| Entries |
| Document | Title | Date |
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| 20080233269 | APPARATUS AND METHODS FOR APPLYING A LAYER OF A SPIN-ON MATERIAL ON A SERIES OF SUBSTRATES - An apparatus and method for applying a fluid spin-on material on a surface of first and second substrates. A spin coating device is configured to dispense the fluid spin-on material to form a first layer on the surface of the first substrate. A metrology tool is configured to measure a first thickness profile of the first layer and generate data representing the first thickness profile. A processing unit is electrically coupled with the metrology tool and is configured to analyze the data received from the metrology unit and to determine a variation in the first thickness profile. The processing unit then determines an adjustment to an operational parameter of the spin coating device predicted to reduce a variation in a second thickness profile of a second layer subsequently formed by the spin coating device on a second substrate. | 09-25-2008 |
| 20080286444 | In Situ Substrate Holder Leveling Method and Apparatus - Embodiments of the present invention are directed to adjusting the spacing between the substrate support and the faceplate of the gas distribution member to achieve improved uniformity of the layer formed on the substrate. One embodiment of the present invention is directed to a method of adjusting a spacing between a gas distribution member and a substrate support disposed generally opposite from the gas distribution member, wherein the substrate support is configured to support a substrate on which to form a layer with improved thickness uniformity. The method comprises forming a layer on the substrate disposed on the substrate support; measuring a thickness of the layer on the substrate; and calculating differences in thickness between a reference location on the substrate and a plurality of remaining locations on the substrate. The method further comprises computing spacing adjustment amounts for the remaining locations relative to the reference location based on the differences in thickness between the reference location and the remaining locations. The spacing adjustment amount is positive to increase the spacing between the substrate support at the location and the gas distribution member if the thickness is greater at the location than at the reference location. The spacing adjustment amount is negative to decrease the spacing between the substrate support at the location if the thickness is smaller at the location than at the reference location. | 11-20-2008 |
| 20080305244 | MONITORING A COATING APPLIED TO A METAL SURFACE - A method of monitoring a coating applied to a metal surface is disclosed. Specifically, the method comprises the following: applying a sol composition to a metal surface, wherein said composition contains one or more alkoxysilyl group containing compounds, a fluorophore, and a solvent; forming a gelled coating on said surface from said composition; measuring the fluorescence of said coating with a fluorometer, wherein said fluorometer is capable of measuring reflective fluorescence emission measurements; correlating the fluorescence of said coating with the thickness or weight of said coating, and/or with the concentration of alkoxysilyl group containing compound in the coating composition; and optionally applying an additional coating to said metal surface when the thickness of the coating is less than a desired amount or adjusting the concentration of the alkoxysilyl group containing compound applied to said surface. | 12-11-2008 |
| 20090004364 | Method For Protecting New/Used Engine Parts - New and used parts of gas and steam turbine engines are protected by imparting a controlled residual compressive stress to given portions of the part and then coated by a CVD or PVD process at low temperatures with layers of TiN or alloys thereof at alternate selective hard and less hardened levels. The protective treatment is particularly efficacious for airfoils of compressor blades/vanes of gas turbine engines and airfoils of airfoils and certain components of steam turbine engines. This method is targeted to reduce erosion, corrosion and stress-corrosion cracking in these parts. | 01-01-2009 |
| 20090047417 | METHOD AND SYSTEM FOR VAPOR PHASE APPLICATION OF LUBRICANT IN DISK MEDIA MANUFACTURING PROCESS - Lubricant coatings are applied as vapor to magnetic disks. The method and apparatus include applying vaporizing heat to a pre-determined amount of liquid to form a vapor. Precision delivery of lubricant vapor allows close-loop lube thickness control. The flow of the liquid to the heater is controlled such that only a pre-determined amount from the reservoir flows to the heater at a time, the pre-determined amount is vaporized. According to an aspect, the pre-determined amount of liquid is transferred from the reservoir for the application of vaporizing heat; isolating the reservoir from the vacuum of the vacuum chamber. The method enables multiple types of lubricants to be applied to the disk. Another heater is included for applying vaporizing heat to a second liquid to form a second vapor to supply to the disk. According to an aspect, pulsed lubricant vapor delivery is provided, conserving lubricant and minimizing thermal decomposition. | 02-19-2009 |
| 20090092742 | Method for intermittently applying thin-film coatings - A method for intermittently applying thin-film coatings is realized, by which a coating of extremely thin film reduced to 20 μm or less in thickness is deposited intermittently with high productivity and at the same time, the trailing coating edge of the thin film is formed in a highly accurate shape having good linearity. This is achieved as follows. A band-shaped substrate ( | 04-09-2009 |
| 20090104343 | SYSTEMS AND METHODS FOR APPLYING A LIQUID COATING MATERIAL TO A SUBSTRATE - Systems and methods for applying liquid coating materials to a substrate, such as an electronic component or circuit board. A control system ( | 04-23-2009 |
| 20090117259 | Processing system, processing method, and computer program - The present invention provides a processing system, a processing method and a program, which can readily control a gas flow rate. A vertical-type heating apparatus | 05-07-2009 |
| 20090130294 | Method and device for coating a series of support bodies - The accuracy of the coating concentration when applying a catalytically active coating to suitable carrier bodies can be increased if, following raw coating with a relatively wide fluctuation range in the coating concentration, excessive or insufficient coating applied is if appropriate corrected iteratively. Excessive coating suspension applied is removed, for example by subsequent suction, while the coating is still in the wet state, whereas insufficient coating suspension applied is topped up, for example by spraying on additional coating suspension. | 05-21-2009 |
| 20090136655 | Film Thickness Sensor Having a Porous Blower - The invention describes a sensor system ( | 05-28-2009 |
