| Entries |
| Document | Title | Date |
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| 20080210168 | SINGLE CHAMBER, MULTIPLE TUBE HIGH EFFICIENCY VERTICAL FURNACE SYSTEM - A processing system is provided that has a single chamber in communication with multiple vertical processing tubes. The multiple tubes and boats are serviced by a single robotic substrate loading mechanism. A fluid supply feeds a fluid such as a gas or a vapor to at least one selectively isolatable portion of the system of the chamber, the boat loading area or one of the multiple vertical furnace processing tubes. With selective control of the atmosphere in the vertical processing tubes within the processing chamber, the wafers are processed so as to deposit or remove material therefrom. A single control panel and single gas panel servicing the system further adds to overall efficiency. | 09-04-2008 |
| 20080236498 | VACUUM FILM DEPOSITION APPARATUS - There is provided a vacuum film deposition apparatus which forms a film on a substrate by a vacuum film deposition technique, include: substrate holding means for holding the substrate; a deposition preventing member for preventing film deposition at undesired positions within the apparatus; and contacting means for bringing the substrate or the substrate holding means and the deposition preventing member into contact with each other. | 10-02-2008 |
| 20080251019 | SYSTEM AND METHOD FOR TRANSFERRING A SUBSTRATE INTO AND OUT OF A REDUCED VOLUME CHAMBER ACCOMMODATING MULTIPLE SUBSTRATES - The present invention comprises a system and method for transferring a substrate into and out of a chamber configured to accommodate multiple substrates. In one embodiment, the system comprises a chamber housing that includes a first substrate support tray and a second substrate support tray independently movable along a vertical axis, and a substrate conveyor movable into and out of the chamber housing. The first substrate support tray and the second substrate support tray are movable to a position where a portion of the second substrate support tray is received in the first substrate support tray. | 10-16-2008 |
| 20080289577 | Workpiece processing apparatus - A workpiece processing apparatus S, which comprises: a plasma generator unit | 11-27-2008 |
| 20090031956 | Apparatus for decorating objects by sublimation - Apparatus and a process for the continuous cycle decoration of profiled bars for shutters and frames, or other similar objects, with a carrier film of plastic material, printed with the desired decoration with sublimable inks. The process provides for a significant number of profiled bars or decorated steel sheets to be produced per unit of time. | 02-05-2009 |
| 20090031957 | HIGH RESOLUTION SUBSTRATE HOLDER LEVELING DEVICE AND METHOD - A method for adjusting a spacing of a leveling plate from a chamber body comprises attaching a mounting stud that includes a stud threaded surface to the chamber body. An adjustment screw is provided that has a first threaded surface threadingly engaged with the stud threaded surface. A bushing is provided that has a bushing threaded surface threadingly engaged with a second threaded surface of the adjustment screw. The bushing is movably coupled to the leveling plate. Coarse adjustment of the spacing between the leveling plate and the chamber body is made by rotating the adjustment screw with respect to the mounting stud. The bushing is fixed to the leveling plate. Fine adjustment of the spacing between the leveling plate and the chamber body is made by rotating the adjustment screw with respect to the mounting stud and the bushing. | 02-05-2009 |
| 20090107404 | EPITAXIAL REACTOR WITH SUSCEPTOR CONTROLLED POSITIONING - The invention relates to a system for controlling the positioning of a susceptor ( | 04-30-2009 |
| 20090114158 | Workpiece Support With Fluid Zones For Temperature Control - A workpiece support is disclosed defining a workpiece-receiving surface. The workpiece support includes a plurality of fluid zones. A fluid, such as a gas, is fed to the fluid zones for contact with a workpiece on the workpiece support. The fluid can have selected thermoconductivity characteristics for controlling the temperature of the workpiece at particular locations. In accordance with the present disclosure, at least certain of the fluid zones are at different azimuthal positions. In this manner, the temperature of the workpiece can be adjusted not only in a radial direction but also in an angular direction. | 05-07-2009 |
