Tai-Jui
Tai-Jui Su, Taoyuan TW
Patent application number | Description | Published |
---|---|---|
20150241872 | MOBILE ROBOTIC TROLLEY-BASED PROCESSING SYSTEM AND MOBILE ROBOTIC TROLLEY THEREOF - A mobile robotic trolley-based processing system includes a conveyor platform including a conveying track, air supply valves arranged along the conveying track, a gantry support unit providing a catenary and a water supply unit, mobile robotic trolleys each including a wheeled trolley chassis movable along the conveying track, connectors connectable to the air supply valves for collecting compressed air, a pantograph kept in contact with the catenary for collecting electrical power, a robot arm for transferring profile materials individually, a cleaner having a water inlet pipe connectable to the water supply unit for collecting water or cleaning solution and a drive control system for controlling the operation of the robot arm and the cleaner, and machine tools for processing profile materials being transferred by the robot arm of each mobile robotic trolley. | 08-27-2015 |
Tai-Jui Wang, Kaohsiung City TW
Patent application number | Description | Published |
---|---|---|
20130125961 | OPTICAL PASSIVATION FILM, METHOD FOR MANUFACTURING THE SAME, AND SOLAR CELL - An optical passivation film includes Ti | 05-23-2013 |
20140087549 | METHOD FOR FORMING PATTERNED DOPING REGIONS - A method for forming doping regions is disclosed, including providing a substrate, forming a first-type doping material on the substrate and forming a second-type doping material on the substrate, wherein the first-type doping material is separated from the second-type doping material by a gap; forming a covering layer to cover the substrate, the first-type doping material and the second-type doping material; and performing a thermal diffusion process to diffuse the first-type doping material and the second-type doping material into the substrate. | 03-27-2014 |
20150162196 | METHOD FOR FORMING PATTERNED DOPING REGIONS - A method for forming doping regions is disclosed, including providing a substrate, forming a first-type doping material on the substrate and forming a second-type doping material on the substrate, wherein the first-type doping material is separated from the second-type doping material by a gap; forming a covering layer to cover the substrate, the first-type doping material and the second-type doping material; and performing a thermal diffusion process to diffuse the first-type doping material and the second-type doping material into the substrate. | 06-11-2015 |
Tai-Jui Wang, Chutung TW
Patent application number | Description | Published |
---|---|---|
20140080313 | ETCHING COMPOSITION AND METHOD FOR ETCHING A SEMICONDUCTOR WAFER - An etching composition for a semiconductor wafer is provided, including 0.5-50 wt % base, 10-80 wt % alcohol, 0.01-15 wt % additive and water. A method for etching a semiconductor wafer is also provided. When the etching composition is applied to the entire surface or a partial surface of the semiconductor wafer at 60-200° C., the etching composition reacts on the semiconductor wafer to form a foam that etches the semiconductor wafer and includes a solid, a liquid and a gas. At the same time, the additive forms an oxide mask on the surface of the semiconductor wafer. Therefore, an excellent texture structure is formed on the surface of the semiconductor wafer, and a single surface of the semiconductor wafer is etched. | 03-20-2014 |