Patent application number | Description | Published |
20080279746 | Process for the Fluorination of Boron Hydrides - A process for fluorination of borohydride salts including providing a reaction medium comprising HF and a superacid. A borohydride salt compound is added to the reaction medium. The borohydride salt is reacted with the with the reaction medium under conditions to form a fluorinated borohydride salt. In addition, reactor vessels may be provided for reacting the HF, superacid additive and borohydride that are fabricated from materials resistant to superacid compositions. | 11-13-2008 |
20090297925 | Dodecaborate Salt Radical Anion Compositions and Methods for Making and Using Such Compositions - The disclosure relates to new compositions comprising an, B | 12-03-2009 |
20100130780 | Synthesis of amine boranes - A method for preparing an amine borane from an alkali metal borohydride and an amine salt. The alkali metal borohydride is allowed to react with 0.95 to 1.05 equivalents of the amine salt in a solvent which contains water and an amine. | 05-27-2010 |
20100143607 | Precursors for Depositing Group 4 Metal-Containing Films - Described herein are Group 4 metal-containing precursors, compositions comprising Group 4 metal-containing precursors, and deposition processes for fabricating conformal metal containing films on substrates. In one aspect, the Group 4 metal-containing precursors are represented by the following formula I: | 06-10-2010 |
20100178228 | Synthesis of M2B12H12 - A method for preparing M | 07-15-2010 |
20110212629 | LIQUID COMPOSITION CONTAINING AMINOETHER FOR DEPOSITION OF METAL-CONTAINING FILMS - A formulation, comprising: a) at least one metal-ligand complex, wherein one or more ligands are selected from the group consisting of β-diketonates, β-ketoiminates, β-ketoesterates, β-diiminates, alkyls, carbonyls, alkyl carbonyls, cyclopentadienyls, pyrrolyls, alkoxides, amidinates, imidazolyls, and mixtures thereof; and the metal is selected from Group 2 to 16 elements of the Periodic Table of the Elements; and, b) at least one aminoether selected from the group consisting of R | 09-01-2011 |
20110250126 | GROUP 4 METAL PRECURSORS FOR METAL-CONTAINING FILMS - The present invention is related to a family of Group 4 metal precursors represented by the formula: | 10-13-2011 |
20110256314 | METHODS FOR DEPOSITION OF GROUP 4 METAL CONTAINING FILMS - A method for forming metal-containing films by atomic layer deposition using precursors of the formula: | 10-20-2011 |
20120045589 | Amidate Precursors For Depositing Metal Containing Films - Volatile metal amidate metal complexes are exemplified by bis(N-(tert-butyl)ethylamidate)bis(ethylmethylamido) titanium; (N-(tert-butyl)(tert-butyl)amidate)tris(ethylmethylamido) titanium; bis(N-(tert-butyl)(tert-butyl)amidate)bis(dimethylamido) titanium and (N-(tert-butyl)(tert-butyl)amidate)tris(dimethylamido) titanium. The term “volatile” referes to any precursor of this invention having vapor pressure above 0.5 torr at temperature less than 200° C. Metal-containing film depositions using these metal amidate ligands are also described. | 02-23-2012 |
20120121806 | Complexes Of Imidazole Ligands - Metal imidazolate complexes are described where imidazoles ligands functionalized with bulky groups and their anionic counterpart, i.e., imidazolates are described. Compounds comprising one or more such polyalkylated imidazolate anions coordinated to a metal or more than one metal, selected from the group consisting of alkali metals, transition metals, lanthanide metals, actinide metals, main group metals, including the chalcogenides, are contemplated. Alternatively, multiple different imidazole anions, in addition to other different anions, can be coordinated to metals to make new complexes. The synthesis of novel compounds and their use to form thin metal containing films is also contemplated. | 05-17-2012 |
20130030191 | Group IV Metal Complexes For Metal-Containing Film Deposition - Metal-containing complexes with general formula (1) (R | 01-31-2013 |
20130312855 | Vessel with Filter - A vessel for conveying a precursor-containing fluid stream from a precursor material contained within the vessel, the vessel comprising: an interior volume defined by a top, one or more sidewalls, and a base; and at least one fluid outlet for vaporized precursor, and at least one particle barrier that defines at least one particle restricted space within the interior volume, wherein said particle barrier comprises at least one 3-dimensional filter. A method for using the apparatus is also disclosed. | 11-28-2013 |
20140308802 | METHOD OF MAKING A MULTICOMPONENT FILM - Described herein is a method and precursor composition for depositing a multicomponent film. In one embodiment, the method and composition described herein is used to deposit a germanium-containing film such as Germanium Tellurium, Antimony Germanium, and Germanium Antimony Tellurium (GST) films via an atomic layer deposition (ALD) and/or other germanium, tellurium and selenium based metal compounds for phase change memory and photovoltaic devices. In this or other embodiments, the Ge precursor used comprises trichlorogermane. | 10-16-2014 |
20150030782 | Volatile dihydropyrazinly and dihydropyrazine metal complexes - A composition comprising dihydropyrazinyl anions that can be coordinated as 6 electron ligands to a broad range of different metals to yield volatile metal complexes for ALD and CVD depositions are described herein. Also described herein are undeprotonated dihydropyrazines that can coordinate to metals as stabilizing neutral ligands. In one embodiment, the composition is used for the direct liquid injection delivery of the metal dihydropyrazinyl complex precursor to the chamber of an ALD or CVD chamber for the deposition of metal-containing thin films such as, for example, ruthenium or cobalt metal films. | 01-29-2015 |