Patent application number | Description | Published |
20110202380 | MULTIPLE SIMULTANEOUS SESSION SUPPORT BY A REMOTE TECHNICIAN - In a remote technical support system, a technical support controller receives an indication of a maximum number of support sessions to be serviced by a remote technician. Thereafter, the technical support controller receives a service request for a user device. The technical support controller determines if handling of the service request by the remote technician would cause the number of support sessions currently being handled by the remote technician to exceed the previously-indicated maximum number of support sessions. If not, the service request is added to a work queue for the remote technician. Each service request may be classified into categories such that only remote technicians associated with a given category can handle service requests for that category. Furthermore, the process of selecting a remote technician to handle a given service request can be completely automated or based on individual remote technicians selecting service requests from a preliminary queue. | 08-18-2011 |
20110202798 | REMOTE TECHNICAL SUPPORT EMPLOYING A CONFIGURABLE EXECUTABLE APPLICATION - In a remote technical support system, in response to a request for service, a user device receives an executable application from the technical support controller, which executable application is subsequently invoked at the user device. Additionally, the user device receives configuration information from the technical support controller. The executable application then performs technical support processing of the user device in accordance with the configuration information. The executable application can be configured, based on the configuration information, to engage in dynamic workflow, i.e., to make decisions about what activities to perform based on previous results. Because the configuration information can be selected according to the specific nature of the user device and/or the specific nature of the service request, the executable application can be tailored to best address the requesting end user's needs with minimal attention from a remote technician. | 08-18-2011 |
20130132143 | MULTIPLE SIMULTANEOUS SESSION SUPPORT BY A REMOTE TECHNICIAN USING PRELIMINARY QUEUES - In a remote technical support system, a technical support controller receives an indication of a maximum number of support sessions to be serviced by a remote technician. Thereafter, the technical support controller receives a service request for a user device, which service request is classified into a category and added to a preliminary queue corresponding to the category. The technical support controller determines if handling of the service request by the remote technician would cause the number of support sessions currently being handled by the remote technician to exceed the previously-indicated maximum number of support sessions. If not, the service request is added to a work queue for the remote technician and removed from the preliminary queue. | 05-23-2013 |
20140039960 | MULTIPLE SIMULTANEOUS SESSION SUPPORT BY A REMOTE TECHNICIAN USING PRELIMINARY QUEUES - In a remote technical support system, a technical support controller receives an indication of a maximum number of support sessions to be serviced by a remote technician. Thereafter, the technical support controller receives a service request for a user device, which service request is classified into a category and added to a preliminary queue corresponding to the category. The technical support controller determines if handling of the service request by the remote technician would cause the number of support sessions currently being handled by the remote technician to exceed the previously-indicated maximum number of support sessions. If not, the service request is added to a work queue for the remote technician and removed from the preliminary queue. | 02-06-2014 |
20150356492 | MULTIPLE SIMULTANEOUS SESSION SUPPORT BY A REMOTE TECHNICIAN USING PRELIMINARY QUEUES - In a remote technical support system, a technical support controller receives an indication of a maximum number of support sessions to be serviced by a remote technician. Thereafter, the technical support controller receives a service request for a user device, which service request is classified into a category and added to a preliminary queue corresponding to the category. The technical support controller determines if handling of the service request by the remote technician would cause the number of support sessions currently being handled by the remote technician to exceed the previously-indicated maximum number of support sessions. If not, the service request is added to a work queue for the remote technician and removed from the preliminary queue. | 12-10-2015 |
Patent application number | Description | Published |
20090309018 | MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM - The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam. | 12-17-2009 |
20120080407 | Multi-Source Plasma Focused Ion Beam System - The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam. | 04-05-2012 |
20130309421 | MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM - The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam. | 11-21-2013 |
Patent application number | Description | Published |
20130181140 | Charged Particle Beam System Aperture - An improved beam-defining aperture structure and method for fabrication is realized. An aperture opening is made in a thin conductive film positioned over a cavity in a support substrate, where the aperture size and shape is determined by the opening in the conductive film and not determined by the substrate. | 07-18-2013 |
20140117233 | Retarding Field Analyzer Integral with Particle Beam Column - A retarding field analyzer uses the existing components of a charged particle beam system eliminating the need for inserting a separate retarding field analyzer device. Using components of the existing column reduces the time required to analyze the beam. Using the imaging capabilities of the existing column facilitates alignment of the beam with the analyzer. | 05-01-2014 |
20140312245 | MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM - The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam. | 10-23-2014 |
20150318140 | Multi-Source Plasma Focused Ion Beam System - The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam. | 11-05-2015 |
Patent application number | Description | Published |
20100294047 | METHOD AND SYSTEM FOR PERFORMING A MAGNETIC SEPARATION PROCEDURE - Methods, systems, and apparatus are provided for automated isolation of selected analytes, to which magnetically-responsive solid supports are bound, from other components of a sample. An apparatus for performing an automated magnetic separation procedure includes a mechanism for effecting linear movement of a magnet between operative and non-operative positions with respect to a receptacle device. A receptacle holding station within which a receptacle device may be temporarily stored prior to moving the receptacle to the apparatus for performing magnetic separation includes magnets for applying a magnetic field to the receptacle device held therein, thereby drawing at least a proton of the magnetically-responsive solid supports out of suspension before the receptacle device is moved to the magnetic separation station. An automated receptacle transport mechanism moves the receptacle devices between the apparatus for performing magnetic separation and the receptacle holding station. | 11-25-2010 |
20130026079 | METHOD AND SYSTEM FOR PERFORMING A MAGNETIC SEPARATION PROCEDURE - Methods, systems, and apparatus are provided for automated isolation of selected analytes, to which magnetically-responsive solid supports are bound, from other components of a sample. An apparatus for performing an automated magnetic separation procedure includes a mechanism for effecting linear movement of a magnet between operative and non-operative positions with respect to a receptacle device. A receptacle holding station within which a receptacle device may be temporarily stored prior to moving the receptacle to the apparatus for performing magnetic separation includes magnets for applying a magnetic field to the receptacle device held therein, thereby drawing at least a proton of the magnetically-responsive solid supports out of suspension before the receptacle device is moved to the magnetic separation station. An automated receptacle transport mechanism moves the receptacle devices between the apparatus for performing magnetic separation and the receptacle holding station. | 01-31-2013 |
20150027933 | SYSTEM FOR PERFORMING A MAGNETIC SEPARATION PROCEDURE - A system for separating an analyte from other components of a sample contained in a receptacle, where the system includes a receptacle holding station and a magnetic separation station. The receptacle holding station is configured to receive and hold a receptacle and includes one or more magnets positioned to apply a magnetic field to the contents of the receptacle. When present in the receptacle holding station, a receptacle remains stationary relative to the one or more magnets. The magnetic separation station includes one or more magnets and is constructed and arranged to perform a magnetic separation procedure on the contents of a receptacle transported from the receptacle holding station to the magnetic separation station by an automated receptacle transport. The magnetic separation procedure includes isolating an analyte immobilized on a magnetically-responsive solid support within the receptacle and removing other components of the sample from the receptacle. The magnetic separation station is configured to provide relative movement between the receptacle and the one or more magnets after the receptacle is transported to the magnetic separation station. | 01-29-2015 |