Patent application number | Description | Published |
20090043450 | Vehicle and Electric Apparatus - A charger can read an ID code from a transponder key of an immobilizer system of a contract vehicle. When an owner of the vehicle connects a vehicle and charger with a charging cable and brings the transponder key close to a reading portion, the read ID code is transmitted from charger toward vehicle where authentication is performed. Vehicle transmits an authentication result to charger. Preferably, these transmission and reception can be performed by power line communication employing a vehicle cable. | 02-12-2009 |
20090096416 | Charging Device, Electric Vehicle Equipped With the Charging Device and Charging Control Method - An HV-ECU acquires electric power information from an electricity transmission line by using a modem. The electric power information includes information regarding the amount of carbon dioxide having been emitted in the generating process of the commercial electric power supplied from an electricity transmission line. When the CO | 04-16-2009 |
20090184833 | Vehicle and Information Apparatus of Vehicle - An information apparatus of a vehicle that allows the request for the required information to be reliably made is provided. When a vehicle and a charging device are connected to each other for transmission and reception of electric power in order to charge a main battery, a main control ECU receives the contents from a server depending on the contents requesting information stored in a request storing unit and stores the received contents in a contents storing unit. Preferably, prior to receiving the contents, the main control ECU notifies of the content of the contents requesting information to inquire of an operator performing the charging whether the contents are received based on the contents requesting information. | 07-23-2009 |
20110022222 | CHARGING SYSTEM OF ELECTRIC POWERED VEHICLE - A charge instructing device installed in a space such as an indoor space in which the security is ensured reads key information (ID) stored in a vehicle key held in a key holding unit and transmits the read ID to an electric powered vehicle. Electric powered vehicle performs authentication by checking the ID transmitted from charge instructing device against registration information stored in advance. The result of the authentication is then transmitted from electric powered vehicle to charge instructing device. Charge instructing device permits a charger to charge electric powered vehicle according to the result of the authentication transmitted from electric powered vehicle. | 01-27-2011 |
20130096734 | PRELIMINARY AIR CONDITIONING SYSTEM - A charging start time and preliminary air conditioning time are calculated based on the departure time that is set with a control/operation device, and the charging time and preliminary air conditioning time are set. Then, a control is executed to start charging when at the charging start time and preliminary air conditioning may be started when the amount of charge is sufficient for preliminary air conditioning and a preliminary air conditioning starting trigger is detected, that is locking or preparation for leaving house is detected, for example. | 04-18-2013 |
20130141054 | ELECTRICITY CHARGING SYSTEM - An electricity charging system includes: a charger portion that charges a storage battery; a detection portion that detects an amount of charge stored in the storage battery; and a control portion that controls electric power that is supplied to charge the storage battery by the charger portion so that the electric power changes by a predetermined rule, according to the amount of stored electricity detected by the detection portion. | 06-06-2013 |
20130169233 | CHARGING METHOD AND CHARGING SYSTEM - Use start date-and-time is input by use of U | 07-04-2013 |
20130187613 | ENERGY MANAGEMENT SYSTEM - An energy management system has an integration control portion that performs control to charge a storage battery with a power of such an amount that a power consumption including a power supplied by a supply portion is equal to or smaller than a target value indicated by power consumption target information recorded in a recording portion when a power consumption detected by a detection portion is smaller than the target value, and to supply a building with a power with which the storage battery is charged such that the power consumption including the power supplied by the supply portion coincides in amount with a power equal to or smaller than the target value indicated by the power consumption target information recorded in the recording portion when the power consumption detected by the detection portion is larger than the target value. | 07-25-2013 |
Patent application number | Description | Published |
20090295503 | VARIABLE-FREQUENCY BAND-ELIMINATION FILTER - A series resonance circuit defined by a series circuit including an inductor and a capacitor and a series resonance circuit defined by a series circuit including an inductor and a capacitor are connected in shunt to a signal line. A diode is disposed between the grounding end of the series resonance circuit and the ground, and a diode is disposed between the grounding end of the series resonance circuit and the ground. The connection point between the grounding end of the series resonance circuit and the diode is connected to the ground via a frequency shifting inductor in a conductive state at high frequency, and the connection point between the grounding end of the series resonance circuit and the diode is connected to the ground via a frequency shifting inductor in a conductive state at high frequency. A matching circuit defined by a multistage T-shape LCL circuit is disposed between the series resonance circuits. | 12-03-2009 |
