductor chip and the second active surface of the second semiconductor chip are bonded to each other without an adhesive. | 07-18-2013 |
20130181344 | SEMICONDUCTOR MODULE, METHOD FOR MANUFACTURING THE SEMICONDUCTOR MODULE, AND MOBILE APPARATUS - Bump electrodes and wiring layers are formed by selectively removing a copper sheet while the copper sheet is being held on a supporting base by an adhesion layer. Subsequently, a device mounting board is formed by laminating an insulating resin layer in such a manner that Au/Ni layers are exposed on the bump electrodes and the adhesion layer. The device mounting board and a semiconductor device held on the supporting base are temporarily press-bonded to each other and then the supporting base and the adhesion layer are removed. Then the device mounting board and the semiconductor device are finally and permanently press-bonded together. | 07-18-2013 |
20130181345 | SEMICONDUCTOR DEVICE HAVING PENETRATION ELECTRODE PENETRATING THROUGH SEMICONDUCTOR SUBSTRATE - Disclosed herein is a device that includes: a semiconductor substrate having a first surface on which a plurality of circuit elements are formed and a second surface opposite to the first surface; an insulating layer covering the second surface of the semiconductor substrate; and a penetration electrode having a body section that penetrates through the semiconductor substrate and a protruding section that is connected to one end of the body section and protrudes from the second surface of the semiconductor substrate. The second surface of the semiconductor substrate is covered with the protruding section of the penetration electrode without intervention of the insulating layer. | 07-18-2013 |
20130181346 | BUMPING PROCESS AND STRUCTURE THEREOF - A bumping process includes providing a silicon substrate, forming a titanium-containing metal layer on the silicon substrate, wherein the titanium-containing metal layer comprises a plurality of first areas and a plurality of second areas, forming a photoresist layer on the titanium-containing metal layer, patterning the photoresist layer to form a plurality of opening slots, forming a plurality of bottom coverage layers at the opening slots, proceeding a heat procedure, forming a plurality of external coverage layers to make each of the external coverage layers connect with each of the bottom coverage layers, wherein said external coverage layer and said bottom coverage layer form a wrap layer and completely surround the copper bump, forming a plurality of connective layers on the external coverage layers, removing the photoresist layer, removing the second areas and enabling each of the first areas to form an under bump metallurgy layer. | 07-18-2013 |
20130181347 | Bump Pad Structure - An embodiment is a bump bond pad structure that comprises a substrate comprising a top layer, a reinforcement pad disposed on the top layer, an intermediate layer above the top layer, an intermediate connection pad disposed on the intermediate layer, an outer layer above the intermediate layer, and an under bump metal (UBM) connected to the intermediate connection pad through an opening in the outer layer. Further embodiments may comprise a via mechanically coupling the intermediate connection pad to the reinforcement pad. The via may comprise a feature selected from the group consisting of a solid via, a substantially ring-shaped via, or a five by five array of vias. Yet, a further embodiment may comprise a secondary reinforcement pad, and a second via mechanically coupling the reinforcement pad to the secondary reinforcement pad. | 07-18-2013 |
20130181348 | SEMICONDUCTOR DEVICE HAVING BACKSIDE REDISTRIBUTION LAYERS AND METHOD FOR FABRICATING THE SAME - Present embodiments relate to a semiconductor device having a backside redistribution layer and a method for forming such a layer. Specifically, one embodiment includes providing a substrate comprising a via formed therein. The substrate has a front side and a backside. The embodiment may further include forming a trench on the backside of the substrate, disposing an insulating material in the trench, and forming a trace over the insulating material in the trench. | 07-18-2013 |
20130187265 | PACKAGE STRUCTURE AND SEMICONDUCTOR STRUCTURE THEREOF - A semiconductor structure comprises a carrier, a plurality of under bump metallurgy layers, a plurality of copper containing bumps and an organic barrier layer, wherein the carrier comprises a protective layer and a plurality of conductive pads, mentioned protective layer comprises a plurality of openings, the conductive pads exposed by the openings, mentioned under bump metallurgy layers being formed on the conductive pads, mentioned copper containing bumps being formed on the under bump metallurgy layers, each of the copper containing bumps comprises a top surface and a ring surface in connection with the top surface, mentioned organic barrier layer having a first coverage portion, and mentioned first coverage portion covers the top surface and the ring surface of each of the copper containing bumps. | 07-25-2013 |
20130187266 | INTEGRATED CIRCUIT PACKAGE ASSEMBLY AND METHOD OF FORMING THE SAME - An integrated circuit package assembly includes a first integrated circuit package and a second integrated circuit package disposed under the first integrated circuit package. Solder bumps are disposed between the first integrated circuit package and the second integrated circuit package providing electrical signal connections between the first integrated circuit package and the second integrated circuit package. At least one support structure is disposed between the first integrated circuit package and the second integrated circuit package to facilitate thermal conduction between the first integrated circuit package and the second integrated circuit package without providing electrical signal connections. | 07-25-2013 |
20130187267 | INCREASED SURFACE AREA ELECTRICAL CONTACTS FOR MICROELECTRONIC PACKAGES - A multilayer microelectronic device package includes one or more vertical electrical contacts. At least one semiconductor material layer is provided having one or more electrical devices fabricated therein. An electrical contact pad can be formed on or in the semiconductor material layer. Another material layer is positioned adjacent to the semiconductor material layer and includes a conductive material stud embedded in or bonded to the layer. A via is formed through at least a portion of the semiconductor material layer and the electrical contact pad and into the adjacent layer conducting material stud. The via is constructed such that the via tip terminates within the conducting material stud, exposing the conducting material. A metallization layer is disposed in the via such that the metallization layer contacts both the electrical contact pad and the conducting material stud exposed by the via tip. | 07-25-2013 |
20130187268 | Semiconductor Packaging Structure and Method - A system and method for packaging semiconductor dies is provided. An embodiment comprises a first package with a first contact and a second contact. A post-contact material is formed on the first contact in order to adjust the height of a joint between the contact pad a conductive bump. In another embodiment a conductive pillar is utilized to control the height of the joint between the contact pad and external connections. | 07-25-2013 |
20130187269 | PACKAGE ASSEMBLY AND METHOD OF FORMING THE SAME - A package assembly including a semiconductor die electrically coupled to a substrate by an interconnected joint structure. The semiconductor die includes a bump overlying a semiconductor substrate, and a molding compound layer overlying the semiconductor substrate and being in physical contact with a first portion of the bump. The substrate includes a no-flow underfill layer on a conductive region. A second portion of the bump is in physical contact with the no-flow underfill layer to form the interconnected joint structure. | 07-25-2013 |
20130187270 | Multi-Chip Fan Out Package and Methods of Forming the Same - A package includes a die having a conductive pad at a top surface of the die, a stud bump over and connected to the conductive pad, and a redistribution line over and connected to the stud bump. An electrical connector is over and electrically coupled to the redistribution line. | 07-25-2013 |
20130187271 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device includes a first bump that is located over a surface of a semiconductor element, and is formed on a first bump formation face distanced from a back surface of the semiconductor element at a first distance, and a second bump that is located over the surface of the semiconductor element, and is formed on a second bump formation face distanced from the back surface of the semiconductor element at a second distance being longer than the first distance, the second bump having a diameter larger than a diameter of the first bump. | 07-25-2013 |
20130193569 | Integrated Circuit Die And Method Of Fabricating - Integrated circuit dies and methods of fabricating the dies are disclosed. An embodiment of a method includes providing a die having a redistribution layer fabricated thereon. The redistribution layer has a surface located thereon that is free of any seed layers. An under bump metal layer is fabricated directly to the surface. | 08-01-2013 |
20130193570 | BUMPING PROCESS AND STRUCTURE THEREOF - A bumping process includes providing a silicon substrate; forming a titanium-containing metal layer on silicon substrate, the titanium-containing metal layer comprises a plurality of first areas and a plurality of second areas; forming a first photoresist layer on titanium-containing metal layer; patterning the first photoresist layer to form a plurality of first opening slots; forming a plurality of copper bumps within first opening slots, said copper bump comprises a first top surface and a first ring surface; removing the first photoresist layer; forming a second photoresist layer on titanium-containing metal layer; patterning the second photoresist layer to form a plurality of second opening slots; forming a plurality of bump isolation layers at spaces, the first top surfaces and the first ring surfaces; forming a plurality of connective layers on bump isolation layers; removing the second photoresist layer, removing the second areas to form an under bump metallurgy layer. | 08-01-2013 |
20130193571 | SEMICONDUCTOR PACKAGE AND METHOD AND SYSTEM FOR FABRICATING THE SAME - A fabrication method of a semiconductor package includes: disposing a first wafer on a substrate having at least a conductive pad; stacking a second wafer on the first wafer, wherein the second wafer has a pre-open area corresponding in position to the conductive pad of the substrate; forming a protection layer on the second wafer; embrittling the protection layer on the pre-open area of the second wafer; and removing the embrittled portion of the protection layer and portions of the second and first wafers so as to form an opening to expose the conductive pad, thereby preventing an adhesive layer from being attached to a cutting tool as in the prior art. | 08-01-2013 |
20130200511 | REDUCING STRESS IN MULTI-DIE INTEGRATED CIRCUIT STRUCTURES - An integrated circuit structure can include a first interposer and a second interposer. The first interposer and the second interposer can be coplanar. The integrated circuit structure further can include at least a first die that is coupled to the first interposer and the second interposer. | 08-08-2013 |
20130200512 | PACKAGE WITH INTERPOSER FRAME AND METHOD OF MAKING THE SAME - Embodiments of mechanisms of utilizing an interposer frame to form a package using package on package (PoP) technology are provided in this disclosure. The interposer frame is formed by using a substrate with one or more additives to adjust the properties of the substrate. The interposer frame has through substrate holes (TSHs) lined with conductive layer to form through substrate vias (TSVs) with solder balls on adjacent packages. The interposer frame enables the reduction of pitch of TSVs, mismatch of coefficients of thermal expansion (CTEs), shorting, and delamination of solder joints, and improves mechanical strength of the PoP package. | 08-08-2013 |
20130200513 | NO-FLOW UNDERFILL FOR PACKAGE WITH INTERPOSER FRAME - Mechanisms of forming a package on package (PoP) package by using an interposer and an no-reflow underfill (NUF) layer are provided. The interposer frame improves the form factor of the package, enables the reduction in the pitch of the bonding structures. The NUF layer enables a semiconductor die and an interposer frame be bonded to a substrate by utilizing the heat on the connectors of the semiconductor die and on the connectors of the interposer frame for bonding. The heat provided by the semiconductor die and the interposer frame also transforms the NUF layer into an underfill. PoP structures formed by using the interposer frame and the NUF layer improve yield and have better reliability performance. | 08-08-2013 |
20130200514 | SEMICONDUCTOR PACKAGES AND METHODS OF MANUFACTURING THE SAME - A semiconductor package comprises a board including a board pad, a plurality of semiconductor chips mounted on the board, the semiconductor chips including chip pads. Bumps are disposed on the chip pads, respectively, and a wire is disposed between the chip pads and the bumps. The wire electrically connects the chip pads of the plurality of semiconductor chips and the board pad to each other. | 08-08-2013 |
20130200515 | SEMICONDUCTOR PACKAGE AND METHOD OF FORMING THE SAME - A semiconductor package includes a first package substrate, a first semiconductor chip disposed on the first package substrate, the semiconductor chip including first through hole vias, and a chip package disposed on the first semiconductor chip, the chip package including a second package substrate and a second semiconductor chip disposed on the second package substrate, wherein a first conductive terminal is disposed on a first surface of the semiconductor chip and a second conductive terminal is disposed on a first surface of the second package substrate, the first conductive terminal disposed on the second conductive terminal. | 08-08-2013 |
20130200516 | HYBRID SUBSTRATE, PRODUCTION METHOD THEREFOR, AND SEMICONDUCTOR INTEGRATED CIRCUIT PACKAGE - A hybrid substrate according to the present invention comprises a core layer composed of a glass woven cloth as a reinforcing material, and a glass-ceramic sintered body which at least comprises a glass component and a metal oxide component. The glass woven cloth and the glass-ceramic sintered body formed by an impregnation with respect to the glass woven cloth are in a form of sintering integration with each other. | 08-08-2013 |
20130207258 | POST-PASSIVATION INTERCONNECT STRUCTURE AMD METHOD OF FORMING SAME - A semiconductor device including a dielectric layer formed on the surface of a post-passivation interconnect (PPI) structures. A polymer layer is formed on the dielectric layer and patterned with an opening to expose a portion of the dielectric layer. The exposed portion of the dielectric layer is then removed to expose a portion of the PPI structure. A solder bump is then formed over and electrically connected to the first portion of the PPI structure. | 08-15-2013 |
20130207259 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND WAFER - The present invention prevents bumps on semiconductor chips from sticking to probe needles and coming off from the semiconductor chips. A wafer has effective areas where a plurality of bumps (first bumps) are formed. The bumps are formed on the side of an active surface of the semiconductor chips. The wafer further has non-effective areas where a plurality of dummy bumps are formed. Among the dummy bumps, some positioned at the outermost circumference are dummy bumps (second bumps) that are smaller than the other bumps. The dummy bumps (second bumps) intersect the inner peripheral edge of a shielding member as viewed in a plan view. The dummy bumps (second bumps) are formed over third pad electrodes. A bump-formation insulating film is removed from over the entire third pad electrodes. | 08-15-2013 |
20130214407 | SEMICONDUCTOR PACKAGING METHOD AND STRUCTURE THEREOF - A semiconductor packaging method includes providing a substrate having a plurality of pads, each of the pads comprises a first coupling surface having a plurality of first conductive contact areas and a plurality of first non-conductive contact areas; forming a conductible gel with anti-dissociation function on the substrate, said conductible gel includes a plurality of conductive particles and a plurality of anti-dissociation substances; mounting a chip on the substrate, said chip comprises a plurality of copper-containing bumps, each of the copper-containing bumps comprises a ring surface and a second coupling surface having a plurality of second conductive contact areas and a plurality of second non-conductive contact areas, wherein the conductive particles are electrically connected with the first conductive contact areas and the second conductive contact areas, said anti-dissociation substances are in contact with the second non-conductive contact area, and the ring surfaces are covered with the anti-dissociation substances. | 08-22-2013 |
20130214408 | Interposer Having Conductive Posts - There are disclosed herein various implementations of an interposer for use in semiconductor packaging. One exemplary implementation comprises a conductive post formed from a wire bond. A first end of the conductive post is mechanically joined to a conductive pad on a first surface of the interposer, while a second end of the conductive post is capable of making electrical connection to a contact body on an active surface of a semiconductor die. Such an interposer may include a rigid or flexible interposer dielectric. In one exemplary implementation, the interposer dielectric has a via formed therein, the conductive post being situated in the via and extending through a second surface of the interposer opposite the first surface. | 08-22-2013 |
20130214409 | Semiconductor Device and Method of Forming Bond-on-Lead Interconnection for Mounting Semiconductor Die in FO-WLCSP - A semiconductor die has a conductive layer including a plurality of trace lines formed over a carrier. The conductive layer includes a plurality of contact pads electrically continuous with the trace lines. A semiconductor die has a plurality of contact pads and bumps formed over the contact pads. A plurality of conductive pillars can be formed over the contact pads of the semiconductor die. The bumps are formed over the conductive pillars. The semiconductor die is mounted to the conductive layer with the bumps directly bonded to an end portion of the trace lines to provide a fine pitch interconnect. An encapsulant is deposited over the semiconductor die and conductive layer. The conductive layer contains wettable material to reduce die shifting during encapsulation. The carrier is removed. An interconnect structure is formed over the encapsulant and semiconductor die. An insulating layer can be formed over the conductive layer. | 08-22-2013 |
20130221517 | SEMICONDUCTOR WORKPIECE WITH BACKSIDE METALLIZATION AND METHODS OF DICING THE SAME - Various semiconductor workpieces and methods of dicing the same are disclosed. In one aspect, a method of manufacturing is provided that includes forming a channel in a metallization structure on a backside of a semiconductor workpiece. The semiconductor workpiece includes a substrate. The channel is in substantial alignment with a dicing street on a front side of the semiconductor chip. | 08-29-2013 |
20130221518 | PRINTED WIRING BOARD - A printed wiring board includes a core substrate, a first buildup layer laminated on a first surface of the core substrate and including the outermost interlayer resin insulation layer and the outermost conductive layer formed on the outermost interlayer resin insulation layer of the first buildup layer, and a second buildup layer laminated on a second surface of the core substrate and including the outermost interlayer resin insulation layer and the outermost conductive layer formed on the outermost interlayer resin insulation layer of the second buildup layer. The outermost conductive layer of the first buildup layer includes pads positioned to mount a semiconductor device on a surface of the first buildup layer, and the outermost interlayer resin insulation layer of the first buildup layer has a thermal expansion coefficient which is set lower than a thermal expansion coefficient of the outermost interlayer resin insulation layer of the second buildup layer. | 08-29-2013 |
20130221519 | SEMICONDUCTOR DEVICES INCLUDING DUMMY SOLDER BUMPS - A semiconductor device includes a substrate on which integrated circuit units are formed, main solder bumps that are electrically connected to the integrated circuit units on the substrate and dummy solder bumps that are not electrically connected to the integrated circuit units on the substrate. The dummy solder bumps are narrower than wiring patterns immediately below the dummy solder bumps. | 08-29-2013 |
20130221520 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A semiconductor chip SC includes an electrode pad PAD. A Cu pillar PIL is formed on the electrode pad PAD. In addition, an interconnect substrate INT includes a connection terminal TER. The connection terminal TER contains Cu. For example, the connection terminal TER is formed of Cu, and is formed, for example, in a land shape. However, the connection terminal TER may not be formed in a land shape. The Cu pillar PIL and the connection terminal TER are connected to each other through a solder layer SOL. The solder layer SOL contains Sn. A Ni layer NIL is formed on either the Cu pillar PIL or the connection terminal TER. The minimum value L of the thickness of the solder layer SOL is equal to or less than 20 μm. | 08-29-2013 |
20130221521 | SOLDER BUMP STRETCHING METHOD FOR FORMING A SOLDER BUMP JOINT IN A DEVICE - A method includes heating a solder bump above a melting temperature of the solder bump. The solder bump is stretched to increase a height of the solder bump. The solder bump is cooled down to form a solder bump joint in an electrical device. | 08-29-2013 |
20130228916 | TWO-SOLDER METHOD FOR SELF-ALIGNING SOLDER BUMPS IN SEMICONDUCTOR ASSEMBLY - A semiconductor device ( | 09-05-2013 |
20130228917 | Semiconductor Device and Method for Forming a Low Profile Embedded Wafer Level Ball Grid Array Molded Laser Package (EWLP-MLP) - A semiconductor device has a semiconductor die with an encapsulant deposited over and around the semiconductor die. An interconnect structure is formed over a first surface of the encapsulant. An opening is formed from a second surface of the encapsulant to the first surface of the encapsulant to expose a surface of the interconnect structure. A bump is formed recessed within the opening and disposed over the surface of the interconnect structure. A semiconductor package is provided. The semiconductor package is disposed over the second surface of the encapsulant and electrically connected to the bump. A plurality of interconnect structures is formed over the semiconductor package to electrically connect the semiconductor package to the bump. The semiconductor package includes a memory device. The semiconductor device includes a height less than 1 millimeter. The opening includes a tapered sidewall formed by laser direct ablation. | 09-05-2013 |
20130228918 | THREE-DIMENSIONAL INTEGRATED CIRCUIT WHICH INCORPORATES A GLASS INTERPOSER AND METHOD FOR FABRICATING THE SAME - A three-dimensional integrated circuit (3D-IC) which incorporates a glass interposer and a method for fabricating the three-dimensional integrated circuit (3D-IC) with the glass interposer are described herein. In one embodiment, the 3D-IC incorporates a glass interposer which has vias formed therein which are not filled with a conductor that allow for precision metal-to-metal interconnects (for example) between redistribution layers. In another embodiment, the 3D-IC incorporates a glass interposer which has vias and has a coefficient of thermal expansion (CTE) that is different than the CTE of silicon which is 3.2 ppm/° C. | 09-05-2013 |
20130228919 | Semiconductor Device and Method of Forming Protective Coating Over Interconnect Structure to Inhibit Surface Oxidation - A semiconductor device has a semiconductor die with a first conductive layer formed over the semiconductor die. A first insulating layer is formed over the semiconductor die with a first opening in the first insulating layer disposed over the first conductive layer. A second conductive layer is formed over the first insulating layer and into the first opening over the first conductive layer. An interconnect structure is formed over the first and second conductive layers within openings of a second insulating layer. The second insulating layer is removed. The interconnect structure can be a conductive pillar or conductive pad. A bump material can be formed over the conductive pillar. A protective coating is formed over the conductive pillar or pad to a thickness less than one micrometer to reduce oxidation. The protective coating is formed by immersing the conductive pillar or pad into the bath containing tin or indium. | 09-05-2013 |
20130228920 | PROTECTION LAYER FOR ADHESIVE MATERIAL AT WAFER EDGE - A three-dimensional integrated circuit (3DIC) including a first substrate having a first surface and a second surface opposite to the first surface and a second substrate attached to the first surface of the first substrate. The 3DIC further includes an interconnect between attached to the first surface of the first substrate and the second substrate and a plurality of through vias formed in the first substrate and electrically coupled to the interconnect. The 3DIC further includes a protection layer over the second surface of the first substrate, wherein each of the plurality of through vias protrudes through the protection layer and a plurality of dies, each die of the plurality of dies attached to at least one through via of the plurality of through vias. | 09-05-2013 |
20130234315 | STRUCTURES AND METHODS FOR DETECTING SOLDER WETTING OF PEDESTAL SIDEWALLS - Structures and methods for detecting solder wetting of pedestal sidewalls. The structure includes a semiconductor wafer having an array of integrated circuit chips, each of the integrated circuit chips having an array of chip pedestals having respective chip solder columns on top of the chip pedestals, the pedestals spaced apart a first distance in a first direction and a spaced apart second distance in second direction perpendicular to the first direction; and at least one monitor structure disposed in different regions of the wafer from the integrated circuit chips, the monitor structure comprising at least a first pedestal and a first solder column on a top surface of the first pedestal and a second pedestal and a second solder column on a top surface of the second pedestal, the first and the second pedestals spaced apart a third distance, the third distance less than the first and the second distances. | 09-12-2013 |
20130234316 | SELF-ALIGNED POLYMER PASSIVATION/ALUMINUM PAD - The invention provides a semiconductor chip structure having at least one aluminum pad structure and a polyimide buffering layer under the aluminum pad structure, wherein the polyimide buffering layer is self-aligned to the aluminum pad structure, and a method of forming the same. The method includes forming a polyimide buffering layer on a substrate, forming an aluminum pad structure on the buffering layer, and, using the aluminum pad structure as a mask, etching the substrate to remove the polyimide buffering layer from the substrate everywhere except under the aluminum pad structure. | 09-12-2013 |
20130234317 | Packaging Methods and Packaged Semiconductor Devices - Packaging methods and packaged semiconductor devices are disclosed. In one embodiment, a packaging method includes providing a first die, partially packaging the first die, and forming a plurality of solder balls on a surface of the partially packaged first die. An epoxy flux is disposed over the plurality of solder balls. A second die is provided, and the second die is partially packaged. The plurality of solder balls is coupled to the partially packaged second die. | 09-12-2013 |
20130234318 | Semiconductor Device and Method of Forming Non-Linear Interconnect Layer with Extended Length for Joint Reliability - A semiconductor device has a substrate and first conductive layer formed over the substrate. An insulating layer is formed over the first substrate with an opening over the first conductive layer. A second conductive layer is formed within the opening of the insulating layer. A portion of the second conductive layer is removed to expose a horizontal surface and side surfaces of the second conductive layer below a surface of the insulating layer. The second conductive layer has non-linear surfaces to extend a contact area of the second conductive layer. The horizontal surface and side surfaces can be stepped surfaces or formed as a ring. A third conductive layer is formed over the second conductive layer. A plurality of bumps is formed over the horizontal surface and side surfaces of the second conductive layer. A semiconductor die is mounted to the substrate. | 09-12-2013 |
20130234319 | SEMICONDUCTOR CONSTRUCTIONS - Some embodiments include a planarization method. A liner is formed across a semiconductor substrate and along posts that extending upwardly from the substrate. Organic fill material is formed over the liner and between the posts. A planarized surface is formed which extends across the posts and across one or both of the liner and the fill material. Some embodiments include a semiconductor construction containing a semiconductor die. Electrically conductive posts extend through the die. The posts have upper surfaces above a backside surface of the die, and have sidewall surfaces extending between the backside surface and the upper surfaces. A liner is across the backside surface of the die and along the sidewall surfaces of the posts. Electrically conductive caps are over the upper surfaces of the posts, and have rims along the liner adjacent the sidewall surfaces of the posts. | 09-12-2013 |
20130234320 | CHIP STACK STRUCTURE AND METHOD FOR FABRICATING THE SAME - A chip stack structure taking a wafer as a stacking base and stacking chips thereon is provided. The chip stack structure is capable of achieving high density electrode bonding and breaking the bottleneck of requiring interposer to serve as a transferring interface in three dimensional chip package. The chip stack structure is easily fabricated and compatible with wafer level process, so as to reduce processing time and manufacturing cost. A method for fabricating the chip stack structure is also provided. | 09-12-2013 |
20130234321 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - The semiconductor device includes a plurality of pillar patterns formed over a semiconductor substrate. Each pillar pattern includes a silicon layer; a bit line junction region formed at the bottom of one side of the pillar pattern, and configured to be in contact the silicon layer; a bit line provided between the pillar patterns, coupled to the bit line junction region, and extending along a first direction; and a gate spaced apart from an upper part of the bit line, extending along a second direction perpendicular to the bit line, and formed at a sidewall of the pillar pattern. | 09-12-2013 |
20130234322 | Thin 3D Fan-Out Embedded Wafer Level Package (EWLB) for Application Processor and Memory Integration - A semiconductor device has a plurality of first semiconductor die with an encapsulant deposited over a first surface of the first semiconductor die and around the first semiconductor die. An insulating layer is formed over the encapsulant and over a second surface of the first semiconductor die opposite the first surface. The insulating layer includes openings over the first semiconductor die. A first conductive layer is formed over the first semiconductor die within the openings. A second conductive layer is formed over the first conductive layer to form vertical conductive vias. A second semiconductor die is disposed over the first semiconductor die and electrically connected to the first conductive layer. A bump is formed over the second conductive layer outside a footprint of the first semiconductor die. The second semiconductor die is disposed over an active surface or a back surface of the first semiconductor die. | 09-12-2013 |
20130234323 | SEMICONDUCTOR CHIP AND MANUFACTURING METHOD THEREOF - A semiconductor device comprising stacked substrates through a bump, the bump comprising a solder bump formed on a copper bump wherein the solder bump includes Zn. | 09-12-2013 |
20130234324 | Semiconductor Device and Method of Forming Vertically Offset Conductive Pillars Over First Substrate Aligned to Vertically Offset BOT Interconnect Sites Formed Over Second Substrate - A semiconductor device has a first substrate and first conductive pillars formed over the first substrate. Second conductive pillars are formed over the first substrate alternating with the first conductive pillars. The second conductive pillars are vertically offset with respect to the first conductive pillars. First BOT interconnect sites are formed over a second substrate. Second BOT interconnect sites are formed over the second substrate alternating with the first interconnect sites. The second interconnect sites are vertically offset with respect to the first interconnect sites. The first substrate is mounted to the second substrate such that the first conductive pillars are aligned with and electrically connected to the first interconnect sites and the second conductive pillars are aligned with and electrically connected to the second interconnect sites. An underfill material is deposited between the first and second substrates. The first substrate can be a flipchip type semiconductor device. | 09-12-2013 |
20130234325 | FILLED THROUGH-SILICON VIA AND THE FABRICATION METHOD THEREOF - By adding particles of high thermal conductivity and low thermal expansion coefficient into the copper as a composite material and filling with the composite material into the through-via hole, the mismatch of the coefficient of thermal expansion and the stress of the through-silicon via are lowered and the thermal conductivity of the through-silicon via is increased. | 09-12-2013 |
20130241049 | Methods and Apparatus of Guard Rings for Wafer-Level-Packaging - Methods and apparatuses are disclosed for forming a post-passivation interconnect (PPI) guard ring over a circuit in a wafer forming a wafer level package (WLP). A circuit device comprises a guard ring and an active area. A passivation layer is formed on top of the circuit device over the guard ring and the active area, wherein the passivation layer contains a passivation contact connected to the guard ring. A first polymer layer is formed over the passivation layer. A PPI opening is formed within the first polymer layer or within the passivation layer over the passivation contact. A PPI guard ring is formed filling the PPI opening in touch with the passivation contact and extending on top of the first polymer layer or the passivation layer. | 09-19-2013 |
20130241050 | INTEGRATED OPTOELECTRONIC INTERCONNECTS WITH SIDE-MOUNTED TRANSDUCERS - A method for fabricating an optical interconnect includes producing a semiconductor wafer that includes multiple first dies. Each first die includes circuitry disposed over a surface of the wafer and connected to conductive vias arranged in rows. The multiple first dies are diced by cutting the wafer across the rows of the vias, such that, in each first die, the cut vias form respective contact pads on a side face of the first die that is perpendicular to the surface. A second semiconductor die including one or more optoelectronic transducers is attached to the contact pads, so as to connect the transducers to the circuitry. | 09-19-2013 |
20130241051 | CONTROLLED AREA SOLDER BONDING FOR DIES - A method of fabricating a semiconductor comprises forming a plurality of stud bumps in a pattern having a geometrical shape on a surface of a substrate, the pattern defining a periphery of a bonding area on the surface of the substrate, and placing a solder material in the bonding area such that the solder material is surrounded by the stud bumps. The solder material is heated to a temperature where the solder material begins to flow within the bonding area. A bonding surface of a die is pressed onto the stud bumps with a sufficient pressure to crush the stud bumps a predetermined extent such that the solder material substantially evenly spreads between the stud bumps within the bonding area. The solder material is then solidified to form a final solder area that conforms to the geometrical shape of the pattern of stud bumps. | 09-19-2013 |
20130241052 | Methods and Apparatus for Solder on Slot Connections in Package on Package Structures - Solder on slot connections in package on package structures. An apparatus includes a substrate having a front side surface and a back side surface; a first passivation layer disposed over at least one of the front side and back side surfaces; at least one via opening formed in the first passivation layer; a conductor layer disposed over the first passivation layer, coupled to the at least one via and forming a conductive trace on the surface of the first passivation layer; a second passivation layer formed over the conductor layer; and at least one slot opening formed in the second passivation layer and exposing a portion of the conductive trace for receiving a solder connector. In additional embodiments the substrate may be a semiconductor wafer. Methods for forming the structures are disclosed. | 09-19-2013 |
20130241053 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH CONDUCTIVE PILLARS AND MOLDED CAVITIES AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit packaging system includes: providing a substrate; forming a conductive post on the substrate, the conductive post includes a vertical side; attaching an integrated circuit to the substrate; and forming an encapsulant including a molded cavity, the vertical side circumscribed by and exposed within the molded cavity from the encapsulant. | 09-19-2013 |
20130241054 | SEMICONDUCTOR APPARATUS AND METHOD OF FABRICATING THE SAME - In a semiconductor apparatus, a plurality of semiconductor chips including through-silicon vias are stacked in a vertical direction, wherein the through-silicon via formed in each semiconductor chip protrudes beyond heights of each semiconductor chip. | 09-19-2013 |
20130241055 | Multi-Chip Packages and Methods of Manufacturing the Same - Multi-chip packages are provided having a first semiconductor chip arranged on a package substrate. The first semiconductor chip includes a first bonding pad connected to the package substrate. A second semiconductor chip is arranged on the first semiconductor chip. The second semiconductor chip has an overhang that protrudes from a side surface of the first semiconductor chip, and a second bonding pad arranged on the overhang. A third semiconductor chip is arranged on the second semiconductor chip to expose the overhang. The third semiconductor chip has a third bonding pad. A first conductive wire may be connected between the second bonding pad and the third bonding pad. A second conductive wire may be connected between the third bonding pad and the package substrate. | 09-19-2013 |
20130249076 | Semiconductor Device and Method of Forming Duplex Plated Bump-On-Lead Pad Over Substrate for Finer Pitch Between Adjacent Traces - A semiconductor device has a substrate. A first conductive layer is formed over the substrate. A duplex plated bump on lead pad is formed over the substrate. An insulating layer is formed over the first conductive layer and the substrate. A portion of the insulating over the duplex plated bump on lead pad is removed using a laser direct ablation process. The insulating layer is a lamination layer. The duplex plated bump on lead pad has a wide bump on lead pad. A semiconductor die is mounted over the substrate. The semiconductor die has a composite conductive interconnect structure. The semiconductor die has a first bump and a second bump with a pitch ranging from 90-150 micrometers between the first bump and the second bump. A duplex plated contact pad is formed on a surface of the substrate opposite the duplex plated bump-on-lead pad. | 09-26-2013 |
20130249077 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH TERMINALS AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit packaging system includes: providing a leadframe having a mounting platform; applying an attach layer on the mounting platform; mounting an integrated circuit die on the attach layer; forming an encapsulation on the integrated circuit die and the attach layer, the mounting platform exposed from the encapsulation; and forming a terminal having a terminal protrusion from the leadframe, the terminal protrusion below a horizontal plane of the mounting platform. | 09-26-2013 |
20130249078 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH SUPPORT STRUCTURE AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit packaging system includes: forming a one-layer substrate with a symmetrical structure, the one-layer substrate having a redistribution pad and an insulation, the redistribution pad only at an insulation top side of the insulation; mounting an integrated circuit over the one-layer substrate; and forming an encapsulation over the integrated circuit. | 09-26-2013 |
20130249079 | Semiconductor Device and Method of Singulating Semiconductor Wafer along Modified Region within Non-Active Region Formed by Irradiating Energy through Mounting Tape - A semiconductor device has a semiconductor wafer with a plurality of semiconductor die separated by a non-active region. The semiconductor die can be circular or polygonal with three or more sides. A plurality of bumps is formed over the semiconductor die. A portion of semiconductor wafer is removed to thin the semiconductor wafer. A wafer ring is mounted to mounting tape. The semiconductor wafer is mounted to the mounting tape within the wafer ring. The mounting tape includes translucent or transparent material. A penetrable layer is applied over the bumps formed over the semiconductor wafer. An irradiated energy from a laser is applied through the mounting tape to the non-active region to form a modified region within the non-active region. The semiconductor wafer is singulated along the modified region to separate the semiconductor die. | 09-26-2013 |
20130249080 | Semiconductor Device and Method for Forming Openings and Trenches in Insulating Layer by First LDA and Second LDA for RDL Formation - A semiconductor device has a semiconductor die with an encapsulant deposited over the semiconductor die. A first insulating layer having high tensile strength and elongation is formed over the semiconductor die and encapsulant. A first portion of the first insulating layer is removed by a first laser direct ablation to form a plurality of openings in the first insulating layer. The openings extend partially through the first insulating layer or into the encapsulant. A second portion of the first insulating layer is removed by a second laser direct ablation to form a plurality of trenches in the first insulating layer. A conductive layer is formed in the openings and trenches of the first insulating layer. A second insulating layer is formed over the conductive layer. A portion of the second insulating layer is removed by a third laser direct ablation. Bumps are formed over the conductive layer. | 09-26-2013 |
20130249081 | METHOD FOR MANUFACTURING FINE-PITCH BUMPS AND STRUCTURE THEREOF - A method for manufacturing fine-pitch bumps comprises providing a silicon substrate; forming a titanium-containing metal layer having a plurality of first zones and a plurality of second zones on the silicon substrate; forming a photoresist layer on the titanium-containing metal layer; patterning the photoresist layer; forming a plurality of copper bumps having a plurality of first top surfaces and a plurality of first ring surfaces; heating the photoresist layer to form a plurality of body portions and removable portions; etching the photoresist layer; forming a plurality of bump protection layers on the titanium-containing metal layer, the first top surface and the first ring surface, each of the bump protection layers comprises a bump coverage portion; plating a plurality of gold layers at the bump coverage portion; eventually, removing the second zones to enable each of the first zones to form an under bump metallurgy layer. | 09-26-2013 |
20130249082 | CONDUCTIVE BUMP STRUCTURE ON SUBSTRATE AND FABRICATION METHOD THEREOF - A conductive bump structure is formed on a substrate having a plurality of bonding pads and a first insulating layer thereon. The first insulating layer has a plurality of openings formed therein for exposing the bonding pads and a conductive post is formed on the bonding pads exposed through the openings. Therein, a gap is formed between the conductive post and the wall of the opening such that no contact occurs between the conductive post and the first insulating layer, thereby preventing delamination of the conductive bump structure caused by stresses concentrating on an interface of different materials as in the prior art. | 09-26-2013 |
20130249083 | PACKAGING SUBSTRATE - A packaging substrate is provided, wherein a plurality of conductive posts together with a conductive bonding layer formed thereon form a plurality of external connection structures with the same height, thereby preventing tilted stack structures and poor coplanarity in a subsequent stacking process. | 09-26-2013 |
20130249084 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device includes an interlayer insulating film containing Si, O, C, and H, an under-bump metal film disposed over the interlayer insulating film and containing Ni, and a bump electrode disposed over the under-bump metal film. In the interlayer insulating film, a ratio of a peak height of Si—CH | 09-26-2013 |
20130249085 | SEMICONDUCTOR DEVICE HAVING PENETRATING ELECTRODES EACH PENETRATING THROUGH SEMICONDUCTOR CHIP - Disclosed herein is a device that includes: a semiconductor substrate; plurality of first through-substrate vias each penetrating through the semiconductor substrate, a plurality of second through-substrate vias each penetrating through the semiconductor substrate, an insulating film formed over the semiconductor substrate, the insulating film including a first opening and a plurality of second openings, the first opening being located over the first through-substrate vias, and each of the second openings being located over a corresponding one of the second through-substrate vias. | 09-26-2013 |
20130249086 | CHIP STRUCTURE, CHIP BONDING STRUCTURE USING THE SAME, AND MANUFACTURING METHOD THEREOF - A chip structure, a chip bonding structure, and manufacturing methods thereof are provided. The chip structure includes a chip, a plurality of bumps, and an insulation layer. The bumps are disposed on the chip. Each bump has a first bump portion and a second bump portion connected to each other, wherein the first bump portion and the second bump portion have different activities. The bumps are subjected to chemical reaction to form an insulation layer on the surface of one of the first bump portion and the second bump portion which has higher activity, so as to avoid short-circuit between the adjacent bumps. | 09-26-2013 |
20130249087 | ELECTRONIC COMPONENT AND MANUFACTURE METHOD THEREOF - An electronic component includes a package substrate, a plurality of conductive pads, an insulating material and a semiconductor device. The plurality of conductive pads is disposed on the package substrate. The insulating material is disposed between the plurality of conductive pads. The insulating material includes a top surface located on an identical plane to an upper surface of the plurality of conductive pads. The semiconductor device includes a conductive bump aligned on a corresponding conductive pad of the plurality of conductive pads. | 09-26-2013 |
20130249088 | ADAPTIVE PATTERNING FOR PANELIZED PACKAGING - An adaptive patterning method and system for fabricating panel based package structures is described. Misalignment for individual device units in a panel or reticulated wafer may be adjusted for by measuring the position of each individual device unit and forming a unit-specific pattern over each of the respective device units. | 09-26-2013 |
20130249089 | METHOD FOR MANUFACTURING FINE-PITCH BUMPS AND STRUCTURE THEREOF - A method for manufacturing fine-pitch bumps comprises the steps of providing a silicon substrate; forming a titanium-containing metal layer on the silicon substrate, wherein the titanium-containing metal layer comprises a plurality of first zones and a plurality of second zones; forming a photoresist layer on the titanium-containing metal layer; patterning the photoresist layer to form a plurality of opening slots; forming a plurality of copper bumps at the opening slots, wherein each of the copper bumps comprises a first top surface and a ring surface; heating the photoresist layer to form a plurality of body portions and a plurality of removable portions; etching the photoresist layer; and removing the second zones to enable each of the first zones to form an under bump metallurgy layer having a bearing portion and an extending portion. | 09-26-2013 |
20130249090 | Semiconductor Device and Method of Forming Partially-Etched Conductive Layer Recessed Within Substrate for Bonding to Semiconductor Die - A semiconductor device has a substrate with a die attach area. A conductive layer is formed over a surface of the substrate and extending below the surface. An insulating layer is formed over the surface of the substrate outside the die attach area. A portion of the conductive layer is removed within the die attach area to expose sidewalls of the substrate. The remaining portion of the conductive layer is recessed below the surface of the substrate within the die attach area. A semiconductor die has bumps formed over its active surface. The semiconductor die is mounted to the substrate by bonding the bumps to the remaining portion of the first conductive layer recessed below the first surface of the substrate. The sidewalls of the substrate retain the bumps during bonding to the remaining portion of the conductive layer. An encapsulant is deposited between the semiconductor die and substrate. | 09-26-2013 |
20130249091 | Multi-Direction Design for Bump Pad Structures - An integrated circuit structure includes a semiconductor chip having a first region and a second region; a dielectric layer formed on the first region and the second region of the semiconductor chip; a first elongated under-bump metallization (UBM) connector formed in the dielectric layer and on the first region of the semiconductor chip and having a first longer axis extending in a first direction; and a second elongated UBM connector formed in the dielectric layer on the second region of the semiconductor chip and having a second longer axis extending in a second direction. The first direction is different from the second direction. | 09-26-2013 |
20130256870 | PACKAGING DEVICE AND METHOD OF MAKING THE SAME - A device includes a first and a second package component. A metal trace is disposed on a surface of the first package component. The metal trace has a lengthwise direction. The second package component includes a metal pillar, wherein the second package component is disposed over the first package component. A solder region bonds the metal pillar to the metal trace, wherein the solder region contacts a top surface of the metal trace. | 10-03-2013 |
20130256871 | SEMICONDUCTOR CHIP DEVICE WITH FRAGMENTED SOLDER STRUCTURE PADS - Methods and apparatus to inhibit cracks and delaminations in a semiconductor chip solder bump and to reduce pad parasitic capacitance are disclosed. In one aspect, a method of manufacturing is provided that includes forming a first insulating layer over plural conductor pads of a semiconductor chip and forming an opening over each of the conductor pads. An individual solder structure is coupled to the insulating layer. The solder structure has a projection in each of the openings and in electrical contact with one of the plural conductor pads. | 10-03-2013 |
20130256872 | THERMAL MANAGEMENT OF STACKED SEMICONDUCTOR CHIPS WITH ELECTRICALLY NON-FUNCTIONAL INTERCONNECTS - A method of manufacturing is provided that includes fabricating a first plurality of electrically functional interconnects on a front side of a first semiconductor chip and fabricating a first plurality of electrically non-functional interconnects on a back side of the first semiconductor chip. Additional chips may be stacked on the first semiconductor chip. | 10-03-2013 |
20130256873 | SYSTEM, METHOD, AND COMPUTER PROGRAM PRODUCT FOR PREPARING A SUBSTRATE POST - A system, method, and computer program product are provided for preparing a substrate post. In use, a first solder mask is applied to a substrate. Additionally, a post is affixed to each of one or more pads of the substrate. Further, a second solder mask is applied to the substrate. | 10-03-2013 |
20130256874 | Elongated Bumps in Integrated Circuit Devices - A device includes a substrate, a metal pad over the substrate, and a passivation layer covering edge portions of the metal pad. The passivation layer has a first opening overlapping the metal pad, wherein the first opening has a first lateral dimension measured in a direction parallel to a major surface of the substrate. A polymer layer is over the passivation layer and covering the edge portions of the metal pad. The polymer layer has a second opening overlapping the metal pad. The second opening has a second lateral dimension measured in the direction. The first lateral dimension is greater than the second lateral dimension by more than about 7 μm. A Under-Bump metallurgy (UBM) includes a first portion in the second opening, and a second portion overlying portions of the polymer layer. | 10-03-2013 |
20130256875 | SEMICONDUCTOR PACKAGE, PACKAGE STRUCTURE AND FABRICATION METHOD THEREOF - A semiconductor package includes: a dielectric layer having opposite first and second surfaces; a semiconductor chip embedded in the dielectric layer and having a plurality of electrode pads; a plurality of first metal posts disposed on the electrode pads of the semiconductor chip, respectively, such that top ends of the first metal posts are exposed from the first surface; at least a second metal post penetrating the dielectric layer such that two opposite ends of the second metal post are exposed from the first and second surfaces, respectively; a first circuit layer formed on the first surface for electrically connecting the first and second metal posts; and a second circuit layer formed on the second surface for electrically connecting the second metal post. The semiconductor package dispenses with conventional laser ablation and electroplating processes for forming conductive posts in a molding compound, thereby saving fabrication time and cost. | 10-03-2013 |
20130256876 | SEMICONDUCTOR PACKAGE - A semiconductor package includes a semiconductor chip having a plurality of contact pads on a surface thereof, a plurality of main bumps on the contact pads, respectively. Each of the plurality of main bumps includes a first pillar layer on one of the contact pads and a first solder layer on the first pillar layer, and the first solder layer includes an upper portion having an overhang portion. | 10-03-2013 |
20130256877 | SEMICONDUCTOR PACKAGE - Provided is a semiconductor package including a circuit substrate including a substrate pad, a semiconductor chip spaced apart from and facing the circuit substrate, the semiconductor chip including a chip pad, and a connection pattern electrically connecting the circuit substrate with the semiconductor chip. The semiconductor chip may include a plurality of first circuit patterns extending substantially perpendicular toward a top surface of the semiconductor chip and at least one first via electrically connecting the chip pad to the first circuit patterns. The chip pad may include a first region in contact with the connection pattern and a second region outside the first region, and the first via may be connected to the second region of the chip pad. | 10-03-2013 |
20130256878 | SEMICONDUCTOR PACKAGE - The invention provides a semiconductor package. The semiconductor package includes a semiconductor package includes a substrate having a die attach surface. A die is mounted on die attach surface of the substrate via a conductive pillar bump. The die comprises a metal pad electrically coupling to the conductive pillar bump, wherein the metal pad has a first edge and a second edge substantially vertical to the first edge, wherein the length of the first edge is different from that of the second edge from a plan view. | 10-03-2013 |
20130256879 | WIRING SUBSTRATE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A wiring substrate may include: a base having a predetermined thickness; a plurality of electrode portions formed to protrude on one surface in a thickness direction of the base; a wiring provided in the base and electrically connected to the electrode portions; and a resin layer formed on the base to fill between the plurality of electrode portions. An upper surface of the resin layer may be formed in a concave shape lower than a maximum height of the electrode portion, and an upper surface of the electrode portion and the upper surface of the resin layer form a continuous curved surface. | 10-03-2013 |
20130256880 | ELECTRODE BODY, WIRING SUBSTRATE, AND SEMICONDUCTOR DEVICE - An electrode body is provided as an electrode body capable of appropriately reducing a load when silicon wafer direct bonding is performed. The electrode body includes a base member that has a predetermined thickness; and an electrode portion that is formed on one surface of the base member in a thickness direction thereof. The electrode portion includes a basic bump formed in a substantially columnar shape to protrude on the base member and a fragile bump formed independently from the basic bump to form a metallic bond with the basic bump. | 10-03-2013 |
20130256881 | Semiconductor Device - Disclosed is a semiconductor device suppressed in decrease of reliability. The semiconductor device comprises an electrode pad portion ( | 10-03-2013 |
20130256882 | METHOD FOR MANUFACTURING FINE-PITCH BUMPS AND STRUCTURE THEREOF - A method for manufacturing fine-pitch bumps comprises providing a silicon substrate; forming a titanium-containing metal layer having a plurality of first zones and a plurality of second zones on the silicon substrate; forming a photoresist layer on the titanium-containing metal layer; patterning the photoresist layer; forming a plurality of copper bumps having a plurality of first top surfaces and a plurality of first ring surfaces; heating the photoresist layer to form a plurality of body portions and removable portions; etching the photoresist layer; forming a plurality of bump protection layers on the titanium-containing metal layer, the first top surface and the first ring surface, each of the bump protection layers comprises a bump coverage portion; plating a plurality of gold layers at the bump coverage portion; eventually, removing the second zones to enable each of the first zones to form an under bump metallurgy layer. | 10-03-2013 |
20130264703 | SEMICONDUCTOR PACKAGES AND METHODS FOR MANUFACTURING THE SAME - A semiconductor package includes a holder covering or encapsulating an edge part of a semiconductor chip. Thus, it may be possible to isolate the edge part on which contaminants may easily exist from a pixel part. As a result, the contaminants from the edge part do not contaminate the pixel part, so that distortion of an image may be prevented. | 10-10-2013 |
20130264704 | Semiconductor Device and Method of Confining Conductive Bump Material During Reflow with Solder Mask Patch - A semiconductor device has a semiconductor die with die bump pads and substrate with trace lines having integrated bump pads. A solder mask patch is formed interstitially between the die bump pads or integrated bump pads. The solder mask patch contains non-wettable material. Conductive bump material is deposited over the integrated bump pads or die bump pads. The semiconductor die is mounted over the substrate so that the conductive bump material is disposed between the die bump pads and integrated bump pads. The bump material is reflowed without a solder mask around the integrated bump pads to form an interconnect between the semiconductor die and substrate. The solder mask patch confines the conductive bump material within a footprint of the die bump pads or integrated bump pads during reflow. The interconnect can have a non-fusible base and fusible cap. | 10-10-2013 |
20130264705 | Semiconductor Device and Method of Forming Bump on Substrate to Prevent ELK ILD Delamination During Reflow Process - A semiconductor device that has a flipchip semiconductor die and substrate. A first insulating layer is formed over the substrate. A via is formed through the first insulating layer. Conductive material is deposited in the via to form a conductive pillar or stacked stud bumps. The conductive pillar is electrically connected to a conductive layer within the substrate. A second insulating layer is formed over the first insulating layer. Bump material is formed over the conductive pillar. The bump material is reflowed to form a bump. The first and second insulating layers are removed. The semiconductor die is mounted to the substrate by reflowing the bump to a conductive layer of the die. The semiconductor die also has a third insulating layer formed over the conductive layer and an active surface of the die and UBM formed over the first conductive layer and third insulating layer. | 10-10-2013 |
20130264706 | Semiconductor Package and Method of Manufacturing the Same - A method of forming a semiconductor package having a large capacity and a reduced or minimized volume includes: attaching a semiconductor substrate on a support substrate using an adhesive layer, wherein the semiconductor substrate includes a plurality of first semiconductor chips and a chip cutting region, wherein first and second ones of the plurality of first semiconductor chips are separated each other by the chip cutting region, and the semiconductor substrate includes a first surface on which an active area is formed and a second surface opposite to the first surface; forming a first cutting groove having a first kerf width, between the first and second ones of the plurality of first semiconductor chips, so that the semiconductor substrate is separated into a plurality of first semiconductor chips; attaching a plurality of second semiconductor chips corresponding to the first semiconductor chips, respectively, to the plurality of first semiconductor chips; forming a molding layer so as to fill the first cutting groove; and forming a second cutting groove having a second kerf width that is less than the first kerf width, in the molding layer, so as to separate the molding layer into individual molding layers covering one of the plurality of first semiconductor chips and corresponding one of the plurality of second semiconductor chips. | 10-10-2013 |
20130264707 | METHOD FOR HANDLING VERY THIN DEVICE WAFERS - A structure and method of handling a device wafer during through-silicon via (TSV) processing are described in which a device wafer is bonded to a temporary support substrate with a permanent thermosetting material. Upon removal of the temporary support substrate a planar frontside bonding surface including a reflowed solder bump and the permanent thermosetting material is exposed. | 10-10-2013 |
20130270693 | Trace Layout Method in Bump-on-Trace Structures - A method and device for preventing the bridging of adjacent metal traces in a bump-on-trace structure. An embodiment comprises determining the coefficient of thermal expansion (CTE) and process parameters of the package components. The design parameters are then analyzed and the design parameters may be modified based on the CTE and process parameters of the package components. | 10-17-2013 |
20130270694 | SUBSTRATES HAVING BUMPS WITH HOLES, SEMICONDUCTOR CHIPS HAVING BUMPS WITH HOLES, SEMICONDUCTOR PACKAGES FORMED USING THE SAME, AND METHODS OF FABRICATING THE SAME - Substrates and semiconductor chips are provided. The substrate or the semiconductor chip includes a body and a substantially pillar-shaped bump disposed on a first surface of the body. The pillar-shaped bump has a hole penetrating a portion thereof. Related semiconductor packages are also provided. Further, related methods are provided. | 10-17-2013 |
20130270695 | Second Level Interconnect Structures and Methods of Making the Same - The various embodiments of the present invention provide a stress-relieving, second-level interconnect structure that is low-cost and accommodates TCE mismatch between low-TCE packages and PCBs. The various embodiments of the interconnect structure are reworkable and can be scaled to pitches from about 1 millimeter (mm) to about 150 micrometers (μm). The interconnect structure comprises at least a first pad, a supporting pillar, and a solder bump, wherein the first pad and supporting pillar are operative to absorb substantially all plastic strain, therefore enhancing compliance between the two electronic components. The versatility, scalability, and stress-relieving properties of the interconnect structure of the present invention make it a desirable structure to utilize in current two-dimensional and ever-evolving three-dimensional IC structures. | 10-17-2013 |
20130270696 | SEMICONDUCTOR MEMORY MODULES AND METHODS OF FABRICATING THE SAME - The inventive concept provides semiconductor memory modules and methods of fabricating the same. The semiconductor memory module may include a module board having a first surface and a second surface opposite to the first surface, and memory chips mounted directly on the module board by a flip-chip bonding method. Each of the memory chips may include a passivation layer disposed on a rear surface of each of the memory chips, and the passivation layer may have a color different from a natural color of single-crystalline silicon. | 10-17-2013 |
20130270697 | DEVICE WITH PILLAR-SHAPED COMPONENTS - A device with pillar-shaped components, includes a substrate; a wiring layer disposed on the substrate; and pillar-shaped components disposed on any of the substrate and the wiring layer, each of the pillar-shaped components having a bottom part connected to any of the substrate and the wiring layer, a top part opposed to the bottom part, and a lateral face part extending from the bottom part to the top part to connect the bottom part and the top part; wherein each of the pillar-shaped components includes a first pillar-shaped part formed by plating, a second pillar-shaped part formed on the first pillar-shaped part by plating, and a ring-like projection part formed on the lateral face part to project outward and extend in a circumferential direction, the ring-like projection part being formed in a position higher than a joint position between the first pillar-shaped part and the second pillar-shaped part. | 10-17-2013 |
20130277826 | SEMICONDUCTOR DEVICE AND METHOD OF FORMING BUMP-ON-LEAD INTERCONNECTION - A semiconductor device has a semiconductor die with a plurality of composite bumps formed over a surface of the semiconductor die. The composite bumps have a fusible portion and non-fusible portion, such as a conductive pillar and bump formed over the conductive pillar. The composite bumps can also be tapered. Conductive traces are formed over a substrate with interconnect sites having edges parallel to the conductive trace from a plan view for increasing escape routing density. The interconnect site can have a width less than 1.2 times a width of the conductive trace. The composite bumps are wider than the interconnect sites. The fusible portion of the composite bumps is bonded to the interconnect sites so that the fusible portion covers a top surface and side surface of the interconnect sites. An encapsulant is deposited around the composite bumps between the semiconductor die and substrate. | 10-24-2013 |
20130277827 | Semiconductor Device and Method of Forming Composite Bump-on-Lead Interconnection - A semiconductor device has a semiconductor die mounted to a substrate with a plurality of composite interconnects formed between interconnect sites on the substrate and bump pads on the die. The interconnect sites are part of traces formed on the substrate. The interconnect site has a width between 1.0 and 1.2 times a width of the trace. The composite interconnect is tapered. The composite interconnects have a fusible portion connected to the interconnect site and non-fusible portion connected to the bump pad. The non-fusible portion can be gold, copper, nickel, lead solder, or lead-tin alloy. The fusible portion can be tin, lead-free alloy, tin-silver alloy, tin-silver-copper alloy, tin-silver-indium alloy, eutectic solder, or other tin alloys with silver, copper, or lead. An underfill material is deposited between the semiconductor die and substrate. A finish such as Cu—OSP can be formed over the substrate. | 10-24-2013 |
20130277828 | Methods and Apparatus for bump-on-trace Chip Packaging - Methods and apparatus for a solder mask trench used in a bump-on-trace (BOT) structure to form a semiconductor package are disclosed. A solder mask layer is formed on a trace and on a substrate. An opening of the solder mask layer, called a solder mask trench, is formed to expose the trace on the substrate. The solder mask trench has a width about a size of a diameter of a solder bump. A solder bump is landed directly on the exposed trace to connect a chip to the trace by an interconnect. With the formation of the solder mask trench, the trace exposed in the solder mask trench have a better grab force, which reduces the trace peeling failure for the semiconductor package. A plurality of solder mask trench rings may be formed in a package. | 10-24-2013 |
20130277829 | Method of Fabricating Three Dimensional Integrated Circuit - A method of fabricating a three dimensional integrated circuit comprises forming a redistribution layer on a first side of a packaging component, forming a holding chamber in the redistribution layer, attaching an integrated circuit die on the first side of the packaging component, wherein an interconnect bump of the integrated circuit die is inserted into the holding chamber, applying a reflow process to the integrated circuit die and the packaging component and forming an encapsulation layer on the packaging component. | 10-24-2013 |
20130277830 | Bump-on-Trace Interconnect - Disclosed herein is a bump-on-trace interconnect with a wetted trace sidewall and a method for fabricating the same. A first substrate having conductive bump with solder applied is mounted to a second substrate with a trace disposed thereon by reflowing the solder on the bump so that the solder wets at least one sidewall of the trace, with the solder optionally wetting between at least half and all of the height of the trace sidewall. A plurality of traces and bumps may also be disposed on the first substrate and second substrate with a bump pitch of less than about 100 μm, and volume of solder for application to the bump calculated based on at least one of a joint gap distance, desired solder joint width, predetermined solder joint separation, bump geometry, trace geometry, minimum trace sidewall wetting region height and trace separation distance. | 10-24-2013 |
20130277831 | SEMICONDUCTOR PACKAGE AND METHOD OF FABRICATING THE SAME - A semiconductor package including a circuit board including a plurality of pads; a support structure disposed on the circuit board; and a plurality of semiconductor chips stacked on the circuit board and the support structure, each semiconductor chip including at least one pad. For each semiconductor chip, the at least one pad is aligned with a corresponding pad of the circuit board; and an electrical connection is formed between the at least one pad and the corresponding pad of the circuit board through the support structure. | 10-24-2013 |
20130277832 | METHOD OF MAKING CAVITY SUBSTRATE WITH BUILT-IN STIFFENER AND CAVITY SUBSTRATE MANUFACTURED THEREBY - The present invention relates to a method of making a cavity substrate. In accordance with a preferred embodiment, the method includes: preparing a supporting board including a stiffener, a bump/flange sacrificial carrier and an adhesive, wherein the adhesive bonds the stiffener to the sacrificial carrier; forming a coreless build-up circuitry on the supporting board in contact with the bump and the stiffener; and removing the bump and a portion of the flange to form a cavity and expose a conductive via of the coreless build-up circuitry from a closed end of the cavity, wherein the cavity is laterally covered and surrounded by the adhesive. A semiconductor device can be mounted on the cavity substrate and electrically connected to the conductive via. The coreless build-up circuitry provides signal routing for the semiconductor device while the stiffener can provide adequate mechanical support for the coreless build-up circuitry and the semiconductor device. | 10-24-2013 |
20130277833 | PAD STRUCTURE OF A SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING THE PAD STRUCTURE AND SEMICONDUCTOR PACKAGE INCLUDING THE PAD STRUCTURE - A pad structure usable with a semiconductor device may include an insulating layer pattern structure, a plug, and a pad. The insulating layer pattern structure has a plug hole and at least one via hole. The plug is formed in the plug hole. The pad is formed on the insulating layer pattern structure. The pad is electrically connected with the plug and has a lower surface and an uneven upper surface. The lower surface includes a protruded portion inserted into the via hole. The uneven upper surface includes a recessed portion and an elevated portion- to provide high roughness and firm connection. | 10-24-2013 |
20130277834 | FLIP CHIP PACKAGE WITH SHELF AND METHOD OF MANUFACTURING THEREOF - The semiconductor device according to the present invention has a planar semiconductor chip having projecting connection terminals provided on one surface thereof. A shelf is provided where a peripheral edge of a surface of the semiconductor chip opposite one surface thereof onto which connection terminals are provided is removed. This makes it possible to secure a larger volume of the fillet portion of the underfill, thereby helping improve the function of preventing the rising up of the excess underfill by providing a shelf in the semiconductor chip. | 10-24-2013 |
20130277835 | SEMICONDUCTOR DEVICE - A device includes a substrate, a semiconductor chip, first and second pads, and a first wiring layer. The substrate includes first and second surfaces. The semiconductor chip includes third and fourth surfaces. The third surface faces toward the first surface. The first and second pads are provided on the third surface. The first and second pads are connected to each other. The first wiring layer is provided on the second surface of the substrate. The first wiring layer is connected to the first pad. | 10-24-2013 |
20130277836 | METHOD AND STRUCTURE OF SENSORS AND MEMS DEVICES USING VERTICAL MOUNTING WITH INTERCONNECTIONS - A method and structure for fabricating sensor(s) or electronic device(s) using vertical mounting with interconnections. The method includes providing a resulting device including at least one sensor or electronic device, formed on a die member, having contact region(s) with one or more conductive materials formed thereon. The resulting device can then be singulated within a vicinity of the contact region(s) to form one or more singulated dies, each having a singulated surface region. The singulated die(s) can be coupled to a substrate member, having a first surface region, such that the singulated surface region(s) of the singulated die(s) are coupled to a portion of the first surface region. Interconnections can be formed between the die(s) and the substrate member with conductive adhesives, solder processes, or other conductive bonding processes. | 10-24-2013 |
20130277837 | CONTROLLED SOLDER-ON-DIE INTEGRATIONS ON PACKAGES AND METHODS OF ASSEMBLING SAME - A process of bumping a die backside includes opening a recess in a die backside film (DBF) to expose a through-silicon via (TSV) contact in a die, followed by filling the recess with a conductive material that contacts the TSV contact. Added solder is coupled to the conductive material at a level of the DBF. A subsequent die is coupled to the first die at the added solder to form an electrical coupling consisting of the TSV contact, the conductive material, and the added solder, an electrical bump coupled to the subsequent die. Apparatus and computer systems are assembled using the process. | 10-24-2013 |
20130285236 | Semiconductor Device and Method of Forming a Thin Wafer Without a Carrier - A semiconductor device has a conductive via in a first surface of a substrate. A first interconnect structure is formed over the first surface of the substrate. A first bump is formed over the first interconnect structure. The first bump is formed over or offset from the conductive via. An encapsulant is deposited over the first bump and first interconnect structure. A portion of the encapsulant is removed to expose the first bump. A portion of a second surface of the substrate is removed to expose the conductive via. The encapsulant provides structural support and eliminates the need for a separate carrier wafer when thinning the substrate. A second interconnect structure is formed over the second surface of the substrate. A second bump is formed over the first bump. A plurality of semiconductor devices can be stacked and electrically connected through the conductive via. | 10-31-2013 |
20130292817 | STRUCTURE AND METHOD FOR MONITORING STRESS INDUCED FAILURES IN INTERLEVEL DIELECTRIC LAYERS OF SOLDER BUMP INTEGRATED CIRCUITS - A structure and method for monitoring interlevel dielectric stress damage. The structure includes a monitor solder bump and normal solder bumps; a set of stacked interlevel dielectric layers between the substrate and the monitor solder bump and the normal solder bumps, one or more ultra-low K dielectric layers comprising an ultra-low K material having a dielectric constant of 2.4 or less; a monitor structure in a region directly under the monitor solder bump in the ultra-low K dielectric layers and wherein the conductor density in at least one ultra-low K dielectric layer in the region directly under the monitor solder bumps is less than a specified minimum density and the conductor density in corresponding regions of the ultra-low K dielectric layers directly under normal solder bumps is greater than the specified minimum density. | 11-07-2013 |
20130292818 | SEMICONDUCTOR CHIP, SEMICONDUCTOR PACKAGE HAVING THE SAME, AND STACKED SEMICONDUCTOR PACKAGE USING THE SEMICONDUCTOR PACKAGE - A semiconductor package includes a semiconductor chip having a front surface and a back surface; through electrode formed in the semiconductor chip to pass through the front surface and the back surface and having a first end which is disposed on the front surface and a second end which is disposed on the back surface; and back-side bump formed over the second end of the through electrode and including an embedded pattern which is formed over a portion of the second end of the through electrode and a conductive pattern which is formed over the embedded pattern and a remaining portion of the second end of the through is electrode and having a convex sectional shape. | 11-07-2013 |
20130292819 | CHIP-ON-FILM DEVICE - A chip-on-film device including a flexible circuit film having a wire, a passivation layer having a hole, an adhesive layer, a pad, an interconnection, and a bump is provided. A part of the adhesive layer is disposed in the hole. The pad is disposed under the passivation layer, and a part of the pad is disposed under the hole. A part of the interconnection is disposed under the passivation layer, and disposed at a side of the pad, wherein the interconnection does not touch the pad. A part of the bump is disposed on the adhesive layer. The bump is electrically connected to the pad via the adhesive layer. The bump is welded on the wire. A part of a first part of the bump overlaps the pad, and a second part of the bump extends to an outside of the pad and at least partially overlaps the interconnection. | 11-07-2013 |
20130292820 | ELECTRONIC DEVICE PACKAGES INCLUDING BUMP BUFFER SPRING PADS AND METHODS OF MANUFACTURING THE SAME - Electronic device packages and related methods are provided. The electronic device package includes a first substrate having a first contact portion disposed thereon, a bump having a first contact surface connected to the first contact portion and a second contact surface disposed opposite to the first contact surface, and a buffer spring pad portion between the first contact portion of the first substrate and the first contact surface of the bump. The buffer spring pad portion includes at least two different conductive material layers which are stacked. | 11-07-2013 |
