| Entries |
| Document | Title | Date |
|---|
| 20080287279 | Glasses having low OH, OD levels - A fused silica glass and a fused silica article having a combined concentration of at least one of OH and OD of up to about 50 ppm. The fused silica glass is formed by drying a fused silica soot blank or preform in an inert atmosphere containing a drying agent, followed by removal of residual drying agent from the dried soot blank by heating the dried soot blank in an atmosphere comprising an inert gas and of oxygen. | 11-20-2008 |
| 20090029842 | Fused silica having low OH, OD levels and method of making - A fused silica article having a combined concentration of hydroxyl (OH) and deuteroxyl (OD) concentration of less than 10 parts per million (ppm) and, in one embodiment, less than 1 ppm. The fused silica article is formed by drying a soot blank in a halogen-free atmosphere comprising carbon monoxide. The dried soot blank may optionally be doped to reach target levels of OH and OD concentrations and improve homogeneity within the fused silica article. The dried soot blank is then oxidized and, sintered to form the article. A method of reducing the combined concentration of OH and OD to less than 10 ppm is also described. | 01-29-2009 |
| 20090036289 | Optical composite material and method for its production - An optical composite material comprises an amorphous optical material ( | 02-05-2009 |
| 20090042709 | PROCESS FOR PREPARING BATCH MATERIALS FOR THE MANUFACTURE OF GLASS - The invention relates to a process for manufacturing compounds based on one or more silicates of alkali metals and/or of alkaline-earth metals, optionally in the form of mixed silicates that combine at least two of these elements, said process involving:
| 02-12-2009 |
| 20090062101 | OPTICAL GLASS - An optical glass of the present invention has optical constants of a refractive index (nd) within a range from 1.75 to 1.85 and an Abbe number (ν d) within a range from 35 to 45, comprises SiO | 03-05-2009 |
| 20090082189 | Optical glass - An optical glass having a refractive index (nd) within a range from 1.825 to 1.870, an Abbe number (νd) within a range from 22 to less than 27, a transformation temperature (Tg) within a range from 530° C. to 585° C. and an mean coefficient of linear thermal expansion (α) within a range from 80×10 | 03-26-2009 |
| 20090099000 | Vial and Method for Producing the Same - To provide a vial with low alkali elution and a method for producing the same by removing a deteriorated region caused by processing on an internal surface of a vial. A vial with reduced alkali elution and a method for producing the same by forming vials from borosilicate glass tubes comprises a first step of forming a borosilicate glass tube into a cup-shaped body by formation of a bottom of a vial, and a second step of forming the cup-shaped body into the vial by formation of a mouth of the cup-shaped body. Further provided is a vial with reduced alkali elution and a method for producing the same by forming vials from borosilicate glass tubes, which comprises a first step of forming a borosilicate glass tube into a cup-shaped body to form a bottom of a vial; a second step of fire-blasting an internal surface of said cup-shaped body by a certain length from the bottom toward an opening of said cup-shaped body with flames to remove a deteriorated region caused by processing; and a third step of forming a mouth of said cup-shaped body to complete a vial with reduced alkali elution. | 04-16-2009 |
| 20090143213 | LOW EXPANSION GLASS MATERIAL HAVING LOW EXPANSIVITY GRADIENT - A low expansion glass substrate includes titania and silica and has a thermal expansivity with an average gradient less than 1 ppb/° C./° C. in a temperature range of 19° C. to 25° C. | 06-04-2009 |
| 20090163344 | Component of Quartz Glass for Use in Semiconductor Manufacture and Method for Producing the Same - The invention starts from a known component of quartz glass for use in semiconductor manufacture, which component at least in a near-surface region shows a co-doping of a first dopant and of a second oxidic dopant, said second dopant containing one or more rare-earth metals in a concentration of 0.1-3% by wt. each (based on the total mass of SiO | 06-25-2009 |
| 20090203511 | SYNTHETIC SILICA GLASS OPTICAL MATERIAL HAVING HIGH RESISTANCE TO LASER INDUCED DAMAGE - Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength less than about 250 nm and particularly, exhibiting a low laser induced wavefront distortion; specifically a laser induced wavefront distortion, measured at 633 nm, of between about −1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70 μJ/cm | 08-13-2009 |