| 20090114159 | TRANSPORTING MEANS AND VACUUM COATING INSTALLATION FOR SUBSTRATES OF DIFFERENT SIZES - In a vacuum coating installation to coat planar substrates, comprising a vacuum chamber and a transport device arranged in the vacuum chamber for transporting the substrates along a transportation path through the vacuum chamber, with the transport device comprising a multitude of transport rollers arranged successively along the transportation path, each transport roller is adapted to be mounted at least at two different positions, vertically distanced from each other. A carrier frame has a substrate accepting structure and a guiding rod arranged at the bottom of the carrier frame in the direction of transportation to create a friction connection with the transportation device, connected to the carrier frame at the connection points, with the guiding rod being connected at least at one connection point to the carrier frame such that a relative displacement is possible of the guiding rod relative to the carrier frame in the direction of transportation. | 05-07-2009 |
| 20090173280 | VACUUM COATING SYSTEM COMPRISING A TRANSPORT UNIT FOR TRANSPORTING SUBSTRATES - A vacuum coating unit with a transport device for transporting substrates in a transport direction, comprises at least one first endless conveyor running in the transport direction and having a conveyor device guided around at least two deflection rollers. The conveyor device is located at a distance from a guide device extending in the transport direction parallel to the conveyor device of the first endless conveyor in such a way that the substrates can be introduced into the gap between the conveyor device and the guide device and can be moved in the transport direction by the displacement of the conveyor device. | 07-09-2009 |
| 20090178621 | SUBSTRATE TREATING SYSTEM FOR DEPOSITING A METAL GATE ON A HIGH-K DIELECTRIC FILM AND IMPROVING HIGH-K DIELECTRIC FILM AND METAL GATE INTERFACE - An apparatus to improve high-k dielectric film and metal gate interface in the fabrication of MOSFET by depositing a metal gate on a high-k dielectric comprising an annealing step annealing a substrate with high-k dielectric film deposited thereon in a thermal annealing module and a depositing step depositing a metal gate material on said annealed substrate in a metal gate deposition module, characterized that said annealing step and depositing step are carried out consecutively without a vacuum break. | 07-16-2009 |
| 20090217878 | SYSTEM FOR THIN FILM DEPOSITION UTILIZING COMPENSATING FORCES - A process for depositing a thin film material on a substrate is disclosed, comprising simultaneously directing a series of gas flows from the output face of a delivery head of a thin film deposition system toward the surface of a substrate, and wherein the series of gas flows comprises at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material, wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material. A system capable of carrying out such a process is also disclosed. | 09-03-2009 |
| 20090283042 | SUSCEPTOR POSITIONING AND SUPPORTING DEVICE OF VACUUM APPARATUS - A susceptor positioning and supporting device of a vacuum apparatus for carrying and elevating a substrate in a vacuum apparatus chamber is provided. The device has a lateral positioning and supporting mechanism to perform clamping and positioning at a side of a susceptor, preventing the susceptor from slanting inside the vacuum apparatus chamber. The lateral positioning and supporting mechanism and the susceptor thereby forms a closed beam support mechanism capable of reducing load suspension deformation at the ends of the large susceptor. The device improves planarity of the large susceptor and the substrate, and in turn improves uniformity of a thin film deposited on the substrate. | 11-19-2009 |
| 20090314211 | BIG FOOT LIFT PIN - Embodiments described herein generally provide a lift pin assembly having increased wafer placement accuracy, repeatability, reliability, and corrosion resistance. In one embodiment, a lift pin assembly for positioning a substrate relative to a substrate support is provided. The lift pin assembly comprises a lift pin comprising a pin shaft, a pin head coupled with a first end of the pin shaft for supporting the substrate, and a shoulder coupled with a second end of the pin shaft. The lift pin assembly further comprises a cylindrical body slidably coupled with the pin shaft and a locking pin for preventing the cylindrical body from sliding along the shaft, wherein the shoulder has a through-hole dimensioned to accommodate the locking pin. | 12-24-2009 |
