Patent application number | Description | Published |
20110239824 | METHOD FOR RECOVERING METAL FROM TARGET AND METHOD FOR MANUFACTURING TARGET - A target consisting essentially of a CoCrPt-based metal or a CoCrPtRu-based metal, and one or more metal oxides selected from the group consisting of SiO | 10-06-2011 |
20110243784 | METHOD FOR RECOVERING METAL FROM TARGET AND METHOD FOR MANUFACTURING TARGET - In the method for recovering a metal from a target that contains a metal and a metal oxide, the target contains a sintered body of the metal oxide after being heated under a condition of melting the metal without melting or decomposing the metal oxide. The target is heated in an upper crucible of a two-level crucible that includes the upper crucible with a through hole-formed in a bottom surface thereof, and a lower crucible disposed below the through hole, the size of the through hole being set such that it does not allow the sintered body of the metal oxide contained in the target to pass therethrough, and the melted metal is caused to flow into the lower crucible, so that the metal is separated from the metal oxide. | 10-06-2011 |
20130175166 | MAGNETRON SPUTTERING TARGET AND PROCESS FOR PRODUCING THE SAME - A magnetron sputtering target containing a ferromagnetic metal element includes a magnetic phase containing the ferromagnetic metal element; a plurality of non-magnetic phases containing the ferromagnetic metal element, the plurality of non-magnetic phases containing a different constituent element from each other or containing constituent elements at different ratios from each other; and an oxide phase. Regions of the magnetic phase and the plurality of non-magnetic phases are separated from each other by the oxide phase. | 07-11-2013 |
20140021043 | FEPT-C-BASED SPUTTERING TARGET AND PROCESS FOR PRODUCING THE SAME - An FePt—C-based sputtering target contains Fe, Pt, and C and has a structure in which an FePt-based alloy phase and a C phase containing unavoidable impurities are mutually dispersed, the FePt-based alloy phase containing Pt in an amount of 40 at % or more and 60 at % or less with the balance being Fe and unavoidable impurities. The content of C is 21 at % or more and 70 at % or less based on the total amount of the target. | 01-23-2014 |
20140301887 | FEPT-C-BASED SPUTTERING TARGET AND PROCESS FOR PRODUCING THE SAME - An FePt—C-based sputtering target contains Fe, Pt, and C and has a structure in which an FePt-based alloy phase and a C phase containing unavoidable impurities are mutually dispersed, the FePt-based alloy phase containing Pt in an amount of 40 at % or more and 60 at % or less with the balance being Fe and unavoidable impurities. The content of C is 21 at % or more and 70 at % or less based on the total amount of the target. | 10-09-2014 |
20140306144 | MAGNETRON SPUTTERING TARGET AND PROCESS FOR PRODUCING THE SAME - A process for producing a magnetron sputtering target includes: mixing and dispersing an oxide powder and a magnetic metal powder, the magnetic metal powder containing a ferromagnetic metal element, to obtain a magnetic powder mixture; mixing and dispersing an oxide powder and each of a plurality of non-magnetic metal powders, the plurality of non-magnetic metal powders containing the ferromagnetic metal element, the plurality of non-magnetic metal powders containing a different constituent element from each other or containing constituent elements at different ratios from each other, to obtain a plurality of non-magnetic powder mixtures; and mixing and dispersing the magnetic powder mixture and the plurality of non-magnetic powder mixtures to obtain a powder mixture for pressure sintering. | 10-16-2014 |
20140311901 | MAGNETRON SPUTTERING TARGET AND METHOD FOR MANUFACTURING THE SAME - Provided is a magnetron sputtering target having a ferromagnetic metal element. This magnetron sputtering target includes: a magnetic phase containing the ferromagnetic metal element; a plurality of non-magnetic phases that each contain the ferromagnetic metal element and that are different in constituent elements or a content ratio of constituent elements; and an oxide phase. At least one of the plurality of non-magnetic phases is more finely interdispersed with the oxide phase than the magnetic phase. | 10-23-2014 |
20140318954 | FEPT-BASED SPUTTERING TARGET - An FePt-based sputtering target has a structure in which an FePt-based alloy phase, a C phase containing unavoidable impurities, and a metal oxide phase containing unavoidable impurities are mutually dispersed, the FePt-based alloy phase containing Pt in an amount of 40 at % or more and 60 at % or less with the balance being Fe and unavoidable impurities, wherein C is contained in an amount of more than 0 vol % and 20 vol % or less based on the total amount of the target, the metal oxide is contained in an amount of 10 vol % or more and less than 40 vol % based on the total amount of the target, and the total content of C and the metal oxide is 20 vol % or more and 40 vol % or less based on the total amount of the target. | 10-30-2014 |
