Class / Patent application number | Description | Number of patent applications / Date published |
427010000 | Electrical or optical | 40 |
20080311283 | Method of Inspecting and Manufacturing an Integrated Circuit - An auxiliary layer is provided over a main surface of a sample, wherein the sample may be a semiconductor substrate. The auxiliary layer may have an essentially plane surface and is transparent or semi-transparent to an inspection radiation with a wave length between, for example, 193 and 800 nm. The sample coated with the auxiliary layer is inspected for defects in the sample via an imaging method that may use coherent radiation. After inspection, the auxiliary layer is removed. Dependent on the defect count, a process of manufacturing integrated circuits may be continued or the sample may be reworked or discarded. | 12-18-2008 |
20090017190 | Movable injectors in rotating disc gas reactors - A system and method for uniform deposition of material layers on wafers in a rotating disk chemical vapor deposition reaction system is provided, wherein one or more substrates are rotated on a carrier about an axis while maintaining surfaces of the one or more substrates substantially perpendicular to the axis of rotation and facing in an upstream direction along the axis of rotation. During rotating a first gas is discharged in the downstream direction towards the one or more substrates from a first set of gas inlets. A second gas is discharged in the downstream direction towards the one or more substrates from at least one movable gas injector, and the at least one movable gas inlet is moved with a component of motion in a radial direction towards or away from the axis of rotation. | 01-15-2009 |
20090035450 | BASE MATERIAL PROCESSING APPARATUS AND BASE MATERIAL PROCESSING METHOD - A base material processing apparatus comprises a device for irradiating light from a light transmissive film side to a base material during film formation on a surface of the base material or film processing of the film formed on the surface of the base material. The apparatus also comprises film physical characteristic measuring device for receiving reflected light coming from the base material during the film formation or the film processing, detecting interference light formed by first reflected light and second reflected light contained in the reflected light, the first reflected light being reflected from a surface of the film, the second reflected light being reflected from an interface between the film and the base material, and measuring a physical characteristic of the film with a peak valley technique. | 02-05-2009 |
20090047418 | FILM-FORMING METHOD, AND FILM FORMING DEVICE - A film-forming method includes: a) discharging a liquid including a film material on an object so as to form a liquid film made of the liquid; b) measuring distribution of an optical constant related to a film thickness of a thin film by irradiating the liquid film with light from a first light source so as to detect light from the liquid film; and c) modulating light from a second light source corresponding to the optical constant of the liquid film based on converting data indicating a relation between the optical constant and light wave information of the light from the second light source while irradiating the liquid film with the light from the second light source so as to dry the liquid film to form the thin film on the object. | 02-19-2009 |
20090047419 | FILM-FORMING METHOD AND FILM-FORMING DEVICE - A film-forming method includes: a) discharging a liquid including a film material on an object so as to form a liquid film made of the liquid; b) irradiating the liquid film with light and thus detecting light from the liquid film so as to measure distribution of an optical constant, which is related to a film thickness of a thin film, with respect to the liquid film; and c) drying the liquid film on the object so as to form the thin film by converting the distribution of the optical constant into distribution of a temperature of the liquid film based on converting information that relates the optical constant of the liquid film to the temperature of the liquid film and thus forming the distribution of the temperature on the liquid film. | 02-19-2009 |
20090061075 | METHOD AND APPARATUS FOR MEASURING COATING THICKNESS WITH A LASER - A method of measuring a coating deposits a layer of coating on an object. A laser beam is projected on the layer of the coating. A reflection of the project laser beam is received by the laser sensor. From this information, the thickness of the layer of the coating on the object is determined. A value related to the thickness of the layer of the coating may then be compared to a desired value. | 03-05-2009 |
