Class / Patent application number | Description | Number of patent applications / Date published |
438129000 | With electrical circuit layout | 41 |
20080233685 | METHOD OF MANUFACTURE OF AN APPARATUS FOR INCREASING STABILITY OF MOS MEMORY CELLS - In deep submicron memory arrays there is noted a relatively steady on current value and, therefore, threshold values of the transistors comprising the memory cell are reduced. This, in turn, results in an increase in the leakage current of the memory cell. With the use of an ever increasing number of memory cells leakage current must be controlled. A method of manufacture of a dynamic threshold voltage control scheme implemented with no more than minor changes to the existing MOS process technology is disclosed. The disclosed invention controls the threshold voltage of MOS transistors. Methods for enhancing the impact of the dynamic threshold control technology using this apparatus are also included. The invention is particularly useful for SRAM, DRAM, and NVM devices. | 09-25-2008 |
20080242008 | METHOD OF MAKING THREE DIMENSIONAL NAND MEMORY - A method of making a monolithic, three dimensional NAND string, includes forming a select transistor, forming a first memory cell over a second memory cell, forming a first word line for the first memory cell, forming a second word line for the second memory cell, forming a bit line, forming a source line, and forming a select gate line for the select transistor. The first and the second word lines are not parallel to the bit line, and the first and the second word lines extend parallel to at least one of the source line and the select gate line. | 10-02-2008 |
20090155962 | Method for fabricating pitch-doubling pillar structures - A method of making a semiconductor device includes forming at least one device layer over a substrate, forming at least two spaced apart features over the at least one device layer, forming sidewall spacers on the at least two features, filling a space between a first sidewall spacer on a first feature and a second sidewall spacer on a second feature with a filler feature, selectively removing the sidewall spacers to leave the first feature, the filler feature and the second feature spaced apart from each other, and etching the at least one device layer using the first feature, the filler feature and the second feature as a mask. | 06-18-2009 |
20100015763 | RESCUE STRUCTURE AND METHOD FOR LASER WELDING - A rescue structure to repair an open wire includes a first metal layer having at least a rescue line, an isolation layer formed on the first metal layer, and a second metal layer formed on the isolation layer. The second metal layer has at least a signal line crossing the rescue line to form an enlarged intersection node. The intersection node is particularly arranged far from the side where the rescue line is used for signal transmission. | 01-21-2010 |
20100035386 | Method for forming semiconductor device having metallization comprising select lines, bit lines and word lines - A semiconductor device includes a semiconductor substrate including a first region having a cell region and a second region having a peripheral circuit region, first transistors on the semiconductor substrate, a first protective layer covering the first transistors, a first insulation layer on the first protective layer, a semiconductor pattern on the first insulation layer in the first region, second transistors on the semiconductor pattern, a second protective layer covering the second transistors, the second protective layer having a thickness greater than that of the first protective layer, and a second insulation layer on the second protective layer and the first insulation layer of the second region. | 02-11-2010 |
20100081238 | MIXED-SCALE ELECTRONIC INTERFACE - Embodiments of the present invention are directed to mixed-scale electronic interfaces, included in integrated circuits and other electronic devices, that provide for dense electrical interconnection between microscale features of a predominantly microscale or submicroscale layer and nanoscale features of a predominantly nanoscale layer. A method is provided for fabricating a nanoscale/microscale interface having a microscale layer and a predominantly nanoscale layer. | 04-01-2010 |
20100159648 | ELECTROPHOTOGRAPH PRINTED ELECTRONIC CIRCUIT BOARDS - The present invention provides a device for producing printed electronic circuits using electrophotography | 06-24-2010 |
20100173456 | Methods of Forming Field Effect Transistors, Methods of Forming Field Effect Transistor Gates, Methods of Forming Integrated Circuitry Comprising a Transistor Gate Array and Circuitry Peripheral to the Gate Array, and Methods of Forming Integrated Circuitry Comprising a Transistor Gate Array Including First Gates and Second Grounded Isolation Gates - The invention includes methods of forming field effect transistors, methods of forming field effect transistor gates, methods of forming integrated circuitry comprising a transistor gate array and circuitry peripheral to the gate array, and methods of forming integrated circuitry comprising a transistor gate array including first gates and second grounded isolation gates. In one implementation, a method of forming a field effect transistor includes forming masking material over semiconductive material of a substrate. A trench is formed through the masking material and into the semiconductive material. Gate dielectric material is formed within the trench in the semiconductive material. Gate material is deposited within the trench in the masking material and within the trench in the semiconductive material over the gate dielectric material. Source/drain regions are formed. Other aspects and implementations are contemplated. | 07-08-2010 |