| 20090181162 | METHOD AND APPARATUS FOR THIN FILM/LAYER FABRICATION AND DEPOSITION - A method and apparatus for controlling the thickness of a thin film or thin layer of discrete particles or of a heterogeneous mixture characterized in that the interfacial tension forces between the solution or suspension and its environment are used as the driving forces to evenly spread the solution, suspension or mixture while the solvent evaporates and/or dilutes. | 07-16-2009 |
| 20090191326 | THIN FILM FORMING METHOD AND COLOR FILTER MANUFACTURING METHOD - A method for forming a thin film by discharging a liquid including a material for forming the thin film, the material being dissolved or dispersed in a solvent, from a plurality of nozzles so as to dispose the liquid into a plurality of predetermined areas included in an effective area set on a substrate to form the thin film while the plurality of nozzles and the substrate are relatively scanned, includes: (a) forming a plurality of reception parts surrounded by a plurality of partitions and bottoms of the predetermined areas, the partitions being provided around the predetermined areas; and (b) forming a plurality of thin films by disposing the liquid from the nozzles into the reception parts. In step (a), a plan view area of at least one of the reception parts in a peripheral area of the effective area is made smaller than a plan view area of the reception part in a central area of the effective area. | 07-30-2009 |
| 20090232967 | THERMAL PROCESSING APPARATUS, METHOD FOR REGULATING TEMPERATURE OF THERMAL PROCESSING APPARATUS, AND PROGRAM - There are provided a thermal processing apparatus, a method for regulating a temperature of a thermal processing apparatus, and a program, by which a temperature can be easily regulated. A control part | 09-17-2009 |
| 20090291199 | Apparatus and methods of control for coolant recycling - A system and method for cooling and coating optical fiber includes the capability to control the amount of coolant gas that is fed to and recycled through a heat exchanger for cooling the optical fiber. The capability to control the amount of fed and recycled coolant gas includes measuring at least one parameter selected from the thermal conductivity of the coolant gas, the viscosity of the coolant gas, the diameter of the primary coating on the optical fiber, and the power usage of a coating applicator for applying primary coating on the optical fiber. | 11-26-2009 |
| 20100075021 | METHOD, APPARATUS AND PROGRAM FOR FILLING LIQUID MATERIAL - Provided are a method, an apparatus and a computer program for filling a liquid material, which do not require complicated parameter calculation and which do not affect the moving speed of a discharge unit. In the method for filling a gap between a substrate and a work placed thereon with the liquid material discharged from the discharge unit by utilizing a capillary action, the method is characterized in forming an application pattern made up of an application region and a non-application region along an outer periphery of the work, and correcting a discharge amount of the liquid material by extending and contracting the application region and the non-application region. The apparatus and the program for carrying out the method are also provided. | 03-25-2010 |
| 20100080889 | METHOD AND EQUIPMENT FOR THE CONTINUOUS DEPOSITION OF A COATING ON A STRIP TYPE SUBSTRATE - In the continuous deposition of a coating on strip-type substrate, a thickness of the coating depends on the condition of various actuators. A first preliminary phase of the process includes developing a pre-setting model, a second preliminary phase includes developing an adjustment model, an intermediate pre-setting step during which the actuators are set statically, a step of measuring the thickness of the coating, and an adjustment step during which the actuators are dynamically controlled by a predictive control based on the adjustment model in order to reduce any potential difference between the coating measured thickness and a target value of the thickness. | 04-01-2010 |
| 20100086672 | METHOD AND APPARATUS FOR MONITORING AND CONTROLLING THE APPLICATION OF PERFORMANCE ENHANCING MATERIALS TO CREPING CYLINDERS - A method for monitoring and controlling the thickness of coating on a creping cylinder is disclosed. The methodologies involve a coordinated scheme of apparatuses that function to monitor various aspects of a creping cylinder coating so that the thickness of the coating can be determined. | 04-08-2010 |
| 20100086673 | HEATING FOR BUFFER LAYER DEPOSITION - Improved methods and apparatus for forming thin film buffer layers of chalcogenide on a substrate web through the chemical combination of a metal and chalcogen in solution form. The web and/or the solutions may be heated by one or a plurality of heating elements that may be disposed out of physical contact with the web, allowing enhanced control over the reaction speed through fine temperature control. One or more properties of the chalcogenide layer may be measured, and the temperature of the system may be adjusted in response. | 04-08-2010 |
| 20100112190 | COMPOSITE LAMINATE THICKNESS COMPENSATION - A method is provided for the non-contact measurement of variations in thickness of composite materials and structures prepared from composite parts. Metrologic methods are employed to provide a 3D image of the structure or part. Variations that are greater than an acceptable amount can be corrected by adding a compensation layer to the surface of the structure or part. | 05-06-2010 |
| 20100136216 | GAS DISTRIBUTION BLOCKER APPARATUS - Embodiments of the present invention generally provide apparatus and methods for altering the flow and pressure differential of process gases supplied across a showerhead of a processing chamber to provide improved deposition uniformity across the surface of a substrate disposed therein. In one embodiment, a blocker plate is disposed between a backing plate and a showerhead. In one embodiment, the distance between the blocker plate and the showerhead is adjustable. In another embodiment, the blocker plate has a non-planar surface contour. In another embodiment, a regional blocker plate is disposed between a backing plate and a showerhead. In another embodiment, a central blocker plate and a peripheral blocker plate are disposed between a backing plate and a showerhead. | 06-03-2010 |
| 20100203231 | METHOD AND APPARATUS FOR PRODUCING INSULATED WIRE - Disclosed is a method of producing an insulated electric wire, in which a primary coating layer including at least an enamel-baking layer is formed on a metallic conductor to form a primary coated electric wire, and a secondary coating layer is extrusion-formed on the primary coating layer of the primary coated electric wire. The method includes an electric wire pre-heating process where a surface of the primary coating layer is pre-heated using an electric wire pre-heating unit, and a resin extrusion process where a secondary coating layer is extrusion-formed on the pre-heated primary coating layer using a resin extrusion unit. Further disclosed is an apparatus for producing an insulated electric wire. | 08-12-2010 |
| 20100233354 | Device for Creating a Printing Plate and Development Process - The invention concerns a device forcreating a printing plate including a support ( | 09-16-2010 |
