Patent application number | Description | Published |
20130224958 | THROUGH HOLE FORMING METHOD - Provided are a method of forming a through hole, which can inhibit misalignment between central axes of holes in both surfaces of a substrate, which is free from metal contamination, and which inhibits notching so as to improve the dimensional accuracy, the method including: preparing a silicon substrate; preparing a supporting substrate for supporting the silicon substrate; fixing the silicon substrate and the supporting substrate to form a composite substrate; and carrying out dry etching to the composite substrate from a silicon substrate side of the composite substrate toward a supporting substrate side of the composite substrate to form a through hole in the silicon substrate, in which the supporting substrate in the preparing a supporting substrate has a hole formed at a region corresponding to a region of the through hole to be formed in the silicon substrate, on a surface of the supporting substrate facing the silicon substrate. | 08-29-2013 |
20140023176 | RADIATION GENERATING APPARATUS AND RADIATION IMAGING SYSTEM - Provided is a radiation generating apparatus, including: a radiation generating unit for emitting radiation; and a movable diaphragm unit including a light projecting/sighting system for making a simulation display of a radiation field with visible light. The light projecting/sighting system includes: a light source of the visible light; a light guiding plate that is provided across a radiation axis, and causes the visible light from the light source to exit from a front surface of the light guiding plate; and a louver that gives directivity to the visible light exiting from the front surface of the light guiding plate. | 01-23-2014 |
20140037055 | RADIATION EMISSION TARGET, RADIATION GENERATING TUBE, AND RADIOGRAPHY SYSTEM - A radiation emission target includes a target layer that generates radiation when irradiated with an electron beam and a substrate composed of diamond, the substrate supporting the target layer. The substrate has a Knoop hardness of 60 GPa or more and 150 GPa or less. | 02-06-2014 |
20140087562 | METHOD FOR PROCESSING SILICON SUBSTRATE AND METHOD FOR PRODUCING CHARGED-PARTICLE BEAM LENS - A method for processing a silicon substrate includes forming a mask layer on the silicon substrate; forming a hole is farmed in the silicon substrate by alternately repeating (i) an etching step in which plasma etching is performed in a thickness direction of the silicon substrate using the mask layer as a mask and (ii) a deposition step in which a protection film is deposited on an inner wall of the hole formed in the etching step; removing the protection film; and a planarizing a side wall of the hole by etching the inner wall of the hole from which the protection film has been removed. The mask layer includes a material that withstands the removal step. In the planarization step, the inner wall of the hole is etched using the mask layer as a mask. | 03-27-2014 |
20140112442 | RADIATION GENERATING APPARATUS AND RADIATION IMAGING SYSTEM - A radiation generating apparatus includes a radiation generating unit and a diaphragm unit that functions as a projector-collimator configured to simulate a radiation field with a visible-light field. The diaphragm unit includes a light source configured to generate visible light, an optical lens configured to control a state of diffusion of the visible light emitted from the light source, and field-limiting blades. The light source and the optical lens are provided between a radiation emission window and the field-limiting blades. The light source is movable into and retractable from a path of radiation generated by the radiation generating unit. | 04-24-2014 |
20140205071 | TRANSMISSION-TYPE X-RAY TARGET AND RADIATION GENERATING TUBE INCLUDING THE SAME - A transmission-type X-ray target includes a flat plate-shaped diamond substrate having a first surface and a second surface facing the first surface and a target layer that is located on the first surface. A residual stress of the first surface is lower than a residual stress of the second surface. | 07-24-2014 |
20140254754 | RADIATION GENERATING APPARATUS AND RADIATION IMAGING SYSTEM - A radiation generating apparatus including: a radiation generating unit for emitting radiation through a transmission window; and a movable diaphragm unit including a restricting blade for adjusting a size of a radiation field and a light projecting and collimating device for making simulation display of the radiation field with a visible light field, in which the light projecting and collimating device includes a light source for emitting visible light, and a reflection plate disposed obliquely to a radiation center axis, the reflection plate having a reflection surface for reflecting the visible light and transmitting the radiation; the visible light field is formed of the visible light which is emitted from the light source and is reflected by the reflection plate; and a compensating member having a thickness variation for reducing unevenness of the radiation emitted in the radiation field is disposed on a radiation exit side of the reflection plate. | 09-11-2014 |
20140369471 | TRANSMISSIVE TARGET, X-RAY GENERATING TUBE INCLUDING TRANSMISSIVE TARGET, X-RAY GENERATING APPARATUS, AND RADIOGRAPHY SYSTEM - A transmissive target includes a target layer configured to include target metal and generate X-ray when receiving electrons and a substrate configured to support the target layer and include carbon as a main component. A carbide region including carbide of the target metal and a non-carbide region including the target metal are disposed in a mixed manner on a boundary surface between the substrate and the target layer on a target layer side. | 12-18-2014 |
20150036801 | RADIATION GENERATING APPARATUS AND RADIATION IMAGING SYSTEM - A radiation generating apparatus | 02-05-2015 |