20100184259 | METHOD FOR FABRICATING A 3-D INTEGRATED CIRCUIT USING A HARD MASK OF SILICON-OXYNITRIDE ON AMORPHOUS CARBON - A method for fabricating a 3-D monolithic memory device. Silicon-oxynitride (Si | 07-22-2010 |
20100210077 | CONFIGURABLE INTEGRATED CIRCUIT WITH BUILT-IN TURNS - Some embodiments of the invention provide configurable integrated circuits (“IC's”) with configurable node arrays. In some embodiments, the configurable node array includes numerous (e.g., 50, 100, etc.) configurable nodes arranged in several rows and columns. This array also includes several direct offset connections, where each particular direct offset connection connects two nodes that are neither in the same column nor in the same row in the array. In some embodiments, at least some direct offset connections connect pairs of nodes that are separated in the array by more than one row and at least one column, or by more than one column and at least one row. Some embodiments establish a direct connection by (1) a set of wire segments that traverse through a set of the IC's wiring layers, and (2) a set of vias when two or more wiring layers are involved. In some embodiments, some of the direct connections have intervening circuits (e.g., buffer circuits), while other direct connections do not have any intervening circuits. Also, in some embodiments, the nodes in the configurable array are all similar (e.g., have the same set of circuit elements and same internal wiring between the circuit elements). | 08-19-2010 |
20100221874 | Method for Multi-Level Interconnection Memory Device - A method for preventing arcing during deep via plasma etching is provided. The method comprises forming a first patterned set of parallel conductive lines over a substrate and forming a plurality of semiconductor pillars on the first patterned set of parallel conductive lines and extending therefrom, wherein a pillar comprises a first barrier layer, an antifuse layer, a diode, and a second barrier layer, wherein an electric current flows through the diode upon a breakdown of the antifuse layer. The method further comprises depositing a dielectric between the plurality of semiconductor pillars, and plasma etching a deep via recess through the dielectric and through the underlying layer after the steps of forming a plurality of semiconductor pillars and depositing a dielectric. An embodiment of the invention comprises a memory array device. | 09-02-2010 |
20100221875 | SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES INCLUDING GATE PATTERNS HAVING STEP DIFFERENCE THEREBETWEEN AND A CONNECTION LINE DISPOSED BETWEEN THE GATE PATTERNS AND METHODS OF FABRICATING THE SAME - Provided are semiconductor integrated circuit (IC) devices including gate patterns having a step difference therebetween and a connection line interposed between the gate patterns. The semiconductor IC device includes a semiconductor substrate including a peripheral active region, a cell active region, and a device isolation layer. Cell gate patterns are disposed on the cell active region and the device isolation layer. A peripheral gate pattern is disposed on the peripheral active region. A cell electrical node is disposed on the cell active region adjacent to the cell gate patterns. Peripheral electrical nodes are disposed on the peripheral active region adjacent to the peripheral gate pattern. Connection lines are disposed on the cell gate patterns disposed on the device isolation layer. The connection lines are connected between the cell gate patterns and the peripheral gate pattern. | 09-02-2010 |
20100227438 | RESISTANCE VARIABLE MEMORY DEVICE AND METHOD OF FABRICATING THE SAME - A method of fabricating a resistance variable device includes forming selection devices on a substrate, forming a conductive layer on the selection devices, patterning the conductive layer in a first direction to form conductive patterns spaced apart from each other in the first direction and connecting a pair of adjacent selection devices to each other in the first direction, forming a resistance-variable-material-layer on the conductive patterns, and patterning the resistance-variable-material-layer and the conductive patterns in a second direction to form rows of resistance-variable material extending in the second direction and to form electrodes spaced apart from one another, such that each electrode corresponds to a separate selection device. | 09-09-2010 |
20100227439 | PHASE CHANGE MEMORY DEVICE RESISTANT TO STACK PATTERN COLLAPSE AND A METHOD FOR MANUFACTURING THE SAME - A phase change memory device resistant to stack pattern collapse is presented. The phase change memory device includes a silicon substrate, switching elements, heaters, stack patterns, bit lines and word lines. The silicon substrate has a plurality of active areas. The switching elements are connected to the active areas. The heaters are connected to the switching elements. The stack patterns are connected to the heaters. The bit lines are connected to the stack patterns. The word lines are connected to the active areas of the silicon substrate. | 09-09-2010 |