| 20100239743 | DROPLET DISCHARGE DEVICE, METHOD FOR DISCHARGING DROPLETS, AND METHOD FOR MANUFACTURING COLOR FILTER - A droplet discharge device includes a droplet discharge head, a feed reel, a drying chamber, a drying-gas-introducing device, a take-up reel, an imaging device, an analyzing unit and a control unit. The imaging device captures an image of functional liquid discharged from nozzles of the droplet discharge head onto a sheet member between the feed reel and the take-up reel with the sheet member having been dried in the drying chamber filled with a drying gas to achieve a predetermined humidity. The analyzing unit measures an area over which the functional liquid is deposited on the sheet member from each of the nozzles, and calculates a distribution of a discharge amount of the functional liquid. The control unit adjusts a voltage applied to the drive elements so that the discharge amount of the functional liquid from each of the nozzles approximates a predetermined optimum amount. | 09-23-2010 |
| 20100247745 | METHOD FOR MANUFACTURING A COMPOUND FILM - A method for manufacturing a compound film comprising a substrate and at least one additional layer is disclosed. The method comprising the steps of depositing at least two chemical elements on the substrate and/or on the at least one additional layer using depositions sources, maintaining depositing of the at least two chemical elements while the substrate and the deposition sources are being moved relative to each other, measuring the compound film properties, particularly being compound film thickness, compound-film overall composition, and compound-film composition in one or several positions of the compound film, comparing the predefined values for the compound film properties to the measured compound film properties, and adjusting the deposition of the at least two chemical elements in case the measured compound film properties do not match the predefined compound film properties. | 09-30-2010 |
| 20110014355 | METHOD AND SYSTEM FOR LAYERWISE PRODUCTION OF A TANGIBLE OBJECT - A method for layerwise production of a tangible object comprises repeatedly performing method cycles. Each method cycle comprises the steps of solidifying a predetermined area of an uppermost liquid layer ( | 01-20-2011 |
| 20110027458 | CONTINUOUS ANALYTE SENSORS AND METHODS OF MAKING SAME - Described here are embodiments of processes and systems for the continuous manufacturing of implantable continuous analyte sensors. In some embodiments, a method is provided for sequentially advancing an elongated conductive body through a plurality of stations, each configured to treat the elongated conductive body. In some of these embodiments, one or more of the stations is configured to coat the elongated conductive body using a meniscus coating process, whereby a solution formed of a polymer and a solvent is prepared, the solution is continuously circulated to provide a meniscus on a top portion of a vessel holding the solution, and the elongated conductive body is advanced through the meniscus. The method may also comprise the step of removing excess coating material from the elongated conductive body by advancing the elongated conductive body through a die orifice. For example, a provided elongated conductive body | 02-03-2011 |
| 20110135807 | MULTI-LAYER, SUBSTANTIALLY POLYVINYL CHLORIDE- AND POLYOLEFIN-FREE COMPOSITE FILM - The invention relates to a multilayer composite film which is substantially free from polyvinyl chloride and polyolefins. In particular, the layers of the film may include an ABS material, a polystyrene material, and/or a polyester material. The material composition and thickness of composite film are such that the maximum tensile force generated when a test body including the composite film is subjected to a specified single-axis tensile testing procedure ranges between 30 Newtons and 280 Newtons. | 06-09-2011 |
| 20110143018 | Methods and systems for making battery electrodes and devices arising therefrom - The invention provides, in preferred embodiments, methods, systems, and devices arising therefrom for making battery electrodes, in particular, for lithium-ion batteries. Unlike conventional slurry coating methods that use mechanical means to coat thick pastes of active material, other materials, and solvent(s) onto a substrate, the invention provides for a method to produce electrode coatings onto support in a multi-layer approach to provide highly uniform distribution of materials within the electrode. Problems of differential sedimentation of particles in slurries found in conventional methods are minimized with the methods of the present invention. Also included are systems for producing in large-scale the battery electrodes of the invention. Further included are electrodes produced by the methods and systems described herein. | 06-16-2011 |
| 20110183065 | Methods and apparatus for roll-coating sheet articles using metering roll of variable profile - Methods and apparatus for coating a major surface of a strip article advancing past and in contact with an applicator roll by supplying coating material to the applicator roll for transfer to the strip surface while urging a metering roll against the applicator roll to impart a coating profile to the coating material on the applicator roll before the coating material having that profile is transferred to the strip surface, wherein the metering roll is subjected to a force for bending the axis of the metering roll convexly toward the applicator roll, thereby to compensate for deflection of the metering roll that would otherwise tend to cause nonuniformity of applied coating weight across the width of the strip. | 07-28-2011 |
| 20110189378 | Apparatus and method for coating a functional layer - An apparatus and method for coating a functional layer on a current collector with an active material layer thereon, the apparatus including a first roll and a second roll, the first roll and second roll being for advancing the current collector; a gravure roll, the gravure roll being configured to coat the functional layer on the active material layer; a thickness measurer, the thickness measurer being configured to measure at least one of a thickness of the active material layer and a sum thickness of the active material layer and the functional layer; and a controller, the controller being in communication with the thickness measurer and being configured to control a rotation speed of the gravure roll. | 08-04-2011 |
| 20110189379 | METHOD FOR THE THERMOGRAPHIC INSPECTION OF NONMETALLIC MATERIALS, PARTICULARLY COATED NONMETALLIC MATERIALS, AS WELL AS METHOD FOR THE PRODUCTION THEREOF AND AN OBJECT PRODUCED ACCORDING TO THE METHOD - A method for the thermographic inspection of nonmetallic materials, particularly coated nonmetallic materials, is provided. The method includes heating at least one part of the surface of the nonmetallic material, preferably a part of the surface furnished with a nonmetallic coating, by a short energy pulse, preferably a light pulse, or by periodic input of heat, and recording the temporal and spatial temperature profile at least at a plurality of successive time points. | 08-04-2011 |
