| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 156345190 | With mechanical mask or shield or shutter for shielding workpiece | 6 |
| 20090020226 | Etching Apparatus - An etching apparatus includes: an etching chamber; a piping unit disposed in an upper portion of the etching chamber and including a plurality of nozzles via which an etchant is sprayed; a substrate mask disposed below the piping unit; and a transfer unit disposed below the substrate mask and used to transfer a substrate. The substrate mask interposed between the piping unit including the nozzles and the substrate has a mesh structure or a plurality of holes or slits. Thus, the generation of microbubbles can be prevented during a wet etching process so that a thin layer formed on the substrate can be etched at a uniform etch rate. Also, a lift unit having a fixing unit may be disposed on a lateral surface of the substrate mask. The lift unit moves the substrate mask up and down so as to obtain a uniform etch rate. | 01-22-2009 |
| 20100139862 | IMPRINT LITHOGRAPHY - A method for manufacturing a working template for use in imprint lithography is disclosed, which in an embodiment, involves contacting a first target region of an imprintable medium on a working template substrate with a master template to form a first imprint in the medium, the imprint defining a part of a working template pattern, separating the master template from the imprinted medium, contacting a second target region of the medium with the master template to form a second imprint in the medium, the second imprint defining a further part of the working template pattern, and separating the master template from the imprinted medium. | 06-10-2010 |
| 20100307683 | SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS - To improve the etch resistance of a resist pattern corresponding to an exposure light source with a short wavelength. | 12-09-2010 |
| 20120152460 | TEST MASK SET AND MASK SET - A test mask set includes a first test mask having a plurality of gate pattern areas disposed therein, each of the plurality of gate pattern areas having one or more gate patterns; and a second test mask having a plurality of active pattern areas disposed therein, each of the plurality of active pattern areas having one or more active patterns. The gate patterns formed in different areas among the plurality of gate pattern areas differ in at least one of a gate spacing or a gate width. The active patterns formed in different areas among the plurality of active pattern areas differ in at least one of an active spacing or an active width | 06-21-2012 |
| 20140041803 | METHOD AND APPARATUS FOR LIQUID TREATMENT OF WAFER SHAPED ARTICLES - In an apparatus and method for treating a wafer-shaped article, a rotary chuck is configured to hold a wafer-shaped article of a predetermined diameter such that a surface of the wafer-shaped article facing the rotary chuck is spaced from an opposing peripheral surface of the rotary chuck. The opposing peripheral surface comprises a first surface overlapping an outer peripheral edge of a wafer-shaped article when positioned on the spin chuck and a second surface positioned radially inwardly of the first surface and meeting the first surface at an interface that is radially inward of and substantially concentric with a wafer-shaped article when positioned on the rotary chuck. The second surface is substantially more hydrophobic than the first surface. | 02-13-2014 |
| 20150323250 | SUBSTRATE PROCESSING APPARATUS, DEPOSIT REMOVING METHOD OF SUBSTRATE PROCESSING APPARATUS AND RECORDING MEDIUM - A particle can be suppressed from being generated by removing a processing liquid or crystals caused by the processing liquid which adhere to a cover member. A substrate processing apparatus includes a substrate holding unit | 11-12-2015 |
