| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 205674000 | Electrolyte composition or defined electrolyte | 40 |
| 20080217186 | Electropolishing process for titanium - The present invention relates to a method of electrochemical polishing of surfaces of titanium or titanium-containing alloys, such as Nitinol. An electrolyte is used that comprises methanesulfonic acid and one or more alkanediphosphonic acids. These alkanediphosphonic acids can optionally be substituted with hydroxy and/or amino groups. A further aspect of the present invention relates to the use of said electrolyte for the electropolishing of titanium or titanium-containing alloys. | 09-11-2008 |
| 20080230397 | Process for the polishing of metallic dental prostheses - The invention concerns a process for the polishing of metallic dental prostheses, such as frames. In order to reproducibly obtain a defined surface roughness with no need for additional finishing, it is proposed for the dental prosthesis to be polished by means of plasma polishing. | 09-25-2008 |
| 20090173637 | Manufacture of Multi-Leaf Collimators - We propose to shape the leaf by the use of electro-chemical machining (ECM). ECM is a technique by which a blank is suspended within a mould, with a small gap therebetween. A conductive fluid is caused to flow through the gap, and a large electrical current is passed from the mould to the blank. The blank steadily erodes, dissolving into the fluid. The fluid should not provoke a reaction from the material of the blank, such as a surface oxide. Sodium Chloride solution is a common choice. The current that is passed can, if desired, be controlled to a profile that will affect the manner of erosion. Thus, the current profile can be a steady on/off current, or it can be pulsed. One known arrangement is for the current to rise to a peak, then fall to zero, followed by a brief reverse flow. | 07-09-2009 |
| 20100051475 | MACHINING ELECTRODE, ELECTROCHEMICAL MACHINING APPARATUS, ELECTROCHEMICAL MACHINING METHOD AND METHOD FOR MANUFACTURING STRUCTURE BODY - A machining electrode includes: a base substance including an electrolytic portion faced to a workpiece on one end face in an axial direction and having conductivity; an insulating unit provided on a face in a direction generally orthogonal to the axial direction of the base substance and having insulation; and a shielding unit provided on a face opposite to the base substance of the insulating unit. | 03-04-2010 |
| 20100059390 | METHOD AND APARATUS FOR ELECTROCHEMICAL MECHANICAL POLISHING NiP SUBSTRATES - The present invention relates to an apparatus and a method of electrochemical mechanical polishing (ECMP) for microelectronics applications. The apparatus and method of electrochemical mechanical polishing can be used planarize NiP substrate for a magnetic storage medium and for a process which allows polishing with a controlled surface finish, and a set of corresponding polishing electrolytes and slurry. | 03-11-2010 |
| 20100108538 | METHOD FOR STRIPPING A COMPONENT - A method for stripping a component, in particular a gas turbine component, to completely or partially remove a multilayer or sandwich antiwear coating from the surface of the component, the antiwear coating including at least one relatively hard ceramic layer and at least one relatively soft metallic layer is disclosed. According to the present invention, in order to remove the multilayer or sandwich antiwear coating, the component is placed in a bath of an alkaline electrolyte, the component placed in the electrolyte being stripped at a current density of between 1 A/dm | 05-06-2010 |
| 20100200424 | Plasma-electrolytic polishing of metals products - Plasma-electrolytic polishing (PEP) of titanium alloy and other metals where plasma effect takes place when voltage does not exceed 80V DC. | 08-12-2010 |
| 20100213078 | Electrolyte composition for electropolishing niobium and tantalum and method for using same - The electrolyte composition and electropolishing method for electropolishing surfaces of metals and their alloys, in particular surfaces of niobium, niobium containing alloys, tantalum, tantalum containing alloys is disclosed. The electrolyte composition comprises methanesulfonic acid and hydrofluoric acid. Said electrolyte composition make possible to electropolish niobium, niobium containing alloys, tantalum and tantalum containing alloys to the best quality ever by eliminating problems of hydrogen absorption and sulfur contamination o the workpieces. | 08-26-2010 |
