Patent application number | Description | Published |
20090219499 | SURFACE SHAPE MEASURING APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - A surface shape measuring apparatus includes an illumination system and a light receiving system. The illumination system splits wide-band light from a light source into measurement light and reference light, illuminates the measurement light to obliquely enter a surface of the film, and illuminates the reference light to obliquely enter a reference mirror. The light receiving system combines the measurement light reflected by the surface of the film and the reference light reflected by the reference mirror with each other and introduces the combined light to a photoelectric conversion element. An incident angle of the measurement light upon the surface of the film and an incident angle of the reference light upon the reference mirror are each larger than the Brewster's angle. S-polarized light and p-polarized light included in the measurement light entering a surface of the substrate have equal intensity on the photoelectric conversion element. | 09-03-2009 |
20110141451 | DISPLACEMENT MEASUREMENT DEVICE, EXPOSURE APPARATUS, AND WORKING DEVICE - A device has a scale on which a grating pattern is formed, a light source to irradiate light on the scale, a wavelength plate to transform multiple diffracted lights from the light source into circular polarized light, respectively, an optical element to superposition and cause interference of the multiple diffracted lights, and a photodetector to receive the interfered light. Also, a generating unit to generate linearly polarized light by the light from the light source, so that the multiple diffracted lights input to the wavelength plate become linearly polarized light with a same mutual polarization direction. | 06-16-2011 |
20110176139 | MEASURING APPARATUS AND EXPOSURE DEVICE - An apparatus includes a system configured to split a light emitted from a light source into reference light and subject light, cause the subject light to enter into an object, and combine the subject light reflected by the object with the reference light, a detection unit configured to detect coherent light between the combined subject and reference lights, an element, provided within a light path of the reference light or the subject light, configured to change a path length difference between the reference light and the subject light and a relative position between the reference light and the subject light in a light receiving surface of the detection unit, and a position-variable mechanism configured to cause a position of the optical element to be changeable, wherein, by changing a position of the element, the optical path length difference and the relative position are independently adjusted. | 07-21-2011 |
20110253892 | ELECTRON-BEAM EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE - An electron-beam exposure apparatus includes a first measurement device which irradiates a mark formed on a substrate with light to detect reflected light of the light, thereby measuring the position of the mark, a second measurement device which detects a secondary electron generated by the electron beam guided from an electron source onto the mark, thereby measuring the position of the mark, and a controller. The controller performs measurements for the mark using the first and second measurement devices without interposing drawing of a pattern on the substrate with the electron beam between the measurements, calculates a shift in irradiated point of the electron beam based on the difference between the measurement results obtained by the first and second measurement devices, and controls at least one of a stage and the electron optical system to correct the calculated shift. | 10-20-2011 |
20120164583 | DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE - A drawing apparatus performs drawing on a substrate with a plurality of charged particle beams. The apparatus comprises a stage configured to hold the substrate and to be moved; a projection system configured to project the plurality of charged particle beams onto the substrate; a measurement device configured to detect a charged particle beam that reaches the measurement device due to a charged particle beam incident, via the projection system, on a mark formed on the substrate, to measure a position of the mark; and a controller. The controller is configured to control operations of the projection system and the measurement device so that the position of the mark is measured with at least one of the plurality of charged particle beams, in parallel with drawing on the substrate with a part of the plurality of charged particle beams. | 06-28-2012 |
20130021588 | MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE - A measurement apparatus includes a beam splitter that splits light from a light source into measurement light to be directed to an object to be measured and reference light to be directed to a reference surface, a beam combiner that combines the measurement light reflected by the object and the reference light reflected by the reference surface to generate combined light, and obtains physical information of the object based on the combined light. The measurement apparatus further includes a coherence controller which changes spatial coherences of the measurement light and the reference light. | 01-24-2013 |
20130107279 | OPTICAL APPARATUS, POSITION DETECTION APPARATUS, MICROSCOPE APPARATUS, AND EXPOSURE APPARATUS | 05-02-2013 |
20130168569 | DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides a drawing apparatus which performs drawing on a substrate with a plurality of charged particle beams, the apparatus including a stage configured to hold the substrate and to be moved, a charged particle optical system including a deflector configured to deflect the plurality of charged particle beams, a detector configured to detect a charged particle arrived thereat by causing a charged particle beam to impinge on a mark including a plurality of mark elements formed on one of the substrate and the stage, and a processor configured to perform a process of obtaining a position of the mark. | 07-04-2013 |
