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Charging of chamber

Subclass of:

414 - Material or article handling

414147000 - CHAMBER OF A TYPE UTILIZED FOR A HEATING FUNCTION AND MATERIAL CHARGING OR DISCHARGING MEANS THEREFOR

Patent class list (only not empty are listed)

Deeper subclasses:

Class / Patent application numberDescriptionNumber of patent applications / Date published
414160000 Charging of chamber 61
20090142162SUBSTRATE TREATING APPARATUS WITH INTER-UNIT BUFFERS - The invention provides coating units, heat-treating units, and a first main transport mechanism for transporting substrates to each of these treating units. The substrates are transferred from the first main transport mechanism to a second main transport mechanism through a receiver. When a substrate cannot be placed on the receiver, this substrate is placed on a buffer. Thus, the first main transport mechanism can continue transporting other substrates. The other substrates in the treating units are transported between the treating units without delay, to receive a series of treatments including coating treatment and heat treatment as scheduled. This prevents lowering of the quality of treatment for forming film on the substrates.06-04-2009
20090257849APPARATUS AND METHOD FOR LOADING PARTICULATE MATERIAL INTO VERTICAL TUBES - An apparatus and method for loading particulate material in a vertical tube comprising at least one impact-absorbing module, a central axis and a sustaining wire to position the apparatus suspended in the interior of the tube in such a way as to allow loading and uniform distribution of all the material loaded in the tube and the method of loading that uses the apparatus is also described.10-15-2009
20100061828VERTICAL THERMAL PROCESSING APPARATUS - The present invention is a processing apparatus comprising a transfer mechanism including at least one transfer plate, the transfer mechanism being configured to cause, when a substrate to be processed is placed on an upper surface of the transfer plate, the transfer plate to move while maintaining the substrate to be processed placed horizontally thereon. The transfer plate has a cantilevered support structure horizontally extending from a proximal end thereof to a distal end thereof in a fore and aft direction. An upper surface of the transfer plate is provided with a plurality of support projections configured to horizontally support the substrate to be processed at a substantially central position thereof and a rear position thereof in the fore and aft direction. The substrate to be processed is not supported on the distal portion of the transfer plate.03-11-2010
20100098517PROCESSING APPARATUS AND PROCESSING METHOD - A processing apparatus including: a carry-in area into which a container containing substrates to be processed is carried, the container having a flange part on an upper part thereof and an opening in a front surface thereof, with a lid being detachably fixed to the opening; a transfer area whose atmosphere is maintained differently from an atmosphere of the carry-in area; a partition wall separating the carry-in area and transfer area; a through-hole formed in the partition wall; a door configured to open and close the through-hole; and a table on which the container can be placed in the carry-in area. After the container has been placed and then held on the table, the container is brought into contact with the through-hole, the door and the lid are opened, and the substrates to be processed in the container are conveyed to the transfer area so as to process the substrates.04-22-2010
20100104402HIGH TEMPERATURE SHEET HANDLING SYSTEM AND METHODS - Methods and apparatus provide for imparting a controlled supply of gas to at least one Bernoulli chuck to provide a balanced draw and repellant gas flow to a material sheet; and at least one of: elevating a temperature of the supply of gas to the at least one Bernoulli chuck such that the gas flow to the material sheet is provided at the elevated temperature providing a stream of gas to an insulator substrate to promote separation of an exfoliation layer from a donor semiconductor wafer, and providing a stream of gas to a junction of the insulator substrate and any support structure to promote separation of the insulator substrate and the supporting structure.04-29-2010
20100143079VACUUM PROCESSING APPARATUS - A vacuum treatment apparatus is provided with a plurality of carriers whereupon a base material is mounted; a circulation path which is held in a controlled atmosphere and permits the carriers to circulate therein; a plurality of base material exit/entrance chambers arranged in the circulation path for loading and taking out the base material on and from the carriers; and vacuum treatment chambers which are arranged between the base material exit/entrance chambers in the circulation path and perform vacuum treatment to the base material.06-10-2010
20100143080DEVICE AND METHOD FOR LOADING AND UNLOADING A HEAT TREATMENT FURNACE - The invention relates to a device for loading and unloading a heat treatment furnace and to a corresponding method. Heat treatment furnaces are normally loaded and unloaded by means of a so-called elevator. During unloading, a removed workpiece is usually lowered by means of the elevator into an oil bath, in which it is then removed from the elevator. Oil is then transferred into the furnace chamber via the oil-covered elevator. Such an application of oil is avoided by means of a device comprising a frame rack having a first and a second level, which are disposed parallel above each other, and are connected to each other by means of a plurality of frame braces, wherein the first and the second levels have a plurality of openings and the frame braces have guide means. The device further comprises a plurality of lifting braces that are connected by a lifting mechanism and are supported vertically movably in the guide means, wherein each lifting brace has carriers at a first and a second position, wherein the carriers are aligned on the lifting braces such that they can be moved in the associated levels in or through the openings upon a vertical movement of the lifting braces. The device further comprises a retaining means disposed on a frame brace, which limits the vertical movement of the corresponding lifting brace.06-10-2010
