Rody
Achim Rody, Frankfurt DE
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20090203533 | Methods and Kits for Predicting and Monitoring Direct Response to Cancer Therapy - The invention provides novel compositions, methods and uses, for the prediction, diagnosis, prognosis, prevention and treatment of malignant neoplasia and breast cancer. The invention further relates to genes that are differentially expressed in breast tissue of breast cancer patients versus those of normal “healthy” tissue. Differentially expressed genes for the identification of patients which are likely to respond to chemotherapy are also provided. | 08-13-2009 |
Marc P.n. Rody, Great Falls, VA US
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20120248207 | WIRELESS CONTROL OF A HEATING OR COOLING UNIT - A control system includes a remote temperature sensor configured to wirelessly communicate a signal indicative of a space temperature, and a return air temperature sensor configured to output a signal indicative of a temperature of return airflow within an air conditioning/heating unit. The system further includes a controller segregated from the space that is responsive to the signals from the sensors for determining a working sensed temperature based upon a temperature value associated with the return air sensor and at least one temperature value associated with at least one remote temperature sensor. The controller is configured to compare the working sensed temperature to a set-point temperature and responsively generate a command signal to activate the air conditioning or heating unit to control temperature relative to a set-point. The controller controls the air conditioning/heating unit at all times based upon the temperature value associated with the return air sensor. | 10-04-2012 |
Yves Rody, Eindhoven NL
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20100333048 | METHOD AND APPARATUS FOR DESIGNING AN INTEGRATED CIRCUIT - Method and apparatus for designing an integrated circuit by calculating an optimised reticle layout design from an IC layout design and a model describing an optical system for transferring the IC layout design onto a semiconductor wafer using a reticle, wherein the IC layout design comprises features defined by a plurality of boundaries. Approximating the plurality of boundaries to generate an approximated IC layout design suitable for the manufacture of the IC. Performing OPC simulation on at least a portion of the approximated IC layout design. | 12-30-2010 |
Yves Rody, Crolles FR
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20080261375 | Method of Forming a Semiconductor Device Having a Dummy Feature - A method for forming a semiconductor device includes identifying an area that comprises an active device region, wherein the area has a perimeter at a first location and at least a portion of the edge of the active device region is coincident with at least a portion of the perimeter, expanding the perimeter to a first distance away from the first location, wherein the first distance defines a first point of a dummy feature, determining a second point of the dummy feature, adding the dummy feature to a layout using the first point and the second point, and using the layout to form a layer in a semiconductor device. | 10-23-2008 |
Yves Fabien Rody, Dresden DE
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20140204355 | Method for Exposing an Area on a Substrate to a Beam and Photolithographic System - Embodiments of the invention describe a method for exposing an area on a substrate to a beam. The method includes adjusting a focus offset of the beam with respect to the area on the substrate, tilting the beam or tilting the substrate, and exposing the area on the substrate with the beam, thereby generating locations within the area exposed with different foci. Furthermore embodiments describe computer programs for controlling a photolithographic system to do the same and a photolithographic system for doing the same. | 07-24-2014 |