20090087543 | TEMPLATED GROWTH OF GRAPHENIC MATERIALS - A method is disclosed for producing graphenic materials by templated growth along a preformed graphenic material lattice edge, wherein at least one of the graphenic material or template is translated during growth of the graphenic material. A method for preparing CNTs from preformed CNT substrates in the presence of cylindrical templating structures and a reactive carbon source in a fluid phase is also disclosed, wherein at least one of the CNT substrate or the cylindrical templating structure is translated during addition of carbon atoms to the CNT substrate. A method is also disclosed for preparing CNTs from preformed CNT substrates in the presence of cylindrical templating structures and a carbon source in a fluid phase, wherein non-thermalized excited states are produced on the CNT substrate and at least one of the CNT substrate or the cylindrical templating structure is translated during addition of carbon atoms to the CNT substrate. | 04-02-2009 |
20090155453 | Manufacturing Method and Apparatus of Optical Goods - A manufacturing method of optical goods, including: injecting a material composition stored in a tank into a cavity provided inside a mold; and polymerizing and curing the injected material composition, in which a viscosity of the material composition stored in the tank is measured. | 06-18-2009 |
20090191327 | VACUUM COATING INSTALLATION AND METHOD OF PRODUCING A COATING LAYER ON A SUBSTRATE - A strip coating system includes a first pulley carrying a flexible metal or Al substrate wound up on the first pulley. A second, take-up, pulley is provided for taking up the coated substrate. The coating process is a continuous coating process, during which the first pulley and the second pulley are rotated to move the substrate continuously past a coating tool for depositing coating particles on a surface of the substrate. After having passed the coating section with a speed v, the substrate carrying a coating layer on the surface thereof passes an infrared spectroscopic measurement device for measuring the layer thickness of the coating layer. Feedback controls are provided to control one or more process parameters of the coating tool responsive to the measurement of the thickness of the coating layer detected by the measurement tool. Thus, an in situ online measurement of the thickness of the coating layer may be implemented. | 07-30-2009 |
20090214760 | Optical Monitoring System for Coating Processes - The invention concerns an optical monitoring system for the measurement of layer thicknesses of thin coatings applied in a vacuum, particularly on moving substrates, during the coating process, in which the light intensity of the light of a light source injected into a reference light guide and released by a first piezoelectric or electrostrictive or magnetostrictive light chopper is registered by a light detector unit in a reference phase, the light of the light source in a measuring phase is injected into a first measuring light guide and the light released by a second piezoelectric or electrostrictive or magnetostrictive light chopper is directed to the substrate, and the light intensity of the light reflected or transmitted from the substrate is registered by the light detector unit through a second measuring light guide, and a remaining light intensity is registered by the light detector unit in at least one dark phase, wherein the reference phase, the measuring phase, and the dark phase are shifted in time by the light chopper and are digitally adjusted depending on the position of the substrate. | 08-27-2009 |
20090214761 | REAL TIME IMPRINT PROCESS DIAGNOSTICS FOR DEFECTS - Defects and/or particles during an imprint lithography process may provide exclusion zones and/or transition zones in the patterned layer. Exclusion zones and/or transition zones in the patterned layer may be identified to provide a region of interest on a template. | 08-27-2009 |
20090269484 | Method of measuring coating quantity and method of predicting dissolution behavior - Evaluation methods that employ the near infrared spectrum have generally had a low specificity and in particular have encountered difficulty in the evaluation of trace components, and the accurate measurement of coating quantity by methods using the near infrared spectrum has been quite problematic. The quantity of coating applied to a coating target, such as granules or uncoated tablets, is measured based on the absorption or scattering of light in the 800 to 1100 nm wavelength region by an additive coated on the coating target. The use of polyethylene glycol or a long-chain hydrocarbyl-containing compound as the additive is preferred. | 10-29-2009 |
