Seligson
Allen Seligson, La Jolla, CA US
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20130323350 | Orally dispersible multi-micronutrient dietary supplement composition and methods of using same - The present invention is directed to a novel orally dispersible multi-micronutrient dietary supplement in a tablet dosage form. Use of lipid encapsulated substrates, flavorings, sweeteners and bitter masking agents provides for a dosage that suppresses unpleasant tastes or aftertastes and imparts a pleasant mouth feel when the tablet disperses after being sucked or chewed for several minutes. The combination of lipid encapsulated substrates, oral disintegration and multiple daily dosing schedule provides for improved bioavailability of several crucial micronutrients. | 12-05-2013 |
Allen L. Seligson, Ramona, CA US
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20080260875 | NOVEL SKIN CARE COMPOSITIONS AND METHODS - Skin care compositions and methods are provided comprising a highly hydrophobic substance, an alkaryl polyfluorocarbon, particularly a substituted phenyl-polyfluoroacylamino propanamide, an alkanol and refined oils and the oil triglyceride fractions in sufficient amount to provide substantial homogeneity. When employed for hirsutism, optionally antioxidants and moisturizer are added. For use against wrinkles, additionally vitamins, antioxidants and a mixture of extracts of naturally occurring substances are present. | 10-23-2008 |
Dan Seligson, Palo Alto, CA US
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20130078633 | Detection of Isotype Profiles as Signatures for Disease - The invention provides a non-invasive technique for the detection and quantification of immunoglobulin isotypes, in a biological sample containing a plurality of distinct cell populations. Methods are conducted using sequencing technology to detect and enumerate immunoglobulin isotype profiles within a heterogeneous biological sample. | 03-28-2013 |
20150211070 | COMPOSITIONS AND METHODS FOR ANALYZING HETEROGENEOUS SAMPLES - Methods and compositions for detecting molecules in a heterogeneous sample are disclosed. The methods and compositions disclosed herein may be used for the treatment of a disease or condition characterized by the presence of nucleic acids from at least two different genomic sources. Additionally, the methods and compositions disclosed herein may be used to diagnose, predict, or monitor the status or outcome of a disease or condition characterized by the presence of nucleic acids from at least two different genomic sources. The heterogeneous samples may be from a transplant recipient, a chimeric individual, a subject suffering from a pathogenic infection, or a subject suffering from a different condition such as cancer. | 07-30-2015 |
Daniel Seligson, Palo Alto, CA US
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20110304592 | ENERGY SENSING LIGHT EMITTING DIODE DISPLAY - A display that includes energy sensors within the display itself is disclosed. An Organic Light Emitting Diode (OLED) can be made to operate both as a light emitter and as an energy detector. When forward biased with an appropriate driving signal, the OLED emits light via electroluminescence, which can be used to make a portion of an image on the display. In another mode, the OLED can detect energy by converting incoming photons or energy into an electrical signal by the photoelectric effect. By operating OLEDs in the display in both emissive and sensing modes, energy that shines on the display, such as from an outside source can be detected at the same time an image is shown. Additionally, a display including OLEDs can detect light energy generated by the display itself. | 12-15-2011 |
David Seligson, Los Angeles, CA US
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20080311039 | Therapeutic and Prognostic Factor Yy1 in Human Cancer - The present invention provides for the first time YY1, a transcription factor gene over-expressed and/or functionally overactive in human cancer. The present invention provides methods of diagnosing and providing a prognosis for cancer such as prostate cancer, as well as methods of drug discovery. YY1 is also a therapeutic target for treatment of cancer resistant to conventional and experimental cancer therapeutics. Inhibition of YY1 expression and/or activity sensitizes resistant tumor cells to cytotoxic treatments, including chemotherapy, radiation therapy, hormonal therapy, and immunotherapy. | 12-18-2008 |
David B. Seligson, Los Angeles, CA US
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20080248039 | Antibodies Against Histone Modifications for Clinical Diagnosis and Prognosis of Cancer - The present invention provides methods of diagnosing and providing a prognosis for a cancer by identifying cancers with altered global histone modification patterns using immunohistochemical techniques. | 10-09-2008 |
20100331203 | AROMATASE EXPRESSION PREDICTS SURVIVAL IN WOMEN WITH NON-SMALL CELL LUNG CANCER - The present invention relates to the discovery that the level of aromatase polypeptide expression in non-small cell lung carcinomas can be used for example to provide information useful in prognostic and therapeutic methodologies in women having or suspected of having this cancer. | 12-30-2010 |