20130171570 | DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides a drawing apparatus including a stage having a reference mark, and configured to hold a substrate and to be moved, a charged particle optical system, a first measuring device having an optical axis spaced apart from an axis of the charged particle optical system by a first distance and configured to measure a position of an alignment mark formed on the substrate, a second measuring device having an optical axis spaced apart from the axis of the charged particle optical system by a second distance and configured to measure a position of the reference mark, and a processor configured to obtain a baseline of the first measuring device based on positions of the reference mark respectively measured by the first measuring device and the second measuring device. | 07-04-2013 |
20130216954 | DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - A drawing apparatus, which draws a pattern on a substrate with a plurality of charged particle beams, includes: a charged particle optical system configured to emit the plurality of charged particle beams onto the substrate; and a controller configured to control an operation of the charged particle optical system. The controller is configured to control the operation so as to compensate for a distortion of the pattern that is determined based on first data of an undulation of a surface of the substrate and second data of an inclination of each of the plurality of charged particle beams with respect to an axis of the charged particle optical system. | 08-22-2013 |
20130230805 | DRAWING APPARATUS, REFERENCE MEMBER, AND METHOD OF MANUFACTURING ARTICLE - A drawing apparatus includes a charged particle optical system, a first measurement device including an image taking optical system and configured to measure a position of a reference mark in a first direction, a second measurement device configured to measure a position of the reference mark in the first direction based on an amount of charged particle beams that arrives thereat from the reference mark on which the charged particle beam are incident. The reference mark includes a first region having a first edge inclined with respect to a second direction perpendicular to the first direction and a second region having a second edge parallel to the second direction. A processor obtains a baseline based on measurement result with respect to the first region obtained by the first measurement device and measurement result with respect to the second region obtained by the second measurement device. | 09-05-2013 |
20130258095 | OPTICAL APPARATUS, MEASURING APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides an optical apparatus which detects an image of a mark on a substrate, the apparatus including an optical system configured to form an image of the mark, a detector configured to detect the image, wherein the optical system includes an aperture stop, an aperture, corresponding to a first field of view and a second field of view of the detector, being formed in the aperture stop, a light-shielding member, and a driving mechanism configured to position the light-shielding member so that one of the first field of view and the second field of view is valid, and a part of the other is invalid. | 10-03-2013 |
20130265575 | DETECTION APPARATUS, LITHOGRAPHY APPARATUS, CHARGED PARTICLE BEAM APPARATUS, AND ARTICLE MANUFACTURING METHOD - A detection apparatus includes an optical system including a polarization beam splitter and a quarter-wave plate. The optical system illuminates a mark via the polarization beam splitter and the quarter-wave plate in sequence, and directs light reflected from the mark via the quarter-wave plate and the polarization beam splitter in sequence towards a light-receiving element An airtight container configured to enclose therein at least part of the optical system includes, as a partition wall thereof, a light transmitting member arranged in an optical path between the polarization beam splitter and the quarter-wave plate. | 10-10-2013 |
20140107984 | GENERATION METHOD, DESIGN METHOD, MANUFACTURING METHOD OF OPTICAL SYSTEM, AND STORAGE MEDIUM - The present invention provides a generation method of generating, by a computer, initial data to be used when designing an optical system in which a plurality of lenses are arranged in an optical axis direction, wherein in an optical system model in which a thickness of each lens and intervals between the plurality of lenses are set to 0, letting m be the number of lenses, r | 04-17-2014 |
20140204357 | DETECTION APPARATUS, MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides a detection apparatus including a detector configured to detect a mark including a plurality of patterns arrayed on an object in a first direction, the apparatus comprising a support configured to support at least a part of the detector, wherein the support is configured to support the at least the part such that a displacement of the at least the part in a second direction corresponding to the first direction is smaller than a displacement of the at least the part in a third direction perpendicular to the second direction. | 07-24-2014 |
20140320836 | LITHOGRAPHY APPARATUS, LITHOGRAPHY METHOD, AND METHOD FOR MANUFACTURING DEVICE - An apparatus includes an optical system configured to irradiate a surface of a substrate with a beam, a control unit configured to control a position of the irradiation of the beam, and a first measurement unit and a second measurement unit each configured to measure a position of a mark formed on the substrate. The second measurement unit is placed at a position closer to an optical axis of the optical system than the first measurement unit is. Based on a position measurement value measured by the first measurement unit and position measurement values measured at different timings by the second measurement unit, the control unit controls the position of the beam irradiated to the substrate. The position measurement values measured at the different timings are values obtained from the same mark or values obtained from two marks adjacent to a common shot area. | 10-30-2014 |
