Patent application number | Description | Published |
20080198352 | Optical Module for an Objective - There is provided an optical module for an objective. The optical module includes (a) a first holding device with an inner circumference, which extends in a first circumferential direction, (b) at least one first supporting device for supporting a first optical element and being fixed at said inner circumference of said first holding device, (c) an annular circumferential first assembly space being defined by displacing said first supporting device once in a revolving manner along said first circumferential direction, (d) at least one second supporting device being provided for supporting a second optical element and being fixed at said inner circumference of said first holding device, and (e) an annular circumferential second assembly space being defined by displacing said second supporting device once in a revolving manner along said first circumferential direction. The first assembly space intersects the second assembly space. | 08-21-2008 |
20080212083 | OPTICAL IMAGING ARRANGEMENT - There is provided an optical imaging arrangement comprising: a mask unit comprising a pattern, a substrate unit comprising a substrate, an optical projection unit comprising a group of optical element units, the optical projection unit being adapted to transfer an image of the pattern onto the substrate, a first imaging arrangement component, the first imaging arrangement component being a component of one of the optical element units, a second imaging arrangement component, the second imaging arrangement component being different from the first imaging arrangement component and being a component of one of the mask unit, the optical projection unit and the substrate unit, and a metrology arrangement. The metrology arrangement captures a spatial relationship between the first imaging arrangement component and the second imaging arrangement component. The metrology arrangement comprises a reference element, the reference element being mechanically connected directly to the first imaging arrangement component. | 09-04-2008 |
20080309950 | Calibrating A Lithographic Apparatus - The X, Y and Rz positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be coplanar with the pattern on the mask itself. Measurements of the table position in the other degrees of freedom can be measured with capacitive or optical height sensors. | 12-18-2008 |
20090052066 | Actuator Device - Actuator devices, as well as related systems and methods, are disclosed. In some embodiments, the devices, systems and methods are within the field of microlithography. | 02-26-2009 |
20090091727 | OPTICAL IMAGING DEVICE WITH DETERMINATION OF IMAGING ERRORS - In some embodiments, the disclosure provides a system that includes an optical element group including a plurality of optical elements configured to project a pattern of an object in an object plane to an image plane. The system also includes a unit configured to detect an image selected from an image of at least part of the projection the pattern of the object, and an image of a measurement element arranged in the area of the object. The image is created via at least some of the optical elements in the optical element group. The unit is configured to determine an imaging error in the projection of the pattern of the object from the object plane to the image plane. The device is configured to be used in microlithography. | 04-09-2009 |
20090135395 | OPTICAL SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY - An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%. | 05-28-2009 |
20090185148 | SUPPORT FOR AN OPTICAL ELEMENT - The disclosure relates to a support structure for an optical element and an optical element module including such a support structure. The disclosure also relates to a method of supporting an optical element. The disclosure may be used in the context of photolithography processes for fabricating microelectronic devices, such as semiconductor devices, or in the context of fabricating devices, such as masks or reticles, used during such photolithography processes. | 07-23-2009 |
20090207396 | OPTICAL SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY - An optical system for semiconductor lithography including a plurality of optical components, as well as related components and methods, are disclosed. The apparatus can include an optical component that can be moved by a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%. | 08-20-2009 |
20090303626 | HOUSING STRUCTURE - A housing structure has a frame structure | 12-10-2009 |
20090316124 | Lithographic Apparatus, Device Manufacturing Method and Device Manufactured Thereby - The X, Y and Rz positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be coplanar with the pattern on the mask itself. Measurements of the table position in the other degrees of freedom can be measured with capacitive or optical height sensors. | 12-24-2009 |
20090324174 | DEVICE CONSISTING OF AT LEAST ONE OPTICAL ELEMENT - An optical assembly comprises at least one optical element movable in at least two degrees of freedom and at least one actuator for adjusting the least one optical element; at least one sensor for sensing the position of the at least one element in at least two degrees of freedom and is characterised in that the at least one sensor is located at least substantially diagonally opposite to the least one actuator. | 12-31-2009 |
20100014065 | METHOD FOR IMPROVING IMAGING PROPERTIES OF AN OPTICAL SYSTEM, AND SUCH AN OPTICAL SYSTEM - The disclosure relates to a method for improving optical properties of an optical system. The optical system has a plurality of optical elements for imaging a pattern onto a substrate that is arranged in an image plane of the optical system. The method includes detecting at least one time-dependent, at least partially reversible aberration of the optical system that is caused by heating of at least one of the optical elements. The method also includes at least partially correcting the aberration by replacing at least one optical element from the plurality of optical elements with at least one optical compensation element. The disclosure also relates to such an optical system with improved imaging properties. | 01-21-2010 |
