| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 850021000 |
PARTICULAR TYPE OF SCANNING PROBE MICROSCOPY [SPM] OR MICROSCOPE; ESSENTIAL COMPONENTS THEREOF
| 212 |
| 850021000 |
PARTICULAR TYPE OF SCANNING PROBE MICROSCOPY [SPM] OR MICROSCOPE; ESSENTIAL COMPONENTS THEREOF (EPO)
| 212 |
| 850001000 |
SCANNING OR POSITIONING ARRANGEMENTS, I.E., ARRANGEMENTS FOR ACTIVELY CONTROLLING THE MOVEMENT OR POSITION OF THE PROBE (EPO)
| 116 |
| 850001000 |
SCANNING OR POSITIONING ARRANGEMENTS, I.E., ARRANGEMENTS FOR ACTIVELY CONTROLLING THE MOVEMENT OR POSITION OF THE PROBE
| 116 |
| 850005000 |
MONITORING THE MOVEMENT OR POSITION OF THE PROBE RESPONSIVE TO INTERACTION WITH THE SAMPLE (EPO)
| 75 |
| 850005000 |
MONITORING THE MOVEMENT OR POSITION OF THE PROBE RESPONSIVE TO INTERACTION WITH THE SAMPLE
| 75 |
| 850052000 |
GENERAL ASPECTS OF SPM PROBES, THEIR MANUFACTURE, OR THEIR RELATED INSTRUMENTATION, INSOFAR AS THEY ARE NOT SPECIALLY ADAPTED TO A SINGLE SPECIFIC SPM TECHNIQUE
| 74 |
| 850052000 |
GENERAL ASPECTS OF SPM PROBES, THEIR MANUFACTURE, OR THEIR RELATED INSTRUMENTATION, INSOFAR AS THEY ARE NOT SPECIALLY ADAPTED TO A SINGLE SPECIFIC SPM TECHNIQUE (EPO)
| 74 |
| 850008000 |
AUXILIARY MEANS SERVING TO ASSIST OR IMPROVE THE SCANNING PROBE TECHNIQUES OR APPARATUS, E.G., DISPLAY OR DATA PROCESSING DEVICES
| 52 |
| 850008000 |
AUXILIARY MEANS SERVING TO ASSIST OR IMPROVE THE SCANNING PROBE TECHNIQUES OR APPARATUS, E.G., DISPLAY OR DATA PROCESSING DEVICES (EPO)
| 52 |
| 850019000 |
CALIBRATION ASPECT, E.G., CALIBRATION OF PROBES
| 8 |
| 850019000 |
CALIBRATION ASPECT, E.G., CALIBRATION OF PROBES (EPO)
| 8 |
| 850062000 |
APPLICATIONS OF SCANNING-PROBE TECHNIQUES OTHER THAN SPM
| 7 |
| 850062000 |
APPLICATIONS OF SCANNING-PROBE TECHNIQUES OTHER THAN SPM (EPO)
| 7 |
| 850063000 |
SCANNING-PROBE TECHNIQUES OR APPARATUS NOT OTHERWISE PROVIDED FOR | 2 |
| 20090055977 | SCANNING NANOTUBE PROBE DEVICE AND ASSOCIATED METHOD - A method and device are provided for determining, without contact, the physical and electrical properties of nanotube materials. The device includes a scanning probe configured to generate a signal of certain frequency onto the nanotube material and measure a reflected signal from the nanotube material, and a processor coupled to the scanning probe and configured to determine the physical and electrical properties of the nanotube material from the measured reflected signal. The method includes positioning a scanning probe relative to the nanotube material, generating a signal of certain frequency onto the nanotube material, and measuring a reflected signal from the nanotube material. | 02-26-2009 |
| 20120297510 | Cleaning Station for Atomic Force Microscope - A cleaning station for thoroughly cleaning the AFM component surfaces that are exposed to fluid during imaging of a sample supported in a fluid medium is disclosed. The cleaning station is designed to selectively expose the AFM component surfaces to cleansing agents, such as soap/detergent and water, plasma cleaning, etc., and cleaning tools, such as brushes, while protecting fluid sensitive components from exposure to the cleansing agents. The preferred embodiments are particularly beneficial for scanners in which the fluid sensitive components (actuator, sensor, connector, etc.) are integrated in the same device to which the cantilever holder is attached. | 11-22-2012 |
| 20090055977 | SCANNING NANOTUBE PROBE DEVICE AND ASSOCIATED METHOD - A method and device are provided for determining, without contact, the physical and electrical properties of nanotube materials. The device includes a scanning probe configured to generate a signal of certain frequency onto the nanotube material and measure a reflected signal from the nanotube material, and a processor coupled to the scanning probe and configured to determine the physical and electrical properties of the nanotube material from the measured reflected signal. The method includes positioning a scanning probe relative to the nanotube material, generating a signal of certain frequency onto the nanotube material, and measuring a reflected signal from the nanotube material. | 02-26-2009 |
