Patent application number | Description | Published |
20130044573 | MANUFACTURING METHOD OF TIMEPIECE DIAL, TIMEPIECE DIAL, AND TIMEPIECE - To provide a timepiece dial that presents a rich stereoscopic effect, and to provide a timepiece comprising the timepiece dial, the timepiece dial of the invention comprises a microlens layer composed of a plurality of microlenses arranged in an orderly fashion as viewed in a planar view, and a decorative layer composed of a repeating design having a plurality of constituent units. As viewed in a planar view, the microlens layer and the decorative layer are superimposed, and the decorative layer has regions where pitches of the constituent units that are adjacent are different from each other. | 02-21-2013 |
20130051196 | TIMEPIECE DIAL AND TIMEPIECE - To provide a timepiece dial that presents an appearance with a rich stereoscopic effect, and to provide a timepiece including the timepiece dial, a timepiece dial of the present invention includes a microlens layer formed with a plurality of microlenses which are arranged in an orderly fashion in a planar view; and a decorative layer formed with a design having a plurality of lines. The microlens layer and the decorative layer are superimposed as viewed in a planar view of the timepiece dial. A pitch of adjacent lines of the design changes along a longitudinal direction of a linear reference line. | 02-28-2013 |
20130064048 | TIMEPIECE DIAL, AND TIMEPIECE - To provide a timepiece dial that presents a rich stereoscopic effect, and to provide a timepiece including the timepiece dial, a timepiece dial of the invention has a microlens layer in which a plurality of microlenses are arranged in an orderly fashion when viewed from above, and a decorative layer provided with a design, in which the microlens layer and the decorative layer are superimposed when viewed from above, and the decorative layer has a plurality of regions that are different in the design from each other. Preferably, the decorative layer is provided with a design having a plurality of lines and/or a repeating design having the same arrangement as the microlenses and a pitch that differs from that of the microlenses as the design. | 03-14-2013 |
20130070574 | TIMEPIECE ROTATING DISPLAY MEMBER, AND TIMEPIECE - To provide a timepiece rotating display member that presents an appearance with a rich stereoscopic effect, and to provide a timepiece including the timepiece rotating display member, a timepiece rotating display member of the invention includes a microlens layer formed with a plurality of microlenses which are arranged in an orderly fashion as viewed in a planar view; and a decorative layer formed with a repeating design and/or a design having a plurality of lines; wherein the microlens layer and the decorative layer are superimposed as viewed in a planar view. It is preferable that the timepiece rotating display member is a date disc, a day disc, an age-of-the-moon disc or a disc hand. | 03-21-2013 |
Patent application number | Description | Published |
20080301724 | Disk recording and/or reproducing device - A disk recording and/or reproducing device includes a disk tray having a concave disk housing portion for putting in and taking out a disk-like recording medium; a tray housing case supporting the disk tray so as to be movable in a direction in which the disk tray is inserted and ejected; and a disk cover mounted to the tray housing case and covering over the disk housing portion of the disk tray when the disk tray is housed in the tray housing case. The disk cover includes an annular contact portion at an outer periphery thereof, extending outwardly and continuous in a circumferential direction thereof, a dimension of a width of the annular contact portion is larger than that of a thickness of the disk cover, and the annular contact portion is brought into contact with an entire periphery of the disk housing portion of the disk tray. | 12-04-2008 |
20110119691 | DISC LOADING MECHANISM - A disc loading mechanism transporting a disc between a disc cartridge and a recording and reproducing apparatus includes: a loading arm having at a leading end thereof claw members which comes into contact with an outer circumference of the disc and performs drawing of the disc into the recording and reproducing apparatus and insertion of the disc into the disc cartridge; an arm driving mechanism which slides the loading arm in a disc transport direction; a disc extruding lever which extrudes the disc up to a contact position with the claw members when discharging the disc; and a lever driving mechanism which drives the extrusion lever, wherein each of the claw members includes a draw-in surface portion and an insertion surface portion provided at the opposite side to the draw-in surface portion. | 05-19-2011 |
20110119693 | CARTRIDGE DRIVE APPARATUS - A cartridge drive apparatus for a disc cartridge having upper and lower shells which are separatably joined to each other to form a cartridge body is disclosed, in which a accommodated disc is able to be inserted or ejected by separating the upper and lower shells vertically. The cartridge drive apparatus includes a cartridge holder which, by inserting the cartridge body, has an upper holder supporting the upper shell and a lower holder supporting the lower shell, and a holder moving mechanism which separates the upper holder and the lower holder of the cartridge holder to separate the upper shell and the lower shell and thus is able to allow the disc to be inserted or ejected. | 05-19-2011 |