20140318955 | FEPT-BASED SPUTTERING TARGET - An FePt-based sputtering target contains Fe, Pt, and a metal oxide, and further contains one or more kinds of metal elements other than Fe and Pt, wherein the FePt-based sputtering target has a structure in which an FePt-based alloy phase and a metal oxide phase containing unavoidable impurities are mutually dispersed, the FePt-based alloy phase containing Pt in an amount of 40 at % or more and less than 60 at % and the one or more kinds of metal elements in an amount of more than 0 at % and 20 at % or less with the balance being Fe and unavoidable impurities and with the total amount of Pt and the one or more kinds of metal elements being 60 at % or less, and wherein the metal oxide is contained in an amount of 20 vol % or more and 40 vol % or less based on the total amount of the target. | 10-30-2014 |
20140322062 | PROCESS FOR PRODUCING FEPT-BASED SPUTTERING TARGET - A process for producing an FePt-based sputtering target includes adding C powder containing unavoidable impurities and metal oxide powder containing unavoidable impurities to FePt-based alloy powder containing Pt in an amount of 40 at % or more and 60 at % or less with the balance being Fe and unavoidable impurities so that the C powder and the metal oxide powder are contained to satisfy: | 10-30-2014 |
20140322063 | PROCESS FOR PRODUCING FEPT-BASED SPUTTERING TARGET - A process for producing an FePt-based sputtering target includes adding metal oxide powder containing unavoidable impurities to FePt-based alloy powder containing Pt in an amount of 40 at % or more and less than 60 at % and one or more kinds of metal elements other than Fe and Pt in an amount of more than 0 at % and 20 at % or less with the balance being Fe and unavoidable impurities and with a total amount of Pt and the one or more kinds of metal elements being 60 at % or less so that the metal oxide powder accounts for 20 vol % or more and 40 vol % or less of a total amount of the FePt-based alloy powder and the metal oxide powder, followed by mixing the FePt-based alloy powder and the metal oxide powder to produce a powder mixture. | 10-30-2014 |
Patent application number | Description | Published |
20120261651 | ORGANIC ELECTROLUMINESCENT ELEMENT AND NOVEL ALCOHOL-SOLUBLE PHOSPHORESCENT MATERIAL - Object of the present invention is to provide an organic electroluminescent element having an emissive layer that may be formed by wet process in the fabrication of the organic electroluminescence device with multi-layer structure and has excellent electron-injection property, electron-transfer property, durability and luminescent efficiency and a novel alcohol-soluble organic phosphorescent material that may be preferably applicable to the fabrication of the same. An organic electroluminescent element | 10-18-2012 |
20130092918 | ORGANIC EL ELEMENT AND METHOD FOR PRODUCING SAME - The present invention is to provide a method of favorably forming an organic EL device with the inverted structure by the wet process. On that account, an organic EL device includes a cathode, an electron injection layer, a light emitting layer, a hole transport layer, a hole injection layer, an anode are formed in this order on a substrate. The electron injection layer is formed by applying ink between banks and drying the ink. The ink is formed by dissolving a polymer compound having an organic phosphine oxide skeleton in an alcohol solvent. The light emitting layer is formed by applying ink between components of the bank and the drying the ink. The ink is formed by dissolving material for light emitting layer such as polyphenylene vinylene (PPV) derivative or polyfluorene derivative in a nonpolar solvent. | 04-18-2013 |
20130295706 | Organic Electroluminescent Element and Manufacturing Method Thereof, and Phosphorus-Containing Organic Compound and Manufacturing Method Thereof - An organic electroluminescent element comprising an anode, a cathode and a plurality of organic compound layers sandwiched between the anode and cathode, the organic compound layers including: a hole-transporting layer made of an organic compound insoluble in alcohols; and an electron-transporting layer formed on the hole-transporting layer by a wet method, the electron-transporting layer being made of a phosphorus-containing organic compound soluble in the alcohols. | 11-07-2013 |