Patent application number | Description | Published |
20090068592 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A positive resist composition including a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure,
| 03-12-2009 |
20090075204 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A positive resist composition including a resin component (A) which exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure,
| 03-19-2009 |
20090246683 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A positive resist composition and method of forming a resist pattern are provided which enable formation of a resist pattern having excellent shape with reduced LWR. | 10-01-2009 |
20100003622 | PATTERN-FORMING METHOD, METAL OXIDE FILM-FORMING MATERIAL AND METHOD FOR USING THE METAL OXIDE FILM-FORMING MATERIAL - A pattern-forming method, including: forming a first resist film by applying a first chemically amplified resist composition onto a support, forming a plurality of resist patterns by selectively exposing and then developing the first resist film, forming a plurality of coated patterns by forming a coating film composed of a metal oxide film on the surface of each resist pattern, forming a second resist film by applying a second chemically amplified resist composition onto the support having the coated patterns formed thereon, and selectively exposing and then developing the second resist film, thereby forming a pattern composed of the plurality of coated patterns and a resist pattern formed in the second resist film onto the support. | 01-07-2010 |
20100035192 | METHOD OF FORMING RESIST PATTERN - A method of forming a resist pattern including: forming a resist film on a substrate using a chemically amplified negative resist composition; forming a latent image of a first line and space pattern by subjecting the resist film to first exposure through a photomask; forming a latent image of a second line and space pattern so as to intersect with the latent image of the first line and space pattern by subjecting the resist film to second exposure through a photomask; and subjecting the resist film to developing to form a hole pattern in the resist film. | 02-11-2010 |
20100104972 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition of the present invention is obtained by dissolving a resin component (A) that displays changed alkali solubility under action of acid and an acid generator component (B) that generates acid upon exposure in an organic solvent (S), wherein the organic solvent (S) includes an aromatic organic solvent (S1). According to the present invention, a resist composition and a method of forming a resist pattern, in which the level of LWR is reduced, can be provided. | 04-29-2010 |
Patent application number | Description | Published |
20090250864 | RECORDING MEDIUM TRANSPORT APPARATUS AND IMAGE FORMING APPARATUS - A recording medium transport apparatus includes: plural storage units each storing a recording medium; a transport unit that transports the recording medium from one of the storage units to a recording position where an image is recorded on the recording medium; a memory that stores a reference position of a recording medium prescribed for each storage unit; a measuring unit that measures a position of the transported recording medium; and a movement unit that reads the reference position corresponding to the storage unit that stored the transported recording medium, from the memory, and moves the recording medium according to the difference between the reference position and the measured position such that the position of the recording medium approaches the reference position when the recording medium is located upstream of the recording position in the transport direction thereof. | 10-08-2009 |
20090256308 | RECORDING SHEET MOVING DEVICE, IMAGE FORMING DEVICE, AND RECORDING SHEET MOVING METHOD - A recording sheet moving device includes: a moving unit that moves a recording sheet; a recording sheet specifying unit that specifies a length in the transport direction and a weight per unit area of the recording sheet; a first memory configured to record, for each of plural recording sheets, a threshold for a length in the transport direction in association with a weight per unit area; and a movement control unit that retrieves a threshold for a length on the basis of the specified weight per unit area from the first memory, and compares the retrieved threshold for a length and the specified length, to determine whether to cause the moving unit to move the recording sheet, and if it is determined that the recording sheet should be moved, causes the moving unit to move the recording sheet. | 10-15-2009 |
20090257074 | RECORDING MATERIAL MOVING DEVICE AND IMAGE FORMING DEVICE - A recording material moving device comprises: a position adjuster that moves a recording material in a direction which is parallel to a recording surface of the recording material and orthogonal to a transporting direction, in an upstream side of a recording position along the transport direction of the recording material; a reference position specifying unit that specifies a reference position; a determination unit that determines whether a range of a predetermined width centered on the reference position exceeds a movable range of the recording material within which the recording material can be moved by the position adjuster; and a controller that causes, if the determination unit determines that the movable range is not exceeded, the position adjuster to sequentially move the recording material within the movable range of the predetermined width centered on the reference position each time a condition for moving the recording material is satisfied. | 10-15-2009 |