| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 250441110 | With air lock or evacuation means | 18 |
| 20090008572 | CHARGED-PARTICLE BEAM APPARATUS - Provided is a charged-particle beam apparatus capable of preventing a small amount of dust from being attached to an electrostatic lens serving as an objective lens to apply a high voltage to the electrostatic lens. | 01-08-2009 |
| 20090294690 | METHOD OF FORMING TEM SAMPLE HOLDER - A TEM sample holder is formed from at least one nano-manipulator probe tip and a TEM sample holder pre-form. The probe tip is permanently attached to the TEM sample-holder pre-form to create a TEM sample holder before attachment of a sample to the point of the probe tip inside a FIB. In the preferred embodiment the probe tip is attached to the TEM sample holder pre-form by applying pressure to the pre-form and the probe tip, so as to cause plastic flow of the pre-form material about the probe tip. The TEM sample holder may have smaller dimensions than the TEM sample holder pre-form; in this case the TEM sample holder is cut from the larger TEM sample holder pre-form, preferably in the same operation as attaching the probe tip. | 12-03-2009 |
| 20100108907 | CHARGED-PARTICLE OPTICAL SYSTEM WITH DUAL LOADING OPTIONS - A charged-particle optical system ( | 05-06-2010 |
| 20100258739 | Charged particle beam apparatus - A sample measuring method and a charged particle beam apparatus are provided which remove contaminants, that have adhered to a sample in a sample chamber of an electron microscope, to eliminate adverse effects on the subsequent manufacturing processes. To achieve this objective, after the sample measurement or inspection is made by using a charged particle beam, contaminants on the sample are removed before the next semiconductor manufacturing process. This allows the contaminants adhering to the sample in the sample chamber to be removed and therefore failures or defects that may occur in a semiconductor fabrication process following the measurement and inspection can be minimized. | 10-14-2010 |
| 20100320396 | SAMPLE HOLDER FOR ELECTRON MICROSCOPE - A sample holder capable of holding samples is provided which comprises a plurality of probes in contact with a sample, fine movement mechanisms for moving the plural probes, and a driver connected to the fine movement mechanisms, wherein the plural fine movement mechanisms move the plural probes independently of one another and the driver moves the plural probes simultaneously. | 12-23-2010 |
| 20110253905 | SPECIMEN HOLDER ASSEMBLY - A specimen holder assembly ( | 10-20-2011 |
| 20120037815 | TEM PHASE PLATE LOADING SYSTEM - A phase plate loading system, which can be installed on any commercial TEM (transmission electron microscope) without modifying its optical or lens design, includes an airlock chamber and a transport unit. The airlock chamber is disposed adjacent to the specimen section of the TEM. The transport unit transfers a phase plate into the TEM through the airlock chamber. | 02-16-2012 |
| 20120091362 | CHARGED PARTICLE RADIATION DEVICE - Disclosed is a high resolution and high throughput charged particle radiation device that attenuates the natural vibration of an ion pump in a short time, excited by a reaction force at the time of driving the stage, and prevents occurrence of a loop of force and a loop of current. The charged particle radiation device includes a sample chamber ( | 04-19-2012 |
| 20130193343 | SAMPLE DEVICE FOR CHARGED PARTICLE BEAM - Provided is a sample device for a charged particle beam, which facilitates the delivery of a sample between an FIB and an SEM in an isolated atmosphere. An atmosphere isolation unit | 08-01-2013 |
| 20130200271 | CHARGED PARTICLE BEAM DEVICE - The objective of the present invention is to provide a charged particle beam device such that a tip part can be effectually maintained in a clean state, while the frequency of valve body replacements is also reduced. To achieve the objective, a charged particle beam device is offered, comprising: a partition that is positioned between a charged particle source-side vacuum space and a specimen stage-side vacuum space, said partition further comprising an opening for a charged particle beam to pass through; a driver mechanism that moves a shutter member between a first location within the optical axis of the charged particle beam and a second location outside the optical axis of the charged particle beam; and a control device that controls the driver mechanism. The first location is a location wherein the shutter member is distanced from the partition, and the control device carries out a control that opens a valve between the specimen chamber and the exchange chamber when the shutter member is in a state of being located in the first location. | 08-08-2013 |