| 20110244115 | Extrusion Application System - A machine and a method of applying a non-Newtonian liquid composition onto a surface in a controlled manner. The composition is held in a chamber at a controlled variable pressure and is dispensed through a slit die nozzle as controlled by a valve. Characteristics of the composition are empirically developed and provided to a logic control circuit to assure that the composition is dispensed on either the entire surface or in one or more precise locations. | 10-06-2011 |
| 20120027916 | ARRANGEMENT AND METHOD FOR MEASUREMENT OF THE TEMPERATURE AND OF THE THICKNESS GROWTH OF SILICON RODS IN A SILICON DEPOSITION REACTOR - An arrangement for measurement of temperature and thickness growth of silicon rods in a silicon deposition reactor employs a temperature measurement device located outside the reactor. Continuous temperature measurement and measurement of the thickness growth throughout the entire deposition process is achieved with a contactlessly operating temperature measurement device arranged outside the silicon deposition reactor in front of a viewing window. The temperature measurement device can be pivoted horizontally about a rotation axis by a rotating drive. The pivoting axis runs parallel to a longitudinal axis of the silicon rod, and the central axis of the temperature measurement device runs through the pivoting axis. | 02-02-2012 |
| 20120076923 | WET PAINT COATING THICKNESS MEASUREMENT AND INSTRUMENT - An instrument is described for measuring the thickness of a paint coating on a rotating roll of a roll coating applicator roll for determination of the thickness of a paint coating to be applied to a moving substrate comprising: sensor means arranged for emitting and detecting signals reflected from the surface of the paint coating on at least one roll of the roll coating applicator to generate data indicative of the position of the surface of the paint on the roll, the sensor means being distanced from the paint coating for the emission and detection of the signals; and processing means for processing the data generated by the sensor means to determine the thickness of the paint coating to be applied to the substrate. | 03-29-2012 |
| 20120088026 | FILM THICKNESS MEASUREMENT - A method for determining the thickness of a film on a substrate is described. The substrate has a first major surface opposite a second major surface, and the film covers a portion of the first major surface. During a first measurement step, a first measuring beam is used to determine the distance from a first reference point to a portion of the first major surface of the substrate that is not covered with the film, and a second measuring beam is used to determine the distance from a second reference point to a portion of the second major surface of the substrate that is not covered with film. During a second measurement step the first measuring beam is used to determine the distance from the first reference point to the film, and the second measuring beam is used to determine the distance from the second reference point to a portion of the second major surface of the substrate that is not covered with film. The thickness of the film so determined may be used as a control parameter in a method of applying an ink to an automotive glazing pane. | 04-12-2012 |
| 20120114837 | FILM FORMATION APPARATUS AND FILM FORMATION METHOD - Provided are a film formation apparatus and a film formation method which may control with accuracy the thickness of a thin film formed on the film formation object. A film formation apparatus includes a moving part (film formation source unit) for moving a film formation source between a predetermined film formation waiting position and a predetermined film forming position is provided, and the moving part holds a quartz oscillator for measurement and a quartz oscillator for calibration so that their relative positions with respect to the film formation source are maintained. And a calibration step for calibrating a monitored value of the quartz oscillator for measurement, using a monitored value of the quartz oscillator for calibration, is performed in a middle of the film forming step of forming the film on the film formation object. | 05-10-2012 |
| 20120114838 | FILM FORMATION APPARATUS - A film formation apparatus includes a film formation source, a quartz oscillator for measurement, and a quartz oscillator for calibration. When a thin film of a film forming material is formed on a film formation object, the film forming material is heated in the film formation source to release vapors thereof. The quartz oscillator for measurement measures the amount of the film forming material formed on the film formation object, while the quartz oscillator for calibration calibrates the quartz oscillator for measurement. In the film formation apparatus, there are further provided a moving part for moving the film formation source between a predetermined film formation waiting position and a predetermined film forming position with respect to the film formation object and a temperature control part for controlling a temperature of the quartz oscillator for measurement and a temperature of the quartz oscillator for calibration to be substantially the same. | 05-10-2012 |
| 20120114839 | VACUUM VAPOR DEPOSITION SYSTEM - Provided is a vacuum vapor deposition system, which enables a vapor deposition rate to be measured accurately and a film thickness to be controlled with higher accuracy. The vacuum vapor deposition system includes: a vacuum chamber; a substrate holding mechanism; a vapor depositing source; a film thickness sensor for monitoring; a control system including a temperature controller and a film thickness controller; and a film thickness sensor for calibration, in which a distance from one film thickness sensor whose measurement accuracy is to be enhanced, out of the film thickness sensor for monitoring and the film thickness sensor for calibration, to a center of the opening of the vapor depositing source, is smaller than a distance from another film thickness sensor to the center of the opening of the vapor depositing source. | 05-10-2012 |
| 20120114840 | VACUUM VAPOR DEPOSITION SYSTEM - Provided is a vacuum vapor deposition system including: a vapor depositing source; a film thickness sensor for monitoring; and a film thickness sensor for calibration, in which a distance L | 05-10-2012 |
| 20120148727 | Coating Apparatus and Method for Coating Using the Same - A coating apparatus to apply a coating solution onto a base material, including a first body portion, a second body portion spaced-apart by a gap from the first body portion, a coating solution inlet arranged in one region of the second body portion, a coating solution passage connecting the coating solution inlet to said gap, a coating solution outlet arranged at one end of the gap to discharge the coating solution supplied to the coating solution inlet and a gap adjusting arrangement including a plurality of gap adjusting portions arranged on the first body portion to adjust a size of the coating solution outlet, the plurality of gap adjusting portions being arranged in a width direction of the base material. | 06-14-2012 |