20110064543REACTION VESSEL AND METHOD FOR THE HANDLING THEREOF - A cuvette (03-17-2011
20110076116SOLID FUEL CONVEYANCE AND INJECTION SYSTEM FOR A GASIFIER - A system for use in a gasification system, comprises a solid pump that delivers a pressurized fuel and a high-pressure transition vessel. The transition vessel comprises a first inlet connected to an outlet of the solid pump so that all of the fuel from the solid pump passes through the transition vessel, a second inlet for connection to a conveyance gas line, and an outlet through which the fuel is transported to a gasifier. The transition vessel is elongated in the direction of a flow so that a conveyance gas introduced through said conveyance gas line plus the pressure difference carries the fuel to the gasifier.03-31-2011
20120170999LOAD LOCK DEVICE AND PROCESSING SYSTEM - A load lock device is connected between a vacuum chamber and an atmospheric chamber through gate valves and the interior thereof is selectively switchable between a vacuum atmosphere and an atmospheric pressure atmosphere. The load lock device includes: a load lock container; a support unit provided in the load lock container and having supporting portions for supporting target objects in multiple stages; a gas introduction unit having gas ejection holes which are provided so as to correspond to the supporting portions and eject as a cooling gas a restoring as for restoring the atmosphere in the load lock container to the atmospheric pressure; and a vacuum exhaust system for evacuating the atmosphere in the load lock container to vacuum.07-05-2012
20120213613WAFER BOAT ASSEMBLY, LOADING APPARATUS COMPRISING SUCH A WAFER BOAT ASSEMBLY AND METHOD FOR LOADING A VERTICAL FURNACE - Wafer boat assembly for use in a loading apparatus for loading semiconductor substrates in a vertical furnace configured for batch processing, wherein the wafer boat assembly comprises a wafer boat for holding semiconductor substrates and a cover configured to substantially surround the substrates, wherein the wafer boat assembly is provided with 08-23-2012
20120219387THERMAL CURING METHODS AND SYSTEMS FOR FORMING CONTACT LENSES - Contact lens curing systems and methods are described. A contact lens curing system includes an oven that has a plurality of curing zones, a mold advancement system for moving contact lens mold assemblies between the plurality of zones, and a controlled atmosphere the curing zones that provides a substantially chemically inert environment in which contact lens precursor materials can be polymerized in contact mold assemblies located in the curing zones. Methods of producing contact lenses include curing contact lens precursor materials in contact lens mold assemblies in the lens curing system.08-30-2012
20120269603LOADING UNIT AND PROCESSING SYSTEM - A loading unit which elevates a substrate holder holding a plurality of substrates to be subjected to heat treatment with respect to a cylindrical processing container whose bottom portion is opened and closed by a cap, includes, a loading housing, an elevator mechanism elevating the substrate holder, a shutter closing an opening of the bottom of the processing container, a substrate moving and loading mechanism having an elevatable moving and loading arm, a first partitioning box installed to surround the elevator mechanism and a moving space of the elevated substrate holder and provided with a cooling gas injecting means, a second partitioning box connected to the first partitioning box and is installed to surround the substrate moving and loading mechanism and a moving space of the substrate moving and loading mechanism, and a third partitioning box connected to the first partitioning box and is installed to surround the shutter.10-25-2012
20130028687HEAT TREATMENT APPARATUS AND METHOD OF TRANSFERRING SUBSTRATES TO THE SAME - A heat treatment apparatus includes a vessel loading unit on which a substrate vessel configured to accommodate a plurality of substrates at a first interval is loaded, a substrate holder configured to hold the plurality of substrates at a second interval which is smaller than the first interval, a substrate transfer unit capable of supporting the substrates and configured to transfer the plurality of substrates between the substrate holder and the substrate vessel and includes at least two substrate supporting parts stacked with the first interval therebetween and configured to be simultaneously advanced and retreated relative to the substrate vessel and individually advanced and retreated relative to the substrate holder, and a control unit configured to control an upper one of the at least two substrate supporting parts to be in an inoperative state when a lower one is supporting the substrate.01-31-2013
20130039723DEVICE FOR DISTRIBUTING BULK MATERIAL WITH A DISTRIBUTION SPOUT SUPPORTED BY A CARDAN SUSPENSION - A distribution device for distributing bulk material with a distribution spout on a cardan suspension that has a first and a second gimbal member pivotable about two perpendicular suspension axes where a drive arrangement has a first and a second transmission mechanism for controlling pivotal motion of the distribution spout about the suspension axes and the drive arrangement has a further cardan joint, with a first part pivotable about a third axis and a second part pivotable about a fourth axis, and a rotary motor for driving a rotary drive shaft that is connected to the cardan joint by means of an articulated connecting arm such that the rotational position and the axial position of the drive shaft determine the pivotal position of the second part about the third and fourth axes respectively, where the transmission mechanisms transmit torque about the third and fourth axes from the cardan joint to the cardan suspension for pivoting the distribution spout about the first and second axes respectively.02-14-2013
