Teng-Chin
Teng-Chin Kuo, Taipei City TW
Patent application number | Description | Published |
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20150293461 | OVERLAP MARK SET AND METHOD FOR SELECTING RECIPE OF MEASURING OVERLAP ERROR - An overlap mark set is provided to have at least a first and a second overlap marks both of which are located at the same pattern layer. The first overlap mark includes at least two sets of X-directional linear patterns, having a preset offset a | 10-15-2015 |
Teng-Chin Kuo, Taipei TW
Patent application number | Description | Published |
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20150362905 | METHOD OF CORRECTING OVERLAY ERROR - A method of correcting an overlay error includes the following steps. First, an overlay mark disposed on a substrate is captured so as to generate overlay mark information. The overlay mark includes at least a pair of first mark patterns and at least a second mark pattern above the first mark patterns. Then, the overlay mark information is calculated to generate an offset value between two first mark patterns and to generate a shift value between the second mark pattern and one of the first mark patterns. Finally, the offset value is used to compensate the shift value so as to generate an amended shift value. | 12-17-2015 |
Teng-Chin Yu, New Taipei City TW
Patent application number | Description | Published |
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20150134278 | Measurement Device for Detecting Material Level and Temperature - A measurement device for detecting a material level and a temperature has a cable, a level sensing module, a thermal sensing module, a processing module, and a power module. The measurement device detects difference of currents between an electrode of the cable and the earth, and calculates a material level of a material stored in a silo according to the RF admittance. The cable comprises a plurality of thermal sensing units for detecting a temperature of the material. The measurement device further calibrates a material capacitance of the material with the temperature for avoiding an error caused by an inaccurate parameter. | 05-14-2015 |