| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 378072000 | Stress analysis | 8 |
| 20100208869 | MEASURING STRAIN OF EPITAXIAL FILMS USING MICRO X-RAY DIFFRACTION FOR IN-LINE METROLOGY - In a method for use of x-ray diffraction to measure the strain on the top silicon germanium layer of an SOI substrate, the location of the peak diffraction area of an upper silicon layer of the SOI substrate is determined by first determining the peak diffraction area of the upper silicon layer on a reference pad (where the SOI thickness is about 700-900 Angstroms) within a die formed on a semiconductor wafer. The x-ray beam then moves to that location on the pad of interest to be measured and begins the XRD scan on the pad of interest to ultimately determine the strain of the top silicon germanium layer of the pad of interest | 08-19-2010 |
| 20100239068 | NON-DESTRUCTIVE TESTING SYSTEMS AND METHODS - A system and method for non-destructively determining the grain orientation of a crystalline material using x-ray diffraction techniques to non-destructively analyze material and, more particularly, to a system and method for determining the grain orientation of an underlying crystalline material covered by an overlying polycrystalline material. Further, the system and method relate to the use of x-ray diffraction to non-destructively characterize parts and components to determine whether to accept or reject those components or parts for use in application. | 09-23-2010 |
| 20130077755 | System for analyzing a granulate for producing a pharmaceutical product - An apparatus for analyzing a granulate for producing a pharmaceutical product has a data receiving unit adapted for receiving X-ray diffraction data indicative of a scattering of X-rays irradiated onto the granulate, a processor unit adapted for processing the X-ray diffraction data to derive information indicative of a compressibility and/or a dissolution characteristic of the granulate, and a control unit adapted for controlling a process of producing a pharmaceutical product based on the derived information. | 03-28-2013 |
| 20130089182 | Evaluation System and Evaluation Method of Plastic Strain - An evaluation system for plastic strain includes an X-ray diffraction device for irradiating the surface of a measurement object; and an image analyzing device that generates diffraction intensity curves from X-ray diffraction angle and intensity with an implanted database, which can be obtained in advance from test specimens made of the same material of the measurement object, establishing at least one of the relations between the full width at half maximum of the diffraction intensity curve and plastic strain, and between the integral intensity angular breadth of diffraction intensity curve and plastic strain. The image analyzing device obtains plastic strain of the measurement object based on at least one of the diffraction parameters of the full width at half maximum and the integral intensity angular breadth of a diffraction intensity curve corresponding to the implanted database indicative of the relation between the diffraction parameter and plastic strain. | 04-11-2013 |
| 20130121470 | X-RAY STRESS MEASURING APPARATUS - An X-ray stress measuring apparatus, for measuring stress on a sample, comprises: a pair of X-ray generating means ( | 05-16-2013 |
| 20140029726 | X-RAY STRESS MEASUREMENT METHOD AND APPARATUS | 01-30-2014 |
| 20150146857 | INSPECTION METHOD FOR BEARING PART AND INSPECTION APPARATUS FOR BEARING PART - An inspection method for a bearing part includes the steps of: emitting X-rays onto a fatigued portion of a bearing part to be inspected; detecting annular diffracted X-rays (X-ray diffraction ring) diffracted by the fatigued portion; and estimating a use condition of the bearing part to be inspected, based on the detected annular diffracted X-rays (X-ray diffraction ring). | 05-28-2015 |
| 20160139065 | METHOD AND SYSTEM FOR DETERMINING STRAIN DISTRIBUTION IN A SAMPLE - A control system is presented for use in measuring one or more parameters of a sample. The control system comprises an input utility and a processor utility. The input utility is configured for receiving input data including first data comprising X-ray Diffraction or High-Resolution X-ray Diffraction (XRD) response data of the sample indicative of a material distribution in the sample, and second data comprising optical response data of the sample to incident light indicative of at least a geometry of the sample. The processor utility is configured and operable for processing and analyzing one of the first and second data for optimizing the other one of the first and second data, and utilizing the optimized data for determining said one or more parameters of the sample including a strain distribution in the sample. | 05-19-2016 |