20100227440 | PHASE CHANGE MEMORY DEVICE RESISTANT TO STACK PATTERN COLLAPSE AND A METHOD FOR MANUFACTURING THE SAME - A phase change memory device resistant to stack pattern collapse is presented. The phase change memory device includes a silicon substrate, switching elements, heaters, stack patterns, bit lines and word lines. The silicon substrate has a plurality of active areas. The switching elements are connected to the active areas. The heaters are connected to the switching elements. The stack patterns are connected to the heaters. The bit lines are connected to the stack patterns. The word lines are connected to the active areas of the silicon substrate. | 09-09-2010 |
20100297815 | Transistor Layout for Manufacturing Process Control - A symmetrical circuit is disclosed (FIG. | 11-25-2010 |
20100304537 | Semiconductor Devices Including a Topmost Metal Layer with at Least one Opening and Their Methods of Fabrication - In one embodiment, a semiconductor device has a topmost or highest conductive layer with at least one opening. The semiconductor device includes a semiconductor substrate having a cell array region and an interlayer insulating layer covering the substrate having the cell array region. The topmost conductive layer is disposed on the interlayer insulating layer in the cell array region. The topmost conductive layer has at least one opening. A method of fabricating the semiconductor device is also provided. The openings penetrating the topmost metal layer help hydrogen atoms reach the interfaces of gate insulating layers of cell MOS transistors and/or peripheral MOS transistors during a metal alloy process, thereby improve a performance (production yield and/or refresh characteristics) of a memory device. | 12-02-2010 |
20100311210 | NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME - A non-volatile semiconductor storage device includes: a substrate; a control circuit layer provided on the substrate; a support layer provided on the control circuit layer; and a memory cell array layer provided on the support layer. The memory cell array layer includes: a first lamination part having first insulation layers and first conductive layers alternately laminated therein; and a second lamination part provided on either the top or bottom surface of the respective first lamination part and laminated so as to form a second conductive layer between second insulation layers. The control circuit layer includes at least any one of: a row decoder driving word lines provided in the memory cell array layer, and a sense amplifier sensing and amplifying a signal from bit lines provided in the memory cell array layer. | 12-09-2010 |
20100317157 | CELL ARRAY OF SEMICONDUCTOR MEMORY DEVICE AND A METHOD OF FORMING THE SAME - A cell array includes a semiconductor substrate including an active region comprising a first region, a second region, and a transition region, the second region being separated from the first region by the transition region, wherein a top surface of the second region is at a different level than a top surface of the first region. The cell array also includes a plurality of word lines crossing over the first region. The cell array also includes a selection line crossing over the active region, wherein at least a portion of the selection line is located over the transition region. | 12-16-2010 |
20110020986 | Offset Geometries for Area Reduction In Memory Arrays - An array with cells that have adjacent similar structures that are displaced from each other across a common cell border in a direction that is not perpendicular to the cell border thus avoiding an across cell border design rule violation between the adjacent similar structures. A method of forming reduced area memory arrays by displacing adjacent similar structures along a common cell border. A method of building arrays using conventional array building software by forming unit pairs with cells that are not identical and are not mirror images or rotated versions of each other. | 01-27-2011 |
20110045643 | Method of forming active region structure - A method of forming an active region structure includes preparing a semiconductor substrate including a cell array region and a peripheral circuit region, forming preliminary cell active regions in the cell array region of the semiconductor substrate, and forming cell active regions in the preliminary cell active regions and at least one peripheral active region in the peripheral circuit region of the semiconductor substrate, such that the preliminary cell active regions, the cell active regions, and the at least one peripheral active region are integrally formed with the semiconductor substrate and protrude from the semiconductor substrate. | 02-24-2011 |
20110076810 | Three Dimensional Multilayer Circuit - A method for forming three-dimensional multilayer circuit includes forming an area distributed CMOS layer configured to selectively address a set of first vias and a set of second vias. A template is then aligned with the first set of vias and lower crossbar segments are created using the template. The template is then removed, rotated, and aligned with the set of second vias. Upper crossbar segments which attach to the second set of vias are then created. | 03-31-2011 |