| 20090239733 | Methods of heat-treating soda-lime glass substrates and heat-treated soda-lime glass substrates formed using the same - A soda-lime glass substrate formed through a heat-treatment method has an absorption coefficient ranging from about 0.15 λ,W/m·K to about 0.54 λ,W/m·K, and a free path length ranging from about 0.12 cm to about 0.24 cm. The heat-treated soda-lime glass substrate is formed by heating for a selected time at a pre-specified maximum temperature of about 270° C. to about 330° C. so as to remove thermally induced residual deformations from the substrate and then the substrate is slowly cooled so as to substantially avoid reintroducing thermally induced residual deformations into the cooling substrate. Thus, the soda-lime glass substrate is transformed to one at or close to its contraction saturation point. This allows the heat-treated soda-lime glass substrate to serve in a practical way as a substrate of a flat display panel. | 09-24-2009 |
| 20090258777 | SYSTEM AND METHOD FOR TREATING FLY ASH - A method and system for treating fly ash with a treating fluid by evenly dispersing a treating fluid into a flowing stream of fly ash. By dispersing the treating fluid into the fly ash as the fly ash is flowing, the method takes advantage of natural mixing and particle motion that occurs during flow of the bulk solid. The application of treating fluid is advantageously controlled by an automated controller that has inputs and outputs that allow the controller to adjust flow rate of the treating fluid in correspondence with a measured flow rate of the fly ash. | 10-15-2009 |
| 20090318279 | Low alkali, non-crystalline, vitreous silica fillers - A substantially white powder for use as a filler and/or extender derived from by-products of manufacturing vitreous low alkali, low iron glass fibers, and a method for producing the powder. The filler has very low alkalinity and by virtue of its being essentially free of crystalline silica is non-hazardous to health and therefore safe for consumer-based and industrial-based uses. | 12-24-2009 |
| 20100004113 | SYNTHETIC SILICA HAVING LOW POLARIZATION-INDUCED BIREFRINGENCE, METHOD OF MAKING SAME AND LITHOGRAPHIC DEVICE COMPRISING SAME - Disclosed are synthetic silica glass having a low polarization-induced birefringence, process for making the glass and lithography system comprising optical element made of the glass. The silica glass has a polarization-induced birefringence measured at 633 nm of less than about 0.1 nm/cm when subjected to excimer laser pulses at about 193 nm having a fluence of about 40 μJ·cm | 01-07-2010 |
| 20100041538 | FUSED SILICA GLASS AND PROCESS FOR PRODUCING THE SAME - Fused silica glass having an internal transmittance of UV with 245 nm wavelength, being at least 95% at 10 mm thickness, a OH content of not larger than 5 ppm, and a content of Li, Na, K, Mg, Ca and Cu each being smaller than 0.1 ppm. Preferably the glass has a viscosity coefficient at 1215° C. of at least 10 | 02-18-2010 |
| 20100056353 | METHOD AND SYSTEM FOR PRODUCING FLUORIDE GAS AND FLUORINE-DOPED GLASS OR CERAMICS - The present invention relates generally to production of a fluoride gas and equivalents thereof, and fluorine-doped sodium silicate glass, glass ceramics, vitro ceramics and equivalents thereof. In one embodiment, the method includes providing a salt and an oxide in a reactor, heating the reactor to produce a vapor and the vitro ceramic and removing the vapor. | 03-04-2010 |
| 20100167906 | PROCESS OF MAKING A DENSE SYNTHETIC SILICA GLASS, A MUFFLE FURNACE FOR PERFORMING THE PROCESS, AND SILICA GLASS OBTAINED FROM SAID PROCESS - The process of making synthetic silica glass occurs in a combustion chamber of a muffle furnace. It includes producing a gas flow containing a fuel, an oxidizer, and a silicon compound that is converted by flame hydrolysis and/or by chemical oxidation to SiO | 07-01-2010 |
| 20100197477 | ALKALI-FREE GLASSES CONTAINING IRON AND TIN AS FINING AGENTS - Alkali-free glasses are disclosed which can be used to produce substrates for flat panel display devices, e.g., active matrix liquid crystal displays (AMLCDs). The glasses contain iron and tin as fining agents, and preferably are substantially free of arsenic and antimony. In certain embodiments, the glasses are also substantially free of barium. Methods for producing alkali-free glass sheets using a downdraw process (e.g., a fusion process) are also disclosed. | 08-05-2010 |
| 20100234205 | TiO2-containing quartz glass substrate - An object of the present invention is to provide a TiO | 09-16-2010 |