20140064885COVER OPENING/CLOSING APPARATUS, THERMAL PROCESSING APPARATUS USING THE SAME, AND COVER OPENING/CLOSING METHOD - Provided is a cover opening/closing apparatus which includes: a wafer conveyance port having an opening edge and configured to be opened/closed by an opening/closing door; and a cover removal apparatus installed on the opening/closing door and configured to remove a cover of a FOUP which is formed with a substrate outlet having a opening edge. When the cover removal apparatus removes the cover of the FOUP, the opening edge of the substrate outlet is closely contacted with the opening edge of the wafer conveyance port. The cover removal apparatus includes: a latch key which is engaged with the cover of the FOUP, a driving unit configured to drive the latch key, and an accommodation unit configured to accommodate the driving unit. The cover opening/closing apparatus further includes an exhaust system configured to exhaust a space within the accommodation unit.03-06-2014
20150299591CHAR REMOVAL PIPE - Provided is a char removal pipe comprising a removal pipe (10-22-2015
414161000 With control system responsive to condition in chamber 5
20090016854Heat-treating apparatus and method of producing substrates - A heat-treating apparatus capable of realizing a highly precise processing maintaining a high degree of safety, and a method of producing substrates are provided. The heat-treating apparatus comprises a reaction tube for treating substrates; a manifold for supporting the reaction tube; and a heater provided surrounding the reaction tube to heat the interior of reaction tube; wherein the reaction tube and the manifold are in contact with each other as their continuous flat surfaces come in contact with each other; a cover member is provided to cover the contact portion between the reaction tube and the manifold from the outer side; and the cover member is provided with at least either a gas feed port or an exhaust port communicated with a space formed among the cover member, the reaction tube and the manifold.01-15-2009
20100284768METHOD AND APPARATUS FOR FEEDING A PULVERIZED MATERIAL - The present invention is referred to a method and an apparatus for feeding a pulverized material. The apparatus comprises fuel feeding means to supply pulverized fuel. Flexible means are coupled between the fuel feeding means and dosing means for the filling of the dosing means. The dosing means are closed and pressurized once that the dosing means have been filled. The pulverized material is discharged from the dosing means while controlling the pressurization during the discharge, in order to provide a continuous and constant discharge of the pulverized fuel. The apparatus includes means for detecting a minimum level or weight of pulverized fuel in the dosing means, and means for depressurizing the dosing means once that the minimum level of the pulverized fuel has been reached.11-11-2010
20110170989SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - Provided is a substrate processing apparatus suppressing the vibration of a cover in an initial stage of unloading a boat from a process pipe. The substrate processing apparatus comprises: a boat for placing a substrate; a process pipe receiving the boat; a cover on which the boat is placed, the cover opening and closing a furnace port installed on a lower end of the process pipe; an elevation mechanism moving the cover upward and downward; a motor driving the elevation mechanism; a sealing member sealing a space between the cover and a lower end surface of the process pipe; and a controller controlling torque of the motor such that the substrate is maintained a rest position within the boat in a deformation recovery period of the cover occurring when the sealing member is removed from a surface of the cover or the lower end surface of the process pipe.07-14-2011
20130202386SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM - A substrate processing apparatus includes a control unit performing loading substrates into a second unit block when a trouble occurs in a module of a first unit block; determining whether it is before a leading substrate of a next lot of the lot where a standby substrate positioned in upper stream side than the troubled module belongs is loaded into the module in the uppermost stage of the second unit block; loading the standby substrate into the module in the uppermost stage of the second unit block when determined it is before the loading of the leading substrate and loading the standby substrate into the module in the uppermost stage of the second unit block after a rearmost substrate of the next lot is loaded into the module in the uppermost stage of the second unit block when determined otherwise; and performing a series of processing on the standby substrate.08-08-2013
20160049321SEMICONDUCTOR BAKING APPARATUS AND OPERATION METHOD THEREOF - A semiconductor baking apparatus includes a load lock chamber, a process chamber, a transfer chamber, a first interior door, and a controller. The process chamber has a first accommodating space therein. The transfer chamber has a second accommodating space therein, and the transfer chamber is connected to the load lock chamber and the process chamber. The first interior door is between the process chamber and the transfer chamber. When the first interior door is opened, the first accommodating space is communicated with the second accommodating space. The controller is programmed to open the first interior door when the semiconductor baking apparatus idles.02-18-2016
