Schoenleber
James R. Schoenleber, Spokane, WA US
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20140259764 | Shoe Cleat for Non-Cleated Shoes - A shoe cleat for installation on a non-cleated shoe provides a disk shaped base having opposing surfaces with a ground surface engaging protuberance on one base surface, and a threaded sole engaging screw on the opposing base surface. A cleat wrench releasably engages with outer peripheral configuration of the surface engage protuberance and allows the cleat to be threadably engaged in a shoe sole by a user. | 09-18-2014 |
Martin Schoenleber, Aschaffenburg DE
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20110261371 | Apparatus and Method for Monitoring a Thickness of a Silicon Wafer with a Highly Doped Layer - Apparatus for monitoring a thickness of a silicon wafer with a highly-doped layer at least at a backside of the silicon wafer is provided. The apparatus has a source configured to emit coherent light of multiple, wavelengths. Moreover, the apparatus comprises a measuring head configured to be contactlessly positioned adjacent the silicon wafer and configured to illuminate at least a portion of the silicon wafer with the coherent light and to receive at least a portion of radiation reflected by the silicon wafer. Additionally, the apparatus comprises a spectrometer, a beam splitter and an evaluation device. The evaluation device is configured to determine a thickness of the silicon wafer by analyzing the radiation reflected by the silicon wafer by an optical coherence tomography process. The coherent light is emitted multiple wavelengths in a bandwidth b around a central wavelength w | 10-27-2011 |
20130034918 | MONITORING APPARATUS AND METHOD FOR IN-SITU MEASUREMENT OF WAFER THICKNESSES FOR MONITORING THE THINNING OF SEMICONDUCTOR WAFERS AND THINNING APPARATUS COMPRISING A WET ETCHING APPARATUS AND A MONITORING APPARATUS - According to the invention, a monitoring device ( | 02-07-2013 |
20140315333 | Apparatus and Method for Monitoring a Thickness of a Silicon Wafer with a Highly Doped Layer - Apparatus for monitoring a thickness of a silicon wafer with a highly-doped layer at least at a backside of the silicon wafer is provided. The apparatus has a source configured to emit coherent light of multiple wavelengths. Moreover, the apparatus comprises a measuring head configured to be contactlessly positioned adjacent the silicon wafer and configured to illuminate at least a portion of the silicon wafer with the coherent light and to receive at least a portion of radiation reflected by the silicon wafer. Additionally, the apparatus comprises a spectrometer, a beam splitter and an evaluation device. The evaluation device is configured to determine a thickness of the silicon wafer by analyzing the radiation reflected by the silicon wafer by an optical coherence tomography process. The coherent light is emitted multiple wavelengths in a bandwidth b around a central wavelength w | 10-23-2014 |
Michael Schoenleber, Mountain View, CA US
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20130311115 | Battery System and Method with Parameter Estimator - An electrochemical battery system in one embodiment includes at least one electrochemical cell, a first sensor configured to generate a current signal indicative of an amplitude of a current passing into or out of the at least one electrochemical cell, a second sensor configured to generate a voltage signal indicative of a voltage across the at least one electrochemical cell, a memory in which command instructions are stored, and a processor configured to execute the command instructions to obtain the current signal and the voltage signal, and to generate kinetic parameters for an equivalent circuit model of the at least one electrochemical cell by obtaining a derivative of an open cell voltage (U | 11-21-2013 |
20130311116 | Battery System and Method with SOC/SOH Observer - An electrochemical battery system in one embodiment includes at least one electrochemical cell, a first sensor configured to generate a current signal indicative of an amplitude of a current passing into or out of the at least one electrochemical cell, a second sensor configured to generate a voltage signal indicative of a voltage across the at least one electrochemical cell, a memory in which command instructions are stored, and a processor configured to execute the command instructions to obtain the current signal and the voltage signal, and to generate an estimated SOC and kinetic parameters for an equivalent circuit model of the at least one electrochemical cell by obtaining a derivative of an open cell voltage, obtaining an estimated nominal capacity of the at least one electrochemical cell, estimating the kinetic parameters using a modified least-square algorithm with forgetting factor, and estimating the SOC using the estimated kinetic parameters. | 11-21-2013 |
20130311117 | Battery System and Method with Capacity Estimator - An electrochemical battery system in one embodiment includes at least one electrochemical cell, a current sensor configured to generate a current signal, a voltage sensor configured to generate a voltage signal, a memory in which command instructions are stored, and a processor configured to execute the command instructions to obtain the current signal and the voltage signal, and to generate an estimated cell nominal capacity (C | 11-21-2013 |
Michael Schoenleber, Sunnyvale, CA US
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20140180614 | System And Method For Selective Estimation Of Battery State With Reference To Persistence Of Excitation And Current Magnitude - A method of monitoring a battery with a controller identifies appropriate times for estimating a state of the battery. The method includes identifying a persistence of excitation in the battery, identifying a magnitude of an electrical current that is supplied to the battery, and performing a state estimation process for the battery only in response to the identified persistence of excitation exceeding a first predetermined threshold and the identified magnitude of the electrical current exceeding a second predetermined threshold. | 06-26-2014 |
Richard Schoenleber, Stuttgart DE
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20150090086 | POWER TOOL - A power tool includes a sawing working device of an at least partially flat form and at least one actuator. The sawing working device is configured to produce a sawing cut in a working direction. The at least one actuator is configured to produce at least one oscillation in the sawing working device. | 04-02-2015 |