| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 501054000 | More than 90 percent by weight silica | 20 |
| 20080274869 | Quartz Glass Blank and Method for Producing Said Blank - The present invention relates to a quartz glass blank for an optical component for transmitting radiation of a wavelength of 15 nm and shorter, the blank consisting of highly pure quartz glass, doped with titanium and/or fluorine, which is distinguished by an extremely high homogeneity. The homogeneity relates to the following features:
| 11-06-2008 |
| 20080305940 | TITANIA-DOPED QUARTZ GLASS FOR NANOIMPRINT MOLDS - In the nanoimprint lithography, titania-doped quartz glass having an internal transmittance distribution of up to 10% at wavelength 365 nm is suited for use as nanoimprint molds. | 12-11-2008 |
| 20080305941 | TITANIA-DOPED QUARTZ GLASS FOR NANOIMPRINT MOLDS - In the nanoimprint lithography, a titania-doped quartz glass having a CTE of −300 to 300 ppb/° C. between 0° C. and 250° C. and a CTE distribution of up to 100 ppb/° C. at 25° C. is suited for use as nanoimprint molds. | 12-11-2008 |
| 20090203512 | HALIDE FREE GLASSES HAVING LOW OH, OD CONCENTRATIONS - A fused silica glass having a refractive index homogeneity of less or equal to about 5 ppm over an aperture area of at least about 50 cm | 08-13-2009 |
| 20100105537 | Extruded Glass Structures and Methods for Manufacturing the Same - Methods for preparing glass structures include extruding a glass precursor, the glass precursor having a composition in the range of 55%-75% SiO | 04-29-2010 |
| 20100179047 | OPTICAL MEMBER COMPRISING TIO2-CONTAINING SILICA GLASS - The present invention relates to an optical member including a TiO | 07-15-2010 |
| 20100317505 | TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME - The present invention is to provide a TiO | 12-16-2010 |
| 20110207592 | Low Expansivity, High Transmission Titania Doped Silica Glass - In one embodiment the present disclosure is directed to a silica-titania glass with an internal transmission of >90%/cm at wavelengths from 340 nm to 840 nm. In another embodiment the internal transmission is >93%/cm at wavelengths from 340 nm to 840 nm. In a further embodiment the internal transmission is >95%/cm at wavelengths from 340 nm to 840 nm. In another embodiment the disclosure is directed to a silica-titania glass with an overall transmission through an optic made of the glass is >84% at wavelengths from 340 nm to 840 nm. In another embodiment overall transmission through an optic made of the glass is >86% at wavelengths from 340 nm to 840 nm. In a further embodiment the overall transmission through an optic made of the glass is >88% at wavelengths from 330 nm to 840 nm. In a further embodiment the silica-titania glass has a Ti | 08-25-2011 |
| 20110207593 | Expansivity in Low Expansion Silica-Titania Glasses - This disclosure is directed to tailoring and improving the expansivity of low thermal expansion silica-titania glass through changes in the [OH] content and fictive temperature of the glasses. The [OH] concentration in the glass can be in the range of 600-2500 ppm. The fictive temperature, T | 08-25-2011 |
| 20120149543 | TIO2-CONTAINING SILICA GLASS, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY - The present invention relates to a TiO | 06-14-2012 |
| 20120238434 | SILICA GLASS CONTAINING TIO2 - The present invention relates to a TiO | 09-20-2012 |
| 20130116108 | SILICA GLASS HAVING IMPROVED PROPERTIES - The invention relates to a silica glass compound having improved physical and chemical properties. In one embodiment, the present invention relates to a silica glass having a desirable brittleness in combination with a desirable density while still yielding a glass composition having a desired hardness and desired strength relative to other glasses. In another embodiment, the present invention relates to a silica glass composition that contains at least about 85 mole percent silicon dioxide and up to about 15 mole percent of one or more dopants selected from F, B, N, Al, Ge, one or more alkali metals (e.g., Li, Na, K, etc.), one or more alkaline earth metals (e.g., Mg, Ca, Sr, Ba, etc.), one or more transition metals (e.g., Ti, Zn, Y, Zr, Hf, etc.), one or more lanthanides (e.g., Ce, etc.), or combinations of any two or more thereof. | 05-09-2013 |
| 20140066286 | NIOBIUM DOPED SILICA TITANIA GLASS AND METHOD OF PREPARATION - This disclosure is directed to a silica-titania-niobia glass and to a method for making the glass. The composition of the silica-titania-niobia (SiO | 03-06-2014 |
| 20140155246 | VERY LOW CTE SLOPE DOPED SILICA-TITANIA GLASS - The present disclosure is directed to a doped silica-titania glass, DST glass, consisting essentially of 0.1 wt. % to 5 wt. % halogen, 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiO | 06-05-2014 |
| 20150080206 | ULTRALOW EXPANSION GLASS - Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750° C.-950° C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650° C.-875° C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition. | 03-19-2015 |
| 20150376049 | BLANK OF TIO2-SIO2 GLASS FOR A MIRROR SUBSTRATE FOR USE IN EUV LITHOGRAPHY AND METHOD FOR THE PRODUCTION THEREOF - A blank of TiO | 12-31-2015 |
| 20160016839 | METHOD FOR THE MANUFACTURE OF DOPED QUARTZ GLASS - One aspect relates to a method for the manufacture of doped quartz glass. Moreover, one aspect relates to quartz glass obtainable according to the method including providing a soot body, treating the soot body with a gas, heating an intermediate product and vitrifying an intermediate product. | 01-21-2016 |
| 20160096765 | METHOD FOR THE MANUFACTURE OF SYNTHETIC QUARTZ GLASS - One aspect relates to a method for the production of synthetic quartz glass. Moreover, one aspect relates to a polyalkylsiloxane compound, which includes certain specifications with respect to chlorine content, metallic impurities content, and residual moisture, as well as the use thereof for the production of synthetic quartz glass. One aspect also relates to a synthetic quartz glass that can be obtained according to the method of one embodiment. | 04-07-2016 |
| 20160137545 | HIGH HYDROXYL TIO2-SIO2 GLASS - Ultralow expansion titania-silica glass. The glass has high hydroxyl content and optionally include one or more dopants. Representative optional dopants include boron, alkali elements, alkaline earth elements or metals such as Nb, Ta, Al, Mn, Sn Cu and Sn. The glass is prepared by a process that includes steam consolidation to increase the hydroxyl content. The high hydroxyl content or combination of dopant(s) and high hydroxyl content lowers the fictive temperature of the glass to provide a glass having a very low coefficient of thermal expansion (CTE), low fictive temperature (T | 05-19-2016 |
| 20160168010 | DOPED ULTRA-LOW EXPANSION GLASS AND METHODS FOR MAKING THE SAME | 06-16-2016 |