20110225602 | DISC CARTRIDGE - A disc cartridge includes upper and lower shells making up a cartridge body, and with the lower shell, a first-rectangular plate, and disc holders making up the side wall of the cartridge body provided to first-side edges of the first-rectangular plate, and also slidably supporting a disc are provided, and second-side edges which face each other are opened, with the upper shell, a second-rectangular plate, standing wall members provided to third-side edges of the second-rectangular plate, making up the front and rear faces of the cartridge body, and a dividing wall provided to fourth-side edges are provided, and with the disc holders, an disc insertion/ejection opening from the second-side edges is provided to one edge, and a push-out opening for a disc push-out member is provided to the other edge, and when the shells are combined together, the second-side edges are closed, and are opened when the shells are separated. | 09-15-2011 |
20110296445 | DISC CHANGER - A disc changer includes: a disc cartridge having a case body in which a plurality of disc-shaped recording media are storable by being arrayed in the axial direction of the center axis, and an information input medium to which at least information relating to pitch between disc-shaped recording media and the number of stored disc-shaped recording media is input; a disc holder configured to hold the disc cartridge, a portion of which is moveable in the center axial direction of the disc-shaped recording media; and a movement mechanism including an encoder, configured to determine a stop position in the center axial direction of the disc holder based on information input to the information input medium. | 12-01-2011 |
20110296446 | DISC CHANGER - A disc changer includes a disc cartridge having an insertion hole, a case body into which the disc cartridge is inserted, having first and second shells which can be separated in which a plurality of disc-shaped recording media are storable by being arrayed in the axial direction of the center axis, and a lock lever for locking the shells in a connected state; and a disc holder to hold the inserted disc cartridge, including an unlocking piece which unlocks locking between the shells by being inserted into the insertion hole when the disc cartridge is inserted into the disc holder to press the lock lever, and a restricting lever supported by the unlocking piece, including a restricting portion engaged with the case body when the unlocking piece is inserted into the insertion hole, so that locking between the shells is unlocked, the restricting lever restricting movement in the extracting direction. | 12-01-2011 |
20110296449 | DISK CARTRIDGE - A disk cartridge includes a case body that can house a plurality of disk-shaped recording media and is joined or separated by making a first shell contact with/separate from a second shell in an axial direction, and a lock lever that is rotatably supported and locks the first shell and the second shell in a joining manner, in the inside of the case body. A disk inserting/ejecting slot is formed, a supporting shaft is provided to the case body, the lock lever includes a supported part, a lock part, and a lock-release part, the first shell is provided with an open/close panel that includes an insertion hole, an insertion protrusion part that is inserted into the insertion hole of the open/close panel is provided to an end part of the lock-release part, and an end face of the insertion protrusion part is formed as an inclined face. | 12-01-2011 |
20110296450 | DISC CARTRIDGE - A disc cartridge includes a case body in which a plurality of disc-shaped recording media can be stored being arranged in the axial direction of a central shaft and which includes a first shell having a base face portion parallel to a recording face of the recording medium and a second shell having a basal plane portion parallel to the recording face, which move toward or away from each other in the axial direction, thereby being combined with or separated from each other, wherein the second shell has a pair of side face portions protruding in the same direction from both end portions of the basal plane portion and situated facing each other, a thin-walled portion is formed at a central portion between the side face portions in the basal plane portion, and a bridge member which is attached to span the side face portions is provided. | 12-01-2011 |
20110296451 | DISK CARTRIDGE - A disk cartridge includes a case body that is capable of housing a plurality of disk-shaped recording media and is joined or separated by making a first shell contact with/separate from a second shell in an axial direction, and a lock lever that is rotatably supported and locks the first shell and the second shell in a joining manner, in the inside of the case body. A supporting shaft is provided to the case body, the lock lever includes a supported part and a lock part, a disk inserting/ejecting slot is formed, an open/close panel is provided to the first shell, the lock lever is supported on an end part of the case body, and an insertion concave part in which the lock part of the lock lever can be inserted and engaged is formed within an inner face of the open/close panel. | 12-01-2011 |