20100304693 | HIGH FREQUENCY SWITCH MODULE - A high frequency switch module includes a laminated circuit component that includes an antenna electrode connected to a single antenna, a plurality of communication electrodes connected to a plurality of high frequency communication circuits to transmit, receive, or transmit and receive plural kinds of communication signals, and a land arranged to mount a switch IC on, and a switch IC that is mounted on the laminated circuit component and includes a common terminal connected to the single antenna through the laminated circuit component, and a plurality of communication circuit terminals connected to the plurality of high frequency communication circuits through the laminated circuit component. The switch IC is provided with switch circuits between the communication circuit terminals and the common terminal, and all of the switch circuits have the same or substantially the same resistance against transmission power applied at the time of transmission. | 12-02-2010 |
20120062332 | VARIABLE CAPACITANCE MODULE AND MATCHING CIRCUIT MODULE - In a variable capacitance module capable of achieving necessary variable capacitance ranges, a variable capacitance circuit includes a variable capacitance element and fixed capacitance elements. A first variable capacitance element and a first fixed capacitance element are connected in series, and the series circuit thereof and a second fixed capacitance element are connected in parallel. Accordingly, with reference to the capacitance of the second fixed capacitance element, the range of the combined capacitance of the variable capacitance circuit is provided by a step size of capacitance based on the combined capacitance of the variable capacitance element and the first fixed capacitance element. The first and second fixed capacitance elements are defined by inner-layer flat-plate electrodes in a laminated substrate, and the variable capacitance element is defined by an MEMS element mounted on a top surface of the laminated substrate. | 03-15-2012 |
Patent application number | Description | Published |
20130082199 | CONTROL VALVE - A control valve according to an embodiment includes a guide member of a cylindrical shape extending coaxially with a valve hole, a valve element of a bottomed cylindrical shape for opening and closing a valve section such that the valve element touches and leaves the valve hole, and a pressure-canceling structure for canceling out at least part of pressure acting on the valve element by introducing a working fluid into a back pressure chamber via a leak passage, the pressure-canceling structure including the back pressure chamber, surrounded by the valve element and the guide member, and the leak passage communicating between the valve hole and the back pressure chamber. A sliding portion and a spacing are formed in an overlapped portion which is a region overlapped by the valve element and the guide member. The sliding portion is connected circumferentially at least when the valve section is closed, and the proportion of the spacing occupied in the overlapped portion is larger than the proportion of the sliding portion occupied at the time when the valve section is open. | 04-04-2013 |
20130313461 | CONTROL VALVE - An expansion valve according to one embodiment includes a body having an internal passage through which the working fluid flows, a valve hole provided in the internal passage, a driven member that opens and closes a valve section by touching and leaving the valve hole, a guide member that slidably supports the driven member inserted along the guide member, and a shield wall, provided in the driven member, which closes one end opening of the spacing between the driven member and the guide member when the valve section is fully opened. | 11-28-2013 |
20140130916 | COMPOSITE VALVE - A control valve according to an exemplary embodiment includes an interlocking mechanism that achieves a first operation and a second operation simultaneously or continuously. In the first operation, a sub-valve is opened by having an actuating rod displaced integrally with a sub-valve element in accordance with the magnitude of solenoidal force. In the second operation, a load, by which to bias a main valve element in a closing direction of a main valve, is increased by displacing the actuating rod relative to the main valve element. | 05-15-2014 |
20140318164 | AUTOMOTIVE AIR CONDITIONER AND EXPANSION VALVE - A first expansion valve is provided in a first refrigerant circulation passage through which the refrigerant discharged from a compressor is able to circulate by passing sequentially through an external heat exchanger and an evaporator and returning to the compressor. A second expansion valve is provided in a second refrigerant circulation passage through which the refrigerant discharged from the compressor is able to circulate by passing sequentially through an auxiliary condenser and the external heat exchanger and returning to the compressor. The second expansion valve regulates the valve opening degree such that the refrigerant state at an inlet side of the compressor during a heating operation is in a range where the dryness of refrigerant is greater than or equal to 0.9 and the superheat of refrigerant is less than or equal to 5° C. | 10-30-2014 |
Patent application number | Description | Published |
