Patent application number | Description | Published |
20110044147 | WRITEALE OPTICAL RECORDING OF MULTI-LEVEL ORIENTED NANO-STRUCTURE DISCS - A method of performing writable optical recording of a medium to form multilevel oriented nano-structures therein, comprises steps of providing a disc-shaped, writable recording medium having a planar surface; and encoding data/information in the medium by forming a plurality of multilevel nano-structured pits in the surface by scanning with a focused spot of optical energy to form at least one data track therein, including scanning the optical spot in a cross-track direction while rotating the disc about a central axis. | 02-24-2011 |
20120080402 | PLANARIZATION METHOD FOR MEDIA - A planarization process may planarize a media disk that has data trenches between data features and larger servo trenches between servo features. A filler material layer is deposited on the media disk and provides step coverage of the trenches. The filler material has data recesses over the data trenches and servo recesses over the servo trenches that must be removed to produce a planar media surface. A first planarization process is used to remove the data recesses and a second planarization process is used to remove the servo recesses. | 04-05-2012 |
20120196094 | HYBRID-GUIDED BLOCK COPOLYMER ASSEMBLY - A method for nano-patterning includes imprinting features in a resist with an imprint mold to form one or more topographic surface patterns on the imprinted resist. A a block copolymer (“BCP”) material is deposited on the imprinted resist, wherein a molecular dimension L | 08-02-2012 |
20120274371 | METHOD FOR ENCODER FREQUENCY SHIFT COMPENSATION - The embodiments disclose a method for encoder frequency-shift compensation, including, determining frequency values of an input encoder signal, analyzing an encoder index clock signal and the input encoder signal to determine values of frequency-shifts and compensating for the values of the frequency-shifts to generate a frequency-shift compensated clock. | 11-01-2012 |
20130004736 | METHOD OF PROTECTING PATTERNED MAGNETIC MATERIALS OF A STACK - The embodiments disclose a method of protecting patterned magnetic materials of a stack, including depositing a thin continuous film of an inert material that is inert to the magnetic materials of a patterned stack upon which the thin continuous film is being deposited and forming a thin interim interface layer from the thin continuous film to protect top and sidewall areas of non-etched higher relief magnetic islands and magnetic film etched surfaces of the patterned stack from air exposure damage and damage from contact with backfilled materials. | 01-03-2013 |
20130070370 | Planarization Method for Media - A planarization process may planarize a media disk that has data trenches between data features and larger servo trenches between servo features. A filler material layer is deposited on the media disk and provides step coverage of the trenches. The filler material has data recesses over the data trenches and servo recesses over the servo trenches that must be removed to produce a planar media surface. A first planarization process is used to remove the data recesses and a second planarization process is used to remove the servo recesses. | 03-21-2013 |
20130169315 | METHOD FOR ENCODER FREQUENCY-SHIFT COMPENSATION - A method for encoder frequency-shift compensation includes determining frequency values of an input encoder signal, determining repeatable frequency-shifts of the frequency values and generating a frequency-shift compensated clock using the repeatable frequency-shifts. A frequency-shift compensated clock includes a synthesizer configured to generate a frequency-shift compensated clock signal using repeatable frequency shifts and encoder clock signals. | 07-04-2013 |
20140175051 | METHOD OF MAGNETIC MEIDA MANUFACTURING - The embodiments disclose a method of creating a mask by depositing a protection layer that mechanically strengthens patterned features that are imprinted into a resist layer that is deposited onto a magnetic layer, implanting mechanically strengthened patterned resist layer features into the magnetic layer using ion implantation and removing the resist layer and the mask to expose at least a portion of the magnetic layer. | 06-26-2014 |
20140193538 | Dual-imprint pattern for apparatus - Provided herein is an apparatus, including an imprint template including a dual-imprint pattern, wherein the dual-imprint pattern is characteristic of imprinting a first pattern on the template with a first template and a second pattern on the template with a second template, and wherein the first pattern and the second pattern at least partially overlap to form the dual-imprint pattern. | 07-10-2014 |
20140308439 | METHOD OF PROTECTING PATIERNED MAGNETIC MATERIALS OF A STACK - The embodiments disclose a method of protecting patterned magnetic materials of a stack, including depositing a thin continuous film of an inert material that is inert to the magnetic materials of a patterned stack upon which the thin continuous film is being deposited and forming a thin interim interface layer from the thin continuous film to protect top and sidewall areas of non-etched higher relief magnetic islands and magnetic film etched surfaces of the patterned stack from air exposure damage and damage from contact with backfilled materials. | 10-16-2014 |
20140370331 | METHOD OF FABRICATING ION IMPLANTATION MAGNETICALLY AND THERMALLY ISOLATED BITS IN HAMR BPM STACKS - The embodiments disclose a continuous thin film magnetic layer and a patterned hard mask layer configured to be deposited onto the continuous thin film magnetic layer and to have plural ion implantations, wherein the ion implantations are configured to create chemically and structurally altered localized magnetic regions unprotected by the patterned hard mask layer. | 12-18-2014 |
20150016774 | METHOD FOR REGULATING PATTERNED PLASMONIC UNDERLAYER - The embodiments disclose a stack feature of a stack configured to confine optical fields within and to a patterned plasmonic underlayer in the stack configured to guide light from a light source to regulate optical coupling. | 01-15-2015 |
20150017482 | METHOD FOR FABRICATING PLASMONIC CLADDING - The embodiments disclose a plasmonic cladding structure including at least one conformal plasmonic cladding structure wrapped around plural stack features of a recording device, wherein the conformal plasmonic cladding structure is configured to create a near-field transducer in close proximity to a recording head of the recording device, at least one conformal plasmonic cladding structure with substantially removed top surfaces of the stack features with exposed magnetic layer materials and a thermally insulating filler configured to be located between the stack features. | 01-15-2015 |
20150246476 | METHOD FOR FABRICATING RECTANGULAR PATTERED STACKS - The embodiments disclose an analyzer configured to determine positions of circumferential gratings track features and alignment patterns in a first template and a phase device configured to determine positions of radial gratings features and interspersed pattern fields in a second template, wherein the first template is transferred and cross-imprinted with the second template features and patterns to form a third template substrate as a rectangular patterned stack imprint template. | 09-03-2015 |
20150266233 | APPARATUSES AND METHODS UTILIZING ETCH STOP LAYERS - Provided herein is an apparatus, including a substrate; an etch stop layer overlying the substrate, wherein the etch stop layer is substantially resistant to etching conditions; and a patterned layer overlying the etch stop layer, wherein the patterned layer is substantially labile to the etching conditions, and wherein the patterned layer comprises a number of features including substantially consistent feature profiles among regions of high feature density and regions of low feature density. | 09-24-2015 |
20150294680 | METHOD OF FABRICATING A BPM TEMPLATE USING HIERARCHICAL BCP DENSITY PATTERNS - The embodiments disclose a method including patterning a template substrate to have different densities using hierarchical block copolymer density patterns in different zones including a first pattern and a second pattern, using a first directed self-assembly to pattern a first zone in the substrate using a first block copolymer material, and using a second directed self-assembly to pattern a second zone in the substrate using a second block copolymer material. | 10-15-2015 |