20120120786 | DISC CARTRIDGE - A disc cartridge includes a case body for receiving disc-shaped recording media in an axial direction of a central shaft so that first and second shells respectively having a base surface portion parallel to a recording surface of the disc-shaped recording media are coupled separated by axial engagement/disengagement; and a lock lever supported perpendicular to the axial direction in the case body and locking the shells coupled. The shells are separated to form a disc insertion/extraction hole for the insert or discharge of the disc-shaped recording media into/from the case body. A support shaft serving as a pivoting point of the lock lever is installed to the case body. The lock lever includes a supported portion supported by the support shaft, a lock portion protruding from the supported portion and locking the shells, and a balance portion protruding from the supported portion approximately opposite to protrusion of the lock portion. | 05-17-2012 |
20120292158 | DISK TRANSPORTATION DEVICE AND DISK STORAGE SYSTEM - A disk transportation device includes a pair of rotation arms that are rotatable respectively about a fulcrum shaft extending in the same direction as the axial direction of a center shaft of a disk-shaped recording medium in both sides thereof that pinch the transportation passage of the disk-shaped recording medium transported between a disk changer and a disk drive device; and four transportation rollers of which two at a time are rotatably supported on the pair of rotation arms respectively, wherein the four transportation rollers contact the outer peripheral surface of the disk-shaped recording medium respectively and the pair of rotation arms are rotated in opposite directions to each other in a state where one of the transportation rollers at a time is supported at the pair of the rotation arms respectively contact the outer peripheral surface of the disk-shaped recording medium. | 11-22-2012 |
20120301252 | CARTRIDGE TRANSPORTING DEVICE - A cartridge transporting device includes: a cartridge holder in which a cartridge receiving a recording medium is inserted and which holds the inserted cartridge; a supporting frame that supports the cartridge holder to be freely move between an insertion position and a drawn-in position; a locking member that moves between a locking position and a non-locking position, moves to the locking position, and locks the cartridge holder at the insertion position; a holder driving member that is movable in a predetermined direction and moves the cartridge holder between the insertion position and the drawn-in position; and a moving mechanism that moves the holder driving member in the predetermined direction, wherein when the cartridge holder starts to move from the insertion position to the drawn-in position, the holder driving member moves such that the cartridge holder locked by the locking member is unlocked. | 11-29-2012 |
20130057982 | DISC CONVEYING DEVICE - A disc conveying device includes a route adjuster which is pressed and turned by a disc-shaped recording medium being conveyed in a direction orthogonal to a central axis direction in a lead-in direction of being extracted and led in from a disc cartridge and an ejecting direction of being stored in the disc cartridge after being ejected; wherein a positioning groove is formed to the route adjuster, in which a peripheral portion of the disc-shaped recording medium is inserted at the time of the disc-shaped recording medium being conveyed, so as to position the disc-shaped recording medium. | 03-07-2013 |
20130061254 | DISC CONVEYING DEVICE - A disc conveying device includes a pair of rails positioned on opposite sides across a disc-shaped recording medium transported in the lead-in direction or ejecting direction in a direction orthogonal to a center axis direction, and extending in the direction of the conveyed disc-shaped recording medium; link arms that are turnably supported to a base chassis, are turnable as to the pair of rails, and move in parallel in a direction of separating the rails from the peripheral face of the disc-shaped recording medium; conveying rollers that convey the disc-shaped recording medium by being supported by the rails, and touch the peripheral face of the disc-shaped recording medium with at least one conveying roller rotating; and an ejecting lever that is turnable as to at least one of the rails, by which turning the peripheral face of the disc-shaped recording medium is pressed, and the disc-shaped recording medium is conveyed. | 03-07-2013 |