20140322655 | STAGE APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - A stage apparatus includes first, second, third, and fourth stages arranged along a plane defined by first and second axes orthogonal to each other, each of the first to fourth stages holding an article and being subjected to scanning along the plane, and a controller configured to control the scanning of the first to fourth stages in synchronization such that a pair of the first and second stages and a pair of the third and fourth stages are respectively positioned symmetrically to each other with respect to the first axis and a pair of the first and third stages and a pair of the second and fourth stages are respectively positioned symmetrically to each other with respect to the second axis. | 10-30-2014 |
20140322833 | IRRADIATION APPARATUS FOR IRRADIATING CHARGED PARTICLE BEAM, METHOD FOR IRRADIATION OF CHARGED PARTICLE BEAM, AND METHOD FOR MANUFACTURING ARTICLE - An apparatus includes an optical system configured to irradiate a substrate with a charged particle beam, a control unit configured to control an irradiation position of the charged particle beam, and a first measurement unit and a second measurement unit each configured to measure a surface position of the substrate. The first measurement unit and the second measurement unit have different characteristics in terms of charging. The control unit controls the irradiation position of the charged particle beam based on values measured by the first measurement unit and the second measurement unit. | 10-30-2014 |
20140377891 | CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND METHODS RELATED THERETO - A charged particle beam irradiation apparatus, which irradiates a substrate with a charged particle beam, includes a capacitance sensor and an optical sensor configured to measure a surface position of the substrate, a storage unit configured to store respective measurement values of the surface position of the substrate measured by the optical sensor and the capacitance sensor, and a calculation unit configured to obtain surface position data of the substrate, in which the calculation unit obtains a correction amount by using respective measurement values of the surface position measured by the capacitance sensor and the optical sensor in a region within a scribe line formed on the substrate, which are stored in the stored unit, and applies the correction amount to the measurement value of the surface position measured by the capacitance sensor, to obtain the surface position data of the substrate. | 12-25-2014 |
20150022796 | INTERFEROMETER, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - An interferometer includes: an optical system configured to generate interfering light by dividing light from a light source, and combining reference light and measurement light; a detector configured to detect the interfering light generated by the optical system; and an optical member configured to give spatial coherence to the light from the light source before the detector detects the light from the light source. The optical member gives higher spatial coherence in a second direction serving as a direction of a line of intersection of a cross section of a beam of the light incident on the optical member, and a plane including optical paths of the light from the light source before being divided by the optical system, the reference light, the measurement light, and the interfering light, than in a first direction perpendicular to the plane. | 01-22-2015 |
20150185623 | OPTICAL DEVICE, LITHOGRAPHY APPARATUS AND MANUFACTURING METHOD OF ARTICLE - An optical device provided with an optical system illuminating light on a target surface, including: three light sources configured to emit light beams of different wavelengths; a first fiber configured to guide, to the optical system, two light beams among the three light beams from the three light sources; and a second fiber configured to guide, to the optical system, the light beam of a wavelength other than the two light beams. A cutoff wavelength of the first fiber differs from a cutoff wavelength of the second fiber. | 07-02-2015 |
20150331331 | DETECTION APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD - Provided is a detection apparatus that detects a mark with a periodic structure and includes an illumination optical system configured to irradiate light on the mark; a light receiving optical system configured to receive a diffracted light from the mark when a relative position between the illumination optical system and the mark is changed in the measurement direction; and a photodetector configured to detect the diffracted light from the light receiving optical system. Here, a numerical aperture of the light receiving optical system in the measurement direction is larger than a numerical aperture of the light receiving optical system in the non-measurement direction in the plane on which the mark is formed. | 11-19-2015 |
Patent application number | Description | Published |
20120134727 | Image Forming Apparatus - An image forming apparatus is provided which includes a main body, and a belt unit removable from the main body. The belt unit includes a belt extending between a drive roller and a driven roller and configured to rotate such that a recording medium is fed in a feeding direction. The apparatus further includes a feeding device that feeds the recording medium to the belt, and a positioning section including an engaging portion and an engaged portion, the positioning section being configured to position the belt unit when the engaging portion engages the engaged portion. Also, an urging member is provided that urges the belt unit and causes a pressing force to be applied between the engaging portion and the engaged portion. An urging direction of the urging member has a component in the feeding direction. | 05-31-2012 |