20090324805 | Optical monitor for thin film deposition using base stack admittance - A method is provided for the determination of the time to terminate the deposition of an optical thin film using an exact model for the reflectance. This model is used to fit the reflectance measurements to determine the deposition rate, from which the time to deposit the entire layer is determined, as well as finding the admittance of the base stack at the beginning of the current layer. The layer deposition is terminated at the calculated time resulting in precise thickness control. This ability to fit the base admittance enables the determination of the reflection model parameters for each layer being deposited so that the accuracy of each layer is independent of previously deposited layers. This means that there is no build up of errors from layer to layer as the deposition progresses, enabling the deposition of coating designs with higher precision, including non periodic and non quarter wave designs. | 12-31-2009 |
20100129525 | APPARATUS FOR FORMING PHOSPHOR LAYER AND METHOD FOR FORMING PHOSPHOR LAYER USING THE APPARATUS - A phosphor layer forming apparatus ( | 05-27-2010 |
20100136217 | SAMPLE ANALYZING METHOD, SAMPLE ANALYZING APPARATUS, MANUFACTURING METHOD OF ORGANIC EL ELEMENT, MANUFACTURING EQUIPMENT, AND RECORDING MEDIUM - Light is irradiated onto a glass substrate of an organic EL element, and the characteristics of an organic film are analyzed. In the sample analyzing apparatus, in such a way that the glass substrate is located on the upper side, the organic EL element is placed on a stage. The light is irradiated towards the glass substrate, and an amplitude ratio and a phase difference which are related to the organic EL element are measured. Also, the sample analyzing apparatus selects a model of a structure corresponding to reflected lights K | 06-03-2010 |
20100166945 | Methods of calculating thicknesses of layers and methods of forming layers using the same - A method of calculating a thickness of a layer may include forming the layer on a substrate in a chamber, measuring optical emission spectrum data from the chamber, and calculating the thickness of the layer from the optical emission spectrum data. A method of forming a layer may include depositing the layer on a substrate in a chamber, measuring optical emission spectrum data from the chamber, calculating a thickness of the layer using the optical emission spectrum data, and ending the depositing of the layer when the calculated thickness of the layer is within a target thickness range. | 07-01-2010 |
20100189880 | Method and Apparatus for Extruding a Liquid Onto a Substrate and Inspecting the Same - An extrusion and inspection apparatus is provided. Specifically, the apparatus includes a generally horizontal surface adapted to support a substrate and a coating die that extrudes fluid onto the substrate. A shuttle having a bridge with the coating die mounted thereon moves the coating die generally parallel to the substrate. In addition to lateral motion parallel to the substrate, the apparatus includes a gauging member that positions the die to at least one predetermined position above the substrate. A light source secured to the bridge is also employed to illuminate the substrate before and/or after coating. The apparatus also includes an imager secured to the bridge where the imager obtains images of the substrate during illumination. | 07-29-2010 |
20100209593 | Methods For Producing Omni-Directional Multi-Layer Photonic Structures - A method for producing a multi-layer photonic structure having at least one group of alternating layers of high index material and low index material may include, determining a characteristic property function for the multi-layer photonic structure, determining a thickness multiplier for the at least one group of alternating layers based on a comparison of the characteristic property function to a target profile, adjusting the characteristic property function with the determined thickness multiplier, and comparing an adjusted characteristic property function to the target profile, wherein, when the adjusted characteristic property function does not approximate the target profile, at least one additional group of layers is added to the multi-layer photonic structure. | 08-19-2010 |
20100227046 | FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER READABLE STORAGE MEDIUM - A disclosed film deposition apparatus includes a transparent window in a ceiling plate of a vacuum chamber. A film thickness of a film deposited on a substrate is measured by emitting light to the substrate through the transparent window by a film thickness measurement system that includes optical units arranged on or above the transparent window, optical fiber cables connected to the corresponding optical units, a measurement unit to which the optical fiber cables are connected, and a control unit electrically connected to the measurement unit in order to control the measurement unit. | 09-09-2010 |