| 20110083972 | ELECTROCHEMICAL METHOD AND APPARATUS FOR REMOVING COATING FROM A SUBSTRATE - A method of removing coating from a substrate may include contacting at least a portion of a surface of a substrate to an electrolytic substance, where at least a portion of the surface includes cadmium; connecting a power source to the substrate and to an anode material; applying a current and a voltage; and removing at least a portion of coating from the substrate. | 04-14-2011 |
| 20110186444 | METHOD FOR ELECTROKINETIC DECONTAMINATION OF A POROUS SOLID MEDIUM - The invention relates to a method for electrokinetic decontamination of a porous solid medium, which comprises:
| 08-04-2011 |
| 20110259759 | METHOD AND DEVICE FOR DECONTAMINATING A METALLIC SURFACE - The present invention concerns a method and device for oxidative erosion or for decontamination of a metallic surface, comprising a step consisting of intermittently polarising the metallic surface to be eroded or decontaminated, placed in contact with a solution containing manganese VII, at a more anodic electric potential than the corrosion potential of said surface. | 10-27-2011 |
| 20120138481 | ALUMINIUM LITHOGRAPHIC SHEET - The invention relates to an aluminium alloy lithographic sheet product having an enhanced electrolytic graining response in which Zn between 0.5 and 2.5 wt % is added to an aluminium base alloy, in particular an alloy of the 1XXX, 3XXX or 5XXX series alloys. The invention also relates to a method of producing a lithographic sheet product. | 06-07-2012 |
| 20120152758 | METHOD FOR PROCESSING OF GLASS, PROCESS FOR PRODUCTION OF WIRING SUBSTRATE, PROCESS FOR PRODUCTION OF MICROCHIP, AND PROCESS FOR PRODUCTION OF MICROLENS ARRAY SUBSTRATE - Provided is a method for processing glass, which can process glass with fewer steps and thus at less cost than of the conventional methods. In the present processing method, a part of a glass substrate ( | 06-21-2012 |
| 20130186774 | Etching of Plastic Using Acidic Solutions Containing Trivalent Manganese - A method of preparing a solution capable of etching a platable plastic. The method comprises the steps of: (a) providing an electrolyte comprising a solution of manganese(II) in a solution of 9 to 15 molar sulfuric acid or phosphoric acid to an electrolytic cell; (b) applying a current to the electrolytic cell, wherein the electrolytic cell comprises an anode and a cathode; and (c) oxidizing the electrolyte to form manganese(III) ions, wherein the manganese(III) ions form a metastable sulfate complex. Thereafter, a platable plastic may be immersed in the metastable sulfate complex for a period of time to etch the platable substrate prior to subsequent plating steps. | 07-25-2013 |
| 20140076738 | ELECTROCHEMICAL ETCHING APPARATUS - An electroplating etching apparatus includes a power supply to output current, and a container configured to contain an electrolyte. A cathode is coupled to the container and configured to fluidly communicate with the electrolyte. An anode is electrically connected to the output, and includes a graphene layer. A metal substrate layer is formed on the graphene layer, and is etched from the graphene layer in response to the current flowing through the anode. | 03-20-2014 |
| 20140231270 | METHODS OF NONDESTRUCTIVELY DELAMINATING GRAPHENE FROM A METAL SUBSTRATE - Methods of delaminating a graphene film ( | 08-21-2014 |
| 20150114847 | ELECTROCHEMICAL SYSTEM AND METHOD FOR ELECTROPOLISHING HOLLOW METAL BODIES - A method and system for electrochemically machining a hollow body of a metal or a metal alloy. An electrode is positioned within a hollow body including a metal or metal alloy, where the hollow body has a variable internal diameter. The hollow body is oriented vertically, with the electrode oriented vertically therein. The hollow body is at least partially filled with an aqueous, acidic electrolyte solution, the electrolyte solution being devoid of hydrofluoric acid and having a viscosity less than 15 cP. An electric current is passed between the hollow body and the electrode, where the electric current includes a plurality of anodic pulses and a plurality of cathodic pulses, and where the cathodic pulses are interposed between at least some of the anodic pulses. | 04-30-2015 |
