Patent application number | Description | Published |
20110043811 | MASK DEFECT MEASUREMENT METHOD, MASK QUALITY DETERMINATION METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE - A method for measuring a shape of a phase defect existing on an exposure mask includes making inspection light incident on the mask, measuring the intensity of light scattered in an angular range in which the width of an scattering area on the phase defect can be predicted, calculating a radius of the phase defect based on the measured scattered light intensity, changing the angular range of scattered light to be measured, remeasuring scattered light intensity in the thus changed angular range, and calculating a scattering cross-sectional area based on the scattered light intensity obtained by remeasurement. A process of remeasuring the scattered light intensity and calculating the scattering cross-sectional area is repeatedly performed until the remeasured scattered light intensity is saturated and the shape of the phase defect is determined by using the calculated radius of the phase defect and each of the calculated scattering cross-sectional areas. | 02-24-2011 |
20120063667 | MASK DEFECT INSPECTION METHOD AND DEFECT INSPECTION APPARATUS - According to one embodiment, in a method for inspecting a defect of an exposure mask, using an optical system which acquires a dark-field image, an arbitrary partial region where a uniform dark-field image is obtained on the mask is allocated at a defocus position to acquire an image. A detection threshold is decided using signal intensities of the acquired image and an area ratio between a desired inspection region and the partial region, so that a signal count indicating signal intensities greater than the detection threshold in the inspection region is less than a target false detection count. The mask is allocated in a just-in-focus position to acquire an image of the inspection region. A signal having a signal intensity of the acquired image, which indicates an intensity greater than the detection threshold, is determined as a defect. | 03-15-2012 |
20120218543 | MASK INSPECTION METHOD AND MASK INSPECTION APPARATUS - According to one embodiment, a method of detecting a defect of a semiconductor exposure mask includes acquiring a background intensity from a surface height distribution of the mask, acquiring a standard background intensity distribution from the background intensity, making light of an arbitrary wavelength incident on the mask, and acquiring an image at a position of interest of the mask, acquiring background intensity raw data, based on a signal intensity of the acquired image at the position of interest and a mean value of image intensity data in a peripheral area of the position of interest, finding a correction coefficient of the signal intensity, based on a ratio of the background intensity raw data to the standard background intensity distribution, correcting the signal intensity by multiplying the signal intensity. | 08-30-2012 |
20120224051 | MASK INSPECTION METHOD AND MASK INSPECTION APPARATUS - According to one embodiment, a method of inspecting a defect of a semiconductor exposure mask by using an optical system, which is configured to acquire an image by an imaging module by making light of an arbitrary wavelength incident on the semiconductor exposure mask, includes acquiring a control condition for elongating a point image acquired by the optical system in a read-out direction of the imaging module, acquiring an image of a desired area of the mask under the control condition, and determining, when a peak signal with a signal intensity which is a first threshold or more. | 09-06-2012 |
20130244142 | Method and Apparatus for Inspecting a Mask Substrate for Defects, Method of Manufacturing a Photomask, and Method of Manufacturing a Semiconductor Device - According to one embodiment, a method of inspecting a mask substrate for defects, includes acquiring a defocus image of a partial region of a mask substrate using a dark-field optical system, acquiring a just-focus image of the partial region using the dark-field optical system, generating a set composed of first signals obtained from the defocus image and having signal intensities equal to or higher than a first threshold value, excluding, from the set, the first signals pertaining to parts in which signal intensities of signals obtained from the just-focus image are equal to or higher than a second threshold value, determining an inspection threshold value for signal intensities, on the basis of the first signals not excluded from, and remaining in, the sea. | 09-19-2013 |
20130244143 | Optimum Imaging Position Detecting Method, Optimum Imaging Position Detecting Device, Photomask Manufacturing Method, and Semiconductor Device Manufacturing Method - According to one embodiment, an optimum imaging position detecting method includes acquiring an image of a predetermined area of a substrate surface, calculating, on the basis of the image of the predetermined area, peak intensity corresponding to a value obtained by subtracting average signal intensity of an area outside an intensity acquisition part from signal intensity of the intensity acquisition part, calculating variation of the peak intensity, executing acquiring the image of the predetermined area, calculating the peak intensity, and calculating the variation of the peak intensity at each of a plurality of imaging positions, and determining that a position of the maximum variation of the peak intensity is an optimum imaging position. | 09-19-2013 |
Patent application number | Description | Published |
20080277989 | Headrest for vehicles - A headrest for vehicles including a stationary plate secured to the seat back of a vehicle; an attachment shaft supported by the stationary plate; a coil spring wound on the attachment shaft and having a fixed end and a free end with its inner diameter being smaller than the outer diameter of the attachment shaft; and a headrest base plate attached to the stationary plate so as to turn forward and rearward. The fixed end of the coil spring is fixed to the base plate so as to secure the attachment shaft to the base plate or the fixed end of the coil is fixed to the stationary plate so as to secure the attachment shaft to the base plate, and the winding direction of the coil spring is set in a direction that tightens the spring when the base plate is turned rearward, thus restricting this rearward turning. | 11-13-2008 |
20090021068 | Headrest - A headrest including a base material having a front base member and a rear base member, a turn restricting bracket installed the front and rear base members and having an abutting portion and a protruding step, a center shaft attached to the turn restricting bracket, and a latching panel installed between the front and rear base members with one end thereof hinged to the rear base member, the latching panel being pulled by a spring. The headrest has forward and rearward use limitation positions: at forward use limitation position, when the headrest turns forward and a latching surface formed in the latching panel catches on the protruding step, a further forward turning of the headrest is restricted; and at the rearward use limitation position, when the headrest turns rearward and the abutting portion strikes the front base member, further rearward turning of the headrest is restricted. | 01-22-2009 |
20090295212 | Armrest apparatus - An armrest apparatus including an arm, which is fitted to a drum provided on a seat side member, and a coil spring, which is provided on the drum, wherein one end of the spring is fixed to the arm-rest member and another end of the spring, a free end, is curved outwardly in the direction away from the center axis of the drum, and this coil spring is loosely wound around the drum so as to tighten when the arm-rest member is rotated downward, and further a coil end receiving surface that receives the curved part of the coil spring is provided in the drum. When the arm-rest member is rotated downward and reaches a predetermined set angle, the coil end receiving surface receives the curved part of the coil spring, so that the coil spring tightens the drum by a downward load applied to the arm, restricting the downward rotation of the arm. | 12-03-2009 |
20140353093 | Rotary Damper - The rotary damper includes a brake drum ( | 12-04-2014 |