20120094949 | HISTONE MODIFICATION PATTERNS FOR CLINICAL DIAGNOSIS AND PROGNOSIS OF CANCER - The present invention provides methods of diagnosing and providing a prognosis and therapy for cancer including, but not limited to, pancreatic cancer and responsiveness to thymidylate synthase inhibitor (e.g., 5-FU) therapy, by identifying cancers with altered histone modification patterns selected from the group consisting of H3K4me2, H3K9me2, or H3K18ac. | 04-19-2012 |
Joel Seligson, Misgav IL
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20080266561 | OPTICAL GAIN APPROACH FOR ENHANCEMENT OF OVERLAY AND ALIGNMENT SYSTEMS PERFORMANCE - A resultant image of a grating target may be obtained by dividing an image of the target into first and second portions and optically modifying the first and/or second portion such that a final image formed from their combination is characterized by a Moiré pattern. The resultant image may be analyzed to determine a shift in the grating target from a shift in the Moiré pattern. Optical alignment apparatus may include a first beam splitter, an image transformation element optically coupled to the first beam splitter, and a second beam splitter. The first beam splitter divides an image of a grating target into first and second portions. The second beam splitter combines the first portion and the second portion. The image transformation element optically modifies the first and/or second portion such that a final image formed from their combination is characterized by a Moiré pattern. | 10-30-2008 |
20110069312 | METROLOGY SYSTEMS AND METHODS - Various metrology systems and methods are provided. | 03-24-2011 |
20110310388 | DISCRETE POLARIZATION SCATTEROMETRY - Systems and methods for discrete polarization scatterometry are provided. | 12-22-2011 |
20120327503 | ILLUMINATION CONTROL - An optical system may include an objective, a source of illumination, an illumination system having illumination optics configured to direct the illumination onto the objective, and at least two dynamic optical array devices located at a pupil conjugate plane and a field conjugate plane, respectively in the illumination optics. The dynamic optical array devices are configured to control one or more properties of illumination coupled from the illumination system to the objective. | 12-27-2012 |
20130229661 | Metrology Systems and Methods - Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector. | 09-05-2013 |
20150036142 | Metrology Systems and Methods - Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector. | 02-05-2015 |
20150198524 | NEAR FIELD METROLOGY - Metrology systems and methods are provided herein, which comprise an optical element that is positioned between an objective lens of the system and a target. The optical element is arranged to enhance evanescent modes of radiation reflected by the target. Various configurations are disclosed: the optical element may comprise a solid immersion lens, a combination of Moiré-elements and solid immersion optics, dielectric-metal-dielectric stacks of different designs, and resonating elements to amplify the evanescent modes of illuminating radiation. The metrology systems and methods are configurable to various metrology types, including imaging and scatterometry methods. | 07-16-2015 |
Joel Seligson, D.n. Misgav IL
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20120206729 | STRUCTURED ILLUMINATION FOR CONTRAST ENHANCEMENT IN OVERLAY METROLOGY - Contrast enhancement in a metrology tool may include generating a beam of illumination, directing a portion of the generated beam onto a surface of a spatial light modulator (SLM), directing at least a portion of the generated beam incident on the surface of the SLM through an aperture of an aperture stop and onto one or more target structures of one or more samples, and generating a selected illumination pupil function of the illumination transmitted through the aperture utilizing the SLM in order to establish a contrast level of one or more field images of the one or more target structures above a selected contrast threshold, and performing one or more metrology measurements on the one or more target structures utilizing the selected illumination pupil function. | 08-16-2012 |
20130044331 | OVERLAY METROLOGY BY PUPIL PHASE ANALYSIS - The present invention may include measuring a first phase distribution across a pupil plane of a portion of illumination reflected from a first overlay target of a semiconductor wafer, wherein the first overlay target is fabricated to have a first intentional overlay, measuring a second phase distribution across the pupil plane of a portion of illumination reflected from a second overlay target, wherein the second overlay target is fabricated to have a second intentional overlay in a direction opposite to and having the same magnitude as the first intentional overlay, determining a first phase tilt associated with a sum of the first and second phase distributions, determining a second phase tilt associated with a difference between the first and second phase distributions, calibrating a set of phase tilt data, and determining a test overlay value associated with the first and second overlay target. | 02-21-2013 |
Joel L. Seligson, D.n. Misgav IL