| 20150368826 | Foundry Mixture and Related Methods for Casting and Cleaning Cast Metal Parts - A foundry mixture for making molds used for molding cast metal parts includes foundry sand, a non-aqueous binder, and a cleaning agent that includes calcium oxide. Residual foundry mixture remaining on the cast part after removal from the mold is removed by electrolytic cleaning of the cast part. | 12-24-2015 |
| 205675000 | Less than 50 weight percent water | 5 |
| 20080289970 | ELECTROPOLISHING PROCESS FOR COBALT AND COBALT ALLOYS - The present invention relates to a method of electrochemical polishing of surfaces of cobalt or cobalt alloys. It employs an electrolyte comprising glycolic acid and at least one alkane-sulfonic acid with an alkyl residue that has 1 to 3 carbon atoms. This electrolyte is also one aspect of the present invention. In one embodiment, at least one alkane-sulfonic acid comprises methane-sulfonic acid. The electrolyte and the method using this electrolyte are suitable in particular for surfaces of cobalt or cobalt alloys, including cobalt-chromium alloys such as stellite. | 11-27-2008 |
| 20110203940 | Method of Selectively Removing Conductive Material - An electrolyte solution, methods, and systems for selectively removing a conductive metal from a substrate are provided. The electrolyte solution comprising nanoparticles that are more noble than the conductive metal being removed, is applied to a substrate to remove the conductive metal selectively relative to a dielectric material without application of an external potential or contact of a processing pad with the surface of the substrate. The solutions and methods can be applied, for example, to remove a conductive metal layer (e.g., barrier metal) selectively relative to dielectric material and to a materially different conductive metal (e.g., copper interconnect) without application of an external potential or contact of a processing pad with the surface of the substrate. | 08-25-2011 |
| 20130092556 | ELECTROPOLISHING SOLUTION CONTAINING A SULFATE SALT AND METHODS OF USE THEREOF - A substantially anhydrous electropolishing electrolyte solution that includes at least one sulfate salt. The substantially anhydrous electropolishing electrolyte solutions described herein do not use water as a solvent; instead, such electropolishing electrolyte solutions use anhydrous alcohols and/or glycols as a solvent. For example, an electropolishing electrolyte solution, as described herein, may include an alcohol, at least one mineral acid, and at least one sulfate salt. The at least one sulfate salt can act as a source of sulfate ions to replenish sulfate ions consumed in the electropolishing process. Anhydrous sulfate salts can also act as water scavengers by reacting with water to form sulfate salt hydrates. Methods of electropolishing metal articles using such electropolishing electrolyte solutions are disclosed herein as well. | 04-18-2013 |
| 205676000 | More than 20 weight percent organic material | 1 |
| 20110062031 | METHOD, APPARATUS, AND ELECTROLYTIC SOLUTION FOR ELECTROPOLISHING METALLIC STENTS - An apparatus, a method, and an electrolytic solution are described for electropolishing metallic stents made, for example, of high-strength medical alloys. The apparatus may include an electropolishing container made from material of low thermal conductivity. The apparatus may include at least one spiral cathode for optimization of solution agitation and/or voltage distribution in the electrolytic solution. Further, an electrolytic solution including at least dimethylsulfate is described. A method for improved electropolishing to consistently produce smooth surfaces is also described. | 03-17-2011 |
| 205680000 | More than 20 weight percent of one or more phosphoric acids | 1 |
| 20090200178 | ELECTROPOLISHING METHOD - The present invention describes a cost-saving and environmentally conserving process for the electrochemical polishing of steel, in particular of low-alloy steels. The workpieces are rinsed after electropolishing in an arid phosphoric acid-sulfuric acid-bath in a first rinsing step with a phosphoric acid-containing solution, whereby a chemical attack on the freshly polished surfaces is avoided without the use of environmentally harmful and unhealthy inhibitors such as chromates. By recycling of the acids and the rinsing solution, these acids and solutions can be regenerated, whereby the process can be designed effluent-free. | 08-13-2009 |
| 205682000 | Phosphorus containing | 4 |