414165000 By depositing material onto surface of glass melt 1
414166000 With pushing device to move material therealong 1
20120070252METHOD AND DEVICE FOR SUPPLYING GLASS MELTING FURNACES WITH FREE FLOWING GLASS MIXTURES - A method and a device for supplying free flowing glass mixtures by transport devices for feeding the glass mixture through a doghouse opening of a glass melting furnace above the glass level, and a pusher driven by a pusher arm for distributing the glass mixture on the glass melt. The transport devices and the pusher arm extend through the doghouse opening and at are least extensively sealed. To feed glass mixture into the furnace and to distribute it over the melt surface in a targeted manner, thereby extensively maintaining the sealing of the interior of the furnace from the surroundings, the glass mixture is applied to the glass melt by two adjacent transport devices and independently controlled with regard to the delivered quantity per unit of time, and is distributed over the glass melt by continuous rotary motions of the pusher at both sides of the pusher arm.03-22-2012
414167000 By driven device for transporting material to a stationary, at least in part, accumulating means for subsequent release into chamber by gravity 2
414171000 Conveyor 2
20080298932Catalyst Loading System - Particulate filling devices and methods are disclosed that use a loading system generally including a loading cart, a drive system, and a line assembly. The drive system generally includes a motor, a drive shaft, a driven shaft, a spool, a plurality of cable partitions, and a controller. Each line assembly generally includes cable sections, swivel connectors, one or more spring blocks and a weight.12-04-2008
20150344242VACUUM OPERATED WOOD PELLET HANDLING, FILTERING AND DISPENSING APPARATUS, SYSTEM AND METHODS OF USE THEREOF - A vacuum operated wood pellet management apparatus, systems and methods thereof, capable of handling, transferring, dispensing and filtering wood pellets. The pellet management apparatus and systems comprising a housing having a motor and a vacuum fan, a power supply, wherein the power supply controls an output of the motor, a pellet chamber connected to the housing, wherein the pellet chamber includes an inlet port configured to receive a plurality of wood pellets from a source of wood pellets and an outlet port regulated by a self-closing hinge.12-03-2015
414172000 By driven device for transporting material to and/or into, or into and within, chamber 18
20080226428Substrate handling chamber with movable substrate carrier loading platform - An apparatus for processing substrates may include a substrate handling chamber having a substrate load port on a side wall, and a movable platform movably engaged with the handling chamber between a first position and a second position. The first position is such that a substrate carrier on the movable platform is inaccessible by a substrate handling robot inside the chamber. The second position is near to the load port such that a substrate carrier on the movable platform is accessible by a substrate handling robot inside the handling chamber. The movable platform is configured to rotate about a generally vertical axis between the first and second positions.09-18-2008
20080298933SUBSTRATE CARRIER, PORT APPARATUS AND FACILITY INTERFACE AND APPARATUS INCLUDING SAME - An apparatus includes a first enclosure, a first door, at least one first valve, at least one inlet diffuser and at least one substrate holder. The first enclosure has a first opening. The first door is configured to seal the first opening. The first valve is coupled to the first enclosure. The inlet diffuser is coupled to the first valve and configured to provide a first gas with a temperature substantially higher than a temperature of an environment around the first enclosure. Each substrate holder disposed within the first enclosure supports at least one substrate.12-04-2008
20090067954AUTOMATED SYSTEMS AND METHODS FOR ADAPTING SEMICONDUCTOR FABRICATION TOOLS TO PROCESS WAFERS OF DIFFERENT DIAMETERS - Automated systems and methods for adapting semiconductor fabrication tools to process wafers of different diameters are described. In one embodiment, a method comprises providing a semiconductor fabrication tool, placing an adapter ring on a plurality of ring holders via a robotic arm, the plurality of ring holders being operable to support the adapter ring at a vertical distance from a stage heater and the stage heater being movable in a vertical direction, placing a first semiconductor wafer on the stage heater via the robotic arm, the first semiconductor wafer having a first diameter, and moving the stage heater upward to receive the adapter ring from the plurality of ring holders and to cover a portion of the stage heater during processing of the first semiconductor wafer.03-12-2009
20110027049TRANSFER DEVICE AND PROCESSING SYSTEM HAVING SAME - A transfer device includes a base; and a substrate supporter for supporting one or more target substrates to be processed. The substrate supporter is forwardly and backwardly moved to transfer the target substrates. The transfer device further includes reflecting bodies provided at least above and below the substrate supporter, the reflecting bodies serving to reflect heats radiated from the target substrates supported by the substrate supporter.02-03-2011
20110182699TRANSFER ROBOT WITH SUBSTRATE COOLING - Embodiments of the present invention provide a transfer robot having a cooling plate attached thereto for cooling a substrate during transfer between a processing chamber and a load lock chamber. In one embodiment, the cooling plate is a single, large area cooling plate attached to the transfer robot beneath the substrate being transferred. In another embodiment, the cooling plate is an array of substrates attached to the transfer robot beneath the substrate being transferred. The cooling plate may include a conduit path for circulating a cooling fluid throughout the cooling plate. The cooling plate may have an upper surface with a high emissivity coating applied thereto.07-28-2011