| 20100012037 | SUBSTRATE TRANSFER APPARATUS - A substrate transfer apparatus comprising: a plurality of floating-transfer guide plates adjacent to each other with a space, each of guide plate having a plurality of floating gas ejecting holes; a gas supplying source for supplying a floating gas to the guide plates; a tray that is placed on one of the guide plates in order to mount a substrate to be transferred, and that is floated by the floating gas; and a transfer arm for transferring the floated tray to the adjacent other guide plate from the guide plate, wherein the tray includes a main body portion having both side edges parallel to a transfer direction of the tray, and an outward projecting portion that is formed so as to partially project outwardly from at least one of both side edges of the main body portion, and wherein the transfer arm is in contact and engaged with the outward projecting portion when the tray is transferred by the transfer arm. | 01-21-2010 |
| 20100071624 | SUBSTRATE SUPPORT FRAME, AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME AND METHOD OF LOADING AND UNLOADING SUBSTRATE USING THE SAME - A substrate support frame for loading or unloading a substrate on or from a susceptor in a chamber, wherein the substrate support frame is disposed over the susceptor, comprises a body supporting a boundary portion of the substrate; a first opening through a center portion of the body and exposing a center portion of the susceptor; and a second opening corresponding to one side of the body, wherein the substrate is disposed on the body through the second opening to overlap the center portion of the susceptor. | 03-25-2010 |
| 20100071625 | SHUTTER DISK HAVING A TUNED COEFFICIENT OF THERMAL EXPANSION - A shutter disk having a tuned coefficient of thermal expansion is provided herein. In some embodiments, a shutter disk having a tuned coefficient of thermal expansion may include a body formed from a first material comprising at least two components, wherein a ratio of each of the at least two components to one another is selected to provide a coefficient of thermal expansion of the body that is substantially similar to a coefficient of thermal expansion of a second material to be deposited atop the body. | 03-25-2010 |
| 20100206235 | WAFER CARRIER TRACK - Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a wafer carrier track for levitating and traversing a wafer carrier within a vapor deposition reactor system is provided which includes upper and lower sections of a track assembly having a gas cavity formed therebetween. A guide path extends along an upper surface of the upper section and between two side surfaces which extend along and above the guide path and parallel to each other. A plurality of gas holes along the guide path extends from the upper surface of the upper section, through the upper section, and into the gas cavity. In some examples, the upper and lower sections of the track assembly may independently contain quartz, and in some examples, may be fused together. | 08-19-2010 |
| 20100212596 | WEIGHT PLATE OF VACUUM EVAPORATION APPARATUS AND VACUUM EVAPORATION APPARATUS USING THE SAME - Provided is a weight plate of a vacuum evaporation apparatus, and a vacuum evaporation apparatus, which may prevent occurrence of displacement due to an impact or the like during a conveyance by a convey mechanism after a shadow mask and a glass substrate are superposed and aligned. The glass substrate is superposed and aligned on a top surface of a tension mask as the shadow mask fixed to a mask holding member. Then, the weight plate is placed on the glass substrate and presses the glass substrate by gravity to form a combined conveyance body. A liquid metal is filled in a hollow part of the weight plate at a filling factor of from more than 25% to less than 85% or other shock absorbing mechanism is provided for absorbing an impact applied to the combined conveyance body. | 08-26-2010 |
| 20110056436 | A DEVICE FOR LAYERED DEPOSITION OF VARIOUS MATERIALS ON A SEMICONDUCTOR SUBSTRATE, AS WELL AS A LIFT PIN FOR USE IN SUCH A DEVICE - The invention relates to a deposition device for comprising a processing space with a substrate support disposed therein, as well as several lift pins ( | 03-10-2011 |
