Patent application number | Description | Published |
20090256183 | Single Gate Nonvolatile Memory Cell With Transistor and Capacitor - A nonvolatile memory integrated circuit has a semiconductor substrate and a nonvolatile memory device on the semiconductor substrate. The device has a transistor and a capacitor on the semiconductor substrate, and a shared floating gate connecting the gate regions of the transistor and the capacitor. The transistor has at least a doping region defining the source and drain regions, as well as three other doping regions overlapping the source and drain regions. Also disclosed are a nonvolatile memory circuit with multiple such nonvolatile memory device, and methods for making the nonvolatile memory circuit with one or more such nonvolatile memory devices. | 10-15-2009 |
20090256184 | Single Gate Nonvolatile Memory Cell With Transistor and Capacitor - A nonvolatile memory integrated circuit has a semiconductor substrate and a nonvolatile memory device on the semiconductor substrate. The device has a transistor and a capacitor on the semiconductor substrate, and a shared floating gate connecting the gate regions of the transistor and the capacitor. The transistor has at least a doping region defining the source and drain regions, as well as three other doping regions overlapping the source and drain regions. Also disclosed are a nonvolatile memory circuit with multiple such nonvolatile memory device, and methods for making the nonvolatile memory circuit with one or more such nonvolatile memory devices. | 10-15-2009 |
20110121373 | SEMICONDUCTOR MEMORY DEVICES AND METHODS OF MANUFACTURING THE SAME - A semiconductor memory device includes a substrate of a first impurity type, a first well region of a second impurity type in the substrate, the second impurity type being different from the first impurity type, a second well region of the first impurity type in the substrate, a patterned first dielectric layer on the substrate extending over the first and second well regions, a patterned first gate structure on the patterned first dielectric layer, a patterned second dielectric layer on the patterned first gate structure, and a patterned second gate structure on the patterned second dielectric layer. The patterned first gate structure may include a first section extending in a first direction and a second section extending in a second direction orthogonal to the first section, wherein the first section and the second section intersects each other in a cross pattern. The patterned second gate structure may include at least one of a first section extending in the first direction over the first section of the patterned first gate structure or a second section extending in the second direction over the second section of the patterned first gate structure. | 05-26-2011 |
20110140201 | LATERAL POWER MOSFET STRUCTURE AND METHOD OF MANUFACTURE - A lateral power MOSFET with a low specific on-resistance is described. Stacked P-top and N-grade regions in patterns of articulated circular arcs separate the source and drain of the transistor. | 06-16-2011 |
20110266601 | Single Gate Semiconductor Device - A semiconductor device has a gate multiple doping regions on both sides of the gate. The gate can be shared by a transistor and a capacitor. | 11-03-2011 |
20120001260 | SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THE SAME - A semiconductor device for use in a relatively high voltage application that comprises a substrate, a first n-type well region in the substrate to serve as a high voltage n-well (HVNW) for the semiconductor device, a pair of second n-type well regions in the first n-type well region, a p-type region in the first n-type well region between the second n-type well regions, a pair of conductive regions on the substrate between the second n-type well regions, and a number of n-type regions to serve as n-type buried layers (NBLs) for the semiconductor device, wherein the NBLs are located below the first n-type region and dispersed in the substrate. | 01-05-2012 |
20120086052 | HIGH VOLTAGE MOS DEVICE AND METHOD FOR MAKING THE SAME - A high-voltage metal-oxide-semiconductor (HVMOS) device may include a source, a drain, a gate positioned proximate to the source, a drift region disposed substantially between the drain and a region of the gate and the source, and a self shielding region disposed proximate to the drain. A corresponding method is also provided. | 04-12-2012 |
20120104492 | LOW ON-RESISTANCE RESURF MOS TRANSISTOR - The present invention relates to a low on-resistance RESURF MOS transistor, comprising: a drift region; two isolation regions formed on the drift region; a first-doping-type layer disposed between the two isolation regions; and a second-doping-type layer disposed below the first-doping-type layer. | 05-03-2012 |
20120241861 | Ultra-High Voltage N-Type-Metal-Oxide-Semiconductor (UHV NMOS) Device and Methods of Manufacturing the same - An ultra-high voltage n-type-metal-oxide-semiconductor (UHV NMOS) device with improved performance and methods of manufacturing the same are provided. The UHV NMOS includes a substrate of P-type material; a first high-voltage N-well (HVNW) region disposed in a portion of the substrate; a source and bulk p-well (PW) adjacent to one side of the first HVNW region, and the source and bulk PW comprising a source and a bulk; a gate extended from the source and bulk PW to a portion of the first HVNW region, and a drain disposed within another portion of the first HVNW region that is opposite to the gate; a P-Top layer disposed within the first HVNW region, the P-Top layer positioned between the drain and the source and bulk PW; and an n-type implant layer formed on the P-Top layer. | 09-27-2012 |
