Yun-Jun
Yun-Jun Kim, Uiwang-Si KR
Patent application number | Description | Published |
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20140183701 | HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS - A hardmask composition includes a monomer represented by the following Chemical Formula 1 and an aromatic ring-containing polymer, | 07-03-2014 |
20140186775 | MONOMER FOR HARDMASK COMPOSITION AND HARDMASK COMPOSITION INCLUDING THE MONOMER AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION - A monomer for a hardmask composition is represented by the following Chemical Formula 1, | 07-03-2014 |
20140342273 | MONOMER FOR A HARDMASK COMPOSITION, HARDMASK COMPOSITION COMPRISING THE MONOMER, AND METHOD FOR FORMING A PATTERN USING THE HARDMASK COMPOSITION - Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. | 11-20-2014 |
20150008212 | MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING MONOMER, AND PATTERN FORMING METHOD USING HARDMASK COMPOSITION - Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern. | 01-08-2015 |
Yun-Jun Kim, Suwon-Si KR
Patent application number | Description | Published |
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20150187566 | HARDMASK COMPOSITION, METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS - A hardmask composition includes a polymer including a moiety represented by one of the following Chemical Formulae 1a to 1c, a monomer represented by the following Chemical Formula 2 and a solvent. | 07-02-2015 |
20150187589 | HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION - A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent. | 07-02-2015 |
20150268558 | MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING THE MONOMER, AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION - A monomer for a hardmask composition, a hardmask composition, and a method of forming patterns, the monomer being represented by the following Chemical Formula 1: | 09-24-2015 |
20150274622 | MONOMER, HARDMASK COMPOSITION INCLUDING MONOMER, AND METHOD FOR FORMING PATTERN BY USING HARDMASK COMPOSITION - Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the hardmask composition. | 10-01-2015 |
Yun-Jun Kim, Suwon-Si, Gyeonggi-Do KR
Patent application number | Description | Published |
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20150301446 | MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING SAID MONOMER, AND METHOD FOR FORMING PATTERN USING SAID HARDMASK COMPOSITION - Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the same. | 10-22-2015 |
Yun-Jun Lee, Taipei City TW
Patent application number | Description | Published |
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20100209702 | COMPOSITE LAYER AND FABRICATION METHOD THEREOF - The invention provides a method for forming a composite membrane, including: (a) loading a substrate into a chamber; (b) performing a first cycle step in the chamber to form a single aluminum oxide (Al | 08-19-2010 |