20090208862 | TWO COMPONENT DEVELOPER AND IMAGE FORMING METHOD - Provided is a method for forming an image containing the steps of: (a) forming an electrostatic latent image on an electrostatic latent image carrier; and (b) developing the electrostatic latent image by a two component developer comprising a toner and a carrier, wherein the two component developer is continually replenished in the developing step. (b); and the toner includes: colored particles.; and external additive particles comprising a complex oxide incorporating silicon atoms and at least one of titanium atoms and aluminum atoms, and a surface existing ratio of the silicon atoms (R | 08-20-2009 |
20090233202 | TWO COMPONENT DEVELOPER AND IMAGE FORMING METHOD - A two component developer comprising a toner and a carrier, wherein the toner includes: colored particles; and external additive particles comprising a complex oxide incorporating silicon atoms and at least one of titanium atoms and aluminum atoms, and a surface existing ratio of the silicon atoms (R | 09-17-2009 |
20090233205 | TWO-COMPONENT DEVELOPER - Provided is a two-component developer with which degradation of development is inhibited even in the case of prolonged use, and thereby a high quality image exhibiting high resolution and sufficient image density can be formed for a long duration. Also disclosed is a two-component developer possessing a carrier and a toner, wherein the carrier in which magnetic material powder is dispersed in a binder resin containing a phenol formaldehyde resin has a shape coefficient SF-1 of 1.0-1.2, a shape coefficient SF-2 of 1.1-2.5 and a volume-based median particle diameter of 10-100 μm, and the toner possesses a colored particle and an external additive particle, wherein the external additive particle comprises a titanic acid compound and iron, and the iron content is 100-1,000 ppm, based on the titanic acid compound. | 09-17-2009 |
20090239171 | TONER - It is to provide a toner which can form an image of high image quality exhibiting high resolution wherein a final visible image exhibits high image density and high thin-line reproducibility even in long-term use. In a toner incorporating at least a colored particle containing a binder resin composed of a polyester resin and a colorant, and external additive particles, the toner has a degree of average circularity of 0.950-0.990, a volume based median diameter of 4.5-8.0 μm, a volume based particle diameter dispersibility (CV | 09-24-2009 |
20120009515 | DEVELOPER FOR ELECTROPHOTOGRAPHY - The present invention provides a developer for electrophotography which is superior in property of build up of electrification and in charge stability even in environments of high temperature and high humidity or in an environment of low temperature and low humidity where it is difficult for a developer to retain its electrostatic charge performance, and which can provide an image free from fogging and decrease in density for a long term, that is, a developer for electrophotography containing composite oxide particles which include metal titanate particles containing titanium as a first metal atom and a second metal atom and containing therein 0.009 to 0.350% by weight of a third metal atom selected from the group consisting of the metal atoms belonging to Group 5A of the long form of the periodic table of elements. | 01-12-2012 |
Patent application number | Description | Published |
20130071658 | ADHESIVE COMPOSITION, ADHESIVE TAPE, METHOD FOR PROCESSING SEMICONDUCTOR WAFER AND METHOD FOR PRODUCING TSV WAFER - The present invention aims to provide an adhesive composition having high adhesive strength, as well as being easily detachable and having excellent heat resistance, an adhesive tape comprising the adhesive composition, a method for treating a semiconductor wafer using the adhesive tape, and a method for producing a TSV wafer. The present invention relates to an adhesive composition comprising: an adhesive component; and a tetrazole compound represented by the following formula (1), formula (2), or formula (3), or its salt: | 03-21-2013 |
20130220533 | PRESSURE-SENSITIVE ADHESIVE COMPOUND, PRESSURE-SENSITIVE ADHESIVE TAPE, AND WAFER TREATMENT METHOD - The present invention aims to provide an adhesive composition which has high initial adhesion and can strongly fix an adherend, while can be peeled off easily by light irradiation even after undergoing a high-temperature process at 200° C. or higher. The present invention also aims to provide an adhesive tape produced from the adhesive composition, and wafer treatment method using the adhesive composition. The present invention provides an adhesive composition including an adhesive component, a photoinitiator, and a silicone compound containing a functional group that is crosslinkable with the adhesive component. | 08-29-2013 |
20150217552 | WAFER PROCESSING METHOD - Provided is a method of treating a wafer in the state where the wafer is fixed on a support plate with an adhesive composition. Although the wafer is treated by a chemical, heating, or exothermic treatment, the method achieves sufficient adhesiveness during the step of treating a surface of the wafer and allows detachment of the support plate from the wafer without damaging the wafer or leaving the adhesive on the wafer after the wafer treating step. The method of treating a wafer of the present invention includes the steps of: fixing a wafer on a support plate via an adhesive composition containing a curable adhesive component to be crosslinked and cured by light irradiation or heating; crosslinking and curing the curable adhesive component by light irradiation or heating of the adhesive composition; treating a surface of the wafer fixed on the support plate by a chemical, heating, or exothermic treatment; and detaching the support plate from the treated wafer. | 08-06-2015 |
Patent application number | Description | Published |