20120003062CORNER CHAMBER WITH HEATER - A disk processing system with a corner chamber having a heater assembly and a carrier rotary assembly configured to rotate the heater assembly.01-05-2012
20120257949DEVICE FOR POSITIONING A MATERIAL BASKET - A method and device position a deflectable material basket at a charging opening of a furnace. The method and device reliably prevent a swinging or oscillating movement of the deflectable material basket that is moved by a crane, when approaching the furnace and when discharging the material.10-11-2012
20140348617SUBSTRATE PROCESSING APPARATUS INCLUDING HEAT-SHIELD PLATE - Provided is a substrate processing apparatus. The substrate processing apparatus in which processes with respect to substrates are performed includes a lower chamber having an opened upper side, the lower chamber including a passage allowing the substrates to pass therethrough in a side thereof, an external reaction tube closing the opened upper side of the lower chamber to provide a process space in which the processes are performed, an internal reaction tube disposed within the external reaction tube, the internal reaction tube being disposed around a substrate holder placed in the process position to define a reaction region with respect to the substrates, a heater disposed outside the external reaction tube to heat the process space, the substrate holder on which the one or more substrates are vertically stacked, the substrate holder being movable between a stacking position in which the substrates are stacked within the substrate holder and a process position in which the processes with respect to the substrates are performed, and a heat-shield plate disposed under the substrate holder to close an opened lower side of the internal reaction tube when the substrate holder is disposed at the process position.11-27-2014
20150338166SHAFT FURNACE CHARGING DEVICE EQUIPPED WITH A COOLING SYSTEM AND ANNULAR SWIVEL JOINT THEREFORE - A shaft furnace charging device equipped with a cooling system, the charging device including a suspension rotor with a charge distributor and a stationary housing supporting the suspension rotor so that the rotor can rotate about an axis; the cooling system including a stationary circuit portion, a rotary circuit portion arranged on the suspension rotor, and an annular swivel joint arranged coaxially on the axis and connecting the stationary circuit portion with the rotary circuit portion, the annular swivel joint including an annular fixed part mounted on the stationary housing and an annular rotary part mounted on the suspension rotor, the fixed part and the rotary part having mating configurations that allow relative rotation and including an annular trough that defines an annular volume, via which the circuit portions are in fluidal communication; wherein the annular swivel joint includes: a stationary forward connection for receiving cooling fluid from the stationary circuit portion; a rotary forward connection for supplying cooling fluid to the rotary circuit portion; a rotary return connection for receiving cooling fluid from the rotary circuit portion; and a stationary return connection for returning cooling fluid to the stationary circuit portion; a partition dividing the annular volume into an annular external cavity and an annular internal cavity so that the internal cavity is at least partially surrounded by the external cavity, so that the forward connections are coupled via one of the external and internal cavities and the return connections are coupled via the other of the external and internal cavities, and with leakage-permitting communication between the external and internal cavities through an annular first clearance and through an annular second clearance, which are provided to allow relative rotation between the fixed part and the rotary part; and an annular first flow restrictor provided in the first clearance and an annular second flow restrictor provided in the second clearance, the flow restrictors being configured to reduce leakage between the external and internal cavities.11-26-2015
20150340253SEMICONDUCTOR PROCESSING ASSEMBLY AND FACILITY - A semiconductor processing assembly, comprising at least one semiconductor processing system and a substrate cassette stocker with stocker positions that are at least partially disposed within a footprint of the at least one semiconductor processing system. The semiconductor processing system also includes a local substrate cassette transport system for exchanging substrate cassettes with a global cassette transport system of a processing facility. The local substrate cassette transport system transports cassettes between its substrate cassette exchange station and the stocker positions. Also disclosed is a semiconductor processing facility, having a clean room bay area and a clean room chase area, disposed adjacent to the clean room bay area and separated therefrom by a clean room bounding wall. The facility also includes a semiconductor processing assembly having at least two semiconductor processing systems and a local substrate cassette transport system for transporting substrate cassettes between the semiconductor processing systems.11-26-2015
20160060534COKE OVEN CHARGING SYSTEM - The present technology is generally directed to coal charging systems used with coke ovens. In some embodiments, a coal charging system includes a charging head having opposing wings that extend outwardly from the charging head, leaving an open pathway through which coal may be directed toward side edges of the coal bed. In other embodiments, an extrusion plate is positioned on a rearward face of the charging head and oriented to engage and compress coal as the coal is charged along a length of the coking oven. In other embodiments, charging plates extend outwardly from inward faces of opposing wings.03-03-2016