20130292821 | CONDUCTIVE STRUCTURE AND METHOD FOR FORMING THE SAME - A conductive structure for a semiconductor chip and a method for forming the conductive structure are provided. The semiconductor chip comprises a plurality of first pads and second pads. The pad area is defined with a first area, a second area and a third area, wherein the first area is located between the second area and the third area. Each of the first pads and the second pads are interlaced to each other on the first area. The conductive structure comprises a plurality of conductive bumps formed on each of the first pads and the second pads respectively to electrically connect with each of the first pads and the second pads. Each of the conductive bumps has a first bump-width disposed on the first area and a second bump-width disposed on one of the second and third areas in which the first bump-width is shorter than the second bump-width. | 11-07-2013 |
20130292822 | BUMP STRUCTURE, SEMICONDUCTOR PACKAGE HAVING THE BUMP STRUCTURE, AND METHOD OF FORMING THE BUMP STRUCTURE - A bump structure includes a first bump and a second bump. The first bump is disposed on a connection pad of a substrate. The first bump includes a lower portion having a first width, a middle portion having a second width smaller than the first width, and an upper portion having a third width greater than the second width. The second bump is disposed on the upper portion of the first bump. | 11-07-2013 |
20130292823 | STACK OF SEMICONDUCTOR STRUCTURES AND CORRESPONDING MANUFACTURING METHOD - A stack of a first and second semiconductor structures is formed. Each semiconductor structure includes: a semiconductor bulk, an overlying insulating layer with metal interconnection levels, and a first surface including a conductive area. The first surfaces of semiconductor structures face each other. A first interconnection pillar extends from the first surface of the first semiconductor structure. A housing opens into the first surface of the second semiconductor structure. The housing is configured to receive the first interconnection pillar. A second interconnection pillar protrudes from a second surface of the second semiconductor structure which is opposite the first surface. The second interconnection pillar is in electric contact with the first interconnection pillar. | 11-07-2013 |
20130292824 | CONNECTION OF A CHIP PROVIDED WITH THROUGH VIAS - A chip provided with through vias wherein the vias are formed of an opening with insulated walls coated with a conductive material and filled with an easily deformable insulating material, elements of connection to another chip being arranged in front of the easily deformable insulating material. | 11-07-2013 |
20130292825 | CHIP PACKAGE AND METHOD FOR FORMING THE SAME - An embodiment of the invention provides a chip package which includes: a semiconductor substrate having a first surface and a second surface; a device region formed in the semiconductor substrate; a dielectric layer disposed on the first surface of the semiconductor substrate; a conducting pad structure located in the dielectric layer and electrically connected to the device region, wherein the conducting pad structure comprises a stacked structure of a plurality of conducting pad layers; a support layer disposed on a top surface of the conducting pad structure; and a protection layer disposed on the second surface of the semiconductor substrate. | 11-07-2013 |
20130292826 | METHOD OF MAKING SEMICONDUCTOR ASSEMBLY WITH BUILT-IN STIFFENER AND SEMICONDUCTOR ASSEMBLY MANUFACTURED THEREBY - The present invention relates to a method of making a semiconductor assembly. In accordance with a preferred embodiment, the method includes: preparing a dielectric layer and a supporting board including a stiffener, a bump/flange sacrificial carrier and an adhesive, wherein the adhesive bonds the stiffener to the sacrificial carrier and the dielectric layer covers the supporting board; then removing the bump and a portion of the flange to form a cavity and expose the dielectric layer; then mounting a semiconductor device into the cavity; and then forming a build-up circuitry that includes a first conductive via in direct contact with the semiconductor device and provides signal routing for the semiconductor device. Accordingly, the direct electrical connection between the semiconductor device and the build-up circuitry is advantageous to high I/O and high performance, and the stiffener can provide adequate mechanical support for the build-up circuitry and the semiconductor device. | 11-07-2013 |
20130292827 | Pillar Structure having a Non-Planar Surface for Semiconductor Devices - A conductive pillar for a semiconductor device is provided. The conductive pillar is formed such that a top surface is non-planar. In embodiments, the top surface may be concave, convex, or wave shaped. An optional capping layer may be formed over the conductive pillar to allow for a stronger inter-metallic compound (IMC) layer. The IMC layer is a layer formed between solder material and an underlying layer, such as the conductive pillar or the optional capping layer. | 11-07-2013 |
20130292828 | STACKED SEMICONDUCTOR PACKAGES - An apparatus includes a first substrate having a first land and a second substrate having a second land. A first molding compound is disposed between the first substrate and the second substrate. A first semiconductor chip is disposed on the first substrate and in contact with the first molding portion. A first connector contacts the first land and a second connector contacts the second land. The second connector is disposed on the first connector. A volume of the second connector is greater than a volume of the first connector. A surface of the first semiconductor chip is exposed. The first molding compound is in contact with the second connector, and at least a portion of the second connector is surrounded by the first molding compound. | 11-07-2013 |
20130292829 | Semiconductor Package with Embedded Die - A semiconductor package having an embedded die and solid vertical interconnections, such as stud bump interconnections, for increased integration in the direction of the z-axis (i.e., in a direction normal to the circuit side of the die). The semiconductor package can include a die mounted in a face-up configuration (similar to a wire bond package) or in a face-down or flip chip configuration. | 11-07-2013 |
20130299965 | SEMICONDUCTOR ASSEMBLIES, STRUCTURES, AND METHODS OF FABRICATION - Semiconductor assemblies, structures, and methods of fabrication are disclosed. A coating is formed on an electrically conductive pillar. The coating, which may be formed from at least one of a silane material and an organic solderability protectant material, may bond to a conductive material of the electrically conductive pillar and, optionally, to other metallic materials of the electrically conductive pillar. The coating may also bond to substrate passivation material, if present, or to otherwise-exposed surfaces of a substrate and a bond pad. The coating may be selectively formed on the conductive material. Material may not be removed from the coating after formation thereof and before reflow of the solder for die attach. The coating may isolate at least the conductive material from solder, inhibiting solder wicking or slumping along the conductive material and may enhance adhesion between the resulting bonded conductive element and an underfill material. | 11-14-2013 |
20130299966 | WSP DIE WITH OFFSET REDISTRIBUTION LAYER CAPTURE PAD - A WSP die having a redistribution layer (“RDL”) with an RDL capture pad that has an RDL pad central axis RR and a RDL pad outer peripheral edge arranged about the RDL capture pad central axis RR and an under bump metal (UBM) pad positioned above the RDL capture pad. The UBM pad has a UBM pad central axis UU and a UBM pad outer peripheral edge arranged around the UBM pad central axis UU. The UBM pad central axis UU is laterally offset from the RDL pad central axis RR. | 11-14-2013 |
20130299967 | WSP DIE HAVING REDISTRIBUTION LAYER CAPTURE PAD WITH AT LEAST ONE VOID - A MP die with a redistribution layer (“RDL”) capture pad having at least one void therein and having an RDL capture pad outer peripheral edge and an under bump metal (“UBM”) pad positioned above the RDL capture pad and having a UBM pad outer peripheral edge positioned laterally inwardly of the RDL capture pad outer peripheral edge and positioned laterally outwardly of all the voids in the RDL capture pad. | 11-14-2013 |
20130299968 | SEMICONDUCTOR PACKAGE AND A SUBSTRATE FOR PACKAGING - A semiconductor package is provided, which includes: a substrate having a metal pattern layer; a semiconductor die formed on the substrate; and an underfill filled between the substrate and the semiconductor die. At least an opening is formed in the metal pattern layer to reduce the area of the metal pattern layer on the substrate, thereby reducing the contact area between the underfill and the metal pattern layer, hence eliminating the underfill delamination. | 11-14-2013 |
20130299969 | SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR PACKAGE - A semiconductor package includes a first semiconductor chip, a second semiconductor chip and a sealing member. The first semiconductor chip includes a substrate having a first surface and a second surface opposite to the first surface and having an opening that extends in a predetermined depth from the second surface, and a plurality of through electrodes extending in a thickness direction from the first surface, end portions of the through electrodes being exposed through a bottom surface of the opening. The second semiconductor chip is received in the opening and mounted on the bottom surface of the opening. The sealing member covers the second semiconductor chip in the opening. | 11-14-2013 |
20130299970 | SEMICONDUCTOR DEVICE - To provide a semiconductor device characterized in that lands for mounting thereon solder balls placed in an inner area of a chip mounting area have an NSMD structure. This means that lands for mounting thereon solder balls placed in an area of the back surface of a through-hole wiring board overlapping with a chip mounting area in a plan view have an NSMD structure. According to the invention, a semiconductor device to be mounted on a mounting substrate with balls has improved reliability. | 11-14-2013 |
20130299971 | Semiconductor Device and Method of Forming Penetrable Film Encapsulant Around Semiconductor Die and Interconnect Structure - A semiconductor device has a plurality of bumps formed over a carrier. A semiconductor die is mounted to the carrier between the bumps. A penetrable film encapsulant layer having a base layer, first adhesive layer, and second adhesive layer is placed over the semiconductor die and bumps. The penetrable film encapsulant layer is pressed over the semiconductor die and bumps to embed the semiconductor die and bumps within the first and second adhesive layers. The first adhesive layer and second adhesive layer are separated to remove the base layer and first adhesive layer and leave the second adhesive layer around the semiconductor die and bumps. The bumps are exposed from the second adhesive layer. The carrier is removed. An interconnect structure is formed over the semiconductor die and second adhesive layer. A conductive layer is formed over the second adhesive layer electrically connected to the bumps. | 11-14-2013 |
20130299972 | SELF-ALIGNED PROTECTION LAYER FOR COPPER POST STRUCTURE - A semiconductor device includes a semiconductor substrate and a conductive post overlying and electrically connected to the substrate. The semiconductor device further includes a manganese-containing protection layer on a surface of the conductive post. The semiconductor device further includes a cap layer over a top surface of the conductive post. A method of forming a semiconductor device includes forming a bond pad region on a semiconductor substrate. The method further includes forming a conductive post overlying and electrically connected to the bond pad region. The method further includes forming a protection layer on a surface of the conductive post, wherein the protection layer comprises manganese (Mn). The method further includes forming a cap layer on a top surface of the conductive post. | 11-14-2013 |
20130299973 | Semiconductor Die and Method of Forming FO-WLCSP Vertical Interconnect Using TSV and TMV - A semiconductor device has a TSV wafer and semiconductor die mounted over the TSV wafer. A channel is formed through the TSV wafer. An encapsulant is deposited over the semiconductor die and TSV wafer. Conductive TMV are formed through the encapsulant over the conductive TSV and contact pads of the semiconductor die. The conductive TMV can be formed through the channel. A conductive layer is formed over the encapsulant and electrically connected to the conductive TMV. The conductive TMV are formed during the same manufacturing process. An insulating layer is formed over the encapsulant and conductive layer. A plurality of semiconductor die of the same size or different sizes can be stacked over the TSV wafer. The plurality of semiconductor die can be stacked over opposite sides of the TSV wafer. An internal stacking module can be stacked over the semiconductor die and electrically connected through the conductive TMV. | 11-14-2013 |
20130299974 | Semiconductor Device and Method of Forming Open Cavity in TSV Interposer to Contain Semiconductor Die in WLCSMP - A semiconductor device is made by mounting a semiconductor wafer to a temporary carrier. A plurality of TSV is formed through the wafer. A cavity is formed partially through the wafer. A first semiconductor die is mounted to a second semiconductor die. The first and second die are mounted to the wafer such that the first die is disposed over the wafer and electrically connected to the TSV and the second die is disposed within the cavity. An encapsulant is deposited over the wafer and first and second die. A portion of the encapsulant is removed to expose a first surface of the first die. A portion of the wafer is removed to expose the TSV and a surface of the second die. The remaining portion of the wafer operates as a TSV interposer for the first and second die. An interconnect structure is formed over the TSV interposer. | 11-14-2013 |
20130299975 | Semiconductor Device and Method of Forming Through Vias with Reflowed Conductive Material - A semiconductor device is made by providing a first semiconductor wafer having semiconductor die. A gap is made between the semiconductor die. An insulating material is deposited in the gap. A portion of the insulating material is removed to form a first through hole via (THV). A conductive lining is conformally deposited in the first THV. A solder material is disposed above the conductive lining of the first THV. A second semiconductor wafer having semiconductor die is disposed over the first wafer. A second THV is formed in a gap between the die of the second wafer. A conductive lining is conformally deposited in the second THV. A solder material is disposed above the second THV. The second THV is aligned to the first THV. The solder material is reflowed to form the conductive vias within the gap. The gap is singulated to separate the semiconductor die. | 11-14-2013 |
20130299976 | Semiconductor Die Connection System and Method - A system and method for connecting semiconductor dies is provided. An embodiment comprises connecting a first semiconductor die with a first width to a second semiconductor die with a larger second width and that is still connected to a semiconductor wafer. The first semiconductor die is encapsulated after it is connected, and the encapsulant and first semiconductor die are thinned to expose a through substrate via within the first semiconductor die. The second semiconductor die is singulated from the semiconductor wafer, and the combined first semiconductor die and second semiconductor die are then connected to another substrate. | 11-14-2013 |
20130307139 | BONDING OF SUBSTRATES INCLUDING METAL-DIELECTRIC PATTERNS WITH METAL RAISED ABOVE DIELECTRIC AND STRUCTURES SO FORMED - Bonding of substrates including metal-dielectric patterns on a surface with the metal raised above the dielectric, as well as related structures, are disclosed. One method includes providing a first substrate having a metal-dielectric pattern on a surface thereof; providing a second substrate having a metal-dielectric pattern on a surface thereof; performing a process resulting in the metal being raised above the dielectric; cleaning the metal; and bonding the first substrate to the second substrate. A related structure is also disclosed. The bonding of raised metal provides a strong bonding medium, and good electrical and thermal connections enabling creation of three dimensional integrated structures with enhanced functionality. | 11-21-2013 |
20130307140 | PACKAGING WITH INTERPOSER FRAME - The mechanisms of using an interposer frame to package a semiconductor die enables fan-out structures and reduces form factor for the packaged semiconductor die. The mechanisms involve using a molding compound to attach the semiconductor die to the interposer frame and forming a redistribution layer on one or both sides of the semiconductor die. The redistribution layer(s) in the package enables fan-out connections and formation of external connection structures. Conductive columns in the interposer frame assist in thermal management. | 11-21-2013 |
20130307141 | Wire-Based Methodology of Widening the Pitch of Semiconductor Chip Terminals - A packaged semiconductor device ( | 11-21-2013 |
20130307142 | SELECTIVE SOLDER BUMP FORMATION ON WAFER - A method for selective bump formation on a wafer includes performing a wafer test on the wafer. Known good dies (KGDs) on the wafer are identified based on the wafer test performed. Solder bumps are formed on the KGDs. | 11-21-2013 |
20130307143 | WAFER-LEVEL PACKAGING MECHANISMS - The embodiments of mechanisms of wafer-level packaging (WLP) described above utilize a planarization stop layer to determine an end-point of the removal of excess molding compound prior to formation of redistribution lines (RDLs). Such mechanisms of WLP are used to implement fan-out and multi-chip packaging. The mechanisms are also usable to manufacture a package including chips (or dies) with different types of external connections. For example, a die with pre-formed bumps can be packaged with a die without pre-formed bumps. | 11-21-2013 |
20130307144 | THREE-DIMENSIONAL CHIP STACK AND METHOD OF FORMING THE SAME - A three dimensional (3D) chip stack includes a first chip bonded to a second chip. The first chip includes a first bump structure overlying the first substrate, and the second chip includes a second bump structure overlying the second substrate. The first bump structure is attached to the second bump structure, and a joining region is formed between the first bump structure and the second bump structure. The joining region is a solderless region which includes a noble metal. | 11-21-2013 |
20130307145 | SEMICONDUCTOR PACKAGE AND METHOD OF FABRICATING THE SAME - A semiconductor package including a package substrate; a semiconductor chip on the package substrate; a first via contact on the package substrate; a second via contact on the semiconductor chip; a metal wiring, which is arranged on the first via contact and the second via contact and interconnects the first via contact and the second via contact; a first encapsulating material which is arranged between the metal wiring and the package substrate and encapsulates the semiconductor chip, the first via contact, and the second via contact; and a second encapsulating material which encapsulates the first encapsulating material and the metal wiring. | 11-21-2013 |
20130307146 | MOUNTING STRUCTURE OF ELECTRONIC COMPONENT AND METHOD OF MANUFACTURING THE MOUNTING STRUCTURE OF THE ELECTRONIC COMPONENT - A mounting structure of an electronic component includes a plurality of joining portions that join a plurality of first electrode terminals on the electronic component to a plurality of second electrode terminals on a circuit board. The joining portions each include a first projecting electrode formed on the first electrode terminal, a second projecting electrode formed on the second electrode terminal, and a solder portion that joins the first projecting electrode to the second projecting electrode. The end face of the first projecting electrode is larger in area than the end face of the second projecting electrode, and at least a part of the second electrode terminals exposed from the circuit board has a larger area than the bottom of the second projecting electrode. | 11-21-2013 |
20130307147 | CHIP PACKAGE AND METHOD FOR FORMING THE SAME - Embodiments of the present invention provide a chip package including: a substrate having a first surface and a second surface; a device region located in the substrate; a conducting pad structure disposed on the substrate and electrically connected to the device region; a spacer layer disposed on the first surface of the substrate; a second substrate disposed on the spacer layer, wherein a cavity is created and surrounded by the second substrate, the spacer layer, and the substrate on the device region; and a through-hole extending from a surface of the second substrate towards the substrate, wherein the through-hole connects to the cavity. | 11-21-2013 |
20130313702 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device comprises a substrate, a word line, an insulation material, and an etch stop material. The substrate comprises a pillar that may comprise an active area. The word line is formed in the substrate. The insulation material is formed on the word line. The etch stop material is formed on the insulating material and around the pillar. | 11-28-2013 |
20130313703 | SEMICONDUCTOR DEVICE HAVING WAFER-LEVEL CHIP SIZE PACKAGE - A semiconductor device including a semiconductor substrate with circuit elements and electrode pads formed on one surface. The surface is covered by a dielectric layer with openings above the electrode pads. A metal layer is included on the dielectric layer and patterned to form a conductive pattern with traces leading to the electrode pads. A protective layer is included as having openings exposing part of the conductive pattern. Each opening is covered by an electrode such as a solder bump, which is electrically connected through the conductive pattern to one of the electrode pads. The thickness of the protective layer, which may function as a package of the semiconductor device, is thus reduced. The protective layer may be formed from a photosensitive material, simplifying the formation of the openings for the electrodes. | 11-28-2013 |
20130313704 | METHOD FOR FABRICATING TWO SUBSTRATES CONNECTED BY AT LEAST ONE MECHANICAL AND ELECTRICALLY CONDUCTIVE CONNECTION AND STRUCTURE OBTAINED - A first substrate provided with a receiving area made from a first metallic material is supplied. A second substrate provided with an insertion area comprising a base surface and at least two bumps made from a second metallic material is arranged facing the first substrate. The bumps are salient from the base surface. A pressure is applied between the first substrate and the second substrate so as to make the bumps penetrate into the receiving area. The first metallic material reacts with the second metallic material so as to form a continuous layer of an intermetallic compound having a base formed by the first and second metallic materials along the interface between the bumps and the receiving area. | 11-28-2013 |
20130320521 | RELEASABLE BURIED LAYER FOR 3-D FABRICATION AND METHODS OF MANUFACTURING - A releasable buried layer for 3-D fabrication and methods of manufacturing is disclosed. The method includes forming an interposer structure which includes forming a carbon rich dielectric releasable layer over a wafer. The method further includes forming back end of the line (BEOL) layers over the carbon rich dielectric layer, including wiring layers and solder bumps. The method further includes bonding the solder bumps to a substrate using flip chip processes. The flip chip processes comprises reflowing the solder bumps and rapidly cooling down the solder bumps which releases the carbon rich dielectric releasable layer from the wafer. | 12-05-2013 |
20130320522 | Re-distribution Layer Via Structure and Method of Making Same - An embodiment is a semiconductor device comprising a contact pad over a substrate, wherein the contact pad is disposed over an integrated circuit on the substrate and a first passivation layer over the contact pad. A first via in the first passivation layer, wherein the first via has more than four sides, and wherein the first via extends to the contact pad. | 12-05-2013 |
20130320523 | Semiconductor Device and Method of Reflow Soldering for Conductive Column Structure in Flip Chip Package - A semiconductor device comprises a substrate and a semiconductor die. Bumps are formed over the substrate or a first surface of the semiconductor die. Conductive columns devoid of solder are formed over the substrate or the first surface of the semiconductor die. The semiconductor die is disposed over the substrate. A collet including a first cavity and a second cavity formed in a surface of the first cavity is mounted over the semiconductor die with a second surface of the semiconductor die opposite the first surface disposed within the first cavity. The bumps are reflowed. A force is applied to the collet to hold the bumps to the conductive columns while reflowing the bumps to make electrical connection to the conductive columns. The collet is removed. An underfill material is deposited between the semiconductor die and substrate. An encapsulant is deposited over the semiconductor die and substrate. | 12-05-2013 |
20130320524 | Design Scheme for Connector Site Spacing and Resulting Structures - A system and method for preventing cracks in a passivation layer is provided. In an embodiment a contact pad has a first diameter and an opening through the passivation layer has a second diameter, wherein the first diameter is greater than the second diameter by a first distance of about 10 μm. In another embodiment, an underbump metallization is formed through the opening, and the underbump metallization has a third diameter that is greater than the first diameter by a second distance of about 5 μm. In yet another embodiment, a sum of the first distance and the second distance is greater than about 15 μm. | 12-05-2013 |
20130320525 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH SUBSTRATE AND METHOD OF MANUFACTURE THEREOF - An integrated circuit packaging system and method of manufacture thereof includes: a substrate having a top insulation layer and a top conductive layer; an inter-react layer on the substrate; an integrated circuit die on the substrate; a package body on the inter-react layer and the integrated circuit die; and a top solder bump on the top conductive layer, the top solder bump in a 3D via formed through the package body, the inter-react layer, and the top insulation layer for exposing the top conductive layer in the 3D via. | 12-05-2013 |
20130320526 | SEMICONDUCTOR CONSTRUCT AND MANUFACTURING METHOD THEREOF AS WELL AS SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor construct includes a semiconductor substrate and connection pads provided on the semiconductor substrate. Some of the connection pads are connected to a common wiring and at least one of the remaining of the connection pads are connected to a wiring. The construct also includes a first columnar electrode provided to be connected to the common wiring and a second columnar electrode provided to be connected to a connection pad portion of the wiring. | 12-05-2013 |
20130320527 | SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD - A semiconductor device includes a semiconductor chip, and a terminal connected with the semiconductor chip. The terminal has a first surface and a second surface spaced from each other in a thickness direction. The semiconductor device also includes a sealing resin covering the semiconductor chip and the terminal. The sealing resin is so configured that the first surface of the terminal is exposed from the sealing resin. The terminal is formed with an opening to be filled with the sealing resin. | 12-05-2013 |
20130320528 | COAXIAL SOLDER BUMP SUPPORT STRUCTURE - A solder bump support structure and method of manufacturing thereof is provided. The solder bump support structure includes an inter-level dielectric (ILD) layer formed over a silicon substrate. The ILD layer has a plurality of conductive vias. The structure further includes a first insulation layer formed on the ILD layer. The solder bump support structure further includes a pedestal member formed on the ILD layer which includes a conductive material formed above the plurality of conductive vias in the ILD layer coaxially surrounded by a second insulation layer. The second insulation layer is thicker than the first insulation layer. The structure further includes a capping under bump metal (UBM) layer formed over, and in electrical contact with, the conductive material and formed over at least a portion of the second insulation layer of the pedestal member. | 12-05-2013 |
20130328186 | REDUCED STRESS TSV AND INTERPOSER STRUCTURES - A component can include a substrate and a conductive via extending within an opening in the substrate. The substrate can have first and second opposing surfaces. The opening can extend from the first surface towards the second surface and can have an inner wall extending away from the first surface. A dielectric material can be exposed at the inner wall. The conductive via can define a relief channel within the opening adjacent the first surface. The relief channel can have an edge within a first distance from the inner wall in a direction of a plane parallel to and within five microns below the first surface, the first distance being the lesser of one micron and five percent of a maximum width of the opening in the plane. The edge can extend along the inner wall to span at least five percent of a circumference of the inner wall. | 12-12-2013 |
20130328187 | SEMICONDUCTOR DEVICE - There is provided a semiconductor device which includes a plurality of first through-substrate vias that are used to supply power from a first power supply and that penetrate through a substrate structure, and a plurality of second through-substrate vias that are used to supply power from a second power supply different from the first power supply and that penetrate through a substrate structure. The semiconductor device also includes a through-substrate via string composed by the first and second through-substrate vias, in which the first through-substrate vias are located adjacent to one another and the second through-substrate vias are also located adjacent to one another. The through-substrate via string is disposed in the substrate structure for extending in a first direction. | 12-12-2013 |
20130328188 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device includes a substrate including first and second surfaces, a first insulating film including third and fourth surfaces, the fourth surface being in contact with the first surface, and an electrode elongated to penetrate the substrate and the first insulating film, the electrode including a first portion and a second portion. The first portion includes first and second end parts and a center part sandwiched between the first and second end part. The first and second end parts of the first portion are smaller in diameter than at least a portion of the center part of the first portion. The second portion is located between the first portion and the third surface, and includes a third end part exposed from the third surface and a fourth end part connected to the first end part of the first portion. | 12-12-2013 |
20130328189 | Bump-on-Lead Flip Chip Interconnection - A semiconductor device has a semiconductor die with a plurality of bumps formed over the die. A substrate has a plurality of conductive traces formed on the substrate. Each trace has an interconnect site for mating to the bumps. The interconnect sites have parallel edges along a length of the conductive traces under the bumps from a plan view for increasing escape routing density. The bumps have a noncollapsible portion for attaching to a contact pad on the die and fusible portion for attaching to the interconnect site. The fusible portion melts at a temperature which avoids damage to the substrate during reflow. The noncollapsible portion includes lead solder, and fusible portion includes eutectic solder. The interconnect sites have a width which is less than 1.2 times a width of the conductive trace. Alternatively, the interconnect sites have a width which is less than one-half a diameter of the bump. | 12-12-2013 |
20130334680 | WAFER LEVEL PACKAGES OF HIGH VOLTAGE UNITS FOR IMPLANTABLE MEDICAL DEVICES AND CORRESPONDING FABRICATION METHODS - A multi-chip modular wafer level package of a high voltage unit for an implantable cardiac defibrillator includes one or more high voltage (HV) component chips encapsulated with other components thereof in a polymer mold compound of a single reconstituted wafer, wherein all interconnect segments are preferably located on a single side of the wafer. To electrically couple a contact surface of each HV chip, located on a side of the chip opposite the interconnect side of the wafer, the reconstituted wafer may include conductive through polymer vias; alternately, either wire bonds or layers of conductive polymer are formed to couple the aforementioned contact surface to the corresponding interconnect, prior to encapsulation of the HV chips. In some cases one or more of the components encapsulated in the reconstituted wafer of the package are reconstituted chips. | 12-19-2013 |
20130334681 | SEMICONDUCTOR PACKAGE STRUCTURE AND METHOD FOR MAKING THE SAME - A semiconductor package structure includes a first substrate, a second substrate and an encapsulant. The first substrate comprises a plurality of first bumps and a plurality of first solder layers. Each of the first solder layers is formed on each of the first bumps and comprises a cone-shaped slot having an inner surface. The second substrate comprises a plurality of second bumps and a plurality of second solder layers. Each of the second solder layers is formed on each of the second bumps and comprises an outer surface. Each of the second solder layers is a cone-shaped body. The second solder layer couples to the first solder layer and is accommodated within the first solder layer. The inner surface of the cone-shaped slot contacts with the outer surface of the second solder layer. The encapsulant is formed between the first substrate and the second substrate. | 12-19-2013 |
20130334682 | EMBEDDED PACKAGES INCLUDING A MULTI-LAYERED DIELECTRIC LAYER AND METHODS OF MANUFACTURING THE SAME - The embedded package includes a semiconductor chip having contact portions disposed on a top surface thereof, a first dielectric layer substantially surrounding sidewalls of the semiconductor chip and including first fillers dispersed therein, a second dielectric layer substantially covering the top surface of the semiconductor chip and including second fillers dispersed therein, and first external interconnection portions disposed on the second dielectric layer and electrically connected to the contact portions, wherein an average size of the first fillers is different from that of the second fillers. | 12-19-2013 |
20130334683 | ELECTRONIC DEVICE PACKAGES HAVING BUMPS AND METHODS OF MANUFACTURING THE SAME - An electronic device package includes a bump having a post disposed on a contact portion of a semiconductor chip and an enlarged portion laterally protruded from an upper portion of the post; an interconnection portion having a locking portion that substantially surrounds the enlarged portion and an upper sidewall of the post; and a dielectric layer substantially surrounding the bump and the locking portion to separate the interconnection portion from the semiconductor chip. | 12-19-2013 |
20130334684 | SUBSTRATE STRUCTURE AND PACKAGE STRUCTURE - A substrate structure is provided, including a substrate body and a plurality of traces formed on a surface of the substrate body. At least one of the traces has an electrical contact formed in a groove thereof for electrically connecting an external element, thereby meeting the demands of fine line/fine pitch and miniaturization and improving the product yield. | 12-19-2013 |
20130341784 | Semiconductor Device and Method of Forming an Embedded SOP Fan-Out Package - A semiconductor device includes a ball grid array (BGA) package including first bumps. A first semiconductor die is mounted to the BGA package between the first bumps. The BGA package and first semiconductor die are mounted to a carrier. A first encapsulant is deposited over the carrier and around the BGA package and first semiconductor die. The carrier is removed to expose the first bumps and first semiconductor die. An interconnect structure is electrically connected to the first bumps and first semiconductor die. The BGA package further includes a substrate and a second semiconductor die mounted, and electrically connected, to the substrate. A second encapsulant is deposited over the second semiconductor die and substrate. The first bumps are formed over the substrate opposite the second semiconductor die. A warpage balance layer is formed over the BGA package. | 12-26-2013 |
20130341785 | SEMICONDUCTOR CHIP WITH EXPANSIVE UNDERBUMP METALLIZATION STRUCTURES - Methods and apparatus to protect fragile dielectric layers in a semiconductor chip are disclosed. In one aspect, a method of manufacturing is provided that includes forming a first polymer layer over a conductor pad of a semiconductor chip where the conductor pad has a first lateral dimension. An underbump metallization structure is formed on the first polymer layer and in ohmic contact with the conductor pad. The underbump metallization structure has a second lateral dimension greater than the first lateral dimension. A second polymer layer is formed on the first polymer layer with a first opening exposing at least a portion of the underbump metallization structure. | 12-26-2013 |
20130341786 | Package on Package Devices and Methods of Packaging Semiconductor Dies - Package on package (PoP) devices and methods of packaging semiconductor dies are disclosed. In one embodiment, a PoP device includes a first packaged die and a second packaged die coupled to the first packaged die. Metal pillars are coupled to the first packaged die. The metal pillars have a first portion proximate the first packaged die and a second portion disposed over the first portion. Each of the metal pillars is coupled to a solder joint proximate the second packaged die. | 12-26-2013 |
20130341787 | CARBON NANOTUBE-SOLDER COMPOSITE STRUCTURES FOR INTERCONNECTS, PROCESS OF MAKING SAME, PACKAGES CONTAINING SAME, AND SYSTEMS CONTAINING SAME - A carbon nanotube (CNT) array is patterned on a substrate. The substrate can be a microelectronic die, an interposer-type structure for a flip-chip, a mounting substrate, or a board. The CNT array is patterned by using a patterned metallic seed layer on the substrate to form the CNT array by chemical vapor deposition. The patterned CNT array can also be patterned by using a patterned mask on the substrate to form the CNT array by growing. A computing system that uses the CNT array for heat transfer from the die is also used. | 12-26-2013 |
20130341788 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME, AND WIRING SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device has a semiconductor substrate, an electrode pad formed on a surface of the semiconductor substrate, and a protruding electrode electrically connected to the electrode pad. The protruding electrode comprises a pedestal part formed on the electrode pad and a protruding part formed on the pedestal part. The protruding part has a columnar part with a width smaller than that of the pedestal part, and a tapered part with a width gradually increased from an end of the columnar part side toward an end of the pedestal part side. An angle of inclination of a side surface of the tapered part with respect to a plane surface perpendicular to the surface is larger than an angle of inclination of a side surface of the pedestal part and an angle of inclination of a side surface of the columnar part with respect to the plane surface. | 12-26-2013 |
20130341789 | Semiconductor Device and Method of Forming a Wafer Level Package with Top and Bottom Solder Bump Interconnection - A semiconductor device is made by forming solder bumps over a copper carrier. Solder capture indentations are formed in the copper carrier to receive the solder bumps. A semiconductor die is mounted to the copper carrier using a die attach adhesive. The semiconductor die has contact pads formed over its active surface. An encapsulant is deposited over the copper carrier, solder bumps, and semiconductor die. A portion of the encapsulant is removed to expose the solder bumps and contact pads. A conductive layer is formed over the encapsulant to connect the solder bumps and contact pads. The conductive layer operates as a redistribution layer to route electrical signals from the solder bumps to the contact pads. The copper carrier is removed. An insulating layer is formed over the conductive layer and encapsulant. A plurality of semiconductor devices can be stacked and electrically connected through the solder bumps. | 12-26-2013 |
20140001631 | INTEGRATED WLUF AND SOD PROCESS | 01-02-2014 |
20140008785 | Package Redistribution Layer Structure and Method of Forming Same - A package-on-package (PoP) device comprises a bottom package on a substrate and a first set of conductive elements coupling the bottom package and the substrate. The PoP device further comprises a top package over the bottom package and a redistribution layer coupling the top package to the substrate. A method of forming a PoP device comprises coupling a first package to a substrate; and forming a redistribution layer over the first package and a top surface of the substrate. The method further comprises coupling a second package to the redistribution layer, wherein the redistribution layer couples the second package to the substrate. | 01-09-2014 |
20140008786 | BUMP-ON-TRACE PACKAGING STRUCTURE AND METHOD FOR FORMING THE SAME - A device comprises a first package component, and a first metal trace and a second metal trace on a top surface of the first package component. The device further includes a dielectric mask layer covering the top surface of the first package component, the first metal trace and the second metal trace, wherein the dielectric mask layer has an opening therein exposing the first metal trace. The device also includes a second package component and an interconnect formed on the second package component, the interconnect having a metal bump and a solder bump formed on the metal bump, wherein the solder bump contacts the first metal trace in the opening of the dielectric mask layer. | 01-09-2014 |
20140008787 | CONDUCTIVE BUMP STRUCTURE AND METHOD OF FABRICATING A SEMICONDUCTOR STRUCTURE - A conductive bump structure used to be formed on a substrate having a plurality of bonding pads. The conductive bump structure includes a first metal layer formed on the bonding pads, a second metal layer formed on the first metal layer, and a third metal layer formed on the second metal layer. The second metal layer has a second melting point higher than a third melting point of the third metal layer. Therefore, a thermal compression bonding process is allowed to be performed to the third metal layer first so as to bond the substrate to another substrate, and then a reflow process can be performed to melt the second metal layer and the third metal layer into each other so as to form an alloy portion, thus avoiding cracking of the substrate. | 01-09-2014 |
20140008792 | Semiconductor Device and Method of Forming Bump-on-Lead Interconnection - A semiconductor device has a semiconductor die with a plurality of composite bumps formed over a surface of the semiconductor die. The composite bumps have a fusible portion and non-fusible portion, such as a conductive pillar and bump formed over the conductive pillar. The composite bumps can also be tapered. Conductive traces are formed over a substrate with interconnect sites having edges parallel to the conductive trace from a plan view for increasing escape routing density. The interconnect site can have a width less than 1.2 times a width of the conductive trace. The composite bumps are wider than the interconnect sites. The fusible portion of the composite bumps is bonded to the interconnect sites so that the fusible portion covers a top surface and side surface of the interconnect sites. An encapsulant is deposited around the composite bumps between the semiconductor die and substrate. | 01-09-2014 |
20140008793 | SEMICONDUCTOR DEVICE - To provide a technique capable of reducing the chip size of a semiconductor chip and particularly, a technique capable of reducing the chip size of a semiconductor chip in the form of a rectangle that constitutes an LCD driver by devising a layout arrangement in a short-side direction. In a semiconductor chip that constitutes an LCD driver, input protection circuits are arranged in a lower layer of part of a plurality of input bump electrodes and on the other hand, in a lower layer of the other part of the input bump electrodes, the input protection circuits are not arranged but SRAMs (internal circuits) are arranged. | 01-09-2014 |
20140015122 | Method of Forming Post Passivation Interconnects - A method of forming post passivation interconnects comprises forming a passivation layer over a substrate, wherein a metal pad is embedded in the passivation layer, depositing a first dielectric layer on the passivation layer, applying a first patterning process to the first dielectric layer to form a first opening, forming a first seed layer over the first opening, filling the first opening with a conductive material, depositing a second dielectric layer on the first dielectric layer, applying a second patterning process to the second dielectric layer to form a second opening, forming an under bump metallization structure over the second opening and mounting an interconnect bump over the under bump metallization structure. | 01-16-2014 |
20140015123 | SENSOR PACKAGE AND METHOD OF FORMING SAME | 01-16-2014 |
20140015124 | PILLAR ON PAD INTERCONNECT STRUCTURES, SEMICONDUCTOR DICE AND DIE ASSEMBLIES INCLUDING SUCH INTERCONNECT STRUCTURES, AND RELATED METHODS - Methods of fabricating interconnect structures for semiconductor dice comprise forming conductive elements in contact with bond pads on an active surface over a full pillar diameter of the conductive elements, followed by application of a photodefinable material comprising a photoresist to the active surface and over the conductive elements. The polymide material is selectively exposed and developed to remove photodefinable material covering at least tops of the conductive elements. Semiconductor dice and semiconductor die assemblies are also disclosed. | 01-16-2014 |
20140015125 | SEMICONDUCTOR PACKAGE AND METHOD OF FABRICATING THE SAME - A method of fabricating a semiconductor package is provided, including: providing a carrier having a plurality of chip areas defined thereon, and forming a connection unit on each of the chip areas; disposing a semiconductor element on each of the connection units; forming an insulating layer on the carrier and the semiconductor elements; and forming on the insulating layer a circuit layer electrically connected to the semiconductor elements. Since being formed only on the chip areas instead of on the overall carrier as in the prior art, the connection units are prevented from expanding or contracting during temperature cycle, thereby avoiding positional deviations of the semiconductor elements. | 01-16-2014 |
20140015126 | SEMICONDUCTOR PACKAGE AND STACKED SEMICONDUCTOR PACKAGE USING THE SAME - A semiconductor package including a semiconductor chip having a front surface and a rear surface which faces away from the front surface, pads disposed over the front surface of the semiconductor chip, and bumps formed over the pads, and each having a T-shaped configuration or defining an inverted T-shaped space. | 01-16-2014 |
20140015127 | CONTACT SUPPORT PILLAR STRUCTURE FOR FLIP CHIP SEMICONDUCTOR DEVICES AND METHOD OF MANUFACTURE THEREFORE - In one aspect, there is provided a semiconductor device that comprises an interconnect layer located over a semiconductor substrate. A passivation layer is located over the interconnect layer and has a contact support pillar opening formed therein. Contact support pillars that comprise a conductive metal and have a metal extension are located within the opening of the passivation layer. | 01-16-2014 |
20140015128 | NONVOLATILE MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME - A three-dimensional nonvolatile memory device and a method for fabricating the same include a semiconductor substrate, a plurality of active pillars, a plurality of gate electrodes, and a plurality of supporters. The semiconductor substrate includes a memory cell region and a contact region. The active pillars extend in the memory cell region perpendicularly to the semiconductor substrate. The gate electrodes intersect the active pillars, extend from the memory cell region to the contact region and are stacked on the semiconductor substrate. The supporters extend in the contact region perpendicularly to the semiconductor substrate to penetrate at least one or more of the gate electrodes. | 01-16-2014 |
20140015129 | STACKED PACKAGE INCLUDING SPACERS AND METHOD OF MANUFACTURING THE SAME - A stacked package and method of manufacture are provided. The stacked package may include a first semiconductor package, a second semiconductor package, plugs and spacers. The second semiconductor package may be stacked on the first semiconductor package. The plugs may electrically connect the first semiconductor to the second semiconductor package. The spacer may be interposed between the first semiconductor package and the second semiconductor package to form a gap between the first semiconductor package and the second semiconductor package, thereby preventing an electrical short between the plugs. | 01-16-2014 |
20140015130 | MICROELECTRONIC DIE PACKAGES WITH METAL LEADS, INCLUDING METAL LEADS FOR STACKED DIE PACKAGES, AND ASSOCIATED SYSTEMS AND METHODS - Microelectronic die packages, stacked systems of die packages, and methods of manufacturing them are disclosed herein. In one embodiment, a system of stacked packages includes a first die package having a bottom side, a first dielectric casing, and first metal leads; a second die package having a top side attached to the bottom side of the first package, a dielectric casing with a lateral side, and second metal leads aligned with and projecting towards the first metal leads and including an exterior surface and an interior surface region that generally faces the lateral side; and metal solder connectors coupling individual first leads to individual second leads. In a further embodiment, the individual second leads have an “L” shape and physically contact corresponding individual first leads. In another embodiment, the individual second leads have a “C” shape and include a tiered portion that projects towards the lateral side of the second casing. | 01-16-2014 |
20140021599 | THREE-DIMENSIONAL INTEGRATED CIRCUITS AND FABRICATION THEREOF - A three-dimensional integrated circuit is disclosed, including a first interposer including through substrate vias (TSV) therein and circuits thereon; a plurality of first active dies disposed on a first side of the first interposer, a plurality of first intermediate interposers, each including through substrate vias (TSV), disposed on the first side of the first interposer, and a second interposer including through substrate vias (TSV) therein and circuits thereon supported by the first intermediate interposers. | 01-23-2014 |
20140021600 | REDISTRIBUTION LAYER (RDL) WITH VARIABLE OFFSET BUMPS - An integrated circuit (IC) chip is disclosed including a plurality of metal vertical interconnect accesses (vias) in a back end of line (BEOL) layer, a redistribution layer (RDL) on the BEOL layer, the BEOL layer having a plurality of bond pads, each bond pad connected to at least one corresponding metal via through the RDL; and a solder bump connected to each bond pad, wherein each solder bump is laterally offset from the corresponding metal via connected to the bond pad towards a center of the IC chip by an offset distance, wherein the offset distance is non-uniform across the IC chip. In one embodiment, the offset distance for each solder bump is proportionate to a distance between the center of the IC chip and the center of the corresponding solder bump pad structure for that solder bump. | 01-23-2014 |
20140021601 | SEMICONDUCTOR MANUFACTURING METHOD AND SEMICONDUCTOR STRUCTURE THEREOF - A semiconductor manufacturing method includes providing a carrier; forming a first photoresist layer; forming plural core portions; removing the first photoresist layer; forming a second photoresist layer; forming a plurality of connection portions, each of the plurality of connection portions includes a first connection layer and a second connection layer and connects to each of the core portions to form a hybrid bump, wherein each of the first connection layers comprises a base portion, a projecting portion and an accommodating space, each base portion comprises an upper surface, each projecting portion is protruded to the upper surface and located on top of each core portion, each accommodating space is located outside each projecting portion, the second connection layers cover the projecting portions and the upper surfaces, and the accommodating spaces are filled by the second connection layers; removing the second photoresist layer to reveal the hybrid bumps. | 01-23-2014 |
20140021602 | SUBSTRATE FOR SEMICONDUCTOR PACKAGE AND SEMICONDUCTOR PACKAGE HAVING THE SAME - A substrate for a semiconductor package includes: a first dielectric having a first surface and a second surface which faces away from the first surface and possesses waveform shaped portions, and formed with first holes penetrating the first and second surfaces; and circuit traces formed over the second surface of the first dielectric and having waveform shaped portions disposed over the waveform shaped portions of the second surface of the first dielectric. The waveform shaped portions of the second surface of the first dielectric and the waveform shaped portions of the circuit traces form a stress-resistant structure. | 01-23-2014 |
20140021603 | USING AN INTERCONNECT BUMP TO TRAVERSE THROUGH A PASSIVATION LAYER OF A SEMICONDUCTOR DIE - A semiconductor die, which includes a first semiconductor device, a first passivation layer, and a first interconnect bump, is disclosed. The first passivation layer is over the first semiconductor device, which includes a first group of device fingers. The first interconnect bump is thermally and electrically connected to each of the first group of device fingers. Additionally, the first interconnect bump protrudes through a first opening in the first passivation layer. | 01-23-2014 |
20140021604 | INTEGRATED CIRCUIT DEVICES WITH BUMP STRUCTURES THAT INCLUDE A PROTECTION LAYER - Disclosed herein is a device that includes first and second spaced-apart conductive pads positioned in a layer of insulating material, first and second under-bump metallization layers that are conductively coupled to the first and second conductive pads, respectively, and first and second spaced-apart conductive bumps that are conductively coupled to the first and second under-bump metallization layers, respectively. Additionally, the device includes, among other things, a passivation layer positioned above the layer of insulating material between the first and second spaced-apart conductive bumps, and a protective layer positioned on the passivation layer, wherein the protective layer extends between and contacts the first and second under-bump metallization layers, the material of the protective layer being one of silicon dioxide, silicon oxyfluoride (SiOF), silicon nitride (SiN), and silicone carbon nitride (SiCN). | 01-23-2014 |
20140027900 | Bump Structure for Yield Improvement - A bump structure for electrically coupling semiconductor components is provided. The bump structure includes a first bump on a first semiconductor component and a second bump on a second semiconductor component. The first bump has a first non-flat portion (e.g., a convex projection) and the second bump has a second non-flat portion (e.g., a concave recess). The bump structure also includes a solder joint formed between the first and second non-flat portions to electrically couple the semiconductor components. | 01-30-2014 |
20140027901 | PACKAGE-ON-PACKAGE STRUCTURES HAVING BUFFER DAMS AND METHODS FOR FORMING THE SAME - A device includes a device die and a plurality of metal posts at a surface of the device die and electrically coupled to the device die. The device further includes a plurality of through-assembly vias (TAVs), a dam member between the device die and the plurality of TAVs, and a polymer layer encompassing the device die, the plurality of metal posts, the plurality of TAVs, and the dam member. | 01-30-2014 |
20140027902 | REPAIRING ANOMALOUS STIFF PILLAR BUMPS - Generally, the subject matter disclosed herein relates to repairing anomalous stiff pillar bumps that may be detected above a metallization system of a semiconductor chip or wafer. One illustrative method disclosed herein includes, among other things, forming a pillar bump above a metallization system of a semiconductor chip, and forming a plurality of notches in the pillar bump, wherein the plurality of notches are adapted to adjust a flexibility of the pillar bump when the pillar bump is exposed to a lateral force. | 01-30-2014 |
20140027903 | Semiconductor Package Including an Integrated Waveguide - Methods and apparatus are disclosed for wirelessly communicating among integrated circuits and/or functional modules within the integrated circuits. A semiconductor device fabrication operation uses a predetermined sequence of photographic and/or chemical processing steps to form one or more functional modules onto a semiconductor substrate. The functional modules are coupled to an integrated waveguide that is formed onto the semiconductor substrate and/or attached thereto to form an integrated circuit. The functional modules communicate with each other as well as to other integrated circuits using a multiple access transmission scheme via the integrated waveguide. One or more integrated circuits may be coupled to an integrated circuit carrier to form Multichip Module. The Multichip Module may be coupled to a semiconductor package to form a packaged integrated circuit. | 01-30-2014 |
20140027904 | SEMICONDUCTOR DEVICE - A semiconductor device | 01-30-2014 |
20140027905 | SEMICONDUCTOR PACKAGE STRUCTURE AND METHOD FOR MAKING THE SAME - A semiconductor package structure includes a first substrate, a second substrate and an encapsulant. The first substrate comprises a plurality of first bumps and a plurality of first solder layers. Each of the first solder layers is formed on each of the first bumps and comprises a cone-shaped slot having an inner surface. The second substrate comprises a plurality of second bumps and a plurality of second solder layers. Each of the second solder layers is formed on each of the second bumps and comprises an outer surface. Each of the second solder layers is a cone-shaped body. The second solder layer couples to the first solder layer and is accommodated within the first solder layer. The inner surface of the cone-shaped slot contacts with the outer surface of the second solder layer. The encapsulant is formed between the first substrate and the second substrate. | 01-30-2014 |
20140035125 | SEMICONDUCTOR MANUFACTURING METHOD, SEMICONDUCTOR STRUCTURE AND PACKAGE STRUCTURE THEREOF - A semiconductor manufacturing method includes providing a carrier having a metallic layer, wherein the metallic layer comprises a plurality of base areas and a plurality of outer lateral areas; forming a first photoresist layer; forming a plurality of bearing portions; removing the first photoresist layer to reveal the bearing portions, each bearing portion comprises a bearing surface having a first area and a second area; forming a second photoresist layer for revealing the first areas of the bearing surfaces; forming a plurality of connection portions, wherein the first areas of the bearing surfaces are covered by the connection portions to make each connection portion connect with each bearing portion to form a snap bump; removing the outer lateral areas of the metallic layer to make the base areas form a plurality of under bump metallurgy layers. | 02-06-2014 |
20140035126 | SEMICONDUCTOR MANUFACTURING METHOD AND SEMICONDUCTOR STRUCTURE THEREOF - A semiconductor manufacturing method includes providing a substrate having a metallic layer that includes a first metal layer and a second metal layer, the first metal layer comprises plural base areas and plural first outer lateral areas, the second metal layer comprises plural second base areas and plural second outer lateral areas; forming a first photoresist layer; forming plural bearing portions; removing the first photoresist layer; forming a second photoresist layer; forming plural connection portions, each connection portion comprises a first connection layer and a second connection layer; removing the second photoresist layer to reveal the connection portions and the bearing portions; removing the first outer lateral areas; reflowing the second connection layers to form plural composite bumps; removing the second outer lateral areas to make the first base areas and the second base areas form plural under bump metallurgy layers. | 02-06-2014 |
20140035127 | CHIP PACKAGE AND A METHOD FOR MANUFACTURING A CHIP PACKAGE - A method for manufacturing a chip package is provided. The method includes: forming an electrically insulating material over a chip side; selectively removing at least part of the electrically insulating material thereby forming a trench in the electrically insulating material, depositing electrically conductive material in the trench wherein the electrically conductive material is electrically connected to at least one contact pad formed over the chip side; forming an electrically conductive structure over the electrically insulating material, wherein at least part of the electrically conductive structure is in direct physical and electrical connection with the electrically conductive material; and depositing a joining structure over the electrically conductive structure. | 02-06-2014 |
20140035128 | SEMICONDUCTOR SEAL RING - Among other things, a semiconductor seal ring and method for forming the same are provided. The semiconductor seal ring comprises a plurality of dielectric layers formed over a semiconductor substrate upon which a semiconductor device is formed. A plurality of conductive layers is arranged among at least some of the plurality of dielectric layers. An upper conductive layer is formed over the plurality of dielectric layers. An upper passivation layer is formed over the upper conductive layer to isolate the upper conductive layer from conductive debris resulting from a die saw process along a die saw cut line. In an example, a first columnar region comprising a first portion of the conductive layers is electrically isolated from the semiconductor device because the first columnar region is disposed relatively close to the die saw cut line and thus can be exposed to conductive debris which can cause undesired short circuits. | 02-06-2014 |
20140035129 | THIN INTEGRATED CIRCUIT CHIP-ON-BOARD ASSEMBLY AND METHOD OF MAKING - An integrated circuit assembly includes an insulating layer having a having a first surface and a second surface, where the first surface of the insulating layer is less than 10 microns below an upper plane of the integrated circuit assembly. An active layer contacts the first surface of the insulating layer. A metal bond pad is electrically connected to the active layer and formed on the second surface of the insulating layer, and is also electrically connected to a printed circuit board. A method of fabricating an integrated circuit assembly includes coupling a handle wafer to the active layer of a semiconductor-on-insulator wafer, removing the substrate of the semiconductor-on-insulator, forming a bond pad connecting to the active layer on the exposed insulator surface, bonding the bond pad to a printed circuit board using a solder bump, and removing the handle wafer. | 02-06-2014 |
20140035130 | PACKAGING METHOD USING SOLDER COATING BALL AND PACKAGE MANUFACTURED THEREBY - Disclosed herein a packaging method including: (A) forming a plurality of pads and another circuit pattern on a substrate; (B) forming a second dry film pattern including opening exposing the pad; (C) mounting a solder coating ball in the opening of the second dry film pattern; (D) performing a reflow process on the solder coating ball in order to allow the solder coating ball to have a modified pattern; (E) delaminating the second dry film pattern; and (F) forming a solder pattern including the modified pattern of the solder coating ball in a solder to mount a chip on the substrate using the solder pattern. | 02-06-2014 |
20140035131 | SEMICONDUCTOR DEVICES HAVING MULTI-BUMP ELECTRICAL INTERCONNECTIONS AND METHODS FOR FABRICATING THE SAME - A method may include providing a substrate including a chip pad, forming on the substrate a solder stack including at least two solder layers which are stacked and at least one intermediate layer interposed between the at least two solder layers. The solder stack can be reflowed to form a bump stack that is electrically connected to the chip pad. The bump stack may include at least two solder bumps which are stacked and the at least one intermediate layer interposed between the at least two solder bumps. Related structures are also disclosed. | 02-06-2014 |
20140035132 | SURFACE MOUNT CHIP - A surface mount chip including, on the side of a surface, first and second pads of connection to an external device, wherein, in top view, the first pad has an elongated general shape, and the second pad is a point-shaped pad which is not aligned with the first pad. | 02-06-2014 |
20140035133 | SEMICONDUCTOR PACKAGE CONTAINING SILICON-ON-INSULATOR DIE MOUNTED IN BUMP-ON-LEADFRAME MANNER TO PROVIDE LOW THERMAL RESISTANCE - Thermal transfer from a silicon-on-insulator (SOI) die is improved by mounting the die in a bump-on-leadframe manner in a semiconductor package, with solder or other metal bumps connecting the active layer of the SOI die to metal leads used to mount the package on a printed circuit board or other support structure. | 02-06-2014 |
20140035134 | DENSE INTERCONNECT WITH SOLDER CAP (DISC) FORMATION WITH LASER ABLATION AND RESULTING SEMICONDUCTOR STRUCTURES AND PACKAGES - Dense interconnect with solder cap (DISC) formation with laser ablation and resulting semiconductor structures and packages are described. For example, a method of fabricating a semiconductor structure includes forming an insulative material stack above a plurality of solder bump landing pads. The solder bump landing pads are above an active side of a semiconductor die. A plurality of trenches is formed in the insulative material stack by laser ablation to expose a corresponding portion of each of the plurality of solder bump landing pads. A solder bump is formed in each of the plurality of trenches. A portion of the insulative material stack is then removed. | 02-06-2014 |
20140042614 | UNDERFILL - An integrated circuit includes a substrate and at least one chip. Each chip is disposed over the substrate or the other chip. Solder bumps are disposed between the substrate and the at least one chip. An insulating film is disposed around the solder bumps and provides electrical insulation for the solder bumps except areas for interconnections. A thermally conductive underfill is disposed between the substrate, the at least one chip, and the solder bumps. | 02-13-2014 |
20140042615 | FLIP-CHIP PACKAGE - An exemplary flip-chip package is provided, including: a package structure having a first bonding pad and a second bonding pad formed thereon, wherein the first bond pad has a feature size different from a feature size of the second bond pad; a semiconductor chip facing the package structure, having a first under bump metal (UBM) layer and a second under bump metal (UBM) layer formed thereon, wherein the first UBM layer has a feature size different from a feature size of the second UBM layer; a first conductive element disposed between the first bond pad and the first UBM layer; and a second conductive element disposed between the second bond pad and the second UBM layer. | 02-13-2014 |
20140042616 | SEMICONDUCTOR DEVICE - There is provided a semiconductor device. The semiconductor device includes: a silicon substrate; a copper post connected to one surface of the silicon substrate; a semiconductor element having a linear expansion coefficient different from that of the silicon substrate; a metal layer provided between the semiconductor element and the silicon substrate to cover the copper post; a first alloy layer provided between the copper post and the semiconductor element, wherein the first alloy layer includes alloy of gold and a metal of the metal layer; and a second alloy layer provided between the metal layer and the semiconductor element, wherein the second alloy layer includes alloy of gold and the metal of the metal layer. | 02-13-2014 |
20140042617 | SEMICONDUCTOR DEVICE HAVING PENETRATION ELECTRODE - Disclosed herein is a semiconductor device that includes: a semiconductor substrate including first and second surfaces opposed to each other, a plurality of penetration electrodes each penetrating between the first and second surfaces and a plurality of first metal films each surrounding an associated one of the penetration electrodes with an intervention of an insulating film; and a wiring structure formed on a side of the first surface of the semiconductor substrate, the wiring structure including a plurality of wirings each electrically connected to an associated one of the penetration electrodes. | 02-13-2014 |
20140042618 | METHODS FOR FORMING A SEMICONDUCTOR STRUCTURE AND RELATED STRUCTURES - Methods of forming a Ni material on a bond pad are disclosed. The methods include forming a dielectric material over a bond pad, forming an opening within the dielectric material to expose the bond pad, curing the dielectric material to form a surface of the dielectric material having a steep curvilinear profile, and forming a nickel material over the at least one bond pad. The dielectric material having a steep curvilinear profile may be formed by altering at least one of a curing process of the dielectric material and a thickness of the dielectric material. The dielectric material may be used to form a relatively thick Ni material on bond pads smaller than about 50 μm. Semiconductor structures formed by such methods are also disclosed. | 02-13-2014 |
20140042619 | SEMICONDUCTOR DEVICE HAVING UNDER-BUMP METALLIZATION (UBM) STRUCTURE AND METHOD OF FORMING THE SAME - A semiconductor device comprises a semiconductor substrate, an under-bump metallization (UBM) structure overlying the semiconductor substrate, and a solder bump overlying and electrically connected to the UBM structure. The UBM structure comprises a copper-containing metallization layer, a nickel-containing metallization layer, and a first intermetallic compound (IMC) layer between the copper-containing metallization layer and the nickel-containing metallization layer. The first IMC layer is in direct contact with the copper-containing metallization layer and the nickel-containing metallization layer. | 02-13-2014 |
20140042620 | STACKED MULTILAYER STRUCTURE AND MANUFACTURING METHOD THEREOF - A stacked multilayer structure according to an embodiment of the present invention comprises: a stacked layer part including a plurality of conducting layers and a plurality of insulating layers, said plurality of insulating layers being stacked alternately with each layer of said plurality of conducting layers, one of said plurality of insulating layers being a topmost layer among said plurality of conducting layers and said plurality of insulating layers; and a plurality of contacts, each contact of said plurality of contacts being formed from said topmost layer and each contact of said plurality of contacts being in contact with a respective conducting layer of said plurality of conducting layers, a side surface of each of said plurality of contacts being insulated from said plurality of conducting layers via an insulating film. | 02-13-2014 |
20140048926 | SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME - A semiconductor package includes a passivation layer overlying a semiconductor substrate, a bump overlying the passivation layer, and a molding compound layer overlying the passivation layer and covering a lower portion of the bump. A sidewall of the passivation layer is covered by the molding compound layer. | 02-20-2014 |
20140048927 | METHOD TO IMPROVE FINE CU LINE RELIABILITY IN AN INTEGRATED CIRCUIT DEVICE - Structure and methods for forming a semiconductor structure. The semiconductor structure includes a plurality of layers comprising at least one copper interconnect layer. The copper interconnect layer provides an electrical conduit between one of physically adjacent layers in the semiconductor structure and an integrated circuit in the semiconductor structure and an electronic device. A plurality of studs is positioned within the at least one copper interconnect layer. The studs are spaced apart by a distance less than or equal to a Blech length of the at least one copper interconnect layer. The Blech length is a length below which damage due to electromigration of metal atoms within the at least one copper interconnect layer does not occur. The plurality of studs comprises copper atom diffusion barriers. | 02-20-2014 |
20140048928 | Multi-Chip Module with Multiple Interposers - A Multi-Chip Module is presented herein that comprises a package substrate, at least two integrated circuit devices, each of which is electrically coupled to the package substrate, and an interposer. Formed in the interposer are electrical connections which are predominantly horizontal interconnects. The first interposer is arranged to electrically couple the two integrated circuit devices to each other. Methods for manufacturing a Multi-Chip Module are also presented herein. | 02-20-2014 |
20140048929 | Bonded Structures for Package and Substrate - The embodiments described provide elongated bonded structures near edges of packaged structures free of solder wetting on sides of copper posts substantially facing the center of the packaged structures. Solder wetting occurs on other sides of copper posts of these bonded structures. The elongated bonded structures are arranged in different arrangements and reduce the chance of shorting between neighboring bonded structures. In addition, the elongated bonded structures improve the reliability performance. | 02-20-2014 |
20140048930 | CONDUCTIVE BUMP, SEMICONDUCTOR CHIP AND STACKED SEMICONDUCTOR PACKAGE USING THE SAME - A conductive bump includes a step member formed to form a step on a portion of a connection pad; and a conductive member formed on the connection pad and the step member and having an inclined surface which is inclined with respect to the connection pad. | 02-20-2014 |
20140048931 | SOLDER ON TRACE TECHNOLOGY FOR INTERCONNECT ATTACHMENT - A solder on trace device includes a conductive trace on a semiconductor substrate surface. The conductive trace has a sidewall and a bonding surface. The solder on trace device also includes a passivation layer on at least one end of the conductive trace. The solder on trace device further includes a pre-solder material on the sidewall and the bonding surface of the conductive trace. | 02-20-2014 |
20140048932 | Semiconductor Device and Method of Dual-Molding Die Formed on Opposite Sides of Build-Up Interconnect Structure - A semiconductor device has a first interconnect structure. A first semiconductor die has an active surface oriented towards and mounted to a first surface of the first interconnect structure. A first encapsulant is deposited over the first interconnect structure and first semiconductor die. A second semiconductor die has an active surface oriented towards and mounted to a second surface of the first interconnect structure opposite the first surface. A plurality of first conductive pillars is formed over the second surface of the first interconnect structure and around the second semiconductor die. A second encapsulant is deposited over the second semiconductor die and around the plurality of first conductive pillars. A second interconnect structure including a conductive layer and bumps are formed over the second encapsulant and electrically connect to the plurality of first conductive pillars and the first and second semiconductor die. | 02-20-2014 |
20140048933 | SEMICONDUCTOR DEVICE INCLUDING A BUFFER LAYER STRUCTURE FOR REDUCING STRESS - A semiconductor device includes a semiconductor chip, wiring that is included in the semiconductor chip and has a coupling part between parts with different widths, a pad being formed above the wiring and in a position overlapping the coupling part, a bump being formed on the pad, a buffer layer being formed in a position between the coupling part and the pad so as to cover the entire coupling part, and inorganic insulating layers being formed between the wiring and the buffer layer and between the buffer layer and the pad, respectively. The buffer layer is made of a material other than resin and softer than the inorganic insulating layer | 02-20-2014 |
20140054763 | THIN WAFER HANDLING AND KNOWN GOOD DIE TEST METHOD - A method of attaching a microelectronic element to a substrate can include aligning the substrate with a microelectronic element, the microelectronic element having a plurality of spaced-apart electrically conductive bumps each including a bond metal, and reflowing the bumps. The bumps can be exposed at a front surface of the microelectronic element. The substrate can have a plurality of spaced-apart recesses extending from a first surface thereof. The recesses can each have at least a portion of one or more inner surfaces that are non-wettable by the bond metal of which the bumps are formed. The reflowing of the bumps can be performed so that at least some of the bond metal of each bump liquefies and flows at least partially into one of the recesses and solidifies therein such that the reflowed bond material in at least some of the recesses mechanically engages the substrate. | 02-27-2014 |
20140054764 | SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME - A semiconductor package includes a semiconductor substrate, a contact pad overlying the semiconductor substrate, an interconnect layer overlying the contact pad, a passivation layer formed between the contact pad and the interconnect layer, a bump overlying the interconnect layer, and a protection layer overlying the interconnect layer and the passivation layer and covering a lower portion of the bump. The protection layer includes a curved surface region. | 02-27-2014 |
20140054765 | DRIVING CHIP AND METHOD OF MANUFACTURING THE SAME - A driving chip and a method of manufacturing the driving chip are disclosed. In one aspect, the method includes forming an inside metal portion of a connection terminal on a base element by patterning a first metal layer; forming a first insulating layer on the inside metal portion of the connection terminal; forming an inside metal portion of a dummy terminal on the first insulating layer by patterning a second metal layer; and forming a bump portion on the inside metal portion of the connection terminal and on a second metal portion of the dummy terminal. The driving chip may suppress warp transformation or pressure mark of the driving chip and thus, the reliability of the driving chip may be improved. | 02-27-2014 |
20140054766 | LEAD-FREE SOLDER BUMP BONDING STRUCTURE - According to a lead-free solder bump bonding structure, by causing the interface (IMC interface) of the intermetallic compound layer at a lead-free-solder-bump side to have scallop shapes of equal to or less than 0.02 [portions/μm] without forming in advance an Ni layer as a barrier layer on the surfaces of respective Cu electrodes of first and second electronic components like conventional technologies, a Cu diffusion can be inhibited, thereby inhibiting an occurrence of an electromigration. Hence, the burden at the time of manufacturing can be reduced by what corresponds to an omission of the formation process of the Ni layer as a barrier layer on the Cu electrode surfaces, and thus a lead-free solder bump bonding structure can be provided which reduces a burden at the time of manufacturing in comparison with conventional technologies and which can inhibit an occurrence of an electromigration. | 02-27-2014 |
20140054767 | TERMINAL STRUCTURE AND SEMICONDUCTOR DEVICE - The present invention relates to a terminal structure comprising; a base material | 02-27-2014 |
20140054768 | TERMINAL STRUCTURE AND SEMICONDUCTOR DEVICE - The present invention relates to a terminal structure comprising: a base material | 02-27-2014 |
20140054769 | TERMINAL STRUCTURE, AND SEMICONDUCTOR ELEMENT AND MODULE SUBSTRATE COMPRISING THE SAME - A preferred terminal structure comprises a base material; an electrode formed on the base material; an insulating covering layer formed on the base material and on the electrode and having an opening exposing at least part of the electrode; an under bump metal layer containing Ni, filling the opening on the electrode; and a dome-shaped bump containing Sn and Ti, covering the under bump metal layer, wherein at least part of the under bump metal layer has a portion sandwiched between the external electrode and the insulating covering layer. | 02-27-2014 |