20140310731 | DISK DRIVE APPARATUS - There is provided a disk drive apparatus including a first chassis unit that has a first pickup base at which a first optical pickup has been disposed, and a second chassis unit that has a second pickup base at which a pulley supporting part has been provided and at which a second optical pickup has been disposed. A disk table on which a disk-like recording medium is loaded is disposed at the first pickup base. A support hole is formed in the pulley supporting part. A chucking pulley that sandwiches and holds the disk-like recording medium together with the disk table is supported by the pulley supporting part in a state of being inserted in the support hole. At the chucking pulley, provided are an escape part, a flange part, and a clamp part. | 10-16-2014 |
20140310732 | DISK DRIVE APPARATUS - There is provided a disk drive apparatus including a first chassis unit that has a first pickup base supported by the first base chassis through an elastically deformable insulator, and a second chassis unit that has a second pickup base supported by the second base chassis through an elastically deformable insulator. At least one of the first chassis unit and the second chassis unit is moved in a thickness direction of the disk-like recording medium, and the first pickup base and the second pickup base are connected to or separated from each other. Positioning parts for performing positioning of the first pickup base and the second pickup base at a time of connection are provided at the first pickup base and the second pickup base, respectively. The first pickup base and the second pickup base are connected to each other by magnetic forces of magnets. | 10-16-2014 |
20140310733 | DISK DRIVE APPARATUS - There is provided a disk drive apparatus including a first chassis unit that has a pickup base at which an optical pickup and a disk table have been disposed, and a first base chassis to which the pickup base has been attached, and a second chassis unit that has a second base chassis and at which a chucking pulley has been disposed. A first rectifying plate part is provided at the first base chassis. A second rectifying plate part is provided at the second base chassis. | 10-16-2014 |
20140317643 | DISK CONVEYING DEVICE - Provided is a disk conveying device including a conveying mechanism configured to convey a disk-like recording medium inside and outside a disk cartridge including a plurality of holding grooves into which both end portions of the disk-like recording medium positioned at opposite sides with a center hole interposed therebetween are inserted, the plurality of holding grooves being formed in a line in a thickness direction of the disk-like recording medium, and a discharge lever configured to press an outer circumferential surface of the disk-like recording medium to the disk cartridge side when the disk-like recording medium is conveyed by the conveying mechanism. | 10-23-2014 |
20140325165 | MEMORY APPARATUS AND MEMORY MANAGEMENT METHOD - A memory apparatus includes a detection unit, a storage unit, an update unit, and a determination unit. The detection unit is configured to detect a deterioration factor of a nonvolatile memory. The storage unit is configured to hold a lifetime estimation value. The update unit is configured to update the lifetime estimation value on the basis of the deterioration factor detected by the detection unit. The determination unit is configured to use the lifetime estimation value updated by the update unit to generate a notification signal. | 10-30-2014 |
20150095543 | DATA BUS SYSTEM AND RECORDING APPARATUS - A data bus system includes a plurality of recording apparatuses, a transmission path, and a management apparatus. The plurality of recording apparatuses are configured to record and hold data. The transmission path is connected to the plurality of recording apparatuses by wireless communication and configured to transmit the data. The management apparatus is configured to manage the plurality of recording apparatuses and the transmission path. | 04-02-2015 |
20150095593 | RECORDING APPARATUS - A recording apparatus includes a recording unit, a waveguide forming unit, a communication unit, and a memory controller. The recording unit is configured to record and hold data. The waveguide forming unit is configured to function as a transmission path that transmits the data. The communication unit is configured to communicate with the waveguide forming unit. The memory controller is configured to control input and output of the data to and from the recording unit. | 04-02-2015 |
Patent application number | Description | Published |
20110124204 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING SUBSTRATE, AND SUBSTRATE PROCESSING APPARATUS - A semiconductor device manufacturing method includes: forming a layer on a substrate by supplying source gas into a process vessel; changing the layer into an oxide layer by supplying gases containing oxygen and hydrogen into the process vessel heated and kept lower than atmospheric pressure; and forming an oxide film on the substrate by alternately repeating the forming of the layer and the changing of the layer while purging an inside of the process vessel therebetween. In the forming of the layer, the source gas is supplied toward the substrate through a nozzle at a side of the substrate, and inert or hydrogen-containing gas is supplied together with the source gas through the nozzle toward the substrate, such that the velocity of the source gas flowing parallel to the substrate is greater than the velocity of the inert gas flowing parallel to the substrate in the purging of the process vessel. | 05-26-2011 |