| 20110073486 | AMORPHOUS METALLIC MATERIAL ELEMENTS AND METHODS FOR PROCESSING SAME - A method for altering a dimension of an element made of an amorphous metallic material is provided. The method includes providing an anode comprising the amorphous metallic material, wherein the amorphous metallic material comprises at least two primary constituents, providing a cathode disposed in a spaced-apart relationship with the anode, providing an electrolyte in contact with the anode and the cathode, and applying an electrical potential between the anode and the cathode. | 03-31-2011 |
| 20110253554 | ELECTROLYTE FOR REMOVING TITANIUM-CONTAINING COATINGS AND REMOVING METHOD USING SAME - An electrolyte for removing titanium-containing coatings from substrates is provided. The electrolyte includes alkali, accelerant, and inhibiter. The alkali is hydroxide. The accelerant is a complexant capable of complexing with titanium. The inhibiter is polyphosphate. A method for removing titanium-containing coatings from substrates is also described there. | 10-20-2011 |
| 20110253555 | SOLUTION FOR ELECTROLYTICALLY REMOVING CHROMIUM CARBIDE COATING AND METHOD FOR SAME - A solution and method for electrolytically removing chromium carbide coatings from the surface of substrates are provided. The solution includes 20-200 g/L alkali, the alkali being soluble alkali metal hydroxides; 20-150 g/L accelerant, the accelerant being a complexant and can combine with chromium ion; and 0.5-10 g/L auxiliary agent, the auxiliary agent being soluble polyphosphates. The method for removing chromium carbide coating on the substrate mainly includes electrolysis using the substrate having the coating as the anode and using the solution as the electrolyte. | 10-20-2011 |
| 20130319878 | ELECTROLYTIC SOLUTION, ELECTROLYSIS CASE, ELECTROPOLISHING SYSTEM, AND ELECTROPOLISHING METHOD USING THESE - In an electropolishing method passing large current, an electrolytic solution is given a viscosity by reacting an organic acid (a phosphoric acid solution or a mixed solution of phosphoric acid and sulfuric acid) with a silicon dioxide as a gelling agent, the electrolytic solution is continuously introduced to an electrolysis case and concurrently the first introduced electrolytic solution is discharged to progress the electropolishing. The electrolysis case has a cathode at a specific height from a lower open end of a frame in a specific size and depth, an introduction port on the cathode for introducing the electrolytic solution with specific viscosity, and a discharge port for discharging the solution from the frame. It is possible to shorten the distance of the cathode in the electrolysis case from the open end corresponding to the work-piece surface, and control the resistant of the electrolytic solution, so that the large current can be passed and the operation time can be reduced. | 12-05-2013 |
| 205684000 | Organic material containing | 13 |
| 20090139875 | ELECTROLYTE FOR ELECTRO-CHEMICAL MACHINING OF METAL PRODUCT - Disclosed is an electrolyte for electrochemical machining of a metal product, which can reduce a defect of an electro-chemical machining product, increase a lifespan of an electrolyte and an electrode, and improve efficiency of the electrochemical machining. The electrolyte includes an inorganic salt and at least one of a complexing agent and a reducing agent in a solvent. | 06-04-2009 |
| 20090223831 | Removal of Surface Oxides by Electron Attachment - The present invention relates to a method for removing metal oxides from a substrate surface. In one particular embodiment, the method comprises: providing a substrate, a first, and a second electrode that reside within a target area; passing a gas mixture comprising a reducing gas through the target area; supplying an amount of energy to the first and/or the second electrode to generate electrons within the target area wherein at least a portion of the electrons attach to a portion of the reducing gas and form a negatively charged reducing gas; and contacting the substrate with the negatively charged reducing gas to reduce the metal oxides on the surface of the substrate. | 09-10-2009 |