20140054770 | TERMINAL STRUCTURE, AND SEMICONDUCTOR ELEMENT AND MODULE SUBSTRATE COMPRISING THE SAME - A preferred terminal structure comprises a base material; an electrode formed on the base material; an insulating covering layer formed on the base material and on the electrode and having an opening exposing at least part of the electrode; an under bump metal layer containing Ni, formed in a region in the opening on the electrode so that an upper surface of the metal layer is at a position lower than an upper surface of the insulating covering layer in a peripheral edge portion of the opening; and a dome-shaped bump containing Sn and Ti, formed in a region in the opening on the under bump metal layer, wherein an end portion of a boundary between the under bump metal layer and the bump is in contact with an inner wall of the opening portion in the insulating covering layer. | 02-27-2014 |
20140054771 | Method for Self-Assembly of Substrates and Devices Obtained Thereof - A method for defining regions with different surface liquid tension properties on a substrate is disclosed. The method includes: providing a substrate with a main surface having a first surface liquid tension property that is at least partially covered with a seed layer; forming at least one micro-bump on the seed layer leaving part of the seed layer exposed; patterning the exposed seed layer to expose part of the main surface; forming at least one closed-loop structure that encloses a region of the main surface and the at least one micro-bump; and chemically treating the main surface of the substrate to provide on a surface of at least one closed-loop structure and the at least one micro-bump a second surface liquid tension property. The second surface liquid tension property is substantially different from the first surface liquid tension property of the main surface and is liquid phobic. | 02-27-2014 |
20140061896 | Die Underfill Structure And Method - A method of attaching an IC wafer having a plurality of copper pillars (“CuP's) projecting from one face thereof to a substrate having a plurality of contact pads on one face thereof including applying a film having a substantial amount of filler particles therein to the one face of the wafer; applying an a-stage resin having substantially no filler particles therein to the one face of the substrate; and interfacing the film with the a-stage resin. | 03-06-2014 |
20140061897 | Bump Structures for Semiconductor Package - A package structure includes a first substrate bonded to a second substrate by connecting metal pillars on the first substrate to connectors on the second substrate. A first metal pillar is formed overlying and electrically connected to a metal pad on a first region of the first substrate, and a second metal pillar is formed overlying a passivation layer in a second region of the first substrate. A first solder joint region is formed between metal pillar and the first connector, and a second solder joint region is formed between the second metal pillar and the second connector. The thickness of the first metal pillar is greater than the thickness of the second metal pillar. | 03-06-2014 |
20140061898 | Metal Pads with Openings in Integrated Circuits - A device includes a metal pad, and a passivation layer including portions overlapping edge portions of the metal pad. A Post-Passivation-Interconnect (PPI) includes a trace portion overlying the passivation layer, and a pad portion connected to the trace portion. A polymer layer includes an upper portion over the PPI, and a plug portion extending into, and encircled by, the pad portion of the PPI. | 03-06-2014 |
20140061899 | WAFER LEVEL PACKAGE STRUCTURE AND MANUFACTURING METHOD OF THE SAME - The present invention provides a semiconductor package structure, which includes a die, a plurality of bonding wires, an encapsulant, and a plurality of first external terminals. The die has an active surface and a back surface. A first end of each of the bonding wires is connected to the back surface of the die, and a second end opposite to the first end is electrically connected to the active surface of the die. The encapsulant covers the back surface of the die and the bonding wires, wherein a portion of each of the bonding wires is exposed from the encapsulant. The first external terminals are disposed on the top surface of the encapsulant, and cover the exposed portions of the bonding wires respectively and are electrically connected to the bonding wires. | 03-06-2014 |
20140061900 | SEMICONDUCTOR PACKAGE WITH IMPROVED REDISTRIBUTION LAYER DESIGN AND FABRICATING METHOD THEREOF - A semiconductor package with improved redistribution layer design and fabricating method thereof are disclosed and may include a semiconductor die comprising bond pads, a first redistribution layer (RDL) formed on the semiconductor die. The first RDL has a first end coupled to a bond pad and a second end coupled to a solder bump via under bump metal layers. A second RDL is formed in a same plane of the semiconductor die as the first RDL and is electrically isolated from the first RDL. A first end of the second RDL may be coupled to a bond pad and the second RDL may pass underneath, but be electrically isolated from, the solder bump. A passivation layer may be formed on the first and second RDLs exposing the second end of the first RDL. The under bump metal layers may be formed on the second end of the first RDL exposed by the passivation layer. | 03-06-2014 |
20140061901 | Precise-Aligned Lock-And-Key Bonding Structures - Copper (Cu)-to-Cu bonding techniques are provided. In one aspect, a bonding method is provided. The method includes the following steps. A first bonding structure is provided having at least one copper pad embedded in a first insulator and at least one via in the first insulator over the copper pad, wherein the via has tapered sidewalls. A second bonding structure is provided having at least one copper stud embedded in a second insulator, wherein a portion of the copper stud is exposed for bonding and has a domed shape. The first bonding structure is bonded to the second bonding structure by way of a copper-to-copper bonding between the copper pad and the copper stud, wherein the via and the copper stud fit together like a lock-and-key. A bonded structure is also provided. | 03-06-2014 |
20140070401 | EXTRUSION-RESISTANT SOLDER INTERCONNECT STRUCTURES AND METHODS OF FORMING - Various embodiments include methods of forming interconnect structures, and the structures formed by such methods. In one embodiment, a method can include: providing a precursor interconnect structure having: a photosensitive polyimide (PSPI) layer; a controlled collapse chip connection (C4) bump overlying the PSPI layer; and a solder overlying the C4 bump and contacting a side of the C4 bump. The method can further include recessing a portion of the PSPI layer adjacent to the C4 bump to form a PSPI pedestal under the C4 bump. The method can additionally include forming an underfill abutting the PSPI pedestal and the C4 bump, wherein the underfill and the solder form an interface separated from the PSPI pedestal. | 03-13-2014 |
20140070402 | Stress Reduction Apparatus - A structure comprises a plurality of connectors formed on a top surface of a first semiconductor die, a second semiconductor die formed on the first semiconductor die and coupled to the first semiconductor die through the plurality of connectors and a first dummy conductive plane formed between an edge of the first semiconductor die and the plurality of connectors, wherein an edge of the first dummy conductive plane and a first distance to neutral point (DNP) direction form a first angle, and wherein the first angle is less than or equal to 45 degrees. | 03-13-2014 |
20140070403 | Packaging Methods and Packaged Devices - Packaging methods and packaged devices are disclosed. In one embodiment, a method of packaging a semiconductor device includes forming a first redistribution layer (RDL) over a carrier, and forming a plurality of through assembly vias (TAVs) over the first RDL. An integrated circuit die is coupled over the first RDL, and a molding compound is formed over the first RDL, the TAVs, and the integrated circuit die. A second RDL is formed over the molding compound, the TAVs, and the integrated circuit die. | 03-13-2014 |
20140070404 | SEMICONDUCTOR PACKAGE STRUCTURE AND INTERPOSER THEREFOR - An interposer for a semiconductor package structure includes a base substrate, a plurality of passive devices formed on the base substrate, and an identification (ID) code. The base substrate includes a first surface and an opposite second surface. The ID code is formed on the first surface or the second surface of the base substrate. | 03-13-2014 |
20140070405 | STACKED SEMICONDUCTOR DEVICES WITH A GLASS WINDOW WAFER HAVING AN ENGINEERED COEFFICIENT OF THERMAL EXPANSION AND METHODS OF MAKING SAME - One illustrative device disclosed herein includes a device substrate having a plurality of first die formed adjacent a front side of the device substrate, a glass window wafer attached to a back side of the device substrate, wherein the glass window wafer has a plurality of openings formed therein and a coefficient of thermal expansion that is within plus or minus 200-500% of the coefficient of thermal expansion of the device wafer, and a plurality of second die, each of which is positioned in one of the openings in the glass window wafer and electrically coupled to one of the first die. | 03-13-2014 |
20140070406 | Devices and Methods for 2.5D Interposers - Polyimide-based redistribution layers (RDLs) can be employed to reduce thermo-mechanical stress that is exerted on conductive interconnections bonded to interposers in 2.5 D semiconductor packaging configurations. The polyimide-based RDL is located on an upper or lower face of an interposer. Additionally, height differentials between laterally adjacent semiconductor dies in 2.5 D semiconductor packages can be reduced or eliminated by using different diameter micro-bumps, different height copper pillars, or a multi-tiered interposer to lower taller semiconductor dies in relation to shorter semiconductor dies. | 03-13-2014 |
20140070407 | SEMICONDUCTOR PACKAGE AND METHOD OF FABRICATING THE SAME - According to example embodiments, a semiconductor package includes: a lower molding element; a lower semiconductor chip in the lower molding element and having lower chip pads on an upper surface and at an areas close to first and second sides of the lower molding element; conductive pillars surrounding the lower semiconductor chip and passing through the lower molding element; an upper semiconductor chip on the upper surface of the lower molding element and lower semiconductor chip, the upper semiconductor chip having upper chip pads on a top surface and at areas close to third and the fourth sides of the upper semiconductor chip, and a connecting structure on the lower molding element and the upper semiconductor chip and electrically connecting each of the lower chip pads and upper chip pads to a corresponding conductive pillar. The upper semiconductor chip is substantially orthogonal to the lower semiconductor chip. | 03-13-2014 |
20140070408 | Plating Structure For Wafer Level Packages - A plating structure for wafer level packages are disclosed and may include a semiconductor wafer comprising a plurality of semiconductor die and a plating structure for forming an under bump metal on redistribution layers on the plurality of semiconductor die. The plating structure may comprise a plating connection line around a periphery of the semiconductor wafer, and a plating bar coupling the plating connection line to plating traces on the plurality of semiconductor die. The plating traces may be electrically coupled to the redistribution layers on the plurality of semiconductor die. The semiconductor wafer may comprise a reconstituted wafer of said semiconductor die. The semiconductor wafer may comprise a wafer prior to singulating the plurality of semiconductor die. The plating bar may be located in a sawing line for the singulating of the plurality of semiconductor die. A passivation layer may cover the redistribution layer and the plating traces. | 03-13-2014 |
20140070409 | SEMICONDUCTOR DEVICE AND SEMICONDUCTOR ASSEMBLY WITH LEAD-FREE SOLDER - A semiconductor device includes a semiconductor substrate, a pad region on the semiconductor substrate, a passivation layer over the semiconductor substrate and at least a portion of the pad region, and a bump structure overlying the pad region. The passivation layer has an opening defined therein to expose at least another portion of the pad region. The bump structure is electrically connected to the pad region via the opening. The bump structure includes a copper layer and a SnAg layer overlying the copper layer. The SnAg layer has a melting temperature higher than the eutectic temperature of Sn and Ag. | 03-13-2014 |
20140070410 | Semiconductor Device and Method of Forming Multi-Layered UBM with Intermediate Insulating Buffer Layer to Reduce Stress for Semiconductor Wafer - A semiconductor wafer has a contact pad. A first insulating layer is formed over the wafer. A second insulating layer is formed over the first insulating layer and contact pad. A portion of the second insulating layer is removed to expose the contact pad. A first UBM layer is formed over and follows a contour of the second insulating layer and contact pad to create a well over the contact pad. A first buffer layer is formed in the well over the first UBM layer and the contact pad. A second UBM layer is formed over the first UBM layer and first buffer layer. A third UBM layer is formed over the second UBM layer. A bump is formed over the third UBM layer. The first buffer layer reduces stress on the bump and contact pad. A second buffer layer can be formed between the second and third UBM layers. | 03-13-2014 |
20140070411 | SEMICONDUCTOR DEVICE - Provided is a semiconductor device in which a semiconductor element mounted on a wiring substrate is placed in a hollow portion, the hollow portion being formed by the wiring substrate, a protective member, and a wall member, with the wiring substrate, the protective member, and the wall member being a bottom surface, a top surface, and side surfaces thereof, respectively. The wall member has a vent hole provided therein, which communicates the hollow portion to/from the outside, and the vent hole includes a pillar member formed of a material having a linear expansion coefficient which is smaller than that of the wall member. Therefore, airtightness of the hollow portion is maintained to prevent entry of foreign matters at ordinary temperature, and vapor pressure in the hollow portion is relieved when heated. | 03-13-2014 |
20140077355 | THREE-DIMENSIONAL SEMICONDUCTOR PACKAGE DEVICE HAVING ENHANCED SECURITY - A semiconductor package device that includes an integrated circuit device package having a storage circuitry is disclosed. In an implementation, the semiconductor package device includes a semiconductor substrate having a first surface and a second surface. The semiconductor substrate includes one or more integrated circuits formed proximal to (e.g., adjacent to, in, or on) the first surface. The semiconductor package device also includes an integrated circuit device disposed over the second surface, the integrated circuit device including storage circuitry for storing sensitive data. In one or more implementations, the semiconductor package device includes a through-substrate via that furnishes an electrical connection to the integrated circuit package. The semiconductor package device also includes an encapsulation structure disposed over the second surface and at least substantially encapsulates the integrated circuit device package. | 03-20-2014 |
20140077356 | Post Passivation Interconnect Structures and Methods for Forming the Same - A device includes a metal pad, a passivation layer overlapping edge portions of the metal pad, and a first polymer layer over the passivation layer. A Post-Passivation-Interconnect (PPI) has a level portion overlying the first polymer layer, and a plug portion that has a top connected to the level portion. The plug portion extends into the first polymer layer. A bottom surface of the plug portion is in contact with a dielectric material. A second polymer layer is overlying the first polymer layer. | 03-20-2014 |
20140077357 | CIRCUIT SUBSTRATE AND PROCESS FOR FABRICATING THE SAME - A circuit substrate includes a dielectric layer and a plurality of conductive structures. The dielectric layer has a plurality of conductive openings, a first surface, and a second surface opposite to the first surface. Each of the conductive openings connects the first surface and the second surface. The conductive openings are respectively filled with the conductive structures. Each of the conductive structures is integrally formed and includes a pad part, a connection part, and a protruding part. Each of the connection parts is connected to the corresponding pad part and the corresponding protruding part. Each of the protruding parts has a curved surface that protrudes from the second surface. A process for fabricating the circuit substrate is also provided. | 03-20-2014 |
20140077358 | Bump Structure and Method of Forming Same - An embodiment bump on trace (BOT) structure includes a contact element supported by an integrated circuit, an under bump metallurgy (UBM) feature electrically coupled to the contact element, a metal bump on the under bump metallurgy feature, and a substrate trace on a substrate, the substrate trace coupled to the metal bump through a solder joint and intermetallic compounds, a ratio of a first cross sectional area of the intermetallic compounds to a second cross sectional area of the solder joint greater than forty percent. | 03-20-2014 |
20140077359 | Ladder Bump Structures and Methods of Making Same - An embodiment ladder bump structure includes an under bump metallurgy (UBM) feature supported by a substrate, a copper pillar mounted on the UBM feature, the copper pillar having a tapering curved profile, which has a larger bottom critical dimension (CD) than a top critical dimension (CD) in an embodiment, a metal cap mounted on the copper pillar, and a solder feature mounted on the metal cap. | 03-20-2014 |
20140077360 | Interconnection Structure and Method of Forming Same - An embodiment bump on trace (BOT) structure includes a contact element supported by an integrated circuit, an under bump metallurgy (UBM) feature electrically coupled to the contact element, a metal ladder bump mounted on the under bump metallurgy feature, the metal ladder bump having a first tapering profile, and a substrate trace mounted on a substrate, the substrate trace having a second tapering profile and coupled to the metal ladder bump through direct metal-to-metal bonding. An embodiment chip-to-chip structure may be fabricated in a similar fashion. | 03-20-2014 |
20140077361 | Semiconductor Device and Method of Forming Build-Up Interconnect Structures Over Carrier for Testing at Interim Stages - A semiconductor device has a first interconnect structure formed over the carrier. A semiconductor die is disposed over the first interconnect structure after testing the first interconnect structure to be known good. The semiconductor die in a known good die. A vertical interconnect structure, such as a bump or stud bump, is formed over the first interconnect structure. A discrete semiconductor device is disposed over the first interconnect structure or the second interconnect structure. An encapsulant is deposited over the semiconductor die, first interconnect structure, and vertical interconnect structure. A portion of the encapsulant is removed to expose the vertical interconnect structure. A second interconnect structure is formed over the encapsulant and electrically connected to the vertical interconnect structure. The first interconnect structure or the second interconnect structure includes an insulating layer with an embedded glass cloth, glass cross, filler, or fiber. | 03-20-2014 |
20140077362 | Semiconductor Device and Method of Forming Dual-Sided Interconnect Structures in FO-WLCSP - A semiconductor device has a substrate with first and second conductive layers formed over first and second opposing surfaces of the substrate. A plurality of bumps is formed over the substrate. A semiconductor die is mounted to the substrate between the bumps. An encapsulant is deposited over the substrate and semiconductor die. A portion of the bumps extends out from the encapsulant. A portion of the encapsulant is removed to expose the substrate. An interconnect structure is formed over the encapsulant and semiconductor die and electrically coupled to the bumps. A portion of the substrate can be removed to expose the first or second conductive layer. A portion of the substrate can be removed to expose the bumps. The substrate can be removed and a protection layer formed over the encapsulant and semiconductor die. A semiconductor package is disposed over the substrate and electrically connected to the substrate. | 03-20-2014 |
20140077363 | Semiconductor Device and Method of Forming Dual-Sided Interconnect Structures in Fo-WLCSP - A semiconductor device has a substrate including first and second conductive layers formed over first and second opposing surfaces of the substrate. A plurality of wire studs or stud bumps is formed over the substrate. A semiconductor die is mounted to the substrate between the wire studs. A first encapsulant is deposited around the semiconductor die. A first interconnect structure is formed over the semiconductor die and first encapsulant. A second encapsulant is deposited over the substrate, semiconductor die, and first interconnect structure. The second encapsulant can be formed over a portion of the semiconductor die and side surface of the substrate. A portion of the second encapsulant is removed to expose the substrate and first interconnect structure. A second interconnect structure is formed over the second encapsulant and first interconnect structure and electrically coupled to the wire studs. A discrete semiconductor device can be formed on the interconnect structure. | 03-20-2014 |
20140077364 | Semiconductor Device and Method of Forming Wire Studs as Vertical Interconnect in FO-WLP - A semiconductor device has a substrate and semiconductor die disposed over a first surface of the substrate. A wire stud is attached to the first surface of the substrate. The wire stud includes a base portion and stem portion. A bonding pad is formed over a second surface of the substrate. An encapsulant is deposited over the substrate, semiconductor die, and wire stud. A portion of the encapsulant is removed by LDA to expose the wire stud. A portion of the encapsulant is removed by LDA to expose the substrate. An interconnect structure is formed over the encapsulant and electrically connected to the wire stud and semiconductor die. A bump is formed over the interconnect structure. A semiconductor package is disposed over the encapsulant and electrically connected to the substrate. A discrete semiconductor device is disposed over the encapsulant and electrically connected to the substrate. | 03-20-2014 |
20140077365 | Metal Bump and Method of Manufacturing Same - An embodiment bump structure includes a contact element formed on a substrate, a passivation layer overlying the substrate, the passivation layer having a passivation opening exposing the contact element a polyimide layer overlying the passivation layer, the polyimide layer having a polyimide opening exposing the contact element an under bump metallurgy (UMB) feature electrically coupled to the contact element, the under bump metallurgy feature having a UBM width, and a copper pillar on the under bump metallurgy feature, a distal end of the copper pillar having a pillar width, the UBM width greater than the pillar width. | 03-20-2014 |
20140077366 | Wafer Level Fan-Out Package With a Fiducial Die - A wafer level fan-out package with a fiducial die is disclosed and may include a semiconductor die and a transparent fiducial die both encapsulated in a molding compound resin, passivation layers on an upper surface and a lower surface of the molding compound resin except where redistribution layers are formed on upper and lower surfaces of the molding compound resin, and a metal pattern on a lower surface of the transparent fiducial die that is visible through an exposed upper surface of the transparent fiducial die. The pattern may comprise a standard coordinate for forming a through mold via utilizing laser drilling. | 03-20-2014 |
20140077367 | SOLDER INTERCONNECT WITH NON-WETTABLE SIDEWALL PILLARS AND METHODS OF MANUFACTURE - A solder interconnect structure is provided with non-wettable sidewalls and methods of manufacturing the same. The method includes forming a nickel or nickel alloy pillar on an underlying surface. The method further includes modifying the sidewall of the nickel or nickel alloy pillar to prevent solder wetting on the sidewall. | 03-20-2014 |
20140077368 | REPAIRING ANOMALOUS STIFF PILLAR BUMPS - A system for repairing pillar bumps includes a pillar bump repair device that is adapted to form a plurality of strain-relieving notches in a pillar bump that is positioned above a metallization system of a semiconductor chip. The system further includes a pillar bump support device that is adapted to substantially support the pillar bump while the pillar bump repair device is forming each of the plurality of strain-relieving notches. | 03-20-2014 |
20140084453 | OVERCOMING CHIP WARPING TO ENHANCE WETTING OF SOLDER BUMPS AND FLIP CHIP ATTACHES IN A FLIP CHIP PACKAGE - Structures and methods for forming good electrical connections between an integrated circuit (IC) chip and a chip carrier of a flip chip package include forming one of: a tensile layer on a front side of the IC chip, which faces a tops surface of the chip carrier, and a compressive layer on the backside of the IC chip. Addition of one of: a tensile layer to the front side of the IC chip and a compressive layer the backside of the IC chip, may reduce or modulate warpage of the IC chip and enhance wetting of opposing solder surfaces of solder bumps on the IC chip and solder formed on flip chip (FC) attaches of a chip carrier during making of the flip chip package. | 03-27-2014 |
20140084454 | DIRECT MULTIPLE SUBSTRATE DIE ASSEMBLY - A direct multiple substrate die assembly can include a first and a second substrate, wherein each substrate can include at least one interlocking edge feature. An electrical interconnection area can be formed adjacent to or within the interlocking edge feature on each substrate and can be configured to couple one or more electrical signals between the substrates. In one embodiment, the interlocking edge feature can include one or more keying features that can enable accurate alignment between the substrates. In yet another embodiment, the direct multiple substrate die assembly can be mounted out of plane with respect to a supporting substrate. | 03-27-2014 |
20140084455 | SEMICONDUCTOR PACKAGE AND FABRICATION METHOD THEREOF - A semiconductor package is provided, which includes: a semiconductor substrate having opposite first and second surfaces; an adhesive layer formed on the first surface of the semiconductor substrate; at least a semiconductor chip disposed on the adhesive layer; an encapsulant formed on the adhesive layer for encapsulating the semiconductor chip; and a plurality of conductive posts penetrating the first and second surfaces of the semiconductor substrate and the adhesive layer and electrically connected to the semiconductor chip, thereby effectively reducing the fabrication cost, shortening the fabrication time and improving the product reliability. | 03-27-2014 |
20140084456 | SEMICONDUCTOR PACKAGES, METHODS OF MANUFACTURING SEMICONDUCTOR PACKAGES, AND SYSTEMS INCLUDING SEMICONDUCTOR PACKAGES - A semiconductor package comprises a first semiconductor chip, a second semiconductor chip on the first semiconductor chip, a third semiconductor chip on the second semiconductor chip and a fourth semiconductor chip on the third semiconductor chip. A first underfill layer is positioned between the second semiconductor chip and the first semiconductor chip; a second underfill layer is positioned between the third semiconductor chip and the second semiconductor chip, and a third underfill layer is positioned between the fourth semiconductor chip and the third semiconductor chip. In some embodiments, the second underfill layer comprises a material that is different than the first and third underfill layers. | 03-27-2014 |
20140084457 | BUMP STRUCTURES, ELECTRICAL CONNECTION STRUCTURES, AND METHODS OF FORMING THE SAME - A bump structure may include a body portion spaced apart from a pad disposed on a substrate and a first extension extending from a side of the body portion onto the pad. A second extension extends from another side of the body portion. | 03-27-2014 |
20140084458 | CHIP PACKAGE AND METHOD FOR FORMING THE SAME - An embodiment of the invention provides a chip package which includes: a substrate having a first surface and a second surface; a sensing layer disposed on the first surface of the substrate, wherein the sensing layer has a sensing region; a conducting pad structure disposed on the substrate and electrically connected to the sensing region; a spacer layer disposed on the first surface of the substrate; a semiconductor substrate placed on the spacer layer, wherein the semiconductor substrate, the spacer layer, and the substrate together surround a cavity on the sensing region; and a through-hole extending from a surface of the semiconductor substrate toward the substrate, wherein the through-hole connects to the cavity. | 03-27-2014 |
20140084459 | Multiple Die Packaging Interposer Structure and Method - System and method for providing a multiple die interposer structure. An embodiment comprises a plurality of interposer studs in a molded interposer, with a redirection layer on each side of the interposer. Additionally, the interposer studs may be initially attached to a conductive mounting plate by soldering or wirebond welding prior to molding the interposer, with the mounting plate etched to form one of the redirection layers. Integrated circuit dies may be attached to the redirection layers on each side of the interposer, and interlevel connection structures used to mount and electrically connect a top package having a third integrated circuit to the interposer assembly. | 03-27-2014 |
20140084460 | Contact bumps methods of making contact bumps - Contact bumps between a contact pad and a substrate can include recesses and protrusions that can mate with the material of the substrate. The irregular mating surfaces between the contact bumps and the contact pads can enhance the bonding strength of the contacts, for example, against shear and tension forces, especially for flexible systems such as smart cards. | 03-27-2014 |
20140091456 | USING COLLAPSE LIMITER STRUCTURES BETWEEN ELEMENTS TO REDUCE SOLDER BUMP BRIDGING - Provided are an electronic assembly and method for forming the same, comprising a first element having a first surface and a second element having a second surface. | 04-03-2014 |
20140091457 | CONTROLLED SOLDER HEIGHT PACKAGES AND ASSEMBLY PROCESSES - An apparatus comprises a substrate including a surface and a plurality of bonding pads positioned on the surface. The apparatus also includes a material comprising a solder positioned on the bonding pads and extending a distance outward therefrom. A first of the bonding pads in a first location on the substrate surface includes the solder extending a first distance outward therefrom. A second of the bonding pads in a second location on the substrate surface includes the solder extending a second distance outward therefrom. The first distance is different than the second distance. Other embodiments are described and claimed. | 04-03-2014 |
20140091458 | ENCAPSULATED WAFER-LEVEL CHIP SCALE (WLSCP) PEDESTAL PACKAGING - Consistent with an example embodiment, there is semiconductor device assembled to resist mechanical damage. The semiconductor device comprises an active circuit defined on a top surface, contact areas providing electrical connection to the active circuit. There is a pedestal structure upon which the active circuit is mounted on an opposite bottom surface; the pedestal structure has an area smaller than the area of the active device. An encapsulation, consisting of a molding compound, surrounds the sides and the underside of the active device and it surrounds the contact areas. The encapsulation provides a resilient surface protecting the active device from mechanical damage. A feature of the embodiment is that the contact areas may have solder bumps defined thereon. | 04-03-2014 |
20140091459 | Chip-size, double side connection package and method for manufacturing the same - A low resistance metal is charged into holes formed in a semiconductor substrate to thereby form through electrodes. Post electrodes of a wiring-added post electrode component connected together by a support portion thereof are simultaneously fixed to and electrically connected to connection regions formed on an LSI chip. On the front face side, after resin sealing, the support portion is separated so as to expose front face wiring traces. On the back face side, the semiconductor substrate is grounded so as to expose tip ends of the through electrodes. The front face wiring traces exposed to the front face side and the tip ends of the through electrodes exposed to the back face side are used as wiring for external connection. | 04-03-2014 |
20140091460 | SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME - A stack of semiconductor chips, a semiconductor device, and a method of manufacturing are disclosed. The stack of semiconductor chips may comprise a first chip of the stack, a second chip of the stack over the first chip, conductive bumps, a homogeneous integral underfill material, and a molding material. The conductive bumps may extend between an upper surface of the first chip and a lower surface of the second chip. The homogeneous integral underfill material may be interposed between the first chip and the second chip, encapsulate the conductive bumps, and extend along sidewalls of the second chip. The homogeneous integral underfill material may have an upper surface extending in a direction parallel to an upper surface of the second chip and located adjacent the upper surface of the second chip. The molding material may be on outer side surfaces of the homogeneous integral underfill material above the upper surface of the first chip, wherein, in view of a first cross sectional profile, the molding material is separated from sidewalls of the second chip by the homogeneous integral underfill material such that the molding material does not contact sidewalls of the second chip. | 04-03-2014 |
20140097534 | DUAL-PHASE INTERMETALLIC INTERCONNECTION STRUCTURE AND METHOD OF FABRICATING THE SAME - Provided are a dual-phase intermetallic interconnection structure and a fabricating method thereof. The dual-phase intermetallic interconnection structure includes a first intermetallic compound, a second intermetallic compound, a first solder layer, and a second solder layer. The second intermetallic compound covers and surrounds the first intermetallic compound. The first intermetallic compound and the second intermetallic compound contain different high-melting point metal. The first solder layer and the second solder layer are disposed at the opposite sides of the second intermetallic compound, respectively. The first intermetallic compound is adapted to fill the micropore defects generated during the formation of the second intermetallic compound. | 04-10-2014 |
20140103520 | DEVICES, SYSTEMS, AND METHODS RELATED TO FORMING THROUGH-SUBSTRATE VIAS WITH SACRIFICIAL PLUGS - Methods for making semiconductor devices are disclosed herein. A method configured in accordance with a particular embodiment includes forming one or more openings in a front side of the semiconductor device and forming sacrificial plugs in the openings that partially fill the openings. The method further includes further filling the partially filled openings with a conductive material, where individual sacrificial plugs are generally between the conductive material and a substrate of the semiconductor device. The sacrificial plugs are exposed at a backside of the semiconductor device. Contact regions can be formed at the backside by removing the sacrificial plugs. | 04-17-2014 |
20140103521 | ELECTRONIC DEVICE HAVING A CONTACT RECESS AND RELATED METHODS - An electronic device may include a bottom interconnect layer and an integrated circuit (IC) carried by the bottom interconnect layer. The electronic device may further include an encapsulation material on the bottom interconnect layer and laterally surrounding the IC. The electronic device may further include electrically conductive pillars on the bottom interconnect layer extending through the encapsulation material. At least one electrically conductive pillar and adjacent portions of encapsulation material may have a reduced height with respect to adjacent portions of the IC and the encapsulation material and may define at least one contact recess. The at least one contact recess may be spaced inwardly from a periphery of the encapsulation material. | 04-17-2014 |
20140103522 | SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR DEVICE, AND METHOD OF MANFACTURING SEMICONDUCTOR SUBSTRATE - A semiconductor substrate having a base material and a connection portion provided on at least one surface of the base material. The connection portion includes: a non-conductive wall portion so as to surround a concave portion formed on the base material; an electrode portion disposed on a bottom surface of a concave portion; and a metal portion disposed in contact with the electrode portion. | 04-17-2014 |
20140103523 | SEMICONDUCTOR PACKAGE - A semiconductor package including a lower semiconductor chip, and an upper semiconductor chip flip-chip bonded on the lower semiconductor chip may be provided. Each of the lower and upper semiconductor chips includes a first bonding pad formed on an active surface, which has a center line extending in a first direction, and a first rewire electrically connected to the first bonding pad, The first rewire includes first and second connection regions. The first and second connection regions face each other and are disposed at a same distance from the center line in a second direction, which is perpendicular to the first direction. | 04-17-2014 |
20140103524 | ELECTRONIC DEVICE - In a conventional electronic device and a method of manufacturing the same, reduction in cost of the electronic device is hindered because resin used in an interconnect layer on the solder ball side is limited. The electronic device includes an interconnect layer (a first interconnect layer) and an interconnect layer (a second interconnect layer). The second interconnect layer is formed on the undersurface of the first interconnect layer. The second interconnect layer is larger in area seen from the top than the first interconnect layer and is extended to the outside from the first interconnect layer. | 04-17-2014 |
20140103525 | SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME - A semiconductor device manufacturing technique which allows reduction of semiconductor chip size. First, a pad and other wires are formed over an insulating film. A surface protective film is formed over the insulating film including the pad and wires, and an opening is made in the surface protective film. The opening lies over the pad and exposes a surface of the pad. A bump electrode is formed over the surface protective film including the opening. Here, the pad is smaller than the bump electrode. Consequently, the wires are arranged just beneath the bump electrode in the same layer as the pad | 04-17-2014 |
20140103526 | SELF-ALIGNED PROTECTION LAYER FOR COPPER POST STRUCTURE - A semiconductor device includes a copper-containing post overlying and electrically connected to a bond pad region. The semiconductor device further includes a protection layer on a surface of the copper-containing post, where the protection layer includes manganese. | 04-17-2014 |
20140103527 | Semiconductor Device and Method of Forming a POP Device with Embedded Vertical Interconnect Units - A semiconductor device has a substrate. A plurality of conductive vias is formed through the substrate. A conductive layer is formed over the substrate. An insulating layer is formed over conductive layer. A portion of the substrate is removed to expose the conductive vias. A plurality of vertical interconnect structures is formed over the substrate. A first semiconductor die is disposed over the substrate. A height of the vertical interconnect structures is less than a height of the first semiconductor die. An encapsulant is deposited over the first semiconductor die and the vertical interconnect structures. A first portion of the encapsulant is removed from over the first semiconductor die while leaving a second portion of the encapsulant over the vertical interconnect structures. The second portion of the encapsulant is removed to expose the vertical interconnect structures. A second semiconductor die is disposed over the first semiconductor die. | 04-17-2014 |
20140103528 | SEMICONDUCTOR DEVICE - A semiconductor device, that is approximately identical in package size to a semiconductor chip, such as a W-CSP, is devised to secure a wider area for sealing such as laser marking. A semiconductor substrate has a plurality of via electrodes extending from the bottom of the semiconductor substrate to top electrodes, a bottom wire net formed at the bottom of the semiconductor substrate such that the bottom wire net is connected to the via electrodes, and an insulative film covering the bottom wire net. A sealing area having a sealing mark is disposed at the bottom of the semiconductor substrate. The sealing area is located such that the outer circumference of the sealing area is spaced apart from the bottom wire net in a direction parallel to a sealing mark forming surface, and the outer circumference of the sealing area is disposed at the edge of the semiconductor substrate. | 04-17-2014 |
20140110835 | Bump Package and Methods of Formation Thereof - In accordance with an embodiment of the present invention, a semiconductor package includes a semiconductor chip and a bump. The semiconductor chip has a contact pad on a major surface. The bump is disposed on the contact pad of the semiconductor chip. A solder layer is disposed on sidewalls of the bump. | 04-24-2014 |
20140110836 | Packaging Devices, Methods of Manufacture Thereof, and Packaging Methods - Packaging devices, methods of manufacture thereof, and packaging methods for semiconductor devices are disclosed. In one embodiment, a packaging device includes a substrate including an integrated circuit die mounting region. An underfill material flow prevention feature is disposed around the integrated circuit die mounting region. | 04-24-2014 |
20140110837 | ROUTING LAYER FOR MITIGATING STRESS IN A SEMICONDUCTOR DIE - A routing layer for a semiconductor die is disclosed. The routing layer includes pads for attaching solder bumps; bond-pads bonded to bump-pads of a die having an integrated circuit, and traces interconnecting bond-pads to pads. The routing layer is formed on a layer of dielectric material. The routing layer includes conductive traces at least partially surrounding some pads so as to absorb stress from solder bumps attached to the pads. Parts of the traces that surround pads protect parts of the underlying dielectric material proximate the solder bumps, from the stress. | 04-24-2014 |
20140117532 | Bump Interconnection Ratio for Robust CPI Window - The disclosure is directed to a device and method for manufacture thereof. The device includes a first workpiece bonded to a second workpiece by a bump interconnection structure. The bump interconnection structure allows for optimized packaging assembly yield and bond integrity. | 05-01-2014 |
20140117533 | Semiconductor Devices, Methods of Manufacture Thereof, and Packaged Semiconductor Devices - Semiconductor devices, methods of manufacture thereof, and packaged semiconductor devices are disclosed. In one embodiment, a method of manufacturing a semiconductor device includes forming a plurality of contact pads over a substrate, and forming an insulating material over the plurality of contact pads and the substrate. The insulating material is patterned to form an opening over each of the plurality of contact pads, and the plurality of contact pads is cleaned. The method includes forming an under-ball metallization (UBM) structure over the plurality of contact pads and portions of the insulating material. Cleaning the plurality of contact pads recesses a top surface of each of the plurality of contact pads. | 05-01-2014 |
20140117534 | Interconnection Structure - A structure comprises a first passivation layer formed over a substrate, a second passivation layer formed over the first passivation layer, wherein the second passivation layer includes a first opening with a first dimension, a bond pad embedded in the first passivation layer and the second passivation layer, a protection layer formed on the second passivation layer comprising a second opening with a second dimension, wherein the second dimension is greater than the first dimension and a connector formed on the bond pad. | 05-01-2014 |
20140117535 | COMPENSATING FOR WARPAGE OF A FLIP CHIP PACKAGE BY VARYING HEIGHTS OF A REDISTRIBUTION LAYER ON AN INTEGRATED CIRCUIT CHIP - Structures and methods of making a flip chip package that employ polyimide pads of varying heights at a radial distance from a center of an integrated circuit (IC) chip for a flip chip package. The polyimide pads may be formed under electrical connectors, which connect the IC chip to a chip carrier of the flip chip package, so that electrical connectors formed on polyimide pads of greater height are disposed at a greater radial distance from the center of the IC chip, while electrical connectors formed on polyimide pads of a lesser height are disposed more proximately to the center of the IC chip. Electrical connectors of a greater relative height to the IC chip's surface may compensate for a gap, produced by heat-induced warpage during the making of the flip chip package, that separates the electrical connectors on the IC chip from flip chip attaches on the chip carrier. | 05-01-2014 |
20140117536 | WIRING SUBSTRATE, TAPE PACKAGE HAVING THE SAME, AND DISPLAY DEVICE HAVING THE SAME - A wiring substrate includes a base film, a plurality of first wirings and a plurality of second wirings. The base film has a chip-mounting region configured for mounting a semiconductor chip thereon. The first wirings extend in a first direction from inside the chip-mounting region to outside the chip-mounting region, and include first connection end portions extending in a second direction different from the first direction. The first connection end portions may be formed inside the chip-mounting region and configured to electrically connect to the semiconductor chip. The second wirings extend in the first direction from inside the chip-mounting region to outside the chip-mounting region, and include second connection end portions extending in the opposite direction to the second direction in which the first connection end portions extend, and the second connection end portions may be formed inside the chip-mounting region and configured to electrically connect to the semiconductor chip. | 05-01-2014 |
20140117537 | SEMICONDUCTOR PACKAGE AND METHOD OF FABRICATING THE SAME - Disclosed is a semiconductor package including an encapsulant having a top surface and a bottom surface opposite to the top surface; a semiconductor chip embedded in the encapsulant having an active surface, an inactive surface opposite to the active surface, and lateral surfaces interconnecting the active surface and the inactive surface, wherein the active surface protrudes from the bottom surface of the encapsulant and the semiconductor chip further has a plurality of electrode pads disposed on the active surface; a positioning member layer formed on a portion of the bottom surface of the encapsulant, covering the lateral surfaces of the semiconductor chip that protrude therefrom, and exposing the active surface; and a build-up trace structure disposed on the active surface of the semiconductor chip and the positioning member layer formed on the bottom surface of the encapsulant. The present invention also provides a method of fabricating a semiconductor package. | 05-01-2014 |
20140117538 | PACKAGE STRUCTURE AND FABRICATION METHOD THEREOF - A fabrication method of a package structure is provided, which includes the steps of: providing an interposer having a plurality of recess holes; forming a conductive bump in a lower portion of each of the recess holes; forming a conductive through hole on the conductive bump in each of the recess holes; removing a portion of the interposer so as for the conductive bumps to protrude from the interposer; and mounting at least a first external element on the conductive bumps, thereby simplifying the fabrication process, shortening the process time and reducing the material cost. | 05-01-2014 |
20140117539 | WIRING SUBSTRATE, METHOD FOR MANUFACTURING WIRING SUBSTRATE, AND SEMICONDUCTOR PACKAGE - A wiring substrate includes a core layer, first and second wiring layers, and a first insulating layer. The core layer has one and another surfaces and includes a plate-shaped member formed of an aluminum oxide and multiple linear conductors penetrating the plate-shaped member in a thickness direction of the plate-shaped member. The first wiring layer is formed on the one surface of the core layer. The second wiring layer is formed on the other surface of the core layer. The first insulating layer has a same thickness as the first wiring layer and is formed in an area of the one surface of the core layer on which the first wiring layer is not formed. The first and second wiring layers are positioned superposing each other in a plan view. The first and second wiring layers are electrically connected by way of the multiple linear conductors. | 05-01-2014 |
20140117540 | SEMICONDUCTOR MANUFACTURING METHOD AND SEMICONDUCTOR STRUCTURE THEREOF - A semiconductor manufacturing method includes providing a substrate having a metallic layer that includes a first metal layer and a second metal layer, the first metal layer comprises plural base areas and plural first outer lateral areas, the second metal layer comprises plural second base areas and plural second outer lateral areas; forming a first photoresist layer; forming plural bearing portions; removing the first photoresist layer; forming a second photoresist layer; forming plural connection portions, each connection portion comprises a first connection layer and a second connection layer; removing the second photoresist layer to reveal the connection portions and the bearing portions; removing the first outer lateral areas; reflowing the second connection layers to form plural composite bumps; removing the second outer lateral areas to make the first base areas and the second base areas form plural under bump metallurgy layers. | 05-01-2014 |
20140117541 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - Of three chips ( | 05-01-2014 |
20140117542 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device includes an expanded semiconductor chip having a first semiconductor chip and an expanded portion extending outward from a side surface of the first semiconductor chip, a second semiconductor chip provided so as to be connected to the expanded semiconductor chip via a plurality of first bumps, and a base provided so as to be connected to the expanded semiconductor chip via a plurality of second bumps. The first bumps are provided between the first semiconductor chip and the second semiconductor chip. The second bumps are provided between the expanded portion and the base. | 05-01-2014 |
20140124916 | Molded Underfilling for Package on Package Devices - Presented herein are a package-on-package device having a molded underfill and a method for forming the same, the method comprising applying a package mount mounting a die to the first side of a carrier package. A molded underfill may be applied first side of the carrier package, and be in contact with a portion of the package mount a portion of a sidewall of the die. A top package having at least one land may be mounted to the first side of the carrier package above the die, and, optionally separated from the top of the die. The package mount may be coined prior to, during or after applying the molded underfill to optionally be level with the underfill surface. The underfill region contacting the package mount may be below or above the surface of the underfill region contacting the die sidewall. | 05-08-2014 |
20140124917 | METHOD AND SYSTEM FOR CONTROLLING CHIP INCLINATION DURING FLIP-CHIP MOUNTING - A method for alignment of a first substrate coupled to a second substrate includes determining an inclination angle for the first substrate or the second substrate due to warpage. The method includes determining a joint height difference based on the inclination angle and configuring a size for one or more bond pads based on the joint height difference. | 05-08-2014 |
20140124918 | THERMAL IMPROVEMENT OF INTEGRATED CIRCUIT PACKAGES - An integrated circuit package comprising an active semiconductor device layer and at least one heat-transfer semiconductor layer on the active semiconductor device layer. The heat-transfer semiconductor layer has a coefficient of thermal expansion that substantially matches a coefficient of thermal expansion of the active semiconductor device layer. | 05-08-2014 |
20140124919 | SEMICONDUCTOR DEVICE AND SEMICONDUCTOR PROCESS - The present invention relates to a semiconductor device and semiconductor process. The semiconductor device includes a substrate, a circuit layer, a plurality of under bump metallurgies (UBMs), a redistribution layer and a plurality of interconnection metals. The substrate has an active surface and a inactive surface. The circuit layer and the under bump metallurgies (UBMs) are disposed adjacent to the active surface. The redistribution layer is disposed adjacent to the inactive surface. The interconnection metals electrically connect the circuit layer and redistribution layer. | 05-08-2014 |
20140124920 | STUD BUMP STRUCTURE AND METHOD FOR MANUFACTURING THE SAME - A stud bump structure and method for manufacturing the same are provided. The stud bump structure includes a substrate, and a first silver alloy stud bump disposed on the substrate, wherein the first silver alloy stud bump has a weight percentage ratio of Ag:Au:Pd=60-99.98:0.01-30:0.01-10. | 05-08-2014 |
20140124921 | SEMICONDUCTOR PACKAGE - A semiconductor package includes a substrate; a driving chip having first bumps on a first surface and bump pads on a second surface facing away from the first surface, and mounted to the substrate by the medium of the first bumps; a support member disposed on the substrate substantially horizontally with respect to the driving chip; and a plurality of memory chips substantially horizontally disposed on the driving chip and the support member such that one corner portions of the memory chips are positioned on the driving chip while being centered about the driving chip, wherein the respective memory chips have second bumps which are electrically connected with the respective bump pads of the driving chip, on one surfaces of the one corner portions of the memory chips which face the driving chip. | 05-08-2014 |
20140124922 | BUMP STRUCTURES IN SEMICONDUCTOR PACKAGES AND METHODS OF FABRICATING THE SAME - The bump structure includes a metal pattern disposed on an electrode pad to have a vertical sidewall and a recessed region surrounded by the vertical sidewalls, a metal post including a lower portion inserted into the recessed region and a protruded portion upwardly extending from the lower portion, and a passivation spacer on a sidewall of the metal post. The metal post is electrically connected to the electrode pad. | 05-08-2014 |
20140124923 | SEMICONDUCTOR DEVICES HAVING A STAGGERED PAD WIRING STRUCTURE - A semiconductor device includes a plurality of first metal wirings of first to n-th layers disposed on a substrate, and a plurality of pad wirings disposed on the first metal wirings and including a metal material of an n+1-th layer. The pad wirings are disposed in a staggered shape in a first direction and have a rectangular shape lengthily extending in a second direction. A plurality of additional wirings are disposed in an additional wiring region in the first direction and include the metal material of the n+1-th layer. The additional wiring region is disposed between the pad wirings. A plurality of pads may contact an upper surface of the pad wirings. The pads have a rectangular shape having a first width in the first direction and a first length greater than the first width in the second direction. | 05-08-2014 |
20140124924 | INTEGRATED CIRCUIT DEVICE INCLUDING A COPPER PILLAR CAPPED BY BARRIER LAYER AND METHOD OF FORMING THE SAME - A method of forming an integrated circuit device includes forming a mask layer overlying an under bump metallurgy (UBM) layer, wherein the mask layer comprises a first portion adjacent to the UBM layer, and a second portion overlying the first portion. The method further includes forming an opening in the mask layer to expose a portion of the UBM layer. The method further includes forming a conductive layer in the opening of the mask layer, electrically connected to the exposed portion of the UBM layer. The method further includes removing the second portion of the mask layer to expose an upper portion of the conductive layer. The method further includes forming a barrier layer on the exposed upper portion of the conductive layer. | 05-08-2014 |
20140131854 | MULTI-CHIP MODULE CONNECTION BY WAY OF BRIDGING BLOCKS - One aspect provides an integrated circuit (IC) multi-chip packaging assembly, comprising a first IC chip having packaging substrate contacts and bridging block contacts, a second IC chip having packaging substrate contacts and bridging block contacts, and a bridging block partially overlapping the first and second IC chips and having interconnected electrical contacts on opposing ends thereof that contact the bridging block contacts of the first IC chip and the second IC chip to thereby electrically connect the first IC chip to the second chip. | 05-15-2014 |
20140131855 | THERMOCOMPRESSION FOR SEMICONDUCTOR CHIP ASSEMBLY - A method of assembling a semiconductor chip to a substrate wherein at least one of the semiconductor chip and substrate comprise solder bumps. The method includes aligning the semiconductor chip with the substrate; applying a compression force to the semiconductor chip to cause the solder bumps to deform between the semiconductor chip pads and the substrate pads, the compression force being applied while the semiconductor chip and substrate are held at a temperature above room temperature and below a temperature at which any liquid will form in at least one of the solder bumps; then applying an underfill material to fill the gap between the chip and substrate; and then heating the assembled semiconductor chip and substrate to an elevated temperature to cause the solder bumps to melt and reflow and form a metallurgical bond between the semiconductor chip pads and the substrate pads. | 05-15-2014 |
20140131856 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - Provided are a semiconductor device including an interposer having a relatively thin thickness without a through silicon via and a method of manufacturing the same. The method of manufacturing a semiconductor device includes forming an interposer including a redistribution layer and a dielectric layer on a dummy substrate, connecting a semiconductor die to the redistribution layer facing an upper portion of the interposer, encapsulating the semiconductor die by using an encapsulation, removing the dummy substrate from the interposer, and connecting a bump to the redistribution layer facing a lower portion of the interposer. | 05-15-2014 |
20140131857 | BARRIER LAYER ON BUMP AND NON-WETTABLE COATING ON TRACE - Some implementations provide a semiconductor device that includes a die, an under bump metallization (UBM) structure coupled to the die, and a barrier layer. The UBM structure has a first oxide property. The barrier layer has a second oxide property that is more resistant to oxide removal from a flux material than the first oxide property of the UBM structure. The barrier layer includes a top portion, a bottom portion and a side portion. The top portion is coupled to the UBM structure, and the side portion is substantially oxidized. | 05-15-2014 |
20140131858 | Warpage Control of Semiconductor Die Package - Various embodiments of mechanisms for forming a die package using a compressive dielectric layer to contact and to surround through substrate vias (TSVs) in the die package are provided. The compressive dielectric layer reduces or eliminates bowing of the die package. As a result, the risk of broken redistribution layer (RDL) due to bowing is reduced or eliminated. In addition, the compressive dielectric layer, which is formed between the conductive TSV columns and surrounding molding compound, improves the adhesion between the conductive TSV columns and the molding compound. Consequently, the reliability of the die package is improved. | 05-15-2014 |
20140131859 | SOLDER FATIGUE ARREST FOR WAFER LEVEL PACKAGE - A wafer level package includes a wafer, a lead disposed of the wafer for connecting the wafer to an electrical circuit, and a core disposed of the lead. In some embodiments, the lead disposed of the wafer is a copper pillar, and the core is plated onto the copper pillar. In some embodiments, the core is polymer screen-plated onto the lead. In some embodiments, the core extends between at least approximately thirty-five micrometers (35 μm) and fifty micrometers (50 μm) from the lead. In some embodiments, the core covers between at least approximately one-third (⅓) and one-half (½) of the surface area of the lead. In some embodiments, the core comprises a stud-shape extending from the lead. In some embodiments, the core extends perpendicularly across the lead. In some embodiments, the core extends longitudinally along the lead. Further, a portion of the core can extend perpendicularly from a longitudinal core. | 05-15-2014 |
20140131860 | SEMICONDUCTOR DEVICE, SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, AND ELECTRONIC DEVICE - A semiconductor device includes a semiconductor substrate; an active element configured to be formed on the semiconductor substrate; and a multi-layer wiring structure configured to be formed on the semiconductor substrate. A heat dissipation structure is provided in the multi-layer wiring structure. The upper end of the heat dissipation structure forms an external connection pad to be connected with an external wiring board, and the lower end of the heat dissipation structure makes contact with a surface of the semiconductor substrate outside of an element forming region for the active element. | 05-15-2014 |
20140131861 | Plasma Treatment for Semiconductor Devices - A semiconductor device having a polymer layer and a method of fabricating the same is provided. A two-step plasma treatment for a surface of the polymer layer includes a first plasma process to roughen the surface of the polymer layer and loosen contaminants, and a second plasma process to make the polymer layer smoother or make the polymer layer less rough. An etch process may be used between the first plasma process and the second plasma process to remove the contaminants loosened by the first plasma process. In an embodiment, the polymer layer exhibits a surface roughness between about 1% and about 8% as measured by Atomic Force Microscopy (AFM) with the index of surface area difference percentage (SADP) and/or has surface contaminants of less than about 1% of Ti, less than about 1% of F, less than about 1.5% Sn, and less than about 0.4% of Pb. | 05-15-2014 |
20140131862 | SEMICONDUCTOR DEVICE HAVING CONDUCTIVE PADS AND A METHOD OF MANUFACTURING THE SAME - A semiconductor device includes a substrate, a plurality of conductive pads formed in consecutive conductive layers, and a bump structure. The plurality of conductive pads is aligned and arranged one above another over the substrate. The plurality of conductive pads comprises a first conductive pad and a second conductive pad. The first conductive pad is above the second conductive pad. A redistribution layer extends the second conductive pad. The first conductive pad is not extended by a redistribution layer. The bump structure is formed directly on the first conductive pad and electrically coupled to the plurality of conductive pads. | 05-15-2014 |
20140131863 | Semiconductor Device with Copper-Tin Compound on Copper Connector - An embodiment is a method for forming a semiconductor assembly including cleaning a connector including copper formed on a substrate, applying cold tin to the connector, applying hot tin to the connector, and spin rinsing and drying the connector. | 05-15-2014 |
20140131864 | Connector Design for Packaging Integrated Circuits - A device includes a top dielectric layer having a top surface. A metal pillar has a portion over the top surface of the top dielectric layer. A non-wetting layer is formed on a sidewall of the metal pillar, wherein the non-wetting layer is not wettable to the molten solder. A solder region is disposed over and electrically coupled to the metal pillar. | 05-15-2014 |
20140131865 | Structure and Method for Bump to Landing Trace Ratio - The present disclosure provides an integrated circuit. The integrated circuit includes an interconnect structure formed on a substrate; a landing metal trace formed on the interconnect structure and coupled to the interconnect structure, wherein the landing metal trace includes a first width T defined in a first direction; and a metal bump post formed on and aligned with the landing metal trace, wherein the metal bump post includes a second width U defined in the first direction, and the second width U is greater than the first width T. | 05-15-2014 |
20140138815 | SERVER PROCESSING MODULE - One embodiment of the present invention sets forth a processing module including an interposer and a plurality of processing nodes. The interposer includes a plurality of through substrate vias. Each processing node includes a processing unit die coupled directly to a top surface of the interposer with a first plurality of solder bump structures, a memory die coupled directly to the top surface of the interposer with a second plurality of solder bump structures, and a plurality of circuit elements electrically coupling the processing unit die and the memory die. The processing module further includes a plurality of electrical connections formed on a bottom surface of the interposer and electrically coupled to the plurality of processing nodes through the plurality of through substrate vias. The processing module further comprises a plurality of interconnecting circuit elements electrically interconnecting the plurality of processing nodes. | 05-22-2014 |
20140138816 | Method for Forming Package-on-Package Structure - A method comprises attaching a semiconductor die on a first side of a wafer, attaching a first top package on the first side of the wafer and attaching a second top package on the first side of the wafer. The method further comprises depositing an encapsulation layer over the first side of the wafer, wherein the first top package and the second top package are embedded in the encapsulation layer, applying a thinning process to a second side of the wafer, sawing the wafer into a plurality of chip packages and attaching the chip package to a substrate. | 05-22-2014 |
20140138817 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device including a relatively thin interposer excluding a through silicon hole and a manufacturing method thereof are provided. The method includes forming an interposer on a dummy substrate. The forming of the interposer includes, forming a dielectric layer on the dummy substrate, forming a pattern and a via on the dielectric layer, and forming a seed layer at the pattern and the via of the dielectric layer and forming a redistribution layer and a conductive via on the seed layer. A semiconductor die is connected with the conductive via facing an upper portion of the interposer, and the semiconductor die is encapsulated with an encapsulant. The dummy substrate is removed from the interposer. A bump is connected with the conductive via facing a lower portion of the interposer. | 05-22-2014 |
20140138818 | ORGANIC THIN FILM PASSIVATION OF METAL INTERCONNECTIONS - Electronic assemblies and their manufacture are described. One embodiment relates to a method including depositing an organic thin film layer on metal bumps on a semiconductor wafer, the organic thin film layer also being formed on a surface adjacent to the metal bumps on the wafer. The wafer is diced into a plurality of semiconductor die structures, the die structures including the organic thin film layer. The semiconductor die structures are attached to substrates, wherein the attaching includes forming a solder bond between the metal bumps on a die structure and bonding pads on a substrate, and wherein the solder bond extends through the organic thin film layer. The organic thin film layer is then exposed to a plasma. Other embodiments are described and claimed. | 05-22-2014 |
20140138819 | SEMICONDUCTOR DEVICE INCLUDING TSV AND SEMICONDUCTOR PACKAGE INCLUDING THE SAME - Provided are a semiconductor device, a method of manufacturing the same, and a semiconductor package including the same. The semiconductor device includes: a substrate having a recess region in a predetermined portion of a back side of the substrate; a wiring part disposed on a front side of the substrate and including at least one wiring layer; an insulating layer disposed on the back side of the substrate and including a first portion filling in the recess region and a second portion covering the back side of the substrate of a non-recess region other than the recess region; and a through silicon via (TSV) provided in plurality of and penetrating the first portion to be electrically connected to the at least one wiring layer. | 05-22-2014 |
20140138820 | SEMICONDUCTOR DEVICE AND SEMICONDUCTOR PACKAGE CONTAINING THE SAME - A semiconductor device, having an electrode pad as a part of wirings on the uppermost layer thereof, includes a passivation film and a bump electrode for external connection. The passivation film is formed on the electrode pad, and the bump electrode is formed on the passivation film and electrically connected to the electrode pad. The electrode pad is formed so as to be smaller in size than the bump electrode, and parts of the wiring on the uppermost layer are formed under the bump electrode. In this manner, it is possible to utilize the area under the bump electrode effectively without sacrificing flatness of the passivation film. As a result, the semiconductor device and the semiconductor package can be made smaller. | 05-22-2014 |
20140138821 | SUBSTRATE FOR FLIP CHIP BONDING AND METHOD OF FABRICATING THE SAME - Disclosed herein is substrate for flip chip bonding, in which a base solder layer is formed between a pad and a metal post, thereby increasing impact resistance and mounting reliability. A method of fabricating the substrate for flip chip bonding is also provided. | 05-22-2014 |
20140145324 | METHOD AND SYSTEM FOR CONTROLLING CHIP WARPAGE DURING BONDING - A semiconductor assembly includes a first substrate and a chip. The chip is coupled to and spaced apart from the substrate. Further, the chip has a first surface facing the substrate. The chip also has a warpage profile indicating stress imparted on the chip following a reflow operation. The assembly includes a back layer disposed on the chip on a second surface substantially opposite from the first surface. The back layer has a non-uniform thickness. Additionally, the thickness of the back layer on each of a plurality of elements of the chip is based on the warpage profile. | 05-29-2014 |
20140145325 | ELECTRONIC DEVICES WITH EMBEDDED DIE INTERCONNECT STRUCTURES, AND METHODS OF MANUFACTURE THEREOF - An embodiment of an electronic device includes an IC die with a top surface and a bond pad exposed at the top surface. A stud bump (or stack of stud bumps) is connected to the bond pad, and the stud bump and die are encapsulated with encapsulant. A trench is formed from a top surface of the encapsulant to the stud bump, resulting in the formation of a trench-oriented surface of the stud bump, which is exposed at the bottom of the trench. An end of an interconnect is connected to the trench-oriented surface of the stud bump. The interconnect extends above the encapsulant top surface, and may be coupled to another IC die of the same electronic device, another IC die that is distinct from the device, or another conductive feature of the device or a larger electronic system in which the device is incorporated. | 05-29-2014 |
20140145326 | SUBSTRATE WITH INTEGRATED PASSIVE DEVICES AND METHOD OF MANUFACTURING THE SAME - A substrate with integrated passive devices and method of manufacturing the same are presented. The substrate may include through silicon vias, at least one redistribution layer having a 1st passive device pattern and stacked vias, and an under bump metal layer having a 2nd passive device pattern. | 05-29-2014 |
20140145327 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME - Semiconductor devices and methods for fabricating the same are provided. For example, the semiconductor device includes a substrate, a first contact pad formed on the substrate, an insulation layer formed on the substrate and including a first opening which exposes the first contact pad, a first bump formed on the first contact pad and electrically connected to the first contact pad, and a reinforcement member formed on the insulation layer and adjacent to a side surface of the first lower bump. The first bump includes a first lower bump and a first upper bump, which are sequentially stacked on the first contact pad. | 05-29-2014 |
20140145328 | INTERCONNECT ASSEMBLIES AND METHODS OF MAKING AND USING SAME - The various embodiments of the present invention provide fine pitch, chip-to-substrate hybrid interconnect assemblies, as well as methods of making and using the assemblies. The hybrid assemblies generally include a semiconductor having a die pad disposed thereon, a substrate having a substrate pad disposed thereon, and a polymer layer disposed between the surface of the die pad and the surface of the substrate pad. In addition, at least a portion of the surface of the die pad is metallically bonded to at least a portion of the surface of the substrate pad and at least a portion of the surface of the die pad is chemically bonded to at least a portion of the surface of the substrate pad. | 05-29-2014 |
20140145329 | FINE PITCH MICROCONTACTS AND METHOD FOR FORMING THEREOF - A method includes applying a final etch-resistant material to an in-process substrate so that the final etch-resistant material at least partially covers first microcontact portions integral with the substrate and projecting upwardly from a surface of the substrate, and etching the surface of the substrate so as to leave second microcontact portions below the first microcontact portions and integral therewith, the final etch-resistant material at least partially protecting the first microcontact portions from etching during the further etching step. A microelectronic unit includes a substrate, and a plurality of microcontacts projecting in a vertical direction from the substrate, each microcontact including a base region adjacent the substrate and a tip region remote from the substrate, each microcontact having a horizontal dimension which is a first function of vertical location in the base region and which is a second function of vertical location in the tip region. | 05-29-2014 |
20140145330 | BOND PAD CONFIGURATIONS FOR CONTROLLING SEMICONDUCTOR CHIP PACKAGE INTERACTIONS - A semiconductor chip includes at least one integrated circuit device and a bond pad that is electrically connected to the at least one integrated circuit device. The bond pad has an irregular configuration when viewed from above that corresponds to a first area portion that is defined by a first substantially regular geometric shape when viewed from above and a second area portion adjacent to the first area portion. The second area portion is located at a greater distance from a centerline of the semiconductor chip than any part of the first area portion when viewed from above, and two sides of the first area portion are substantially aligned with and substantially flush with two respective sides of the second area portion. | 05-29-2014 |
20140151873 | SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD - A semiconductor device including a first semiconductor chip and a second semiconductor chip which are bump bonded to each other with a clearance therebetween sealed with resin injected from a prescribed position on the first semiconductor chip in a manner that a space between bumps formed by bump bonding is filled with the resin, and a plurality of concave and convex sections which are formed on a surface side of the first semiconductor chip, the surface being bonded with the second semiconductor chip, and have a protruding section which straddles at least one convex section out of convex sections of the plurality of concave and convex sections formed in a surrounding section of a bonding region between the first semiconductor chip and the second semiconductor chip. | 06-05-2014 |
20140151874 | BUMP-EQUIPPED ELECTRONIC COMPONENT AND METHOD FOR MANUFACTURING BUMP-EQUIPPED ELECTRONIC COMPONENT - A bump-equipped electronic component includes a circuit substrate and first and second bumps which are disposed on a principal surface of the circuit substrate and have different cross-sectional areas in a direction parallel or substantially parallel to the principal surface. One of the first and second bumps having a smaller cross-sectional area includes a height adjustment layer disposed in a direction perpendicular or substantially perpendicular to the principal surface. | 06-05-2014 |
20140151875 | CROSSTALK POLARITY REVERSAL AND CANCELLATION THROUGH SUBSTRATE MATERIAL TUNING - Transmission lines with a first dielectric material separating signal traces and a second dielectric material separating the signal traces from a ground plane. In embodiments, mutual capacitance is tuned relative to self-capacitance to reverse polarity of far end crosstalk between a victim and aggressor channel relative to that induced by other interconnect portions along the length of the channels, such as inductively coupled portions. In embodiments, a transmission line for a single-ended channel includes a material of a higher dielectric constant within the same routing plane as a microstrip or stripline conductor, and a material of a lower dielectric constant between the conductor and the ground plane(s). In embodiments, a transmission line for a differential pair includes a material of a lower dielectric constant within the same routing plane as a microstrip or stripline conductors, and a material of a higher dielectric constant between the conductors and the ground plane(s). | 06-05-2014 |
20140151876 | SEMICONDUCTOR PACKAGE AND PROCESS FOR FABRICATING SAME - A package carrier includes: (a) a dielectric layer defining a plurality of openings; (b) patterned electrically conductive layer, embedded in the dielectric layer and disposed adjacent to a first surface of the dielectric layer; (c) a plurality of electrically conductive posts, disposed in respective ones of the openings, wherein the openings extend between a second surface of the dielectric layer to the patterned electrically conductive layer, the electrically conductive posts are connected to the patterned electrically conductive layer, and an end of each of the electrically conductive posts has a curved profile and is faced away from the patterned electrically conductive layer; and (d) a patterned solder resist layer, disposed adjacent to the first surface of the dielectric layer and exposing portions of the patterned electrically conductive layer corresponding to contact pads. A semiconductor package includes the package carrier, a chip, and an encapsulant covering the chip and the package carrier. | 06-05-2014 |
20140151877 | SEMICONDUCTOR PACKAGE AND METHOD FOR FABRICATING THE SAME - A semiconductor package includes a semiconductor chip having a first bump group and a second bump group, and a package substrate having a first pattern for data communication with the semiconductor chip and a second pattern for supplying power to the semiconductor chip or grounding the semiconductor chip, wherein the first bump group is disposed on the first pattern and the second bump group is disposed on the second pattern. | 06-05-2014 |
20140151878 | System and Method for Fine Pitch PoP Structure - A fine pitch package-on-package (PoP), and a method of forming, are provided. The PoP may be formed by placing connections, e.g., solder balls, on a first substrate having a semiconductor die attached thereto. A first reflow process is performed to elongate the solder balls. Thereafter, a second substrate having another semiconductor die attached thereto is connected to the solder balls. A second reflow process is performed to form an hourglass connection. | 06-05-2014 |