20100039629 | METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument. | 02-18-2010 |
20100066990 | IMAGING DEVICE WITH EXCHANGEABLE DIAPHRAGMS AND METHOD THEREFOR - The disclosure concerns a method for exchangeable introduction and/or exchange of diaphragms in an imaging device, such as an EUV projection exposure system for microlithography or a corresponding imaging device with a housing and at least one diaphragm, which is accommodated exchangeably in the housing and at least one transfer device with at least one receptacle, on or at which the diaphragm can be detachably arranged in order that it may be moved in or out of the objective space. At least one receptacle of the transfer device, on or at which the diaphragm can be detachably arranged, is an element of the diaphragm mount for positioning the diaphragm in the housing. | 03-18-2010 |
20100134777 | DIAPHRAGM CHANGING DEVICE - The invention relates to an optical imaging device, in particular an objective | 06-03-2010 |
20100235127 | CALIBRATION OF A POSITION MEASURING DEVICE OF AN OPTICAL DEVICE - A method for calibrating a position measuring device of an optical device, including a measurement step in which a movable unit of the optical device is moved according to a predefinable scheme in at least one degree of freedom and a position of the movable unit is determined in the at least one degree of freedom. The position of the movable unit is determined in the at least one degree of freedom in a first measurement via a first measuring device of the position measuring device, and the position of the movable unit is determined in the at least one degree of freedom in a second measurement via a second measuring device of the position measuring device sing a reference element connected to the movable unit. In a calibration step, the first measuring device is calibrated using the results of the first measurement and the second measurement. An encoder system is used as the second measuring device. The reference element includes a reference grid of the encoder system. | 09-16-2010 |
20100271607 | OPTICAL ASSEMBLY - An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement. | 10-28-2010 |
20100284652 | COMPOSITE BODY - A composite body is joined together of at least two bodies ( | 11-11-2010 |
20110001949 | OPTICAL IMAGING ARRANGEMENT - There is provided an optical imaging arrangement comprising: a mask unit comprising a pattern, a substrate unit comprising a substrate, an optical projection unit comprising a group of optical element units, the optical projection unit being adapted to transfer an image of the pattern onto the substrate, a first imaging arrangement component, the first imaging arrangement component being a component of one of the optical element units, a second imaging arrangement component, the second imaging arrangement component being different from the first imaging arrangement component and being a component of one of the mask unit, the optical projection unit and the substrate unit, and a metrology arrangement. The metrology arrangement captures a spatial relationship between the first imaging arrangement component and the second imaging arrangement component. The metrology arrangement comprises a reference element, the reference element being mechanically connected directly to the first imaging arrangement component. | 01-06-2011 |
20110051110 | LENS COMPRISING A PLURALITY OF OPTICAL ELEMENT DISPOSED IN A HOUSING - The invention relates to a lens comprising several optical elements that are disposed in a lens housing. At least one sensor array encompassing at least one capacitive sensor unit and/or at least one inductive sensor unit is provided for determining the relative position between a first optical element and a second optical element or between a load-bearing structural element of the lens and a second optical element. | 03-03-2011 |
20110085239 | OPTICAL APPARATUS WITH ADJUSTABLE ACTION OF FORCE ON AN OPTICAL MODULE - The disclosure pertains to an optical apparatus, in particular for microlithography, that includes an optical module, a support structure and a connection apparatus. The connection apparatus includes at least one connection unit which includes a first connector part and a second connector part. The first connector part is connected to the optical module, and the second connector part is connected to the support structure. | 04-14-2011 |
20110181852 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing. | 07-28-2011 |
20110181857 | OPTICAL ASSEMBLY - An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement. | 07-28-2011 |
20110194091 | LOW-CONTAMINATION OPTICAL ARRANGEMENT - An optical arrangement has a plurality of optical elements capable of transmitting a beam. A partial housing is provided which extends from a surface of an optical element in the direction of the beam emanating from the optical element, or of the beam incident on the optical element, and whose shape is adapted to the shape of the beam. The partial housing is surrounded at least partially by a measurement structure which is mechanically decoupled therefrom. The measurement structure has at least one sensor. | 08-11-2011 |
20110216428 | HOUSING STRUCTURE - A housing structure has a frame structure | 09-08-2011 |
20110279799 | EUV Lithography Device and Method For Processing An Optical Element - An EUV lithography device including an illumination device for illuminating a mask at an illumination position in the EUV lithography device and a projection device for imaging a structure provided on the mask onto a light-sensitive substrate. The EUV lithography device has a processing device ( | 11-17-2011 |