| 20100252446 | Method to Electrodeposit Metals Using Ionic Liquids in the Presence of an Additive - The present invention pertains to the use of an additive selected from the group consisting of amorphous silica, graphite powder, and a mixture thereof in a process to electroplate or electropolish a metal on a substrate using an ionic liquid as the electrolyte to increase metal layer thickness. It furthermore pertains to a method to electroplate or electropolish a metal on a metal substrate wherein an ionic liquid is employed as electrolyte, wherein a metal salt added to said ionic liquid or a metal anode is employed as metal source, and wherein said ionic liquid comprises said additive. | 10-07-2010 |
| 20110120883 | Electrolyte Solution and Electropolishing Methods - An aqueous electrolyte solution including a concentration of citric acid in the range of about 1.6 g/L to about 982 g/L and an effective concentration of ammonium bifluoride (ABF), and being substantially free of a strong acid. Methods of micropolishing a surface of a non-ferrous metal workpiece including exposing the surface to a bath of an aqueous electrolyte solution including a concentration of citric acid in the range of about 1.6 g/L to about 780 g/L and a concentration of ammonium bifluoride in the range of about 2 g/L to about 120 g/L and having no more than about 3.35 g/L of a strong acid, controlling the temperature of the bath to be between the freezing point and the boiling point of the solution, connecting the workpiece to an anodic electrode of a DC power supply and immersing a cathodic electrode of the DC power supply in the bath, and applying a current across the bath. | 05-26-2011 |
| 20110214998 | METHOD OF MAKING A POROUS TIO2 PHOTONIC FILM - A porous titanium dioxide film having photonic properties is made by etching a titanium substrate in an electrolyte solution in the presence of an electric field. The electrolyte solution can be an organic electrolyte solution. Etching involves providing an electrolyte solution in contact with a pair of electrodes and passing an electric current through the electrolyte solution. The titanium substrate can be one of the pair of electrodes. The current has a wave profile selected from a group consisting of a periodic square profile, a sine wave, a linear profile, or a quintic profile, and is provided either parallel of perpendicular to a plane of the substrate. | 09-08-2011 |
| 20110253556 | SOLUTION SYSTEM FOR ELECTROLYTICALLY REMOVING TITANIUM CARBIDE COATING AND METHOD FOR SAME - A solution system for removing titanium carbide coatings on substrate surface by two electrolysis steps is provided. The solution system includes a first electrolyte solution for a first electrolysis step and a second electrolyte solution for a second electrolysis step. The first electrolyte solution contains 2-80 g/L soluble alkali metal hydroxide and 5-100 g/L complexant capable of complexing with titanium ions. The second electrolyte solution contains 50-300 g/L soluble alkali metal hydroxide, 5-100 g/L complexant capable of complexing with titanium ions, and 10-60 g/L alkylol amine. The method for removing titanium carbide coating from the substrate mainly includes two electrolysis steps respectively using the first and second electrolyte solution. | 10-20-2011 |
| 20120125786 | Electrolyte solution and electrochemical Surface Modification Methods - An aqueous electrolyte solution including a concentration of citric acid in the range of about 1.6 g/L to about 982 g/L and an effective concentration of ammonium bifluoride (ABF), and being substantially free of a strong acid. Methods of treating the surface of a non-ferrous metal workpiece include exposing the surface to a bath of an aqueous electrolyte solution including a concentration of citric acid less than or equal to about 300 g/L and a concentration of ammonium bifluoride greater than or equal to about 10 g/L, and having no more than about 3.35 g/L of a strong acid, controlling the temperature of the bath to be greater than or equal to about 54° C., connecting the workpiece to the anode of a DC power supply and immersing a cathode of the DC power supply in the bath, and applying a current across the bath. | 05-24-2012 |
| 20120125787 | Electrolyte solution and electrochemical surface modification methods - An aqueous electrolyte solution including a concentration of citric acid in the range of about 1.6 g/L to about 982 g/L and an effective concentration of ammonium bifluoride (ABF), and being substantially free of a strong acid. Methods of treating the surface of a non-ferrous metal workpiece include exposing the surface to a bath of an aqueous electrolyte solution including a concentration of citric acid less than or equal to about 300 g/L and a concentration of ammonium bifluoride greater than or equal to about 10 g/L, and having no more than about 3.35 g/L of a strong acid, controlling the temperature of the bath to be greater than or equal to about 54° C., connecting the workpiece to the anode of a DC power supply and immersing a cathode of the DC power supply in the bath, and applying a current across the bath. | 05-24-2012 |