| 20150137000 | Charged Particle Beam Instrument and Sample Container - A charged particle beam instrument is offered which can introduce cooled samples easily into a sample chamber. The charged particle beam instrument ( | 05-21-2015 |
| 20150137001 | Charged Particle Beam Instrument - A charged particle beam instrument is offered which can easily perform an in situ observation in a gaseous atmosphere. The charged particle beam instrument ( | 05-21-2015 |
| 20150340198 | Apparatus and Method for Processing Sample, and Charged Particle Radiation Apparatus - In order to prevent a sample from thermally expanding and contracting when the sample is placed on a sample stage inside a vacuum chamber, the related art has proposed a coping method of awaiting observation by setting a standby time from when the wafer is conveyed into the vacuum chamber until the wafer and the sample table are brought into thermal equilibrium. In addition, the coping method is configured so as to await the observation until the wafer is cooled down to room temperature when the wafer is heated in the previous step. Consequently, throughput of an apparatus decreases. A temperature control mechanism which can control temperature of the sample is installed inside a mini-environment device. The sample temperature control mechanism controls the temperature of the sample inside the mini-environment device so as to become a setting temperature which is set in view of a lowered temperature of the sample inside a load lock chamber. | 11-26-2015 |
| 20150348742 | CHARGED PARTICLE OPTICAL APPARATUS HAVING A SELECTIVELY POSITIONABLE DIFFERENTIAL PRESSURE MODULE - Disclosed is a charged particle optical apparatus, which includes a particle optical arrangement, configured to define a particle beam path for inspecting an object. The object is accommodated in a pressure-controlled interior of a specimen chamber during the inspection of the object. The charged particle optical apparatus further includes a differential pressure module having a differential pressure aperture. A positioning arm is arranged in the specimen chamber for selectively position the differential pressure module within the pressure-controlled interior of the specimen chamber into an operating position in which the particle beam path passes through the differential pressure aperture. The selective positioning includes an advancing movement of the differential pressure module toward the primary particle beam path. The advancing movement is transmitted to the differential pressure module by a track-guided movement of the positioning arm. | 12-03-2015 |
| 20150380208 | CHARGED PARTICLE BEAM DEVICE, METHOD FOR ADJUSTING CHARGED PARTICLE BEAM DEVICE, AND METHOD FOR INSPECTING OR OBSERVING SAMPLE - A charged particle beam device capable of observing a sample in an air atmosphere or gas atmosphere has a thin film for separating the atmospheric pressure space from the decompressed space. A vacuum evacuation pump evacuates a first housing; and a detector detects a charged particle beam (obtained by irradiation of the sample) in the first housing. A thin film is provided to separate the inside of the first housing and the inside of a second housing at least along part of the interface between the first and second housings. An opening part is formed in the thin film so that its opening area on a charged particle irradiation unit's side is larger than its opening area on the sample side; and the thin film which covers the sample side of the opening part transmits or allows through the primary charged particle beam and the charged particle beam. | 12-31-2015 |
| 20160020064 | Apparatus for focusing and for storage of ions and for separation of pressure areas - An apparatus for focusing and for storage of ions and an apparatus for separation of a first pressure area from a second pressure area are disclosed, in particular for an analysis apparatus for ions. A particle beam device may have at least one of the abovementioned apparatuses. A container for holding ions and at least one multipole unit are provided. The multipole unit has a through-opening with a longitudinal axis as well as a multiplicity of electrodes. A first set of the electrodes is at a first radial distance from the longitudinal axis. A second set of the electrodes is in each case at a second radial distance from the longitudinal axis. The first radial distance is less than the second radial distance. Alternatively or additionally, the apparatus may have an elongated opening with a radial extent. The opening has a longitudinal extent which is greater than the radial extent. | 01-21-2016 |
| 20160172152 | ELECTRON MICROSCOPE HAVING A CARRIER | 06-16-2016 |
| 20160189920 | LOCALIZED, IN-VACUUM MODIFICATION OF SMALL STRUCTURES - A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber. | 06-30-2016 |