| 20110073042 | Substrate Centering Device and Organic Material Deposition System - A substrate centering device for an organic material deposition system comprises: a plurality of substrate support holders configured to be reciprocally movable in a facing direction within an organic material deposition chamber and supporting both side portions of a substrate loaded by a robot; a substrate centering unit configured to be reciprocally movable at each of the substrate support holders and centering the substrate by guiding both side portions of the substrate; and a plurality of substrate clampers configured to be reciprocally movable in a vertical direction at each of the substrate support holders, and clamping the substrate that has been centered by the substrate centering unit. | 03-31-2011 |
| 20110139073 | CONVEYOR ASSEMBLY FOR A VAPOR DEPOSITION APPARATUS - A conveyor assembly for use in a vapor deposition apparatus includes a housing defining an enclosed interior volume. A conveyor is driven in an endless loop path within the housing. The housing has a top member that defines an open deposition area in an upper conveyance leg of the conveyor. The conveyor includes a plurality of interconnected slats, with each slat having a respective flat, planar outer surface and transverse edge profiles such that, in the upper conveyance leg of the conveyor, the outer surfaces of the slats lie in a common horizontal plane and define an uninterrupted flat support surface for a substrate conveyed through the vapor deposition apparatus. | 06-16-2011 |
| 20110155063 | Conveyor Assembly with Removable Rollers for a Vapor Deposition System - A conveyor assembly for conveying substrates through a vapor deposition system includes a first carriage rail and a second carriage rail disposed at an opposite side of the conveyor assembly. The first and second carriage rails include a plurality of roller positions spaced longitudinally therealong. The carriage rails further include a pair of wheels at each of the roller positions, with the wheels spaced apart so as to define a cradle at the respective roller position. At least one of the wheels at each roller position on is drive wheel. A plurality of rollers extend between the first and second carriage rails. The rollers have ends that drop into the cradles at the roller positions such that the rollers are removable from the carriage rails by being lifted out of the cradles at the roller positions. | 06-30-2011 |
| 20120000426 | INTEGRATED GEARBOX AND ROTARY FEEDTHROUGH SYSTEM FOR A VACUUM CHAMBER STRUCTURE - A vacuum chamber structure includes a rotary feedthrough configured on a chamber wall to provide rotational drive to the interior of the structure. The rotary feedthrough includes a gearbox having a housing and a shaft rotationally supported by bearings contained within the housing. A motor is operably coupled to the gearbox housing to drive the shaft, which extends from the gearbox. A seal assembly is operably disposed between the gearbox housing and the chamber wall, with the shaft disposed through the seal assembly and extending through a bore in the chamber wall and into the interior of the structure. The shaft is rotationally supported with bearings only via the bearings in the gearbox housing. | 01-05-2012 |
| 20120017833 | CONVEYOR DEVICE AND SUBSTRATE TREATMENT INSTALLATION - Conveyor devices, in particular for use in substrate treatment devices, and configurations of substrate treatment devices, in particular horizontal coating installations for the mass coating of plate-like substrates during the production of solar cells are provided. The conveyor device comprises a multiplicity of conveyor rollers, each mounted rotatably at both ends thereof. During operation of the conveyor device, at least one conveyor roller is displaceable axially, i.e. parallel to the axis of rotation thereof. | 01-26-2012 |
| 20120024233 | Conveyor Assembly with Releasable Drive Coupling - A module for a deposition system includes a drive unit mounted on an exterior wall of the module. The drive unit has a drive shaft that extends into the module and engages a conveyor operably disposed within the module for driving the conveyor in a conveying path. A releasable drive coupling is configured between the drive unit and a drive member of the conveyor. The drive coupling has a first end that releasably engages with the drive shaft and a second end that releasably engages the conveyor drive member. The drive coupling includes a torque member, and may also include at least one thermal shield spaced concentrically around the torque member and extending axially between the first and second ends. | 02-02-2012 |