20140159231 | SEMICONDUCTOR ASSEMBLY - A semiconductor assembly that may enhance dissipation of heat. The assembly includes a first die of a first material and defining a first passage. A second material, such as silicon carbide, diamond, or carbon nanotube, having a higher heat conductivity than the first material is disposed in the center of the first passage. An electronic component, which may be, for example, another die or a printed wiring board, is adjacent to the first die, is predominantly of a third material, and defines a first opening. A fourth material having a higher heat conductivity than the third material is disposed in the center of the first opening. The first opening is in alignment with the first passage, and may provide for heat transfer with a chimney effect between the materials of relatively high heat conductivity. A mold including a high heat conductivity material may also be provided. | 06-12-2014 |
20140159232 | Apparatus and Method for Three Dimensional Integrated Circuits - A structure comprises a substrate comprising a plurality of traces on top of the substrate, a plurality of connectors formed on a top surface of a semiconductor die, wherein the semiconductor die is formed on the substrate and coupled to the substrate through the plurality of connectors and a dummy metal structure formed at a corner of a top surface of the substrate, wherein the dummy metal structure has two discontinuous sections. | 06-12-2014 |
20140159233 | PACKAGE ON PACKAGE STRUCTURE AND METHOD OF MANUFACTURING THE SAME - A package on package structure includes a first substrate having a first region and a second region, a bump formed on the first region of the first substrate, a first semiconductor die bonded to the second region of the first substrate, and a semiconductor die package bonded to the first substrate. The bump includes a metallic structure and a plurality of minor elements dispersed in the metallic structure. The semiconductor die package includes a connector bonded to the bump, and the first semiconductor die is between the semiconductor die package and the first substrate. | 06-12-2014 |
20140159234 | SEMICONDUCTOR MANUFACTURING PROCESS AND STRUCTURE THEREOF - A semiconductor manufacturing process includes the following steps of providing a silicon substrate having at least one connection pad and a protection layer, forming a first seed layer having at least one first section and at least one second section, forming a first photoresist layer, forming a first buffer layer having a coupling portion and a cladding portion, removing the first photoresist layer, removing the second section of the first seed layer to form a first under bump metallurgy layer, forming a support layer on the protection layer and the first buffer layer, the first under bump metallurgy layer has a first ring wall, the first buffer layer has a second ring wall, wherein the first ring wall, the second ring wall and the cladding portion are cladded by the support layer, and forming a connection portion and covering the coupling portion with the connection portion. | 06-12-2014 |
20140159235 | ELECTRONIC COMPONENT, ELECTRONIC APPARATUS INCLUDING THE SAME, AND MANUFACTURING METHOD OF THE ELECTRONIC APPARATUS - An electronic component includes an electrode portion and a solder portion formed on the electrode portion. In the electronic component, the electrode portion includes a first conductive portion and a second conductive portion each having different diffusion coefficient with respect to a component of the solder portion on a top surface of the electrode portion, and the solder portion is formed on the first conductive portion and the second conductive portion. | 06-12-2014 |
20140159236 | Semiconductor Device Having High-Density Interconnect Array with Core Pillars Formed With OSP Coating - An interconnect structure for a semiconductor device is made by forming a contact pad on a substrate, forming an under bump metallization layer over the contact pad, forming a photoresist layer over the substrate, removing a portion of the photoresist layer to form an opening which exposes the UBM, depositing a first conductive material into the opening of the photoresist, removing the photoresist layer, depositing a second conductive material over the first conductive material, and coating the second conductive material with an organic solderability preservative. The interconnect structure is formed without solder reflow. The first conductive layer is nickel and the second conductive layer is copper. The organic solderability preservative is made with benzotriazole, rosin, rosin esters, benzimidazole compounds, or imidazole compounds. The interconnect structure decreases the pitch between the core pillars in the interconnect array and increases the density of I/O contacts on the semiconductor device. | 06-12-2014 |
20140167252 | LOW-COST LOW-PROFILE SOLDER BUMP PROCESS FOR ENABLING ULTRA-THIN WAFER-LEVEL PACKAGING (WLP) PACKAGES - Techniques are described herein for a dip soldering process which provides a low-profile, low-cost solder bump formation process which may be implemented to promote package thickness scaling (e.g., reduce the overall package thickness). For example, the dip soldering process disclosed herein may enable ultra-thin wafer-level packages (WLP), ultra-thin wafer level quad-flat no-leads (WQFN) packages, or the like. | 06-19-2014 |
20140167253 | Semiconductor Devices, Methods of Manufacture Thereof, and Packaged Semiconductor Devices - Semiconductor devices, methods of manufacture thereof, and packaged semiconductor devices are disclosed. In one embodiment, a semiconductor device includes a substrate and conductive traces disposed over the substrate. Each of the conductive traces has a bottom region proximate the substrate and a top region opposite the bottom region. The top region has a first width and the bottom region has a second width. The second width is greater than the first width. | 06-19-2014 |
20140167254 | BUMP STRUCTURES FOR SEMICONDUCTOR PACKAGE - A package structure includes a first substrate bonded to a second substrate by connecting metal pillars on the first substrate to connectors on the second substrate. A first metal pillar is formed overlying and electrically connected to a metal pad on a first region of the first substrate, and a second metal pillar is formed overlying a passivation layer in a second region of the first substrate. A first solder joint region is formed between metal pillar and the first connector, and a second solder joint region is formed between the second metal pillar and the second connector. The lateral dimension of the first metal pillar is greater than the lateral dimension of the second metal pillar. | 06-19-2014 |
20140167255 | PACKAGE STRUCTURE AND PACKAGE METHOD - Disclosed are a package structure and a package method. The package structure comprises an IC bare die, having bare die pads formed on a surface; a flexible packaging substrate, having first pads formed on a first surface and second pads formed on a second surface; and a plurality of bumps, previously formed on the first surface of the flexible packaging substrate. The bumps have different heights, and correspond to the first pads and contact the bare die pads respectively. Pressing or heating is implemented to package the IC bare die. The package structure further comprises a printed circuit board, having a plurality of contact pads. The second pads of the flexible packaging substrate respectively contact with the contact pads via solders. Connection is implemented by pressing or heating. Extremely low stress is generated to the packaging substrate and the printed circuit board. | 06-19-2014 |
20140167256 | FLIP CHIP PACKAGE STRUCTURE AND FABRICATION PROCESS THEREOF - Disclosed herein are various chip packaging structures and methods of fabrication. In one embodiment, a flip chip package structure can include: (i) a pad on a chip; (ii) an isolation layer on the chip and the pad, where the isolation layer includes a through hole that exposes a portion of an upper surface of the pad; (iii) a metal layer on the pad, where the metal layer fully covers the exposed upper surface portion of the pad; and (iv) a bump on the metal layer, where side edges of the bump do not make contact with the isolation layer. | 06-19-2014 |
20140167257 | FABRICATION OF THREE-DIMENSIONAL HIGH SURFACE AREA ELECTRODES - A method for fabricating three dimensional high surface electrodes is described. The methods including the steps: designing the pillars; selecting a material for the formation of the pillars; patterning the material; transferring the pattern to form the pillars; insulating the pillars and providing a metal layer for increased conductivity. Alternative methods for fabrication of the electrodes and fabrication of the electrodes using CMOS are also described. | 06-19-2014 |
20140167258 | SEMICONDUCTOR DEVICE - A semiconductor device includes a substantially rectangular semiconductor chip having an obverse surface, a first long side, a second long side opposite the first long side, a first short side and a second short side, and a plurality of bump electrodes. A wiring substrate has a main surface, a first side disposed outside of the semiconductor chip and extending substantially parallel with the first long side, a second side disposed outside of the semiconductor chip and extending substantially parallel with the second long side, and a plurality of wiring groups, each including a plurality of wirings. A semiconductor chip is mounted on the wiring substrate such that the obverse surface of the semiconductor chip is faced to the main surface of the wiring substrate and the first long side is located between the first side of the wiring substrate and the second long side, in a plan view. | 06-19-2014 |
20140167259 | PILLAR ON PAD INTERCONNECT STRUCTURES, SEMICONDUCTOR DEVICES INCLUDING SAME AND RELATED METHODS - Methods of fabricating interconnect structures for semiconductor dice comprise forming conductive elements in contact with bond pads on an active surface over a full pillar diameter of the conductive elements, followed by application of a photodefinable material comprising a photoresist to the active surface and over the conductive elements. The polyimide material is selectively exposed and developed to remove photodefinable material covering at least tops of the conductive elements. Semiconductor dice and semiconductor die assemblies are also disclosed. | 06-19-2014 |
20140167260 | SEMICONDUCTOR PACKAGES INCLUDING A PLURALITY OF UPPER SEMICONDUCTOR DEVICES ON A LOWER SEMICONDUCTOR DEVICE - Semiconductor packages are provided. The semiconductor packages may include an upper package including a plurality of upper semiconductor devices connected to an upper package substrate. The semiconductor packages may also include a lower package including a lower semiconductor device connected to a lower package substrate. The upper and lower packages may be connected to each other. | 06-19-2014 |
20140167261 | ROUTING LAYER FOR MITIGATING STRESS IN A SEMICONDUCTOR DIE - A routing layer for a semiconductor die is disclosed. The routing layer includes traces interconnecting integrated circuit bond-pads to UBMs. The routing layer is formed on a layer of dielectric material. The routing layer includes conductive traces arranged underneath the UBMs as to absorb stress from solder bumps attached to the UMBs. Traces beneath the UBMs protect parts of the underlying dielectric material proximate the solder bumps, from the stress. | 06-19-2014 |
20140175634 | METHODS OF PROMOTING ADHESION BETWEEN UNDERFILL AND CONDUCTIVE BUMPS AND STRUCTURES FORMED THEREBY - Methods of forming a microelectronic packaging structure and associated structures formed thereby are described. Those methods and structures may include modifying an underfill material with one of a thiol adhesion promoter, an azole coupling agent, surface modified filler, and peroxide based cross-linking polymer chemistries to greatly enhance adhesion in package structures utilizing the embodiments herein. | 06-26-2014 |
20140175635 | PACKAGING STRUCTURE - A packaging structure is provided. The packaging structure includes first and second chips, at least one surface of each of the first and second chips being an active surface and a common chip to which at least one of the first and second chips is electrically interconnected. The respective active surfaces of the first and second chips are directly electrically interconnected to one another in a face-to-face arrangement and are oriented transversely with respect to the common chip. | 06-26-2014 |
20140175636 | HIGH DENSITY INTERCONNECT DEVICE AND METHOD - Embodiments that allow both high density and low density interconnection between microelectronic die and motherboard via Direct Chip Attach (DCA) are described. In some embodiments, microelectronic die have a high density interconnect with a small bump pitch located along one edge and a lower density connection region with a larger bump pitch located in other regions of the die. The high density interconnect regions between die are interconnected using an interconnecting bridge made out of a material that can support high density interconnect manufactured into it, such as silicon. The lower density connection regions are used to attach interconnected die directly to a board using DCA. The high density interconnect can utilize current Controlled Collapsed Chip Connection (C4) spacing when interconnecting die with an interconnecting bridge, while allowing much larger spacing on circuit boards. | 06-26-2014 |
20140175637 | Back-to-back stacked integrated circuit assembly and method of making - An integrated circuit assembly includes a first substrate and a second substrate, with active layers formed on the first surfaces of each substrate, and with the second surfaces of each substrate coupled together. A method of fabricating an integrated circuit assembly includes forming active layers on the first surfaces of each of two substrates, and coupling the second surfaces of the substrates together. | 06-26-2014 |
20140175638 | SEMICONDUCTOR PACKAGES INCLUDING SEMICONDUCTOR CHIPS HAVING PROTRUSIONS AND METHODS OF FABRICATING THE SAME - The semiconductor package includes an upper semiconductor chip stacked on a package substrate and a support layer or a lower semiconductor chip disposed between the upper semiconductor chip and the package substrate. The upper semiconductor chip includes a protrusion downwardly extending from an edge thereof. The protrusion of the upper semiconductor chip is combined with a sidewall of the support layer or the lower semiconductor chip. Related methods are also provided. | 06-26-2014 |
20140175639 | Semiconductor Device and Method of Simultaneous Molding and Thermalcompression Bonding - A semiconductor device has a semiconductor die disposed over a substrate. The semiconductor die and substrate are placed in a chase mold. An encapsulant is deposited over and between the semiconductor die and substrate simultaneous with bonding the semiconductor die to the substrate in the chase mold. The semiconductor die is bonded to the substrate using thermocompression by application of force and elevated temperature. An electrical interconnect structure, such as a bump, pillar bump, or stud bump, is formed over the semiconductor die. A flux material is deposited over the interconnect structure. A solder paste or SOP is deposited over a conductive layer of the substrate. The flux material and SOP provide temporary bond between the semiconductor die and substrate. The interconnect structure is bonded to the SOP. Alternatively, the interconnect structure can be bonded directly to the conductive layer of the substrate, with or without the flux material. | 06-26-2014 |
20140175640 | Semiconductor Device and Method of Bonding Semiconductor Die to Substrate in Reconstituted Wafer Form - A semiconductor device has a plurality of semiconductor die disposed over a carrier. An electrical interconnect, such as a stud bump, is formed over the semiconductor die. The stud bumps are trimmed to a uniform height. A substrate includes a bump over the substrate. The electrical interconnect of the semiconductor die is bonded to the bumps of the substrate while the semiconductor die is disposed over the carrier. An underfill material is deposited between the semiconductor die and substrate. Alternatively, an encapsulant is deposited over the semiconductor die and substrate using a chase mold. The bonding of stud bumps of the semiconductor die to bumps of the substrate is performed using gang reflow or thermocompression while the semiconductor die are in reconstituted wafer form and attached to the carrier to provide a high throughput of the flipchip type interconnect to the substrate. | 06-26-2014 |
20140175641 | Method for Welding Gold-Silicon Eutectic Chip, and Transistor - Relating to electronic components, the present disclosure provides a method for welding a gold-silicon eutectic chip, and a transistor. The method for welding a gold-silicon eutectic chip includes: electroplating a gold layer with a thickness smaller than or equal to 1 micron on surfaces of a chip carrier; bonding multiple gold protrusions on the gold layer in a welding region; and rubbing a chip in the welding region at a eutectic temperature to form a welding layer. The transistor includes a chip, a chip carrier, and a middle layer connecting the chip and the chip carrier, where the welding middle layer is a welding layer obtained by using the above welding method. The present disclosure reduces an amount of gold in use and lowers a cost of gold-silicon eutectic welding to a relatively large extent, and, accordingly, cuts down the cost of a transistor. | 06-26-2014 |
20140175642 | Semiconductor Device and Method of Forming Interconnect Structure with Conductive Pads Having Expanded Interconnect Surface Area for Enhanced Interconnection Properties - A semiconductor device has a substrate and first conductive pads formed over the substrate. An interconnect surface area of the first conductive pads is expanded by forming a plurality of recesses into the first conductive pads. The recesses can be an arrangement of concentric rings, arrangement of circular recesses, or arrangement of parallel linear trenches. Alternatively, the interconnect surface area of the first conductive pads is expanded by forming a second conductive pad over the first conductive pad. A semiconductor die has a plurality of interconnect structures formed over a surface of the semiconductor die. The semiconductor die is mounted to the substrate with the interconnect structures contacting the expanded interconnect surface area of the first conductive pads to increase bonding strength of the interconnect structure to the first conductive pads. A mold underfill material is deposited between the semiconductor die and substrate. | 06-26-2014 |
20140175643 | APPARATUSES AND METHODS TO ENHANCE PASSIVATION AND ILD RELIABILITY - Some embodiments of the present invention include apparatuses and methods relating to processing and packaging microelectronic devices that reduce stresses on and limit or eliminate crack propagation in the devices. | 06-26-2014 |
20140183723 | STACKED MULTI-CHIP PACKAGE AND METHOD OF MAKING SAME - Stacked multichip packages and methods of making multichip packages. A method includes using a boat having different depth openings corresponding to the length of column interconnections of the completed multichip package and masks to place proper length columns in the corresponding depth openings; placing an integrated circuit chip on the boat and attaching exposed upper ends of the columns to respective chip pads of the integrated circuit using a first solder reflow process and attaching a preformed package substrate integrated circuit chip stack to the integrated circuit and attached columns using a second solder reflow process. | 07-03-2014 |
20140183724 | SUBSTRATE FOR SEMICONDUCTOR PACKAGE, SEMICONDUCTOR PACKAGE USING THE SAME, AND MANUFACTURING METHOD THEREOF - A substrate for a semiconductor package includes a substrate body having a first surface and a second surface which faces away from the first surface, and formed with at least one bump land on the first surface, and a dam formed and projected over an edge of the first surface of the substrate body, and having an underfill member discharge unit. | 07-03-2014 |
20140183725 | POST-PASSIVATION INTERCONNECT STRUCTURE AND METHOD OF FORMING THE SAME - A semiconductor device includes a passivation layer formed on a semiconductor substrate, a protective layer overlying the passivation layer and having an opening, an interconnect structure formed in the opening of the protective layer, a bump formed on the interconnect structure, and a molding compound layer overlying the interconnect structure and being in physical contact with a lower portion of the bump. | 07-03-2014 |
20140183726 | PACKAGE SUBSTRATE, METHOD FOR MANUFACTURING THE SAME, AND PACKAGE ON PACKAGE SUBSTRATE - The present invention relates to a package substrate, a method for manufacturing the same, and a package on package substrate. In accordance with an embodiment of the present invention, a package substrate including: an inner insulating layer; a circuit pattern layer formed on the inner insulating layer; an outer insulating layer formed on the inner insulating layer to protect the circuit pattern layer and expose portions of external and internal patterns of the circuit pattern layer; a mixed pattern layer consisting of post bumps and outermost layer patterns formed on the portions of the internal and external patterns exposed by the outer insulating layer; and a resist layer formed on the outer insulating layer to protect the outermost layer patterns of the mixed pattern layer and expose the outermost layer patterns by an open region. | 07-03-2014 |
20140183727 | WATERFALL WIRE BONDING - A wire bonded structure for a semiconductor device is disclosed. The wire bonded structure comprises a bonding pad; and a continuous length of wire mutually diffused with the bonding pad, the wire electrically coupling the bonding pad with a first electrical contact and a second electrical contact different from the first electrical contact. | 07-03-2014 |
20140183728 | WAFER SUPPORTING STRUCTURE, INTERMEDIATE STRUCTURE OF A SEMICONDUCTOR PACKAGE INCLUDING THE WAFER SUPPORTING STRUCTURE - A wafer supporting structure includes a supporting substrate for supporting a wafer, a release layer for detaching the wafer from the supporting substrate, and an adhesive layer for attaching the wafer to the supporting substrate. | 07-03-2014 |
20140183729 | SENSOR PACKAGES HAVING SEMICONDUCTOR DIES OF DIFFERING SIZES - A sensor package comprises a composite structure in which the composite structure includes a first electronic component having first bond pads, the first electronic component exhibiting a first surface area. A mold material encapsulates the first electronic component to produce the composite structure, and the composite structure exhibits a second surface area that is greater than the first surface area. The sensor package further comprises a second electronic component having a top side and a bottom side opposing the top side. The top side includes second bond pads, and the bottom side is bonded to an outer surface of the composite structure to form a stacked structure. Electrical interconnects are attached between corresponding ones of the first bond pads and the second bond pads. | 07-03-2014 |
20140183730 | SEMICONDUCTOR DEVICE HAVING A LIQUID COOLING MODULE - A semiconductor device comprises a mounting substrate, a semiconductor element provided above said mounting substrate, a package substrate provided above said mounting substrate with said semiconductor element therebetween and electrically connected to said semiconductor element via a primary connecting bump, a liquid cooling module cooling said semiconductor element by a liquid refrigerant, in which a heat receiving section of the liquid cooling module is disposed between said semiconductor element and said mounting substrate, and a plurality of secondary connecting bumps provided between said package substrate and said mounting substrate. | 07-03-2014 |
20140191390 | Metal Routing Architecture for Integrated Circuits - A device includes a substrate, a metal pad over the substrate, and a metal trace electrically disconnected from the metal pad. The metal pad and the metal trace are level with each other. A passivation layer includes a portion overlapping an edge portion of the metal pad. A metal pillar is overlying the metal pad, and is electrically connected to the metal pad. The metal trace has a portion overlapped by the metal pillar. | 07-10-2014 |
20140191391 | ELONGATED BUMP STRUCTURES IN PACKAGE STRUCTURE - A package structure includes a chip attached to a substrate. The chip includes a bump structure including a conductive pillar having a length (L) measured along a long axis of the conductive pillar and a width (W) measured along a short axis of the conductive pillar. The substrate includes a pad region and a mask layer overlying the pad region, wherein the mask layer has an opening exposing a portion of the pad region. The chip is attached to the substrate to form an interconnection between the conductive pillar and the pad region. The opening has a first dimension (d1) measured along the long axis and a second dimension (d2) measured along the short axis. In an embodiment, L is greater than d1, and W is less than d2. | 07-10-2014 |
20140191392 | Post-Passivation Interconnect Structure and Methods for Forming the Same - A method includes forming a polymer layer over a passivation layer, wherein the passivation layer further comprises a portion over a metal pad. The polymer layer is patterned to form an opening in the polymer layer, wherein exposed surfaces of the polymer layer have a first roughness. A surface treatment is performed to increase a roughness of the polymer layer to a second roughness greater than the first roughness. A metallic feature is formed over the exposed surface of the polymer layer. | 07-10-2014 |
20140191393 | SEMICONDUCTOR PACKAGE AND FABRICATION METHOD THEREOF - A semiconductor package is provided, including a carrier having electrical connecting pads, a semiconductor element disposed on the carrier and having electrode pads, conductive elements electrically connected to the electrode pads and the electrical connecting pads, fluorine ions formed between the conductive elements and the electrode pads or between the conductive elements and the electrical connecting pads, and an encapsulant formed on the carrier and the conductive elements, wherein the electrode pads or the electrical connecting pads are formed by aluminum materials to form fluorine aluminum by way of packaging the fluorine ions after the completion of the packaging process. Accordingly, the corrosion resistance of the semiconductor package is increased. | 07-10-2014 |
20140191394 | Bumps for Chip Scale Packaging - A chip scale semiconductor device comprises a semiconductor die, a first bump and a second bump. The first bump having a first diameter and a first height is formed on an outer region of the semiconductor die. A second bump having a second diameter and a second height is formed on an inner region of the semiconductor die. The second diameter is greater than the first diameter while the second height is the same as the first height. By changing the shape of the bump, the stress and strain can be redistributed through the bump. As a result, the thermal cycling reliability of the chip scale semiconductor device is improved. | 07-10-2014 |
20140191395 | Forming Interconnect Structures Using Pre-Ink-Printed Sheets - A method of forming a device includes printing conductive patterns on a dielectric sheet to form a pre-ink-printed sheet, and bonding the pre-ink-printed sheet onto a side of a substrate. The conductive feature includes a through-substrate via extending from a first major side of the substrate to a second major side of the substrate opposite the first major side. A conductive paste is then applied to electrically couple conductive patterns to a conductive feature in the substrate. | 07-10-2014 |
20140191396 | SEMICONDUCTOR PACKAGE AND METHOD FOR FABRICATING BASE FOR SEMICONDUCTOR PACKAGE - In one configuration, a semiconductor package includes a conductive trace embedded in a base and a semiconductor device mounted on the conductive trace via a conductive structure, wherein the conductive structure is a bump structure and the width of the bump structure is bigger than the width of the conductive trace. In another configuration, a method for fabricating a semiconductor package includes providing a base, forming at least one conductive trace on the base, forming an additional insulation material on the base, and defining patterns upon the additional insulation material, wherein the pattern is formed on at least one conductive trace, wherein the conductive structure is a bump structure and the width of the bump structure is bigger than the width of the conductive trace. | 07-10-2014 |
20140191397 | PACKAGE SUBSTRATE AND SEMICONDUCTOR PACKAGE INCLUDING THE SAME - A package substrate may include an insulating substrate, a dummy pad, a signal pad and a plug. The dummy pad may be formed on an upper surface of the insulating substrate. The signal pad may be formed on the upper surface of the insulating substrate. The signal pad may have an upper surface protruded from an upper surface of the dummy pad. The plug may be vertically formed in the insulating substrate. The plug may have an upper end exposed through the upper surface of the insulating substrate and connected with the signal pad and the dummy pad, and a lower end exposed through a lower surface of the insulating substrate. Thus, a signal bump may accurately make contact with the protruded upper surface of the signal pad. | 07-10-2014 |
20140197534 | SUBSTRATE WITH BOND FINGERS - A flip chip mounting board includes a substrate having a top surface and a plurality of generally parallel, longitudinally extending, laterally spaced apart bond fingers are formed on the top surface. Each of the plurality of bond fingers has a first longitudinal end portion and a second longitudinal end portion. A first strip of laterally extending solder resist material overlies the first longitudinal end portions of the bond fingers. The first strip has an edge wall with a plurality of longitudinally projecting tooth portions separated by gaps with a longitudinally extending tooth portion being aligned with every other one of the bond fingers. Adjacent bond fingers have first end portions covered by different longitudinal lengths of solder resist material. | 07-17-2014 |
20140197535 | WAFER-LEVEL PACKAGING MECHANISMS - A semiconductor package includes a first semiconductor die surrounded by a molding compound. The semiconductor package further includes a first conductive pad on the first semiconductor die, wherein the first conductive pad is at a top metal level of the first semiconductor die. The semiconductor package further includes redistribution lines (RDLs) formed over the first conductive pad, wherein at least one RDL of the RDLs extends beyond the boundaries of the semiconductor die, and a portion of the at least one RDL contacts the first conductive pad, wherein a surface of the first conductive pad contacting the portion of the at least one RDL is at a different level than a surface of the molding compound under the at least one RDL extended beyond the boundaries of the first semiconductor die. | 07-17-2014 |
20140203428 | CHIP STACK WITH ELECTRICALLY INSULATING WALLS - A chip stack is provided and includes two or more chips, a solder joint operably disposed between adjacent ones of the two or more chips, the solder joint occupying about 25-30% or more of an area of the chip stack and insulating walls disposed on at least one of the two or more chips to separate the solder joint from an adjacent solder joint. | 07-24-2014 |
20140203429 | FAN-OUT PACKAGE STRUCTURE AND METHODS FOR FORMING THE SAME - A package includes a device die including a first plurality of metal pillars at a top surface of the device die. The package further includes a die stack including a plurality of dies bonded together, and a second plurality of metal pillars at a top surface of the die stack. A polymer region includes first portions encircling the device die and the die stack, wherein a bottom surface of the polymer region is substantially level with a bottom surface of the device die and a bottom surface of the die stack. A top surface of the polymer region is level with top ends of the first plurality of metal pillars and top ends of the second plurality of metal pillars. Redistribution lines are formed over and electrically coupled to the first and the second plurality of metal pillars. | 07-24-2014 |
20140203430 | INTERCONNECTION DESIGNS AND MATERIALS HAVING IMPROVED STRENGTH AND FATIGUE LIFE - Methods and designs for increasing interconnect areas for interconnect bumps are disclosed. An interconnect bump may be formed on a substrate such that the interconnect bump extends beyond a contact pad onto a substrate. An interconnect bump may be formed on a larger contact pad, the bump having a large diameter. | 07-24-2014 |
20140203431 | SEMICONDUCTOR DEVICE - To improve reliability of a semiconductor device, in a flip-chip bonding step, a solder material that is attached to a tip end surface of a projecting electrode in advance and a solder material that is applied in advance over a terminal (bonding lead) are heated and thereby integrated and electrically connected to each other. The terminal includes a wide part (a first portion) with a first width W | 07-24-2014 |
20140203432 | Method for Packaging Quad Flat Non-Leaded Package Body, and Package Body - A method for packaging a quad flat non-leaded (QFN) package body. The method includes: etching an upper surface of a metal plate to process a groove to form a bond wire bench, a component bench, and a bump; processing the bump to a preset height, and assembling a component on the component bench; packaging the processed metal plate to form a package body, and exposing the surface of the processed bump on an upper surface of the package body to form a top lead; and etching a lower surface of the package body to process a bottom lead. In the present invention, large passive components can be stacked on the QFN package body with a top lead; the structure is simplified while the reliability of the welding joints is improved; a plurality of components can be stacked through the top lead to overcome the limitations of component stacking. | 07-24-2014 |
20140210074 | Semiconductor Devices, Methods of Manufacture Thereof, and Semiconductor Device Packages - Semiconductor devices, methods of manufacture thereof, and semiconductor device packages are disclosed. In one embodiment, a semiconductor device includes an insulating material layer having openings on a surface of a substrate. One or more insertion bumps are disposed over the insulating material layer. The semiconductor device includes signal bumps having portions that are not disposed over the insulating material layer. | 07-31-2014 |
20140210075 | METHODS FOR PROCESSING SUBSTRATES - A method for processing substrates includes providing a bonding layer between a substrate and a carrier to bond the substrate to the carrier, processing the substrate while the substrate is supported by the carrier, and removing the bonding layer to separate the substrate from the carrier. The bonding layer may include a thermosetting release layer and thermosetting glue layers, wherein at least one of the thermosetting glue layers is provided on each side of the thermosetting release layer. | 07-31-2014 |
20140210076 | FLIP-CHIP HYBRIDIZATION OF MICROELECTRONIC COMPONENTS BY LOCAL HEATING OF CONNECTING ELEMENTS - A method of forming a hybridized device including forming a first component provided with metal bumps, and a second component provided with connection elements, attaching the bumps to the connection elements. The manufacturing of the second component includes forming, on a surface of a substrate, resistive elements at the locations provided for the connection elements; depositing an electric insulator layer at least on the resistive elements; and forming the connection elements, each comprising a metal well having an opening capable of receiving the corresponding metal bump of the first microelectronic component and at least partially filled with a fusible element, particularly indium or an alloy of tin and gold, or with a conductive ink, particularly based on silver or copper. Further, the attachment of the balls to the connection elements comprises applying an electric current through the resistive elements to heat the bumps. | 07-31-2014 |
20140210077 | INTEGRATED CIRCUIT SYSTEM WITH DISTRIBUTED POWER SUPPLY - An integrated circuit system comprises an interposer, a first integrated circuit, and at least one voltage regulator module. The first integrated circuit comprises first bond pads, and is electrically connected to the interposer at a first position of the interposer via the first bond pads. The first integrated circuit also comprises second bond pads. The first integrated circuit further comprises at least two circuit blocks. The at least two circuit blocks are configured to operate at different operating voltages. The at least one voltage regulator module is electrically connected to the first integrated circuit via the second bond pads, and the at least one voltage regulator module is configured to convert a received power supply voltage to the respective operating voltage of one of the at least two circuit blocks and supply the respective operating voltage via the second bond pads. | 07-31-2014 |
20140210078 | RFID Chip Module - A chip module comprises a carrier, having a first main surface and a second main surface opposite to the first main surface. A first recess structure is arranged in the carrier in the first main surface, and a chip is arranged in the first recess structure of the carrier. A patterned metallization layer is deposited on the second main surface of the carrier, the metallization layer having a first metallization structure and a second metallization structure, the first metallization structure being electrically isolated from the second metallization structure. The chip is electrically connected to the first metallization structure and the second metallization structure. The chip module comprises in particular an RFID chip and is suited to be connected to a textile substrate by way of laser reflow soldering. | 07-31-2014 |
20140210079 | METHOD FOR DESIGNING POWER DISTRIBUTION NETWORK OF CIRCUIT SYSTEM AND RELATED CIRCUIT SYSTEM - A method for designing a power distribution network of a circuit system includes the following steps: determining positions of a plurality of power source nodes; estimating a current distribution condition of the circuit system; and creating a first part of the power distribution network according to at least the positions of the power source nodes. | 07-31-2014 |
20140217578 | SEMICONDUCTOR PACKAGE PROCESS AND STRUCTURE THEREOF - A semiconductor package process includes the following steps, providing a first substrate having a first metal bump, the first metal bump comprises a joint portion having a first softening point; providing a second substrate having a second metal bump having a top surface, a lateral surface and a second softening point, wherein the first softening point is smaller than the second softening point; performing a heating procedure to make the joint portion of the first metal bump become a softened state; and laminating the first substrate on the second substrate to make the second metal bump embedded into the joint portion in the softened state to make the top surface and the lateral surface of the at least one second metal bump being clad extendedly by compressing the joint portion in the softened state. | 08-07-2014 |
20140217579 | HIGH DENSITY PACKAGE INTERCONNECTS - Electronic assemblies and methods including the formation of interconnect structures are described. In one embodiment an apparatus includes semiconductor die and a first metal bump on the die, the first metal bump including a surface having a first part and a second part. The apparatus also includes a solder resistant coating covering the first part of the surface and leaving the second part of the surface uncovered. Other embodiments are described and claimed. | 08-07-2014 |
20140217580 | SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME - A semiconductor device includes a bonding pad on a semiconductor substrate, a bump on the bonding pad, a solder on the bump, and an anti-wetting layer between the bump and the solder extending along a sidewall of the bump, the anti-wetting layer having a first thickness T | 08-07-2014 |
20140217581 | ELECTRONIC COMPONENT, MOTHER SUBSTRATE, AND ELECTRONIC COMPONENT MANUFACTURING METHOD - An electronic component includes a plurality of electrodes provided in a rectangular or substantially rectangular box-shaped area on an upper surface of a substrate, an electronic component element mounted on the substrate by flip-chip bonding, and an identification mark. The identification mark is provided between a first electrode, which is arranged along one side of the rectangular or substantially rectangular box-shaped area, and a second electrode, which is adjacent to the first electrode along the one side, of the plurality of electrodes provided on the upper surface of the substrate, and is located on or outside a line connecting the outer side edges of the first and second electrodes. | 08-07-2014 |
20140217582 | SEMICONDUCTOR DEVICE - This invention provides a multi-pin semiconductor device as a low-cost flip-chip BGA. In the flip-chip BGA, a plurality of signal bonding electrodes in a peripheral area of the upper surface of a multilayer wiring substrate are separated into inner and outer ones and a plurality of signal through holes coupled to a plurality of signal wirings drawn inside are located between a plurality of rows of signal bonding electrodes and a central region where a plurality of bonding electrodes for core power supply are located so that the chip pad pitch can be decreased and the cost of the BGA can be reduced without an increase in the number of layers in the multilayer wiring substrate. | 08-07-2014 |
20140217583 | SEMICONDUCTOR DEVICE INCLUDING A BUFFER LAYER STRUCTURE FOR REDUCING STRESS - A semiconductor device includes a semiconductor chip, wiring that is included in the semiconductor chip and has a coupling part between parts with different widths, a pad being formed above the wiring and in a position overlapping the coupling part, a bump being formed on the pad, a buffer layer being formed in a position between the coupling part and the pad so as to cover the entire coupling part, and inorganic insulating layers being formed between the wiring and the buffer layer and between the buffer layer and the pad, respectively. The buffer layer is made of a material other than resin and softer than the inorganic insulating layer | 08-07-2014 |
20140217584 | FLOW UNDERFILL FOR MICROELECTRONIC PACKAGES - A microelectronic assembly includes a first component with first conductive elements; a second component with second conductive elements; a bond metal; and an underfill layer. The posts have a height above the respective surface from which the posts project. A bond metal can be disposed between respective pairs of conductive elements, each pair including at least one of the posts and at least one of the first or second conductive elements confronting the at least one post. The bond metal can contact edges of the posts along at least one half the height of the posts. An underfill layer contacts and bonds the first and second surfaces of the first and second components. A residue of the underfill layer may be present at at least one interfacial surfaces between at least some of the posts and the bond metal or may be present within the bond metal. | 08-07-2014 |
20140231984 | Molding Compound Structure - A device comprises a package component comprising a plurality of bumps formed on a first side of the package component, a semiconductor die mounted on the first side of the package component, a dielectric material formed over the first side of the package component, wherein four corners of the top surface of the package component are free from the dielectric material and a top package bonded on the first side of the package component, wherein the semiconductor die is located between the top package and the package component. | 08-21-2014 |
20140231985 | SEMICONDUCTOR CHIP PACKAGE STRUCTURE - A method for fixing a semiconductor chip on a circuit board is provided, which includes following steps. The circuit board is provided, which sequentially includes a substrate having a chip connecting portion, at least one metal wire and an insulating layer. An organic insulating material is formed on the insulating layer of the outside edge of the chip connecting portion. An anisotropic conductive film (ACF) is then formed to cover the chip connecting portion and a portion of the organic insulating material Finally, a semiconductor chip is hot-pressed on the ACF. The organic insulating material formed on the insulating layer is used to prevent the metal wires beneath the insulating layer from occurring of corrosion. A semiconductor chip package structure is also provided. | 08-21-2014 |
20140231986 | THROUGH SUBSTRATE VIA (TSUV) STRUCTURES AND METHOD OF MAKING THE SAME - Through substrate via (TSuV) structures and method of making the same are disclosed herein. In embodiments, TSuV structures are metal filled selectively to avoid forming significant metal overburden on non-via surfaces of the substrate. In certain embodiments, post-fill metal removal/planarization operations are eliminated for reduced process complexity and manufacturing cost. In embodiments, selective metal fill entails selective electroless or electrolytic deposition. Both front side and back side selective deposition methods are described along with features of through substrate via structures made with such methods. | 08-21-2014 |
20140231987 | Connector Structures of Integrated Circuits - A die includes a substrate, a metal pad over the substrate, and a passivation layer covering edge portions of the metal pad. A metal pillar is formed over the metal pad. A portion of the metal pillar overlaps a portion of the metal pad. A center of the metal pillar is misaligned with a center of the metal pad. | 08-21-2014 |
20140231988 | Packaging Methods and Packaged Semiconductor Devices - Packaging methods and packaged semiconductor devices are disclosed. In one embodiment, a packaging method includes providing a first die, partially packaging the first die, and forming a plurality of solder balls on a surface of the partially packaged first die. An epoxy flux is disposed over the plurality of solder balls. A second die is provided, and the second die is partially packaged. The plurality of solder balls is coupled to the partially packaged second die. | 08-21-2014 |
20140231989 | Semiconductor Device and Method of Embedding Bumps Formed on Semiconductor Die into Penetrable Adhesive Layer to Reduce Die Shifting During Encapsulation - A semiconductor device has a semiconductor die with a plurality of bumps formed over a surface of the first semiconductor die. A penetrable adhesive layer is formed over a temporary carrier. The adhesive layer can include a plurality of slots. The semiconductor die is mounted to the carrier by embedding the bumps into the penetrable adhesive layer. The semiconductor die and interconnect structure can be separated by a gap. An encapsulant is deposited over the first semiconductor die. The bumps embedded into the penetrable adhesive layer reduce shifting of the first semiconductor die while depositing the encapsulant. The carrier is removed. An interconnect structure is formed over the semiconductor die. The interconnect structure is electrically connected to the bumps. A thermally conductive bump is formed over the semiconductor die, and a heat sink is mounted to the interconnect structure and thermally connected to the thermally conductive bump. | 08-21-2014 |
20140231990 | WIRING BOARD AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device includes a semiconductor chip and a wiring board formed on the semiconductor chip. The wiring board includes a first insulation layer, first conductive patterns on the first layer, first via conductors formed in the first layer and connecting the first patterns and electrode pads of the chip, respectively, a second insulation layer on the first layer, second conductive patterns on the second layer, and second via conductors formed in the second layer and connecting the first conductive patterns and the second patterns, respectively, each second via conductors has a side surface extending through the second layer such that the side surface has a bent portion which changes inclination of the side surface in depth direction of each second via conductor, and the second patterns are positioned to fan in or out with respect to the electrode pads. | 08-21-2014 |
20140231991 | Method of Fabricating Three Dimensional Integrated Circuit - A method of fabricating a three dimensional integrated circuit comprises forming a redistribution layer on a first side of a packaging component, forming a holding chamber in the redistribution layer, attaching an integrated circuit die on the first side of the packaging component, wherein an interconnect bump of the integrated circuit die is inserted into the holding chamber, applying a reflow process to the integrated circuit die and the packaging component and forming an encapsulation layer on the packaging component. | 08-21-2014 |
20140239490 | PACKAGING SUBSTRATE AND FABRICATION METHOD THEREOF - A packaging substrate and a fabrication method thereof are disclosed. The packaging substrate includes: a substrate body having a plurality of first and second conductive pads formed on a surface thereof; a first insulating layer formed on the surface of the substrate body and having a plurality of first and second openings for respectively exposing the first and second conductive pads; a conductive layer formed on the first and second conductive pads and the first insulating layer around peripheries of the first and second conductive pads; a plurality of first and second conductive bumps formed on the conductive layer on the first and second conductive pads, respectively; a solder layer formed on the second conductive bumps; and a plurality of conductive posts formed on the first conductive bumps and having a width different from that of the first conductive bumps. The invention improves the fabrication efficiency. | 08-28-2014 |
20140239491 | MICROELECTRONIC UNIT AND PACKAGE WITH POSITIONAL REVERSAL - A semiconductor unit includes a chip having left and right columns of contacts at its front surface. Interconnect pads are provided overlying the front surface of the chip and connected to at least some of the contacts as, for example, by traces or by arrangements including wire bonds. The interconnect pads alone, or the interconnect pads and some of the contacts, provide an array of external connection elements. This array includes some reversal pairs of external connection elements in which the external connection element connected to or incorporating the right contact is disposed to the left of the external connection element incorporating or connected to the left contact. Such a unit may be used in a multi-chip. The reversed connections simplify routing, particularly where corresponding contacts of two chips are to be connected to common terminals on the package substrate. | 08-28-2014 |
20140239492 | SEMICONDUCTOR APPARATUS - A semiconductor apparatus includes a first wiring substrate, a second wiring substrate positioned above the first wiring substrate, multiple connection terminals provided between the first wiring substrate and the second wiring substrate and configured to electrically connect the first wiring substrate and the second wiring substrate, an electronic component provided on at least one of the first wiring substrate and the second wiring substrate. The multiple connection terminals include a signal terminal and ground terminals provided on both sides of the signal terminal. The signal terminal and the ground terminals have side surfaces that face each other. The signal terminal and the ground terminals are adjacently arranged, so that intervals between the side surfaces of the signal terminal and the ground terminals are constant from a plan view. | 08-28-2014 |
20140239493 | SEMICONDUCTOR CHIP AND SEMICONDUCTOR DEVICE - Provided is a semiconductor chip that is flip-chip mounted where an inner chip pad array and an outer chip pad array, which are arranged on an inner side and an outer side of IO cells in a staggered manner, are arranged to be spaced away from each other by a predetermined gap or greater. The predetermined gap represents a gap where one via can be arranged between an inner substrate pad array and an outer substrate pad array on a substrate which faces and is connected to the inner chip pad array and the outer chip pad array. In addition, the predetermined gap represents a gap where a plated wire is interconnected and then a resist opening for etch-back can be formed. Even in a case where a space for forming an interconnection is not present between outer substrate pad arrays, interconnection characteristics of the substrate are improved. | 08-28-2014 |
20140239494 | SEMICONDUCTOR PACKAGE STRUCTURE AND SEMICONDUCTOR PROCESS - The disclosure relates to a semiconductor bonding structure and process and a semiconductor chip. The semiconductor bonding structure includes a first pillar, a first interface, an intermediate area, a second interface and a second pillar in sequence. The first pillar, the second pillar and the intermediate area include a first metal. The first interface and the second interface include the first metal and an oxide of a second metal. The content percentage of the first metal in the first interface and the second interface is less than that of the first metal in the intermediate area. | 08-28-2014 |
20140239495 | Semiconductor Device and Method of Forming a Vertical Interconnect Structure for 3-D FO-WLCSP - A semiconductor device is made by forming a first conductive layer over a carrier. The first conductive layer has a first area electrically isolated from a second area of the first conductive layer. A conductive pillar is formed over the first area of the first conductive layer. A semiconductor die or component is mounted to the second area of the first conductive layer. A first encapsulant is deposited over the semiconductor die and around the conductive pillar. A first interconnect structure is formed over the first encapsulant. The first interconnect structure is electrically connected to the conductive pillar. The carrier is removed. A portion of the first conductive layer is removed. The remaining portion of the first conductive layer includes an interconnect line and UBM pad. A second interconnect structure is formed over a remaining portion of the first conductive layer is removed. | 08-28-2014 |
20140239496 | Semiconductor Device and Method of Forming Micro-Vias Partially Through Insulating Material Over Bump Interconnect Conductive Layer for Stress Relief - A semiconductor device has a semiconductor die and first insulating layer formed over the semiconductor die. A plurality of first micro-vias can be formed in the first insulating layer. A conductive layer is formed in the first micro-openings and over the first insulating layer. A second insulating layer is formed over the first insulating layer and conductive layer. A portion of the second insulating layer is removed to expose the conductive layer and form a plurality of second micro-openings in the second insulating layer over the conductive layer. The second micro-openings can be micro-vias, micro-via ring, or micro-via slots. Removing the portion of the second insulating layer leaves an island of the second insulating layer over the conductive layer. A bump is formed over the conductive layer. A third insulating layer is formed in the second micro-openings over the bump. The second micro-openings provide stress relief. | 08-28-2014 |
20140246771 | PACKAGE SUBSTRATE, METHOD OF MANUFACTURING THE PACKAGE SUBSTRATE AND SEMICONDUCTOR PACKAGE INCLUDING THE PACKAGE SUBSTRATE - A package substrate may include an insulating substrate, a first land array, a second land array, a first plating line and a second plating line. The first land array may be arranged on a first surface of the insulating substrate. The second land array may be arranged on a second surface of the insulating substrate opposite to the first surface. The second land array may be electrically connected to the first land array. The second land array may include outer lands and inner lands. The first plating line may be connected to the outer lands. The second plating line may be connected between the outer lands and the inner lands. The second plating line may have a width narrower than that of the first plating line. The second plating line may be removed by applying a removing current to the first plating line prior to the first plating line. | 09-04-2014 |
20140246772 | Passivation Scheme - An integrated circuit includes a conductive pad disposed over a substrate. A first passivation layer is disposed over the conductive pad. A second passivation layer is disposed over the first passivation layer. A stress buffer layer is disposed over the second passivation layer. A conductive interconnect layer is over and coupled to the conductive pad and over the stress buffer layer with the conductive interconnect layer adjoining sidewalls of the first passivation layer and the stress buffer layer. | 09-04-2014 |
20140252592 | PAD DEFINED CONTACT FOR WAFER LEVEL PACKAGE - A device and fabrication techniques are described that employ wafer-level packaging techniques for fabricating semiconductor devices that include a pad defined contact. In implementations, the wafer-level package device that employs the techniques of the present disclosure includes a substrate, a passivation layer, a top metal contact pad, a thin film with a via formed therein, a redistribution layer structure configured to contact the top metal contact pad, and a dielectric layer on the thin film and the redistribution layer structure. In implementations, a process for fabricating the wafer-level package device that employs the techniques of the present disclosure includes processing a substrate, forming a passivation layer, depositing a top metal contact pad, forming a thin film with a via formed therein, forming a redistribution layer structure in the via formed in the thin film, and forming a dielectric layer on the thin film and the redistribution layer structure. | 09-11-2014 |
20140252593 | Method and Apparatus for Connecting Packages onto Printed Circuit Boards - Methods and apparatus are disclosed for attaching the integrated circuit (IC) packages to printed circuit boards (PCBs) to form smooth solder joints. A polymer flux may be provided in the process to mount an IC package to a PCB. The polymer flux may be provided on connectors of the IC package, or provided on PCB contact pad and/or pre-solder of the PCB. When the IC package is mounted onto the PCB, the polymer flux may cover a part of the connector, and may extend to cover a surface of the molding compound on the IC package. The polymer flux may completely cover the connector as well. The polymer flux delivers a fluxing component that facilitates smooth solder joint formation as well as a polymer component that offers added device protection by encapsulating individual connectors. The polymer component may be an epoxy. | 09-11-2014 |
20140252594 | Package Structures and Methods for Forming the Same - A packaging structure and a method of forming a packaging structure are provided. The packaging structure, such as an interposer, is formed by optionally bonding two carrier substrates together and simultaneously processing two carrier substrates. The processing includes forming a sacrificial layer over the carrier substrates. Openings are formed in the sacrificial layers and pillars are formed in the openings. Substrates are attached to the sacrificial layer. Redistribution lines may be formed on an opposing side of the substrates and vias may be formed to provide electrical contacts to the pillars. A debond process may be performed to separate the carrier substrates. Integrated circuit dies may be attached to one side of the redistribution lines and the sacrificial layer is removed. | 09-11-2014 |
20140252595 | SEMICONDUCTOR PACKAGE INCLUDING ANTENNA LAYER AND MANUFACTURING METHOD THEREOF - A semiconductor package and a manufacturing method thereof are provided. The semiconductor package includes a substrate, a semiconductor chip, a package body and an antenna layer. The semiconductor chip is disposed on the substrate. The package body encapsulates the semiconductor chip and includes an upper surface. The antenna layer is formed on the upper surface of the package body and includes two antenna slot groups connected together. Each antenna slot group includes a wave guiding slot extending along a first direction, and an irradiation slot group extending along a second direction, wherein the irradiation slot group is connected to the wave guiding slot. | 09-11-2014 |
20140252596 | Bump-on-Trace (BOT) Structures and Methods for Forming the Same - An integrated circuit structure includes a package component, which includes a dielectric layer and a metal trace over and in contact with the dielectric layer. The dielectric layer includes a first dielectric material and a second dielectric material in the first dielectric material. The first dielectric material is a flowable and curable material. The second dielectric material comprises a functional group selected from the group consisting essentially of (—C—N—), (—C—O—), (—N—C═O), and combinations thereof. | 09-11-2014 |
20140252597 | Directly Sawing Wafers Covered with Liquid Molding Compound - A method includes forming a passivation layer over a metal pad, wherein the metal pad is further overlying a semiconductor substrate of a wafer. A Post-Passivation Interconnect (PPI) is formed to electrically couple to the metal pad, wherein a portion of the PPI is overlying the passivation layer. A metal bump is formed over and electrically coupled to the PPI. The method further includes applying a molding compound over the metal bump and the PPI, applying a release film over the molding compound, pressing the release film against the molding compound, and curing the molding compound when the release film is pressed against the molding compound. The release film is then removed from the molding compound. The wafer is sawed into dies using a blade, with the blade cutting through the molding compound. | 09-11-2014 |
20140252598 | Package Having Substrate with Embedded Metal Trace Overlapped by Landing Pad - A package and method of making the package are provided. An embodiment package includes an integrated circuit supporting a conductive pillar, a substrate having a landing pad on each embedded metal trace, a landing pad width greater than a corresponding embedded metal trace width, and a conductive material electrically coupling the conductive pillar to the landing pad. In an embodiment, the landing pad overlaps the metal trace in one direction. | 09-11-2014 |
20140252599 | SUBSTRATE-LESS INTERPOSER TECHNOLOGY FOR A STACKED SILICON INTERCONNECT TECHNOLOGY (SSIT) PRODUCT - A substrate-less interposer for a stacked silicon interconnect technology (SSIT) product, includes: a plurality of metallization layers, at least a bottom most layer of the metallization layers comprising a plurality of metal segments, wherein each of the plurality of metal segments is formed between a top surface and a bottom surface of the bottom most layer of the metallization layers, and the metal segments are separated by dielectric material in the bottom most layer; and a dielectric layer formed on the bottom surface of the bottom most layer, wherein the dielectric layer includes one or more openings for providing contact to the plurality of metal segments in the bottom most layer. | 09-11-2014 |
20140252600 | Treating Copper Surfaces for Packaging - A die has a top surface, and a metal pillar having a portion protruding over the top surface of the die. A sidewall of the metal pillar has nano-wires. The die is bonded to a package substrate. An underfill is filled into the gap between the die and the package substrate. | 09-11-2014 |
20140252601 | Interconnect Structures and Methods of Forming Same - Embodiments of the present disclosure include interconnect structures and methods of forming interconnect structures. An embodiment is an interconnect structure including a post-passivation interconnect (PPI) over a first substrate and a conductive connector on the PPI. The interconnect structure further includes a molding compound on a top surface of the PPI and surrounding a portion of the conductive connector, a top surface of the molding compound adjoining the conductive connector at an angle from about 10 degrees to about 60 degrees relative to a plane parallel with a major surface of the first substrate, the conductive connector having a first width at the adjoining top surface of the molding compound, and a second substrate over the conductive connector, the second substrate being mounted to the conductive connector. | 09-11-2014 |
20140252602 | STRUCTURE OF A SEMICONDUCTOR CHIP WITH SUBSTRATE VIA HOLES AND METAL BUMPS AND A FABRICATION METHOD THEREOF - A structure of a semiconductor chip with substrate via holes and metal bumps and a fabrication method thereof. The structure comprises a substrate, at least one backside metal layer, at least one first metal layer, at least one electronic device, and at least one metal bump. The substrate has at least one substrate via hole penetrating through the substrate. The at least one first metal layer and electronic device are formed on the front side of the substrate. The at least one metal bump is formed on the at least one first metal layer. The at least one backside metal layer is formed on the backside of the substrate covering the inner surface of the substrate via hole and at least part of the backside of the substrate and connected to the first metal layer on the top of the substrate via hole. | 09-11-2014 |
20140252603 | SEMICONDUCTOR DEVICE HAVING A CONDUCTIVE VIAS - A semiconductor device is provided, including: a substrate having opposing first and second surfaces and a plurality of conductive vias passing through the first and second surfaces; an insulating layer formed on the first surface of the substrate and exposing end portions of the conductive vias therefrom; and a buffer layer formed on the insulating layer at peripheries of the end portions of the conductive vias, thereby increasing product reliability and good yield. | 09-11-2014 |
20140252604 | STACKED DEVICE AND METHOD OF MANUFACTURING THE SAME - A stacked device encompasses a lower chip including a plurality of wiring lands and a plurality of wall-block patterns, each of the wall-block patterns is allocated at a position except locations where the wiring lands are disposed, each of the wall-block patterns has a inclined plane, a height of each of the wall-block patterns measured from a reference plane of the array of the wiring lands is higher than the wiring lands, and an upper chip including a plurality of wiring bumps assigned correspondingly to the positions of the wiring lands, respectively, and a plurality of cone bumps assigned correspondingly to the positions of the wall-block patterns, respectively. | 09-11-2014 |
20140252605 | SEMICONDUCTOR PACKAGE AND METHOD OF FABRICATING THE SAME - Provided are a semiconductor package and a method of fabricating the same. The method of fabricating the semiconductor package includes arranging each of a plurality of second semiconductor chips and each of a plurality of first semiconductor chips to be electrically connected to each other on a first wafer which includes the plurality of first semiconductor chips, with a first width of each of the first semiconductor chips is greater than a second width of each of the second semiconductor chips, forming a first molding layer surrounding the second semiconductor chips on the first wafer, forming a chip package including the first and second semiconductor chips by sawing the first wafer in units of the first semiconductor chips, arranging the chip package on a package substrate to electrically connect the second semiconductor chips to the package substrate, and forming a second molding layer surrounding the chip package on the package substrate. | 09-11-2014 |
20140252606 | INTEGRATED CIRCUIT, MULTICORE PROCESSOR APPARATUS, AND METHOD FOR MANUFACTURING INTEGRATED CIRCUIT - The preferred embodiment of the invention provides a three-dimensional integrated circuit at a suppressed fabrication cost as a whole while a common mask is used for fabricating chips, each of which constitutes the three-dimensional integrated circuit, and especially common area of buffers for bumps is used. The integrated circuit of the invention is an integrated circuit constituted by a plurality of chips laminated, including a first chip and a second chip both having the same layout for through silicon vias. The first chip is connected to a board via one or more first bumps, and further, the through silicon vias in a first number in the chip are connected to one first bump, the first number being a natural number of 2 or more. | 09-11-2014 |
20140252607 | REFLOW FILM, SOLDER BUMP FORMATION METHOD, SOLDER JOINT FORMATION METHOD, AND SEMICONDUCTOR DEVICE - The present invention relates to a reflow film containing a thermoplastic resin which is dissolvable in a solvent, and solder particles, wherein the solder particles are dispersed in the film, and also relates to a solder bump formation method which comprises: (A) a step of mounting the reflow film on the electrode surface side of a substrate, (B) a step of mounting and fixing a flat plate, (C) a step of heating, and (D) a step of dissolving and removing the reflow film, and herewith, a reflow film is provided which, by causing localization of the solder component on the electrodes of the substrate by self-assembly, exhibits excellent storage properties, transportability and handling properties during use, and can form solder bumps or solder joints selectively on only the electrodes. | 09-11-2014 |
20140264827 | METHODS OF FORMING WAFER LEVEL UNDERFILL MATERIALS AND STRUCTURES FORMED THEREBY - Methods of forming microelectronic packaging structures and associated structures formed thereby are described. Those methods and structures may include forming a wafer level underfill (WLUF) material comprising a resin material, and adding at least one of a UV absorber, a sterically hindered amine light stabilizer (HALS), an organic surface protectant (OSP), and a fluxing agent to form the WLUF material. The WLUF is then applied to a top surface of a wafer comprising a plurality of die. | 09-18-2014 |
20140264828 | Method and Apparatus for a Conductive Pillar Structure - A method and apparatus for a conductive pillar structure is provided. A device may be provided, which may include a substrate, a first passivation layer formed over the substrate, a conductive interconnect extending through the first passivation layer and into the substrate, a conductive pad formed over the first passivation layer, and a second passivation layer formed over the interconnect pad and the second passivation layer. A portion of the interconnect pad may be exposed from the second passivation layer. The conductive pillar may be formed directly over the interconnect pad using one or more electroless plating processes. The conductive pillar may have a first and a second width and a first height corresponding to a distance between the first width and the second width. | 09-18-2014 |
20140264829 | ELECTRONIC ASSEMBLY WITH COPPER PILLAR ATTACH SUBSTRATE - An electronic assembly includes a copper pillar attach substrate that has a dielectric layer and a solder resist layer overlying the dielectric layer. The solder resist layer has a plurality of solder resist openings. A plurality of parallel traces are formed on the dielectric layer. Each trace has a first end portion, a second end portion and an intermediate portion. The first and second end portions of each trace are covered by the solder resist layer and the intermediate portions are positioned in the solder resist openings. Each of the intermediate portions has at least one conductive coating layer on it and has a height measured from the dielectric layer to the top of the topmost conductive coating layer that is at least as great as the solder resist layer thickness. | 09-18-2014 |
20140264830 | BUMPLESS BUILD-UP LAYER (BBUL) SEMICONDUCTOR PACKAGE WITH ULTRA-THIN DIELECTRIC LAYER - Bumpless build-up layer (BBUL) semiconductor packages with ultra-thin dielectric layers are described. For example, an apparatus includes a semiconductor die including an integrated circuit having a plurality of external conductive bumps. A semiconductor package houses the semiconductor die. The semiconductor package includes a dielectric layer disposed above the plurality of external conductive bumps. A conductive via is disposed in the dielectric layer and coupled to one of the plurality of conductive bumps. A conductive line is disposed on the dielectric layer and coupled to the conductive via. | 09-18-2014 |
20140264831 | CHIP ARRANGEMENT AND A METHOD FOR MANUFACTURING A CHIP ARRANGEMENT - A chip arrangement may include: a first semiconductor chip having a first side and a second side opposite the first side; a second semiconductor chip having a first side and a second side opposite the first side, the second semiconductor chip disposed at the first side of the first semiconductor chip and electrically coupled to the first semiconductor chip, the first side of the second semiconductor chip facing the first side of the first semiconductor chip; an encapsulation layer at least partially encapsulating the first semiconductor chip and the second semiconductor chip, the encapsulation layer having a first side and a second side opposite the first side, the second side facing in a same direction as the second side of the second semiconductor chip; and an interconnect structure disposed at least partially within the encapsulation layer and electrically coupled to at least one of the first and second semiconductor chips, wherein the interconnect structure may extend to the second side of the encapsulation layer. | 09-18-2014 |
20140264832 | CHIP ARRANGEMENTS - A chip arrangement may include: a first chip including a first contact, a second contact, and a redistribution structure electrically coupling the first contact to the second contact; a second chip including a contact; and a plurality of interconnects electrically coupled to the second contact of the first chip, wherein at least one interconnect of the plurality of interconnects electrically couples the second contact of the first chip to the contact of the second chip. | 09-18-2014 |
20140264833 | SEMICONDUCTOR PACKAGE AND METHOD FOR FABRICATING THE SAME - A semiconductor package includes through-chip vias each penetrating through a semiconductor substrate and having a protrusion that is protruded from the backside of the semiconductor substrate; and a passivation layer formed on the backside of the semiconductor substrate and planarized corresponding to the surface of the protrusions of the through-chip vias, wherein the passivation layer includes a first insulation layer formed on the side of the protrusions of the through-chip vias and the backside of the semiconductor substrate, and a second insulation layer formed over the first insulation layer. | 09-18-2014 |
20140264834 | Low Cost and Ultra-Thin Chip on Wafer on Substrate (CoWoS) Formation - Methods of making and an integrated circuit device. An embodiment method includes patterning a first polymer layer disposed over a first copper seed layer, electroplating a through polymer via in the first polymer layer using the first copper seed layer, a via end surface offset from a first polymer layer surface, forming a second polymer layer over the first polymer layer, the second polymer layer patterned to expose the via end surface, and electroplating an interconnect in the second polymer layer to cap the via end surface using a second copper seed layer. | 09-18-2014 |
20140264835 | SEMICONDUCTOR PACKAGES AND METHODS OF PACKAGING SEMICONDUCTOR DEVICES - Package substrate, semiconductor packages and methods for forming a semiconductor package are presented. The package substrate includes a base substrate having first and second major surfaces and a plurality of via contacts extending through the first to the second major surfaces of the base substrate. A first conductive layer having a plurality of openings is disposed over the first surface of the base substrate and via contacts. The openings are configured to match conductive trace layout of the package substrate. Conductive traces are disposed over the first conductive layer. The conductive traces are directly coupled to the via contacts through some of the openings of the first conductive layer. | 09-18-2014 |
20140264836 | SYSTEM-IN-PACKAGE WITH INTERPOSER PITCH ADAPTER - An integrated circuit package is disclosed that includes a first-pitch die and a second-pitch die. The second-pitch die interconnects to the second-pitch substrate through second-pitch substrates. The first-pitch die interconnects through first-pitch interconnects to an interposer adapter. The pitch of the first-pitch interconnects is too fine for the second-pitch substrate. But the interposer adapter interconnects through second-pitch interconnects to the second-pitch substrate and includes through substrate vias so that I/O signaling between the first-pitch die and the second-pitch die can be conducted through the second-pitch substrate and through the through substrate vias in the interposer adapter. | 09-18-2014 |
20140264837 | SEMICONDUCTOR DEVICE WITH POST-PASSIVATION INTERCONNECT STRUCTURE AND METHOD OF FORMING THE SAME - A semiconductor device, including a protective layer overlying a contact pad and a dummy pad on a semiconductor substrate, an interconnect structure overlying the protective layer and contacting part of the dummy pad through a contact via passing through the protective layer, a bump overlying the interconnect structure positioned over the dummy pad. | 09-18-2014 |
20140264838 | Method and Apparatus for a Conductive Bump Structure - A method and apparatus for a conductive bump structure is provided. The conductive bump structure may include a conductive layer and a conductive bump formed over a through via (“TV”). The TV may be formed through a substrate and a passivation layer. The TV may have a top surface extending above a top surface of the passivation layer. The conductive layer may be formed directly over the TV using one or more electroless plating processes. The conductive layer may have sides that may taper from a top surface of the conductive layer to the top surface of the passivation layer. The conductive layer may include a plurality of layers, wherein each layer may be formed using one or more electroless plating processes. The conductive bump may be formed on the conductive layer and may be reflowed to couple the conductive bump to the conductive layer. | 09-18-2014 |
20140264839 | Packaged Semiconductor Devices, Methods of Packaging Semiconductor Devices, and PoP Devices - Packaged semiconductor devices, methods of packaging semiconductor devices, and package-on-package (PoP) devices are disclosed. In some embodiments, a method of packaging a semiconductor device includes forming through-package vias (TPVs) over a carrier, and coupling a semiconductor device to the carrier. The semiconductor device includes contact pads disposed on a surface thereof and an insulating material disposed over the contact pads. A molding material is formed over the carrier between the TPVs and the semiconductor device. Openings are formed in the insulating material using a laser drilling process over the contact pads, and a redistribution layer (RDL) is formed over the insulating material and the openings in the insulating material. A portion of the RDL is coupled to a top surface of each of the contact pads. | 09-18-2014 |
20140264840 | Package-on-Package Structure - A device comprises a top package mounted on a bottom package, wherein the bottom package comprises a plurality of interconnection components and the bottom package comprises a plurality of first bumps formed on a first side of the bottom package, a semiconductor die is bonded on a second side of the bottom package, wherein the semiconductor die is electrically coupled to the first bumps through the interconnection components and the semiconductor die is located between the top package and the bottom package, and an underfill layer formed between the top package and the bottom package. | 09-18-2014 |
20140264841 | Surface Treatment in Electroless Process for Adhesion Enhancement - An embodiment method of forming and a bump structure are disclosed. The bump structure includes a passivation layer formed over a metal pad, the passivation layer having a recess exposing a portion of the metal pad, and a metal bump formed over the metal pad, the metal bump having a lip extending beneath the passivation layer, the lip anchoring the metal bump to the passivation layer. | 09-18-2014 |