| 20120156362 | METHOD AND DEVICE FOR COATING PATH GENERATION - A method for generating a motion path for a spray gun for coating a component is disclosed. Path templates for surface segments of the component are defined, the surface is analyzed, a first motion path is generated, a model of the spray profile is simulated, the coating thickness is simulated for the motion path based on the simulated model of the spray profile and the generated first motion path. The simulated coating thickness is compared with tolerances and when the simulated coating thickness does not achieve the tolerances, an adapted motion path is generated. The coating thickness is simulated for the motion path based on the simulated model of the spray profile and the generated adapted motion path. Repeating the comparing, the motion path generation, and the simulation of the coating thickness based on the generated adapted motion path until the simulated coating thickness achieves the tolerances. | 06-21-2012 |
| 20120177811 | METHOD FOR MANUFACTURING A CORROSION SENSOR - A method for manufacturing a corrosion sensor includes spraying a non-conductive material on a substrate and spraying a conductive material at discrete locations on the substrate or on the non-conductive material. The method further includes spraying the non-conductive material around the discrete locations of the conductive material. | 07-12-2012 |
| 20120201954 | METHOD OF DETERMINING MULTILAYER THIN FILM DEPOSITION ON A PIEZOELECTRIC CRYSTAL - A method for accurately calculating the thickness of deposited thin film layers onto a piezoelectric crystal blank in which dissimilar materials can be utilized, enabling determinations for various applications employing exotic materials. Additionally, the specific acoustic impedance (or equivalent z-ratio) of an unknown deposited material can be determined. The exact analytical solution nearly eliminates thickness errors when several layers of different materials are sequentially deposited on the same monitor quartz crystal. | 08-09-2012 |
| 20120213913 | Method and Device for Regenerating the Interior Surfaces of Conduits by Means of Thermal Spraying of Metals - A method for regeneration of internal conduit surfaces by thermal projection of metals, includes inserting a device including a vehicle having a rolling assembly to permit rolling of the vehicle and carrying a thermal projection system, through a manhole in a conduit installation, including the steps of inserting the device in a conduit with the rolling assembly in a retracted position, and expanding the rolling assembly inside the conduit until the device is centered in the conduit; inserting electrical, pneumatic and/or hydraulic conduits and conduits for supplying metal to be thermally projected, through the manhole, such that the conduits are connected with the vehicle; positioning a regeneration device including the thermal projection system connected with the vehicle by a remote-control pulling system in a particular position to be regenerated; thermally projecting metal from the regeneration device; advancing the vehicle and connected regeneration device to a new regeneration position. | 08-23-2012 |
| 20120237667 | PRINTED LAYER FORMATION PROCESSING DEVICE AND PRINTED LAYER FORMATION PROCESSING METHOD - A printed layer formation processing device performs a part of a process for forming a printed layer on a part of the print medium by a first colorant in a molded object formation process. The printed layer formation processing device includes: a formation amount correspondence relationship storage part that stores a formation amount correspondence relationship, which is a correspondence relationship between a degree of deformation of the print medium and a formation amount of the first colorant, which are correlated so that the thickness of the printed layer is substantially the same in respective regions of the molded object, a deformation degree acquisition part that acquires the degree of deformation in the respective regions of the print medium; and a formation amount determining part that determines the formation amount of the first colorant in the respective regions based on the degree of the deformation and the formation amount correspondence relationship. | 09-20-2012 |
| 20120263865 | DUAL LANE COATING - The present invention relates to methods and apparatuses for forming an active-containing film product, while significantly reducing the amount of wasted active material. The resulting product is an active-containing film product that meets the user's predetermined criteria of physical properties and is suitable for use. | 10-18-2012 |
| 20120269958 | MATERIAL BUILDUP SIMULATIONS BY APPLICATION OF POWDER JET MASS CONSERVATION PRICIPLES - A method for simulating of the thickness of a coating which is placed onto a substrate surface is disclosed. The thickness is simulated using mass conservation principles. In a preferred embodiment at least one reference spray trial is performed, the correlation of a single spray profile to at least one spray process parameter is determined, the single spray profile is simulated using mass conservation principles to an incoming powder jet stream. | 10-25-2012 |
| 20120276282 | TOOLING CARRIER FOR INLINE COATING MACHINE, METHOD OF OPERATING THEREOF AND PROCESS OF COATING A SUBSTRATE - A process of coating at least one substrate with a plurality of deposition sources, a method of tooling, a carrier unit and a deposition system are described. The systems and methods provide for or allow for exposing a first substrate portion | 11-01-2012 |
| 20120288615 | APPARATUS AND METHOD FOR TREATING SUBSTRATE - Provided are an apparatus and method for depositing a thin film on a substrate. The substrate is supported by a substrate holder. The substrate holder is seated on each of a plurality of holder seating grooves defined in a top surface of the susceptor. An injection hole for injecting a gas is defined in a top surface of each of the holder seating grooves. When a process is performed, the susceptor is rotated with respect to a central axis thereof, and the substrate holder is rotated with respect to a central axis of the substrate holder by the gas injected from the injection hole. A flow rate of the gas supplied onto an under surface of the substrate holder is adjusted according to a state of the substrate. | 11-15-2012 |
| 20120288616 | MEASUREMENT METHOD AND DEVICE FOR MEASURING LAYER THICKNESSES AS WELL AS PRODUCTION METHOD AND COATING SYSTEM - A method for measuring the thickness of a coating on a component section of a rotating component, wherein a heat expansion of the component section is determined by detecting a component core temperature and an actual coating thickness is produced, a device for conducting a method of this type having a temperature detecting system and having an evaluating device, as well as a production process and a coating system, are disclosed. | 11-15-2012 |
| 20120295014 | INJECTOR FOR A VACUUM VAPOUR DEPOSITION SYSTEM - An injector for a vacuum vapour deposition system, includes an injection duct suitable for receiving vaporized materials from a vacuum evaporation source and a diffuser having a plurality of nozzles for diffusing the vaporized materials into a vacuum deposition chamber, each nozzle including a channel suitable for connecting the injection duct to the deposition chamber. The diffuser has a spatially varying nozzle distribution. A process for calibrating an injector and a process for manufacturing a diffuser for an injector are also described. | 11-22-2012 |