20130251896 | METHOD OF PROTECTING COMPONENT OF FILM FORMING APPARATUS AND FILM FORMING METHOD - Provided is a method of protecting a component of a film forming apparatus, which includes forming a film having a rough surface on a surface of a component which is provided in the interior of the processing chamber of a film forming apparatus such that the surface of the component is coated with the film having the rough surface, the component being exposed to a film forming atmosphere during a film forming process. Forming a film having a rough surface on a surface of the component is in some embodiments performed before or after the film forming process is performed on target substrate and in some cases both before and after. | 09-26-2013 |
20140106577 | METHOD AND APPARATUS OF FORMING SILICON NITRIDE FILM - Provided is a method of forming a silicon nitride film on an object to be processed, which includes: supplying a silicon raw material gas into a processing chamber; and supplying a nitridant gas into the processing chamber, wherein supplying the silicon raw material gas includes an initial supply stage in which the silicon raw material gas is initially supplied and a late supply stage following the initial supply stage, wherein a first internal pressure of the processing chamber defined in the initial supply stage is lower than a second internal pressure of the processing chamber defined in the late supply stage. | 04-17-2014 |
20140356550 | FILM FORMING APPARATUS, FILM FORMING METHOD AND NON-TRANSITORY STORAGE MEDIUM - A film forming apparatus includes a first supply unit configured to supply a first reaction gas into the reaction vessel under an environment of a first pressure, a second supply unit configured to supply a second reaction gas into the reaction vessel under an environment of a second pressure lower than the first pressure, a first vacuum exhaust mechanism connected to the reaction vessel through a first exhaust path in order to create the environment of the first pressure within the reaction vessel, a second vacuum exhaust mechanism connected to the reaction vessel through a second exhaust path in order to create the environment of the second pressure, the second vacuum exhaust mechanism being lower in an operation pressure zone than the first vacuum exhaust mechanism, and a switching unit configured to switch exhaust destinations of the reaction vessel between the first path and the second path. | 12-04-2014 |
20150275368 | Film Forming Apparatus Using Gas Nozzles - A film forming apparatus includes: first and second source gas nozzles installed so as to extend in an arrangement direction of the substrates, each of the source gas nozzles including a plurality of gas ejection holes formed to eject the source gas toward central regions of the substrates at height positions corresponding to gaps between the substrates; a reaction gas supply unit configured to supply the reaction gas into the reaction vessel; first and second source gas supply lines respectively connected to the first and second source gas nozzles; first and second tanks respectively installed on the first and source gas supply lines, and configured to accumulate the source gas in a pressurized state; valves respectively installed at upstream and downstream sides of the first tank and at upstream and downstream sides of the second tank; and an exhaust port configured to evacuate the interior of the reaction vessel. | 10-01-2015 |
20150376789 | VERTICAL HEAT TREATMENT APPARATUS AND METHOD OF OPERATING VERTICAL HEAT TREATMENT APPARATUS - A vertical heat treatment apparatus includes: a gas supply part that supplies a film forming gas into a reaction chamber; and gas distribution adjusting members arranged above and below a region in which target substrates are disposed. The gas distribution adjusting members include a first plate-shaped member with convex and concave portions and a second plate-shaped member with convex and concave portions, the first plate-shaped member and the second plate-shaped member being arranged above and below each other, and the first plate-shaped member and the second plate-shaped member being arranged above a bottom plate of a substrate holding and supporting part and below a ceiling plate of a substrate holding and supporting part. The first plate-shaped member has a first surface area and the second plate-shaped member has a second surface area different from the first surface area. | 12-31-2015 |
Patent application number | Description | Published |
20080282976 | Film formation apparatus and method for using the same - A method for using a film formation apparatus for a semiconductor process includes setting an idling state where a reaction chamber of the film formation apparatus accommodates no product target substrate therein, and then, performing a purging process of removing a contaminant present in an inner surface of the reaction chamber by causing radicals to act on the inner surface of the reaction chamber. The radicals are generated by activating a purging process gas containing oxygen and hydrogen as elements. | 11-20-2008 |
20090233454 | FILM FORMATION APPARATUS FOR SEMICONDUCTOR PROCESS AND METHOD FOR USING SAME - A method for using a film formation apparatus includes, in order to inhibit metal contamination: performing a cleaning process using a cleaning gas on an inner wall of a process container and a surface of a holder with no productive target objects held thereon; and then, performing a coating process of forming a silicon nitride film by alternately supplying a silicon source gas and a nitriding gas to cover with the silicon nitride film the inner wall of the process container and the surface of the holder with no productive target objects held thereon. | 09-17-2009 |