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20120033226 | OPTICS SYMMETRIZATION FOR METROLOGY - The present invention includes an illumination source, at least one illumination symmetrization module (ISM) configured to symmetrize at least a portion of light emanating from the illumination source, a first beam splitter configured to direct a first portion of light processed by the ISM along an object path to a surface of one or more specimens and a second portion of light processed by the ISM along a reference path, and a detector disposed along a primary optical axis, wherein the detector is configured to collect a portion of light reflected from the surface of the one or more specimens. | 02-09-2012 |
Joel L. Seligson, Misgav IL
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20100005442 | Apparatus and Methods for Determining Overlay and Uses of Same - Disclosed are techniques and apparatus are provided for determining overlay error or pattern placement error (PPE) across the field of a scanner which is used to pattern a sample, such as a semiconductor wafer or device. This determination is performed in-line on the product wafer or device. That is, the targets on which overlay or PPE measurements are performed are provided on the product wafer or device itself. The targets are either distributed across the field by placing the targets within the active area or by distributing the targets along the streets (the strips or scribe areas) which are between the dies of a field. The resulting overlay or PPE that is obtained from targets distributed across the field may then be used in a number of ways to improve the fabrication process for producing the sample. For instance, the resulting overlay or PPE may be used to more accurately predict device performance and yield, more accurately correct a deviating photolithography scanning tool, or determine wafer lot disposition. | 01-07-2010 |
John Seligson, El Dorado Hills, CA US
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20150271016 | CONFIGURATION OF NETWORKS WITH SERVER CLUSTER DEVICE - Implementations relate to configuration of networks with a server cluster device. In some implementations, a method includes receiving shortest path bridging (SPB) configuration information at one or more of two peer server devices provided in a server cluster having a communication link connecting the peer server devices, where the server cluster is connected to a network and is detectable as a single logical server by a network device on the network. The information is sent from each receiving peer server device to the other peer server device over the communication link, where the information is related to the received SPB configuration information. Network configurations are synchronized on the two peer server devices based on the information sent over the communication link. | 09-24-2015 |
20150271017 | CONFIGURATION OF NETWORKS USING SWITCH DEVICE ACCESS OF REMOTE SERVER - Implementations relate to configuration of networks using switch device access of a remote server. In some implementations, a method includes sending a request from an edge configuration device to an access control server, where the request requests shortest path bridging (SPB) configuration information for a detected end device connected to the edge configuration device, and where the edge configuration device is connected to an SPB network. The method receives at the edge configuration device the SPB configuration information for the end device from the access control server. The edge configuration device is configured to provide the end device access to the SPB network. | 09-24-2015 |
20150271022 | CONFIGURATION OF NETWORKS USING CLIENT DEVICE ACCESS OF REMOTE SERVER - Implementations relate to configuration of networks using client device access of a remote server. In some implementations, a method includes requesting a management server from an end device for shortest path bridging (SPB) configuration information for the end device to communicate on an SPB network, where the end device communicates with the management server over a non-SPB connection. The SPB configuration information is received from the management server, and the SPB configuration information is sent to an edge configuration device connected to the end device, where the SPB configuration information causes configuration of the edge configuration device to allow communication of the end device on the SPB network. | 09-24-2015 |
20150271169 | AUTHENTICATION OF CLIENT DEVICES IN NETWORKS - Implementations relate to authentication of end devices in networks. In some implementations, a method includes receiving identity information at an edge configuration device from an end device via a connection, where the identity information identifies the end device or one or more users associated with the end device. A request is sent from the edge configuration device to an access control server connected to the network in response to receiving the identity information, where the request requests authentication for the end device. Authentication is received at the edge configuration device from the access control server for the end device to connect to a network connected to the edge configuration device. | 09-24-2015 |