| 20130004653 | Alignment Film Coating Method and Alignment Film Coating Apparatus - An alignment film coating method for spraying alignment film droplets on a glass substrate provided with color filters is disclosed. The color filters include a plurality of groups of cuboidal R, G, B trichromatic color filters having an equal area but different thicknesses and arranged in rows and columns, and the R, G, B trichromatic color filters are disposed at intervals with a groove being formed between every two adjacent color filters. A plurality of spray nozzles for spraying the alignment film droplets are arranged in a direction parallel to an arrangement direction of the color filters of a same color. An alignment film coating apparatus is further disclosed. By using the alignment film coating method and the alignment film coating apparatus of the present disclosure to coat an alignment film, the alignment film can be made more uniform and flat. | 01-03-2013 |
| 20130078364 | METHOD AND APPARATUS FOR MONITORING AND CONTROLLING THE APPLICATION OF PERFORMANCE ENHANCING MATERIALS TO CREPING CYLINDERS - A method for monitoring and controlling the thickness of coating on a creping cylinder is disclosed. The methodologies involve a coordinated scheme of apparatuses that function to monitor various aspects of a creping cylinder coating so that the thickness of the coating can be determined. | 03-28-2013 |
| 20130101730 | MICROWAVE PLASMA REACTORS - New and improved microwave plasma assisted reactors, for example chemical vapor deposition (MPCVD) reactors, are disclosed. The disclosed microwave plasma assisted reactors operate at pressures ranging from about 10 Torr to about 760 Torr. The disclosed microwave plasma assisted reactors include a movable lower sliding short and/or a reduced diameter conductive stage in a coaxial cavity of a plasma chamber. For a particular application, the lower sliding short position and/or the conductive stage diameter can be variably selected such that, relative to conventional reactors, the reactors can be tuned to operate over larger substrate areas, operate at higher pressures, and discharge absorbed power densities with increased diamond synthesis rates (carats per hour) and increased deposition uniformity. | 04-25-2013 |
| 20130115366 | APPARATUS AND METHOD FOR FORMING THIN FILM - Apparatus and a method for forming a thin film including a vacuum chamber, a substrate holder located on the inner upper side of the vacuum chamber to secure a substrate, an evaporation source located on the inner lower side of the vacuum chamber to evaporate a deposition material, an evaporation source shutter substantially confining the deposition material evaporated to the evaporation source, a sensor located within the vacuum chamber to detect the thickness of the deposition material deposited on itself, and a calculation portion calculating the thickness of the deposition material deposited on the evaporation source shutter using data detected by the sensor. | 05-09-2013 |
| 20130156940 | ADJUSTABLE NOZZLE FOR PLASMA DEPOSITION AND A METHOD OF CONTROLLING THE ADJUSTABLE NOZZLE - The description relates to an adjustable nozzle capable of pivoting about an axis of the nozzle and translating along the axis of the nozzle. A high density plasma chemical vapor deposition (HDP CVD) chamber houses a plurality of adjustable nozzles. A feedback control system includes a control unit coupled to the adjustable nozzle and the HDP CVD chamber to form a more uniform thickness profile of films deposited on a wafer in the HDP CVD chamber. | 06-20-2013 |
| 20130171336 | WAFER PROCESSING METHOD AND SYSTEM USING MULTI-ZONE CHUCK - In a wafer processing method and a wafer processing system, a first property on a back side of a wafer is measured. The back side of the wafer is supported on a multi-zone chuck having a plurality of zones with controllable clamping forces. The wafer is secured to the multi-zone chuck by controlling the clamping forces in the corresponding zones in accordance with measured values of the first property in the zones. | 07-04-2013 |
| 20130260016 | Sealant Analysis System - A method and apparatus for inspecting sealant on an object. First data is generated for a first geometry of a first surface of the object prior to sealing the object. Second data is generated for a second geometry of a second surface of the object after the sealant has been applied to the object. A difference is identified between the first data and the second data. The difference indicates a thickness of the sealant on the object. | 10-03-2013 |
| 20130273237 | Method to Determine the Thickness of a Thin Film During Plasma Deposition - The present invention provides a method to determine the thickness of a thin film during deposition. A target film thickness is set. A substrate is placed within a deposition system. The thin film is deposited onto the substrate within the deposition system. Radiation reflected from the substrate is monitored at multiple wavelengths during the deposition of the thin film using standard OEI techniques. A value derived from the reflected radiation is monitored. A time is detected at which the derived value is at a target value. A film thickness is calculated at the detected times to generate data. A mathematical analysis is performed on the generated data to determine an equation for deposited film thickness versus time. The calculated equation for deposited film thickness versus time is used to achieve the target film thickness. | 10-17-2013 |
| 20130287933 | THREE-DIMENSIONAL (3D) PRINTING - In at least some examples, a three-dimensional (3D) printing system comprises a coarse 3D printing interface to form a 3D object core. The 3D printing system also comprises a fine 3D printing interface to form a 3D object shell around at least some of the 3D object core. The 3D printing system also comprises a controller to receive a dataset corresponding to a 3D object model and to direct the coarse 3D printing interface to form the 3D object core based on the dataset. | 10-31-2013 |
| 20130287934 | Liquid Metal Digital Manufacturing System - A process and apparatus for the production of metal parts by layered manufacturing starting from wire raw material comprising of the steps of; descaling of the wire; creating and maintaining a melt pool of the metal in a melt chamber; expelling controlled amounts of melt from the melt chamber in predetermined layer patterns, which solidify to form a desired object; managing the solidification parameters to achieve the deposit cross sections desired and depositing a removable support material to assist in maintaining the geometry of the desired metal deposit. Said apparatus is capable of higher production rate than other metal layered manufacturing systems available commercially and can be used for any metal alloy or non-metal material that can be supplied in wire form and that is within the melt capacity of this invention. | 10-31-2013 |