20090263975 | FILM FORMATION METHOD AND APPARATUS FOR FORMING SILICON-CONTAINING INSULATING FILM DOPED WITH METAL - A film formation method for a semiconductor process performs a film formation process to form a silicon-containing insulating film doped with a metal on a target substrate, in a process field inside a process container configured to be selectively supplied with a silicon source gas and a metal source gas. The method includes forming a first insulating thin layer by use of a chemical reaction of the silicon source gas, while maintaining a shut-off state of supply of the metal source gas; then, forming a first metal thin layer by use of a chemical reaction of the metal source gas, while maintaining a shut-off state of supply of the silicon source gas; and then, forming a second insulating thin layer by use of the chemical reaction of the silicon source gas, while maintaining a shut-off state of supply of the metal source gas. | 10-22-2009 |
Patent application number | Description | Published |
20080211350 | PIEZOELECTRIC RESONATOR ELEMENT AND PIEZOELECTRIC DEVICE - A piezoelectric resonator element includes: a base in a predetermined length, the base being made of a piezoelectric material; a plurality of resonating arms extending from a first end of the base; a joining part connected to a second end apart from the first end of the base by a predetermined distance; a connecting part connected to the joining part and extending in a width direction of the piezoelectric resonator element; a supporting arm connected to the connecting part and extending in a same direction as the resonating arm at an outer side of the plurality of resonating arms. A ratio L | 09-04-2008 |
20080315727 | PIEZOELECTRIC RESONATOR, MANUFACTURING METHOD THEREOF AND LID FOR PIEZOELECTRIC RESONATOR - A piezoelectric resonator includes a piezoelectric resonator element having a resonating arm and a metal film that is formed on the resonating arm; a package including a bottom part on which the piezoelectric resonator element is fixed and a frame wall that surrounds the bottom part, and having an opening above the bottom part; and a lid including a frame in which a through hole is provided and an optically transparent part that has an upper face and a lower face of the frame and is disposed at the through hole, the through hole penetrating a front face and a back face, the lower face of the optically transparent part being disposed so as to oppose the metal film, and the lid closing the opening of the package such that the lid overlaps with the bottom part and the frame wall, the through hole having a curved inner wall face whose curved face is coupled with at least one of the front face and the back face at least one opening edge of the front face and the back face and a vertical inner wall face that is provided vertical to the front face and the back face and in a part of a thickness direction of the frame, and the optically transparent part being provided so as to contact closely with at least a part of the vertical inner wall face and at least a part of the curved inner wall face. | 12-25-2008 |
20090001856 | PIEZOELECTRIC RESONATOR AND MANUFACTURING METHOD THEREFOR - A piezoelectric resonator includes a piezoelectric resonator element having a base portion and a resonating arm extending from the base portion, a package including a bottom to which the piezoelectric resonator element is fixed and a frame wall that surrounds the bottom and having an opening above the bottom, and a lid for closing the opening of the package. In this piezoelectric resonator, the lid includes a main body having a through-hole formed therein, a flange formed to surround a periphery of the main body and to be thinner than the main body, and an optically transparent member located in the through-hole. The flange has a joining portion with an upper end surface of the frame wall, and the main body projects in a direction from the flange to the bottom in a thickness direction. Also, the through-hole is at a position displaced in a first direction approaching a first end of the main body from a center of the main body. Also, the flange is joined with the frame wall such that a clearance between the first end and the joining portion of the flange nearest to the first end is larger than a clearance between a second end in a second direction opposite to the first direction of the main body and the joining portion of the flange nearest to the second end. | 01-01-2009 |
20100180415 | PIEZOELECTRIC RESONATOR AND MANUFACTURING METHOD THEREFOR - A piezoelectric resonator includes a piezoelectric resonator element having a base portion and a resonating arm extending from the base portion, a package including a bottom to which the piezoelectric resonator element is fixed and a frame wall that surrounds the bottom and having an opening above the bottom, and a lid for closing the opening of the package. In this piezoelectric resonator, the lid includes a main body having a through-hole formed therein, a flange formed to surround a periphery of the main body and to be thinner than the main body, and an optically transparent member located in the through-hole. The flange has a joining portion with an upper end surface of the frame wall, and the main body projects in a direction from the flange to the bottom in a thickness direction. Also, the through-hole is at a position displaced in a first direction approaching a first end of the main body from a center of the main body. Also, the flange is joined with the frame wall such that a clearance between the first end and the joining portion of the flange nearest to the first end is larger than a clearance between a second end in a second direction opposite to the first direction of the main body and the joining portion of the flange nearest to the second end. | 07-22-2010 |