414173000 Plural, successive, driven devices 1
20120230802DEVICE AND A METHOD FOR TRANSPORTING BLANKS MADE FROM AN INITIALLY PLASTIC, ESPECIALLY CERAMIC, MATERIAL TO AND FROM A DRYER AND A KILN - The present invention relates to a device (09-13-2012
414191000 Traversing hoist having material-underlying support or material attracting or gripping means 1
20130136565DEVICE AND METHODS FOR PICKING AND PLACING HOT 3D GLASS - A system for picking and placing glass articles from a first location to a second location, the second location including a thermal reforming apparatus for transforming the glass articles from 2D glass articles to 3D glass articles includes a robot having an end effector, the end effector including a compliance assembly having at least six degrees of freedom. The compliance assembly is in fluid communication with both an open pneumatic system and a closed pneumatic system, the open pneumatic system providing a partial vacuum to a portion of the compliance assembly for grabbing the glass article, and the closed pneumatic system for activating a centering function for a portion of the compliance assembly.05-30-2013
414196000 Conveyor 5
20080304941Multi-Stage Baking Apparatus for Plasma Display Panel - The present invention intends to provide a baking apparatus for PDP capable of realizing an improvement in productivity while minimizing an increase in a factory space. In a baking furnace 12-11-2008
20090175705SUBSTRATE TRANSFER APPARATUS AND VERTICAL HEAT PROCESSING APPARATUS - The present invention restrains, during a transfer of a substrate, a central portion of the substrate from being warped by its own weight, which might be caused by a super-enlargement of a diameter of the substrate. A substrate transfer apparatus 07-09-2009
20120183376SYSTEM FOR EXTRACTION AND TRANSPORT OF LIGHT ASHES BY MEANS OF A STEEL BELT CONVEYOR - A transport apparatus for dry extraction and transport of fly ashes produced inside solid fuel boilers, adapted to be associated with a fume dedusting system and including: a metal belt conveyor, having a plurality of slats partially overlapped, adapted to support a bed of fly ashes to transport the bed along a preset path, and a sealed metal casing inside which the slats move; and containment means for fly ashes, adapted to confine the ashes on the slats and along the transport path so as to limit relative motion between ashes and conveyor, which means comprises transverse boards, leveling members, side boards and a movable rear baffle.07-19-2012
414197000 Screw 2
20090022570SYSTEM, METHOD AND APPARATUS FOR FEEDING BIOMASS INTO A PRESSURIZED VESSEL - A system, method and apparatus for feeding biomass into a pressurized vessel. The apparatus includes: a screw feeding housing with a drive motor, and a screw; and a biomass inlet, wherein the biomass is dropped in the biomass inlet and the screw feeds the biomass into the pressurized vessel.01-22-2009
20140271047SYSTEM FOR PROCESSING MATERIAL FOR A GASIFIER - A system for processing material for a gasifier. The system comprises an auger feeder adapted to receive material to be gasified. The auger feeder is adapted to feed the material. A tube is connected to the auger feeder such that the tube is adapted to receive the material from the auger feeder. The tube is also connected to a gasifier, which is adapted to receive the material from the tube.09-18-2014
414199000 By material supporting structure movable, or having a movable component, to release material into chamber by gravity 16
20100028106ROTARY CHARGING DEVICE FOR A SHAFT FURNACE - A rotary charging device (02-04-2010
20110135425CHARGING INSTALLATION FOR A SHAFT FURNACE AND LOWER SEALING VALVE ASSEMBLY THEREFORE - The invention concerns a charging installation for a shaft furnace, in particular for a blast furnace, and especially the lower sealing valve assembly thereof, the installation including at least two hoppers acting as lock hoppers for intermediate storage of charge material to be charged into the furnace, the lower sealing valve includes a lower sealing valve housing arranged below the hoppers, the lower sealing valve housing has at least two inlets respectively communicating with one of the hoppers and an outlet for passing charge material into the furnace, each inlet has a respective associated valve seat providing gas-tight sealing of the hoppers downstream, the lower sealing valve assembly further includes a sealing valve mechanism for sealing the inlets, more specifically for closing the seats in technically gas-tight manner, where the sealing valve mechanism includes a one-sided shutter having a single sealing face that cooperates with both of the at least two valve seats, by virtue of the sealing valve mechanism being configured to bring the sealing face of the one-sided shutter into sealing contact in turn with each of the at least two valve seats for sealing the associated inlet.06-09-2011