20140264842 | Package-on-Package Structure and Method of Forming Same - A device comprises a bottom package comprising interconnect structures, first bumps on a first side and metal bumps on a second side, a semiconductor die bonded on the bottom package, wherein the semiconductor die is electrically coupled to the first bumps through the interconnect structures. The device further comprises a top package bonded on the second side of the bottom package, wherein the top package comprises second bumps, and wherein each second bump and a corresponding metal bump form a joint structure between the top package and the bottom package and an underfill layer formed between the top package and the bottom package, wherein the metal bumps are embedded in the underfill layer. | 09-18-2014 |
20140264843 | Integrated Circuit Structure Having Dies with Connectors - An embodiment is an integrated circuit structure including a first die having a bump structure, and a second die having a pad structure. The first die is attached to the second die by bonding the bump structure and the pad structure. The bump structure includes a metal pillar, a metal cap layer on the metal pillar, a metal insertion layer on the metal cap layer, and a solder layer on the metal insertion layer. The pad structure includes at least one of a nickel (Ni) layer, a palladium (Pd) layer or a gold (Au) layer. | 09-18-2014 |
20140264844 | SEMICONDUCTOR DEVICE HAVING A DIE AND THROUGH SUBSTRATE-VIA - Semiconductor devices are described that have a through-substrate via formed therein. In one or more implementations, the semiconductor devices include a semiconductor wafer and an integrated circuit die bonded together with an adhesive material. The semiconductor wafer and the integrated circuit die include one or more integrated circuits formed therein. The integrated circuits are connected to one or more conductive layers deployed over the surfaces of the semiconductor wafer and an integrated circuit die. A via is formed through the semiconductor wafer and the patterned adhesive material so that an electrical interconnection can be formed between the integrated circuits formed in the semiconductor wafer and the integrated circuits formed in the integrated circuit die. The via includes a conductive material that furnishes the electrical interconnection between the semiconductor wafer and the integrated circuit die. | 09-18-2014 |
20140264845 | WAFER-LEVEL PACKAGE DEVICE HAVING HIGH-STANDOFF PERIPHERAL SOLDER BUMPS - A wafer-level package device and techniques for fabricating the device are described that include a second integrated circuit chip electrically coupled to a base integrated circuit chip, where the second integrated circuit chip is placed on and connected to the base integrated circuit chip between multiple high-standoff peripheral pillars with solder bumps. In implementations, the wafer-level package device that employs example techniques in accordance with the present disclosure includes a base integrated circuit chip, multiple high-standoff peripheral pillars with solder bumps, and a second integrated circuit chip electrically coupled to the base integrated circuit chip and placed on the base integrated circuit chip in the center of an array of high-standoff peripheral pillars with solder bumps. | 09-18-2014 |
20140264846 | Packaging Devices, Methods of Manufacture Thereof, and Packaging Methods - Packaging devices, methods of manufacture thereof, and packaging methods are disclosed. In some embodiments, a packaging device includes a first substrate including a post passivation interconnect (PPI) structure including a PPI pad disposed thereon, and a second substrate including a contact pad disposed thereon. A conductive bump is coupled between the PPI pad and the contact pad. A molding material is disposed over portions of the PPI structure proximate the conductive bump. A top surface of the molding material contacts the conductive bump at a height of the conductive bump having a width C, and the contact pad has a width B. A ratio R of C:B comprises about 1.0 or greater. | 09-18-2014 |
20140264847 | SEMICONDUCTOR DEVICE - A semiconductor device includes a plurality of electrodes disposed on a surface in a first column and a second column parallel to the first and separated by a first distance. The adjacent electrodes in the first column are spaced from each other by at least a second distance. Adjacent electrodes in the second column are spaced from each other by at least a third distance. The distance between adjacent columns is not equal to the spacing distance of electrodes in the first column and the electrodes form a staggered lattice in which no electrode in the first column is aligned perpendicularly with any electrode in the second column. | 09-18-2014 |
20140264848 | SEMICONDUCTOR PACKAGE AND METHOD FOR FABRICATING THE SAME - A semiconductor package includes through-substrate vias each penetrating through a semiconductor substrate and having a protrusion that is protruded from the backside of the semiconductor substrate, and a passivation layer formed on a sidewall of the protrusion and the backside of the semiconductor substrate, wherein a bottom surface of the protrusion and a bottom surface of the passivation layer are substantially coplanar. | 09-18-2014 |
20140264849 | Package-on-Package Structure - A device comprises a bottom package mounted on a printed circuit board, wherein the bottom package comprises a plurality of first bumps formed between the bottom package and the printed circuit board, a first underfill layer formed between the printed circuit board and the bottom package, a semiconductor die mounted on the bottom package and a top package bonded on the bottom package, wherein the top package comprises a plurality of second bumps and the top package and the bottom package form a ladder shaped structure. The device further comprises a second underfill layer formed between the bottom package and the top package, wherein the second underfill layer is formed of a same material as the first underfill layer. | 09-18-2014 |
20140264850 | Semiconductor Device and Method of Forming a Dual UBM Structure for Lead Free Bump Connections - A semiconductor device has a substrate with a contact pad. A first insulation layer is formed over the substrate and contact pad. A first under bump metallization (UBM) is formed over the first insulating layer and is electrically connected to the contact pad. A second insulation layer is formed over the first UBM. A second UBM is formed over the second insulation layer after the second insulation layer is cured. The second UBM is electrically connected to the first UBM. The second insulation layer is between and separates portions of the first and second UBMs. A photoresist layer with an opening over the contact pad is formed over the second UBM. A conductive bump material is deposited within the opening in the photoresist layer. The photoresist layer is removed and the conductive bump material is reflowed to form a spherical bump. | 09-18-2014 |
20140264851 | Semiconductor Device and Method of Forming UBM Structure on Back Surface of TSV Semiconductor Wafer - A semiconductor device has a plurality of conductive vias formed through the semiconductor die with a first insulating layer around the conductive vias. A recess is formed in the first insulating layer around the conductive vias by LDA. A portion of the semiconductor wafer is removed by LDA after forming the recess in the first insulating layer so that the conductive vias extend above a surface of the semiconductor wafer. The first insulating layer extends to the surface of the semiconductor wafer or above the surface of the semiconductor wafer. A second insulating layer is formed over the surface of the semiconductor wafer and conductive vias. A first portion of the second insulating layer is removed by LDA, while leaving a second portion of the second insulating layer over the surface of the semiconductor wafer around the conductive vias. An electroless plated bump is formed over the conductive vias. | 09-18-2014 |
20140264852 | METHOD FOR FORMING BUMPS IN SUBSTRATES WITH THROUGH VIAS - A method for manufacturing solder bumps for through vias in a substrate having a first surface and a second surface opposed to each other. The method includes the steps of forming a blind hole extending in the substrate from the first surface for each via and filling each blind hole with a conductive filler; a deepest part of each filler includes a bump portion made of a solder material. The method further includes the step of removing a part of the substrate extending from the second surface to have at least the bump portions protrude from the substrate. The non-protruding part of each filler defines the corresponding via and the bump portion defines the corresponding bump. | 09-18-2014 |
20140284788 | SEMICONDUCTOR DEVICE AND METHOD OF FORMING PIP WITH INNER KNOWN GOOD DIE INTERCONNECTED WITH CONDUCTIVE BUMPS - A PiP semiconductor device has an inner known good semiconductor package. In the semiconductor package, a first via is formed in a temporary carrier. A first conductive layer is formed over the carrier and into the first via. The first conductive layer in the first via forms a conductive bump. A first semiconductor die is mounted to the first conductive layer. A first encapsulant is deposited over the first die and carrier. The semiconductor package is mounted to a substrate. A second semiconductor die is mounted to the first conductive layer opposite the first die. A second encapsulant is deposited over the second die and semiconductor package. A second via is formed in the second encapsulant to expose the conductive bump. A second conductive layer is formed over the second encapsulant and into the second via. The second conductive layer is electrically connected to the second die. | 09-25-2014 |
20140284789 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE - To improve coupling reliability in flip chip bonding of a semiconductor device. By using, in the fabrication of a semiconductor device, a wiring substrate in which a wiring that crosses an opening area of a solder resist film on the upper surface of the wiring substrate has, on one side of the wiring, a bump electrode and, on the other side, a plurality of wide-width portions having no bump electrode thereon, a solder on the wiring can be dispersed to each of the wide-width portions during reflow treatment in a solder precoating step. Such a configuration makes it possible to reduce a difference in height between the solder on each of terminals and the solder on each of the wide-width portions and to enhance the coupling reliability in flip chip bonding. | 09-25-2014 |
20140284790 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device in which reliability of a bonding pad to which a conductive wire is bonded is achieved. A bonding pad having an OPM structure is formed of an Al—Cu alloy film having a Cu concentration of 2 wt % or more. By increasing the Cu concentration, the Al—Cu alloy film forming the bonding pad is hardened. Therefore, the bonding pad is difficult to be deformed by impact in bonding of a Cu wire, and deformation of an OPM film as following the deformation of the bonding pad can be reduced. In this manner, concentration of a stress on the OPM film caused by the impact from the Cu wire can be reduced, and therefore, the breakage of the OPM film can be prevented. | 09-25-2014 |
20140284791 | CORELESS INTEGRATED CIRCUIT PACKAGING SYSTEM AND METHOD OF MANUFACTURE THEREOF - A system and method for manufacturing an integrated circuit packaging system includes: forming a base substrate including: providing a sacrificial carrier: mounting a metallic sheet on the sacrificial carrier, applying a top trace to the metallic sheet, forming a conductive stud on the top trace, forming a base encapsulation over the metallic sheet, the top trace, and the conductive stud, the top trace exposed from a top surface of the base encapsulation, and removing the sacrificial carrier and the metallic sheet; mounting an integrated circuit device on the base substrate; and encapsulating the integrated circuit device and the base substrate with a top encapsulation. | 09-25-2014 |
20140284792 | ELECTRONIC DEVICE PACKAGE - A chip package is disclosed. The package includes a carrier substrate, at least two semiconductor chips, a fill material layer, a protective layer, and a plurality of conductive bumps. The carrier substrate includes a grounding region. The semiconductor chips are disposed overlying the grounding region of the carrier substrate. Each semiconductor chip includes at least one signal pad and includes at least one grounding pad electrically connected to the grounding region. The fill material layer is formed overlying the carrier substrate and covers the semiconductor chips. The protective layer covers the fill material layer. The plurality of conductive bumps is disposed overlying the protective layer and is electrically connected to the semiconductor chips. A fabrication method of the chip package is also disclosed. | 09-25-2014 |
20140284793 | SEMICONDUCTOR DEVICE HAVING A THROUGH-SUBSTRATE VIA - Semiconductor devices are described that include a via that extends only partially through the substrate. Through-substrate vias (TSV) furnish electrical interconnectivity to electronic components formed in the substrates. In implementations, the semiconductor devices are fabricated by first bonding a semiconductor wafer to a carrier wafer with an adhesive material. The semiconductor wafer includes an etch stop disposed within the wafer (e.g., between a first surface a second surface of the wafer). One or more vias are formed through the wafer. The vias extend from the second surface to the etch stop. | 09-25-2014 |
20140291834 | SEMICONDUCTOR DEVICES AND PACKAGES INCLUDING CONDUCTIVE UNDERFILL MATERIAL AND RELATED METHODS - Semiconductor devices and device packages include at least one semiconductor die electrically coupled to a substrate through a plurality of conductive structures. The at least one semiconductor die may be a plurality of memory dice, and the substrate may be a logic die. An underfill material disposed between the at least one semiconductor die and the substrate may include a thermally conductive material. An electrically insulating material is disposed between the plurality of conductive structures and the underfill material. Methods of attaching a semiconductor die to a substrate, such as for forming semiconductor device packages, include covering or coating at least an outer side surface of conductive structures, electrically coupling the semiconductor die to the substrate with an electrically insulating material, and disposing a thermally conductive material between the semiconductor die and the substrate. | 10-02-2014 |
20140291835 | IC Package with Integrated Waveguide Launcher - Embodiments described herein include an integrated circuit (IC) device. For example, the IC device can include a substrate configured to be coupled to a printed circuit board (PCB), an IC die attached to the substrate, and a waveguide launcher formed on the substrate. The waveguide launcher is electrically coupled to the IC die through the substrate. | 10-02-2014 |
20140291836 | SEMICONDUCTOR DEVICE - A semiconductor device includes a substrate having a plurality of electrodes and a plurality of leads that are connected to the electrodes and a semiconductor element that is mounted on the substrate. The semiconductor element has a rectangular shape including a long side, a short side, and a corner portion, and has bumps connected to the electrodes. An underfill is filled between the substrate and the semiconductor element and extends on the substrate around the semiconductor element. An overcoat covers the leads on the substrate. At least one of the plurality of leads that is connected to the electrode corresponding to the bump arranged nearest to the corner portion along the long side of the semiconductor element has at least two successive bent portions that are bent in the same direction and is laid out toward the short side of the semiconductor element in a plan view. | 10-02-2014 |
20140291837 | EMBEDDED PACKAGE AND METHOD FOR MANUFACTURING THE SAME - An embedded package includes a semiconductor chip divided into a cell region and a peripheral region, having a first surface and a second surface which faces away from the first surface, and including an integrated circuit which is formed in the cell region on the first surface, a bonding pad which is formed in the peripheral region on the first surface and a bump which is formed over the bonding pad; a core layer attached to the second surface of the to semiconductor chip; an insulation component formed over the core layer including the semiconductor chip and having an opening which exposes the bump; and a circuit wiring line formed over the insulation component and the bump and electrically connected to the bump, wherein the insulation component formed in the cell region has a thickness larger than a height of the bump. | 10-02-2014 |
20140291838 | Design Scheme for Connector Site Spacing and Resulting Structures - A system and method for preventing cracks in a passivation layer is provided. In an embodiment a contact pad has a first diameter and an opening through the passivation layer has a second diameter, wherein the first diameter is greater than the second diameter by a first distance of about 10 μm. In another embodiment, an underbump metallization is formed through the opening, and the underbump metallization has a third diameter that is greater than the first diameter by a second distance of about 5 μm. In yet another embodiment, a sum of the first distance and the second distance is greater than about 15 μm. In another embodiment the underbump metallization has a first dimension that is less than a dimension of the contact pad and a second dimension that is greater than a dimension of the contact pad. | 10-02-2014 |
20140291839 | Solder Joint Flip Chip Interconnection - A flip chip interconnect has a tapering interconnect structure, and the area of contact of the interconnect structure with the site on the substrate metallization is less than the area of contact of the interconnect structure with the die pad. Also, a bond-on-lead or bond-on-narrow pad or bond on a small area of a contact pad interconnection includes such tapering flip chip interconnects. Also, methods for making the interconnect structure include providing a die having interconnect pads, providing a substrate having interconnect sites on a patterned conductive layer, providing a bump on a die pad, providing a fusible electrically conductive material either at the interconnect site or on the bump, mating the bump to the interconnect site, and heating to melt the fusible material. | 10-02-2014 |
20140291840 | STACKED SEMICONDUCTOR PACKAGE - A stacked semiconductor chip includes a main substrate supporting a semiconductor chip module, wherein the semiconductor module comprises at least two sub semiconductor chip modules each having a sub substrate in which a first semiconductor chip is embedded and at least two second semiconductor chips are stacked on the sub substrate. | 10-02-2014 |
20140291841 | SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME, AND ELECTRONIC COMPONENT - [Problem] To provide a semiconductor device both capable of greatly reducing the size of a through electrode and capable of reducing the size of a surface electrode and provide a method for manufacturing a semiconductor device capable of reliably bringing a through electrode into contact with a surface electrode regardless of the size of the surface electrode. | 10-02-2014 |
20140299985 | BUMP STRUCTURES FOR MULTI-CHIP PACKAGING - A multi-chip package includes a substrate having a plurality of first bump structures. A pitch between first bump structures of the plurality of first bump structures is uniform across a surface of the substrate. The multi-chip package includes a first chip bonded to the substrate and a second chip bonded to the substrate. The first chip includes a plurality of second bump structures, and the plurality of second bump structures are bonded to a first set of first bump structures of the plurality of first bump structures. The second chip includes a plurality of third bump structures, and the plurality of third bump structures are bonded to a second set of first bump structures of the plurality of first bump structures. A pitch between second bump structures of the plurality of second bump structures is different from a pitch between third bump structures of the plurality of third bump structures. | 10-09-2014 |
20140299986 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE - A plurality of protruding electrodes of a semiconductor chip are in contact with a plurality of electrodes formed on a semiconductor substrate, via a plurality of solder sections. In this state, the solder sections are melted so as to form a plurality of solder bonding sections joined to the protruding electrodes of the semiconductor chip and the electrodes of the semiconductor substrate. Moreover, a distance between a part of the semiconductor chip and the semiconductor substrate is larger than a distance between the other part of the semiconductor chip and the semiconductor substrate, extending at least some of the solder bonding sections. Thus, the solder bonding sections vary in height. Holes are then formed at least in a solder bonding section having a maximum height out of the solder bonding sections. After that, the solder bonding sections are solidified. | 10-09-2014 |
20140306337 | SEMICONDUCTOR DEVICE HAVING A BUFFER MATERIAL AND STIFFENER - Semiconductor devices are described that include a semiconductor device having multiple, stacked die on a substrate (e.g., a semiconductor wafer). In one or more implementations, wafer-level package devices that employ example techniques in accordance with the present disclosure include an ultra-thin semiconductor wafer with metallization and vias formed in the wafer and an oxide layer on the surface of the wafer, an integrated circuit chip placed on the semiconductor wafer, an underfill layer between the integrated circuit chip and the semiconductor wafer, a buffer material formed on the semiconductor wafer, the underfill layer, and at least one side of the integrated circuit chip, an adhesive layer placed on the buffer layer and the integrated circuit chip, and a stiffener layer placed on the adhesive layer. The semiconductor device may then be segmented into individual semiconductor chip packages. | 10-16-2014 |
20140306338 | DIE-DIE STACKING STRUCTURE AND METHOD FOR MAKING THE SAME - The present invention relates to die-die stacking structure and the method for making the same. The die-die stacking structure comprises a top die having a bottom surface, a first insulation layer covering the bottom surface of the top die, a bottom die having a top surface, a second insulation layer covering the top surface of the bottom die, a plurality of connection members between the top die and the bottom die and a protection material between the first insulation layer and the second insulation layer. The plurality of connection members communicates the top die with the bottom die. The protection material bridges the plurality of connection members to form a mesh layout between the first insulation layer and the second insulation layer. The structure and method of present invention at least provide more strength and stress buffer to resist die warpage and absorb thermal cycling stress, and then prevents the bump and dielectric materials in the die-die stacking structure from cracking caused by thermal stress or external mechanical stress. | 10-16-2014 |
20140306339 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE - A semiconductor device has a semiconductor substrate having a first surface and a second surface, a through electrode penetrating through the semiconductor substrate and having a protrusion protruding from the second surface, and an insulation layer on the second surface, which covers the side surface of the protrusion, has an opening through which to expose the end surface of the protrusion, and has a thickness greater than the length of the protrusion. | 10-16-2014 |
20140306340 | PACKAGE STRUCTURE HAVING EMBEDDED ELECTRONIC COMPONENT - A package structure having an embedded electronic component includes: a carrier having a cavity penetrating therethrough; a semiconductor chip received in the cavity and having solder bumps disposed thereon; a dielectric layer formed on the carrier and the semiconductor chip so as to encapsulate the solder bumps; a wiring layer formed on the dielectric layer; an insulating protection layer formed on the dielectric layer and the wiring layer; and a solder material formed in the dielectric layer and the insulating protection layer for electrically connecting the wiring layer and the solder bumps, thereby shortening the signal transmission path between the semiconductor chip and the carrier to avoid signal losses. | 10-16-2014 |
20140306341 | 3D Packages and Methods for Forming the Same - Embodiments of the present disclosure include a semiconductor device and methods of forming a semiconductor device. An embodiment is a method of forming a semiconductor device, the method comprising forming a conductive pad in a first substrate, forming an interconnecting structure over the conductive pad and the first substrate, the interconnecting structure comprising a plurality of metal layers disposed in a plurality of dielectric layers, bonding a die to a first side of the interconnecting structure, and etching the first substrate from a second side of the interconnecting structure, the etching exposing a portion of the conductive pad. | 10-16-2014 |
20140306342 | SEMICONDUCTOR DEVICE, HAVING THROUGH ELECTRODES, A MANUFACTURING METHOD THEREOF, AND AN ELECTRONIC APPARATUS - A semiconductor device includes a semiconductor substrate and a through electrode provided in a through hole formed in the semiconductor substrate. The through electrode partially protrudes from a back surface of the semiconductor substrate, which is opposite to an active surface thereof. The through electrode includes a resin core and a conductive film covering at least a part of the resin core. | 10-16-2014 |
20140312489 | FLIP-CHIP SEMICONDUCTOR PACKAGE - A flip-chip semiconductor package is provided that includes a semiconductor chip, a package substrate having a chip attachment surface on which bond sites are formed, and bumps attached to an active surface of the semiconductor chip and bonded to the bond sites, wherein the bond sites are radially arranged around a middle portion of the package substrate. | 10-23-2014 |
20140312490 | ELECTRICAL SYSTEM AND CORE MODULE THEREOF - Disclosed is a core module, comprising: a package substrate, having a plurality of pads; a first component, connected to the pads of the package substrate corresponding to the first component with a plurality of first joint parts; a second component, connected to the pads of the package substrate corresponding to the first component with a plurality of second joint parts; and a third component, connected to the pads of the package substrate corresponding to the third component with a plurality of third joint parts, wherein the first component is positioned above the second component relative to the lower package substrate, and the first component, the second component and the third component are all electrically connected via the package substrate, and a main molding material is molding the first component, the second component and the third component. | 10-23-2014 |
20140312491 | SEMICONDUCTOR DEVICE, SEMICONDUCTOR PACKAGE, AND ELECTRONIC SYSTEM - Provided are a semiconductor device, a semiconductor package, and an electronic system. The device includes a substrate having a front side and a back side disposed opposite the front side. An internal circuit is disposed on or near to the front side of the substrate. Signal I/O through-via structures are disposed in the substrate. Back side conductive patterns are disposed on the back side of the substrate and electrically connected to the signal I/O through-via structures. A back side conductive structure is disposed on the back side of the substrate and spaced apart from the signal I/O through-via structures. The back side conductive structure includes parallel supporter portions. | 10-23-2014 |
20140312492 | Package with a Fan-out Structure and Method of Forming the Same - An embodiment is a device comprising a semiconductor die, an adhesive layer on a first side of the semiconductor die, and a molding compound surrounding the semiconductor die and the adhesive layer, wherein the molding compound is at a same level as the adhesive layer. The device further comprises a first post-passivation interconnect (PPI) electrically coupled to a second side of the semiconductor die, and a first connector electrically coupled to the first PPI, wherein the first connector is over and aligned to the molding compound. | 10-23-2014 |
20140312493 | SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME - A technique which improves the reliability in coupling between a bump electrode of a semiconductor chip and wiring of a mounting substrate, more particularly a technique which guarantees the flatness of a bump electrode even when wiring lies in a top wiring layer under the bump electrode, thereby improving the reliability in coupling between the bump electrode and the wiring formed on a glass substrate. Wiring, comprised of a power line or signal line, and a dummy pattern are formed in a top wiring layer beneath a non-overlap region of a bump electrode. The dummy pattern is located to fill the space between wirings to reduce irregularities caused by the wirings and space in the top wiring layer. A surf ace protection film formed to cover the top wiring layer is flattened by CMP. | 10-23-2014 |
20140312494 | Wafer Backside Interconnect Structure Connected to TSVs - An integrated circuit structure includes a semiconductor substrate having a front surface and a back surface; a conductive via passing through the semiconductor substrate; and a metal feature on the back surface of the semiconductor substrate. The metal feature includes a metal pad overlying and contacting the conductive via, and a metal line over the conductive via. The metal line includes a dual damascene structure. The integrated circuit structure further includes a bump overlying the metal line. | 10-23-2014 |
20140319677 | SUBMOUNT FOR ELECTRONIC, OPTOELECTRONIC, OPTICAL, OR PHOTONIC COMPONENTS - One or more metal contacts are formed in a recessed area on a top surface of a submount; a pickup tool of a die bonder engages protruding peripheral regions of the submount so as not to damage the metal contacts or metal bumps in the recessed region. A semiconductor optical submount includes non-contiguous dielectric layers between metal contacts and the semiconductor material to reduce parasitic capacitance. | 10-30-2014 |
20140319678 | Semiconductor Device and Method of Forming TMV and TSV in WLCSP Using Same Carrier - A semiconductor device has a semiconductor die mounted over a carrier. An encapsulant is deposited over the semiconductor die and carrier. An insulating layer is formed over the semiconductor die and encapsulant. A plurality of first vias is formed through the insulating layer and semiconductor die while mounted to the carrier. A plurality of second vias is formed through the insulating layer and encapsulant in the same direction as the first vias while the semiconductor die is mounted to the carrier. An electrically conductive material is deposited in the first vias to form conductive TSV and in the second vias to form conductive TMV. A first interconnect structure is formed over the insulating layer and electrically connected to the TSV and TMV. The carrier is removed. A second interconnect structure is formed over the semiconductor die and encapsulant and electrically connected to the TSV and TMV. | 10-30-2014 |
20140319679 | Semiconductor Method and Device of Forming a Fan-Out POP Device with PWB Vertical Interconnect Units - A semiconductor device has a carrier with a die attach area. A semiconductor die is mounted to the die attach area with a back surface opposite the carrier. A modular interconnect unit is mounted over the carrier and around or in a peripheral region around the semiconductor die such that the modular interconnect unit is offset from the back surface of the semiconductor die. An encapsulant is deposited over the carrier, semiconductor die, and modular interconnect unit. A first portion of the encapsulant is removed to expose the semiconductor die and a second portion is removed to expose the modular interconnect unit. The carrier is removed. An interconnect structure is formed over the semiconductor die and modular interconnect unit. The modular interconnect unit includes a vertical interconnect structures or bumps through the semiconductor device. The modular interconnect unit forms part of an interlocking pattern around the semiconductor die. | 10-30-2014 |
20140319680 | Semiconductor Device and Method of Forming Bump Structure with Insulating Buffer Layer to Reduce Stress on Semiconductor Wafer - A semiconductor wafer has a plurality of semiconductor die with contact pads for electrical interconnect. An insulating layer is formed over the semiconductor wafer. A bump structure is formed over the contact pads. The bump structure has a buffer layer formed over the insulating layer and contact pad. A portion of the buffer layer is removed to expose the contact pad and an outer portion of the insulating layer. A UBM layer is formed over the buffer layer and contact pad. The UBM layer follows a contour of the buffer layer and contact pad. A ring-shaped conductive pillar is formed over the UBM layer using a patterned photoresist layer filled with electrically conductive material. A conductive barrier layer is formed over the ring-shaped conductive pillar. A bump is formed over the conductive barrier layer. The buffer layer reduces thermal and mechanical stress on the bump and contact pad. | 10-30-2014 |
20140327131 | PACKAGE STRUCTURE AND FABRICATION METHOD THEREOF - A package structure is disclosed, which includes a substrate having a body, a plurality of conductive pads formed on the body and a surface passivation layer formed on the body and having a plurality of openings for exposing the conductive pads; a plurality of conductive vias formed in the openings of the surface passivation layer and electrically connected to the conductive pads; a plurality of circuits formed on the surface passivation layer and electrically connected to the conductive vias, wherein the circuits have a plurality of electrical contacts; at least a pattern portion formed on the surface passivation layer and intersecting with the circuits; and a second passivation layer formed on the surface passivation layer, the circuits and the pattern portion and having a plurality of openings for exposing portions of the electrical contacts of the circuits, thereby strengthening the bonding between the circuits and the passivation layers. | 11-06-2014 |
20140327132 | TSV Backside Reveal Structure and Exposing Process - A TSV backside reveal structure is provided, formed by a TSV conductive column on a substrate running throughout the substrate front surface and substrate back surface and stretching out of the substrate back surface; wherein, a sloping buffer is formed within the region between the substrate back surface and the TSV, and the height of the sloping buffer changes continuously; wherein the region close to the TSV has the highest height and the height of the buffer gradually decreases to that of the substrate back surface. | 11-06-2014 |
20140327133 | METAL BUMP STRUCTURE FOR USE IN DRIVER IC AND METHOD FOR FORMING THE SAME - A metal bump structure for use in a driver IC includes a metal bump disposed on a matrix, an optional capping layer disposed on the metal bump to completely cover the metal bump and a protective layer disposed on the metal bump to completely cover and protect the metal bump or the optional capping layer and so that the metal bump is not exposed to an ambient atmosphere. The protective layer or the optional capping layer may have a fringe disposed on the matrix. | 11-06-2014 |
20140327134 | METAL BUMP STRUCTURE FOR USE IN DRIVER IC AND METHOD FOR FORMING THE SAME - A metal bump structure for use in a driver IC includes a passivation layer disposed on a metal pad and defining a recess on the metal pad, an adhesion layer in said recess, on the metal pad and on the passivation layer, a metal bump disposed in the recess and completely covering the adhesion layer, and a capping layer disposed on the metal bump and completely covering the metal bump so that the metal bump is not exposed to an ambient atmosphere. | 11-06-2014 |
20140327135 | Semiconductor Device and Method of Forming Duplex Plated Bump-On-Lead Pad Over Substrate for Finer Pitch Between Adjacent Traces - A semiconductor device has a substrate. A conductive layer is formed over the substrate. A duplex plated bump on lead pad is formed over the substrate. An insulating layer is formed over the conductive layer and the substrate. A portion of the insulating over the duplex plated bump on lead pad is removed using a laser direct ablation process. The insulating layer is a lamination layer. The duplex plated bump on lead pad has a wide bump on lead pad. A semiconductor die is mounted over the substrate. The semiconductor die has a composite conductive interconnect structure. The semiconductor die has a first bump and a second bump with a pitch ranging from 90-150 micrometers between the first bump and the second bump. A duplex plated contact pad is formed on a surface of the substrate opposite the duplex plated bump-on-lead pad. | 11-06-2014 |
20140327136 | SEMICONDUCTOR DEVICE HAVING UNDER-BUMP METALLIZATION (UBM) STRUCTURE AND METHOD OF FORMING THE SAME - A semiconductor device comprises a semiconductor substrate, an under-bump metallization (UBM) structure overlying the semiconductor substrate, and a solder bump overlying and electrically connected to the UBM structure. The UBM structure comprises a first metallization layer comprising a first metal, a second metallization layer comprising a second metal different from the first metal, and a first intermetallic compound (IMC) layer between the first metallization layer and the second metallization layer, the first IMC layer comprising the first metal and the second metal. | 11-06-2014 |
20140327137 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - Even when a stiffener is omitted, the semiconductor device which can prevent the generation of twist and distortion of a wiring substrate is obtained. As for a semiconductor device which has a wiring substract, a semiconductor chip by which the flip chip was made to the wiring substrate, and a heat spreader adhered to the back surface of the semiconductor chip, and which omitted the stiffener for reinforcing a wiring substrate and maintaining the surface smoothness of a heat spreader, a wiring substrate has a plurality of insulating substrates in which a through hole whose diameter differs, respectively was formed, and each insulating substrate contains a glass cloth | 11-06-2014 |
20140332952 | SEMICONDUCTOR STRUCTURE AND METHOD FOR TESTING THE SAME - A semiconductor structure comprising a substrate, a dielectric layer, a conductor post, a first conductive layer structure and a second conductive layer structure is provided. The substrate comprises an opening structure. The dielectric layer is disposed on a sidewall of the opening structure. The conductor structure is disposed in the opening structure and covers the dielectric layer. The first and second conductive layer structures are electrically connected to the conductor post. A voltage difference is existed between the first and second conductive layer structures, such that a current is passing through the first conductive layer structure, the opening structure and second conductive layer structure. A resistance values is related to the voltage difference and the current. A dimension of the opening structure is 10 times greater than a dimension of the first and second conductive layer structures. | 11-13-2014 |
20140332953 | CHIP ARRANGEMENT, AND METHOD FOR FORMING A CHIP ARRANGEMENT - A chip arrangement may include: a chip including a plurality of electrical nets, wherein each electrical net includes at least one bonding pad; and a plurality of pillars formed on the at least one bonding pad of a majority of the plurality of electrical nets, wherein the plurality of pillars may be configured to connect the at least one bonding pad of the majority of the plurality of electrical nets to a chip-external connection region. | 11-13-2014 |
20140332954 | Semiconductor Device - Disclosed is a semiconductor device suppressed in decrease of reliability. The semiconductor device comprises an electrode pad portion ( | 11-13-2014 |
20140332955 | Integrated Circuit Package System with Removable Backing Element Having Plated Terminal Leads and Method of Manufacture Thereof - A method of manufacture of an integrated circuit package system includes: attaching a first die to a first die pad; connecting electrically a second die to the first die through a die interconnect positioned between the first die and the second die; connecting a first lead adjacent the first die pad to the first die; connecting a second lead to the second die, the second lead opposing the first lead and adjacent the second die; and providing a molding material around the first die, the second die, the die interconnect, the first lead and the second lead, with a portion of the first lead exposed. | 11-13-2014 |
20140339694 | Semiconductor Devices Having a Glass Substrate, and Method for Manufacturing Thereof - A method for manufacturing semiconductor devices includes providing a stack having a semiconductor wafer and a glass substrate with openings and at least one trench attached to the semiconductor wafer. The semiconductor wafer includes a plurality of semiconductor devices. The openings of the glass substrate leave respective areas of the semiconductor devices uncovered by the glass substrate and the trench connects the openings. A metal layer is formed at least on exposed walls of the trench and the openings and on the uncovered areas of the semiconductor devices of the semiconductor wafer. A metal region is formed by electroplating metal in the openings and the trench and by subsequently grinding the glass substrate to remove the trenches. The stack of the semiconductor wafer and the attached glass substrate is cut to separate the semiconductor devices. | 11-20-2014 |
20140339695 | ELECTRONIC COMPONENT AND METHOD OF FABRICATING THE SAME - An electronic component includes: a substrate formed of ceramic and including one or more pads on an upper surface thereof; a component flip-chip mounted on the upper surface of the substrate with one or more bumps bonded to the one or more pads; and an additional film located on a lower surface of the substrate and overlapping with at least a part of a smaller one of the pad and the bump in each of one or more pad/bump pairs, the one or more pad/bump pairs being composed of the one or more pads and the one or more bumps bonded to each other. | 11-20-2014 |
20140339696 | Interconnect Structure for Wafer Level Package - A package includes a device die having a substrate. A molding compound contacts a sidewall of the substrate. A metal pad is over the substrate. A passivation layer has a portion covering an edge portion of the metal pad. A metal pillar is over and contacting the metal pad. A dielectric layer is over the passivation layer. A package material formed of a molding compound or a polymer is over the dielectric layer. The dielectric layer includes a bottom portion between the passivation layer and the package material, and a sidewall portion between a sidewall of the metal pillar and a sidewall of the package material. A polymer layer is over the package material, the molding compound, and the metal pillar. A post-passivation interconnect (PPI) extends into the polymer layer. A solder ball is over the PPI, and is electrically coupled to the metal pad through the PPI. | 11-20-2014 |
20140339697 | Solder Bump for Ball Grid Array - A solder bump structure for a ball grid array (BGA) includes at least one under bump metal (UBM) layer and a solder bump formed over the at least one UBM layer. The solder bump has a bump width and a bump height and the ratio of the bump height over the bump width is less than 1. | 11-20-2014 |
20140346663 | SEMICONDUCTOR STRUCTURE WITH SACRIFICIAL ANODE AND METHOD FOR FORMING - A packaged semiconductor device is made by forming a conductive pad on an external surface of an integrated circuit device, forming a passivation layer over the conductive pad, removing a portion of the passivation layer over a bond area on the conductive pad, forming a sacrificial anode around a majority of a periphery surrounding the bond area, forming a conductive bond in the bond area, and forming an encapsulating material around the conductive bond and an exposed portion of the sacrificial anode. | 11-27-2014 |
20140346664 | VARIABLE TEMPERATURE SOLDERS FOR MULTI-CHIP MODULE PACKAGING AND REPACKAGING - Various methods of mounting semiconductor chips on a substrate are disclosed. In one aspect, a method of manufacturing is provided that includes coupling a first plurality of solder interconnect structures to a first semiconductor chip. The first solder interconnect structures have a first melting point. The first semiconductor chip may be tested. If the first semiconductor chip passes the testing, then a second semiconductor chip is coupled to the first semiconductor chip using a second plurality of solder interconnect structures that have a second melting point lower than the first melting point. | 11-27-2014 |
20140346665 | Integrated Circuit Structure and Method for Reducing Polymer Layer Delamination - An embodiment integrated circuit structure includes a substrate, a metal pad over the substrate, a post-passivation interconnect (PPI) structure over the substrate and electronically connected to the metal pad, a first polymer layer over the PPI structure, an under bump metallurgy (UBM) extending into an opening in the first polymer layer and electronically connected to the PPI structure, and a barrier layer on a top surface of the first polymer layer adjacent to the UBM. | 11-27-2014 |
20140346666 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device and a manufacturing method thereof are provided. The manufacturing method includes following steps. A mould is provided. The mould has a chamber and a plurality of protrusions in the chamber. A thermosetting material is injected into the chamber. The thermosetting material is cured. A parting step is performed to separate the cured thermosetting material from the mould, so as to form an interposer substrate. A plurality of blind holes corresponding to the protrusions is formed on the interposer substrate. A conductive material is filled into the blind holes to form a plurality of conductive pillars. A conductive pattern layer is formed on a surface of the interposer substrate. The conductive pattern layer is electrically connected with the conductive pillars. | 11-27-2014 |
20140346667 | SEMICONDUCTOR PACKAGE AND METHOD OF FABRICATING THE SAME - A semiconductor package comprising: a lower semiconductor package comprising a lower semiconductor chip mounted on a lower package substrate and a lower molding layer substantially covering the lower semiconductor chip and having through holes arranged in a first direction and a second direction. The first direction is different from the second direction; and for each of the through holes, first and second upper widths of the through hole in the first and second directions are less than a third upper width of the through hole in a third direction that is a diagonal direction with respect to the first and second directions. | 11-27-2014 |
20140346668 | SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME, AND ELECTRONIC COMPONENT - An electrode layer is formed on a gate insulating film. An interlayer insulating film is formed on the gate insulating firm. A lower pad is formed by a damascene method. Next, a through hole is formed, and a first interlayer insulating film, which is provided with a projected portion that is in the same pattern as a lower insulating film, is exposed within the through hole at the same time. After etching the first interlayer insulating film so that a part of the projected portion remains as an etching residue, a via insulating film is formed and the via insulating film at the bottom of the through hole is etched. After that, a through electrode is formed by plating an electrode material on the inner side of the via insulating film on the through hole. | 11-27-2014 |
20140346669 | SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME - A semiconductor package includes a passivation layer overlying a semiconductor substrate, a pillar bump overlying the passivation layer, and a molding compound layer overlying the passivation layer and covering a lower portion of the bump. A sidewall of the passivation layer is covered by the molding compound layer. | 11-27-2014 |
20140346670 | SEMICONDUCTOR PACKAGE WITH SINGLE SIDED SUBSTRATE DESIGN AND MANUFACTURING METHODS THEREOF - A multilayer substrate includes a first outer conductive patterned layer, a first insulating layer exposing a portion of the first outer conductive patterned layer to define a first set of pads, a second outer conductive patterned layer, and a second insulating layer exposing a portion of the second outer conductive patterned layer to define a second set of pads. The multilayer substrate further includes inner layers each with an inner conductive patterned layer, multiple inner conductive posts formed adjacent to the inner conductive patterned layer, and an inner dielectric layer, where the inner conductive patterned layer and the inner conductive posts are embedded in the inner dielectric layer, and a top surface of each of the inner conductive posts is exposed from the inner dielectric layer. | 11-27-2014 |
20140346671 | Fan-Out Package Structure and Methods for Forming the Same - A package includes a device die including a first plurality of metal pillars at a top surface of the device die. The package further includes a die stack including a plurality of dies bonded together, and a second plurality of metal pillars at a top surface of the die stack. One of the device die and the plurality of dies includes a semiconductor substrate and a through-via penetrating through the semiconductor substrate, A polymer region includes portions encircling the device die and the die stack, wherein a bottom surface of the polymer region is substantially level with a bottom surface of the device die and a bottom surface of the die stack. A top surface of the polymer region is level with top ends of the first and the second plurality of metal pillars. Redistribution lines are formed over the first and the second plurality of metal pillars. | 11-27-2014 |
20140346672 | Integrated Circuit Structure Having Dies with Connectors - An embodiment is an integrated circuit structure including a first die attached to a second die by a first connector. The first connector includes a solder joint portion between a first nickel-containing layer and a second nickel-containing layer, a first copper-containing layer between the first nickel-containing layer and the solder joint portion, and a second copper-containing layer between the second nickel-containing layer and the solder joint portion. | 11-27-2014 |
20140346673 | Methods and Apparatus for bump-on-trace Chip Packaging - Methods and apparatuses for a attaching a first substrate to a second substrate are provided. In some embodiments, a first substrate has a protective layer, such as a solder mask, around a die attach area, at which a second substrate is attached. A keep-out region (e.g., an area between the second substrate and the protective layer) is a region around the second substrate in which the protective layer is not formed or removed. The keep-out region is sized such that a sufficient gap exists between the second substrate and the protective layer to place an underfill between the first substrate and the second substrate while reducing or preventing voids and while allowing traces in the keep-out region to be covered by the underfill. | 11-27-2014 |
20140353819 | Polymer Layers Embedded with Metal Pads for Heat Dissipation - An integrated circuit structure includes a metal pad, a passivation layer including a portion over the metal pad, a first polymer layer over the passivation layer, and a first Post-Passivation Interconnect (PPI) extending into to the first polymer layer. The first PPI is electrically connected to the metal pad. A dummy metal pad is located in the first polymer layer. A second polymer layer is overlying the first polymer layer, the dummy metal pad, and the first PPI. An Under-Bump-Metallurgy (UBM) extends into the second polymer layer to electrically couple to the dummy metal pad. | 12-04-2014 |
20140353820 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME - Semiconductor device and method for fabricating the same are provided. The semiconductor device comprises a first metal wiring line, a chip pad which is electrically connected with the first metal wiring line and has a first width, a passivation layer which encloses the chip pad and includes a contact hole, a first barrier pattern formed on a side wall of the contact hole and a top surface of the passivation layer, a contact filling the contact hole on the first barrier pattern, and a bump, which is formed of the same material as the contact, has a second width which is smaller than the first width, and is overlaid with the first metal wiring line and the chip pad, the bump being entirely overlapped with the chip pad. | 12-04-2014 |
20140353821 | SEMICONDUCTOR DEVICES HAVING SOLDER TERMINALS SPACED APART FROM MOLD LAYERS AND RELATED METHODS - A method of forming an electronic device may include providing a solder structure on a surface of a substrate, and a surface of the solder structure spaced apart from the substrate may be planar. A mold layer may be formed on the surface of the substrate, wherein the mold layer surrounds the solder structure and wherein the planar surface of the solder structure is exposed through the mold layer. After forming the mold layer, the solder structure is heated to form a solder terminal having a curved surface spaced apart from the substrate. Related devices are also discussed. | 12-04-2014 |
20140353822 | SEMICONDUCTOR DEVICE - Reliability of a semiconductor device is improved. A semiconductor device has a base material comprised of insulating material having a through hole, a terminal formed on a lower surface of the base material, and a semiconductor chip mounted on an upper surface of the base material in a face-up manner. Further, the semiconductor device has a conductive member such as a wire, which electrically connects a pad of the semiconductor chip with an exposed surface of the terminal which is exposed from the through hole of the base material, and has a sealing body for sealing the conductive member, inside of the through hole of the base material, and the semiconductor chip. An anchor means is provided in a region of the exposed surface of the terminal which is exposed from the through hole of the base material except for a joint portion joined with the conductive member such as the wire. | 12-04-2014 |
20140353823 | SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME - Disclosed herein is a semiconductor package having a fan-out structure in which a semiconductor chip is buried by an encapsulation member and an external connection member is disposed below the buried semiconductor chip. The semiconductor package includes an embedded rewiring pattern layer, an upper semiconductor chip disposed above the embedded rewiring pattern layer, an upper encapsulation member encapsulating the upper semiconductor chip, a lower semiconductor chip disposed below the embedded rewiring pattern layer, and a lower encapsulation member encapsulating the lower semiconductor chip to prevent exposure thereof. | 12-04-2014 |
20140361426 | STACKED SEMICONDUCTOR PACKAGE AND METHOD FOR MANUFACTURING THE SAME - A stacked semiconductor package includes: a first semiconductor chip formed with a first through electrode, the first through electrode protruding above a first surface of the first semiconductor chip; a first polymer layer formed over the first surface of the first semiconductor chip such that the first through electrode is exposed by the first polymer layer; a second semiconductor chip having a first surface attached onto the first semiconductor chip by medium of the first polymer layer and a vial hole passing through the second semiconductor chip, the first surface of the second semiconductor chip being formed with a bonding pad having a through hole which corresponds to the first through electrode; and a second through electrode located within the through hole and the via hole and is electrically connected with the first through electrode. | 12-11-2014 |
20140361427 | FLEXIBLE STACK PACKAGES, ELECTRONIC SYSTEMS INCLUDING THE SAME, AND MEMORY CARDS INCLUDING THE SAME - Flexible stack packages are provided. The flexible stack package includes a first unit package and a second unit package which are sequentially stacked. Each of the first and second unit packages has a fixed area and a floating area. The fixed area of the first unit package is connected and fixed to the fixed area of the second unit package by a fixing part. | 12-11-2014 |
20140361428 | SEMICONDUCTOR PACKAGES - A semiconductor package comprises a lower package comprising a lower substrate, a lower semiconductor chip on the lower substrate, a lower graphene layer on the lower semiconductor chip, and a lower molding layer between the lower substrate and the lower graphene layer. An upper package is on the lower substrate, the upper package spaced apart from the lower package, the upper package comprising an upper substrate, an upper semiconductor chip, and an upper molding layer. Lower conductive bumps are positioned between the lower substrate and the upper substrate, the lower bumps comprising a ground bump and a signal transmitting bump. | 12-11-2014 |
20140361429 | SEMICONDUCTOR DEVICE WITH BUMPS AND DISPLAY DEVICE MODULE INCORPORATING THE SAME - A semiconductor device includes: a semiconductor chip having a main face which has a pair of long sides parallel to each other and a pair of short sides orthogonal to the pair of long sides; first bumps arrayed in a first bump placement region of the semiconductor chip, the first bump placement region being positioned along one of the pair of long sides; second bumps arrayed in a second bump placement region of the semiconductor chip, the second bump placement region being positioned along the other of the pair of long sides; first power lines disposed in a region between the first bump placement region and the second bump placement region, the first power lines extending in a direction parallel to the pair of long sides; and third bumps integrated on the semiconductor chip. Each of the third bumps provides short-circuiting of the first power lines. | 12-11-2014 |
20140361430 | SEMICONDUCTOR DEVICE - A semiconductor chip and a wiring board are coupled to each other through conductor posts. The centers of conductor posts situated above openings at the outermost periphery shift from the centers of the openings in a direction away from the center of the semiconductor chip. When a region where each of the conductor posts and an insulating layer are overlapped with each other is designated as an overlapped region, the width of the overlapped region more on the inner side than the opening is smaller than the width of the overlapped region more on the outer side than the opening. Thus, while stress applied to the conductor posts is relaxed, coupling reliability between the semiconductor chip and the wiring board is retained. | 12-11-2014 |
20140361431 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device includes a first semiconductor electronic component which includes a pad electrode, a solder bump, and a metal layer between a pad and solder that is configured to have an underlying metal layer formed between the pad electrode and the solder bump and connected to the pad electrode, and a main metal layer formed on the underlying metal layer, and in which the main metal layer has an eave portion at an outer edge portion thereof. | 12-11-2014 |
20140361432 | Pillar Design for Conductive Bump - A system and method for conductive pillars is provided. An embodiment comprises a conductive pillar having trenches located around its outer edge. The trenches are used to channel conductive material such as solder when a conductive bump is formed onto the conductive pillar. The conductive pillar may then be electrically connected to another contact through the conductive material. | 12-11-2014 |
20140361433 | SEMICONDUCTOR DEVICE - A semiconductor device, including: a semiconductor layer; a first conductive layer formed above the semiconductor layer and having a first width; a second conductive layer connected to the first conductive layer and having a second width which is smaller than the first width; an interlayer dielectric formed above the first conductive layer and the second conductive layer; and an electrode pad formed above the interlayer dielectric. A connection section at which the first conductive layer and the second conductive layer are connected is disposed in a specific region positioned inward from a line extending vertically downward from an edge of the electrode pad; and a reinforcing section is provided at the connection section. | 12-11-2014 |
20140367848 | Semiconductor Device and Method of Making an Embedded Wafer Level Ball Grid Array (EWLB) Package on Package (POP) Device With a Slotted Metal Carrier Interposer - A semiconductor device has a semiconductor die. The semiconductor die is disposed over a conductive substrate. An encapsulant is deposited over the semiconductor die. A first interconnect structure is formed over the encapsulant. An opening is formed through the substrate to isolate a portion of the substrate electrically connected to the first interconnect structure. A bump is formed over the first interconnect structure. Conductive vias are formed through the encapsulant and electrically connected to the portion of the substrate. A plurality of bumps is formed over the semiconductor die. A first conductive layer is formed over the encapsulant. A first insulating layer is formed over the first conductive layer. A second conductive layer is formed over the first insulating layer and first conductive layer. A second insulating layer is formed over the first insulating layer and second conductive layer. Protrusions extend above the substrate. | 12-18-2014 |
20140367849 | INTERPOSER AND METHOD OF MANUFACTURING THE SAME - A method of manufacturing an interposer is provided, including forming a plurality of first openings on one surface side of a substrate, forming a first metal layer in the first openings, forming on the other surface side of the substrate a plurality of second openings that are in communication with the first openings, forming a second metal layer in the second openings, and electrically connecting the first metal layer to the second metal layer, so as to form conductive through holes. The conductive through holes are formed stage by stage, such that the fabrication time in forming the metal layers is reduced, and a metal material will not be accumulated too thick on a surface of the substrate. Therefore, the metal material has a smoother surface, and no overburden will be formed around end surfaces of the through holes. An interposer is also provided. | 12-18-2014 |
20140367850 | STACKED PACKAGE AND METHOD OF FABRICATING THE SAME - A stacked package and a method of fabricating the same are provided. The stacked package includes: a first package, having a first encapsulant, a first electrical connection structure formed on one surface of the first encapsulant, a plurality of first conductive pillars formed in the first encapsulant, and a first semiconductor chip disposed in the first encapsulant are electrically connected to the first electrical connection structure; and a second package stacked on the first package, wherein the second package has a second encapsulant, a second electrical connection structure formed on the second encapsulant, a second semiconductor, a chip disposed in the second encapsulant and electrically connected to the second electrical connection structure, and a plurality of second conductive pillars formed in the second encapsulant and electrically connected to the first electrical conduction pillars. The stacked package can provide a great number of inputs/outputs for electronic applications. | 12-18-2014 |
20140367851 | EMBEDDED PACKAGES, METHODS OF FABRICATING THE SAME, ELECTRONIC SYSTEMS INCLUDING THE SAME, AND MEMORY CARDS INCLUDING THE SAME - Embedded packages are provided. The embedded package includes a chip attached to a first surface of a core layer, a plurality of bumps on a surface of the chip opposite to the core layer, and a first insulation layer surrounding the core layer, the chip and the plurality of bumps. The first insulation layer has a trench disposed in a portion of the first insulation layer to expose the plurality of bumps. | 12-18-2014 |
20140367852 | SUBSTRATE HAVING PILLAR GROUP AND SEMICONDUCTOR PACKAGE HAVING PILLAR GROUP - The present disclosure provides a substrate and a semiconductor package. The substrate includes a body, at least one pad group, a plurality of traces and at least one pillar group. The pad group includes a plurality of pads. Each pad has at least one inner side and at least one outer side. The inner side of a first pad is faced to the inner side of an adjacent second pad with a spaced section between. Each pillar group includes a plurality of pillars disposed on respective ones of the pads. The use of pad groups having multiple pads on which to form pillars allows an increase in the number of the pillars available in a given area so as to increase the amount of I/O connections. Furthermore, for a given number of I/O connections, the area occupied by the pads, pillars and traces can be reduced. | 12-18-2014 |
20140367853 | SOLID-STATE IMAGING DEVICE, IMAGING APPARATUS, SUBSTRATE, SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SOLID-STATE IMAGING DEVICE - A solid-state imaging device is a solid-state imaging device in which a first substrate formed on a first semiconductor wafer and a second substrate formed on a second semiconductor wafer are bonded via connect that electrically connects the substrates, wherein the first substrate includes photoelectric conversion units, the second substrate includes an output circuit that acquires a signal generated by the photoelectric conversion unit via the connector and outputs the signal, and dummy connectors that support the first and second bonded substrates are further arranged in a substrate region in which the connectors are not arranged in a substrate region of at least one of the first substrate and the second substrate. | 12-18-2014 |
20140374899 | Package with Solder Regions Aligned to Recesses - A method includes forming a passivation layer over a portion of a metal pad, forming a polymer layer over the passivation layer, and exposing the polymer layer using a photolithography mask. The photolithography mask has an opaque portion, a transparent portion, and a partial transparent portion. The exposed polymer layer is developed to form an opening, wherein the metal pad is exposed through the opening. A Post-Passivation Interconnect (PPI) is formed over the polymer layer, wherein the PPI includes a portion extending into the opening to connect to the metal pad. | 12-25-2014 |
20140374900 | SEMICONDUCTOR PACKAGE AND METHOD OF FABRICATING THE SAME - A semiconductor package includes memory I/O bumps and power/ground voltage bumps which are disposed at different positions from each other. In the semiconductor package, memory chips are disposed side by side, and a passivation layer is interposed between a conductive pad and a bump. | 12-25-2014 |
20140374901 | SEMICONDUCTOR PACKAGE AND METHOD OF FABRICATING THE SAME - A semiconductor package including: a substrate including a grounding pattern and a pad, the grounding pattern and the pad being separated and electrically insulated from each other; a semiconductor chip mounted on the substrate, the semiconductor chip including an active surface and an inactive surface opposite to the active surface; a bump interposed between the active surface and the pad to electrically connect the active surface to the pad; and a conductive member including at least a portion, the at least a portion being disposed on the inactive surface and electrically connected to the grounding pattern. | 12-25-2014 |
20150008575 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A surface mounting semiconductor component includes a semiconductor device, a circuit board, a number of first solder bumps, and a number of second solder bumps. The semiconductor device included a number of die pads. The circuit board includes a number of contact pads. The first solder bumps are configured to bond the semiconductor device and the circuit board. Each of the first solder bumps connects at least two die pads with a corresponding contact pad. Each of the second solder bumps connects a die pad with a corresponding contact pad. A method of forming a surface mounting component or a chip scale package assembly wherein the component or assembly has at least two different types of solder bumps. | 01-08-2015 |
20150008576 | WAFER-LEVEL CHIP-SCALE PACKAGE DEVICE HAVING BUMP ASSEMBLIES CONFIGURED TO FURNISH SHOCK ABSORBER FUNCTIONALITY - Semiconductor devices are described that have bump assemblies configured to furnish shock absorber functionality. In an implementation, a wafer-levelchip-scale package devices include an integrated circuit chip having an array of bump assemblies disposed over the integrated circuit chip. The array of bump assemblies comprises a plurality of first bump assemblies that include solder bumps composed at least substantially of a solder composition (i.e., solder bumps that do not include a core). The array further comprises a plurality of second bump assemblies that includes a solder bump having a core configured to furnish shock absorber functionality to the integrated circuit chip. | 01-08-2015 |
20150008577 | METHODS OF FLUXLESS MICRO-PIERCING OF SOLDER BALLS, AND RESULTING DEVICES - A method of establishing conductive connections is disclosed. The method includes providing an integrated circuit die having a plurality of solder balls each of which has an oxide layer on an outer surface of the solder ball. The method also includes performing a heating process to heat at least the solder balls and applying a force causing each of a plurality of piercing bond structures on a substrate to pierce one of the solder balls and its associated oxide layer to thereby establish a conductive connection between the solder ball and the piercing bond structure. | 01-08-2015 |
20150008578 | DEVICE PACKAGING WITH SUBSTRATES HAVING EMBEDDED LINES AND METAL DEFINED PADS - Package substrates enabling reduced bump pitches and package assemblies thereof. Surface-level metal features are embedded in a surface-level dielectric layer with surface finish protruding from a top surface of the surface-level dielectric for assembly, without solder resist, to an IC chip having soldered connection points. Package substrates are fabricated to enable multiple levels of trace routing with each trace routing level capable of reduced minimum trace width and spacing. | 01-08-2015 |
20150008579 | SEMICONDUCTOR DEVICE HAVING LOW DIELECTRIC INSULATING FILM AND MANUFACTURING METHOD OF THE SAME - A semiconductor device includes a semiconductor substrate on which a structure portion is provided except a peripheral portion thereof, and has a laminated structure including low dielectric films and wiring lines, the low dielectric films having a relative dielectric constant of 3.0 or lower and a glass transition temperature of 400° C. or higher. An insulating film is formed on the structure portion. A connection pad portion is arranged on the insulating film and connected to an uppermost wiring line of the laminated structure portion. A bump electrode is provided on the connection pad portion. A sealing film made of an organic resin is provided on a part of the insulating film which surrounds the bump electrode. Side surfaces of the laminated structure portion are covered with the insulating film and/or the sealing film. | 01-08-2015 |
20150014843 | SEMICONDUCTOR DEVICE WITH IMPROVED METAL PILLAR CONFIGURATION - When forming sophisticated semiconductor devices including metal pillars arranged on contact pads, which may comprise aluminum, device performance and reliability may be improved by avoiding exposure of the contact pad material to the ambient atmosphere, in particular during and between dicing and packaging processes. To this end, the contact pad material may be covered by a protection layer or may be protected by the metal pillars itself, thereby concurrently improving mechanical stress distribution in the device. | 01-15-2015 |
20150014844 | Die-on-Interposer Assembly with Dam Structure and Method of Manufacturing the Same - A semiconductor package includes an interposer chip having a frontside, a backside, and a corner area on the backside defined by a first corner edge and a second corner edge of the interposer chip. A die is bonded to the frontside of the interposer chip. At least one dam structure is formed on the corner area of the backside of the interposer chip. The dam structure includes an edge aligned to at least one the first corner edge and the second corner edge of the interposer chip. | 01-15-2015 |
20150014845 | SEMICONDUCTOR MODULE WITH INTERLOCKED CONNECTION - A semiconductor package includes a support substrate having opposing first and second main surfaces and sides between the first and second main surfaces, a semiconductor die attached to one of the main surfaces of the support substrate, and an encapsulation material at least partly covering the support substrate and the semiconductor die. A protrusion extends outward from a side of the support substrate and terminates in the encapsulation material. The protrusion forms an interlocked connection with the encapsulation material. The interlocked connection increases the tensile strength of the interface between the encapsulation material and the side of the support substrate with the protrusion. | 01-15-2015 |
20150014846 | Self-alignment Structure for Wafer Level Chip Scale Package - A packaged semiconductor device includes a semiconductor substrate, a metal pad, a metal base, a polymer insulating layer, a copper-containing structure and a conductive bump. The metal pad and the metal base are disposed on the semiconductor substrate. The polymer insulating layer overlies the metal base and the semiconductor substrate. The copper-containing structure is disposed over the polymer insulating layer, and includes a support structure and a post-passivation interconnect (PPI) line. The support structure is aligned with the metal base. The PPI line is located partially within the support structure, and extends out through an opening of the support structure, in which a top of the support structure is elevated higher than a top of the PPI line. The conductive bump is held by the support structure. | 01-15-2015 |
20150014847 | MICROELECTRONIC ASSEMBLIES WITH STACK TERMINALS COUPLED BY CONNECTORS EXTENDING THROUGH ENCAPSULATION - A microelectronic assembly or package can include first and second support elements and a microelectronic element between inwardly facing surfaces of the support elements. First connectors and second connectors such as solder balls, metal posts, stud bumps, or the like face inwardly from the respective support elements and are aligned with and electrically coupled with one another in columns. An encapsulation separates respective pairs of coupled first and second connectors from one another and may encapsulate the microelectronic element and fill spaces between the support elements. The first connectors, the second connectors or both may be partially encapsulated prior to electrically coupling respective pairs of first and second connectors in columns. | 01-15-2015 |
20150014848 | SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF - A semiconductor device is disclosed, which includes: a substrate having a substrate body and a plurality of conductive pads formed on the substrate body, wherein each of the conductive pads has at least an opening formed in a first surface thereof; a semiconductor component having a plurality of bonding pads; a plurality of conductive elements formed between the bonding pads and the conductive pads and in the openings of the conductive pads; and an encapsulant formed between the substrate and the semiconductor component for encapsulating the conductive elements, thereby strengthening the bonding between the conductive elements and the conductive pads and consequently increasing the product yield. | 01-15-2015 |
20150014849 | CORELESS PACKAGE STRUCTURE AND METHOD FOR MANUFACTURING SAME - A coreless package structure and a method for manufacturing same includes the steps of providing a supporting substrate comprising an etching resist layer and a copper foil. A groove is defined in the copper foil and a plurality of contact pads are formed on the surface of the copper foil. A chip including a plurality of electrode pads is received in the groove and a packaging layer is formed on a side of the copper foil. An insulating layer and a conductive pattern layer are formed on the packaging layer in that order, the conductive pattern layer being electrically connected to the contact pads and the electrode pads by a plurality of conductive bumps. Finally, the etching resist layer and the copper foil are removed to obtain a coreless package structure. | 01-15-2015 |
20150014850 | INTERCONNECT STRUCTURE - A microelectronic assembly includes first and second surfaces, a first thin conductive element, a first conductive projection, and a first fusible mass. The first thin conductive element includes a face that has first and second regions. The first conductive projection covers the first region of the first face. A barrier may be formed along a portion of the first region. The second face includes a second conductive projection that extends away therefrom. The first fusible metal mass connects the first conductive projection to the second conductive projection such that the first surface of the first face is oriented toward the second surface of the second substrate. The first mass extends along a portion of the first conductive projection to a location toward the first edge of the barrier. The barrier is disposed between the first thin element and the first metal mass. | 01-15-2015 |
20150021758 | MECHANISMS FOR FORMING BUMP STRUCTURES OVER WIDE METAL PAD - Embodiments of mechanisms for forming a semiconductor die are provided. The semiconductor die includes a semiconductor substrate and a protection layer formed over the semiconductor substrate. The semiconductor die also includes a conductive layer conformally formed over the protection layer, and a recess is formed in the conductive layer. The recess surrounds a region of the conductive layer. The semiconductor die further includes a solder bump formed over the region of the conductive layer surrounded by the recess. | 01-22-2015 |
20150021759 | MECHANISMS FOR FORMING PACKAGE STRUCTURE - Embodiments of mechanisms for forming a package structure are provided. A method for forming a package structure includes providing a semiconductor die and forming a first bump structure and a second bump structure over the semiconductor die. The second bump structure is thinner and wider than the first bump structure. | 01-22-2015 |
20150021760 | MECHANISMS FOR FORMING BONDING STRUCTURES - Embodiments of mechanisms for forming a package are provided. The package includes a substrate and a contact pad formed on the substrate. The package also includes a conductive pillar bonded to the contact pad through solder formed between the conductive pillar and the contact pad. The solder is in direct contact with the conductive pillar. | 01-22-2015 |
20150021761 | MULTI-CHIP PACKAGE - A multi-chip package may include a package substrate, a plurality of semiconductor chips stacked stepwise on the package substrate, a logic chip and a first conductive wire. The logic chip may include a conductive bump electrically connected to the package substrate. The first conductive wire may be electrically connected between the semiconductor chips and the logic chip. | 01-22-2015 |
20150021762 | SEMICONDUCTOR SUBSTRATE HAVING STRESS-ABSORBING SURFACE LAYER - An assembly ( | 01-22-2015 |
20150021763 | EPOXY RESIN COMPOSITION AND SEMICONDUCTOR APPARATUS PREPARED USING THE SAME - An epoxy resin composition includes an inorganic filler, an epoxy resin, and a curing agent. The inorganic filler has an average particle diameter D50 from about 2 μm to about 10 μm, an average particle diameter D10 of about 3 μm or less, and an average particle diameter D90 from about 6 μm to about 15 μm. Inorganic filler particles having a particle diameter of about 25 μm or more constitute about 0.1 wt % or less of the inorganic filler. | 01-22-2015 |