20100266749 | METHOD OF USING IMAGE DATA IN THE PRODUCTION OF THIN WALL EXTRUSIONS - A method of coating metal wire with extrudate using an extrusion system. The method includes the steps of advancing the metal wire through an extrusion die of the extrusion system and extruding molten extrudate over the metal wire as the metal wire is advanced through the extrusion die. Image data is generated, using one or several electronic cameras, concurrently with the advancing, and extruding to provide visual feedback indicative of the concentricity or non-concentricity of extrudate surrounding the metal wire as the metal wire exits the extrusion die. | 10-21-2010 |
20100330264 | COLORED COATING AND METHOD - A method of evaluating a coating applied to a surface comprises the step of applying the coating to the surface. The coating including a conversion gel to chemically bind the surface and an indicator substantially uniformly distributed throughout the coating wherein the indicator modifies an appearance of the coating. The method further comprising the step of determining whether the indicator is present on the surface at a substantially uniform concentration. | 12-30-2010 |
20110027459 | Methods and Devices for Monitoring and Controlling Thin Film Processing - Thin film processing systems and methods are provided having a moving deposition sensor capable of translation and/or rotation in a manner that exposes the sensor to thin film deposition environments in a flux region substantially the same as the deposition environments experienced by one or more moveable substrates during a selected deposition period. In one embodiment, a thin film monitoring and control system is provided wherein one or more moveable substrates and a moveable deposition sensor are moved along substantially coincident trajectories in a flux region of a thin film deposition system for a selected deposition period. Systems and methods of the present invention may include SC-cut quartz crystal microbalance sensors capable of excitation of at least two different resonant modes. | 02-03-2011 |
20110052793 | Optical monitor with computed compensation - A method is provided for the determination a thickness error in a previously deposited layer using the reflection monitor signal of the currently-depositing layer. This thickness error is then used to compute corrections to the thickness of the currently-depositing layer and the next layer which corrects for the thickness error in the previous layer. The method is stable with respect to noise in the optical monitor signal. The technique is applicable for optical coating designs which are not necessarily quarter wave. The approach avoids the buildup of thickness errors from layer to layer and thus is applicable for very thick designs with many layers. Near the end of a currently depositing layer the monitor signal is used to fit the admittance of the base stack under the current layer. This establishes the parameters in an exact reflectance model used for the rate or thickness monitoring of the current layer. | 03-03-2011 |
20110151107 | Coating apparatus and method for real-timely monitoring thickness change of coating film - A method for real-timely monitoring thickness change of a coating film is disclosed. In the method, a coating module having a chamber and a film thickness-monitoring module containing an SPR optical fiber sensor, a light source, a light-receiving detector, and optical fibers are first provided. The optical fibers are used to connect the SPR optical fiber sensor with the light source and the light-receiving detector. The SPR optical fiber sensor has a sensing area and is arranged in the chamber. The light source provides the SPR optical fiber sensor with light. Then, a substrate is put into the chamber. While coating process is performed on the substrate, a film is also formed on the sensing area of the SPR optical fiber sensor. The light-receiving detector receives signals output from the sensing area of the SPR optical fiber sensor and then outputs signals of light-intensity change. | 06-23-2011 |
20110189380 | DEVICE AND METHOD FOR FABRICATING DISPLAY DEVICE - A device for manufacturing a display device includes a deposition source; a deposition thickness calculator for calculating a deposition thickness of a deposition material deposited on a substrate; and a controller for controlling a power of a heater which heats the deposition source by comparing the deposition thickness calculated with a reference thickness. The controller controls the power of the heater either at least one time for each substrate on which the thin film is to be deposited or at regular intervals while the deposition material is deposited. Influence of measurement noise that is included in a quartz crystal sensor for measuring a deposition speed may be minimized, and distribution of deposition thickness of an organic light emitting material may be reduced, thereby increasing the yield of the deposition process and producing quality display devices. | 08-04-2011 |