20110230057 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING SUBSTRATE, AND SUBSTRATE PROCESSING APPARATUS - An excellent type of a film is realized by modifying conventional types of films. A carbonitride film of a predetermined thickness is formed on a substrate by performing, a predetermined number of times, a cycle including the steps of: supplying a source gas into a process vessel accommodating the substrate under a condition where a CVD reaction is caused, and forming a first layer including an element on the substrate; supplying a carbon-containing gas into the process vessel to form a layer including carbon on the first layer, and forming a second layer including the element and the carbon; supplying the source gas into the process vessel under a condition where a CVD reaction is caused to additionally form a layer including the element on the second layer, and forming a third layer including the element and the carbon; and supplying a nitrogen-containing gas into the process vessel to nitride the third layer, and forming a carbonitride layer serving as a fourth layer including the element, the carbon, and nitrogen. | 09-22-2011 |
20110256733 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS - An insulating film having features such as a low dielectric constant, a low etching rate and a high insulating property is formed. An oxycarbonitride film having a predetermined thickness is formed on a substrate in a process vessel by performing a cycle a predetermined number of times, wherein the cycle includes steps of: (a) performing a set of steps a predetermined number of times to form a carbonitride layer having a predetermined thickness on the substrate; and (b) supplying an oxygen-containing gas into the process vessel to oxidize the carbonitride layer having the predetermined thickness, thereby forming an oxycarbonitride layer, wherein the set of steps includes: (a-1) supplying a gas containing an element into the process vessel accommodating the substrate under a condition where a CVD reaction is caused to form a layer containing the element on the substrate; (a-2) supplying a carbon-containing gas into the process vessel to form a carbon-containing layer on the layer containing the element, thereby forming a layer including the element and a carbon; and (a-3) supplying a nitrogen-containing gas into the process vessel to nitride the layer including the element and the carbon, thereby forming the carbonitride layer. | 10-20-2011 |
20110294280 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS - Provided are a method of manufacturing a semiconductor device and a substrate processing apparatus capable of improving defects of conventional CVD and ALD methods, satisfying requirements of film-thinning, and realizing high film-forming rate. The method includes forming a first layer including a first element being able to become solid state by itself on a substrate by supplying a gas containing the first element into a process vessel in which the substrate is accommodated under a condition that a CVD reaction occurs, and forming a second layer including the first element and a second element being unable to become solid state by itself by supplying a gas containing the second element into the process vessel to modify the first layer, wherein a cycle including the forming of the first layer and the forming of the second layer is performed at least once to form a thin film including the first and second elements and having a predetermined thickness. | 12-01-2011 |
20110318940 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING SUBSTRATE, AND SUBSTRATE PROCESSING APPARATUS - A method of manufacturing a semiconductor device includes forming a layer containing a predetermined element on a substrate by supplying a source gas containing the predetermined element into a process vessel and exhausting the source gas from the process vessel to cause a chemical vapor deposition (CVD) reaction. A nitrogen-containing gas is supplied into the process vessel and then exhausted, changing the layer containing the predetermined element into a nitride layer. This process is repeated to form a nitride film on the substrate. The process vessel is purged by supplying an inert gas into the process vessel and exhausting the inert gas from the process vessel between forming the layer containing the predetermined element and changing the layer containing the predetermined element into the nitride layer. | 12-29-2011 |
20120184110 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS - An insulating film including characteristics such as low permittivity, a low etching rate and a high insulation property is formed. Supplying a gas containing an element, a carbon-containing gas and a nitrogen-containing gas to a heated substrate in a processing vessel to form a carbonitride layer including the element, and supplying the gas containing the element and an oxygen-containing gas to the heated substrate in the processing vessel to form an oxide layer including the element are alternately repeated to form on the substrate an oxycarbonitride film having the carbonitride layer and the oxide layer alternately stacked therein. | 07-19-2012 |