20150021764 | SEMICONDUCTOR DEVICE WITH REDISTRIBUTION LAYERS ON PARTIAL ENCAPSULATION AND NON-PHOTOSENSITIVE PASSIVATION LAYERS - A semiconductor device with redistribution layers on partial encapsulation is disclosed and may include providing a carrier with a non-photosensitive protection layer, forming a pattern in the non-photosensitive protection layer, providing a semiconductor die with a contact pad on a first surface, and bonding the semiconductor die to the non-photosensitive protection layer such that the contact pad aligns with the pattern formed in the non-photosensitive protection layer. A second surface opposite to the first surface of the semiconductor die, side surfaces between the first and second surfaces of the semiconductor die, and a portion of a first surface of the non-photosensitive protection layer may be encapsulated with an encapsulant. The carrier may be removed leaving the non-photosensitive protection layer bonded to the semiconductor die. A redistribution layer may be formed on the contact pad and a second surface of the non-photosensitive protection layer opposite to the first surface. | 01-22-2015 |
20150021765 | Semiconductor Device - Disclosed is a semiconductor device suppressed in decrease of reliability. The semiconductor device comprises an electrode pad portion ( | 01-22-2015 |
20150021766 | SUBSTRATE FOR SEMICONDUCTOR PACKAGE AND PROCESS FOR MANUFACTURING - A semiconductor package substrate includes a core portion, an upper circuit layer and a plurality of pillars. The pillars are disposed on and project upward from the upper circuit layer. Top surfaces of the pillars are substantially coplanar. The pillars provide an electrical interconnect to a semiconductor die. Solder joint reliability as between the substrate and the semiconductor die is improved. | 01-22-2015 |
20150028470 | Through-Silicon Coaxial Via Structure And Method - A silicon interconnect structure includes a peripheral outer via in a silicon substrate, a solid core inner via in the silicon substrate, the solid core inner via coaxial with the peripheral outer via to form a coaxial via structure, a metal interconnect stack formed over a first surface of the peripheral outer via and the solid core inner via, at least portions of the metal interconnect stack forming an electrical connection with the peripheral outer via and the solid core inner via, first contact pads on a surface of the metal interconnect stack, and second contact pads on an exposed surface of the peripheral outer via and the solid core inner via. | 01-29-2015 |
20150028471 | Semiconductor Device and Method of Forming Through Mold Hole with Alignment and Dimension Control - A semiconductor device includes a semiconductor die and an encapsulant formed over a first surface of the semiconductor die and around the semiconductor die. A first insulating layer is formed over a second surface of the semiconductor die opposite the first surface. A plurality of conductive vias is formed through the first insulating layer. A conductive pad is formed over the encapsulant. An interconnect structure is formed over the semiconductor die and encapsulant. A first opening is formed in the encapsulant to expose the conductive vias. The conductive vias form a conductive via array. The conductive via array is inspected through the first opening to measure a dimension of the first opening and determine a position of the first opening. The semiconductor device is adjusted based on a position of the conductive via array. A conductive material is formed in the first opening over the conductive via array. | 01-29-2015 |
20150028472 | STACKED PACKAGE AND METHOD FOR MANUFACTURING THE SAME - The stacked package includes: a substrate having an upper surface formed with connection pads, a lower surface, and four side surfaces; a first semiconductor chip mounted over the upper surface of the substrate; a first adhesive member that covers a portion of the substrate including the first semiconductor chip; and a second semiconductor chip formed with bumps on edges of a first surface and mounted over the substrate with interposition of the first semiconductor chip and the first adhesive member such that a center of the first surface is attached over the first adhesive member and the bumps are bonded onto the connection pads, with a second surface opposing to the first surface being polished evenly. | 01-29-2015 |
20150028473 | STACK PACKAGES AND METHODS OF FABRICATING THE SAME - Stack packages are provided. The stack package includes a first chip and a second chip. The first chip includes a first chip body, first through electrodes penetrating the first chip body, and an insulation layer disposed on a bottom surface of the first chip body. The second chip includes a second chip body and bumps disposed on a top surface of the second chip body. The first and second chips are vertically stacked such that the bumps penetrate the insulation layer to pierce the first through electrodes and the top surface of the second chip body directly contacts the insulation layer. Related fabrication methods, electronic systems and memory cards are also provided. | 01-29-2015 |
20150028474 | SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR PACKAGE - Embodiments of the inventive concept include a semiconductor package having a plurality of stacked semiconductor chips. A multi-layered substrate includes a central insulation layer, an upper wiring layer disposed on an upper surface of the central insulation layer, and a first lower wiring layer disposed on a lower surface of the central insulation layer. The stacked semiconductor chips are connected to the multi-layered substrate and/or each other using various means. The semiconductor package is capable of high performance operation, like a semiconductor package based on flip-ship bonding, and also meets the need for large capacity by overcoming a limitation caused by a single semiconductor chip. Embodiments of the inventive concept also include methods of manufacturing the semiconductor package. | 01-29-2015 |
20150028475 | TECHNIQUE FOR WAFER-LEVEL PROCESSING OF QFN PACKAGES - Semiconductor package device, such as wafer-level package semiconductor devices, are described that have pillars for providing electrical interconnectivity. In an implementation, the wafer-level package devices include an integrated circuit chip having at least one pillar formed over the integrated circuit chip. The pillar is configured to provide electrical interconnectivity with the integrated circuit chip. The wafer-level package device also includes an encapsulation structure configured to support the pillar. | 01-29-2015 |
20150028476 | DEVICES, SYSTEMS, AND METHODS RELATED TO FORMING THROUGH-SUBSTRATE VIAS WITH SACRIFICIAL PLUGS - Methods for making semiconductor devices are disclosed herein. A method configured in accordance with a particular embodiment includes forming one or more openings in a front side of the semiconductor device and forming sacrificial plugs in the openings that partially fill the openings. The method further includes further filling the partially filled openings with a conductive material, where individual sacrificial plugs are generally between the conductive material and a substrate of the semiconductor device. The sacrificial plugs are exposed at a backside of the semiconductor device. Contact regions can be formed at the backside by removing the sacrificial plugs. | 01-29-2015 |
20150035139 | Copper Post Structure for Wafer Level Chip Scale Package - In a method for forming a packaging structure, a metal pad is formed on a semiconductor substrate, and a first polymer insulating layer is formed over the semiconductor substrate. An opening passing through the first polymer insulating layer is formed to expose a portion of the metal pad. A copper-containing material is deposited in the opening and over the first polymer insulating layer, thereby forming a copper-containing layer having a first thickness and a first width over the first polymer insulating layer. A conductive bump having a second width is formed over the copper-containing layer, in which the second width is smaller than the first width. An exposed portion of the copper-containing layer is etched using the conductive bump as a mask until the exposed portion is reduced to a second thickness, thereby forming a monolithic copper-containing structure. | 02-05-2015 |
20150035140 | WAFER SUPPORT SYSTEM FOR 3D PACKAGING - A method for handling and supporting a device wafer during a wafer thinning process and the resulting device are provided. Embodiments include forming a plurality of solder bumps on a first surface of a substrate having a first and a second surface; removing a portion from a periphery of the first surface of the substrate; forming a temporary bonding material on a first carrier; bonding the first surface of the substrate with the temporary bonding material of the first carrier; affixing the second surface of the substrate to a second carrier; and removing the temporary bonding material. | 02-05-2015 |
20150035141 | SEMICONDUCTOR PACKAGE STRUCTURE FOR IMPROVING DIE WARPAGE AND MANUFACTURING METHOD THEREOF - A semiconductor die package includes a semiconductor die, a film for improving die warpage bonded to a first face of the semiconductor die, a plurality of electrically conductive bumps formed on a second face of the semiconductor die, a substrate onto which the electrically conductive bumps of the second face of the semiconductor die are bonded to electrically connect the semiconductor die and the substrate, and a mold compound applied these components to form an exposed surface of the semiconductor die package that is coplanar with an exposed surface of the film. | 02-05-2015 |
20150035142 | MULTI-CHIP PACKAGE - A multi-chip package may include a package substrate, a connecting substrate, a plurality of semiconductor chips and a logic chip. The package substrate may have an opening. The connecting substrate may be arranged on an upper surface of the package substrate. The semiconductor chips may be stacked on an upper surface of the connecting substrate. The semiconductor chips may be electrically connected with the connecting substrate. The logic chip may be arranged in the opening. The logic chip may be electrically connected between the connecting substrate and the package substrate. Thus, the logic chip may not act as to increase a width of the multi-chip package. | 02-05-2015 |
20150035143 | CHIP PACKAGE AND FABRICATION METHOD THEREOF - A chip package is disclosed. The package includes a semiconductor chip having a first surface and a second surface opposite thereto, at least one conductive pad adjacent to the first surface, and an opening extending toward the first surface from the second surface to expose the conductive pad. The caliber adjacent to the first surface is greater than that of the opening adjacent to the second surface. An insulating layer and a redistribution layer (RDL) are successively disposed on the second surface and extend to a sidewall and a bottom of the opening, in which the RDL is electrically connected to the conductive pad through the opening. A passivation layer covers the RDL and partially fills the opening to form a void between the passivation layer and the conductive pad in the opening. A fabrication method of the chip package is also disclosed. | 02-05-2015 |
20150035144 | HIGH DENSITY INTERCONNECT DEVICE AND METHOD - Embodiments that allow both high density and low density interconnection between microelectronic die and motherboard via Direct Chip Attach (DCA) are described. In some embodiments, microelectronic die have a high density interconnect with a small bump pitch located along one edge and a lower density connection region with a larger bump pitch located in other regions of the die. The high density interconnect regions between die are interconnected using an interconnecting bridge made out of a material that can support high density interconnect manufactured into it, such as silicon. The lower density connection regions are used to attach interconnected die directly to a board using DCA. The high density interconnect can utilize current Controlled Collapsed Chip Connection (C4) spacing when interconnecting die with an interconnecting bridge, while allowing much larger spacing on circuit boards. | 02-05-2015 |
20150035145 | MILLIMETER WAVE WAFER LEVEL CHIP SCALE PACKAGING (WLCSP) DEVICE - Various embodiments include wafer level chip scale package (WLCSP) structures and methods of tuning such structures. In some embodiments, the WLCSP structure includes: a printed circuit board (PCB) trace connection including at least one PCB ground connection connected with a PCB ground plane; a set of ground solder balls each contacting the printed circuit board trace connection; a set of chip pads contacting each of the ground solder balls in the set of ground solder balls; a chip ground plane connecting the set of chip pads; and a signal interconnect interposed between two of the set of ground solder balls, the signal interconnect including: a signal trace connection electrically isolated from the PCB ground plane; a signal ball contacting the signal PCB trace connection; a chip pad contacting the signal ball, and a signal trace connection on a chip contacting the chip pad. | 02-05-2015 |
20150041971 | STACKED SEMICONDUCTOR APPARATUS - A stacked semiconductor apparatus includes a main die, a plurality of slave dies, and a vertical interposer. The vertical interposer is vertically stacked on the main die. | 02-12-2015 |
20150041972 | SEMICONDUCTOR PACKAGE AND FABRICATION METHOD THEREOF - A semiconductor package is disclosed, which includes: a first substrate; a first semiconductor component disposed on the first substrate; a second substrate disposed on the first semiconductor component and electrically connected to the first substrate through a plurality of conductive elements; and a first encapsulant formed between the first substrate and the second substrate and encapsulating the first semiconductor component and the conductive elements. The present invention can control the height and volume of the conductive elements since the distance between the first substrate and the second substrate is fixed by bonding the second substrate to the first semiconductor component. | 02-12-2015 |
20150041973 | SEMICONDUCTOR DEVICES INCLUDING UNITARY SUPPORTS - A semiconductor device includes a plurality of cylindrical structures located at vertices and central points of a plurality of hexagons in a honeycomb pattern, and a unitary support having a plurality of openings. Each of the openings exposes a part each of four of the cylindrical structures. Each of the openings has the shape of a parallelogram or an oval substantially. A first distance between opposite cylindrical structures of a first pair of the four cylindrical structures exposed by each opening is shorter than a second distance between opposite cylindrical structures of a second pair of the four cylindrical structures exposed by the opening. The first distance is equal to a distance between the central point and each of the vertices of the hexagon. | 02-12-2015 |
20150041974 | SINTERED BODY OF SILVER FINE PARTICLE - A sintered body of silver fine particles for a bonding member to bond components of a semiconductor device, wherein an activation energy for creep of the sintered body of the silver fine particles is from 0.4 to 0.75 times that of an activation energy for a lattice diffusion of bulk silver. | 02-12-2015 |
20150041975 | SEMICONDUCTOR PACKAGE AND FABRICATING METHOD THEREOF - A semiconductor package includes a first package comprising a circuit board and a first semiconductor die mounded on the circuit board, and a second package comprising a mounting board. At least one second semiconductor die may be mounted on the mounting board, and one or more leads may be electrically connected to the mounting board and/or the second semiconductor die. An adhesion member may bond the first package to the second package, and an encapsulant may encapsulate the first package and the second package. the circuit board, the mounting board, and the one or more leads may be arranged to surround the first semiconductor die and the second semiconductor die, and the plurality of leads may be electrically connected to the circuit board and to a constant potential or ground, to reduce the effects of external electromagnetic interference upon the semiconductor package. | 02-12-2015 |
20150041976 | SEMICONDUCTOR DEVICE SEALED IN A RESIN SECTION AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device includes a first semiconductor chip having a pad electrode formed on an upper surface thereof; a resin section sealing the first semiconductor chip with the upper surface and a side surface of the first semiconductor chip being covered and a lower surface of die first semiconductor chip being exposed; a columnar electrode communicating between the upper surface and the lower surface of the resin section with the upper surface and the lower surface of the columnar electrode being exposed on the resin section and at least a part of the side surface of the columnar electrode being covered; and a bonding wire connecting the pad electrode and the columnar electrode with a part of the bonding wire being embedded in the columnar electrode as one end of the bonding wire being exposed on the lower surface of the columnar electrode and the remaining part of the bonding wire being covered with the resin section, and a method for manufacturing the same. | 02-12-2015 |
20150041977 | STRUCTURES AND METHODS FOR IMPROVING SOLDER BUMP CONNECTIONS IN SEMICONDUCTOR DEVICES - Structures with improved solder bump connections and methods of fabricating such structures are provided herein. The structure includes a via formed in a dielectric layer to expose a contact pad and a capture pad formed in the via and over the dielectric layer. The capture pad has openings over the dielectric layer to form segmented features. The solder bump is deposited on the capture pad and the openings over the dielectric layer. | 02-12-2015 |
20150041978 | SEMICONDUCTOR DEVICE - The semiconductor device | 02-12-2015 |
20150048496 | FABRICATION PROCESS AND STRUCTURE TO FORM BUMPS ALIGNED ON TSV ON CHIP BACKSIDE - Disclosed is a fabrication process of fabricating bumps aligned on TSVs on chip backside. A plurality of TSV pillars are embedded inside the semiconductor layer of an IC substrate where the sidewalls the bottom of the TSV pillars toward the chip backside are covered by a dielectric liner. Then, the thickness of the semiconductor layer is reduced from the chip backside to make the bottom portion of the dielectric liner to be exposed from the chip backside by including a first selectively etching. Then, a backside passivation is disposed on the chip backside without disposing on the bottoms of the TSV pillars. Then, the bottom portion of the dielectric liner is removed by a second selectively etching. An UBM layer is disposed on the backside passivation. A plurality of bumps are disposed on the UBM layer where the interface between each bump and each TSV pillar is a central protrusion lumped toward the corresponding bump. Accordingly, the interfaces between the bumps and the TSV pillars offer an increased bonding area to increase adhesion anchoring effects for the bumps bonded on the UBM layer through the central protrusions. | 02-19-2015 |
20150048497 | INTERPOSER WITH ELECTROSTATIC DISCHARGE PROTECTION - A photovoltaic (PV) substrate includes a grooved die-facing surface to form a channel for a bypass diode. The die-facing surface supports a screen-printed metal interconnect layer to form a first terminal for the bypass diode. | 02-19-2015 |
20150048498 | Alignment Structures and Methods of Forming Same - Embodiments of the present disclosure include interconnect structures and methods of forming interconnect structures. An embodiment is a method of forming an interconnect structure, the method including forming a first post-passivation interconnect (PPI) over a first substrate, forming a second PPI over the first substrate, and forming a first conductive connector on the first PPI. The method further includes forming a second conductive connector on the second PPI, and forming a molding compound on top surfaces of the first and second PPIs and surrounding portions of the first and second connectors, a first section of molding compound being laterally between the first and second connectors, the first section of molding compound having a curved top surface. | 02-19-2015 |
20150048499 | FINE-PITCH PILLAR BUMP LAYOUT STRUCTURE ON CHIP - Disclosed is a fine-pitch pillar bump layout structure on chip, comprising a chip, a passivation layer and at least two pillar bumps. Bonding pads of the chip are disposed along an X-axis. Openings of the passivation layer have a first aspect ratio. Pillar bumps are disposed on the bonding pads and each has a pillar body and a solder cap. Each pillar body has a plurality of symmetrical raised blocks disposed on the passivation layer and extended in both directions of Y-axis. The pillar bodies have shrunk bump widths along the X-axis so that a second aspect ratio is at least 1.5 times greater than the first aspect ratio and to partially expose the bonding pads and to make the central points of the pillar bodies be vertically aligned with the central points of the openings of the passivation layer. | 02-19-2015 |
20150048500 | Multi-Chip Structure and Method of Forming Same - A device comprises a first chip and a second chip stacked together to form a multi-chip structure, wherein the multi-chip structure is embedded in an encapsulation layer. The device further comprises a redistribution layer formed on a top surface of a first side of the encapsulation layer, wherein the redistribution layer is connected to active circuits of the first chip and the second chip and the redistribution layer extends beyond at least one edge of the first chip and the second chip. | 02-19-2015 |
20150048501 | SEMICONDUCTOR PACKAGE - A semiconductor package includes a substrate including a lower plate and an upper plate, a semiconductor chip mounted on a top surface of the substrate, and a mold layer surrounding a sidewall and a bottom surface of the semiconductor chip. The substrate has a mold path including an inner path extending between the lower and upper plates and a mold hole penetrating the upper plate. The mold hole is connected to the inner path. The mold layer extends into the mold path. | 02-19-2015 |
20150054149 | Novel 3D Integration Method Using SOI Substrates And Structures Produced Thereby - A process and resultant article of manufacture made by such process comprises forming through vias needed to connect a bottom device layer in a bottom silicon wafer to the one in the top device layer in a top silicon wafer comprising a silicon-on-insulator (SOI) wafer. Through vias are disposed in such a way that they extend from the middle of the line (MOL) interconnect of the top wafer to the buried oxide (BOX) layer of the SOI wafer with appropriate insulation provided to isolate them from the SOI device layer. | 02-26-2015 |
20150054150 | SEMICONDUCTOR PACKAGE AND FABRICATION METHOD THEREOF - A method for fabricating a semiconductor package is disclosed, which includes: providing first and second packaging substrates, wherein a surface of the first packaging substrate has first conductive pads and first conductive posts formed on the first conductive pads, a surface of the second packaging substrate has second conductive pads and second conductive posts formed on the second conductive pads, and the surface of the second packaging substrate further has a semiconductor chip disposed thereon; disposing the first packaging substrate on the second packaging substrate in a manner that the first conductive posts correspond in position to and are electrically connected to the second conductive posts; and forming an encapsulant between the first and second packaging substrates for encapsulating the first and second conductive posts and the semiconductor chip, thereby effectively preventing solder bridging and increasing the product yield and reliability. | 02-26-2015 |
20150054151 | Semiconductor Device and Method of Forming Interconnect Structure Over Seed Layer on Contact Pad of Semiconductor Die Without Undercutting Seed Layer Beneath Interconnect Structure - A semiconductor device has a semiconductor die with a first conductive layer formed over the die. A first insulating layer is formed over the die with a first opening in the first insulating layer disposed over the first conductive layer. A second conductive layer is formed over the first insulating layer and into the first opening over the first conductive layer. An interconnect structure is constructed by forming a second insulating layer over the first insulating layer with a second opening having a width less than the first opening and depositing a conductive material into the second opening. The interconnect structure can be a conductive pillar or conductive pad. The interconnect structure has a width less than a width of the first opening. The second conductive layer over the first insulating layer outside the first opening is removed while leaving the second conductive layer under the interconnect structure. | 02-26-2015 |
20150054152 | MULTILAYER PILLAR FOR REDUCED STRESS INTERCONNECT AND METHOD OF MAKING SAME - A multi-layer pillar and method of fabricating the same is provided. The multi-layer pillar is used as an interconnect between a chip and substrate. The pillar has at least one low strength, high ductility deformation region configured to absorb force imposed during chip assembly and thermal excursions | 02-26-2015 |
20150054153 | FLIP CHIP INTERCONNECTION WITH DOUBLE POST - A method of assembling a packaged microelectronic element is disclosed that includes the steps of providing a microelectronic element having a plurality of conductive posts extending away from a first surface of a microelectronic element, the posts having top surfaces and edge surfaces extending abruptly away from the top surfaces, and a fusible metal cap attached to an end of each of the plurality of posts; at least substantially aligning the posts of the microelectronic element with a plurality of conductive posts extending from a first surface of a substrate, the posts of the substrate having top surfaces and edge surfaces extending abruptly away from the top surfaces; and joining the posts of the microelectronic element with the posts of the substrate. | 02-26-2015 |
20150061115 | INTERCONNECT STRUCTURE AND MANUFACTURING METHOD THEREOF - A conductive interconnect structure includes a contact pad; a conductive body connected to the contact pad at a first end; and a conductive layer positioned on a second end of the conductive body. The conductive body has a longitudinal direction perpendicular to a surface of the contact pad. The conductive body has an average grain size (a) on a cross sectional plane (Plane A) whose normal is perpendicular to the longitudinal direction of the conductive body. The conductive layer has an average grain size (b) on Plane A. The conductive body and the conductive layer are composed of same material, and the average grain size (a) is greater than the average grain size (b). | 03-05-2015 |
20150061116 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device includes a carrier, an under bump metallurgy (UBM) pad on the carrier, and a post on a surface of the UBM pad. In some embodiments, a height of the post to a longest length of the UBM pad is between about 0.25 and about 0.7. A method of manufacturing a semiconductor device includes providing a carrier, disposing a UBM pad on the carrier and forming a post on the UBM pad. | 03-05-2015 |
20150061117 | CHIP PACKAGE AND METHOD FOR FORMING THE SAME - According to an embodiment of the present invention, a chip package is provided. The chip package includes: a patterned conducting plate having a plurality of conducting sections electrically separated from each other; a plurality of conducting pads disposed on an upper surface of the patterned conducting plate; a chip disposed on the conducting pads; a plurality of conducting bumps disposed on a lower surface of the patterned conducting plate, wherein each of the conducting bumps is electrically connected to a corresponding one of the conducting sections of the patterned conducting plate; and an insulating support layer partially surrounding the conducting bumps. | 03-05-2015 |
20150061118 | Three-Dimensional Chip Stack and Method of Forming the Same - A three-dimensional chip stack includes a first chip bonded to a second chip to form a bonded interconnection therebetween. The bonded interconnection includes a first conductive pillar overlying a first substrate of the first chip, a second conductive pillar overlying a second substrate of the second chip, and a joint structure between the first conductive pillar and the second conductive pillar. The joint structure includes a first IMC region adjacent to the first conductive pillar, a second IMC region adjacent to the second conductive pillar, and a metallization layer between the first IMC region and the second IMC region. | 03-05-2015 |
20150061119 | CIRCUIT SUBSTRATE, SEMICONDUTOR PACKAGE STRUCTURE AND PROCESS FOR FABRICATING A CIRCUIT SUBSTRATE - A circuit substrate includes a circuit stack, a patterned conductive layer, a dielectric layer, and a plurality of thickening conductive layers. The circuit stack has a surface. The patterned conductive layer is located on the surface of the circuit stack and has a plurality of traces. Each of the traces has a bonding segment. The dielectric layer is located on the surface of the circuit stack and covers the patterned conductive layer. Besides, the dielectric layer has a plurality of bonding openings Each of the bonding openings exposes the corresponding bonding segment. Each of the thickening conductive layers is located on the corresponding bonding segment. A semiconductor package structure having the above circuit substrate and a process for fabricating a circuit substrate are also provided. | 03-05-2015 |
20150061120 | STACK PACKAGES AND METHODS OF MANUFACTURING THE SAME - Embodiments of a stack package may include an upper chip on a lower chip, a backside passivation layer covering the backside surface of the lower chip and having a thickness which is substantially equal to a height of the protrusion portion of a lower through via electrode, a backside bump substantially contacting the protrusion portion, and a front side bump electrically connected to a chip contact portion of the upper chip and physically and electrically connected to the backside bump. The backside passivation layer may include a first insulation layer provided over a sidewall of the protrusion portion and the backside surface of the lower chip. Embodiments of fabrication methods are also disclosed. | 03-05-2015 |
20150061121 | METHOD FOR WAFER LEVEL PACKAGING AND A PACKAGE STRUCTURE THEREOF - The present disclosure relates to a method for wafer level packaging and a package structure thereof. The method includes several steps. A through hole is formed in the interposer with a thickness that is less than the length of a first conducting pillar. The first conducting pillar is disposed inside the through hole. A redistribution layer is disposed and electrically connected with the first conducting pillar. A solder ball is disposed on the redistribution layer so as to form a wafer level packaging structure. | 03-05-2015 |
20150061122 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE - A manufacturing method of a semiconductor device includes placing a mask having an opening on an external region of a top face of a substrate to locate an end portion of the opening of the mask just above a concave portion formed on the top face of the substrate, the external region being located outside the concave portion. The manufacturing method further includes: growing a conductive film on part of the top face of the substrate through the mask after the mask is placed on the substrate, the part of the top face containing the concave portion; and removing the mask from the substrate after the conductive film is grown. | 03-05-2015 |
20150061123 | Semiconductor Device and Method for Forming Openings and Trenches in Insulating Layer by First LDA and Second LDA for RDL Formation - A semiconductor device has a semiconductor die with an encapsulant deposited over the semiconductor die. A first insulating layer having high tensile strength and elongation is formed over the semiconductor die and encapsulant. A first portion of the first insulating layer is removed by a first laser direct ablation to form a plurality of openings in the first insulating layer. The openings extend partially through the first insulating layer or into the encapsulant. A second portion of the first insulating layer is removed by a second laser direct ablation to form a plurality of trenches in the first insulating layer. A conductive layer is formed in the openings and trenches of the first insulating layer. A second insulating layer is formed over the conductive layer. A portion of the second insulating layer is removed by a third laser direct ablation. Bumps are formed over the conductive layer. | 03-05-2015 |
20150061124 | Semiconductor Device and Method of Forming Interconnect Structure for Encapsulated Die Having Pre-Applied Protective Layer - A semiconductor device has a protective layer formed over an active surface of a semiconductor wafer. The semiconductor die with pre-applied protective layer are moved from the semiconductor wafer and mounted on a carrier. The semiconductor die and contact pads on the carrier are encapsulated. The carrier is removed. A first insulating layer is formed over the pre-applied protective layer and contact pads. Vias are formed in the first insulating layer and pre-applied protective layer to expose interconnect sites on the semiconductor die. An interconnect structure is formed over the first insulating layer in electrical contact with the interconnect sites on the semiconductor die and contact pads. The interconnect structure has a redistribution layer formed on the first insulating layer, a second insulating layer formed on the redistribution layer, and an under bump metallization layer formed over the second dielectric in electrical contact with the redistribution layer. | 03-05-2015 |
20150061125 | INTEGRATED CIRCUIT PACKAGE INCLUDING IN-SITU FORMED CAVITY - A flip chip packaged component includes a die having a first surface and a dielectric barrier disposed on the first surface of the die. The dielectric barrier at least partially surrounds a designated location on the first surface of the die. A plurality of bumps is disposed on the first surface of the die on an opposite side of the dielectric barrier from the designated location. The flip chip packaged component further includes a substrate having a plurality of bonding pads on a second surface thereof. A cavity is defined by the first surface of the die, the dielectric barrier, and the substrate. A molding compound encapsulates the die and at least a portion of the substrate. | 03-05-2015 |
20150069602 | CHIP-ON-FILM DEVICE - A chip-on-film device including a flexible circuit film having a wire, a passivation layer having a hole, an adhesive layer, a first pad, a second pad, an interconnection, and a bump is provided. A part of the adhesive layer is disposed in the hole. The first pad and the second pad are disposed under the passivation layer. | 03-12-2015 |
20150076688 | PLUG VIA FORMATION BY PATTERNED PLATING AND POLISHING - Solder bump connections and methods for fabricating solder bump connections. A passivation layer is formed on a dielectric layer. A via opening extends through the passivation layer from a top surface of the passivation layer to a metal line in the dielectric layer. A mask on the top surface of the passivation layer includes a mask opening that is aligned with the via opening. A conductive layer is selectively formed in the via opening and the mask opening. The conductive layer projects above the top surface of the passivation layer. The method further includes planarizing the passivation layer and the conductive layer to define a plug in the via opening that is coupled with the metal line. | 03-19-2015 |
20150076689 | Hollow Metal Pillar Packaging Scheme - An integrated circuit includes a bottom substrate, a metal layer disposed over the bottom substrate and a hollow metal pillar disposed on the metal layer. The metal layer and the hollow metal pillar are electrically connected. | 03-19-2015 |
20150076690 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - Provided is a semiconductor flat package with improved mountability. In a semiconductor device, an end surface of a lead, which is exposed from an encapsulation resin, is covered with a plated layer, and a side end surface of the plated layer and a side end surface of the encapsulation resin are flush with each other. A material with good solder wettability is formed at a lead cut portion of the semiconductor flat package, to thereby improve solder connection strength with a circuit board. A solder fillet is formed from the lead cut portion of the semiconductor package, to thereby enable adaptation of solder automatic visual inspection after mounting. | 03-19-2015 |
20150084185 | SEMICONDUCTOR DEVICE WITH A SEMICONDUCTOR DIE EMBEDDED BETWEEN AN EXTENDED SUBSTRATE AND A BOTTOM SUBSTRATE - A method of manufacturing a semiconductor device having a semiconductor die within an extended substrate and a bottom substrate may include bonding a bottom surface of a semiconductor die to a top surface of a bottom substrate, forming an adhering member to a top surface of the semiconductor die, bonding an extended substrate to the semiconductor die and to the top surface of the bottom substrate utilizing the adhering member and a conductive bump on a bottom surface of the extended substrate and a conductive bump on the bottom substrate. The semiconductor die and the conductive bumps may be encapsulated utilizing a mold member. The conductive bump on the bottom surface of the extended substrate may be electrically connected to a terminal on the top surface of the extended substrate. The adhering member may include a laminate film, a non-conductive film adhesive, or a thermal hardening liquid adhesive. | 03-26-2015 |
20150084186 | BUMP STRUCTURE HAVING A SINGLE SIDE RECESS - A bump structure includes a first end, and a second end opposite the first end. The bump structure further includes a first side connected between the first end and the second end. The bump structure further includes a second side opposite the first side. The second side is connected between the first end and the second end, and the second side comprises a recess for a reflowed solder material to fill. | 03-26-2015 |
20150084187 | METHODS OF FORMING HYDROPHOBIC SURFACES ON SEMICONDUCTOR DEVICE STRUCTURES, METHODS OF FORMING SEMICONDUCTOR DEVICE STRUCTURES, AND SEMICONDUCTOR DEVICE STRUCTURES - A method of forming a hydrophobic surface on a semiconductor device structure. The method comprises forming at least one structure having at least one exposed surface comprising titanium atoms. The at least one exposed surface of at least one structure is contacted with at least one of an organo-phosphonic acid and an organo-phosphoric acid to form a material having a hydrophobic surface on the at least one exposed surface of the least one structure. A method of forming a semiconductor device structure and a semiconductor device structure are also described. | 03-26-2015 |
20150084188 | STACKABLE MOLDED MICROELECTRONIC PACKAGES - A microelectronic package has a microelectronic element and conductive posts or masses projecting above a surface of the substrate. Conductive elements at a surface of the substrate opposite therefrom are electrically interconnected with the microelectronic element. An encapsulant overlies at least a portion of the microelectronic element and may be in contact with the conductive posts or masses. The encapsulant may have openings permitting electrical connections with the conductive posts or masses. The openings may partially expose conductive masses joined to posts, fully expose top surfaces of posts and partially expose edge surfaces of posts, or may partially expose top surfaces of posts. | 03-26-2015 |
20150084189 | FORMATION OF THROUGH-SILICON VIA (TSV) IN SILICON SUBSTRATE - To form a through-silicon via (TSV) in a silicon substrate without using plating equipment or using sputtering equipment or small metal particles, and form an interlayer connection by stacking a plurality of such silicon substrates, a through hole of a silicon substrate is filled using molten solder itself. In detail, solid solder placed above the through hole of the silicon substrate is molten and the molten solder is guided to and filled in the internal space. A metal layer can be deposited on an internal surface of the through hole beforehand, and also an intermetallic compound (IMC) can be formed in a portion other than the metal layer. | 03-26-2015 |
20150084190 | Multi-Chip Package Structure and Method of Forming Same - A device comprises a first semiconductor die embedded in a molding compound layer, a surface-mount device embedded in the molding compound layer, a plurality of interconnect structures formed on the molding compound layer, wherein the first semiconductor die is electrically coupled to the interconnect structures and the surface-mount device is electrically coupled to the interconnect structures through at least one V-shaped via and a plurality of bumps formed on and electrically coupled to the interconnect structures. | 03-26-2015 |
20150084191 | Multi-Chip Package and Method of Formation - A device comprises a first semiconductor die embedded in a molding compound layer, a surface-mount device embedded in the molding compound layer, a plurality of interconnect structures formed on the molding compound layer, wherein the first semiconductor die is electrically coupled to the interconnect structures and the surface-mount device is electrically coupled to the interconnect structures through at least a metal pillar and a plurality of bumps formed on and electrically coupled to the interconnect structures. | 03-26-2015 |
20150091157 | Semiconductor Device and Method of Making an Embedded Wafer Level Ball Grid Array (EWLB) Package on Package (POP) Device With a Slotted Metal Carrier Interposer - A semiconductor device has a semiconductor die. The semiconductor die is disposed over a conductive substrate. An encapsulant is deposited over the semiconductor die. A first interconnect structure is formed over the encapsulant. An opening is formed through the substrate to isolate a portion of the substrate electrically connected to the first interconnect structure. A bump is formed over the first interconnect structure. Conductive vias are formed through the encapsulant and electrically connected to the portion of the substrate. A plurality of bumps is formed over the semiconductor die. A first conductive layer is formed over the encapsulant. A first insulating layer is formed over the first conductive layer. A second conductive layer is formed over the first insulating layer and first conductive layer. A second insulating layer is formed over the first insulating layer and second conductive layer. Protrusions extend above the substrate. | 04-02-2015 |
20150091158 | PACKAGE STRUCTURE - A package structure, comprising: a substrate, having at least one conductive units provided at a first surface of the substrate; at least one first die, provided on a second surface of the substrate; a connecting layer; a second die, provided on the connecting layer, wherein the connecting layer comprises at least one bump for connecting the first die to the second die such that the first die and the second die are electrically connected; and at least one bonding wire, for electrically connecting the first die to the conductive units or the substrate. | 04-02-2015 |
20150091159 | SEMICONDUCTOR DEVICE WITH FINE CONDUCTIVE PILLAR AND METHOD OF MANUFACTURING THE SAME - A semiconductor device and a method of manufacturing the same are provided. A semiconductor device comprises a substrate, a conductive pattern formed on the substrate, and at least a conductive pillar having a predetermined height formed on the conductive pattern. The conductive pillar can be formed under a focus ion beam (FIB) or an electron beam environment. In one embodiment, a diameter of the conductive pillar is no more than 10 μm. | 04-02-2015 |
20150091160 | 3D DEVICE PACKAGING USING THROUGH-SUBSTRATE POSTS - A method for 3D device packaging utilizes through-substrate metal posts to mechanically and electrically bond two or more dice. The first die includes a set of access holes extending from a surface of the first die to a set of pads at a metal layer of the first die. The second die includes a set of metal posts. The first die and the second die are stacked such that each metal post extends from a surface of the second die toward a corresponding pad via a corresponding access hole. The first die and second die are mechanically and electrically bonded via solder joints formed between the metal posts and the corresponding pads. | 04-02-2015 |
20150091161 | SEMICONDUCTOR DEVICE - A first photosensitive organic insulating film (PO1) formed in contact with a passivation film (PL) covers the entire circumference of a stepped portion (TRE) at a surface of the passivation film PL formed by a topmost conductive layer (TCL) and has an outer circumferential edge (ED | 04-02-2015 |
20150091162 | SEMICONDUCTOR DEVICE - A semiconductor device provided with a wiring substrate including a connection pad, a joining member joined with the connection pad, and a semiconductor chip including a connection terminal electrically connected to the connection pad via the joining member. The joining member includes a first intermetallic compound layer composed of an intermetallic compound of Cu | 04-02-2015 |
20150091163 | DRIVER INTEGRATED CIRCUIT CHIP, DISPLAY DEVICE HAVING THE SAME, AND METHOD OF MANUFACTURING A DRIVER INTEGRATED CIRCUIT CHIP - A driver integrated circuit chip is provided. The driver integrated circuit chip includes a base substrate including at least one driver integrated circuit, a plurality of metal lines, and a passivation layer covering the driver integrated circuit and the metal lines; a plurality of input bumps arranged near a first longer side of the base substrate; a plurality of output bumps arranged near a second longer side of the base substrate; and a plurality of dummy bumps arranged on a central region of the base substrate, the dummy bumps being arranged between the input bumps and the output bumps. Each of the dummy bumps has a stacked layer structure that is different from a stacked layer structure of each of the input bumps and the output bumps. | 04-02-2015 |
20150091164 | SEMICONDUCTOR DEVICE - An inventive semiconductor device includes: a semiconductor chip including an integrated circuit; a plurality of electrode pads provided on the semiconductor chip and connected to the integrated circuit; a rewiring to which the electrode pads are electrically connected together, the rewiring being exposed on an outermost surface of the semiconductor chip and having an exposed surface area greater than the total area of the electrode pads; and a resin package which seals the semiconductor chip. | 04-02-2015 |
20150091165 | Semiconductor Device and Method of Forming Patterned Repassivation Openings Between RDL and UBM to Reduce Adverse Effects of Electro-Migration - A semiconductor device has a semiconductor wafer with a first conductive layer formed over a surface of the semiconductor wafer. A first insulating layer is formed over the surface of the semiconductor wafer and first conductive layer. A second conductive layer is formed over the first insulating layer and first conductive layer. A second insulating layer is formed over the first insulating layer and second conductive layer. A plurality of openings is formed in the second insulating layer in a bump formation area of the semiconductor wafer to expose the second conductive layer and reduce adverse effects of electro-migration. The openings are separated by portions of the second insulating layer. A UBM layer is formed over the openings in the second insulating layer in the bump formation area electrically connected to the second conductive layer. A bump is formed over the UBM layer. | 04-02-2015 |
20150091166 | MICROELECTRONIC DIE PACKAGES WITH METAL LEADS, INCLUDING METAL LEADS FOR STACKED DIE PACKAGES, AND ASSOCIATED SYSTEMS AND METHODS - Microelectronic die packages, stacked systems of die packages, and methods of manufacturing them are disclosed herein. In one embodiment, a system of stacked packages includes a first die package having a bottom side, a first dielectric casing, and first metal leads; a second die package having a top side attached to the bottom side of the first package, a dielectric casing with a lateral side, and second metal leads aligned with and projecting towards the first metal leads and including an exterior surface and an interior surface region that generally faces the lateral side; and metal solder connectors coupling individual first leads to individual second leads. In a further embodiment, the individual second leads have an “L” shape and physically contact corresponding individual first leads. In another embodiment, the individual second leads have a “C” shape and include a tiered portion that projects towards the lateral side of the second casing. | 04-02-2015 |
20150097283 | PLUG VIA FORMATION WITH GRID FEATURES IN THE PASSIVATION LAYER - Solder bump connections and methods for fabricating solder bump connections. A passivation layer is formed on a dielectric layer. Via openings extend through the passivation layer from a top surface of the passivation layer to a metal line in the passivation layer. A conductive layer is formed on the top surface of the passivation layer and within each via opening. When the passivation layer and the conductive layer are planarized, a plug is formed that includes sections in the via openings. Each section is coupled with the metal line. | 04-09-2015 |
20150097284 | Bowl-shaped solder structure - An apparatus relating generally to a substrate is disclosed. In this apparatus, a first metal layer is on the substrate. The first metal layer has an opening. The opening of the first metal layer has a bottom and one or more sides extending from the bottom. A second metal layer is on the first metal layer. The first metal layer and the second metal layer provide a bowl-shaped structure. An inner surface of the bowl-shaped structure is defined responsive to the opening of the first metal layer and the second metal layer thereon. The opening of the bowl-shaped structure is configured to receive and at least partially retain a bonding material during a reflow process. | 04-09-2015 |
20150097285 | SYSTEMS AND METHODS FOR BONDING SEMICONDUCTOR ELEMENTS - A method of ultrasonically bonding semiconductor elements includes the steps of: (a) aligning surfaces of a plurality of first conductive structures of a first semiconductor element to respective surfaces of a plurality of second conductive structures of a second semiconductor element, wherein the surfaces of each of the plurality of first conductive structures and the plurality of second conductive structures include aluminum; and (b) ultrasonically bonding ones of the first conductive structures to respective ones of the second conductive structures. | 04-09-2015 |
20150097286 | CHIP PACKAGE AND METHOD FOR FABRICATING THE SAME - A chip package includes a packaging substrate, a semiconductor chip, and a plurality of conductive structures. The semiconductor chip has a central region and an edge region that surrounds the central region. The conductive structures are between the packaging substrate and the semiconductor chip. The conductive structures have different heights, and the heights of the conductive structures are gradually increased from the central region of the semiconductor chip to the edge region of the semiconductor chip, such that a distance between the edge region of the semiconductor chip and the packaging substrate is greater than a distance between the central region of the semiconductor chip and the packaging substrate. | 04-09-2015 |
20150097287 | Electrical Connections for Chip Scale Packaging - Electrical connections for chip scale packaging are disclosed. In one embodiment, a semiconductor device includes a post-passivation layer disposed over a substrate, the substrate having a first direction of coefficient of thermal expansion mismatch. The semiconductor device includes a first opening through the post-passivation layer, the first opening comprising a plurality of elongated apertures. A longest of the plurality of elongated apertures comprises a first dimension, wherein the first dimension is aligned substantially perpendicular to the first direction of coefficient of thermal expansion mismatch. | 04-09-2015 |
20150102482 | Mechanism for Forming Patterned Metal Pad connected to Multiple Through Silicon Vias (TSVs) - Various embodiments of mechanisms for forming through a three-dimensional integrated circuit (3DIC) structure are provided. The 3DIC structure includes an interposer bonded to a die and a substrate. The interposer has a conductive structure with through silicon vias (TSVs) connected to a patterned metal pad and a conductive structure on opposite ends of the TSVs. The pattern metal pad is embedded with dielectric structures to reduce dishing effect and has regions over TSVs that are free of the dielectric structures. The conductive structure has 2 or more TSVs. By using a patterned metal pad and 2 or more TSVs, the reliability and yield of the conductive structure and the 3DIC structure are improved. | 04-16-2015 |
20150102483 | MICROELECTRONIC PACKAGE WITH STRESS-TOLERANT SOLDER BUMP PATTERN - A microelectronic package includes larger diameter solder bumps and smaller diameter solder bumps for coupling an interposer to a packaging substrate. The larger diameter solder bumps are positioned on a peripheral surface of the interposer and the smaller diameter solder bumps are positioned on a center surface of the interposer. The solder bumps positioned in the peripheral region can more reliably withstand the higher mechanical stresses that occur in this peripheral region during operation of the microelectronic package. | 04-16-2015 |
20150102484 | PACKAGE STRUCTURE AND FABRICATION METHOD THEREOF - A package structure is disclosed, which includes: a first substrate; a build-up layer formed on and electrically connected to the first substrate and having a cavity; at least an electronic element disposed in the cavity and electrically connected to the first substrate; a stack member disposed on the build-up layer so as to be stacked on the first substrate; and an encapsulant formed between the build-up layer and the stack member. The build-up layer facilitates to achieve a stand-off effect and prevent solder bridging. | 04-16-2015 |
20150102485 | NON-CONDUCTIVE FILM AND NON-CONDUCTIVE PASTE INCLUDING ZINC PARTICLES, SEMICONDUCTOR PACKAGE INCLUDING THE SAME, AND METHOD OF MANUFACTURING THE SEMICONDUCTOR PACKAGE - A non-conductive material layer, selected from a non-conductive film and a non-conductive polymer paste, and containing a dispersion of zinc (Zn) particles is disclosed, together with semiconductor packages including the non-conductive material layer. The non-conductive material layer contains zinc (Zn) particles having an average particle diameter of about 1 nm to about 200 nm in a non-conductive polymer base material of a film type, and a semiconductor package includes the non-conductive film. By using the non-conductive film and/or the non-conductive paste containing the zinc dispersion, e a semiconductor package having excellent electric connection properties and high reliability may be manufactured through simple processes at low manufacturing costs. | 04-16-2015 |
20150102486 | Method for Mounting a Chip and Chip Package - Provided is a method of mounting a chip. The method includes: forming a bump at one surface of a cavity formed concavely in an inner direction of a substrate; performing a coining process to flatten a surface of the bump; coating a solder material on the bump subjected to the coining process; and bonding a chip and the bump by melting the solder material, wherein an electrode portion or a metal portion is formed on a bottom of the chip. For a metal substrate according to the present invention, wherein a vertical insulating layer is included, since the electrode portion of the chip and the electrode portion of the substrate have to be electrically connected, the metal substrate is bonded to the electrode portion of the chip using the bump additionally formed on the metal substrate, so the heat generated in the chip can be rapidly transferred to the substrate, and the junction temperature of the chip can be decreased, thereby enhancing the light efficiency and the. In addition, cracking due to the difference of thermal expansion coefficient between solder materials can be prevented by sealing the bonding portion of the chip using the solder materials. Further, since oxidation of the bonding portion is prevented by blocking the contact with the outside, the chip packaging process can be performed without an additional process of filling an inert gas into the internal space wherein the chip is mounted. | 04-16-2015 |
20150102487 | STRESS BUFFER STRUCTURES IN A MOUNTING STRUCTURE OF A SEMICONDUCTOR DEVICE - A semiconductor device includes a bonding pad on a substrate. The semiconductor device further includes a passivation layer covering a peripheral portion of the bonding pad while exposing a middle portion of the bonding pad. Additionally, the semiconductor device includes a stress buffer layer over the passivation layer where the stress buffer layer exposes a portion of the bonding pad, and where a wall of the stress buffer layer extends, in steps, upwardly from the exposed portion of the bonding pad. Furthermore, the semiconductor device includes an under-bump metallurgy (UBM) layer over the stress buffer layer, where the UBM layer contacts a portion of the bonding pad. | 04-16-2015 |
20150102488 | PRINTED CIRCUIT BOARD USING SOLDER COATING BALL - Disclosed herein a printed circuit board comprising: a plurality of pads formed on a substrate; a solder resist (SR) pattern enclosing a region of the pad and burying another circuit pattern; and a solder pattern including a metal pattern therein using a solder and formed on an upper surface of each of the pads. | 04-16-2015 |
20150102489 | SEMICONDUCTOR DEVICE INCLUDING A BUFFER LAYER STRUCTURE FOR REDUCING STRESS - A semiconductor device includes a semiconductor chip, wiring that is included in the semiconductor chip and has a coupling part between parts with different widths, a pad being formed above the wiring and in a position overlapping the coupling part, a bump being formed on the pad, a buffer layer being formed in a position between the coupling part and the pad so as to cover the entire coupling part, and inorganic insulating layers being formed between the wiring and the buffer layer and between the buffer layer and the pad, respectively. The buffer layer is made of a material other than resin and softer than the inorganic insulating layer | 04-16-2015 |
20150108634 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device includes a die, a pad disposed on the die and configured to be electrically coupled with a bump through a conductive trace attached on the pad, a polymer disposed over the die and patterned to provide a path for the conductive trace passing through, and a molding surrounding the die and the polymer. A top surface of the molding is substantially in a same level as a top surface of the polymer. Further, a method of manufacturing a semiconductor device includes providing a die, forming a pad on the die, disposing a first polymer over the die, patterning the first polymer with an opening over the pad, disposing a sacrificial layer over the patterned first polymer, disposing a molding surrounding the die, removing a portion of the molding thereby exposing the sacrificial layer, removing the sacrificial layer thereby exposing the pad and the first polymer, disposing a second polymer on the first polymer, patterning the second polymer with the opening over the pad, and disposing a conductive material on the pad within the opening. | 04-23-2015 |
20150108635 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF - A semiconductor structure includes a three dimensional stack including a first semiconductor die and a second semiconductor die. The second semiconductor die is connected with the first semiconductor die with a bump between the first semiconductor die and the second semiconductor die. The semiconductor structure includes a molding compound between the first semiconductor die and the second semiconductor die. A first portion of a metal structure over a surface of the three dimensional stack and contacting a backside of the second semiconductor die and a second portion of the metal structure over the surface of the three dimensional stack and configured for electrically connecting the three dimensional stack with an external electronic device. | 04-23-2015 |
20150108636 | SUBMOUNT, ENCAPSULATED SEMICONDUCTOR ELEMENT, AND METHODS OF MANUFACTURING THE SAME - The present invention provides a submount which includes a semiconductor element and which can be easily connected to an IC on a main substrate. The submount in one embodiment of the present invention includes: a substrate; electrodes; the semiconductor element; Au wires; and gold bumps. The electrodes, the semiconductor element, the Au wires, and the gold bumps are encapsulated on the substrate by a resin. The gold bumps are formed on the electrodes and the Au wires by ball bonding and are cut by dicing such that side surfaces of the gold bumps are exposed. The exposed surfaces function as side surface electrodes of the submount. | 04-23-2015 |
20150108637 | SEMICONDUCTOR DEVICE INCLUDING TWO OR MORE CHIPS MOUNTED OVER WIRING SUBSTRATE - A semiconductor device includes a composite chip mounted over the a wiring substrate, the composite chip including a first area and a second area that is provided independently from the first area, the first area including a first circuit formed in the first area, and the second area including a second circuit formed in the second area. | 04-23-2015 |
20150108638 | Package on Package Structure and Method of Manufacturing the Same - A package on package structure includes a first substrate having a first region and a second region, a bump formed on the first region of the first substrate, a first semiconductor die bonded to the second region of the first substrate, and a semiconductor die package bonded to the first substrate. The bump includes a metallic structure and a plurality of minor elements dispersed in the metallic structure. The semiconductor die package includes a connector bonded to the bump, and the first semiconductor die is between the semiconductor die package and the first substrate. | 04-23-2015 |
20150108639 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - Of three chips ( | 04-23-2015 |
20150108640 | THIN INTEGRATED CIRCUIT CHIP-ON-BOARD ASSEMBLY AND METHOD OF MAKING - An integrated circuit assembly includes an insulating layer having a having a first surface and a second surface, where the first surface of the insulating layer is less than 10 microns below an upper plane of the integrated circuit assembly. An active layer contacts the first surface of the insulating layer. A metal bond pad is electrically connected to the active layer and formed on the second surface of the insulating layer, and is also electrically connected to a printed circuit board. A method of fabricating an integrated circuit assembly includes coupling a handle wafer to the active layer of a semiconductor-on-insulator wafer, removing the substrate of the semiconductor-on-insulator, forming a bond pad connecting to the active layer on the exposed insulator surface, bonding the bond pad to a printed circuit board using a solder bump, and removing the handle wafer. | 04-23-2015 |
20150115435 | SEMICONDUCTOR APPARATUS INCLUDING THROUGH VIA - A semiconductor apparatus with a through via includes a semiconductor chip and a through via formed by penetrating through the semiconductor chip. The system further includes a first metal layer connected to a portion of the through via at an end of the through via and a second metal layer connected to another portion of the through via at the end of the through via. | 04-30-2015 |
20150115436 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - Provided is a method of manufacturing a semiconductor device, the method including forming a via structure through a portion of a substrate; partially removing the substrate to expose a portion of the via structure; forming a protecting layer on the substrate to cover the portion of the via structure exposed by partially removing the substrate, the protecting layer including a photosensitive organic insulating material; curing the protecting layer to form a cured protecting layer; planarizing the cured protecting layer until a part of the via structure is exposed; and forming a pad structure to contact the part of the via structure exposed by planarizing the cured protecting layer. | 04-30-2015 |
20150115437 | UNIVERSAL ENCAPSULATION SUBSTRATE, ENCAPSULATION STRUCTURE AND ENCAPSULATION METHOD - A universal packaging substrate, comprising a first substrate ( | 04-30-2015 |
20150115438 | STACKED SEMICONDUCTOR PACKAGE - A semiconductor package comprising: a base substrate; a first semiconductor chip unit attached to the base substrate and including at least one first semiconductor chip; a second semiconductor chip unit stacked on the first semiconductor chip unit and including at least one second semiconductor chip; at least one third semiconductor chip disposed between the first semiconductor chip unit and the second semiconductor chip unit and having an area smaller than that of the at least one first semiconductor chip and that of the at least one second semiconductor chip; and an insulating material layer disposed between the first semiconductor chip unit and the second semiconductor chip unit to surround at least a portion of the at least one third semiconductor chip and having a thickness larger than that of the third semiconductor chip. | 04-30-2015 |
20150115439 | CHIP PACKAGE AND METHOD FOR FORMING THE SAME - The present disclosure relates to a chip package and a method for forming the same. The chip package comprises a carrier pad, a chip, and a plurality of second conductive bumps, and a molding compound. The carrier pad has a first surface with a plurality of first conductive bumps formed thereon. The chip has an active surface. One end of each of the plurality of second conductive bumps is electrically coupled to the active surface, and the other end of each of the plurality of second conductive bumps is electrically coupled to the first conductive bumps. The molding compound encapsulates the chip and completely fills space between the carrier pad and the chip. In the chip package and the method for forming the same according to the present disclosure, the first conductive bumps are formed on the first surface of the carrier pad by etching, which provides an electrical connection between the first conductive bumps and the active surface of the chip, and broadens a flow channel of the molding compound between the chip and the carrier pad so that the molding compound can completely fill the space between the chip and the carrier pad. Underfill before encapsulation is not needed and the package cost is thus lowered. | 04-30-2015 |
20150115440 | SEMICONDUCTOR DEVICE - A semiconductor device includes multilayer chips in which a first semiconductor chip and a second semiconductor chip are bonded together. A first electrode pad is formed on a principal surface of the first semiconductor chip, and a first bump is formed on the first electrode pad. A second bump is formed on the principal surface of the second semiconductor chip such that the second bump is bonded to the first bump. The first electrode pad has an opening, and the opening and an entire peripheral portion of the opening form a stepped shape form a stepped shape. The first bump has a recessed shape that is recessed at a center thereof and covers the stepped shape. | 04-30-2015 |
20150123264 | Semiconductor Devices and Methods of Forming Thereof - In accordance with an embodiment of the present invention, a method of forming a semiconductor device includes forming a contact layer over a first major surface of a substrate. The substrate includes device regions separated by kerf regions. The contact layer is disposed in the kerf region and the device regions. A structured solder layer is formed over the device regions. The contact layer is exposed at the kerf region after forming the structured solder layer. The contact layer and the substrate in the kerf regions are diced. | 05-07-2015 |
20150123265 | SOLDER BUMP ARRANGEMENTS FOR LARGE AREA ANALOG CIRCUITRY - An integrated circuit (IC) can include an analog region of a die of the IC. The analog region includes analog circuitry. The IC further includes a plurality of solder bumps implemented on a surface of the die in an area in vertical alignment with the analog region of the die. | 05-07-2015 |
20150123266 | Bump-on-Trace Design for Enlarge Bump-to-Trace Distance - A package includes a first and a second package component. The first package component includes a first metal trace and a second metal trace at the surface of the first package component. The second metal trace is parallel to the first metal trace. The second metal trace includes a narrow metal trace portion having a first width, and a wide metal trace portion having a second width greater than the first width connected to the narrow metal trace portion. The second package component is over the first package component. The second package component includes a metal bump overlapping a portion of the first metal trace, and a conductive connection bonding the metal bump to the first metal trace. The conductive connection contacts a top surface and sidewalls of the first metal trace. The metal bump is neighboring the narrow metal trace portion. | 05-07-2015 |
20150123267 | PACKAGED SEMICONDUCTOR DEVICE - A semiconductor device with an under-bump metallurgy (UBM) over a dielectric is provided. The UBM has a trench configured to be offset from a central point of the UBM. A distance between a center of the trench to an edge of the UBM is larger than a distance between the center of the trench to an opposite edge of the UBM. A probe pin is configured to contact the UBM and collect measurement data. | 05-07-2015 |
20150123268 | 3D Die Stacking Structure with Fine Pitches - A package includes package includes a first package component including a first plurality of electrical connectors at a top surface of the first package component, and a second plurality of electrical connectors longer than the first plurality of electrical connectors at the top surface of the first package component. A first device die is over the first package component and bonded to the first plurality of electrical connectors. A second package component is overlying the first package component and the first device die. The second package component includes a third plurality of electrical connectors at a bottom surface of the second package component. The third plurality of electrical connectors is bonded to the second plurality of electrical connectors. A fourth plurality of electrical connectors is at a bottom surface of the second package. The second and the fourth plurality of electrical connectors comprise non-solder metallic materials. | 05-07-2015 |
20150123269 | Packaging Devices and Methods of Manufacture Thereof - Packaging devices and methods of manufacture thereof for semiconductor devices are disclosed. In some embodiments, a packaging device includes a contact pad disposed over a substrate, and a passivation layer disposed over the substrate and a first portion of the contact pad, a second portion of the contact pad being exposed. A post passivation interconnect (PPI) line is disposed over the passivation layer and is coupled to the second portion of the contact pad. A PPI pad is disposed over the passivation layer and is coupled to the PPI line. An insulating material is disposed over the PPI line, the PPI pad being exposed. The insulating material is spaced apart from an edge portion of the PPI pad by a predetermined distance. | 05-07-2015 |
20150123270 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE - According to one embodiment, a first electrode is formed on a first face of a first semiconductor chip, and a second electrode and a protrusion are formed on a second face of a second semiconductor chip. The first semiconductor chip and the second semiconductor chip are spaced from one another by the protrusion in such a manner that the first face and the second face face each other. The first semiconductor chip and the second semiconductor chip are subject to reflow to be electrically connected to each other, and then the protrusion is cured at a temperature lower than a reflow temperature. | 05-07-2015 |
20150123271 | THERMOCOMPRESSION FOR SEMICONDUCTOR CHIP ASSEMBLY - An assembly of a semiconductor chip having pads to a substrate having pads aligned to receive the semiconductor chip is provided, whereby at least one of the semiconductor chip pads and substrate pads include solder bumps. The solder bumps are deformed against the substrate pads and the semiconductor chip pads, whereby an underfill material is applied to fill the gap between the semiconductor chip and substrate such that the underfill material envelopes both the deformed solder bumps and the substrate pads. The underfill material does not penetrate between the deformed solder bumps, the semiconductor chip pads, and the substrate pads based on a compression force causing the solder bumps to be deformed against the substrate pads and the semiconductor chip pads. At least one of the solder bumps have not been melted or reflowed to make a metallurgical bond between the semiconductor chip pads and the substrate pads. | 05-07-2015 |
20150123272 | NO-FLOW UNDERFILL FOR PACKAGE WITH INTERPOSER FRAME - A method of forming a package on a package structure includes applying a no-reflow underfill (NUF) layer over a substrate, wherein the substrate has at least one first bump and a plurality of second bumps surrounding the at least one first bump. The method further includes bonding a semiconductor die to the at least one first bump. The method further includes bonding an interposer frame to the plurality of second bumps, wherein the interposer frame surrounds the semiconductor die, wherein the semiconductor die is disposed in an opening of the interposer frame. | 05-07-2015 |
20150123273 | Semiconductor Device and Method of Forming Interposer Frame Electrically Connected to Embedded Semiconductor Die - A semiconductor device has an interposer frame mounted over a carrier. A semiconductor die has an active surface and bumps formed over the active surface. The semiconductor die can be mounted within a die opening of the interposer frame or over the interposer frame. Stacked semiconductor die can also be mounted within the die opening of the interposer frame or over the interposer frame. Bond wires or bumps are formed between the semiconductor die and interposer frame. An encapsulant is deposited over the interposer frame and semiconductor die. An interconnect structure is formed over the encapsulant and bumps of the first semiconductor die. An electronic component, such as a discrete passive device, semiconductor die, or stacked semiconductor die, is mounted over the semiconductor die and interposer frame. The electronic component has an I/O count less than an I/O count of the semiconductor die. | 05-07-2015 |
20150123274 | SEMICONDUCTOR DEVICE - A semiconductor device includes a substantially rectangular semiconductor chip having an obverse surface, a first long side, a second long side opposite the first long side, a first short side and a second short side, and a plurality of bump electrodes. A wiring substrate has a main surface, a first side disposed outside of the semiconductor chip and extending substantially parallel with the first long side, a second side disposed outside of the semiconductor chip and extending substantially parallel with the second long side, and a plurality of wiring groups, each including a plurality of wirings. A semiconductor chip is mounted on the wiring substrate such that the obverse surface of the semiconductor chip is faced to the main surface of the wiring substrate and the first long side is located between the first side of the wiring substrate and the second long side, in a plan view. | 05-07-2015 |
20150130049 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device includes a carrier and a metallic structure including a metallic member, a pad and a via portion; wherein the metallic member is disposed inside the carrier, the pad is configured for receiving a solder bump and is disposed on a surface of the carrier, the via portion is configured for electrically connecting the metallic member and the pad, and the via portion is disposed proximal to an end of the pad. Further, a method of manufacturing a semiconductor device includes providing a carrier, removing a portion of the carrier for forming a via extending a surface of the carrier to an interior of the carrier, filling the via by a conductive material, and disposing the conductive material on the surface of the carrier, wherein the via is disposed proximal to an end portion of the conductive material. | 05-14-2015 |
20150130050 | Substrate Design with Balanced Metal and Solder Resist Density - A package includes a package substrate, which includes a middle layer selected from the group consisting of a core and a middle metal layer, a top metal layer overlying the middle layer, and a bottom metal layer underlying the middle layer. All metal layers overlying the middle layer have a first total metal density that is equal to a sum of all densities of all metal layers over the middle layer. All metal layers underlying the middle layer have a second total metal density that is equal to a sum of all densities of all metal layers under the middle layer. An absolute value of a difference between the first total metal density and the second total metal density is lower than about 0.1. | 05-14-2015 |
20150130051 | Bump-on-Trace Structures with High Assembly Yield - A package includes first package component, which further includes a first metal trace at a surface of the first package component, with the first metal trace having a trace width measured in a direction perpendicular to a lengthwise direction of the first metal trace. The first package component further includes a second metal trace at the surface of the first package component. The first metal trace and the second metal trace are parallel to each other. A second package component is overlying the first package component, wherein the second package component includes a metal bump. A solder region bonds the metal bump to the first metal trace, wherein the solder region contacts a top surface and sidewalls of the first portion of the first metal trace. A ratio of a volume of the solder region to the trace width is between about 1,100 μm | 05-14-2015 |
20150130052 | METHOD FOR PRODUCING MICROBUMPS ON A SEMICONDUCTOR COMPONENT - The disclosed technology relates to pillar-type microbumps formed on a semiconductor component, such as an integrated circuit chip or an interposer substrate, and a method of forming the pillar-type microbumps. In one aspect, a method of forming the pillar-type microbump on a semiconductor component includes providing the semiconductor component, where the semiconductor component has an upper metallization layer, and the metallization layer has a contact area. The method additionally includes forming a passivation layer over the metallization layer. The method additionally includes forming a plurality of openings through the passivation layer such that the contact area is exposed at a bottom of the openings. The method further includes forming the microbump over the contact area, where the microbump forms an electrical connection with the contact area through the openings. | 05-14-2015 |
20150130053 | SEMICONDUCTOR DEVICE - A semiconductor device includes a support body provided with a wiring layer that includes a first pad; a first semiconductor chip; a first relay substrate stacked on the first semiconductor chip through a first non-conductive adhesion layer and including a first conductive portion and a first protruding electrode electrically connected to the first conductive portion; a second semiconductor chip stacked on the first relay substrate through a second non-conductive adhesion layer, the first protruding electrode of the first relay substrate penetrating the second non-conductive adhesion layer to be connected to the second semiconductor chip; and a first metal wire formed at the first relay substrate to be connected to the first conductive portion for electrically connecting the first conductive portion with the first pad of the wiring layer of the support body. | 05-14-2015 |
20150130054 | SEMICONDUCTOR PACKAGE STRUCTURE AND MANUFACTURING METHOD THEREOF - A semiconductor package and a method for manufacturing a semiconductor package that comprises a unit substrate, for example to which a semiconductor chip is attached, embedded in a base substrate on which a semiconductor device may be mounted. The base substrate may, for example, comprise vias between top and bottom surfaces thereof and/or vias between the top surface of the base substrate and a top surface of the unit substrate embedded within the base substrate. | 05-14-2015 |