| 20120055407 | ARRANGEMENT FOR PROCESSING SUBSTRATE AND SUBSTRATE CARRIER - The invention relates to an arrangement for processing a substrate in a reaction chamber of a gas deposition apparatus by exposing the substrate to alternate, saturated surface reactions of starting materials, the arrangement comprising loading means for loading the substrate into the reaction chamber on a substrate support. In accordance with the invention, the substrate is arranged for being attached in a detachable manner with an adhesive to the substrate carrier. | 03-08-2012 |
| 20120090548 | WAFER CARRIER TRACK - Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a wafer carrier track for levitating and traversing a wafer carrier within a vapor deposition reactor system is provided which includes upper and lower sections of a track assembly having a gas cavity formed therebetween. A guide path extends along an upper surface of the upper section and between two side surfaces which extend along and above the guide path and parallel to each other. A plurality of gas holes along the guide path extends from the upper surface of the upper section, through the upper section, and into the gas cavity. In some examples, the upper and lower sections of the track assembly may independently contain quartz, and in some examples, may be fused together. | 04-19-2012 |
| 20120247392 | MULTICHAMBER THIN-FILM DEPOSITION APPARATUS AND GAS-EXHAUSTING MODULE - A gas-exhausting module for a multichamber thin-film deposition apparatus, which has one or more reactor chambers, includes a collecting chamber and a plurality of gas pipes. The collecting chamber includes an upper portion and a lower portion. The cross-sectional area of the lower portion is less than the cross-sectional area of the upper portion. One end of each gas pipe communicates with one of the reactor chambers. The other end of each gas pipe communicates with the upper portion in a tangential direction. During operation, a cyclonic airflow is provided within the collecting chamber to uniformly extract the exhaust gas from each reactor chamber. | 10-04-2012 |
| 20120266821 | REACTION SYSTEM FOR GROWING A THIN FILM - An atomic deposition (ALD) thin film deposition apparatus includes a deposition chamber configured to deposit a thin film on a wafer mounted within a space defined therein. The deposition chamber comprises a gas inlet that is in communication with the space. A gas system is configured to deliver gas to the gas inlet of the deposition chamber. At least a portion of the gas system is positioned above the deposition chamber. The gas system includes a mixer configured to mix a plurality of gas streams. A transfer member is in fluid communication with the mixer and the gas inlet. The transfer member comprising a pair of horizontally divergent walls configured to spread the gas in a horizontal direction before entering the gas inlet. | 10-25-2012 |
| 20130098294 | CONVEYOR ASSEMBLY WITH REMOVABLE ROLLERS FOR A VAPOR DEPOSITION SYSTEM - A conveyor assembly for conveying substrates through a vapor deposition system includes a first carriage rail disposed at a drive side of the conveyor assembly. A roller position is defined along the carriage rail, and a drive wheel is disposed at the roller position and configured for driving engagement against a roller. The drive wheel includes an axial cylindrical extension and an elastomeric sleeve disposed on the cylindrical extension, with the elastomeric sleeve having a defined outer diameter. With this configuration, a roller placed in the roller position rests by gravity on the elastomeric sleeve and is rotationally driven by rotation of the drive wheel such that a substrate conveyed by the roller is displaced a defined distance for each rotation of the drive wheel as a function of the outer diameter of the elastomeric sleeve. | 04-25-2013 |
| 20130152859 | SYSTEM AND METHOD FOR PEDESTAL ADJUSTMENT - A pedestal positioning assembly system for use in a substrate processing system includes a pedestal rigidly attached to a pedestal shaft, a reference rigidly attached to the substrate processing system, a lateral adjustment assembly to adjust a lateral location of the pedestal relative to the reference, and a vertical adjustment assembly to adjust a tilt of the pedestal relative to the reference. The lateral adjustment assembly and the vertical adjustment assembly are external to a processing chamber and are coupled to the pedestal disposed within the processing chamber through the pedestal shaft. The reference can be a ring and the lateral adjustment assembly substantially centers the pedestal within the ring. A method of adjusting a pedestal includes leveling the pedestal, translating the pedestal, calibrating the pedestal height to a preheat ring level, and checking the level and location of the pedestal while rotating the pedestal. | 06-20-2013 |