| 20100261597 | TIO2-CONTAINING SILICA GLASS - The present invention is to provide a TiO | 10-14-2010 |
| 20100292068 | Method for producing glass for display substrate - A method of producing a glass having a SiO | 11-18-2010 |
| 20100323871 | TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING HIGH ENERGY DENSITIES AS WELL AS SPECIAL TEMPERATURE CONTROLLED PROCESS FOR ITS MANUFACTURE - The present invention provides a TiO | 12-23-2010 |
| 20100323872 | TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING THE SAME - The present invention provides a TiO | 12-23-2010 |
| 20100323873 | TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR LITHOGRAPHY USING THE SAME - The present invention provides a TiO | 12-23-2010 |
| 20110021339 | Silica Glass With Saturated Induced Absorption and Method of Making - A silica glass article, such as a lens in a stepper/scanner system, having saturated induced absorption at wavelengths of less than about 250 nm. Saturated induced absorption is achieved by first removing Si—O defects in the silica glass by forming silicon hydride (SiH) at such defects, and loading the silica glass with hydrogen to react with E′ centers formed by photolysis of SiH in the silica glass article. The silicon hydride is formed by loading the silica glass with molecular hydrogen at temperatures of at least 475° C. After formation of SiH, the silica glass is loaded with additional molecular hydrogen at temperatures of less than 475° C. | 01-27-2011 |
| 20110028299 | TIO2-CONTAINING SILICA GLASS FOR OPTICAL MEMBER FOR EUV LITHOGRAPHY - The present invention provides a TiO | 02-03-2011 |
| 20110059837 | METHOD FOR PRODUCING SYNTHETIC QUARTZ GLASS - In a known exterior deposition method for producing synthetic quartz glass, amorphous quartz glass powder particles ( | 03-10-2011 |
| 20110092354 | SYNTHETIC SILICA GLASS WITH UNIFORM FICTIVE TEMPERATURE - A method of making a silica glass having a uniform fictive temperature. The glass article is heated at a target fictive temperature, or heated or cooled at a rate that is less than the rate of change of the fictive temperature, for a time that is sufficient to allow the fictive temperature of the glass to come within 3° C. of the target fictive temperature. The silica glass is then cooled from the target fictive temperature to a temperature below the strain point of the glass at a cooling rate that is greater than the relaxation rate of the glass at the target fictive temperature. The silica glass has a fictive temperature that varies by less than 3° C. after the annealing step. A silica glass made by the method is also described. | 04-21-2011 |
| 20110130265 | SYNTHETIC SILICA GLASS MOLDED BODY, METHOD OF MOLDING THE SAME, AND METHOD OF INSPECTING SYNTHETIC SILICA GLASS MOLDED BODY - A method of molding a synthetic silica glass molded body by accommodating a synthetic silica glass block in a mold provided with a pressing portion, and by pressing the block while heating, the method comprising:
| 06-02-2011 |
| 20110301015 | PROCESS FOR PRODUCING POROUS QUARTZ GLASS OBJECT, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY - The present invention relates to a process for producing a porous quarts glass body containing hydrolyzing a metal dopant precursor and an SiO | 12-08-2011 |
| 20120264583 | SODA LIME SILICA GLASS COMPOSITION - A soda lime silica glass having a colourant portion falling within one of the following combinations of ranges: | 10-18-2012 |
| 20120264584 | SUBSTRATE FOR EUVL OPTICAL MEMBER - The present invention relates to a substrate for EUV lithography optical member, comprising a silica glass containing TiO | 10-18-2012 |
| 20120289393 | Method for Producing Ulta-Low-Expansion Glass | 11-15-2012 |
| 20130045854 | MANUFACTURE OF SYNTHETIC SILICA GLASS - Methods are described for manufacturing silica-based glass, in which silica precursor material is supplied to a synthesis flame in the form of an emulsion. The methods involve the steps of: forming an emulsion of an aqueous phase in a non-aqueous liquid silica precursor material; supplying the emulsion as a spray of droplets into a synthesis flame, whereby the precursor material is converted in the flame into a silica-containing soot; and collecting the soot on a substrate, either as a porous soot body for subsequent consolidation to glass or directly as a substantially pore-free glass. | 02-21-2013 |
| 20130059717 | Method of strengthening glass by plasma induced ion exchanges in connection with tin baths, and articles made according to the same - Certain example embodiments relate to an improved method of strengthening glass substrates (e.g., soda lime silica glass substrates). In certain examples, a glass substrate may be chemically strengthened by creating an electric field within the glass. In certain cases, the chemical tempering may be performed by surrounding the substrate by a plasma including certain ions, such as Li | 03-07-2013 |