20130059451 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATAUS - A method of manufacturing a semiconductor device, the method comprising: forming an oxide film on a substrate by alternately repeating: (a) forming an element-containing layer on the substrate by supplying a source gas containing an element into a process vessel accommodating the substrate; and (b) changing the element-containing layer to an oxide layer by supplying an oxygen-containing gas and a hydrogen-containing gas into the process vessel having an inside pressure lower than atmospheric pressure, reacting the oxygen-containing gas with the hydrogen-containing gas to generate an atomic oxygen, and oxidizing the element-containing layer by the atomic oxygen. | 03-07-2013 |
20140024225 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS - An insulating film having features such as a low dielectric constant, a low etching rate and a high insulating property is formed. An oxycarbonitride film is formed on a substrate by performing a cycle a predetermined number of times, the cycle including: (a) supplying a gas containing an element to the substrate; (b) supplying a carbon-containing gas to the substrate; (c) supplying a nitrogen-containing gas to the substrate; and (d) supplying an oxygen-containing gas to the substrate. | 01-23-2014 |
20140318451 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus capable of forming an oxide film on a substrate by forming a layer on the substrate by supplying a source gas into a process vessel accommodating the substrate via the first nozzle, and simultaneously supplying an oxygen-containing gas through a second nozzle and a hydrogen-containing gas through a first nozzle into the process vessel having an inside pressure thereof lower than atmospheric pressure; mixing and reacting the oxygen-containing gas with the hydrogen-containing gas in a non-plasma atmosphere within the process vessel to generate atomic oxygen; and oxidizing the layer with the atomic oxygen to change the layer into an oxide layer is disclosed. | 10-30-2014 |
20150101755 | SUBSTRATE PROCESSING APPARATUS - An insulating film having features such as a low dielectric constant, a low etching rate and a high insulating property is formed. An oxycarbonitride film is formed on a substrate by performing a cycle a predetermined number of times, the cycle including: (a) supplying a gas containing an element to the substrate; (b) supplying a carbon-containing gas to the substrate; (c) supplying a nitrogen-containing gas to the substrate; and (d) supplying an oxygen-containing gas to the substrate. | 04-16-2015 |
20150194302 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus capable of forming an oxide film on a substrate by forming a layer on the substrate by supplying a source gas into a process vessel accommodating the substrate via the first nozzle, and simultaneously supplying an oxygen-containing gas through a second nozzle and a hydrogen-containing gas through a first nozzle into the process vessel having an inside pressure thereof lower than atmospheric pressure; mixing and reacting the oxygen-containing gas with the hydrogen-containing gas in a non-plasma atmosphere within the process vessel to generate atomic oxygen; and oxidizing the layer with the atomic oxygen to change the layer into an oxide layer is disclosed. | 07-09-2015 |
20150206737 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS - Provided is a technique of forming a film on a substrate by performing a cycle a predetermined number of times. The cycle includes: forming a first layer by supplying a gas containing a first element to the substrate, wherein the first layer is a discontinuous layer, a continuous layer, or a layer in which at least one of the discontinuous layer or the continuous layer is overlapped; forming a second layer including the first layer and a discontinuous layer including a second element stacked on the first layer; and forming a third layer by supplying a gas containing a third element to the substrate to modify the second layer under a condition where a modifying reaction of the second layer by the gas containing the third element is not saturated. | 07-23-2015 |
20150206742 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS - Provided is a technique of forming a film on a substrate by performing a cycle a predetermined number of times. The cycle includes: forming a first layer including a first element, wherein the first layer is a discontinuous layer, a continuous layer, or a layer in which at least one of the discontinuous layer or the continuous layer is overlapped; forming a second layer including the first layer and a discontinuous layer including a second element stacked on the first layer; forming a third layer by supplying a gas containing a third element to the substrate to modify the second layer; and forming a fourth layer including the first element, the second element, the third element and a fourth element by supplying a gas containing the fourth element to the substrate to modify the third layer. | 07-23-2015 |