| 20130199448 | METHOD AND APPARATUS FOR CONTACTLESSLY ADVANCING SUBSTRATES - A method of contactlessly advancing a substrate ( | 08-08-2013 |
| 20140261186 | METHOD AND APPARATUS FOR MANUFACTURING THREE-DIMENSIONAL-STRUCTURE MEMORY DEVICE - Provided is a method of manufacturing a memory device having a 3-dimensional structure, which includes alternately stacking one or more dielectric layers and one or more sacrificial layers on a substrate, forming a through hole passing through the dielectric layers and the sacrificial layers, forming a pattern filling the through hole, forming an opening passing through the dielectric layers and the sacrificial layers, and supplying an etchant through the opening to remove the sacrificial layers. The stacking of the dielectric layers includes supplying the substrate with one or more gases selected from the group consisting of SiH | 09-18-2014 |
| 20140331933 | APPARATUS FOR PROCESSING APPARATUS HAVING SIDE PUMPING TYPE - Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber body having an opened upper side, the chamber body providing an inner space in which a process with respect to a substrate is performed, a chamber lid disposed on an upper portion of the chamber body to close the opened upper side of the chamber body, and a showerhead disposed on a lower portion of the chamber lid to supply a process gas toward the inner space. The chamber body includes at least one convergent port disposed along the inside of a sidewall of the chamber body to allow the process gas within the inner space to converge, a plurality of inner exhaust holes defined in along the sidewall of the chamber body to communicate with the convergent port and the inner space, and a plurality of inner exhaust ports connected to the convergent port. | 11-13-2014 |
| 20150047567 | FILM-FORMING APPARATUS - A film-forming apparatus forms a film by sequentially supplying a plurality of kinds of reaction gases to a substrate placed between a placing unit and a ceiling plate in a processing chamber having vacuum atmosphere and supplying a replacement gas between supply of one reaction gas and supply of next reaction gas. A central gas ejecting unit is disposed above the central portion of the substrate, and includes gas ejecting ports formed therein to spread the gases toward the outer side in the horizontal direction. A peripheral gas supply unit is disposed to surround the central gas ejecting unit. The peripheral gas supply unit includes a plurality of gas ejecting ports, which is formed in the circumferential direction such that the gases are spread in the horizontal direction toward the outer circumferential side and the central side of the substrate in a plan view. | 02-19-2015 |
| 20150096495 | APPARATUS AND METHOD OF ATOMIC LAYER DEPOSITION - An apparatus for depositing atomic layers comprises a substrate moving mechanism, a showerhead comprising at least one injection unit, and a showerhead reciprocating mechanism. The showerhead injects source and reactant precursors to the substrate while the substrate is transported. The number of the atomic layers deposited on the substrate can be controlled by controlling the moving speed of the substrate and the reciprocating speed of the showerhead. The invention provides an apparatus and a method with high throughput and small footprint. The invention also provides an apparatus and a method configured to deposit the atomic layers on a gas permeable substrate. | 04-09-2015 |
| 20150122180 | SUBSTRATE TRANSFER APPARATUS AND THIN FILM DEPOSITION APPARATUS HAVING THE SAME - A substrate transfer apparatus includes a guide rail, a carrier, a magnetic levitation unit, and a transferring unit. The guide rail is in a vacuum evacuable chamber. The carrier may carry a substrate and may be linearly movable along the guide rail. The magnetic levitation unit is configured to generate a magnetic levitation force between the guide rail and the carrier. The transferring unit is configured to generate a momentum for linearly transferring the carrier and includes a plurality of first transferring magnetic material members on an upper surface of the carrier, a plurality of second transferring magnetic material members over the carrier and spaced apart from the first transferring magnetic material members, and a plurality of containers in which the plurality of second transferring magnetic material members is respectively disposed. | 05-07-2015 |
