Patent application number | Description | Published |
20080203297 | Specimen Inspection Equipment and How to Make the Electron Beam Absorbed Current Images - An object of the present invention is to obtain a clear absorbed current image without involving the difference in gain of amplifier between inputs, from absorbed currents detected by using a plurality of probes and to improve measurement efficiency. | 08-28-2008 |
20080237462 | Semiconductor Testing Method and Semiconductor Tester - A semiconductor testing method capable of quickly counting semiconductor cells with accuracy is achieved. Since an SEM is adjusted in a specific condition, the rotation axis of a stage and the axis of an optical system are deviated from each other in a different observation environment and a different adjustment environment. The deviation between the axes is easily adjusted in each observation environment, so that the deviation is reduced. A seemingly horizontal or vertical line is drawn with a mouse and raster rotation is performed in alignment with the closer axis. After that, the stage is horizontally moved, pattern matching is performed on an image on a position where the image should be disposed, and an angle is adjusted. The stage is moved evenly along the X-axis and the Y-axis, achieving a movement to a destination like a straight line. In synchronization with the smooth movement of the stage, a cell | 10-02-2008 |
20090250610 | SAMPLE INSPECTION APPARATUS - A sample inspection apparatus in which a fault in a semiconductor sample can be measured and analyzed efficiently. A plurality of probes are brought into contact with the sample. The sample is irradiated with an electron beam while a current flowing through the probes is measured. Signals from at least two probes are supplied to an image processing unit so as to form an absorbed electron current image. A difference between images obtained in accordance with a temperature change of the sample is obtained. A faulty point is identified from the difference between the images. | 10-08-2009 |
20100116986 | Specimen Inspection Equipment and How to Make the Electron Beam Absorbed Current Images - An object of the present invention is to obtain a clear absorbed current image without involving the difference in gain of amplifier between inputs, from absorbed currents detected by using a plurality of probes and to improve measurement efficiency. | 05-13-2010 |
20100177954 | LOGICAL CAD NAVIGATION FOR DEVICE CHARACTERISTICS EVALUATION SYSTEM - A navigation system for easily determining defective positions is provided. In the case of CAD navigation to defective positions, logical information for indicating defective positions is created in a CAD format, instead of CAD data of physical information indicating circuit design. Specifically, by attaching marks such as rectangles, characters, or lines, to an electron microscope image with software, quick navigation is performed with required minimum information. By using created CAD data, re-navigation with the same equipment and CAD navigation to heterogeneous equipment are performed. | 07-15-2010 |
20100200749 | Semiconductor Testing Method and Semiconductor Tester - A semiconductor testing method capable of quickly counting semiconductor cells in which a seemingly horizontal or vertical line is drawn with a mouse, and raster rotation is performed in alignment with the closer axis. After that, the stage is horizontally moved, pattern matching is performed on an image on a position where the image should be disposed, and an angle is adjusted. The stage is moved evenly along the X-axis and the Y-axis, achieving a movement to a destination like a straight line. In synchronization with the smooth movement of the stage, a cell is surrounded in a rectangular frame by a ruler, and the number of cells is displayed with a numeric value. | 08-12-2010 |
20110291009 | SEMICONDUCTOR INSPECTION METHOD AND DEVICE THAT CONSIDER THE EFFECTS OF ELECTRON BEAMS - Disclosed is a device capable of probing with minimal effect from electron beams. Rough probing is made possible using a lower magnification than the magnification usually viewed. When target contact of semiconductor is detected, measurement position is set in the center of picture usually to move probe without moving stage. With the miniaturization, contact can be confirmed only at high magnification, although probe can be confirmed at low magnification on the contrary but it is necessary to display it in real time. Static image obtained at high magnification once is combined with image obtained at low magnification in real time from target contact required for probing and characteristic of probe to be displayed, so that probing at low magnification can be realized to reduce the effects of electron beams and obtain accurate electrical characteristics. | 12-01-2011 |
20110291692 | METHOD AND APPARATUS FOR INSPECTING SEMICONDUCTOR USING ABSORBED CURRENT IMAGE - Provided is an apparatus for automatically detecting a failure position on a specified wiring line. The apparatus and a method for automatically detecting the failure position even on a long wiring line by applying a probe and an electron beam onto a sample and using an image of the current absorbed by the sample are provided. The apparatus obtains an absorbed current image, while laterally moving at right angle with the probe applied onto the sample, and based on the obtained absorbed current image, correction is performed by means of both an image shift and a stage. Countermeasures are taken, using a stage not having a sample rotating stage, against factors including a hardware factor of not moving at a correct angle, such as backlash, the wiring line is accurately and continuously displayed even when the apparatus moves to the ends of the long wiring line, and the failure position is detected, while the apparatus automatically reciprocates several times between the both ends of the wiring line. | 12-01-2011 |
20130112871 | Inspection Method and Device - The high magnification, high resolution and real-time property of an SEM image are realized when the electrical characteristics of an inspection object are measured, without affecting the electrical characteristics of the inspection object. A high-quality, high-magnification first image including an image of a target position in the inspection object on a sample is acquired. Next, a low-quality, low-magnification second image including the image of the target position in the inspection object on the sample and probe images is acquired. Next, data on the first image is built into the second image to generate an image for coarse-access observation which is the same in magnification as the second image. The generation of the image for coarse-access observation is repeated until a probe comes close to the target position in the inspection object. | 05-09-2013 |
20130119999 | Specimen Testing Device and Method for Creating Absorbed Current Image - Proposed is a technique of emphasizing a change in absorbed current obtained from a faulty part in a wiring section as a testing target more than in other parts of the wiring section. A specimen testing device is configured to output an image of absorbed current output from two probes during scanning of an electron beam so as to be operatively associated with the scanning of the electron beam and includes the following mechanism. When a faulty part of a wiring section on the specimen side with which two probes are in contact is irradiated with an electron beam, the resistance value at the faulty part changes more than that of irradiation of a normal wiring section with the electron beam. Such a change in resistance value is detected as a change in ratio between a resistance value of the wiring section specified by the two probes and a known resistance value. With this method, an absorbed current image corresponding to the faulty part can be made easily distinguishable from an absorbed current image of other parts of the wiring section. | 05-16-2013 |
20150074523 | CHARGED PARTICLE BEAM APPARATUS, SPECIMEN OBSERVATION SYSTEM AND OPERATION PROGRAM - Skills of a novice user operating a charged particle beam apparatus can be improved. Provided are an image display device which displays operation items of an electron microscope on an operation screen, a storage device which stores information of assist buttons which display image state information acquired via a detector of the electron microscope such that the information of assist buttons is correspondent to image quality of the image thus acquired as well as to observation conditions composed of a combination of parameter setting values of the electron microscope, an operation program which analyzes the image quality of the image acquired via the detector, acquires the information of the assist buttons based on analytical results of the image quality of the image as well as current observation conditions, and makes the assist buttons be displayed on the predetermined part of the operation screen. | 03-12-2015 |