| 20140030424 | Method For Automatic Setting Of the Rider Roll/Glue Applicator Roll Gap On A Glue Machine - A method for automatically setting the rider roll/glue applicator roll gap for the single face web on a glue machine senses a forward drag that the single face web, operating at corrugator speed, exerts on the glue applicator roll, driven at an underspeed, after bringing the flute tips of the single face web into contact with the glue applicator roll by adjusting the position of the rider roll. Changes in forward drag exerted on the glue applicator roll are monitored and related directly to glue applicator roll drive current to provide a slight compression of the single face web between the rider roll and the glue applicator roll. Preferably, the glue applicator roll uses a regenerative drive and the target drive current command in a feedback control system to cause the gap to be adjusted to achieve the desired slight compression of the web flutes and to maintain the glue applicator roll under speed. | 01-30-2014 |
| 20140106062 | METHOD OF MONITORING PHOTOACTIVE ORGANIC MOLECULES IN-SITU DURING GAS-PHASE DEPOSITION OF THE PHOTOACTIVE ORGANIC MOLECULES - A method for in-situ monitoring of gas-phase photoactive organic molecules in real time while depositing a film of the photoactive organic molecules on a substrate in a processing chamber for depositing the film includes irradiating the gas-phase photoactive organic molecules in the processing chamber with a radiation from a radiation source in-situ while depositing the film of the one or more organic materials and measuring the intensity of the resulting photoluminescence emission from the organic material. One or more processing parameters associated with the deposition process can be determined from the photoluminescence intensity data in real time providing useful feedback on the deposition process. | 04-17-2014 |
| 20140134324 | AUTOMATIC LITHIUM TARGET REGENERATING APPARATUS AND AUTOMATIC LITHIUM TARGET REGENERATING METHOD - Provided are an automatic lithium target regenerating apparatus and an automatic lithium target regenerating method, which are equipped with a measurement function of a lithium film thickness of a lithium target, and may automatically regenerate the consumed lithium target by moving a vapor deposition source to the lithium target. An automatic lithium target regenerating apparatus ( | 05-15-2014 |
| 20140154402 | PRODUCTION OF POLYCRYSTALLINE SILICON BY NATURAL SINTERING FOR PHOTOVOLTAIC APPLICATIONS - Silicon sintering method, without applying an external force, comprising placement of a silicon sample in a furnace, then heat treatment of this sample at, at least one temperature and at least one partial pressure of oxidising species to control the thickness of a silicon oxide layer on its surface. | 06-05-2014 |
| 20140154403 | THIN FILM DEPOSITION SOURCE, DEPOSITION APPARATUS AND DEPOSITION METHOD USING THE SAME - A thin film deposition source, a deposition apparatus and a deposition method using the same are disclosed. The deposition apparatus includes a deposition source including a plurality of jet nozzles that spray a deposition substance on a surface of a substrate and are arranged in a first direction, and at least one shutter controlling a jet region of the deposition substance by opening or shielding at least a portion of a jetting passageway of the deposition substance. | 06-05-2014 |
| 20140170301 | THIN FILM DEPOSITION APPARATUS AND METHOD - A thin film deposition apparatus and method are disclosed. In one aspect, the deposition apparatus comprises a deposition source emitting a deposition material that is to be deposited on a surface of a substrate, a transfer unit moving the deposition source, a thickness measurement sensor measuring a thickness of the deposition material deposited on the surface of the substrate, and a transfer controller adjusting a moving speed of the transfer unit according to the thickness of the deposition material deposited on the surface of the substrate per unit of time. | 06-19-2014 |
| 20140170302 | METHOD AND APPARATUS FOR MONITORING AND CONTROLLING THE APPLICATION OF PERFORMANCE ENHANCING MATERIALS TO CREPING CYLINDERSTO IMPROVE PROCESS - The invention provides methods and compositions for monitoring and controlling the thickness of coating on a creping cylinder is disclosed. The methodologies involve a coordinated scheme of apparatuses that function to monitor various aspects of a creping cylinder coating so that the thickness of the coating can be determined. | 06-19-2014 |
| 20140178568 | DEVICES AND METHODS FOR PASSIVATING A FLEXIBLE SUBSTRATE IN A COATING PROCESS - An apparatus for passivating a coating of a flexible substrate includes a coating chamber for coating the flexible substrate, a chamber separation element, the chamber separation element being arranged for separating the coating chamber from a further chamber, a coating drum, the coating drum and the chamber separation element forming a gap, and a gas inlet, the gas inlet being arranged within the chamber separation element for supplying oxygen into the gap. | 06-26-2014 |
| 20140199472 | EJECTION VOLUME CORRECTION METHOD FOR INKJET HEAD, EJECTION VOLUME CORRECTION APPARATUS - An aspect of the present invention provides an ejection volume correction method for an inkjet head, including: an arranging step of ejecting functional ink as ink droplets from nozzles of an inkjet head so as to discretely arrange the ink droplets on a front surface of a substrate; a contacting step of filling the functional ink in between a mold and the substrate by causing the mold to contact the ink droplets arranged on the front surface of the substrate; a curing step of curing the filled functional ink so as to generate a functional film ; a separating step of separating the mold from the functional film; a measuring step of measuring a thickness of the functional film; and a correcting step of correcting an ejection volume from the nozzles based on the measured thickness. | 07-17-2014 |
| 20140272110 | METHODS OF PLATING OR COATING ULTRASOUND TRANSDUCERS - According to some embodiments, a method of depositing at least one electrode on a base member of an ultrasound transducer comprises at least partially etching a surface of the base member using a first etching agent, catalyzing the surface of the base member using a first catalyst, plating copper on the surface of the base member using an electroless plating process, inspecting the copper plated on the surface of the base member, at least partially etching a surface of the copper-plated surface using a second etching agent, catalyzing the copper-plated surface using a second catalyst, plating nickel on the copper-plated surface using an electroless plating process and depositing at least one layer of gold on the nickel-plated surface. | 09-18-2014 |
| 20140314947 | ARTICLES AND METHODS FOR ENHANCED BOILING HEAT TRANSFER - The present disclosure provides, among other things, scale-coated surfaces, vessels with controlled deposits of scale, and associated methods for enhanced boiling heat transfer. It is presently found that creating and/or maintaining a scale deposit at a controlled thickness actually enhances a type of boiling called nucleate boiling, which improves heat transfer. | 10-23-2014 |