| 20150122181 | SUSCEPTOR SUPPORT PORTION AND EPITAXIAL GROWTH APPARATUS INCLUDING SUSCEPTOR SUPPORT PORTION - A susceptor support portion of the present invention includes a susceptor shaft and a substrate lift portion. The susceptor shaft includes a support column and a plurality of arms that extend radially from the support column, the substrate lift portion includes a support column and a plurality of arms that extend radially from the support column, the arm of the susceptor shaft includes a first arm, a second arm coupled to the first arm, and a third arm coupled to the second arm, from the support column side of the susceptor shaft, the second arm being provided with a through hole which passes through the second arm in a vertical direction, and a width of the first arm of the susceptor shaft is smaller than a width of the second arm of the susceptor shaft. | 05-07-2015 |
| 20150361548 | Injection Assembly in Linear Deposition Apparatus with Bulging Ridges Extending along Bottom Openings - Embodiments relate to an injection module assembly (IMA) including a body and injectors installed in a module block. The body is formed with a plurality of openings defined by walls extending from the bottom surface to the top surface. Each of the walls includes bulging ridges at the bottom along bottom portions of the injectors. The bulging ridges prevent gas or radicals injected by adjacent injectors from mixing at locations other than on the top surface of a substrate placed below the IMA. Accordingly, the injectors can be placed with closer proximity to each other despite the compact size of the IMA. | 12-17-2015 |
| 20150368798 | Apparatus And Process Containment For Spatially Separated Atomic Layer Deposition - Provided are atomic layer deposition apparatus and methods including a gas distribution plate comprising a plurality of elongate gas ports with gas curtains extending along the outer length of the gas distribution plate. Also provided are atomic layer deposition apparatuses and methods including a gas distribution plate with a plurality of elongate gas ports with gas curtains. | 12-24-2015 |
| 20160002780 | CARRIER FOR SUBSTRATES - A carrier for supporting a substrate in a substrate processing chamber for vacuum processing is described. The carrier includes a substrate fixation assembly, wherein the substrate fixation assembly includes one or more fixation units; a first fixation dement having a first surface configured for contacting a first substrate surface of the substrate; a second fixation element having a second surface configured for contacting a second substrate surface of the substrate; and a force dement for providing a fixation force for the substrate with at least one of the first and the second fixation element. | 01-07-2016 |
| 20160102399 | APPARATUS AND METHOD FOR HIGH-THROUGHPUT ATOMIC LAYER DEPOSITION - Atomic layer deposition apparatus for depositing a film in a continuous fashion. The apparatus includes a process tunnel, extending in a transport direction and bounded by at least a first and a second wall. The walls are mutually parallel and allow a flat substrate to be accommodated there between. The apparatus further includes a transport system for moving a train of substrates or a continuous substrate in tape form, through the tunnel. At least the first wall of the process tunnel is provided with a plurality of gas injection channels that, viewed in the transport direction, are connected successively to a first precursor gas source, a purge gas source, a second precursor gas source and a purge gas source respectively, so as to create a tunnel segment that—in use—comprises successive zones containing a first precursor gas, a purge gas, a second precursor gas and a purge gas, respectively. | 04-14-2016 |
| 20160376703 | VAPOR DEPOSITION APPARATUS - A vapor deposition apparatus comprises a vacuum chamber, at least two movable holders and an alignment system. A pedestal, a backboard supported on the pedestal and a metal mask located above the backboard are disposed inside the vacuum chamber, wherein an anti-plasma coated layer is provided on the metal mask; each of the movable holders is configured to clamp an end of the metal mask on which a pulling force can be applied; and the alignment system is configured to drive the movable holders to move in at least one direction of a first direction and a second direction that are perpendicular to each other within a plane in parallel to the backboard and a third direction perpendicular to the plane to perform at least one of applying a pulling force on the metal mask and attaching the metal mask onto a preset location of the backboard. | 12-29-2016 |
| 20190144227 | SUBSTRATE CONVEYING DEVICE AND DEPOSITION APPARATUS | 05-16-2019 |