| 20120297510 | Cleaning Station for Atomic Force Microscope - A cleaning station for thoroughly cleaning the AFM component surfaces that are exposed to fluid during imaging of a sample supported in a fluid medium is disclosed. The cleaning station is designed to selectively expose the AFM component surfaces to cleansing agents, such as soap/detergent and water, plasma cleaning, etc., and cleaning tools, such as brushes, while protecting fluid sensitive components from exposure to the cleansing agents. The preferred embodiments are particularly beneficial for scanners in which the fluid sensitive components (actuator, sensor, connector, etc.) are integrated in the same device to which the cantilever holder is attached. | 11-22-2012 |
| 850063000 |
SCANNING-PROBE TECHNIQUES OR APPARATUS NOT OTHERWISE PROVIDED FOR (EPO) | 2 |
| 20090055977 | SCANNING NANOTUBE PROBE DEVICE AND ASSOCIATED METHOD - A method and device are provided for determining, without contact, the physical and electrical properties of nanotube materials. The device includes a scanning probe configured to generate a signal of certain frequency onto the nanotube material and measure a reflected signal from the nanotube material, and a processor coupled to the scanning probe and configured to determine the physical and electrical properties of the nanotube material from the measured reflected signal. The method includes positioning a scanning probe relative to the nanotube material, generating a signal of certain frequency onto the nanotube material, and measuring a reflected signal from the nanotube material. | 02-26-2009 |
| 20120297510 | Cleaning Station for Atomic Force Microscope - A cleaning station for thoroughly cleaning the AFM component surfaces that are exposed to fluid during imaging of a sample supported in a fluid medium is disclosed. The cleaning station is designed to selectively expose the AFM component surfaces to cleansing agents, such as soap/detergent and water, plasma cleaning, etc., and cleaning tools, such as brushes, while protecting fluid sensitive components from exposure to the cleansing agents. The preferred embodiments are particularly beneficial for scanners in which the fluid sensitive components (actuator, sensor, connector, etc.) are integrated in the same device to which the cantilever holder is attached. | 11-22-2012 |
| 20090055977 | SCANNING NANOTUBE PROBE DEVICE AND ASSOCIATED METHOD - A method and device are provided for determining, without contact, the physical and electrical properties of nanotube materials. The device includes a scanning probe configured to generate a signal of certain frequency onto the nanotube material and measure a reflected signal from the nanotube material, and a processor coupled to the scanning probe and configured to determine the physical and electrical properties of the nanotube material from the measured reflected signal. The method includes positioning a scanning probe relative to the nanotube material, generating a signal of certain frequency onto the nanotube material, and measuring a reflected signal from the nanotube material. | 02-26-2009 |
| 20120297510 | Cleaning Station for Atomic Force Microscope - A cleaning station for thoroughly cleaning the AFM component surfaces that are exposed to fluid during imaging of a sample supported in a fluid medium is disclosed. The cleaning station is designed to selectively expose the AFM component surfaces to cleansing agents, such as soap/detergent and water, plasma cleaning, etc., and cleaning tools, such as brushes, while protecting fluid sensitive components from exposure to the cleansing agents. The preferred embodiments are particularly beneficial for scanners in which the fluid sensitive components (actuator, sensor, connector, etc.) are integrated in the same device to which the cantilever holder is attached. | 11-22-2012 |