20150214024 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS - Provided is a technique including forming a film by performing a cycle a predetermined number of times. The cycle includes: (a) forming a discontinuous first layer including the first element and having a thickness of less than one atomic layer on the substrate by supplying a gas containing the first element into a process vessel accommodating the substrate; and (b) forming a second layer including the first element and the second element by supplying a gas containing the second element into the process vessel to modify the first layer under a condition where a modifying reaction of the first layer by the gas containing the second element is not saturated. | 07-30-2015 |
20150214031 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS - Provided is a technique of forming a film on a substrate by performing a cycle a predetermined number of times. The cycle includes: forming a first layer by supplying a gas containing a first element to the substrate, wherein the first layer is a discontinuous layer, a continuous layer, or a layer in which at least one of the discontinuous layer or the continuous layer is overlapped; forming a second layer including the first layer and a discontinuous layer including a second element stacked on the first layer; forming a third layer including the second layer and a discontinuous layer including a third element stacked on the second layer; and forming a fourth layer including the first element, the second element, the third element and a fourth element by supplying a gas containing the fourth element to the substrate to modify the third layer. | 07-30-2015 |
20150214032 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS - Provided is a technique including forming a film on a substrate, the film including a first element and a second element different from the first element, by performing a cycle a predetermined number of times. The cycle includes: forming a first layer including the first element by supplying a gas containing the first element to the substrate, wherein the first layer is a discontinuous layer, a continuous layer, or a layer in which at least one of the discontinuous layer or the continuous layer is overlapped; and forming a second layer including the first element and the second element by supplying a gas containing the second element to the substrate to modify the first layer under a condition where a modifying reaction of the first layer by the gas containing the second element is not saturated. | 07-30-2015 |
20150214033 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS - Provided is a technique including forming a film on a substrate, the film including a first element and a second element different from the first element, by performing a cycle a predetermined number of times. The cycle includes: forming a first layer including a discontinuous chemical adsorption layer of a molecule constituting a gas containing the first element by supplying the gas containing the first element to the substrate under a condition where chemical adsorption of the molecule on a surface of the substrate is not saturated; and forming a second layer including the first element and the second element by supplying a gas containing the second element to the substrate to modify the first layer under a condition where a modifying reaction of the first layer by the gas containing the second element is not saturated. | 07-30-2015 |
20150214034 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS - Provided is a technique including forming a film by performing a cycle a predetermined number of times. The cycle includes: forming a first layer by supplying a gas containing a first element under a condition where chemical adsorption of a molecule constituting the gas containing the first element is not saturated; forming a second layer including the first layer and a layer including a second element stacked on the first layer by supplying a gas containing the second element under a condition where chemical adsorption of a molecule constituting the gas containing the second element is not saturated; and forming a third layer by supplying a gas containing a third element to modify the second layer under a condition where a modifying reaction of the second layer by the gas containing the third element is not saturated. | 07-30-2015 |
20150221495 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS - Provided is a technique of forming a film on a substrate by performing a cycle a predetermined number of times. The cycle includes: forming a first layer by supplying a gas containing a first element to the substrate, wherein the first layer is a discontinuous layer, a continuous layer, or a layer in which at least one of the discontinuous layer or the continuous layer is overlapped; forming a second layer by supplying a gas containing a second element to the substrate to modify the first layer under a condition where a modifying reaction of the first layer by the gas containing the second element is not saturated; and forming a third layer by supplying a gas containing a third element to the substrate to modify the second layer under a condition where a modifying reaction of the second layer by the gas containing the third element is not saturated. | 08-06-2015 |