20110182700LOWER SEALING VALVE ASSEMBLY FOR A SHAFT FURNACE CHARGING INSTALLATION AND VALVE ACTUATION MECHANISM THEREFORE - A lower sealing valve assembly for a shaft furnace charging installation including a lower sealing valve housing with a lower outlet through which charge material can freely drop onto a distribution device, the housing has at least one upper inlet for communicating with an outlet of a hopper arranged above the housing, where each inlet has an associated valve seat that is arranged inside the lower sealing valve housing and turned towards the interior of the housing, a shutter is further operatively connected to an actuation mechanism for moving the shutter into and out of sealing contact with the valve seat, the valve actuation mechanism includes a turn-slide cylindric joint having a typically vertical joint axis for swiveling the shutter in a plane perpendicular to the joint axis inside the lower sealing valve housing and for translating the shutter up and down along the joint axis such that the cylindric joint includes a shaft that is axially fixed and rotatably in a hollow sleeve, which in turn is axially slideable in an outer shell that is fixed to the housing and, further according to the invention, the mechanism includes a first hydraulic cylinder, which is connected on one side to the shell and on the other side to the hollow sleeve to impart axial translation to the sleeve and therewith to the shaft along the joint axis; and: a second hydraulic cylinder, which is hinged on one side to the sleeve and on the other side to the shaft, to impart rotation to the shaft and about the joint axis.07-28-2011
20120070253DEVICE FOR DISTRIBUTING CHARGE MATERIAL IN A SHAFT FURNANCE03-22-2012
20120148373HYDRAULIC DISTRIBUTOR FOR TOP CHARGING A BLAST FURNACE - A hydraulic distributor for safely and efficiently top charging a bell-less blast furnace. The hydraulic distributor includes a main housing, an inner ring, a trunnion, and an actuator ring, which act together to lift and rotate the distributor chute. Hydraulic tilt cylinders operatively coupled to the inner ring act to lift the distributor chute to change tilt. Rotational Drives operatively coupled to the trunnion act to rotate the distributor chute. The hydraulic distributor provides improved repeatability and precision control of the distributor chute, and hence the placement of burden materials within the blast furnace resulting in improved productivity and operation of the furnace. The hydraulic distributor provides a less complex design and construction resulting in reduced costs for manufacturing and maintenance.06-14-2012
20130039724COMPOSITE CONTINUOUS FEEDER - A composite continuous feeder is arranged above a growth furnace and comprises a primary feeder and a secondary feeder. The primary feeder includes a feeding chamber, a first material holder holding a plurality of material bits and an elevator mechanism. The elevator mechanism is coupled to the feeding chamber and first material holder, and used to lift or lower the first material holder in the feeding chamber. The secondary feeder includes a second material holder also holding a plurality of material bits, a buffering discharger and a material discharging guide tube. The buffering discharger is arranged at the outlet of the second material holder to receive the material bits output therefrom. The material discharging guide tube discharges the material bits into the growth furnace. By using the primary and secondary feeders, the invention can apply to mono-crystal and poly-crystal growth furnaces and effectively control material feeding amount and speed.02-14-2013
414200000 Including serially arranged closures 1
20110064544 FEED ARRANGEMENT OF A SYSTEM FOR THE PROCESSING OF CARBON CONTAINING RAW MATERIAL - The invention relates to devices for loading installations for treating raw materials containing carbon, such as gas generators and ovens, inter alia, and for using in installations for processing household and industrial waste. The device consists of a loading chamber and two downwardly expanding sealable chambers arranged in a row beneath each other, and separated from each other and from the chamber of the installation by closing elements. The central chamber of the device comprises the inlet and outlet cross-sections of the gas flue with forced gas circulation, in the circuit of which flaps and the gas cooler are installed. As a technical result, the operating reliability of the device is increased by preventing the adhesion of thermoplastic raw materials to the working bodies by maintaining the temperature in the central chamber below the melting point of the raw material constituents.03-17-2011
414204000 Bell and hopper 1
20140112738DOOR AND VALVE ASSEMBLY FOR A CHARGING INSTALLATION OF A SHAFT FURNACE - A hatch and valve arrangement for a charging installation for a shaft furnace, such as a blast furnace, said arrangement comprising a housing (04-24-2014
414206000 With means to distribute material after release from structure 8
20090087284THREE HOPPER CHARGING INSTALLATION FOR A SHAFT FURNACE - A three hopper charging installation for a shaft furnace includes a rotary distribution device for distributing bulk material in the furnace by rotating a distribution member about the furnace central axis and a first, a second and a third hopper arranged in parallel above the rotary distribution device and offset from the central axis. A sealing valve housing is arranged between the hoppers and the distribution device. It has a top part with a first, a second and a third inlet respectively communicating with the first, the second and the third hopper. A first, a second and a third sealing valve are provided in the top part. Each sealing valve includes a flap which is pivotable between a closed sealing position and an open parking position. The sealing valve housing also has a funnel shaped bottom part with an outlet communicating with the distribution device. According to the invention, the top part of the sealing valve housing has a tripartite stellate configuration in horizontal section with a central portion, in which the inlets are arranged adjacently in triangular relationship about the central axis, and with a first, a second and a third extension portion, each sealing valve being adapted such that its flap opens outwardly with respect to the central axis by pivoting into a parking position located in the first, second or third extension portion respectively.04-02-2009