| 20130123092 | TIO2-CONTAINING QUARTZ GLASS SUBSTRATE AND METHOD FOR PRODUCING SAME - The present invention relates to a TiO | 05-16-2013 |
| 20130316890 | METHOD FOR PRODUCING SILICA GLASS BODY CONTAINING TITANIA, AND SILICA GLASS BODY CONTAINING TITANIA - The present invention relates to a method for producing a silica glass body containing titania, containing: a flame hydrolysis step of feeding a silica (SiO | 11-28-2013 |
| 20140018229 | NANOIMPRINT MOLD-FORMING SYNTHETIC QUARTZ GLASS AND MAKING METHOD - Synthetic quartz glass is prepared by subjecting a silicon-providing feedstock to flame hydrolysis in oxyhydrogen flame, depositing silica fine particles on a rotating quartz glass target while concurrently melting and vitrifying them, thereby forming a synthetic quartz glass ingot, shaping, annealing, and effecting dehydrogenation treatment at a temperature of at least 600° C. and a pressure of up to 5 Pa for a holding time of at least 12 hours. The synthetic quartz glass has a high helium gas permeability and is suited for forming nanoimprint molds. | 01-16-2014 |
| 20140194271 | TUNING Tzc BY THE ANNEALING OF ULTRA LOW EXPANSION GLASS - The disclosure describes a silica-titania glass having a selected titania content in the range of 5-20 wt % that has zero crossover temperature (Tzc) associated with the selected titania content withing this range, and the Tzc is adjustable by ±10° C. or less. The disclosure also describes a method by which the Tzc of a silica-titania glass article, for example, a mirror substrate, can be tuned to within a specification range by means of a selected final anneal that shifts Tzc of the article or substrate to the desired Tzc value. In addition, since different mirrors in a set can be specified at different values of Tzc, this process the method can be on used glass samples or pieces from a single glass boule to make parts with different Tzc values, thus reducing the number of separate boules required to fill an order. | 07-10-2014 |
| 20150299017 | Process for Melting and Refining Soda-Lime Glass - A process for making soda-lime glass includes forming and refining sodium silicate glass in liquid phase. At least one other material is dissolved in the refined liquid phase sodium silicate glass to produce a liquid phase soda-lime glass melt. Formation of sodium silicate glass as an intermediate product before mixing with at least one other glass-forming material has the advantage of promoting release of gaseous reaction products from the sodium silicate glass during the refining step due at least in part to the relatively low viscosity of the sodium silicate glass. One or more steps in the process can be carried out under reduced pressure to promote release of gases and to reduce bubble formation. | 10-22-2015 |
| 20150343411 | SYSTEM AND PROCESS FOR DISSOLUTION OF SOLIDS - A system and process are disclosed for dissolution of solids and “difficult-to-dissolve” solids. A solid sample may be ablated in an ablation device to generate nanoscale particles. Nanoparticles may then swept into a coupled plasma device operating at atmospheric pressure where the solid nanoparticles are atomized. The plasma exhaust may be delivered directly into an aqueous fluid to form a solution containing the atomized and dissolved solids. The composition of the resulting solution reflects the composition of the original solid sample. | 12-03-2015 |
| 20150376048 | BLANK MADE OF TITANIUM-DOPED SILICA GLASS AND METHOD FOR THE PRODUCTION THEREOF - A blank made of titanium-doped silica glass for a mirror substrate for use in EUV lithography is provided. The blank includes a surface portion to be provided with a reflective film and having an optically used area (CA) over which a coefficient of thermal expansion (CTE) has a two-dimensional inhomogeneity (dCTE) distribution profile averaged over a thickness of the blank. A maximum inhomogeneity (dCTE | 12-31-2015 |
| 20160085145 | METHOD FOR PRODUCING A BLANK OF FLUORINE-DOPED AND TITANIUM-DOPED GLASS HAVING A HIGH SILICIC-ACID CONTENT AND A BLANK PRODUCED ACCORDING TO THE METHOD - A method for producing a silica glass blank co-doped with titanium and fluorine for use in EUV lithography includes (a) producing a TiO | 03-24-2016 |
| 20160185645 | METHOD FOR PRODUCING TITANIUM-DOPED SILICA GLASS FOR USE IN EUV LITHOGRAPHY AND BLANK PRODUCED IN ACCORDANCE THEREWITH | 06-30-2016 |