20120075611 | DIAPHRAGM CHANGING DEVICE - The invention relates to an optical imaging device, in particular an objective | 03-29-2012 |
20120140328 | OPTICAL ELEMENT WITH LOW SURFACE FIGURE DEFORMATION - A reflective optical element includes a body with a first reflective surface of a high precision geometrical form, which can be used for reflecting light in a wavelength range less than 50 nm in an EUV-lithographic projection exposure system. The body includes first and a second non-reflecting surfaces. Further, the body includes a single connection area formed on the first non-reflecting surface with at least one fixation surface inside the connection area for fixing the entire optical element directly or indirectly to at least one bearing surface of a bearing element. The second non-reflecting surface is different from the single connection area formed on the first non-reflective surface. The second non-reflecting surface at least partly surrounds the single connection area. At least one stress relief recess is formed into the body. The stress relief recess at least partly separates the first non-reflective surface from the second non-reflecting surface. | 06-07-2012 |
20120154774 | Lithographic Apparatus and Device Manufacturing Method - Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s). | 06-21-2012 |
20120182533 | OPTICAL ARRANGEMENT AND MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS INCLUDING SAME - An optical arrangement includes at least one optical element and a support element for the optical element. The optical element and the support element are connected together by way of at least three decoupling elements. The decoupling elements are formed monolithically with the optical element and with the support element. | 07-19-2012 |
20120188523 | OPTICAL ARRANGEMENT IN A PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY - An optical arrangement includes a multiplicity of optical elements and a carrier structure which carries the optical elements. The carrier structure is composed of at least two releasably interconnected modules. Each module is composed of at least one carrier structure subelement. A subhousing is produced by a multiplicity of carrier structure subelements and/or modules. The subhousing has a geometry that varies, at least in regions, in correspondence to a usable beam path in the projection exposure apparatus, the usable beam path being defined as an envelope of all light bundles which can propagate from all field points in a field plane to an image plane of the projection exposure apparatus. A projection exposure apparatus for EUV lithography includes such an optical arrangement. | 07-26-2012 |
20120194793 | OPTICAL APPARATUS FOR USE IN PHOTOLITHOGRAPHY - An optical apparatus includes an interchange mechanism and an optical assembly of an illumination system or a projection objective. At least one of the plurality of optical elements of the optical assembly is selected from among a plurality of ones selectable from the interchange mechanism which facilitates exchange of one for another in the beam path. To reduce transmission of vibration from the interchange mechanism to the optical assembly, the interchange mechanism is mounted on a structure which is substantially dynamically decoupled from the housing, and a selected selectable optical element is located at an operating position at which it is separate from the interchange mechanism. | 08-02-2012 |
20120241268 | ARRANGEMENT FOR THE VIBRATION ISOLATION OF A PAY LOAD - The disclosure relates to arrangements and methods for vibration isolation of a payload from a body. An arrangement for vibration isolation of a payload from a body having vibrations includes a sensor for measuring vibrations, and an actuator for generating a compensation force on the payload, at least on the basis of the measurement of the sensor. At least one balancing mass is arranged in the reaction path of a reaction force associated with the compensation force, and the sensor is mounted on the body. | 09-27-2012 |
20120293784 | METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation. | 11-22-2012 |
20120327385 | OPTICAL SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY - Semiconductor lithography system includes a plurality of optical components, including an optical component movable a distance along a straight line within a time of between 5 ms and 500 ms. The straight line can have a polar and azimuth angle of between 0° and 90°, and a distance between the straight line and an optical axis of the apparatus being less than a cross-sectional dimension of a projection exposure beam bundle of the projection exposure apparatus. The apparatus can also include a guide unit configured to guide the optical component. The apparatus can further include a drive unit configured to drive the optical component via drive forces so that torques generated by inertial forces of the optical component and of optional components concomitantly moved with the optical component, and the torques generated by the drive forces, which act on the guide unit, compensate for one another to less than 10%. | 12-27-2012 |
20130141707 | EUV Exposure Apparatus - A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K. | 06-06-2013 |
20140176927 | OPTICAL IMAGING ARRANGEMENT WITH INDIVIDUALLY ACTIVELY SUPPORTED COMPONENTS - An optical imaging arrangement includes an optical projection unit and a control device. The optical projection unit includes a support structure and a group of optical element units adapted to transfer, in an exposure process using exposure light along an exposure light path, an image of a pattern of a mask unit onto a substrate of a substrate unit. The group of optical element units includes a first optical element unit and a plurality of second optical element units, the first optical element unit and the second optical element units, under a control by the control device, being actively supported by the support structure. | 06-26-2014 |