20150130055 | Chip-on-Wafer Structures and Methods for Forming the Same - A package component includes a substrate, wherein the substrate has a front surface and a back surface over the front surface. A through-via penetrates through the substrate. A conductive feature is disposed over the back surface of the substrate and electrically coupled to the through-via. A first dielectric pattern forms a ring covering edge portions of the conductive feature. An Under-Bump-Metallurgy (UBM) is disposed over and in contact with a center portion of the conductive feature. A polymer contacts a sidewall of the substrate. A second dielectric pattern is disposed over and aligned to the polymer. The first and the second dielectric patterns are formed of a same dielectric material, and are disposed at substantially a same level. | 05-14-2015 |
20150130056 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A semiconductor device including a semiconductor element; a pad electrode that is formed on the semiconductor element; an alignment mark that is formed on the semiconductor element; a connection electrode that is formed on the pad electrode; and an underfill resin that is formed to cover the connection electrode. The height of the alignment mark from the semiconductor element is greater than that of the connection electrode. | 05-14-2015 |
20150130057 | Post Passivation Interconnect Structures and Methods for Forming the Same - A device includes a metal pad, a passivation layer overlapping edge portions of the metal pad, and a first polymer layer over the passivation layer. A Post-Passivation-Interconnect (PPI) has a level portion overlying the first polymer layer, and a plug portion that has a top connected to the level portion. The plug portion extends into the first polymer layer. A bottom surface of the plug portion is in contact with a dielectric material. A second polymer layer is overlying the first polymer layer. | 05-14-2015 |
20150130058 | Low Cost and Ultra-Thin Chip on Wafer on Substrate (CoWoS) Formation - Methods of making and an integrated circuit device. An embodiment method includes patterning a first polymer layer disposed over a first copper seed layer, electroplating a through polymer via in the first polymer layer using the first copper seed layer, a via end surface offset from a first polymer layer surface, forming a second polymer layer over the first polymer layer, the second polymer layer patterned to expose the via end surface, and electroplating an interconnect in the second polymer layer to cap the via end surface using a second copper seed layer. | 05-14-2015 |
20150137349 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device includes a substrate including a surface, a plurality of pads disposing on the surface of the substrate, the plurality of pads includes a non-solder mask defined (NSMD) pad and a solder mask defined (SMD) pad, and the NSMD pad is arranged at a predetermined location. Further, a method of manufacturing a semiconductor device includes providing a substrate, disposing a plurality of pads on a surface of the substrate, disposing a solder mask over the surface of the substrate and the plurality of pads, forming a first recess in the solder mask to surround one of the plurality of pads, and forming a second recess in the solder mask and above one of the plurality of pads. | 05-21-2015 |
20150137350 | SEMICONDUCTOR DEVICE AND FABRICATING METHOD THEREOF - A semiconductor structure includes an oval-shaped pad and a dielectric layer. The oval-shaped pad is on a substrate and includes a major axis corresponding to the largest distance of the oval-shaped pad. The major axis is toward a geometric center of the substrate. The dielectric layer covers the substrate and surrounds the oval-shaped pad. | 05-21-2015 |
20150137351 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device includes a die, a conductive post disposed adjacent to the die, and a molding surrounding the conductive post and the die, the molding includes a protruded portion protruded from a sidewall of the conductive post and disposed on a top surface of the conductive post. Further, a method of manufacturing a semiconductor device includes disposing a die, disposing a conductive post adjacent to the die, disposing a molding over the conductive post and the die, removing some portions of the molding from a top of the molding, and forming a recess of the molding above a top surface of the conductive post. | 05-21-2015 |
20150137352 | MECHANISMS FOR FORMING POST-PASSIVATION INTERCONNECT STRUCTURE - Embodiments of mechanisms for forming a semiconductor device are provided. The semiconductor device includes a contact pad over a substrate. The semiconductor device also includes a passivation layer over the substrate and a first portion of the contact pad, and a second portion of the contact pad is exposed through an opening. The semiconductor device further includes a post-passivation interconnect layer over the passivation layer and coupled to the second portion of the contact pad. In addition, the semiconductor device includes a bump over the post-passivation interconnect layer and outside of the opening. The semiconductor device also includes a diffusion barrier layer physically insulating the bump from the post-passivation interconnect layer while electrically connecting the bump to the post-passivation interconnect layer. | 05-21-2015 |
20150137353 | UNDER-BUMP METAL STRUCTURES FOR INTERCONNECTING SEMICONDUCTOR DIES OR PACKAGES AND ASSOCIATED SYSTEMS AND METHODS - The present technology is directed to manufacturing semiconductor dies with under-bump metal (UBM) structures for die-to-die and/or package-to-package interconnects or other types of interconnects. In one embodiment, a method for forming under-bump metal (UBM) structures on a semiconductor die comprises constructing a UBM pillar by plating a first material onto first areas of a seed structure and depositing a second material over the first material. The first material has first electrical potential and the second material has a second electrical potential greater than the first electrical potential. The method further comprises reducing the difference in the electrical potential between the first material and the second material, and then removing second areas of the seed structure between the UBM pillars thereby forming UBM structures on the semiconductor die. | 05-21-2015 |
20150137354 | PILLAR BUMP FORMED USING SPOT-LASER - A pillar bump, such as a copper pillar bump, is formed on an integrated circuit chip by applying a metallic powder over a conductive pad on a surface of the chip. The metallic powder is selectively spot-lasered to form the pillar bump. Any remaining unsolidified metallic powder may be removed from the surface of the chip. This process may be repeated to increase the bump height. Further, a solder cap may be formed on an outer surface of the pillar bump. | 05-21-2015 |
20150137355 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device includes a first substrate including a surface, and a pad array on the surface of the substrate, wherein the pad array comprises a first type pad and a second type pad located on a same level. The semiconductor device further includes a conductive bump connecting either the first type pad or the second type pad to a second substrate and a via connected a conductive feature at a different level to the first type pad and the via located within a projection area of the first type pad and directly contacting the first type pad. The semiconductor device also has a dielectric in the substrate and directly contacting the second type pad, wherein the second type pad is floated on the dielectric. | 05-21-2015 |
20150137356 | NON-CYANIDE ELECTROLYTIC GOLD PLATING SOLUTION - The present invention provides a non-cyanogen type electrolytic gold plating solution, which can form a plating film capable of maintaining a high hardness even when the plating film is subjected to a heat treatment. A non-cyanogen type electrolytic gold plating solution of the present invention includes: a gold source including an alkaline salt of gold sulfite or ammonium of gold sulfite; and a conductive salt including sulfite and sulfate. The non-cyanogen type electrolytic gold plating solution includes a salt of at least one of iridium, ruthenium, and rhodium in a metal concentration of 1 to 3000 mg/L. Further, the non-cyanogen type electrolytic gold plating solution preferably includes a crystal adjuster. The crystal adjuster is particularly preferably thallium. | 05-21-2015 |
20150137357 | SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE PRODUCTION METHOD - An inventive semiconductor device includes: a first semiconductor chip; a second semiconductor chip having a front surface opposed to a front surface of the first semiconductor chip; a first electrode region including a first electrode provided between the first semiconductor chip and the second semiconductor chip to electrically connect the first semiconductor chip to the second semiconductor chip; and a juncture portion provided between the first semiconductor chip and the second semiconductor chip as surrounding the first electrode region to connect the first semiconductor chip to the second semiconductor chip. | 05-21-2015 |
20150137358 | SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE PRODUCTION METHOD - A semiconductor device according to the present invention includes: a combination object; and a chip having a front surface opposed to a front surface of the combination object. The chip includes: a multi-level wiring structure provided in the front surface of the chip; a connection electrode provided in the multi-level wiring structure and electrically connected to the combination object; an alignment mark set provided in the multi-level wiring structure and electrically isolated from the connection electrode; and an electrically conductive film provided at a higher level than the alignment mark set in association with the multi-level wiring structure to cover the alignment mark set and electrically isolated from the connection electrode. | 05-21-2015 |
20150137359 | METHOD FOR FORMING THROUGH SILICON VIA WITH WAFER BACKSIDE PROTECTION - Semiconductor devices with through silicon vias (TSVs) are formed without copper contamination. Embodiments include exposing a passivation layer surrounding a bottom portion of a TSV in a silicon substrate, forming a silicon composite layer over the exposed passivation layer and over a bottom surface of the silicon substrate, forming a hardmask layer over the silicon composite layer and over the bottom surface of the silicon substrate, removing a section of the silicon composite layer around the bottom portion of the TSV using the hardmask layer as a mask, re-exposing the passivation layer, and removing the hardmask layer and the re-exposed passivation layer to expose a contact for the bottom portion of the TSV. | 05-21-2015 |
20150137360 | TSV Structures and Methods for Forming the Same - A device includes a substrate having a front side and a backside, a through-via extending from the backside to the front side of the substrate, and a conductive pad on the backside of the substrate and over the through-via. The conductive pad has a substantially planar top surface. A conductive bump has a non-planar top surface over the substantially planar top surface and aligned to the through-via. The conductive bump and the conductive pad are formed of a same material. No interface is formed between the conductive bump and the conductive pad. | 05-21-2015 |
20150137361 | Through Silicon Via Structure and Method - A system and method for manufacturing a through silicon via is disclosed. An embodiment comprises forming a through silicon via with a liner protruding from a substrate. A passivation layer is formed over the substrate and the through silicon via, and the passivation layer and liner are recessed from the sidewalls of the through silicon via. Conductive material may then be formed in contact with both the sidewalls and a top surface of the through silicon via. | 05-21-2015 |
20150145119 | Integrated Circuit And Fabricating Method Thereof - An integrated circuit and a method of fabricating the integrated circuit are provided. In various embodiments, the integrated circuit includes a first substrate, a second substrate, and a bump pad. The first substrate has at least one active device and a plurality of first metallic pads electrically connected to the active device. The first substrate has front-end-of-line processing layers without back-end-of-line processing layers over the front-end-of-line processing layers. The second substrate has a semiconductor substrate and an interconnect structure disposed on the semiconductor substrate, and the interconnect structure has at least one second metallic pad. The second substrate does not include any active devices. The bump pad is sandwiched by the first substrate and the second substrate. The active device and the first metallic pad of the first substrate are electrically connected to the second metallic pad of the second substrate through the bump pad. | 05-28-2015 |
20150145120 | SEMICONDUCTOR DEVICE HAVING A THROUGH ELECTRODE - A semiconductor device includes a through electrode, a pad, and a bump. The through electrode penetrates a device body of the semiconductor device. The pad is disposed over an end of the through electrode to have a first overlap region and a second overlap region that overlap with a central portion and an edge portion of the end of the through electrode, respectively. The bump is disposed over the pad to contact the second overlap region of the pad without contacting the first overlap region of the pad. | 05-28-2015 |
20150145121 | THIN EMBEDDED PACKAGES, METHODS OF FABRICATING THE SAME, ELECTRONIC SYSTEMS INCLUDING THE SAME, AND MEMORY CARDS INCLUDING THE SAME - An embedded package includes a core layer having a cavity, a first semiconductor chip disposed in the cavity, and bumps disposed on a top surface of the first semiconductor chip, a second semiconductor chip disposed on the first semiconductor chip and the core layer, pads disposed on a top surface of the second semiconductor chip, and a first insulation layer disposed on the core layer and the first and second semiconductor chips. The first insulation layer has first openings that expose the bumps and second openings that expose the pads, and the first and second openings have a similar depth. | 05-28-2015 |
20150145122 | INTEGRATED CIRCUITS WITH INTERNAL PADS - An embodiment includes an integrated circuit, comprising: a substrate; a first circuit formed on the substrate and coupled to a plurality of first pads on the substrate; and a second circuit formed on the substrate and coupled to a plurality of second pads on the substrate. The first pads are formed on a perimeter of the substrate; and the second pads extend from the perimeter of the substrate towards an interior of the substrate. | 05-28-2015 |
20150145123 | POWER SEMICONDUCTOR MODULE AND METHOD OF MANUFACTURING THE SAME - Disclosed herein are a power semiconductor module and a method of manufacturing the same. The power semiconductor module includes: a substrate on which a semiconductor device is mounted; a pin positioned on the substrate and having one side electrically connected to the substrate; and a molding part formed to cover a portion of the pin and the substrate and the semiconductor device, wherein the molding part has a pin insertion opening. | 05-28-2015 |
20150145124 | SEMICONDUCTOR CHIPS WITH THROUGH-SILICON VIAS, AND SEMICONDUCTOR PACKAGES INCLUDING THE SAME - Provided is a semiconductor device with through-silicon vias. The device includes a substrate including a lower semiconductor layer, a buried insulating layer, and an upper semiconductor layer, electronic devices on the upper semiconductor layer, a vertical electrode structure including a vertical electrode penetrating the substrate, and an electrode separation pattern surrounding the vertical electrode structure in a plan view and penetrating the upper semiconductor layer to directly contact the buried insulating layer. | 05-28-2015 |
20150145125 | PASSIVATION PROCESS TO PREVENT TIW CORROSION - Disclosed is an under bump metallization structure including a plurality of metal or metal alloy layers formed on chip bond pads with improved reliability due to a sacrificial metal oxide and the methods of making the under bump metallization structures. | 05-28-2015 |
20150145126 | Semiconductor Device and Method of Forming Compliant Stress Relief Buffer Around Large Array WLCSP - A semiconductor device has a stress relief buffer mounted to a temporary substrate in locations designated for bump formation. The stress relief buffer can be a multi-layer composite material such as a first compliant layer, a silicon layer formed over the first compliant layer, and a second compliant layer formed over the silicon layer. A semiconductor die is also mounted to the temporary substrate. The stress relief buffer can be thinner than the semiconductor die. An encapsulant is deposited between the semiconductor die and stress relief buffer. The temporary substrate is removed. An interconnect structure is formed over the semiconductor die, encapsulant, and stress relief buffer. The interconnect structure is electrically connected to the semiconductor die. A stiffener layer can be formed over the stress relief buffer and encapsulant. A circuit layer containing active devices, passive devices, conductive layers, and dielectric layers can be formed within the stress relief buffer. | 05-28-2015 |
20150145127 | SEMICONDUCTOR PACKAGE - A semiconductor package is provided. In one configuration, the semiconductor package includes a substrate. A conductive trace is disposed on the substrate. A conductive pillar bump is disposed on the conductive trace, wherein the conductive bump is coupled to a die. In another configuration, a first conductive trace is disposed on the substrate, and a second conductive trace is disposed on the substrate. In the second configuration, a conductive pillar bump disposed on the second conductive trace, connecting to a conductive bump or a metal pad of the semiconductor die. A first conductive structure is disposed between the second conductive trace and the conductive pillar bump or between the second conductive trace and the substrate, and a die is disposed over the first conductive trace. | 05-28-2015 |
20150145128 | Semiconductor Device and Method of Forming Stepped Interconnect Layer for Stacked Semiconductor Die - A semiconductor device comprises a first semiconductor die. An encapsulant is disposed around the first semiconductor die. A first stepped interconnect structure is disposed over a first surface of the encapsulant. An opening is formed in the first stepped interconnect structure. The opening in the first stepped interconnect structure is over the first semiconductor die. A second semiconductor die is disposed in the opening of the first stepped interconnect structure. A second stepped interconnect structure is disposed over the first stepped interconnect structure. A conductive pillar is formed through the encapsulant. | 05-28-2015 |
20150145129 | MECHANISMS FOR FORMING PACKAGE STRUCTURE - Structures and formation methods of a package structure are provided. The package structure includes a semiconductor die and a substrate bonded to the semiconductor die through a first bonding structure and a second bonding structure therebetween. The first bonding structure and the second bonding structure are next to each other and the second bonding structure is wider than the first bonding structure. The first bonding structure has a first under bump metallurgy (UBM) structure and a first solder bump thereon, and the second bonding structure has a second UBM structure and a second solder bump thereon. The second UBM structure has a maximum width larger than that of the first UBM structure, and the second solder bump has a maximum width larger than that of the first solder bump. | 05-28-2015 |
20150294948 | SOLDER BUMP REFLOW BY INDUCTION HEATING - A method of applying inductive heating to join an integrated circuit chip to an electrical substrate using solder bumps including applying a magnetic field to a magnetic liner in thermal contact with a solder bump on the integrated circuit chip, the magnetic field causes Joule heating in the magnetic liner sufficient to melt the solder bump, the solder bump comprising a lower portion embedded in a first dielectric layer and an upper portion at least partially embedded in a second dielectric layer, the lower | 10-15-2015 |
20150303130 | Semiconductor Package and Method of Manufacturing the Same - Disclosed are a semiconductor package and a method of manufacturing the same. The semiconductor package includes a flexible substrate provided with signal lines, a semiconductor device bonded on the flexible substrate and configured to be connected to the signal lines through at least one of gold bumps or solder bumps, and a heat dissipation layer formed on at least a portion of the flexible substrate and at least a portion of the semiconductor device. The heat dissipation layer is formed by coating a heat dissipation paint composition and curing the heat dissipation paint composition. The heat dissipation paint composition includes an epichlorohydrin bisphenol A resin, a modified epoxy resin, a curing agent, a curing accelerator and a heat dissipation filler. | 10-22-2015 |
20150303138 | SEMICONDUCTOR INTERPOSER AND PACKAGE STRUCTURE HAVING THE SAME - A semiconductor interposer is provided, which includes: a substrate body having a surface defined with an inner area and a peripheral area around the inner area; a plurality of conductive posts embedded in the substrate body and each having one end exposed from the surface of the substrate body; a passivation layer formed on the surface of the substrate body and having a peripheral portion formed in the peripheral area, a plurality of ring-shaped portions formed around peripheries of the exposed ends of the conductive posts in the inner area and a plurality of strip-shaped portions formed between the ring-shaped portions for connecting the ring-shaped portions; and a UBM layer formed on the exposed end of each of the conductive posts and extending on the ring-shaped portion around the periphery of the exposed end of the conductive post, thereby effectively reducing stresses to prevent warping of the semiconductor interposer. | 10-22-2015 |
20150303160 | Connector Structures of Integrated Circuits - A die includes a substrate, a metal pad over the substrate, and a passivation layer covering edge portions of the metal pad. A metal pillar is formed over the metal pad. A portion of the metal pillar overlaps a portion of the metal pad. A center of the metal pillar is misaligned with a center of the metal pad. | 10-22-2015 |
20150303161 | Zero Stand-Off Bonding System and Method - A system and method for a zero stand-off configuration are provided. An embodiment comprises forming a seal layer over a conductive region that is part of a first substrate and breaching the seal with a conductive member of a second substrate in order to bond the first substrate to the second substrate. | 10-22-2015 |
20150303170 | SINGULATED UNIT SUBSTRATE FOR A SEMICONDCUTOR DEVICE - A singulated substrate for a semiconductor device may include a singulated unit substrate comprising circuit patterns on a top surface and a bottom surface of the singulated unit substrate. A semiconductor die may be bonded to the top surface of the singulated unit substrate. An encapsulation layer may encapsulate the semiconductor die and cover the top surface of the singulated unit substrate. The side surfaces of the singulated unit substrate between the top surface and bottom surface of the singulated unit substrate may be coplanar with side surfaces of the encapsulation layer. The semiconductor die may be electrically coupled to the singulated unit substrate utilizing solder bumps. Solder balls may be formed on the circuit patterns on the bottom surface of the singulated unit substrate. An underfill material may be formed between the semiconductor die and the top surface of the singulated unit substrate. | 10-22-2015 |
20150311132 | SCRIBE LINE STRUCTURE AND METHOD OF FORMING SAME - An embodiment device includes a die, a molding compound extending along sidewalls of the die, and a first polymer layer over the die and the molding compound. The first polymer layer has a first lateral dimension. The device further includes a second polymer layer over the first polymer layer. The second polymer layer has a second lateral dimension, where the second lateral dimension is less than the first lateral dimension. | 10-29-2015 |
20150311159 | ELECTROMAGNETIC BANDGAP STRUCTURE FOR THREE DIMENSIONAL ICS - An electromagnetic bandgap (EBG) cell comprises a plurality of first conductive line layers beneath a first integrated circuit (IC) die, wherein wires on at least one of the first conductive line layers are each connected to one of a high voltage source and a low voltage source and are oriented to form a first mesh structure at a bottom of the EBG cell. The EBG cell further comprises a pair of through-substrate-vias (TSVs) above the plurality of first conductive line layers, wherein the pair of TSVs penetrate the first IC die and are connected to a high voltage source and a low voltage source, respectively, and a pair of micro bumps above a dielectric layer above the pair of TSVs, wherein the micro bumps connect the TSVs of the first IC die with a plurality of second conductive line layers formed on a second IC die. | 10-29-2015 |
20150311168 | STRUCTURE AND METHOD OF PROVIDING A RE-DISTRIBUTION LAYER (RDL) AND A THROUGH-SILICON VIA (TSV) - A method of providing a redistribution layer (RDL) and a through-silicon via (TSV) for a semiconductor package is disclosed. The method comprises preparing a wafer for bonding to a semiconductor package. The wafer comprises a low resistance substrate containing a RDL and a TSV for making an input/output (I/O) connection point of the semiconductor package available at another location. The RDL comprises a conduction path through the low resistance substrate that is bounded on two sides by an isolation trench. The TSV is bounded by the isolation trench and the RDL. Preparing the wafer for bonding may comprise preparing the isolation trench that bounds the conduction path for the RDL through the low resistance substrate and bounds a vertical conduction path in a pillar for the TSV in the low resistance substrate, filling the isolation trench with isolation trench material, and preparing a wafer bonding surface. | 10-29-2015 |
20150311172 | Semiconductor Device and Method of Forming Bump-on-Lead Interconnection - A semiconductor device has a semiconductor die with a plurality of composite bumps formed over a surface of the semiconductor die. The composite bumps have a fusible portion and non-fusible portion, such as a conductive pillar and bump formed over the conductive pillar. The composite bumps can also be tapered. Conductive traces are formed over a substrate with interconnect sites having edges parallel to the conductive trace from a plan view for increasing escape routing density. The interconnect site can have a width less than | 10-29-2015 |
20150318249 | SEMICONDUCTOR CHIP HAVING DIFFERENT CONDUCTIVE PAD WIDTHS AND METHOD OF MAKING LAYOUT FOR SAME - A semiconductor chip includes a first conductive pad, a second conductive pad and a third conductive pad. The semiconductor chip also includes a first under bump metallurgy (UBM) structure, a second UBM structure, and a third UBM structure. The first conductive pad is electrically coupled to a circuit over a substrate, the second conductive pad is over a corner region of the substrate and free from being electrically coupled to the circuit over the substrate. The first conductive pad is closer to a geometric center of the semiconductor chip than the second conductive pad. The third conductive pad is over a region of the substrate between the first conductive pad and the second conductive pad. The third conductive pad has a pad width greater than a pad width of the first conductive pad and less than a pad width of the second conductive pad. | 11-05-2015 |
20150318252 | Semiconductor Package and Method of Manufacturing the Same - A semiconductor package includes a semiconductor substrate, a contact pad overlying the semiconductor substrate, an interconnect layer overlying the contact pad, a passivation layer formed between the contact pad and the interconnect layer, a bump overlying the interconnect layer, and a protection layer overlying the interconnect layer and the passivation layer and covering a lower portion of the bump. The protection layer includes a curved surface region. | 11-05-2015 |
20150318253 | BUMP STRUCTURE HAVING A SIDE RECESS AND SEMICONDUCTOR STRUCTURE INCLUDING THE SAME - A bump structure includes a first end; and a second end opposite the first end. The bump structure further includes a side connected between the first end and the second end, wherein the side comprises a recess for a reflowed solder material to fill, and the recess defines a first surface adjacent to the first end and a second surface adjacent to the second end. | 11-05-2015 |
20150318254 | ELECTROPLATED SOLDER WITH EUTECTIC CHEMICAL COMPOSITION - This chip package includes a substrate having a gold (or tin) layer disposed on a surface of the substrate. The gold (or tin) layer may couple to a tin (or gold) layer disposed on a surface of a second substrate. When melted, the gold layer and the tin layer result in an interconnect with a chemical composition having a subsequent melting temperature to reflow the bump that is higher than the initial melting temperature. For example, the chemical composition may correspond to a non-equilibrium gold-tin alloy. | 11-05-2015 |
20150318255 | ULTRATHIN MICROELECTRONIC DIE PACKAGES AND METHODS OF FABRICATING THE SAME - Ultrathin microelectronic die packages and methods of fabricating the same comprising attaching a microelectronic die to a substrate with a plurality of interconnects, and depositing an underfill material between the microelectronic die and the microelectronic substrate, and around the interconnects. An etchant may be introduced to a back surface of the microelectronic die to remove a portion thereof which reduces the thickness of the microelectronic die to form an ultrathin microelectronic die. In another embodiment, the etching of the microelectronic die forms an ultrathin microelectronic die having a curved surface between the ultrathin microelectronic die back surface and a sidewall thereof. | 11-05-2015 |
20150318256 | PACKAGING SUBSTRATE AND SEMICONDUCTOR PACKAGE HAVING THE SAME - A packaging substrate is provided, which includes: a laminated body; first, second and third conductive pads formed on a surface of the laminated body so as for conductive bumps to be respectively mounted thereon, wherein the third conductive pad is positioned outside of an area between projections of the conductive bumps on the first and second conductive pads on the surface of the laminated body; first, second and third conductive vias formed in the laminated body and electrically connected to the first, second and third conductive pads, respectively; and first, second and third internal conductive traces formed in the laminated body and electrically connected to the first, second and third conductive vias, respectively, thereby preventing bridging from occurring between the conductive bumps and the conductive traces and overcoming non-wetting of the conductive bumps caused by a solder mask layer. | 11-05-2015 |
20150318259 | INTEGRATED CIRCUIT PACKAGING SYSTEM WITH NO-REFLOW CONNECTION AND METHOD OF MANUFACTURE THEREOF - An integrated circuit packaging system, and a method of manufacture thereof, includes: an integrated circuit; a substrate having a substrate contact; an internal interconnect between the substrate and the integrated circuit, the internal interconnect is a no-reflow connection directly on the substrate contact and the integrated circuit; and an encapsulation over the internal interconnect. | 11-05-2015 |
20150318268 | MULTI-CHIP PACKAGE AND METHOD OF MANUFACTURING THE SAME - A multi-chip package includes a first semiconductor chip and a second semiconductor chip. The first semiconductor chip has a first active surface. The second semiconductor chip has a second active surface facing the first active surface. The second active surface is electrically connected with the first active surface and the first active surface of the first semiconductor chip and the second active surface of the second semiconductor chip are bonded to each other without an adhesive. | 11-05-2015 |
20150325507 | CONDUCTIVE CONNECTIONS, STRUCTURES WITH SUCH CONNECTIONS, AND METHODS OF MANUFACTURE - A solder connection may be surrounded by a solder locking layer ( | 11-12-2015 |
20150325537 | INTEGRATED CIRCUIT - An integrated circuit (IC) is provided. The IC includes a chip, a passivation layer, a first metal internal connection, a routing wire and a bonding area. The passivation layer is disposed on the chip, wherein the passivation layer has a first opening. The first metal internal connection is disposed under the passivation layer and disposed in the chip. The routing wire is disposed on the passivation layer, wherein a first end of the routing wire electrically connects to a first end of the first metal internal connection through the first opening of the passivation layer. The bonding area is disposed on the passivation layer, wherein the bonding area electrically connects to a second end of the routing wire. | 11-12-2015 |
20150325540 | PLUG VIA FORMATION BY PATTERNED PLATING AND POLISHING - Solder bump connections and methods for fabricating solder bump connections. A passivation layer is formed on a dielectric layer. A via opening extends through the passivation layer from a top surface of the passivation layer to a metal line in the dielectric layer. A mask on the top surface of the passivation layer includes a mask opening that is aligned with the via opening. A conductive layer is selectively formed in the via opening and the mask opening. The conductive layer projects above the top surface of the passivation layer. The method further includes planarizing the passivation layer and the conductive layer to define a plug in the via opening that is coupled with the metal line. | 11-12-2015 |
20150325541 | Semiconductor Device - Disclosed is a semiconductor device suppressed in decrease of reliability. The semiconductor device comprises an electrode pad portion ( | 11-12-2015 |
20150325545 | PACKAGE STRUCTURE, CHIP STRUCTURE AND FABRICATION METHOD THEREOF - A chip structure is provided, which includes: a substrate having a plurality of conductive pads formed on a surface thereof; a first copper layer formed on each of the conductive pads; a nickel layer formed on the first copper layer; a second copper layer formed on the nickel layer; and a tin layer formed on the second copper layer, thereby effectively reducing stresses. | 11-12-2015 |
20150325546 | METHOD OF MAKING A PILLAR STRUCTURE HAVING A NON-METAL SIDEWALL PROTECTION STRUCTURE AND INTEGRATED CIRCUIT INCLUDING THE SAME - An integrated circuit device includes a semiconductor substrate; and a pad region over the semiconductor substrate. The integrated circuit device further includes an under-bump-metallurgy (UBM) layer over the pad region. The integrated circuit device further includes a conductive pillar on the UBM layer, wherein the conductive pillar has a sidewall surface and a top surface. The integrated circuit device further includes a protection structure over the sidewall surface of the conductive pillar, wherein sidewalls of the UBM layer are substantially free of the protection structure, and the protection structure is a non-metal material. | 11-12-2015 |
20150325547 | Metal Bump Joint Structure and Methods of Forming - A structure comprises a first semiconductor chip with a first metal bump and a second semiconductor chip with a second metal bump. The structure further comprises a solder joint structure electrically connecting the first semiconductor chip and the second semiconductor chip, wherein the solder joint structure comprises an intermetallic compound region between the first metal bump and the second metal bump, wherein the intermetallic compound region is with a first height dimension and a surrounding portion formed along exterior walls of the first metal bump and the second metal bump, wherein the surrounding portion is with a second height dimension, and wherein the second height dimension is greater than the first height dimension. | 11-12-2015 |
20150332985 | PROTECTIVE PACKAGING FOR INTEGRATED CIRCUIT DEVICE - A method for packaging an integrated circuit (IC) device in which conventional manufacturing steps of mechanically bonding a die to a corresponding interconnecting substrate, wire bonding the die, and encapsulating the die in a protective shell are replaced by a single manufacturing step that includes thermally treating an appropriate assembly of parts to both form proper electrical connections for the die in the resulting IC package and cause the molding compound(s) to encapsulate the die in a protective enclosure. | 11-19-2015 |
20150332986 | SEMICONDUCTOR DEVICE INCLUDING SEMICONDUCTOR CHIP COVERED WITH SEALING RESIN - A semiconductor device includes a wiring substrate, a sealing resin layer formed on the wiring substrate out of a filler-containing resin and having a one-sided filler content ratio, and at least one semiconductor chip mounted on the wiring substrate such that the semiconductor chip is located offset to be closer to an area where the filler content ratio is relatively low in the sealing resin layer and is sealed in its offset location in the sealing resin layer. | 11-19-2015 |
20150333021 | SEMICONDUCTOR STRUCTRURE WITH COMPOSITE BARRIER LAYER UNDER REDISTRIBUTION LAYER AND MANUFACTURING METHOD THEREOF - A mechanism of a semiconductor structure with composite barrier layer under redistribution layer is provided. A semiconductor structure includes a substrate comprising a top metal layer on the substrate; a passivation layer over the top metal layer having an opening therein exposing the top metal layer; a composite barrier layer over the passivation layer and the opening, the composite barrier layer includes a center layer, a bottom layer, and an upper layer, wherein the bottom layer and the upper layer sandwich the center layer; and a redistribution layer (RDL) over the composite barrier layer and electrically connecting the underlying top metal layer. | 11-19-2015 |
20150333022 | CONTACT PADS FOR INTEGRATED CIRCUIT PACKAGES - Disclosed herein are contact pads for use with integrated circuit (IC) packages. In some embodiments, a contact pad disclosed herein may be disposed on a substrate of an IC package, and may include a metal projection portion and a metal recess portion. Each of the metal projection portion and the metal recess portion may have a solder contact surface. The solder contact surface of the metal recess portion may be spaced away from the solder contact surface of the metal projection portion. Related devices and techniques are also disclosed herein, and other embodiments may be claimed. | 11-19-2015 |
20150333025 | ORGANIC COATING TO INHIBIT SOLDER WETTING ON PILLAR SIDEWALLS - The present invention relates generally to and more particularly, to a method of fabricating a pillar interconnect structure with non-wettable sidewalls and the resulting structure. More specifically, the present invention may include exposing only the sidewalls of a pillar to an organic material that reacts with metal of the pillar to form an organo-metallic layer on sidewalls of the pillar. The organo-metallic layer may prevent solder from wetting on the sidewalls of the pillar during subsequent bonding/reflow processes. | 11-19-2015 |
20150333026 | INTERCONNECT STRUCTURE WITH IMPROVED CONDUCTIVE PROPERTIES AND ASSOCIATED SYSTEMS AND METHODS - Interconnect structures with improved conductive properties are disclosed herein. In one embodiment, an interconnect structure can include a first conductive member coupled to a first semiconductor die and a second conductive member coupled to second semiconductor die. The first conductive member includes a recessed surface defining a depression. The second conductive member extends at least partially into the depression of the first conductive member. A bond material within the depression can at least partially encapsulate the second conductive member and thereby bond the second conductive member to the first conductive member. | 11-19-2015 |
20150333029 | PACKAGE SUBSTRATE AND METHOD FOR FABRICATING THE SAME - A package substrate and a method of fabricating the same are provided. The method includes providing a substrate body having a first surface, a second surface opposing the first surface, a plurality of first electrical connecting pads disposed on the first surface; mounting a metal board on the first electrical connecting pads; and patterning the metal board so as to define a plurality of metal pillars corresponding to the first electrical connecting pads. Therefore, drawbacks of raw edges and unequal heights of the metal pillars can be obviated. | 11-19-2015 |
20150333035 | ARTICLES INCLUDING BONDED METAL STRUCTURES AND METHODS OF PREPARING THE SAME - Articles including bonded metal structures and methods of preparing the same are provided herein. In an embodiment, a method of preparing an article that includes bonded metal structures includes providing a first substrate. A first metal structure and a second metal structure are formed on the first substrate. The first metal structure and the second metal structure each include an exposed contact surface. A bond mask is formed over the contact surface of the first metal structure. A second substrate is bonded to the first substrate through the exposed contact surface of the second metal structure. The bond mask remains disposed over the exposed contact surface of the second metal structure during bonding of the second substrate to the first substrate. A wire is bonded to the exposed contact surface of the first metal structure. | 11-19-2015 |
20150340332 | COPPER PILLAR SIDEWALL PROTECTION - Methods for copper pillar protection may include forming a metal post over a contact on a semiconductor die, where the metal post comprises a sidewall. A metal cap may be formed on the metal post and may be wider than the width of the metal post. A solder bump may be formed on the metal cap, and a conformal passivation layer may be formed on at least the sidewall of the metal post. The metal cap may be rounded shaped or rectangular shaped in cross-section. The metal post and the metal cap may comprise copper. The metal cap may comprise a copper layer and a nickel layer. The seed metal layer may comprise one or more of titanium, tungsten, and copper. The conformal passivation layer may comprise a nonwettable polymer. Horizontal portions of the conformal passivation layer may be removed utilizing an anisotropic etch such as a plasma etch. | 11-26-2015 |
20150340333 | CONTACT COMPONENT AND SEMICONDUCTOR MODULE - A contact component adapted to be soldered onto a metal region provided on an insulating substrate of a semiconductor module includes a cylindrical portion; a hollow hole for fitting an external terminal; and a flange formed at a lower end portion of the cylindrical portion and having a diameter larger than an external diameter of the cylindrical portion. An end face of the flange adapted to be soldered includes a flat bottom surface and a concave portion extending from an inner circumference edge of the cylindrical portion in the flat bottom surface to an outer circumference edge of the flange. The cylindrical portion includes a cut-out portion at an inner side of a lower end thereof. | 11-26-2015 |
20150340334 | METHODS OF FABRICATING SEMICONDUCTOR CHIP SOLDER STRUCTURES - Various semiconductor chip solder bump and underbump metallization (UBM) structures and methods of making the same are disclosed. In one aspect, a method is provided that includes depositing a layer of a first metallic material on a semiconductor chip. The first layer has a first physical quantity. A layer of a second metallic material is deposited on the layer of the first metallic material. The second layer has a second physical quantity. The first and second layers are reflowed to form a solder structure with a desired ratio of the first metallic material to the second metallic material. | 11-26-2015 |
20150340343 | INTEGRATED CIRCUIT PACKAGE ASSEMBLY - An integrated circuit package assembly includes a substrate and a first integrated circuit package over the substrate. The integrated circuit package assembly also includes a second integrated circuit package between the first integrated circuit package and the substrate. The integrated circuit package further includes solder bumps between the first integrated circuit package and the second integrated circuit package. The solder bumps are configured to electrically connect the first integrated circuit package and the second integrated circuit package. The integrated circuit package assembly further includes at least two support structures between and in direct contact with the second integrated circuit package and the substrate. The at least two support structures are configured to facilitate thermal conduction between the second integrated circuit package and the substrate without providing electrical connections. | 11-26-2015 |
20150348862 | SEMICONDUCTOR DEVICE WITH A SEMICONDUCTOR CHIP CONNECTED IN A FLIP CHIP MANNER - A semiconductor device ( | 12-03-2015 |
20150348863 | SEMICONDUCTOR PACKAGE HAVING HEAT DISSIPATING MEMBER - A semiconductor package includes a substrate having an upper surface and a lower surface, a semiconductor chip which is mounted on the upper surface of the substrate, and in an upper surface of which a first recess portion is provided, a molding member formed such that the molding member exposes the upper surface of the semiconductor chip and covers the semiconductor chip on the upper surface of the substrate, and a first heat dissipating member formed in the first recess portion, wherein the first heat dissipating member includes moisture absorption particles and a heat dissipation molding member. | 12-03-2015 |
20150348878 | Circuit module and method of manufacturing the same - Manufacturing method and circuit module, which comprises an insulator layer and, inside the insulator layer, at least one component, which comprises contact areas, the material of which contains a first metal. On the surface of the insulator layer are conductors, which comprise at least a first layer and a second layer, in such a way that at least the second layer contains a second metal. The circuit module comprises contact elements between the contact areas and the conductors for forming electrical contacts. The contact elements, for their part, comprise, on the surface of the material of the contact area, an intermediate layer, which contains a third metal, in such a way that the first, second, and third metals are different metals and the contact surface area (A | 12-03-2015 |
20150348925 | REDUCED TITANIUM UNDERCUT IN ETCH PROCESS - In accordance with one embodiment of the present disclosure, a method of forming a metal feature includes etching a portion of a first metal layer using a first etching chemistry, and etching a portion of a barrier layer using a second etching chemistry to achieve a barrier layer undercut of less than or equal to 2 times the thickness of the barrier layer. | 12-03-2015 |
20150348926 | METHODS FOR SURFACE ATTACHMENT OF FLIPPED ACTIVE COMPONENTS - An active substrate includes a plurality of active components distributed over a surface of a destination substrate, each active component including a component substrate different from the destination substrate, and each active component having a circuit and connection posts on a process side of the component substrate. The connection posts may have a height that is greater than a base width thereof, and may be in electrical contact with the circuit and destination substrate contacts. The connection posts may extend through the surface of the destination substrate contacts into the destination substrate connection pads to electrically connect the connection posts to the destination substrate contacts. | 12-03-2015 |
20150348927 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF - A semiconductor structure includes a substrate including a front side, a conductive bump disposed over the front side, and an opaque molding disposed over the front side and around a periphery portion of an outer surface of the conductive bump, wherein the opaque molding includes a recessed portion disposed above a portion of the front side adjacent to a corner of the substrate and extended through the opaque molding to expose the portion of the front side and an alignment feature disposed within the portion of the front side. | 12-03-2015 |
20150348929 | PACKAGE STRUCTURE AND FABRICATION METHOD THEREOF - A package structure is provided, which includes: a substrate having opposite top and bottom surfaces and a plurality of conductive pads and a plurality of conductive posts formed therein, wherein the conductive pads are exposed from the bottom surface of the substrate, and the conductive posts are electrically connected to the conductive pads and each of the conductive posts has an end surface exposed from the top surface of the substrate; a plurality of first conductive bumps formed on the end surfaces of the conductive posts; a plurality of second conductive bumps formed on the top surface of the substrate, wherein the second conductive bumps are higher than the first conductive bumps; and at least a first electronic element disposed on and electrically connected to the first conductive bumps, thereby increasing the wiring flexibility and facilitating subsequent disposing of electronic elements without changing existing machines. | 12-03-2015 |
20150348930 | FLIP CHIP PACKAGES HAVING CHIP FIXING STRUCTURES, ELECTRONIC SYSTEMS INCLUDING THE SAME, AND MEMORY CARDS INCLUDING THE SAME - A flip chip package includes a chip having a surface, main bumps disposed on a first region of the surface of the chip, dummy bumps disposed on a second region of the surface of the chip, a substrate having a surface, dams disposed on the surface of the substrate, connection pads disposed on the surface of the substrate and electrically connected to respective ones of the main bumps, and adhesion patterns attaching the dummy bumps to respective ones of the dams. | 12-03-2015 |
20150348932 | SEMICONDUCTOR PACKAGE - The invention provides a semiconductor package. The semiconductor package includes a substrate. A first conductive trace is disposed on the substrate. A first conductive trace disposed on the substrate. A semiconductor die is disposed over the first conductive trace. A solder resist layer is formed such a portion of the solder resist layer and a portion of the first conductive trace collectively have a T-shaped cross section. | 12-03-2015 |
20150348944 | SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME - Wire connection failure in semiconductor device is prevented. | 12-03-2015 |
20150357274 | Semiconductor Die and Method of Forming FO-WLCSP Vertical Interconnect Using TSV and TMV - A semiconductor device has a TSV wafer and semiconductor die mounted over the TSV wafer. A channel is formed through the TSV wafer. An encapsulant is deposited over the semiconductor die and TSV wafer. Conductive TMV are formed through the encapsulant over the conductive TSV and contact pads of the semiconductor die. The conductive TMV can be formed through the channel. A conductive layer is formed over the encapsulant and electrically connected to the conductive TMV. The conductive TMV are formed during the same manufacturing process. An insulating layer is formed over the encapsulant and conductive layer. A plurality of semiconductor die of the same size or different sizes can be stacked over the TSV wafer. The plurality of semiconductor die can be stacked over opposite sides of the TSV wafer. An internal stacking module can be stacked over the semiconductor die and electrically connected through the conductive TMV. | 12-10-2015 |
20150357300 | SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR DEVICE, IMAGING ELEMENT, AND IMAGING DEVICE - A semiconductor substrate includes a semiconductor substrate body in which a wiring is formed and a bonding electrode provided to protrude from a first surface of the semiconductor substrate body. The bonding electrode comprises a composite including a first metal portion which is provided to protrude from the first surface of the semiconductor substrate body and of which a base end portion in a protrusion direction is electrically connected to the wiring, and a second metal portion which is formed of a second metal which has lower hardness than first metal of which the first metal portion is formed and which is provided to be bonded to the first metal portion in a range equal to or less than a protrusion height of the first metal portion, the first metal portion is formed on the second metal portion by sputtering or evaporation the first metal. | 12-10-2015 |
20150357301 | Bump Structure and Method of Forming Same - An embodiment bump on trace (BOT) structure includes a contact element supported by an integrated circuit, an under bump metallurgy (UBM) feature electrically coupled to the contact element, a metal bump on the under bump metallurgy feature, and a substrate trace on a substrate, the substrate trace coupled to the metal bump through a solder joint and intermetallic compounds, a ratio of a first cross sectional area of the intermetallic compounds to a second cross sectional area of the solder joint greater than forty percent. | 12-10-2015 |
20150357317 | Methods of Packaging Semiconductor Devices and Packaged Semiconductor Devices - Methods of packaging semiconductor devices and packaged semiconductor devices are disclosed. In some embodiments, a method of packaging a semiconductor device includes providing a semiconductor device comprising an integrated circuit die, connectors disposed over the integrated circuit die, and an insulating material disposed over the connectors and the integrated circuit die. The insulating material is removed from over corner regions of the integrated circuit die, and a molding material is disposed over the insulating material and the integrated circuit die. A top portion of the molding material and the insulating material is removed to expose the connectors. | 12-10-2015 |
20150364425 | 3D INTERCONNECT STRUCTURE COMPRISING THROUGH-SILICON VIAS COMBINED WITH FINE PITCH BACKSIDE METAL REDISTRIBUTION LINES FABRICATED USING A DUAL DAMASCENE TYPE APPROACH - A 3D interconnect structure and method of manufacture are described in which a through-silicon vias (TSVs) and metal redistribution layers (RDLs) are formed using a dual damascene type process flow. A silicon nitride or silicon carbide passivation layer may be provided between the thinned device wafer back side and the RDLs to provide a hermetic barrier and etch stop layer during the process flow. | 12-17-2015 |
20150364437 | SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME - A semiconductor device manufacturing technique which allows reduction of semiconductor chip size. First, a pad and other wires are formed over an insulating film. A surface protective film is formed over the insulating film including the pad and wires, and an opening is made in the surface protective film. The opening lies over the pad and exposes a surface of the pad. A bump electrode is formed over the surface protective film including the opening. Here, the pad is smaller than the bump electrode. Consequently, the wires are arranged just beneath the bump electrode in the same layer as the pad | 12-17-2015 |
20150364449 | Bonding Package Components Through Plating - A method includes aligning a first electrical connector of a first package component to a second electrical connector of a second package component. With the first electrical connector aligned to the second electrical connector, a metal layer is plated on the first and the second electrical connectors. The metal layer bonds the first electrical connector to the second electrical connector. | 12-17-2015 |
20150371962 | TERMINAL STRUCTURE, SEMICONDUCTOR DEVICE, AND TERMINAL FORMING METHOD - A terminal structure includes: a pillar containing a first metal material; and a cover layer covering an upper surface and a side surface of the pillar, the cover layer containing a second metal material into which a solder material diffuses more slowly than into the first metal material. | 12-24-2015 |
20150371963 | SEMICONDUCTOR DEVICE HAVING NON-CIRCULAR CONNECTORS - A semiconductor device has semiconductor chip assembled on a substrate. The substrate has a first surface including conductive traces, which have a first length and a first width, the first width being uniform along the first length, and further a pitch to respective adjacent traces. The semiconductor chip has a second surface including contact pads; the second surface faces the first surface spaced apart by a gap. A conductive pillar contacts each contact pad; the pillar includes a core and a solder body, which connects the core to the respective trace across the gap. The pillar core has a non-circular cross section of a second width and a second length greater than the second width and greater than the first width. | 12-24-2015 |
20150371964 | Bonded Structures for Package and Substrate - The embodiments described provide elongated bonded structures near edges of packaged structures free of solder wetting on sides of copper posts substantially facing the center of the packaged structures. Solder wetting occurs on other sides of copper posts of these bonded structures. The elongated bonded structures are arranged in different arrangements and reduce the chance of shorting between neighboring bonded structures. In addition, the elongated bonded structures improve the reliability performance. | 12-24-2015 |
20150371965 | HIGH DENSITY FILM FOR IC PACKAGE - The present invention discloses a high density film for IC package. The process comprises: a redistribution layer is fabricated following IC design rule, with a plurality of bottom pad formed on bottom, and with a plurality of first top pad formed on top; wherein the density of the plurality of bottom pad is higher than the density of the plurality of first top pad; and a top redistribution layer is fabricated following PCB design rule, using the plurality of the first top pad as a starting point; with a plurality of second top pad formed on top; wherein a density of the plurality of first top pad is higher than a density of the plurality of second top pad. | 12-24-2015 |
20150371970 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - In the present invention, a semiconductor wafer is prepared, said semiconductor wafer having a plurality of semiconductor chip regions, each of which is to be a semiconductor chip having a desired circuit formed on one surface, and cutting regions that are provided among the semiconductor chip regions. A modified layer is formed along the outer circumference of each of the semiconductor chip regions in each of the semiconductor chip regions, said modified layer reaching, from at least the inner portion of the semiconductor wafer, the other surface where no circuit is to be formed. Then, the semiconductor wafer is divided into a plurality of semiconductor chips by cutting the semiconductor wafer at the cutting regions. | 12-24-2015 |
20150380357 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device includes a substrate including a pad and an alignment feature disposed over the substrate, a passivation disposed over the substrate and a periphery of the pad, a post passivation interconnect (PPI) including a via portion disposed on the pad and an elongated portion receiving a conductive bump to electrically connect the pad with the conductive bump, a polymer covering the PPI, and a molding material disposed over the polymer and around the conductive bump, wherein the molding material comprises a first portion orthogonally aligned with the alignment feature and adjacent to an edge of the semiconductor device and a second portion distal to the edge of the semiconductor device, a thickness of the first portion is substantially smaller than a thickness of the second portion, thereby the alignment feature is visible through the molding material under a predetermined radiation. | 12-31-2015 |
20150380372 | SEMICONDUCTOR DEVICE INCLUDING A PROTECTIVE FILM - A semiconductor device includes a semiconductor chip having a wire and a passivation film formed on the outermost surface with an opening partially exposing the wire. A resin layer is stacked on the semiconductor chip and provided with a through-hole in a position opposed to a portion of the wire facing the opening. A pad is formed on a peripheral portion of the through-hole in the resin layer and in the through-hole so that an external connection terminal is arranged on the surface thereof. The peripheral portion of the resin layer is formed more thickly than the remaining portion of the resin layer other than the peripheral portion. | 12-31-2015 |
20150380388 | Fan-Out Package Structure and Methods for Forming the Same - A package includes a device die including a first plurality of metal pillars at a top surface of the device die. The package further includes a die stack including a plurality of dies bonded together, and a second plurality of metal pillars at a top surface of the die stack. One of the device die and the plurality of dies includes a semiconductor substrate and a through-via penetrating through the semiconductor substrate, A polymer region includes portions encircling the device die and the die stack, wherein a bottom surface of the polymer region is substantially level with a bottom surface of the device die and a bottom surface of the die stack. A top surface of the polymer region is level with top ends of the first and the second plurality of metal pillars. Redistribution lines are formed over the first and the second plurality of metal pillars. | 12-31-2015 |
20160005702 | Fan-Out Package and Methods of Forming Thereof - An embodiment is a package including a molding compound laterally encapsulating a chip with a contact pad. A first dielectric layer is formed overlying the molding compound and the chip and has a first opening exposing the contact pad. A first metallization layer is formed overlying the first dielectric layer, in which the first metallization layer fills the first opening. A second dielectric layer is formed overlying the first metallization layer and the first dielectric layer and has a second opening over the first opening. A second metallization layer is formed overlying the second dielectric layer and formed in the second opening. | 01-07-2016 |
20160005705 | Structure and Method of Batch-Packaging Low Pin Count Embedded Semiconductor Chips - A method for fabricating packaged semiconductor devices in panel format. A flat panel sheet dimensioned for a set of contiguous chips includes a stiff substrate of an insulating plate, and a tape having a surface layer of a first adhesive releasable at elevated temperatures, a core base film, and a bottom layer with a second adhesive attached to the substrate. Attaching a set onto the first adhesive layer, the chip terminals having terminals with metal bumps facing away from the first adhesive layer. Laminating low CTE insulating material to fill gaps between the bumps and to form an insulating frame surrounding the set. Grinding lamination material to expose the bumps. Plasma-cleaning assembly, sputtering uniform metal layer across assembly, optionally plating metal layer, and patterning metal layer to form rerouting traces and extended contact pads. | 01-07-2016 |
20160005706 | SEMICONDUCTOR DEVICES HAVING THROUGH ELECTRODES, METHODS OF MANUFACTURING THE SAME, AND SEMICONDUCTOR PACKAGES INCLUDING THE SAME - A semiconductor device includes a semiconductor layer having a first surface and a second surface, a through electrode penetrating the semiconductor layer and having a protruding portion that protrudes over the second surface of the semiconductor layer, a front-side bump disposed on the first surface of the semiconductor layer and electrically coupled to the through electrode, a passivation pattern including a first insulation pattern that surrounds a sidewall of the protruding portion of the through electrode and extends onto the second surface of the semiconductor layer and a second insulation pattern that covers the first insulation pattern and has an etch selectivity with respect to the first insulation pattern, and a back-side bump covering an end surface of the protruding portion of the through electrode and extending onto the passivation pattern. | 01-07-2016 |
20160005707 | SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME - A semiconductor package includes a package board that includes an circuit pattern and a plurality of contact pads electrically connected to the circuit pattern; a semiconductor chip having a plurality of chip pads; and a bump structure including a plurality of connecting bumps electrically connected with the semiconductor chip and the circuit pattern and a plurality of gap adjusting bumps bonded to the semiconductor chip and shaped into a slender bar between the semiconductor chip and the package board, the gap adjusting bumps spacing the semiconductor chip from the package board such that a gap space, S, is maintained between the package board and the semiconductor chip. A method of fabrication and a memory unit are disclosed. | 01-07-2016 |
20160005726 | SYSTEM-IN-PACKAGE - A system-in-package includes a package carrier; a first semiconductor die having a die face and a die edge, the first semiconductor die being assembled face-down to a chip side of the package carrier, wherein a plurality of contact pads are situated on the die face; a second semiconductor die mounted on the package carrier and adjacent to the first semiconductor die; a rewiring laminate structure between the first semiconductor die and the package carrier, the rewiring laminate structure comprising a re-routed metal layer, wherein at least a portion of the re-routed metal layer projects beyond the die edge; and a plurality of copper pillar bumps arranged on the rewiring laminate structure for electrically connecting the first semiconductor die with the package carrier. | 01-07-2016 |
20160005727 | SEMICONDUCTOR DEVICE - This invention can reduce heat that is generated in a first semiconductor chip and transfers to a second semiconductor chip through through-silicon vias. The first semiconductor chip has the first through-silicon vias. Each of the first through-silicon vias is arranged on any of grid points arranged in m rows and n columns (m>n). The first semiconductor chip also has a first circuit formation area. A first circuit is formed in the first circuit formation area. The first circuit performs signal processing while communicating with the second semiconductor chip. In plan view, the first circuit formation area does not overlap with a through-silicon via area that is defined by coupling the outermost grid points arranged in m rows and n columns. In plan view, some of connection terminals are located between the first circuit formation area and the through-silicon via area. | 01-07-2016 |
20160009544 | MICROFABRICATED ULTRASONIC TRANSDUCERS AND RELATED APPARATUS AND METHODS | 01-14-2016 |
20160013136 | STRUCTURE AND METHOD FOR PROTECTING STRESS-SENSITIVE INTEGRATED CIRCUIT | 01-14-2016 |
20160013153 | HIGH DENSITY CHIP-TO-CHIP CONNECTION | 01-14-2016 |
20160013161 | SEMICONDUCTOR PACKAGE | 01-14-2016 |
20160020179 | MOISTURE BARRIER FOR SEMICONDUCTOR STRUCTURES WITH STRESS RELIEF - A semiconductor structure is disclosed. The semiconductor structure includes an electrically conductive layer disposed over a substrate. A moisture barrier layer is disposed over the substrate and between the substrate and the electrically conductive layer. A dielectric layer is disposed over the moisture barrier layer. The dielectric layer has an elastic modulus that is lower than an elastic modulus of the moisture barrier layer. | 01-21-2016 |
20160020181 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device includes a substrate defined with a seal ring region and a circuit region, the substrate includes a seal ring structure and an integrated circuit structure, the seal ring structure is disposed in the seal ring region and includes a plurality of stacked conductive layers interconnected by a plurality of via layers, the integrated circuit structure is disposed in the circuit region and includes an active or a passive device; a metal pad disposed over the seal ring region and contacted with the seal ring structure; a passivation layer disposed over the substrate and covering the metal pad; a polymeric layer disposed over the passivation layer and the circuit region; and a molding disposed over the passivation layer and the polymeric layer, wherein the seal ring structure is covered by the molding. | 01-21-2016 |
20160020184 | SEMICONDUCTOR DEVICES HAVING THROUGH ELECTRODES, METHODS OF FABRICATING THE SAME, ELECTRONIC SYSTEMS INCLUDING THE SAME, AND MEMORY CARDS INCLUDING SAME - A semiconductor device includes a chip body having an uneven surface including at least two regions at different levels from one another, a through electrode penetrating the chip body and having an end which is exposed by the uneven surface of the chip body, a passivation layer disposed on the uneven surface of the chip body, and a bump disposed on the passivation layer and the exposed end of the through electrode and overlapping with the uneven surface of the chip body. | 01-21-2016 |
20160020186 | COPPER-CONTAINING LAYER ON UNDER-BUMP METALLIZATION LAYER - A semiconductor device includes an under-bump metallization (UBM) layer over a substrate. The semiconductor device also includes a copper-containing layer having a base portion over the UBM layer. The semiconductor device further includes a solder bump over the UBM layer and over the copper-containing layer. The base portion is embedded in the solder bump. The copper-containing layer has a cylindrical shape and includes at least two segments separated by at least two openings. A first total area (A) of the at least two openings is greater than about 3% of a second total area (B) of the at least two segments. The first total area (A) is less than about 70% of the second total area (B) of the at least two segments. | 01-21-2016 |
20160020187 | METHOD FOR PRODUCING ELECTRONIC COMPONENT, BUMP-FORMED PLATE-LIKE MEMBER, ELECTRONIC COMPONENT, AND METHOD FOR PRODUCING BUMP-FORMED PLATE-LIKE MEMBER - The present invention provides a method for producing an electronic component, capable of simply and efficiently producing an electronic component having both of a via electrode(s) (bump(s)) and a plate-like member. The method is a method for producing an electronic component. The electronic component includes: a substrate | 01-21-2016 |
20160027636 | LARGE-AREA, LATERALLY-GROWN EPITAXIAL SEMICONDUCTOR LAYERS - Structures and methods for confined lateral-guided growth of a large-area semiconductor layer on an insulating layer are described. The semiconductor layer may be formed by heteroepitaxial growth from a selective growth area in a vertically-confined, lateral-growth guiding structure. Lateral-growth guiding structures may be formed in arrays over a region of a substrate, so as to cover a majority of the substrate region with laterally-grown epitaxial semiconductor tiles. Quality regions of low-defect, stress-free GaN may be grown on silicon. | 01-28-2016 |
20160027723 | SEMICONDUCTOR DEVICE - This invention provides a multi-pin semiconductor device as a low-cost flip-chip BGA. In the flip-chip BGA, a plurality of signal bonding electrodes in a peripheral area of the upper surface of a multilayer wiring substrate are separated into inner and outer ones and a plurality of signal through holes coupled to a plurality of signal wirings drawn inside are located between a plurality of rows of signal bonding electrodes and a central region where a plurality of bonding electrodes for core power supply are located so that the chip pad pitch can be decreased and the cost of the BGA can be reduced without an increase in the number of layers in the multilayer wiring substrate. | 01-28-2016 |
20160027747 | SEMICONDUCTOR DEVICE WITH FINE PITCH REDISTRIBUTION LAYERS - A semiconductor device with fine pitch redistribution layers is disclosed and may include a semiconductor die with a bond pad and a first passivation layer comprising an opening above the bond pad. A redistribution layer (RDL) may be formed on the passivation layer with one end of the RDL electrically coupled to the bond pad and a second end comprising a connection region. A second passivation layer may be formed on the RDL with an opening for the connection region of the RDL. An under bump metal (UBM) may be formed on the connection region of the RDL and a portion of the second passivation layer. A bump contact may be formed on the UBM, wherein a width of the RDL is less than a width of the opening in the second passivation layer and may be constant from the bond pad through at least a portion of the opening. | 01-28-2016 |
20160027750 | Methods and Apparatus for Transmission Lines in Packages - Methods and apparatus for forming a semiconductor device package with a transmission line using a micro-bump layer are disclosed. The micro-bump layer may comprise micro-bumps and micro-bump lines, formed between a top device and a bottom device. A signal transmission line may be formed using a micro-bump line above a bottom device. A ground plane may be formed using a redistribution layer (RDL) within the bottom device, or using additional micro-bump lines. The RDL formed ground plane may comprise open slots. There may be RDLs at the bottom device and the top device above and below the micro-bump lines to form parts of the ground planes. | 01-28-2016 |
20160027751 | SEMICONDUCTOR DEVICE HAVING SOLDER JOINT AND METHOD OF FORMING THE SAME - Provided is a semiconductor device having a high-reliability solder joint. The semiconductor device includes a high-temperature solder formed on a conductive pad. A low-temperature solder having a lower melting point than the high-temperature solder is formed on the high-temperature solder. A barrier layer is formed between the high-temperature solder and the low-temperature solder. An Sn content of the high-temperature solder is higher than that of the low-temperature solder. | 01-28-2016 |
20160027753 | SEMICONDUCTOR DEVICE HAVING SINGLE LAYER SUBSTRATE AND METHOD - In one embodiment, a semiconductor device includes a single layer substrate having an insulation layer and conductive patterns on a first surface of the insulation layer. A semiconductor die is attached on a first surface of the single layer substrate and electrically connected to the conductive patterns. Conductive bumps are also on the first surface of the single layer substrate and electrically connected to the semiconductor die through the conductive patterns. An encapsulant overlaps at least portions of the first surface of the single layer substrate. The conductive bumps are at least partially exposed in the encapsulant. | 01-28-2016 |
20160027754 | SEMICONDUCTOR DEVICE - To provide a semiconductor device with a wafer level package structure that allows for probing while reducing the area occupied by the pad electrodes. | 01-28-2016 |
20160027755 | SEMICONDUCTOR CHIP AND SEMICONDUCTOR DEVICE PROVIDED WITH SEMICONDUCTOR CHIP - One semiconductor chip includes a substrate having insulation properties, a plurality of bump electrodes provided on one surface of the substrate, a plurality of recesses provided in the other surface of the substrate, and a solder layer disposed within the recesses. The recesses are formed such that the area of the opening decreases from the other surface side toward the one surface side of the substrate. | 01-28-2016 |
20160027756 | SEMICONDUCTOR DEVICE - A semiconductor device is provided. The semiconductor device can be manufactured with a reduced cost. The semiconductor device ( | 01-28-2016 |
20160027758 | SEMICONDUCTOR DEVICE - [Problem] To provide a semiconductor device with a wafer level package structure that allows for probing while reducing the area occupied by the pad electrodes. [Solution] In the present invention, the following are provided: a semiconductor chip (100) that has first and second pad electrodes (120 | 01-28-2016 |
20160035636 | Manufacturing Method of Semiconductor Device - Provided is a semiconductor device having a pad on a semiconductor chip, a first passivation film formed over the semiconductor chip and having an opening portion on the pad of a probe region and a coupling region, a second passivation film formed over the pad and the first passivation film and having an opening portion on the pad of the coupling region, and a rewiring layer formed over the coupling region and the second passivation film and electrically coupled to the pad. The pad of the probe region placed on the periphery side of the semiconductor chip relative to the coupling region has a probe mark and the rewiring layer extends from the coupling region to the center side of the semiconductor chip. The present invention provides a technology capable of achieving size reduction, particularly pitch narrowing, of a semiconductor device. | 02-04-2016 |
20160035684 | Bump Pad Structure - An embodiment is a bump bond pad structure that comprises a substrate comprising a top layer, a reinforcement pad disposed on the top layer, an intermediate layer above the top layer, an intermediate connection pad disposed on the intermediate layer, an outer layer above the intermediate layer, and an under bump metal (UBM) connected to the intermediate connection pad through an opening in the outer layer. Further embodiments may comprise a via mechanically coupling the intermediate connection pad to the reinforcement pad. The via may comprise a feature selected from the group consisting of a solid via, a substantially ring-shaped via, or a five by five array of vias. Yet, a further embodiment may comprise a secondary reinforcement pad, and a second via mechanically coupling the reinforcement pad to the secondary reinforcement pad. | 02-04-2016 |
20160035686 | CHIP ATTACHMENT SYSTEM - Forming the chip attachment system includes obtaining a chip having a bump core on a die. The method also includes obtaining an intermediate structure having a transfer pad on a substrate. The method further includes transferring the transfer pad from the substrate to the bump core such that the transfer pad becomes a solder layer on the bump core. | 02-04-2016 |
20160035687 | BUMP STRUCTURAL DESIGNS TO MINIMIZE PACKAGE DEFECTS - A method of forming a chip package includes providing a chip with a plurality of first bumps, wherein the plurality of first bumps has a first height. The method further includes providing a substrate with a plurality of second bumps, wherein the plurality of second bumps has a second height. The method further includes bonding the plurality of first bumps to the plurality of second bumps to form a first bump structure of the chip package, wherein the first bump structure has a standoff, wherein a ratio of a sum of the first height and the second height to the standoff is equal to or greater than about 0.6 and less than 1. | 02-04-2016 |
20160035688 | SEMICONDUCTOR COMPONENT, SEMICONDUCTOR-MOUNTED PRODUCT INCLUDING THE COMPONENT, AND METHOD OF PRODUCING THE PRODUCT - A semiconductor component includes a semiconductor package having a mountable face, a bump, and a coating part. The bump is made of first solder and is formed on the mountable face. The coating part formed of a first composition containing solder powder made of second solder, a flux component, and a first thermosetting resin binder coats the top end of the bump. | 02-04-2016 |
20160035707 | STACKED STRUCTURE OF SEMICONDUCTOR CHIPS HAVING VIA HOLES AND METAL BUMPS - A stacked structure comprises a semiconductor chip which includes a substrate having at least one substrate via hole penetrating through the substrate; at least one backside metal layer formed on a backside of the substrate covering an inner surface of the substrate via hole and at least part of the backside of the substrate; at least one front-side metal layer formed on the front-side of the substrate and electrically connected to the at least one backside metal layer on a top of at least one of the at least one substrate via hole; at least one electronic device formed on the front-side of the substrate and electrically connected to the at least one front-side metal layer; and at least one metal bump formed on at least one of the backside metal layer and the front-side metal layer. | 02-04-2016 |
20160043046 | ETCHING OF UNDER BUMP METALLIZATION LAYER AND RESULTING DEVICE - Methods for wet etching a UBM layer and the resulting devices are disclosed. Embodiments may include patterning metal bumps on a wafer that has at least two metal layers thereon; exposing the wafer to a first acid solution to remove a portion of a first of the two metal layers exposed by the patterning of the metal bumps; and exposing the wafer to a second acid solution to remove a portion a second of the two metal layers exposed by the patterning of the metal bumps and the exposure of the wafer to the first acid solution, wherein an undercut below the metal bumps, formed by removal of the portions of the first and second metal layers, is less than 1.5 microns. | 02-11-2016 |