| 20140329001 | AUTOMATIC PAINTING AND MAINTAINING WET-SURFACE OF ARTIFACTS - A system and method of coating a workpiece is disclosed. A controller is in electronic communication with a robotic manipulator having a coating dispenser. A layer of coating is applied to a surface of the workpiece by the robot. A wet-surface time is determined corresponding to the areas of the surface upon which the layer of coating is applied. A second layer of coating is applied prior to the expiration of the wet-surface time of the first layer. The layers of coating in adjacent segments can be applied in an overlapping manner within the boundary regions of the segments. | 11-06-2014 |
| 20140377450 | ULTRASONIC TRANSMITTING AND RECEIVING DEVICE FOR THICKNESS AND/OR GRAMMAGE MEASUREMENT - An ultrasonic transmitting and receiving device is provided for measuring the transmission and/or reflection of ultrasonic waves on a thin material sheet, or a coating applied thereto. The device may include a plurality of ultrasonic transmitters, a plurality of ultrasonic receivers, wherein the number of the ultrasonic transmitters corresponds to the number of the ultrasonic receivers, and one receiver electronics respectively for each of the ultrasonic receivers or a group receiver electronics respectively for a predetermined number of ultrasonic receivers. A method is provided for ultrasonic absorption and/or transmission measurement, in which signals are emitted by multiple ultrasonic transmitters at the same time or nearly at the same time which are received by ultrasonic receivers and in which the received signals are evaluated in parallel. | 12-25-2014 |
| 20150017320 | METHOD OF MANUFACTURING STACKED THIN FILM PIEZOELECTRIC FILTER - A method of manufacturing a stacked thin film piezoelectric filter includes the steps of forming a lower thin film piezoelectric resonator on a substrate, measuring a frequency of the lower thin film piezoelectric resonator and adjusting the frequency, forming an acoustic coupling layer on the lower thin film piezoelectric resonator whose frequency has been adjusted, forming the stacked thin film piezoelectric filter by forming an upper thin film piezoelectric resonator on the acoustic coupling layer, and measuring a frequency of the upper thin film piezoelectric resonator and adjusting the frequency. | 01-15-2015 |
| 20150050418 | CHANGING PRINTING CONTROL PARAMETERS BASED ON MEASURED SOLDER PASTE DEPOSITS IN CERTAIN SUBAREAS OF A PRINTED CIRCUIT BOARD - It is described a method for changing parameters for controlling a transfer of solder paste onto a printed circuit board ( | 02-19-2015 |
| 20150064343 | METHOD OF PRODUCING EXTREMELY THICK INSULATION COATING ON SURFACE OF ELECTRICAL STEEL - A method of producing an extremely thick insulation coating on a surface of an electrical steel, comprises the following steps: 1) preparing a coating liquid—stirring sufficiently the coating liquid for 0.1˜4 hours, with the viscosity of the coating liquid being within 10˜80 S; 2) coating a strip steel—using a double-roller or a tri-roller coating machine, wherein the film thickness and evenness can be controlled by adjusting different parameters; 3) baking the coating—using three sections, that is, a drying section, a baking section and a cooling section, to bake the coating, wherein the temperature in the drying section is 100˜400° C., the temperature in the baking section is 200˜370° C.; the time in the whole drying and solidification section is 33˜144 seconds, wherein the time in the drying section is 9˜39 seconds, and the baking time is 24˜105 seconds; wherein in the baking process, the strip steel having been coated is conveyed in a non-contact way, in particular, the strip steel is conveyed by blowing pressure-adjustable air onto the lower surface to make it float; the air pressure is 0˜2000 Pa; the wet film is kept out of contact with the furnace rollers before it is solidified, guaranteeing that the surface of wet film is intact; 4) online detecting the film thickness. | 03-05-2015 |
| 20150079274 | CRUCIBLE FOR VAPOR DEPOSITION, VAPOR DEPOSITION APPARATUS AND VAPOR DEPOSITION METHOD - Provided are a crucible for vapor deposition, a vapor deposition apparatus and a vapor deposition method capable of detecting a film formation rate using a sensor in vapor deposition by proximity vapor deposition. The crucible according to the present invention includes a storage section that stores a vapor deposition source, a first guide passage that guides a vaporized material emitted from the vapor deposition source toward a substrate to be treated, a wall section for defining the first guide passage and a second guide passage that diverges from a middle part of the first guide passage, penetrates the wall section and communicates with the outside. | 03-19-2015 |
| 20150352589 | Methods and Apparatus for Applying Adhesives in Patterns to an Advancing Substrate - The present disclosure involves methods and apparatuses for applying fluids onto an advancing substrate having an unconstrained caliper, Hs. The fluid application apparatus may include a slot die applicator and a substrate carrier, wherein the slot die applicator includes a slot opening, a first lip, and a second lip, the slot opening located between the first lip and the second lip. And the substrate carrier includes a base surface and a pattern element that includes a pattern surface and protrudes outward from the base surface. The substrate carrier is positioned adjacent the slot die applicator to define a minimum distance, Hg, between the pattern surface of the pattern element and the first lip and the second lip that is less than the unconstrained caliper, Hs, of the substrate. Embodiments of apparatuses may be configured to monitor; establish; maintain; and/or change the desired minimum distance, Hg, before and/or during operation. | 12-10-2015 |
| 20160067728 | METHOD OF FORMING A LAYER OF GLUE ON A WORK PIECE - A method of forming a layer of glue on a work piece includes: spraying the glue on the work piece; obtaining specification data of the glue by measuring a weight of the glue being sprayed on the work piece; and adjusting the spraying amount of the glue in real time according to the specification data of the glue. | 03-10-2016 |
| 20160090650 | METHOD AND APPARATUS FOR RF COMPENSATION IN PLASMA ASSISTED ATOMIC LAYER DEPOSITION - The embodiments herein relate to methods, apparatus, and systems for depositing film on substrates. In these embodiments, the substrates are processed in batches. Due to changing conditions within a reaction chamber as additional substrates in the batch are processed, various film properties may trend over the course of a batch. Disclosed herein are methods and apparatus for minimizing the trending of film properties over the course of a batch. More specifically, film property trending is minimized by changing the amount of RF power used to process substrates over the course of the batch. Such methods are sometimes referred to as RF compensation methods. | 03-31-2016 |
| 20160168710 | Gas Injection System For Chemical Vapor Deposition Using Sequenced Valves | 06-16-2016 |
| 20160178819 | SELF-FILTERED OPTICAL MONITORING OF NARROW BANDPASS FILTERS | 06-23-2016 |