20090092465MULTIPLE HOPPER CHARGING INSTALLATION FOR A SHAFT FURNACE - A multiple hopper charging installation for a shaft furnace includes a rotary distribution device for distributing bulk material in the shaft furnace by rotating a distribution member about a central axis of the shaft furnace and at least two hoppers arranged in parallel and offset from the central axis above the rotary distribution device. Each hopper has a lower funnel part ending in an outlet portion and each hopper has a material gate valve with a shutter member associated to its outlet portion. According to the invention, each funnel part is configured asymmetrically with its outlet portion being eccentric and arranged proximate to the central axis, each outlet portion is oriented vertically so as to produce a substantially vertical outflow of bulk material and each material gate valve has a one-piece shutter member and is configured with its respective shutter member opening in a direction pointing away from the central axis such that any partial valve opening area is located on the side of the associated outlet portion proximate to the central axis.04-09-2009
20090129896Charging Device and Distribution Chute for a Shaft Furnace - A charging device for a shaft furnace comprises a distribution chute for bulk material and a drive mechanism for the distribution chute. The distribution chute has a trough-shaped main part with an open impact section and an outlet section. The main part provides a sliding channel between the impact section and the outlet section. The drive mechanism for the distribution chute is capable of rotating the distribution chute about an essentially vertical axis and pivoting the distribution chute about an essentially horizontal axis so as to allow distribution of bulk material on a charging surface of the shaft furnace. According to the present invention, the distribution chute comprises a circumferentially closed funnel portion which tapers in the direction of flow and is arranged downstream of the impact section and with its outlet at the downstream end of said trough-shaped main part.05-21-2009
20100290866DISTRIBUTOR DEVICE - A distributor device including a distribution chute (11-18-2010
20100329826CHARGING DEVICE FOR DISTRIBUTING BULK MATERIAL - A charging device (12-30-2010
20110002758CHARGING DEVICE FOR A SHAFT FURNACE - A charging device for a shaft furnace, which includes at least one charging hopper having a discharge orifice arranged in a position off-centre with respect to the central axis of the shaft furnace, and a material distribution device arranged below this hopper. The material distribution device includes a feed channel coaxial with the central axis of the furnace and a rotatable, pivotable chute, which is arranged below the feed channel for distributing a charge in the shaft furnace. The charging device also includes a connecting box in the shape of a funnel, arranged between the material distribution device and the charging hopper. The connecting box possesses a lower central outlet communicating with the charging hopper and at least one upper inlet which is arranged off-centre with respect to the central axis of the furnace and communicates with the discharge orifice of the hopper. According to the invention, the charging device includes at least one spreader situated upstream of the distribution device, on the trajectory of the material discharged from the discharge orifice. The spreader enables a flow of material to be dispersed to both sides of the feed channel.01-06-2011
20110274519LOWER SEALING VALVE UNIT FOR A BLAST FURNACE TOP CHARGING SYSTEM - A lower sealing valve unit for a charging system of a shaft furnace includes a housing having a pair of inlets and at least one outlet; a valve seat associated with each inlet; and a flap associated with each valve seat and adapted for, in a closed position, engaging the valve seat to sealingly close the inlet, each flap being supported by a pivotable shaft allowing displacement between the closed position and an open position off the associated valve seat, where a common structure, mounted to one side of the housing, includes a pair of drive mechanisms, each connected to one of the pivotable shafts for independent actuation thereof, the shafts passing coaxially though the housing side and being supported by the common structure.11-10-2011
20120045298SHAFT FURNACE CHARGING INSTALLATION HAVING A DRIVE MECHANISM FOR A DISTRIBUTION CHUTE - The invention concerns a drive mechanism for a distribution chute (02-23-2012
414208000 By inclined flow path 2
20100322744CHARGE DISTRIBUTION APPARATUS - The present invention proposes a charge distribution apparatus for a furnace comprising a charge distribution chute and a drive mechanism (12-23-2010
20110164950SHAFT FURNACE CHARGING DEVICE AND CORRESPONDING DISTRIBUTION CHUTE - A charging device for a shaft furnace, in particular for a blast furnace and a cooperating distribution chute are proposed, where the distribution chute has an elongated chute body providing a sliding channel for bulk material and two chute-mounting members attached laterally to either side of the chute body for mounting the distribution chute to the charging device, the charging device including a mechanism for rotating the distribution chute, the mechanism having a rotatable support rotor with two suspension flanges cooperating with the chute-mounting members of the distribution chute for mounting the distribution chute, where each chute-mounting member of the chute includes a hook-shaped portion that forms a suspension hook for mounting the distribution chute to the suspension flanges, each suspension flange in turn has a support configured for engagement with the hook-shaped portion of the chute along a hook engagement direction, and furthermore, each chute-mounting member includes an abutment portion that cooperates with a counter-abutment on the corresponding suspension flange to provide abutment in a direction transversal to the hook engagement direction (C) so as to preclude pivoting of the chute about the supports of the suspension flanges.07-07-2011
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