| 20120267254 | Electrolyte Solution and Electropolishing Methods - An aqueous electrolyte solution including a concentration of citric acid in the range of about 1.6 g/L to about 982 g/L and an effective concentration of ammonium bifluoride (ABF), and being substantially free of a strong acid. Methods of micropolishing a surface of a non-ferrous metal workpiece including exposing the surface to a bath of an aqueous electrolyte solution including a concentration of citric acid in the range of about 1.6 g/L to about 780 g/L and a concentration of ammonium bifluoride in the range of about 2 g/L to about 120 g/L and having no more than about 3.35 g/L of a strong acid, controlling the temperature of the bath to be between the freezing point and the boiling point of the solution, connecting the workpiece to an anodic electrode of a DC power supply and immersing a cathodic electrode of the DC power supply in the bath, and applying a current across the bath. | 10-25-2012 |
| 20130092557 | ELECTROPOLISHING SOLUTION CONTAINING A WATER SEQUESTERING AGENT AND METHODS OF USE THEREOF - Substantially anhydrous electropolishing electrolyte solutions. The substantially anhydrous electropolishing electrolyte solutions described herein do not use water as a solvent; instead, such electropolishing electrolyte solutions use anhydrous alcohols and/or glycols as a solvent. For example, an electropolishing electrolyte solution, as described herein, may include an alcohol, at least one mineral acid, and at least one water sequestering agent. Suitable examples of water sequestering agent include, but are not limited to, polyfunctional alcohols. Methods of electropolishing metal articles using such electropolishing electrolyte solutions are disclosed herein as well. | 04-18-2013 |
| 20140110272 | METHOD, APPARATUS, AND ELECTROLYTIC SOLUTION FOR ELECTROPOLISHING METALLIC STENTS - An apparatus, a method, and an electrolytic solution are described for electropolishing metallic stents made, for example, of high-strength medical alloys. The apparatus may include an electropolishing container made from material of low thermal conductivity. The apparatus may include at least one spiral cathode for optimization of solution agitation and/or voltage distribution in the electrolytic solution. Further, an electrolytic solution including at least dimethylsulfate is described. A method for improved electropolishing to consistently produce smooth surfaces is also described. | 04-24-2014 |
| 20140116891 | Non-Cyanide Base Electro Chemical Polishing - A system used in polishing the metal includes a base assembly and an electrolytic cell assembly. The base assembly has a support stand which is mounted on to a connecting element. The base assembly further includes a holding cylinder that is provided with a hook or similar kind of means that is adapted to hold an anode fixture. A process of polishing the metal using system includes providing stripping solution which is free of cyanide is taken in a glass beaker of the electrolytic cell assembly and is heated. Further, the products that are to be polished are mounted on to the anode fixture using the plurality of hooks. | 05-01-2014 |
| 20140246332 | Electrolyte Solution and Electrochemical Surface Modification Methods - An aqueous electrolyte solution including a concentration of citric acid in the range of about 1.6 g/L to about 982 g/L and an effective concentration of ammonium bifluoride (ABF), and being substantially free of a strong acid. Methods of treating the surface of a non-ferrous metal workpiece include exposing the surface to a bath of an aqueous electrolyte solution including a concentration of citric acid less than or equal to about 300 g/L and a concentration of ammonium bifluoride greater than or equal to about 10 g/L, and having no more than about 3.35 g/L of a strong acid, controlling the temperature of the bath to be greater than or equal to about 54° C., connecting the workpiece to the anode of a DC power supply and immersing a cathode of the DC power supply in the bath, and applying a current across the bath. | 09-04-2014 |