20120248574 | Semiconductor Structure and Manufacturing Method and Operating Method for the Same - A semiconductor structure and a manufacturing method and an operating method for the same are provided. The semiconductor structure comprises a first well region, a second well region, a first doped region, a second doped region, an anode, and a cathode. The second well region is adjacent to the first well region. The first doped region is on the second well region. The second doped region is on the first well region. The anode is coupled to the first doped region and the second well region. The cathode is coupled to the first well region and the second doped region. The first well region and the first doped region have a first conductivity type. The second well region and the second doped region have a second conductivity type opposite to the first conductivity type. | 10-04-2012 |
20120280316 | Semiconductor Structure and Manufacturing Method for the Same - A semiconductor structure and a manufacturing method for the same are provided. The semiconductor structure includes a first doped well, a first doped electrode, a second doped electrode, doped strips and a doped top region. The doped strips are on the first doped well between the first doped electrode and the second doped electrode. The doped strips are separated from each other. The doped top region is on the doped strips and extended on the first doped well between the doped strips. The first doped well and the doped top region have a first conductivity type. The doped strips have a second conductivity type opposite to the first conductivity type. | 11-08-2012 |
20130020680 | SEMICONDUCTOR STRUCTURE AND A METHOD FOR MANUFACTURING THE SAME - A semiconductor structure and a method for manufacturing the same are provided. The semiconductor structure comprises a diode. The diode comprises a first doped region, a second doped region and a third doped region. The first doped region and the third doped region have a first conductivity type. The second doped region has a second conductivity type opposite to the first conductivity type. The second doped region and the third doped region are separated from each other by the first doped region. The third doped region has a first portion and a second portion adjacent to each other. The first portion and the second portion are respectively adjacent to and away from the second doped region. A dopant concentration of the first portion is bigger than a dopant concentration of the second portion. | 01-24-2013 |
20130207191 | SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor structure and a method for manufacturing the same are provided. The semiconductor structure comprises a first doped region and a second doped region. The first doped region comprises a first contact region. The first doped region and the first contact region have a first type conductivity. The second doped region comprises a second contact region. The second doped region and the second contact region have a second type conductivity opposite to the first type conductivity. The first doped region is adjacent to the second doped region. | 08-15-2013 |
20130265102 | SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor structure and method for manufacturing the same are provided. The semiconductor structure includes a substrate having a first conductive type; a deep well having a second conductive type formed in the substrate and extending down from a surface of the substrate; a first well having the first conductive type formed in the deep well and extending down from the surface of the substrate; and a second well having the second conductive type formed in the deep well and extending down from the surface of the substrate, and the second well adjacent to the first well. The first well includes a block region and plural finger regions joined to one side of the block region, while the second well includes plural channel regions interlaced with the finger regions to separate the finger regions. | 10-10-2013 |
20130295728 | Semiconductor Structure and Manufacturing Method for the Same - A semiconductor structure and a manufacturing method for the same are provided. The semiconductor structure includes a first doped well, a first doped electrode, a second doped electrode, doped strips and a doped top region. The doped strips are on the first doped well between the first doped electrode and the second doped electrode. The doped strips are separated from each other. The doped top region is on the doped strips and extended on the first doped well between the doped strips. The first doped well and the doped top region have a first conductivity type. The doped strips have a second conductivity type opposite to the first conductivity type. | 11-07-2013 |
20140015016 | SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME - A semiconductor structure and a method for forming the same are provided. The semiconductor structure includes a bulk, a gate, a source, a drain and a bulk contact region. The gate is on the bulk. The source and the drain are in the bulk on opposing sides of the gate respectively. The bulk contact region is only in a region of the bulk adjacent to the source. The bulk contact region is electrically connected to the bulk. | 01-16-2014 |
20140024205 | SEMICONDUCTOR STRUCTURE AND A METHOD FOR MANUFACTURING THE SAME - A semiconductor structure and a method for manufacturing the same are provided. The semiconductor structure comprises a diode. The diode comprises a first doped region, a second doped region and a third doped region. The first doped region and the third doped region have a first conductivity type. The second doped region has a second conductivity type opposite to the first conductivity type. The second doped region and the third doped region are separated from each other by the first doped region. The third doped region has a first portion and a second portion adjacent to each other. The first portion and the second portion are respectively adjacent to and away from the second doped region. A dopant concentration of the first portion is bigger than a dopant concentration of the second portion. | 01-23-2014 |