20110206830 | REVERSE INTERFEROMETRIC METHOD AND APPARATUS FOR MEASURING LAYER THICKNESS - A reverse interferometric method for the determination of the thickness of a layer of material employs a multi-wavelength light source which generates a light beam which comprises a time-variant series of different monochromatic wavelengths. The beam is reflected from the body of material being measured and is detected by a broad spectrum wavelength detector which produces a signal comprising a series of data points indicating the reflectivity of the sample as a function of the time-variant series of monochromatic wavelengths. A signal processor processes these data points to fit them to a model waveform, and the frequency of the model waveform is used to calculate the thickness of the body of material. Further disclosed are apparatus for carrying out the method and use of the method in a continuous process for the fabrication of thin film materials. | 08-25-2011 |
20110212256 | DEPOSITION RATE CONTROL - An vapor deposition control system includes a multi-level control scheme. | 09-01-2011 |
20110300290 | Device for fabricating electrode by roll to roll process and method for fabricating electrode - There are provided a device for fabricating an electrode by a roll-to-roll process and a method for fabricating an electrode. The device for fabricating an electrode includes an unwinding roll and a winding roll travelling an electrode material; a film forming roll disposed between the unwinding roll and the winding roll allowing the electrode material to travel along a cylindrical surface of the film forming roll and having a cooling unit cooling the electrode material; and an evaporation unit receiving a lithium source and mounted for the received lithium source to form a thin film in the electrode material positioned on the film forming roll. Thereby, the lithium is deposited in a vacuum atmosphere such that the process is simple and the deposition rate and the deposition uniformity of lithium can be improved. | 12-08-2011 |
20120156363 | Gas Injection System for Chemical Vapor Deposition Using Sequenced Valves - A gas injection system for a chemical vapor deposition system includes a gas manifold comprising a plurality of valves where each of the plurality of valves has an input that is coupled to a process gas source and an output for providing process gas. Each of a plurality of gas injectors has an input that is coupled to the output of one of the plurality of valves and an output that is positioned in one of a plurality of zones in a chemical vapor deposition reactor. A controller having a plurality of outputs where each of the plurality of outputs is coupled to a control input of one of the plurality of valves. The controller instructs at least some of the plurality of valves to open at predetermined times to provide a desired gas flow to each of the plurality of zones in the chemical vapor deposition reactor. | 06-21-2012 |
20120258239 | EVAPORATION SYSTEM WITH MEASUREMENT UNIT - An evaporator for evaporating a material onto a substrate is described. The evaporator includes a guiding means for guiding the material towards at least one opening nozzle. The guiding means includes a measurement outlet for a portion of the material. The evaporator further includes a first measurement system configured for generating a first signal correlated with a deposition rate of the evaporator and having a first detector positioned for being coated by the material and a second optical measurement system for generating a second signal correlated with the deposition rate of the evaporator and wherein the second signal is based on the portion of the material of the measurement outlet. | 10-11-2012 |
20120263866 | METHOD FOR MEASURING LAYER THICKNESS BY MEANS OF LASER TRIANGULATION, AND DEVICE - A method for determining the layer thickness of a component to be coated is provided. The monitoring of the process is automated by carrying out laser triangulation measurement before and after the coating of the component. At least one reference point on the component is used to determine the distortion of the blade or vane. A device for carrying out the method is also provided. | 10-18-2012 |
20130323407 | METHOD FOR COATING WITH AN EVAPORATION MATERIAL - An apparatus for depositing a material layer on a sample inside a vacuum chamber comprises a sample stage ( | 12-05-2013 |
