Van Empel
Jaap Wilhelmus Petrus Van Empel, Bergeijk NL
Patent application number | Description | Published |
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20130010270 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus having a component that moves in a first direction, the component including a passive gas flow system. The passive gas flow system has a gas inlet to drive gas into the passive gas flow system when the component moves in the first direction and a gas outlet, connected to the gas inlet by a gas conduit, to direct the gas that is driven into the passive gas flow system in a certain direction. | 01-10-2013 |
Paul Cornelius Maria Van Empel, Ottersum NL
Patent application number | Description | Published |
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20090053262 | Combination vaccine for poultry - The present invention relates to a combination vaccine for the protection of poultry against | 02-26-2009 |
Tjarko Adriaan Rudolf Van Empel, Eindhoven DE
Patent application number | Description | Published |
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20110024651 | RADIATION SYSTEM AND METHOD, AND A SPECTRAL PURITY FILTER - A radiation system configured to generate a radiation beam, the radiation system including a chamber including: a radiation source configured to generate radiation; a radiation beam emission aperture; a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture; and a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture, wherein the spectral purity filter is configured to divide the chamber into a high pressure region and a low pressure region. | 02-03-2011 |