20130315624 | Image Forming Apparatus - An image forming apparatus including an image forming unit; a belt unit with a first roller, a second roller, an endless belt, and a frame; a frame positioning member arranged in the belt unit to define a position of the frame in the axial direction with respect to a body; a first roller positioning member arranged in the belt unit to define a position of the first roller in the axial direction with respect to the frame; a guiding member arranged in a position corresponding to one of axial-end sides of the first roller along the axial direction in the endless belt; and an engageable member arranged on the one of axial-end sides of the first roller in the belt unit, is provided. The frame positioning member, the first roller positioning member, and the engageable member are arranged on the same axial-end side along the axial direction. | 11-28-2013 |
20130343794 | Belt Unit and Image Forming Apparatus - A belt unit, including an endless belt, a first roller, a second roller, and a guiding member, is provided. The endless belt includes a belt strip and a guided section protruding from an inner circumferential surface of the belt strip. The guiding member with a groove is arranged on one of axial-end sides of the first roller coaxially with the first roller. The guided section of the endless belt is set in the groove. The groove includes a first face and a second face facing each other along a direction in parallel with a central axis of the first roller. The guiding member includes a first piece containing the first face and a second piece containing the second face. The first face protrudes outwardly with respect to the inner circumferential surface of the belt strip. | 12-26-2013 |
20140001013 | Belt Unit and Image Forming Apparatus | 01-02-2014 |
20150274457 | BELT CONVEYING DEVICE PROVIDED WITH ROTATABLE ASSEMBLY AND FRAME FOR SKEW CORRECTION OF BELT - A belt conveying device includes: a first roller; a second roller; a belt; a rotatable assembly; and a frame. The first roller has an axis extending in an axial direction. The first roller has a first end portion on a first side in the axial direction and a second end portion on a second side opposite to the first side in the axial direction. The belt is configured to be looped taut around the first roller and the second roller. The rotatable assembly has a first gear and is provided at the first end portion. The rotatable assembly is configured to provide a first position to engage with the first roller and to rotate and a second position to be disengaged from the first roller. The frame has a second gear arranged in a prescribed direction. The second gear engages with the first gear. | 10-01-2015 |
20160004210 | Image-Forming Apparatus Having Structure for Stably Supporting Belt Unit - An image-forming apparatus includes a main body, a belt unit detachably attachable to the main body, a coupling and a first restricting part. The belt unit includes: a first roller defining an axis extending in an axial direction, a second roller opposing the first roller other in a first direction perpendicular to the axial direction, and a belt looped over the first roller and the second roller. The coupling is configured to move in the axial direction to come into engagement with the first roller for inputting a drive force into the first roller. The first restricting part is provided on the main body and is configured to restrict the first roller from moving in a second direction perpendicular to the axial direction and the first direction when the belt unit is attached to the main body. | 01-07-2016 |
20160061295 | Image Forming Apparatus - An image forming apparatus including a driving source, a planetary gear mechanism including first, second and third elements, a rotation restraint member configured to switch the planetary gear mechanism between a locked state where rotation of the second element is locked and a released state where the second element is capable of rotating, and a switching mechanism configured to switch the planetary gear mechanism between a first state where any two elements of the first, second and third elements are separated and a second state where the two elements are coupled, wherein the third element is configured to rotate in a first direction when the planetary gear mechanism is in the locked state and first state and to rotate in a second direction opposite to the first direction when the planetary gear mechanism is in the released state and second state. | 03-03-2016 |
20160091857 | Image-Forming Apparatus Provided with Interlocking Mechanism for Inputting Drive Force to Drive Roller of Belt Unit - An image-forming apparatus includes a main body, a drive source, an image forming section, a coupling and an interlocking mechanism. The image forming section includes a trigger part and a belt unit including: a belt; and a drive roller and a follow roller opposing each other in a first direction perpendicular to an axial direction of the drive roller. The belt is stretched over the drive roller and the follow roller to extend in the first direction. The coupling includes a movable part movable between a transmitting position transmitting a drive force from the drive source to the drive roller and an interrupting position interrupting transmission of the drive force from the drive source to the drive roller. The interlocking mechanism is configured to interlock movement of the movable part between the transmitting position and the interrupting position with movement of the trigger part. | 03-31-2016 |