Patent application number | Description | Published |
20130095027 | CRYSTALLINE SILICON INGOT AND METHOD OF FABRICATING THE SAME - A crystalline silicon ingot and a method of fabricating the same are disclosed. The crystalline silicon ingot of the invention includes multiple silicon crystal grains growing in a vertical direction of the crystalline silicon ingot. The crystalline silicon ingot has a bottom with a silicon crystal grain having a first average crystal grain size of less than about 12 mm. The crystalline silicon ingot has an upper portion, which is about 250 mm away from said bottom, with a silicon crystal grain having a second average crystal grain size of greater than about 14 mm. | 04-18-2013 |
20130095028 | CRYSTALLINE SILICON INGOT AND METHOD OF FABRICATING THE SAME - A crystalline silicon ingot and a method of manufacturing the same are provided. Using a crystalline silicon seed layer, the crystalline silicon ingot is formed by a directional solidification process. The crystalline silicon seed layer is formed of multiple primary monocrystalline silicon seeds and multiple secondary monocrystalline silicon seeds. Each of the primary monocrystalline silicon seeds has a first crystal orientation different from (100). Each of the secondary monocrystalline silicon seeds has a second crystal orientation different from the first crystal orientation. Each of the primary monocrystalline silicon seeds is adjacent to at least one of the secondary monocrystalline silicon seeds, and separate from the others of the primary monocrystalline silicon seeds. | 04-18-2013 |
20130136918 | CRYSTALLINE SILICON INGOT INCLUDING NUCLEATION PROMOTION LAYER AND METHOD OF FABRICATING THE SAME - A crystalline silicon ingot and a method of fabricating the same are provided. The method utilizes a nucleation promotion layer to facilitate a plurality of silicon grains to nucleate on the nucleation promotion layer from a silicon melt and grow in a vertical direction into silicon grains until the silicon melt is completely solidified. The increment rate of defect density in the silicon ingot along the vertical direction has a range of 0.01%/mm˜10%/mm. | 05-30-2013 |
20140127496 | CRYSTALLINE SILICON INGOT INCLUDING NUCLEATION PROMOTION LAYER AND METHOD OF FABRICATING THE SAME - A crystalline silicon ingot and a method of fabricating the same are provided. The method utilizes a nucleation promotion layer to facilitate a plurality of silicon grains to nucleate on the nucleation promotion layer from a silicon melt and grow in a vertical direction into silicon grains until the silicon melt is completely solidified. The increment rate of defect density in the silicon ingot along the vertical direction has a range of 0.01%/mm˜10%/mm. | 05-08-2014 |
20140186631 | SEED USED FOR CRYSTALLINE SILICON INGOT CASTING - The invention discloses a seed used for crystalline silicon ingot casting. A seed according to a preferred embodiment of the invention includes a crystal and an impurity diffusion-resistant layer. The crystal is constituted by at least one grain. The impurity diffusion-resistant layer is formed to overlay an outer surface of the crystal. A crystalline silicon ingot fabricated by use of the seed of the invention has significantly reduced red zone and yellow zone. | 07-03-2014 |
20150197873 | CRUCIBLE ASSEMBLY AND METHOD OF MANUFACTURING CRYSTALLINE SILICON INGOT BY USE OF SUCH CRUCIBLE ASSEMBLY - The invention provides a crucible assembly and method of manufacturing a crystalline silicon ingot by use of such crucible assembly. The crucible assembly of the invention includes a crucible body and a fiber textile article. The fiber textile article is made of a plurality of carbon fibers, and is loaded on a bottom of the crucible body. The fiber textile article has a plurality of intrinsic pores randomly arranged. | 07-16-2015 |
20150307361 | MULTICRYSTALLINE SILICON BRICK AND SILICON WAFER THEREFROM - Present disclosure provides a multicrystalline silicon (mc-Si) brick, including a bottom portion starting from a bottom to a height of 100 mm, a middle portion starting from the height of 100 mm to a height of 200 mm; and a top portion starting from the height of 200 mm to a top. A percentage of incoherent grain boundary in the bottom portion is greater than a percentage of incoherent grain boundary in the top portion. Present disclosure also provides a multicrystalline silicon (mc-Si) wafer. The mc-Si wafer includes a percentage of non-Σ grain boundary from about 60 to about 75 and a percentage of Σ3 grain boundary from about 12 to about 25. | 10-29-2015 |
20150361577 | METHOD OF CASTING INGOT AND CONTAINING DEVICE OF INGOT CASTING FURNACE FOR CONTAINING MATERIALS OF INGOT - A method of casting an ingot includes the following steps: place solid silicon raw materials on a bottom of a containing device, wherein the containing device includes a container and a graphite layer provided on a surrounding wall and an inner bottom of the container, and the solid silicon raw materials are stacked upon the graphite layer on the inner bottom; heat the container to melt the solid silicon raw material into liquid state; cool the container from the bottom up till all of the silicon raw materials are crystallized and solidified. The solidified silicon raw materials become an ingot. Whereby, the graphite layer can effectively prevent impurities of the container from contaminating the ingot. | 12-17-2015 |