Yücel
Yücel Kök, Veldhoven NL
Patent application number | Description | Published |
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20090316121 | LITHOGRAPHIC APPARATUS AND METHOD - A lithographic apparatus of the immersion type is disclosed. In the apparatus, a plurality of heating and/or cooling devices are provided in the vicinity of the final element of the projection system, e.g. in a barrier member of a liquid handling system. The heating and/or cooling devices can be used, for example, to control temperature gradients in the final element of the projection system to control aberrations therein. | 12-24-2009 |
20100245791 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally. | 09-30-2010 |
Yücel Kök, Veldhoven NL
Patent application number | Description | Published |
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20100245791 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally. | 09-30-2010 |
Yücel Önal, Erlenbach DE
Patent application number | Description | Published |
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20110189072 | PROCESS FOR PREPARING HIGHER HYDRIDOSILANES - Process for preparing higher hydridosilanes of the general formula H—(SiH | 08-04-2011 |
Yücel Önal, Carl Junction, MO US
Patent application number | Description | Published |
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20130224098 | USE OF A REACTOR WITH INTEGRATED HEAT EXCHANGER IN A PROCESS FOR HYDRODECHLORINATING SILICON TETRACHLORIDE - The invention relates to a method for converting silicon tetrachloride by means of hydrogen to form trichlorosilane in a modified hydrodechlorination reactor. The invention further relates to a the use of such a modified hydrodechlorination reactor as an integrated component of a system for producing trichlorosilane from metallurgical silicon. | 08-29-2013 |