20140054656 | SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor structure and a method for manufacturing the same are provided. The semiconductor structure comprises a substrate, a device region, a first doped region and a gate structure. The first doped region is formed in the substrate adjacent to the device region. The gate structure is on the first doped region. The first doped region is overlapped the gate structure. | 02-27-2014 |
20140061721 | MOS DEVICE AND METHOD FOR FABRICATING THE SAME - An improved MOS device is provided whereby the p-top layer is defined by a series of discretely placed p type top diffusion regions. The invention also provides methods for fabricating the MOS device of the invention. | 03-06-2014 |
20140061790 | SPLIT-GATE LATERAL DIFFUSED METAL OXIDE SEMICONDUCTOR DEVICE - A semiconductor device includes a source region, a drain region, and a drift region between the source and drain regions. A split gate is disposed over a portion of the drift region, and between the source and drain regions. The split gate includes first and second gate electrodes separated by a gate oxide layer. A self-aligned RESURF region is disposed within the drift region between the gate and the drain region. PI gate structures including an upper polysilicon layer are disposed near the drain region, such that the upper polysilicon layer can serve as a hard mask for the formation of the double RESURF structure, thereby allowing for self-alignment of the double RESURF structure. | 03-06-2014 |
20140065781 | Ultra-High Voltage N-Type-Metal-Oxide-Semiconductor (UHV NMOS) Device and Methods of Manufacturing the same - An ultra-high voltage n-type-metal-oxide-semiconductor (UHV NMOS) device with improved performance and methods of manufacturing the same are provided. The UHV NMOS includes a substrate of P-type material; a first high-voltage N-well (HVNW) region disposed in a portion of the substrate; a source and bulk p-well (PW) adjacent to one side of the first HVNW region, and the source and bulk PW comprising a source and a bulk; a gate extended from the source and bulk PW to a portion of the first HVNW region, and a drain disposed within another portion of the first HVNW region that is opposite to the gate; a P-Top layer disposed within the first HVNW region, the P-Top layer positioned between the drain and the source and bulk PW; and an n-type implant layer formed on the P-Top layer. | 03-06-2014 |
20140264855 | SEMICONDUCTOR COMPOSITE LAYER STRUCTURE AND SEMICONDUCTOR PACKAGING STRUCTURE HAVING THE SAME THEREOF - A semiconductor composite layer structure disposed on a substrate having an electronic circuit structure and a first conductive layer is disclosed. The semiconductor composite layer structure comprises a plurality of dielectric layers, a first wetting layer, a stiff layer and a second wetting layer. The dielectric layers are disposed on the substrate separately. The first wetting layer is disposed on the dielectric layer and the substrate between the dielectric layers. The stiff layer is disposed on the first wetting layer. The second wetting layer is disposed on stiff layer, for contacting with a second conductive layer. | 09-18-2014 |
20140302654 | MOS device and method of manufacturing the same - A semiconductor device and method of forming the semiconductor device are disclosed, where the semiconductor device includes additional implant regions in the source and drain areas of the device for improving Ron-sp and BVD characteristics of the device. The device includes a gate electrode formed over a channel region that separates first and second implant regions in the device substrate. The first implant region has a first conductivity type, and the second implant region has a second conductivity type. A source diffusion region is formed in the first implant region, and a drain diffusion region is formed in the second implant region. | 10-09-2014 |
20140332886 | SINGLE POLY PLATE LOW ON RESISTANCE EXTENDED DRAIN METAL OXIDE SEMICONDUCTOR DEVICE - A semiconductor device, in particular, an extended drain metal oxide semiconductor (ED-MOS) device, defined by a doped shallow drain implant in a drift region. For example, an extend drain n-channel metal oxide semiconductor (ED-NMOS) device is defined by an n doped shallow drain (NDD) implant in the drift region. The device is also characterized by conductive layer separated from a substrate in part by a thin oxide layer and in another part by a thick/thin oxide layer. A method of fabricating a semiconductor device, in particular an ED-NMOS device, having a doped shallow drain implant of a drift region is also provided. A method is also provided for fabricating conductive layer disposed in part across a thin oxide layer and in another part across a thick/thin oxide layer. | 11-13-2014 |
20150048452 | ULTRA-HIGH VOLTAGE SEMICONDUCTOR HAVING AN ISOLATED STRUCTURE FOR HIGH SIDE OPERATION AND METHOD OF MANUFACTURE - A semiconductor device, in particular, an ultra-high metal oxide semiconductor (UHV MOS) device, is defined by a doped gradient structure in a drain region. For example, an ultra-high n-type metal oxide semiconductor (UHV NMOS) device is defined by an n-doped gradient structure in the drain region. The n-doped gradient structure has at least one of a high voltage n- (HVN-) well, a drain side high voltage n-type deep (HVND) well, and a drain side n-type well (NW) disposed in the drain region. A drain side n+ well is additionally disposed in the at least one of the HVN- well, the drain side HVND well, and the drain side NW. A method of manufacturing a UHV NMOS device having a doped gradient structure of a drain region is also provided. | 02-19-2015 |