20110086470 | ADDITIONAL METAL ROUTING IN SEMICONDUCTOR DEVICES - Memory devices, such as DRAM memory devices, may include one or more metal layers above a local interconnect of the DRAM memory that make contact to lower gate regions of the memory device. As the size of semiconductor components decreases and circuit densities increase, the density of the metal routing in these upper metal layers becomes increasingly difficult to fabricate. By providing additional metal routing in the lower gate regions that may be coupled to the upper metal layers, the spacing requirements of the upper metal layers may be eased, while maintaining the size of the semiconductor device. In addition, the additional metal routing formed in the gate regions of the memory devices may be disposed parallel to other metal contacts in a strapping configuration, thus reducing a resistance of the metal contacts, such as buried digit lines of a DRAM memory cell. | 04-14-2011 |
20110092030 | SYSTEM COMPRISING A SEMICONDUCTOR DEVICE AND STRUCTURE - A semiconductor device includes a first mono-crystallized layer including first transistors, and a first metal layer forming at least a portion of connections between the first transistors; and a second layer including second transistors, the second transistors including mono-crystalline material, the second layer overlying the first metal layer, wherein the first metal layer includes aluminum or copper, and wherein the second layer is less than one micron in thickness and includes logic cells. | 04-21-2011 |
20110159645 | METHODS OF FORMING A MEMORY ARRAY WITH A PAIR OF MEMORY-CELL STRINGS TO A SINGLE CONDUCTIVE PILLAR - A method of forming a memory array includes forming first and second strings of serially-coupled memory cells respectively on first and second sides of a conductive pillar. Forming the first string of memory cells includes forming a first control gate on the first side of the conductive pillar and interposing a first charge trap between the first side of the conductive pillar and the first control gate. Forming the second string of memory cells comprises forming a second control gate on the second side of the conductive pillar and interposing a second charge trap between the second side of the conductive pillar and the second control gate. The first and second charge traps are electrically isolated from each other, and the first and second control gates are electrically isolated from each other. | 06-30-2011 |
20110165737 | Method for designing semiconductor integrated circuit which includes metallic wiring connected to gate electrode and satisfies antenna criterion - A method of forming a semiconductor integrated circuit, includes providing a first logic cell, a second logic cell and a metallic wiring connected to the first logic cell and a gate electrode of the second logic cell, and providing a third logic cell including a gate electrode connected to the metallic wiring, such that the third logic cell makes no contribution to a logic operation of the semiconductor integrated circuit, in order that an antenna ratio of the first gate electrode to the metallic wiring does not satisfy an antenna criterion, and an antenna ratio of the first gate electrode and the second gate electrode to the metallic wiring satisfies the antenna criterion. | 07-07-2011 |
20110177658 | Standard Cell Architecture and Methods with Variable Design Rules - Structures and methods for standard cell layouts having variable rules for spacing of layers to cell boundaries are disclosed. In one embodiment, a first standard cell layout is provided with a conductive layer having at least two portions spaced apart by a minimum spacing distance, the conductive layer having at least one portion spaced from a cell boundary by a first spacing distance of less than half of the minimum spacing distance; a second standard cell disposed adjacent the first standard cell with at least one second portion of the conductive layer in the second cell disposed adjacent the first portion in the first standard cell and spaced apart from a common cell boundary by a second spacing greater than half of the minimum; wherein the sum of the first and second spacings is at least as great as the minimum spacing. A method for forming standard is disclosed. | 07-21-2011 |
20110183475 | DAMASCENE METHOD OF MAKING A NONVOLATILE MEMORY DEVICE - A method of making a device includes providing a first device level containing first semiconductor rails separated by first insulating features, forming a sacrificial layer over the first device level, patterning the sacrificial layer and the first semiconductor rails in the first device level to form a plurality of second rails extending in a second direction, wherein the plurality of second rails extend at least partially into the first device level and are separated from each other by rail shaped openings which extend at least partially into the first device level, forming second insulating features between the plurality of second rails, removing the sacrificial layer, and forming second semiconductor rails between the second insulating features in a second device level over the first device level. The first semiconductor rails extend in a first direction. The second semiconductor rails extend in the second direction different from the first direction. | 07-28-2011 |