20140255598 | Optical Design Techniques for Providing Favorable Fabrication Characteristics - Disclosed are methods and techniques for providing favorable fabrication characteristics for optical elements. One method includes providing a desired integrated computational element (ICE) design comprising a plurality of layers, each layer having a design thickness, randomizing the design thickness of each layer of the desired ICE design to simulate a fabrication error in each layer, thereby generating a plurality of randomized ICE designs, calculating a standard error of calibration between each randomized ICE design and the desired ICE design, correlating the standard error of calibration between a given layer of the desired ICE design and the fabrication error of each corresponding layer of each randomized ICE design, and ranking the plurality of layers of the desired ICE design based on the sensitivity to changes in the standard error of calibration. | 09-11-2014 |
20140287135 | METHOD FOR COATING NON-UNIFORM SUBSTRATES - A method for applying a uniform coating to a non-uniform substrate, the method including: a) optically characterizing the non-uniform substrate; b) adjusting a thickness and a color of a primer layer to achieve a first target color while depositing the primer layer on the non-uniform substrate; c) optically characterizing the non-uniform substrate comprising the primer layer deposited thereon; and, d) adjusting a thickness and a color of a first paint layer to achieve a second target color while depositing the first paint layer on the non-uniform substrate comprising the primer layer deposited thereon. | 09-25-2014 |
20140295059 | REFURBISHMENT PROCESS OF THE PUMPING UNIT IN A VOLUMETRIC SCREW COMPRESSOR OF THE "OIL FREE' TYPE - A refurbishment process for a volumetric screw compressor of the ‘oil-free’ type, which comprises a male rotor and a female rotor, is described. The process comprises visually checking the wear condition of the rotors, treating their surface for removing the previous coating, and applying a new coating on the surface. The composition of the coating applied on the surface of the rotors consists of the following materials: | 10-02-2014 |
20140349007 | COLD SPRAY COATING PROCESS - A cold spray coating process is disclosed. The cold spray coating process includes positioning a cold spray nozzle relative to a bearing assembly, rotating the bearing assembly, and directing a powdered babbitt material through the cold spray nozzle, to a surface of the rotating bearing assembly. The powdered babbitt material adheres to the surface of the rotating bearing assembly, forming a coating on the surface. Another cold spray coating process includes positioning the cold spray nozzle relative to a bearing assembly, rotating the cold spray nozzle, and directing a powdered babbitt material through the cold spray nozzle, to a surface of the bearing assembly. The powdered babbitt material adheres to the surface, the rotating of the cold spray nozzle forming a coating on the surface. Another cold spray coating process includes monitoring properties of the coating on the surface of the bearing assembly with a coating monitor. | 11-27-2014 |
20160130696 | OPTICAL TRANSMISSION/REFLECTION MODE IN-SITU DEPOSITION RATE CONTROL FOR ICE FABRICATION - Systems and methods of controlling a deposition rate during thin-film fabrication are provided. A system as provided may include a chamber, a material source contained within the chamber, an electrical component to activate the material source, a substrate holder to support the multilayer stack and at least one witness sample. The system may further include a measurement device and a computational unit. The material source provides a layer of material to the multilayer stack and to the witness sample at a deposition rate controlled at least partially by the electrical component and based on a correction value obtained in real-time by the computational unit. In some embodiments, the correction value is based on a measured value provided by the measurement device and a computed value provided by the computational unit according to a model. | 05-12-2016 |
20160145744 | IMAGE PROCESSING-BASED LITHOGRAPHY SYSTEM AND METHOD OF COATING TARGET OBJECT - A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate. | 05-26-2016 |
20160161247 | METHOD FOR MEASURING THE THICKNESS OF A LAYER OF MATERIAL, GALVANIZING METHOD AND RELATED MEASURING DEVICE - Method of measuring the thickness of a layer by a light source irradiating the layer with a light beam, which light source is controlled by a sinusoidal control signal having a modulation frequency f | 06-09-2016 |
20160186313 | THIN FILM DEPOSITION APPARATUS AND METHOD - A thin film deposition apparatus and method are disclosed. In one aspect, the deposition apparatus comprises a deposition source emitting a deposition material that is to be deposited on a surface of a substrate, a transfer unit moving the deposition source, a thickness measurement sensor measuring a thickness of the deposition material deposited on the surface of the substrate, and a transfer controller adjusting a moving speed of the transfer unit according to the thickness of the deposition material deposited on the surface of the substrate per unit of time. | 06-30-2016 |