20140185029 | OPTICAL IMAGING ARRANGEMENT WITH VIBRATION DECOUPLED SUPPORT UNITS - An optical imaging arrangement includes an optical projection system and a support structure system. The optical projection system includes a group of optical elements configured to transfer, in an exposure process using exposure light along an exposure light path, an image of a pattern of a mask supported by a mask support structure onto a substrate supported by a substrate support structure. The mask support structure and the substrate support structure form a primary source of vibration. The support structure system includes a base support structure, an optical element support structure and at least one secondary vibration source support structure of a secondary vibration source other than the primary source of vibration. The optical element support structure supports the optical elements. | 07-03-2014 |
20140204354 | METHOD FOR CONTROLLING A MOTION OF OPTICAL ELEMENTS IN LITHOGRAPHY SYSTEMS - A method for controlling a vibrating optical element of a lithographic system the optical element having a predetermined number of degrees of freedom comprises: detecting a number of displacements of the optical element, each displacement corresponding to a degree of freedom, wherein the number of detected displacements is larger than the number of degrees of freedom; for each displacement according to a degree of freedom, generating a sensor signal corresponding to a movement in a degree of freedom; wherein the optical element moves as a function of a rigid body transformation matrix, the optical element movement including a first type of movement and a second type of movement; and modifying the sensor signals as a function of a modified transformation matrix, wherein the modified transformation matrix at least partially reduces at least one eigen mode or resonance of one of the first type of movements or the second type of movements. | 07-24-2014 |
20140233006 | METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation. | 08-21-2014 |
20140254036 | OPTICAL MODULE FOR AN OBJECTIVE - Disclosed is an optical module for a lens, especially a microlithographic apparatus, comprising a first holding device with an inner circumference that extends in a first circumferential direction, and at least one first supporting device which is fastened to the inner circumference of said first holding device and is used for supporting a first optical element, an annular circumferential first assembly space being defined by displacing the first supporting device once in a revolving manner along the first circumferential direction. At least one second supporting device which is fixed to the inner circumference of the first holding device is provided for supporting a second optical element, an annular circumferential second assembly space being defined by displacing the second supporting device once in a revolving manner along the first circumferential direction. The first assembly space intersects the second assembly space. | 09-11-2014 |
20140268381 | OPTICAL MODULE FOR A MICROLITHOGRAPHY OBJECTIVE HOLDING AND SUPPORTING DEVICES - Disclosed is an optical module for a lens, especially a microlithographic apparatus, comprising a first holding device with an inner circumference that extends in a first circumferential direction, and at least one first supporting device which is fastened to the inner circumference of said first holding device and is used for supporting a first optical element, an annular circumferential first assembly space being defined by displacing the first supporting device once in a revolving manner along the first circumferential direction. At least one second supporting device which is fixed to the inner circumference of the first holding device is provided for supporting a second optical element, an annular circumferential second assembly space being defined by displacing the second supporting device once in a revolving manner along the first circumferential direction. The first assembly space intersects the second assembly space. | 09-18-2014 |
20140293253 | LENS COMPRISING A PLURALITY OF OPTICAL ELEMENT DISPOSED IN A HOUSING - The invention relates to a lens comprising several optical elements that are disposed in a lens housing. At least one sensor array encompassing at least one capacitive sensor unit and/or at least one inductive sensor unit is provided for determining the relative position between a first optical element and a second optical element or between a load-bearing structural element of the lens and a second optical element. | 10-02-2014 |
20140333912 | MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing. | 11-13-2014 |
20150062596 | OPTICAL IMAGING ARRANGEMENT WITH MULTIPLE METROLOGY SUPPORT UNITS - An optical imaging arrangement includes an optical projection system and a support structure system. The optical projection system includes a group of optical elements configured to transfer, in an exposure process using exposure light along an exposure light path, an image of a pattern of a mask onto a substrate. The support structure system includes an optical element support structure and a metrology support structure. The optical element support structure supports the group of optical elements, while the metrology support structure supports a group of metrology devices associated with the group of optical elements and configured to capture status information representative of at least one of a position and an orientation of each of the optical elements in at least one degree of freedom up to all six degrees of freedom. | 03-05-2015 |