20110195547 | METHODS FOR FORMING INTERCONNECT STRUCTURES FOR INTEGRATION OF MULTI LAYERED INTEGRATED CIRCUIT DEVICES - Semiconductor devices comprise at least one integrated circuit layer, at least one conductive trace and an insulative material adjacent at least a portion of the at least one conductive trace. At least one interconnect structure extends through a portion of the at least one conductive trace and a portion of the insulative material, the at least one interconnect structure comprising a transverse cross-sectional dimension through the at least one conductive trace which differs from a transverse cross-sectional dimension through the insulative material. Methods of forming semiconductor devices comprising at least one interconnect structure are also disclosed. | 08-11-2011 |
20110287590 | CONTACT STRUCTURES IN SUBSTRATE HAVING BONDED INTERFACE, SEMICONDUCTOR DEVICE INCLUDING THE SAME, METHODS OF FABRICATING THE SAME - On embodiment of a contact structure may include a lower insulation layer on a lower substrate, an upper substrate on the lower insulation layer, a groove penetrating the upper substrate to extend into the lower insulation layer, the groove below an interface between the upper substrate and the lower insulation layer, an upper insulation layer in the groove, and a contact plug penetrating the upper insulation layer in the groove to extend into the lower insulation layer. | 11-24-2011 |
20120077318 | DAMASCENE METHOD OF MAKING A NONVOLATILE MEMORY DEVICE - A method of making a device includes providing a first device level containing first semiconductor rails separated by first insulating features, forming a sacrificial layer over the first device level, patterning the sacrificial layer and the first semiconductor rails in the first device level to form a plurality of second rails extending in a second direction, wherein the plurality of second rails extend at least partially into the first device level and are separated from each other by rail shaped openings which extend at least partially into the first device level, forming second insulating features between the plurality of second rails, removing the sacrificial layer, and forming second semiconductor rails between the second insulating features in a second device level over the first device level. The first semiconductor rails extend in a first direction. The second semiconductor rails extend in the second direction different from the first direction. | 03-29-2012 |
20120108016 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHODS WITH USING NON-PLANAR TYPE OF TRANSISTORS - Static random access memory cells and methods of making static random access memory cells are provided. The static random access memory cells contain two non-planar pass-gate transistors, two non-planar pull-up transistors, two non-planar pull-down transistors. A portion of a fin of the non-planar pull-up transistor is electrically connected to a portion of a fin of the non-planar pull-down transistor by an assist-bar. The methods involve forming an assist-fin between fins of a non-planar pull-up transistor and a non-planar pull-down transistor and between gate electrodes, and widening a width of the assist-fin to form the assist-bar so that a portion of the fin of non-planar pull-up transistor is electrically connected to a portion of the fin of non-planar pull-down transistor via the assist-bar. | 05-03-2012 |
20120129301 | SYSTEM COMPRISING A SEMICONDUCTOR DEVICE AND STRUCTURE - A method of manufacturing a semiconductor device, the method including, providing a first monocrystalline layer including semiconductor regions, overlaying the first monocrystalline layer with an isolation layer, transferring a second monocrystalline layer comprising semiconductor regions to overlay the isolation layer, wherein the first monocrystalline layer and the second monocrystalline layer are formed from substantially different crystal materials; and subsequently etching the second monocrystalline layer as part of forming at least one transistor in the second monocrystalline layer. | 05-24-2012 |
20120178221 | Methods Of Forming Memory Arrays - Some embodiments include methods of forming memory arrays. A stack of semiconductor material plates may be patterned to subdivide the plates into pieces. Electrically conductive tiers may be formed along sidewall edges of the pieces. The pieces may then be patterned into an array of wires, with the array having vertical columns and horizontal rows. Individual wires may have first ends joining to the electrically conductive tiers, may have second ends in opposing relation to the first ends, and may have intermediate regions between the first and second ends. Gate material may be formed along the intermediate regions. Memory cell structures may be formed at the second ends of the wires. A plurality of vertically-extending electrical interconnects may be connected to the wires through the memory cell structures, with individual vertically-extending electrical interconnects being along individual columns of the array. Some embodiments include memory arrays incorporated into integrated circuitry. | 07-12-2012 |
20120196409 | 3D SEMICONDUCTOR DEVICE - A semiconductor device includes a first mono-crystallized semiconductor layer; and a second mono-crystallized semiconductor layer; wherein said first and second mono-crystallized semiconductor layers are overlaying one on top of the other, and wherein said first mono-crystallized semiconductor layer comprise repeating memory structure with sub structures defined by etching. | 08-02-2012 |
