Patent application number | Description | Published |
20090000019 | WASTE TRANSPORT SYSTEM AND APPARATUS FOR USE WITH LOW WATER OR WATER FREE WASTE DISPOSAL DEVICES - A waste transport system may be used for transporting waste from low or no water disposal devices (e.g., low flow toilet fixtures, foam flush toilets and similar types of reduced water toilet fixtures) to remote areas that may not be functionally accessible by gravity. These areas may include, but are not limited to, composting units, sewers, septic systems, holding tanks or areas where the waste may be combined with additional water. | 01-01-2009 |
20120233758 | ON-DEMAND WASTE TRANSPORT SYSTEM AND APPARATUS FOR USE WITH LOW WATER OR WATER FREE WASTE DISPOSAL DEVICES - An on-demand waste transport system and method may be used for transporting waste from low or no water disposal devices (e.g., low flow toilet fixtures, foam flush toilets and similar types of reduced water toilet fixtures) to remote areas (that may not be functionally accessible by gravity) via an evacuation system. These areas may include, but are not limited to, composting units, sewers, septic systems, holding tanks or areas where the waste may be combined with additional water. The system and method may transport the waste by generating an “on-demand” vacuum pressure within the system. | 09-20-2012 |
Patent application number | Description | Published |
20080236615 | METHOD OF PROCESSING WAFERS IN A SEQUENTIAL FASHION - A method and apparatus for processing two substrates is provided. The apparatus comprises a chamber having an upper opening, a lower process volume adapted to retain a process solution, and an upper process volume, wherein the chamber is proportioned to vertically process two substrates. The apparatus further comprises a substrate transfer assembly adapted to transfer two substrates in and out of the chamber through the upper opening and one or more megasonic transducers disposed in the chamber, wherein the one or more megasonic transducers are configured to direct megasonic energy towards the process solution retained in the chamber. | 10-02-2008 |
20090044838 | OZONATION FOR ELIMINATION OF BACTERIA FOR WET PROCESSING SYSTEMS - In a first aspect, an apparatus adapted to clean a semiconductor device manufacturing component is provided. The apparatus includes an ozone module adapted to (1) obtain Ozone; (2) combine the Ozone with a fluid to generate ozonated fluid; and (3) deliver the ozonated fluid to the semiconductor device manufacturing component so as to clean the semiconductor device manufacturing component. Numerous other aspects are provided. | 02-19-2009 |
20100035526 | CHEMICAL MECHANICAL POLISHING SYSTEM HAVING MULTIPLE POLISHING STATIONS AND PROVIDING RELATIVE LINEAR POLISHING MOTION - A chemical-mechanical polishing apparatus including a table top, a transfer station mounted on the table top, a plurality of polishing stations mounted on the table top, a plurality of washing stations, and a plurality of carrier heads supported by a support member rotatable about an axis. Each washing station is located between a first polishing station and either a second polishing station or the transfer station, and the transfer station and the plurality of polishing stations are arranged at approximately equal angular intervals about the axis. | 02-11-2010 |
20100330776 | BONDING APPARATUS AND METHOD - A bonding apparatus and method holds first and second bodies peripherally, one above the other, on respective shelves. A lower heat-transfer body is configured to lift the first body from below and press the first and second bodies against an upper heat-transfer body to enable bonding between the first and second bodies. | 12-30-2010 |