| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 430288100 | Plural, terminal unsaturation | 11 |
| 20080286693 | Sulfonate derivatives and the use thereof as latent acids - Chemically amplified photoresist compositions comprising, | 11-20-2008 |
| 20100173247 | SUBSTRATE PLANARIZATION WITH IMPRINT MATERIALS AND PROCESSES - The present invention relates to planarization materials and methods of using the same for substrate planarization in photolithography. A planarization layer of a planarization composition is formed on a substrate. The planarization composition contains at least one aromatic monomer and at least one non-aromatic monomer. A substantially flat surface is brought into contact with the planarization layer. The planarization layer is cured by exposing to a first radiation or by baking The substantially flat surface is then removed. A photoresist layer is formed on the planarization layer. The photoresist layer is exposed to a second radiation followed by development to form a relief image in the photoresist layer. The relief image is then transferred into the substrate. | 07-08-2010 |
| 20130029271 | PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENESITIVE COMPOSITION - Disclosed are a photosensitive composition and a compound used in the same. If the composition provided through the present application is used, it is possible to form a thin film having improved adhesion strength of a pattern. | 01-31-2013 |
| 20140120474 | Deep-Ultraviolet Chemically-Amplified Positive Photoresist - The invention discloses a deep-ultraviolet chemically-amplified positive photoresist. The deep-ultraviolet chemically-amplified positive photoresist according to one embodiment of the invention includes a cyclopentenyl pimaric acid, a divinyl ether, a photoacid generator and an organic solvent. The deep-ultraviolet chemically-amplified positive photoresist according to the invention has a good sensitivity and a good transparency. | 05-01-2014 |
| 20140134542 | Positive-Type Resist Composition - A positive-type resist composition according to the present invention includes a fluorine-containing aliphatic alcohol, a polymer, a vinyl compound and a photoacid generator, wherein the fluorine-containing aliphatic alcohol is a monohydric C | 05-15-2014 |
| 20160011506 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING QUANTUM DOT PATTERN USING THE SAME | 01-14-2016 |
| 20160026080 | COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVLOPMENT PROCESS - Provided is a composition that is sensitive to radiation in electromagnetic spectrum ranges for printing purposes, and includes (a) one or more binder polymers; (b) an ethylenically unsaturated compound; (c) one or more compounds that absorbs radiations in the selected region of the spectrum; (d) a sensitizer; (e) optionally a photoaccelarator; (f) an adhesion promoter; (g) a dye; and (h) optionally thermal polymerization inhibitors. Also provided is a printing plate including the radiation sensitive composition, as well as the use of the composition and an image developing process. | 01-28-2016 |
| 20160033864 | PHOTORESIST AND METHODS OF PREPARING AND USING THE SAME - Disclosed is a photoresist comprising 1 to 90 parts of hydroxyl-containing or carboxyl-containing film-forming resin, 1 to 99 parts of silicon-containing vinyl ether monomer, and an organic solvent capable of dissolving the aforesaid substances. Disclosed is also methods of preparing and using the photoresist. | 02-04-2016 |
| 20160046552 | COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND - A composition containing a novel vinyl-group-containing compound. This composition contains a vinyl-group-containing compound represented by general formula (1). In the formula: W | 02-18-2016 |
| 20160070166 | HIGH RESOLUTION, SOLVENT RESISTANT, THIN ELASTOMERIC PRINTING PLATES - The present invention relates to a printing element having at least one polymer layer which has photoimageable constituents and a chemically functionalized polymer to make the polymer layer either more hydrophobic or hydrophilic. In one embodiment, the printing element comprises two adjacent polymer layers on a substrate in which the photoimaged layer comprises a polymer chemically modified with hydrophobic fluoroalkyl side groups to provide differential wetting with hydrophilic inks. | 03-10-2016 |
| 20160070173 | A LITHOGRAPHIC PRINTING PLATE PRECURSOR - A negative-working lithographic printing plate precursor includes a support and a coating containing a photopolymerisable layer; characterised in that the coating includes a compound including at least one moiety having a structure according to Formula (I) at a level above 10% wt and below 40% wt relative to the total dry weight of the ingredients of the coating: | 03-10-2016 |
