| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 216064000 | Etchant is devoid of chlorocarbon or fluorocarbon compound (e.g., C.F.C., etc.) | 6 |
| 20080230519 | METHOD AND SYSTEM FOR DRY ETCHING A METAL NITRIDE - A method and system of etching a metal nitride, such as titanium nitride, is described. The etching process comprises introducing a process composition having a halogen containing gas, such as Cl | 09-25-2008 |
| 20090050604 | TRI-LAYER PLASMA ETCH RESIST REWORK - Exemplary embodiments provide a tri-layer resist (TLR) stack used in a photolithographic process, and methods for resist reworking by a single plasma etch process. The single plasma etch process can be used to remove one or more portions/layers of the TLR stack that needs to be reworked in a single process. The removed portions/layers can then be re-formed and resulting in a reworked TLR stack for subsequent photo-resist (PR) processing. The disclosed plasma-etch resist rework method can be a fast, simple, and cost effective process used in either single or dual damascene tri-layer patterning processes for the fabrication of, for example, sub 45-nm node semiconductor structures. | 02-26-2009 |
| 20090218315 | METHOD AND SYSTEM FOR CONTROLLING CENTER-TO-EDGE DISTRIBUTION OF SPECIES WITHIN A PLASMA - A method and system for controlling the center-to-edge distribution of a species within a plasma is provided. In one embodiment, the invention provides a method for plasma processing, comprising determining plasma processing center-to-edge profile requirements of a substrate, and selecting a ratio of two inert gases to be provided to a plasma processing chamber in response to the plasma processing center to edge profile requirements. | 09-03-2009 |
| 20090255900 | Oil/gas separation membrane, its use in gas sensor and process for producing the same - An oil gas separation membrane combines a gas permeable yet oil and temperature resistant bulk polymer membrane such as poly(tetrafluoroethylene) and poly(tetrafluoroethylene-co-hexafluoropropylene); a porous metal support such as sintered metal frit disk made with stainless steel, bronze or nickel; and an highly gas permeable adhesive that bonds firmly the bulk polymer membrane and the metal frit surface together. The adhesive is either a homogenous polymer that has desirable gas permeability, or a coalescent porous polymer particulates network. A gas sensor employing the oil gas separation membrane for detecting and monitoring fault gases of oil filled electrical equipment requires no mechanical wearing or moving part such as pump and valve and the gas sensor is operated normally under various temperature and pressure conditions | 10-15-2009 |
| 20110049099 | HARDMASK TRIM METHOD - A method for forming features in a polysilicon layer is provided. A hardmask layer is formed over the polysilicon layer. A photoresist mask is formed over the hardmask layer. The hardmask layer is etched through the photoresist mask to form a patterned hardmask. The patterned hardmask is trimmed by providing a non-carbon containing trim gas comprising oxygen and a fluorine containing compound, forming a plasma from the trim gas, and trimming the hardmask. Features are etched into the polysilicon layer through the hardmask. | 03-03-2011 |
| 20130284701 | METHOD OF MANUFACTURING DIELECTRIC DEVICE AND ASHING METHOD - [Object] To provide a method of manufacturing a dielectric device and an ashing method that are capable of suppressing the occurrence of resist residue. | 10-31-2013 |