20120252171 | NON-VOLATILE MEMORY AND LOGIC CIRCUIT PROCESS INTEGRATION - A method for forming an integrated circuit for a non-volatile memory cell transistor is disclosed that includes: forming a layer of discrete storage elements over a substrate in a first region of the substrate and in a second region of the substrate; forming a first layer of dielectric material over the layer of discrete storage elements in the first region and the second region; forming a first layer of barrier work function material over the first layer of dielectric material in the first region and the second region; and removing the first layer of barrier work function material from the second region, the first layer of dielectric material from the second region, and the layer of discrete storage elements from the second region. After the removing, a second layer of barrier work function material is formed over the substrate in the first region and the second region. The second layer of barrier work function material is removed from the first region. A first gate of a memory device is formed in the first region. The first gate includes a portion of the first layer of barrier work function material. The memory device includes a charge storage structure including a portion of the layer of discrete storage elements. A second gate of a transistor is formed in the second region, the second gate including a portion of the second layer of barrier work function material. | 10-04-2012 |
20130237019 | STACKED MEMORY DEVICE AND METHOD OF FABRICATING SAME - A stacked semiconductor memory device comprises a semiconductor substrate having a functional circuit, a plurality of memory cell array layers, and at least one connection layer. The memory cell array layers are stacked above the semiconductor substrate. The connection layers are stacked above the semiconductor substrate independent of the memory cell array layers. The connection layers electrically connect memory cell selecting lines arranged on the memory cell array layers to the functional circuit. | 09-12-2013 |
20130267067 | Embedded NOR Flash Memory Process with NAND Cell and True Logic Compatible Low Voltage Device - An integrated circuit formed of nonvolatile memory array circuits, logic circuits and linear analog circuits is formed on a substrate. The nonvolatile memory array circuits, the logic circuits and the linear analog circuits are separated by isolation regions formed of a shallow trench isolation. The nonvolatile memory array circuits are formed in a triple well structure. The nonvolatile memory array circuits are NAND-based NOR memory circuits formed of at least two floating gate transistors that are serially connected such that at least one of the floating gate transistors functions as a select gate transistor to prevent leakage current through the charge retaining transistors when the charge retaining transistors is not selected for reading. Each column of the NAND-based NOR memory circuits are associated with and connected to one bit line and one source line. | 10-10-2013 |
20150118803 | LAYOUT SCHEME AND METHOD FOR FORMING DEVICE CELLS IN SEMICONDUCTOR DEVICES - A method and layout for forming word line decoder devices and other devices having word line decoder cells provides for forming metal interconnect layers using non-DPL photolithography operations and provides for stitching distally disposed transistors using a lower or intermediate metal layer or a subjacent conductive material. The transistors may be disposed in or adjacent longitudinally arranged word line decoder or other cells and the conductive coupling using the metal or conductive material lowers gate resistance between transistors and avoids RC signal delays. | 04-30-2015 |
20150294982 | PRINTING ELECTRONIC CIRCUITRY LOGIC - A method of making a logic gate array includes providing a substrate; forming an array of first conductive lines with plurality of first gaps disposed on each of the first conductive lines on the substrate wherein the array of first conductive lines is disposed in a first direction; forming an array of isolation lines over the first conductive lines wherein the isolation lines are not disposed on the first gaps; forming an array of second conductive lines with plurality of second gaps disposed on each of the second conductive lines on the substrate wherein the array of second conductive lines is disposed in a second direction and wherein orientation of the second direction is different than the orientation of the first direction; and printing one or more conductive ink dots at least one intersection of the first conductive lines and the second conductive lines by connecting the corresponding first gaps and corresponding second gaps. | 10-15-2015 |
20160099180 | Method for Manufacturing a Semiconductor Switching Device with Different Local Cell Geometry - A method for manufacturing a semiconductor device includes providing a semiconductor substrate having an outer rim, an active area, and an edge termination region arranged between the active area and the outer rim, and forming a plurality of switchable cells in the active area. Each of the switchable cells includes a body region, a gate electrode structure, and a source region. The active area defined by the switchable cells includes at least a first switchable region having a specific gate-drain capacitance which is different to a specific gate-drain capacitance of a second switchable region. The method further includes forming a source metallization in ohmic contact with the source regions of the switchable cells, and forming a gate metallization in ohmic contact with the gate electrode structures of the switchable cells. | 04-07-2016 |