20160043051 | SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD OF THE SAME - The present disclosure provides a semiconductor package, including a semiconductor die and a substrate having a first surface electrically coupled to the semiconductor die and a second surface opposing to the first surface. The first surface includes a core region having a plurality of landing pads and a periphery region surrounding the core region and having a plurality of landing traces. A pitch of the landing pads is from about 55 μm to about 280 μm. The semiconductor die includes a third surface facing the first surface of the substrate and a fourth surface opposing to the third surface. The third surface includes a plurality of elongated bump positioned correspondingly to the landing pads and the landing traces of the substrate, and the elongated bump includes a long axis and a short axis perpendicular to the long axis on a cross section thereof. | 02-11-2016 |
20160043057 | SEMICONDUCTOR PACKAGES INCLUDING GAP IN INTERCONNECTION TERMINALS AND METHODS OF MANUFACTURING THE SAME - A semiconductor package includes a lower package comprising a lower semiconductor chip mounted on a lower package substrate, an upper package comprising an upper package substrate stacked on the lower package and an upper semiconductor chip mounted on the upper package substrate, interconnection terminals electrically connecting the lower package substrate with the upper package substrate, and a lower molding film molding the lower semiconductor chip between the lower package substrate and the upper package substrate. The lower package substrate comprises a chip region on which the lower semiconductor chip is mounted, an interconnection region enclosing a portion of the chip region, and a mold injection region defined by the chip region and the interconnection region. The interconnection terminals are disposed on the lower package substrate of the interconnection region but not disposed on the lower package substrate of the mold injection region. | 02-11-2016 |
20160049379 | PRINTED CIRCUIT BOARD AND SEMICONDUCTOR PACKAGE USING THE SAME - Embodiments of the inventive aspect include a printed circuit board and a semiconductor package using the same. The semiconductor package includes a substrate having one or more connection pads, semiconductor chips mounted on the substrate, an underfill layer filling a region between the semiconductor chips and the substrate, and solder bumps electrically connecting the connection pads and the semiconductor chips in the underfill layer. The substrate includes void preventing patterns protruding on a top surface of the substrate under the underfill layer. | 02-18-2016 |
20160049384 | BUFFER LAYER(S) ON A STACKED STRUCTURE HAVING A VIA - A structure includes first and second substrates, first and second stress buffer layers, and a post-passivation interconnect (PPI) structure. The first and second substrates include first and second semiconductor substrates and first and second interconnect structures on the first and second semiconductor substrates, respectively. The second interconnect structure is on a first side of the second semiconductor substrate. The first substrate is bonded to the second substrate at a bonding interface. A via extends at least through the second semiconductor substrate into the second interconnect structure. The first stress buffer layer is on a second side of the second semiconductor substrate opposite from the first side of the second semiconductor substrate. The PPI structure is on the first stress buffer layer and is electrically coupled to the via. The second stress buffer layer is on the PPI structure and the first stress buffer layer. | 02-18-2016 |
20160056101 | CHIP-STACKED SEMICONDUCTOR PACKAGE - A chip-stacked semiconductor package including a first chip having a plurality of first real bump pads and a plurality of first dummy bump pads, a second chip on the first chip, the second chip including a plurality of real bumps and a plurality of bridge dummy bumps, the plurality of real bumps electrically connected to the plurality of first real bump pads, the plurality of bridge dummy bumps connected to the plurality of first dummy bump pads, and a sealing member sealing the first chip and the second chip may be provided. | 02-25-2016 |
20160056105 | SEMICONDUCTOR PACKAGE - A semiconductor package includes a substrate, a first passivation layer disposed on the substrate, and an under bump metallurgy layer disposed on the first passivation layer. An additional under bump metallurgy layer is disposed on the first passivation layer, isolated from the under bump metallurgy layer; and a conductive pillar disposed on the additional under bump metallurgy layer. | 02-25-2016 |
20160056119 | FLIP CHIP PACKAGE AND MANUFACTURING METHOD THEREOF - A flip chip package and a manufacturing method thereof are disclosed. The flip chip package in accordance with an embodiment of the present invention includes: a substrate; a plurality of pads formed on the substrate; a solder resist covering the substrate in such a way that the pads are exposed; a chip mounted on the substrate in such a way that the chip is electrically connected with the pads; a plurality of bumps formed, respectively, on the pads in such a way that the bumps are interposed between the pads and the chip; an under-fill flowing between the substrate and the chip and being filled in between the substrate and the chip; and an opening placed in between the plurality of bumps in such a way that a flowing space of the under-fill is provided in between the plurality of bumps. | 02-25-2016 |
20160056126 | INTERCONNECT STRUCTURES FOR WAFER LEVEL PACKAGE AND METHODS OF FORMING SAME - A device package includes a plurality of dies, a molding compound extending along sidewalls of the plurality of dies, and a polymer layer over and contacting the molding compound. The molding compound comprises a non-planar top surface, and a total thickness variation (TTV) of a top surface of the polymer layer is less than a TTV of the non-planar top surface of the molding compound. The device package further includes a conductive feature on the polymer layer, wherein the conductive feature is electrically connected at least one of the plurality of dies. | 02-25-2016 |
20160062172 | CHIP ON FILM PACKAGE AND DISPLAY APPARATUS HAVING THE SAME - A chip on film package includes a base substrate, an input line, an integrated circuit (IC) chip and an output line. The input line is disposed on the base substrate, The IC Chip is electrically connected to the input line. The output line includes a main output and a sub output line, The main output line is electrically connected to the IC chip and extends in a first direction from the IC chip. The sub output line is electrically connected to the IC chip. The sub output line includes at least six bending parts, and is extended in the first direction. | 03-03-2016 |
20160064252 | ELECTRONIC MODULE HAVING AN OXIDE SURFACE FINISH AS A SOLDER MASK, AND METHOD OF MANUFACTURING ELECTRONIC MODULE USING ORGANIC SOLDERABILITY PRESERVATIVE AND OXIDE SURFACE FINISH PROCESSES - An electronic module includes a substrate, conductive pads at top and bottom surfaces of the substrate, at least one electronic component disposed on the top surface of the substrate and soldered to the pads at the top surface of the substrate, a molding compound covering the at least one electronic component, and a solder resist comprising an organo-metallic compound at regions between respective ones of the pads at the bottom surface of the substrate. The module is manufactured using both an OSP surface finishing process to coat the pads at the top surface of the substrate with OSP so as to protect the pads from oxidation while the electronic component is being connected to the substrate, and an oxide surface finish process to form the solder resist. | 03-03-2016 |
20160064282 | METHOD FOR INSULATING SINGULATED ELECTRONIC DIE AND STRUCTURE - In one embodiment, a method of forming an electronic device includes providing a wafer having plurality of die separated by spaces. The method includes plasma singulating the wafer through the spaces to form singulation lines that expose side surfaces of the plurality of die. The method includes forming an insulating layer on the exposed side surfaces. In one embodiment, the steps of singulating and forming the insulating layer are carried out with the wafer mounted to a carrier substrate that supports the wafer and singulated die during both steps. | 03-03-2016 |
20160064348 | Packaging Devices, Packaged Semiconductor Devices, and Packaging Methods - Packaging devices, packaged semiconductor devices, and packaging methods are disclosed. In some embodiments, a packaging device includes a substrate having an integrated circuit die mounting region disposed thereon. Microstructures are disposed proximate a side of the integrated circuit die mounting region of the substrate. | 03-03-2016 |
20160064358 | SEMICONDUCTOR DEVICE INCLUDING SEMICONDUCTOR CHIPS STACKED OVER SUBSTRATE - According to the present invention, a semiconductor device includes a substrate including a first surface and a second surface opposite to the first surface, a first layer formed over the first surface, a second layer thicker than the first layer formed over the first portion of the first layer, the first and second layers being formed of a same material, a first semiconductor chip mounted over a second portion of the first layer; and a second semiconductor chip commonly mounted over the first semiconductor chip and the second layer. | 03-03-2016 |
20160064359 | STACK PACKAGES AND METHODS OF FABRICATING THE SAME - Stack packages are provided. The stack package includes a first chip configured to include a first chip body having a top surface and a bottom surface, first through electrodes penetrating the first chip body, and an insulation layer disposed on the bottom surface of the first chip body, and first bumps disposed on the top surface of the first chip body, and a second chip configured to include a second chip body having a top surface and a bottom surface, and second bumps disposed on the top surface of the second chip body. The first and second chips are vertically stacked such that the top surface of the second chip body is directly attached to the first insulation layer and the second bumps of the second chip penetrate the first insulation layer of the first chip to pierce the first through electrodes of the first chip. | 03-03-2016 |
20160071804 | SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME - To provide a technique capable of positioning of a semiconductor chip and a mounting substrate with high precision by improving visibility of an alignment mark. In a semiconductor chip constituting an LCD driver, a mark is formed in an alignment mark formation region over a semiconductor substrate. The mark is formed in the same layer as that of an uppermost layer wiring (third layer wiring) in an integrated circuit formation region. Then, in the lower layer of the mark and a background region surrounding the mark, patterns are formed. At this time, the pattern P | 03-10-2016 |
20160071813 | Semiconductor Device and Method of Self-Confinement of Conductive Bump Material During Reflow Without Solder Mask - A semiconductor device has a semiconductor die with a die bump pad and substrate with a trace line and integrated bump pad. Conductive bump material is deposited on the substrate bump pad or die bump pad. The semiconductor die is mounted over the substrate so that the bump material is disposed between the die bump pad and substrate bump pad. The bump material is reflowed without a solder mask around the die bump pad or substrate bump pad to form an interconnect. The bump material is self-confined within a footprint of the die bump pad or substrate bump pad. The bump material can be immersed in a flux solution prior to reflow to increase wettability. Alternatively, the interconnect includes a non-fusible base and fusible cap. The volume of bump material is selected so that a surface tension maintains self-confinement of the bump material within the bump pads during reflow. | 03-10-2016 |
20160071820 | PACKAGE STRUCTURES AND METHODS OF FORMING - Methods of forming and structures of packages are discussed herein. In an embodiment, a method includes forming a back side redistribution structure, and after forming the back side redistribution structure, adhering a first integrated circuit die to the back side redistribution structure. The method further includes encapsulating the first integrated circuit die on the back side redistribution structure with an encapsulant, forming a front side redistribution structure on the encapsulant, and electrically coupling a second integrated circuit die to the first integrated circuit die. The second integrated circuit die is electrically coupled to the first integrated circuit die through first external electrical connectors mechanically attached to the front side redistribution structure. | 03-10-2016 |
20160071826 | THREE-DIMENSIONAL CHIP-TO-WAFER INTEGRATION - An integrated circuit device is disclosed that includes a semiconductor substrate and a die attached to the semiconductor substrate. A conductive pillar is connected to at least one of the semiconductor substrate or the die. An overmold is molded onto the semiconductor substrate over the die, and the conductive pillar extends through the overmold. | 03-10-2016 |
20160079151 | PACKAGE STRUCTURE WITH AN EMBEDDED ELECTRONIC COMPONENT AND METHOD OF FABRICATING THE PACKAGE STRUCTURE - The present invention provides a package structure with an embedded electronic component and a method of fabricating the package structure. The method includes: forming a first wiring layer on a carrier; removing the carrier and forming the first wiring layer on a bonding carrier; disposing an electronic component on the first wiring layer; forming an encapsulating layer, a second wiring layer and an insulating layer on the first wiring layer; disposing a chip on the electronic component and the second wiring layer; and forming a covering layer that covers the chip. The present invention can effectively reduce the thickness of the package structure and the electronic component without using adhesives. | 03-17-2016 |
20160079184 | SEMICONDUCTOR DEVICE - A semiconductor device includes a first semiconductor chip including an inorganic protective film, a second semiconductor chip including an organic protective film and a re-wiring layer, the second semiconductor chip being electrically connected to the first semiconductor chip through a through-silicon via and a bump connection, a third semiconductor chip including an inorganic protective film, the third semiconductor chip being electrically connected to the second semiconductor chip through the re-wiring layer and a bump connection, a first resin layer filled between the first semiconductor chip and the second semiconductor chip, the first resin layer being in contact with the inorganic protective film, and a second resin layer filled between the second semiconductor chip and the third semiconductor chip, the second resin layer being in contact with the organic protective film and the inorganic protective film. | 03-17-2016 |
20160079192 | Metal Routing Architecture for Integrated Circuits - A device includes a substrate, a metal pad over the substrate, and a metal trace electrically disconnected from the metal pad. The metal pad and the metal trace are level with each other. A passivation layer includes a portion overlapping an edge portion of the metal pad. A metal pillar is overlying the metal pad, and is electrically connected to the metal pad. The metal trace has a portion overlapped by the metal pillar. | 03-17-2016 |
20160079194 | SEMICONDUCTOR SUBSTRATE AND SEMICONDUCTOR PACKAGE STRUCTURE - A semiconductor substrate includes an insulating layer, a first conductive patterned layer disposed adjacent to a first surface of the insulating layer, and conductive bumps disposed on the first conductive patterned layer. Each conductive bump has a first dimension along a first direction and a second dimension along a second direction perpendicular to the first direction, and the first dimension is greater than the second dimension. A semiconductor package structure includes the semiconductor substrate, at least one die electrically connected to the conductive bumps, and a molding compound encapsulating the conductive bumps. | 03-17-2016 |
20160079195 | SEMICONDUCTOR DEVICE - A semiconductor device includes a first substrate and a second substrate facing the first substrate, each substrate having conductive pads disposed thereon, an insulating adhesive layer sealing the space between the first substrate and the second substrate, and a plurality of bumps penetrating the insulating adhesive layer and electrically connecting the plurality of first conductive pads and the plurality of second conductive pads. The plurality of bumps include at least a first bump having a first height and a second bump that is provided in a position closer to a geometric center of the second substrate than the first bump and has a second height greater than the first height. | 03-17-2016 |
20160079205 | SEMICONDUCTOR PACKAGE ASSEMBLY - The invention provides a semiconductor package, a semiconductor package assembly and a method for fabricating a semiconductor package. The semiconductor package assembly includes a first semiconductor package. The first semiconductor package includes a first semiconductor die having first pads thereon. A first redistribution layer (RDL) structure is coupled to the first semiconductor die. Conductive pillar structures are disposed on a surface of the first RDL structure away from the first semiconductor die, wherein the conductive pillar structures are coupled to the first RDL structure. | 03-17-2016 |
20160079206 | SEMICONDUCTOR PACKAGE, PACKAGE-ON-PACKAGE DEVICE INCLUDING THE SAME, AND MOBILE DEVICE INCLUDING THE SAME - A semiconductor package includes a substrate; a first semiconductor chip arranged on the substrate; a second semiconductor chip arranged on the first semiconductor chip; a lead attached to the second semiconductor chip on a side of the second semiconductor chip opposite a side of the second semiconductor chip facing the first semiconductor chip; and a molding member covering an upper surface of the substrate and side surfaces of the lead and sealing the first semiconductor chip and the second semiconductor chip. | 03-17-2016 |
20160079208 | SEMICONDUCTOR PACKAGE AND METHOD OF FABRICATING THE SAME - An embodiment includes a semiconductor package comprising: a substrate; a first semiconductor chip mounted on the substrate; a second semiconductor chip mounted on a top surface of the first semiconductor chip; a connecting bump disposed between the first and second semiconductor chips to electrically connect the second semiconductor chip to the first semiconductor chip; and a first heat dissipation part disposed on the top surface of the first semiconductor chip between the first and second semiconductor chips and spaced apart from a bottom surface of the second semiconductor chip. | 03-17-2016 |
20160086847 | METHOD OF ELECTRODEPOSITING GOLD ON A COPPER SEED LAYER TO FORM A GOLD METALLIZATION STRUCTURE - An electrically conductive barrier layer is formed on a semiconductor substrate such that the barrier layer covers a first device terminal. A seed layer is formed on the barrier layer. The seed includes a noble metal other than gold. The substrate is masked so that a first mask opening is laterally aligned with the first terminal. An unmasked portion of the seed layer is electroplated using a gold electrolyte solution so as to form a first gold metallization structure in the first mask opening. The mask, the masked portions of the seed layer, and the barrier layer are removed. The noble metal from the unmasked portion of the seed layer is diffused into the first gold metallization structure. The first gold metallization structure is electrically connected to the first terminal via the barrier layer. | 03-24-2016 |
20160086867 | Integrated Circuit Packages and Methods for Forming the Same - A method includes forming an electrical connector over a substrate of a wafer, and molding a polymer layer, with at least a portion of the electrical connector molded in the polymer layer. A first sawing step is performed to form a trench in the polymer layer. After the first sawing step, a second sawing step is performed to saw the wafer into a plurality of dies. | 03-24-2016 |
20160086902 | SEMICONDUCTOR PACKAGE STRUCTURE AND MANUFACTURING METHOD THEREOF - A semiconductor package structure includes a semiconductor substrate including a plurality of through substrate vias (TSV) extending from a first surface to a second surface of the semiconductor substrate, wherein the second surface is opposite to the first surface; a plurality of conductive bumps on the second surface and connected to a corresponding TSV; a polymeric layer on the second surface and surrounding a lower portion of a corresponding conductive bump. The polymeric layer includes a first portion configured as a blanket covering a periphery region of the semiconductor substrate; and a second portion in a core region of the semiconductor substrate and configured as a plurality of isolated belts, wherein each of the isolated belts surrounds a corresponding conductive bump. | 03-24-2016 |
20160086903 | SEMICONDUCTOR STRUCTURE AND METHOD OF FABRICATING THE SAME - The present invention provides a semiconductor structure and a method of fabricating the same. The semiconductor structure includes a carrier, a semiconductor chip and an encapsulant. The semiconductor chip is disposed on the carrier, and has opposing non-active and active surfaces. The non-active surface is coupled to the carrier, and the active surface has a plurality of metallic pillars formed thereon. A under bump metallogy layer is formed between the metallic pillars and the active surface and on side surfaces of the metal pillars. The surface of the encapsulant is flush with end surfaces of the metallic pillars. Therefore, the product yield is increased significantly. | 03-24-2016 |
20160086904 | Method and a System for Producing a Semi-Conductor Module - In a method for producing a semi-conductor module ( | 03-24-2016 |
20160086905 | SHAPED AND ORIENTED SOLDER JOINTS - The present description relates to the field of fabricating microelectronic assemblies, wherein a microelectronic device may be attached to a microelectronic substrate with a plurality of shaped and oriented solder joints. The shaped and oriented solder joints may be substantially oval, wherein the major axis of the substantially oval solder joints may be substantially oriented toward a neutral point or center of the microelectronic device. Embodiments of the shaped and oriented solder joint may reduce the potential of solder joint failure due to stresses, such as from thermal expansion stresses between the microelectronic device and the microelectronic substrate. | 03-24-2016 |
20160086906 | Chip Bonding Method and Driving Chip of Display - A chip bonding method for bonding a chip on a display panel is provided. The chip includes a joint face, a rear face, input bumps and output bumps. The joint face having a first symmetry axis line is opposite to the rear face. The input bumps and the output bumps are respectively located on two sides of the symmetry axis line and disposed on the joint face. | 03-24-2016 |
20160086910 | PACKAGED MICROELECTRONIC DEVICES AND METHODS FOR MANUFACTURING PACKAGED MICROELECTRONIC DEVICES - Microelectronic devices and method of forming a plurality of microelectronic devices on a semiconductor workpiece are disclosed herein. One such method includes placing a plurality of first interconnect elements on a side of a semiconductor workpiece, forming a layer on the side of the workpiece, reshaping the first interconnect elements by heating the first interconnect elements, and coupling a first portion of a plurality of individual second interconnect elements to corresponding first interconnect elements with a second portion of the individual second interconnect elements exposed. | 03-24-2016 |
20160086921 | SEMICONDUCTOR PACKAGE HAVING CASCADED CHIP STACK - A semiconductor package that includes a package substrate, a lower semiconductor chip mounted on the package substrate, and an upper semiconductor chip stacked on the lower semiconductor chip in a cascade shape is provided. An active surface of the lower semiconductor chip is facing an active surface of the upper semiconductor chip. | 03-24-2016 |
20160086924 | SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR PACKAGE - Embodiments of the inventive concept include a semiconductor package having a plurality of stacked semiconductor chips. A multi-layered substrate includes a central insulation layer, an upper wiring layer disposed on an upper surface of the central insulation layer, and a first lower wiring layer disposed on a lower surface of the central insulation layer. The stacked semiconductor chips are connected to the multi-layered substrate and/or each other using various means. The semiconductor package is capable of high performance operation, like a semiconductor package based on flip-ship bonding, and also meets the need for large capacity by overcoming a limitation caused by a single semiconductor chip. Embodiments of the inventive concept also include methods of manufacturing the semiconductor package. | 03-24-2016 |
20160090301 | PACKAGES FOR SEMICONDUCTOR DEVICES AND METHODS FOR ASSEMBLING SAME - One or more embodiments of the present disclosure are directed to packages that include a stacked microelectromechanical sensor MEMS die and an application-specific integrated circuit (ASIC) die. The smaller of the MEMS die and the ASIC die is stacked on the larger of the MEMS die and the ASIC die. The larger of the two dice may form one or more dimensions of the package. In one embodiment, a bottom surface of the larger of the two dice forms an outer surface of the package. In that regard, the package may take less lateral space on another component, such as a board or other package. | 03-31-2016 |
20160093580 | SEMICONDUCTOR DEVICE AND METHOD COMPRISING REDISTRIBUTION LAYERS - A method of making a semiconductor package can include forming a plurality of redistribution layer (RDL) traces disposed over active surfaces of a plurality of semiconductor die and electrically connected to contact pads on the plurality of semiconductor die. The method can include disposing an encapsulant material over the active surfaces, contacting at least four side surfaces of each of the plurality of semiconductor die, and disposed over the plurality of RDL traces. The method can also include forming a via through the encapsulant material to expose at least one of the plurality of RDL traces, forming an electrical interconnect disposed within the via and coupled to the at least one RDL trace, and singulating the plurality of semiconductor packages through the encapsulant material to leave an offset of 30-140 μm of the encapsulant material disposed around a periphery of each of the plurality of semiconductor die. | 03-31-2016 |
20160093583 | BOND PAD WITH MICRO-PROTRUSIONS FOR DIRECT METALLIC BONDING - A bond pad with micro-protrusions for direct metallic bonding. In one embodiment, a semiconductor device comprises a semiconductor substrate, a through-silicon via (TSV) extending through the semiconductor substrate, and a copper pad electrically connected to the TSV and having a coupling side. The semiconductor device further includes a copper element that projects away from the coupling side of the copper pad. In another embodiment, a bonded semiconductor assembly comprises a first semiconductor substrate with a first TSV and a first copper pad electrically coupled to the first TSV, wherein the first copper pad has a first coupling side. The bonded semiconductor assembly further comprises a second semiconductor substrate, opposite to the first semiconductor substrate, the second semiconductor substrate comprising a second copper pad having a second coupling side. A plurality of copper connecting elements extend between the first and second coupling sides of the first and second copper pads. | 03-31-2016 |
20160093585 | THERMOCOMPRESSION FOR SEMICONDUCTOR CHIP ASSEMBLY - An assembly of a semiconductor chip having pads to a substrate having pads aligned to receive the semiconductor chip is provided, whereby at least one of the semiconductor chip pads and substrate pads include solder bumps. The solder bumps are deformed against the substrate pads and the semiconductor chip pads, whereby an underfill material is applied to fill the gap between the semiconductor chip and substrate. The underfill material does not penetrate between the deformed solder bumps, the semiconductor chip pads, and the substrate pads. At least one of the solder bumps have not been melted or reflowed to make a metallurgical bond between the semiconductor chip pads and the substrate pads, and at least another one of the solder bumps have been melted or reflowed to make a metallurgical bond between the semiconductor chip pads and the substrate pads. | 03-31-2016 |
20160093588 | POWER SUPPLY ARRANGEMENT FOR SEMICONDUCTOR DEVICE - A semiconductor device includes a device die, a first power supply die, and a second power supply die different from the first power supply die. The device die includes a first circuit and a second circuit. The first power supply die is electrically coupled to the first circuit and configured to supply power for the first circuit. The second power supply die is electrically coupled to the second circuit and configured to supply power for the second circuit. The first and second power supply dies are attached to the device die, and overlap the device die in a thickness direction of the device die. | 03-31-2016 |
20160093590 | Package-on-Package Structure and Method - A device comprises a top package mounted on a bottom package through a joint structure, wherein the joint structure comprises a solder ball of the top package coupled to a metal structure embedded in the bottom package and an epoxy protection layer having a first edge in direct contact with a top surface of the bottom package and a second edge surrounding a lower portion of the solder ball. | 03-31-2016 |
20160093597 | Package and Method for Making the Same - A package structure includes a substrate having a first bond pad layer. A silicon bridge layer having one or more redistribution layers therein. The silicon bridge layer has a second bond pad, and the silicon bridge layer is attached to the substrate by an adhesive layer. A first die is coupled to the substrate and the silicon bridge layer. A second die is coupled to the silicon bridge layer, wherein the first die and the second die communicate with one another by way of the one or more redistribution layers. Power and/or ground connectors are coupled to the first bond pad and the second bond pad for enabling grounding and/or transferring power from the semiconductor substrate to the second die. | 03-31-2016 |
20160099223 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A method of manufacturing a semiconductor structure includes receiving a substrate including a die pad disposed thereon; disposing a passivation over the substrate and around the die pad; disposing a polymer over the passivation; forming a post passivation interconnect (PPI) including an elongated portion and a via portion contacting with the die pad; depositing a metallic paste on the elongated portion of the PPI by a stencil; disposing a conductive bump over the metallic paste; and disposing a molding over the PPI and around the metallic paste and the conductive bump. | 04-07-2016 |
20160099228 | METHOD AND APPARATUS FOR DIE-TO-DIE PAD CONTACT - A semiconductor device includes at least a first semiconductor die and a second semiconductor die. The first semiconductor dies comprises a first and second side, and includes at least a first contact pad located on the first side of the first semiconductor die. The second semiconductor die comprises a first and second side, and includes at least a second contact pad located on the first side of the second semiconductor die, wherein the first semiconductor die is stacked on the second semiconductor die and wherein the first side of the first semiconductor die faces the first side of the second semiconductor die. At least one voltage-guided conductive filament is created between the first contact pad and the second contact pad. | 04-07-2016 |
20160099229 | SEMICONDUCTOR DEVICES HAVING THROUGH ELECTRODES, SEMICONDUCTOR PACKAGES INCLUDING THE SAME, METHODS OF MANUFACTURING THE SAME, ELECTRONIC SYSTEMS INCLUDING THE SAME, AND MEMORY CARDS INCLUDING THE SAME - A semiconductor device includes a substrate having a first surface and a second surface that are opposite to each other, a plurality of through electrodes penetrating the substrate and extending from the first surface to the second surface, front-side bumps disposed on the first surface and connected to odd-numbered through electrodes among the plurality of through electrodes, and backside bumps disposed on the second surface and connected to even-numbered through electrodes among the plurality of through electrodes. Related semiconductor packages, fabrication methods, electronic systems and memory cards are also provided. | 04-07-2016 |
20160104685 | Improving the Strength of Micro-Bump Joints - A device includes a work piece including a metal bump; and a dielectric layer having a portion directly over the metal bump. The metal bump and a surface of the portion of the dielectric layer form an interface. A metal finish is formed over and contacting the metal bump. The metal finish extends from over the dielectric layer to below the interface. | 04-14-2016 |
20160104686 | DRIVING CHIP AND DISPLAY DEVICE - A driving chip and a display device, relating to the technical field of driving chip for displays, are disclosed. A surface of the driving chip has a first edge and a second edge opposite to each other. The driving chip includes connecting bumps and supporting bumps, which are arranged along the first edge to form at least one first bump column, and at either end of the first bump column, there is at least one of the supporting bumps; the connecting bumps and the supporting bumps are arranged along the second edge to form at least one second bump column, and at either end of the second bump column, there is at least one of the supporting bumps. A surface of the driving chip according to embodiments of the invention has bump columns, a supporting bump is disposed at an end of a bump column, and acts to support the driving chip favorably. Thus, upon bonding and packaging, the driving chip can bear a force in equilibrium as a whole, and occurrence of a problem of impression defectiveness is avoided. | 04-14-2016 |
20160104693 | INTERCONNECT STRUCTURES WITH INTERMETALLIC PALLADIUM JOINTS AND ASSOCIATED SYSTEMS AND METHODS - Interconnect structures with intermetallic palladium joints are disclosed herein. In one embodiment, a method of forming an interconnect structure includes depositing a first conductive material comprising nickel on a first conductive surface of a first die, and depositing a second conductive material comprising nickel on a second conductive surface of a second die spaced apart from the first surface. The method further includes depositing a third conductive material on the second conductive material, and thermally compressing tin/solder between the first and third conductive materials to form an intermetallic palladium joint that extends between the first conductive material and the second conductive material such that one end of the intermetallic palladium joint is bonded directly to the first conductive material and an opposite end of the intermetallic palladium joint is bonded directly to the second conductive material. | 04-14-2016 |
20160111181 | ANISOTROPIC ELECTROCONDUCTIVE PARTICLES - An anisotropic electroconductive particle including a first insulating layer, a first conductive layer disposed on the first insulating layer, and a second insulating layer disposed on the first conductive layer. | 04-21-2016 |
20160111358 | SEMICONDUCTOR PACKAGE - A semiconductor package is provided. In one configuration, the semiconductor package includes a substrate. First and second conductive traces are disposed on the substrate. A conductive pillar bump is disposed on the second conductive trace, and a first conductive structure is disposed between the second conductive trace and the conductive pillar bump or between the second conductive trace and the substrate. A semiconductor die is disposed over the first conductive trace, wherein the conductive pillar bump connects to the semiconductor die. | 04-21-2016 |
20160111384 | SEMICONDUCTOR PACKAGE STRUCTURE AND MANUFACTURING METHOD THEREOF - A semiconductor package structure includes a first semiconductor substrate including a conductive pad; and a conductive pillar on the conductive pad and disposed between the first semiconductor substrate and a second semiconductor substrate. The conductive pad is coupled with a circuitry of the first semiconductor substrate. The conductive pillar extends along a longitudinal axis and toward the second semiconductor substrate. The conductive pillar includes a sidewall with a rough surface notching toward the longitudinal axis. | 04-21-2016 |
20160111387 | PLANARITY-TOLERANT REWORKABLE INTERCONNECT WITH INTEGRATED TESTING - A structure includes an electrical interconnection between a first substrate including a plurality of protrusions and a second substrate including a plurality of solder bumps, the plurality of protrusions includes sharp tips that penetrate the plurality of solder bumps, and a permanent electrical interconnection is established by physical contact between the plurality of protrusions and the plurality of solder bumps including a metallurgical joint. | 04-21-2016 |
20160111388 | SEMICONDUCTOR DEVICE - A technique capable of improving reliability of a semiconductor device is provided. In the present invention, as a wiring board on which a semiconductor chip is mounted, a build-up wiring board is not used but a through wiring board THWB is used. In this manner, in the present invention, the through wiring board formed of only a core layer is used, so that it is not required to consider a difference in thermal expansion coefficient between a build-up layer and the core layer, and besides, it is not required either to consider the electrical disconnection of a fine via formed in the build-up layer because the build-up layer does not exist. As a result, according to the present invention, the reliability of the semiconductor device can be improved while a cost is reduced. | 04-21-2016 |
20160118311 | THIN FILM RDL FOR IC PACKAGE - A package substrate comprising a thin film redistribution layer (RDL) with a plurality of metal pillar configured on chip side is disclosed to thin the thickness of an IC package before mounting to a circuit board. The height of metal pillar keeps a proper distance between the IC chip and the package substrate so that an underfill material can be filled in between to ensure the reliability of the IC package. | 04-28-2016 |
20160118323 | PACKAGE STRUCTURE AND FABRICATION METHOD THEREOF - A method for fabricating a package structure is provided, which includes the steps of: forming a first insulating layer on a carrier; forming a dielectric body on the first insulating layer, wherein the dielectric body has a first surface formed on the first insulating layer and a second surface opposite to the first surface, and a circuit layer and a plurality of conductive posts formed on the circuit layer are embedded in the dielectric body; forming a second insulating layer on the second surface of the dielectric body, wherein the glass transition temperature of the first insulating layer and/or the second insulating layer is greater than 250° C.; and removing the carrier. Since the glass transition temperature of the first or second insulating layer is greater than that of the dielectric body, the package structure has a preferred strength to avoid warping, thereby dispensing with a support member. | 04-28-2016 |
20160118324 | WAFER LEVEL PACKAGING APPROACH FOR SEMICONDUCTOR DEVICES - A semiconductor device includes a substrate having a front surface and a back surface, a subassembly on the front surface of the substrate including first and second metal layers insulated from each other, a cap assembly including a metal connection member, and first and second through holes penetrating through the substrate and filled with metals. The metal filled in the first through hole is electrically connected to the first metal layer, and the metal filled in the second through hole is electrically connected to the second metal layer. The semiconductor device also includes a metal connection pad on the substrate that entirely surrounds the subassembly and is aligned with the metal connection member. The interface between the cap assembly and the subassembly is free of through holes to prevent a resistance change and shield the subassembly from interference. | 04-28-2016 |
20160118351 | Interconnect Crack Arrestor Structure and Methods - A system and method for preventing cracks is provided. An embodiment comprises placing crack stoppers into a connection between a semiconductor die and a substrate. The crack stoppers may be in the shape of hollow or solid cylinders and may be placed so as to prevent any cracks from propagating through the crack stoppers. | 04-28-2016 |
20160118360 | Bump-on-Trace Design for Enlarge Bump-to-Trace Distance - A package includes a first and a second package component. The first package component includes a first metal trace and a second metal trace at the surface of the first package component. The second metal trace is parallel to the first metal trace. The second metal trace includes a narrow metal trace portion having a first width, and a wide metal trace portion having a second width greater than the first width connected to the narrow metal trace portion. The second package component is over the first package component. The second package component includes a metal bump overlapping a portion of the first metal trace, and a conductive connection bonding the metal bump to the first metal trace. The conductive connection contacts a top surface and sidewalls of the first metal trace. The metal bump is neighboring the narrow metal trace portion. | 04-28-2016 |
20160118364 | Integrated Circuit with a Thermally Conductive Underfill and Methods of Forming Same - An integrated circuit includes a substrate and at least one chip. Each chip is disposed over the substrate or the other chip. Solder bumps are disposed between the substrate and the at least one chip. An insulating film is disposed around the solder bumps and provides electrical insulation for the solder bumps except areas for interconnections. A thermally conductive underfill is disposed between the substrate, the at least one chip, and the solder bumps. | 04-28-2016 |
20160126172 | SEMICONDUCTOR DEVICE PACKAGE AND ELECTRONIC DEVICE INCLUDING THE SAME - A semiconductor device package includes a substrate having a first surface and a second surface that is opposite to the first surface, a plurality of solder joints disposed on the first surface of the substrate, a semiconductor chip disposed above the second surface of the substrate, and a support member disposed between the second surface of the substrate and the semiconductor chip. At least one of the solder joints is in contact with the first surface of the substrate opposite to a region on the second surface in which the support member is not disposed. | 05-05-2016 |
20160126176 | PACKAGE SUBSTRATE, PACKAGE STRUCTURE AND FABRICATION METHOD THEREOF - A package substrate is provided, which includes: a body having opposite first and second surfaces, each having adjacent first and second regions defined thereon; first and second circuit layers formed on the first and second surfaces of the body, respectively; a first insulating layer formed on the first surface of the body and having a plurality of first openings formed in the first insulating layer and positioned in the first and second regions; and a second insulating layer formed on the second surface of the body and having a plurality of second openings formed in the second insulating layer and positioned in the second region. Further, at least a third opening is formed in the second insulating layer and positioned in the first region to reduce the volume of the second insulating layer, thereby facilitating even distribution of thermal stresses through the first and second insulating layers during thermal cycling and hence preventing warpage of the package substrate. | 05-05-2016 |
20160126202 | BRIDGING ARRANGEMENT, MICROELECTRONIC COMPONENT AND METHOD FOR MANUFACTURING A BRIDGING ARRANGEMENT - A bridging arrangement includes a first and a second surface defining a gap therebetween. At least one surface of the first and second surface has an anisotropic energy landscape. A plurality of particles defines a path between the first and second surface bridging the gap. | 05-05-2016 |
20160126204 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A method of manufacturing a semiconductor device includes: arranging a solder material containing at least tin, between a semiconductor element and a joined member provided with a nickel layer and a copper layer, such that the solder material is in contact with the copper layer, the nickel layer being provided on a surface of the joined member, and the copper layer being provided on at least a portion of a surface of the nickel layer; and melting and solidifying the solder material to form Cu | 05-05-2016 |
20160126220 | Electrostatic Discharge Protection Structure and Method - A semiconductor package comprises a top package and a bottom package with a plurality of fan-out interconnect structures. A plurality of inter-package connectors are formed inside a gap between the top package and the bottom package. A conductive protection layer is formed over the semiconductor package, wherein the conductive protection layer seals the gap around its perimeter, wherein the conductive protection layer covers an upper surface and a side wall of the top package, and wherein the conductive protection layer covers portions of an upper surface of the bottom package that extend beyond a boundary of the top package and a top portion of a side wall of the bottom package. | 05-05-2016 |
20160126264 | SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME - A technique which improves the reliability in coupling between a bump electrode of a semiconductor chip and wiring of a mounting substrate, more particularly a technique which guarantees the flatness of a bump electrode even when wiring lies in a top wiring layer under the bump electrode, thereby improving the reliability in coupling between the bump electrode and the wiring formed on a glass substrate. Wiring, comprised of a power line or signal line, and a dummy pattern are formed in a top wiring layer beneath a non-overlap region of a bump electrode. The dummy pattern is located to fill the space between wirings to reduce irregularities caused by the wirings and space in the top wiring layer. A surface protection film formed to cover the top wiring layer is flattened by CMP. | 05-05-2016 |
20160133536 | Semiconductor Device Packaging Methods and Structures Thereof - In some embodiments, a semiconductor device includes a first die, a second die coupled to a first surface of the first die, and a third die coupled to the first surface of the first die. The semiconductor device further includes an underfill material disposed between the first die and the second die and between the first die and the third die. A first volume of the underfill material for the second die is different than a second volume of the underfill material for the third die. | 05-12-2016 |
20160133551 | PACKAGE STRUCTURE AND FABRICATION METHOD THEREOF - A package structure is provided, which includes: a dielectric layer having opposite first and second surfaces; a first circuit layer embedded in the dielectric layer and having a surface exposed from the first surface of the dielectric layer; a plurality of conductive posts embedded in the dielectric layer and electrically connected to the first circuit layer and having one ends exposed from the second surface of the dielectric layer; a second circuit layer formed on the second surface of the dielectric layer and electrically connected the ends of the conductive posts exposed from the second surface of the dielectric layer; and a plurality of protruding elements formed on the surface of the first circuit layer exposed from the first surface of the dielectric layer, thereby providing a large contact area so as to strengthen bonding between a semiconductor chip and the first circuit layer of the package structure. | 05-12-2016 |
20160133588 | CHIP PACKAGE AND MANUFACTURING METHOD THEREOF - A chip package includes a chip, a laser stopper, an isolation layer, a redistribution layer, an insulating layer, and a conductive structure. The chip has a conductive pad, a first surface, and a second surface. The conductive pad is located on the first surface. The second surface has a first though hole to expose the conductive pad. The laser stopper is located on the conductive pad in the first though hole. The isolation layer is located on the second surface and in the first though hole. The isolation layer has a third surface opposite to the second surface, and has a second though hole to expose the laser stopper. The redistribution layer is located on the third surface, a sidewall of the second though hole, and the laser stopper in the second though hole. The conductive structure is located on the redistribution. | 05-12-2016 |
20160133591 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device and a manufacturing method thereof, which can reduce a size of the semiconductor device. As a non-limiting example, various aspects of this disclosure provide for a reduction in package size based at least in part on patterning techniques for forming interconnection structures. | 05-12-2016 |
20160133593 | ELECTRONIC PACKAGE AND FABRICATION METHOD THEREOF - An electronic package is provided, which includes: an electronic element having an active surface with a plurality of electrode pads, an inactive surface opposite to the active surface, and a side surface adjacent to and connecting the active and inactive surfaces; a plurality of conductive elements formed on the electrode pads of the electronic element; | 05-12-2016 |
20160133595 | ELECTRICAL APPARATUS AND METHOD FOR MANUFACTURING THE SAME - An electrical apparatus includes a first electrical component; a second electrical component; and an In—Sn—Ag alloy connecting the first electrical component and the second electrical component, the In—Sn—Ag alloy containing AgIn | 05-12-2016 |
20160133606 | SEMICONDUCTOR DEVICE INCLUDING AN EMBEDDED SURFACE MOUNT DEVICE AND METHOD OF FORMING THE SAME - Embodiments of the present disclosure include devices and methods of forming the same. An embodiment is a device including a solder resist coating over a first side of a substrate, an active surface of a die bonded to the first side of the substrate by a first connector, and a surface mount device mounted to the die by a second set of connectors, the surface mount device being between the die and the first side of the substrate, the surface mount device being spaced from the solder resist coating. | 05-12-2016 |
20160141218 | CIRCUIT MODULE AND MANUFACTURING METHOD THEREOF - There is provided a circuit module where a sufficient amount of underfill resin may be supplied to corner portions of a semiconductor chip. A circuit module includes a circuit board provided with a plurality of electrode pads on a surface of the board, a semiconductor chip arranged on the board, the chip including a surface and a back surface, where each of a plurality of solder bumps and provided on the back surface is solder joined to a corresponding one of the plurality of electrode pads, and an underfill provided between the surface of the board and the back surface of the chip. Furthermore, the chip includes an eaves portion of a predetermined thickness at an outer periphery of the surface, and the underfill forms a fillet extending from a bottom surface of the eaves portion to the surface of the board along a side wall of the chip. | 05-19-2016 |
20160141219 | CHIP PACKAGE AND METHOD FOR FORMING THE SAME - A chip package includes a chip, a dam layer, a permanent adhesive layer, a support, a buffer layer, a redistribution layer, a passivation layer, and a conducting structure. A conducting pad and a sensing device of the chip are located on a first surface of a substrate of the chip, and the conducting pad protrudes from the side surface of the substrate. The dam layer surrounds the sensing device. The permanent adhesive layer is between the support and the substrate. The support and the permanent adhesive layer have a trench to expose the conducting pad. The buffer layer is located on the support. The redistribution layer is located on the buffer layer and on the support, the permanent adhesive layer, and the conducting pad facing the trench. The passivation layer covers the redistribution layer, the buffer layer, and the conducting pad. | 05-19-2016 |
20160141238 | Semiconductor Device and Method for Forming a Low Profile Embedded Wafer Level Ball Grid Array Molded Laser Package (EWLB-MLP) - A semiconductor device has a semiconductor die with an encapsulant deposited over and around the semiconductor die. An interconnect structure is formed over a first surface of the encapsulant. An opening is formed from a second surface of the encapsulant to the first surface of the encapsulant to expose a surface of the interconnect structure. A bump is formed recessed within the opening and disposed over the surface of the interconnect structure. A semiconductor package is provided. The semiconductor package is disposed over the second surface of the encapsulant and electrically connected to the bump. A plurality of interconnect structures is formed over the semiconductor package to electrically connect the semiconductor package to the bump. The semiconductor package includes a memory device. The semiconductor device includes a height less than 1 millimeter. The opening includes a tapered sidewall formed by laser direct ablation. | 05-19-2016 |
20160141255 | SEMICONDUCTOR PACKAGE AND FABRICATION METHOD THEREOF - A semiconductor package is provided, which includes: a circuit structure having a first bottom surface and a first top surface opposite to the first bottom surface; at least a semiconductor element disposed on the first top surface of the circuit structure and electrically connected to the circuit structure; an encapsulant formed on the first top surface of the circuit structure to encapsulate the semiconductor element, wherein the encapsulant has a second bottom surface facing the first top surface of the circuit structure and a second top surface opposite to the second bottom surface; and a strengthening layer formed on the second top surface of the encapsulant, or formed between the circuit structure and the encapsulant, or formed on the first bottom surface of the circuit structure, thereby effectively preventing the encapsulant from warping and the semiconductor element from cracking. | 05-19-2016 |
20160141273 | SEMICONDUCTOR DEVICE - This semiconductor device is formed by stacking a plurality of semiconductor chips that each have a plurality of bump electrodes, each of the plurality of semiconductor chips being provided with an identification section formed on a respective side face. Each semiconductor chip has a similar arrangement for its respective plurality of bump electrodes, and each identification section is formed so that the positional relationship with a respective reference bump electrode provided at a specific location among the respective plurality of bump electrodes is the same in each semiconductor chip. The plurality of semiconductor chips are stacked such that the bump electrodes provided thereon are electrically connected in the order of stacking of the semiconductor chips, while the side faces on which the identification sections are formed are oriented in the same direction. | 05-19-2016 |
20160148866 | ELECTRICAL INTERCONNECT FOR AN ELECTRONIC PACKAGE - Some example forms relate to an electrical interconnect for an electronic package. The electrical interconnect includes a dielectric layer that includes a trench formed into one surface of the dielectric layer and a signal conductor that fills the trench and extends above the one surface of dielectric layer. The electrical interconnect further includes a conductive reference layer mounted on an opposing side of the dielectric layer. The conductive reference layer is electromagnetically coupled to the signal conductor when current passes through the signal conductor. | 05-26-2016 |
20160148886 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device includes a substrate layer, a redistribution layer (RDL) disposed over the substrate layer, a conductive bump disposed over the RDL, and a molding disposed over the RDL and surrounding the conductive bump, wherein the molding includes a protruded portion laterally protruded from a sidewall of the substrate layer and away from the conductive bump. | 05-26-2016 |
20160148889 | System and Method for an Improved Fine Pitch Joint - Presented herein are an interconnect and method for forming the same, the method comprising forming an interconnect on a mounting surface of a mounting pad disposed on a first surface of a first substrate, the interconnect comprising a conductive material, optionally solder or metal, the interconnect avoiding the sides of the mounting pad. A molding compound is applied to the first surface of the first substrate and molded around the interconnect to covering at least a lower portion of the interconnect and a second substrate may be mounted on the interconnect. The interconnect may comprise an interconnect material disposed between a first and second substrate and a molding compound disposed on a surface of the first substrate, and exposing a portion of the interconnect. A sidewall of the interconnect material contacts the mounting pad at an angle less than about 30 degrees from a plane perpendicular to the first substrate. | 05-26-2016 |
20160148891 | SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURING THE SAME - A semiconductor structure and a method for forming the same are provided. The semiconductor structure includes: a semiconductor chip; a substrate facing an active surface of the semiconductor chip; and a conductive bump extending from the active surface of the semiconductor chip toward the substrate, wherein the conductive bump comprises: a plurality of bump segments comprising a first group of bump segments and a second group of bump segments, wherein each bump segment comprises the same segment height in a direction orthogonal to the active surface of the semiconductor chip, and each bump segment comprises a volume defined by the multiplication of the segment height with the average cross-sectional area of the bump segment; wherein the ratio of the total volume of the first group of bump segments to the total volume of the second group of bump segments is between about 0.03 and about 0.8. | 05-26-2016 |
20160148892 | SOLDER IN CAVITY INTERCONNECTION STRUCTURES - The present disclosure relates to the field of fabricating microelectronic packages, wherein cavities are formed in a dielectric layer deposited on a first substrate to maintain separation between soldered interconnections. In one embodiment, the cavities may have sloped sidewalls. In another embodiment, a solder paste may be deposited in the cavities and upon heating solder structures may be formed. In other embodiments, the solder structures may be placed in the cavities or may be formed on a second substrate to which the first substrate may be connected. In still other embodiments, solder structures may be formed on both the first substrate and a second substrate. The solder structures may be used to form solder interconnects by contact and reflow with either contact lands or solder structures on a second substrate. | 05-26-2016 |
20160148903 | Integrated Circuit Packages and Methods of Forming Same - Packages and methods of manufacture thereof are described. A package may include a first package and a die structure disposed over the first package. The first package may include: a first encapsulant; a first via structure within the first encapsulant; a first die within the first encapsulant, at least a portion of the first encapsulant being interposed between a sidewall of the first die and a sidewall of the first via structure; a second die within the first encapsulant, an active side of the second die facing an active side of the first die; and a first via chip within the first encapsulant, the first via chip comprising one or more through vias, wherein the first via chip is disposed at the active side of the first die, and between the second die and the first via structure. | 05-26-2016 |
20160155683 | SEMICONDUCTOR PACKAGE HAVING HEAT-DISSIPATION MEMBER | 06-02-2016 |
20160155686 | SEMICONDUCTOR DEVICES HAVING A TSV, A FRONT-SIDE BUMPING PAD, AND A BACK-SIDE BUMPING PAD | 06-02-2016 |
20160155697 | Protrusion Bump Pads for Bond-on-Trace Processing | 06-02-2016 |
20160155715 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | 06-02-2016 |
20160155716 | PACKAGE SUBSTRATE, SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SAME | 06-02-2016 |
20160163621 | SINGLE-LAYER WIRING PACKAGE SUBSTRATE, SINGLE-LAYER WIRING PACKAGE STRUCTURE HAVING THE PACKAGE SUBSTRATE, AND METHOD OF FABRICATING THE SAME - A single-layer wiring package substrate and a method of fabricating the same are provided, the method including: forming on a carrier a wiring layer having a first surface and a second surface opposing the first surface and being in contact with the carrier; forming on the carrier and on the wiring layer a dielectric body that has a first side having a first opening, from which a portion of the wiring layer is exposed, and a second side opposing the first side and disposed at the same side as the second surface of the wiring layer; and removing the carrier, with the second side of the dielectric body and the second surface of the wiring layer exposed. Therefore, a coreless package substrate is fabricated, and the overall thickness and cost of the substrate are reduced. | 06-09-2016 |
20160163630 | INTERPOSER WITH EXTRUDED FEED-THROUGH VIAS - A semiconductor device comprises an interposer with extruded feed-through vias and a semiconductor die. The interposers includes a substrate having a plurality of through-vias. A dielectric liner lining said through-vias. A plurality of feed-thru electrically conducting features provided by a plurality of extruded metal wires within said dielectric liner. A semiconductor die attached to said interposer. | 06-09-2016 |
20160163663 | SEMICONDUCTOR LIGHT-EMITTING DEVICE AND SEMICONDUCTOR LIGHT-EMITTING APPARATUS HAVING THE SAME - An embodiment includes a semiconductor light-emitting device comprising: an electrode pad; a first under-barrier metal (UBM) layer stacked on the electrode pad; a second UBM layer stacked on the first UBM layer and having a multilayered structure including at least two layers; and a solder bump disposed on the second UBM layer, wherein adhesion between the second UBM layer and the first UBM layer is higher than adhesion between the first UBM layer and the solder bump. | 06-09-2016 |
20160163664 | SEMICONDUCTOR SUBSTRATE AND MANUFACTURING METHOD THEREOF - A method of manufacturing a semiconductor substrate includes a device-forming process of forming a plurality of device areas in a substrate section, a first wiring process of forming circuit wirings connected to the plurality of device areas, an electrode pad-forming process of forming a plurality of electrode pads, a second wiring process of forming a potential adjustment wiring electrically connecting at least a part of the electrode pads, an electrode-forming process of forming electrode bodies on the electrode pads by electroless plating after the second wiring process, and a potential adjustment-releasing process of releasing a connection by the potential adjustment wiring after the electrode-forming process. | 06-09-2016 |
20160163669 | ELONGATED PAD STRUCTURE - A 3DIC includes a die and a substrate. The die includes multiple bumps to provide electrical connection the substrate. The substrate includes multiple elongated contact pads. The elongated contact pads making electrical contact with the bumps and shaped to maintain alignment with the bumps over a temperature range. | 06-09-2016 |
20160163675 | Semiconductor Device and Method of Bonding Semiconductor Die to Substrate in Reconstituted Wafer Form - A semiconductor device has a plurality of semiconductor die disposed over a carrier. An electrical interconnect, such as a stud bump, is formed over the semiconductor die. The stud bumps are trimmed to a uniform height. A substrate includes a bump over the substrate. The electrical interconnect of the semiconductor die is bonded to the bumps of the substrate while the semiconductor die is disposed over the carrier. An underfill material is deposited between the semiconductor die and substrate. Alternatively, an encapsulant is deposited over the semiconductor die and substrate using a chase mold. The bonding of stud bumps of the semiconductor die to bumps of the substrate is performed using gang reflow or thermocompression while the semiconductor die are in reconstituted wafer form and attached to the carrier to provide a high throughput of the flipchip type interconnect to the substrate. | 06-09-2016 |
20160163679 | MICROELECTRONIC ASSEMBLIES HAVING STACK TERMINALS COUPLED BY CONNECTORS EXTENDING THROUGH ENCAPSULATION - A microelectronic assembly or package can include first and second support elements and a microelectronic element between inwardly facing surfaces of the support elements. First connectors and second connectors such as solder balls, metal posts, stud bumps, or the like face inwardly from the respective support elements and are aligned with and electrically coupled with one another in columns. The first connectors, the second connectors or both may be partially encapsulated prior to electrically coupling respective pairs of first and second connectors in columns. A method may include arranging extremities of first connectors or second connectors in a temporary layer before forming the partial encapsulation. | 06-09-2016 |
20160172299 | INTEGRATED DEVICE PACKAGE COMPRISING PHOTO SENSITIVE FILL BETWEEN A SUBSTRATE AND A DIE | 06-16-2016 |
20160172321 | METHOD AND STRUCTURE FOR WAFER-LEVEL PACKAGING | 06-16-2016 |
20160172322 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE | 06-16-2016 |
20160172329 | Interconnect Structures for Wafer Level Package and Methods of Forming Same | 06-16-2016 |
20160181127 | METHOD FOR COUPLING CIRCUIT ELEMENT AND PACKAGE STRUCTURE | 06-23-2016 |
20160181140 | PROTECTIVE TAPE AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME | 06-23-2016 |
20160181201 | SEMICONDUCTOR PACKAGE ASSEMBLY WITH THROUGH SILICON VIA INTERCONNECT | 06-23-2016 |
20160181215 | Three-Dimensional Integrated Circuit Integration | 06-23-2016 |
20160181218 | LOW COST PACKAGE WARPAGE SOLUTION | 06-23-2016 |
20160181219 | Solder Joint Structure for Ball Grid Array in Wafer Level Package | 06-23-2016 |
20160190027 | METHODS OF FORMING PANEL EMBEDDED DIE STRUCTURES - Methods of forming molded panel coreless package structures are described. Those methods and structures may include fabrication of embedded die packages using large panel format and use of molding to improve rigidity of the panel, as well as to embed the die in a non-sacrificial mold material. The methods and structures described include methods for manufacturing thin, coreless substrate architectures which possess low warpage. | 06-30-2016 |
20160190077 | SEMICONDUCTOR STRUCTURE WITH UBM LAYER AND METHOD OF FABRICATING THE SAME - A semiconductor structure with an under bump metallization (UBM) layer is provided. The semiconductor structure at least includes a substrate, a metal pad disposed on the substrate, an insulating layer covering the substrate and an edge of the metal pad, wherein at least one recess is disposed within the insulating layer and a first UBM layer contacts the metal pad. The recess is adjacent to the metal pad and the recess is in the shape of a ring. The first UBM layer contacts part of the recess. | 06-30-2016 |
20160190078 | INTEGRATED CIRCUIT SYSTEM WITH CARRIER CONSTRUCTION CONFIGURATION AND METHOD OF MANUFACTURE THEREOF - A method of manufacture of an integrated circuit system includes: providing a semiconductor wafer with a bond pad; attaching a detachable carrier to the semiconductor wafer, the detachable carrier including a carrier frame portion and a terminal structure; removing the carrier frame portion with the terminal structure attached to the semiconductor wafer; and forming an encapsulation encapsulating the semiconductor wafer, the bond pad, and the terminal structure. | 06-30-2016 |
20160190079 | SEMICONDUCTOR SUBSTRATE AND SEMICONDUCTOR PACKAGE STRUCTURE HAVING THE SAME - The present disclosure relates to a semiconductor package structure including a semiconductor substrate, a semiconductor chip and a conductive material. The semiconductor substrate includes an insulating layer, a conductive circuit layer and a conductive bump. The conductive circuit layer is recessed from the top surface of the insulating layer, and includes at least one pad. The conductive bump is disposed on the at least one pad. A side surface of the conductive bump, a top surface of the at least one pad and a side surface of the insulating layer together define an accommodating space. The conductive material is electrically connected the conductive bump and the semiconductor chip, and a portion of the conductive material is disposed in the accommodating space. | 06-30-2016 |
20160190081 | DISPLAY DEVICE AND ARRAY SUBSTRATE FOR DISPLAY DEVICE - An array substrate for a display device can include a substrate, a pad positioned on the substrate, an insulating layer positioned on the pad and including a plurality of open portions exposing the pad, a first metal layer positioned on the insulating layer and disposed to be in contact with the pad, a second metal layer positioned on the first metal layer, and a bump electrode positioned on the second metal layer and including a plurality of dimples. | 06-30-2016 |
20160190082 | CONTACT AREA DESIGN FOR SOLDER BONDING - A package component includes a dielectric layer and a metal pad over the dielectric layer. A plurality of openings is disposed in the metal pad. The first plurality of openings is separated from each other by portions of the metal pad, with the portions of the metal pad interconnected to form a continuous metal region. | 06-30-2016 |
20160190083 | FLIP CHIP SCHEME AND METHOD OF FORMING FLIP CHIP SCHEME - The present invention provides a flip chip scheme and a method of forming the flip chip scheme. The flip chip scheme comprises: a plurality of bumps, some of the bumps arranged in a first pattern, respectively, and some of the bumps arranged in a second pattern different from the first pattern, respectively; wherein the first pattern is an equilateral triangle arranged by three bumps, and the second pattern is a square arranged by four bumps. The method comprises: arranging some of the bumps in a first pattern, respectively, and arranging some of the bumps in a second pattern different from the first pattern, respectively; wherein the first pattern is an equilateral triangle arranged by three bumps, and the second pattern is a square arranged by four bumps. | 06-30-2016 |
20160190096 | Packaged Semiconductor Devices and Methods of Packaging Semiconductor Devices - Packaged semiconductor devices and methods of packaging semiconductor devices are disclosed. In some embodiments, a method of packaging a semiconductor device includes forming a mask coating over a carrier, coupling an integrated circuit die over the mask coating, and disposing a molding compound around the integrated circuit die. The method includes forming an interconnect structure over the integrated circuit die and the molding compound. | 06-30-2016 |
20160197033 | COMPOUND CARRIER BOARD STRUCTURE OF FLIP-CHIP CHIP-SCALE PACKAGE AND MANUFACTURING METHOD THEREOF | 07-07-2016 |
20160197052 | BUMP-EQUIPPED ELECTRONIC COMPONENT AND METHOD FOR MANUFACTURING BUMP-EQUIPPED ELECTRONIC COMPONENT | 07-07-2016 |
20160197055 | 3D INTEGRATED CIRCUIT (3DIC) STRUCTURE AND METHOD OF MAKING SAME | 07-07-2016 |
20160204075 | Semiconductor chip and method of processing a semiconductor chip | 07-14-2016 |
20160204076 | Integrated Circuit Structure Having Dies with Connectors | 07-14-2016 |
20160254204 | PACKAGED SEMICONDUCTOR COMPONENTS HAVING SUBSTANTIALLY RIGID SUPPORT MEMBERS AND METHODS OF PACKAGING SEMICONDUCTOR COMPONENTS | 09-01-2016 |
20160254241 | PRINTED CIRCUIT BOARD AND SOLDERING METHOD | 09-01-2016 |
20160254252 | SYSTEMS AND METHODS FOR BONDING SEMICONDUCTOR ELEMENTS | 09-01-2016 |
20160379910 | SEMICONDUCTOR PACKAGE AND METHOD FOR MANUFACTURING THE SAME - The present disclosure relates to a semiconductor package and a method for manufacturing the same. The semiconductor package includes a substrate, a package body and at least two connecting elements. The substrate has a first surface. The package body is disposed adjacent to the first surface of the substrate, and the package body defines a groove having a substantially flat bottom surface. The connecting elements are disposed adjacent to the first surface of the substrate. A portion of each of the connecting elements is within the package body, and another portion of each of the connecting elements protrudes from the substantially flat bottom surface of the groove. | 12-29-2016 |
20160379915 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device and a method of manufacturing a semiconductor device. As a non-limiting example, various aspects of this disclosure provide a semiconductor device, and method of manufacturing thereof, that comprises a redistribution structure formed on a stiffening layer. | 12-29-2016 |
20160379945 | Semiconductor Device and Method of Manufacture Thereof - A semiconductor device and a method of making a semiconductor device are disclosed. The semiconductor device comprises a redistribution layer arranged over a chip, the redistribution layer comprising a first redistribution line. The semiconductor further comprises an isolation layer disposed over the redistribution layer, the isolation layer having a first opening forming a first pad area and a first interconnect located in the first opening and in contact with the first redistribution line. | 12-29-2016 |
20160379947 | Semiconductor Device with Metal Structure Electrically Connected to a Conductive Structure - A semiconductor device includes a semiconductor die that having a conductive structure. A metal structure is electrically connected to the conductive structure and contains a first metal. An auxiliary layer stack is sandwiched between the conductive structure and the metal structure and includes an adhesion layer that contains a second metal. The auxiliary layer stack further includes a metal diffusion barrier layer between the adhesion layer and the conductive structure. The adhesion layer contains the first metal and a second metal. | 12-29-2016 |
20160379949 | Electronic Element and Manufacturing Method - An electronic element for an electronic apparatus includes a substrate; a bump, disposed on the substrate for electrically connecting the electronic apparatus; and at least one under bump metal layer, disposed between the bump and the substrate for the bump to be attached to the substrate; wherein the UBM layer forms a breach structure. | 12-29-2016 |
20160379950 | DOUBLE PLATED CONDUCTIVE PILLAR PACKAGE SUBSATRATE - The present disclosure relates to a package substrate. The package substrate includes a patterned conductive layer and conductive pillars. Each of the conductive pillars includes a first portion and a second portion, where the first portion contacts the patterned conductive layer at one end of the first portion, and the second portion is adjacent to another end of the first portion. A thickness of the first portion is greater than a thickness of the second portion. Side surfaces of the first portion are substantially coplanar to side surfaces of the second portion. | 12-29-2016 |
20160379955 | Flip Chip Packaging - An integrated circuit (IC) package includes a first substrate; a second substrate disposed over the first substrate; a plurality of connectors disposed between the first and second substrates such to electrically couple the first and second substrate; a constraint layer disposed over the first and second substrates such that a cavity is formed between the constraint layer and the first substrate; and a molding material disposed within the cavity and extending through the constraint layer. The constraint layer has a top surface and an opposing bottom surface and the molding material extends from the top surface to the bottom surface of the constraint layer. | 12-29-2016 |
20160379957 | SUBSTRATE FOR MOUNTING A CHIP AND CHIP PACKAGE USING THE SUBSTRATE - Disclosed is a chip-mounting substrate. The chip-mounting substrate includes a plurality of conductive portions configured to apply voltages to at least two or more chips to be mounted, a plurality of insulation portions formed between the conductive portions and configured to electrically isolate the conductive portions, and a cavity formed in a region which includes at least three or more of the conductive portions and at least two or more of the insulation portions and depressed inward to form a space in which the chips are mounted. | 12-29-2016 |
20170236795 | CONNECTION BODY | 08-17-2017 |
20170236802 | Semiconductor Device and Method of Making Wafer Level Chip Scale Package | 08-17-2017 |
20170236810 | ELECTRONIC DEVICE | 08-17-2017 |
20180025959 | Integrated Circuit Packages and Methods for Forming the Same | 01-25-2018 |
20180025966 | INTEGRATED FAN-OUT PACKAGE AND METHOD OF FABRICATING THE SAME | 01-25-2018 |
20180026004 | BONDING WIRE, WIRE BONDING METHOD USING THE BONDING WIRE, AND ELECTRICAL CONNECTION PART OF SEMICONDUCTOR DEVICE USING THE BONDING WIRE | 01-25-2018 |
20190148267 | Semiconductor Package and Method | 05-16-2019 |
20190148279 | ELECTRONICS PACKAGE HAVING A SELF-ALIGNING INTERCONNECT ASSEMBLY AND METHOD OF MAKING SAME | 05-16-2019 |
20190148314 | SEMICONDUCTOR DEVICES WITH POST-PROBE CONFIGURABILITY | 05-16-2019 |
20190148317 | PACKAGE STRUCTURE WITH PROTRUSION STRUCTURE | 05-16-2019 |
20190148325 | ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING THE SAME | 05-16-2019 |
20190148326 | SEMICONDUCTOR DEVICES AND SEMICONDUCTOR PACKAGES | 05-16-2019 |
20190148327 | DRIVING CHIP, DISPLAY SUBSTRATE, DISPLAY DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE | 05-16-2019 |
20190148328 | CHIP-ON-CHIP STRUCTURE AND METHODS OF MANUFACTURE | 05-16-2019 |
20190148340 | PACKAGE STRUCTURE AND METHOD OF MANUFACTURING THE SAME | 05-16-2019 |
20220139838 | PAD STRUCTURE FOR ENHANCED BONDABILITY - Various embodiments of the present application are directed towards a pad with high strength and bondability. In some embodiments, an integrated chip comprises a substrate, an interconnect structure, a pad, and a conductive structure. The interconnect structure adjoins the substrate and comprises wires and vias. The wires and the vias are stacked between the pad and the substrate. The conductive structure (e.g., a wire bond) extends through the substrate to the pad. By arranging the wires and the vias between the pad and the substrate, the pad may be inset into a passivation layer of the interconnect structure and the passivation layer may absorb stress on the pad. Further, the pad may contact the wires and the vias at a top wire level. A thickness of the top wire level may exceed a thickness of other wire levels, whereby the top wire level may be more tolerant to stress. | 05-05-2022 |
20220139858 | PILLAR BUMP WITH NOBLE METAL SEED LAYER FOR ADVANCED HETEROGENEOUS INTEGRATION - A pillar bump structure, and a method for forming the same includes forming, on a semiconductor substrate, a blanket liner followed by a seed layer including a noble metal. A first photoresist layer is formed directly above the seed layer followed by the formation of a first plurality of openings within the photoresist layer. A first conductive material is deposited within each of the first plurality of openings to form first pillar bumps. The first photoresist layer is removed from the semiconductor structure followed by removal of portions of the seed layer extending outward from the first pillar bumps, a portion of the seed layer remains underneath the first pillar bumps. | 05-05-2022 |
20220139862 | RF DEVICES WITH ENHANCED PERFORMANCE AND METHODS OF FORMING THE SAME - The present disclosure relates to a radio frequency (RF) device that includes a mold device die and a multilayer redistribution structure underneath the mold device die. The mold device die includes a device region with a back-end-of-line (BEOL) portion and a front-end-of-line (FEOL) portion over the BEOL portion, and a first mold compound. The FEOL portion includes an active layer formed from a strained silicon epitaxial layer, in which a lattice constant is greater than 5.461 at a temperature of 300K. The first mold compound resides over the active layer. Herein, silicon crystal does not exist between the first mold compound and the active layer. The multilayer redistribution structure includes a number of bump structures, which are at a bottom of the multilayer redistribution structure and electrically coupled to the FEOL portion of the mold device die. | 05-05-2022 |